CN117471840A - Mask plate and exposure system - Google Patents
Mask plate and exposure system Download PDFInfo
- Publication number
- CN117471840A CN117471840A CN202310565415.2A CN202310565415A CN117471840A CN 117471840 A CN117471840 A CN 117471840A CN 202310565415 A CN202310565415 A CN 202310565415A CN 117471840 A CN117471840 A CN 117471840A
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- CN
- China
- Prior art keywords
- light
- mask plate
- diffraction
- shielding
- portions
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims abstract description 21
- 230000010363 phase shift Effects 0.000 claims description 6
- 230000002093 peripheral effect Effects 0.000 claims description 3
- 230000002265 prevention Effects 0.000 abstract description 11
- 238000000034 method Methods 0.000 abstract description 8
- 230000000694 effects Effects 0.000 description 16
- 230000002829 reductive effect Effects 0.000 description 6
- 238000003384 imaging method Methods 0.000 description 4
- 206010070834 Sensitisation Diseases 0.000 description 3
- 230000000670 limiting effect Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000036961 partial effect Effects 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 230000008313 sensitization Effects 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000002452 interceptive effect Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000002238 attenuated effect Effects 0.000 description 1
- YXTPWUNVHCYOSP-UHFFFAOYSA-N bis($l^{2}-silanylidene)molybdenum Chemical compound [Si]=[Mo]=[Si] YXTPWUNVHCYOSP-UHFFFAOYSA-N 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910021344 molybdenum silicide Inorganic materials 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 230000003313 weakening effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
The embodiment of the application discloses a mask plate and an exposure system. The mask plate comprises a light-transmitting substrate, a light shielding part and an anti-diffraction part, wherein the light-transmitting substrate comprises a plurality of first areas and second areas, the first areas and the second areas are arranged at intervals, and the second areas are positioned on the periphery of the first areas. The light shielding part is arranged in the first area. The diffraction prevention part is arranged in the second area and is close to the shading part. The present application aims to improve or even avoid the problem of light diffraction in the prior art affecting the exposure process.
Description
Technical Field
The application relates to the technical field of display, in particular to a mask plate and an exposure system.
Background
In the technology of manufacturing the wirings of the display panel, the wirings are generally formed by exposing and then developing the mask plate on the display panel. With the development of display technology, medium and small-sized wirings are denser, and in order to form denser wirings, the area of a light-transmitting region on a mask plate needs to be smaller.
As shown in fig. 1, the area of the light transmitting area AA between the non-light transmitting areas NA on the mask plate is smaller, and due to the fluctuation of light, when the exposure process is performed on the display panel, the light is diffracted after passing through the light transmitting area AA of the mask plate 10, so that a phenomenon of light wave superposition is formed on one side of the mask plate facing the display panel, and when the light intensity at the non-light transmitting areas reaches a photosensitive limit, the focal point AB cannot fall on the focal plane AC, so that the exposure effect of the subsequent imaging pattern AD is poor. Therefore, it is necessary to develop a mask plate to overcome the drawbacks of the prior art.
Disclosure of Invention
The embodiment of the application provides a mask plate and an exposure system so as to improve and even avoid the problem that light diffraction in the prior art affects an exposure process.
The embodiment of the application provides a mask plate, which comprises:
a light-transmitting substrate including a plurality of first regions arranged at intervals and a second region located at a peripheral side of the first regions;
a light shielding portion provided in the first region; and
and an anti-diffraction part which is arranged in the second area and is close to the light shielding part.
Optionally, in some embodiments of the present application, at least two opposite sides of each of the first regions are provided with the anti-diffraction portions.
Optionally, in some embodiments of the present application, the anti-diffraction portion is in a strip shape and extends along a length direction of the light shielding portion.
Optionally, in some embodiments of the present application, the width of the anti-diffraction portion is less than or equal to 0.5um.
Optionally, in some embodiments of the present application, a distance between the anti-diffraction portion and the light shielding portion is greater than or equal to 0.1um and less than or equal to 0.5um.
Optionally, in some embodiments of the present application, the anti-diffraction portion includes a plurality of shielding sub-portions, and the plurality of shielding sub-portions are disposed at intervals along a length direction of the shielding portion.
Optionally, in some embodiments of the present application, a projection of the shielding portion on the transparent substrate is square or circular.
Optionally, in some embodiments of the present application, a spacing between two adjacent shielding sub-portions is greater than or equal to 0.1um and less than or equal to 0.5um.
Optionally, in some embodiments of the present application, the mask plate further includes a phase shift mask, where the phase shift mask is disposed on the light-transmitting substrate and covers at least a gap between two adjacent shielding sub-portions.
Correspondingly, the embodiment of the application also provides an exposure system, which comprises the mask plate and a light source, wherein the light source is positioned on the light incident side of the mask plate.
The mask plate provided by the embodiment of the application comprises a light-transmitting substrate, a shading part and an anti-diffraction part, wherein the light-transmitting substrate comprises a plurality of first areas and second areas, the first areas are arranged at intervals, and the second areas are located on the periphery of the first areas. The shading part is arranged in the first area. The diffraction preventing part is arranged in the second area and is close to the shading part. This application is through setting up diffraction prevention portion, when implementing exposure technology to display panel, the light can pass the second district of mask plate, and the second district is close to the partial light of shading portion and can be sheltered from by diffraction prevention portion for the mask plate is weakened towards the light intensity of display panel one side, and diffraction prevention portion plays the effect of interfering the cancellation, has reduced the influence of light diffraction, thereby can effectively avoid light diffraction to lead to the problem that the focus did not fall on the focal plane when the light intensity of first district reached sensitization limit, thereby improves exposure effect.
Drawings
Fig. 1 is a schematic diagram of an exposure process of a mask plate provided in the prior art;
fig. 2 is a schematic view of a mask plate provided in the first embodiment of the present application;
fig. 3 is a schematic view of an exposure process of a mask plate provided in the first embodiment of the present application;
fig. 4 is a schematic view of a mask plate according to a second embodiment of the present application.
Detailed Description
The technical solutions in the embodiments of the present application will be described below with reference to the drawings in the embodiments of the present application. The described technical solutions are only used for explaining the inventive idea of the present invention and should not be construed as limiting the scope of protection of the present application. Furthermore, it should be understood that the detailed description is presented herein for purposes of illustration and explanation only and is not intended to limit the present application. In this application, unless otherwise indicated, "upper" and "lower" generally refer to the upper and lower positions of the device in actual use or operation, and particularly the orientation of the drawing figures; while "inner" and "outer" are for the outline of the device.
Referring to fig. 2 and 3, a first embodiment of the present application provides a mask 100, the mask 100 including a light-transmitting substrate 10, a light-shielding portion 20, and an anti-diffraction portion 30, the light-transmitting substrate 10 including a plurality of first areas NA arranged at intervals and second areas AA located at a peripheral side of the first areas NA. The light shielding portion 20 is provided in the first area NA. The diffraction preventing portion 30 is disposed in the second area AA and is close to the light shielding portion 20.
This application is through setting up diffraction prevention portion 30, when implementing exposure technology to display panel, light can pass the second district AA of mask plate 100, and the second district AA is close to the partial light of shading portion 20 and can be sheltered from by diffraction prevention portion 30 for mask plate 100 is weakening towards the light intensity of display panel one side, and diffraction prevention portion 30 plays the effect of interference cancellation, has reduced the influence of light diffraction, thereby can effectively avoid light diffraction can lead to the light intensity of first district NA to reach the problem that the focus did not fall on the focal plane when sensitization limit, thereby improves exposure effect.
The light-transmitting substrate 10 may be a glass substrate, for example, made of a quartz material. In order to further reduce the influence of light diffraction, a plurality of light shielding particles may be disposed in the light-transmitting substrate 10, and the light shielding particles are disposed to overlap with the diffraction preventing portion 30, so that the light intensity of the mask plate 100 on the side facing the display panel is weakened by the light shielding particles, thereby further improving the exposure effect.
The light shielding portion 20 is provided to cover the first region NA of the light-transmitting substrate 10, so that the first region NA of the light-transmitting substrate 10 forms a light-non-transmitting region. The light shielding portion 20 of the mask plate 100 is used to form a pattern of traces during exposure of the display panel. The plurality of first areas NA may be disposed parallel to each other, the lengths of the plurality of first areas NA are the same, and the distances between the adjacent two first areas NA are the same, so that the arrangement manner of forming the plurality of light shielding portions 20 in the later stage is regular, and the distances between the adjacent two first areas NA can be set according to different routing requirements. In order to meet the requirement of dense wiring arrangement of the conventional display panel, the distance between the adjacent first areas NA of the mask plate 100 may be 1.5um, and the width of the light shielding portion 20 is 2.0um. The anti-diffraction portion 30 may be formed in the same manner as the light shielding portion 20, so that the anti-diffraction portion 30 plays a role of shielding light as the light shielding portion 20.
Alternatively, referring to fig. 2 and 3, at least opposite sides of each of the first areas NA are provided with the anti-diffraction portions 30. The diffraction prevention parts 30 are arranged on two opposite sides of the first area NA to further weaken the light intensity below the first area NA, further reduce the influence of diffracted light and improve the exposure effect of an imaging image. Further, the diffraction preventing parts 30 located at opposite sides of the first area NA may be symmetrically disposed with respect to the center of the first area NA.
Alternatively, the diffraction preventing part 30 is in a bar shape and extends in the length direction of the light shielding part 20. By providing the diffraction preventing portion 30 in the form of a bar, not only can the process be effectively simplified, but also it is convenient to extend to the same length as the light shielding portion 20 or longer than the length of the light shielding portion 20, thereby effectively shielding diffracted light at a plurality of positions of the light shielding portion 20 in the length direction.
Further, the width of the diffraction preventing portion 30 is less than or equal to 0.5um. The width D1 of the anti-diffraction portion 30 may be 0.1um, 0.2um, 0.3um, 0.4um, 0.5um, etc., so that the line width dimension of the anti-diffraction portion 30 is outside the imaging range of the panel photoetching machine, and therefore the anti-diffraction portion 30 will not appear in the panel process.
Alternatively, the distance between the diffraction preventing portion 30 and the light shielding portion 20 is greater than or equal to 0.1um and less than or equal to 0.5um. The distance D2 between the diffraction preventing portion 30 and the light shielding portion 20 may be specifically 0.1um, 0.2um, 0.3um, 0.4um, 0.5um, or the like. By limiting the distance between the diffraction preventing portion 30 and the light shielding portion 20, the effect of the light intensity of the light beam approaching the light shielding portion 20 is further reduced, and the effect of interference cancellation of the diffraction preventing portion 30 is improved.
Referring to fig. 4, a second embodiment of the present application is similar to the first embodiment, and the second embodiment is different from the first embodiment in that the anti-diffraction portion 30 includes a plurality of shielding sub-portions 31, and the plurality of shielding sub-portions 31 are disposed at intervals along the length direction of the light shielding portion 20. The anti-diffraction portion 30 is formed by a plurality of shielding sub-portions 31 at intervals, so that light intensity below the first area NA is effectively weakened, interference cancellation is achieved, the imaging focus AB falls on the focal plane AC, the influence of light diffraction is greatly reduced, and the exposure effect is improved.
Optionally, a distance between two adjacent shielding sub-portions 31 is greater than or equal to 0.1um and less than or equal to 0.5um. The spacing between two adjacent shielding sub-portions 31 may be specifically 0.1um, 0.2um, 0.3um, 0.4um, 0.5um, etc., so as to achieve the effect of preventing interference cancellation of the diffraction portion 30 and the difficulty of the manufacturing process. That is, the light shielding effect of the diffraction preventing portion 30 can be effectively improved by making the intervals between the plurality of shielding sub-portions 31 smaller, and the manufacturing process of the diffraction preventing portion 30 can be made simpler by making the intervals between the plurality of shielding sub-portions 31 larger.
Further, the projection of the shielding sub-portion 31 on the light-transmitting substrate 10 is square or circular. The projection shapes of the plurality of shielding sub-portions 31 on the transparent substrate 10 are the same. The projection of the shielding sub-portion 31 may be square or circular, so that the interference cancellation effect of the diffraction preventing portion 30 can be effectively ensured. Further, when the projection of the shielding portion 31 on the transparent substrate 10 is square, the side length of the shielding portion 31 ranges from 0.1um to 0.5um. The side length of the shielding portion 31 may be specifically 0.1um, 0.2um, 0.3um, 0.4um, 0.5um, and the like.
Optionally, the mask plate 100 further includes a phase shift mask (not shown) disposed on the light-transmitting substrate 10 and covering at least a gap between two adjacent shielding sub-portions 31. In order to further reduce the influence of diffracted light, the light intensity of light passing through the gap between the adjacent two shielding sub-portions 31 can be attenuated by providing a phase shift mask while shifting the phase by 180 °, and the effect of canceling the interference of diffracted light is improved due to the opposite phase. Further, the phase shift mask may include two layers, and the material may be molybdenum silicide, and the light may be subjected to interference cancellation twice after passing through the mask plate 100, so that the influence of light diffraction is greatly reduced, and the exposure accuracy is improved.
Correspondingly, the embodiment of the application also provides an exposure system, which comprises the mask plate and a light source, wherein the light source is positioned on the light incident side of the mask plate. The exposure system that this embodiment provided through setting up the diffraction prevention portion, when implementing exposure technology to display panel, light can pass the second district of mask plate, and the second district is close to the partial light of shading portion and can be sheltered from by diffraction prevention portion for mask plate is weakened towards the light intensity of display panel one side, and diffraction prevention portion plays the effect of interfering the cancellation, has reduced the influence of diffracted light, thereby can effectively avoid diffracted light can lead to the light intensity of first district to reach sensitization limit, in order to guarantee that the formation of image focus falls on the focal plane, improves the exposure effect of formation of image pattern.
The foregoing detailed description of the embodiments of the present application is provided merely to facilitate understanding of the method and core ideas of the present application and should not be construed as limiting the scope of protection of the present application.
Claims (10)
1. A mask blank, comprising:
a light-transmitting substrate including a plurality of first regions arranged at intervals and a second region located at a peripheral side of the first regions;
a light shielding portion provided in the first region; and
and an anti-diffraction part which is arranged in the second area and is close to the light shielding part.
2. The mask plate of claim 1, wherein the anti-diffraction portions are disposed on at least opposite sides of the first region.
3. The mask plate according to claim 1, wherein the diffraction preventing portion is in a strip shape and extends in a length direction of the light shielding portion.
4. The mask plate according to claim 3, wherein the width of the diffraction preventing portion is less than or equal to 0.5um.
5. The mask plate according to claim 3, wherein a distance between the diffraction preventing portion and the light shielding portion is greater than or equal to 0.1um and less than or equal to 0.5um.
6. The mask plate according to claim 1, wherein the diffraction preventing portion includes a plurality of shielding sub-portions, the plurality of shielding sub-portions being arranged at intervals along a length direction of the shielding portion.
7. The mask plate according to claim 6, wherein a projection of the shielding sub-portion onto the light-transmitting substrate is square or circular.
8. The mask plate according to claim 6, wherein a spacing between two adjacent shielding sub-portions is greater than or equal to 0.1um and less than or equal to 0.5um.
9. The mask blank according to claim 6, further comprising a phase shift mask disposed on the light-transmitting substrate and covering at least a space between two adjacent shielding sub-portions.
10. An exposure system comprising a light source and a mask plate according to any one of claims 1 to 9, wherein the light source is located on the light entrance side of the mask plate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310565415.2A CN117471840A (en) | 2023-05-18 | 2023-05-18 | Mask plate and exposure system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310565415.2A CN117471840A (en) | 2023-05-18 | 2023-05-18 | Mask plate and exposure system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN117471840A true CN117471840A (en) | 2024-01-30 |
Family
ID=89636722
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202310565415.2A Pending CN117471840A (en) | 2023-05-18 | 2023-05-18 | Mask plate and exposure system |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN117471840A (en) |
-
2023
- 2023-05-18 CN CN202310565415.2A patent/CN117471840A/en active Pending
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