CN117276912A - Visible light transparent wave-absorbing metamaterial with adjustable performance - Google Patents

Visible light transparent wave-absorbing metamaterial with adjustable performance Download PDF

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Publication number
CN117276912A
CN117276912A CN202311446985.6A CN202311446985A CN117276912A CN 117276912 A CN117276912 A CN 117276912A CN 202311446985 A CN202311446985 A CN 202311446985A CN 117276912 A CN117276912 A CN 117276912A
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layer
transparent
graphene
wave
metamaterial
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Inventor
李宝毅
白雪丽
张小平
张胜健
王峰
郭晓苗
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Taiyuan Institute of Technology
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Taiyuan Institute of Technology
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01QANTENNAS, i.e. RADIO AERIALS
    • H01Q17/00Devices for absorbing waves radiated from an antenna; Combinations of such devices with active antenna elements or systems
    • H01Q17/007Devices for absorbing waves radiated from an antenna; Combinations of such devices with active antenna elements or systems with means for controlling the absorption
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01QANTENNAS, i.e. RADIO AERIALS
    • H01Q15/00Devices for reflection, refraction, diffraction or polarisation of waves radiated from an antenna, e.g. quasi-optical devices
    • H01Q15/0006Devices acting selectively as reflecting surface, as diffracting or as refracting device, e.g. frequency filtering or angular spatial filtering devices
    • H01Q15/0013Devices acting selectively as reflecting surface, as diffracting or as refracting device, e.g. frequency filtering or angular spatial filtering devices said selective devices working as frequency-selective reflecting surfaces, e.g. FSS, dichroic plates, surfaces being partly transmissive and reflective
    • H01Q15/002Devices acting selectively as reflecting surface, as diffracting or as refracting device, e.g. frequency filtering or angular spatial filtering devices said selective devices working as frequency-selective reflecting surfaces, e.g. FSS, dichroic plates, surfaces being partly transmissive and reflective said selective devices being reconfigurable or tunable, e.g. using switches or diodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01QANTENNAS, i.e. RADIO AERIALS
    • H01Q15/00Devices for reflection, refraction, diffraction or polarisation of waves radiated from an antenna, e.g. quasi-optical devices
    • H01Q15/0006Devices acting selectively as reflecting surface, as diffracting or as refracting device, e.g. frequency filtering or angular spatial filtering devices
    • H01Q15/0013Devices acting selectively as reflecting surface, as diffracting or as refracting device, e.g. frequency filtering or angular spatial filtering devices said selective devices working as frequency-selective reflecting surfaces, e.g. FSS, dichroic plates, surfaces being partly transmissive and reflective
    • H01Q15/004Devices acting selectively as reflecting surface, as diffracting or as refracting device, e.g. frequency filtering or angular spatial filtering devices said selective devices working as frequency-selective reflecting surfaces, e.g. FSS, dichroic plates, surfaces being partly transmissive and reflective using superconducting materials or magnetised substrates
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K9/00Screening of apparatus or components against electric or magnetic fields
    • H05K9/0073Shielding materials
    • H05K9/0081Electromagnetic shielding materials, e.g. EMI, RFI shielding
    • H05K9/0088Electromagnetic shielding materials, e.g. EMI, RFI shielding comprising a plurality of shielding layers; combining different shielding material structure

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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Laminated Bodies (AREA)

Abstract

The invention discloses a visible light transparent and performance-adjustable wave absorbing metamaterial, which consists of a bottom layer, a middle layer and a top layer, wherein the bottom layer is a graphene film reflecting layer, the middle layer is a transparent medium layer, the top layer is a graphene film wave absorbing layer, a narrow strip transparent silver electrode is arranged at the boundary between the graphene film wave absorbing layer and the transparent medium layer, a plurality of metamaterial periodic microstructure units are arranged on the graphene film wave absorbing layer, the metamaterial periodic microstructure units are arranged on the graphene film wave absorbing layer according to the sequence of unit period length a=10.0 mm, the basic structure is cross-shaped, the microstructure arm length b=6 mm, and the arm width b=2 mm. According to the invention, the graphene film and the transparent dielectric layer are used for replacing metal and dielectric layers in the traditional metamaterial, so that the metamaterial wave absorber has the functions of transparency for visible light and adjustable wave absorbing frequency band, and the defects that the traditional wave absorbing material is opaque, and the wave absorbing frequency band of the metamaterial wave absorber is narrow and fixed are overcome.

Description

Visible light transparent wave-absorbing metamaterial with adjustable performance
Technical Field
The invention relates to the technical field of wave-absorbing superconducting materials, in particular to a wave-absorbing metamaterial which is transparent in visible light and adjustable in performance.
Background
The information interaction window, such as a display screen of a comprehensive display control system, a photoelectric task load window, an equipment observation window and the like, has excellent optical performance (visible light transmittance is more than or equal to 80 percent) in the working process so as to ensure high definition of vision and smoothness of information transmission. The information interaction window is a weak link for the electronic equipment to realize integral electromagnetic protection, is also a main channel for coupling the front door of strong electromagnetic pulse radiation, and can cause electromagnetic interference and even permanent damage to digital circuit devices, network components and the like in the system through the front door coupling of the optical window. Electromagnetic shielding materials applied to optical windows must therefore achieve functional integration of electromagnetic wave absorption and optical transparency.
The electromagnetic protection film applied to the optical window at present is mainly a transparent conductive film, and has the compatibility of light transmission performance and shielding performance, but does not have wave absorbing performance. According to the design theory of electromagnetic protection materials, the wave resistance of the wave absorbing material is matched with the external space to guide electromagnetic waves into the material to realize attenuation. The transparent conductive layer film has good conductive performance, but has the main effect of reflecting electromagnetic waves, and cannot meet the design of the wave absorbing performance of the material.
The traditional wave-absorbing material mainly comprises ferrite, magnetic metal micro powder and carbon material, has excellent wave-absorbing performance, but does not have a visible light transparent function, and most of the traditional wave-absorbing materials have no function of adjustable performance.
Metamaterial or artificial electromagnetic material is artificial composite material formed by arranging periodic or aperiodic artificial micro structures. The metamaterial wave absorber mainly realizes the control of electromagnetic waves by changing conductive patterns, the pattern layer is a conductive film layer, and the wave absorbing frequency and the absorbing bandwidth are controlled by adjusting the pattern shape. However, once the metamaterial wave-absorbing structure is manufactured, the working performance of the metamaterial wave-absorbing structure is hard to change. For example Zhou Bi, an optical transparent and dual-band wave absorber based on a metamaterial is designed and manufactured in an equal mode, a basic unit of the wave absorber consists of an ITO cross microstructure patched structure, glass and an ITO film, the reflectivity of the material is smaller than-10 dB in the frequency ranges of 8.5-11GHz and 14.5-16.5GHz, and the light transmittance of a visible light region and a near infrared region reaches more than 70%, but the wave absorber does not have the function of frequency adjustability. Zhang et al designed a polarization insensitive tunable metamaterial absorber by embedding a varactor diode into the metamaterial, and could continuously control the absorption frequency of the design unit by adjusting the reverse bias voltage on the varactor diode, with a relative bandwidth of 30%, but without a visible light transmission function.
Therefore, there is a need to provide a wave-absorbing metamaterial which is transparent to visible light and has adjustable performance so as to solve the above problems.
Disclosure of Invention
The invention aims to solve the problems that: the traditional wave-absorbing material is opaque, and the metamaterial wave-absorbing body has the defects of narrow wave-absorbing frequency band and fixation.
In order to solve the problems, the invention provides a visible light transparent and performance-adjustable wave-absorbing metamaterial, which consists of a bottom layer, a middle layer and a top layer, wherein the bottom layer is a graphene film reflecting layer, the middle layer is a transparent medium layer, the top layer is a graphene film wave-absorbing layer, a narrow strip transparent silver electrode is arranged at the boundary between the graphene film wave-absorbing layer and the transparent medium layer, a plurality of metamaterial periodic microstructure units are arranged on the graphene film wave-absorbing layer according to the sequence of unit period length a=10.0 mm, the metamaterial periodic microstructure units are in a cross shape, the microstructure arm length b=6 mm and the arm width b=2 mm.
In a preferred embodiment of the scheme, the light transmittance of the graphene film reflecting layer is more than or equal to 85%, the sheet resistance is 20-300 Ω/sq, the graphene film reflecting layer is composed of 2-5 layers of single-layer graphene, the light transmittance of the single-layer graphene is more than or equal to 90%, and the sheet resistance is more than or equal to 500 Ω/sq.
In a preferred embodiment of the scheme, the transparent medium layer is made of transparent material used for an optical window of information equipment, and the thickness of the transparent material is 1.2mm, and the transparent material comprises optical glass, infrared-transmitting glass, an acrylic plate, polycarbonate, polyethylene terephthalate plastic, acrylonitrile-butadiene-styrene, polyvinyl chloride and polystyrene.
In a preferred embodiment of the scheme, the graphene film wave-absorbing layer consists of 2 layers of single-layer graphene films, the light transmittance of the single-layer graphene films is more than or equal to 90%, and the sheet resistance is more than or equal to 500 Ω/sq.
Further, metamaterial periodic microstructure units are arranged on two layers of single-layer graphene films of the graphene film wave-absorbing layer, and the metamaterial periodic microstructure units of the two layers are arranged in a staggered mode.
Further, the metamaterial periodic microstructure unit is prepared by a laser etching process.
In a preferred embodiment of the scheme, the width of the transparent silver electrode is 1-10 mm, the thickness of the transparent silver electrode is 5 mu m, the external bias voltage is 0-150V, and the fermi level of the corresponding graphene is 0-0.5eV.
In order to solve the problems, the invention also provides a preparation method of the visible light transparent and performance-adjustable wave-absorbing metamaterial, which comprises the following steps of:
s1, a graphene film reflecting layer: preparing single-layer graphene by using ethylene and methane as carbon sources and copper foil as a catalyst through a chemical vapor deposition method, transferring the single-layer graphene onto a transparent medium layer by using polymethyl methacrylate, and realizing the compounding of 2-5 layers of graphene on the transparent medium layer through lamination transfer;
s2, preparing a graphene film wave-absorbing layer: preparing a single-layer graphene film by using ethylene and methane as carbon sources and a copper foil as a catalyst through a chemical vapor deposition method, transferring the single-layer graphene film to a transparent dielectric layer through polymethyl methacrylate, preparing a metamaterial periodic microstructure unit on the surface of the single-layer graphene film through a laser etching process, superposing a layer of single-layer graphene film on the top after etching is finished, and finally preparing the metamaterial periodic microstructure unit on the single-layer graphene film on the top layer through the laser etching process;
s3, manufacturing a transparent silver electrode by adopting a screen printing or ink-jet printing process: the silver electrode had a thickness of 5 μm, a width of 2mm, a resistivity of about 1. Mu. Ω. Cm, and a light transmittance of 80%.
Further, in S1 and S2, transferring the graphene growing on the Cu foil onto the transparent dielectric layer, wherein the transfer process is as follows: spin-coating 46g/LPMMA solution on the graphene surface of Cu/graphene by using a spin-coater, wherein spin-coating parameters are 3000r/min and 1min; after air drying, cu/graphene/PMMA is placed in FeCl with the concentration of 1mol/L 3 Heat preservation is carried out for 3 hours at 50 ℃ in the solution, and Cu foil is removed; repeatedly cleaning PMMA/graphene samples in deionized water, and transferring to an intermediate medium layer optical SiO 2 Drying on glass at 70deg.C for 30min; and (3) placing the sample in an acetone solution with the temperature of 50 ℃ for constant temperature soaking for 8 hours, removing PMMA, transferring a layer of graphene film on the transparent medium layer through the operation, and transferring the lamination for multiple times according to the operation.
Further, the conditions of the laser etching process in S2 are: the laser power is 80W, the laser linewidth is 5 mu m, and the laser moving speed is 500mm/s.
The implementation of the invention has the following beneficial effects:
the visible light transparent and performance-adjustable metamaterial wave absorber adopts the graphene film to replace the traditional electromagnetic wave absorbers such as ferrite, metal micropowder and the like, so that the transparency of the wave absorbing material is realized; meanwhile, a double-layer metamaterial periodic structure array is prepared on the wave-absorbing layer graphene film, and electromagnetic wave absorption is realized by utilizing macroscopic response of the double-layer metamaterial periodic structure array to incident electromagnetic waves, so that functional fusion of visible light transmission and electromagnetic wave absorption is realized.
The visible light transparent metamaterial wave absorber with adjustable performance is characterized in that a transparent silver electrode is arranged at the boundary between a graphene film wave absorbing layer and an intermediate transparent medium layer; the conductivity of the graphene film can be regulated and controlled by changing the Fermi level through the external bias voltage, so that the conductivity is regulated and controlled, and the absorption performance of the absorber can be regulated and controlled through changing the external bias voltage.
Drawings
In order to more clearly illustrate the invention or the technical solutions of the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, it being obvious that the drawings in the description below are only some embodiments of the invention, and that other drawings can be obtained from them without inventive effort for a person skilled in the art.
FIG. 1 is a cross-sectional view of a visible light transparent and tunable property wave-absorbing metamaterial;
FIG. 2 is a diagram of a metamaterial periodic unit structure in a wave-absorbing layer;
FIG. 3 is an array diagram of metamaterial periodic unit structures of two layers in a wave-absorbing layer;
fig. 4 is a graph of the wave absorbing performance of the wave absorbing metamaterial wave absorber with transparent visible light and adjustable performance.
In the figure: the solar cell comprises a graphene film reflecting layer 1, a transparent dielectric layer 2, a graphene film wave absorbing layer 3, a single-layer graphene film 4, a transparent silver electrode 5, single-layer graphene 6, a lower-layer metamaterial periodic microstructure unit 7 and an upper-layer metamaterial periodic microstructure unit 8.
Detailed Description
The following description of the embodiments of the present invention will be made clearly and fully with reference to the accompanying drawings, in which it is evident that the embodiments described are only some, but not all embodiments of the invention. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
The invention provides a visible light transparent and performance-adjustable wave-absorbing metamaterial which consists of a bottom layer, a middle layer and a top layer, wherein the bottom layer is a graphene film reflecting layer 1, the middle layer is a transparent medium layer 2, and the top layer is a graphene film wave-absorbing layer 3. Referring to fig. 1, fig. 1 is a cross-sectional view of a visible light transparent and performance-adjustable wave-absorbing metamaterial.
The light transmittance of the graphene film reflecting layer is more than or equal to 85%, the sheet resistance is 20-300 omega/sq, the graphene film reflecting layer consists of 2-5 layers of single-layer graphene 6, the light transmittance of the single-layer graphene is more than or equal to 90%, and the sheet resistance is more than or equal to 500 omega/sq.
The transparent medium layer 2 is made of transparent material used for an optical window of information equipment, the thickness of the transparent material is 1.2mm, and the transparent material comprises optical glass, infrared-transmitting glass, an acrylic plate, polycarbonate, polyethylene terephthalate plastics, acrylonitrile-butadiene-styrene, polyvinyl chloride and polystyrene.
The graphene film wave absorbing layer 3 consists of 2 layers of single-layer graphene films 4, wherein the light transmittance of the single-layer graphene films is more than or equal to 90%, and the sheet resistance is more than or equal to 500 Ω/sq. The two layers of single-layer graphene films of the graphene film wave-absorbing layer are provided with metamaterial periodic microstructure units, and the metamaterial periodic microstructure units of the two layers are arranged in a staggered manner. The metamaterial periodic microstructure units are prepared by a laser etching process, are arranged on a graphene film wave-absorbing layer according to the sequence of the unit periodic length a=10.0 mm, and have a cross-shaped basic structure, wherein the microstructure arm length b=6 mm and the arm width b=2 mm. Referring to fig. 2-3, fig. 2 is a diagram of a metamaterial periodic unit structure in a wave-absorbing layer; FIG. 3 is an array diagram of metamaterial periodic unit structures of two layers in a wave-absorbing layer;
a narrow strip transparent silver electrode 5 is arranged at the boundary between the graphene film wave absorbing layer 3 and the transparent medium layer 2. The transparent silver electrode 5 has a width of 5mm and a thickness of 5 mu m, and has an external bias voltage of 0-150V, and the fermi level of the corresponding graphene is 0-0.5eV.
The technical scheme of the invention is described in detail below by specific embodiments:
a preparation method of a visible light transparent wave-absorbing metamaterial with adjustable performance comprises the following steps:
s1, a graphene film reflecting layer: preparing single-layer graphene by using ethylene and methane as carbon sources and copper foil as a catalyst through a chemical vapor deposition method, transferring the single-layer graphene onto a transparent medium layer by using polymethyl methacrylate, and realizing the compounding of 2 layers of graphene on the transparent medium layer through lamination transfer;
s2, preparing a graphene film wave-absorbing layer: preparing a single-layer graphene film by using ethylene and methane as carbon sources and a copper foil as a catalyst through a chemical vapor deposition method, transferring the single-layer graphene film to a transparent dielectric layer through polymethyl methacrylate, preparing a metamaterial periodic microstructure unit on the surface of the single-layer graphene film through a laser etching process, superposing a layer of single-layer graphene film on the top after etching is finished, and finally preparing the metamaterial periodic microstructure unit on the single-layer graphene film on the top layer through the laser etching process; the conditions of the laser etching process of the two layers are as follows: the laser power is 80W, the laser linewidth is 5 mu m, and the laser moving speed is 500mm/s.
S3, manufacturing a transparent silver electrode by adopting a screen printing or ink-jet printing process: the silver electrode had a thickness of 5 μm, a width of 2mm, a resistivity of about 1. Mu. Ω. Cm, and a light transmittance of 80%.
The transfer process for transferring the graphene growing on the Cu foil onto the transparent dielectric layer comprises the following steps: spin-coating 46g/LPMMA solution on the graphene surface of Cu/graphene by using a spin-coater, wherein spin-coating parameters are 3000r/min and 1min; after air drying, cu/graphene/PMMA is placed in FeCl with the concentration of 1mol/L 3 Heat preservation is carried out for 3 hours at 50 ℃ in the solution, and Cu foil is removed; repeatedly cleaning PMMA/graphene samples in deionized water, and transferring to an intermediate medium layer optical SiO 2 Drying on glass at 70deg.C for 30min; and (3) placing the sample in an acetone solution with the temperature of 50 ℃ for constant temperature soaking for 8 hours, removing PMMA, transferring a layer of graphene film on the transparent medium layer through the operation, and transferring the lamination for multiple times according to the operation.
The metamaterial structure, the transparent medium layer and the reflecting layer with high conductivity in the wave absorbing layer form an electromagnetic wave resonance loss structure together, induced current is excited in the metamaterial periodic structure, and the induced current generates heat so as to dissipate incident electromagnetic waves, so that the purpose of absorbing the electromagnetic waves is achieved.
The visible light transparent and performance-adjustable wave-absorbing metamaterial based on the graphene photoelectric performance, which is obtained by the method, has the light transmittance of 90% (380-1500 nm wave band, visible light and near infrared are covered), the working frequency band is the X wave band (8-12 GHz, the relative bandwidth is 25%), and the wave-absorbing body absorption rate is adjustable from 45% to 96% when the externally applied bias voltage is controlled to be changed between 0 and 150V. Referring to fig. 4, fig. 4 is a graph showing the wave absorbing performance of the wave absorbing metamaterial wave absorber with transparent visible light and adjustable performance.
According to the technical scheme, the graphene film and the transparent dielectric layer are used for replacing metal and dielectric layers in the traditional metamaterial, so that the metamaterial wave absorber has the functions of transparency for visible light and adjustable wave absorption frequency range, and the defects that the traditional wave absorber is opaque and the wave absorption frequency range of the metamaterial wave absorber is narrow and fixed are overcome.
The principle of the invention is as follows: graphene is formed from sp 2 The lattice of the two-dimensional plane crystal formed by the hybridized monolayer carbon atoms is a regular hexagonal honeycomb structure formed by orderly arranging the carbon atoms. In terms of light transmittance, the single-layer graphene film has a light transmittance of up to 98% in the near infrared and visible light bands, and even five-layer graphene has a light transmittance of up to 90%, and exhibits very excellent optical characteristics. In the aspect of electrical performance, the graphene has a symmetrical conical zero band gap structure, has extremely high electron and hole mobility, and the conductivity of the graphene can be regulated and controlled by changing the fermi level through externally applied bias voltage. Therefore, the graphene film is used for replacing a conductive film layer in the traditional metamaterial, so that the metamaterial wave absorber has the functions of visible light transparency and adjustable performance. The absorption performance is regulated by changing the externally applied bias voltage to regulate the conductivity of the graphene film.
The foregoing description of the preferred embodiments of the invention is not intended to be limiting, but rather is intended to cover all modifications, equivalents, alternatives, and improvements that fall within the spirit and scope of the invention.

Claims (10)

1. The visible light transparent and performance-adjustable wave-absorbing metamaterial is characterized by comprising a bottom layer, a middle layer and a top layer, wherein the bottom layer is a graphene film reflecting layer, the middle layer is a transparent medium layer, the top layer is a graphene film wave-absorbing layer, a narrow strip transparent silver electrode is arranged at the boundary between the graphene film wave-absorbing layer and the transparent medium layer, a plurality of metamaterial periodic microstructure units are arranged on the graphene film wave-absorbing layer, the metamaterial periodic microstructure units are arranged on the graphene film wave-absorbing layer according to the sequence of unit period length a=10.0 mm, the basic structure is cross-shaped, the microstructure arm length b=6 mm and the arm width b=2 mm.
2. The visible light transparent and performance-adjustable wave absorbing metamaterial according to claim 1, wherein the light transmittance of the graphene thin film reflecting layer is more than or equal to 85%, the sheet resistance is 20-300 Ω/sq, the graphene thin film reflecting layer is composed of 2-5 layers of single-layer graphene, the light transmittance of the single-layer graphene is more than or equal to 90%, and the sheet resistance is more than or equal to 500 Ω/sq.
3. The visible light transparent and performance adjustable wave absorbing metamaterial according to claim 1, wherein the transparent dielectric layer is made of a transparent material used for an optical window of information equipment, the thickness of the transparent material is 1.2mm, and the transparent material comprises optical glass, infrared transmitting glass, an acrylic plate, polycarbonate, polyethylene terephthalate plastic, acrylonitrile-butadiene-styrene, polyvinyl chloride and polystyrene.
4. The visible light transparent and performance-adjustable wave-absorbing metamaterial according to claim 1, wherein the graphene film wave-absorbing layer is composed of 2 layers of single-layer graphene films, the light transmittance of the single-layer graphene films is more than or equal to 90%, and the sheet resistance is more than or equal to 500 Ω/sq.
5. The visible light-transparent and performance-adjustable wave-absorbing metamaterial according to claim 4, wherein the two layers of single-layer graphene films of the graphene film wave-absorbing layer are provided with metamaterial periodic microstructure units, and the metamaterial periodic microstructure units of the two layers are arranged in a staggered manner.
6. The visible light transparent and adjustable performance wave absorbing metamaterial according to claim 5, wherein the metamaterial periodic microstructure units are prepared by a laser etching process.
7. The visible light transparent and performance-adjustable wave-absorbing metamaterial according to claim 1, wherein the width of the transparent silver electrode is 1-10 mm, the thickness of the transparent silver electrode is 5 μm, the externally applied bias voltage is 0-150V, and the fermi level of the corresponding graphene is 0-0.5eV.
8. The visible light transparent and performance-adjustable wave-absorbing metamaterial according to claim 1, wherein the preparation method of the visible light transparent and performance-adjustable wave-absorbing metamaterial comprises the following steps of:
s1, a graphene film reflecting layer: preparing single-layer graphene by using ethylene and methane as carbon sources and copper foil as a catalyst through a chemical vapor deposition method, transferring the single-layer graphene onto a transparent medium layer by using polymethyl methacrylate, and realizing the compounding of 2-5 layers of graphene on the transparent medium layer through lamination transfer;
s2, preparing a graphene film wave-absorbing layer: preparing a single-layer graphene film by using ethylene and methane as carbon sources and a copper foil as a catalyst through a chemical vapor deposition method, transferring the single-layer graphene film to a transparent dielectric layer through polymethyl methacrylate, preparing a metamaterial periodic microstructure unit on the surface of the single-layer graphene film through a laser etching process, superposing a layer of single-layer graphene film on the top after etching is finished, and finally preparing the metamaterial periodic microstructure unit on the single-layer graphene film on the top layer through the laser etching process;
s3, manufacturing a transparent silver electrode by adopting a screen printing or ink-jet printing process: the silver electrode had a thickness of 5 μm, a width of 2mm, a resistivity of about 1. Mu. Ω. Cm, and a light transmittance of 80%.
9. The visible light transparent and performance-adjustable wave-absorbing metamaterial according to claim 1, wherein in S1 and S2, graphene grown on a Cu foil is transferred onto a transparent dielectric layer, and the transfer process is as follows: spin-coating 46g/LPMMA solution on the graphene surface of Cu/graphene by using a spin-coater, wherein spin-coating parameters are 3000r/min and 1min; after air drying, cu/graphene/PMMA is placed in FeCl with the concentration of 1mol/L 3 Heat preservation is carried out for 3 hours at 50 ℃ in the solution, and Cu foil is removed; repeatedly cleaning PMMA/graphene samples in deionized water, and transferring to an intermediate mediumLayer optical SiO 2 Drying on glass at 70deg.C for 30min; and (3) placing the sample in an acetone solution with the temperature of 50 ℃ for constant temperature soaking for 8 hours, removing PMMA, transferring a layer of graphene film on the transparent medium layer through the operation, and transferring the lamination for multiple times according to the operation.
10. The visible light transparent and performance adjustable wave absorbing metamaterial according to claim 1, wherein the conditions of the laser etching process in S2 are as follows: the laser power is 80W, the laser linewidth is 5 mu m, and the laser moving speed is 500mm/s.
CN202311446985.6A 2023-11-02 2023-11-02 Visible light transparent wave-absorbing metamaterial with adjustable performance Pending CN117276912A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN118367362A (en) * 2024-06-19 2024-07-19 长春理工大学 Active metamaterial adjustable absorber based on ITO and varactor

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN118367362A (en) * 2024-06-19 2024-07-19 长春理工大学 Active metamaterial adjustable absorber based on ITO and varactor
CN118367362B (en) * 2024-06-19 2024-08-20 长春理工大学 ITO (indium tin oxide) -based material varactor diode active metamaterial adjustable wave absorber

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