CN117682763A

CN117682763A - Sintering-free high-reflection photovoltaic glass glaze as well as preparation method and application thereof

Info

Publication number: CN117682763A
Application number: CN202311536125.1A
Authority: CN
Inventors: 周志文; 王科; 纪朋远; 唐高山; 蔡敬; 向黎明; 陈志鸿; 何进
Original assignee: CSG Holding Co Ltd; Dongguan CSG Solar Glass Co Ltd
Current assignee: CSG Holding Co Ltd; Dongguan CSG Solar Glass Co Ltd
Priority date: 2023-11-16
Filing date: 2023-11-16
Publication date: 2024-03-12

Abstract

The application discloses a sintering-free high-reflection photovoltaic glass glaze and a preparation method and application thereof. In a first aspect of the application, a sintering-free high-reflection photovoltaic glass frit is provided, and raw materials of the sintering-free high-reflection photovoltaic glass frit comprise silicon carbon resin, titanium dioxide, an auxiliary agent and a solvent. The sintering-free high-reflection photovoltaic glass glaze adopts silicon carbon resin to replace conventional low-melting glass powder as a film forming substance of high-reflection glass printing ink, and can be formed into films without high-temperature sintering and only by low-temperature baking, and the molecular structure of the silicon carbon resin as a raw material in the formed film is only provided with silicon-oxygen bonds and silicon-carbon bonds, so that the characteristics of hardness, high temperature resistance and various other chemical mediums similar to glass are realized, and a high-reflection coating with good adhesive force, high hardness and good weather resistance is obtained.

Description

Sintering-free high-reflection photovoltaic glass glaze as well as preparation method and application thereof

Technical Field

The application relates to the technical field of photovoltaics, in particular to a sintering-free high-reflection photovoltaic glass glaze, a preparation method and application thereof.

Background

The double-glass assembly adopts high-reflection glazed backboard glass to replace the traditional backboard, the high-reflection glazed glass backboard utilizes gaps between the battery pieces to carry out glaze plating and whitewashing, sunlight penetrating through gaps of the solar battery pieces is reflected to the surface of the solar battery pieces, so that the sunlight can be secondarily utilized, the light absorption capacity of the double-glass photovoltaic assembly is improved, and the effect of light blocking reflection and component power improvement is achieved. By combining PERC, HJT, PERT, topcon and other double-sided battery technologies, the glazed double-glass assembly can realize double-sided power generation without obviously increasing cost, and meanwhile, the power generation gain of 10-30% is realized at the system end. Therefore, each module manufacturer introduces the gridded high-reflection glazed glass in a large scale.

The gridding high-reflection glazed glass is formed by printing high-reflection white glaze (the high-reflection white glaze refers to a glass glaze with high reflectivity to visible light and is high-temperature sintering ink) on glass in a screen printing mode, and then sintering the glass at 680-720 ℃ to be tightly combined with the glass, so that a firm and hard paint film is formed. The existing photovoltaic glass high-reflection white glaze is generally prepared from glass powder, titanium pigment, varnish and the like. The glass powder is an important component of the glaze, and has the main effects of melting and softening the glass powder when the glazed glass is toughened, replacing varnish resin as a binder to form an enamel body, playing a role of secondary film forming, adhering functional whitening powder (titanium pigment) on the surface of the glass and having certain adhesive force.

However, the high-temperature sintering type glass ink needs high-temperature sintering, so that a large amount of heat is consumed, energy consumption is increased, and the thermal expansion coefficient between glass powder and a glass substrate is often different, so that the stress of the whole glass is uneven, the flatness and the bending degree of the glass can be influenced, and the glazed glass is low in mechanical load resistance and easy to self-explosion in the use process. Meanwhile, because the general tempering temperature of the photovoltaic glass is 680-720 ℃, in order to enable the glass powder to be melted and softened in the temperature range and have fluidity so as to wrap and bond titanium pigment, a low-melting-point glass powder with the melting temperature of 450-550 ℃ needs to be selected, and a large amount of alkali metal or alkaline earth metal salts such as sodium, potassium and the like are added to be used as fluxing agents in the preparation process of the low-melting-point glass powder so as to reduce the melting temperature of silicon dioxide, and alkali metals such as sodium, potassium and the like form alkali solution under the action of water vapor and form soluble silicate with the silicon dioxide, so that a silicon dioxide network is corroded to cause corrosion and falling of a glaze layer, and the weather resistance of the glaze layer is affected; meanwhile, metal ions such as sodium and potassium are easy to migrate to the surface of the silicon crystal cell and are enriched in the cell anti-reflection layer under the action of an external electric field, so that leakage current is increased, PID (potential induced degradation) problems are easy to occur in the photovoltaic module, and accordingly output power of the photovoltaic module is attenuated.

However, the common low-temperature baking type ink generally has the problems of insufficient adhesive force, weak weather resistance, unstable performance and the like, paint dropping, color changing and the like are easy to occur after processing, and particularly the low-temperature baking type ink made of common organic resin under the irradiation of outdoor sunlight ultraviolet rays cannot meet the outdoor use requirement of a photovoltaic power generation assembly. Therefore, there is a need to provide a highly reflective ink material for photovoltaic back sheet glass that does not require high temperature sintering and is excellent in properties such as adhesion, weather resistance, etc.

Disclosure of Invention

The present application aims to solve at least one of the technical problems existing in the prior art. Therefore, the application provides the sintering-free high-reflection photovoltaic glass glaze and the preparation method and application thereof, so that the high-temperature sintering-free photovoltaic glass glaze is realized, and meanwhile, the adhesion, weather resistance and the like are taken into consideration.

In a first aspect of the present application, a sinter-free high-reflectance photovoltaic glass frit is provided, wherein the raw materials of the sinter-free high-reflectance photovoltaic glass frit comprise silicon carbon resin, titanium dioxide, an auxiliary agent and a solvent.

The beneficial effect of exempting from sintering high reflection photovoltaic glass frit that this application embodiment provided is:

the sintering-free high-reflection photovoltaic glass glaze adopts silicon carbon resin to replace conventional low-melting glass powder as a film forming substance of high-reflection glass printing ink, and can be formed into films without high-temperature sintering and only by low-temperature baking, and the molecular structure of the silicon carbon resin as a raw material in the formed film is only provided with silicon-oxygen bonds and silicon-carbon bonds, so that the characteristics of hardness, high temperature resistance and various other chemical mediums similar to glass are realized, and a high-reflection coating with good adhesive force, high hardness and good weather resistance is obtained.

In some embodiments of the present application, the adjuvant includes at least one of a thickener, a dispersant.

In some embodiments of the present application, the thickener is a non-soap based thickener.

In some embodiments of the present application, the non-soap based thickener comprises at least one of an inorganic thickener, a cellulosic thickener, a polyacrylate thickener, a polyurethane thickener, a polyurea thickener, and the like.

In some embodiments of the present application, the inorganic thickener comprises at least one of bentonite, fumed silica, attapulgite, aluminum silicate, and the like.

In some embodiments of the present application, the cellulosic thickener comprises at least one of methylcellulose, ethylcellulose, carboxymethylcellulose, hydroxyethylcellulose, hydroxypropylcellulose, hydroxypropylmethyl cellulose, and the like.

In some embodiments of the present application, the polyacrylate thickener comprises at least one of a polyacrylate, a homopolymer or a copolymer of acrylic acid, methacrylic acid.

In some embodiments of the present application, the non-soap based thickener comprises at least one of fumed silica, polyurea, bentonite, celluloses.

In some embodiments of the present application, the dispersant includes at least one of a silane coupling agent, a titanate coupling agent, a zirconate coupling agent, an aluminate coupling agent, a bimetallic coupling agent (e.g., aluminum-zirconate, aluminum-titanate), a rare earth coupling agent, and the like. In the embodiment of the application, the dispersing agent, particularly the titanate coupling agent is used for carrying out surface treatment on the titanium dioxide, so that the dispersibility and stability of the titanium dioxide in the silicon-carbon resin are improved, the subsequent film forming process is facilitated, and various performances of the film coating are promoted.

In some embodiments of the present application, the titanate coupling agent comprises at least one of a monoalkoxy titanate coupling agent, a monoalkoxy pyrophosphate titanate coupling agent, a chelating titanate coupling agent, a coordinating titanate coupling agent, such as at least one of U.S. Kenrich Petrochemicals inc. KR-38S, KR-138s, KR-238 s.

In some embodiments of the present application, the mass of the thickener is 0.5-1.5%, such as 0.5%, 0.6%, 0.7%, 0.8%, 0.9%, 1%, 1.1%, 1.2%, 1.3%, 1.4%, 1.5% of the total mass of the sinter free highly reflective photovoltaic glass frit.

In some embodiments of the present application, the dispersant is 1-2% by mass of the titanium dioxide, such as 1%, 1.1%, 1.2%, 1.3%, 1.4%, 1.5%, 1.6%, 1.7%, 1.8%, 1.9%, 2%.

In some embodiments of the present application, the titanium pigment has a mass of 50-150%, such as 50%, 60%, 70%, 80%, 90%, 100%, 110%, 120%, 130%, 140%, 150% of the mass of the silicone resin.

In some embodiments of the present application, the titanium dioxide is rutile titanium dioxide.

In some embodiments of the present application, a coating layer is formed on the surface of the rutile titanium dioxide, and the coating layer comprises at least one of silicon oxide and aluminum oxide. The titanium dioxide is coated by the silicon oxide and/or the aluminum oxide, so that lattice defects caused by the titanium dioxide under the ultraviolet irradiation condition can be blocked, light activation points on the surface of the titanium dioxide are shielded, and the PID resistance is improved.

In some embodiments of the present application, the cladding layer comprises silicon oxide and aluminum oxide.

In some embodiments of the present application, the rutile titanium dioxide is produced by a chloride process.

In some embodiments of the present application, the method for preparing rutile titanium dioxide by chlorination method comprises reacting titanium-containing raw material (such as high titanium chloride slag or synthetic rutile or natural rutile) with chlorine to generate titanium tetrachloride, purifying, gas-phase oxidizing, rapid cooling, gas-solid separation, washing, and pulverizing to obtain rutile titanium dioxide. The titanium dioxide prepared by the chlorination method has extremely low impurity content, and is better in reflection effect when used for photovoltaic glass, and higher in power of photovoltaic modules.

In some embodiments of the present application, the solvent comprises at least one of esters, alcohol ethers, alcohol ether esters.

In some embodiments of the present application, the solvent comprises one of butyl acetate, 3-methoxybutyl acetate, propylene glycol methyl ether acetate, ethylene glycol butyl ether acetate, diethylene glycol methyl ether acetate, diethylene glycol ethyl ether acetate, diethylene glycol butyl ether acetate, ethylene glycol butyl ether, diethylene glycol butyl ether, dipropylene glycol methyl ether, dipropylene glycol ethyl ether, dipropylene glycol propyl ether, dipropylene glycol butyl ether.

In some embodiments of the present application, the silicon carbon resin comprises structural units of O-Si-C-Si-O-Si.

In some embodiments of the present application, the silicone comprises at least one of Z4100, Z4300 of Shanghai co general chemical industry, inc.

In some embodiments of the present application, the viscosity of the sinter-free highly reflective photovoltaic glass frit is 8000 to 20000 mPa-s.

In a second aspect of the present application, a method for preparing a sintering-free high-reflection photovoltaic glass frit is provided, the method comprising the steps of:

and mixing the silicon carbon resin and titanium dioxide in a solvent, adding an auxiliary agent, uniformly mixing, and binding ink to obtain the sintering-free high-reflection photovoltaic glass glaze.

In some embodiments of the present application, a method of preparing a sinter-free highly reflective photovoltaic glazing frit comprises the steps of:

and mixing the silicon carbon resin and titanium dioxide in a solvent, adding a dispersing agent, dispersing uniformly, adding a thickening agent, regulating viscosity, and binding ink to obtain the sintering-free high-reflection photovoltaic glass glaze.

In some embodiments of the present application, a thickener is added to adjust the viscosity to make it suitable for screen printing.

In some embodiments of the present application, a thickener is added to adjust the viscosity to 8000 to 20000 mPa-s.

In some embodiments of the present application, the silicone resin is stirred in the solvent at a stirring speed of 300 to 400rpm, and titanium dioxide is added to mix.

In some embodiments of the present application, the dispersant is added followed by stirring at 800 to 1000rpm for 30 to 60 minutes.

In some embodiments of the present application, the glaze fineness after ink pricking is <7 μm.

In a third aspect of the application, a coated glass is provided, the coated glass comprises a glass substrate and a glaze coating layer positioned on one side of the glass substrate, and the glaze coating layer is formed by the sintering-free high-reflection photovoltaic glass glaze.

In some embodiments of the present application, the coated glass is prepared as follows: and (3) tempering the glass substrate, cooling, performing screen printing by using the high-reflection photovoltaic glass glaze without sintering, and solidifying at the temperature below 300 ℃ to form a glaze coating layer to obtain the coated glass.

In some embodiments of the present application, the temperature of the tempering is 650-750 ℃, e.g., 650 ℃, 660 ℃, 670 ℃, 680 ℃, 690 ℃, 700 ℃, 710 ℃, 720 ℃, 730 ℃, 740 ℃, 750 ℃. In some of these embodiments, the tempering temperature is 680-720 ℃.

In some embodiments of the present application, the tempering time is 2 to 5 minutes, such as 2 minutes, 3 minutes, 4 minutes, 5 minutes.

In some embodiments of the present application, the screen printing is 180-250 mesh, e.g., 180 mesh, 190 mesh, 200 mesh, 210 mesh, 220 mesh, 230 mesh, 240 mesh, 250 mesh.

In some embodiments of the present application, the wet film thickness of screen printing is 20 to 35 μm, e.g., 20 μm, 25 μm, 30 μm, 35 μm.

In some embodiments of the present application, the temperature of curing is 150 to 250 ℃, such as 150 ℃, 200 ℃, 250 ℃.

In some embodiments of the present application, the curing time is 3 to 5 minutes, e.g., 3 minutes, 4 minutes, 5 minutes.

In a fourth aspect of the present application, a photovoltaic module is provided, the photovoltaic module comprising the coated glass described above.

In some embodiments of the present application, a photovoltaic module includes a back sheet, a front sheet, and a battery cell positioned between the back sheet and the front sheet, the back sheet including the aforementioned coated glass.

In some embodiments of the present application, the battery cell includes, but is not limited to, at least one of an N-type photovoltaic cell (e.g., BSF, single-sided PERC, double-sided PERC), a P-type photovoltaic cell (e.g., PERT, HJT/HIT, IBC, TOPCon, HBC, TBC), and the like.

In some embodiments of the present application, the photovoltaic module includes a back plate, a first adhesive film layer, a battery cell, a second adhesive film layer, and a front plate that are sequentially disposed. The first adhesive film layer and the second adhesive film layer can be polyethylene-polyvinyl acetate copolymer (EVA), polyvinyl butyral (PVB) and the like.

Additional aspects and advantages of the application will be set forth in part in the description which follows, and in part will be obvious from the description, or may be learned by practice of the application.

Detailed Description

The conception and technical effects produced by the present application will be clearly and completely described below in connection with the embodiments to fully understand the objects, features and effects of the present application. It is apparent that the described embodiments are only some embodiments of the present application, but not all embodiments, and that other embodiments obtained by those skilled in the art without inventive effort based on the embodiments of the present application are within the scope of the present application.

The following detailed description of embodiments of the present application is exemplary and is provided merely for purposes of explanation and not to be construed as limiting the application.

In the description of the present application, the meaning of a plurality means one or more, the meaning of a plurality means two or more, and the meaning of greater than, less than, exceeding, etc. is understood to exclude the present number, and the meaning of above, below, within, etc. is understood to include the present number, and the meaning of about means within the range of ±20%, 10%, 8%, 5%, 4%, 3%, 2%, 1%, 0.5%, 0.2%, 0.1% etc. of the present number. The description of the first and second is for the purpose of distinguishing between technical features only and should not be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated or implicitly indicating the precedence of the technical features indicated.

In the description of the present application, a description with reference to the terms "one embodiment," "some embodiments," "illustrative embodiments," "examples," "specific examples," or "some examples," etc., means that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the present application. In this specification, schematic representations of the above terms do not necessarily refer to the same embodiments or examples. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.

Example 1

The embodiment provides a white sintering-free high-reflection photovoltaic glass glaze, which is prepared by the following steps:

(1) 100g of silicone Z4100 (solvent is butyl acetate, solid content 20%) was added to the dispersion tank, the mechanical stirrer was turned on, stirring speed was 400rpm, and 20g of titanium pigment was added thereto while stirring.

(2) Then, 0.4g of the titanate coupling agent KR-138S was added thereto, and the stirring speed was adjusted to 800rpm, followed by stirring and dispersion for 30 minutes.

(3) Finally, about 1g of ethyl cellulose was added thereto to adjust the viscosity to about 20000 mPas.

(4) Pouring the ink into a three-roller grinder, binding the ink, detecting the fineness of the ink to be less than 10 mu m, and obtaining the white sintering-free high-reflection photovoltaic glass glaze.

The titanium dioxide is prepared by a chlorination method, and a coating layer of aluminum oxide and silicon oxide is formed on the surface of the titanium dioxide.

The embodiment also provides high-reflection photovoltaic backboard glazed glass. The preparation process is as follows:

tempering a photovoltaic backboard glass raw sheet at 680-720 ℃ for 3min, cooling, entering a screen printing room along with a conveying roller way, performing 200-mesh screen printing by using the sintering-free high-reflection photovoltaic glass glaze, controlling the thickness of a wet film to be 25 mu m, and then entering a curing furnace to be cured for 5min at 250 ℃ to obtain the high-reflection photovoltaic backboard glaze-plated glass.

Example 2

(1) 100g of silicone Z4300 (butyl acetate as solvent, 50% solids) was added to the dispersion jar, the mechanical stirrer was turned on, stirring speed was 400rpm, and 75g of titanium pigment was added thereto while stirring.

(2) Then, 1g of the titanate coupling agent KR-138S was added thereto, and the stirring speed was adjusted to 800rpm, followed by stirring and dispersion for 30 minutes.

(3) Finally, about 1.5g of ethyl cellulose was added thereto to adjust the viscosity to about 20000 mPas.

Example 3

(1) 100g of silicone Z4300 (butyl acetate as solvent, 50% solids) was added to the dispersion jar, the mechanical stirrer was turned on, and 50g of titanium pigment was added thereto with stirring at 400 rpm.

(3) Finally, about 1.8g of ethyl cellulose was added thereto to adjust the viscosity to about 20000 mPas.

Comparative example 1

The comparative example provides a common low-temperature baking type glaze, which is prepared by the following steps:

(1) 100g of a glass varnish resin acrylic resin AC8170 (solid content 60%) and 20g of an amino resin Cymel325 were added to a dispersion cylinder, and a mechanical stirrer was turned on at a stirring speed of 400rpm, to which 80g of titanium pigment was added while stirring.

(2) Then, 1.6g of the titanate coupling agent KR-138S was added thereto, and the stirring speed was adjusted to 800rpm, followed by stirring and dispersion for 30 minutes.

(3) Finally, an appropriate amount of ethylcellulose was added thereto, and the viscosity was adjusted to about 20000 mpa.s.

(4) Pouring the ink into a three-roller grinder, binding the ink, detecting the fineness of the ink to be less than 10 mu m, and obtaining the white low-temperature baking glaze.

The comparative example also provides a photovoltaic backboard glazing glass. The preparation process is as follows:

tempering a photovoltaic backboard glass raw sheet at 680-720 ℃ for 3min, cooling, entering a screen printing room along with a conveying roller way, performing 200-mesh screen printing on the low-temperature baking type glaze in the comparative example, controlling the thickness of a wet film to be 25 mu m, and then entering a curing furnace to be cured for 5min at 250 ℃ to obtain the photovoltaic backboard glazed glass.

Comparative example 2

The comparative example provides a high-temperature sintered toughened glass glaze, which is prepared by the following steps:

(1) 80g of aqueous varnish was added to the dispersion tank, the mechanical stirrer was turned on, the stirring speed was 500rpm, and 3g TEGO Dispers 735W dispersant was added thereto with stirring for a dispersion time of 10 minutes.

(2) 120g of titanium dioxide, 200g of leadless low-melting glass powder (D250) and 5g of thixotropic anti-settling agent are sequentially added into a dispersing cylinder to be dispersed at a high speed of 1500rpm for 50min.

(3) Finally, a proper amount of diluent is added, and the viscosity is adjusted to 60000-100000 mPa.s.

(4) Pouring the ink into a three-roller grinder, binding the ink, detecting the fineness of the ink to ensure that the fineness is less than 10 mu m, and obtaining the white high-temperature sintering type toughened glass glaze.

the high-temperature sintered toughened glass glaze is printed on the surface of the photovoltaic backboard glass by using a 200-mesh screen, the thickness of a wet film is controlled to be 25 mu m, the wet film is cured for 3min at 250 ℃, and the high-impact-resistance photovoltaic backboard glazed glass is obtained by sintering and toughening the glass at 690-695 ℃.

The photovoltaic backboard glazed glass provided in examples 1 to 3 and comparative examples 1 to 2 were used for detection, the reflectance test equipment was a spectrocolorimeter CM-26dG/26d/25d of KONICA MINOLTA, and the adhesion test was a hundred-blade knife. PCT test refers to UL1703, uv test refers to IEC61215. The test methods can also be referred to in Table 1, and the results are shown in Table 1.

TABLE 1 detection methods and results for examples and comparative examples

As can be seen from the results in the table, the existing low-temperature baking type photovoltaic glass glaze provided in comparative example 1 has poor weather resistance, the adhesion of the formed coating film with the back plate glass is rapidly reduced under the ultraviolet light condition, and various problems such as deformation, discoloration and falling occur, so that the use is affected. The existing high-temperature sintering type photovoltaic glass glaze provided in the comparative example 2 has better weather resistance, but has poorer impact strength, and the excessively high sintering temperature also causes the problem of excessively high energy consumption. In contrast, the sintering-free high-reflection photovoltaic glass glaze provided in examples 1 to 3 can form a coating film with higher impact strength on back plate glass in a low-temperature baking mode, has strong adhesive force with a base film, and has high weather resistance to ultraviolet, high temperature and the like.

The principle of the further analysis is that the sintering-free high-reflection photovoltaic glass glaze provided by the application adopts silicon carbon resin to replace the existing low-melting-point glass powder as a film forming substance of high-reflection glass ink, and after film forming is carried out by low-temperature baking, only silicon-oxygen bonds and silicon-carbon bonds exist in the molecular structure of the silicon carbon resin, so that the hardness, high temperature resistance and various other chemical medium resistance characteristics similar to those of glass can be realized. The high-temperature sintering is not needed in the film forming process, and the high-reflection coating with good adhesive force, high hardness up to 5H and good ultraviolet aging resistance can be obtained only by curing at 150-250 ℃. Therefore, the toughening degree of the photovoltaic glass is not influenced, the impact resistance of the photovoltaic toughened glass is not influenced, the impact resistance is different from that of the original toughened glass, and the problem that the photovoltaic glazed glass is easy to break is solved. And the silicon carbon resin has few metal impurities, avoids the influence of alkali metals such as sodium and potassium, and has excellent weather resistance and PID resistance.

The present application has been described in detail with reference to the embodiments, but the present application is not limited to the embodiments described above, and various changes can be made within the knowledge of one of ordinary skill in the art without departing from the spirit of the present application. Furthermore, embodiments of the present application and features of the embodiments may be combined with each other without conflict.

Claims

1. The sintering-free high-reflection photovoltaic glass glaze is characterized in that raw materials of the sintering-free high-reflection photovoltaic glass glaze comprise silicon carbon resin, titanium dioxide, an auxiliary agent and a solvent.

2. The sinter-free highly reflective photovoltaic glass frit according to claim 1, wherein the auxiliary agent comprises at least one of a thickener and a dispersant.

3. The sinter-free highly reflective photovoltaic glass frit according to claim 2, wherein the thickener comprises at least one of fumed silica, polyurea, bentonite, celluloses, and/or the dispersant comprises a titanate coupling agent.

4. The sintering-free high-reflection photovoltaic glass frit according to claim 3, wherein the mass of the thickener is 0.5-1.5% of the total mass of the sintering-free high-reflection photovoltaic glass frit, and/or the mass of the dispersant is 1-2% of the mass of the titanium pigment.

5. The sintering-free high-reflection photovoltaic glass frit according to claim 1, wherein the mass of the titanium pigment is 50-150% of the mass of the silicon carbon resin.

6. The sintering-free high-reflection photovoltaic glass glaze according to claim 1, wherein the titanium white powder is rutile titanium white powder, and a coating layer is formed on the surface of the rutile titanium white powder, and the coating layer comprises at least one of silicon oxide and aluminum oxide.

7. The sinter-free highly reflective photovoltaic glass frit of claim 1, wherein the solvent comprises one of butyl acetate, propylene glycol methyl ether acetate, ethylene glycol butyl ether, diethylene glycol butyl ether, dipropylene glycol methyl ether, dipropylene glycol butyl ether.

8. The method for preparing the sintering-free high-reflection photovoltaic glass frit according to any one of claims 1 to 7, comprising the following steps:

9. Coated glass, characterized in that it comprises a glass substrate and a glazing layer on one side of the glass substrate, the glazing layer being formed from the sintering-free high-reflection photovoltaic glass frit according to any one of claims 1 to 7.

10. A photovoltaic module comprising the coated glass of claim 9.