CN117417124A - Method for effectively reducing air bubbles generated by melting LTPS glass substrate - Google Patents
Method for effectively reducing air bubbles generated by melting LTPS glass substrate Download PDFInfo
- Publication number
- CN117417124A CN117417124A CN202311347203.3A CN202311347203A CN117417124A CN 117417124 A CN117417124 A CN 117417124A CN 202311347203 A CN202311347203 A CN 202311347203A CN 117417124 A CN117417124 A CN 117417124A
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- China
- Prior art keywords
- glass
- melting
- ltps
- glass substrate
- sio
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- 239000011521 glass Substances 0.000 title claims abstract description 49
- 239000000758 substrate Substances 0.000 title claims abstract description 25
- 238000000034 method Methods 0.000 title claims abstract description 19
- 238000002844 melting Methods 0.000 title claims abstract description 17
- 230000008018 melting Effects 0.000 title claims abstract description 17
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims abstract description 12
- 239000007788 liquid Substances 0.000 claims abstract description 9
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims abstract description 6
- 229910052697 platinum Inorganic materials 0.000 claims abstract description 6
- 239000002994 raw material Substances 0.000 claims abstract description 6
- 101100496858 Mus musculus Colec12 gene Proteins 0.000 claims abstract description 4
- 238000000137 annealing Methods 0.000 claims abstract description 4
- 238000002156 mixing Methods 0.000 claims abstract description 4
- 229910017976 MgO 4 Inorganic materials 0.000 claims abstract description 3
- 229910004298 SiO 2 Inorganic materials 0.000 claims abstract description 3
- 239000000203 mixture Substances 0.000 claims description 7
- 230000000694 effects Effects 0.000 abstract description 6
- 238000003723 Smelting Methods 0.000 abstract 1
- 238000005352 clarification Methods 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000000265 homogenisation Methods 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 101001074571 Homo sapiens PIN2/TERF1-interacting telomerase inhibitor 1 Proteins 0.000 description 1
- 102100036257 PIN2/TERF1-interacting telomerase inhibitor 1 Human genes 0.000 description 1
- 150000001339 alkali metal compounds Chemical class 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000005816 glass manufacturing process Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000010309 melting process Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000005368 silicate glass Substances 0.000 description 1
- HUAUNKAZQWMVFY-UHFFFAOYSA-M sodium;oxocalcium;hydroxide Chemical compound [OH-].[Na+].[Ca]=O HUAUNKAZQWMVFY-UHFFFAOYSA-M 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/11—Glass compositions containing silica with 40% to 90% silica, by weight containing halogen or nitrogen
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/02—Other methods of shaping glass by casting molten glass, e.g. injection moulding
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B25/00—Annealing glass products
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B5/00—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
- C03B5/16—Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
- C03B5/225—Refining
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B5/00—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
- C03B5/16—Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
- C03B5/235—Heating the glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
- C03C1/004—Refining agents
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Manufacturing & Machinery (AREA)
- Glass Compositions (AREA)
Abstract
The invention relates to a method for effectively reducing air bubbles generated by melting an LTPS glass substrate, which comprises the following oxides in percentage: siO (SiO) 2 62~65%、Al 2 O 3 18~22%、CaO 3.9~4.85%、B 2 O 3 1.5~2%、MgO 4~5%、SrO 5~6.8%、SrCl 2 0.20-0.25%, wherein SiO 2 +Al 2 O 3 83~84%；Wherein the SrO is introduced into the reactor as Sr (NO 3) 2 、SrCO 3 With SrSO 4 . The following steps are adopted for smelting: and uniformly mixing the raw materials of all the components, melting for 8-15 hours at the high temperature of 1690-1720 ℃, pouring the melted and clarified glass liquid into a mold for forming by a platinum crucible, and then, precisely annealing in a muffle furnace to obtain the LTPS glass. The quantity of bubbles in unit volume in the LTPS glass is obviously better than that of the conventional glass, so that an excellent clarifying effect is achieved.
Description
Technical Field
The invention relates to the field of glass manufacturing, in particular to a method for effectively reducing air bubbles generated by melting an LTPS glass substrate.
Background
The TFT-LCD glass substrate raw material does not contain alkali metal compound, and simultaneously has high alumina content, so that the glass melting process is more difficult than the conventional soda-lime silicate glass, and the glass melting temperature is high, the viscosity is high, and the bubble removal is difficult. The melting and clarifying temperature of the LTPS (LowTemperature Poly-silicon, low-temperature polysilicon) glass substrate is about 80-100 ℃ higher than that of the TFT-LCD glass substrate, the difficulty of melting the batch is higher, the viscosity of the glass liquid is high, and bubbles are difficult to effectively discharge, so that the difficulty of homogenization and clarification processes is high. In the glass manufacturing process, bubbles are the most common defects, which affect the appearance, transmittance, mechanical strength, hardness and the like of glass products, and when a certain amount of microbubbles remain in a glass substrate and the uniformity is poor, the requirements of the glass substrate for display cannot be met.
Disclosure of Invention
The invention aims to provide a method for effectively reducing bubbles generated by melting an LTPS glass substrate, and provides an LPTS glass substrate composition and a preparation method thereof.
The technical scheme adopted for solving the technical problems is as follows:
a method for effectively reducing air bubbles generated by melting an LTPS glass substrate is characterized in that the composition comprises the following oxides in percentage by mass: siO (SiO) 2 62~65%、Al 2 O 3 18~22%、CaO 3.9~4.85%、B 2 O 3 1.5~2%、MgO 4~5%、SrO 5~6.8%、SrCl 2 0.20-0.25%, wherein SiO 2 +Al 2 O 3 83~84%；
Further, the method for effectively reducing the air bubbles generated by melting the LTPS glass substrate comprises the steps that SrO is introduced into the glass substrate as raw materials of Sr (NO) 3 ) 2 、SrCO 3 With SrSO 4 And (2) andthe mass ratio of the three is Sr (NO) 3 ) 2 ：SrCO 3 =4.5~6；SrSO 4 ：[Sr(NO 3 ) 2 +SrCO 3 ]=5%~8%。
A method for effectively reducing air bubbles generated in melting an LTPS glass substrate is characterized by comprising the following steps of:
(1) Uniformly mixing the raw materials of the components according to the mass percentage, and placing the mixture into a high-temperature furnace to be melted for 8-15 hours at a high temperature of 1690-1720 ℃;
(2) Pouring molten and clarified glass liquid into a mold from a platinum crucible for forming;
(3) And then the glass is put into a muffle furnace for precise annealing, thus obtaining the LTPS substrate glass.
The invention has the beneficial effects that: the invention provides a method for effectively reducing the bubbles of LTPS substrate glass, so that the number of bubbles in unit volume in a melted sample is obviously better than that of a process formula consisting of conventional glass, and an excellent clarification effect is achieved.
Drawings
FIG. 1 is a diagram of bubbles of a molten sample of example 1;
FIG. 2 is a diagram showing bubbles of a sample melted in a comparative example.
Description of the embodiments
A method for effectively reducing air bubbles generated by melting an LTPS glass substrate comprises the following specific implementation steps:
the components and contents used for preparing the LTPS glass substrate compositions in examples 1-5 are shown in Table 1:
the LTPS glass substrate in each example was prepared as follows:
uniformly mixing the raw materials according to the components shown in the table 1, and placing the mixture into a platinum crucible of a high-temperature furnace to be melted for 8-15 hours at a high temperature of 1690-1720 ℃; when the glass liquid reaches a molten state, a platinum stirring rod is adopted to stir the glass liquid, so that bubbles are easier to discharge, and the purpose of clarification and homogenization is achieved; pouring molten and clarified glass liquid into a mold from a platinum crucible for forming; then, the glass is precisely annealed in a muffle furnace, and then the obtained glass is subjected to cutting and polishing procedures to obtain an LTPS glass substrate, and the number of bubbles in unit volume in a sample is counted through an optical microscope, so that the clarifying effect is better or worse, as shown in a table 1, compared with a comparative example, the method provided by the invention has the advantages that the number of bubbles is greatly reduced, as shown in fig. 1 and 2.
Examples 1 to 5
TABLE 1
The method for effectively reducing the bubbles of the LTPS substrate glass provided by the invention has the advantages that the number of bubbles in unit volume in the melted sample is obviously superior to that of the conventional glass-made process formula, and an excellent clarification effect is achieved. To achieve the above object, it is critical to control Sr (NO 3) 2 、SrCO 3 With SrSO 4 Mass ratio of the three, wherein SrSO 4 Is a glass clarifier, which can release oxygen at high temperature, and the reaction at high temperature is 2SrSO 4 == 2SrO+2SO 2 ↑+O 2 ∈, oxygen is discharged at high temperature, and SrCl is matched 2 The high-temperature evaporation effect of the glass liquid is achieved; at the same time, sr (NO) 3 ) 2 Is also a high Wen Gongyang agent which also decomposes to release oxygen at high temperature, which is different from one another in temperature, on the one hand Sr (NO 3 ) 2 、SrCO 3 The SrO decomposition product is used in a glass network, has an important influence on the formation of a silicate network structure, and can be used for carrying out bubble removal on glass liquid in stages by utilizing the difference of the temperature of oxygen released by the SrO decomposition product and the silicate network structure, so that the optimal clarification effect can be realized.
The above description is only of the preferred embodiments of the present invention and is not intended to limit the present invention in any way; any person skilled in the art can make many possible variations and modifications to the technical solution of the present invention or modifications to equivalent embodiments using the methods and technical contents disclosed above, without departing from the scope of the technical solution of the present invention. Therefore, any simple modification, equivalent substitution, equivalent variation and modification of the above embodiments according to the technical substance of the present invention, which do not depart from the technical solution of the present invention, still fall within the scope of the technical solution of the present invention.
Claims (2)
1. A method for effectively reducing the melting bubbles of an LTPS glass substrate, wherein the composition for melting the LTPS glass comprises the following oxides in percentage by mass: siO (SiO) 2 62~65%、Al 2 O 3 18~22%、CaO 3.9~4.85%、B 2 O 3 1.5~2%、MgO 4~5%、SrO 5~6.8%、SrCl 2 0.10-0.15%, wherein SiO 2 +Al 2 O 3 83~84%；
The following steps are adopted for melting:
(1) Uniformly mixing the raw materials of the components according to the mass percentage, and placing the mixture into a high-temperature furnace to be melted for 8-15 hours at a high temperature of 1690-1720 ℃;
(2) Pouring molten and clarified glass liquid into a mold from a platinum crucible for forming;
(3) And then the glass is put into a muffle furnace for precise annealing, wherein the annealing temperature is 800-830 ℃, and the LTPS substrate glass can be obtained.
2. The method for effectively reducing air bubbles generated by melting an LTPS glass substrate according to claim 1, wherein the SrO is introduced from Sr (NO 3 ) 2 、SrCO 3 With SrSO 4 And the mass ratio of the three is Sr (NO 3 ) 2 ：SrCO 3 =4.5~6；SrSO 4 ：[Sr(NO 3 ) 2 +SrCO 3 ]=5%~8%。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202311347203.3A CN117417124A (en) | 2023-10-18 | 2023-10-18 | Method for effectively reducing air bubbles generated by melting LTPS glass substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202311347203.3A CN117417124A (en) | 2023-10-18 | 2023-10-18 | Method for effectively reducing air bubbles generated by melting LTPS glass substrate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN117417124A true CN117417124A (en) | 2024-01-19 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202311347203.3A Pending CN117417124A (en) | 2023-10-18 | 2023-10-18 | Method for effectively reducing air bubbles generated by melting LTPS glass substrate |
Country Status (1)
| Country | Link |
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| CN (1) | CN117417124A (en) |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005053712A (en) * | 2003-08-04 | 2005-03-03 | Nippon Electric Glass Co Ltd | Alkali-free glass |
| JP2012071998A (en) * | 2010-09-28 | 2012-04-12 | Asahi Glass Co Ltd | Method of manufacturing alkali-free glass |
| JP2013082561A (en) * | 2011-10-06 | 2013-05-09 | Nippon Electric Glass Co Ltd | Method for producing superconductive material |
| US20160340223A1 (en) * | 2014-01-15 | 2016-11-24 | Corning Incorporated | Method of making glass sheets with vehicle pretreatment of refractory |
| CN107226611A (en) * | 2017-06-02 | 2017-10-03 | 合肥市惠科精密模具有限公司 | A kind of TFT LCD substrates glass environmental protection fining agent |
| CN112573821A (en) * | 2020-12-14 | 2021-03-30 | 河北光兴半导体技术有限公司 | Plate glass composition and preparation method thereof |
| CN115947539A (en) * | 2022-12-23 | 2023-04-11 | 中建材玻璃新材料研究院集团有限公司 | Aluminosilicate glass for display substrate and preparation method thereof |
-
2023
- 2023-10-18 CN CN202311347203.3A patent/CN117417124A/en active Pending
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005053712A (en) * | 2003-08-04 | 2005-03-03 | Nippon Electric Glass Co Ltd | Alkali-free glass |
| JP2012071998A (en) * | 2010-09-28 | 2012-04-12 | Asahi Glass Co Ltd | Method of manufacturing alkali-free glass |
| JP2013082561A (en) * | 2011-10-06 | 2013-05-09 | Nippon Electric Glass Co Ltd | Method for producing superconductive material |
| US20160340223A1 (en) * | 2014-01-15 | 2016-11-24 | Corning Incorporated | Method of making glass sheets with vehicle pretreatment of refractory |
| CN107226611A (en) * | 2017-06-02 | 2017-10-03 | 合肥市惠科精密模具有限公司 | A kind of TFT LCD substrates glass environmental protection fining agent |
| CN112573821A (en) * | 2020-12-14 | 2021-03-30 | 河北光兴半导体技术有限公司 | Plate glass composition and preparation method thereof |
| CN115947539A (en) * | 2022-12-23 | 2023-04-11 | 中建材玻璃新材料研究院集团有限公司 | Aluminosilicate glass for display substrate and preparation method thereof |
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