CN117363057A - Method for manufacturing normal temperature solidified ceramic hydrophobic ash-proof anti-reflection film coating - Google Patents
Method for manufacturing normal temperature solidified ceramic hydrophobic ash-proof anti-reflection film coating Download PDFInfo
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- CN117363057A CN117363057A CN202310501348.8A CN202310501348A CN117363057A CN 117363057 A CN117363057 A CN 117363057A CN 202310501348 A CN202310501348 A CN 202310501348A CN 117363057 A CN117363057 A CN 117363057A
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- glass
- reflection
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- 230000002209 hydrophobic effect Effects 0.000 title claims abstract description 43
- 239000000919 ceramic Substances 0.000 title claims abstract description 39
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 22
- 238000000034 method Methods 0.000 title claims abstract description 16
- 239000007888 film coating Substances 0.000 title claims description 31
- 238000009501 film coating Methods 0.000 title claims description 31
- 239000011521 glass Substances 0.000 claims abstract description 50
- 239000011248 coating agent Substances 0.000 claims abstract description 40
- 238000000576 coating method Methods 0.000 claims abstract description 40
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 23
- 229920002457 flexible plastic Polymers 0.000 claims abstract description 19
- 239000002985 plastic film Substances 0.000 claims abstract description 19
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims abstract description 14
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 14
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims abstract description 13
- 229910000077 silane Inorganic materials 0.000 claims abstract description 13
- 229940104869 fluorosilicate Drugs 0.000 claims abstract description 8
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims abstract description 7
- 229910000420 cerium oxide Inorganic materials 0.000 claims abstract description 7
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 claims abstract description 7
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 claims abstract description 7
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims abstract description 7
- 239000004408 titanium dioxide Substances 0.000 claims abstract description 7
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims abstract description 5
- 239000006117 anti-reflective coating Substances 0.000 claims abstract 4
- 239000000243 solution Substances 0.000 claims description 30
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 claims description 26
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 23
- 238000003756 stirring Methods 0.000 claims description 22
- 239000002131 composite material Substances 0.000 claims description 21
- 229910044991 metal oxide Inorganic materials 0.000 claims description 17
- 150000004706 metal oxides Chemical class 0.000 claims description 17
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 14
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 14
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims description 12
- 239000011259 mixed solution Substances 0.000 claims description 12
- 239000008367 deionised water Substances 0.000 claims description 11
- 229910021641 deionized water Inorganic materials 0.000 claims description 11
- -1 perfluoropropyl silicate Chemical compound 0.000 claims description 11
- 235000012239 silicon dioxide Nutrition 0.000 claims description 11
- 239000002253 acid Substances 0.000 claims description 9
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims description 8
- 239000002994 raw material Substances 0.000 claims description 8
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 6
- HSJPMRKMPBAUAU-UHFFFAOYSA-N cerium(3+);trinitrate Chemical compound [Ce+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O HSJPMRKMPBAUAU-UHFFFAOYSA-N 0.000 claims description 6
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 claims description 6
- CMOAHYOGLLEOGO-UHFFFAOYSA-N oxozirconium;dihydrochloride Chemical compound Cl.Cl.[Zr]=O CMOAHYOGLLEOGO-UHFFFAOYSA-N 0.000 claims description 6
- 229910021426 porous silicon Inorganic materials 0.000 claims description 6
- 229910052726 zirconium Inorganic materials 0.000 claims description 6
- OBOSXEWFRARQPU-UHFFFAOYSA-N 2-n,2-n-dimethylpyridine-2,5-diamine Chemical compound CN(C)C1=CC=C(N)C=N1 OBOSXEWFRARQPU-UHFFFAOYSA-N 0.000 claims description 5
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 5
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 claims description 5
- OZECDDHOAMNMQI-UHFFFAOYSA-H cerium(3+);trisulfate Chemical compound [Ce+3].[Ce+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O OZECDDHOAMNMQI-UHFFFAOYSA-H 0.000 claims description 5
- 229910017604 nitric acid Inorganic materials 0.000 claims description 5
- VJIFBECQKOBRHM-UHFFFAOYSA-N 2-silylethanamine Chemical compound NCC[SiH3] VJIFBECQKOBRHM-UHFFFAOYSA-N 0.000 claims description 4
- 239000004115 Sodium Silicate Substances 0.000 claims description 4
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 claims description 4
- VYLVYHXQOHJDJL-UHFFFAOYSA-K cerium trichloride Chemical compound Cl[Ce](Cl)Cl VYLVYHXQOHJDJL-UHFFFAOYSA-K 0.000 claims description 4
- AZFVLHQDIIJLJG-UHFFFAOYSA-N chloromethylsilane Chemical compound [SiH3]CCl AZFVLHQDIIJLJG-UHFFFAOYSA-N 0.000 claims description 4
- DCKVFVYPWDKYDN-UHFFFAOYSA-L oxygen(2-);titanium(4+);sulfate Chemical compound [O-2].[Ti+4].[O-]S([O-])(=O)=O DCKVFVYPWDKYDN-UHFFFAOYSA-L 0.000 claims description 4
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 claims description 4
- 229910052911 sodium silicate Inorganic materials 0.000 claims description 4
- 238000005507 spraying Methods 0.000 claims description 4
- ZQZCOBSUOFHDEE-UHFFFAOYSA-N tetrapropyl silicate Chemical compound CCCO[Si](OCCC)(OCCC)OCCC ZQZCOBSUOFHDEE-UHFFFAOYSA-N 0.000 claims description 4
- 229910000348 titanium sulfate Inorganic materials 0.000 claims description 4
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 claims description 4
- MAYUMUDTQDNZBD-UHFFFAOYSA-N 2-chloroethylsilane Chemical compound [SiH3]CCCl MAYUMUDTQDNZBD-UHFFFAOYSA-N 0.000 claims description 3
- NGDQQLAVJWUYSF-UHFFFAOYSA-N 4-methyl-2-phenyl-1,3-thiazole-5-sulfonyl chloride Chemical compound S1C(S(Cl)(=O)=O)=C(C)N=C1C1=CC=CC=C1 NGDQQLAVJWUYSF-UHFFFAOYSA-N 0.000 claims description 3
- FPCJKVGGYOAWIZ-UHFFFAOYSA-N butan-1-ol;titanium Chemical compound [Ti].CCCCO.CCCCO.CCCCO.CCCCO FPCJKVGGYOAWIZ-UHFFFAOYSA-N 0.000 claims description 3
- CWAFVXWRGIEBPL-UHFFFAOYSA-N ethoxysilane Chemical compound CCO[SiH3] CWAFVXWRGIEBPL-UHFFFAOYSA-N 0.000 claims description 3
- 239000007788 liquid Substances 0.000 claims description 3
- ARYZCSRUUPFYMY-UHFFFAOYSA-N methoxysilane Chemical compound CO[SiH3] ARYZCSRUUPFYMY-UHFFFAOYSA-N 0.000 claims description 3
- 238000007761 roller coating Methods 0.000 claims description 3
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 claims description 3
- 238000010345 tape casting Methods 0.000 claims description 3
- ZXAUZSQITFJWPS-UHFFFAOYSA-J zirconium(4+);disulfate Chemical compound [Zr+4].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O ZXAUZSQITFJWPS-UHFFFAOYSA-J 0.000 claims description 3
- YKTSYUJCYHOUJP-UHFFFAOYSA-N [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] Chemical compound [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] YKTSYUJCYHOUJP-UHFFFAOYSA-N 0.000 claims description 2
- DIZPMCHEQGEION-UHFFFAOYSA-H aluminium sulfate (anhydrous) Chemical compound [Al+3].[Al+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O DIZPMCHEQGEION-UHFFFAOYSA-H 0.000 claims description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 229920006255 plastic film Polymers 0.000 claims 1
- 238000002834 transmittance Methods 0.000 abstract description 27
- 230000032683 aging Effects 0.000 abstract description 12
- 230000003667 anti-reflective effect Effects 0.000 abstract description 7
- 238000002360 preparation method Methods 0.000 abstract description 7
- 230000000694 effects Effects 0.000 abstract description 4
- 238000010438 heat treatment Methods 0.000 abstract description 3
- MARUHZGHZWCEQU-UHFFFAOYSA-N 5-phenyl-2h-tetrazole Chemical compound C1=CC=CC=C1C1=NNN=N1 MARUHZGHZWCEQU-UHFFFAOYSA-N 0.000 abstract description 2
- 238000001514 detection method Methods 0.000 abstract description 2
- 238000009776 industrial production Methods 0.000 abstract 2
- 239000010408 film Substances 0.000 description 60
- 210000004027 cell Anatomy 0.000 description 42
- 238000012360 testing method Methods 0.000 description 11
- 238000010248 power generation Methods 0.000 description 10
- 239000010409 thin film Substances 0.000 description 9
- 238000011161 development Methods 0.000 description 8
- 230000018109 developmental process Effects 0.000 description 8
- 238000001035 drying Methods 0.000 description 8
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 230000002265 prevention Effects 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- 150000003839 salts Chemical class 0.000 description 5
- 239000007921 spray Substances 0.000 description 5
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 4
- 230000006872 improvement Effects 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 229910052719 titanium Inorganic materials 0.000 description 4
- 239000010936 titanium Substances 0.000 description 4
- 210000003850 cellular structure Anatomy 0.000 description 3
- 229910021419 crystalline silicon Inorganic materials 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 125000005009 perfluoropropyl group Chemical group FC(C(C(F)(F)F)(F)F)(F)* 0.000 description 3
- 230000004075 alteration Effects 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000011031 large-scale manufacturing process Methods 0.000 description 2
- 238000005096 rolling process Methods 0.000 description 2
- 238000007790 scraping Methods 0.000 description 2
- 239000000741 silica gel Substances 0.000 description 2
- 229910002027 silica gel Inorganic materials 0.000 description 2
- 238000005245 sintering Methods 0.000 description 2
- 230000002195 synergetic effect Effects 0.000 description 2
- IKBFHCBHLOZDKH-UHFFFAOYSA-N 2-chloroethyl(triethoxy)silane Chemical compound CCO[Si](CCCl)(OCC)OCC IKBFHCBHLOZDKH-UHFFFAOYSA-N 0.000 description 1
- BHWUCEATHBXPOV-UHFFFAOYSA-N 2-triethoxysilylethanamine Chemical compound CCO[Si](CCN)(OCC)OCC BHWUCEATHBXPOV-UHFFFAOYSA-N 0.000 description 1
- 229920000742 Cotton Polymers 0.000 description 1
- 241000282414 Homo sapiens Species 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- YHWCPXVTRSHPNY-UHFFFAOYSA-N butan-1-olate;titanium(4+) Chemical compound [Ti+4].CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-] YHWCPXVTRSHPNY-UHFFFAOYSA-N 0.000 description 1
- 230000011712 cell development Effects 0.000 description 1
- 239000004568 cement Substances 0.000 description 1
- 238000002468 ceramisation Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 210000003608 fece Anatomy 0.000 description 1
- 239000005329 float glass Substances 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 125000005005 perfluorohexyl group Chemical group FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)* 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- RVRKDGLTBFWQHH-UHFFFAOYSA-N yttrium zirconium Chemical compound [Y][Zr][Y] RVRKDGLTBFWQHH-UHFFFAOYSA-N 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D1/00—Coating compositions, e.g. paints, varnishes or lacquers, based on inorganic substances
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/02—Polysilicates
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
- C09D183/08—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/60—Additives non-macromolecular
- C09D7/61—Additives non-macromolecular inorganic
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- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Inorganic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
The invention discloses a method for manufacturing a normal-temperature cured ceramic hydrophobic ash-proof coating, wherein the anti-reflective coating is formed by coating any two or more of porous silica, titanium dioxide, zirconium dioxide, cerium oxide, yttrium oxide, aluminum oxide and the like and silane or fluorosilicate on the surface of glass or a flexible plastic film after being compounded and curing at normal temperature, and the anti-reflective coating plated on the surface of the glass or the flexible plastic film has the advantages of ultra-smooth high-density hydrophobic ash-proof effect with low surface energy, high ceramic hardness and wear resistance, ageing resistance, no attenuation and detection results prove that the anti-reflective coating can be used for 25 years. Within 250-2500 nm, the transmittance of the ultra-white embossed glass plated with the anti-reflective film is improved by 2.5-3.5%, the transmittance of the transparent conductive glass (TCO) glass plated with the anti-reflective film is improved by 6.0-8.0%, and the transmittance of the flexible plastic film plated with the anti-reflective film is improved by 2.5-3.5%. The generated energy of the cadmium telluride solar cell plated with the antireflection film in the running solar power station is improved by more than 6%, and the hydrophobic and ash-proof functions of the antireflection film in different polluted environments are improved by 5% -33%. The anti-reflection coating is water-based, has no three wastes in the manufacturing process, has simple preparation method and is suitable for large-scale industrial production; the film preparation method is simple and easy to implement, does not need heating and curing in the film preparation process, is naturally dried and formed, and is suitable for a solar power station and a solar battery industrial production line in operation.
Description
Technical Field
Int.Cl.
C09D 1/00(2006.01)
C09D 183/04(2006.01)
C09D 7/12(2006.01)
C09D 5/00(2006.01)
The invention relates to a method for manufacturing a normal-temperature solidified hydrophobic anti-ash anti-reflection film coating.
Background
With the demand of human beings for energy and the environmental protection, solar power generation instead of mineral energy power generation has become a necessary development trend in the energy field. However, the rapid development and popularization of solar cell technology make the solar power station have the problem that the power generation efficiency of the solar cell is drastically reduced due to environmental pollution in the operation process. In the dry area, dirt such as sand, stone, dust, bird droppings and the like in the nature fall on the surface of the solar cell panel, so that the illumination quantity on the surface of the solar cell is influenced, the power generation capacity of the solar cell is drastically reduced, the power generation efficiency of the solar cell is greatly influenced, and particularly, a distributed solar power station in an urban industrial area is greatly influenced, because of the pollution of industrial emissions such as metal dust, ceramic powder, cement ash, cotton wool and the like, the power generation capacity of the solar cell is reduced by 20% -80%, and huge economic loss is caused to users due to the power generation capacity reduction and instability caused by the pollution. Meanwhile, the novel thin film solar cell is a solar cell with lower price and higher efficiency, development, production and development of the novel thin film solar cell are rapid, but the used TCO glass can be coated after the solar cell component is manufactured due to the fact that the packaging adhesive is not high-temperature-resistant, so that the film coating of the thin film solar cell component is required to be carried out at a lower temperature, the use of a high-temperature curing antireflection film is strictly limited, and the possibility that the thin film solar cell component is further synergistic by using the antireflection film is seriously influenced.
Aiming at the requirement of solar cell synergistic upgrading, a normal-temperature-curing hydrophobic ash-preventing anti-reflection film coating capable of being naturally dried at normal temperature is developed, and the problem to be solved in the field of solar cells is urgently solved.
In addition, with the development of thin film solar cells, flexible solar cells have been rapidly developed due to their light weight and low cost, and particularly the advent of perovskite solar cells, flexible solar cells have become a new development field. As the investment of countries and enterprises is larger and larger, the flexible solar cell is becoming a trend of solar cell development to replace the crystalline silicon solar cell. However, the flexible solar cell is encapsulated by plastic, the material is not high-temperature resistant, and the application of the normal-temperature cured anti-reflection film coating can solve the application problem of the flexible solar cell anti-reflection film, so that the normal-temperature cured ceramic hydrophobic anti-reflection film coating has a huge application prospect in the field of solar cells.
At present, according to data and market research, all anti-reflective film coatings at home and abroad can form a durable (25 years) anti-reflective film after being heated and cured at a certain temperature (400-700 ℃), so that the application of the normal-temperature cured hydrophobic ash-proof anti-reflective film coating can expand the application of the anti-reflective film in the field of solar cells.
The anti-reflection coating has the advantages that the anti-reflection coating can be cured into a film at normal temperature, the ceramic hardness and wear resistance can be obtained without heating, and the prepared anti-reflection coating has a hydrophobic and anti-ash function, has been widely applied to solar power stations and thin film solar cell modules in operation, and can be used for obtaining the quality detection passing of professional institutions.
The invention aims to reduce the use condition of the antireflection film in the solar cell and expand the use range of the antireflection film in the solar cell field according to the technical development of the solar cell.
Disclosure of Invention
The invention overcomes the defects of the prior art, and provides the normal-temperature curing ceramic hydrophobic anti-ash anti-reflection film coating manufacturing method which has wider application range and more convenient use condition and can more effectively improve the efficiency of the solar cell.
The invention aims to reduce the use condition of an antireflection film in a solar cell and expand the use range of the antireflection film in the field of the solar cell according to the technical development of the solar cell.
In order to solve the technical problems, the invention adopts the following technical scheme:
the normal temperature cured ceramic hydrophobic anti-ash anti-reflection film coating comprises porous silicon dioxide, metal oxide, silane, fluorosilicate, acid, alcohol and deionized water, wherein the molar ratio of the porous silicon dioxide to the metal oxide to the silane is 100:0.5-30:30-300:30-300: 0.01 to 50: 100-2000, 200-2000; the metal oxide is one or more of titanium dioxide, zirconium dioxide, cerium oxide, yttrium oxide and aluminum oxide.
In the improvement scheme of the normal-temperature cured ceramic hydrophobic anti-ash reflective film coating, the silicon dioxide is one or more of ethyl orthosilicate, propyl orthosilicate, sodium silicate and silica gel, the acid is one or more of sulfuric acid, hydrochloric acid, nitric acid or acetic acid, the alcohol is one or more of ethanol, isopropanol and isobutanol, the titanium dioxide is one or more of butyl titanate, titanium sulfate and titanium tetrachloride, the zirconium dioxide is one or more of zirconium oxychloride, zirconium sulfate and zirconium sulfonate, and the cerium oxide raw material is one or more of cerium nitrate, cerium sulfate and cerium chloride; the yttrium oxide is one or more of yttrium nitrate and yttrium chloride. The silane is one or more of chloromethyl silane, chloroethyl silane, aminoethyl silane, methoxysilane and ethoxysilane, and the fluorosilicate is perfluoropropyl silicate, perfluorohexyl silicate and perfluoroisooctyl silicate.
The preparation process of normal temperature cured ceramic hydrophobic anti-ash anti-reflecting film paint includes the steps of 1) preparing silica sol, adding alcohol, acid and deionized water into silica compound and stirring to obtain silica sol mixture; 2) Adding the metal oxide into the silica sol mixed solution, and fully stirring to obtain a composite solution; 3) And (3) adding silane and fluosilicate into the composite solution of metal oxide and silica sol step by step, and fully stirring to obtain the normal-temperature cured ceramic hydrophobic anti-ash anti-reflection film coating.
In the improvement scheme of the normal-temperature cured ceramic hydrophobic anti-ash anti-reflection film coating, the silica sol composite liquid is placed for 0.5-3.5 hours before the step 3) is carried out.
The preparation process of the antireflection film with normal temperature cured ceramic hydrophobic ash preventing coating includes the first homogeneous coating of the antireflection coating onto glass surface, normal temperature drying, and curing in air for 10-30 min to obtain the antireflection film.
In the improvement scheme of the manufacturing method of the normal-temperature cured ceramic hydrophobic anti-ash anti-reflection film, the anti-reflection coating coated on the surface of the glass or the flexible plastic film is uniformly coated in a spraying, roller coating, knife coating or lifting mode.
In the improvement scheme of the manufacturing method of the normal-temperature cured ceramic hydrophobic anti-ash anti-reflection film, the thickness of the anti-reflection film is 130 nm-250 nm.
In the improved scheme of the manufacturing method for preparing the solar cell anti-reflection film by using the normal-temperature cured ceramic hydrophobic anti-ash anti-reflection film coating, the surface of the glass or flexible plastic film is cleaned and dried before the anti-reflection coating is coated on the surface of the glass or flexible plastic film.
Compared with the prior art, the invention has the advantages that 1) the anti-reflection coating is naturally dried, solidified and formed into a film under the normal temperature condition, and heating is not needed in the film forming process of the anti-reflection coating; 2) The coating has wide application range and can be used for hard materials and flexible materials such as glass, flexible plastic films and the like; 3) The anti-reflection film plated on the surface of the solar cell has the advantages of hydrophobic ash prevention effect, high ceramic hardness, wear resistance, aging resistance and no attenuation, and can be used for 25 years. The transmittance of the photovoltaic glass plated with the anti-reflection film is improved by 2.5% -3.5% within the wavelength of 250 nm-2500 nm, and the transmittance of the transparent conductive TCO glass plated with the anti-reflection film is improved by 6.0% -8.0%; the transmittance of the flexible plastic film coated with the antireflection film is improved by 2.5% -3.5%. 5) The anti-reflection coating is water-based, has no three wastes in the manufacturing process, and is simple in manufacturing method and suitable for large-scale production.
The invention is further described in connection with the following embodiments:
description of the embodiments
The invention relates to a normal-temperature cured ceramic hydrophobic anti-ash anti-reflection film coating which comprises porous silicon dioxide, metal oxide, silane, fluorosilicate, acid, alcohol and deionized water, wherein the molar ratio of the porous silicon dioxide to the metal oxide is 100:1-30:100-300:100-300: 0.01 to 50: 200-2000 parts by weight of the metal oxide is the composite of one or more of titanium dioxide, zirconium dioxide, cerium oxide, yttrium oxide and aluminum oxide and one or more of silane and fluosilicate.
The silicon dioxide is one or more of ethyl orthosilicate, propyl orthosilicate, sodium silicate and silica gel;
the acid is one or more of sulfuric acid, hydrochloric acid, nitric acid or acetic acid;
the alcohol is one or more of ethanol, isopropanol and isobutanol;
the titanium dioxide is one or more of butyl titanate, titanium sulfate and titanium tetrachloride;
the zirconium dioxide is one or more of zirconium oxychloride, zirconium sulfate and zirconium sulfonate;
the cerium oxide raw material is one or more of cerium nitrate, cerium sulfate and cerium chloride;
the yttrium oxide is one or more of yttrium nitrate and yttrium chloride;
the aluminum oxide is one or more of sulfuric acid, aluminum silicate or aluminum chloride;
the silane is one or more of chloromethyl silane, chloroethyl silane, aminoethyl silane, methoxysilane and ethoxysilane;
the fluorosilicate is perfluoropropyl silicate, perfluorohexyl silicate and perfluoroisooctyl silicate.
The anti-reflection coating is water-based, has no three wastes in the manufacturing process, has simple preparation method and is suitable for large-scale production; the film-making technology has low requirements, is simple and easy to operate, saves energy sources, can be performed under natural conditions, and is suitable for a solar power station in operation or a solar battery production line which is not high temperature resistant or other production lines which need an antireflection film. .
The preparation method of the normal temperature solidified ceramic hydrophobic anti-ash anti-reflection film coating comprises the following steps:
1) Preparing silica sol, namely adding alcohol, acid and deionized water into a silicon dioxide compound, fully stirring to obtain a silica sol mixed solution, and 2) adding the metal oxide into the silica sol mixed solution, fully stirring to obtain a composite solution of the metal oxide and the silica sol. 3) Adding silane and fluosilicate into the composite liquid of metal oxide and silica sol, and fully stirring to obtain the normal-temperature cured ceramic hydrophobic anti-ash anti-reflection film coating.
Typically, the silica sol composite solution is allowed to stand for 0.5 to 5 hours before the step 3) is performed.
At present, the antireflection film is widely applied to solar cell glass, and the method for preparing the antireflection film by using the antireflection coating is mainly to coat the antireflection coating on the surface of ultra-white embossed glass (generally, the transmittance is 90-92%), and then the antireflection film is solidified on the surface of the glass by a high-temperature sintering process. The high temperature in the high temperature sintering process conditions severely limits the application of thin film solar cell glass, namely transparent conductive TCO glass and flexible plastic film, to the antireflection film and limits the application of the antireflection coating in the solar power station in operation. Especially, the TCO glass has low transmittance, generally 82-86%, and the antireflection film is needed to improve the transmittance and increase the power generation of the solar cell.
Therefore, the anti-reflection coating which is prepared by naturally drying, solidifying and forming a film in air at normal temperature has the advantages of adjustable formula, controllable performance, simple film forming process and easy implementation, and particularly when the anti-reflection coating is implemented in a large area, the uniformity of the film thickness is controlled by the concentration of the coating, so that the anti-reflection coating is an effective way for solving the problems that the generated energy of the conventional thin film solar cell is not high enough due to low transmittance and the generated energy of a solar power station is greatly reduced due to pollution in operation. The invention adopts inorganic-organic material composite solution to realize the manufacture of the antireflection coating which can be naturally dried and solidified into a film in the air at normal temperature, and the antireflection film has the functions of low surface energy, high compact ceramic surface, hydrophobic, ash prevention, wear resistance, antireflection and the like, thereby not only improving the power generation efficiency of the thin film solar cell, but also reducing the power generation loss and the operation maintenance cost caused by the pollution of the solar power station in operation.
The method for manufacturing the glass anti-reflection film by using the normal-temperature cured ceramic hydrophobic anti-ash anti-reflection film coating comprises the following steps of uniformly coating the anti-reflection coating on the surface of glass or a flexible plastic film, naturally drying and curing the anti-reflection coating for 6-30 minutes under normal temperature conditions to obtain the anti-reflection film with the thickness of 130-250 nm, and the structure of a compact film with the particle stacking low surface energy ultra-smooth particle size of 10-20 nm. The antireflection film has the functions of hydrophobic and ash prevention and the hardness and the wear resistance of ceramization.
The anti-reflection coating is coated on the surface of the glass or the flexible plastic film, and can be uniformly coated by adopting modes of spraying, roller coating, knife coating or lifting, and the like, and the surface of the glass or the flexible plastic film is necessarily cleaned and dried according to the coated glass cleaning standard before coating.
The following is illustrative:
example 1:
adding 5 kg of hydrochloric acid with the concentration of 0.1mol and 0.5 kg of sulfuric acid with the concentration of 0.1mol into a mixed solution of 15 kg of ethanol and 40 kg of deionized water, uniformly stirring, adding 20 kg of ethyl orthosilicate, and fully stirring for 3 hours to obtain stable and transparent silica sol. Then, 0.5 kg of tetrabutyl titanate, 0.1 kg of 0.2mol of zirconium oxychloride solution and 0.1 kg of 0.1mol of tin chloride solution were added to the silica sol respectively, and sufficiently stirred to obtain a composite solution. After standing for 30 minutes, 0.1mol of aminoethyltriethoxysilane solution (0.2 kg) and 0.01mol of perfluoropropyl triethyl silicate (0.1 kg) are respectively added into the composite solution, and the mixture is stirred uniformly to obtain the normal-temperature cured ceramic hydrophobic anti-ash anti-reflection film coating.
And (3) scraping the prepared anti-reflection coating on the surface of transparent conductive glass (TCO glass), and naturally drying for 20 minutes at normal temperature to obtain the TCO glass with the anti-reflection film.
Through tests, the transmittance in the visible light region is improved by 6.0-8.0%, and the hardness of the antireflection film is 7-8H. After the felt friction is 500, the glass transmittance is only reduced by 0.05-0.2%, and after the aging resistance tests of salt spray resistance, ultraviolet irradiation, high temperature and high humidity, cold and hot circulation and the like are carried out according to JC/T2170-2013 and JC/T2168-2013 (2017), the glass transmittance is reduced by less than 0.5%. The surface of the antireflection film has a hydrophilic angle of 126 degrees.
Example 2:
adding 8 kg of acetic acid with the concentration of 0.1mol and 1 kg of nitric acid with the concentration of 0.1mol into a mixed solution of 20 kg of isopropanol and 30 kg of deionized water, uniformly stirring, adding 21 kg of propyl orthosilicate, and fully stirring for 3 hours to obtain stable and transparent silica sol. 0.8 kg of titanium tetrachloride, 0.02mol of yttrium chloride solution, 0.1 kg of 0.01mol of cerium sulfate and 0.2 kg of solution are added into silica sol, and the mixture is stirred uniformly to obtain a composite solution. Then 0.01mol of 0.3 kg of chloroethyl triethoxysilane, 0.01mol of 0.1 kg of perfluorohexyl triethyl silicate are respectively added into the composite solution, and the mixture is fully stirred to obtain the normal-temperature cured ceramic hydrophobic anti-ash anti-reflection film coating.
And (3) rolling the anti-reflection coating on the surface of the solar super-white embossed glass, and naturally drying for 10-20 minutes to obtain the anti-reflection film super-white embossed glass.
Through tests, the transmittance in the visible light region is improved by 2.5% -3.5%, and the hardness of the antireflection film is 6-7H. Under the condition that the pressure is 400 g/cm and the felt friction is 500, the glass transmittance is reduced by 0.1% -0.3%. According to the ageing-resistant conditions of JC/T2170-2013 and JC/T2168-2013 (2017), after salt spray resistance, ultraviolet irradiation resistance, high-temperature high-humidity cold-hot circulation and other ageing-resistant tests, the glass transmittance is reduced by less than 0.5 percent. The surface of the antireflection film has a hydrophilic angle of 102 degrees.
Example 3:
adding 1.2 kg of sulfuric acid with the concentration of 0.1mol and 0.8 kg of hydrochloric acid with the concentration of 0.1mol into a mixed solution of 30 kg of ethanol and 20 kg of deionized water, uniformly stirring, adding 0.2 kg of zirconium oxychloride with the concentration of 0.01mol, and fully stirring for 1.5 hours to obtain stable and transparent zirconium sol. Zirconium sol was added to a 50 kg solution of ethyl orthosilicate having a concentration of 0.2mol to obtain a zirconium silicate sol. After standing for one hour, 0.02mol of yttrium chloride solution, 0.1 kg, and 0.01mol of cerium chloride solution, 0.2 kg were added to the silica zirconium sol to obtain a composite solution. 0.1mol of 0.5 kg of chloromethyl silane and 0.3 kg of perfluoropropyl trimethyl silicate are respectively added into the composite solution, and the mixture is fully stirred to obtain the normal-temperature cured ceramic hydrophobic anti-ash anti-reflection film coating.
And (3) rolling the antireflection coating on the surface of the PET transparent film, and drying for 10 minutes to 30 minutes at normal temperature and normal pressure to obtain the PET flexible high transparent film of the antireflection film.
Through tests, the transmittance in the visible light region is improved by 2.5% -3.5%, and the hardness of the antireflection film is 6H. Under the condition that the pressure is 400 g/cm and the felt friction is 500, the glass transmittance is reduced by 0.1% -0.3%. According to the ageing-resistant conditions of JC/T2170-2013 and JC/T2168-2013 (2017), after the ageing tests of salt spray resistance, ultraviolet irradiation, high-temperature high-humidity cold-hot circulation and the like, the glass transmittance is reduced by less than 0.5 percent.
Example 4:
adding 3 kg of nitric acid and 3 kg of hydrochloric acid into a mixed solution of 25 kg of ethanol and 25 kg of deionized water, uniformly stirring, adding 0.5 kg of titanium sulfate, and fully stirring for 1 hour to obtain stable and transparent titanium sol. Adding titanium sol into 50 kg of silica sol solution with the concentration of 0.2mol, fully stirring to obtain titanium silica sol, and adding 1 kg of solution of 0.1mol cerium sulfate into the titanium silica sol to obtain a composite solution. And respectively adding 0.6 kg of aminoethylsilane and 0.1 kg of perfluoro isooctyl trimethyl silicate into the composite solution, and fully stirring to obtain the normal-temperature cured ceramic hydrophobic anti-ash anti-reflection film coating.
And (3) scraping the anti-reflection coating on the surface of the running crystalline silicon solar cell, and drying for 10 to 30 minutes at normal temperature to obtain the anti-reflection film solar cell.
Through tests, the generated energy of the solar cell is improved by more than 3%, and the hardness of the antireflection film is 6H. According to the JC/T2170-2013 and JC/T2168-2013 (2017) aging resistance conditions, the solar energy generating capacity is reduced by less than 0.5 percent after salt spray resistance, ultraviolet irradiation resistance, high temperature and high humidity resistance, cold and hot circulation resistance and other aging resistance tests.
Example 5:
adding 0.2 kg of 0.1mol zirconium oxychloride solution and 0.3 kg of 0.1mol aluminum sulfate solution into a mixed solution of 25 kg of ethanol and 25 kg of deionized water, uniformly stirring, adding the mixed solution into 50 kg of sodium silicate solution with the concentration of 0.4mol, adding a mixed solution of 1 kg of hydrochloric acid and 1 kg of sulfuric acid, and uniformly stirring to obtain the yttrium-zirconium-containing silica sol composite solution. And respectively adding 0.5 kg of methyltriethoxysilane and 0.1 kg of perfluoropropyl trimethyl silicate into the composite solution, and fully stirring to obtain the normal-temperature cured ceramic hydrophobic anti-ash anti-reflection film coating.
Spraying the anti-reflection coating on the surface of float glass, and naturally drying for 30 minutes at normal temperature to obtain the anti-reflection film glass.
Through tests, the transmittance in the visible light region is improved by 2.8% -3.5%, and the hardness of the antireflection film is 8H. The glass transmission was reduced by less than 0.5% at a pressure of 400 grams per square centimeter indicating 500 felt rubs. The glass transmittance is reduced by less than 0.5 percent after being subjected to ageing-resistant tests such as salt spray resistance and the like, ultraviolet irradiation, high temperature and high humidity, cold and hot circulation and the like according to the ageing-resistant conditions of JC/T2170-2013 and JC/T2168-2013 (2017).
In conclusion, the obtained antireflection film has the structure that particles with the particle size of 10-20 nm are stacked and compacted through an atomic force microscope and a tunnel scanning electron microscope test, so that the transmittance of the ultrawhite embossed glass in a visible light region is improved by 2.5-3.8%, the chromatic aberration is less than 0.3%, or the transmittance in a solar spectrum region of 250-2500 nm is improved by 2.5-3.5%, and the chromatic aberration is less than 0.5%. Within 250 nm-2500 nm, the transmittance of the photovoltaic glass coated with the antireflection film is improved by 2.5-3.5%, the transmittance of the transparent conductive TCO glass coated with the antireflection film is improved by 6.0-8.0%, the transmittance of the flexible plastic coated with the antireflection film is improved by 2.5-3.5%, and the transmittance of the common glass coated with the antireflection film is improved by 2.8-3.5%. In the actual operation of the solar power station, the generated energy of the crystalline silicon solar cell coated with the anti-reflection film is detected to be improved by 3.0%, the generated energy of the cadmium telluride solar cell coated with the anti-reflection film is detected to be improved by 7%, and in different polluted environments, the ash prevention effect is improved by 5% -33%.
The anti-reflection film plated on the surface of the glass has the advantages of low surface energy, high smooth and compact hydrophobic ash prevention effect, high ceramic hardness, high wear resistance, ageing resistance, no attenuation and 25 years of service life.
Claims (8)
1. The normal-temperature cured ceramic hydrophobic anti-ash anti-reflection film coating is characterized by comprising porous silicon dioxide, metal oxide, silane, fluorosilicate, acid, alcohol and deionized water, wherein the molar ratio of the porous silicon dioxide to the metal oxide to the silane to the fluorosilicate is 100:0.5-30:30-300:30-300: 0.1 to 50: 100-2000, 200-2000, wherein the metal oxide is one or more of titanium dioxide, zirconium dioxide, cerium oxide, yttrium oxide and aluminum oxide.
2. The normal temperature cured ceramic hydrophobic anti-ash reflective film coating according to claim 1, wherein the silicon dioxide raw material is one or more of ethyl orthosilicate, propyl orthosilicate, sodium silicate and silica sol, the acid is one or more of sulfuric acid, nitric acid, hydrochloric acid or acetic acid, the alcohol is one or more of ethanol, isopropanol and isobutanol, the titanium dioxide raw material is one or more of butyl titanate, titanium sulfate and titanium tetrachloride, the zirconium dioxide raw material is one or more of zirconium oxychloride, zirconium sulfate and zirconium sulfonate, the cerium oxide raw material is one or more of cerium nitrate, cerium sulfate and cerium chloride, and the yttrium oxide raw material is one or more of yttrium nitrate and yttrium chloride; the alumina raw material is one or more of aluminum sulfate, aluminum silicate and aluminum chloride. The silane is one or more of chloromethyl silane, chloroethyl silane, aminoethyl silane, methoxysilane and ethoxysilane, and the fluorosilicate is one or more of perfluoropropyl silicate, perfluorohexyl silicate and perfluoroisooctyl silicate.
3. A method for manufacturing the normal temperature cured ceramic hydrophobic anti-ash anti-reflection film coating according to claim 1, which is characterized by comprising the following steps:
1) Preparing silica sol, namely adding alcohol, acid and deionized water into a compound containing silicon dioxide, fully stirring to obtain a silica sol mixed solution, and 2) adding the metal oxide into the silica sol mixed solution, and fully stirring to obtain a composite solution of the metal oxide and the silica sol. 3) And (3) adding silane and fluosilicate into the composite liquid of metal oxide and silica sol step by step, and fully stirring to obtain the normal-temperature cured ceramic hydrophobic anti-ash anti-reflection film coating.
4. The method for producing a normal temperature cured ceramic hydrophobic anti-ash anti-reflective coating according to claim 3, wherein the silica sol composite solution is allowed to stand for 0.5 to 3.5 hours before the step 3) is performed.
5. A method for preparing an anti-ash anti-reflection film by using the normal temperature cured ceramic hydrophobic anti-ash anti-reflection film coating as claimed in claim 1, which is characterized by comprising the following steps of uniformly coating the prepared anti-reflection coating on the surface of glass or flexible plastic film, and curing for 6-30 minutes at normal temperature to obtain the ceramic hydrophobic anti-ash anti-reflection film.
6. The method for manufacturing the anti-reflection coating on the surface of the glass or flexible plastic film by using the normal-temperature cured ceramic hydrophobic anti-ash anti-reflection coating according to claim 5, wherein the anti-reflection coating coated on the surface of the glass or flexible plastic film is uniformly coated by spraying, roller coating, knife coating or lifting.
7. The method for manufacturing the glass or flexible plastic film antireflection film by using the normal-temperature cured ceramic hydrophobic ash-preventing antireflection film coating according to claim 5 or 6, wherein the thickness of the antireflection film is 130-250 nm.
8. A method for manufacturing a glass or flexible plastic film antireflection film by using the normal temperature cured ceramic hydrophobic ash-resistant antireflection film coating as set forth in claim 7, wherein the glass or flexible plastic film surface is cleaned and dried before the antireflection coating is coated on the glass or plastic film surface.
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