CN117627989B - Pressure valve, control method thereof and computer readable storage medium - Google Patents
Pressure valve, control method thereof and computer readable storage medium Download PDFInfo
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Abstract
The invention relates to the technical field of pressure control valves, in particular to a pressure valve, a control method thereof and a computer readable storage medium, wherein the pressure valve comprises a self-learning module, a pressure PID controller, a position PID controller, a motor driving module, an actuator and a valve body; the position PID controller erroneously readjust the opening angle according to the position error of the opening angle of the valve body; the self-learning module collects the current pressure and the actual position of the opening angle of the valve body in real time, and calculates PID parameters for the pressure PID controller and the position PID controller by combining the current upstream flow sent by the upper computer. According to the invention, the PD proportional coefficient of the pressure PID controller and the PI proportional coefficient of the position PID controller are determined in real time through the self-learning module, the pressure valve can keep the stable valve body operating at a proper opening angle without a special learning process, and the control of the product quality in the production link is improved.
Description
Technical Field
The invention relates to the technical field of pressure control valves, in particular to a pressure valve, a control method thereof and a computer readable storage medium.
Background
In semiconductor manufacturing facilities, pressure valves are a very common type of equipment that are typically used in downstream pressure control systems to stabilize the gas pressure within a process chamber at a set point, the stabilization of the gas pressure having a direct relationship to the quality of the processed product.
Fig. 1 is a process chamber pressure control system of a semiconductor deposition apparatus in the prior art, and fig. 2 is a block diagram of a pressure valve 1 of a process chamber in the prior art; as shown in fig. 1 and 2, a typical pressure control system mainly comprises an upstream flow control valve 3, a process chamber 2, and a downstream pressure valve 1, wherein a certain flow of gas is injected into the process chamber 2 through the flow control valve 3, and the pressure valve 1 controls the flow of gas flowing out of the process chamber by controlling the opening of a valve body 10, thereby stabilizing the pressure of the gas in the process chamber. The pressure valve 1 generally consists of a valve body 10, an actuator 9 and a controller 4; the controller 4 controls the opening degree of the valve body 10 by an actuator according to the process chamber pressure signal provided by the external pressure sensor 12 and the set target pressure provided by the upper computer 13, thereby controlling the pressure of the chamber.
The process range of semiconductor equipment such as CVD and PVD technology is wide, and the pressure valve 1 is required to ensure stable working state and control precision in a wide range for different flow rates and pressures; because of the nonlinearity of the valve body 10 (typically a butterfly valve) in the pressure valve 1, sufficient linearity cannot be ensured over the entire operating range, so that a learning process is required for the conventional pressure valve 1, i.e., after the system is installed, or the process parameter set value is greatly changed, or the structural parameter of the valve body is changed during long-term operation, closed-loop control of the servo valve is unstable, and a special learning step is required to be performed, i.e., the controller is allowed to re-measure the characteristic parameters of the system in this state and re-select appropriate control parameters.
However, the present pressure valve 1 requires a long time, typically 20-60 minutes, and requires special technicians to complete the learning process, and during operation, quality control of the product is affected due to the fact that the structural parameters change to a process from unstable operation to relearning.
Disclosure of Invention
The invention aims to provide a pressure valve, a control method thereof and a computer readable storage medium, which can keep a stable valve body to operate under a proper opening angle without a special learning process, and improve the control of product quality in a production link.
In order to achieve the above purpose, the present invention provides the following technical solutions:
in a first aspect, an embodiment of the present invention provides a pressure valve, including: the self-learning device comprises a self-learning module, a pressure PID controller, a position PID controller, a motor driving module, an actuator and a valve body;
the self-learning module and the pressure PID controller are used for being connected to a pressure sensor, and the pressure sensor is used for measuring the current pressure in the process cavity of the semiconductor deposition equipment;
The self-learning module and the pressure PID controller are also used for being connected to an upper computer, and the upper computer calculates the pressure error in the current process cavity according to the target pressure and the current pressure which are set as required;
The pressure PID controller is used for calculating the position setting of the current valve opening angle according to the pressure error;
The actuator is connected to the valve body and is used for detecting the actual position of the opening angle of the valve body and calculating the position error of the opening angle according to the actual position and the position setting of the opening angle of the valve body;
The motor driving module is connected to the actuator, the position PID controller is connected to the self-learning module, the motor driving module and the actuator, and the position PID controller is used for readjusting the opening angle according to the position error of the opening angle of the valve body;
the self-learning module is connected to the pressure PID controller, the position PID controller and the actuator, and is used for collecting the actual positions of the current pressure and the opening angle of the valve body in real time and calculating proper PID parameters for the pressure PID controller and the position PID controller by combining the current upstream flow sent by the upper computer.
In an alternative embodiment, an encoder built in the actuator feeds back the actual position of the valve opening angle to the position PID controller and the self-learning module through an encoder interface.
In an alternative embodiment, the position PID controller adjusts the rotation speed of the motor arranged in the actuator through the motor driving module, so as to realize readjustment of the opening angle of the valve body.
In an alternative embodiment, the self-learning module calculates PID parameters for the pressure PID controller and the position PID controller using a Kalman filtering algorithm, comprising the steps of:
s1: initializing parameters;
S2: reading a current pressure value as an observation vector, and reading an actual position of an opening angle of the valve body and a current upstream flow as a control vector;
s3: predicting and updating according to a Kalman filtering algorithm to obtain a group of state vectors, wherein the state vectors comprise required conductance parameters, effective volume of a process cavity and pressure measurement hysteresis coefficients;
s4: and calculating control parameters required by the pressure PID controller and the position PID controller according to the conductance parameters, the effective volume of the process cavity and the pressure measurement hysteresis coefficient and by combining a system closed loop model.
In an alternative embodiment, the Kalman filtering algorithm is:
State vector ：
（1）
In the formula (1), the components are as follows,Process chamber pressure at k; a k、bk、ck is to dynamically determine the conductance parameters of the valve body by a Kalman filtering algorithm; /(I)The effective volume of the process cavity when k is the number; /(I)Hysteresis coefficients are measured for the pressure at k; /(I)A delayed pressure measurement at k;
Control vector ：
（2）
In the formula (2), the amino acid sequence of the compound,The actual position of the valve opening angle at k; /(I)Upstream flow at k;
Observation vector ：
（3）
State transition equation:
（4）
In the formula (4), the amino acid sequence of the compound, Is the conductance of the valve body under the target pressure, and the detail is shown in a formula (7); /(I)Is a control period;
The observation equation:
（5）。
in an alternative embodiment, the pressure PID controller is PD regulated and the position PID controller is PI regulated; the closed loop transfer function of the whole s domain of the system closed loop model is as follows:
（6）
（7）
In the formula (6), the amino acid sequence of the compound, Is the target pressure; /(I)PD proportionality coefficient of the pressure PID controller; /(I)PI proportional coefficient of the position PID controller; /(I)Is a conductance variation factor; /(I)Is the effective volume of the process cavity; s is a state space variable of the Laplace transform; /(I)PD differential time for the pressure PID controller; /(I)Measuring a hysteresis coefficient for the pressure;
in the formula (7), the amino acid sequence of the compound, Is the conductance of the valve body at the target pressure; a. b and c are conductance parameters of the valve body; /(I)Is the actual position of the opening angle of the valve body.
In an alternative embodiment, in S4, fetchAfter one pole of the system is eliminated, the closed loop transfer function of the s domain of the whole system can be simplified into:
（8）。
in an alternative embodiment, in S4, it is determined that ,/>Is of the formula:
（9）
In the formula (9), the amino acid sequence of the compound, For the desired free oscillation frequency,/>Is the desired damping coefficient.
In a second aspect, an embodiment of the present invention provides a control method of a pressure valve, the control method including:
measuring the current pressure in the process cavity of the semiconductor deposition equipment;
calculating a pressure error in the current process cavity according to the target pressure and the current pressure which are set as required;
Calculating the position setting of the current valve opening angle according to the pressure error;
Detecting the actual position of the opening angle of the valve body, and calculating the position error of the opening angle according to the actual position and the position setting of the opening angle of the valve body;
Readjusting the opening angle according to the position error of the opening angle of the valve body;
The actual positions of the current pressure and the opening angle of the valve body are collected in real time, and proper PID parameters are calculated for the pressure PID controller and the position PID controller by combining the current upstream flow sent by the upper computer.
The pressure valve and the control method thereof provided by the embodiment of the invention have the beneficial effects that:
1. the pressure valve can keep stable valve body operating under proper opening angle without special learning process, and control of product quality in production link is improved;
2. The self-learning process is completed without special technicians, the duration is short, and the quality of the controlled product can be stabilized.
In a third aspect, an embodiment of the present invention provides a computer-readable storage medium having stored thereon a computer program which, when executed by a processor, implements a control method as provided in the second aspect.
Drawings
FIG. 1 is a process chamber pressure control system of a prior art semiconductor deposition apparatus;
FIG. 2 is a block diagram of a prior art process chamber pressure valve;
FIG. 3 is a block diagram showing the overall structure of the pressure valve of the present invention;
FIG. 4 is a block diagram of a self-learning module according to the present invention;
FIG. 5 is a flowchart of the Kalman filtering algorithm according to the present invention;
FIG. 6 is a chart of conductance of the valve body of the present invention at different flow rates;
FIG. 7 is a graph of a pressure step response when the pressure valve is open after learning according to the conventional method of the prior art;
FIG. 8 is a graph of the pressure step response of the pressure valve after an increase in upstream flow based on the parameters of FIG. 7;
FIG. 9 is a response chart of the valve body after the pilot parameter is shifted based on the parameters of FIG. 8;
FIG. 10 is a graph of the pressure step response of a pressure valve opening and upstream flow increase using the self-learning module of the present invention.
The diagram is: 1-a pressure valve; 2-a process chamber; 3-a flow control valve; 4-a controller; 5-a self-learning module; a 51-Kalman filtering algorithm module; 52-a system closed loop model; 6-a pressure PID controller; 7-position PID controller; 8-a motor drive module; 9-an actuator; 10-a valve body; 11-encoder interface; 12-a pressure sensor; 13-upper computer.
Detailed Description
For the purpose of making the objects, technical solutions and advantages of the embodiments of the present invention more apparent, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention, and it is apparent that the described embodiments are some embodiments of the present invention, but not all embodiments of the present invention. The components of the embodiments of the present invention generally described and illustrated in the figures herein may be arranged and designed in a wide variety of different configurations.
Thus, the following detailed description of the embodiments of the invention, as presented in the figures, is not intended to limit the scope of the invention, as claimed, but is merely representative of selected embodiments of the invention. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
It should be noted that: like reference numerals and letters denote like items in the following figures, and thus once an item is defined in one figure, no further definition or explanation thereof is necessary in the following figures.
In the description of the present invention, it should be noted that, if the terms "upper", "lower", "inner", "outer", and the like indicate an azimuth or a positional relationship based on the azimuth or the positional relationship shown in the drawings, or the azimuth or the positional relationship in which the inventive product is conventionally put in use, it is merely for convenience of describing the present invention and simplifying the description, and it is not indicated or implied that the apparatus or element referred to must have a specific azimuth, be configured and operated in a specific azimuth, and thus it should not be construed as limiting the present invention.
Furthermore, the terms "first," "second," and the like, if any, are used merely for distinguishing between descriptions and not for indicating or implying a relative importance.
It should be noted that the features of the embodiments of the present invention may be combined with each other without conflict.
As shown in fig. 3 and fig. 4, an embodiment of the present invention provides a pressure valve, and mainly relates to a self-learning pressure control servo valve. The pressure valve comprises a self-learning module 5, a pressure PID controller 6, a position PID controller 7, a motor driving module 8, an actuator 9 and a valve body 10.
Wherein the self-learning module 5 and the pressure PID controller 6 are adapted to be connected to a pressure sensor 12, the pressure sensor 12 being adapted to measure a current pressure within the process chamber 2 of the semiconductor deposition apparatus.
The self-learning module 5 and the pressure PID controller 6 are also connected to an upper computer 13, and the upper computer 13 is used for calculating the pressure error in the current process cavity 2 according to the target pressure and the current pressure set as required.
The pressure PID controller 6 is used for calculating the position setting of the current valve opening angle according to the pressure error.
The actuator 9 is connected to the valve body 10, and the actuator 9 is used for detecting the actual position of the opening angle of the valve body, and calculating the position error of the opening angle according to the actual position and the position setting of the opening angle of the valve body.
The position PID controller 7 is connected to the self-learning module 5, the motor driving module 8, the actuator 9, the position PID controller 7 being adapted to readjust the opening angle in dependence of the position error of the opening angle of the valve body.
The motor driving module 8 is connected to the actuator 9, the self-learning module 5 is connected to the pressure PID controller 6, the position PID controller 7 and the actuator 9, and the self-learning module 5 is used for collecting the current pressure and the actual position of the opening angle of the valve body in real time and calculating proper PID parameters for the pressure PID controller 6 and the position PID controller 7 by combining the current upstream flow sent by the upper computer 13.
Specifically, the encoder built in the actuator 9 feeds back the actual position of the opening angle of the valve body to the position PID controller 7 and the self-learning module 5 through the encoder interface 11. The position PID controller 7 adjusts the rotation speed of a motor arranged in the actuator 9 through the motor driving module 8, and readjusts the opening angle of the valve body. The actuator 9 in this embodiment corresponds to a combination of a motor and a position sensor for reading the current position of the opening angle of the valve body, and the position PID controller 7 controls the rotational speed of the motor to adjust the opening angle of the valve body. The operation principle of the actuator 9 belongs to the prior art and will not be described in detail here.
As shown in fig. 4, in this embodiment, the self-learning module 5 includes a Kalman filtering algorithm module 51 and a system closed-loop model 52, and the self-learning module 5 calculates suitable PID parameters for the pressure PID controller 6 and the position PID controller 7 by using the Kalman filtering algorithm, as shown in fig. 5, and includes the following steps:
s1: initializing parameters.
The Kalman filtering algorithm includes:
State vector ：
（1）
In the formula (1), the components are as follows,Process chamber pressure at k; /(I)The effective volume of the process cavity when k is the number; /(I)Hysteresis coefficients are measured for the pressure at k; /(I)A delayed pressure measurement at k; a k、bk、ck is to dynamically determine the conductance parameters of the valve body through a Kalman filtering algorithm, specifically, the conductance parameters are determined by adopting a conductance formula data fitting method, and a specific data fitting method adopts a least square method to fit the relation between the conductance of the valve body and the opening angle:
1. firstly, measuring the steady-state pressure of a process cavity at a certain flow under different opening angles; for example, obtaining m groups of data Wherein/>For the i-th opening angle,/>Is the ith pressure;
2. By the formula Obtain m groups of data/>Wherein C i is the ith conductance,/>Flow, p is pressure, C is conductance;
3. Assume that the relation between conductance and opening angle is:
in the method, in the process of the invention, For conductance C with respect to opening angle/>Is a function of (2);
4. For data Calculating a, b and c by adopting a least square method;
5. the fitting error is calculated to be small (toward zero), namely, the fitting is considered to be successful.
The method is used for confirming the correctness of the relation between the opening angle and the conductance of the conductance formula in description; after the correctness is confirmed, the conductance parameter a k、bk、ck of the valve body is dynamically determined through a Kalman filtering algorithm.
Control vector：
（2）
In the formula (2), the amino acid sequence of the compound,The actual position of the valve opening angle at k; /(I)Upstream flow at k;
Observation vector ：
（3）
State transition equation:
（4）
In the formula (4), the amino acid sequence of the compound, Is the conductance of the valve body 10 under the target pressure, and is shown in a formula (7) in detail; /(I)Is a control period;
The observation equation:
（5）
In a specific embodiment, as shown in fig. 5, parameters such as each matrix, state vector, control vector and the like in the Kalman filtering algorithm are initialized, and specifically, the parameters a, b, c, V and the like required in the Kalman filtering algorithm can be solved by formulas (1) - (5).
S2: the current pressure value is read as an observation vector, and the actual position of the opening angle of the valve body and the current upstream flow are read as control vectors.
In a specific embodiment, the current pressure value is read in as an observation vector; Reading the actual position of the opening angle of the valve body and the upstream flow as control vectors/>。
S3: and predicting and updating according to a Kalman filtering algorithm to obtain a group of state vectors, wherein the state vectors comprise required conductance parameters, effective volume of a process cavity and pressure measurement hysteresis coefficients.
In a particular embodiment, the update is predicted according to a Kalman filtering algorithm to obtain a set of state vectors; This state vector/>The required conductance parameters a, b and c are included; effective volume of process chamber/>Pressure measurement hysteresis coefficient/>。
S4: and according to the conductance parameters, the effective volume of the process cavity and the pressure measurement hysteresis coefficient, and combining the closed-loop model 52 of the system, calculating the control parameters required by the pressure PID controller 6 and the position PID controller 7.
In a specific embodiment, in S4, the pressure PID controller 6 employs PD regulation and the position PID controller 7 employs PI regulation; the closed loop transfer function of the entire s-domain of the system closed loop model 52 includes:
（6）
（7）
In the formula (6), the amino acid sequence of the compound, Is the target pressure; /(I)PD scaling factor for the pressure PID controller 6; /(I)PI scaling factor for the position PID controller 7; /(I)Is a conductance variation factor; /(I)Is the effective volume of the process cavity; s is a state space variable of the Laplace transform; /(I)PD derivative time for the pressure PID controller 6; /(I)Measuring a hysteresis coefficient for the pressure;
As shown in fig. 6, the conductance of the valve body 10 at different flow rates; wherein: the abscissa is the opening angle, the ordinate is the conductance, wherein Mark points are actual measurement values, a curve is drawn according to a fitting value of a formula, in the formula (7), Is the conductance of the valve body 10 at the target pressure; a. b and c are conductance parameters of the valve body; /(I)Is the actual position of the opening angle of the valve body.
In the formula (6), takeAfter one pole of the system is eliminated, the closed loop transfer function of the s domain of the whole system can be simplified into:
（8）
Determination of ,/>Is of the formula:
（9）
In the formula (9), the amino acid sequence of the compound, For the desired free oscillation frequency,/>Is the desired damping coefficient.
The K p、Kp2 determined in the formula (9) is respectively used as the PD proportionality coefficient of the pressure PID controller 6 and the PI proportionality coefficient of the position PID controller 7, the pressure valve does not need to carry out a special learning process, after the pressure valve is installed for the first time, the PD proportionality coefficient of the pressure PID controller 6 and the PI proportionality coefficient of the position PID controller 7 can be stabilized by only setting the target pressure through the upper computer 13 and starting for a plurality of times, namely, PID parameters can be solved through the formulas (6), (8) and (9), and in the long-time operation process, the stable valve body 10 can be kept to operate under a proper opening angle without repeated learning, so that the control of the product quality in the production link is improved.
The results of the simulation performed using the computer are shown in the following figures:
FIG. 7 is a graph showing a pressure step response when the pressure valve is opened after learning according to the conventional method of the prior art; the response speed and steady-state error at this time became stable after learning for 2 seconds.
As shown in fig. 8, oscillations occur at steady state when upstream flow increases without re-learning.
As shown in fig. 9, the response chart after the pilot parameter of the valve body 10 shifts is shown, and at this time, the response speed becomes slow and the steady-state error becomes large.
Both cases of fig. 8 and 9 will tend to plateau in response after relearning.
As shown in fig. 10, when the self-learning module 5 of the present invention is employed, the open step response of the pressure valve can always be maintained in a good state in both cases.
The embodiment also provides a control method of the pressure valve, which comprises the following steps:
Measuring the current pressure in the process chamber 2 of the semiconductor deposition equipment;
Calculating a pressure error in the current process cavity 2 according to the target pressure and the current pressure which are set as required;
Calculating the position setting of the current valve opening angle according to the pressure error;
Detecting the actual position of the opening angle of the valve body, and calculating the position error of the opening angle according to the actual position and the position setting of the opening angle of the valve body;
Readjusting the opening angle according to the position error of the opening angle of the valve body;
The actual positions of the current pressure and the opening angle of the valve body are acquired in real time, and the current upstream flow sent by the upper computer 13 is combined to calculate proper PID parameters for the pressure PID controller 6 and the position PID controller 7.
For specific execution of the control method, reference is made to the working process of the pressure valve.
The present embodiment also provides a computer-readable storage medium having stored thereon a computer program which, when executed by a processor, implements the above-described control method.
In the embodiments provided in the present application, it should be understood that the disclosed apparatus and method may be implemented in other manners. The apparatus embodiments described above are merely illustrative, for example, of the flowcharts and block diagrams in the figures that illustrate the architecture, functionality, and operation of possible implementations of apparatus, methods and computer program products according to embodiments of the present application. In this regard, each block in the flowchart or block diagrams may represent a module, segment, or portion of code, which comprises one or more executable instructions for implementing the specified logical function(s).
It should also be noted that in some alternative implementations, the functions noted in the block may occur out of the order noted in the figures. For example, two blocks shown in succession may, in fact, be executed substantially concurrently, or the blocks may sometimes be executed in the reverse order, depending upon the functionality involved.
It will also be noted that each block of the block diagrams and/or flowchart illustration, and combinations of blocks in the block diagrams and/or flowchart illustration, can be implemented by special purpose hardware-based systems which perform the specified functions or acts, or combinations of special purpose hardware and computer instructions.
In addition, each functional module in the embodiment of the present application may be integrated together to form a separate part, or each module may exist alone, or two or more modules may be integrated to form a separate part.
The functions, if implemented in the form of software functional modules and sold or used as a stand-alone product, may be stored in a computer-readable storage medium. Based on this understanding, the technical solution of the present application may be embodied essentially or in a part contributing to the prior art or in a part of the technical solution, in the form of a software product stored in a storage medium, comprising several instructions for causing a computer device (which may be a personal computer, a server, a network device, etc.) to perform all or part of the steps of the method according to the embodiment of the present application. And the aforementioned storage medium includes: various media capable of storing program codes, such as a U disk, a mobile hard disk, a read-only memory, a random access memory, a magnetic disk or an optical disk.
The present invention is not limited to the above embodiments, and any changes or substitutions that can be easily understood by those skilled in the art within the technical scope of the present invention are intended to be included in the scope of the present invention. Therefore, the protection scope of the invention is subject to the protection scope of the claims.
Claims (8)
1. A pressure valve, the pressure valve comprising: the self-learning device comprises a self-learning module (5), a pressure PID controller (6), a position PID controller (7), a motor driving module (8), an actuator (9) and a valve body (10);
the self-learning module (5) and the pressure PID controller (6) are used for being connected to a pressure sensor (12), and the pressure sensor (12) is used for measuring the current pressure in a process cavity of the semiconductor deposition equipment;
the self-learning module (5) and the pressure PID controller (6) are also connected to an upper computer (13), and the upper computer (13) calculates the pressure error in the current process cavity (2) according to the target pressure and the current pressure set as required;
The pressure PID controller (6) is used for calculating the current position setting of the opening angle of the valve body according to the pressure error;
The actuator (9) is connected to the valve body (10), the actuator (9) is used for detecting the actual position of the valve body opening angle, calculating the position error of the opening angle according to the actual position and the position setting of the valve body opening angle, and feeding back the actual position of the valve body opening angle to the position PID controller (7) and the self-learning module (5);
The motor driving module (8) is connected to the actuator (9), the position PID controller (7) is connected to the self-learning module (5) and the motor driving module (8) and is connected to the actuator (9), and the position PID controller (7) is used for adjusting the motor rotating speed built in the actuator (9) through the motor driving module (8) according to the position error of the valve opening angle so as to realize readjustment of the valve opening angle;
The self-learning module (5) is connected to the pressure PID controller (6) and the position PID controller (7) and is connected to the actuator (9), and the self-learning module (5) is used for collecting the actual positions of the current pressure and the opening angle of the valve body in real time and calculating PID parameters for the pressure PID controller (6) and the position PID controller (7) by combining the current upstream flow sent by the upper computer (13);
The self-learning module (5) adopts a Kalman filtering algorithm to calculate PID parameters for the pressure PID controller (6) and the position PID controller (7), and the self-learning module (5) adopts the Kalman filtering algorithm to calculate PID parameters, and the method comprises the following steps:
s1: initializing parameters;
S2: reading a current pressure value as an observation vector, and reading an actual position of an opening angle of the valve body and a current upstream flow as a control vector;
S3: predicting and updating according to a Kalman filtering algorithm to obtain a group of state vectors, wherein the state vectors comprise required conductance parameters, effective volume of a process cavity and pressure measurement hysteresis coefficients;
s4: according to the conductance parameters, the effective volume of the process cavity and the pressure measurement hysteresis coefficient, and by combining a system closed loop model (52), the control parameters required by the pressure PID controller (6) and the position PID controller (7) are calculated.
2. The pressure valve of claim 1, wherein the Kalman filtering algorithm comprises:
State vector ：
（1）
In the formula (1), the components are as follows,Process chamber pressure at k; a k、bk、ck is to dynamically determine the conductance parameters of the valve body by a Kalman filtering algorithm; /(I)The effective volume of the process cavity when k is the number; /(I)Hysteresis coefficients are measured for the pressure at k; /(I)A delayed pressure measurement at k;
Control vector ：
（2）
In the formula (2), the amino acid sequence of the compound,The actual position of the valve opening angle at k; /(I)Upstream flow at k;
Observation vector ：
（3）
State transition equation:
（4）
In the formula (4), the amino acid sequence of the compound, Is the conductance of the valve body (10) at the target pressure; /(I)Is a control period;
The observation equation:
（5）。
3. A pressure valve according to claim 2, characterized in that in S4 the pressure PID controller (6) is PD regulated and the position PID controller (7) is PI regulated; the closed loop transfer function of the entire s-domain of the system closed loop model (52) includes:
（6）
（7）
In the formula (6), the amino acid sequence of the compound, Is the target pressure; /(I)PD proportionality coefficient of the pressure PID controller (6); /(I)PI proportionality coefficient for position PID controller (7); /(I)Is a conductance variation factor; /(I)Is the effective volume of the process cavity; s is a state space variable of the Laplace transform; /(I)PD differential time for the pressure PID controller (6); /(I)Measuring a hysteresis coefficient for the pressure;
in the formula (7), the amino acid sequence of the compound, Is the conductance of the valve body (10) at the target pressure; a. b and c are conductance parameters of the valve body; /(I)Is the actual position of the opening angle of the valve body.
4. A pressure valve according to claim 3, wherein in S4After one pole of the system is eliminated, the closed loop transfer function of the s domain of the whole system is simplified into:
（8）
Determination of ,/>Is of the formula:
（9）
In the formula (9), the amino acid sequence of the compound, For the desired free oscillation frequency,/>Is the desired damping coefficient.
5. Pressure valve according to claim 1, characterized in that an encoder built-in to the actuator (9) feeds back the actual position of the valve body opening angle to the position PID controller (7) and the self-learning module (5) via an encoder interface (11).
6. A control method of a pressure valve, characterized in that the control method is for controlling the pressure valve according to claim 1, the control method comprising:
measuring the current pressure in the process cavity of the semiconductor deposition equipment;
calculating a pressure error in the current process cavity according to the target pressure and the current pressure which are set as required;
Calculating the position setting of the current valve opening angle according to the pressure error;
Detecting the actual position of the opening angle of the valve body, and calculating the position error of the opening angle according to the actual position and the position setting of the opening angle of the valve body;
according to the position error of the opening angle of the valve body, the motor driving module is used for adjusting the rotating speed of a motor arranged in an actuator, so that the readjustment of the opening angle of the valve body is realized;
The actual positions of the current pressure and the opening angle of the valve body are collected in real time, and the PID parameters are calculated for the pressure PID controller (6) and the position PID controller (7) by combining the current upstream flow sent by the upper computer (13).
7. The method of claim 6, wherein the calculating PID parameters employs a Kalman filtering algorithm.
8. A computer-readable storage medium, on which a computer program is stored, characterized in that the computer program, when being executed by a processor, implements the control method as claimed in claim 6.
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