CN117590586A - Super-lens generation method and device for dodging, super-lens and dodging system - Google Patents

Super-lens generation method and device for dodging, super-lens and dodging system Download PDF

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Publication number
CN117590586A
CN117590586A CN202311665263.XA CN202311665263A CN117590586A CN 117590586 A CN117590586 A CN 117590586A CN 202311665263 A CN202311665263 A CN 202311665263A CN 117590586 A CN117590586 A CN 117590586A
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China
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flat
top beam
divergence angle
diffraction angle
superlens
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韩雨希
郝成龙
谭凤泽
朱健
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Huzhou Metalans Technology Co ltd
Shenzhen Metalenx Technology Co Ltd
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Huzhou Metalans Technology Co ltd
Shenzhen Metalenx Technology Co Ltd
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Priority to CN202311665263.XA priority Critical patent/CN117590586A/en
Publication of CN117590586A publication Critical patent/CN117590586A/en
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0012—Optical design, e.g. procedures, algorithms, optimisation routines
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/002—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of materials engineered to provide properties not available in nature, e.g. metamaterials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0927—Systems for changing the beam intensity distribution, e.g. Gaussian to top-hat
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/095—Refractive optical elements
    • G02B27/0955—Lenses

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  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)

Abstract

The application provides a superlens generation method and device for dodging, a superlens and a dodging system. The super lens to be generated is used for shaping the Gaussian beam into a first flat-top beam, and the first flat-top beam target meets a first divergence angle; the method comprises the following steps: acquiring a second dodging phase for shaping the Gaussian beam into a second flat-top beam, wherein the second flat-top beam meets a second divergence angle; based on the first divergence angle and the second divergence angle, the number of copies required by the second flat-top beam and the diffraction angle required by the second flat-top beam after copying are obtained; constructing a target image based on the copy number, diffraction angle, wavelength and position distribution of the micro-nano structure; performing phase recovery on the target image to obtain a copy splicing phase; and generating the superlens based on the second dodging phase and the copy-splice phase. According to the super-lens generated by the method provided by the application, the Gaussian beam can be shaped into the flat-top beam with high uniformity and large divergence angle.

Description

Super-lens generation method and device for dodging, super-lens and dodging system
Technical Field
The application relates to the field of lenses, in particular to a super-lens generation method and device for homogenizing light, a super-lens and a homogenizing system.
Background
The flat-top beam refers to a beam in which light intensity is uniformly distributed in a middle region and sharply decreases in an edge region, and is widely used in fields of laser medical treatment, laser etching, and the like. The higher the uniformity of the flat-top beam, the flatter the middle region of its intensity appears. In the related art, most of the light emitted by the light source is gaussian. In the scheme provided by the related art, a corresponding dodging phase is designed for the gaussian beam, an optical element capable of applying the designed dodging phase is further generated, and the gaussian beam is shaped into a flat-top beam through the generated optical element. The proposal provided by the related art can shape the Gaussian beam into a flat-top beam, but has difficulty in simultaneously combining high uniformity and large divergence angle.
Disclosure of Invention
An object of the present application is to provide a method, an apparatus, a superlens and a dodging system for dodging, which can shape a gaussian beam into a flat-top beam with both high uniformity and large divergence angle.
According to an aspect of the embodiments of the present application, a method for generating a superlens for homogenizing light is disclosed, where the superlens to be generated is used for shaping a gaussian beam into a first flat-top beam, and the first flat-top beam target satisfies a first divergence angle and an expected uniformity; the method comprises the following steps:
obtaining a second dodging phase for shaping the gaussian beam into a second flat-top beam, wherein the second flat-top beam satisfies a second divergence angle and an expected uniformity, the second divergence angle being smaller than the first divergence angle;
acquiring the number of copies required by the second flat-top beam and the diffraction angle required by the second flat-top beam after copying based on the first divergence angle and the second divergence angle to copy and splice the first flat-top beam;
constructing a target image for describing the second flat-top light beam to be copied and spliced into the first flat-top light beam by the micro-nano structure of the position distribution based on the copying quantity, the diffraction angle, the wavelength of the second flat-top light beam and the position distribution of the micro-nano structure to be arranged on the super lens;
performing phase recovery on the target image to obtain a replication splicing phase required by the micro-nano structure with the position distribution;
And generating a superlens for shaping the Gaussian beam into the first flat-top beam based on the second dodging phase and the replication and splicing phase.
In an exemplary embodiment of the present application, based on the first divergence angle and the second divergence angle, obtaining the number of copies required for copying and splicing the first flat-top beam, and the diffraction angle required for the second flat-top beam after copying, includes:
calculating the copy number based on the ratio between the first divergence angle and the second divergence angle;
and calculating the diffraction angle based on the replication quantity and the second divergence angle, wherein the diffraction angle is positively correlated with the replication quantity and is positively correlated with the second divergence angle.
In an exemplary embodiment of the present application, a two-dimensional coordinate system constituting the light beam observation plane includes a first direction axis and a second direction axis perpendicular to each other; the number of replications comprises a number of replications required on the first direction axis and a number of replications on the second direction axis, and the diffraction angle comprises a diffraction angle required on the first direction axis and a diffraction angle required on the second direction axis.
In an exemplary embodiment of the present application, based on the number of copies, the diffraction angle, the wavelength of the second flat-top beam, and the position distribution of the micro-nano structures to be arranged on the superlens, constructing a target image for describing that each of the second flat-top beams after copying is spliced into the first flat-top beam by the micro-nano structures at the distribution positions, includes:
calculating the sampling quantity of the micro-nano structure to be arranged based on the diameter of the light spot projected onto the super lens by the Gaussian beam and the sampling period of the micro-nano structure to be arranged; the sampling period and the sampling number together form the position distribution;
calculating an arrangement period of a dot matrix to be arranged in the target image based on the copy number, the diffraction angle, the wavelength, the sampling period and the sampling number;
and determining the target size of the target image according to the sampling period and the sampling number, and arranging a dot matrix in the image with the target size according to the copying number and the arrangement period to obtain the target image, wherein the dot matrix is composed of the copying number of dots, and the distance between adjacent dots in the dot matrix accords with the arrangement period.
In an exemplary embodiment of the present application, calculating the number of samples of the micro-nano structure to be arranged based on the diameter of the light spot projected by the gaussian beam onto the superlens and the sampling period of the micro-nano structure to be arranged includes:
calculating the size of the super-lens target requirement based on the light spot diameter, wherein the size is positively correlated with the light spot diameter;
the number of samples is calculated based on a ratio between the sampling period and the size.
In an exemplary embodiment of the present application, the dimension is greater than or equal to 1.3 times the spot diameter and less than or equal to 1.7 times the spot diameter.
In an exemplary embodiment of the present application, calculating an arrangement period of a lattice to be arranged in the target image based on the copy number, the diffraction angle, the wavelength, the sampling period, and the sampling number includes:
based on the wavelength and the sampling period, calculating to obtain a maximum diffraction angle which can be achieved by the second flat-top beam after replication under the conditions of the wavelength and the sampling period, wherein the maximum diffraction angle is positively correlated with the wavelength and inversely correlated with the sampling period;
And calculating the arrangement period based on the maximum diffraction angle, the replication number, the diffraction angle and the sampling number, wherein the arrangement period is inversely related to the maximum diffraction angle, inversely related to the replication number, positively related to the diffraction angle and positively related to the sampling number.
According to an aspect of an embodiment of the present application, a superlens generating device for homogenizing light is disclosed, a superlens to be generated is used for shaping a gaussian beam into a first flat-top beam, and the first flat-top beam target satisfies a first divergence angle and an expected uniformity; the device comprises:
a second dodging phase acquisition module configured to acquire a second dodging phase for shaping the gaussian beam into a second flat-top beam, wherein the second flat-top beam satisfies a second divergence angle, which is smaller than the first divergence angle, and an expected uniformity;
the replication and splicing parameter acquisition module is configured to acquire the number of replications required by the second flat-top beam and the diffraction angle required by the second flat-top beam after replication for replication and splicing to obtain the first flat-top beam based on the first divergence angle and the second divergence angle;
A target image construction module configured to construct a target image describing copying and splicing of the second flat-top light beam into the first flat-top light beam by the micro-nano structure of the position distribution based on the copy number, the diffraction angle, the wavelength of the second flat-top light beam and the position distribution of the micro-nano structure to be arranged on the super lens;
the replication and splicing phase recovery module is configured to carry out phase recovery on the target image to obtain replication and splicing phases required by the micro-nano structure with the distributed positions;
and the super-lens generating module is configured to generate a super-lens for shaping the Gaussian beam into the first flat-top beam based on the second dodging phase and the copying and splicing phase.
According to an aspect of the embodiments of the present application, a superlens for homogenizing light is disclosed, where the superlens is generated by using the method provided by any one of the method embodiments above.
According to an aspect of embodiments of the present application, a dodging system is disclosed, the dodging system comprising: a light source for emitting a gaussian beam, a superlens for homogenizing the gaussian beam; the superlens is generated by adopting the method provided by any one of the method embodiments.
According to an aspect of an embodiment of the present application, an electronic device is disclosed, including: one or more processing units; and a storage unit configured to store one or more programs that, when executed by the one or more processing units, cause the electronic device to implement any of the method embodiments above.
According to an aspect of embodiments of the present application, a computer-readable storage medium having stored thereon computer-readable instructions, which when executed by a processing unit of a computer, cause the computer to perform any of the above method embodiments is disclosed.
The super-lens shaping generated according to the method provided by the application is used for shaping the first flat-top beam, namely shaping the Gaussian beam into the second flat-top beam, and then copying and splicing the second flat-top beam to obtain the first flat-top beam. Because the copy splice basically does not have obvious influence on the uniformity of the light beams, the uniformity of the first flat-top light beam and the uniformity of the second flat-top light beam have little difference, and can be regarded as basically consistent. And no matter how large the difference is between the second divergence angle of the second flat-top beam and the first divergence angle of the first flat-top beam, the second flat-top beam can be copied and spliced into the first flat-top beam smoothly by adaptively adjusting the number of copies required by the second flat-top beam and the diffraction angle required by the second flat-top beam after copying. Therefore, as long as the obtained second dodging phase can shape the Gaussian beam into a second flat top beam with high uniformity, the superlens generated according to the method provided by the application can successfully shape the Gaussian beam into a first flat top beam with high uniformity and large divergence angle even if the divergence angle of the second flat top beam is small; and a second dodging phase, which is only used to ensure high uniformity, is readily available. Therefore, the super lens generated by the method provided by the application can shape the Gaussian beam into the flat-top beam with high uniformity and large divergence angle.
Other features and advantages of the present application will be apparent from the following detailed description, or may be learned in part by the practice of the application.
It is to be understood that both the foregoing general description and the following detailed description are exemplary and explanatory only and are not restrictive of the application.
Drawings
The above and other objects, features and advantages of the present application will become more apparent by describing in detail exemplary embodiments thereof with reference to the attached drawings.
Fig. 1 shows a flowchart of a superlens generation method for dodging in an embodiment of the present application.
Fig. 2 shows a schematic diagram of shaping a gaussian beam into a second flat top beam in an embodiment of the present application.
Fig. 3 is a schematic diagram of copying and splicing the second flat top beam shown in fig. 2 into the first flat top beam according to an embodiment of the present application.
Fig. 4 shows a schematic diagram of copying and splicing a second flat top beam into a first flat top beam reflected on a beam viewing surface in an embodiment of the present application.
Fig. 5 shows a schematic diagram of a two-dimensional normalized light intensity distribution of a first flat-top beam obtained by shaping in an embodiment of the present application on a beam observation surface.
Fig. 6 shows a schematic diagram of a distribution of one-dimensional normalized light intensity of the first flat-top beam obtained by shaping in an embodiment of the present application in the horizontal direction.
Fig. 7 shows a block diagram of a superlens generating device for homogenizing light in an embodiment of the present application.
Fig. 8 shows a layout diagram of the dodging system in an embodiment of the present application.
Reference numerals illustrate:
1-a light source; 2-superlens.
Detailed Description
Example embodiments will now be described more fully with reference to the accompanying drawings. However, the exemplary embodiments may be embodied in many forms and should not be construed as limited to the examples set forth herein; rather, these example embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the concept of the example embodiments to those skilled in the art. The drawings are merely schematic illustrations of the present application and are not necessarily drawn to scale. The same reference numerals in the drawings denote the same or similar parts, and thus a repetitive description thereof will be omitted.
Furthermore, the described features, structures, or characteristics may be combined in any suitable manner in one or more example embodiments. In the following description, numerous specific details are provided to give a thorough understanding of example embodiments of the present application. One skilled in the relevant art will recognize, however, that the aspects of the application may be practiced without one or more of the specific details, or with other methods, components, steps, etc. In other instances, well-known structures, methods, implementations, or operations are not shown or described in detail to avoid obscuring aspects of the application.
Some of the block diagrams shown in the figures are functional entities and do not necessarily correspond to physically or logically separate entities. These functional entities may be implemented in software or in one or more hardware modules or integrated circuits or in different network and/or processing unit means and/or microcontroller means.
Generally, the flat-top beam is preferably ensured to have high uniformity. On the premise of ensuring high uniformity, the divergence angle of the flat-top beam shaped according to the scheme provided by the related technology can only reach about 15 degrees of half angle, and even if the flat-top beam is slightly optimized, the divergence angle can only be further improved to about 20 degrees of half angle, and the divergence angle is still smaller. Therefore, the solution provided by the related art is capable of shaping the gaussian beam into a flat-top beam, but it is difficult to combine high uniformity and large divergence angle.
In view of overcoming the above-mentioned drawbacks of the related art, the present application provides a superlens generation method for dodging. The super lens generated by the method provided by the application can shape the Gaussian beam into a flat-top beam with high uniformity and large divergence angle.
Fig. 1 shows a flowchart of a superlens generation method for dodging provided by the present application. Referring to fig. 1, the method provided by the present application includes:
step S110, a second dodging phase used for shaping the Gaussian beam into a second flat-top beam is obtained, wherein the second flat-top beam meets a second divergence angle and expected uniformity, and the second divergence angle is smaller than the first divergence angle;
step S120, based on the first divergence angle and the second divergence angle, obtaining the number of copies required by the second flat-top beam and the diffraction angle required by the second flat-top beam after copying and splicing to obtain the first flat-top beam;
step S130, constructing a target image for describing that the second flat top light beam is copied and spliced into the first flat top light beam by the micro-nano structure distributed on the basis of the copy number, the diffraction angle, the wavelength of the second flat top light beam and the position distribution of the micro-nano structure to be arranged on the super lens;
step S140, carrying out phase recovery on the target image to obtain a replication splicing phase required to be provided by the micro-nano structure distributed at the position;
and step S150, generating a superlens for shaping the Gaussian beam into the first flat-top beam based on the second dodging phase and the copy-splice phase.
In the embodiment of the application, the first flat-top beam refers to a flat-top beam obtained by shaping a super-lens target, and the first divergence angle refers to a divergence angle satisfied by the first flat-top beam target; the second flat top beam refers to a flat top beam which can be obtained by directly adopting the dodging phase shaping designed by the related technology, the second divergence angle refers to the divergence angle which is actually met by the second flat top beam, and the second dodging phase refers to the phase for shaping to obtain the second flat top beam.
As can be seen from the above description of the related art, when the first divergence angle is larger, the second divergence angle will be smaller than the first divergence angle, so in this case, the gaussian beam is shaped directly by using the dodging phase designed by the related art, and the first flat-top beam cannot be obtained. To this end, the method provided by the present application proposes: and copying the second flat top light beams with small divergence angles by using the superlens, and splicing the copied second flat top light beams together, thereby obtaining the first flat top light beams with large divergence angles.
Specifically, in order to enable the superlens to copy and splice the second flat-top beam into the first flat-top beam, the micro-nano structure to be arranged on the superlens needs to be enabled to provide a phase for realizing the copy and splice function, that is, a copy and splice phase referred to as a copy and splice phase in the application.
Then, in order to determine the copy and splice phase, after determining the first divergence angle of the first flat-top beam and the second divergence angle of the second flat-top beam, based on the first divergence angle and the second divergence angle, the first flat-top beam can be obtained by calculation, and the number of copies required for copying and splicing the second flat-top beam, that is, the number of copies required for the second flat-top beam, is required. After the number of replications is calculated, the diffraction angle required by the second flat-top beam after replication can be further calculated by combining the second divergence angle and applying the diffraction optical principle.
After the number of copies required by the second flat-top beam and the diffraction angle required by the second flat-top beam after copying are calculated, combining the wavelength of the second flat-top beam and the position distribution of the micro-nano structure to be arranged on the superlens to construct a target image for describing that the micro-nano structure distributed by the position copies and splices the second flat-top beam into the first flat-top beam.
Because the target image describes both the execution subject of the replication and splicing process (i.e., the micro-nano structure distributed at the position) and the execution action of the replication and splicing process (i.e., replicating and splicing a certain light beam), the processing object of the replication and splicing process (i.e., the second flat-top light beam) and the processing result of the replication and splicing process (i.e., the first flat-top light beam), the phase expression of the replication and splicing process can be obtained by performing phase recovery on the constructed target image, i.e., the replication and splicing phase required to be provided by the micro-nano structure distributed at the position is obtained. The phase recovery of the target image can be performed based on the GS algorithm (Gerchberg-Saxton algorithm), or based on the grating principle.
Because the second dodging phase can reshape the Gaussian beam into the second flat-top beam, and the replication and splicing phase can replicate and splice the second flat-top beam into the first flat-top beam, the target phase required by the micro-nano structure to be arranged on the superlens can be determined by combining the second dodging phase and the replication and splicing phase. After the target phase is determined, a micro-nano structure capable of providing the target phase can be screened out by searching a pre-established micro-nano database, and then the screened micro-nano structure is arranged, so that the layout of the superlens is designed; and then processing according to the layout obtained by design, namely generating the superlens for shaping the Gaussian beam into the first flat-top beam.
In summary, the shaping of the superlens generated according to the method provided by the application to obtain the first flat-top beam is equivalent to shaping the gaussian beam into the second flat-top beam, and then copying and splicing the second flat-top beam to obtain the first flat-top beam. Because the copy splice basically does not have obvious influence on the uniformity of the light beams, the uniformity of the first flat-top light beam and the uniformity of the second flat-top light beam have little difference, and can be regarded as basically consistent. And no matter how large the difference is between the second divergence angle of the second flat-top beam and the first divergence angle of the first flat-top beam, the second flat-top beam can be copied and spliced into the first flat-top beam smoothly by adaptively adjusting the number of copies required by the second flat-top beam and the diffraction angle required by the second flat-top beam after copying. Therefore, as long as the obtained second dodging phase can shape the Gaussian beam into a second flat top beam with high uniformity, the superlens generated according to the method provided by the application can successfully shape the Gaussian beam into a first flat top beam with high uniformity and large divergence angle even if the divergence angle of the second flat top beam is small; and a second dodging phase, which is only used to ensure high uniformity, is readily available. Therefore, the super lens generated by the method provided by the application can shape the Gaussian beam into the flat-top beam with high uniformity and large divergence angle.
Fig. 2 shows a schematic diagram of shaping a gaussian beam into a second flat top beam in an embodiment of the present application. Fig. 3 is a schematic diagram of copying and splicing the second flat top beam shown in fig. 2 into the first flat top beam according to an embodiment of the present application.
Referring to fig. 2 and 3, in one embodiment, the divergence angle of the gaussian beam emitted by the light source 1 is θ 0 The target adopts the superlens 2 to shape the superlens into high uniformity and the divergence angle reaches theta 1 Is a flat-top beam of (c). However, if the dodging phase provided in the related art is directly adopted, the divergence angle of the flat-top beam obtained by shaping the superlens 2 can only reach θ on the premise of ensuring high uniformity 2 ，θ 2 Less than theta 1 。
Setting the divergence angle to be theta 1 Is taken as a first flat-top beam, and the divergence angle is theta 2 The flat-top beam is used as a second flat-top beam, and the dodging phase provided in the related art is used as a second dodging phase. After the corresponding copy splicing phase is calculated by adopting the method provided by the application, the divergence angle theta can be generated by combining the second dodging phase 0 Is shaped to have a divergence angle theta 1 A superlens 2 of a first flat-top beam of light.
As can be seen, the superlens 2 will have a divergence angle θ 0 Is shaped to have a divergence angle theta 1 Can be regarded as that the divergence angle is theta 0 Gaussian beam of (2)Shaping to a divergence angle theta 2 Then the divergence angle is theta 2 Is duplicated and spliced into a second flat top light beam with a divergence angle theta 1 Is a flat top beam.
It can be understood that, since each of the second flat-top light beams after replication is emitted from the superlens 2, there is a certain degree of overlapping between the second flat-top light beams after replication when just emitted from the superlens 2, and thus in fig. 3, the first flat-top light beam obtained by splicing each of the second flat-top light beams after replication just emitted from the superlens 2 may exhibit a phenomenon of uneven light intensity distribution. However, after a certain distance, the overlapping of the second flat top beams after copying will be reduced to a negligible extent, and the uniformity of the first flat top beam obtained by splicing will not be adversely affected.
In an embodiment, based on the first divergence angle and the second divergence angle, obtaining the number of copies required for copying and splicing the first flat-top beam, the number of copies required for the second flat-top beam, and the diffraction angle required for the second flat-top beam after copying, includes:
calculating to obtain the copy number based on the ratio between the first divergence angle and the second divergence angle;
And calculating a diffraction angle based on the replication number and the second divergence angle, wherein the diffraction angle is positively correlated with the replication number and the second divergence angle.
In this embodiment, after determining the first divergence angle that the first flat-top beam target meets and the second divergence angle that the second flat-top beam meets, the first divergence angle may be divided by the second divergence angle, and then the obtained ratio is rounded up, that is, the number of copies required for the second flat-top beam is calculated.
Applying the principle of diffractive optics, the inventors found that: the diffraction angle required by the second flat-top beam after replication is positively correlated with the number of replications and is positively correlated with the second divergence angle. That is, as the number of replications increases, the diffraction angle required for the second flat-top beam after replication shows an increasing trend; as the second divergence angle increases, the diffraction angle required for the replicated second flat-top beam also tends to increase. Then, by further combining experimental data on the basis of the principle of diffraction optics, a semi-empirical formula for describing mathematical correlation among the diffraction angle, the number of replications and the second divergence angle required by the second flat-top beam after replication can be established. And then, after the number of replications is calculated, combining the second divergence angle, and applying the semi-empirical formula, the diffraction angle required by the second flat-top beam after replication can be calculated.
In an embodiment, after calculating the obtained ratio of the first divergence angle divided by the second divergence angle, if the obtained ratio is not an integer, the second divergence angle of the second flat-top beam is adjusted so that the obtained ratio is an integer.
In detail, if the ratio obtained by dividing the first divergence angle by the second divergence angle is not an integer, the number of copies of the second flat-top beam slightly exceeds the actual requirement on the mathematical level, so that the actual divergence angle of the first flat-top beam meeting the high uniformity is larger than the first divergence angle. In this case, the first flat-top beam can combine high uniformity and large divergence angle, but the portion exceeding the first divergence angle is wasted, so that the optical efficiency of the first flat-top beam in the first divergence angle area is lower.
Therefore, in this embodiment, by adjusting the second divergence angle of the second flat-top beam, the ratio obtained by dividing the first divergence angle by the second divergence angle is an integer, so that the actual divergence angle of the first flat-top beam, which satisfies the high uniformity, is equal to the first divergence angle, so that the light energy is concentrated in the first divergence angle area as much as possible, thereby ensuring that the first flat-top beam not only can simultaneously satisfy the high uniformity and the large divergence angle, but also can maintain the high optical efficiency.
In one embodiment, the two-dimensional coordinate system forming the light beam observation surface comprises a first direction axis and a second direction axis which are perpendicular to each other; the number of replications comprises a number of replications required on a first direction axis and a number of replications required on a second direction axis, and the diffraction angle comprises a diffraction angle required on the first direction axis and a diffraction angle required on the second direction axis.
It will be appreciated that the beam viewing surface for viewing the imaging of the beam is a two-dimensional plane, and that the two-dimensional coordinate system constituting the beam viewing surface then comprises a first direction axis and a second direction axis which are perpendicular to each other. In this embodiment, the first flat-top beam obtained by shaping the target needs to satisfy the characteristics of the flat-top beam on both the first direction axis and the second direction axis; that is, the light intensity of the first flat-top beam in the first direction axis and the light intensity in the second direction axis are required to exhibit characteristics of being uniformly distributed in the middle region and sharply falling in the edge region.
In this embodiment, the second flat-top beam obtained by shaping the second dodging phase satisfies the features of the flat-top beam on both the first direction axis and the second direction axis.
Determining a divergence angle theta of the first flat-top beam on the first direction axis to meet the target x And a divergence angle α satisfied by the second flat-top beam in the first direction axis. Then use the divergence angle θ x Dividing the first plane top beam by the divergence angle alpha, and then rounding up the obtained ratio to obtain the required copy number M of the second plane top beam on the first direction axis. Then combining the copy number M and the divergence angle alpha, and calculating to obtain the diffraction angle mu required by the second flat top light beam on the first direction axis after copying by adopting a semi-empirical formula x ：μ x ＝f(M,α)。
Similarly, the divergence angle theta of the first flat-top beam on the second direction axis is determined to meet the target y And a divergence angle β satisfied by the second flat-top beam in the second direction axis. Then use the divergence angle θ y Dividing the angle of divergence beta, and rounding up the obtained ratio to obtain the required copy number N of the second flat top light beam on the second direction axis. Then combining the copy number N and the divergence angle beta, and calculating the diffraction angle mu required by the copied second flat top light beam on the second direction axis by adopting the following formula y ：μ y ＝f(N,β)。
Then, based on the number of replications M required on the first direction axis, the diffraction angle μ required on the first direction axis x The number of replications N required in the second direction axis, the diffraction angle mu required in the second direction axis y Wavelength of second flat-top beam and micro-nano structure to be arranged And (3) the position distribution can construct a target image suitable for two-dimensional shaping. And then the target image is subjected to phase recovery, so that the copy splicing phase suitable for two-dimensional shaping can be obtained. And then combining the second dodging phase and the copying and splicing phase to generate and obtain the first flat-top beam for shaping the Gaussian beam to meet the two-dimensional shaping requirement.
In an embodiment, constructing a target image for describing that each of the replicated second flat top beams is spliced into the first flat top beam by the micro-nano structure of the distribution position based on the replication number, the diffraction angle, the wavelength of the second flat top beam and the position distribution of the micro-nano structure to be arranged on the superlens, includes:
calculating the sampling number of the micro-nano structures to be arranged based on the diameter of the light spot projected onto the superlens by the Gaussian beam and the sampling period of the micro-nano structures to be arranged; the sampling period and the sampling quantity together form position distribution;
calculating to obtain the arrangement period of the dot matrix to be arranged in the target image based on the copy number, the diffraction angle, the wavelength, the sampling period and the sampling number;
determining the target size of the target image according to the sampling period and the sampling number, and arranging a dot matrix in the image of the target size according to the copying number and the arrangement period to obtain the target image, wherein the dot matrix is composed of a plurality of dots with copying number, and the distance between adjacent dots in the dot matrix accords with the arrangement period.
It should be noted that, the position distribution of the micro-nano structure to be arranged on the superlens mainly comprises two parts: sampling period and sampling number of micro-nano structure to be arranged. The sampling period of the micro-nano structures to be arranged is mainly used for describing the distance between adjacent micro-nano structures; the number of samples of the micro-nano structure to be arranged is mainly used for describing the number of the micro-nano structures to be arranged in the corresponding dimension. It can be appreciated that after the sampling period and the sampling number are determined, the position distribution of the micro-nano structure to be arranged can be determined.
In this embodiment, for the micro-nano structure to be arranged, the corresponding sampling period is predetermined; therefore, to determine its location distribution, it is alsoThe number of samples thereof needs to be determined. Thus, in this embodiment, the diameter of the spot of the gaussian beam projected onto the superlens is determined to determine the range of modulated light required by the superlens. Specifically, for a light spot projected onto the superlens by a Gaussian beam, the maximum intensity of the light spot can be measured first, and then the intensity of the light spot is measured to be equal to the maximum intensityA double position; light intensity equal to maximum light intensity +.>The multiplied position is used as the boundary position of the light spot, and the light spot diameter can be determined by combining the boundary position of the light spot and the center position of the light spot.
Because the diameter of the light spot can be used for describing the range of the light rays required to be modulated by the superlens, the size of the target requirement of the superlens can be further determined based on the diameter of the light spot, and the sampling number of the micro-nano structures to be arranged can be determined by further combining the sampling period. The micro-nano structure can be arranged on the surface of the super lens facing the light source or on the surface of the super lens facing the light beam observation surface.
In addition, in the present embodiment, by arranging a lattice in the target image, the target image describes that the second flat-top light beam is copied and spliced into the first flat-top light beam by the micro-nano structure of the sampling period and the sampling number.
Specifically, the target size of the target image is determined according to the sampling period and the sampling number, so that the target image has the capability of describing the execution subject of the copy splicing process (i.e., the micro-nano structure of the sampling period and the sampling number). Then, according to the number of copies, a dot matrix made up of the number of dots of the copy is arranged in the image of the target size, so that the target image has the capability of describing the execution operation of the copy splicing process, but does not have the capability of describing the processing object and the processing result of the copy splicing process (that is, when only the number of dots of the dot matrix is determined, the target image has the capability of describing "copy and splice a certain light beam", but does not have the capability of describing "copy and splice what kind of light beam is copied and spliced at the bottom", and does not have the capability of describing "copy and splice what kind of light beam is obtained at the bottom".
Therefore, in order to make the target image further have the capability of describing the processing object and the processing result in the copying and splicing process, in this embodiment, the diffraction optical principle is applied, and the arrangement period of the lattice to be arranged in the target image is calculated based on the number of copies required for the second flat-top beam, the diffraction angle required for the second flat-top beam after copying, the wavelength of the second flat-top beam, the sampling period of the micro-nano structure to be arranged, and the sampling number. The arrangement period is mainly used for describing the distance between adjacent points in the dot matrix to be arranged; the distance between adjacent dots is mainly described by the number of unit distances between adjacent dots (for example, the target image is a matrix of 100×100 pixels, the unit distance of the matrix is the size of a single pixel, meanwhile, the dot matrix to be arranged is composed of 3*3 dots, and the arrangement period of the dot matrix to be arranged is 4. Then, a 3*3 dot matrix is arranged in the matrix of 100×100 pixels, and the interval between adjacent dots is controlled to be 4 pixels).
Then, in the image of the target size, a lattice made up of the number of dots of the copy is arranged in accordance with the number of copies, and the distance between adjacent dots in the lattice is controlled in accordance with the arrangement period, thereby obtaining a target image describing both the execution subject of the copy-splice process (i.e., the sampling period and the micro-nano structure of the number of samples), the execution act of the copy-splice process (i.e., copying and splicing a certain light beam), the processing object of the copy-splice process (i.e., the second flat-top light beam), and the processing result of the copy-splice process (i.e., the first flat-top light beam).
In an embodiment, the calculating the number of samples of the micro-nano structure to be arranged based on the diameter of the light spot projected onto the super lens by the gaussian beam and the sampling period of the micro-nano structure to be arranged includes:
calculating the size of the target requirement of the superlens based on the diameter of the light spot, wherein the size is positively correlated with the diameter of the light spot;
based on the ratio between the sampling period and the size, the number of samples is calculated.
In this embodiment, the size of the superlens target is positively correlated to the diameter of the spot of the gaussian beam incident on the surface. The larger the spot diameter, the larger the size of the superlens target requirements. After the size required by the superlens target is calculated, dividing the size by the sampling period of the micro-nano structure to be arranged, and performing upward rounding to obtain the sampling number of the micro-nano structure to be arranged.
In one embodiment, considering the light intensity distribution characteristics of the gaussian beam, in order for the superlens to be able to receive most of the energy of the gaussian beam to achieve higher optical efficiency, while the superlens is not oversized in size and cost, the size of the superlens target requirements is set to be greater than or equal to 1.3 times the diameter of the spot of the gaussian beam projected onto the superlens, and less than or equal to 1.7 times the diameter of the spot.
When the size of the superlens target requirement is less than 1.3 times the spot diameter, the optical efficiency of the superlens may be too low; when the target size of the superlens is larger than 1.7 times the spot diameter, the superlens can achieve high optical efficiency, but the size and cost are too high.
Preferably, in one embodiment, the size of the target requirements of the superlens is greater than or equal to 1.4 times the diameter of the spot of the gaussian beam projected onto the superlens and less than or equal to 1.6 times the diameter of the spot.
In an embodiment, calculating an arrangement period of a lattice to be arranged in the target image based on the number of copies, the diffraction angle, the wavelength, the sampling period, and the number of samples includes:
based on the wavelength and the sampling period, calculating to obtain the maximum diffraction angle which can be achieved by the second flat top light beam after copying under the conditions of the wavelength and the sampling period, wherein the maximum diffraction angle is positively correlated with the wavelength and inversely correlated with the sampling period;
and calculating an arrangement period based on the maximum diffraction angle, the replication number, the diffraction angle and the sampling number, wherein the arrangement period is inversely related to the maximum diffraction angle, inversely related to the replication number, positively related to the diffraction angle and positively related to the sampling number.
The inventors of the present application found from the analysis of the principle of diffraction optics that: 1. in the application, the arrangement period of the lattice to be arranged in the target image is mainly constrained by the following four factors, namely the maximum diffraction angle which can be achieved by the second flat-top beam after replication, the number of replications required by the second flat-top beam, the diffraction angle required by the second flat-top beam after replication and the sampling number of micro-nano structures to be arranged; specifically, the arrangement period of the lattice to be arranged is inversely related to the maximum diffraction angle which can be achieved by the second flat-top beam after replication, inversely related to the number of replications required by the second flat-top beam, positively related to the diffraction angle required by the second flat-top beam after replication, and positively related to the sampling number of the micro-nano structure to be arranged. 2. The maximum diffraction angle which can be achieved by the second flat-top beam after copying is mainly limited by the wavelength of the second flat-top beam and the sampling period of the micro-nano structure to be arranged; specifically, the maximum diffraction angle achieved by the second flat-top beam after replication is positively correlated with the wavelength of the second flat-top beam and inversely correlated with the sampling period of the micro-nano structure to be arranged.
In this embodiment, the maximum diffraction angle that can be achieved by the second flat-top beam after replication is calculated based on the wavelength of the second flat-top beam and the sampling period of the micro-nano structure to be arranged. And then calculating the arrangement period of the dot matrix to be arranged in the target image based on the maximum diffraction angle which can be achieved by the second flat-top beam after replication, the number of replications required by the second flat-top beam, the diffraction angle required by the second flat-top beam after replication and the sampling number of the micro-nano structure to be arranged.
In one embodiment, the divergence angle (half angle) of the gaussian beam emitted by the light source is 13 °, the wavelength of the gaussian beam is 850nm, and the distance between the light source and the phase modulation surface of the superlens is 1.4mm. The superlens is square, the sampling period of the micro-nano structure to be arranged on the superlens is 0.4 mu m, and the distance between the superlens and the light beam observation surface is 50cm.
In this embodiment, the flat-top beam obtained by shaping the target needs to satisfy the characteristics of the flat-top beam in both the horizontal direction and the vertical direction of the beam observation surface. Specifically, on the premise of ensuring high uniformity, the superlens needs to be capable of shaping the gaussian beam into a first flat-top beam with a divergence angle (half angle) of 60 ° both in the horizontal direction and in the vertical direction. If the obtained second dodging phase is directly adopted, the superlens can only shape the Gaussian beam into a second flat-top beam with the divergence angle (half angle) reaching 20 degrees in the horizontal direction and the vertical direction.
Recording the wavelength of the second flat-top beam as lambda; the diameter of a light spot projected by the Gaussian beam on the super lens is omega; the sampling period of the micro-nano structure to be arranged is P, and the sampling quantity in the horizontal direction is NP x The number of samples in the vertical direction is NP y The method comprises the steps of carrying out a first treatment on the surface of the The divergence angle of the first flat-top beam in the horizontal direction is theta x A divergence angle in the vertical direction of θ y The method comprises the steps of carrying out a first treatment on the surface of the The divergence angle of the second flat-top beam in the horizontal direction is alpha, and the divergence angle in the vertical direction is beta; the number of copies required by the second flat-top beam in the horizontal direction is M, and the number of copies required by the second flat-top beam in the vertical direction is N; the diffraction angle required by the second flat-top beam after copying in the horizontal direction is mu x The diffraction angle required by the second flat-top beam after copying in the vertical direction is mu y The method comprises the steps of carrying out a first treatment on the surface of the The arrangement period of the lattice to be arranged in the target image in the horizontal direction is np x The arrangement period in the vertical direction is np y 。
The wavelength lambda of the second flat-top beam is the same as the wavelength of the Gaussian beam and is 850nm; the diameter omega of the light spot is 646 mu m; the sampling period P is 0.4 μm; divergence angle theta of first flat-top beam in horizontal direction x At 60 deg., divergence angle theta in the vertical direction y 60 °; the divergence angle α of the second flat-top beam in the horizontal direction is 20 °, and the divergence angle β in the vertical direction is 20 °. M, N, mu can then be calculated using the formula x 、μ y 、NP x 、NP y ：
μ x ＝f(M,α)＝f(3,20°)＝40°
μ y ＝f(N,β)＝f(3,20°)＝40°
Then, based on the wavelength lambda of the second flat-top beam and the sampling period P of the micro-nano structure to be arranged, the maximum diffraction angle which can be achieved by the second flat-top beam after copying in the horizontal direction can be calculated; based on the maximum diffraction angle achieved by the second flat-top beam after copying in the horizontal direction, the required copy quantity M in the horizontal direction, and the actually required diffraction angle mu in the horizontal direction x Number of samples NP of micro-nano structure to be aligned in horizontal direction x The arrangement period np of the lattice to be arranged in the horizontal direction can be calculated x . Calculated np x 957.
Similarly, based on the wavelength lambda of the second flat-top beam and the sampling period P of the micro-nano structure to be arranged, the maximum diffraction angle which can be achieved by the second flat-top beam after copying in the vertical direction can be calculated; based on the maximum diffraction angle achieved by the second flat-top beam after copying in the vertical direction, the required copy number N in the vertical direction, and the actually required diffraction angle mu in the vertical direction y Number of samples NP of micro-nano structure to be aligned in horizontal direction y The arrangement period np of the lattice to be arranged in the horizontal direction can be calculated y . Meter with a meter bodyThe calculated np y 957.
Then the target image is set as NP x *NP y A matrix of size, i.e., 2423 x 2423. Then a lattice of size M x N, i.e. a lattice of size 3*3, is set in the matrix. The value of each point in the lattice is set to be 1, and the values of the points except the lattice in the matrix are set to be 0; the dots in the dot matrix have an arrangement period of np in the horizontal direction x The arrangement period in the vertical direction is np y The method comprises the steps of carrying out a first treatment on the surface of the That is, the dots in the dot matrix have an arrangement period of 957 in the horizontal direction and an arrangement period of 957 in the vertical direction. Wherein, the numerical value of the point in the matrix corresponding to the target image represents the normalized light intensity of the corresponding pixel; if the value of a certain point in the target image is set to be 1, the normalized light intensity representing the corresponding pixel is set to be the highest value of 1; otherwise, if the value of a certain point in the target image is set to 0, the normalized light intensity representing the corresponding pixel is set to the lowest value of 0.
After the target image is constructed, the GS algorithm is applied to carry out phase recovery on the target image, and the copy splicing phase is obtained. And combining the second dodging phase and the replication and splicing phase to obtain the target phase required by the micro-nano structure to be arranged on the superlens. After the target phase is determined, a micro-nano structure capable of providing the target phase can be screened out by searching a pre-established micro-nano database, and then the screened micro-nano structure is arranged, so that the layout of the superlens is designed; and then generating a superlens for shaping the Gaussian beam into a first flat-top beam with the divergence angle (half angle) reaching 60 degrees in the horizontal direction and the vertical direction according to the layout obtained by design.
Fig. 4 shows a schematic diagram in this embodiment of copying and splicing the second flat-top beam into the first flat-top beam reflected on the beam viewing surface. Referring to fig. 4, the super lens generated in this embodiment is equivalent to that the second flat-top beam is duplicated 3 copies in both the horizontal direction and the vertical direction, and then the first flat-top beam is spliced.
Fig. 5 shows a schematic diagram of the distribution of the two-dimensional normalized light intensity of the shaped first flat-top beam on the beam observation surface in the present embodiment. Fig. 6 shows a schematic diagram of the distribution of the one-dimensional normalized light intensity of the first flat-top beam shaped in the present embodiment in the horizontal direction. The horizontal axis of fig. 6 represents a horizontal coordinate axis of the light beam observation surface, the origin of which is the intersection point of the optical axis and the light beam observation surface, and the unit of which is μm; the vertical axis of fig. 6 represents the normalized intensity of the light beam.
The radius of the observation area used for determining the light intensity uniformity of the first flat-top beam in the horizontal direction in the light beam observation surface is denoted as R. Since the divergence angle of the first flat-top beam in the horizontal direction is 60 °, the distance between the superlens and the beam observation surface is 50cm, and the size of the superlens is negligible compared to the distance between the superlens and the beam observation surface, r=50 cm×tan (60 °), that is, R is about 8.66×10, can be determined by applying the trigonometric theorem 5 μm. That is, should be + -8.66×10 in the horizontal direction 5 In the observation area of μm, the light intensity uniformity F of the first flat-top beam having a divergence angle of 60 ° in the horizontal direction was determined. The calculation formula of the light intensity uniformity F is as follows:
wherein I is max For maximum normalized light intensity of the observation area, I min Is the minimum normalized light intensity within the observation area.
The intensity uniformity F calculated according to fig. 6 was 98.74%. That is, the first flat-top beam shaped in this embodiment has a light intensity uniformity of 98.74% in the range of 60 ° of divergence angle. Therefore, the first flat-top beam shaped by the embodiment has high uniformity and large divergence angle. Furthermore, according to the calculation of fig. 6, the optical efficiency of the optical system corresponding to the super lens reaches 83.22%; therefore, the first flat-top beam shaped by the embodiment not only has high uniformity and large divergence angle, but also has excellent optical efficiency.
Fig. 7 shows a block diagram of a superlens generating device for dodging as provided by the present application. The super lens to be generated is used for shaping the Gaussian beam into a first flat-top beam, and the first flat-top beam target meets a first divergence angle and expected uniformity; referring to fig. 7, the apparatus includes:
A second dodging phase acquisition module 210 configured to acquire a second dodging phase for shaping the gaussian beam into a second flat-top beam, wherein the second flat-top beam satisfies a second divergence angle, which is smaller than the first divergence angle, and an expected uniformity;
the replication and splicing parameter obtaining module 220 is configured to obtain, based on the first divergence angle and the second divergence angle, the number of replications required for replicating and splicing to obtain the first flat-top beam, the number of replications required for the second flat-top beam, and the diffraction angle required for the second flat-top beam after replication;
a target image construction module 230 configured to construct a target image describing copying and splicing of the second flat-top beam into the first flat-top beam by the micro-nano structure of the position distribution based on the copy number, the diffraction angle, the wavelength of the second flat-top beam, and the position distribution of the micro-nano structure to be arranged on the superlens;
the replication and splicing phase recovery module 240 is configured to perform phase recovery on the target image to obtain a replication and splicing phase required to be provided by the micro-nano structure with the distributed positions;
the superlens generation module 250 is configured to generate a superlens for shaping the gaussian beam into the first flat-top beam based on the second dodging phase and the copy-splice phase.
In an exemplary embodiment of the present application, the copy splice parameter acquisition module 220 is configured to:
calculating to obtain the copy number based on the ratio between the first divergence angle and the second divergence angle;
based on the number of replicas and the second divergence angle, a diffraction angle is calculated, wherein the diffraction angle is positively correlated with the number of replicas and with the second divergence angle.
In an exemplary embodiment of the present application, a two-dimensional coordinate system constituting the light beam observation plane includes a first direction axis and a second direction axis perpendicular to each other; the number of replications comprises the number of replications required on the first direction axis and the number of replications on the second direction axis, and the diffraction angle comprises the diffraction angle required on the first direction axis and the diffraction angle required on the second direction axis.
In an exemplary embodiment of the present application, the target image construction module 230 is configured to:
calculating the sampling number of the micro-nano structures to be arranged based on the diameter of the light spot projected onto the superlens by the Gaussian beam and the sampling period of the micro-nano structures to be arranged; the sampling period and the sampling quantity together form position distribution;
calculating to obtain the arrangement period of the dot matrix to be arranged in the target image based on the copy number, the diffraction angle, the wavelength, the sampling period and the sampling number;
Determining the target size of the target image according to the sampling period and the sampling number, and arranging a dot matrix in the image of the target size according to the copying number and the arrangement period to obtain the target image, wherein the dot matrix is composed of a plurality of dots with copying number, and the distance between adjacent dots in the dot matrix accords with the arrangement period.
In an exemplary embodiment of the present application, the target image construction module 230 is configured to:
calculating the size of the super lens target requirement based on the spot diameter, wherein the size is positively correlated with the spot diameter;
based on the ratio between the sampling period and the size, the number of samples is calculated.
In an exemplary embodiment of the present application, the size of the superlens target requirement is greater than or equal to 1.3 times the spot diameter and less than or equal to 1.7 times the spot diameter.
In an exemplary embodiment of the present application, the target image construction module 230 is configured to:
based on the wavelength and the sampling period, calculating to obtain the maximum diffraction angle which can be achieved by the second flat top light beam after copying under the conditions of the wavelength and the sampling period, wherein the maximum diffraction angle is positively correlated with the wavelength and inversely correlated with the sampling period;
and calculating an arrangement period based on the maximum diffraction angle, the replication number, the diffraction angle and the sampling number, wherein the arrangement period is inversely related to the maximum diffraction angle, inversely related to the replication number, positively related to the diffraction angle and positively related to the sampling number.
The application also provides a superlens for homogenizing light, which is generated by adopting the method provided by any one of the method embodiments. Referring to the method provided in any of the foregoing method embodiments, a specific generation process of the superlens is not described herein.
The application also provides a dodging system. Fig. 8 shows a layout diagram of the dodging system in an embodiment of the present application. Referring to fig. 8, the dodging system provided in the present application includes: a light source 1 for diverging a gaussian beam, and a superlens 2 for homogenizing the gaussian beam. The superlens 2 can be used to make the divergence angle theta of the light emitted by the light source 1 0 Is shaped to have a divergence angle theta 1 Is a first flat-top beam of (2); the first flat-top beam simultaneously satisfies high light uniformity and large divergence angle. The superlens 2 is produced by the method provided by any of the method embodiments described above. Referring to the method provided in any of the above method embodiments, a specific generation process of the superlens 2 is not described herein.
The application also provides electronic equipment. The electronic device is in the form of a general purpose computing device. Components of an electronic device may include, but are not limited to: at least one processing unit, at least one memory unit, a bus connecting the different system components, including the memory unit and the processing unit.
Wherein the storage unit stores program code executable by the processing unit such that the processing unit performs the steps of the exemplary implementations described in the various exemplary embodiments above. For example, the processing unit may perform the various steps as shown in fig. 1.
The memory unit may include readable media in the form of volatile memory units, such as Random Access Memory (RAM) and/or cache memory units, and may further include Read Only Memory (ROM).
The storage unit may also include a program/utility having a set (at least one) of program modules including, but not limited to: an operating system, one or more application programs, other program modules, and program data, each or some combination of which may include an implementation of a network environment.
The bus may be one or more of several types of bus structures including a memory unit bus or memory unit controller, a peripheral bus, an accelerated graphics port, a processing unit, or a local bus using any of a variety of bus architectures.
The present application also provides a computer readable storage medium having computer readable instructions stored thereon, which when executed by a processing unit of a computer, cause the computer to perform the method provided by any of the embodiments described above.
Other embodiments of the present application will be apparent to those skilled in the art from consideration of the specification and practice of the invention disclosed herein. This application is intended to cover any variations, uses, or adaptations of the application following, in general, the principles of the application and including such departures from the present disclosure as come within known or customary practice within the art to which the application pertains. It is intended that the specification and examples be considered as exemplary only, with a true scope and spirit of the application being indicated by the following claims.

Claims (12)

1. The super-lens generation method for homogenizing light is characterized in that the super-lens to be generated is used for shaping a Gaussian beam into a first flat-top beam, and the first flat-top beam target meets a first divergence angle and expected uniformity; the method comprises the following steps:
obtaining a second dodging phase for shaping the gaussian beam into a second flat-top beam, wherein the second flat-top beam satisfies a second divergence angle and an expected uniformity, the second divergence angle being smaller than the first divergence angle;
acquiring the number of copies required by the second flat-top beam and the diffraction angle required by the second flat-top beam after copying based on the first divergence angle and the second divergence angle to copy and splice the first flat-top beam;
Constructing a target image for describing the second flat-top light beam to be copied and spliced into the first flat-top light beam by the micro-nano structure of the position distribution based on the copying quantity, the diffraction angle, the wavelength of the second flat-top light beam and the position distribution of the micro-nano structure to be arranged on the super lens;
performing phase recovery on the target image to obtain a replication splicing phase required by the micro-nano structure with the position distribution;
and generating a superlens for shaping the Gaussian beam into the first flat-top beam based on the second dodging phase and the replication and splicing phase.
2. The method of claim 1, wherein obtaining the number of replications required for replicating and stitching the first flat-top beam, the number of replications required for the second flat-top beam, and the diffraction angle required for the second flat-top beam after replication based on the first divergence angle and the second divergence angle, comprises:
calculating the copy number based on the ratio between the first divergence angle and the second divergence angle;
and calculating the diffraction angle based on the replication quantity and the second divergence angle, wherein the diffraction angle is positively correlated with the replication quantity and is positively correlated with the second divergence angle.
3. The method of claim 1, wherein the two-dimensional coordinate system constituting the light beam viewing surface includes a first direction axis and a second direction axis perpendicular to each other; the number of replications comprises a number of replications required on the first direction axis and a number of replications on the second direction axis, and the diffraction angle comprises a diffraction angle required on the first direction axis and a diffraction angle required on the second direction axis.
4. The method according to claim 1, wherein constructing a target image describing the splicing of the respective post-copy second flat-top light beams into the first flat-top light beam by the micro-nano structure of the distribution position based on the number of copies, the diffraction angle, the wavelength of the second flat-top light beam, and the position distribution of the micro-nano structure to be arranged on the superlens, comprises:
calculating the sampling quantity of the micro-nano structure to be arranged based on the diameter of the light spot projected onto the super lens by the Gaussian beam and the sampling period of the micro-nano structure to be arranged; the sampling period and the sampling number together form the position distribution;
calculating an arrangement period of a dot matrix to be arranged in the target image based on the copy number, the diffraction angle, the wavelength, the sampling period and the sampling number;
And determining the target size of the target image according to the sampling period and the sampling number, and arranging a dot matrix in the image with the target size according to the copying number and the arrangement period to obtain the target image, wherein the dot matrix is composed of the copying number of dots, and the distance between adjacent dots in the dot matrix accords with the arrangement period.
5. The method of claim 4, wherein calculating the number of samples of the micro-nano structure to be arranged based on the spot diameter of the gaussian beam projected onto the superlens and the sampling period of the micro-nano structure to be arranged comprises:
calculating the size of the super-lens target requirement based on the light spot diameter, wherein the size is positively correlated with the light spot diameter;
the number of samples is calculated based on a ratio between the sampling period and the size.
6. The method of claim 5, wherein the dimension is greater than or equal to 1.3 times the spot diameter and less than or equal to 1.7 times the spot diameter.
7. The method according to claim 4, wherein calculating an arrangement period of the lattice to be arranged in the target image based on the number of copies, the diffraction angle, the wavelength, the sampling period, and the number of samples, comprises:
Based on the wavelength and the sampling period, calculating to obtain a maximum diffraction angle which can be achieved by the second flat-top beam after replication under the conditions of the wavelength and the sampling period, wherein the maximum diffraction angle is positively correlated with the wavelength and inversely correlated with the sampling period;
and calculating the arrangement period based on the maximum diffraction angle, the replication number, the diffraction angle and the sampling number, wherein the arrangement period is inversely related to the maximum diffraction angle, inversely related to the replication number, positively related to the diffraction angle and positively related to the sampling number.
8. A superlens generating device for homogenizing light, characterized in that the superlens to be generated is used for shaping a gaussian beam into a first flat-top beam, the first flat-top beam target meeting a first divergence angle and an expected uniformity; the device comprises:
a second dodging phase acquisition module configured to acquire a second dodging phase for shaping the gaussian beam into a second flat-top beam, wherein the second flat-top beam satisfies a second divergence angle, which is smaller than the first divergence angle, and an expected uniformity;
The replication and splicing parameter acquisition module is configured to acquire the number of replications required by the second flat-top beam and the diffraction angle required by the second flat-top beam after replication for replication and splicing to obtain the first flat-top beam based on the first divergence angle and the second divergence angle;
a target image construction module configured to construct a target image describing copying and splicing of the second flat-top light beam into the first flat-top light beam by the micro-nano structure of the position distribution based on the copy number, the diffraction angle, the wavelength of the second flat-top light beam and the position distribution of the micro-nano structure to be arranged on the super lens;
the replication and splicing phase recovery module is configured to carry out phase recovery on the target image to obtain replication and splicing phases required by the micro-nano structure with the distributed positions;
and the super-lens generating module is configured to generate a super-lens for shaping the Gaussian beam into the first flat-top beam based on the second dodging phase and the copying and splicing phase.
9. A superlens for homogenizing light, characterized in that the superlens is produced by the method of any of the preceding claims 1-7.
10. A dodging system, the dodging system comprising: a light source for emitting a gaussian beam, a superlens for homogenizing the gaussian beam; the superlens produced by the method of any of claims 1-7.
11. An electronic device, comprising:
one or more processing units;
a storage unit for storing one or more programs that, when executed by the one or more processing units, cause the electronic device to implement the method of any of claims 1-7.
12. A computer readable storage medium having stored thereon computer readable instructions which, when executed by a processing unit of a computer, cause the computer to perform the method of any of claims 1 to 7.
CN202311665263.XA 2023-12-05 2023-12-05 Super-lens generation method and device for dodging, super-lens and dodging system Pending CN117590586A (en)

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