CN117512716B - Preparation of green sustainable cyanide-free gold plating solution and electroplating method thereof - Google Patents

Preparation of green sustainable cyanide-free gold plating solution and electroplating method thereof Download PDF

Info

Publication number
CN117512716B
CN117512716B CN202410012631.9A CN202410012631A CN117512716B CN 117512716 B CN117512716 B CN 117512716B CN 202410012631 A CN202410012631 A CN 202410012631A CN 117512716 B CN117512716 B CN 117512716B
Authority
CN
China
Prior art keywords
gold plating
copper sheet
solution
red copper
cyanide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN202410012631.9A
Other languages
Chinese (zh)
Other versions
CN117512716A (en
Inventor
周庆华
顾志平
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jiangsu Suda Special Chemical Reagent Co ltd
Original Assignee
Jiangsu Suda Special Chemical Reagent Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jiangsu Suda Special Chemical Reagent Co ltd filed Critical Jiangsu Suda Special Chemical Reagent Co ltd
Priority to CN202410012631.9A priority Critical patent/CN117512716B/en
Publication of CN117512716A publication Critical patent/CN117512716A/en
Application granted granted Critical
Publication of CN117512716B publication Critical patent/CN117512716B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/48Electroplating: Baths therefor from solutions of gold
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/12Electroplating: Baths therefor from solutions of nickel or cobalt
    • C25D3/14Electroplating: Baths therefor from solutions of nickel or cobalt from baths containing acetylenic or heterocyclic compounds
    • C25D3/18Heterocyclic compounds
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10Electroplating with more than one layer of the same or of different metals
    • C25D5/12Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/34Pretreatment of metallic surfaces to be electroplated
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P10/00Technologies related to metal processing
    • Y02P10/20Recycling

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)

Abstract

The invention belongs to the technical field of gold plating, and discloses a preparation method and an electroplating method of green sustainable cyanide-free gold plating solution, wherein the green sustainable cyanide-free gold plating solution uses 2-4 g/L HAu (GSH) 2 As main salt, GSH of 30-32 g/L is used as main complexing agent, hydroxyethylidene diphosphonic acid of 10-12 g/L is used as auxiliary complexing agent, distilled water is used as solvent, potassium hydroxide of 20 g/L is used as auxiliary agent to adjust the pH value of the gold plating solution to 8.5-9.5, and no additive is used. The invention develops a novel cyanide-free gold plating process which takes the glossiness and thickness of a gold plating layer into consideration through optimizing an electroplating route and process parameters on the basis of the developed green sustainable cyanide-free gold plating solution, and the obtained gold plating layer has bright appearance, fine crystallization and good conductivity.

Description

Preparation of green sustainable cyanide-free gold plating solution and electroplating method thereof
Technical Field
The invention belongs to the technical field of gold plating, and particularly relates to a preparation method and an electroplating method of green sustainable cyanide-free gold plating solution.
Background
The gold plating layer has excellent electrical conductivity, thermal conductivity, ductility and corrosion resistance, and is widely applied to the fields of electronic industry, aerospace, finishing processing and the like. At present, cyanide-containing technology is basically still adopted for gold plating, and although cyanide gold plating has the advantages of strong impurity resistance, stable gold plating solution, excellent plating compactness and the like, cyanide has extremely toxicity, so that the cyanide not only seriously threatens the health of production operators, but also seriously pollutes the environment, and meanwhile, the cyanide has a plurality of hidden dangers in links of transportation, storage and the like. In order to realize environmental protection and green sustainable development of electroplating industry, the development of cyanide-free gold plating technology to replace the existing cyanide gold plating technology has great social value and economic benefit.
Sulfite ion (SO) 3 2- ) And thiosulfate ion (S) 2 O 3 2- ) As a complexing agent for a monovalent gold ion, au (SO) can be formed by complexing with the monovalent gold ion 3 ) 2 3- And Au (S) 2 O 3 ) 2 3- Ions, their corresponding stability constants (K f ) The values are respectively 10 10 And 10 26 . However, since the gold ion undergoes disproportionation and SO under weaker coordination 3 2- 、S 2 O 3 2- Ion decomposition to make main salt of sodium gold sulfite and SO 3 2- 、S 2 O 3 2- The complexing agent for the ions is not sufficiently stable. The cyanide-free gold plating technology has a certain limit in large-scale popularization and application because of more or less defects in the stability of gold plating solution or the quality of gold plating.
Disclosure of Invention
Aiming at the situation, the invention provides a preparation method of green sustainable cyanide-free gold plating solution and an electroplating method thereof, and HAu (GSH) 2 The cyanide-free gold plating solution with good persistence and dispersion is developed by taking GSH as a main complexing agent, taking hydroxyethylidene diphosphonic acid as an auxiliary complexing agent, taking distilled water as a solvent and taking potassium hydroxide as an auxiliary agent to adjust the pH value of the gold plating solution to 9.0-10.0, and no additive. The invention develops a novel cyanide-free gold plating process which takes the glossiness and thickness of a gold plating layer into consideration through optimizing an electroplating route and process parameters on the basis of the developed green sustainable cyanide-free gold plating solution.
In order to achieve the above purpose, the technical scheme adopted by the invention is as follows: the invention provides a green sustainable cyanide-free gold plating solution, which comprises the following components in mass concentration: HAu (GSH) 2 2-4 g/L, GSH 30-32 g/L, hydroxyethylidene diphosphonic acid 10-12 g/L, potassium hydroxide 20 g/L, distilled water as solvent, pH 9.0-10.0, HAu (GSH) 2 The preparation method specifically comprises the following steps:
i, ready to configure HAu (GSH) 2 The required reagents: chloroauric acid solution 3 g/L, sodium thiosulfate solution 10 g/L, GSH 30-32 g/L, potassium hydroxide 20 g/L, dilute sulfuric acid with mass fraction of 5%;
II, dissolving chloroauric acid in sodium thiosulfate in S 2 O 3 2- Ions and Au 3+ Mixing the ions in a molar ratio of 5:2, and uniformly stirring to obtain a solution 1;
III, mixing GSH and solution 1 prepared in step II with GSH and Au 3+ Mixing the ions in a molar ratio of 3:1, and uniformly stirring to obtain a solution 2;
IV, mixing potassium hydroxide with the solution 2 prepared in the step III until the pH value is adjusted to 8.0-9.0, and uniformly stirring to obtain a solution 3;
v, mixing 5% of dilute sulfuric acid with the solution 3 prepared in the step IV until the pH value is regulated to 3.5, and obtaining HAu (GSH) after centrifugation, filtration and washing after uniform stirring 2
Preferably, the electroplating method of the green sustainable cyanide-free gold plating solution specifically comprises the following steps:
s1, selecting a red copper sheet as a base material, mechanically polishing the surface of the red copper sheet by using 1200-mesh silicon carbide sand paper, and cleaning the red copper sheet by using ultrapure water after burrs, weld scars, corrosives and impurities are removed;
s2, putting the red copper sheet treated in the step S1 into an oil removal solution, heating the red copper sheet to chemically remove oil, and then cleaning the red copper sheet with ultrapure water;
s3, placing the red copper sheet treated in the step S2 into an oil removal solution, heating the red copper sheet to carry out electrolytic oil removal, and then cleaning the red copper sheet with ultrapure water;
s4, placing the red copper sheet treated in the step S3 into dilute sulfuric acid with the mass fraction of 5% for pickling for 1 min until the red copper sheet becomes bright, and then cleaning with ultrapure water;
s5, putting the red copper sheet treated in the step S4 into electroplating solution, taking the red copper sheet as a cathode, taking a sulfur-containing nickel sheet as an anode, carrying out nickel preplating, and then sequentially carrying out ultrapure water cleaning, dilute sulfuric acid activation with the mass fraction of 5% and ultrapure water cleaning;
s6, placing the red copper sheet treated in the step S5 into a Hall groove, wherein 250 ml cyanide-free gold plating solution is contained in the Hall groove, and the red copper sheet is used as a cathode, so that insoluble Ti-IrO is formed 2 The anode was subjected to electro-gold plating, then washed with distilled water and dried with hot air.
Preferably, in step S2 and step S3, the degreasing solution comprises the following components in mass concentration: 30/g/L potassium carbonate, 65/g/L potassium phosphate, 20/g/L potassium hydroxide and 5/mg/L cetyltrimethylammonium bromide as surfactant.
Preferably, in step S2 and step S3, the heating temperature is 60-65℃and the degreasing time is 16-18 min.
Preferably, in step S5, the mass concentration of the plating solution components is: 100-200 g/L nickel sulfate, 20-32 g/L nickel chloride and boric acid15-22 g/L, 2-3-mg/L brightening agent 2-mercaptobenzothiazole and 1-2 mg/L wetting agent ISS, wherein the pH value of the electroplating solution is 3.5-3.7.
Preferably, in step S5, the plating solution is at a temperature of 57-60deg.C for a plating time of 10-12 min and a current density of 3-5A/dm 2
Preferably, in step S6, the cyanide-free gold plating solution is at a temperature of 40-50deg.C, the electroplating time is 10-12 min, and the current density is 0.6-1.0A/dm 2
The beneficial effects obtained by the invention are as follows: the invention adopts a novel method by adding GSH to Au (S 2 O 3 ) 2 3- Ligand exchange reaction occurs in the ion solution and is carried out with Au + GSH with ion having high coordination degree is prepared by substituting Au (S 2 O 3 ) 2 3- S in ion 2 O 3 2- Ions further form main salt HAu (GSH) required by the cyanide-free gold plating solution of the invention 2
The gold plating solution of the present invention uses HAu (GSH) 2 Is mainly salt and GSH is mainly complexing agent, SO that SO in the gold plating process of sulfite and thiosulfate in the market is completely eradicated 3 2- And S is 2 O 3 2- Ions and Au + The defects of poor continuous performance caused by disproportionation reaction due to insufficient ion coordination degree are overcome, no precipitate is precipitated after the gold plating solution is stood for 6 months, and the gold plating solution has the characteristics of safety, no toxicity, simple preparation, strong sustainability and the like.
The gold plating solution provided by the invention uses the hydroxy ethylidene diphosphonic acid as an auxiliary coordination agent to interact with the main coordination agent GSH, the formed stable complex can further improve the conductivity of the gold plating solution, and the addition of the hydroxy ethylidene diphosphonic acid can effectively improve the glossiness of a gold plating layer.
The gold plating solution of the invention has no addition of any additive and Au + The ionic solubility is low, the manufacturing cost is lower than that of the conventional gold plating solution in the market, but the covering capacity of the gold plating solution can reach 100%, the dispersing capacity can reach 70%, and the manufacturing cost is low but the performance is high.
The green sustainable cyanide-free gold plating solution is based on the invention, the electroplating route and the technological parameters are optimized through a Hall groove experiment, the novel cyanide-free gold plating process is developed, the glossiness and the thickness of the gold plating layer are considered, and the obtained gold plating layer has bright appearance, fine crystallization and good conductivity.
Drawings
FIG. 1 shows a gold plating layer obtained by a right angle cathode method according to example 2 of the present invention;
FIG. 2 is a comparison of CV curves of the gold plating solution of example 2 of the present invention for different times;
FIG. 3 shows the thickness of the centers of the points of the gold plating layer according to example 2 of the present invention;
FIG. 4 is a schematic view showing the appearance of a gold plating layer for Hall groove test in examples 1-3 of the present invention;
FIG. 5 is a graph showing the effect of the auxiliary complexing agent hydroxyethylidene diphosphonic acid of examples 1-3 of the present invention on the appearance of a gold plating layer;
FIG. 6 is a graph showing the effect of the values of examples 1-3 pH of the present invention on the appearance of a gold plating layer;
FIG. 7 shows the effect of temperature on the appearance of gold plating in examples 1-3 of the present invention.
The accompanying drawings are included to provide a further understanding of the invention and are incorporated in and constitute a part of this specification, illustrate the invention and together with the embodiments of the invention, serve to explain the invention.
Detailed Description
The following description of the embodiments of the present invention will be made clearly and fully with reference to the accompanying drawings, in which it is evident that the embodiments described are only some, but not all embodiments of the invention; all other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art. In addition, any methods and materials similar or equivalent to those described herein can be used in the present invention. The preferred methods and materials described herein are illustrative only and should not be construed as limiting the scope of the present application.
The experimental methods in the following examples are all conventional methods unless otherwise specified; the test materials used in the examples described below, unless otherwise specified, were purchased from commercial sources.
Example 1: the green sustainable cyanide-free gold plating solution comprises the following components in percentage by mass: main salt HAu (GSH) 2 2 g/L, main complexing agent GSH 30 g/L, auxiliary complexing agent hydroxyethylidene diphosphonic acid 10 g/L, distilled water as solvent, and 20 g/L potassium hydroxide as auxiliary agent to adjust the pH value of the gold plating solution to 9.0, without adding additives.
The green sustainable cyanide-free gold plating solution electroplating method specifically comprises the following steps:
s1, selecting a red copper sheet as a base material, mechanically polishing the surface of the red copper sheet by using 1200-mesh silicon carbide sand paper, and cleaning the red copper sheet by using ultrapure water after burrs, weld scars, corrosives and impurities are removed;
s2, putting the red copper sheet treated in the step S1 into an oil removing solution, heating the red copper sheet to chemically remove oil, wherein the temperature of the oil removing solution is 60 ℃, the oil removing time is 16 min, and then cleaning the red copper sheet with ultrapure water;
s3, placing the red copper sheet treated in the step S2 into an oil removing solution, heating the oil removing solution to carry out electrolytic oil removal, wherein the temperature of the oil removing solution is 60 ℃, the oil removing time is 16 min, and then cleaning the red copper sheet with ultrapure water;
s4, placing the red copper sheet treated in the step S3 into dilute sulfuric acid with the mass fraction of 5% for pickling for 1 min until the red copper sheet becomes bright, and then cleaning with ultrapure water;
s5, placing the red copper sheet processed in the step S4 into electricityIn the plating solution, copper sheet is used as cathode, sulfur-containing nickel plate is used as anode to carry out nickel preplating, the temperature of the plating solution is 57 ℃, the electroplating time is 10 min, and the current density is 3A/dm 2 Then sequentially carrying out ultrapure water cleaning, dilute sulfuric acid activation with the mass fraction of 5% and ultrapure water cleaning;
s6, placing the red copper sheet treated in the step S5 into a Hall groove, wherein 250 ml cyanide-free gold plating solution is contained in the Hall groove, and the red copper sheet is used as a cathode, so that insoluble Ti-IrO is formed 2 Electroplating the anode with cyanide-free gold plating solution at 40deg.C for 10 min at current density of 0.6A/dm 2 Then washing with distilled water and drying with hot air.
Example 2: the green sustainable cyanide-free gold plating solution comprises the following components in percentage by mass: main salt HAu (GSH) 2 3 g/L, main complexing agent GSH 31 g/L, auxiliary complexing agent hydroxyethylidene diphosphonic acid 11 g/L, distilled water as solvent, and 20 g/L potassium hydroxide as auxiliary agent to adjust the pH value of the gold plating solution to 9.5, without adding additives.
The green sustainable cyanide-free gold plating solution electroplating method specifically comprises the following steps:
s1, selecting a red copper sheet as a base material, mechanically polishing the surface of the red copper sheet by using 1200-mesh silicon carbide sand paper, and cleaning the red copper sheet by using ultrapure water after burrs, weld scars, corrosives and impurities are removed;
s2, putting the red copper sheet treated in the step S1 into an oil removing solution, heating the red copper sheet to chemically remove oil, wherein the temperature of the oil removing solution is 63 ℃, the oil removing time is 17 min, and then cleaning the red copper sheet with ultrapure water;
s3, placing the red copper sheet treated in the step S2 into an oil removing solution, heating the copper sheet to carry out electrolytic oil removal, wherein the temperature of the oil removing solution is 63 ℃, the oil removing time is 17 min, and then cleaning the copper sheet with ultrapure water;
s4, placing the red copper sheet treated in the step S3 into dilute sulfuric acid with the mass fraction of 5% for pickling for 1 min until the red copper sheet becomes bright, and then cleaning with ultrapure water;
s5, placing the red copper sheet treated in the step S4 into an electroplating solution, and pre-plating nickel by taking the red copper sheet as a cathode and a sulfur-containing nickel plate as an anode, wherein the temperature of the electroplating solution is 58The electroplating time is 11 min, and the current density is 4A/dm 2 Then sequentially carrying out ultrapure water cleaning, dilute sulfuric acid activation with the mass fraction of 5% and ultrapure water cleaning;
s6, placing the red copper sheet treated in the step S5 into a Hall groove, wherein 250 ml cyanide-free gold plating solution is contained in the Hall groove, and the red copper sheet is used as a cathode, so that insoluble Ti-IrO is formed 2 Electroplating the anode with cyanide-free gold plating solution at 45deg.C for 11 min at current density of 0.8. 0.8A/dm 2 Then washing with distilled water and drying with hot air.
Example 3: the green sustainable cyanide-free gold plating solution comprises the following components in percentage by mass: main salt HAu (GSH) 2 4. 4 g/L, main complexing agent GSH 32 g/L, auxiliary complexing agent hydroxyethylidene diphosphonic acid 12 g/L, distilled water as solvent, and 20. 20 g/L potassium hydroxide as auxiliary agent to adjust the pH value of the gold plating solution to 10.0, without adding additives.
The green sustainable cyanide-free gold plating solution electroplating method specifically comprises the following steps:
s1, selecting a red copper sheet as a base material, mechanically polishing the surface of the red copper sheet by using 1200-mesh silicon carbide sand paper, and cleaning the red copper sheet by using ultrapure water after burrs, weld scars, corrosives and impurities are removed;
s2, putting the red copper sheet treated in the step S1 into an oil removing solution, heating the red copper sheet to chemically remove oil, wherein the temperature of the oil removing solution is 65 ℃, the oil removing time is 18 min, and then cleaning the red copper sheet with ultrapure water;
s3, placing the red copper sheet treated in the step S2 into an oil removing solution, heating the copper sheet to carry out electrolytic oil removal, wherein the temperature of the oil removing solution is 65 ℃, the oil removing time is 18 min, and then cleaning the copper sheet with ultrapure water;
s4, placing the red copper sheet treated in the step S3 into dilute sulfuric acid with the mass fraction of 5% for pickling for 1 min until the red copper sheet becomes bright, and then cleaning with ultrapure water;
s5, placing the red copper sheet treated in the step S4 into an electroplating solution, taking the red copper sheet as a cathode and a sulfur-containing nickel plate as an anode for nickel preplating, wherein the temperature of the electroplating solution is 60 ℃, the electroplating time is 12 min, and the current density is 5A/dm 2 Then sequentially passing through ultrapure waterWashing, namely activating dilute sulfuric acid with the mass fraction of 5% and cleaning with ultrapure water;
s6, placing the red copper sheet treated in the step S5 into a Hall groove, wherein 250 ml cyanide-free gold plating solution is contained in the Hall groove, and the red copper sheet is used as a cathode, so that insoluble Ti-IrO is formed 2 Electroplating the anode with cyanide-free gold plating solution at 50deg.C for 12 min at current density of 1.0. 1.0A/dm 2 Then washing with distilled water and drying with hot air.
Experimental example
1. In the embodiment 1-3 of the invention, CV test is carried out on the green sustainable cyanide-free gold plating solution before and after the placement, and the stability of the green sustainable cyanide-free gold plating solution is analyzed. Electrochemical testing during the experiment mainly included Cyclic Voltammogram (CV), linear Sweep Voltammogram (LSV) and Chronoamperometry (CA). The electrochemical test uses a three-electrode electrolytic cell made of glass, and the test instrument is a CHI750d electrochemical workstation. In the test process, a reference electrode and an auxiliary electrode respectively adopt a platinum wire (phi=0.38 mm) and a platinum sheet (1 cm ×1 cm), wherein the working electrode comprises a glassy carbon electrode (GCE, phi=3 mm), a rotary disk glassy carbon electrode (GC-RDE, phi=5 mm), a gold electrode (Au, phi=3 mm) and a platinum electrode (Pt, phi=3 mm), and the test temperature is 328K. The scanning speed of the linear sweep voltammogram is 1 mV s -1 The scanning speed of the cyclic voltammogram is 10 mV s -1 . In the course of the experiment, alpha-Al having a particle diameter of 0.5 μm was used before and after each experiment 2 O 3 Treating working electrode with polishing powder, sequentially washing with ethanol and distilled water, and using N 2 And (5) blow-drying.
2. In the embodiment 1-3, the dispersion capacity of the gold plating solution is measured by adopting a right-angle cathode method, and in the experiment, the red copper sheet after nickel preplating is bent into a right angle along the center line, and immersed into the square groove gold plating solution for electroplating. After electroplating, the cathode plate is unfolded, and the ratio of the coated area to the total area of the cathode is the dispersion capacity.
Analysis of results
FIG. 1 shows a gold plating layer obtained by the right angle cathode method according to example 2 of the present invention, it can be observed that the current density is0.8 A/dm 2 After the electroplating time is 11 min, the result shows that all areas of the cathode are covered by the gold plating layer, which indicates that the covering capacity of the gold plating solution reaches 100 percent.
FIG. 2 shows the CV curves of the gold plating solution of the embodiment 2 of the invention after being placed for different time periods, the CV curves are not obviously changed compared with the freshly prepared gold plating solution after being placed for 6 months, and the positions of the oxidation peak and the reduction peak are hardly moved, thus indicating that the stability of the gold plating solution is better.
FIG. 3 shows the thickness of the centers of the gold plating layers in example 2 of the present invention, and it can be observed that the thicknesses of the centers of the No. 1-8 gold plating layers of the Hall groove test piece are in the range of 0.23-0.58 and cm, and the dispersion capacity of the gold plating solution is 70%, which indicates that the dispersion capacity of the gold plating solution is good.
FIG. 5 is a graph showing the effect of the auxiliary complexing agent of hydroxyethylidene diphosphonic acid on the appearance of a gold coating according to the embodiment 1-3 of the present invention, and according to the schematic view of the appearance of the gold coating in the Hall cell experiment of FIG. 4, the fogging and reddening of the gold coating of the Hall cell test piece without the auxiliary complexing agent of hydroxyethylidene diphosphonic acid can be observed, and when the concentration of the added auxiliary complexing agent of hydroxyethylidene diphosphonic acid is in the range of 10 g/L-12 g/L, the gold coating of the Hall cell test piece is bright in the range of 2.5-10 cm, and the excellent bright effect of the gold coating is shown.
FIG. 6 is a graph showing the effect of the values of examples 1-3 and pH on the appearance of the gold plating layer, wherein the effect of the values of the gold plating layer on the appearance of the gold plating layer is observed to be almost full-scale red and hazy when the pH value of the gold plating solution is 7.0, and the appearance of the lower part 3-cm of the gold plating layer of the Hall cell test piece is bright when the pH value of the gold plating solution is 9.0-10.0, and the pH value of the gold plating solution is 9.0-10.0.
FIG. 7 is a graph showing the effect of the temperature of examples 1-3 on the appearance of the gold plating layer, wherein the effect of the temperature on the appearance of the gold plating layer is extremely insensitive to the effect of the temperature according to the schematic view of the appearance of the gold plating layer in the Hall cell experiment of FIG. 4, and the Hall cell test piece with consistent appearance and quality of the gold plating layer can be obtained when the temperature of the gold plating solution is 40-50 ℃.
Although embodiments of the present invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made therein without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.
The invention and its embodiments have been described above with no limitation, and the invention is illustrated in the figures of the accompanying drawings as one of its embodiments, without limitation in practice. In summary, those skilled in the art, having benefit of this disclosure, will appreciate that the invention can be practiced without the specific details disclosed herein.

Claims (7)

1. A green sustainable cyanide-free gold plating solution is characterized in that: comprises the following components in percentage by mass: HAu (GSH) 2 2-4 g/L, GSH 30-32 g/L, hydroxyethylidene diphosphonic acid 10-12 g/L, potassium hydroxide 20 g/L, distilled water as solvent, pH 9.0-10.0, HAu (GSH) 2 The preparation method specifically comprises the following steps:
i, ready to configure HAu (GSH) 2 The required reagents: chloroauric acid solution 3 g/L, sodium thiosulfate solution 10 g/L, GSH 30-32 g/L, potassium hydroxide 20 g/L, dilute sulfuric acid with mass fraction of 5%;
II, dissolving chloroauric acid in sodium thiosulfate in S 2 O 3 2- Ions and Au 3+ Mixing the ions in a molar ratio of 5:2, and uniformly stirring to obtain a solution 1;
III, mixing GSH and solution 1 prepared in step II with GSH and Au 3+ Mixing the ions in a molar ratio of 3:1, and uniformly stirring to obtain a solution 2;
IV, mixing potassium hydroxide with the solution 2 prepared in the step III until the pH value is adjusted to 8.0-9.0, and uniformly stirring to obtain a solution 3;
v, mixing 5% of dilute sulfuric acid with the solution 3 prepared in the step IV until the pH value is regulated to 3.5, and obtaining HAu (GSH) after centrifugation, filtration and washing after uniform stirring 2
2. A method for electroplating a green and sustainable cyanide-free gold plating bath according to claim 1, comprising the steps of:
s1, selecting a red copper sheet as a base material, mechanically polishing the surface of the red copper sheet by using 1200-mesh silicon carbide sand paper, and cleaning the red copper sheet by using ultrapure water after burrs, weld scars, corrosives and impurities are removed;
s2, putting the red copper sheet treated in the step S1 into an oil removal solution, heating the red copper sheet to chemically remove oil, and then cleaning the red copper sheet with ultrapure water;
s3, placing the red copper sheet treated in the step S2 into an oil removal solution, heating the red copper sheet to carry out electrolytic oil removal, and then cleaning the red copper sheet with ultrapure water;
s4, placing the red copper sheet treated in the step S3 into dilute sulfuric acid with the mass fraction of 5% for pickling for 1 min until the red copper sheet becomes bright, and then cleaning with ultrapure water;
s5, putting the red copper sheet treated in the step S4 into electroplating solution, taking the red copper sheet as a cathode, taking a sulfur-containing nickel sheet as an anode, carrying out nickel preplating, and then sequentially carrying out ultrapure water cleaning, dilute sulfuric acid activation with the mass fraction of 5% and ultrapure water cleaning;
s6, placing the red copper sheet treated in the step S5 into a Hall groove, wherein 250 ml cyanide-free gold plating solution is contained in the Hall groove, and the red copper sheet is used as a cathode, so that insoluble Ti-IrO is formed 2 The anode was subjected to electro-gold plating, then washed with distilled water and dried with hot air.
3. The electroplating method of the green sustainable cyanide-free gold plating bath according to claim 2, which is characterized in that: in the step S2 and the step S3, the oil removing solution comprises the following components in mass concentration: 30/g/L potassium carbonate, 65/g/L potassium phosphate, 20/g/L potassium hydroxide and 5/mg/L cetyltrimethylammonium bromide as surfactant.
4. A method for electroplating a green sustainable cyanide-free gold plating bath according to claim 3, wherein: in the step S2 and the step S3, the heating temperature is 60-65 ℃ and the degreasing time is 16-18 min.
5. The electroplating method of the green sustainable cyanide-free gold plating bath according to claim 4, which is characterized in that: in step S5, the mass concentration of the plating liquid components is: 100-200 g/L of nickel sulfate, 20-32 g/L of nickel chloride, 15-22 g/L of boric acid, 2-3 mg/L of brightening agent 2-mercaptobenzothiazole and 1-2 mg/L of wetting agent ISS, wherein the pH value of the electroplating solution is 3.5-3.7.
6. The electroplating method of the green sustainable cyanide-free gold plating bath according to claim 5, which is characterized in that: in step S5, the temperature of the electroplating solution is 57-60 ℃, the electroplating time is 10-12 min, and the current density is 3-5A/dm 2
7. The electroplating method of the green sustainable cyanide-free gold plating bath according to claim 6, which is characterized in that: in step S6, the cyanide-free gold plating solution has a temperature of 40-50deg.C, a plating time of 10-12 min, and a current density of 0.6-1.0A/dm 2
CN202410012631.9A 2024-01-04 2024-01-04 Preparation of green sustainable cyanide-free gold plating solution and electroplating method thereof Active CN117512716B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202410012631.9A CN117512716B (en) 2024-01-04 2024-01-04 Preparation of green sustainable cyanide-free gold plating solution and electroplating method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202410012631.9A CN117512716B (en) 2024-01-04 2024-01-04 Preparation of green sustainable cyanide-free gold plating solution and electroplating method thereof

Publications (2)

Publication Number Publication Date
CN117512716A CN117512716A (en) 2024-02-06
CN117512716B true CN117512716B (en) 2024-03-22

Family

ID=89755271

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202410012631.9A Active CN117512716B (en) 2024-01-04 2024-01-04 Preparation of green sustainable cyanide-free gold plating solution and electroplating method thereof

Country Status (1)

Country Link
CN (1) CN117512716B (en)

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104032337A (en) * 2013-03-07 2014-09-10 罗门哈斯电子材料有限公司 Tin alloy plating solution
CN106906503A (en) * 2017-04-07 2017-06-30 南京工业大学浦江学院 A kind of method that ZnO nano array is prepared based on plating
CN110320195A (en) * 2019-08-21 2019-10-11 合肥工业大学 A kind of colorimetric fluorescence probe and its preparation method and application
CN113862735A (en) * 2021-09-24 2021-12-31 鲍宁 Coating solution, coating electrode and preparation method and application thereof
CN115814112A (en) * 2022-12-05 2023-03-21 南京师范大学 Preparation method and application of Raman minimally invasive probe for detecting glutathione
CN116288562A (en) * 2023-02-24 2023-06-23 电子科技大学 Soft gold electroplating solution and preparation and application thereof
CN116285961A (en) * 2023-02-23 2023-06-23 深圳技术大学 Preparation method of fluorescent nano gold cluster and method for rapidly detecting lead ions by using fluorescent nano gold cluster

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008013516A2 (en) * 2005-05-13 2008-01-31 Cambrios Technologies Corp. Seed layers, cap layers, and thin films and methods of making thereof

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104032337A (en) * 2013-03-07 2014-09-10 罗门哈斯电子材料有限公司 Tin alloy plating solution
CN106906503A (en) * 2017-04-07 2017-06-30 南京工业大学浦江学院 A kind of method that ZnO nano array is prepared based on plating
CN110320195A (en) * 2019-08-21 2019-10-11 合肥工业大学 A kind of colorimetric fluorescence probe and its preparation method and application
CN113862735A (en) * 2021-09-24 2021-12-31 鲍宁 Coating solution, coating electrode and preparation method and application thereof
CN115814112A (en) * 2022-12-05 2023-03-21 南京师范大学 Preparation method and application of Raman minimally invasive probe for detecting glutathione
CN116285961A (en) * 2023-02-23 2023-06-23 深圳技术大学 Preparation method of fluorescent nano gold cluster and method for rapidly detecting lead ions by using fluorescent nano gold cluster
CN116288562A (en) * 2023-02-24 2023-06-23 电子科技大学 Soft gold electroplating solution and preparation and application thereof

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
金纳米棒合成与自组装的研究进展;杨玉东等;化工进展;20090905;第28卷(第09期);第1583-1588和1595页 *

Also Published As

Publication number Publication date
CN117512716A (en) 2024-02-06

Similar Documents

Publication Publication Date Title
CN107313084B (en) A kind of alkaline non-cyanide plate silver plating solution and silver-coating method
Popoola et al. Effect of some process variables on zinc coated low carbon steel substrates
CN108441902B (en) Monovalent gold cyanide-free gold-plating electroplating solution based on alkaloid composite coordination and application thereof
Pecequilo et al. Study of copper electrodeposition mechanism from a strike alkaline bath prepared with 1-hydroxyethane-1, 1-diphosphonic acid through cyclic voltammetry technique
KR20110003519A (en) Pd and pd-ni electrolyte baths
US4427502A (en) Platinum and platinum alloy electroplating baths and processes
TWI675129B (en) Environmentally friendly nickel electroplating compositions and methods
CN111155153A (en) Copper electroplating solution and copper electroplating method
CN112111761A (en) Electrolyte of high-elongation electrolytic copper foil and application thereof
JP2017527700A (en) Composition for electrodeposition of gold-containing layer, use and method thereof
US20040195107A1 (en) Electrolytic solution for electrochemical deposition gold and its alloys
CN106048672B (en) It is a kind of neutral without cyanogen Brush Plating silver plating liquid and its preparation process and application method
TWI674341B (en) Environmentally friendly nickel electroplating compositions and methods
CN106591897A (en) Cyanide-free ionic-liquid copper-plating solution and copper plating process
CN117512716B (en) Preparation of green sustainable cyanide-free gold plating solution and electroplating method thereof
US3920526A (en) Process for the electrodeposition of ductile palladium and electroplating bath useful therefor
Zhang et al. Influence of additives on electroplated copper films and shear strength of SAC305/Cu solder joints
US3793162A (en) Electrodeposition of ruthenium
CN103741178B (en) A kind of solution and electro-plating method for the smooth fine and close Ag films of silicon face Direct Electroplating
CN110923757A (en) Cyanide-free alkali copper electroplating solution and use method thereof
CN108517516A (en) A kind of chemical plating liquid and preparation method thereof
EP3017092A1 (en) Methods and apparatuses for mitigating tin whisker growth on tin and tin-plated surfaces by doping tin with gold
Török et al. Direct cathodic deposition of copper on steel wires from pyrophosphate baths
CN108251871B (en) Method for electrodepositing Al-Pt alloy in imidazole type ionic liquid
Tzaneva et al. Uniformity of Electrochemical Deposition on Thin Copper Layers

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant