CN117550787B - High-stability preparation system based on high-purity low-hydroxyl quartz glass - Google Patents
High-stability preparation system based on high-purity low-hydroxyl quartz glass Download PDFInfo
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- 238000002360 preparation method Methods 0.000 title abstract description 17
- 239000011521 glass Substances 0.000 claims abstract description 130
- 230000008021 deposition Effects 0.000 claims abstract description 64
- 238000004519 manufacturing process Methods 0.000 claims abstract description 49
- 238000007599 discharging Methods 0.000 claims abstract description 34
- 238000006243 chemical reaction Methods 0.000 claims abstract description 32
- 239000002994 raw material Substances 0.000 claims abstract description 17
- 238000001514 detection method Methods 0.000 claims abstract description 10
- 230000003746 surface roughness Effects 0.000 claims abstract description 7
- 230000001681 protective effect Effects 0.000 claims description 29
- 230000015572 biosynthetic process Effects 0.000 claims description 22
- 238000003786 synthesis reaction Methods 0.000 claims description 22
- -1 hydroxyl quartz glass Chemical compound 0.000 claims description 8
- 238000002156 mixing Methods 0.000 claims description 8
- 238000005070 sampling Methods 0.000 claims description 5
- 230000002194 synthesizing effect Effects 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 63
- 230000006872 improvement Effects 0.000 abstract description 9
- 239000007789 gas Substances 0.000 description 57
- 235000012239 silicon dioxide Nutrition 0.000 description 15
- 239000010453 quartz Substances 0.000 description 13
- 238000005516 engineering process Methods 0.000 description 11
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 10
- 239000001301 oxygen Substances 0.000 description 10
- 229910052760 oxygen Inorganic materials 0.000 description 10
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- 238000010586 diagram Methods 0.000 description 8
- 238000000034 method Methods 0.000 description 7
- 230000008569 process Effects 0.000 description 7
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 6
- 238000005260 corrosion Methods 0.000 description 6
- 230000007797 corrosion Effects 0.000 description 6
- 239000007788 liquid Substances 0.000 description 6
- 239000005049 silicon tetrachloride Substances 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 5
- 229910052786 argon Inorganic materials 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 3
- 239000002893 slag Substances 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 239000012159 carrier gas Substances 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000010574 gas phase reaction Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012544 monitoring process Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 108700041286 delta Proteins 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- 238000010583 slow cooling Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000002912 waste gas Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
Abstract
The invention relates to the technical field of glass manufacturing, in particular to a high-stability preparation system based on high-purity low-hydroxyl quartz glass, which comprises the following components: a feed module for feeding the reaction raw materials; a reaction module comprising a deposition furnace, a lamp torch and a base rod; the detection module comprises a roughness sensor, a Zygo interferometer, a transparency detector and an ultrasonic detector; the control module is used for determining the operation state of the lamp torch according to the wave front error of the glass block, or determining a first discharging strategy of the feeder according to the wave front error of the glass block and the transparency of the glass block, determining the temperature mode of the deposition furnace according to the transparency of the glass block and the radial average bubble length of the glass block, and re-determining a second discharging strategy of the feeder based on the inner surface roughness of the deposition furnace after the first discharging strategy of the feeder is determined. The invention realizes the improvement of the production quality and the production stability of the quartz glass.
Description
Technical Field
The invention relates to the technical field of glass manufacturing, in particular to a high-stability preparation system based on high-purity low-hydroxyl quartz glass.
Background
Quartz glass is an important optical and electronic material with excellent transparency, thermal stability and chemical stability. High-purity low-hydroxyl quartz glass is widely used in the fields of optical fibers, optical windows, semiconductors, laser technology and the like due to its low hydroxyl content and high transparency. Conventional methods of quartz glass production typically involve high temperature melting and slow cooling, which may result in higher hydroxyl content and poorer uniformity.
Chinese patent publication No.: CN219217830U discloses a high purity low hydroxyl quartz glass feeding device comprising: comprises a deposition furnace, a foundation rod, a target surface, a lamp torch and a waste discharge port; the base rod is erected in the deposition furnace, the target surface is arranged at the top end of the base rod, the lamp torches are axially arranged at the top end of the deposition furnace relative to the target surface, and at least one waste discharge port is arranged at the bottom end of the deposition furnace; the device also comprises a silicon tetrachloride access pipe, a feeding cabinet, a silicon tetrachloride discharge pipe, an oxygen preheating pipe and a feeder; the inlet of the feed bin is communicated with the outlet of the silicon tetrachloride access pipe, the outlet of the feed bin is communicated with the silicon tetrachloride discharge pipe, one branch outlet of the oxygen preheating pipe is connected with the silicon tetrachloride discharge pipe and then is introduced into the deposition furnace through the feeder, and the other branch outlet of the oxygen preheating pipe is communicated with the air inlet of the feeder; it follows that the high purity low hydroxyl quartz glass feed device has the following problems: the lack of uniformity determination of the glass mass reflected by the wavefront error for the synthetic silica glass mass leads to a decrease in the production quality and production stability of the silica glass.
Disclosure of Invention
Therefore, the invention provides a high-stability preparation system based on high-purity low-hydroxyl quartz glass, which is used for solving the problem that the preparation quality and production stability of the quartz glass are reduced due to the lack of uniformity judgment of a glass block reflected by a wavefront error of a synthetic quartz glass block in the prior art.
In order to achieve the above object, the present invention provides a high stability preparation system based on high purity low hydroxyl quartz glass, comprising: the feeding module comprises a feeding pipe for connecting the reaction raw materials, a feeder connected with the feeding pipe for mixing the reaction raw materials and the first protective gas, and an introducing pipe connected with the feeder for connecting the first protective gas; the reaction module is connected with the feeding module and is used for synthesizing reaction raw materials into glass blocks, and comprises a deposition furnace arranged at the output end of the feeder and used for providing a synthesis place and a lamp torch arranged above the deposition furnace and used for providing a synthetic heat source of the glass blocks; the detection module is partially connected with the reaction module and comprises a roughness sensor, a Zygo interferometer, a transparency detector and an ultrasonic detector, wherein the roughness sensor is arranged below the lamp torch and used for acquiring the roughness of the inner surface of the deposition furnace, the Zygo interferometer is arranged at the output end of the reaction module and used for detecting the wavefront error of a glass block, the transparency detector is arranged at the output end of the Zygo interferometer and used for detecting the transparency of the glass block, and the ultrasonic detector is arranged at the output end of the transparency detector and used for detecting the bubble length of the glass block in the diameter direction; the control module is respectively connected with the feeding module, the reaction module and the detection module and is used for determining the operation state of a lamp torch according to the wave front error of the glass block, or determining a first discharging strategy of the feeder according to the wave front error of the glass block and the transparency of the glass block, determining the temperature mode of the deposition furnace according to the transparency of the glass block and the average bubble length in the radial direction of the glass block, and re-determining a second discharging strategy of the feeder based on the inner surface roughness of the deposition furnace after the first discharging strategy is executed; wherein the first and second discharging strategies are different from each other in terms of flow rate of the first shielding gas.
Further, the control module judges the uniformity of the glass block according to the wavefront error of the glass block obtained by the Zygo interferometer,
and if the wavefront error of the glass block is larger than a preset second error, the control module judges that the uniformity of the glass block is lower than an allowable range and controls the lamp torch to operate in the running state.
Further, the operating state of the torch is that the control module controls the input power of the torch to be input with a first input power, and the first input power is determined by the difference value between the wavefront error of the glass block and the preset second error.
Further, the dispenser comprises:
the electric valve is arranged at the output end of the protective gas inlet pipe and used for controlling the flow of the protective gas;
and the extension pipe is connected with the electric valve and is used for mixing the working gas and the protective gas.
Further, if the wavefront error of the glass block is greater than a preset first error and less than or equal to the preset second error, the control module acquires the transparency of the glass block;
and if the transparency of the glass block is smaller than the preset first transparency, the control module controls the first protection gas to discharge according to the first discharging strategy.
Further, the first discharging strategy is that the control module controls the first protection gas to discharge at a first corresponding flow rate, and the first corresponding flow rate is determined by a difference value between the preset first transparency and the transparency of the glass block.
Further, if the transparency of the glass block is greater than or equal to the preset first transparency and less than the preset second transparency, the control module obtains the bubble lengths of the glass block in the diameter direction of the plurality of sampling sections and calculates the average bubble length of the glass block in the radial direction;
and if the average bubble length in the radial direction of the glass block is greater than the preset length, the control module controls the deposition furnace to operate in the temperature mode.
Further, the temperature mode of the deposition furnace is that the control module controls the deposition furnace to operate at a first corresponding temperature, and the first corresponding temperature is determined by a difference value between the average bubble length in the radial direction of the glass block and a preset length.
Further, after the first discharging strategy is determined, the control module controls the roughness sensor to acquire the roughness of the inner surface of the deposition furnace,
and if the roughness of the inner surface of the deposition furnace is larger than the preset roughness, the control module controls the first protection gas to be discharged by the second discharging strategy.
Further, the second discharging strategy is that the control module controls the first protection gas to discharge at a second corresponding flow rate, wherein the second corresponding flow rate is determined by a difference value between the roughness of the inner surface of the deposition furnace and a preset roughness.
Compared with the prior art, the system has the beneficial effects that the system utilizes the plasma synthesis technology to prepare the high-purity low-hydroxyl quartz glass, the synthesis process of the quartz glass can be precisely controlled by optimizing plasma parameters, the production period can be shortened, the production efficiency can be improved, an online monitoring system and an automatic control system are adopted, the product quality and the production efficiency are ensured, the influence of human factors on the product quality is reduced, and the improvement of the production quality and the production stability of the quartz glass is realized.
According to the system, the quartz glass is synthesized by utilizing a plasma synthesis technology, and in the preparation process, due to the non-uniformity of raw material mixing, when the quartz glass is synthesized according to the original power, a non-uniform chemical reaction occurs, so that the non-uniformity of component distribution is caused, the uniformity of the quartz glass is further influenced, the fluidity of the formed glass liquid is improved by increasing the input power of a lamp torch, the diffusion capacity of the glass liquid is further improved, the uniformity of the formed glass block is improved, and the improvement of the production quality and the production stability of the quartz glass is further realized.
According to the system, the quartz glass is synthesized by utilizing a plasma synthesis technology, and the generated glass liquid has tiny component differences, such as bubbles or other inclusions, caused by the non-uniformity of gas phase reaction in raw materials in the preparation process, so that the structure of the quartz glass is changed, the transparency is reduced, the optical effect cannot meet the requirements, and the ideal chemical reaction condition in the synthesis process is maintained by reducing the flow of protective gas, so that the improvement of the production quality and the production stability of the quartz glass is further realized.
According to the system, the quartz glass is synthesized by utilizing a plasma synthesis technology, and the reactive gas is not completely removed in the preparation process, so that bubbles appear in the quartz glass synthesis process, the hydroxyl content of the quartz glass is beyond the allowable range, the glass quality is reduced, the gas circulation is accelerated by increasing the temperature of a deposition furnace, and the improvement of the production quality and the production stability of the quartz glass is further realized.
According to the system, the quartz glass is synthesized by utilizing a plasma synthesis technology, the transparency of the glass block is improved due to the fact that the flow of the protective gas is reduced in the preparation process, the quartz glass block is continuously produced under the condition of low flow of the protective gas, corrosion is caused to the inner surface of a deposition furnace by corrosive gas such as HCL gas, bubbles of the glass block are increased and the transparency of the glass block is reduced due to the fact that slag generated by corrosion falls on the glass block, and even feeding of the protective gas is achieved through secondary adjustment of the protective gas in the production process, so that the production quality and the production stability of the quartz glass are further improved.
Drawings
FIG. 1 is a schematic diagram showing the overall structure of a high-stability manufacturing system based on high-purity low-hydroxyl quartz glass according to an embodiment of the present invention;
FIG. 2 is a schematic diagram showing a specific structure of a feed module of a high-stability manufacturing system based on high-purity low-hydroxyl quartz glass according to an embodiment of the present invention;
FIG. 3 is a block diagram showing the overall structure of a high-stability manufacturing system based on high-purity low-hydroxyl quartz glass according to an embodiment of the present invention;
FIG. 4 is a block diagram showing a specific structure of a detection module of a high-stability manufacturing system based on high-purity low-hydroxyl quartz glass according to an embodiment of the present invention;
fig. 5 is a cross-sectional view of a deposition furnace of a high stability manufacturing system based on high purity low hydroxyl quartz glass according to an embodiment of the present invention.
Legend: the protective gas introducing pipe 1, the feeding pipe 2, the quartz substrate 3, the base rod 4, the mechanical arm 5, the conveying belt 6, the Zygo interferometer 7, the ultrasonic detector 8, the transparency detector 9, the exhaust port 10, the deposition furnace 11, the lamp torch 12, the feeder 13, the electric valve 14, the extension pipe 15, the electric rail 16, the roughness sensor 17, the glass processing module 18 and the glass block 19.
Detailed Description
In order that the objects and advantages of the invention will become more apparent, the invention will be further described with reference to the following examples; it should be understood that the specific embodiments described herein are for purposes of illustration only and are not intended to limit the scope of the invention.
Preferred embodiments of the present invention are described below with reference to the accompanying drawings. It should be understood by those skilled in the art that these embodiments are merely for explaining the technical principles of the present invention, and are not intended to limit the scope of the present invention.
Fig. 1, fig. 2, fig. 3 and fig. 4 show an overall schematic diagram of a high-stability preparation system based on high-purity low-hydroxyl quartz glass, a specific schematic diagram of a feeding module, an overall schematic diagram, a specific schematic diagram of a detection module and a cross-sectional view of a deposition furnace according to the present invention. The invention discloses a high-stability preparation system based on high-purity low-hydroxyl quartz glass, which comprises the following components:
the feeding module comprises a feeding pipe for connecting the reaction raw materials, a feeder connected with the feeding pipe for mixing the reaction raw materials and the first protective gas, and an introducing pipe connected with the feeder for connecting the first protective gas;
the reaction module is connected with the feeding module and is used for synthesizing reaction raw materials into quartz glass blocks, and comprises a deposition furnace arranged at the output end of the feeder and used for providing a synthesis place and a lamp torch arranged above the deposition furnace and used for providing a synthesis heat source of the quartz glass blocks;
the detection module is partially connected with the reaction module and comprises a roughness sensor, a Zygo interferometer, a transparency detector and an ultrasonic detector, wherein the roughness sensor is arranged below the lamp torch and used for acquiring the roughness of the inner surface of the deposition furnace, the Zygo interferometer is arranged at the output end of the reaction module and used for detecting the wavefront error of a glass block, the transparency detector is arranged at the output end of the Zygo interferometer and used for detecting the transparency of the glass block, and the ultrasonic detector is arranged at the output end of the transparency detector and used for detecting the bubble length of the glass block in the diameter direction;
a control module, which is respectively connected with the feeding module, the reaction module and the detection module and is used for determining the operation state of the lamp torch according to the wave front error of the glass block or determining the first discharging strategy of the feeder according to the wave front error of the glass block and the transparency of the glass block,
and determining the temperature mode of the deposition furnace according to the transparency of the glass block and the average bubble length in the radial direction of the glass block,
and re-determining a second discharging strategy of the feeder based on the inner surface roughness of the deposition furnace after the first discharging strategy is executed;
wherein the first and second discharging strategies are different from each other in terms of flow rate of the first shielding gas.
Specifically, the reaction raw material is a mixture of silicon tetrachloride and oxygen.
Specifically, the reaction module further includes:
a base rod disposed below the torch to support the quartz glass block;
a quartz substrate disposed above the base shaft for determining a stacking diameter of a quartz glass block;
and the exhaust port is arranged at the lower end of the deposition furnace and is used for exhausting waste gas generated by synthesis.
Specifically, the system further comprises a glass processing module (not shown) disposed at the output end of the reaction module, for annealing, cooling and post-processing the generated glass block.
In particular, the post-treatment includes cleaning, cutting, and polishing.
Specifically, the system further comprises a blanking module, wherein the blanking module further comprises:
the conveying belt is arranged at the output end of the glass processing module and is used for conveying glass blocks;
and the mechanical arm is arranged at the output end of the reaction module and used for discharging the synthesized glass block to the glass processing module and moving the post-processed glass block to the conveying belt.
Specifically, a feeder in the feeding module is embedded at the top of a deposition furnace in the reaction module, an induction coupling plasma flame is used as a heat source, a mixed gas of air and chlorine is used as plasma ionization gas, a silicon-containing compound is used as a raw material, and a mixed gas of oxygen and ammonia is used as a carrier gas, wherein the carrier gas carries gasified silicon-containing raw material to be introduced into the deposition furnace through the feeder to react to generate silicon dioxide particles, the silicon dioxide particles are deposited on a quartz substrate, and the height of the quartz substrate is reduced along with the growth of a deposition surface so as to keep the height of the deposition surface unchanged, and a glass block is gradually formed.
Specifically, the blanking module conveys the glass block after post-treatment to a detection end of the Zygo interferometer to detect the wave front error of the glass block, if the wave front error of the glass block is smaller than a preset first error, the blanking module outputs the glass block with qualified uniformity, if the wave front error of the glass block is larger than the preset first error and smaller than or equal to the preset second error, the control module controls the blanking module to convey the glass block to a conveying end of the transparency detector to acquire the transparency of the glass block, if the wave front error of the glass block is larger than the preset second error, the control module controls the input power of the lamp torch to be input with the first input power, and the control module can determine the first blanking strategy of the feeder and the working mode of the temperature mode of the deposition furnace by analogy;
after the first discharging strategy of the feeder is determined, the flow rate of the first protective gas is reduced, so that the corrosion degree of corrosive gas in the deposition furnace to the inner wall of the deposition furnace is increased due to the long-term synthetic quartz glass block, the roughness sensor is moved by the electric track arranged on the foundation rod to acquire the roughness of the inner surface of the deposition furnace, and the second discharging strategy of the feeder is determined when the roughness of the inner surface of the deposition furnace is not in accordance with the requirement so as to avoid the influence of slag generated by corrosion on the transparency of the glass block on the inner wall of the deposition furnace.
Compared with the prior art, the system has the beneficial effects that the system utilizes the plasma synthesis technology to prepare the high-purity low-hydroxyl quartz glass, the synthesis process of the quartz glass can be precisely controlled by optimizing plasma parameters, the production period can be shortened, the production efficiency can be improved, an online monitoring system and an automatic control system are adopted, the product quality and the production efficiency are ensured, the influence of human factors on the product quality is reduced, and the improvement of the production quality and the production stability of the quartz glass is realized.
In particular, the first shielding gas may be oxygen.
Specifically, the torch includes:
the inner quartz tube is used for accessing working gas;
the middle-layer quartz tube is sleeved on the inner-layer quartz tube and is used for accessing a second protective gas;
the outer layer quartz tube is sleeved on the middle layer quartz tube and is used for accessing third protective gas;
a working coil connected with the outer quartz tube for providing ionization energy required by the working gas to become plasma;
wherein the outer layer quartz tube, the middle layer quartz tube and the inner layer quartz tube are coaxial.
Specifically, the second shielding gas may be argon, oxygen, or a mixture of argon and oxygen.
Specifically, the third shielding gas may be argon, oxygen, or a mixture of argon and oxygen.
With continued reference to fig. 1, the control module determines the uniformity of the glass mass based on the wavefront error of the glass mass obtained by the Zygo interferometer,
and if the wavefront error of the glass block is larger than a preset second error, the control module judges that the uniformity of the glass block is lower than an allowable range and controls the lamp torch to operate in the running state.
Specifically, the wavefront error of the glass block is the deviation between the actual wavefront and the ideal wavefront after the light wave passes through the glass medium, and it can be understood that the use of the Zygo interferometer to obtain the wavefront error of the glass block is a common technical means for those skilled in the art, and will not be described herein.
The operating state of the lamp torch is that the control module controls the input power of the lamp torch to be input with first input power, and the first input power is determined through the difference value between the wavefront error of the glass block and the preset second error.
In particular, the adjustment of the torch input power is achieved by adjustment of the work coil input pressure.
Specifically, the wavefront error of the glass block is denoted as P, the preset first error is denoted as P1, the preset second error is denoted as P2, the difference between the wavefront error of the glass block and the preset second error is denoted as Δp, Δp=p-P2 is set, the preset error difference is denoted as Δp0, the step of determining the first input power is,
when delta P is less than or equal to delta P0, the control module uses a preset first power adjustment coefficient alpha 1 to adjust the input power G of the lamp torch;
when delta P > -delta P0, the control module adjusts the torch input power G by using a preset second power adjustment coefficient alpha 2;
wherein 1 < α1 < α2, the first input power G' =g×αj, αj is a preset j-th power adjustment coefficient, and j=1, 2 is set.
According to the system, the quartz glass is synthesized by utilizing a plasma synthesis technology, and in the preparation process, due to the non-uniformity of raw material mixing, when the quartz glass is synthesized according to the original power, a non-uniform chemical reaction occurs, so that the non-uniformity of component distribution is caused, the uniformity of the quartz glass is further influenced, the fluidity of the formed glass liquid is improved by increasing the input power of a lamp torch, the diffusion capacity of the glass liquid is further improved, the uniformity of the formed glass block is improved, and the improvement of the production quality and the production stability of the quartz glass is further realized.
With continued reference to fig. 3, the dispenser includes:
the electric valve is arranged at the output end of the protective gas inlet pipe and used for controlling the flow of the protective gas;
and the extension pipe is connected with the electric valve and is used for mixing the working gas and the protective gas.
With continued reference to fig. 1, if the wavefront error of the glass block is greater than a preset first error and less than or equal to the preset second error, the control module obtains the transparency of the glass block;
and if the transparency of the glass block is smaller than the preset first transparency, the control module controls the first protection gas to discharge according to the first discharging strategy.
Specifically, the flow rate of the shielding gas can be adjusted by adjusting the opening/closing area of the electrically operated valve.
The first discharging strategy is that the control module controls the first protection gas to discharge at a first corresponding flow rate, and the first corresponding flow rate is determined by a difference value between the preset first transparency and the transparency of the glass block.
Specifically, the transparency of the glass block is denoted as T, the preset first transparency is denoted as T1, the preset second transparency is denoted as T2, the difference between the preset first transparency and the transparency of the glass block is denoted as DeltaT, deltaT=T1-T, the preset transparency difference is denoted as DeltaT 0, the step of determining the first corresponding flow rate is,
if DeltaT is less than or equal to DeltaT 0, the control module adjusts the first shielding gas flow V by using a preset second flow adjusting coefficient beta 2;
if DeltaT > DeltaT0, the control module adjusts the first shielding gas flow V by using a preset first flow adjusting coefficient beta 1;
wherein, 0 < β1 < β2 < 1, the adjusted first corresponding flow velocity V' =V×βg, βg is a preset g-th flow adjustment coefficient, and g=1, 2 is set.
According to the system, the quartz glass is synthesized by utilizing a plasma synthesis technology, and the generated glass liquid has tiny component differences, such as bubbles or other inclusions, caused by the non-uniformity of gas phase reaction in raw materials in the preparation process, so that the structure of the quartz glass is changed, the transparency is reduced, the optical effect cannot meet the requirements, and the ideal chemical reaction condition in the synthesis process is maintained by reducing the flow of protective gas, so that the improvement of the production quality and the production stability of the quartz glass is further realized.
With continued reference to fig. 1, if the transparency of the glass block is greater than or equal to the preset first transparency and less than the preset second transparency, the control module obtains the bubble lengths of the glass block in the diameter direction of the sampling section and calculates the average bubble length in the radial direction of the glass block;
and if the average bubble length in the radial direction of the glass block is greater than the preset length, the control module controls the deposition furnace to operate in the temperature mode.
Specifically, the calculation formula of the average bubble length in the radial direction of the glass block is as follows:
，
wherein L is the average bubble length in the radial direction of the glass block, L i The gas bubble length in the diameter direction of the ith sampling section is n, which is the number of sampling sections and n is a natural number of 1 or more.
With continued reference to fig. 1, the temperature mode of the deposition furnace is that the control module controls the deposition furnace to operate at a first corresponding temperature, where the first corresponding temperature is determined by a difference between a radial average bubble length of the glass block and a preset length.
Specifically, the average bubble length in the radial direction of the glass block is denoted as L, the preset length is denoted as L0, the difference between the average bubble length in the radial direction of the glass block and the preset length is denoted as DeltaL, deltaL=L-L0, the difference between the preset lengths is denoted as DeltaL 0, the step of determining the first corresponding temperature is that,
if delta L is less than or equal to delta L0, the control module adjusts the temperature W of the deposition furnace by using a preset first temperature adjustment coefficient delta 1;
if DeltaL > DeltaL0, the control module adjusts the temperature W of the deposition furnace by using a preset second temperature adjustment coefficient delta 2;
wherein, 0 < δ1 < δ2 < 1, the adjusted first corresponding temperature W' =w× (1+δk), δk is a preset kth temperature adjustment coefficient, and k=1, 2 is set.
According to the system, the quartz glass is synthesized by utilizing a plasma synthesis technology, and the reactive gas is not completely removed in the preparation process, so that bubbles appear in the quartz glass synthesis process, the hydroxyl content of the quartz glass is beyond the allowable range, the glass quality is reduced, the gas circulation is accelerated by increasing the temperature of a deposition furnace, and the improvement of the production quality and the production stability of the quartz glass is further realized.
After the first discharging strategy is determined, the control module controls the roughness sensor to acquire the roughness of the inner surface of the deposition furnace,
if the roughness of the inner surface of the deposition furnace is larger than the preset roughness, the control module controls the first protection gas to be discharged by the second discharging strategy;
the second discharging strategy is that the control module controls the first protection gas to discharge at a second corresponding flow rate, wherein the second corresponding flow rate is determined by the difference value between the roughness of the inner surface of the deposition furnace and the preset roughness.
Specifically, an electric rail is provided on the base rod for changing the relative position of the roughness sensor mounted on the electric rail and the base rod.
Specifically, the electric rail is made of the same material as the base rod.
Specifically, after the first discharging strategy is determined, the control module controls the roughness sensor to periodically detect the roughness of the inner surface of the deposition furnace through movement on the electric track.
Specifically, the inner surface roughness of the deposition furnace is denoted as Re, the preset roughness is denoted as Re0, the difference between the inner surface roughness of the deposition furnace and the preset roughness is denoted as DeltaRe, deltaRe=Re-DeltaRe 0, the preset roughness difference is denoted as DeltaRe 0, the step of determining the second corresponding flow rate is,
if the delta Re is less than or equal to delta Re0, the control module adjusts the first corresponding flow velocity V' by using a preset third flow rate adjusting coefficient beta 3;
if DeltaRe > DeltaRe0, the control module adjusts the first corresponding flow velocity V' by using a preset fourth flow adjustment coefficient beta 4;
wherein, 1 < β1 < β2, the adjusted first corresponding flow velocity V' =v×βc, βc is a preset c-th flow adjustment coefficient, and g=3, 4 is set.
According to the system, the quartz glass is synthesized by utilizing a plasma synthesis technology, the transparency of the glass block is improved due to the fact that the flow of the protective gas is reduced in the preparation process, the quartz glass block is continuously produced under the condition of low flow of the protective gas, corrosion is caused to the inner surface of a deposition furnace by corrosive gas such as HCL gas, bubbles of the glass block are increased and the transparency of the glass block is reduced due to the fact that slag generated by corrosion falls on the glass block, and even feeding of the protective gas is achieved through secondary adjustment of the protective gas in the production process, so that the production quality and the production stability of the quartz glass are further improved.
Example 1
In this example 1, the optical performance of the glass block was detected using a wave having a wavelength λ, the wavefront error p=λ/3 of the glass block was detected, the first error p1=λ/4 was preset, the second error p2=λ/5 was preset, the difference Δp=2λ/15 between the wavefront error of the glass block and the second error was preset, the difference Δp0=λ/15,
the control module adjusts the input power G=400 KW of the lamp torch by using a preset second power adjustment coefficient alpha 2=1.2 under the condition of delta P > -delta P0;
adjusted torch input power G' =400 kw×1.2=480 KW.
In the embodiment 1, the production efficiency is improved by optimizing the parameters of the lamp torch and precisely controlling the synthesis process of the quartz glass, so that the production quality and the production stability of the quartz glass are improved.
Thus far, the technical solution of the present invention has been described in connection with the preferred embodiments shown in the drawings, but it is easily understood by those skilled in the art that the scope of protection of the present invention is not limited to these specific embodiments. Equivalent modifications and substitutions for related technical features may be made by those skilled in the art without departing from the principles of the present invention, and such modifications and substitutions will be within the scope of the present invention.
Claims (5)
1. A high stability manufacturing system based on high purity low hydroxyl quartz glass, comprising:
the feeding module comprises a feeding pipe for connecting the reaction raw materials, a feeder connected with the feeding pipe for mixing the reaction raw materials and the first protective gas, and an introducing pipe connected with the feeder for connecting the first protective gas;
the reaction module is connected with the feeding module and is used for synthesizing reaction raw materials into glass blocks, and comprises a deposition furnace arranged at the output end of the feeder and used for providing a synthesis place and a lamp torch arranged above the deposition furnace and used for providing a synthetic heat source of the glass blocks;
the detection module is partially connected with the reaction module and comprises a roughness sensor, a Zygo interferometer, a transparency detector and an ultrasonic detector, wherein the roughness sensor is arranged below the lamp torch and used for acquiring the roughness of the inner surface of the deposition furnace, the Zygo interferometer is arranged at the output end of the reaction module and used for detecting the wavefront error of a glass block, the transparency detector is arranged at the output end of the Zygo interferometer and used for detecting the transparency of the glass block, and the ultrasonic detector is arranged at the output end of the transparency detector and used for detecting the bubble length of the glass block in the diameter direction;
a control module, which is respectively connected with the feeding module, the reaction module and the detection module and is used for determining the operation state of the lamp torch according to the wave front error of the glass block or determining the first discharging strategy of the feeder according to the wave front error of the glass block and the transparency of the glass block,
and determining the temperature mode of the deposition furnace according to the transparency of the glass block and the average bubble length in the radial direction of the glass block,
and re-determining a second discharging strategy of the feeder based on the inner surface roughness of the deposition furnace after the first discharging strategy is executed;
wherein the first and second discharging strategies differ in flow rate of the first shielding gas;
the control module judges the uniformity of the glass block according to the wavefront error of the glass block obtained by the Zygo interferometer,
if the wavefront error of the glass block is larger than a preset second error, the control module judges that the uniformity of the glass block is lower than an allowable range and controls the lamp torch to operate in the running state;
the operating state of the lamp torch is that the control module controls the input power of the lamp torch to be input with a first input power, and the first input power is determined by the difference value between the wavefront error of the glass block and the preset second error;
if the wavefront error of the glass block is larger than a preset first error and smaller than or equal to the preset second error, the control module acquires the transparency of the glass block;
if the transparency of the glass block is smaller than a preset first transparency, the control module controls the first protection gas to be discharged according to the first discharging strategy;
if the transparency of the glass block is larger than or equal to the preset first transparency and smaller than the preset second transparency, the control module obtains bubble lengths in the diameter direction of a plurality of sampling sections of the glass block and calculates the average bubble length in the radial direction of the glass block;
if the average bubble length in the radial direction of the glass block is larger than the preset length, the control module controls the deposition furnace to operate in the temperature mode;
after the first discharging strategy is determined, the control module controls the roughness sensor to acquire the roughness of the inner surface of the deposition furnace,
and if the roughness of the inner surface of the deposition furnace is larger than the preset roughness, the control module controls the first protection gas to be discharged by the second discharging strategy.
2. The high-stability production system based on high-purity low-hydroxyl quartz glass according to claim 1, wherein the feeder comprises:
the electric valve is arranged at the output end of the protective gas inlet pipe and used for controlling the flow of the protective gas;
and the extension pipe is connected with the electric valve and is used for mixing the working gas and the protective gas.
3. The high stability manufacturing system based on high purity low hydroxyl quartz glass according to claim 2, wherein the first discharging strategy is that the control module controls the first shielding gas to be discharged at a first corresponding flow rate, the first corresponding flow rate being determined by a difference between the preset first transparency and the transparency of the glass block.
4. The high-stability production system based on high-purity low-hydroxyl quartz glass according to claim 3, wherein the temperature pattern of the deposition furnace is such that the control module controls the deposition furnace to operate at a first corresponding temperature determined by a difference between an average bubble length in a radial direction of the glass block and a preset length.
5. The high stability manufacturing system based on high purity low hydroxyl quartz glass according to claim 4, wherein the second discharging strategy is that the control module controls the first shielding gas to be discharged at a second corresponding flow rate, wherein the second corresponding flow rate is determined by a difference between an inner surface roughness of the deposition furnace and a preset roughness.
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1699232A (en) * | 2005-06-10 | 2005-11-23 | 中国建筑材料科学研究院 | High-frequency plasma vapor phase synthesis method for quartz glass |
| CN102583977A (en) * | 2012-03-02 | 2012-07-18 | 中国建筑材料科学研究总院 | Method for indirect synthesis of quartz glass, special equipment used therein and quartz glass |
| CN105502897A (en) * | 2016-01-12 | 2016-04-20 | 中国建筑材料科学研究总院 | Preparing method for ultra-pure quartz glass |
| CN219217830U (en) * | 2023-02-13 | 2023-06-20 | 内蒙古金沙布地恒通光电科技有限公司 | High-purity low-hydroxyl quartz glass feeding device |
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Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1699232A (en) * | 2005-06-10 | 2005-11-23 | 中国建筑材料科学研究院 | High-frequency plasma vapor phase synthesis method for quartz glass |
| CN102583977A (en) * | 2012-03-02 | 2012-07-18 | 中国建筑材料科学研究总院 | Method for indirect synthesis of quartz glass, special equipment used therein and quartz glass |
| CN105502897A (en) * | 2016-01-12 | 2016-04-20 | 中国建筑材料科学研究总院 | Preparing method for ultra-pure quartz glass |
| CN219217830U (en) * | 2023-02-13 | 2023-06-20 | 内蒙古金沙布地恒通光电科技有限公司 | High-purity low-hydroxyl quartz glass feeding device |
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