CN117383518B - Sulfur and fluorine gas reaction system based on temperature control - Google Patents
Sulfur and fluorine gas reaction system based on temperature control Download PDFInfo
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- 238000006243 chemical reaction Methods 0.000 title claims abstract description 194
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 title claims abstract description 64
- 229910052717 sulfur Inorganic materials 0.000 title claims abstract description 64
- 239000011593 sulfur Substances 0.000 title claims abstract description 64
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 title claims abstract description 52
- 229910052731 fluorine Inorganic materials 0.000 title claims abstract description 52
- 239000011737 fluorine Substances 0.000 title claims abstract description 52
- 230000035484 reaction time Effects 0.000 claims abstract description 47
- 238000010438 heat treatment Methods 0.000 claims abstract description 33
- 239000007787 solid Substances 0.000 claims abstract description 23
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 13
- 238000003756 stirring Methods 0.000 claims description 9
- 238000001816 cooling Methods 0.000 claims description 2
- 239000007789 gas Substances 0.000 description 37
- SFZCNBIFKDRMGX-UHFFFAOYSA-N sulfur hexafluoride Chemical compound FS(F)(F)(F)(F)F SFZCNBIFKDRMGX-UHFFFAOYSA-N 0.000 description 24
- 229910018503 SF6 Inorganic materials 0.000 description 23
- 229960000909 sulfur hexafluoride Drugs 0.000 description 23
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Classifications
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B17/00—Sulfur; Compounds thereof
- C01B17/45—Compounds containing sulfur and halogen, with or without oxygen
- C01B17/4507—Compounds containing sulfur and halogen, with or without oxygen containing sulfur and halogen only
- C01B17/4515—Compounds containing sulfur and halogen, with or without oxygen containing sulfur and halogen only containing sulfur and fluorine only
- C01B17/453—Sulfur hexafluoride
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Abstract
The invention relates to a sulfur and fluorine gas reaction system based on temperature control, which relates to the technical field of temperature control and comprises the following components: the reaction device is used for heating the solid sulfur to be reacted to generate molten sulfur to be reacted, and carrying out the reaction between the molten sulfur to be reacted and fluorine gas to be reacted; the temperature control device comprises a control unit and a temperature regulation and control unit, wherein the control unit is used for collecting relevant information of molten sulfur to be reacted and relevant information of fluorine gas to be reacted, determining working parameters of the temperature regulation and control unit at a plurality of reaction time points in the reaction process based on a target temperature parameter sequence, relevant information of the solid sulfur to be reacted and relevant information of the fluorine gas to be reacted through a parameter determination model, and regulating and controlling the temperature of the reaction device based on the working parameters of the reaction time points.
Description
Technical Field
The invention relates to the technical field of temperature control, in particular to a sulfur and fluorine gas reaction system based on temperature control.
Background
Sulfur hexafluoride, which is an inorganic compound with chemical formula SF6, is colorless, odorless, nontoxic and incombustible stable gas at normal temperature and pressure, has molecular weight of 146.055, and density of 6.0886kg/m at 20deg.C and 0.1 MPa 3 The sulfur hexafluoride molecular structure is arranged in an octahedron shape, the bonding distance is small, and the bonding energy is high, so that the sulfur hexafluoride molecular structure has high stability, and the sulfur hexafluoride molecular structure has compatibility with electric structural materials and is similar to nitrogen when the temperature is not more than 180 ℃. Sulfur hexafluoride is widely used as a good gas insulator for gas insulation of electronic and electric equipment. The electronic grade high purity sulfur hexafluoride is an ideal electronic etchant, and is widely used in microelectronic technology field as plasma in manufacture of large-scale integrated circuits such as computer chip and LCDAnd (5) sub-etching and cleaning. The fluorine source is used for producing fluorine-doped glass in optical fiber preparation, and the fluorine source is used as a doping agent of an isolation layer in the manufacture of low-loss high-quality single-mode optical fibers. Can also be used as an doping gas for nitrogen excimer lasers. It is used as tracer, standard gas or mixed gas in meteorological, environmental detection and other departments. Are used as arc extinguishing and high capacity transformer insulation materials in high voltage switches. It can also be used in particle accelerator and lightning arrester. The method has the advantages of good chemical stability, no corrosion to equipment and the like, and can be used as a refrigerant (the operation temperature is between-45 ℃ and 0 ℃) in the refrigeration industry. It is also used for radiochemistry due to its high stopping power for alpha particles. In addition, the oxygen is replaced from mine coal dust as a reverse absorbent.
In the prior art, the main preparation method of sulfur hexafluoride at present is a direct conversion method, namely fluorine gas is used as a raw material, and the fluorine gas is directly reacted with sulfur to prepare the sulfur hexafluoride. The direct conversion method adopts different sulfur states and different technological requirements. If fluorine gas and solid sulfur are adopted in the direct combination process, the reaction temperature is not easy to control because the fluorine-sulfur reaction is a very intense exothermic reaction, and byproducts are increased to increase the post-treatment burden.
Therefore, it is necessary to provide a sulfur and fluorine gas reaction system based on temperature control, which is used for improving the accuracy of temperature control, further improving the stability of the reaction of sulfur and fluorine gas and reducing the generation of byproducts in the reaction.
Disclosure of Invention
One embodiment of the present disclosure provides a sulfur and fluorine reaction system based on temperature control, including: the reaction device is used for heating the solid sulfur to be reacted to generate molten sulfur to be reacted, and carrying out the reaction between the molten sulfur to be reacted and fluorine gas to be reacted; the temperature control device comprises a control unit and a temperature regulation and control unit, wherein the control unit is used for collecting relevant information of molten sulfur to be reacted and relevant information of fluorine gas to be reacted, determining working parameters of the temperature regulation and control unit at a plurality of reaction time points in the reaction process based on a target temperature parameter sequence, the relevant information of solid sulfur to be reacted and the relevant information of fluorine gas to be reacted through a parameter determination model, and the temperature regulation and control unit is used for regulating and controlling the temperature of the reaction device based on the working parameters of the reaction time points.
Further, the temperature control device further comprises a data acquisition unit arranged in the reaction device, wherein the data acquisition unit comprises a plurality of groups of data acquisition components, and each group of data acquisition components comprises a temperature sensor and a pressure sensor; the control unit is also used for determining a target installation position of each group of data acquisition components in the reaction device.
Still further, the control unit determines a target installation position of each set of the data acquisition components inside the reaction device, comprising: based on the structural information of the reaction device, establishing a heat transfer model of the reaction device; generating a plurality of candidate installation schemes based on a constraint condition set through a Monte Carlo model, wherein each candidate installation scheme comprises a candidate installation position of each group of data acquisition components; for each candidate installation scheme, generating a relevance score corresponding to the candidate installation scheme based on a heat transfer model of the reaction device; determining a target installation scheme from the plurality of candidate installation schemes based on the relevance scores corresponding to each of the candidate installation schemes; a target installation location of each set of the data acquisition components within the reaction device is determined based on the target installation scheme.
Still further, the generating the relevance score corresponding to the candidate installation scheme based on the heat transfer model of the reaction device includes: for each group of the data acquisition components, generating corresponding relevance scores of the data acquisition components under the candidate installation scheme based on a heat transfer model of the reaction device; and generating a relevance score corresponding to the candidate installation scheme based on the relevance score corresponding to each group of the data acquisition components under the candidate installation scheme.
Further, the determining, by the parameter determining model, working parameters of the temperature regulating unit at a plurality of reaction time points in the reaction process based on the target temperature parameter sequence, the related information of the solid sulfur to be reacted and the related information of the fluorine gas to be reacted includes: and determining working parameters of the temperature regulation unit at a plurality of reaction time points in the reaction process based on a target temperature parameter sequence, the weight information of the solid sulfur to be reacted and the volume information of the fluorine gas to be reacted through a parameter determination model, wherein the target temperature parameter sequence at least comprises target temperatures at the plurality of reaction time points in the reaction process.
Still further, the data acquisition component is configured to acquire a reaction parameter sequence during a reaction process, where the reaction parameter sequence includes a temperature reaction parameter sequence and a pressure reaction parameter sequence, the temperature reaction parameter sequence includes at least a reaction temperature at least one reaction time point during the reaction process, and the pressure reaction parameter sequence includes at least a reaction pressure at least at one reaction time point during the reaction process; the control unit is also used for adjusting working parameters of the temperature regulation and control unit at a plurality of future reaction time points in the reaction process in real time based on the temperature reaction parameter sequence and the target temperature parameter sequence.
Further, the control unit adjusts working parameters of the temperature regulation unit at a plurality of future reaction time points in the reaction process in real time based on the temperature reaction parameter sequence and the target temperature parameter sequence, and the method comprises the following steps: denoising the temperature response parameter sequence based on the pressure response parameter sequence to obtain a denoised temperature response parameter sequence; and based on the denoised temperature reaction parameter sequence and the target temperature parameter sequence, adjusting working parameters of the temperature regulation and control unit at a plurality of future reaction time points in the reaction process in real time.
Further, the adjusting, in real time, the working parameters of the temperature regulation unit at a plurality of future reaction time points in the reaction process based on the denoised temperature reaction parameter sequence and the target temperature parameter sequence includes: calculating the similarity of temperature parameters between the temperature reaction parameter sequence and the target temperature parameter sequence; based on the similarity of the temperature parameters, working parameters of the temperature regulation and control unit at a plurality of future reaction time points in the reaction process are adjusted in real time.
Further, the reaction device comprises a reactor, a water scrubber, an adsorption tower and a low-temperature condensing tower, wherein the inlet end of the reactor is communicated with a fluorine gas inlet pipe, the outlet end of the reactor is communicated with the inlet end of the water scrubber, the outlet end of the water scrubber is communicated with the inlet end of the adsorption tower, and the outlet end of the adsorption tower is communicated with the low-temperature condensing tower; the temperature regulation and control unit at least comprises a heating component and a cooling component which are arranged in the shell of the reactor.
Further, a stirring device is arranged in the reactor.
Compared with the prior art, the sulfur and fluorine gas reaction system based on temperature control provided by the specification has the following beneficial effects:
1. firstly, determining more accurate working parameters of the temperature regulation and control unit at a plurality of reaction time points in the reaction process based on a target temperature parameter sequence, related information of the solid sulfur to be reacted and related information of fluorine gas to be reacted through a parameter determination model, regulating and controlling the temperature of the reaction device based on the working parameters at the plurality of reaction time points, so that the reaction is more controllable, heating the sulfur to a molten state, then enabling the fluorine gas and the molten state sulfur to react respectively, purifying a product through a water washing tower and an adsorption tower to obtain a sulfur hexafluoride product with the purity of not less than 99.8%, and the preparation process is simple, and the produced sulfur hexafluoride product has high purity and generates less waste;
2. the correlation score analysis corresponding to the candidate installation scheme is carried out, and the target installation position of each group of data acquisition components in the reaction device is determined, so that the temperature information acquired by the data acquisition components installed on the target installation position can be more accurate and effective;
3. based on the temperature reaction parameter sequence and the target temperature parameter sequence, the working parameters of the temperature regulation and control unit at a plurality of future reaction time points in the reaction process are adjusted in real time, so that the real-time monitoring of the reaction temperature is realized, and when a large deviation exists between the actual reaction temperature and the target reaction temperature, the working parameters of the temperature regulation and control unit at the plurality of future reaction time points in the reaction process are adjusted so as to adjust the reaction temperature to the target reaction temperature as soon as possible, thereby ensuring that the purity of the produced sulfur hexafluoride product is high and the generated waste is less.
Drawings
The present specification will be further elucidated by way of example embodiments, which will be described in detail by means of the accompanying drawings. The embodiments are not limiting, in which like numerals represent like structures, wherein:
FIG. 1 is a block diagram of a sulfur and fluorine reaction system based on temperature control as shown in one embodiment of the present application;
FIG. 2 is a flow chart illustrating determining a target installation location of each set of data acquisition components within a reaction device in accordance with one embodiment of the present application;
FIG. 3 is a flow chart illustrating denoising a temperature response parameter sequence according to one embodiment of the present application;
fig. 4 is a block diagram of a control unit shown in an embodiment of the present application.
Detailed Description
In order to more clearly illustrate the technical solutions of the embodiments of the present specification, the drawings that are required to be used in the description of the embodiments will be briefly described below.
Fig. 1 is a block diagram of a sulfur and fluorine gas reaction system based on temperature control according to an embodiment of the present application, and as shown in fig. 1, the sulfur and fluorine gas reaction system based on temperature control may include a reaction device and a temperature control device.
The reaction device can be used for heating the solid sulfur to be reacted to generate molten sulfur to be reacted and carrying out the reaction of the molten sulfur to be reacted and fluorine gas to be reacted.
In some embodiments, the reaction device comprises a reactor, a water scrubber, an adsorption tower and a cryocondensation tower, wherein the inlet end of the reactor is communicated with a fluorine gas inlet pipe, the outlet end of the reactor is communicated with the inlet end of the water scrubber, the outlet end of the water scrubber is communicated with the inlet end of the adsorption tower, and the outlet end of the adsorption tower is communicated with the cryocondensation tower.
In some embodiments, a stirring device may also be disposed within the reactor. The stirring device comprises a driving motor, a rotating shaft and stirring blades arranged on the rotating shaft, and an output shaft of the driving motor is coaxially connected with the rotating shaft.
Specifically, the reaction device can generate sulfur hexafluoride products based on the following steps:
s1: adding a certain amount of solid sulfur to be reacted into the reactor, wherein the purity of the sulfur is not less than 99.0%, and heating the reactor to enable the sulfur to be in a molten state, wherein in the process of heating the solid sulfur to be reacted, the stirring device stirs the solid sulfur to be reacted, so that the melting rate of the solid sulfur to be reacted is improved;
s2: adding fluorine gas into the reactor from the inlet end of the reactor through a fluorine gas inlet pipe, wherein the used fluorine gas is prepared by electrolyzing hydrogen fluoride, and then the purified fluorine gas has the purity of not less than 99.9%, the fluorine gas reacts with molten sulfur to generate gaseous sulfur hexafluoride, and after the gaseous sulfur hexafluoride reacts for 8 hours, a crude sulfur hexafluoride product is obtained, wherein in the reaction process of the fluorine gas and the molten sulfur, a stirring device stirs the molten sulfur to be reacted, the contact area of the molten sulfur to be reacted and the fluorine gas is increased, and the efficiency of generating the gaseous sulfur hexafluoride is improved;
s3: the crude sulfur hexafluoride product generated in the reactor enters a water scrubber from the outlet end of the reactor, and acidic and hydrolyzable impurities such as sulfur fluoride and hydrogen fluoride are removed through the water scrubber;
s4: the sulfur hexafluoride crude product treated by the water washing tower enters an adsorption tower, and moisture and partial low fluorine sulfur impurities are removed by the adsorption tower, so that a sulfur hexafluoride pre-product is obtained;
s5: and (3) enabling the sulfur hexafluoride pre-product treated by the adsorption tower to enter a low-temperature condensing tower, and condensing by the low-temperature condensing tower to obtain a sulfur hexafluoride product, wherein the purity of the sulfur hexafluoride product is not less than 99.8%.
As shown in fig. 1, the temperature control device may include a control unit and a temperature regulation unit, where the control unit is configured to collect relevant information of molten sulfur to be reacted and relevant information of fluorine gas to be reacted, and determine, by using a parameter determination model, working parameters of the temperature regulation unit at a plurality of reaction time points in a reaction process based on a target temperature parameter sequence, relevant information of solid sulfur to be reacted, and relevant information of fluorine gas to be reacted, and the temperature regulation unit is configured to regulate a temperature of the reaction device based on the working parameters of the plurality of reaction time points. The parameter determining model may be a machine learning model such as an artificial neural network (Artificial Neural Network, ANN) model, a cyclic neural network (Recurrent Neural Networks, RNN) model, a Long Short-Term Memory (LSTM) model, a bidirectional cyclic neural network (BRNN) model, etc.
In some embodiments, the temperature control device may further comprise a data acquisition unit disposed inside the reaction device, wherein the data acquisition unit comprises a plurality of sets of data acquisition components, each set of data acquisition components comprising a temperature sensor for acquiring the temperature inside the reaction device during the reaction and a pressure sensor for acquiring the pressure inside the reaction device during the reaction. The control unit is also used for determining a target installation position of each group of data acquisition components in the reaction device.
FIG. 2 is a flow chart illustrating the determination of the target mounting location of each set of data acquisition components within the interior of a reaction device, as shown in FIG. 2, and in some embodiments, the control unit determines the target mounting location of each set of data acquisition components within the interior of the reaction device, including:
based on the structural information of the reaction device, a heat transfer model of the reaction device is established, wherein the heat transfer model is used for simulating heat exchange and transfer of the reaction device at a plurality of time points in the reaction process, determining temperature distribution of the reaction device at the plurality of time points in the reaction process, and the heat transfer model can be a virtual model or a physical model obtained by reducing the volume of the reaction device according to a certain proportion;
generating a plurality of candidate installation schemes based on constraint condition sets through a Monte Carlo model, wherein each candidate installation scheme comprises candidate installation positions of each group of data acquisition components, constraint conditions can at least comprise maximum number constraint of the data acquisition components, minimum number constraint of the data acquisition components, maximum distance constraint between two adjacent data acquisition components, minimum distance constraint between two adjacent data acquisition components and installation range constraint, the installation range constraint can be determined based on the amount of solid sulfur to be reacted, for example, the volume of molten sulfur to be reacted can be determined based on the amount of solid sulfur to be reacted, so as to determine the liquid level of the molten sulfur to be reacted, and further determine the installation range, and the installation range can comprise, by way of example only, a spatial range within and a certain distance from the liquid level of the molten sulfur to be reacted;
for each candidate installation scheme, generating a correlation score corresponding to the candidate installation scheme based on a heat transfer model of the reaction device, wherein the correlation score can represent the similarity between the temperature information acquired by the data acquisition component and the expected temperature in the reaction device in the reaction process under the candidate installation scheme;
determining a target installation scheme from among a plurality of candidate installation schemes based on the correlation score corresponding to each candidate installation scheme, for example, a candidate installation scheme having the largest correlation score may be used as the target installation scheme;
and determining the target installation position of each group of data acquisition components in the reaction device based on the target installation scheme, namely taking the candidate installation position of each group of data acquisition components included in the target installation scheme as the target installation position of each group of data acquisition components in the reaction device.
In some embodiments, the control unit generates a relevance score for the candidate installation plan based on the heat transfer model of the reaction device, including:
for each group of data acquisition components, generating corresponding relevance scores of the data acquisition components under the candidate installation scheme based on a heat transfer model of the reaction device;
based on the corresponding relevance scores of each group of data acquisition components under the candidate installation scheme, a relevance score corresponding to the candidate installation scheme is generated.
It may be appreciated that when the heat transfer model is a virtual model, the control unit may set heat transfer parameters, where the heat transfer parameters may include heat parameters for heating the reaction device, the control unit may generate, through the first temperature determining model, an expected temperature sequence corresponding to an inside of the reaction device based on the heat transfer parameters and structural information of the reaction device, the expected temperature sequence may include an expected temperature of the inside of the reaction device at a plurality of heating time points, generate, through the heat transfer model, based on the heat transfer parameters, a temperature of an installation location where each set of data acquisition components is located under each candidate installation scheme, generate an actual temperature sequence corresponding to each set of data acquisition components, where the actual temperature sequence includes actual temperatures of the installation location where the data acquisition components are located at the plurality of heating time points, and the first temperature determining model may include a generation type countermeasure network (GAN, generative Adversarial Networks).
It may be understood that when the heat transfer model is a physical model, the control unit may set heating parameters, and heat the heat transfer model based on the heating parameters through the heating model, where the heating model may be a physical model obtained by reducing the volume of the temperature control unit according to a certain proportion, the control unit may generate, through the second temperature determining model, an expected temperature sequence corresponding to the inside of the heat transfer model based on the heating parameters and structural information of the reaction device, where the expected temperature sequence may include expected temperatures of the inside of the heat transfer model at a plurality of heating time points, and for each candidate installation scheme, may install a data acquisition component in the heat transfer model according to the candidate installation scheme, where the data acquisition component acquires an actual temperature sequence in the reaction process.
In some embodiments, the corresponding relevance scores of the data acquisition components under the candidate installation scheme may be determined based on the similarity between the expected temperature sequence and the actual temperature sequence, it being understood that the greater the similarity between the expected temperature sequence and the actual temperature sequence, the greater the corresponding relevance scores of the data acquisition components under the candidate installation scheme;
specifically, the corresponding similarity of the data acquisition component under the candidate installation scheme may be calculated based on the following formula:
wherein,for the similarity of the j-th data acquisition component under the i-th candidate installation scheme,/th data acquisition component>For preset parameters, < >>For the actual temperature of the mth heating time point in the actual temperature sequence corresponding to the jth data acquisition component under the candidate installation scheme in the ith,/th heating time point>And (3) the expected temperature of the mth heating time point in the actual temperature sequence corresponding to the jth data acquisition component under the ith candidate installation scheme.
The relevance score for a candidate installation plan may be calculated based on the following formula:
wherein,for the relevance score corresponding to the ith candidate installation scheme,/->For the preset weight corresponding to the jth data acquisition component under the ith candidate installation scheme,/for the (j) th data acquisition component>The total number of data acquisition components under the ith candidate installation scheme.
In some embodiments, the control unit may determine the operating parameters of the temperature regulation unit at a plurality of reaction time points during the reaction by means of a parameter determination model based on a target temperature parameter sequence, weight information of the solid sulfur to be reacted and volume information of the fluorine gas to be reacted, wherein the target temperature parameter sequence includes at least target temperatures at the plurality of reaction time points during the reaction.
Specifically, the control unit may predict heat generated by the reaction based on weight information of solid sulfur to be reacted and volume information of fluorine gas to be reacted, determine heat difference values required by the interior of the reactor at a plurality of reaction time points in the reaction process based on a target temperature parameter sequence, and determine working parameters of the temperature regulation unit at the plurality of reaction time points in the reaction process based on the heat difference values.
In some embodiments, the data acquisition component is configured to acquire a sequence of reaction parameters during a reaction process, wherein the sequence of reaction parameters includes a sequence of temperature reaction parameters including at least a reaction temperature at least one reaction time point during the reaction process and a sequence of pressure reaction parameters including at least a reaction pressure at least one reaction time point during the reaction process. The control unit is also used for adjusting working parameters of the temperature regulation and control unit at a plurality of future reaction time points in the reaction process in real time based on the temperature reaction parameter sequence and the target temperature parameter sequence.
In some embodiments, the control unit adjusts, in real time, the operating parameters of the temperature regulation unit at a plurality of future reaction time points in the reaction process based on the temperature reaction parameter sequence and the target temperature parameter sequence, including:
denoising the temperature response parameter sequence based on the pressure response parameter sequence to obtain a denoised temperature response parameter sequence;
based on the denoised temperature reaction parameter sequence and the target temperature parameter sequence, the working parameters of the temperature regulation and control unit at a plurality of future reaction time points in the reaction process are adjusted in real time.
Fig. 3 is a flowchart of denoising a temperature response parameter sequence according to an embodiment of the present application, and as shown in fig. 3, specifically, the control unit may denoise the temperature response parameter sequence based on the pressure response parameter sequence by:
fusing the temperature response parameter sequences acquired by the temperature sensors of the plurality of groups of data acquisition components to generate fused temperature response parameter sequences;
fusing the pressure response parameter sequences acquired by the pressure sensors of the multiple groups of data acquisition components to generate fused pressure response parameter sequences;
generating a temperature response curve based on the fused temperature response parameter sequence;
generating a pressure response curve based on the fused pressure response parameter sequence;
decomposing the temperature response curve into at least one connotation modal component and one residual;
determining a target connotation modal component based on at least one connotation modal component, a residual error and a pressure response curve through a noise determination model, wherein the target connotation modal component is the connotation modal component containing noise;
denoising the target connotation modal component based on a pressure response curve by a denoising model to obtain a denoised connotation modal component, wherein the denoising model can be a machine learning model such as an artificial neural network (Artificial Neural Network, ANN) model, a cyclic neural network (Recurrent Neural Networks, RNN) model, a Long Short-Term Memory (LSTM) model, a bidirectional cyclic neural network (BRNN) model and the like;
reconstructing a temperature response curve based on the denoised content modal component, and generating a denoised temperature response parameter sequence based on the reconstructed temperature response curve.
In some embodiments, the control unit adjusts, in real time, the working parameters of the temperature regulation unit at a plurality of future reaction time points in the reaction process based on the denoised temperature reaction parameter sequence and the target temperature parameter sequence, including:
calculating the similarity of temperature parameters between the temperature reaction parameter sequence and the target temperature parameter sequence;
based on the similarity of the temperature parameters, the working parameters of the temperature regulation and control unit at a plurality of future reaction time points in the reaction process are adjusted in real time.
Specifically, a target temperature parameter sequence segment corresponding to the temperature reaction parameter sequence time can be intercepted from the target temperature parameter sequence based on a plurality of reaction time points corresponding to the temperature reaction parameter sequence, then the temperature parameter similarity between the temperature reaction parameter sequence and the target temperature parameter sequence segment is calculated, and then the working parameters of the temperature regulation unit at a plurality of future reaction time points in the reaction process are adjusted in real time based on the temperature parameter similarity.
For example only, the temperature parameter similarity between the temperature reaction parameter sequence and the target temperature parameter sequence may be calculated based on the following formula:
wherein,for the similarity of temperature parameters between the temperature response parameter sequence and the target temperature parameter sequence segment, +.>For preset parameters, < >>The reaction temperature at the x-th heating time point in the temperature reaction parameter sequence,and y is the total number of heating time points included in the temperature reaction parameter sequence, wherein y is the target temperature of the xth heating time point in the target temperature parameter sequence fragment.
It can be understood that when the similarity of the temperature parameter between the temperature reaction parameter sequence and the target temperature parameter sequence is smaller than a preset similarity threshold, working parameters of the temperature regulation unit at a plurality of future reaction time points in the reaction process are judged to be required to be adjusted in real time. Specifically, the working parameters of the temperature regulation and control unit at a plurality of future reaction time points in the reaction process can be adjusted in real time by the parameter adjustment model based on the temperature reaction parameter sequence and the target temperature parameter sequence.
Fig. 4 is a block diagram of a control unit shown in an embodiment of the present application, which is an example of a hardware device that can be applied to aspects of the present invention, as shown in fig. 4. The control unit is intended to represent various forms of digital electronic computer devices, such as laptops, desktops, workstations, personal digital assistants, servers, blade servers, mainframes, and other suitable computers. The control unit may also represent various forms of mobile devices, such as personal digital processing, cellular telephones, smart phones, wearable devices, and other similar computing devices. The components shown herein, their connections and relationships, and their functions, are meant to be exemplary only, and are not meant to limit implementations of the inventions described and/or claimed herein.
As shown in fig. 4, the control unit includes a computing unit that can perform various appropriate actions and processes according to a computer program stored in a Read Only Memory (ROM) or a computer program loaded from a storage unit into a Random Access Memory (RAM). In the RAM, various programs and data required for the operation of the device may also be stored. The computing unit, ROM and RAM are connected to each other by a bus. An input/output (I/O) interface is also connected to the bus.
A plurality of components in the control unit are connected to the I/O interface, including: an input unit, an output unit, a storage unit, and a communication unit. The input unit may be any type of device capable of inputting information to the control unit, and may receive input numeric or character information and generate key signal inputs related to user settings and/or function controls of the control unit. The output unit may be any type of device capable of presenting information and may include, but is not limited to, a display, speakers, video/audio output terminals, vibrators, and/or printers. Storage units may include, but are not limited to, magnetic disks, optical disks. The communication unit allows the control unit to exchange information/data with other devices via a computer network, such as the internet, and/or various telecommunications networks, and may include, but is not limited to, modems, network cards, infrared communication devices, wireless communication transceivers and/or chipsets, such as bluetooth (TM) devices, wiFi devices, wiMax devices, cellular communication devices, and/or the like.
The computing unit may be a variety of general and/or special purpose processing components having processing and computing capabilities. Some examples of computing units include, but are not limited to, central Processing Units (CPUs), graphics Processing Units (GPUs), various specialized Artificial Intelligence (AI) computing chips, various computing units running machine learning model algorithms, digital Signal Processors (DSPs), and any suitable processors, controllers, microcontrollers, and the like. The computing unit performs the various methods and processes described above.
Finally, it should be understood that the embodiments described in this specification are merely illustrative of the principles of the embodiments of this specification. Other variations are possible within the scope of this description. Thus, by way of example, and not limitation, alternative configurations of embodiments of the present specification may be considered as consistent with the teachings of the present specification. Accordingly, the embodiments of the present specification are not limited to only the embodiments explicitly described and depicted in the present specification.
Claims (6)
1. A sulfur and fluorine reaction system based on temperature control, comprising:
the reaction device is used for heating the solid sulfur to be reacted to generate molten sulfur to be reacted, and carrying out the reaction between the molten sulfur to be reacted and fluorine gas to be reacted;
the temperature control device comprises a control unit and a temperature regulation and control unit, wherein the control unit is used for collecting relevant information of the solid sulfur to be reacted and relevant information of the fluorine gas to be reacted, determining working parameters of the temperature regulation and control unit at a plurality of reaction time points in the reaction process based on a target temperature parameter sequence, the relevant information of the solid sulfur to be reacted and the relevant information of the fluorine gas to be reacted through a parameter determination model, and the temperature regulation and control unit is used for regulating and controlling the temperature of the reaction device based on the working parameters of the reaction time points;
the temperature control device further comprises a data acquisition unit arranged in the reaction device, wherein the data acquisition unit comprises a plurality of groups of data acquisition components, and each group of data acquisition components comprises a temperature sensor and a pressure sensor;
the control unit is also used for determining a target installation position of each group of data acquisition components in the reaction device;
the control unit determines a target installation position of each set of the data acquisition components inside the reaction device, including:
based on the structural information of the reaction device, establishing a heat transfer model of the reaction device;
generating a plurality of candidate installation schemes based on a constraint condition set through a Monte Carlo model, wherein each candidate installation scheme comprises a candidate installation position of each group of data acquisition components;
for each candidate installation scheme, generating a relevance score corresponding to the candidate installation scheme based on a heat transfer model of the reaction device;
determining a target installation scheme from the plurality of candidate installation schemes based on the relevance scores corresponding to each of the candidate installation schemes;
determining a target installation location of each set of the data acquisition components inside the reaction device based on the target installation scheme;
the generating the relevance score corresponding to the candidate installation scheme based on the heat transfer model of the reaction device comprises the following steps:
for each group of the data acquisition components, generating corresponding relevance scores of the data acquisition components under the candidate installation scheme based on a heat transfer model of the reaction device;
generating a relevance score corresponding to the candidate installation scheme based on the relevance scores corresponding to each group of the data acquisition components under the candidate installation scheme;
the determining, by the parameter determining model, working parameters of the temperature regulating unit at a plurality of reaction time points in the reaction process based on a target temperature parameter sequence, the related information of the solid sulfur to be reacted and the related information of the fluorine gas to be reacted, including:
determining working parameters of the temperature regulation unit at a plurality of reaction time points in the reaction process based on a target temperature parameter sequence, weight information of the solid sulfur to be reacted and volume information of fluorine gas to be reacted through a parameter determination model, wherein the target temperature parameter sequence at least comprises target temperatures at the plurality of reaction time points in the reaction process;
when the heat transfer model is a virtual model, the control unit sets heat transfer parameters, wherein the heat transfer parameters comprise heat parameters for heating the reaction device, the control unit generates an expected temperature sequence corresponding to the interior of the reaction device based on the heat transfer parameters and structural information of the reaction device through a first temperature determination model, the expected temperature sequence comprises expected temperatures of the interior of the reaction device at a plurality of heating time points, the temperature of the installation position of each group of data acquisition components under each candidate installation scheme is generated through the heat transfer model based on the heat transfer parameters, an actual temperature sequence corresponding to each group of data acquisition components is generated, the actual temperature sequence comprises actual temperatures of the installation position of the data acquisition components at a plurality of heating time points, and the first temperature determination model comprises a generation type countermeasure network;
when the heat transfer model is a physical model, the control unit sets heating parameters, and heats the heat transfer model based on the heating parameters through the heating model, wherein the heating model is a physical model obtained by reducing the volume of the temperature regulation and control unit according to a certain proportion, the control unit generates an expected temperature sequence corresponding to the inside of the heat transfer model based on the heating parameters and the structural information of the reaction device through a second temperature determination model, the expected temperature sequence comprises expected temperatures of the inside of the heat transfer model at a plurality of heating time points, and for each candidate installation scheme, a data acquisition component is installed in the heat transfer model according to the candidate installation scheme, and the data acquisition component acquires an actual temperature sequence in the reaction process;
based on the similarity between the expected temperature sequence and the actual temperature sequence, a corresponding relevance score of the data acquisition component under the candidate installation scheme is determined, and the greater the similarity between the expected temperature sequence and the actual temperature sequence is, the greater the corresponding relevance score of the data acquisition component under the candidate installation scheme is.
2. The sulfur and fluorine gas reaction system based on temperature control of claim 1, wherein the data acquisition component is configured to acquire a reaction parameter sequence during a reaction process, wherein the reaction parameter sequence comprises a temperature reaction parameter sequence and a pressure reaction parameter sequence, the temperature reaction parameter sequence comprises at least a reaction temperature at least one reaction time point during the reaction process, and the pressure reaction parameter sequence comprises at least a reaction pressure at least one reaction time point during the reaction process;
the control unit is also used for adjusting working parameters of the temperature regulation and control unit at a plurality of future reaction time points in the reaction process in real time based on the temperature reaction parameter sequence and the target temperature parameter sequence.
3. The sulfur and fluorine gas reaction system based on temperature control according to claim 2, wherein the control unit adjusts working parameters of the temperature control unit at a plurality of future reaction time points in the reaction process in real time based on the temperature reaction parameter sequence and the target temperature parameter sequence, and comprises:
denoising the temperature response parameter sequence based on the pressure response parameter sequence to obtain a denoised temperature response parameter sequence;
and based on the denoised temperature reaction parameter sequence and the target temperature parameter sequence, adjusting working parameters of the temperature regulation and control unit at a plurality of future reaction time points in the reaction process in real time.
4. The sulfur and fluorine gas reaction system based on temperature control according to claim 3, wherein the real-time adjustment of the working parameters of the temperature control unit at a plurality of future reaction time points in the reaction process based on the denoised temperature reaction parameter sequence and the target temperature parameter sequence comprises:
calculating the similarity of temperature parameters between the temperature reaction parameter sequence and the target temperature parameter sequence;
based on the similarity of the temperature parameters, working parameters of the temperature regulation and control unit at a plurality of future reaction time points in the reaction process are adjusted in real time.
5. The sulfur and fluorine reaction system based on temperature control according to claim 1, wherein the reaction device comprises a reactor, a water scrubber, an adsorption tower and a low-temperature condensing tower, wherein the inlet end of the reactor is communicated with a fluorine gas inlet pipe, the outlet end of the reactor is communicated with the inlet end of the water scrubber, the outlet end of the water scrubber is communicated with the inlet end of the adsorption tower, and the outlet end of the adsorption tower is communicated with the low-temperature condensing tower;
the temperature regulation and control unit at least comprises a heating component and a cooling component which are arranged in the shell of the reactor.
6. The sulfur and fluorine reaction system based on temperature control according to claim 5, wherein a stirring device is further arranged in the reactor.
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