CN117590705A - Exposure assembly, light alignment method, display panel and display device - Google Patents

Exposure assembly, light alignment method, display panel and display device Download PDF

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Publication number
CN117590705A
CN117590705A CN202311833642.5A CN202311833642A CN117590705A CN 117590705 A CN117590705 A CN 117590705A CN 202311833642 A CN202311833642 A CN 202311833642A CN 117590705 A CN117590705 A CN 117590705A
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CN
China
Prior art keywords
light
photo
mask assembly
alignment
transmitting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202311833642.5A
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Chinese (zh)
Inventor
张少平
雒斌
李梁梁
张荡
张聪
李凡
宋勇志
吴潘强
李林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BOE Technology Group Co Ltd
Chengdu BOE Display Technology Co Ltd
Original Assignee
BOE Technology Group Co Ltd
Chengdu BOE Display Technology Co Ltd
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Application filed by BOE Technology Group Co Ltd, Chengdu BOE Display Technology Co Ltd filed Critical BOE Technology Group Co Ltd
Priority to CN202311833642.5A priority Critical patent/CN117590705A/en
Publication of CN117590705A publication Critical patent/CN117590705A/en
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
    • G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70475—Stitching, i.e. connecting image fields to produce a device field, the field occupied by a device such as a memory chip, processor chip, CCD, flat panel display

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Liquid Crystal (AREA)

Abstract

The application discloses an exposure assembly, a light alignment method, a display panel and a display device, which are used for improving display uniformity. The exposure module includes: the first optical alignment mask assembly and the second optical alignment mask assembly; the first optical alignment mask assembly and the second optical alignment assembly comprise optical alignment mask plates; the photo-alignment mask plate comprises a light-transmitting pattern; the light-transmitting pattern comprises a light-transmitting area; the light-transmitting pattern is divided into a first part and a second part; the orthographic projections of the first part of the first photo-alignment mask assembly and the first part of the second photo-alignment mask assembly relative to the same exposure area are not overlapped with each other, and the orthographic projections of the second part of the first photo-alignment mask assembly and the second part of the second photo-alignment mask assembly relative to the same exposure area are overlapped with each other; in the first photo-alignment mask assembly, the lengths of a plurality of light transmission areas included in the second part in the first direction are increased and then reduced; in the second photo-alignment mask assembly, the lengths of the plurality of light-transmitting areas of the second part in the first direction are firstly reduced and then increased.

Description

Exposure assembly, light alignment method, display panel and display device
Technical Field
The application relates to the technical field of display, in particular to an exposure assembly, a light alignment method, a display panel and a display device.
Background
Currently, one common method for photoalignment of liquid crystal display panels is ultraviolet vertical alignment (Ultra Violet Vertical Alignment, UV) 2 A) Technique, UV 2 The technology A adopts ultraviolet light with a certain angle to carry out scanning alignment through a mask plate so as to irradiate the photo-alignment film layer, and the photo-alignment film layer carries out alignment reaction so as to lead liquid crystal molecules to be arranged at a certain included angle. However, UV 2 The size of the mask used in the technology A is smaller than the size of the liquid crystal display panel, so that a plurality of masks are needed to be spliced. In view of the light source irradiation range and the mask size, it is generally necessary to provide a repetitive exposure region, but the region corresponding to the repetitive exposure region often accompanies a display unevenness due to the repetitive exposure.
Disclosure of Invention
The embodiment of the application provides an exposure component, a light alignment method, a display panel and a display device, which are used for improving display uniformity.
The embodiment of the application provides an exposure module, exposure module includes: a first photo-alignment mask assembly and a second photo-alignment mask assembly;
The first optical alignment mask assembly and the second optical alignment assembly comprise a plurality of optical alignment mask plates; the photoalignment mask plate includes: a plurality of light-transmitting patterns arranged in a first direction;
the light-transmitting pattern includes: a plurality of light-transmitting areas arranged in a second direction; the second direction intersects the first direction; the light transmission pattern is divided into: a first portion, and second portions located on both sides of the first portion in a second direction, respectively;
the orthographic projections of the first part of the first photo-alignment mask assembly and the first part of the second photo-alignment mask assembly relative to the same exposure area are not overlapped with each other, and the orthographic projections of the second part of the first photo-alignment mask assembly and the second part of the second photo-alignment mask assembly relative to the same exposure area are overlapped with each other;
in the first photo-alignment mask assembly, the lengths of a plurality of light transmission areas included in the second part in the first direction are increased and then decreased at one side far away from the first part;
in the second photo-alignment mask assembly, the lengths of the plurality of light-transmitting areas of the second part in the first direction are firstly reduced and then increased at the side far away from the first part.
In some embodiments, the plurality of light-transmitting regions of the first portion are all equal in length in the first direction;
The light-transmitting region of the second portion has a length in the first direction that is less than a length of the light-transmitting region of the first portion in the first direction.
In some embodiments, the photo-alignment mask includes a plurality of light-transmitting regions having equal widths in the second direction;
the width of the light transmitting area of the first photo-alignment mask assembly in the second direction is equal to the width of the light transmitting area of the second photo-alignment mask assembly in the second direction.
In some embodiments, the light transmissive pattern further includes: a plurality of light shielding regions arranged in a second direction; the light transmission areas and the light shielding areas are alternately arranged;
the width of the light-transmitting area in the second direction is equal to the width of the light-shielding area in the second direction.
In some embodiments, the photoalignment mask plate includes: a first light-transmitting pattern and a second light-transmitting pattern arranged in a first direction;
the light shielding area of the first light transmission pattern and the light shielding area of the second light transmission pattern are not overlapped with each other relative to the orthographic projection of the same exposure area;
the orthographic projection of the light transmission area of the first light transmission pattern and the light transmission area of the second light transmission pattern relative to the same exposure area is not overlapped;
the light shielding region of the first light transmission pattern and the light shielding region of the second light transmission pattern are overlapped relative to the orthographic projection of the same exposure region, and the light shielding region of the first light transmission pattern and the light shielding region of the second light transmission pattern are overlapped relative to the orthographic projection of the same exposure region.
In some embodiments, the second portion comprises: a plurality of first light-transmitting regions, and a plurality of second light-transmitting regions located at one side of the plurality of first light-transmitting regions in the second direction;
in the direction that the first part points to the second part, the lengths of the first light-transmitting areas in the first direction are gradually increased, and the lengths of the second light-transmitting areas in the first direction are gradually reduced;
the exposure area comprises a plurality of repeated exposure areas, and the width of the repeated exposure areas is equal to that of the second part in the second direction;
with respect to the same repeated exposure area, the length of the orthographic projection of a plurality of first light transmission areas of the first photo-alignment mask assembly and the orthographic projection of a plurality of second light transmission areas of the second photo-alignment mask assembly in the first direction is gradually reduced or gradually increased;
the length of the first light transmitting areas of the first photo-alignment mask assembly is gradually reduced or gradually increased relative to the same repeated exposure area.
In some embodiments, in the second portion, a line of one end of the plurality of first light-transmitting regions extending in the first direction corresponds to a first curve, a line of the other end of the plurality of first light-transmitting regions extending in the first direction corresponds to a second curve, a line of one end of the plurality of second light-transmitting regions extending in the first direction corresponds to a third curve, and a line of the other end of the plurality of second light-transmitting regions extending in the first direction corresponds to a fourth curve;
The first curve, the second curve, the third curve and the fourth curve are all y=sin 2 An x curve.
In some embodiments, in the light-transmitting pattern, the second portions located at two sides of the first portion are respectively: a positive second portion located on one side of the first portion in a positive direction in the second direction, and a negative second portion located on one side of the first portion in a negative direction in the second direction;
the positive second part of the first photo-alignment mask assembly overlaps the negative second part of the second photo-alignment mask assembly with respect to the positive projection of the same exposure area; the negative second portion of the first photo-alignment mask assembly overlaps the positive second portion of the second photo-alignment mask assembly with respect to a positive projection of the same exposure field.
The optical alignment method provided by the embodiment of the application comprises the following steps:
providing a substrate to be aligned and an exposure assembly provided by the embodiment of the application;
and carrying out optical alignment on the substrate to be aligned by using the first optical alignment mask assembly and the second optical alignment mask assembly of the exposure assembly respectively.
In some embodiments, the photo-alignment mask plate of the first photo-alignment mask assembly and the second photo-alignment mask assembly comprises a first light-transmission pattern and a second light-transmission pattern; the first photo-alignment mask assembly and the second photo-alignment mask assembly are used for photo-alignment of the substrate to be aligned respectively, and the method specifically comprises the following steps:
Controlling the light alignment light source to scan the substrate to be aligned along a first scanning direction by using the first light transmission pattern of the first light alignment mask assembly and the first light transmission pattern of the second light alignment mask assembly respectively;
controlling the light alignment light source to scan the substrate to be aligned along a second scanning direction by using the second light transmission pattern of the first light alignment mask assembly and the second light transmission pattern of the second light alignment mask assembly respectively; the second scanning direction is opposite to the first scanning direction.
In some embodiments, the first photo-alignment mask assembly and the second photo-alignment mask assembly are used to photo-align the substrate to be aligned respectively, and specifically include:
and for each light-transmitting pattern, sequentially using the first photo-alignment mask assembly and the second photo-alignment mask assembly to carry out photo-alignment on the substrate to be aligned.
In some embodiments, the first photo-alignment mask assembly and the second photo-alignment mask assembly are used to photo-align the substrate to be aligned respectively, and specifically include:
and for each light-transmitting pattern, sequentially using the second photo-alignment mask assembly and the first photo-alignment mask assembly to carry out photo-alignment on the substrate to be aligned.
The embodiment of the application provides a kind of display panel, display panel includes: an array substrate and an opposite substrate which are oppositely arranged, and a liquid crystal layer positioned between the array substrate and the opposite substrate; the array substrate comprises an alignment film layer, and/or the opposite substrate comprises an alignment film layer;
The optical alignment method provided by the embodiment of the application is adopted to carry out optical alignment on the alignment film layer of the array substrate and/or the alignment film layer of the opposite substrate.
In some embodiments, the counter substrate includes a common electrode.
The display device provided by the embodiment of the application comprises the display panel provided by the embodiment of the application.
In the exposure assembly, the light alignment method, the display panel and the display device provided by the embodiment of the application, the length of a plurality of light transmission areas included in the second part of the first light alignment mask plate in the first direction Y is firstly increased and then decreased, the length of a plurality of light transmission areas included in the second part of the second light alignment mask plate in the first direction Y is firstly decreased and then increased, namely, the length change trend of the light transmission areas of the second part included in the first light alignment assembly is different from the length change trend of the light transmission areas of the second part included in the second light alignment assembly, and the light transmission patterns of the light alignment mask plate included in the first light alignment assembly are different from the light transmission patterns of the light alignment mask plate included in the second light alignment assembly. Compared with the arrangement mode that the light transmission patterns of the photo-alignment mask plates subjected to the multiple exposure in the related art are the same, and the lengths of the multiple light transmission areas of the second part in the first direction Y are gradually reduced, the lengths of the multiple light transmission areas of the second part of the first photo-alignment mask plate and the second photo-alignment mask plate in the first direction are not regularly changed any more, the exposure of the second part of the first photo-alignment mask plate and the second photo-alignment mask plate is not regularly changed any more, the problem that the brightness unevenness of display products occurs in the corresponding area of the second part due to the larger difference of the exposure of the second part can be relieved, and the brightness uniformity of the display panel can be improved.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings that are needed in the description of the embodiments will be briefly described below, it being obvious that the drawings in the following description are only some embodiments of the present application, and that other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.
Fig. 1 is a schematic structural diagram of a photoalignment mask provided in the related art;
FIG. 2 is a schematic diagram of an exposure module according to an embodiment of the present disclosure;
FIG. 3 is an enlarged schematic view of the region G in FIG. 2 according to an embodiment of the present application;
fig. 4 is a schematic structural diagram of a photoalignment mask provided in an embodiment of the present application;
fig. 5 is a schematic structural diagram of another photoalignment mask provided in an embodiment of the present application;
FIG. 6 is a schematic diagram of another exposure module according to an embodiment of the present disclosure;
fig. 7 is a schematic structural diagram of another photoalignment mask provided in an embodiment of the present application;
fig. 8 is a schematic flow chart of photoalignment amplification according to an embodiment of the present application;
fig. 9 is a schematic structural diagram of a display panel according to an embodiment of the present disclosure;
Fig. 10 is a schematic structural diagram of a display device according to an embodiment of the present application.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present application more clear, the technical solutions of the embodiments of the present application will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present application. It will be apparent that the described embodiments are some, but not all, of the embodiments of the present application. And embodiments and features of embodiments in this application may be combined with each other without conflict. All other embodiments, which can be made by one of ordinary skill in the art without the benefit of the present disclosure, are intended to be within the scope of the present application based on the described embodiments.
Unless otherwise defined, technical or scientific terms used herein should be given the ordinary meaning as understood by one of ordinary skill in the art to which this application belongs. The terms "first," "second," and the like, as used herein, do not denote any order, quantity, or importance, but rather are used to distinguish one element from another. The word "comprising" or "comprises", and the like, means that elements or items preceding the word are included in the element or item listed after the word and equivalents thereof, but does not exclude other elements or items. The terms "connected" or "connected," and the like, are not limited to physical or mechanical connections, but may include electrical connections, whether direct or indirect.
It should be noted that the dimensions and shapes of the various figures in the drawings do not reflect true proportions, and are intended to illustrate the present application only. And the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout.
In the related art, when the photoalignment mask plate is used for performing the multiple exposure, the two groups of photoalignment mask plates subjected to the multiple exposure have overlapping areas in the orthographic projection of the substrate to be exposed, and the areas are repeated exposure areas. As shown in fig. 1, the photoalignment mask plate comprises a light transmission pattern 1, wherein the light transmission pattern 1 comprises a first part 2 and a second part 3; the second portion 3 corresponds to the repeated exposure area a; the first portion 2 and the second portion 3 each comprise a plurality of light-transmitting areas 101. The light transmission patterns of the two groups of light alignment masks subjected to the split exposure are identical, so that the problem that the display brightness of the repeated exposure area A is brighter due to the fact that the areas of the light transmission patterns are identical is avoided, and the lengths of a plurality of light transmission areas 101 of the second part 3 are gradually reduced in the direction that the first part 2 points to the second part 3. That is, in the repeated exposure area a, the lengths of the plurality of light transmitting areas 101 of the second portion 3 of one of the two photo-alignment masks gradually decrease and the lengths of the plurality of light transmitting areas 101 of the second portion 3 of the other photo-alignment mask gradually increase in the left-to-right direction. However, for the photo-alignment mask plate subjected to exposure first, the exposure corresponding to the light-transmitting region with a larger length in the second part is larger, and the brightness of the sub-pixel corresponding to the region is brighter; the light-transmitting area with smaller length in the second part corresponds to smaller exposure, and the brightness of the sub-pixels in the area is dark. That is, in the repetitive exposure region, there is still a problem of uneven display brightness due to uneven exposure amount.
The embodiment of the application provides an exposure module, as shown in fig. 2 to 6, the exposure module includes: a first photo-alignment mask assembly 5 and a second photo-alignment mask assembly 6;
the first optical alignment mask assembly 5 and the second optical alignment assembly comprise a plurality of optical alignment masks 4; for convenience of distinction, the photo-alignment mask plate 4 included in the first photo-alignment mask assembly 5 is referred to as a first photo-alignment mask plate 401, and the photo-alignment mask plate 4 included in the second photo-alignment mask assembly 6 is referred to as a second photo-alignment mask plate 402;
the photoalignment mask plate 4 includes: a plurality of light-transmitting patterns 1 arranged in a first direction Y; the light alignment scanning directions of different types of light transmission patterns 1 are different;
the light-transmitting pattern 1 includes: a plurality of light-transmitting areas 101 arranged in the second direction X; the second direction X intersects the first direction Y; the light-transmitting pattern 1 is divided into: a first portion 2, and second portions 3 located on both sides of the first portion 2 in a second direction X, respectively;
the orthographic projections of the first part 2 of the first photo-alignment mask assembly and the first part 2 of the second photo-alignment mask assembly 6 relative to the same exposure area 1001 are not overlapped with each other, and the orthographic projections of the second part 3 of the first photo-alignment mask assembly 5 and the second part 3 of the second photo-alignment mask assembly 6 relative to the same exposure area 1001 are overlapped with each other;
In the first photoalignment mask assembly 5, on the side far away from the first portion 2, the lengths of a plurality of light-transmitting areas 101 included in the second portion 3 in the first direction Y are increased and then decreased; namely, in the first photoalignment mask 401, the lengths of the plurality of light-transmitting areas 101 included in the second portion 3 at the side far from the first portion 2 are increased and then decreased in the first direction Y;
in the second photoalignment mask assembly 6, on the side far from the first part 2, the lengths of the plurality of light transmission areas 101 of the second part 3 in the first direction Y are firstly reduced and then increased; that is, in the second photoalignment mask 402, the lengths of the plurality of light-transmitting regions 101 included in the second portion 3 at the side away from the first portion 2 decrease first and then increase in the first direction Y.
It should be noted that the exposure module provided in the embodiments of the present application can be used for ultraviolet vertical alignment (Ultra Violet Vertical Alignment, UV 2 A) Photoalignment techniques. By UV 2 When the a technology performs optical alignment on a liquid crystal display panel, the size of a single optical alignment mask plate is generally smaller than that of the liquid crystal display panel, alignment is performed on the liquid crystal display panel, the first optical alignment assembly and the second optical alignment assembly comprising a plurality of optical alignment mask plates are required to be subjected to split exposure, and in consideration of the irradiation range of an exposure light source and the size of the optical alignment mask plate, a single exposure area and a repeated exposure area exist on a substrate on which alignment is required to be performed on the liquid crystal display panel, and the repeated exposure area performs double exposure through the optical alignment mask plates positioned in different optical alignment mask assemblies.
According to the exposure component provided by the embodiment of the application, on one side far away from the first part, the lengths of a plurality of light transmission areas included in the second part of the first light alignment mask plate in the first direction Y are firstly increased and then decreased, the lengths of a plurality of light transmission areas included in the second part of the second light alignment mask plate in the first direction Y are firstly decreased and then increased, namely, the length change trend of the light transmission areas of the second part included in the first light alignment component is different from that of the light transmission areas of the second part included in the second light alignment component, and the light transmission patterns of the light alignment mask plate included in the first light alignment component are different from that of the light alignment mask plate included in the second light alignment component. Compared with the arrangement mode that the light transmission patterns of the photo-alignment mask plates subjected to the multiple exposure in the related art are the same, and the lengths of the multiple light transmission areas of the second part in the first direction Y are gradually reduced, the lengths of the multiple light transmission areas of the second part of the first photo-alignment mask plate and the second photo-alignment mask plate in the first direction are not regularly changed any more, the exposure of the second part of the first photo-alignment mask plate and the second photo-alignment mask plate is not regularly changed any more, the problem that the brightness unevenness of display products occurs in the corresponding area of the second part due to the larger difference of the exposure of the second part can be relieved, and the brightness uniformity of the display panel can be improved.
In fig. 2, the second photoalignment component 6 is located above the first photoalignment component 5, and the orthographic projection relationship between the second photoalignment component and the substrate to be exposed when the second photoalignment component and the substrate to be exposed are used for exposing the substrate to be exposed is illustrated. In fact, in the process of exposing the substrate to be exposed by using the exposure module provided in the embodiment of the present application, the first optical alignment module and the second optical alignment module are required to be used for exposure in several times. Fig. 3 is an enlarged schematic view of the region G in fig. 2. Fig. 4 is a schematic structural diagram of a first photoalignment mask plate 4, that is, a first photoalignment mask plate 401, included in the first photoalignment assembly, and fig. 5 is a schematic structural diagram of a second photoalignment mask plate 4, that is, a second photoalignment mask plate 402, included in the second photoalignment assembly. Fig. 6 is a schematic diagram of a partial region of the first photo-alignment mask 401 and a partial region of the second photo-alignment mask 402.
In some embodiments, as shown in fig. 2, the plurality of photo-alignment masks 4 included in the first photo-alignment mask assembly 5 are sequentially arranged along the second direction X; the distance between any adjacent photo-alignment masks 4 in the first photo-alignment mask assembly 5 is larger than 0;
the second photo-alignment mask assembly 6 comprises a plurality of photo-alignment masks 4 which are sequentially arranged along the second direction X; the distance between any adjacent photo-alignment masks 4 in the second photo-alignment mask assembly 6 is larger than 0.
In some embodiments, as shown in fig. 2, when the exposure component provided in the embodiments of the present application is used to expose the substrate 10 to be aligned, the substrate 10 to be aligned is divided into an exposure area 1001 and a non-exposure area 1002 located outside the exposure area 1001. The exposure region 1001 of the substrate 10 to be aligned includes a plurality of single exposure regions B and a plurality of repeated exposure regions a. The photoalignment mask plate 4 includes: a first region 4-1, a second region 4-2 located at both sides of the first region 4-1, and a third region 4-3 located at a side of the second region 4-2 remote from the first region 4-1, respectively; the first region 4-1 includes a first portion (not shown) of the light-transmitting pattern, and the second region 4-2 includes a second portion (not shown) of the light-transmitting pattern; the third area 4-3 is an edge area of the photoalignment mask plate 4, and does not comprise a light transmission pattern; the orthographic projection of the first area 4-1 in the exposure area 1001 corresponds to a single exposure area B, the orthographic projection of the second area 4-2 on one side of the optical alignment mask plate 4 positioned at the edge on the substrate 10 to be aligned falls into a non-exposure area 1002, and the orthographic projection of the other second areas 4-2 in the exposure area 1001 corresponds to a repeated exposure area A; in the second direction X, the width of the first area 4-1 is equal to that of the single exposure area B, and the width of the second area 4-2 is equal to that of the repeated exposure area A; the orthographic projection of the second region 4-2 of the photo-alignment mask plate 4 in the first photo-alignment mask assembly 5 in the exposure region 1001 overlaps with the orthographic projection of the second region 4-2 of the photo-alignment mask plate 4 in the second photo-alignment mask assembly 6 in the exposure region 1001, that is, the second portion 3 of the first photo-alignment mask assembly 5 overlaps with the orthographic projection of the second portion 3 of the second photo-alignment mask assembly 6 with respect to the same exposure region 1001; the orthographic projection of the first region 4-1 of the photo-alignment mask plate 4 in the first photo-alignment mask assembly 5 in the exposure region 1001 and the orthographic projection of the first region 4-1 of the photo-alignment mask plate 4 in the second photo-alignment mask assembly 6 in the exposure region 1001 are not overlapped, that is, the orthographic projections of the first portion 2 of the first photo-alignment mask assembly and the first portion 2 of the second photo-alignment mask assembly 6 relative to the same exposure region 1001 are not overlapped.
When the method is implemented, the number of the photo-alignment masks included in the first photo-alignment mask assembly and the number of the photo-alignment masks included in the second photo-alignment mask assembly can be set specifically according to the size of the photo-alignment masks and the size of the substrate to be aligned.
In some embodiments, as shown in fig. 6, the lengths h1 of the plurality of light-transmitting regions 101 of the first portion 2 in the first direction Y are equal;
the length h2 of the light-transmitting region 101 of the second portion 3 in the first direction Y is smaller than the length h1 of the light-transmitting region 101 of the first portion 2 in the first direction Y.
In the exposure component provided by the embodiment of the application, the length of the light-transmitting area of the second part corresponding to the repeated exposure area in the first direction is smaller than that of the light-transmitting area of the first part corresponding to the single exposure area in the first direction, so that the difference of exposure amounts of the repeated exposure area and the single exposure area can be reduced, the difference of brightness of the repeated exposure area and the single exposure area is avoided, and the display uniformity is improved.
In some embodiments, as shown in fig. 6, the photo-alignment mask 4 includes a plurality of light-transmitting regions 101 with equal widths h3 in the second direction X;
the width h3 of the light transmitting region 101 of the first photo-alignment mask assembly 5 in the second direction X is equal to the width h3 of the light transmitting region 101 of the second photo-alignment mask assembly 6 in the second direction X.
In some embodiments, as shown in fig. 6, the light transmissive pattern 1 further includes: a plurality of light shielding regions 102 arranged in the second direction X; the light-transmitting areas 101 and the light-shielding areas 102 are alternately arranged;
the width h3 of the light transmitting region 101 in the second direction X is equal to the width h4 of the light shielding region 102 in the second direction X.
UV 2 The technology A adopts ultraviolet light with a certain angle to carry out scanning alignment through a mask plate so as to irradiate the photo-alignment film layer of the display panel, and the photo-alignment film layer carries out alignment reaction so as to lead liquid crystal molecules to form a certain included angle arrangement. The display panel includes a plurality of sub-pixels (the sub-pixels may be defined by intersections of gate lines extending in a row direction and data lines extending in a column direction included in the display panel), each of which may include different domains, and the liquid crystal molecule angles of the different domains are different. In specific implementation, the optical alignment mask plate can be arrangedDifferent types of light transmission patterns are arranged, so that the light alignment scanning directions of the different types of light transmission patterns are different, and each sub-pixel comprises different domains.
In some embodiments, as shown in fig. 4 and 5, the photoalignment mask 4 includes: the first light-transmitting pattern 1 and the second light-transmitting pattern 1 are arranged in the first direction Y. The photoalignment scanning directions of the first light-transmitting pattern 1 and the second light-transmitting pattern 1 are opposite.
In some embodiments, as shown in fig. 7, the front projections of the light-shielding region 102 of the first light-transmitting pattern 1 and the light-shielding region 102 of the second light-transmitting pattern 1 with respect to the same exposure region 1001 do not overlap each other;
the light-transmitting area 101 of the first light-transmitting pattern 1 and the orthographic projection of the light-transmitting area 101 of the second light-transmitting pattern 1 with respect to the same exposure area 1001 do not overlap each other;
the light shielding region 102 of the first light transmission pattern 1 overlaps with the light transmitting region 101 of the second light transmission pattern 1 with respect to the orthographic projection of the same exposure region 1001, and the light transmitting region 101 of the first light transmission pattern 1 overlaps with the light shielding region 102 of the second light transmission pattern 1 with respect to the orthographic projection of the same exposure region 1001.
In a specific implementation, when the photoalignment mask provided in the embodiments of the present application is applied to a photoalignment process of a liquid crystal display panel, as shown in fig. 7, a width h3 of the light-transmitting area 101 in the second direction X is equal to half of a width h5 of the sub-pixel 7 in the second direction X, and correspondingly, a width h4 of the light-shielding area 102 in the second direction X is also equal to half of a width h5 of the sub-pixel 7 in the second direction X, and a sum of widths of adjacent light-transmitting areas 101 and light-shielding areas 102 in the second direction X is equal to a width h5 of the sub-pixel 7 in the second direction X.
In some embodiments, as shown in fig. 7, the photoalignment mask plate includes two kinds of light-transmitting patterns 1, namely a first light-transmitting pattern 1-1 and a second light-transmitting pattern 1-2, wherein the photoalignment scanning directions of the two kinds of light-transmitting patterns 1 are opposite; and the light-transmitting region 101 of the first light-transmitting pattern 1-1 corresponds to the light-shielding region 102 of the second light-transmitting pattern 1-2, and the light-shielding region 102 of the first light-transmitting pattern 1-1 corresponds to the light-transmitting region 101 of the second light-transmitting pattern 1-2. Thus, in the second direction X, the light transmitting region 101 of the first light transmitting pattern 1-1 corresponds to one half of the sub-pixels 7, and the light transmitting region 101 of the second light transmitting pattern 1-2 corresponds to the other half of the sub-pixels 7. Thus, since the light-alignment scanning directions of the two light-transmitting patterns 1 are opposite, as shown in fig. 7, one half of the sub-pixels 7 corresponds to the light-alignment scanning direction Y1 of one light-transmitting pattern 1, and the other half of the sub-pixels 7 corresponds to the light-alignment scanning direction Y2 of the other light-transmitting pattern 1.
In some embodiments, as shown in fig. 6, the second portion 3 comprises: a plurality of first light-transmitting regions 101-1, and a plurality of second light-transmitting regions 101-2 located on one side of the plurality of first light-transmitting regions 101-1 in the second direction X;
in the direction in which the first portion 2 points to the second portion 3, the lengths of the plurality of first light-transmitting regions 101-1 in the first direction Y gradually increase, and the lengths of the plurality of second light-transmitting regions 101-2 in the first direction Y gradually decrease;
The exposure field 1011 includes a plurality of repeated exposure fields a, the width of which is equal to the width of the second portion 3 in the second direction X;
with respect to the same repeated exposure area a, the length of the orthographic projection of the plurality of first light-transmitting areas 101-1 of the first photo-alignment mask assembly 5 and the orthographic projection of the plurality of second light-transmitting areas 101-2 of the second photo-alignment mask assembly 6 in the first direction Y is gradually reduced or gradually increased; specifically, in fig. 6, the dashed area C includes a plurality of first light-transmitting areas 101-1 in the positive second portion 301 of the first photo-alignment mask assembly 5, the dashed area D includes a plurality of second light-transmitting areas 101-2 in the negative second portion 302 of the second photo-alignment mask assembly 6, and the lengths of the plurality of first light-transmitting areas 101-1 in the dashed area C and the plurality of second light-transmitting areas 101-2 in the dashed area D in the negative direction X are gradually increased;
with respect to the same repeated exposure area a, the length of the orthographic projection of the plurality of second light-transmitting areas 101-2 of the first photo-alignment mask assembly 5 and the orthographic projection of the plurality of first light-transmitting areas 101-1 of the second photo-alignment mask assembly 6 in the first direction Y is gradually reduced or gradually increased; specifically, in fig. 6, the dashed area E includes a plurality of second light-transmitting areas 101-2 of the positive second portion 301 of the first photo-alignment mask assembly 5, the dashed area F includes a plurality of first light-transmitting areas 101-1 of the negative second portion 302 of the second photo-alignment mask assembly 6, and the lengths of the plurality of second light-transmitting areas 101-2 of the dashed area E and the plurality of first light-transmitting areas 101-1 of the dashed area F in the second direction X are gradually increased.
The exposure module provided by the embodiment of the application, the length changes of the second light transmission areas of the second part of the first light alignment mask module and the first light transmission areas of the second part of the second light alignment mask module are regular changes, and the length changes of the first light transmission areas of the second part of the first light alignment mask module and the second light transmission areas of the second part of the second light alignment mask module are regular changes. That is, as shown in fig. 6, if the E region of the first photo-alignment mask assembly 5 is interchanged with the D region of the second photo-alignment mask assembly 6, the arrangement of the plurality of light-transmitting regions 101 is similar to the arrangement rule of the plurality of light-transmitting regions 101 of the second portion 3 of the related art shown in fig. 1. Therefore, even if the pattern of the second part of the first photo-alignment mask assembly is different from the pattern of the second part of the second photo-alignment mask assembly, when the first photo-alignment mask assembly and the second photo-alignment mask assembly are utilized to perform the sub-exposure, the total exposure amount of the repeated exposure area can still meet the requirement, the excessive difference of the exposure amount of the repeated exposure area and the single exposure area is avoided, and the display uniformity can be improved.
In some embodiments, the second portion of the first photoalignment mask assembly comprises an area of all light-transmitting regions that is smaller than an area of all light-transmitting regions comprised by the second portion of the second photoalignment mask assembly.
In some embodiments, the first photoalignment mask component, the second portion includes a ratio of a maximum value of a length of the light-transmitting region in the first direction to a length of the light-transmitting region in the first direction of the first portion is greater than or equal to 2/5 and less than or equal to 1/2.
Therefore, the length of the light transmission area in the first light alignment mask assembly is smaller, when the first light alignment mask assembly is used for light alignment, uneven display caused by larger exposure corresponding to the light transmission area with larger length and smaller exposure corresponding to the light transmission area with smaller length can be avoided.
In some embodiments, the second photo-alignment mask assembly includes a ratio of a minimum value of a length of the light-transmitting region of the second portion in the first direction to a length of the light-transmitting region of the first portion in the first direction is greater than or equal to 2/5 and less than or equal to 1/2.
Therefore, the length of the light transmission area in the second photo-alignment mask assembly is larger, and when the second photo-alignment mask assembly is used for photo-alignment for the substrate to be aligned, which comprises a material with low exposure sensitivity, the exposure yield can be improved, the larger difference of exposure amounts in different areas is avoided, and the brightness uniformity of the display panel can be improved.
In some embodiments, as shown in FIG. 6, in the second direction X, the second region 4-2 is divided into a first sub-region 4-2-1 and second sub-regions 4-2-2 located on both sides of the first sub-region 4-2-1; in the second direction X, the widths of the second sub-areas 4-2-2 located on both sides of the first sub-area 4-2-1 are equal; in the second direction X the width h7 of the first sub-zone 4-2-1 is equal to half the width h6 of the second portion 3.
In some embodiments, as shown in fig. 6, the second sub-region 4-2-2 of the first photo-alignment mark assembly 5 includes a light-transmitting region 101 having a length in the first direction Y that is about 80% to about 100% of the sum of the lengths of the light-transmitting regions 101 of the second sub-region 4-2-2 of the second photo-alignment mark assembly 6 and the light-transmitting region 101 of the first portion 2. For example, the ratio of the length of the light transmitting region 101 comprised by the second sub-region 4-2-2 in the first photo-alignment-mask assembly 5 in the first direction Y to the length of the light transmitting region 101 comprised by the second sub-region 4-2-2 in the second photo-alignment-mask assembly 6 in the first direction Y is 85.3%.
In some embodiments, the width h6 of the second portion 3 is about 45 millimeters and the width h7 of the first sub-zone 4-2-1 is about 22.5. The exposure corresponding to the first sub-zone is about 20 millijoules.
In some embodiments, as shown in fig. 4, 5 and 6, in the light-transmitting pattern 1, the second portions 3 located on two sides of the first portion 2 are respectively: a positive second portion 301 on the side of the first portion 2 with positive x+ in the second direction X, and a negative second portion 302 on the side of the first portion 2 with negative X-in the second direction X;
The positive second portion 301 of the first photo-alignment mask assembly 5 overlaps the negative second portion 302 of the second photo-alignment mask assembly 6 with respect to the positive projection of the same exposure area a; the negative second portion 302 of the first photo-alignment mask assembly 5 overlaps the positive second portion 301 of the second photo-alignment mask assembly 6 with respect to the positive projection of the same exposure area a.
In some embodiments, as shown in fig. 6, in the second portion 3, a line connecting one ends of the plurality of first light-transmitting areas 101-1 extending in the first direction Y corresponds to a first curve b1, a line connecting the other ends of the plurality of first light-transmitting areas 101-1 extending in the first direction Y corresponds to a second curve b2, a line connecting one ends of the plurality of second light-transmitting areas 101-2 extending in the first direction Y corresponds to a third curve b3, and a line connecting the other ends of the plurality of second light-transmitting areas 101-2 extending in the first direction Y corresponds to a fourth curve b4;
the first curve b1, the second curve b2, the third curve b3 and the fourth curve b4 are all y=sin 2 An x curve.
The first curve b1, the second curve b2, the third curve b3 and the fourth curve b4 of the photoalignment mask provided by the embodiment of the application are all y=sin 2 The x curves have different slopes at different positions, compared with the condition that each curve is a straight line, namely the length of the light-transmitting area in the first direction is linearly changed, the length change trend of the light-transmitting area in the first direction is inconsistent, the area of the light-transmitting area corresponding to the spliced exposure area is more favorable for being dispersed, the exposure of the spliced exposure area is further dispersed, the brightness difference caused by the exposure difference is reduced, and the display uniformity is improved.
Alternatively, in the specific implementation, the first curve, the second curve, the third curve, and the fourth curve may be other curves such as a y=ax+k curve.
Based on the same inventive concept, the embodiments of the present application further provide a photoalignment method, as shown in fig. 8, including:
s101, providing a substrate to be aligned and an exposure assembly provided by the embodiment of the application;
s102, performing optical alignment on the substrate to be aligned by using the first optical alignment mask assembly and the second optical alignment mask assembly of the exposure assembly respectively.
The photoalignment method provided by the embodiment of the application uses the exposure component provided by the embodiment of the application to photoalign the substrate to be aligned. In the exposure assembly, on one side far away from the first part, the lengths of a plurality of light transmission areas included in the second part of the first light alignment mask plate in the first direction Y are firstly increased and then decreased, and the lengths of a plurality of light transmission areas included in the second part of the second light alignment mask plate in the first direction Y are firstly decreased and then increased, namely, the length change trend of the light transmission areas of the second part included in the first light alignment assembly is different from the length change trend of the light transmission areas of the second part included in the second light alignment assembly, and the light transmission patterns of the light alignment mask plate included in the first light alignment assembly are different from the light transmission patterns of the light alignment mask plate included in the second light alignment assembly. Compared with the arrangement mode that the light transmission patterns of the photo-alignment mask plates subjected to the multiple exposure in the related art are the same, and the lengths of the multiple light transmission areas of the second part in the first direction Y are gradually reduced, the lengths of the multiple light transmission areas of the second part of the first photo-alignment mask plate and the second photo-alignment mask plate in the first direction are not regularly changed any more, the exposure of the second part of the first photo-alignment mask plate and the second photo-alignment mask plate is not regularly changed any more, the problem that the brightness unevenness of display products occurs in the corresponding area of the second part due to the larger difference of the exposure of the second part can be relieved, and the brightness uniformity of the display panel can be improved.
In some embodiments, the photo-alignment mask plate of the first photo-alignment mask assembly and the second photo-alignment mask assembly comprises a first light-transmission pattern and a second light-transmission pattern; the first photo-alignment mask assembly and the second photo-alignment mask assembly are used for photo-alignment of the substrate to be aligned respectively, and the method specifically comprises the following steps:
controlling the light alignment light source to scan the substrate to be aligned along a first scanning direction by using the first light transmission pattern of the first light alignment mask assembly and the first light transmission pattern of the second light alignment mask assembly respectively;
controlling the light alignment light source to scan the substrate to be aligned along a second scanning direction by using the second light transmission pattern of the first light alignment mask assembly and the second light transmission pattern of the second light alignment mask assembly respectively; the second scanning direction is opposite to the first scanning direction.
In some embodiments, the first photo-alignment mask assembly and the second photo-alignment mask assembly are used to photo-align the substrate to be aligned respectively, and specifically include:
and for each light-transmitting pattern, sequentially using the first photo-alignment mask assembly and the second photo-alignment mask assembly to carry out photo-alignment on the substrate to be aligned.
According to the photoalignment method provided by the embodiment of the application, for each light-transmitting pattern, the first photoalignment mask assembly is utilized to carry out photoalignment, in the first photoalignment mask assembly, the lengths of the multiple light-transmitting areas of the second part of the photoalignment mask plate in the first direction are increased and then reduced at one side far away from the first part, compared with the condition that the multiple light-transmitting areas of the related art are sequentially reduced, the lengths of the multiple light-transmitting areas of the second part of the first photoalignment mask assembly are smaller, when the first photoalignment mask assembly is used for photoalignment, the display unevenness caused by the fact that the exposure corresponding to the light-transmitting areas with larger length is larger and the exposure corresponding to the light-transmitting areas with smaller length is smaller can be avoided.
In specific implementation, for the first light transmission pattern, controlling the light alignment light source to scan the substrate to be aligned along a first scanning direction by sequentially utilizing the first light transmission pattern of the first light alignment mask assembly and the first light transmission pattern of the second light alignment mask assembly; and for the second light transmission pattern, controlling the light alignment light source to scan the substrate to be aligned along the first scanning direction by sequentially utilizing the second light transmission pattern of the first light alignment mask assembly and the second light transmission pattern of the second light alignment mask assembly.
Alternatively, in some embodiments, the first photo-alignment mask assembly and the second photo-alignment mask assembly are used to photo-align the substrate to be aligned respectively, and specifically include:
and for each light-transmitting pattern, sequentially using the second photo-alignment mask assembly and the first photo-alignment mask assembly to carry out photo-alignment on the substrate to be aligned.
According to the photoalignment method provided by the embodiment of the application, for each light-transmitting pattern, the second photoalignment mask assembly is used for photoalignment, the length of a light-transmitting area in the second photoalignment mask assembly is larger, and for a substrate to be aligned, which comprises a material with low exposure sensitivity, the second photoalignment mask assembly is used for photoalignment, so that the exposure yield can be improved, the larger difference of exposure amounts in different areas is avoided, and the brightness uniformity of a display panel can be improved.
In specific implementation, for the first light transmission pattern, controlling the light alignment light source to scan the substrate to be aligned along the first scanning direction by sequentially utilizing the first light transmission pattern of the second light alignment mask assembly and the first light transmission pattern of the first light alignment mask assembly; and for the second light transmission pattern, controlling the light alignment light source to scan the substrate to be aligned along the first scanning direction by sequentially utilizing the second light transmission pattern of the second light alignment mask assembly and the second light transmission pattern of the first light alignment mask assembly.
As shown in fig. 9, the display panel provided in the embodiment of the present application includes: the display panel 23 includes: an array substrate 21 and a counter substrate 22 disposed opposite to each other, and a liquid crystal layer 23 between the array substrate 21 and the counter substrate 22;
the optical alignment method provided by the embodiment of the application is adopted to carry out optical alignment on the alignment film layer of the array substrate and/or the alignment film layer of the opposite substrate.
In some embodiments, the array substrate includes an alignment film layer that is a first alignment film layer, and the opposite substrate includes a second alignment film layer, and the liquid crystal layer is located between the first alignment film layer and the second alignment film layer.
In some embodiments, the array substrate further includes: a first substrate, a plurality of thin film transistors positioned between the first substrate and the first alignment film layer, and a plurality of pixel electrodes positioned between the thin film transistors and the first alignment film layer; the thin film transistors are electrically connected with the pixel electrodes in a one-to-one correspondence manner, and each sub-pixel comprises the thin film transistors and the pixel electrodes; the counter substrate further includes: the second substrate is positioned between the second substrate and the second alignment film layer, and the black matrix and the color film are positioned between the second substrate and the second alignment film layer; the black matrix comprises opening areas corresponding to the sub-pixels one by one, and the color film is at least positioned in the opening areas.
In some embodiments, the counter substrate further includes a common electrode.
The display device provided by the embodiment of the application comprises the display panel provided by the embodiment of the application.
In some embodiments, as shown in fig. 10, the display device further includes a backlight module 24, and the display panel 23 is located on the light emitting side of the backlight module 24.
The display device provided by the embodiment of the application is as follows: any product or component with display function such as a mobile phone, a tablet computer, a television, a display, a notebook computer, a digital photo frame, a navigator and the like. Other essential components of the display device are those of ordinary skill in the art, and will not be described in detail herein, nor should they be considered as limiting the application. The implementation of the display device can be referred to the embodiments of the display panel and the exposure assembly, and the repetition is not repeated.
In summary, in the exposure module, the length of the plurality of light-transmitting areas included in the second portion of the first photo-alignment mask plate in the first direction Y is first increased and then decreased, and the length of the plurality of light-transmitting areas included in the second portion of the second photo-alignment mask plate in the first direction Y is first decreased and then increased, that is, the length change trend of the light-transmitting areas of the second portion included in the first photo-alignment module is different from the length change trend of the light-transmitting areas of the second portion included in the second photo-alignment module, and the light-transmitting patterns of the light-alignment mask plate included in the first photo-alignment module are different from the light-transmitting patterns of the light-alignment mask plate included in the second photo-alignment module. Compared with the arrangement mode that the light transmission patterns of the photo-alignment mask plates subjected to the multiple exposure in the related art are the same, and the lengths of the multiple light transmission areas of the second part in the first direction Y are gradually reduced, the lengths of the multiple light transmission areas of the second part of the first photo-alignment mask plate and the second photo-alignment mask plate in the first direction are not regularly changed any more, the exposure of the second part of the first photo-alignment mask plate and the second photo-alignment mask plate is not regularly changed any more, the problem that the brightness unevenness of display products occurs in the corresponding area of the second part due to the larger difference of the exposure of the second part can be relieved, and the brightness uniformity of the display panel can be improved.
While preferred embodiments of the present invention have been described, additional variations and modifications in those embodiments may occur to those skilled in the art once they learn of the basic inventive concepts. It is therefore intended that the following claims be interpreted as including the preferred embodiments and all such alterations and modifications as fall within the scope of the invention.
It will be apparent to those skilled in the art that various modifications and variations can be made in the present application without departing from the spirit or scope of the application. Thus, if such modifications and variations of the present application fall within the scope of the claims and the equivalents thereof, the present application is intended to cover such modifications and variations.

Claims (15)

1. An exposure assembly, the exposure assembly comprising: a first photo-alignment mask assembly and a second photo-alignment mask assembly;
the first optical alignment mask assembly and the second optical alignment assembly comprise a plurality of optical alignment mask plates; the photoalignment mask plate comprises: a plurality of light-transmitting patterns arranged in a first direction;
the light-transmitting pattern includes: a plurality of light-transmitting areas arranged in a second direction; the second direction intersects the first direction; the light-transmitting pattern is divided into: a first portion, and second portions located on both sides of the first portion in the second direction, respectively;
The orthographic projections of the first part of the first photo-alignment mask assembly and the first part of the second photo-alignment mask assembly relative to the same exposure area are not overlapped with each other, and the orthographic projections of the second part of the first photo-alignment mask assembly and the second part of the second photo-alignment mask assembly relative to the same exposure area are overlapped with each other;
in the first photoalignment mask assembly, on one side far away from the first part, lengths of a plurality of light transmission areas included in the second part in the first direction are increased and then reduced;
in the second photoalignment mask assembly, on one side far away from the first part, lengths of the plurality of light-transmitting areas of the second part in the first direction are firstly reduced and then increased.
2. The exposure apparatus according to claim 1, wherein lengths of the plurality of light-transmitting regions of the first portion in the first direction are all equal;
the length of the light-transmitting region of the second portion in the first direction is smaller than the length of the light-transmitting region of the first portion in the first direction.
3. The exposure module according to claim 2, wherein the photo-alignment mask plate includes a plurality of the light-transmitting regions each having an equal width in the second direction;
The width of the light-transmitting area of the first photo-alignment mask assembly in the second direction is equal to the width of the light-transmitting area of the second photo-alignment mask assembly in the second direction.
4. The exposure apparatus according to claim 3, wherein the light-transmitting pattern further comprises: a plurality of light shielding regions arranged in a second direction; the light-transmitting areas and the light-shielding areas are alternately arranged;
the width of the light-transmitting area in the second direction is equal to the width of the light-shielding area in the second direction.
5. The exposure apparatus of claim 4, wherein the photoalignment mask plate comprises: a first light-transmitting pattern and a second light-transmitting pattern arranged in a first direction;
the orthographic projection of the shading area of the first light transmission pattern and the shading area of the second light transmission pattern relative to the same exposure area are not overlapped;
the orthographic projection of the light-transmitting area of the first light-transmitting pattern and the light-transmitting area of the second light-transmitting pattern relative to the same exposure area are not overlapped with each other;
the light shielding region of the first light transmission pattern and the light transmission region of the second light transmission pattern are overlapped relative to the orthographic projection of the same exposure region, and the light transmission region of the first light transmission pattern and the light shielding region of the second light transmission pattern are overlapped relative to the orthographic projection of the same exposure region.
6. The exposure apparatus according to any one of claims 1 to 5, wherein the second portion includes: a plurality of first light-transmitting regions, and a plurality of second light-transmitting regions located on one side of the plurality of first light-transmitting regions in the second direction;
the lengths of the plurality of first light-transmitting areas in the first direction are gradually increased in the direction that the first part points to the second part, and the lengths of the plurality of second light-transmitting areas in the first direction are gradually decreased;
the exposure area comprises a plurality of repeated exposure areas, and the width of the repeated exposure areas is equal to the width of the second part in the second direction;
with respect to the same repeated exposure area, the length of the orthographic projection of the plurality of first light transmission areas of the first photo-alignment mask assembly and the orthographic projection of the plurality of second light transmission areas of the second photo-alignment mask assembly in the first direction is gradually reduced or gradually increased;
and with respect to the same repeated exposure area, the length of the orthographic projection of the plurality of second light transmission areas of the first photo-alignment mask assembly and the orthographic projection of the plurality of first light transmission areas of the second photo-alignment mask assembly in the first direction is gradually reduced or gradually increased.
7. The exposure module according to claim 6, wherein in the second portion, a line connecting one ends of the plurality of first light-transmitting regions extending in the first direction corresponds to a first curve, a line connecting the other ends of the plurality of first light-transmitting regions extending in the first direction corresponds to a second curve, a line connecting one ends of the plurality of second light-transmitting regions extending in the first direction corresponds to a third curve, and a line connecting the other ends of the plurality of second light-transmitting regions extending in the first direction corresponds to a fourth curve;
the first curve, the second curve, the third curve and the fourth curve are all y=sin 2 An x curve.
8. The exposure module according to any one of claims 1 to 5, 7, wherein in the light-transmitting pattern, the second portions located on both sides of the first portion are respectively: a positive second portion located on a side of the first portion in a positive direction of the second direction, and a negative second portion located on a side of the first portion in a negative direction of the second direction;
the positive second portion of the first photo-alignment mask assembly and the negative second portion of the second photo-alignment mask assembly have an overlap with respect to a positive projection of the same exposure area; the negative second portion of the first photo-alignment mask assembly overlaps the positive second portion of the second photo-alignment mask assembly with respect to an orthographic projection of the same exposure area.
9. A method of photoalignment, the method comprising:
providing a substrate to be aligned and an exposure module according to any one of claims 1 to 8;
and carrying out optical alignment on the substrate to be aligned by using the first optical alignment mask assembly and the second optical alignment mask assembly of the exposure assembly respectively.
10. The photoalignment method according to claim 9, wherein the photoalignment mask plate of the first photoalignment mask assembly and the second photoalignment mask assembly comprises a first light transmission pattern and a second light transmission pattern; the first photo-alignment mask assembly and the second photo-alignment mask assembly are used for photo-alignment of the substrate to be aligned respectively, and the method specifically comprises the following steps:
controlling a light alignment light source to scan a substrate to be aligned along a first scanning direction by using a first light transmission pattern of the first light alignment mask assembly and a first light transmission pattern of the second light alignment mask assembly respectively;
controlling the light alignment light source to scan the substrate to be aligned along a second scanning direction by using the second light transmission pattern of the first light alignment mask assembly and the second light transmission pattern of the second light alignment mask assembly respectively; the second scanning direction is opposite to the first scanning direction.
11. The photoalignment method according to claim 9 or 10, wherein photoalignment is performed on the substrate to be aligned by using a first photoalignment mask assembly and the second photoalignment mask assembly, respectively, specifically comprising:
and carrying out optical alignment on the substrate to be aligned by using the first optical alignment mask assembly and the second optical alignment mask assembly in sequence for each light-transmitting pattern.
12. The photoalignment method according to claim 9 or 10, wherein photoalignment is performed on the substrate to be aligned by using a first photoalignment mask assembly and the second photoalignment mask assembly, respectively, specifically comprising:
and carrying out optical alignment on the substrate to be aligned by using the second optical alignment mask assembly and the first optical alignment mask assembly in sequence for each light-transmitting pattern.
13. A display panel, the display panel comprising: an array substrate and an opposite substrate which are oppositely arranged, and a liquid crystal layer positioned between the array substrate and the opposite substrate; the array substrate comprises an alignment film layer, and/or the opposite substrate comprises an alignment film layer;
the alignment film layer of the array substrate and/or the alignment film layer of the counter substrate is photo-aligned using the photo-alignment method according to any one of claims 10 to 12.
14. The display panel of claim 13, wherein the counter substrate comprises a common electrode.
15. A display device comprising the display panel according to claim 13 or 14.
CN202311833642.5A 2023-12-27 2023-12-27 Exposure assembly, light alignment method, display panel and display device Pending CN117590705A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202311833642.5A CN117590705A (en) 2023-12-27 2023-12-27 Exposure assembly, light alignment method, display panel and display device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202311833642.5A CN117590705A (en) 2023-12-27 2023-12-27 Exposure assembly, light alignment method, display panel and display device

Publications (1)

Publication Number Publication Date
CN117590705A true CN117590705A (en) 2024-02-23

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
CN (1) CN117590705A (en)

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