CN117420637A - Manufacturing method of splicing working template, binocular light waveguide and manufacturing method thereof - Google Patents

Manufacturing method of splicing working template, binocular light waveguide and manufacturing method thereof Download PDF

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Publication number
CN117420637A
CN117420637A CN202311390183.8A CN202311390183A CN117420637A CN 117420637 A CN117420637 A CN 117420637A CN 202311390183 A CN202311390183 A CN 202311390183A CN 117420637 A CN117420637 A CN 117420637A
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China
Prior art keywords
grating
coupling
template
optical waveguide
patch
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CN202311390183.8A
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Chinese (zh)
Inventor
虎良可
谢李鹏
赵谊华
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Long Optoelectronics Co ltd
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Long Optoelectronics Co ltd
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Priority to CN202311390183.8A priority Critical patent/CN117420637A/en
Publication of CN117420637A publication Critical patent/CN117420637A/en
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13—Integrated optical circuits characterised by the manufacturing method
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/01—Head-up displays
    • G02B27/017—Head mounted
    • G02B27/0172—Head mounted characterised by optical features
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/122—Basic optical elements, e.g. light-guiding paths
    • G02B6/124—Geodesic lenses or integrated gratings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/24—Coupling light guides
    • G02B6/26—Optical coupling means
    • G02B6/34—Optical coupling means utilising prism or grating
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)

Abstract

The invention provides a manufacturing method of a splicing working template, a manufacturing method of a binocular light waveguide prepared by a monocular master plate, a binocular light waveguide and a binocular near-to-eye display device, wherein the manufacturing method comprises the steps of imprinting a first working template by the monocular master plate to obtain an intermediate template; cutting the middle template to obtain a coupling-in grating patch and a coupling-out grating patch; acquiring a relative position relationship and a grating line direction, and determining rotation information coupled into the grating patch according to the relative position relationship and the grating line direction; the coupling-in grating patch is stuck to the second working template after being rotated according to the rotation information, so that a coupling-in working template is obtained; and sticking the coupling-out grating patch to a third working template to obtain the coupling-out working template. In the method, the monocular master plate can be utilized to prepare a splicing working template, and the optical waveguide prepared by the splicing working template can be matched with the optical waveguide prepared by the monocular master plate to be applied to the binocular near-eye display device, so that the cost and time consumption for manufacturing the binocular near-eye display device are reduced.

Description

Manufacturing method of splicing working template, binocular light waveguide and manufacturing method thereof
Technical Field
The embodiment of the invention relates to the technical field of optics, in particular to a manufacturing method of a splicing working template, an optical waveguide and a manufacturing method of the optical waveguide.
Background
Augmented reality (Augmented Reality, AR) is a display technology that superimposes and projects a real scene and virtual information to the human eye. Optical waveguides, which are the core components of AR technology, are considered as an essential optical solution for consumer-grade AR glasses due to their thinness and high transmission characteristics of ambient light. With the application and development of projection display technologies such as augmented Reality (VR) and Virtual Reality (VR), diffractive waveguides with advantages of small volume, large field of view, light weight, convenience, and the like are gaining favor of more consumers. In general, the nano imprinting technology (Nanoimprinting Technology) is adopted to realize the mass production of the diffraction optical waveguide, and as a novel micro-nano processing technology, the nano imprinting has the advantages of low cost, high mass production, high resolution and the like, and has wide application prospect in the production of various nano devices.
Before the diffraction optical waveguide is produced by using the nanoimprint technology, firstly, a master with a grating structure needs to be prepared by photoetching on the surface of a silicon wafer by using electron beam exposure equipment, however, the processing difficulty is high, the time consumption is long, the technical threshold is high, the prepared master is expensive, the prepared master is generally a single-eye master, only optical waveguides suitable for one eye can be prepared, if a binocular near-eye display device is to be prepared, the master suitable for the other eye needs to be prepared again by using electron beam exposure photoetching, so that the optical waveguides suitable for the other eye can be prepared, and however, the mode of preparing the optical waveguides of the other eye by the master of the other eye by the remanufacturing can lead to the processing cost and time consumption required by preparing the binocular near-eye display device.
Disclosure of Invention
The invention aims to provide a manufacturing method of a splicing working template, a manufacturing method of binocular light waveguides manufactured by a monocular master plate, the binocular light waveguides and a binocular near-eye display device, wherein the splicing working template can be manufactured by the monocular master plate, and the optical waveguides manufactured by the splicing working template can be matched with the optical waveguides manufactured by the monocular master plate to be applied to the binocular near-eye display device, so that the cost and time consumption for manufacturing the binocular near-eye display device are reduced.
In a first aspect, an embodiment of the present invention provides a method for manufacturing a spliced working template, where the spliced working template includes a coupled working template for manufacturing a coupled grating and a coupled working template for manufacturing a coupled grating, where the coupled grating and the coupled grating are used to form a first optical waveguide, where the first optical waveguide is used to binocular image with a second optical waveguide, where the second optical waveguide is obtained by a monocular master through a conventional imprinting method, and where the coupled grating is a linear grating, and the manufacturing method includes: providing a first working template and a monocular master, wherein the monocular master is provided with a first grating pattern and a second grating pattern; imprinting the first working template by adopting the monocular master plate to obtain an intermediate template; cutting the middle template to obtain a coupling-in grating patch with a first structure opposite to the structure concave-convex of the first grating pattern and a coupling-out grating patch with a second structure, wherein the second structure comprises a structure opposite to the structure concave-convex of the second grating pattern; providing a second work template and a third work template; acquiring a relative position relationship and a grating line direction, and determining rotation information of the coupled grating patch according to the relative position relationship and the grating line direction, wherein the relative position relationship is a relative position relationship between the first grating pattern and the second grating pattern, or the relative position relationship is a relative position relationship between the first structure and the second structure on the middle template, and the grating line direction is the grating line direction of the first grating pattern or the grating line direction of the first structure; the coupling-in grating patch is stuck to the second working template after being rotated according to the rotation information, so that the coupling-in working template is obtained; and pasting the coupling-out grating patch to the third working template to obtain the coupling-out working template.
In some embodiments, the rotation information includes a rotation angle and a rotation direction, and the determining the rotation information of the coupling-in grating patch according to the relative positional relationship and the grating line direction includes: if the region of the first grating pattern and the region of the second grating pattern are not symmetrical about the same symmetry axis and the grating line direction is not parallel to the first direction, or the region of the first structure and the region of the second structure are not symmetrical about the same symmetry axis and the grating line direction is not parallel to the first direction, obtaining diffraction efficiencies of different orders of the coupling grating, and determining the rotation angle and the rotation direction according to the diffraction efficiencies; the rotation angle is 0 if the region of the first grating pattern and the region of the second grating pattern are symmetrical about the same symmetry axis, or the grating line direction is parallel to the first direction, or the region of the first structure and the region of the second structure are symmetrical about the same symmetry axis.
In some embodiments, the diffraction efficiency comprises a positive first order diffraction efficiency and a negative first order diffraction efficiency, the determining the rotation angle and the rotation direction from the diffraction efficiency comprises: if the positive first order diffraction efficiency is equal to the negative first order diffraction efficiency, the rotation angle is 180-2N, the rotation direction is a first rotation direction, or the rotation angle is 2N, the rotation direction is a second rotation direction, wherein N is an included angle between the grating line direction and the first direction, and N is more than 0 degrees and less than or equal to 90 degrees; the first rotational direction is different from the second rotational direction; and if the positive first order diffraction efficiency is not equal to the negative first order diffraction efficiency, the rotation angle is 2N, and the rotation direction is a second rotation direction.
In some embodiments, the area where the incoupling grating is located is a 90 ° rotationally symmetric pattern.
In some embodiments, the monocular master has a coupling-in location point corresponding to the first grating pattern and a coupling-out location point corresponding to the second grating pattern, the coupling-in grating patch has a first location point corresponding to the coupling-in location point, and the coupling-out grating patch has a second location point corresponding to the coupling-out location point; the step of pasting the coupling-in grating patch onto the second work template after rotating according to the rotation information to obtain the coupling-in work template, and pasting the coupling-out grating patch onto the third work template to obtain the coupling-out work template, including: acquiring an outline drawing of the first grating pattern, coupling-in coordinate information of the coupling positioning point and coupling-out coordinate information of the coupling-out positioning point; according to the outline of the first grating pattern, the coupling coordinate information of the coupling positioning points and the rotation information, a first positioning mark and a shape mark consistent with the outline of the first grating pattern are manufactured on the second working template, wherein the position of the center point of the shape mark on the second working template is the same as the position of the center point of the area of the coupling grating on the monocular master; manufacturing a second positioning mark on the third working template according to the coupling coordinate information; according to the shape mark and the first positioning mark, the coupling grating patch is stuck to the second working template after being rotated according to the rotation information, wherein the coupling grating is completely attached to the shape mark, and the first positioning mark is overlapped with the first positioning point; and pasting the coupling-out grating patch to the third working template according to the second positioning mark, wherein the second positioning mark is coincident with the second positioning point.
In a second aspect, an embodiment of the present invention further provides a method for preparing a binocular optical waveguide by using a monocular master, the binocular optical waveguide including a first optical waveguide for a first eye and a second optical waveguide for a second eye, the method comprising: providing a first target substrate, a second target substrate and a monocular master; imprinting the first target substrate by adopting the monocular master plate through a conventional imprinting method to obtain the second optical waveguide; determining whether a splicing working template is required to be manufactured, if not, imprinting the second target substrate by adopting the monocular master plate through a conventional imprinting method to obtain the first optical waveguide, if so, manufacturing the splicing working template by adopting the monocular master plate through the manufacturing method according to any one of the first aspect, and imprinting the second target substrate by adopting the splicing working template to obtain the first optical waveguide.
In some embodiments, if the monocular master does not include a turning grating, the imprinting the second target substrate with the stitching work template to obtain the first optical waveguide includes: and determining the imprinting positions of the coupling-in working template and the coupling-out working template on the second target substrate according to the relative position relation and the grating distribution of the coupling-out grating, and imprinting the coupling-in working template and the coupling-out working template on the second target substrate according to the imprinting positions to obtain the first optical waveguide.
In some embodiments, the imprinting positions include different-side imprinting and same-side imprinting, and the determining the imprinting positions of the coupling-in working template and the coupling-out working template on the second target substrate according to the relative positional relationship and the grating distribution of the coupling-out grating includes: if the area of the first grating pattern and the area of the second grating pattern are not symmetrical about the same symmetry axis and the grating distribution of the coupling-out grating is not symmetrical, or the area of the first structure and the area of the second structure are not symmetrical about the same symmetry axis and the grating distribution of the coupling-out grating is not symmetrical, the imprinting position is a heterolateral imprinting; and if the area of the first grating pattern and the area of the second grating pattern are symmetrical about the same symmetry axis, or the grating distribution of the coupling grating is symmetrical, or the area of the first structure and the area of the second structure are symmetrical about the same symmetry axis, the imprinting position is the same side imprinting or different side imprinting.
In some embodiments, if the imprint location is a heterolateral imprint, the imprinting the in-process and the out-process templates to the second target substrate according to the imprint location comprises: imprinting the in-coupling work template and the out-coupling work template onto opposite sides of the second target substrate sequentially or simultaneously.
In a third aspect, an embodiment of the present invention provides a method for manufacturing a spliced working template, where the spliced working template includes an in-working template for manufacturing an in-grating and an out-working template for manufacturing an out-grating, where the in-grating and the out-grating are used to form a first optical waveguide, where the first optical waveguide is used to binocular image with a second optical waveguide, where the second optical waveguide is obtained by a monocular master through a conventional imprinting method, and the manufacturing method includes: providing a first working template and a monocular master plate, wherein the monocular master plate is provided with a first grating pattern, a second grating pattern and a third grating pattern; imprinting the first working template by adopting the monocular master plate to obtain an intermediate template; cutting the middle template to obtain a coupling-in grating patch with a first structure opposite to the structure concave-convex of the first grating pattern, a coupling-out grating patch with a second structure opposite to the structure concave-convex of the second grating pattern and a turning grating patch with a third structure opposite to the structure concave-convex of the third grating pattern, or obtaining the coupling-in grating patch and a coupling-out grating patch with the second structure and the third structure; providing a second work template, a third work template and a fourth work template if the out-coupling grating patch does not contain the third structure, and providing a second work template and a third work template if the out-coupling grating patch contains the third structure; acquiring a grating line direction, and determining rotation information of the coupled grating patch according to the grating line direction, wherein the grating line direction is the grating line direction of the first grating pattern or the grating line direction of the first structure; the coupling-in grating patch is stuck to the second working template after being rotated according to the rotation information, so that the coupling-in working template is obtained; and if the coupling-out grating patch does not contain the third structure, pasting the coupling-out grating patch onto the third working template to obtain the coupling-out working template, pasting the turning grating patch onto the fourth working template to obtain the turning working template, and if the coupling-out grating patch contains the third structure, pasting the coupling-out grating patch onto the third working template.
In some embodiments, the rotation information includes a rotation angle and a rotation direction, and the determining the rotation information of the coupled grating patch according to the grating line direction includes: if the grating line direction is not parallel to the first direction, diffraction efficiencies of different orders of the coupling grating are obtained, and the rotation angle and the rotation direction are determined according to the diffraction efficiencies; and if the grid line direction is parallel to the first direction, the rotation angle is 0.
In some embodiments, the diffraction efficiency comprises a positive first order diffraction efficiency and a negative first order diffraction efficiency, the determining the rotation angle and the rotation direction from the diffraction efficiency comprises: if the positive first order diffraction efficiency is equal to the negative first order diffraction efficiency, the rotation angle is 180-2N, the rotation direction is a first rotation direction, or the rotation angle is 2N, the rotation direction is a second rotation direction, wherein N is an included angle between the grating line direction and the first direction, and N is more than 0 degrees and less than or equal to 90 degrees; the first rotational direction is different from the second rotational direction; and if the positive first order diffraction efficiency is not equal to the negative first order diffraction efficiency, the rotation angle is 2N, and the rotation direction is the first rotation direction.
In some embodiments, the area where the incoupling grating is located is a 90 ° rotationally symmetric pattern.
In some embodiments, the monocular master has a coupling-in location point corresponding to the first grating pattern and a coupling-out location point corresponding to the second grating pattern, the coupling-in grating patch has a first location point corresponding to the coupling-in location point, and the coupling-out grating patch has a second location point corresponding to the coupling-out location point; the step of pasting the coupling-in grating patch onto the second work template after rotating according to the rotation information to obtain the coupling-in work template, and pasting the coupling-out grating patch onto the third work template to obtain the coupling-out work template, including: acquiring an outline drawing of the first grating pattern, coupling-in coordinate information of the coupling positioning point and coupling-out coordinate information of the coupling-out positioning point; according to the outline of the first grating pattern, the coupling coordinate information of the coupling positioning points and the rotation information, a first positioning mark and a shape mark consistent with the outline of the coupling grating are manufactured on the second working template, wherein the position of the center point of the shape mark on the second working template is the same as the position of the center point of the area of the coupling grating on the monocular master; manufacturing a second positioning mark on the third working template according to the coupling coordinate information; according to the shape mark and the first positioning mark, the coupling grating patch is stuck to the second working template after being rotated according to the rotation information, wherein the coupling grating is completely attached to the shape mark, and the first positioning mark is overlapped with the first positioning point; and pasting the coupling-out grating patch to the third working template according to the second positioning mark, wherein the second positioning mark is coincident with the second positioning point.
In a fourth aspect, an embodiment of the present invention provides a method for preparing a binocular optical waveguide including a first optical waveguide for a first eye and a second optical waveguide for a second eye by a monocular master, the method comprising: providing a first target substrate, a second target substrate and a monocular master; imprinting the first target substrate by adopting the monocular master plate through a conventional imprinting method to obtain the second optical waveguide; and manufacturing the splicing working template by using the monocular master plate through the manufacturing method according to any one of the third aspect, and imprinting the second target substrate by using the splicing working template to obtain the first optical waveguide.
In some embodiments, the imprinting the second target substrate with the stitching work template to obtain the second optical waveguide includes: and respectively imprinting the coupling-in working template and the coupling-out working template on the opposite sides of the second target substrate to obtain the second optical waveguide.
In some embodiments, the imprinting the in-coupling and out-coupling work templates to the opposite side of the second target substrate comprises: imprinting the coupling-in working template and the coupling-out working template on opposite sides of the second target substrate sequentially or simultaneously.
In a fifth aspect, embodiments of the present invention provide a binocular waveguide prepared by the preparation method according to any one of the second aspects or by the preparation method according to any one of the fourth aspects.
In a sixth aspect, embodiments of the present invention also provide a binocular near eye display device comprising a binocular light guide as described in the fifth aspect.
Compared with the prior art, the invention has the beneficial effects that: different from the situation of the prior art, the embodiment of the invention provides a manufacturing method of a splicing working template, a manufacturing method of a binocular light waveguide prepared by a monocular master, a binocular light waveguide and a binocular near-to-eye display device, wherein the manufacturing method of the splicing working template comprises the following steps: providing a first working template and a monocular master plate, wherein the monocular master plate is provided with a first grating pattern and a second grating pattern; imprinting the first working template by adopting a monocular master plate to obtain an intermediate template; cutting the middle template to obtain a coupling-in grating patch with a first structure opposite to the structure concave-convex of the first grating pattern and a coupling-out grating patch with a second structure, wherein the second structure comprises a structure opposite to the structure concave-convex of the second grating pattern; providing a second work template and a third work template; acquiring a relative position relationship and a grating line direction, and determining rotation information coupled into the grating patch according to the relative position relationship and the grating line direction, wherein the relative position relationship is the relative position relationship between a first grating pattern and a second grating pattern, or the relative position relationship is the relative position relationship between a first structure and a second structure on an intermediate template, and the grating line direction is the grating line direction of the first grating pattern or the grating line direction of the first structure; the coupling-in grating patch is stuck to the second working template after being rotated according to the rotation information, so that a coupling-in working template is obtained; and sticking the coupling-out grating patch to a third working template to obtain the coupling-out working template. In the method, the monocular master plate can be utilized to prepare a splicing working template, and the optical waveguide prepared by the splicing working template can be matched with the optical waveguide prepared by the monocular master plate to be applied to the binocular near-eye display device, so that the cost and time consumption for manufacturing the binocular near-eye display device are reduced.
Drawings
One or more embodiments are illustrated by way of example and not limitation in the figures of the accompanying drawings, in which like references indicate similar elements/modules and steps, and in which the figures do not include the true to scale unless expressly indicated by the contrary reference numerals.
FIG. 1 is a schematic view of an optical waveguide according to an embodiment of the present invention;
FIG. 2 is a schematic view of another optical waveguide according to an embodiment of the present invention;
FIG. 3 is a schematic diagram illustrating an analysis of an optical path of an optical waveguide according to an embodiment of the present invention;
FIG. 4 is a schematic diagram of an optical path analysis of another optical waveguide according to an embodiment of the present invention;
FIG. 5 is a schematic side view of a monocular master according to an embodiment of the present invention;
FIG. 6 is a schematic diagram of a portion of steps of a conventional imprinting method according to an embodiment of the present invention;
fig. 7 is a schematic flow chart of a method for manufacturing a spliced working template according to an embodiment of the present invention;
FIG. 8 is a schematic diagram of partial steps of a method for manufacturing a spliced working template according to an embodiment of the present invention;
fig. 9 is a schematic structural diagram of a monocular master set according to an embodiment of the present invention;
FIG. 10 is a schematic diagram of another monocular master according to an embodiment of the present invention;
FIG. 11 is a schematic diagram of a structure of a still further monocular master provided by an embodiment of the present invention;
FIG. 12 is a schematic diagram of a structure of a still further monocular master provided by an embodiment of the present invention;
FIG. 13 is a schematic view of some steps of another method for manufacturing a spliced working template according to an embodiment of the present invention;
FIG. 14 is a schematic view of some steps of a method for fabricating a splice work template according to an embodiment of the present invention;
fig. 15 is a schematic flow chart of a method for preparing a binocular light guide by a monocular master according to an embodiment of the present invention;
FIG. 16 is a schematic diagram of a monocular master and a corresponding second target substrate according to an embodiment of the present invention;
FIG. 17 is a schematic diagram of another monocular master and corresponding second target substrate according to an embodiment of the present invention;
fig. 18 is a schematic partial flow diagram of a method for preparing a binocular optical waveguide by using a monocular master according to an embodiment of the present invention;
FIG. 19 is a schematic partial flow diagram of another method for preparing a binocular optical waveguide by a monocular master according to an embodiment of the present invention;
fig. 20 is a schematic side view of a first optical waveguide according to an embodiment of the present invention;
Fig. 21 is a schematic structural diagram of a binocular near-eye display device according to an embodiment of the present invention;
FIG. 22 is a schematic view of an optical path analysis of yet another optical waveguide provided by an embodiment of the present invention;
FIG. 23 is a schematic view of part of steps of another method for manufacturing a spliced working template according to an embodiment of the present invention;
fig. 24 is a schematic structural view of a fifth monocular master provided in an embodiment of the present invention;
fig. 25 is a flow chart of another method for preparing a binocular optical waveguide by using a monocular master according to an embodiment of the present invention.
Detailed Description
The present invention will be described in detail with reference to specific examples. The following examples will assist those skilled in the art in further understanding the present invention, but are not intended to limit the invention in any way. It should be noted that variations and modifications could be made by those skilled in the art without departing from the inventive concept. These are all within the scope of the present invention.
In order to facilitate an understanding of the present application, the present application will be described in more detail below with reference to the accompanying drawings and specific examples. Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs. The terminology used in the description of the present application is for the purpose of describing particular embodiments only and is not intended to be limiting of the application. The term "and/or" as used in this specification includes any and all combinations of one or more of the associated listed items.
It should be noted that, if not conflicting, the various features of the embodiments of the present invention may be combined with each other, which are all within the protection scope of the present application. In addition, although functional block division is performed in the device schematic, in some cases, block division may be different from that in the device. Moreover, the words "first," "second," and the like as used herein do not limit the data and order of execution, but merely distinguish between identical or similar items that have substantially the same function and effect.
The diffractive optical waveguide can be divided into a one-dimensional optical waveguide, as shown in fig. 1, comprising an in-coupling grating 1 and an out-coupling grating 2, and a two-dimensional optical waveguide, as shown in fig. 2, comprising an in-coupling grating 1, an out-coupling grating 2, and a turning grating 3. In general, the preparation flow of the diffractive optical waveguide is as follows: firstly, preparing a silicon wafer master plate by using an electron beam exposure lithography method, transferring a grating structure on the master plate to another medium, thereby obtaining a template with concave-convex opposite to the grating structure of the silicon wafer master plate, and finally, imprinting by using the template through a nano imprinting technology, thus obtaining the required diffraction optical waveguide.
In the surface relief diffraction optical waveguide, please refer to fig. 3, which is a diffraction schematic diagram of the surface relief grating, if the incident light is monochromatic, the principal ray T will be divided into several diffraction orders, such as zero order diffraction order T in the figure 0 Positive first order diffraction order T +1 Negative first order diffraction order T -1 Etc. When the diffracted light enters the substrate, the light propagates through the substrate by total reflectionThe light of each diffraction order continues to propagate in a different direction in the substrate, while the diffraction efficiency of a certain diffraction order can be optimized to the highest by designing other parameters of the grating (material refractive index, grating shape, period, thickness, sidewall tilt, duty cycle, etc.), so that most of the light propagates through coupling into the grating mainly in total reflection in this direction, as the positive first order diffraction order T in fig. 3 +1 . When light propagating through total reflection in the optical waveguide encounters the outcoupling grating, several diffraction orders are also generated, such as the positive a-order diffraction order T in FIG. 3 +a Order and negative a-order diffraction order T -a The total reflection condition is destroyed at this time, the light rays are diffracted again and are emitted from two sides of the optical waveguide respectively, imaging can be observed on two coupled sides of the optical waveguide, but at this time, one side of the imaging surface is required to be selected according to the matching position of the micro optical machine.
The directions of the light source incident on the coupling-in grating are different, and the diffraction optical waveguide can be divided into a reflection type diffraction optical waveguide and a transmission type diffraction optical waveguide, wherein in the transmission type diffraction optical waveguide, light rays directly penetrate the coupling-in grating to perform total reflection in the substrate, as shown in fig. 3, and in the reflection type diffraction optical waveguide, the light rays are emitted to the coupling-in grating from the opposite side through the substrate to perform total reflection in the substrate, as shown in fig. 4. It should be noted that in the transmissive diffraction waveguide shown in fig. 3, light is incident on the coupling-in grating from above the coupling-in grating, the positive-order diffraction order T +1 The diffraction efficiency of the coupling-out region is high, so that the imaging quality of the coupling-out region is high. If light is incident from the non-grating surface to the coupling-in grating through the substrate, as shown in FIG. 4, the incident light is reflected on the substrate surface, and compared with the incident light from the grating surface, the reflected light T x More energy of the chief ray T will be lost, resulting in a reduced imaging quality at the outcoupling area.
In the diffraction optical waveguide, the grating surfaces of the coupling-in grating and the coupling-out grating are not physically different on the same side or different sides of the waveguide substrate, and can be designed according to actual requirements. For the design of the current diffraction waveguide, all grating structure areas are designed on the same surface at the beginning of master design, all grating partition positions are fixed, and then only one surface of the wafer glass can be stamped when the optical waveguide is stamped through a nano stamping process, so that the production time and the production cost can be greatly saved in the production process, as shown in fig. 5; in general, only a single-eye optical waveguide can be produced by one grating master, if a binocular optical waveguide is to be produced, another master needs to be designed and processed again, and it should be noted that the two designed and processed binocular masters are mirror symmetry, so that the requirement that the prepared diffraction optical waveguide is used for binocular wearing is met. However, the master plate prepared by the silicon wafer has the problems of long time consumption, high cost and the like, and if a new process method can be found to prepare the dual-purpose diffraction optical waveguide under the condition of only the single-purpose master plate, the master plate problem can be greatly solved.
Based on the above problems, the embodiments of the present application provide a method for manufacturing a splicing working template, a method for manufacturing a binocular waveguide by using a monocular master, a binocular waveguide, and a binocular near-eye display device, and provide a method for manufacturing a splicing working template by using a monocular master, and then manufacturing a diffraction optical waveguide of another eye by using the manufactured coupling working template and coupling working template, and performing the procedures of shape cutting, laminating a protective sheet, edge inking, and packaging a micro-optical machine on the diffraction optical waveguide, so that the method can be applied to the binocular near-eye display device in combination with the optical waveguide directly printed by the original monocular master, thereby reducing the cost and time consumption for manufacturing the binocular near-eye display device.
In a first aspect, an embodiment of the present invention provides a method for manufacturing a splice work template, the splice work template comprising a coupling-in work template 15 for manufacturing a coupling-in grating 1 and a coupling-out work template 16 for manufacturing a coupling-out grating 2.
The in-coupling grating 1 and the out-coupling grating 2 are used to form a first optical waveguide 111, i.e. the first optical waveguide 111 can be subsequently embossed by a splice working template, the first optical waveguide 111 being manufactured comprising a waveguide substrate, and the in-coupling grating 1 and the out-coupling grating 2 being arranged on the waveguide substrate.
The first optical waveguide 111 is used for binocular imaging with the second optical waveguide 121. The first optical waveguide 111 and the second optical waveguide 121 may subsequently be applied to the same binocular near eye display device, wherein the first optical waveguide 111 is used for left eye imaging, the second optical waveguide 121 is used for right eye imaging, or the first optical waveguide 111 is used for right eye imaging, and the second optical waveguide 121 is used for left eye imaging.
Wherein the second optical waveguide 121 is obtained from the monocular master 10 by a conventional imprint method. Specifically, firstly, the monocular master 10 is imprinted on a polyethylene terephthalate (Polyethylene terephthalate, PET) soft template 11, so that the diffraction grating structure on the monocular master 10 is imprinted on the PET soft template 11, then, as shown in fig. 6, the PET soft template 11 with the diffraction grating structure is imprinted on a wafer glass 13 with an imprinting adhesive 12, and cured (such as UV curing, thermal curing, etc.) by using curing equipment, after demolding, the diffraction grating structure on the PET soft template 11 is imprinted on the imprinting adhesive 12 on the surface of the wafer glass 13, and the wafer glass 13 is subjected to the procedures of quality inspection, shape cutting, laminating a protective sheet, edge inking, packaging a micro-optical machine, etc. to obtain a second optical waveguide 121, and it can be understood that the second optical waveguide 121 is a diffraction optical waveguide.
The incoupling grating 1 is a linear grating comprising a grating structure arranged periodically in the circumferential direction. The linear grating includes one or at least one of a straight grating, a slanted grating, a blazed grating, and the like.
Referring to fig. 7, the manufacturing method includes:
step S10A: a first work template and a monocular master 10 are provided, the monocular master 10 having a first grating pattern 1A and a second grating pattern 2A.
The material of the first working template includes at least one of polyethylene terephthalate (Polyethylene terephthalate, PET), polydimethylsiloxane (PDMS), polymethyl methacrylate (polymethyl methacrylate, PMMA), hard polydimethylsiloxane (hard polydimethylsiloxane, h-PDMS), urethane acrylate (polyurethane acrylate, PUA), polyvinyl alcohol (polyvinyl alcohol, PVA), polyvinyl chloride (Polyvinyl chloride, PVC), polytetrafluoroethylene (Poly tetra fluoroethylene, PTFE), and ethylene-tetrafluoroethylene copolymer (ETFE). The size of the first working master and the size of the monocular master 10 may be the same.
For example, the first working template may be a PET soft template having an imprint layer, or may be a PET soft template not having an imprint layer, and if not having an imprint layer, the imprint layer may be coated with the imprint gel 12 before imprinting.
The monocular master 10 is a master prepared by an electron beam exposure lithography method. The material comprises at least one of monocrystalline silicon, quartz, silicon dioxide, silicon nitride, diamond and diamond-like carbon; for example, the monocular master 10 is a silicon wafer master. The first grating pattern 1A is a pattern for manufacturing the coupling-in grating 1, the first grating pattern 1A is provided with a convex and/or concave structure, and the second grating pattern 2A is also provided with a convex and/or concave structure. The position and shape of the convex structure of the first grating pattern 1A are consistent with those of the convex structure of the coupling-in grating 1, the position and shape of the concave structure of the first grating pattern 1A are consistent with those of the concave structure of the coupling-in grating 1, the second grating pattern 2A is a pattern for manufacturing the coupling-out grating 2, the position and shape of the convex structure of the second grating pattern 2A are consistent with those of the convex structure of the coupling-out grating 2, and the position and shape of the concave structure of the second grating pattern 2A are consistent with those of the concave structure of the coupling-out grating 2. Typically, the first grating pattern 1A and the second grating pattern 2A are both disposed on the same side of the monocular master 10.
The area where the first grating pattern 1A is located may be a regular pattern or an irregular pattern. For the regular pattern, a 90 ° rotationally symmetrical pattern, for example, a circle, a square, etc., is possible, and in this case, the area of the first optical waveguide 111 where the coupling-in grating 1 is located is also a 90 ° rotationally symmetrical pattern. The 90-degree rotationally symmetrical pattern is a pattern which is overlapped with the original pattern after rotating 90 degrees around the center point of the pattern, and for the area where the first grating pattern 1A is located, the center point of the pattern is the center point of the area where the first grating pattern 1A is located, namely the center point of the outline pattern of the first grating pattern 1A. For the irregular pattern, namely, the area where the first grating pattern 1A is located is not a symmetrical pattern, the center point of the pattern is the center of gravity of the area where the first grating pattern 1A is located, namely, the center of gravity of the outline of the first grating pattern 1A.
Step S20A: the first working template is imprinted with the monocular master 10, resulting in an intermediate template 14.
Specifically, the side of the monocular master 10 having the first grating pattern 1A and the second grating pattern 2A is attached to the side of the first work template having the imprint resist 12, then the monocular master 10 is uniformly attached to the first work template by the mechanical force of the nanoimprint apparatus, and can be cured by ultraviolet exposure curing or thermal curing, and then the monocular master 10 and the first work template are separated and demolded, so that the first grating pattern 1A and the second grating pattern 2A on the monocular master 10 can be transferred onto the first work template, the first work template has a first structure with the structure opposite to the structure of the first grating pattern 1A and a second structure with the structure opposite to the structure of the second grating pattern 2A, and the first work template at this time is the intermediate template 14, as shown in fig. 8. In the curing process, the corresponding curing mode and curing glue can be selected according to different curing devices, and the limitation in the invention is not limited.
It will be appreciated that the first structure likewise has a convex and/or concave structure and the second structure likewise has a convex and/or concave structure, but that the convex structure of the first structure corresponds to the concave structure of the first grating pattern 1A, the concave structure of the first structure corresponds to the convex structure of the first grating pattern 1A, i.e. the structure of the first grating pattern 1A is in contrast to the concave structure of the first structure, the convex structure of the second structure corresponds to the concave structure of the second grating pattern 2A, the concave structure of the second structure corresponds to the convex structure of the second grating pattern 2A, i.e. the structure of the second grating pattern 2A is in contrast to the concave structure of the second structure. The pattern of the area where the first grating pattern 1A is located is consistent with the pattern of the area where the first structure is located, and the pattern of the area where the second grating pattern 2A is located is consistent with the pattern of the area where the second structure is located, for example, if the area where the first grating pattern 1A is located is square, the area where the first structure is located is also square.
Step S30A: the intermediate template 14 is cut to obtain a coupling-in grating patch 141 comprising a first structure, which is inverse to the structure relief of the first grating pattern 1A, and a coupling-out grating patch 142 comprising a second structure, which comprises a structure, which is inverse to the structure relief of the second grating pattern 2A.
Next, as shown in fig. 8, the intermediate template 14 is cut to obtain an in-grating patch 141 with a complete first structure and an out-grating patch 142 with a complete second structure. It will be appreciated that the size of the incoupling grating patch 141 should be smaller than the size of the intermediate template 14 and the size of the incoupling grating patch 142 should be smaller than the size of the intermediate template 14.
Step S40A: a second work template and a third work template are provided.
The material of the second working template includes at least one of PET, PDMS, PMMA, h-PDMS, PUA, PVA, PVC, PTFE and ETFE. The size of the second working template may be the same as the size of the first working template.
The material of the third working template includes at least one of PET, PDMS, PMMA, h-PDMS, PUA, PVA, PVC, PTFE and ETFE. The size of the third working template and the size of the first working template may be the same.
Step S50A: and acquiring a relative position relationship and a grating line direction m, and determining rotation information coupled to the grating patch 141 according to the relative position relationship and the grating line direction m, wherein the relative position relationship is a relative position relationship between the first grating pattern 1A and the second grating pattern 2A, or the relative position relationship is a relative position relationship between the first structure and the second structure on the intermediate template 14, and the grating line direction m is the grating line direction of the first grating pattern 1A or the grating line direction of the first structure.
The relative positional relationship includes the following two types: the first grating pattern 1A is directly above the second grating pattern 2A, and the first grating pattern 1A is not directly above the second grating pattern 2A. If the area where the first grating pattern 1A is located is a regular pattern, when the first grating pattern 1A is directly above the second grating pattern 2A, the area where the first grating pattern 1A is located and the area where the second grating pattern 2A is located are symmetrical about the same symmetry axis, as shown in fig. 9 or fig. 10; when the first grating pattern 1A is not directly above the second grating pattern 2A, that is, the region where the first grating pattern 1A is located and the region where the second grating pattern 2A is located are not symmetrical about the same symmetry axis, as shown in fig. 11 or fig. 12. If the area where the first grating pattern 1A is located is an irregular pattern, when the first grating pattern 1A is directly above the second grating pattern 2A, it is that the center of gravity of the area where the first grating pattern 1A is located is on the symmetry axis of the area where the second grating pattern 2A is located; when the first grating pattern 1A is not directly above the second grating pattern 2A, that is, the center of gravity of the area where the first grating pattern 1A is located is not on the symmetry axis of the area where the second grating pattern 2A is located. It should be noted that the area where the first grating pattern 1A is located may be circular as shown in the figure, or may be rectangular, and the area where the second grating pattern 2A is located may be rectangular as shown in the figure, or may be other polygonal shapes.
The gate line direction m is the direction in which the grating structure in the first grating pattern 1A is located, or the direction in which the periodic structure in the first structure is located. The gate line direction m includes the following two ways: the gate line direction m is parallel to the first direction, and the gate line direction m is not parallel to the first direction. As shown in fig. 9, a two-dimensional coordinate system may be established in the monocular master 10 in advance, taking the second grating pattern 2A as an example of a rectangular area, the long side of the rectangular area may be the x-axis of the two-dimensional coordinate system, the short side of the rectangular area may be the y-axis of the two-dimensional coordinate system, and the first direction is the direction in which the x-axis is located. As shown in fig. 9 or 11, the direction in which the grating structures in the first grating pattern 1A are located is parallel to the x-axis, i.e., the grating line direction m is parallel to the first direction, and as shown in fig. 10 or 12, the direction in which the grating structures in the first grating pattern 1A are located is not parallel to the x-axis, i.e., the grating line direction m is not parallel to the first direction. Note that in fig. 9 to 12, the gate line direction m does not actually exist.
After the relative positional relationship and the grating line direction m are obtained, it can be determined whether the coupling-in grating patch 141 needs to rotate and the corresponding rotation angle and direction, so as to ensure that the coupling-in grating 1 in the first optical waveguide 111 obtained by final embossing can smoothly couple and propagate light into the coupling-out grating 2, and ensure the quality of the light coupled out by the coupling-out grating 2.
Step S60A: the coupling-in grating patch 141 is rotated according to the rotation information and then stuck to the second work template, so as to obtain the coupling-in work template 15.
Next, after the coupling-in grating patch 141 is rotated according to the rotation information, as shown in fig. 8, a layer of laminating adhesive 17 is coated on a side of the coupling-in grating patch 141 having no first structure, and then a side of the coupling-in grating patch 141 having the laminating adhesive 17 is laminated with a corresponding position of the second working template by using a positioning and laminating device, and after curing, the coupling-in working template 15 is obtained.
Step S70A: the out-coupling grating patch 142 is adhered to the third work template to obtain the out-coupling work template 16.
As shown in fig. 8, a layer of laminating adhesive 17 is coated on the side of the coupling-out grating patch 142 without the second structure, then the side of the coupling-out grating patch 142 with the laminating adhesive 17 is laminated with the corresponding position of the third working template by using a positioning and laminating device, and the coupling-out working template 16 is obtained after curing.
In this embodiment, the coupling-in working template 15 and the coupling-out working template 16 are prepared by using the monocular master 10 in the above manner, and then the first optical waveguide 111 can be prepared by using the coupling-in working template 15 and the coupling-out working template 16, and the first optical waveguide 111 can be adapted to the second optical waveguide 121 obtained by directly imprinting the monocular master 10, so as to realize binocular imaging, and reduce the cost and time consumption for manufacturing the binocular near-eye display device.
In some embodiments, the rotation information includes a rotation angle and a rotation direction, and determining the rotation information coupled to the grating patch 141 according to the relative positional relationship and the grating direction m includes:
step S51A: if the region of the first grating pattern 1A and the region of the second grating pattern 2A are not symmetrical about the same symmetry axis and the grating line direction m is not parallel to the first direction, or the region of the first structure and the region of the second structure are not symmetrical about the same symmetry axis and the grating line direction m is not parallel to the first direction, diffraction efficiencies of different orders coupled into the grating 1 are obtained, and a rotation angle and a rotation direction are determined according to the diffraction efficiencies.
In the monocular master 10 shown in fig. 12, when the coupling-in grating patch 141 is attached to the second work template, if it is not rotated, the efficiency of the coupling-in grating 1 for light in the first optical waveguide 111 is affected, and thus the coupling-in grating patch 141 needs to be rotated.
In particular, the diffraction efficiencies of the different orders coupled into the grating 1 comprise a positive first order diffraction efficiency T +1 And negative first order diffraction efficiency T -1 If the positive first order diffraction efficiency T +1 Equal to the negative first order diffraction efficiency T -1 The rotation angle is 180-2N, the rotation direction is the first rotation direction, or the rotation angle is 2N, the rotation direction is the second rotation direction, wherein N is the included angle between the grid line direction m and the first direction, N is more than 0 and less than or equal to 90 degrees, and the first rotation direction is different from the second rotation direction; if the positive first order diffraction efficiency T +1 Not equal to the negative first order diffraction efficiency T -1 The rotation angle is 2N and the rotation direction is the first rotation direction.
Positive first order diffraction efficiency T +1 For coupling into the maximum positive diffraction order of grating 1, the negative order diffraction efficiency T -1 Is the maximum negative diffraction order coupled into grating 1. The first rotational direction may be a clockwise direction and the second rotational direction may be a counterclockwise direction.
The area of the first grating pattern 1A or the first structure is a 90 ° rotationally symmetrical pattern, i.e. the area of the first optical waveguide 111 where the coupling-in grating 1 is located is a 90 ° rotationally symmetrical pattern. If the coupling-in grating 1 is a straight grating, the positive first order diffraction efficiency T +1 Equal to the negative first order diffraction efficiency T -1 The included angle N between the gate line direction m and the first direction can be obtained first, and the rotation angle is calculated after the rotation direction is selected. Similarly, if the coupling-in grating 1 is an oblique grating, the positive first order diffraction efficiency T +1 Not equal to the negative first order diffraction efficiency T -1 The rotation angle and the rotation direction can be obtained after the included angle N is obtained. Finally, as shown in fig. 13, after rotating at a desired angle, the incoupling grating patch 141 is stuck to the third work template, resulting in the incoupling work template 15. The positions of the positive and negative first order diffracted light rays in the subsequently manufactured first optical waveguide 111 entering the outcoupling grating 2 are not changed.
For the first grating pattern 1A or the area where the first structure is located is a non-90 ° rotationally symmetrical pattern, the rotationally pasting may also be performed according to the above method, as shown in fig. 14, if the coupling-in grating patch 141 rotates for 2N according to the first rotation direction, the coupling-in area of the finally imprinted second target substrate 18 is not mirror-symmetrical to the coupling-in area of the monocular master, and in this case, in order to ensure the light energy utilization, the size and shape of the optical machine output window need to be changed to adapt to the shape of the coupling-in grating 1 of the first optical waveguide 111, so that the manufactured second target substrate 18 and the first target substrate can also implement binocular imaging. In addition, if the coupling-in grating patch 141 rotates by 4N according to the first rotation direction, the grating angle entering the coupling-in region may be changed, so that the appearance position of the prepared coupling-in grating 1 may be changed, and the position where the positive first-order diffracted light and the negative first-order diffracted light in the prepared first optical waveguide 111 enter the coupling-out grating 2 may be changed, which affects the coupling-out efficiency and the imaging quality of the coupling-out light. Therefore, in order to improve the imaging quality and the coupling-out efficiency, for the non-90 ° rotationally symmetric pattern, the first grating pattern 1A or the first structure may be shaped into the 90 ° rotationally symmetric pattern and then the rotation method in this embodiment is performed, or after the first optical waveguide 111 is prepared by the above method, the size and shape of the optical machine output window is changed to adapt to the coupling-in grating 1 of the first optical waveguide 111, so as to ensure the light energy utilization rate.
In this embodiment, the rotation is performed by the above method, so that the position where the subsequently manufactured positive or negative first order diffraction order light enters the coupling-out grating 2 is ensured not to be changed.
Step S52A: if the region of the first grating pattern 1A and the region of the second grating pattern 2A are symmetrical about the same symmetry axis, or the grating line direction m is parallel to the first direction, or the region of the first structure and the region of the second structure are symmetrical about the same symmetry axis, the rotation angle is 0.
Specifically, in the monocular master 10 shown in fig. 9 or fig. 10, the area of the first grating pattern 1A and the area of the second grating pattern 2A are symmetrical about the same symmetry axis, and the diffraction efficiency of the coupling-in area on the principal ray T is not changed after imprinting. Or in the monocular master 10 as shown in fig. 11, the gate line direction m thereof is parallel to the first directionIf the coupling grating 1 is a linear straight grating, the positive first order diffraction efficiency T +1 Equal to the negative first order diffraction efficiency T -1 Then, when the coupling-in grating patch is stuck to the second working template, rotation is not needed, so that the manufactured first optical waveguide 111 cannot change the diffraction efficiency of the coupling-in area on the principal ray; if the coupling grating 1 is a slant grating or blazed grating, the positive first order diffraction efficiency T +1 Not equal to the negative first order diffraction efficiency T -1 At this time, the coupling-in grating patch cannot be rotated, otherwise the diffraction efficiency of the first optical waveguide 111 on the chief ray is affected. Thus, the monocular master 10 of the type described above does not need to be rotated when the incoupling grating patch 141 is affixed to the second work template.
In this embodiment, by the above method, the diffraction efficiency of the chief ray in the finally prepared first optical waveguide 111 can be ensured to meet the requirement.
In some of these embodiments, referring to fig. 11, the monocular master 10 has a coupling-in positioning point A1 corresponding to the first grating pattern 1A and a coupling-out positioning point corresponding to the second grating pattern 2A, e.g., the coupling-out positioning point includes a first coupling-out positioning point B1 and a second coupling-out positioning point B2, and referring to fig. 8, the coupling-in grating patch 141 has a first positioning point corresponding to the coupling-in positioning point A1 and the coupling-out grating patch 142 has a second positioning point corresponding to the coupling-out positioning point. The number of the coupling positioning points A1 is equal to the number of the first positioning points, at least one coupling positioning point is arranged, the number of the coupling positioning points (B1 and B2) is equal to the number of the second positioning points, and at least one coupling positioning point is arranged. In the embodiment shown in fig. 11, the number of coupling-in anchor points A1 is one, and the number of coupling-out anchor points is two.
Step S60A includes:
step S61A: the outline of the first grating pattern 1A, the in-coupling coordinate information of the in-coupling anchor point A1, and the out-coupling coordinate information of the out-coupling anchor point are acquired.
The outline of the first grating pattern 1A, that is, the outline of the area where the first grating pattern 1A is located, is circular in the embodiment shown in fig. 11. After the outline of the first grating pattern 1A is obtained, the position coordinate information of each point of the outline of the first grating pattern 1A under the two-dimensional coordinate system is obtained. The coupling-in coordinate information of the coupling-in positioning point A1 may be based on the position coordinates of the coupling-in positioning point A1 in the two-dimensional coordinate system. The out-coupling coordinate information of the out-coupling anchor point may be based on the position coordinates of the out-coupling anchor point in the two-dimensional coordinate system.
Step S62A: and according to the outline of the first grating pattern 1A, the coupling-in coordinate information and the rotation information, manufacturing a first positioning mark and a shape mark consistent with the outline of the first grating pattern 1A on a second working template, wherein the position of the center point of the shape mark on the second working template is the same as the position of the center point of the area coupled into the grating 1 on the monocular master 10.
Specifically, the positioning and laminating device may calculate, according to the outline drawing and the rotation information of the first grating pattern 1A, a position coordinate of the shape mark on the second working template, and make the shape mark based on the position coordinate, and make the position of the center point of the shape mark on the second working template be the same as the position of the center point of the area coupled to the grating 1 on the monocular master 10. If the outline of the first grating pattern 1A is a regular pattern, such as a circle, a rectangle, an ellipse, etc., the center point of the area coupled to the grating 1 is the center point of the outline of the first grating pattern 1A, and if the outline of the first grating pattern 1A is an irregular pattern, the center point of the area coupled to the grating 1 is the center of gravity of the outline of the first grating pattern 1A.
Similarly, the positioning and attaching device calculates the position coordinates of the first positioning mark on the second working template according to the coupling coordinate information and the rotation information, and makes the first positioning mark based on the position coordinates.
Step S63A: and manufacturing a second positioning mark on the third working template according to the coupled coordinate information.
Specifically, the positioning and attaching device calculates the position coordinates of the second positioning mark on the second working template according to the coupled coordinate information, and makes the second positioning mark based on the position coordinates.
Step S64A: according to the shape mark and the first positioning mark, the coupling grating patch 141 is rotated according to the rotation information and then is stuck to the second work template, wherein the coupling grating 1 is completely attached to the shape mark, and the first positioning mark coincides with the first positioning point.
Step S65A: the out-coupling grating patch 142 is stuck to the third work template according to the second positioning mark, wherein the second positioning mark coincides with the second positioning point.
Finally, after the coupling-in grating patch 141 is rotated according to the rotation information, the positioning and attaching device attaches the coupling-in grating patch to the second working template, so that the coupling-in grating 1 is completely attached to the shape mark, and the first positioning mark coincides with the first positioning point. Similarly, when the coupling-out grating patch 142 is adhered to the second work template, the positioning and adhering device makes the second positioning mark coincide with the corresponding second positioning point after final adhesion.
In this embodiment, by making the shape mark and the first positioning mark on the second working template, then making the second positioning mark on the third working template when pasting the coupling-in grating patch 141, the accuracy of the pasting position can be improved when pasting the coupling-out grating patch 142. In practical application, only the first positioning mark or the shape chart can be manufactured on the second working template, and it can be understood that the pasting accuracy of the mode of manufacturing the first positioning mark and the shape chart is higher.
In a second aspect, an embodiment of the present application provides a method for preparing a binocular optical waveguide by using a monocular master 10, where the binocular optical waveguide includes a first optical waveguide 111 for a first eye and a second optical waveguide 121 for a second eye, referring to fig. 15, the method includes:
step S100A: a first target substrate, a second target substrate 18 and a monocular master 10 are provided.
The first and second target substrates 18 may be transparent substrates, and the material of the transparent substrates may include at least one of glass and resin.
Step S200A: the first target substrate is imprinted by a conventional imprinting method using the monocular master 10, resulting in a second optical waveguide 121.
Specifically, firstly, the monocular master 10 is imprinted on a polyethylene terephthalate (Polyethylene terephthalate, PET) soft template, so that the diffraction grating structure on the monocular master 10 is imprinted on the PET soft template, then, as shown in fig. 6, the PET soft template 11 with the diffraction grating structure is imprinted on the wafer glass 13 with the imprint adhesive 12, and cured (such as UV curing, thermal curing, etc.) by using curing equipment, after demolding, the diffraction grating structure on the PET soft template is imprinted on the imprint adhesive 12 on the surface of the wafer glass 13, and the second optical waveguide 121 can be obtained through the following procedures of quality inspection, shape cutting, attaching a protective sheet, edge inking, packaging a micro-optical machine, etc., and it can be understood that the second optical waveguide 121 is a diffraction optical waveguide.
Step S300A: determining whether a splicing working template needs to be manufactured, if not, imprinting the second target substrate 18 by using the monocular master 10 through a conventional imprinting method to obtain the first optical waveguide 111, if so, manufacturing the splicing working template by using the monocular master 10 through the manufacturing method according to any one of the embodiments of the first aspect, and imprinting the second target substrate 18 by using the splicing working template to obtain the first optical waveguide 111.
Specifically, if the region where the first grating pattern 1A is located and the region where the second grating pattern 2A is located are symmetrical about the same symmetry axis, the splicing work template may be manufactured, or the splicing work template may not be manufactured. If the region where the first grating pattern 1A is located and the region where the second grating pattern 2A is located are not symmetrical about the same symmetry axis, a splicing work template needs to be manufactured.
If the splicing working template is not required to be manufactured, the first optical waveguide 111 is manufactured in the same manner as the second optical waveguide 121, and the description thereof is omitted. If a splice work template is to be made, after the splice work template is obtained, the splice work template is imprinted to the second target substrate 18, resulting in the first optical waveguide 111.
In this embodiment, the first optical waveguide 111 and the second optical waveguide 121 manufactured in the above manner are applicable to the same binocular near-eye display device.
In some embodiments, if the monocular master 10 does not include the turning grating 3, the second target substrate 18 is imprinted with the stitching work template to obtain the first optical waveguide 111, which includes:
step S310A: according to the relative positional relationship and the grating distribution of the coupling-in working template and the coupling-out working template, the imprinting positions of the coupling-in working template and the coupling-out working template on the second target substrate 18 are determined, and the coupling-in working template and the coupling-out working template are imprinted on the second target substrate 18 according to the imprinting positions, so that the first optical waveguide 111 is obtained.
In general, the coupling-out grating 2 includes a plurality of coupling-out partitions with different or identical grating parameters, and the grating distribution of the coupling-out grating 2 is the distribution direction of the grating parameters of each coupling-out partition in the coupling-out grating 2, which includes the following two ways: the grating distribution of the out-coupling grating 2 is symmetrical and the grating distribution of the out-coupling grating 2 is asymmetrical, wherein the grating distribution of the out-coupling grating 2 is symmetrical to the grating parameters of each out-coupling partition called out-coupling grating 2, and the grating distribution of the out-coupling grating 2 is not asymmetrical to the grating parameters of each out-coupling partition called out-coupling grating 2. Specifically, if the grating parameters of each coupling-out partition are symmetrical about the symmetry axis of the region where the coupling-out grating 2 is located, the grating parameters of each coupling-out partition of the coupling-out grating 2 are symmetrical, i.e. the grating distribution of the coupling-out grating 2 is symmetrical; if the grating parameters of the respective out-coupling sections increase or decrease gradually with the first pupil expansion direction (may be the x-axis) and/or with the second pupil expansion direction (may be the y-axis), the grating parameters of the respective out-coupling sections of the out-coupling grating 2 are asymmetric, i.e. the grating distribution of the out-coupling grating 2 is asymmetric.
It will be appreciated that the direction of distribution of the grating parameters of each of the outcoupling partitions of the outcoupling grating 2 is identical to the direction of distribution of the grating parameters of each partition of the second grating pattern 2A in the monocular master 10, i.e. the grating distribution of the outcoupling grating 2 is identical to the grating distribution of the second grating pattern 2A in the monocular master 10. For example, referring to fig. 16, the second grating pattern 2A of the monocular master 10 includes six out-coupling partitions of equal size sequentially arranged along the x-axis, which are respectively the out-coupling partition-3, the out-coupling partition-2, the out-coupling partition-1, the out-coupling partition 2 and the out-coupling partition 3, wherein if the grating parameter of the out-coupling partition-3 is equal to the grating parameter of the out-coupling partition 3, the grating parameter of the out-coupling partition-2 is equal to the grating parameter of the out-coupling partition 2, and the grating parameter of the out-coupling partition-1 is equal to the grating parameter of the out-coupling partition 1, the grating distribution of the second grating pattern 2A is symmetrical, that is, the grating distribution of the out-coupling grating 2 is symmetrical. Referring to fig. 17, the second grating pattern 2A of the monocular master 10 includes six out-coupling partitions of equal size sequentially arranged along the x-axis, which are respectively the out-coupling partition 1, the out-coupling partition 2, the out-coupling partition 3, the out-coupling partition 4, the out-coupling partition 5 and the out-coupling partition 6, wherein the grating parameters of the out-coupling partition 1, the out-coupling partition 2, the out-coupling partition 3, the out-coupling partition 4, the out-coupling partition 5 and the out-coupling partition 6 are increased, so that the grating distribution of the second grating pattern 2A is asymmetric, that is, the grating distribution of the out-coupling grating 2 is asymmetric.
Specifically, the embossing positions include a heterolateral embossing and a homolateral embossing, and the steps include: if the area of the first grating pattern 1A and the area of the second grating pattern 2A are not symmetrical about the same symmetry axis and the grating distribution of the coupling-out grating 2 is not symmetrical, or the area of the first structure and the area of the second structure are not symmetrical about the same symmetry axis and the grating distribution of the coupling-out grating 2 is not symmetrical, the imprinting position is a heterolateral imprinting. If the regions of the first grating pattern 1A and the regions of the second grating pattern 2A are symmetrical about the same symmetry axis, or the grating distribution of the coupling-out grating 2 is symmetrical, or the regions of the first structure and the regions of the second structure are symmetrical about the same symmetry axis, the imprint positions are the same-side imprinting or the different-side imprinting.
For example, referring to fig. 16, if the grating parameters of the second grating pattern 2A in the monocular master 10 are symmetric, i.e. the grating distribution of the out-coupling grating 2 is symmetric, in such monocular master, if the in-coupling work template and the out-coupling work template are imprinted on the same side of the second target substrate 18, as shown in (a) of fig. 16, after light is coupled from the in-coupling grating to the waveguide substrate, light can be sequentially coupled out from the out-coupling partition 3, the out-coupling partition 2, the out-coupling partition 1, the out-coupling partition-2 and the out-coupling partition-3, since the grating parameters of the out-coupling partition-3 are equal to the grating parameters of the out-coupling partition 3, the grating parameters of the out-coupling partition-2 are equal to the grating parameters of the out-coupling partition 2, and the grating parameters of the out-coupling partition-1 are equal to the grating parameters of the out-coupling partition 1, then light can be normally coupled out from the out-coupling grating. If the in-and out-working templates are imprinted on opposite sides of the second target substrate 18, as shown in fig. 16 (b), after light is coupled from the in-grating into the waveguide substrate, light can be sequentially coupled out from the out-grating region-3, out-grating region-2, out-grating region-1, out-grating region 2 and out-grating region 3, and it can be seen that light can still be normally coupled out from the out-grating region. In summary, when the grating distribution of the coupling-out grating 2 is symmetrical, the light can be normally coupled out no matter the same-side imprinting or different-side imprinting of the coupling-in working template and the coupling-out working template is performed on the second target substrate 18. Similarly, when the region of the first grating pattern 1A and the region of the second grating pattern 2A are symmetrical about the same symmetry axis or the region of the first structure and the region of the second structure are symmetrical about the same symmetry axis, the light can be normally coupled out no matter the same-side imprinting or different-side imprinting of the coupling-in working template and the coupling-out working template is performed on the second target substrate 18. It should be noted that in fig. 16 (b), the incoupling grating is shown as a dashed line, which indicates the side of the incoupling grating that is not visible on the paper.
In the case where the area of the first grating pattern 1A and the area of the second grating pattern 2A are not symmetrical about the same symmetry axis and the grating distribution of the coupling-out grating 2 is not symmetrical, referring to fig. 17, in this monocular master, if the coupling-in working reticle and the coupling-out working reticle are imprinted on the same side of the second target substrate 18, as shown in (a) in fig. 17, light can be coupled out from the coupling-out partition 6, the coupling-out partition 5, the coupling-out partition 4, the coupling-out partition 3, the coupling-out partition 2 and the coupling-out partition 1 in this order after the light is coupled into the waveguide substrate from the coupling-in grating, the light cannot be coupled out normally. If the in-and out-working templates are imprinted on opposite sides of the second target substrate 18, as shown in fig. 17 (b), after light is coupled from the in-grating into the waveguide substrate, light can be coupled out from the out-grating, which is normally coupled out of the out-grating, in turn, from the out-partition 1, out-partition 2, out-partition 3, out-partition 4, out-partition 5, and out-partition 6. In summary, when the area of the first grating pattern 1A and the area of the second grating pattern 2A are not symmetrical about the same symmetry axis and the grating distribution of the coupling-out grating 2 is not symmetrical, the opposite sides of the coupling-in working template and the coupling-out working template need to be imprinted on the second target substrate 18, so as to ensure that the light can be coupled out normally. Similarly, when the area of the first structure and the area of the second structure are not symmetrical about the same symmetry axis and the grating distribution of the coupling-out grating 2 is not symmetrical, the coupling-in working template and the coupling-out working template need to be embossed on opposite sides to the second target substrate 18, so as to ensure that the light can be coupled out normally. It should be noted that in fig. 17 (b), the incoupling grating is shown as a dashed line, which indicates the side of the incoupling grating that is not visible on the paper.
In this embodiment, the imprint positions of the coupling-in working template and the coupling-out working template on the second target substrate 18 are determined by the relative positional relationship and the grating distribution direction of the coupling-out grating 2, so as to ensure that light can be normally coupled out from the coupling-out grating.
In some embodiments, if the imprint locations are heterolateral imprints, imprinting the in-and out-of-working templates to the second target substrate 18 according to the imprint locations, including: the in-coupling and out-coupling templates 15 and 16 are successively or simultaneously imprinted to opposite sides of the second target substrate 18.
Specifically, as shown in fig. 18, one side of the second target substrate 18 may be coated with the imprint resist 12, then the mechanical force of the nanoimprint apparatus is used to uniformly attach the coupling-in working template 15 to the side of the second target substrate 18 coated with the imprint resist 12, and after curing, the coupling-in working template 15 is separated from the second target substrate 18 and demolded; then, the other side of the second target substrate 18 is coated with the imprint adhesive 12, the coupling working template 16 is uniformly attached to the other side of the second target substrate 18 by using the mechanical force of the nanoimprint apparatus, and after curing, the coupling working template 16 is separated from the second target substrate 18 for demolding, so that the second target substrate 18 is provided with the coupling-in grating 1 and the coupling-out grating 2, and the first waveguide sheet can be obtained after the subsequent processes such as cutting and the like.
In order to protect the grating structure, after the coupling-in grating 1 is stamped, a layer of flexible protection film 19 may be coated on one side of the coupling-in grating 1, the flexible protection film 19 may be a material such as polymethyl methacrylate (PMMA), and the coupling-in grating 1 is protected by the flexible protection film 19, so as to reduce damage to the coupling-in grating 1 during stamping of the coupling-out grating 2.
Alternatively, referring to fig. 19, the imprint resist 12 may be coated on both sides of the second target substrate 18, and then the mechanical force of the nanoimprint apparatus is used to attach the coupling work template 15 to one side of the second target substrate 18 and attach the coupling work template 16 to the other side of the second target substrate 18, and after curing, the coupling work template 15 is separated from the second target substrate 18 and the coupling work template 16 is separated from the second target substrate 18.
In this embodiment, the first optical waveguide 111 is obtained by sequentially or simultaneously imprinting the second target substrate 18 with the coupling-in working template 15 and the coupling-out working template 16, and then cutting the second target substrate, wherein the side surface of the first optical waveguide 111 is shown in fig. 20, and the structure of the first optical waveguide 111 when the binocular near-to-eye display device of the second optical waveguide 121 is mounted is shown in fig. 21, and at this time, the first optical waveguide 111 and the second optical waveguide 121 can meet the requirement of binocular display. From an optical angle analysis, as shown in fig. 22, in the first optical waveguide 111, when the coupling-in grating 1 and the coupling-out grating 2 are positioned at both sides of the first optical waveguide 111, the principal ray T passes through the coupling-in grating 1 and then the positive first order diffracted ray T +1 Total reflection in the substrate is performed, and the reflected light T x The lost light energy corresponds to the loss of reflected light in FIG. 3, unlike the excessive loss of reflected light in FIG. 3, in FIG. 22, when the light T is diffracted in the positive first order +1 After reaching the coupling-out grating 2, the total reflection condition is destroyed, and the diffraction of the orders occurs again, so that imaging can be seen on both sides of the first optical waveguide 111, and then the image source 112 can be carried according to actual needs, so that the coupling-out light can be coupled into the human eye 113.
In a third aspect, an embodiment of the present invention provides a method for manufacturing a spliced working template, where the spliced working template includes a coupling-in working template 15 for manufacturing a coupling-in grating 1 and a coupling-out working template 16 for manufacturing a coupling-out grating 2, and the coupling-in grating 1 and the coupling-out grating 2 are used to form a first optical waveguide, where the first optical waveguide is used for binocular imaging with a second optical waveguide, and the second optical waveguide is obtained by a monocular master 10 through a conventional imprinting method, and referring to fig. 23, the manufacturing method includes:
step S10B: a first work template and a monocular master 10 are provided, the monocular master 10 having a first grating pattern 1A, a second grating pattern 2A and a third grating pattern 3A.
Referring to fig. 24, the monocular master 10 further has a third grating pattern 3A. The third grating pattern 3A is a pattern for manufacturing the turning grating 3, and the third grating pattern 3A has a convex and/or concave structure thereon. The convex structures of the third grating pattern 3A are consistent with the convex structures of the turning grating 3 in position and shape, and the concave structures of the third grating pattern 3A are consistent with the concave structures of the turning grating 3 in position and shape. Typically, the first grating pattern 1A, the second grating pattern 2A and the third grating pattern 3A are all arranged on the same side of the monocular master 10.
Step S20B: the first working template is imprinted with the monocular master 10, resulting in an intermediate template 14.
After imprinting the first work template by using the monocular master 10, the first grating pattern 1A, the second grating pattern 2A, and the third grating pattern 3A on the monocular master 10 may be transferred onto the first work template, so that the first work template has a first structure opposite to the structural concave-convex of the first grating pattern 1A, a second structure opposite to the structural concave-convex of the second grating pattern 2A, and a third structure opposite to the structural concave-convex of the third grating pattern 3A, and the first work template at this time is the intermediate template 14.
It will be appreciated that the third structure likewise has a convex and/or concave structure, but that the convex structure of the third structure corresponds to the concave structure of the third grating pattern 3A, and that the concave structure of the third structure corresponds to the convex structure of the third grating pattern 3A, i.e. the structure of the third grating pattern 3A is concave-convex with respect to the third structure.
Step S30B: the intermediate template 14 is cut to obtain a coupling-in grating patch 141 having a first structure opposite to the structural relief of the first grating pattern 1A, a coupling-out grating patch 142 having a second structure opposite to the structural relief of the second grating pattern 2A, and a turning grating patch having a third structure opposite to the structural relief of the third grating pattern 3A, or to obtain a coupling-in grating patch 141, a coupling-out grating patch 142 having the second structure and the third structure.
In the present embodiment, after the intermediate template 14 is cut, the coupling-in grating patch 141 with the complete first structure, the coupling-out grating patch 142 with the complete second structure, and the turning grating patch with the complete third structure can be obtained, or the coupling-in grating patch 141 with the complete first structure, and the coupling-out grating patch 142 with the complete second structure and the complete third structure can be obtained. It will be appreciated that the size of the turning grating patch should be smaller than the size of the intermediate template 14.
Step S40B: if the out-coupling grating patch 142 does not contain a third structure, a second working template, a third working template, and a fourth working template are provided, and if the out-coupling grating patch 142 contains a third structure, the second working template and the third working template are provided.
The material of the fourth working template includes at least one of PET, PDMS, PMMA, h-PDMS, PUA, PVA, PVC, PTFE and ETFE. The size of the fourth working template may be the same as the size of the first working template.
Step S50B: the grating direction is acquired, and rotation information of the grating patch 141 coupled thereto is determined according to the grating direction, wherein the grating direction m is the grating direction of the first grating pattern 1A or the grating direction of the first structure.
After the grating line direction m is obtained, it can be determined whether the coupling-in grating patch 141 needs to rotate and the corresponding rotation angle and direction, so as to ensure that the coupling-in grating 1 in the first optical waveguide 111 obtained by final embossing can smoothly couple and propagate light into the turning grating 3 and the coupling-out grating 2, and ensure the quality of the light coupled out by the coupling-out grating 2.
Step S60B: the coupling-in grating patch 141 is rotated according to the rotation information and then stuck to the second work template, so as to obtain the coupling-in work template 15.
Step S70B: if the out-coupling grating patch 142 does not include the third structure, the out-coupling grating patch 142 is adhered to the third work template to obtain the out-coupling work template 16, the turning grating patch is adhered to the fourth work template to obtain the turning work template, and if the out-coupling grating patch 142 includes the third structure, the out-coupling grating patch 142 is adhered to the third work template.
If the coupling-out grating patch 142 does not include the third structure, a layer of adhesive is coated on the side of the turning grating patch having no third structure, then the side of the turning grating patch having adhesive is attached to the corresponding position of the fourth working template by using positioning and attaching equipment, and the turning working template is obtained after curing.
In this embodiment, the coupling-in working template 15 and the coupling-out working template 16 are prepared by using the monocular master 10 in the above manner, or the coupling-in working template 15, the coupling-out working template 16 and the turning working template are prepared, and then the first optical waveguide 111 can be prepared by using the splicing working template, and the first optical waveguide 111 can be adapted to the second optical waveguide 121 obtained by directly imprinting the monocular master 10, so as to realize binocular imaging, and reduce the cost and time consumption for manufacturing the binocular near-eye display device. It should be noted that, the method steps not described in detail in this invention may refer specifically to the method steps described in the first aspect, and are not described herein.
In some of these embodiments, the rotation information includes a rotation angle and a rotation direction, and determining the rotation information coupled into the grating patch 141 according to the grating direction m includes: step S51B: if the grating line direction m is not parallel to the first direction, diffraction efficiencies of different orders coupled into the grating 1 are obtained, and the rotation angle and the rotation direction are determined according to the diffraction efficiencies.
Unlike the first embodiment, in this embodiment, it is only necessary to determine whether the coupling-in grating patch 141 needs to be rotated according to the grating direction m, so as to ensure the diffraction efficiency of the coupling-in grating 1 on the light in the manufactured first optical waveguide 111.
Specifically, in some of these embodiments, the diffraction efficiency includes a positive first order diffraction efficiency and a negative first order diffraction efficiency, and determining the rotation angle and the rotation direction from the diffraction efficiency includes: if the positive first order diffraction efficiency is equal to the negative first order diffraction efficiency, the rotation angle is 180-2N, the rotation direction is the first rotation direction, or the rotation angle is 2N, the rotation direction is the second rotation direction, wherein N is the included angle between the grid line direction m and the first direction, and N is more than 0 degrees and less than or equal to 90 degrees; the first rotational direction is different from the second rotational direction. If the positive first order diffraction efficiency is not equal to the negative first order diffraction efficiency, the rotation angle is 2N, and the rotation direction is the first rotation direction. Step S52B: if the gate line direction m is parallel to the first direction, the rotation angle is 0.
In this embodiment, the rotation is performed by the above method, so that the position where the subsequently manufactured positive or negative first order diffraction order light coupled into the grating 1 enters the turning grating 3 is not changed.
In some of these embodiments, the area where the incoupling grating 1 is located is a 90 ° rotationally symmetrical pattern. In the present embodiment, by defining the shape of the region where the coupling-in grating 1 is located, the imaging quality and the coupling-out efficiency can be ensured.
In some of these embodiments, the monocular master 10 has a coupling-in location point corresponding to the first grating pattern 1A and a coupling-out location point corresponding to the second grating pattern 2A, the coupling-in grating patch 141 has a first location point corresponding to the coupling-in location point, and the coupling-out grating patch 142 has a second location point corresponding to the coupling-out location point; the coupling-in grating patch 141 is pasted onto the second work template after rotating according to the rotation information, so as to obtain a coupling-in work template 15, and the coupling-out grating patch 142 is pasted onto the third work template, so as to obtain a coupling-out work template 16, including: step S71B: acquiring an outline drawing of the first grating pattern 1A, coupling-in coordinate information of a coupling positioning point and coupling-out coordinate information of a coupling positioning point; step S72B: according to the outline of the first grating pattern 1A, the coupling coordinate information and the rotation information of the coupling positioning points, manufacturing a first positioning mark and a shape mark consistent with the outline of the coupling grating 1 on a second working template, wherein the position of the center point of the shape mark on the second working template is the same as the position of the center point of the area of the coupling grating 1 on the monocular master 10; step S73B: manufacturing a second positioning mark on a third working template according to the coupled coordinate information; step S74B: according to the shape mark and the first positioning mark, the coupling grating patch 141 is stuck to the second working template after rotating according to the rotation information, wherein the coupling grating 1 is completely attached to the shape mark, and the first positioning mark coincides with the first positioning point; step S75B: the out-coupling grating patch 142 is stuck to the third work template according to the second positioning mark, wherein the second positioning mark coincides with the second positioning point.
In this embodiment, by attaching the patch by the above method, the accuracy of the attaching position can be improved.
In some embodiments, the monocular master 10 also has turning anchor points corresponding to the third grating pattern 3A, and the turning grating patch has third anchor points corresponding to the turning anchor points. Pasting a turning grating patch onto a fourth working template to obtain a turning working template, wherein the method comprises the following steps of: acquiring turning coordinate information of a turning positioning point, and manufacturing a third positioning mark on a fourth working die grid according to the turning coordinate information; and adhering the turning grating patch to a fourth working template according to the third positioning mark, wherein the third positioning mark coincides with the third positioning point.
The number of turning positioning points is at least one. The turning coordinate information of the turning point may be based on the position coordinates of the turning point in the two-dimensional coordinate system. And the positioning and attaching equipment calculates the position coordinates of the third positioning mark on the fourth working template according to the turning coordinate information, and makes the third positioning mark based on the position coordinates. And (3) sticking the turning grating patch onto a fourth working template, and enabling the third positioning mark to coincide with the corresponding third positioning point after final lamination by positioning lamination equipment.
In this embodiment, by manufacturing the third positioning mark on the fourth working template, the accuracy of the attaching position can be improved when attaching the turning grating patch later.
In a fourth aspect, an embodiment of the present invention further provides a method for preparing a binocular optical waveguide by using the monocular master 10, where the binocular optical waveguide includes a first optical waveguide for a first eye and a second optical waveguide for a second eye, referring to fig. 25, the method includes: step S100B: a first target substrate, a second target substrate 18 and a monocular master 10 are provided. Step S200B: the first target substrate is imprinted by a conventional imprinting method using the monocular master 10 to obtain a second optical waveguide. Step S300B: a splice work template is produced by the production method according to any one of the third aspects using the monocular master 10, and the second target substrate 18 is imprinted with the splice work template to obtain the first optical waveguide.
In this embodiment, the first optical waveguide 111 and the second optical waveguide 121 manufactured in the above manner are applicable to the same binocular near-eye display device. It should be noted that, the method steps not described in detail in this aspect may be referred to specifically in the second aspect, and are not described here again.
In some of these embodiments, imprinting the second target substrate 18 with the splice work template to obtain a second optical waveguide, comprising: the in-coupling and out-coupling templates 15 and 16, respectively, are imprinted on opposite sides of the second target substrate 18 to obtain a second optical waveguide. The specific imprinting process may be described with reference to the second aspect, and will not be described in detail herein.
In some embodiments, if the stitching work template further includes a turning work template, the turning work template may be imprinted on the second target substrate 18, where the imprinting position of the turning work template may be on the same side or on different side of the second target substrate 18 than the imprinting position of the in-coupling work template 15.
In some of these embodiments, imprinting the in-coupling and out-coupling work templates onto opposite sides of the second target substrate 18 includes: the in-coupling and out-coupling templates 15 and 16 are imprinted sequentially or simultaneously on opposite sides of the second target substrate 18. The specific imprinting process may be described with reference to the second aspect, and will not be described in detail herein.
In a fifth aspect, embodiments of the present invention further provide a binocular optical waveguide prepared by the preparation method according to any one of the embodiments of the second or fourth aspects. In this embodiment, the specific preparation method may refer to the second aspect or the fourth aspect, and will not be described herein.
In a sixth aspect, embodiments of the present invention further provide a binocular near eye display device comprising a binocular light guide according to any of the embodiments of the fifth aspect. In this embodiment, the binocular waveguide has the same structure and function as the binocular waveguide described in the fifth aspect, and will not be described here. The binocular near eye display device may be AR glasses or the like.
It should be noted that the above-described apparatus embodiments are merely illustrative, and the units described as separate units may or may not be physically separate, and units shown as units may or may not be physical units, may be located in one place, or may be distributed over a plurality of network units. Some or all of the modules may be selected according to actual needs to achieve the purpose of the solution of this embodiment.
Finally, it should be noted that: the above embodiments are only for illustrating the technical solution of the present invention, and are not limiting; the technical features of the above embodiments or in the different embodiments may also be combined within the idea of the invention, the steps may be implemented in any order, and there are many other variations of the different aspects of the invention as described above, which are not provided in detail for the sake of brevity; although the invention has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: the technical scheme described in the foregoing embodiments can be modified or some technical features thereof can be replaced by equivalents; such modifications and substitutions do not depart from the spirit of the invention.

Claims (19)

1. The method for manufacturing the spliced working template is characterized in that the spliced working template comprises a coupled-in working template for manufacturing a coupled-in grating and a coupled-out working template for manufacturing a coupled-out grating, the coupled-in grating and the coupled-out grating are used for forming a first optical waveguide, the first optical waveguide is used for binocular imaging with a second optical waveguide, the second optical waveguide is obtained by a monocular master plate through a conventional imprinting method, and the coupled-in grating is a linear grating, and the method for manufacturing the spliced working template comprises the following steps:
providing a first working template and a monocular master, wherein the monocular master is provided with a first grating pattern and a second grating pattern;
imprinting the first working template by adopting the monocular master plate to obtain an intermediate template;
cutting the middle template to obtain a coupling-in grating patch with a first structure opposite to the structure concave-convex of the first grating pattern and a coupling-out grating patch with a second structure, wherein the second structure comprises a structure opposite to the structure concave-convex of the second grating pattern;
providing a second work template and a third work template;
acquiring a relative position relationship and a grating line direction, and determining rotation information of the coupled grating patch according to the relative position relationship and the grating line direction, wherein the relative position relationship is a relative position relationship between the first grating pattern and the second grating pattern, or the relative position relationship is a relative position relationship between the first structure and the second structure on the middle template, and the grating line direction is the grating line direction of the first grating pattern or the grating line direction of the first structure;
The coupling-in grating patch is stuck to the second working template after being rotated according to the rotation information, so that the coupling-in working template is obtained;
and pasting the coupling-out grating patch to the third working template to obtain the coupling-out working template.
2. The method according to claim 1, wherein the rotation information includes a rotation angle and a rotation direction, and the determining the rotation information of the coupling-in grating patch according to the relative positional relationship and the grating line direction includes:
if the region of the first grating pattern and the region of the second grating pattern are not symmetrical about the same symmetry axis and the grating line direction is not parallel to the first direction, or the region of the first structure and the region of the second structure are not symmetrical about the same symmetry axis and the grating line direction is not parallel to the first direction, obtaining diffraction efficiencies of different orders of the coupling grating, and determining the rotation angle and the rotation direction according to the diffraction efficiencies;
the rotation angle is 0 if the region of the first grating pattern and the region of the second grating pattern are symmetrical about the same symmetry axis, or the grating line direction is parallel to the first direction, or the region of the first structure and the region of the second structure are symmetrical about the same symmetry axis.
3. The method of claim 2, wherein the diffraction efficiency includes a positive first order diffraction efficiency and a negative first order diffraction efficiency, and wherein determining the rotation angle and the rotation direction from the diffraction efficiency includes:
if the positive first order diffraction efficiency is equal to the negative first order diffraction efficiency, the rotation angle is 180-2N, the rotation direction is a first rotation direction, or the rotation angle is 2N, the rotation direction is a second rotation direction, wherein N is an included angle between the grating line direction and the first direction, and N is more than 0 degrees and less than or equal to 90 degrees; the first rotational direction is different from the second rotational direction;
and if the positive first order diffraction efficiency is not equal to the negative first order diffraction efficiency, the rotation angle is 2N, and the rotation direction is a second rotation direction.
4. The method of claim 1, wherein the area of the coupling grating is a 90 ° rotationally symmetric pattern.
5. The method of claim 1, wherein the monocular master has a coupling-in location point corresponding to the first grating pattern and a coupling-out location point corresponding to the second grating pattern, the coupling-in grating patch has a first location point corresponding to the coupling-in location point, and the coupling-out grating patch has a second location point corresponding to the coupling-out location point; the step of pasting the coupling-in grating patch onto the second work template after rotating according to the rotation information to obtain the coupling-in work template, and pasting the coupling-out grating patch onto the third work template to obtain the coupling-out work template, including:
Acquiring an outline drawing of the first grating pattern, coupling-in coordinate information of the coupling positioning point and coupling-out coordinate information of the coupling-out positioning point;
according to the outline of the first grating pattern, the coupling coordinate information of the coupling positioning points and the rotation information, a first positioning mark and a shape mark consistent with the outline of the first grating pattern are manufactured on the second working template, wherein the position of the center point of the shape mark on the second working template is the same as the position of the center point of the area of the coupling grating on the monocular master;
manufacturing a second positioning mark on the third working template according to the coupling coordinate information;
according to the shape mark and the first positioning mark, the coupling grating patch is stuck to the second working template after being rotated according to the rotation information, wherein the coupling grating is completely attached to the shape mark, and the first positioning mark is overlapped with the first positioning point;
and pasting the coupling-out grating patch to the third working template according to the second positioning mark, wherein the second positioning mark is coincident with the second positioning point.
6. A method of preparing a binocular optical waveguide from a monocular master, the binocular optical waveguide comprising a first optical waveguide for a first eye and a second optical waveguide for a second eye, the method comprising:
providing a first target substrate, a second target substrate and a monocular master;
imprinting the first target substrate by adopting the monocular master plate through a conventional imprinting method to obtain the second optical waveguide;
determining whether a splicing working template is required to be manufactured, if not, imprinting the second target substrate by adopting the monocular master plate through a conventional imprinting method to obtain the first optical waveguide, if so, manufacturing the splicing working template by adopting the monocular master plate through the manufacturing method according to any one of claims 1-5, and imprinting the second target substrate by adopting the splicing working template to obtain the first optical waveguide.
7. The method of claim 6, wherein, if the monocular master does not include turning gratings, the imprinting the second target substrate with the stitching work template to obtain the first optical waveguide comprises:
And determining the imprinting positions of the coupling-in working template and the coupling-out working template on the second target substrate according to the relative position relation and the grating distribution of the coupling-out grating, and imprinting the coupling-in working template and the coupling-out working template on the second target substrate according to the imprinting positions to obtain the first optical waveguide.
8. The method according to claim 7, wherein the imprinting positions include different-side imprinting and same-side imprinting, and the determining the imprinting positions of the coupling-in work reticle and the coupling-out work reticle on the second target substrate according to the relative positional relationship and the grating distribution of the coupling-out grating includes:
if the area of the first grating pattern and the area of the second grating pattern are not symmetrical about the same symmetry axis and the grating distribution of the coupling-out grating is not symmetrical, or the area of the first structure and the area of the second structure are not symmetrical about the same symmetry axis and the grating distribution of the coupling-out grating is not symmetrical, the imprinting position is a heterolateral imprinting;
and if the area of the first grating pattern and the area of the second grating pattern are symmetrical about the same symmetry axis, or the grating distribution of the coupling grating is symmetrical, or the area of the first structure and the area of the second structure are symmetrical about the same symmetry axis, the imprinting position is the same side imprinting or different side imprinting.
9. The method of claim 8, wherein, if the imprint position is a heterolateral imprint, the imprinting the in-process and out-process templates to the second target substrate according to the imprint position comprises:
imprinting the in-coupling work template and the out-coupling work template onto opposite sides of the second target substrate sequentially or simultaneously.
10. A method for manufacturing a splice work template, the splice work template comprising a coupling-in work template for manufacturing a coupling-in grating and a coupling-out work template for manufacturing a coupling-out grating, the coupling-in grating and the coupling-out grating being used for forming a first optical waveguide for binocular imaging with a second optical waveguide obtained by a monocular master by a conventional imprinting method, the method comprising:
providing a first working template and a monocular master plate, wherein the monocular master plate is provided with a first grating pattern, a second grating pattern and a third grating pattern;
imprinting the first working template by adopting the monocular master plate to obtain an intermediate template;
cutting the middle template to obtain a coupling-in grating patch with a first structure opposite to the structure concave-convex of the first grating pattern, a coupling-out grating patch with a second structure opposite to the structure concave-convex of the second grating pattern and a turning grating patch with a third structure opposite to the structure concave-convex of the third grating pattern, or obtaining the coupling-in grating patch and a coupling-out grating patch with the second structure and the third structure;
Providing a second work template, a third work template and a fourth work template if the out-coupling grating patch does not contain the third structure,
providing a second work template and a third work template if the out-coupling grating patch contains the third structure;
acquiring a grating line direction, and determining rotation information of the coupled grating patch according to the grating line direction, wherein the grating line direction is the grating line direction of the first grating pattern or the grating line direction of the first structure;
the coupling-in grating patch is stuck to the second working template after being rotated according to the rotation information, so that the coupling-in working template is obtained;
and if the coupling-out grating patch does not contain the third structure, pasting the coupling-out grating patch onto the third working template to obtain the coupling-out working template, pasting the turning grating patch onto the fourth working template to obtain the turning working template, and if the coupling-out grating patch contains the third structure, pasting the coupling-out grating patch onto the third working template.
11. The method of claim 10, wherein the rotation information includes a rotation angle and a rotation direction, and the determining the rotation information of the coupling-in grating patch according to the grating line direction includes:
If the grating line direction is not parallel to the first direction, diffraction efficiencies of different orders of the coupling grating are obtained, and the rotation angle and the rotation direction are determined according to the diffraction efficiencies;
and if the grid line direction is parallel to the first direction, the rotation angle is 0.
12. The method of claim 11, wherein the diffraction efficiency includes a positive first order diffraction efficiency and a negative first order diffraction efficiency, and wherein determining the rotation angle and the rotation direction from the diffraction efficiency includes:
if the positive first order diffraction efficiency is equal to the negative first order diffraction efficiency, the rotation angle is 180-2N, the rotation direction is a first rotation direction, or the rotation angle is 2N, the rotation direction is a second rotation direction, wherein N is an included angle between the grating line direction and the first direction, and N is more than 0 degrees and less than or equal to 90 degrees; the first rotational direction is different from the second rotational direction;
and if the positive first order diffraction efficiency is not equal to the negative first order diffraction efficiency, the rotation angle is 2N, and the rotation direction is the first rotation direction.
13. The method of claim 10, wherein the area of the coupling grating is a 90 ° rotationally symmetric pattern.
14. The method of claim 10, wherein the monocular master has a coupling-in location point corresponding to the first grating pattern and a coupling-out location point corresponding to the second grating pattern, the coupling-in grating patch has a first location point corresponding to the coupling-in location point, and the coupling-out grating patch has a second location point corresponding to the coupling-out location point; the step of pasting the coupling-in grating patch onto the second work template after rotating according to the rotation information to obtain the coupling-in work template, and pasting the coupling-out grating patch onto the third work template to obtain the coupling-out work template, including:
acquiring an outline drawing of the first grating pattern, coupling-in coordinate information of the coupling positioning point and coupling-out coordinate information of the coupling-out positioning point;
according to the outline of the first grating pattern, the coupling coordinate information of the coupling positioning points and the rotation information, a first positioning mark and a shape mark consistent with the outline of the coupling grating are manufactured on the second working template, wherein the position of the center point of the shape mark on the second working template is the same as the position of the center point of the area of the coupling grating on the monocular master;
Manufacturing a second positioning mark on the third working template according to the coupling coordinate information;
according to the shape mark and the first positioning mark, the coupling grating patch is stuck to the second working template after being rotated according to the rotation information, wherein the coupling grating is completely attached to the shape mark, and the first positioning mark is overlapped with the first positioning point;
and pasting the coupling-out grating patch to the third working template according to the second positioning mark, wherein the second positioning mark is coincident with the second positioning point.
15. A method of preparing a binocular optical waveguide from a monocular master, the binocular optical waveguide comprising a first optical waveguide for a first eye and a second optical waveguide for a second eye, the method comprising:
providing a first target substrate, a second target substrate and a monocular master;
imprinting the first target substrate by adopting the monocular master plate through a conventional imprinting method to obtain the second optical waveguide;
the first optical waveguide is obtained by manufacturing the splicing working template by the manufacturing method according to any one of claims 10 to 14 through the monocular master plate and imprinting the second target substrate by adopting the splicing working template.
16. The method of manufacturing according to claim 15, wherein the imprinting the second target substrate with the stitching work template to obtain the second optical waveguide includes:
and respectively imprinting the coupling-in working template and the coupling-out working template on the opposite sides of the second target substrate to obtain the second optical waveguide.
17. The method of preparing according to claim 16, wherein the imprinting the in-coupling work template and the out-coupling work template onto opposite sides of the second target substrate comprises:
imprinting the coupling-in working template and the coupling-out working template on opposite sides of the second target substrate sequentially or simultaneously.
18. A binocular optical waveguide prepared by the preparation process of any one of claims 6 to 9 or by the preparation process of any one of claims 15 to 17.
19. A binocular near eye display device comprising a binocular light guide as claimed in claim 18.
CN202311390183.8A 2023-10-24 2023-10-24 Manufacturing method of splicing working template, binocular light waveguide and manufacturing method thereof Pending CN117420637A (en)

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