CN117342802A - Novel titanium-based solar control coated glass and preparation method thereof - Google Patents
Novel titanium-based solar control coated glass and preparation method thereof Download PDFInfo
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- CN117342802A CN117342802A CN202311294421.5A CN202311294421A CN117342802A CN 117342802 A CN117342802 A CN 117342802A CN 202311294421 A CN202311294421 A CN 202311294421A CN 117342802 A CN117342802 A CN 117342802A
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- 239000011521 glass Substances 0.000 title claims abstract description 55
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 title claims abstract description 51
- 239000010936 titanium Substances 0.000 title claims abstract description 51
- 229910052719 titanium Inorganic materials 0.000 title claims abstract description 51
- 238000002360 preparation method Methods 0.000 title claims abstract description 15
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims abstract description 79
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 60
- 239000004408 titanium dioxide Substances 0.000 claims abstract description 34
- 235000012239 silicon dioxide Nutrition 0.000 claims abstract description 30
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 30
- 238000000034 method Methods 0.000 claims abstract description 28
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 claims abstract description 22
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims abstract description 12
- 238000005229 chemical vapour deposition Methods 0.000 claims abstract description 11
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims abstract description 11
- 238000002834 transmittance Methods 0.000 claims abstract description 8
- 229910052751 metal Inorganic materials 0.000 claims abstract description 6
- 239000002184 metal Substances 0.000 claims abstract description 6
- 238000002310 reflectometry Methods 0.000 claims abstract description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 57
- 239000002243 precursor Substances 0.000 claims description 38
- 229910052757 nitrogen Inorganic materials 0.000 claims description 27
- 238000001704 evaporation Methods 0.000 claims description 20
- 239000005977 Ethylene Substances 0.000 claims description 16
- 239000007789 gas Substances 0.000 claims description 16
- 239000000463 material Substances 0.000 claims description 16
- 230000008020 evaporation Effects 0.000 claims description 14
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 12
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 claims description 10
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 10
- 229910000077 silane Inorganic materials 0.000 claims description 10
- 239000012159 carrier gas Substances 0.000 claims description 6
- 230000036284 oxygen consumption Effects 0.000 claims description 6
- FPCJKVGGYOAWIZ-UHFFFAOYSA-N butan-1-ol;titanium Chemical compound [Ti].CCCCO.CCCCO.CCCCO.CCCCO FPCJKVGGYOAWIZ-UHFFFAOYSA-N 0.000 claims description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 4
- 239000001301 oxygen Substances 0.000 claims description 4
- 229910052760 oxygen Inorganic materials 0.000 claims description 4
- 229910001873 dinitrogen Inorganic materials 0.000 claims description 3
- -1 propyl titanate Chemical compound 0.000 claims description 3
- JMXKSZRRTHPKDL-UHFFFAOYSA-N titanium ethoxide Chemical group [Ti+4].CC[O-].CC[O-].CC[O-].CC[O-] JMXKSZRRTHPKDL-UHFFFAOYSA-N 0.000 claims description 3
- 239000000758 substrate Substances 0.000 description 5
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 3
- 229910021529 ammonia Inorganic materials 0.000 description 2
- 238000001755 magnetron sputter deposition Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- FFRBMBIXVSCUFS-UHFFFAOYSA-N 2,4-dinitro-1-naphthol Chemical compound C1=CC=C2C(O)=C([N+]([O-])=O)C=C([N+]([O-])=O)C2=C1 FFRBMBIXVSCUFS-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000005329 float glass Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
- C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
- C03C17/008—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character comprising a mixture of materials covered by two or more of the groups C03C17/02, C03C17/06, C03C17/22 and C03C17/28
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/73—Anti-reflective coatings with specific characteristics
- C03C2217/734—Anti-reflective coatings with specific characteristics comprising an alternation of high and low refractive indexes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/152—Deposition methods from the vapour phase by cvd
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Composite Materials (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
The invention provides novel titanium-based solar control coated glass and a preparation method thereof, wherein the preparation method comprises the steps of sequentially preparing a first titanium dioxide film layer, a second silicon dioxide film layer and a third titanium dioxide/titanium nitride film layer which are mutually doped on the upper surface of the glass by utilizing a chemical vapor deposition method in a tin bath; the titanium dioxide film layer is used as a metal bridge for increasing the bonding capability of the silicon dioxide film layer and glass, and forms a double-layer anti-reflection layer together with the silicon dioxide film layer so as to reduce the overall reflectivity of the film layer and the reflection interference color; the mutually doped titanium oxide/titanium nitride film layer is used for selectively absorbing visible light and solar energy so as to reduce the transmittance of the visible light and the solar energy.
Description
Technical Field
The invention belongs to the technical field of solar control coated glass manufacturing, and particularly relates to novel titanium-based solar control coated glass and a preparation method thereof.
Background
The solar control coated glass has excellent function of reducing visible light and solar energy transmittance, and is widely applied to the building industry. The main production method of the solar control coated glass comprises a magnetron sputtering method and an on-line chemical vapor deposition method. The solar control coated glass produced by the magnetron sputtering method needs a multi-layer film system structure design, the structure and control difficulty are high, and the film layer contains a metal film layer, so that the glass is generally used for synthesizing hollow glass. The solar control coated glass produced by the on-line chemical vapor deposition method is mainly silicon-based solar control coated glass, the color of the film layer is the body color of the siliceous material, and the film layer is gray brown and can be coated on glass substrates with different colors. Through examination, no related technology for preparing a titanium nitride film in a tin bath by adopting a chemical vapor deposition method is found.
Disclosure of Invention
The invention aims to solve the technical problem of providing novel titanium-based solar control coated glass and a preparation method thereof aiming at the defects of the prior art.
In order to solve the technical problems, the invention comprises the following steps:
a preparation method of novel titanium-based solar control coated glass comprises the steps of sequentially preparing a first titanium dioxide film layer, a second silicon dioxide film layer and a third mutually doped titanium dioxide/titanium nitride film layer on the upper surface of glass in a tin bath by utilizing a chemical vapor deposition method; the titanium dioxide film layer is used as a metal bridge for increasing the bonding capability of the silicon dioxide film layer and glass, and forms a double-layer anti-reflection layer together with the silicon dioxide film layer so as to reduce the overall reflectivity of the film layer and the reflection interference color; the mutually doped titanium oxide/titanium nitride film layer is used for selectively absorbing visible light and solar energy so as to reduce the transmittance of the visible light and the solar energy.
Further, the method specifically comprises the following steps:
s1: preparing a first titanium dioxide film layer: evaporating a titanium source precursor in an evaporator to obtain precursor steam, wherein the evaporation temperature is 110-150 ℃; the nitrogen is used as carrier gas to guide the precursor steam into the first reactor in the tin bath, the dosage of the titanium source precursor is 1-5kg/h, and the dosage of the nitrogen is 18-42m 3 Reacting the material steam on the upper surface of glass at 660-670 ℃ to prepare a first titanium dioxide film layer with the thickness of 15-40nm, wherein the refractive index of the film layer is 1.8-2.1;
s2: preparing a second silicon dioxide film layer: introducing a mixed gas material consisting of silane, ethylene, oxygen and nitrogen in different proportions into a second reactor, wherein the ratio of silane-oxygen-ethylene is 1:2-5:4-8, the silane is used in an amount of 0.1-1m 3 The oxygen consumption is 0.4-4m 3 And/h, the ethylene content is 0.6-6m 3 The nitrogen dosage is 18-42m 3 /h; at the glass temperature of 650-660 ℃, the mixed gas material reacts on the first layer of titanium dioxide film to prepare a second layer of silicon dioxide film with the thickness of 15-40nm, and the refractive index of the film is 1.43-1.45;
s3: preparing a third mutually doped titanium dioxide/titanium nitride film layer: evaporating the titanium source precursor in an evaporator to obtain titanium source precursor steam, wherein the evaporation temperature is 110-150 ℃; mixing ammonia gas with titanium source precursor steam to obtain process gas, and introducing the process gas into a third reactor in a tin bath by using nitrogen gas as carrier gas, wherein the dosage of the titanium source precursor is 2-10kg/h, and the dosage of the ammonia gas is 1-10m 3 The nitrogen dosage is 18-42m 3 /h; and (3) reacting the material gas on the second silicon dioxide film layer at the glass temperature of 640-650 ℃ to prepare the third mutually doped titanium oxide/titanium nitride film layer with the thickness of 20-100 nm.
Further, in the step S1, the evaporation temperature of the titanium source precursor is 120-140 ℃; the dosage of the titanium source precursor is 1.5-4kg/h, and the dosage of nitrogen is 24-36m 3 /h; the thickness of the titanium dioxide film layer is 20-30nm, and the refractive index of the film layer is 1.9-1.95.
Further, in the step S2, siliconThe preferable ratio of the alkane-oxygen-ethylene is 1:3.5-4.5:5.5-6.5; the silane is used in an amount of 0.15-0.72m 3 The oxygen consumption is 0.6-3m 3 And/h, the ethylene content is 1-4.5m 3 The nitrogen dosage is 24-36m 3 /h; the thickness of the silicon dioxide film layer is 20-30nm.
Further, in the step S3, the evaporation temperature is 120-140 ℃; the dosage of the titanium source precursor is 2.5-8kg/h, and the dosage of ammonia gas is 1.5-8m 3 The nitrogen dosage is 24-36m 3 /h; the thickness of the mutually doped titanium oxide/titanium nitride film layer is 30-80nm.
Further, in the steps S1 and S3, the titanium source precursor is ethyl titanate, propyl titanate, butyl titanate, or isomers thereof.
The novel titanium-based solar control coated glass is prepared by adopting the novel preparation method of the titanium-based solar control coated glass.
The beneficial effects of the invention are as follows:
the invention prepares a first titanium dioxide film layer on the upper surface of glass by using a chemical vapor deposition method in a tin bath as a metal bridge so as to increase the bonding capability of the film layer and the glass; preparing a second silicon dioxide film layer on the first tin dioxide film layer by using a chemical vapor deposition method, wherein the silicon dioxide film layer and the titanium dioxide film layer form a double-layer antireflection layer so as to reduce the overall reflectivity and the reflection interference color of the film layer; and preparing a third mutually doped titanium oxide/titanium nitride film layer on the second silicon dioxide film layer by utilizing a chemical vapor deposition method, wherein the film layer has a selective absorption effect on visible light and solar energy, and can effectively reduce the transmittance of the visible light and the solar energy.
Detailed Description
The present invention will be described in further detail with reference to the following embodiments in order to facilitate understanding of the present invention. It will be apparent to those skilled in the art that the examples are merely to aid in understanding the invention and are not to be construed as a specific limitation thereof.
The invention provides a preparation method of novel titanium-based solar control coated glass, which comprises the steps of sequentially preparing a first titanium dioxide film layer, a second silicon dioxide film layer and a third titanium dioxide/titanium nitride film layer which are mutually doped on the upper surface of the glass by utilizing a chemical vapor deposition method in a tin bath; the titanium dioxide film layer is used as a metal bridge for increasing the bonding capability of the silicon dioxide film layer and glass, and forms a double-layer anti-reflection layer together with the silicon dioxide film layer so as to reduce the overall reflectivity of the film layer and the reflection interference color; the mutually doped titanium oxide/titanium nitride film layer is used for selectively absorbing visible light and solar energy so as to reduce the transmittance of the visible light and the solar energy.
The preparation method of the novel titanium-based solar control coated glass specifically comprises the following steps:
s1: preparing a first titanium dioxide film layer: evaporating a titanium source precursor in an evaporator to obtain precursor steam, wherein the evaporation temperature is 110-150 ℃; the nitrogen is used as carrier gas to guide the precursor steam into the first reactor in the tin bath, the dosage of the titanium source precursor is 1-5kg/h, and the dosage of the nitrogen is 18-42m 3 Reacting the material steam on the upper surface of glass at 660-670 ℃ to prepare a first titanium dioxide film layer with the thickness of 15-40nm, wherein the refractive index of the film layer is 1.8-2.1;
s2: preparing a second silicon dioxide film layer: introducing a mixed gas material consisting of silane, ethylene, oxygen and nitrogen in different proportions into a second reactor, wherein the ratio of silane-oxygen-ethylene is 1:2-5:4-8, the silane is used in an amount of 0.1-1m 3 The oxygen consumption is 0.4-4m 3 And/h, the ethylene content is 0.6-6m 3 The nitrogen dosage is 18-42m 3 /h; at the glass temperature of 650-660 ℃, the mixed gas material reacts on the first layer of titanium dioxide film to prepare a second layer of silicon dioxide film with the thickness of 15-40nm, and the refractive index of the film is 1.43-1.45;
s3: preparing a third mutually doped titanium dioxide/titanium nitride film layer: evaporating the titanium source precursor in an evaporator to obtain titanium source precursor steam, wherein the evaporation temperature is 110-150 ℃; mixing ammonia gas with titanium source precursor steam to obtain process gas, and introducing the process gas into a third reactor in a tin bath by using nitrogen gas as carrier gas, wherein the dosage of the titanium source precursor is 2-10kg/h, and the dosage of the ammonia gas is 1-10m 3 The nitrogen dosage is 18-42m 3 /h; and (3) reacting the material gas on the second silicon dioxide film layer at the glass temperature of 640-650 ℃ to prepare the third mutually doped titanium oxide/titanium nitride film layer with the thickness of 20-100 nm.
The novel titanium-based solar control coated glass is prepared by the method.
The overall transmittance of the coated glass is 20-50%, and the coated glass can be different in color according to the thickness of the mutually doped titanium dioxide/titanium nitride film layers, and is covered with light blue to golden yellow.
In the step S1, the evaporation temperature of the titanium source precursor is preferably 120-140 ℃; the amount of the titanium source precursor is preferably 1.5-4kg/h, and the amount of nitrogen is preferably 24-36m 3 /h; the thickness of the titanium dioxide film layer is preferably 20-30nm, and the refractive index of the film layer is preferably 1.9-1.95.
In the step S2, the preferable ratio of silane-oxygen-ethylene is 1:3.5-4.5:5.5-6.5; the silane is preferably used in an amount of 0.15 to 0.72m 3 Preferably, the amount of oxygen per hour is from 0.6 to 3m 3 The ethylene content per hour is preferably 1 to 4.5m 3 The nitrogen is preferably used in an amount of 24 to 36m per hour 3 /h; the thickness of the silicon dioxide film layer is preferably 20-30nm.
In the step S3, the evaporation temperature is preferably 120-140 ℃; the dosage of the titanium source precursor is preferably 2.5-8kg/h, and the dosage of ammonia is preferably 1.5-8m 3 The nitrogen is preferably used in an amount of 24 to 36m per hour 3 /h; the thickness of the inter-doped titanium oxide/titanium nitride film layer is preferably 30-80nm.
In the above steps S1 and S3, the titanium source precursor is ethyl titanate, propyl titanate, butyl titanate, and isomers thereof.
Examples
Common float glass has a substrate thickness of 6mm and a plate speed of 470m/h.
(1) Preparation of first titanium dioxide film
The titanium source precursor is butyl titanate, the dosage is 1.5kg/h, and the nitrogen dosage is 24m 3 And/h, the evaporation temperature of the evaporator is 125 ℃, the material steam is introduced into the first reactor, the temperature of the glass substrate is 660 ℃, and the material steam reacts on a hot glass plate to generate two materialsThe thickness of the tin oxide film layer is 25nm, and the refractive index is 2.
(2) Preparation of a second silicon dioxide film
Silane usage of 0.24m 3 And/h, the oxygen consumption is 0.96m 3 /h, ethylene content of 1.44m 3 Per hour, nitrogen dosage is 24m 3 /h; the mixture of materials is led into a second reactor, the temperature of the glass substrate is 650 ℃, and the mixture reacts on the titanium dioxide film to form a silicon dioxide film, the thickness of the film is 25nm, and the refractive index is 1.45.
(3) Preparation of third mutually doped titanium dioxide/titanium nitride film layer film
The titanium source precursor is butyl titanate, the dosage is 5kg/h, and the nitrogen dosage is 24m 3 And/h, the evaporation temperature of the evaporator is 125 ℃, and the ammonia consumption is 4m 3 And/h, introducing process gas into a third reactor, and preparing a mutually doped titanium dioxide/titanium nitride film layer film on the silicon dioxide film layer at the temperature of 640 ℃ of the glass substrate, wherein the film layer thickness is 50nm.
Three film layers sequentially prepared on the surface of the glass by using a chemical vapor deposition method form the coated glass with solar control, and the visible light transmittance is 45%.
Although embodiments of the present invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made therein without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.
Claims (7)
1. The preparation method of the novel titanium-based solar control coated glass is characterized by comprising the steps of sequentially preparing a first titanium dioxide film layer, a second silicon dioxide film layer and a third titanium dioxide/titanium nitride film layer which are mutually doped on the upper surface of the glass by utilizing a chemical vapor deposition method in a tin bath; the titanium dioxide film layer is used as a metal bridge for increasing the bonding capability of the silicon dioxide film layer and glass, and forms a double-layer anti-reflection layer together with the silicon dioxide film layer so as to reduce the overall reflectivity of the film layer and the reflection interference color; the mutually doped titanium oxide/titanium nitride film layer is used for selectively absorbing visible light and solar energy so as to reduce the transmittance of the visible light and the solar energy.
2. The method for preparing novel titanium-based solar control coated glass according to claim 1, wherein the method specifically comprises the following steps:
s1: preparing a first titanium dioxide film layer: evaporating a titanium source precursor in an evaporator to obtain precursor steam, wherein the evaporation temperature is 110-150 ℃; the nitrogen is used as carrier gas to guide the precursor steam into the first reactor in the tin bath, the dosage of the titanium source precursor is 1-5kg/h, and the dosage of the nitrogen is 18-42m 3 Reacting the material steam on the upper surface of glass at 660-670 ℃ to prepare a first titanium dioxide film layer with the thickness of 15-40nm, wherein the refractive index of the film layer is 1.8-2.1;
s2: preparing a second silicon dioxide film layer: introducing a mixed gas material consisting of silane, ethylene, oxygen and nitrogen in different proportions into a second reactor, wherein the ratio of silane-oxygen-ethylene is 1:2-5:4-8, the silane is used in an amount of 0.1-1m 3 The oxygen consumption is 0.4-4m 3 And/h, the ethylene content is 0.6-6m 3 The nitrogen dosage is 18-42m 3 /h; at the glass temperature of 650-660 ℃, the mixed gas material reacts on the first layer of titanium dioxide film to prepare a second layer of silicon dioxide film with the thickness of 15-40nm, and the refractive index of the film is 1.43-1.45;
s3: preparing a third mutually doped titanium dioxide/titanium nitride film layer: evaporating the titanium source precursor in an evaporator to obtain titanium source precursor steam, wherein the evaporation temperature is 110-150 ℃; mixing ammonia gas with titanium source precursor steam to obtain process gas, and introducing the process gas into a third reactor in a tin bath by using nitrogen gas as carrier gas, wherein the dosage of the titanium source precursor is 2-10kg/h, and the dosage of the ammonia gas is 1-10m 3 The nitrogen dosage is 18-42m 3 /h; and (3) reacting the material gas on the second silicon dioxide film layer at the glass temperature of 640-650 ℃ to prepare the third mutually doped titanium oxide/titanium nitride film layer with the thickness of 20-100 nm.
3. The method for preparing a novel titanium-based solar control coated glass according to claim 2, wherein in the step S1, the evaporation temperature of the titanium source precursor is 120-140 ℃; the dosage of the titanium source precursor is 1.5-4kg/h, and the dosage of nitrogen is 24-36m 3 /h; the thickness of the titanium dioxide film layer is 20-30nm, and the refractive index of the film layer is 1.9-1.95.
4. The method for preparing a novel titanium-based solar control coated glass according to claim 2, wherein in the step S2, the preferable ratio of silane-oxygen-ethylene is 1:3.5-4.5:5.5-6.5; the silane is used in an amount of 0.15-0.72m 3 The oxygen consumption is 0.6-3m 3 And/h, the ethylene content is 1-4.5m 3 The nitrogen dosage is 24-36m 3 /h; the thickness of the silicon dioxide film layer is 20-30nm.
5. The method for preparing a novel titanium-based solar control coated glass according to claim 2, wherein in the step S3, the evaporation temperature is 120-140 ℃; the dosage of the titanium source precursor is 2.5-8kg/h, and the dosage of ammonia gas is 1.5-8m 3 The nitrogen dosage is 24-36m 3 /h; the thickness of the mutually doped titanium oxide/titanium nitride film layer is 30-80nm.
6. The method for preparing a novel titanium-based solar control coated glass according to claim 2, wherein in the steps S1 and S3, the titanium source precursor is ethyl titanate, propyl titanate, butyl titanate, or isomers thereof.
7. A novel titanium-based solar control coated glass prepared by the novel titanium-based solar control coated glass preparation method according to any one of claims 1-6.
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| Application Number | Priority Date | Filing Date | Title |
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| CN202311294421.5A CN117342802A (en) | 2023-10-09 | 2023-10-09 | Novel titanium-based solar control coated glass and preparation method thereof |
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| CN202311294421.5A CN117342802A (en) | 2023-10-09 | 2023-10-09 | Novel titanium-based solar control coated glass and preparation method thereof |
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