CN117421864A - Process determination method, process determination device, computer equipment and storage medium - Google Patents

Process determination method, process determination device, computer equipment and storage medium Download PDF

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CN117421864A
CN117421864A CN202311244110.8A CN202311244110A CN117421864A CN 117421864 A CN117421864 A CN 117421864A CN 202311244110 A CN202311244110 A CN 202311244110A CN 117421864 A CN117421864 A CN 117421864A
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黄钦文
恩云飞
周斌
阮彬
董显山
苏伟
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China Electronic Product Reliability and Environmental Testing Research Institute
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Abstract

本申请涉及一种工艺确定方法、装置、计算机设备及存储介质,涉及人工智能技术领域。所述方法包括:确定待分析器件在初始状态下的初始谐振频率和初始品质因子;根据至少一种候选工艺对待分析器件进行封装处理,得到至少一个候选封装状态下的待分析器件,并确定待分析器件在各候选封装状态下的候选谐振频率和候选品质因子;根据待分析器件在初始状态下的初始谐振频率和初始品质因子,以及待分析器件在各候选封装状态下的候选谐振频率和候选品质因子,从各候选工艺中确定待分析器件对应的目标工艺。本申请能够准确的从候选工艺中确定目标工艺,保证了在根据目标工艺对待分析器件进行封装处理后,对待分析器件的品质因子影响最小。

This application relates to a process determination method, device, computer equipment and storage medium, and relates to the field of artificial intelligence technology. The method includes: determining the initial resonant frequency and initial quality factor of the device to be analyzed in an initial state; packaging the device to be analyzed according to at least one candidate process to obtain the device to be analyzed in at least one candidate packaging state, and determining the device to be analyzed. Analyze the candidate resonant frequency and candidate quality factor of the device in each candidate packaging state; according to the initial resonant frequency and initial quality factor of the device to be analyzed in the initial state, and the candidate resonant frequency and candidate quality factor of the device to be analyzed in each candidate packaging state Quality factor determines the target process corresponding to the device to be analyzed from each candidate process. This application can accurately determine the target process from the candidate processes, ensuring that after the device to be analyzed is packaged according to the target process, the quality factor of the device to be analyzed is minimally affected.

Description

工艺确定方法、装置、计算机设备及存储介质Process determination methods, devices, computer equipment and storage media

技术领域Technical field

本申请涉及人工智能技术领域,特别是涉及一种工艺确定方法、装置、计算机设备及存储介质。This application relates to the field of artificial intelligence technology, and in particular to a process determination method, device, computer equipment and storage medium.

背景技术Background technique

为保证部分易损器件的器件结构免受外部环境影响,需要对器件进行真空封装处理,进而有效降低器件的气阻,提高器件的灵敏度和性能稳定性。例如,针对MEMS(MicroElectro Mechanical Systems,微机电系统)器件,可采用晶圆级真空封装技术进行封装处理。In order to ensure that the device structure of some vulnerable devices is protected from the influence of the external environment, the devices need to be vacuum encapsulated, thereby effectively reducing the air resistance of the device and improving the sensitivity and performance stability of the device. For example, for MEMS (MicroElectro Mechanical Systems, microelectromechanical systems) devices, wafer-level vacuum packaging technology can be used for packaging processing.

但是,对器件进行真空封装处理的候选工艺(可以为键合工艺)有很多,当采用不同的候选工艺对同一器件进行真空封装处理时,会对器件的品质因子产生不同的影响,因此,现有技术中可通过获取不同候选工艺进行真空封装处理后器件的品质因子,并对各器件的品质因子进行大小比较,从而,在候选工艺中确定对器件的品质因子影响最小的目标工艺。However, there are many candidate processes (which can be bonding processes) for vacuum packaging of devices. When using different candidate processes to vacuum package the same device, it will have different impacts on the quality factor of the device. Therefore, now In the prior art, the quality factors of devices after vacuum packaging processing in different candidate processes can be obtained, and the quality factors of each device can be compared to determine the target process that has the smallest impact on the quality factor of the device among the candidate processes.

但是,影响器件品质因子的因素有很多,采用现有技术无法准确从候选工艺中确定对器件的品质因子影响最小的目标工艺。However, there are many factors that affect the quality factor of the device, and it is impossible to accurately determine the target process that has the least impact on the quality factor of the device from the candidate processes using existing technology.

发明内容Contents of the invention

基于此,有必要针对上述技术问题,提供一种能够优化封装键合工艺的工艺确定方法、装置、计算机设备及存储介质。Based on this, it is necessary to provide a process determination method, device, computer equipment and storage medium that can optimize the packaging bonding process in view of the above technical problems.

第一方面,本申请提供了一种工艺确定方法,该方法包括:In the first aspect, this application provides a process determination method, which method includes:

确定待分析器件在初始状态下的初始谐振频率和初始品质因子;Determine the initial resonant frequency and initial quality factor of the device to be analyzed in the initial state;

根据至少一种候选工艺对待分析器件进行封装处理,得到至少一个候选封装状态下的待分析器件,并确定待分析器件在各候选封装状态下的候选谐振频率和候选品质因子;Package the device to be analyzed according to at least one candidate process, obtain the device to be analyzed in at least one candidate packaging state, and determine the candidate resonant frequency and candidate quality factor of the device to be analyzed in each candidate packaging state;

根据待分析器件在初始状态下的初始谐振频率和初始品质因子,以及待分析器件在各候选封装状态下的候选谐振频率和候选品质因子,从各候选工艺中确定待分析器件对应的目标工艺。According to the initial resonant frequency and initial quality factor of the device to be analyzed in the initial state, and the candidate resonant frequency and candidate quality factor of the device to be analyzed in each candidate packaging state, the target process corresponding to the device to be analyzed is determined from each candidate process.

在其中一个实施例中,根据待分析器件在初始状态下的初始谐振频率和初始品质因子,以及待分析器件在各候选封装状态下的候选谐振频率和候选品质因子,从各候选工艺中确定待分析器件对应的目标工艺,包括:In one embodiment, based on the initial resonant frequency and initial quality factor of the device to be analyzed in the initial state, and the candidate resonant frequency and candidate quality factor of the device to be analyzed in each candidate packaging state, the candidate process is determined from each candidate process. Analyze the target process corresponding to the device, including:

根据待分析器件在初始状态下的初始谐振频率和初始品质因子,以及待分析器件在各候选封装状态下的候选谐振频率和候选品质因子,确定待分析器件在各候选封装状态下的目标品质变化量;According to the initial resonant frequency and initial quality factor of the device to be analyzed in the initial state, and the candidate resonant frequency and candidate quality factor of the device to be analyzed in each candidate packaging state, the target quality change of the device to be analyzed in each candidate packaging state is determined quantity;

根据待分析器件在各候选封装状态下的目标品质变化量,从各候选工艺中确定待分析器件对应的目标工艺。According to the target quality variation of the device to be analyzed in each candidate packaging state, the target process corresponding to the device to be analyzed is determined from each candidate process.

在其中一个实施例中,根据待分析器件在初始状态下的初始谐振频率和初始品质因子,以及待分析器件在各候选封装状态下的候选谐振频率和候选品质因子,确定待分析器件在各候选封装状态下的目标品质变化量,包括:In one embodiment, based on the initial resonant frequency and initial quality factor of the device to be analyzed in the initial state, and the candidate resonant frequency and candidate quality factor of the device to be analyzed in each candidate packaging state, it is determined that the device to be analyzed is in each candidate state. The target quality variation in the packaging state includes:

针对每一候选封装状态,确定待分析器件在该候选封装状态下的候选谐振频率与初始谐振频率之间的谐振变化量,以及确定待分析器件在该候选封装状态下的候选品质因子与初始品质因子之间的初始品质变化量;For each candidate packaging state, determine the resonance change amount between the candidate resonant frequency and the initial resonant frequency of the device to be analyzed in the candidate packaging state, and determine the candidate quality factor and initial quality of the device to be analyzed in the candidate packaging state The amount of initial quality variation between factors;

对初始品质变化量和谐振变化量进行差值运算,得到待分析器件在该候选封装状态下的目标品质变化量。Perform a difference operation on the initial quality change amount and the resonance change amount to obtain the target quality change amount of the device to be analyzed in the candidate packaging state.

在其中一个实施例中,确定待分析器件在该候选封装状态下的候选谐振频率与初始谐振频率之间的谐振变化量,以及确定待分析器件在该候选封装状态下的候选品质因子与初始品质因子之间的初始品质变化量,包括:In one embodiment, the resonance change amount between the candidate resonant frequency and the initial resonant frequency of the device to be analyzed in the candidate packaging state is determined, and the candidate quality factor and the initial quality of the device to be analyzed in the candidate packaging state are determined. The amount of initial quality variation between factors, including:

对待分析器件在该候选封装状态下的候选谐振频率与初始谐振频率进行差值运算,得到第一运算结果;Perform a difference operation between the candidate resonant frequency and the initial resonant frequency of the device to be analyzed in the candidate packaging state to obtain the first operation result;

将第一运算结果和初始谐振频率的比值作为谐振变化量;The ratio of the first operation result and the initial resonant frequency is used as the resonance change amount;

对待分析器件在该候选封装状态下的候选品质因子与初始品质因子进行差值运算,得到第二运算结果;Perform a difference operation between the candidate quality factor and the initial quality factor of the device to be analyzed in the candidate packaging state to obtain the second operation result;

将第二运算结果和初始品质因子的比值作为初始品质变化量。The ratio of the second operation result and the initial quality factor is used as the initial quality change amount.

在其中一个实施例中,根据待分析器件在各候选封装状态下的目标品质变化量,从各候选工艺中确定待分析器件对应的目标工艺,包括:In one embodiment, the target process corresponding to the device to be analyzed is determined from each candidate process based on the target quality change of the device to be analyzed in each candidate packaging state, including:

根据待分析器件在各候选封装状态下的目标品质变化量,从各候选封装状态中确定目标品质变化量最小的目标封装状态;According to the target quality variation of the device to be analyzed in each candidate packaging state, determine the target packaging state with the smallest target quality variation from each candidate packaging state;

将目标封装状态对应的候选工艺作为待分析器件对应的目标工艺。The candidate process corresponding to the target packaging state is used as the target process corresponding to the device to be analyzed.

在其中一个实施例中,确定待分析器件在初始状态下的初始谐振频率和初始品质因子,包括:In one embodiment, determining the initial resonant frequency and initial quality factor of the device to be analyzed in the initial state includes:

确定待分析器件的模态质量、模态刚度和模态阻尼力系数;Determine the modal mass, modal stiffness and modal damping force coefficient of the device to be analyzed;

根据模态质量和模态刚度,确定待分析器件在初始状态下的初始谐振频率;According to the modal quality and modal stiffness, determine the initial resonant frequency of the device to be analyzed in the initial state;

根据待分析器件的模态质量、模态阻尼力系数和初始谐振频率,确定待分析器件在初始状态下的初始品质因子。According to the modal quality, modal damping force coefficient and initial resonant frequency of the device to be analyzed, the initial quality factor of the device to be analyzed in the initial state is determined.

第二方面,本申请还提供了一种工艺确定装置,包括:In a second aspect, this application also provides a process determination device, including:

第一确定模块,用于确定待分析器件在初始状态下的初始谐振频率和初始品质因子;The first determination module is used to determine the initial resonant frequency and initial quality factor of the device to be analyzed in the initial state;

第二确定模块,用于根据至少一种候选工艺对待分析器件进行封装处理,得到至少一个候选封装状态下的待分析器件,并确定待分析器件在各候选封装状态下的候选谐振频率和候选品质因子;The second determination module is used to package the device to be analyzed according to at least one candidate process, obtain the device to be analyzed in at least one candidate packaging state, and determine the candidate resonant frequency and candidate quality of the device to be analyzed in each candidate packaging state. factor;

第三确定模块,用于根据待分析器件在初始状态下的初始谐振频率和初始品质因子,以及待分析器件在各候选封装状态下的候选谐振频率和候选品质因子,从各候选工艺中确定待分析器件对应的目标工艺。The third determination module is used to determine the candidate resonant frequency and candidate quality factor from each candidate process based on the initial resonant frequency and initial quality factor of the device to be analyzed in the initial state, and the candidate resonant frequency and candidate quality factor of the device to be analyzed in each candidate packaging state. Analyze the target process corresponding to the device.

第三方面,本申请还提供了一种计算机设备,包括存储器和处理器,存储器存储有计算机程序,处理器执行计算机程序时实现以下步骤:In a third aspect, this application also provides a computer device, including a memory and a processor. The memory stores a computer program. When the processor executes the computer program, it implements the following steps:

确定待分析器件在初始状态下的初始谐振频率和初始品质因子;Determine the initial resonant frequency and initial quality factor of the device to be analyzed in the initial state;

根据至少一种候选工艺对待分析器件进行封装处理,得到至少一个候选封装状态下的待分析器件,并确定待分析器件在各候选封装状态下的候选谐振频率和候选品质因子;Package the device to be analyzed according to at least one candidate process, obtain the device to be analyzed in at least one candidate packaging state, and determine the candidate resonant frequency and candidate quality factor of the device to be analyzed in each candidate packaging state;

根据待分析器件在初始状态下的初始谐振频率和初始品质因子,以及待分析器件在各候选封装状态下的候选谐振频率和候选品质因子,从各候选工艺中确定待分析器件对应的目标工艺。According to the initial resonant frequency and initial quality factor of the device to be analyzed in the initial state, and the candidate resonant frequency and candidate quality factor of the device to be analyzed in each candidate packaging state, the target process corresponding to the device to be analyzed is determined from each candidate process.

第四方面,本申请还提供了一种计算机可读存储介质,其上存储有计算机程序,计算机程序被处理器执行时实现以下步骤:In a fourth aspect, this application also provides a computer-readable storage medium on which a computer program is stored. When the computer program is executed by a processor, the following steps are implemented:

确定待分析器件在初始状态下的初始谐振频率和初始品质因子;Determine the initial resonant frequency and initial quality factor of the device to be analyzed in the initial state;

根据至少一种候选工艺对待分析器件进行封装处理,得到至少一个候选封装状态下的待分析器件,并确定待分析器件在各候选封装状态下的候选谐振频率和候选品质因子;Package the device to be analyzed according to at least one candidate process, obtain the device to be analyzed in at least one candidate packaging state, and determine the candidate resonant frequency and candidate quality factor of the device to be analyzed in each candidate packaging state;

根据待分析器件在初始状态下的初始谐振频率和初始品质因子,以及待分析器件在各候选封装状态下的候选谐振频率和候选品质因子,从各候选工艺中确定待分析器件对应的目标工艺。According to the initial resonant frequency and initial quality factor of the device to be analyzed in the initial state, and the candidate resonant frequency and candidate quality factor of the device to be analyzed in each candidate packaging state, the target process corresponding to the device to be analyzed is determined from each candidate process.

第五方面,本申请还提供了一种计算机程序产品,包括计算机程序,该计算机程序被处理器执行时实现以下步骤:In a fifth aspect, this application also provides a computer program product, including a computer program that implements the following steps when executed by a processor:

确定待分析器件在初始状态下的初始谐振频率和初始品质因子;Determine the initial resonant frequency and initial quality factor of the device to be analyzed in the initial state;

根据至少一种候选工艺对待分析器件进行封装处理,得到至少一个候选封装状态下的待分析器件,并确定待分析器件在各候选封装状态下的候选谐振频率和候选品质因子;Package the device to be analyzed according to at least one candidate process, obtain the device to be analyzed in at least one candidate packaging state, and determine the candidate resonant frequency and candidate quality factor of the device to be analyzed in each candidate packaging state;

根据待分析器件在初始状态下的初始谐振频率和初始品质因子,以及待分析器件在各候选封装状态下的候选谐振频率和候选品质因子,从各候选工艺中确定待分析器件对应的目标工艺。According to the initial resonant frequency and initial quality factor of the device to be analyzed in the initial state, and the candidate resonant frequency and candidate quality factor of the device to be analyzed in each candidate packaging state, the target process corresponding to the device to be analyzed is determined from each candidate process.

上述工艺确定方法、装置、计算机设备及存储介质,根据待分析器件在初始状态下的初始谐振频率和初始品质因子,以及待分析器件在各候选封装状态下的候选谐振频率和候选品质因子,从各候选工艺中确定待分析器件对应的目标工艺。由于上述过程中,本申请从各候选工艺中确定目标工艺时,不仅考虑了初始品质因子和各候选封装状态下的候选品质因子,还考虑了初始谐振频率和各候选封装状态下的候选谐振频率,进而,消除了其他因素(谐振频率)对待分析器件品质因子的变化量的影响,使得后续能够准确的从候选工艺中确定目标工艺,保证了在根据目标工艺对待分析器件进行封装处理后,对待分析器件的品质因子影响最小。The above-mentioned process determination method, device, computer equipment and storage medium are based on the initial resonant frequency and initial quality factor of the device to be analyzed in the initial state, and the candidate resonant frequency and candidate quality factor of the device to be analyzed in each candidate packaging state, from Determine the target process corresponding to the device to be analyzed among each candidate process. Due to the above process, when this application determines the target process from each candidate process, it not only considers the initial quality factor and the candidate quality factor in each candidate packaging state, but also considers the initial resonant frequency and the candidate resonant frequency in each candidate packaging state. , furthermore, the influence of other factors (resonant frequency) on the change of the quality factor of the device to be analyzed is eliminated, so that the target process can be accurately determined from the candidate processes in the future, ensuring that after the device to be analyzed is packaged according to the target process, the The quality factor of the analytical device is minimally affected.

附图说明Description of the drawings

为了更清楚地说明本申请实施例或相关技术中的技术方案,下面将对实施例或相关技术描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本申请的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。In order to more clearly explain the technical solutions in the embodiments of the present application or related technologies, the drawings needed to be used in the description of the embodiments or related technologies will be briefly introduced below. Obviously, the drawings in the following description are only for the purpose of describing the embodiments or related technologies. For some embodiments of the application, those of ordinary skill in the art can also obtain other drawings based on these drawings without exerting creative efforts.

图1为本申请实施例提供的工艺确定方法的应用环境图;Figure 1 is an application environment diagram of the process determination method provided by the embodiment of the present application;

图2为本申请实施例提供的工艺确定方法的流程图;Figure 2 is a flow chart of a process determination method provided by an embodiment of the present application;

图3为本申请实施例提供的确定待分析器件对应的目标工艺的步骤流程图;Figure 3 is a flow chart of steps for determining the target process corresponding to the device to be analyzed provided by the embodiment of the present application;

图4为本申请实施例提供的确定目标品质变化量的步骤流程图;Figure 4 is a flow chart of steps for determining the target quality change provided by an embodiment of the present application;

图5为本申请实施例提供的确定初始谐振频率和初始品质因子的步骤流程图;Figure 5 is a flow chart of steps for determining the initial resonant frequency and initial quality factor provided by the embodiment of the present application;

图6为本申请实施例提供的另一种工艺确定方法的流程图;Figure 6 is a flow chart of another process determination method provided by the embodiment of the present application;

图7为本申请实施例提供的第一种工艺确定装置的结构框图;Figure 7 is a structural block diagram of the first process determination device provided by the embodiment of the present application;

图8为本申请实施例提供的第二种工艺确定装置的结构框图;Figure 8 is a structural block diagram of the second process determination device provided by the embodiment of the present application;

图9为本申请实施例提供的第三种工艺确定装置的结构框图;Figure 9 is a structural block diagram of a third process determination device provided by an embodiment of the present application;

图10为本申请实施例提供的第四种工艺确定装置的结构框图;Figure 10 is a structural block diagram of the fourth process determination device provided by the embodiment of the present application;

图11为本申请实施例提供的第五种工艺确定装置的结构框图;Figure 11 is a structural block diagram of the fifth process determination device provided by the embodiment of the present application;

图12为一个实施例中计算机设备的内部结构图。Figure 12 is an internal structure diagram of a computer device in one embodiment.

具体实施方式Detailed ways

为了使本申请的目的、技术方案及优点更加清楚明白,以下结合附图及实施例,对本申请进行进一步详细说明。应当理解,此处描述的具体实施例仅仅用以解释本申请,并不用于限定本申请。In order to make the purpose, technical solutions and advantages of the present application clearer, the present application will be further described in detail below with reference to the drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present application and are not used to limit the present application.

基于上述情况,本申请实施例提供的工艺确定方法,可以应用于如图1所示的应用环境中。在一个实施例中,提供了一种计算机设备,该计算机设备可以是服务器,其内部结构图可以如图1所示。该计算机设备包括通过系统总线连接的处理器、存储器和网络接口。其中,该计算机设备的处理器用于提供计算和控制能力。该计算机设备的存储器包括非易失性存储介质和内存储器。该非易失性存储介质存储有操作系统、计算机程序和数据库。该内存储器为非易失性存储介质中的操作系统和计算机程序的运行提供环境。该计算机设备的数据库用于存储工艺确定方法的获取数据。该计算机设备的网络接口用于与外部的终端通过网络连接通信。该计算机程序被处理器执行时以实现一种工艺确定方法。Based on the above situation, the process determination method provided by the embodiment of the present application can be applied in the application environment as shown in Figure 1. In one embodiment, a computer device is provided. The computer device may be a server, and its internal structure diagram may be as shown in Figure 1 . The computer device includes a processor, memory, and network interfaces connected through a system bus. Wherein, the processor of the computer device is used to provide computing and control capabilities. The memory of the computer device includes non-volatile storage media and internal memory. The non-volatile storage medium stores operating systems, computer programs and databases. This internal memory provides an environment for the execution of operating systems and computer programs in non-volatile storage media. The database of the computer device is used to store the acquisition data of the process determination method. The network interface of the computer device is used to communicate with external terminals through a network connection. The computer program, when executed by the processor, implements a process determination method.

本申请公开了一种工艺确定方法、装置、计算机设备及存储介质,通过待分析器件在初始状态下的初始谐振频率和初始品质因子,以及待分析器件在各候选封装状态下的候选谐振频率和候选品质因子,从各候选工艺中确定待分析器件对应的目标工艺。This application discloses a process determination method, device, computer equipment and storage medium. Through the initial resonant frequency and initial quality factor of the device to be analyzed in the initial state, as well as the candidate resonant frequency and the candidate resonant frequency of the device to be analyzed in each candidate packaging state. The candidate quality factor determines the target process corresponding to the device to be analyzed from each candidate process.

在一个示例性的实施例中,如图2所示,提供了一种工艺确定方法,以该方法应用于图1中的计算机设备为例进行说明,包括以下步骤201至步骤203。其中:In an exemplary embodiment, as shown in FIG. 2 , a process determination method is provided, which is described by taking the method applied to the computer equipment in FIG. 1 as an example, including the following steps 201 to 203 . in:

步骤201,确定待分析器件在初始状态下的初始谐振频率和初始品质因子。Step 201: Determine the initial resonant frequency and initial quality factor of the device to be analyzed in the initial state.

其中,待分析器件可以为MEMS器件,MEMS器件可以包括:电容式Z轴双解耦音叉陀螺、MEMS麦克风、微马达、微泵、微振子等。Among them, the device to be analyzed can be a MEMS device, and the MEMS device can include: capacitive Z-axis double decoupling tuning fork gyroscope, MEMS microphone, micromotor, micropump, microoscillator, etc.

其中,初始状态指的是待分析器件未封装时的状态,和/或,待分析器件在指定时刻的状态。初始谐振频率指的是待分析器件在初始状态下的谐振频率;初始品质因子指的是待分析器件在初始状态下的品质因子。The initial state refers to the state of the device to be analyzed when it is not packaged, and/or the state of the device to be analyzed at a specified moment. The initial resonant frequency refers to the resonant frequency of the device to be analyzed in the initial state; the initial quality factor refers to the quality factor of the device to be analyzed in the initial state.

作为一种实现方式,当需要确定待分析器件在初始状态下的初始谐振频率和初始品质因子时,可根据待分析器件的模态质量、模态刚度和模态阻尼力系数,通过谐振频率计算公式和品质因子计算公式,得到待分析器件在初始状态下的初始谐振频率和初始品质因子。As an implementation method, when it is necessary to determine the initial resonant frequency and initial quality factor of the device to be analyzed in the initial state, the resonant frequency can be calculated based on the modal mass, modal stiffness and modal damping force coefficient of the device to be analyzed. Formula and quality factor calculation formula to obtain the initial resonant frequency and initial quality factor of the device to be analyzed in the initial state.

具体的,将待分析器件的模态质量、模态刚度代入谐振频率计算公式,得到待分析器件在初始状态下的初始谐振频率,进一步的,将待分析器件在初始状态下的初始谐振频率、模态质量和模态阻尼力系数代入品质因子计算公式,得到待分析器件在初始状态下的初始品质因子。Specifically, the modal quality and modal stiffness of the device to be analyzed are substituted into the resonant frequency calculation formula to obtain the initial resonant frequency of the device to be analyzed in the initial state. Further, the initial resonant frequency and modal stiffness of the device to be analyzed in the initial state are obtained. The modal mass and modal damping force coefficient are substituted into the quality factor calculation formula to obtain the initial quality factor of the device to be analyzed in the initial state.

作为另一种实现方式,当需要确定待分析器件在初始状态下的初始谐振频率和初始品质因子时,可通过谐振频率测试电路以及品质因子测试电路对待分析器件进行测试,分别得到待分析器件在初始状态下的初始谐振频率和初始品质因子。As another implementation method, when it is necessary to determine the initial resonant frequency and initial quality factor of the device to be analyzed in the initial state, the device to be analyzed can be tested through the resonant frequency test circuit and the quality factor test circuit to obtain the values of the device to be analyzed respectively. Initial resonant frequency and initial quality factor in the initial state.

具体的,将待分析器件接入到谐振频率测试电路中,通过谐振频率测试电路对待分析器件进行测试,得到谐振频率测试结果,该结果即为待分析器件在初始状态下的初始谐振频率;将待分析器件接入到品质因子测试电路中,通过品质因子测试电路对待分析器件进行测试,得到品质因子测试结果,该结果即为待分析器件在初始状态下的初始品质因子。Specifically, the device to be analyzed is connected to the resonant frequency test circuit, and the device to be analyzed is tested through the resonant frequency test circuit to obtain the resonant frequency test result, which is the initial resonant frequency of the device to be analyzed in the initial state; The device to be analyzed is connected to the quality factor test circuit, and the device to be analyzed is tested through the quality factor test circuit to obtain the quality factor test result, which is the initial quality factor of the device to be analyzed in the initial state.

作为又一种实现方式,当需要确定待分析器件在初始状态下的初始谐振频率和初始品质因子时,可通过谐振频率光学检测器和品质因子光学检测器对待分析器件进行检测,根据检测结果,得到待分析器件在初始状态下的初始谐振频率和初始品质因子。As another implementation method, when it is necessary to determine the initial resonant frequency and initial quality factor of the device to be analyzed in the initial state, the device to be analyzed can be detected through the resonant frequency optical detector and the quality factor optical detector. According to the detection results, Obtain the initial resonant frequency and initial quality factor of the device to be analyzed in the initial state.

具体的,将激光照射到待分析器件上,通过谐振频率光学检测器接收光信号,对光信号进行光电信号转化和分析,得到待分析器件在初始状态下的初始谐振频率;将激光照射到待分析器件上,通过品质因子光学检测器检测并接收光信号,对光信号进行光电信号转化和分析,得到待分析器件在初始状态下的初始品质因子。Specifically, the laser is irradiated on the device to be analyzed, the optical signal is received through the resonant frequency optical detector, the optical signal is converted and analyzed into photoelectric signals, and the initial resonant frequency of the device to be analyzed in the initial state is obtained; the laser is irradiated onto the device to be analyzed. On the analysis device, the optical signal is detected and received through the quality factor optical detector, and the optical signal is converted and analyzed into photoelectric signals to obtain the initial quality factor of the device to be analyzed in the initial state.

综上所述,确定待分析器件在初始状态下的初始谐振频率和初始品质因子的方法有很多,本申请不对确定待分析器件在初始状态下的初始谐振频率和初始品质因子的方法进行限定。To sum up, there are many methods for determining the initial resonant frequency and initial quality factor of the device to be analyzed in the initial state. This application does not limit the method of determining the initial resonant frequency and initial quality factor of the device to be analyzed in the initial state.

步骤202,根据至少一种候选工艺对待分析器件进行封装处理,得到至少一个候选封装状态下的待分析器件,并确定待分析器件在各候选封装状态下的候选谐振频率和候选品质因子。Step 202: Package the device to be analyzed according to at least one candidate process to obtain the device to be analyzed in at least one candidate packaging state, and determine the candidate resonant frequency and candidate quality factor of the device to be analyzed in each candidate packaging state.

其中,候选工艺指的是对待分析器件进行封装所使用的键合工艺;候选封装状态指的是待分析器件经过候选工艺封装后的状态。候选谐振频率指的是待分析器件在候选封装状态下的谐振频率;候选品质因子指的是待分析器件在候选封装状态下的品质因子。Among them, the candidate process refers to the bonding process used to package the device to be analyzed; the candidate packaging state refers to the state of the device to be analyzed after being packaged by the candidate process. The candidate resonant frequency refers to the resonant frequency of the device to be analyzed in the candidate packaging state; the candidate quality factor refers to the quality factor of the device to be analyzed in the candidate packaging state.

需要说明的是,采用不同的候选工艺在对待分析器件进行封装后,会对待分析器件的品质因子产生不同程度的影响,因此,可通过分析封装前后待分析器件品质因子的变化量,使得后续能够从候选工艺中确定目标工艺,但是,品质因子不仅仅会受到候选工艺的封装影响而发生改变,还会因键合应力而产生改变,因此,可通过获取分析封装前后待分析器件谐振频率的变化量,来反映键合应力对品质因子的影响程度,进而,消除了谐振频率(键合应力)对待分析器件品质因子的变化量的影响,使得后续能够准确的从候选工艺中确定目标工艺。It should be noted that using different candidate processes to package the device to be analyzed will have varying degrees of impact on the quality factor of the device to be analyzed. Therefore, the change in the quality factor of the device to be analyzed before and after packaging can be analyzed to enable subsequent Determine the target process from the candidate process. However, the quality factor will not only be changed by the packaging of the candidate process, but also by the bonding stress. Therefore, the change in the resonant frequency of the device to be analyzed before and after packaging can be obtained and analyzed. quantity to reflect the degree of influence of bonding stress on the quality factor, thereby eliminating the influence of the resonant frequency (bonding stress) on the change in the quality factor of the device to be analyzed, so that the target process can be accurately determined from the candidate processes.

需要说明的是,候选工艺包括候选工艺技术和候选工艺环境,其中,候选工艺技术指的是对待分析器件的封装流程,候选工艺环境指的是对待分析器件进行封装时所处的环境;其中,候选工艺环境可分为封装气压环境和封装环境温度。It should be noted that the candidate process includes candidate process technology and candidate process environment, where the candidate process technology refers to the packaging process of the device to be analyzed, and the candidate process environment refers to the environment in which the device to be analyzed is packaged; where, Candidate process environments can be divided into packaging air pressure environment and packaging environment temperature.

进一步说明,各候选工艺的候选工艺技术不同,和/或,候选工艺环境不同;其中,候选工艺环境不同包括以下三种情况:(1)封装气压环境不同,但是封装环境温度相同;(2)封装气压环境相同,但是封装环境温度不同;(3)封装气压环境不同,并且封装环境温度也不同。It is further explained that the candidate process technologies of each candidate process are different, and/or the candidate process environments are different; among them, the candidate process environments are different including the following three situations: (1) The packaging air pressure environment is different, but the packaging environment temperature is the same; (2) The packaging air pressure environment is the same, but the packaging environment temperature is different; (3) The packaging air pressure environment is different, and the packaging environment temperature is also different.

需要说明的是,确定待分析器件在候选封装状态下的候选谐振频率和候选品质因子的方法有很多,例如,根据谐振频率计算公式和品质因子计算公式,确定待分析器件在候选封装状态下的候选谐振频率和候选品质因子,或者,通过谐振频率测试电路以及品质因子测试电路对待分析器件进行测试,根据测试结果,确定待分析器件在候选封装状态下的候选谐振频率和候选品质因子,或者,通过谐振频率光学检测器和品质因子光学检测器对待分析器件进行检测,根据检测结果,确定待分析器件在候选封装状态下的候选谐振频率和候选品质因子。可理解为,可通过多种方式确定待分析器件在候选封装状态下的候选谐振频率和候选品质因子,在此不对待分析器件在候选封装状态下的候选谐振频率和候选品质因子的确定方法进行一一赘述,下面将针对上述三种方法,进行详细说明:It should be noted that there are many methods for determining the candidate resonant frequency and candidate quality factor of the device to be analyzed in the candidate packaging state. For example, according to the resonant frequency calculation formula and the quality factor calculation formula, determine the candidate resonant frequency and candidate quality factor of the device to be analyzed in the candidate packaging state. Candidate resonant frequency and candidate quality factor, or, test the device to be analyzed through the resonant frequency test circuit and quality factor test circuit, and determine the candidate resonant frequency and candidate quality factor of the device to be analyzed in the candidate packaging state according to the test results, or, The device to be analyzed is detected through the resonant frequency optical detector and the quality factor optical detector, and based on the detection results, the candidate resonant frequency and candidate quality factor of the device to be analyzed in the candidate packaging state are determined. It can be understood that the candidate resonant frequency and candidate quality factor of the device to be analyzed in the candidate packaging state can be determined in a variety of ways. The method for determining the candidate resonant frequency and candidate quality factor of the device to be analyzed in the candidate packaging state will not be discussed here. Let’s go into details one by one. The above three methods will be explained in detail below:

作为一种实现方式,当需要确定待分析器件在候选封装状态下的候选谐振频率和候选品质因子时,可根据候选封装状态下的待分析器件的模态质量、模态刚度和模态阻尼力系数,通过谐振频率计算公式和品质因子计算公式,得到待分析器件在候选封装状态下的候选谐振频率和候选品质因子。As an implementation method, when it is necessary to determine the candidate resonant frequency and candidate quality factor of the device to be analyzed in the candidate packaging state, the modal quality, modal stiffness and modal damping force of the device to be analyzed in the candidate packaging state can be Coefficient, through the resonant frequency calculation formula and the quality factor calculation formula, the candidate resonant frequency and candidate quality factor of the device to be analyzed in the candidate packaging state are obtained.

具体的,将待分析器件在候选封装状态下的模态质量、模态刚度代入谐振频率计算公式,得到待分析器件在候选封装状态下的候选谐振频率,进一步的,将待分析器件在候选封装状态下的候选谐振频率,以及待分析器件在候选封装状态下的模态质量和模态阻尼力系数代入品质因子计算公式,得到待分析器件在候选封装状态下的候选品质因子。Specifically, the modal quality and modal stiffness of the device to be analyzed in the candidate packaging state are substituted into the resonant frequency calculation formula to obtain the candidate resonant frequency of the device to be analyzed in the candidate packaging state. Further, the candidate resonant frequency of the device to be analyzed in the candidate package is obtained. The candidate resonant frequency in the state, as well as the modal quality and modal damping force coefficient of the device to be analyzed in the candidate packaging state are substituted into the quality factor calculation formula to obtain the candidate quality factor of the device to be analyzed in the candidate packaging state.

作为另一种实现方式,当需要确定待分析器件在候选封装状态下的候选谐振频率和候选品质因子时,可通过谐振频率测试电路以及品质因子测试电路对待分析器件进行测试,分别得到待分析器件在候选封装状态下的候选谐振频率和候选品质因子。As another implementation method, when it is necessary to determine the candidate resonant frequency and candidate quality factor of the device to be analyzed in the candidate packaging state, the device to be analyzed can be tested through the resonant frequency test circuit and the quality factor test circuit to obtain the device to be analyzed respectively. Candidate resonant frequency and candidate quality factor in the candidate packaging state.

具体的,将候选封装状态下的待分析器件接入到谐振频率测试电路中,通过谐振频率测试电路对候选封装状态下的待分析器件进行测试,得到谐振频率测试结果,该结果即为待分析器件在候选封装状态下的候选谐振频率;将候选封装状态下的待分析器件接入到品质因子测试电路中,通过品质因子测试电路对候选封装状态下的待分析器件进行测试,得到品质因子测试结果,该结果即为待分析器件在候选封装状态下的候选品质因子。Specifically, the device to be analyzed in the candidate package state is connected to the resonant frequency test circuit, and the device to be analyzed in the candidate package state is tested through the resonant frequency test circuit to obtain the resonant frequency test result, which is the result to be analyzed. The candidate resonant frequency of the device in the candidate packaging state; connect the device to be analyzed in the candidate packaging state to the quality factor test circuit, and test the device to be analyzed in the candidate packaging state through the quality factor test circuit to obtain the quality factor test As a result, the result is the candidate quality factor of the device to be analyzed in the candidate package state.

作为又一种实现方式,当需要确定待分析器件在候选封装状态下的候选谐振频率和候选品质因子时,可通过谐振频率光学检测器和品质因子光学检测器对待分析器件进行检测,根据检测结果,得到待分析器件在候选封装状态下的候选谐振频率和候选品质因子。As another implementation method, when it is necessary to determine the candidate resonant frequency and candidate quality factor of the device to be analyzed in the candidate packaging state, the device to be analyzed can be detected through the resonant frequency optical detector and the quality factor optical detector. According to the detection results , obtain the candidate resonant frequency and candidate quality factor of the device to be analyzed in the candidate packaging state.

具体的,将激光照射到候选封装状态下的待分析器件上,通过谐振频率光学检测器检测并接收光信号,将进行光电信号转化和处理,得到待分析器件在候选封装状态下的候选谐振频率;将激光照射到候选封装状态下的待分析器件上,通过品质因子光学检测器检测并接收光信号,将进行光电信号转化和处理,得到待分析器件在候选封装状态下的候选品质因子。Specifically, the laser is irradiated onto the device to be analyzed in the candidate packaging state, the optical signal is detected and received through the resonant frequency optical detector, and the photoelectric signal is converted and processed to obtain the candidate resonant frequency of the device to be analyzed in the candidate packaging state. ; Irradiate the laser onto the device to be analyzed in the candidate packaging state, detect and receive the optical signal through the quality factor optical detector, convert and process the photoelectric signal, and obtain the candidate quality factor of the device to be analyzed in the candidate packaging state.

步骤203,根据待分析器件在初始状态下的初始谐振频率和初始品质因子,以及待分析器件在各候选封装状态下的候选谐振频率和候选品质因子,从各候选工艺中确定待分析器件对应的目标工艺。Step 203: Based on the initial resonant frequency and initial quality factor of the device to be analyzed in the initial state, and the candidate resonant frequency and candidate quality factor of the device to be analyzed in each candidate packaging state, determine the corresponding component of the device to be analyzed from each candidate process. target craft.

需要说明的是,由于对待分析器件进行封装处理时,采用不同的候选工艺在对待分析器件进行封装后,会对待分析器件的品质因子产生不同程度的影响,但是,品质因子不仅仅会受到候选工艺的封装影响而发生改变,还会因键合应力而产生改变,因此,可通过获取分析封装前后待分析器件谐振频率的变化量,来反映键合应力对品质因子的影响程度,进而,消除了谐振频率(键合应力)对待分析器件品质因子的变化量的影响,实现从各候选工艺中确定待分析器件对应的目标工艺。It should be noted that when packaging the device to be analyzed, the use of different candidate processes will have varying degrees of impact on the quality factor of the device to be analyzed. However, the quality factor will not only be affected by the candidate process. It changes due to the influence of packaging, and also changes due to bonding stress. Therefore, the change in the resonant frequency of the device to be analyzed before and after packaging can be obtained to reflect the degree of influence of bonding stress on the quality factor, thereby eliminating The influence of the resonant frequency (bonding stress) on the change of the quality factor of the device to be analyzed can be determined from each candidate process to determine the target process corresponding to the device to be analyzed.

因此,可根据所述待分析器件在初始状态下的初始谐振频率和初始品质因子,以及所述待分析器件在各候选封装状态下的候选谐振频率和候选品质因子,待分析器件在候选封装状态下的目标品质变化量,根据分析结果,从各候选工艺中确定待分析器件对应的目标工艺。Therefore, according to the initial resonant frequency and initial quality factor of the device to be analyzed in the initial state, and the candidate resonant frequency and candidate quality factor of the device to be analyzed in each candidate packaging state, the device to be analyzed is in the candidate packaging state. According to the target quality variation under the analysis results, the target process corresponding to the device to be analyzed is determined from each candidate process.

其中,目标品质变化量用于表示消除了谐振频率对待分析器件品质因子变化量的影响后,候选工艺对待分析器件品质因子的影响程度。Among them, the target quality change amount is used to represent the degree of influence of the candidate process on the quality factor of the device to be analyzed after eliminating the impact of the resonant frequency on the quality factor change of the device to be analyzed.

其中,目标工艺指的是目标封装状态对应的候选工艺,进一步的,目标封装状态指的是各候选封装状态中使得目标品质变化量最小的状态。The target process refers to the candidate process corresponding to the target packaging state. Further, the target packaging state refers to the state that minimizes the target quality change among the candidate packaging states.

在本申请的一种实施例中,当需要从各候选工艺中确定待分析器件对应的目标工艺时,可通过品质计算模型得到待分析器件在各候选封装状态下的目标品质变化量,进而,通过品质分析模型对目标品质变化量进行对比分析,从各候选工艺中确定待分析器件对应的目标工艺。In one embodiment of the present application, when it is necessary to determine the target process corresponding to the device to be analyzed from each candidate process, the target quality change amount of the device to be analyzed in each candidate packaging state can be obtained through the quality calculation model, and then, The quality analysis model is used to conduct comparative analysis on the target quality changes, and determine the target process corresponding to the device to be analyzed from each candidate process.

具体的,将待分析器件在初始状态下的初始谐振频率和初始品质因子以及待分析器件在各候选封装状态下的候选谐振频率和候选品质因子输入至品质计算模型中,得到品质计算模型的输出结果,该结果即为待分析器件在各候选封装状态下的目标品质变化量,进而,将待分析器件在各候选封装状态下的目标品质变化量输入品质分析模型,根据品质分析模型的输出结果,从各候选工艺中确定待分析器件对应的目标工艺。Specifically, the initial resonant frequency and initial quality factor of the device to be analyzed in the initial state and the candidate resonant frequency and candidate quality factor of the device to be analyzed in each candidate packaging state are input into the quality calculation model to obtain the output of the quality calculation model. As a result, the result is the target quality change amount of the device to be analyzed in each candidate packaging state. Furthermore, the target quality change amount of the device to be analyzed in each candidate packaging state is input into the quality analysis model. According to the output results of the quality analysis model , determine the target process corresponding to the device to be analyzed from each candidate process.

上述工艺确定方法,根据待分析器件在初始状态下的初始谐振频率和初始品质因子,以及待分析器件在各候选封装状态下的候选谐振频率和候选品质因子,从各候选工艺中确定待分析器件对应的目标工艺。由于上述过程中,本申请从各候选工艺中确定目标工艺时,不仅考虑了初始品质因子和各候选封装状态下的候选品质因子,还考虑了初始谐振频率和各候选封装状态下的候选谐振频率,进而,消除了其他因素(谐振频率)对待分析器件品质因子的变化量的影响,使得后续能够准确的从候选工艺中确定目标工艺,保证了在根据目标工艺对待分析器件进行封装处理后,对待分析器件的品质因子影响最小。The above process determination method determines the device to be analyzed from each candidate process based on the initial resonant frequency and initial quality factor of the device to be analyzed in the initial state, and the candidate resonant frequency and candidate quality factor of the device to be analyzed in each candidate packaging state. Corresponding target technology. Due to the above process, when this application determines the target process from each candidate process, it not only considers the initial quality factor and the candidate quality factor in each candidate packaging state, but also considers the initial resonant frequency and the candidate resonant frequency in each candidate packaging state. , furthermore, the influence of other factors (resonant frequency) on the change of the quality factor of the device to be analyzed is eliminated, so that the target process can be accurately determined from the candidate processes in the future, ensuring that after the device to be analyzed is packaged according to the target process, the The quality factor of the analytical device is minimally affected.

作为一种实施例,由于采用不同的候选工艺在对待分析器件进行封装后,会对待分析器件的品质因子产生不同程度的影响,但是,品质因子不仅仅会受到候选工艺的封装影响而发生改变,还会因键合应力而产生改变,因此,为了准确获取目标工艺,可通过获取分析封装前后待分析器件谐振频率的变化量,来反映键合应力对品质因子的影响程度,进而,消除了谐振频率(键合应力)对待分析器件品质因子的变化量的影响,具体的,根据待分析器件在初始状态下的初始谐振频率和初始品质因子,以及待分析器件在各候选封装状态下的候选谐振频率和候选品质因子,从各候选工艺中确定待分析器件对应的目标工艺,具体可包括步骤301至步骤303,其中:As an embodiment, since the use of different candidate processes to package the device to be analyzed will have varying degrees of impact on the quality factor of the device to be analyzed, however, the quality factor will not only be affected by the packaging of the candidate process. It will also be changed due to bonding stress. Therefore, in order to accurately obtain the target process, the change in the resonant frequency of the device to be analyzed before and after packaging can be obtained to reflect the impact of bonding stress on the quality factor, thereby eliminating resonance. The influence of frequency (bonding stress) on the change in quality factor of the device to be analyzed. Specifically, based on the initial resonant frequency and initial quality factor of the device to be analyzed in the initial state, as well as the candidate resonance of the device to be analyzed in each candidate packaging state Frequency and candidate quality factor, determine the target process corresponding to the device to be analyzed from each candidate process, which may specifically include steps 301 to 303, wherein:

步骤301,根据待分析器件在初始状态下的初始谐振频率和初始品质因子,以及待分析器件在各候选封装状态下的候选谐振频率和候选品质因子,确定待分析器件在各候选封装状态下的目标品质变化量。Step 301: Based on the initial resonant frequency and initial quality factor of the device to be analyzed in the initial state, and the candidate resonant frequency and candidate quality factor of the device to be analyzed in each candidate packaging state, determine the quality of the device to be analyzed in each candidate packaging state. Target quality change amount.

需要说明的是,由于品质因子不仅仅会受到候选工艺的封装影响而发生改变,还会因键合应力而产生改变,因此,可通过确定分析封装前后待分析器件谐振频率的变化量,来消除键合应力对品质因子的影响,当需要确定待分析器件在各候选封装状态下的目标品质变化量时,具体可包括以下内容:对于每一候选封装状态,确定待分析器件在该候选封装状态下的候选谐振频率与初始谐振频率之间的谐振变化量,以及确定待分析器件在该候选封装状态下的候选品质因子与初始品质因子之间的初始品质变化量,对初始品质变化量和谐振变化量进行差值运算,得到差值运算的结果,即为待分析器件在各候选封装状态下的目标品质变化量。It should be noted that since the quality factor will not only be changed by the packaging of the candidate process, but also by the bonding stress, it can be eliminated by determining the change in the resonant frequency of the device to be analyzed before and after packaging. The impact of bonding stress on the quality factor. When it is necessary to determine the target quality change of the device to be analyzed in each candidate packaging state, the specific content may include the following: For each candidate packaging state, determine the state of the device to be analyzed in the candidate packaging state. The resonance change amount between the candidate resonant frequency and the initial resonant frequency under the candidate resonant frequency, and the initial quality change amount between the candidate quality factor and the initial quality factor of the device to be analyzed in the candidate packaging state. For the initial quality change amount and resonance A difference operation is performed on the change amount, and the result of the difference operation is obtained, which is the target quality change amount of the device to be analyzed in each candidate packaging state.

进一步说明,在确定初始品质变化量和谐振变化量时,具体可包括以下内容:针对每一候选封装状态,确定待分析器件在该候选封装状态下的候选谐振频率,将该候选谐振频率与初始谐振频率进行差值运算,得到第一运算结果,将第一运算结果与初始谐振频率的比值作为待分析器件在该候选封装状态下的候选谐振频率与初始谐振频率之间的谐振变化量;根据待分析器件在该候选封装状态下的候选品质因子,将该候选品质因子与初始品质因子进行差值运算,得到第二运算结果,将第二运算结果与初始品质因子的比值作为待分析器件在该候选封装状态下的候选品质因子与初始品质因子之间的初始品质变化量。To further explain, when determining the initial quality change and resonance change, the specific content may include the following: for each candidate packaging state, determine the candidate resonant frequency of the device to be analyzed in the candidate packaging state, and compare the candidate resonant frequency with the initial Perform a difference operation on the resonant frequency to obtain the first operation result, and use the ratio of the first operation result to the initial resonant frequency as the resonance change amount between the candidate resonant frequency and the initial resonant frequency of the device to be analyzed in the candidate packaging state; according to For the candidate quality factor of the device to be analyzed in the candidate packaging state, perform a difference operation between the candidate quality factor and the initial quality factor to obtain the second operation result, and use the ratio of the second operation result to the initial quality factor as the ratio of the device to be analyzed in the candidate package state. The initial quality change between the candidate quality factor and the initial quality factor in the candidate packaging state.

在本申请的一种实施例中,确定待分析器件的初始谐振频率为ω0,初始品质因子为Q0,并且,待分析器件存在两种候选封装状态,两种候选封装状态分别为候选封装状态1和候选封装状态2,其中,待分析器件在候选封装状态1下的候选谐振频率为ω1,待分析器件在候选封装状态1下的候选品质因子为Q1,待分析器件在候选封装状态2下的候选谐振频率为ω2,待分析器件在候选封装状态2下的候选品质因子为Q2,则待分析器件在候选封装状态1下的候选谐振频率与初始谐振频率之间的谐振变化量为:(ω10)/ ω0,待分析器件在候选封装状态1下的候选品质因子与初始品质因子之间的初始品质变化量为:(Q1-Q0)/Q0,待分析器件在候选封装状态2下的候选谐振频率与初始谐振频率之间的谐振变化量为:(ω20)/w0,待分析器件在候选封装状态2下的候选品质因子与初始品质因子之间的初始品质变化量为:(Q2-Q0)/ Q0;因此,待分析器件在候选封装状态1下的目标品质变化量为:(Q1-Q0)/Q0-(ω10)/ ω0,待分析器件在候选封装状态2下的目标品质变化量为:(Q2-Q0)/Q0-(ω20)/ ω0In one embodiment of the present application, it is determined that the initial resonant frequency of the device to be analyzed is ω 0 and the initial quality factor is Q 0 , and there are two candidate packaging states for the device to be analyzed, and the two candidate packaging states are respectively candidate packaging State 1 and candidate packaging state 2, where the candidate resonant frequency of the device to be analyzed in the candidate packaging state 1 is ω 1 , the candidate quality factor of the device to be analyzed in the candidate packaging state 1 is Q1, and the candidate quality factor of the device to be analyzed in the candidate packaging state is Q1 The candidate resonant frequency under 2 is ω 2 , and the candidate quality factor of the device to be analyzed in candidate packaging state 2 is Q 2 , then the resonance change between the candidate resonant frequency of the device to be analyzed in candidate packaging state 1 and the initial resonant frequency The quantity is: (ω 10 )/ω 0 , and the initial quality change between the candidate quality factor and the initial quality factor of the device to be analyzed in candidate packaging state 1 is: (Q 1 -Q 0 )/Q 0 , the resonance change between the candidate resonant frequency of the device to be analyzed in candidate packaging state 2 and the initial resonant frequency is: (ω 20 )/w 0 , the candidate quality factor of the device to be analyzed in candidate packaging state 2 The initial quality change from the initial quality factor is: (Q 2 -Q 0 )/ Q 0 ; therefore, the target quality change of the device to be analyzed in candidate packaging state 1 is: (Q 1 -Q 0 )/ Q 0 -(ω 10 )/ ω 0 , the target quality change amount of the device to be analyzed in candidate packaging state 2 is: (Q 2 -Q 0 )/Q 0 -(ω 20 )/ ω 0 .

步骤302,根据待分析器件在各候选封装状态下的目标品质变化量,从各候选工艺中确定待分析器件对应的目标工艺。Step 302: Determine the target process corresponding to the device to be analyzed from each candidate process based on the target quality change of the device to be analyzed in each candidate packaging state.

需要说明的是,当需要从各候选工艺中确定待分析器件对应的目标工艺时,具体可包括以下内容:根据待分析器件在各候选封装状态下的目标品质变化量,从各候选封装状态中确定目标品质变化量最小的目标封装状态;将目标封装状态对应的候选工艺作为待分析器件对应的目标工艺。It should be noted that when it is necessary to determine the target process corresponding to the device to be analyzed from each candidate process, the specific content may include the following: According to the target quality change of the device to be analyzed in each candidate packaging state, from each candidate packaging state Determine the target packaging state with the smallest change in target quality; use the candidate process corresponding to the target packaging state as the target process corresponding to the device to be analyzed.

具体的,根据待分析器件在各候选封装状态下的目标品质变化量,对各候选封装状态下的目标品质变化量按照从小到大的顺序依次排列,并且,确定排序结果中位于首位的候选封装状态的目标品质变化量,该候选工艺即为待分析器件对应的目标工艺。Specifically, according to the target quality change amount of the device to be analyzed in each candidate packaging state, the target quality change amounts in each candidate packaging state are arranged in order from small to large, and the candidate package ranked first in the sorting result is determined. The target quality change amount of the state, the candidate process is the target process corresponding to the device to be analyzed.

在本申请的一种实施例中,若待分析器件具有三个候选封装状态,分别为候选封装状态1、候选封装状态2和候选封装状态3,其中,候选封装状态1对应的目标品质变化量为M1,候选封装状态2对应的目标品质变化量为M2,候选封装状态3对应的目标品质变化量为M3,并且M1< M2< M3,由于候选封装状态1对应的目标品质变化量M1最小,因此,候选封装状态1对应的候选工艺作为待分析器件对应的目标工艺。In an embodiment of the present application, if the device to be analyzed has three candidate packaging states, namely candidate packaging state 1, candidate packaging state 2 and candidate packaging state 3, where the target quality change amount corresponding to candidate packaging state 1 is M1, the target quality change amount corresponding to candidate packaging state 2 is M2, the target quality change amount corresponding to candidate packaging state 3 is M3, and M1 < M2 < M3, since the target quality change amount M1 corresponding to candidate packaging state 1 is the smallest, Therefore, the candidate process corresponding to candidate packaging state 1 is used as the target process corresponding to the device to be analyzed.

上述工艺确定方法,通过待分析器件在初始状态下的初始谐振频率和初始品质因子,以及待分析器件在各候选封装状态下的候选谐振频率和候选品质因子,确定待分析器件在各候选封装状态下的目标品质变化量,进而,根据待分析器件在各候选封装状态下的目标品质变化量,从各候选工艺中确定待分析器件对应的目标工艺。由于上述本申请在各候选封装状态下的目标品质变化量的过程中,是由待分析器件的初始谐振频率、初始品质因子、候选谐振频率和候选品质因子共同确定目标品质变化量,因此,本申请相比于现有技术仅通过初始品质因子和候选品质因子确定目标品质变化量,考虑得更加全面,得到的目标品质变化量能够更加准确的反映待分析器件的品质因子变化程度,从而能够根据目标品质变化量选择目标工艺。The above process determination method determines the states of the device to be analyzed in each candidate packaging state through the initial resonant frequency and initial quality factor of the device to be analyzed in the initial state, and the candidate resonant frequency and candidate quality factor of the device to be analyzed in each candidate packaging state. Then, based on the target quality variation of the device to be analyzed in each candidate packaging state, the target process corresponding to the device to be analyzed is determined from each candidate process. Since the above-mentioned process of the target quality change amount in each candidate packaging state of this application is based on the initial resonant frequency, initial quality factor, candidate resonant frequency and candidate quality factor of the device to be analyzed, the target quality change amount is jointly determined. Therefore, this application Compared with the existing technology, the application only determines the target quality change amount through the initial quality factor and candidate quality factors, which is more comprehensive. The obtained target quality change amount can more accurately reflect the degree of change in the quality factor of the device to be analyzed, so that it can be based on The target quality variation selects the target process.

在一个示例性的实施例中,如图4所示,根据待分析器件在初始状态下的初始谐振频率和初始品质因子,以及待分析器件在各候选封装状态下的候选谐振频率和候选品质因子,确定待分析器件在各候选封装状态下的目标品质变化量,包括步骤401和步骤402。其中:In an exemplary embodiment, as shown in Figure 4, according to the initial resonant frequency and initial quality factor of the device to be analyzed in the initial state, and the candidate resonant frequency and candidate quality factor of the device to be analyzed in each candidate packaging state , determining the target quality variation of the device to be analyzed in each candidate packaging state, including step 401 and step 402. in:

步骤401,针对每一候选封装状态,确定待分析器件在该候选封装状态下的候选谐振频率与初始谐振频率之间的谐振变化量,以及确定待分析器件在该候选封装状态下的候选品质因子与初始品质因子之间的初始品质变化量。Step 401: For each candidate packaging state, determine the resonance change amount between the candidate resonant frequency and the initial resonant frequency of the device to be analyzed in the candidate packaging state, and determine the candidate quality factor of the device to be analyzed in the candidate packaging state. The initial quality change from the initial quality factor.

其中,谐振变化量指的是待分析器件在每一候选封装状态下的候选谐振频率相比于初始谐振频率的变化量,用于表示在每一候选封装状态对应的候选工艺中的键合应力对品质因子的影响。Among them, the resonance change amount refers to the change amount of the candidate resonance frequency of the device to be analyzed in each candidate packaging state compared to the initial resonance frequency, and is used to represent the bonding stress in the candidate process corresponding to each candidate packaging state. Impact on quality factor.

其中,初始品质变化量指的是待分析器件在每一候选封装状态下的候选品质因子相比于初始品质因子的变化量。The initial quality change refers to the change in the candidate quality factor of the device to be analyzed in each candidate packaging state compared to the initial quality factor.

在本申请的一种实施例中,针对每一候选封装状态,当需要确定待分析器件在该候选封装状态下的候选谐振频率与初始谐振频率之间的谐振变化量时,具体可包括以下内容:对待分析器件在该候选封装状态下的候选谐振频率与初始谐振频率进行差值运算,得到第一运算结果;将第一运算结果和初始谐振频率的比值作为谐振变化量。In one embodiment of the present application, for each candidate packaging state, when it is necessary to determine the resonance change amount between the candidate resonant frequency and the initial resonant frequency of the device to be analyzed in the candidate packaging state, the following content may be specifically included: : Perform a difference operation between the candidate resonant frequency and the initial resonant frequency of the device to be analyzed in the candidate packaging state to obtain the first operation result; use the ratio of the first operation result and the initial resonant frequency as the resonance variation amount.

进一步说明,根据待分析器件在该候选封装状态下的候选谐振频率与初始谐振频率/>,对待分析器件在该候选封装状态下的候选谐振频率/>与初始谐振频率/>进行差值运算,得到第一运算结果/>,将第一运算结果/>和初始谐振频率/>的比值,即/>作为谐振变化量。To further explain, according to the candidate resonant frequency of the device to be analyzed in the candidate packaging state and initial resonant frequency/> , the candidate resonant frequency of the device to be analyzed in this candidate packaging state/> and initial resonant frequency/> Perform a difference operation to obtain the first operation result/> , convert the first operation result/> and initial resonant frequency/> The ratio of /> as the resonance variation.

根据上述描述,可确定待分析器件的谐振变化量的表达式(1)如下所示:According to the above description, the expression (1) that can determine the resonance variation of the device to be analyzed is as follows:

(1) (1)

其中,指的是谐振变化量,/>指的是待分析器件在候选封装状态下的候选谐振频率,/>指的是待分析器件在初始状态下的初始谐振频率。in, Refers to the resonance change amount,/> Refers to the candidate resonant frequency of the device to be analyzed in the candidate packaging state,/> Refers to the initial resonant frequency of the device to be analyzed in its initial state.

在本申请的一种实施例中,当需要确定待分析器件在该候选封装状态下的候选品质因子与初始品质因子之间的初始品质变化量时,具体可包括以下内容:对待分析器件在该候选封装状态下的候选品质因子与初始品质因子进行差值运算,得到第二运算结果;进一步的,将第二运算结果和初始品质因子的比值作为初始品质变化量。In an embodiment of the present application, when it is necessary to determine the initial quality change between the candidate quality factor and the initial quality factor of the device to be analyzed in the candidate packaging state, the specific content may include the following: the device to be analyzed is in the candidate packaging state A difference operation is performed between the candidate quality factor in the candidate packaging state and the initial quality factor to obtain the second operation result; further, the ratio of the second operation result and the initial quality factor is used as the initial quality change amount.

进一步说明,根据待分析器件在该候选封装状态下的候选品质因子与初始品质因子/>,对待分析器件在该候选封装状态下的候选品质因子/>与初始品质因子/>进行差值运算,得到第一运算结果/>,将第一运算结果/>和初始品质因子/>的比值,即/>作为初始品质变化量。To further explain, according to the candidate quality factor of the device to be analyzed in the candidate packaging state and initial quality factor/> , the candidate quality factor of the device to be analyzed in this candidate packaging state/> and initial quality factor/> Perform a difference operation to obtain the first operation result/> , convert the first operation result/> and initial quality factor/> The ratio of /> as the initial quality change.

根据上述描述,可确定待分析器件的初始品质变化量的表达式(2)如下所示:According to the above description, the expression (2) that can determine the initial quality change of the device to be analyzed is as follows:

(2) (2)

其中,指的是待分析器件的初始品质变化量,/>指的是待分析器件在候选封装状态下的候选品质因子,/>指的是待分析器件在初始状态下的初始品质因子。in, Refers to the initial quality change of the device to be analyzed,/> Refers to the candidate quality factor of the device to be analyzed in the candidate packaging state,/> Refers to the initial quality factor of the device to be analyzed in its initial state.

步骤402,对初始品质变化量和谐振变化量进行差值运算,得到待分析器件在该候选封装状态下的目标品质变化量。Step 402: Perform a difference operation on the initial quality change amount and the resonance change amount to obtain the target quality change amount of the device to be analyzed in the candidate packaging state.

在本申请的一种实施例中,当需要确定待分析器件在该候选封装状态下的目标品质变化量时,具体可包括以下内容:根据初始品质变化量和谐振变化量,对初始品质变化量和谐振变化量进行差值运算,进而,根据差值运算结果,得到待分析器件在该候选封装状态下的目标品质变化量。In one embodiment of the present application, when it is necessary to determine the target quality change amount of the device to be analyzed in the candidate packaging state, the specific content may include the following: According to the initial quality change amount and the resonance change amount, the initial quality change amount is A difference operation is performed with the resonance variation, and then, based on the difference operation result, the target quality variation of the device to be analyzed in the candidate packaging state is obtained.

进一步说明,根据初始品质变化量和谐振变化量/>,对初始品质变化量/>和谐振变化量/>进行差值运算,进而,根据差值运算结果,即/>,作为待分析器件在该候选封装状态下的目标品质变化量。To further explain, according to the initial quality change and resonance change/> , for the initial quality change/> and resonance change/> Perform a difference operation, and then, based on the difference operation result, that is/> , as the target quality variation of the device to be analyzed in this candidate packaging state.

根据上述描述,可确定待分析器件在该候选封装状态下的目标品质变化量的表达式(3)如下所示:According to the above description, the expression (3) that can determine the target quality change of the device to be analyzed in this candidate packaging state is as follows:

(3) (3)

其中,指的是待分析器件在该候选封装状态下的目标品质变化量,/>指的是待分析器件在候选封装状态下的候选品质因子,/>指的是待分析器件在初始状态下的初始品质因子,/>指的是待分析器件在候选封装状态下的候选谐振频率,/>指的是待分析器件在初始状态下的初始谐振频率。in, Refers to the target quality change amount of the device to be analyzed in the candidate packaging state,/> Refers to the candidate quality factor of the device to be analyzed in the candidate packaging state,/> Refers to the initial quality factor of the device to be analyzed in its initial state,/> Refers to the candidate resonant frequency of the device to be analyzed in the candidate packaging state,/> Refers to the initial resonant frequency of the device to be analyzed in its initial state.

上述工艺确定方法,通过对每一候选封装状态,确定待分析器件在该候选封装状态下的候选谐振频率与初始谐振频率之间的谐振变化量,以及待分析器件在该候选封装状态下的候选品质因子与初始品质因子之间的初始品质变化量,得到待分析器件在该候选封装状态下的目标品质变化量,为后续从各候选工艺中确定待分析器件对应的目标工艺提供判断依据。The above process determination method determines, for each candidate packaging state, the resonance change amount between the candidate resonant frequency of the device to be analyzed in the candidate packaging state and the initial resonant frequency, and the candidate resonant frequency of the device to be analyzed in the candidate packaging state. The initial quality change between the quality factor and the initial quality factor is used to obtain the target quality change of the device to be analyzed in the candidate packaging state, which provides a basis for subsequent determination of the target process corresponding to the device to be analyzed from each candidate process.

在一个示例性的实施例中,如图5所示,确定待分析器件在初始状态下的初始谐振频率和初始品质因子,包括步骤501至步骤503。其中:In an exemplary embodiment, as shown in FIG. 5 , determining the initial resonant frequency and initial quality factor of the device to be analyzed in the initial state includes steps 501 to 503 . in:

步骤501,确定待分析器件的模态质量、模态刚度和模态阻尼力系数。Step 501: Determine the modal mass, modal stiffness and modal damping force coefficient of the device to be analyzed.

其中,模态质量指的是待分析器件所处模态下的质量,可以用来评估待分析器件在特定振动模态下的质量分布和相应的振动特性,进一步的,待分析器件所处模态可以包括驱动模态,和/或,检测模态。Among them, the modal quality refers to the quality of the mode of the device to be analyzed, which can be used to evaluate the mass distribution and corresponding vibration characteristics of the device to be analyzed in a specific vibration mode. Furthermore, the mode of the device to be analyzed is The modes may include drive modes, and/or detection modes.

其中,模态刚度指的是待分析器件所处模态下的刚度,可以用来评估待分析器件在特定振动模态下的振动特性和相应的结构刚度。Among them, the modal stiffness refers to the stiffness in the mode of the device to be analyzed, which can be used to evaluate the vibration characteristics and corresponding structural stiffness of the device to be analyzed in a specific vibration mode.

其中,模态阻尼力系数指的是待分析器件所处模态下的阻尼力,可以用来评估待分析器件在特定振动模态下的阻尼特性和相应的能量耗散能力。Among them, the modal damping force coefficient refers to the damping force in the mode of the device to be analyzed, which can be used to evaluate the damping characteristics and corresponding energy dissipation capabilities of the device to be analyzed in a specific vibration mode.

需要说明的是,确定待分析器件的模态质量、模态刚度和模态阻尼力系数的方法有很多,例如,通过光学传感器对待分析器件进行测量,确定待分析器件的模态质量、模态刚度和模态阻尼力系数,或者,通过模态分析模型,对待分析器件进行分析,确定待分析器件的模态质量、模态刚度和模态阻尼力系数。可理解为,可通过多种方式确定待分析器件的模态质量、模态刚度和模态阻尼力系数,在此不对待分析器件的模态质量、模态刚度和模态阻尼力系数的确定方法进行一一赘述,下面将针对上述两种方法,进行详细说明:It should be noted that there are many methods to determine the modal quality, modal stiffness and modal damping force coefficient of the device to be analyzed. For example, measuring the device to be analyzed through an optical sensor to determine the modal quality, modal modal quality and modal damping force coefficient of the device to be analyzed. Stiffness and modal damping force coefficient, or, through the modal analysis model, analyze the device to be analyzed to determine the modal mass, modal stiffness and modal damping force coefficient of the device to be analyzed. It can be understood that the modal mass, modal stiffness and modal damping force coefficients of the device to be analyzed can be determined in a variety of ways, and the determination of the modal mass, modal stiffness and modal damping force coefficients of the device to be analyzed is not included here. The methods will be described one by one. The above two methods will be explained in detail below:

作为一种实现方式,当需要确定待分析器件的模态质量、模态刚度和模态阻尼力系数时,具体可包括以下内容:通过激光器使得待分析器件产生振动,并通过光学传感器对待分析器件进行测量,得到光学传感器的测量结果,该结果即为待分析器件的模态质量、模态刚度和模态阻尼力系数。As an implementation method, when it is necessary to determine the modal quality, modal stiffness and modal damping force coefficient of the device to be analyzed, the specific content may include the following: using a laser to vibrate the device to be analyzed, and using an optical sensor to vibrate the device to be analyzed. Measurement is performed to obtain the measurement results of the optical sensor, which are the modal quality, modal stiffness and modal damping force coefficient of the device to be analyzed.

作为另一种实现方式,当需要确定待分析器件的模态质量、模态刚度和模态阻尼力系数时,具体可包括以下内容:将待分析器件材料特性、几何形状和约束条件输入至模态分析模型中,得到模态分析模型的输出结果,该结果即为待分析器件的模态质量、模态刚度和模态阻尼力系数。As another implementation method, when it is necessary to determine the modal mass, modal stiffness and modal damping force coefficient of the device to be analyzed, the specific content may include the following: input the material properties, geometry and constraint conditions of the device to be analyzed into the model In the modal analysis model, the output result of the modal analysis model is obtained, which is the modal mass, modal stiffness and modal damping force coefficient of the device to be analyzed.

步骤502,根据模态质量和模态刚度,确定待分析器件在初始状态下的初始谐振频率。Step 502: Determine the initial resonant frequency of the device to be analyzed in the initial state based on the modal quality and modal stiffness.

需要说明的是,当需要确定待分析器件在初始状态下的初始谐振频率时,可根据待分析器件的模态质量、模态刚度以及谐振频率计算公式,将待分析器件的模态质量、模态刚度代入谐振频率计算公式中,得到待分析器件在初始状态下的初始谐振频率。It should be noted that when it is necessary to determine the initial resonant frequency of the device to be analyzed in the initial state, the modal quality, modal stiffness and resonant frequency calculation formula of the device to be analyzed can be The state stiffness is substituted into the resonant frequency calculation formula to obtain the initial resonant frequency of the device to be analyzed in the initial state.

其中,谐振频率计算公式为:Among them, the resonant frequency calculation formula is:

(4) (4)

其中,指的是待分析器件在初始状态下的初始谐振频率,k指的是待分析器件的模态刚度,m指的是待分析器件的模态质量。in, refers to the initial resonant frequency of the device to be analyzed in the initial state, k refers to the modal stiffness of the device to be analyzed, and m refers to the modal quality of the device to be analyzed.

进一步说明,由公式(4)可以看出,待分析器件的初始谐振频率主要由待分析器件的模态刚度和模态质量决定,其中,待分析器件的模态刚度会受到待分析器件受到的残余应力的影响而发生变化,例如,若待分析器件为MEMS器件,则在对MEMS器件进行真空封装过程中,当MEMS器件结构在高温条件下键合后并恢复到室温时,由于键合界面异质材料的热膨胀系数的不匹配,将会在MEMS器件中产生残余应力,进而影响MEMS器件的模态刚度,例如,当MEMS器件中存在残余应力时,将会导致MEMS器件的模态刚度增加,进而提高了MEMS器件的初始谐振频率。Further explanation, it can be seen from formula (4) that the initial resonant frequency of the device to be analyzed is mainly determined by the modal stiffness and modal quality of the device to be analyzed. Among them, the modal stiffness of the device to be analyzed will be affected by the stress on the device to be analyzed. Changes occur due to the influence of residual stress. For example, if the device to be analyzed is a MEMS device, during the vacuum packaging process of the MEMS device, when the MEMS device structure is bonded under high temperature conditions and returns to room temperature, due to the bonding interface The mismatch in thermal expansion coefficients of heterogeneous materials will produce residual stress in the MEMS device, thereby affecting the modal stiffness of the MEMS device. For example, when residual stress exists in the MEMS device, it will cause the modal stiffness of the MEMS device to increase. , thereby increasing the initial resonant frequency of the MEMS device.

在本申请的一种实施例中,若待分析器件包含至少两种模态,则分别确定各模态的初始谐振频率,具体的,若待分析器件为电容式Z轴双解耦音叉陀螺,该待分析器件包含驱动模态和检测模态,其中,驱动模态包含驱动梳齿和驱动梳齿,用于闭环驱动控制;检测模态包含检测梳齿和力反馈梳齿,用于检测闭环控制。当需要确定该待分析器件在初始状态下的初始谐振频率时,可根据该待分析器件在驱动模态和检测模态的模态质量、模态刚度以及谐振频率计算公式,将该待分析器件在驱动模态的模态质量、模态刚度代入谐振频率计算公式中,得到该待分析器件在初始状态下驱动模态的初始谐振频率;将该待分析器件在检测模态的模态质量、模态刚度代入谐振频率计算公式中,得到该待分析器件在初始状态下检测模态的初始谐振频率。In one embodiment of the present application, if the device to be analyzed contains at least two modes, the initial resonant frequency of each mode is determined respectively. Specifically, if the device to be analyzed is a capacitive Z-axis double decoupled tuning fork gyro, The device to be analyzed includes a driving mode and a detection mode. The driving mode includes driving comb teeth and driving comb teeth, which are used for closed-loop drive control; the detection mode includes detection comb teeth and force feedback comb teeth, which are used to detect closed-loop control. When it is necessary to determine the initial resonant frequency of the device to be analyzed in the initial state, the device to be analyzed can be calculated based on the modal quality, modal stiffness and resonant frequency calculation formula of the device to be analyzed in the driving mode and detection mode. Substituting the modal quality and modal stiffness of the driving mode into the resonant frequency calculation formula, the initial resonant frequency of the driving mode of the device to be analyzed in the initial state is obtained; the modal quality and modal stiffness of the device to be analyzed in the detection mode are obtained. The modal stiffness is substituted into the resonant frequency calculation formula to obtain the initial resonant frequency of the detected mode of the device to be analyzed in the initial state.

进一步说明,该待分析器件在初始状态下驱动模态的初始谐振频率的表达式为:To further explain, the expression of the initial resonant frequency of the driving mode of the device to be analyzed in the initial state is:

(5) (5)

其中,指的是该待分析器件在初始状态下驱动模态的初始谐振频率,/>指的是待分析器件在驱动模态的模态刚度,/>指的是待分析器件在驱动模态的模态质量。in, Refers to the initial resonant frequency of the driving mode of the device to be analyzed in the initial state,/> Refers to the modal stiffness of the device to be analyzed in the driving mode,/> It refers to the modal quality of the device to be analyzed in the driving mode.

进一步说明,该待分析器件在初始状态下检测模态的初始谐振频率的表达式为:To further explain, the expression of the initial resonant frequency of the detected mode of the device to be analyzed in the initial state is:

(6) (6)

其中,指的是该待分析器件在初始状态下检测模态的初始谐振频率,/>指的是待分析器件在检测模态的模态刚度,/>指的是待分析器件在检测模态的模态质量。in, Refers to the initial resonant frequency of the detected mode of the device to be analyzed in the initial state,/> Refers to the modal stiffness of the device to be analyzed in the detection mode,/> It refers to the modal quality of the device to be analyzed in the detection mode.

步骤503,根据待分析器件的模态质量、模态阻尼力系数和初始谐振频率,确定待分析器件在初始状态下的初始品质因子。Step 503: Determine the initial quality factor of the device to be analyzed in the initial state based on the modal quality, modal damping force coefficient and initial resonant frequency of the device to be analyzed.

需要说明的是,当需要确定待分析器件在初始状态下的初始品质因子时,可根据待分析器件在驱动模态的模态质量、模态阻尼力系数和初始谐振频率,代入阻尼比计算公式,得到待分析器件在初始状态下的阻尼比,进一步的,根据待分析器件在初始状态下的阻尼比,代入品质因子计算公式,得到待分析器件在初始状态下的初始品质因子。It should be noted that when it is necessary to determine the initial quality factor of the device to be analyzed in the initial state, the damping ratio calculation formula can be substituted according to the modal quality, modal damping force coefficient and initial resonant frequency of the device to be analyzed in the driving mode. , obtain the damping ratio of the device to be analyzed in the initial state. Further, according to the damping ratio of the device to be analyzed in the initial state, substitute it into the quality factor calculation formula to obtain the initial quality factor of the device to be analyzed in the initial state.

其中,阻尼比计算公式为:Among them, the damping ratio calculation formula is:

(7) (7)

其中,指的是待分析器件在初始状态下的阻尼比,c指的是待分析器件的模态阻尼力系数,m指的是待分析器件的模态质量,/>指的是待分析器件在初始状态下的初始谐振频率。in, refers to the damping ratio of the device to be analyzed in the initial state, c refers to the modal damping force coefficient of the device to be analyzed, m refers to the modal mass of the device to be analyzed,/> Refers to the initial resonant frequency of the device to be analyzed in its initial state.

其中,品质因子计算公式为:Among them, the quality factor calculation formula is:

(8) (8)

其中,指的是待分析器件在初始状态下的品质因子,/>指的是待分析器件在初始状态下的阻尼比。in, Refers to the quality factor of the device to be analyzed in its initial state,/> It refers to the damping ratio of the device to be analyzed in the initial state.

进一步说明,由公式(7)和(8)可知,品质因子主要与阻尼力系数及初始谐振频率相关,其中,阻尼力系数的变化主要来自待分析器件封装腔体内部气压的变化,气压越大,阻尼力系数越大,例如,MEMS器件在真空封装过程中高温键合可能会导致腔体内部材料的放气,进而导致MEMS器件封装腔体内气压上升、阻尼力系数增大,从而引起品质因子下降。Further explanation, from formulas (7) and (8), it can be seen that the quality factor is mainly related to the damping force coefficient and the initial resonant frequency. Among them, the change of the damping force coefficient mainly comes from the change of the internal air pressure of the package cavity of the device to be analyzed. The greater the air pressure , the greater the damping force coefficient. For example, high-temperature bonding of MEMS devices during the vacuum packaging process may cause outgassing of materials inside the cavity, which in turn causes the air pressure in the MEMS device packaging cavity to rise and the damping force coefficient to increase, thus causing the quality factor decline.

在本申请的一种实施例中,若待分析器件包含至少两种模态,则分别确定各模态的初始品质因子,具体的,若待分析器件为电容式Z轴双解耦音叉陀螺,当需要确定该待分析器件在初始状态下的初始品质因子时,可将该待分析器件在驱动模态的模态质量、模态阻尼力系数和初始谐振频率,代入阻尼比计算公式,得到该待分析器件在初始状态下的驱动模态阻尼比;将该待分析器件在检测模态的模态质量、模态阻尼力系数和初始谐振频率,代入阻尼比计算公式,得到该待分析器件在初始状态下的检测模态阻尼比。In one embodiment of the present application, if the device to be analyzed contains at least two modes, the initial quality factor of each mode is determined respectively. Specifically, if the device to be analyzed is a capacitive Z-axis double decoupled tuning fork gyro, When it is necessary to determine the initial quality factor of the device to be analyzed in the initial state, the modal mass, modal damping force coefficient and initial resonant frequency of the device to be analyzed in the driving mode can be substituted into the damping ratio calculation formula to obtain the The driving mode damping ratio of the device to be analyzed in the initial state; substituting the modal quality, modal damping force coefficient and initial resonant frequency of the device to be analyzed in the detection mode into the damping ratio calculation formula, we get the device to be analyzed in The detection modal damping ratio in the initial state.

其中,该待分析器件在初始状态下的驱动模态阻尼比的表达式为:Among them, the expression of the driving mode damping ratio of the device to be analyzed in the initial state is:

(9) (9)

其中,指的是该待分析器件在初始状态下的驱动模态阻尼比,/>指的是该待分析器件在初始状态下的驱动模态阻尼力系数,/>指的是该待分析器件在驱动模态的模态质量,/>指的是该待分析器件在初始状态下驱动模态的初始谐振频率。in, Refers to the driving mode damping ratio of the device to be analyzed in the initial state,/> Refers to the driving mode damping force coefficient of the device to be analyzed in the initial state,/> Refers to the modal quality of the device to be analyzed in the driving mode,/> Refers to the initial resonant frequency of the driving mode of the device to be analyzed in the initial state.

其中,该待分析器件在初始状态下的检测模态阻尼比的表达式为:Among them, the expression of the detection mode damping ratio of the device to be analyzed in the initial state is:

(10) (10)

其中,指的是该待分析器件在初始状态下的检测模态阻尼比,/>指的是该待分析器件在初始状态下的检测模态阻尼力系数,/>指的是该待分析器件在检测模态的模态质量,/>指的是该待分析器件在初始状态下检测模态的初始谐振频率。in, Refers to the detection modal damping ratio of the device to be analyzed in the initial state,/> Refers to the detected modal damping force coefficient of the device to be analyzed in the initial state,/> Refers to the modal quality of the device to be analyzed in the detection mode,/> Refers to the initial resonant frequency of the detected mode of the device to be analyzed in the initial state.

进一步的,根据该待分析器件在初始状态下的驱动模态阻尼比,代入品质因子计算公式,得到该待分析器件在初始状态下驱动模态的初始品质因子;根据该待分析器件在初始状态下的检测模态阻尼比,代入品质因子计算公式,得到该待分析器件在初始状态下检测模态的初始品质因子。Further, according to the driving mode damping ratio of the device to be analyzed in the initial state, substitute the quality factor calculation formula to obtain the initial quality factor of the driving mode of the device to be analyzed in the initial state; according to the initial quality factor of the device to be analyzed in the initial state The detection mode damping ratio under is substituted into the quality factor calculation formula to obtain the initial quality factor of the detection mode of the device to be analyzed in the initial state.

其中,该待分析器件在初始状态下驱动模态的初始品质因子的表达式为:Among them, the expression of the initial quality factor of the driving mode of the device to be analyzed in the initial state is:

(11) (11)

其中,指的是该待分析器件在初始状态下驱动模态的初始品质因子,/>指的是该待分析器件在初始状态下的驱动模态阻尼比。in, Refers to the initial quality factor of the driving mode of the device to be analyzed in the initial state,/> It refers to the driving mode damping ratio of the device to be analyzed in the initial state.

其中,该待分析器件在初始状态下检测模态的初始品质因子的表达式为:Among them, the expression of the initial quality factor of the detection mode of the device to be analyzed in the initial state is:

(12) (12)

其中,指的是该待分析器件在初始状态下驱动模态的初始品质因子,/>指的是该待分析器件在初始状态下的检测模态阻尼比。in, Refers to the initial quality factor of the driving mode of the device to be analyzed in the initial state,/> It refers to the detection modal damping ratio of the device to be analyzed in the initial state.

上述工艺确定方法中,通过待分析器件的模态质量、模态刚度以及模态阻尼力系数,得到待分析器件在初始状态下的初始谐振频率和初始品质因子,为后续确定初始品质变化量提供基础。In the above process determination method, the initial resonant frequency and initial quality factor of the device to be analyzed in the initial state are obtained through the modal quality, modal stiffness and modal damping force coefficient of the device to be analyzed, which provides a basis for subsequent determination of the initial quality change. Base.

在一种实施例中,当需要确定待分析器件对应的目标工艺时,具体可包括以下流程,如图6所示:In one embodiment, when it is necessary to determine the target process corresponding to the device to be analyzed, the following process may be included, as shown in Figure 6:

步骤601,确定待分析器件的模态质量、模态刚度和模态阻尼力系数。Step 601: Determine the modal mass, modal stiffness and modal damping force coefficient of the device to be analyzed.

步骤602,根据模态质量和模态刚度,确定待分析器件在初始状态下的初始谐振频率。Step 602: Determine the initial resonant frequency of the device to be analyzed in the initial state based on the modal quality and modal stiffness.

步骤603,根据待分析器件的模态质量、模态阻尼力系数和初始谐振频率,确定待分析器件在初始状态下的初始品质因子。Step 603: Determine the initial quality factor of the device to be analyzed in the initial state based on the modal quality, modal damping force coefficient and initial resonant frequency of the device to be analyzed.

步骤604,根据至少一种候选工艺对待分析器件进行封装处理,得到至少一个候选封装状态下的待分析器件,并确定待分析器件在各候选封装状态下的候选谐振频率和候选品质因子。Step 604: Package the device to be analyzed according to at least one candidate process to obtain the device to be analyzed in at least one candidate packaging state, and determine the candidate resonant frequency and candidate quality factor of the device to be analyzed in each candidate packaging state.

步骤605,针对每一候选封装状态,对待分析器件在该候选封装状态下的候选谐振频率与初始谐振频率进行差值运算,得到第一运算结果。Step 605: For each candidate packaging state, perform a difference operation between the candidate resonant frequency and the initial resonant frequency of the device to be analyzed in the candidate packaging state to obtain a first operation result.

步骤606,将第一运算结果和初始谐振频率的比值作为谐振变化量。Step 606: Use the ratio of the first calculation result to the initial resonant frequency as the resonance change amount.

步骤607,对待分析器件在该候选封装状态下的候选品质因子与初始品质因子进行差值运算,得到第二运算结果。Step 607: Perform a difference operation on the candidate quality factor of the device to be analyzed in the candidate packaging state and the initial quality factor to obtain a second operation result.

步骤608,将第二运算结果和初始品质因子的比值作为初始品质变化量。Step 608: Use the ratio of the second operation result and the initial quality factor as the initial quality change.

步骤609,对初始品质变化量和谐振变化量进行差值运算,得到待分析器件在该候选封装状态下的目标品质变化量。Step 609: Perform a difference operation on the initial quality change amount and the resonance change amount to obtain the target quality change amount of the device to be analyzed in the candidate packaging state.

步骤610,根据待分析器件在各候选封装状态下的目标品质变化量,从各候选封装状态中确定目标品质变化量最小的目标封装状态,将目标封装状态对应的候选工艺作为待分析器件对应的目标工艺。Step 610: According to the target quality change amount of the device to be analyzed in each candidate packaging state, determine the target packaging state with the smallest target quality change amount from each candidate packaging state, and use the candidate process corresponding to the target packaging state as the candidate process corresponding to the device to be analyzed. target craft.

上述工艺确定方法,根据待分析器件在初始状态下的初始谐振频率和初始品质因子,以及待分析器件在各候选封装状态下的候选谐振频率和候选品质因子,从各候选工艺中确定待分析器件对应的目标工艺。由于上述过程中,本申请从各候选工艺中确定目标工艺时,不仅考虑了初始品质因子和各候选封装状态下的候选品质因子,还考虑了初始谐振频率和各候选封装状态下的候选谐振频率,进而,消除了其他因素(谐振频率)对待分析器件品质因子的变化量的影响,使得后续能够准确的从候选工艺中确定目标工艺,保证了在根据目标工艺对待分析器件进行封装处理后,对待分析器件的品质因子影响最小。The above process determination method determines the device to be analyzed from each candidate process based on the initial resonant frequency and initial quality factor of the device to be analyzed in the initial state, and the candidate resonant frequency and candidate quality factor of the device to be analyzed in each candidate packaging state. Corresponding target process. Due to the above process, when this application determines the target process from each candidate process, it not only considers the initial quality factor and the candidate quality factor in each candidate packaging state, but also considers the initial resonant frequency and the candidate resonant frequency in each candidate packaging state. , furthermore, the influence of other factors (resonant frequency) on the change of the quality factor of the device to be analyzed is eliminated, so that the target process can be accurately determined from the candidate processes in the future, ensuring that after the device to be analyzed is packaged according to the target process, the The quality factor of the analytical device is minimally affected.

应该理解的是,虽然以上的各实施例所涉及的流程图中的各个步骤按照箭头的指示依次显示,但是这些步骤并不是必然按照箭头指示的顺序依次执行。除非本文中有明确的说明,这些步骤的执行并没有严格的顺序限制,这些步骤可以以其它的顺序执行。而且,以上的各实施例所涉及的流程图中的至少一部分步骤可以包括多个步骤或者多个阶段,这些步骤或者阶段并不必然是在同一时刻执行完成,而是可以在不同的时刻执行,这些步骤或者阶段的执行顺序也不必然是依次进行,而是可以与其它步骤或者其它步骤中的步骤或者阶段的至少一部分轮流或者交替地执行。It should be understood that although the steps in the flowcharts involved in the above embodiments are shown in sequence as indicated by arrows, these steps are not necessarily executed in the order indicated by arrows. Unless explicitly stated in this article, there is no strict order restriction on the execution of these steps, and these steps can be executed in other orders. Moreover, at least some of the steps in the flowcharts involved in the above embodiments may include multiple steps or multiple stages. These steps or stages are not necessarily executed at the same time, but may be executed at different times. The execution order of these steps or stages is not necessarily sequential, but may be performed in turn or alternately with other steps or at least part of the steps or stages in other steps.

基于同样的发明构思,本申请实施例还提供了一种用于实现上述所涉及的工艺确定方法的工艺确定装置。该装置所提供的解决问题的实现方案与上述方法中所记载的实现方案相似,故下面所提供的一个或多个工艺确定装置实施例中的具体限定可以参见上文中对于工艺确定方法的限定,在此不再赘述。Based on the same inventive concept, embodiments of the present application also provide a process determination device for implementing the above-mentioned process determination method. The solution to the problem provided by this device is similar to the solution recorded in the above method. Therefore, for the specific limitations in one or more process determination device embodiments provided below, please refer to the above limitations on the process determination method. I won’t go into details here.

在一个示例性的实施例中,如图7所示,提供了一种工艺确定装置,包括:第一确定模块10、第二确定模块20和第三确定模块30,其中:In an exemplary embodiment, as shown in Figure 7, a process determination device is provided, including: a first determination module 10, a second determination module 20 and a third determination module 30, wherein:

第一确定模块10,用于确定待分析器件在初始状态下的初始谐振频率和初始品质因子。The first determination module 10 is used to determine the initial resonant frequency and initial quality factor of the device to be analyzed in the initial state.

第二确定模块20,用于根据至少一种候选工艺对待分析器件进行封装处理,得到至少一个候选封装状态下的待分析器件,并确定待分析器件在各候选封装状态下的候选谐振频率和候选品质因子。The second determination module 20 is used to package the device to be analyzed according to at least one candidate process, obtain the device to be analyzed in at least one candidate packaging state, and determine the candidate resonant frequency and candidate resonant frequency of the device to be analyzed in each candidate packaging state. Quality factor.

第三确定模块30,用于根据待分析器件在初始状态下的初始谐振频率和初始品质因子,以及待分析器件在各候选封装状态下的候选谐振频率和候选品质因子,从各候选工艺中确定待分析器件对应的目标工艺。The third determination module 30 is configured to determine from each candidate process based on the initial resonant frequency and initial quality factor of the device to be analyzed in the initial state, and the candidate resonant frequency and candidate quality factor of the device to be analyzed in each candidate packaging state. The target process corresponding to the device to be analyzed.

上述工艺确定装置,根据待分析器件在初始状态下的初始谐振频率和初始品质因子,以及待分析器件在各候选封装状态下的候选谐振频率和候选品质因子,从各候选工艺中确定待分析器件对应的目标工艺。由于上述过程中,本申请从各候选工艺中确定目标工艺时,不仅考虑了初始品质因子和各候选封装状态下的候选品质因子,还考虑了初始谐振频率和各候选封装状态下的候选谐振频率,进而,消除了其他因素(谐振频率)对待分析器件品质因子的变化量的影响,使得后续能够准确的从候选工艺中确定目标工艺,保证了在根据目标工艺对待分析器件进行封装处理后,对待分析器件的品质因子影响最小。The above-mentioned process determination device determines the device to be analyzed from each candidate process based on the initial resonant frequency and initial quality factor of the device to be analyzed in the initial state, and the candidate resonant frequency and candidate quality factor of the device to be analyzed in each candidate packaging state. Corresponding target technology. Due to the above process, when this application determines the target process from each candidate process, it not only considers the initial quality factor and the candidate quality factor in each candidate packaging state, but also considers the initial resonant frequency and the candidate resonant frequency in each candidate packaging state. , furthermore, the influence of other factors (resonant frequency) on the change of the quality factor of the device to be analyzed is eliminated, so that the target process can be accurately determined from the candidate processes in the future, ensuring that after the device to be analyzed is packaged according to the target process, the The quality factor of the analytical device is minimally affected.

在一个示例性的实施例中,如图8所示,提供了一种工艺确定装置,该装置中第三确定模块30,包括:第一确定单元31和第二确定单元32,其中:In an exemplary embodiment, as shown in Figure 8, a process determination device is provided, in which the third determination module 30 includes: a first determination unit 31 and a second determination unit 32, wherein:

第一确定单元31,用于根据待分析器件在初始状态下的初始谐振频率和初始品质因子,以及待分析器件在各候选封装状态下的候选谐振频率和候选品质因子,确定待分析器件在各候选封装状态下的目标品质变化量。The first determination unit 31 is used to determine the initial resonant frequency and initial quality factor of the device to be analyzed in the initial state, and the candidate resonant frequency and candidate quality factor of the device to be analyzed in each candidate packaging state. The target quality change amount in the candidate packaging state.

第二确定单元32,用于根据待分析器件在各候选封装状态下的目标品质变化量,从各候选工艺中确定待分析器件对应的目标工艺。The second determination unit 32 is configured to determine the target process corresponding to the device to be analyzed from each candidate process based on the target quality change of the device to be analyzed in each candidate packaging state.

在一个示例性的实施例中,如图9所示,提供了一种工艺确定装置,该装置中第一确定单元31,包括:第一确定子单元311和第二确定子单元312,其中:In an exemplary embodiment, as shown in Figure 9, a process determination device is provided, in which the first determination unit 31 includes: a first determination sub-unit 311 and a second determination sub-unit 312, wherein:

第一确定子单元311,用于针对每一候选封装状态,确定待分析器件在该候选封装状态下的候选谐振频率与初始谐振频率之间的谐振变化量,以及确定待分析器件在该候选封装状态下的候选品质因子与初始品质因子之间的初始品质变化量。The first determination subunit 311 is used to determine, for each candidate packaging state, the resonance change amount between the candidate resonant frequency and the initial resonant frequency of the device to be analyzed in the candidate packaging state, and determine the resonant frequency of the device to be analyzed in the candidate package. The initial quality change between the candidate quality factor in the state and the initial quality factor.

第一确定子单元311具体用于对待分析器件在该候选封装状态下的候选谐振频率与初始谐振频率进行差值运算,得到第一运算结果;将第一运算结果和初始谐振频率的比值作为谐振变化量;对待分析器件在该候选封装状态下的候选品质因子与初始品质因子进行差值运算,得到第二运算结果;将第二运算结果和初始品质因子的比值作为初始品质变化量。The first determination subunit 311 is specifically used to perform a difference operation between the candidate resonant frequency and the initial resonant frequency of the device to be analyzed in the candidate packaging state to obtain the first operation result; and use the ratio of the first operation result to the initial resonant frequency as the resonance The amount of change; perform a difference operation between the candidate quality factor of the device to be analyzed in the candidate packaging state and the initial quality factor to obtain the second operation result; use the ratio of the second operation result and the initial quality factor as the initial quality change amount.

第二确定子单元312,用于对初始品质变化量和谐振变化量进行差值运算,得到待分析器件在该候选封装状态下的目标品质变化量。The second determination subunit 312 is used to perform a difference operation on the initial quality change amount and the resonance change amount to obtain the target quality change amount of the device to be analyzed in the candidate packaging state.

在一个示例性的实施例中,如图10所示,提供了一种工艺确定装置,该装置中第二确定单元32,包括:第三确定子单元321和第四确定子单元322,其中:In an exemplary embodiment, as shown in Figure 10, a process determination device is provided, in which the second determination unit 32 includes: a third determination sub-unit 321 and a fourth determination sub-unit 322, wherein:

第三确定子单元321,用于根据待分析器件在各候选封装状态下的目标品质变化量,从各候选封装状态中确定目标品质变化量最小的目标封装状态。The third determination subunit 321 is configured to determine the target packaging state with the smallest target quality change from each candidate packaging state based on the target quality change of the device to be analyzed in each candidate packaging state.

第四确定子单元322,用于将目标封装状态对应的候选工艺作为待分析器件对应的目标工艺。The fourth determination subunit 322 is used to use the candidate process corresponding to the target packaging state as the target process corresponding to the device to be analyzed.

在一个示例性的实施例中,如图11所示,提供了一种工艺确定装置,该装置中第一确定模块10,包括:第三确定单元11、第四确定单元12和第五确定单元13,其中:In an exemplary embodiment, as shown in Figure 11, a process determination device is provided, in which the first determination module 10 includes: a third determination unit 11, a fourth determination unit 12 and a fifth determination unit 13, among which:

第三确定单元11,用于确定待分析器件的模态质量、模态刚度和模态阻尼力系数。The third determination unit 11 is used to determine the modal quality, modal stiffness and modal damping force coefficient of the device to be analyzed.

第四确定单元12,用于根据模态质量和模态刚度,确定待分析器件在初始状态下的初始谐振频率。The fourth determination unit 12 is used to determine the initial resonant frequency of the device to be analyzed in the initial state based on the modal quality and modal stiffness.

第五确定单元13,用于根据待分析器件的模态质量、模态阻尼力系数和初始谐振频率,确定待分析器件在初始状态下的初始品质因子。The fifth determination unit 13 is used to determine the initial quality factor of the device to be analyzed in the initial state based on the modal quality, modal damping force coefficient and initial resonance frequency of the device to be analyzed.

上述工艺确定装置中的各个模块可全部或部分通过软件、硬件及其组合来实现。上述各模块可以硬件形式内嵌于或独立于计算机设备中的处理器中,也可以以软件形式存储于计算机设备中的存储器中,以便于处理器调用执行以上各个模块对应的操作。Each module in the above-mentioned process determination device can be implemented in whole or in part by software, hardware and combinations thereof. Each of the above modules may be embedded in or independent of the processor of the computer device in the form of hardware, or may be stored in the memory of the computer device in the form of software, so that the processor can call and execute the operations corresponding to the above modules.

在一个示例性的实施例中,提供了一种计算机设备,该计算机设备可以是终端,其内部结构图可以如图12所示。该计算机设备包括处理器、存储器、输入/输出接口、通信接口、显示单元和输入装置。其中,处理器、存储器和输入/输出接口通过系统总线连接,通信接口、显示单元和输入装置通过输入/输出接口连接到系统总线。其中,该计算机设备的处理器用于提供计算和控制能力。该计算机设备的存储器包括非易失性存储介质和内存储器。该非易失性存储介质存储有操作系统和计算机程序。该内存储器为非易失性存储介质中的操作系统和计算机程序的运行提供环境。该计算机设备的输入/输出接口用于处理器与外部设备之间交换信息。该计算机设备的通信接口用于与外部的终端进行有线或无线方式的通信,无线方式可通过WIFI、移动蜂窝网络、NFC(近场通信)或其他技术实现。该计算机程序被处理器执行时以实现一种工艺确定方法。该计算机设备的显示单元用于形成视觉可见的画面,可以是显示屏、投影装置或虚拟现实成像装置。显示屏可以是液晶显示屏或者电子墨水显示屏,该计算机设备的输入装置可以是显示屏上覆盖的触摸层,也可以是计算机设备外壳上设置的按键、轨迹球或触控板,还可以是外接的键盘、触控板或鼠标等。In an exemplary embodiment, a computer device is provided. The computer device may be a terminal, and its internal structure diagram may be as shown in FIG. 12 . The computer device includes a processor, memory, input/output interface, communication interface, display unit and input device. Among them, the processor, memory and input/output interface are connected through the system bus, and the communication interface, display unit and input device are connected to the system bus through the input/output interface. Wherein, the processor of the computer device is used to provide computing and control capabilities. The memory of the computer device includes non-volatile storage media and internal memory. The non-volatile storage medium stores operating systems and computer programs. This internal memory provides an environment for the execution of operating systems and computer programs in non-volatile storage media. The input/output interface of the computer device is used to exchange information between the processor and external devices. The communication interface of the computer device is used for wired or wireless communication with external terminals. The wireless mode can be implemented through WIFI, mobile cellular network, NFC (Near Field Communication) or other technologies. The computer program, when executed by the processor, implements a process determination method. The display unit of the computer equipment is used to form a visually visible picture, and may be a display screen, a projection device or a virtual reality imaging device. The display screen can be a liquid crystal display or an electronic ink display. The input device of the computer device can be a touch layer covered on the display screen, or it can be a button, trackball or touch pad provided on the computer device casing, or it can be External keyboard, trackpad or mouse, etc.

本领域技术人员可以理解,图12中示出的结构,仅仅是与本申请方案相关的部分结构的框图,并不构成对本申请方案所应用于其上的计算机设备的限定,具体的计算机设备可以包括比图中所示更多或更少的部件,或者组合某些部件,或者具有不同的部件布置。Those skilled in the art can understand that the structure shown in Figure 12 is only a block diagram of a partial structure related to the solution of the present application, and does not constitute a limitation on the computer equipment to which the solution of the present application is applied. Specific computer equipment can May include more or fewer parts than shown, or combine certain parts, or have a different arrangement of parts.

在一个示例性的实施例中,提供了一种计算机设备,包括存储器和处理器,存储器中存储有计算机程序,该处理器执行计算机程序时实现以下步骤:In an exemplary embodiment, a computer device is provided, including a memory and a processor. A computer program is stored in the memory. When the processor executes the computer program, it implements the following steps:

确定待分析器件在初始状态下的初始谐振频率和初始品质因子;Determine the initial resonant frequency and initial quality factor of the device to be analyzed in the initial state;

根据至少一种候选工艺对待分析器件进行封装处理,得到至少一个候选封装状态下的待分析器件,并确定待分析器件在各候选封装状态下的候选谐振频率和候选品质因子;Package the device to be analyzed according to at least one candidate process, obtain the device to be analyzed in at least one candidate packaging state, and determine the candidate resonant frequency and candidate quality factor of the device to be analyzed in each candidate packaging state;

根据待分析器件在初始状态下的初始谐振频率和初始品质因子,以及待分析器件在各候选封装状态下的候选谐振频率和候选品质因子,从各候选工艺中确定待分析器件对应的目标工艺。According to the initial resonant frequency and initial quality factor of the device to be analyzed in the initial state, and the candidate resonant frequency and candidate quality factor of the device to be analyzed in each candidate packaging state, the target process corresponding to the device to be analyzed is determined from each candidate process.

在一个实施例中,处理器执行计算机程序时还实现以下步骤:In one embodiment, the processor also implements the following steps when executing the computer program:

根据待分析器件在初始状态下的初始谐振频率和初始品质因子,以及待分析器件在各候选封装状态下的候选谐振频率和候选品质因子,确定待分析器件在各候选封装状态下的目标品质变化量;According to the initial resonant frequency and initial quality factor of the device to be analyzed in the initial state, and the candidate resonant frequency and candidate quality factor of the device to be analyzed in each candidate packaging state, the target quality change of the device to be analyzed in each candidate packaging state is determined quantity;

根据待分析器件在各候选封装状态下的目标品质变化量,从各候选工艺中确定待分析器件对应的目标工艺。According to the target quality variation of the device to be analyzed in each candidate packaging state, the target process corresponding to the device to be analyzed is determined from each candidate process.

在一个实施例中,处理器执行计算机程序时还实现以下步骤:In one embodiment, the processor also implements the following steps when executing the computer program:

针对每一候选封装状态,确定待分析器件在该候选封装状态下的候选谐振频率与初始谐振频率之间的谐振变化量,以及确定待分析器件在该候选封装状态下的候选品质因子与初始品质因子之间的初始品质变化量;For each candidate packaging state, determine the resonance change amount between the candidate resonant frequency and the initial resonant frequency of the device to be analyzed in the candidate packaging state, and determine the candidate quality factor and initial quality of the device to be analyzed in the candidate packaging state The amount of initial quality variation between factors;

对初始品质变化量和谐振变化量进行差值运算,得到待分析器件在该候选封装状态下的目标品质变化量。Perform a difference operation on the initial quality change amount and the resonance change amount to obtain the target quality change amount of the device to be analyzed in the candidate packaging state.

在一个实施例中,处理器执行计算机程序时还实现以下步骤:In one embodiment, the processor also implements the following steps when executing the computer program:

对待分析器件在该候选封装状态下的候选谐振频率与初始谐振频率进行差值运算,得到第一运算结果;Perform a difference operation between the candidate resonant frequency and the initial resonant frequency of the device to be analyzed in the candidate packaging state to obtain the first operation result;

将第一运算结果和初始谐振频率的比值作为谐振变化量;The ratio of the first operation result and the initial resonant frequency is used as the resonance change amount;

对待分析器件在该候选封装状态下的候选品质因子与初始品质因子进行差值运算,得到第二运算结果;Perform a difference operation between the candidate quality factor and the initial quality factor of the device to be analyzed in the candidate packaging state to obtain the second operation result;

将第二运算结果和初始品质因子的比值作为初始品质变化量。The ratio of the second operation result and the initial quality factor is used as the initial quality change amount.

在一个实施例中,处理器执行计算机程序时还实现以下步骤:In one embodiment, the processor also implements the following steps when executing the computer program:

根据待分析器件在各候选封装状态下的目标品质变化量,从各候选封装状态中确定目标品质变化量最小的目标封装状态;According to the target quality variation of the device to be analyzed in each candidate packaging state, determine the target packaging state with the smallest target quality variation from each candidate packaging state;

将目标封装状态对应的候选工艺作为待分析器件对应的目标工艺。The candidate process corresponding to the target packaging state is used as the target process corresponding to the device to be analyzed.

在一个实施例中,处理器执行计算机程序时还实现以下步骤:In one embodiment, the processor also implements the following steps when executing the computer program:

确定待分析器件的模态质量、模态刚度和模态阻尼力系数;Determine the modal mass, modal stiffness and modal damping force coefficient of the device to be analyzed;

根据模态质量和模态刚度,确定待分析器件在初始状态下的初始谐振频率;According to the modal quality and modal stiffness, determine the initial resonant frequency of the device to be analyzed in the initial state;

根据待分析器件的模态质量、模态阻尼力系数和初始谐振频率,确定待分析器件在初始状态下的初始品质因子。According to the modal quality, modal damping force coefficient and initial resonant frequency of the device to be analyzed, the initial quality factor of the device to be analyzed in the initial state is determined.

在一个实施例中,提供了一种计算机可读存储介质,其上存储有计算机程序,计算机程序被处理器执行时实现以下步骤:In one embodiment, a computer-readable storage medium is provided with a computer program stored thereon. When the computer program is executed by a processor, the following steps are implemented:

确定待分析器件在初始状态下的初始谐振频率和初始品质因子;Determine the initial resonant frequency and initial quality factor of the device to be analyzed in the initial state;

根据至少一种候选工艺对待分析器件进行封装处理,得到至少一个候选封装状态下的待分析器件,并确定待分析器件在各候选封装状态下的候选谐振频率和候选品质因子;Package the device to be analyzed according to at least one candidate process, obtain the device to be analyzed in at least one candidate packaging state, and determine the candidate resonant frequency and candidate quality factor of the device to be analyzed in each candidate packaging state;

根据待分析器件在初始状态下的初始谐振频率和初始品质因子,以及待分析器件在各候选封装状态下的候选谐振频率和候选品质因子,从各候选工艺中确定待分析器件对应的目标工艺。According to the initial resonant frequency and initial quality factor of the device to be analyzed in the initial state, and the candidate resonant frequency and candidate quality factor of the device to be analyzed in each candidate packaging state, the target process corresponding to the device to be analyzed is determined from each candidate process.

在一个实施例中,计算机程序被处理器执行时还实现以下步骤:In one embodiment, the computer program, when executed by the processor, also implements the following steps:

根据待分析器件在初始状态下的初始谐振频率和初始品质因子,以及待分析器件在各候选封装状态下的候选谐振频率和候选品质因子,确定待分析器件在各候选封装状态下的目标品质变化量;According to the initial resonant frequency and initial quality factor of the device to be analyzed in the initial state, and the candidate resonant frequency and candidate quality factor of the device to be analyzed in each candidate packaging state, the target quality change of the device to be analyzed in each candidate packaging state is determined quantity;

根据待分析器件在各候选封装状态下的目标品质变化量,从各候选工艺中确定待分析器件对应的目标工艺。According to the target quality variation of the device to be analyzed in each candidate packaging state, the target process corresponding to the device to be analyzed is determined from each candidate process.

在一个实施例中,计算机程序被处理器执行时还实现以下步骤:In one embodiment, the computer program, when executed by the processor, also implements the following steps:

针对每一候选封装状态,确定待分析器件在该候选封装状态下的候选谐振频率与初始谐振频率之间的谐振变化量,以及确定待分析器件在该候选封装状态下的候选品质因子与初始品质因子之间的初始品质变化量;For each candidate packaging state, determine the resonance change amount between the candidate resonant frequency and the initial resonant frequency of the device to be analyzed in the candidate packaging state, and determine the candidate quality factor and initial quality of the device to be analyzed in the candidate packaging state The amount of initial quality variation between factors;

对初始品质变化量和谐振变化量进行差值运算,得到待分析器件在该候选封装状态下的目标品质变化量。Perform a difference operation on the initial quality change amount and the resonance change amount to obtain the target quality change amount of the device to be analyzed in the candidate packaging state.

在一个实施例中,计算机程序被处理器执行时还实现以下步骤:In one embodiment, the computer program, when executed by the processor, also implements the following steps:

对待分析器件在该候选封装状态下的候选谐振频率与初始谐振频率进行差值运算,得到第一运算结果;Perform a difference operation between the candidate resonant frequency and the initial resonant frequency of the device to be analyzed in the candidate packaging state to obtain the first operation result;

将第一运算结果和初始谐振频率的比值作为谐振变化量;The ratio of the first operation result and the initial resonant frequency is used as the resonance change amount;

对待分析器件在该候选封装状态下的候选品质因子与初始品质因子进行差值运算,得到第二运算结果;Perform a difference operation between the candidate quality factor and the initial quality factor of the device to be analyzed in the candidate packaging state to obtain the second operation result;

将第二运算结果和初始品质因子的比值作为初始品质变化量。The ratio of the second operation result and the initial quality factor is used as the initial quality change amount.

在一个实施例中,计算机程序被处理器执行时还实现以下步骤:In one embodiment, the computer program, when executed by the processor, also implements the following steps:

根据待分析器件在各候选封装状态下的目标品质变化量,从各候选封装状态中确定目标品质变化量最小的目标封装状态;According to the target quality variation of the device to be analyzed in each candidate packaging state, determine the target packaging state with the smallest target quality variation from each candidate packaging state;

将目标封装状态对应的候选工艺作为待分析器件对应的目标工艺。The candidate process corresponding to the target packaging state is used as the target process corresponding to the device to be analyzed.

在一个实施例中,计算机程序被处理器执行时还实现以下步骤:In one embodiment, the computer program, when executed by the processor, also implements the following steps:

确定待分析器件的模态质量、模态刚度和模态阻尼力系数;Determine the modal mass, modal stiffness and modal damping force coefficient of the device to be analyzed;

根据模态质量和模态刚度,确定待分析器件在初始状态下的初始谐振频率;According to the modal quality and modal stiffness, determine the initial resonant frequency of the device to be analyzed in the initial state;

根据待分析器件的模态质量、模态阻尼力系数和初始谐振频率,确定待分析器件在初始状态下的初始品质因子。According to the modal quality, modal damping force coefficient and initial resonant frequency of the device to be analyzed, the initial quality factor of the device to be analyzed in the initial state is determined.

在一个实施例中,提供了一种计算机程序产品,包括计算机程序,该计算机程序被处理器执行时实现以下步骤:In one embodiment, a computer program product is provided, comprising a computer program that when executed by a processor implements the following steps:

确定待分析器件在初始状态下的初始谐振频率和初始品质因子;Determine the initial resonant frequency and initial quality factor of the device to be analyzed in the initial state;

根据至少一种候选工艺对待分析器件进行封装处理,得到至少一个候选封装状态下的待分析器件,并确定待分析器件在各候选封装状态下的候选谐振频率和候选品质因子;Package the device to be analyzed according to at least one candidate process, obtain the device to be analyzed in at least one candidate packaging state, and determine the candidate resonant frequency and candidate quality factor of the device to be analyzed in each candidate packaging state;

根据待分析器件在初始状态下的初始谐振频率和初始品质因子,以及待分析器件在各候选封装状态下的候选谐振频率和候选品质因子,从各候选工艺中确定待分析器件对应的目标工艺。According to the initial resonant frequency and initial quality factor of the device to be analyzed in the initial state, and the candidate resonant frequency and candidate quality factor of the device to be analyzed in each candidate packaging state, the target process corresponding to the device to be analyzed is determined from each candidate process.

在一个实施例中,计算机程序被处理器执行时还实现以下步骤:In one embodiment, the computer program, when executed by the processor, also implements the following steps:

根据待分析器件在初始状态下的初始谐振频率和初始品质因子,以及待分析器件在各候选封装状态下的候选谐振频率和候选品质因子,确定待分析器件在各候选封装状态下的目标品质变化量;According to the initial resonant frequency and initial quality factor of the device to be analyzed in the initial state, and the candidate resonant frequency and candidate quality factor of the device to be analyzed in each candidate packaging state, the target quality change of the device to be analyzed in each candidate packaging state is determined quantity;

根据待分析器件在各候选封装状态下的目标品质变化量,从各候选工艺中确定待分析器件对应的目标工艺。According to the target quality variation of the device to be analyzed in each candidate packaging state, the target process corresponding to the device to be analyzed is determined from each candidate process.

在一个实施例中,计算机程序被处理器执行时还实现以下步骤:In one embodiment, the computer program, when executed by the processor, also implements the following steps:

针对每一候选封装状态,确定待分析器件在该候选封装状态下的候选谐振频率与初始谐振频率之间的谐振变化量,以及确定待分析器件在该候选封装状态下的候选品质因子与初始品质因子之间的初始品质变化量;For each candidate packaging state, determine the resonance change amount between the candidate resonant frequency and the initial resonant frequency of the device to be analyzed in the candidate packaging state, and determine the candidate quality factor and initial quality of the device to be analyzed in the candidate packaging state The amount of initial quality variation between factors;

对初始品质变化量和谐振变化量进行差值运算,得到待分析器件在该候选封装状态下的目标品质变化量。Perform a difference operation on the initial quality change amount and the resonance change amount to obtain the target quality change amount of the device to be analyzed in the candidate packaging state.

在一个实施例中,计算机程序被处理器执行时还实现以下步骤:In one embodiment, the computer program, when executed by the processor, also implements the following steps:

对待分析器件在该候选封装状态下的候选谐振频率与初始谐振频率进行差值运算,得到第一运算结果;Perform a difference operation between the candidate resonant frequency and the initial resonant frequency of the device to be analyzed in the candidate packaging state to obtain the first operation result;

将第一运算结果和初始谐振频率的比值作为谐振变化量;The ratio of the first operation result and the initial resonant frequency is used as the resonance change amount;

对待分析器件在该候选封装状态下的候选品质因子与初始品质因子进行差值运算,得到第二运算结果;Perform a difference operation between the candidate quality factor and the initial quality factor of the device to be analyzed in the candidate packaging state to obtain the second operation result;

将第二运算结果和初始品质因子的比值作为初始品质变化量。The ratio of the second operation result and the initial quality factor is used as the initial quality change amount.

在一个实施例中,计算机程序被处理器执行时还实现以下步骤:In one embodiment, the computer program, when executed by the processor, also implements the following steps:

根据待分析器件在各候选封装状态下的目标品质变化量,从各候选封装状态中确定目标品质变化量最小的目标封装状态;According to the target quality variation of the device to be analyzed in each candidate packaging state, determine the target packaging state with the smallest target quality variation from each candidate packaging state;

将目标封装状态对应的候选工艺作为待分析器件对应的目标工艺。The candidate process corresponding to the target packaging state is used as the target process corresponding to the device to be analyzed.

在一个实施例中,计算机程序被处理器执行时还实现以下步骤:In one embodiment, the computer program, when executed by the processor, also implements the following steps:

确定待分析器件的模态质量、模态刚度和模态阻尼力系数;Determine the modal mass, modal stiffness and modal damping force coefficient of the device to be analyzed;

根据模态质量和模态刚度,确定待分析器件在初始状态下的初始谐振频率;According to the modal quality and modal stiffness, determine the initial resonant frequency of the device to be analyzed in the initial state;

根据待分析器件的模态质量、模态阻尼力系数和初始谐振频率,确定待分析器件在初始状态下的初始品质因子。According to the modal quality, modal damping force coefficient and initial resonant frequency of the device to be analyzed, the initial quality factor of the device to be analyzed in the initial state is determined.

需要说明的是,本申请所涉及的用户信息(包括但不限于用户设备信息、用户个人信息等)和数据(包括但不限于用于分析的数据、存储的数据、展示的数据等),均为经用户授权或者经过各方充分授权的信息和数据,且相关数据的收集、使用和处理需要符合相关规定。It should be noted that the user information (including but not limited to user equipment information, user personal information, etc.) and data (including but not limited to data used for analysis, stored data, displayed data, etc.) involved in this application are all It is information and data authorized by the user or fully authorized by all parties, and the collection, use and processing of relevant data need to comply with relevant regulations.

本领域普通技术人员可以理解实现上述实施例方法中的全部或部分流程,是可以通过计算机程序来指令相关的硬件来完成,该计算机程序可存储于一非易失性计算机可读取存储介质中,该计算机程序在执行时,可包括如上述各方法的实施例的流程。其中,本申请所提供的各实施例中所使用的对存储器、数据库或其它介质的任何引用,均可包括非易失性和易失性存储器中的至少一种。非易失性存储器可包括只读存储器(Read-OnlyMemory,ROM)、磁带、软盘、闪存、光存储器、高密度嵌入式非易失性存储器、阻变存储器(ReRAM)、磁变存储器(Magnetoresistive Random Access Memory,MRAM)、铁电存储器(Ferroelectric Random Access Memory,FRAM)、相变存储器(Phase Change Memory,PCM)、石墨烯存储器等。易失性存储器可包括随机存取存储器(Random Access Memory,RAM)或外部高速缓冲存储器等。作为说明而非局限,RAM可以是多种形式,比如静态随机存取存储器(Static Random Access Memory,SRAM)或动态随机存取存储器(Dynamic RandomAccess Memory,DRAM)等。本申请所提供的各实施例中所涉及的数据库可包括关系型数据库和非关系型数据库中至少一种。非关系型数据库可包括基于区块链的分布式数据库等,不限于此。本申请所提供的各实施例中所涉及的处理器可为通用处理器、中央处理器、图形处理器、数字信号处理器、可编程逻辑器、基于量子计算的数据处理逻辑器等,不限于此。Those of ordinary skill in the art can understand that all or part of the processes in the methods of the above embodiments can be implemented by instructing relevant hardware through a computer program. The computer program can be stored in a non-volatile computer-readable storage medium. , when executed, the computer program may include the processes of the above method embodiments. Any reference to memory, database or other media used in the embodiments provided in this application may include at least one of non-volatile and volatile memory. Non-volatile memory can include read-only memory (ROM), magnetic tape, floppy disk, flash memory, optical memory, high-density embedded non-volatile memory, resistive memory (ReRAM), magnetic variable memory (Magnetoresistive Random) Access Memory (MRAM), Ferroelectric Random Access Memory (FRAM), Phase Change Memory (PCM), graphene memory, etc. Volatile memory may include random access memory (Random Access Memory, RAM) or external cache memory. As an illustration and not a limitation, RAM can be in various forms, such as static random access memory (Static Random Access Memory, SRAM) or dynamic random access memory (Dynamic Random Access Memory, DRAM). The databases involved in the various embodiments provided in this application may include at least one of a relational database and a non-relational database. Non-relational databases may include blockchain-based distributed databases, etc., but are not limited thereto. The processors involved in the various embodiments provided in this application may be general-purpose processors, central processing units, graphics processors, digital signal processors, programmable logic devices, quantum computing-based data processing logic devices, etc., and are not limited to this.

以上实施例的各技术特征可以进行任意的组合,为使描述简洁,未对上述实施例中的各个技术特征所有可能的组合都进行描述,然而,只要这些技术特征的组合不存在矛盾,都应当认为是本说明书记载的范围。The technical features of the above embodiments can be combined in any way. To simplify the description, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, all possible combinations should be used. It is considered to be within the scope of this manual.

以上实施例仅表达了本申请的几种实施方式,其描述较为具体和详细,但并不能因此而理解为对本申请专利范围的限制。应当指出的是,对于本领域的普通技术人员来说,在不脱离本申请构思的前提下,还可以做出若干变形和改进,这些都属于本申请的保护范围。因此,本申请的保护范围应以所附权利要求为准。The above embodiments only express several implementation modes of the present application, and their descriptions are relatively specific and detailed, but they should not be construed as limiting the patent scope of the present application. It should be noted that, for those of ordinary skill in the art, several modifications and improvements can be made without departing from the concept of the present application, and these all fall within the protection scope of the present application. Therefore, the scope of protection of this application should be determined by the appended claims.

Claims (10)

1.一种工艺确定方法,其特征在于,所述方法包括:1. A process determination method, characterized in that the method includes: 确定待分析器件在初始状态下的初始谐振频率和初始品质因子;Determine the initial resonant frequency and initial quality factor of the device to be analyzed in the initial state; 根据至少一种候选工艺对所述待分析器件进行封装处理,得到至少一个候选封装状态下的待分析器件,并确定待分析器件在各候选封装状态下的候选谐振频率和候选品质因子;Perform packaging processing on the device to be analyzed according to at least one candidate process, obtain the device to be analyzed in at least one candidate packaging state, and determine the candidate resonant frequency and candidate quality factor of the device to be analyzed in each candidate packaging state; 根据所述待分析器件在初始状态下的初始谐振频率和初始品质因子,以及所述待分析器件在各候选封装状态下的候选谐振频率和候选品质因子,从各候选工艺中确定待分析器件对应的目标工艺。According to the initial resonant frequency and initial quality factor of the device to be analyzed in the initial state, and the candidate resonant frequency and candidate quality factor of the device to be analyzed in each candidate packaging state, the corresponding device to be analyzed is determined from each candidate process. target technology. 2.根据权利要求1所述的方法,其特征在于,所述根据所述待分析器件在初始状态下的初始谐振频率和初始品质因子,以及所述待分析器件在各候选封装状态下的候选谐振频率和候选品质因子,从各候选工艺中确定待分析器件对应的目标工艺,包括:2. The method according to claim 1, characterized in that, according to the initial resonant frequency and initial quality factor of the device to be analyzed in an initial state, and the candidates of the device to be analyzed in each candidate packaging state, Resonant frequency and candidate quality factor, determine the target process corresponding to the device to be analyzed from each candidate process, including: 根据所述待分析器件在初始状态下的初始谐振频率和初始品质因子,以及所述待分析器件在各候选封装状态下的候选谐振频率和候选品质因子,确定待分析器件在各候选封装状态下的目标品质变化量;According to the initial resonant frequency and initial quality factor of the device to be analyzed in the initial state, and the candidate resonant frequency and candidate quality factor of the device to be analyzed in each candidate packaging state, it is determined that the device to be analyzed is in each candidate packaging state. The target quality change amount; 根据待分析器件在各候选封装状态下的目标品质变化量,从各候选工艺中确定待分析器件对应的目标工艺。According to the target quality variation of the device to be analyzed in each candidate packaging state, the target process corresponding to the device to be analyzed is determined from each candidate process. 3.根据权利要求2所述的方法,其特征在于,所述根据待分析器件在初始状态下的初始谐振频率和初始品质因子,以及待分析器件在各候选封装状态下的候选谐振频率和候选品质因子,确定待分析器件在各候选封装状态下的目标品质变化量,包括:3. The method according to claim 2, characterized in that, according to the initial resonant frequency and initial quality factor of the device to be analyzed in the initial state, and the candidate resonant frequency and candidate resonant frequency of the device to be analyzed in each candidate packaging state. Quality factor determines the target quality change of the device to be analyzed in each candidate packaging state, including: 针对每一候选封装状态,确定待分析器件在该候选封装状态下的候选谐振频率与初始谐振频率之间的谐振变化量,以及确定待分析器件在该候选封装状态下的候选品质因子与初始品质因子之间的初始品质变化量;For each candidate packaging state, determine the resonance change amount between the candidate resonant frequency and the initial resonant frequency of the device to be analyzed in the candidate packaging state, and determine the candidate quality factor and initial quality of the device to be analyzed in the candidate packaging state The amount of initial quality variation between factors; 对所述初始品质变化量和所述谐振变化量进行差值运算,得到待分析器件在该候选封装状态下的目标品质变化量。A difference operation is performed on the initial quality change amount and the resonance change amount to obtain the target quality change amount of the device to be analyzed in the candidate packaging state. 4.根据权利要求3所述的方法,其特征在于,所述确定待分析器件在该候选封装状态下的候选谐振频率与初始谐振频率之间的谐振变化量,以及确定待分析器件在该候选封装状态下的候选品质因子与初始品质因子之间的初始品质变化量,包括:4. The method according to claim 3, characterized in that: determining the resonance change amount between the candidate resonant frequency and the initial resonant frequency of the device to be analyzed in the candidate packaging state, and determining the resonant frequency of the device to be analyzed in the candidate packaging state. The initial quality change between the candidate quality factor and the initial quality factor in the packaged state includes: 对待分析器件在该候选封装状态下的所述候选谐振频率与所述初始谐振频率进行差值运算,得到第一运算结果;Perform a difference operation between the candidate resonant frequency and the initial resonant frequency of the device to be analyzed in the candidate packaging state to obtain a first operation result; 将所述第一运算结果和所述初始谐振频率的比值作为谐振变化量;The ratio of the first operation result and the initial resonant frequency is used as the resonance change amount; 对待分析器件在该候选封装状态下的所述候选品质因子与所述初始品质因子进行差值运算,得到第二运算结果;Perform a difference operation between the candidate quality factor and the initial quality factor of the device to be analyzed in the candidate packaging state to obtain a second operation result; 将所述第二运算结果和所述初始品质因子的比值作为初始品质变化量。The ratio of the second operation result and the initial quality factor is used as the initial quality change amount. 5.根据权利要求2所述的方法,其特征在于,所述根据待分析器件在各候选封装状态下的目标品质变化量,从各候选工艺中确定待分析器件对应的目标工艺,包括:5. The method according to claim 2, wherein determining the target process corresponding to the device to be analyzed from each candidate process according to the target quality variation of the device to be analyzed in each candidate packaging state includes: 根据待分析器件在各候选封装状态下的目标品质变化量,从各候选封装状态中确定目标品质变化量最小的目标封装状态;According to the target quality variation of the device to be analyzed in each candidate packaging state, determine the target packaging state with the smallest target quality variation from each candidate packaging state; 将目标封装状态对应的候选工艺作为待分析器件对应的目标工艺。The candidate process corresponding to the target packaging state is used as the target process corresponding to the device to be analyzed. 6.根据权利要求1所述的方法,其特征在于,所述确定待分析器件在初始状态下的初始谐振频率和初始品质因子,包括:6. The method of claim 1, wherein determining the initial resonant frequency and initial quality factor of the device to be analyzed in an initial state includes: 确定待分析器件的模态质量、模态刚度和模态阻尼力系数;Determine the modal mass, modal stiffness and modal damping force coefficient of the device to be analyzed; 根据所述模态质量和所述模态刚度,确定待分析器件在初始状态下的初始谐振频率;According to the modal quality and the modal stiffness, determine the initial resonant frequency of the device to be analyzed in the initial state; 根据待分析器件的模态质量、模态阻尼力系数和所述初始谐振频率,确定待分析器件在初始状态下的初始品质因子。According to the modal quality, modal damping force coefficient and the initial resonant frequency of the device to be analyzed, the initial quality factor of the device to be analyzed in the initial state is determined. 7.一种工艺确定装置,其特征在于,所述装置包括:7. A process determination device, characterized in that the device includes: 第一确定模块,用于确定待分析器件在初始状态下的初始谐振频率和初始品质因子;The first determination module is used to determine the initial resonant frequency and initial quality factor of the device to be analyzed in the initial state; 第二确定模块,用于根据至少一种候选工艺对所述待分析器件进行封装处理,得到至少一个候选封装状态下的待分析器件,并确定待分析器件在各候选封装状态下的候选谐振频率和候选品质因子;The second determination module is used to package the device to be analyzed according to at least one candidate process, obtain the device to be analyzed in at least one candidate packaging state, and determine the candidate resonant frequency of the device to be analyzed in each candidate packaging state. and candidate quality factors; 第三确定模块,用于根据所述待分析器件在初始状态下的初始谐振频率和初始品质因子,以及所述待分析器件在各候选封装状态下的候选谐振频率和候选品质因子,从各候选工艺中确定待分析器件对应的目标工艺。The third determination module is configured to determine the initial resonant frequency and initial quality factor of the device to be analyzed from each candidate based on the initial resonant frequency and initial quality factor of the device to be analyzed in each candidate packaging state. In the process, the target process corresponding to the device to be analyzed is determined. 8.一种计算机设备,包括存储器和处理器,所述存储器存储有计算机程序,其特征在于,所述处理器执行所述计算机程序时实现权利要求1至6中任一项所述的方法的步骤。8. A computer device, comprising a memory and a processor, the memory stores a computer program, wherein the method of any one of claims 1 to 6 is implemented when the processor executes the computer program. step. 9.一种计算机可读存储介质,其上存储有计算机程序,其特征在于,所述计算机程序被处理器执行时实现权利要求1至6中任一项所述的方法的步骤。9. A computer-readable storage medium with a computer program stored thereon, characterized in that when the computer program is executed by a processor, the steps of the method according to any one of claims 1 to 6 are implemented. 10.一种计算机程序产品,包括计算机程序,其特征在于,该计算机程序被处理器执行时实现权利要求1至6中任一项所述的方法的步骤。10. A computer program product, comprising a computer program, characterized in that, when executed by a processor, the computer program implements the steps of the method according to any one of claims 1 to 6.
CN202311244110.8A 2023-09-22 2023-09-22 Process determination method, process determination device, computer equipment and storage medium Pending CN117421864A (en)

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