CN117250679A - Multi-band heat insulation material capable of selectively utilizing atmospheric radiation - Google Patents
Multi-band heat insulation material capable of selectively utilizing atmospheric radiation Download PDFInfo
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- CN117250679A CN117250679A CN202311239210.1A CN202311239210A CN117250679A CN 117250679 A CN117250679 A CN 117250679A CN 202311239210 A CN202311239210 A CN 202311239210A CN 117250679 A CN117250679 A CN 117250679A
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- atmospheric radiation
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- 230000005855 radiation Effects 0.000 title claims abstract description 31
- 239000012774 insulation material Substances 0.000 title claims description 16
- 239000000758 substrate Substances 0.000 claims abstract description 27
- 238000010521 absorption reaction Methods 0.000 claims abstract description 24
- 239000000463 material Substances 0.000 claims abstract description 22
- 238000002310 reflectometry Methods 0.000 claims abstract description 10
- 229910052732 germanium Inorganic materials 0.000 claims description 11
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 11
- 239000005083 Zinc sulfide Substances 0.000 claims description 9
- 229910052984 zinc sulfide Inorganic materials 0.000 claims description 9
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 claims description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 8
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 6
- 229910052710 silicon Inorganic materials 0.000 claims description 5
- 239000010703 silicon Substances 0.000 claims description 5
- PFNQVRZLDWYSCW-UHFFFAOYSA-N (fluoren-9-ylideneamino) n-naphthalen-1-ylcarbamate Chemical compound C12=CC=CC=C2C2=CC=CC=C2C1=NOC(=O)NC1=CC=CC2=CC=CC=C12 PFNQVRZLDWYSCW-UHFFFAOYSA-N 0.000 claims description 3
- 239000004793 Polystyrene Substances 0.000 claims description 3
- OYLGJCQECKOTOL-UHFFFAOYSA-L barium fluoride Chemical compound [F-].[F-].[Ba+2] OYLGJCQECKOTOL-UHFFFAOYSA-L 0.000 claims description 3
- 229910001632 barium fluoride Inorganic materials 0.000 claims description 3
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 claims description 3
- 229910001634 calcium fluoride Inorganic materials 0.000 claims description 3
- 229920003229 poly(methyl methacrylate) Polymers 0.000 claims description 3
- 239000004926 polymethyl methacrylate Substances 0.000 claims description 3
- 229920002223 polystyrene Polymers 0.000 claims description 3
- 229920002635 polyurethane Polymers 0.000 claims description 3
- 239000004814 polyurethane Substances 0.000 claims description 3
- 239000000377 silicon dioxide Substances 0.000 claims description 3
- 235000012239 silicon dioxide Nutrition 0.000 claims description 3
- 239000004408 titanium dioxide Substances 0.000 claims description 3
- 229910052582 BN Inorganic materials 0.000 claims description 2
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 claims description 2
- 229910000618 GeSbTe Inorganic materials 0.000 claims description 2
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 2
- 150000004767 nitrides Chemical class 0.000 claims description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 2
- OCGWQDWYSQAFTO-UHFFFAOYSA-N tellanylidenelead Chemical compound [Pb]=[Te] OCGWQDWYSQAFTO-UHFFFAOYSA-N 0.000 claims description 2
- 239000010409 thin film Substances 0.000 claims 2
- 239000011810 insulating material Substances 0.000 claims 1
- 238000009413 insulation Methods 0.000 abstract description 8
- 238000004321 preservation Methods 0.000 abstract description 7
- 238000005265 energy consumption Methods 0.000 abstract description 5
- 230000017525 heat dissipation Effects 0.000 abstract description 3
- 239000010408 film Substances 0.000 description 16
- 230000000694 effects Effects 0.000 description 6
- 239000012788 optical film Substances 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- IXQKTGRUJMZBRU-UHFFFAOYSA-N [S-2].[Zn+2].[Ge+2].[S-2] Chemical compound [S-2].[Zn+2].[Ge+2].[S-2] IXQKTGRUJMZBRU-UHFFFAOYSA-N 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 239000004964 aerogel Substances 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005566 electron beam evaporation Methods 0.000 description 2
- 230000002401 inhibitory effect Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000002984 plastic foam Substances 0.000 description 2
- 239000000741 silica gel Substances 0.000 description 2
- 229910002027 silica gel Inorganic materials 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 230000008014 freezing Effects 0.000 description 1
- 238000007710 freezing Methods 0.000 description 1
- 238000011534 incubation Methods 0.000 description 1
- 229920001684 low density polyethylene Polymers 0.000 description 1
- 239000004702 low-density polyethylene Substances 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000002207 thermal evaporation Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0816—Multilayer mirrors, i.e. having two or more reflecting layers
- G02B5/085—Multilayer mirrors, i.e. having two or more reflecting layers at least one of the reflecting layers comprising metal
- G02B5/0875—Multilayer mirrors, i.e. having two or more reflecting layers at least one of the reflecting layers comprising metal the reflecting layers comprising two or more metallic layers
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/003—Light absorbing elements
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Laminated Bodies (AREA)
Abstract
The invention discloses a multiband selectively utilized atmosphere radiation heat preservation material, which comprises an infrared broadband high-absorption substrate and an infrared selective reflecting layer arranged on the surface of the substrate, and the infrared selective reflecting layer meets the following conditions: high absorption (absorption rate greater than 0.5) of light in the wavelength range of 5-8 μm; high reflection (reflectance greater than 0.5) of light in the wavelength range 8-13.5 μm; high absorption (absorption rate greater than 0.5) of light in the wavelength 13.5-16 μm band; high reflection (reflectivity greater than 0.5) of light in the wavelength range 16-25 μm. According to the invention, the infrared selective reflecting layer and the infrared broadband absorbing substrate are combined, so that the aim is insulated by utilizing the atmospheric radiation while the external heat dissipation of the atmospheric transparent window is restrained, and the energy consumption required by insulation is effectively reduced. In addition, the film structure is small in size, light in weight and easy to prepare and put into practical use.
Description
Technical Field
The invention relates to a multi-band thermal insulation material selectively utilizing atmospheric radiation, which is a novel thermal management material based on an optical film structure.
Background
Thermal insulation plays a vital role in many fields as an essential component of human production and life. Compared with the daytime solar radiation, the solar energy provides most of energy for the earth, and especially at night, the heat preservation difficulty is higher because no extra heat source exists. The temperature near the earth's ground can be reduced below freezing point due to the radiative heat transfer (3K) of the atmosphere transparent band (8-14 μm) to the outer space. For example, the night average air temperature in desert areas can reach-3.9 ℃, which constitutes a great threat to production and life. For agriculture, too low a temperature can damage plants, thereby reducing crop yield. For the power industry, high-voltage wires can frost and freeze, and potential safety hazards are brought to energy supply. Therefore, insulation has become a significant problem in many industries.
The current heat preservation comprises two modes, namely an active mode and a passive mode, wherein the active mode is an electric drive heater, an additional electric power supply system is needed, the energy consumption is high, and the carbon emission is aggravated. Passive approaches include the use of insulating blankets or low emissivity films to reduce heat loss, but these approaches are less efficient due to the absence of additional heat input. Thus, advanced low carbon, efficient and easy to implement incubation methods have not emerged in current research.
Disclosure of Invention
Aiming at the defects and shortcomings of the existing heat insulation materials, the invention provides an optical film structure with selective reflectivity/absorptivity in an infrared band, which has high absorptivity in infrared atmospheric radiation bands (5-8 mu m and 13.5-16 mu m) and high reflectivity in infrared atmospheric transparent bands (8-13.5 mu m and 16-25 mu m), thereby realizing efficient radiation heat management on the covered surface and reducing energy consumption caused by heat insulation.
A multi-band selective utilization atmosphere radiation heat insulation material comprises an infrared broadband high absorption substrate and an infrared selective reflection layer arranged on the surface of the substrate, and the infrared selective reflection layer meets the following conditions:
high absorption (absorption rate greater than 0.5) of light in the wavelength range of 5-8 μm;
high reflection (reflectance greater than 0.5) of light in the wavelength range 8-13.5 μm;
high absorption (absorption rate greater than 0.5) of light in the wavelength 13.5-16 μm band;
high reflection (reflectivity greater than 0.5) of light in the wavelength range 16-25 μm.
The invention combines an infrared broadband absorbing substrate and an infrared selective reflecting layer to realize high absorptivity in infrared atmospheric radiation wave bands (5-8 mu m, 13.5-16 mu m) and high reflectivity in infrared atmospheric transparent wave bands (8-13.5 mu m, 16-25 mu m) for high-efficiency radiation heat management of covered surfaces.
Preferably, the infrared selective reflecting layer is composed of high-refractive-index material film layers and low-refractive-index material film layers which are sequentially and alternately deposited on the substrate, and the innermost layer and the outermost layer are both high-refractive-index material film layers.
Preferably, the high refractive index material is selected from one or more of germanium, germanium antimony tellurium, lead telluride and the like; the low refractive index material is selected from one or more of zinc sulfide, zinc selenide, barium fluoride, calcium fluoride and the like.
Preferably, the infrared broadband high-absorption substrate material is oxide (such as silicon dioxide, titanium dioxide), nitride (such as silicon nitride, boron nitride and the like) or organic matter (such as polymethyl methacrylate, polyurethane, polystyrene and the like).
Preferably, the high refractive index material is germanium; the low refractive index material is selected from one or more of zinc sulfide, zinc selenide, barium fluoride and calcium fluoride.
As a further preference, the high refractive index material is germanium and the low refractive index material is zinc sulfide.
Preferably, the total number of the infrared selective reflecting layers is 3-20, and the whole thickness is 1-100 μm.
Preferably, the infrared selective reflecting layer is deposited on the infrared broadband absorption substrate by means of magnetron sputtering, thermal evaporation, electron beam evaporation or the like.
As a further preferable scheme, in the germanium-zinc sulfide multilayer optical film system structure, from the light incident direction to the substrate, the thicknesses of the layers in sequence are as follows: germanium 0.747 μm, zinc sulfide 0.908 μm, germanium 0.712 μm, zinc sulfide 1.006 μm, germanium 0.765 μm.
Preferably, the infrared broadband absorbing substrate material is silicon wafer, silicon dioxide, titanium dioxide, polymethyl methacrylate, polyurethane or polystyrene. The thickness is far greater than the wavelength of infrared (5-25 μm), such as 100 μm or more, and more preferably 100-1000 μm.
Taking the above preferred scheme as an example, the infrared broadband high-absorption substrate and the infrared selective reflecting layer arranged on the surface of the substrate can realize the absorption rate of 0.7 in the infrared atmospheric radiation wave band (5-8 mu m and 13.5-16 mu m) and the reflectivity of 0.84 in the infrared atmospheric transparent wave band (8-13.5 mu m and 16-25 mu m).
The substrate is used for providing support for the infrared selective reflecting layer, and besides a special substrate, the surface of a building and the surface of other coverings can be selected, or clothes, other coating surfaces and the like can be selected.
Compared with the prior art, the invention has the beneficial effects that:
(1) The infrared absorption rate is regulated and controlled, and the invention utilizes the atmospheric radiation as an external heat source to realize heat gain under the condition of no electric input;
(2) According to the invention, through reasonably selecting the absorption/reflection interval of the infrared band, the radiation heat management efficiency is improved, and the energy consumption caused by heat preservation is reduced;
(3) The invention adopts an optical film structure, has small overall size and light weight, and is easy to prepare and practical.
(4) The heat insulation material has heat insulation and condensation resistance effects.
In summary, the invention combines the infrared selective reflecting layer and the infrared broadband absorbing substrate, realizes the heat preservation of the target by utilizing the atmospheric radiation while inhibiting the external heat dissipation of the atmospheric transparent window, and effectively reduces the energy consumption required by heat preservation. In addition, the film structure is small in size, light in weight and easy to prepare and put into practical use.
Drawings
Fig. 1 shows a schematic diagram of the present invention applied to radiant heat management.
FIG. 2 is a schematic diagram of a germanium-zinc sulfide multilayer optical film structure and an infrared broadband absorbing substrate and a spectral chart of infrared emissivity/absorptivity in an embodiment of the invention.
FIG. 3 shows a thermal insulation effect testing device in an embodiment of the present invention.
Fig. 4 shows the results of a test of the inventive example against a low emissivity insulation film and an exposed surface.
Detailed Description
The following detailed description of specific embodiments of the invention refers to the accompanying drawings: the present embodiment is based on the present invention, but the scope of the present invention is not limited to the following embodiments and examples.
As shown in FIG. 1, the radiant heat transfer model mainly includes objects on the earth's surface, the atmosphere (290K), and outer space (3K). The object and the atmosphere directly exchange radiant heat, and the object and the atmosphere exchange radiant heat through the atmosphere transparent window and the outer space.
Typical surfaces such as houses, roofs and floors are high emissivity/absorptivity objects that both absorb radiation from the atmosphere and dissipate heat to the outer space through an atmospheric transparent window, but the outer space is extremely low in temperature and therefore has a greater heat loss. For surfaces covered with a low emissivity film, the broad band low emissivity can suppress outer space radiation but also isolate radiant energy from the atmosphere, so net heat loss is always greater than 0. The invention provides a thermal insulation material selectively utilizing atmospheric radiation, which has high reflectivity in infrared atmospheric transparent wave bands (8-13.5 mu m and 16-25 mu m), has high absorptivity in infrared atmospheric radiation wave bands (5-8 mu m and 13.5-16 mu m), and can insulate a target by using atmospheric radiation while inhibiting external heat dissipation of an atmospheric transparent window.
As shown in fig. 2, the thermal insulation material selectively utilizing atmospheric radiation provided by the invention consists of a high-low refractive index film system and an infrared broadband absorption substrate which are deposited alternately. The high-low refractive index film system adopts a germanium-zinc sulfide multilayer optical film structure (the thicknesses of all layers are 0.747 mu m germanium, 0.908 mu m zinc sulfide, 0.712 mu m germanium, 1.006 mu m zinc sulfide and 0.765 mu m germanium from the light incidence direction to the substrate), the infrared broadband absorption substrate is a silicon wafer (the thickness is 0.5 mm), and the film system is deposited on the surface of the silicon wafer by adopting an electron beam evaporation mode. The emissivity/absorptivity of the whole finally obtained material is 0.16 in the infrared atmosphere transparent wave band (8-13.5 μm, 16-25 μm), namely the reflectivity reaches 0.84, and 0.7 in the infrared atmosphere radiation wave band (5-8 μm, 13.5-16 μm).
FIG. 3 shows a thermal insulation effect test device, wherein in order to demonstrate the effect of radiant heat regulation, a plastic foam box coated with aluminum foil and aerogel are used for isolating heat conduction from the transverse direction and the bottom, and a low-density polyethylene film is used for isolating heat convection above the plastic foam box and the aerogel; the inside of the box body adopts a silica gel plate to simulate the general high-emissivity surface, an experimental group (the invention) and a control group (a low-emissivity film: a silicon wafer and a 100nm chromium film) are covered on the surface of the silica gel plate, and a thermocouple and a heat flow meter are used for recording the real-time temperature and the heat flux.
Fig. 4 shows the test results, and shows that the temperature of the experimental group is increased by 4.4 ℃ compared with the blank group (the exposed surface: the film of the invention or the low-emissivity film is not added), and the temperature of the experimental group is increased by 2.1 ℃ compared with the control group (the low-emissivity film), so that the heat preservation effect is remarkable and the duration time is long. As can be seen by comparing the temperatures of the groups with the dew point, the temperature of the experimental group is always far higher than the dew point temperature, and the temperature of the blank group can be reduced below the dew point in the experiment, which proves that the heat insulation material provided by the invention has the anti-condensation effect.
Claims (8)
1. A multi-band heat insulating material selectively utilizing atmospheric radiation is characterized in that,
the infrared broadband high-absorption substrate comprises an infrared broadband high-absorption substrate and an infrared selective reflecting layer arranged on the surface of the substrate, and the infrared broadband high-absorption substrate meets the following conditions:
the absorption rate of the light with the wavelength of 5-8 mu m is more than 0.5;
high reflection to light with the wavelength of 8-13.5 mu m, and the reflectivity is more than 0.5;
the light with the wavelength of 13.5-16 mu m is highly absorbed, and the absorptivity is more than 0.5;
high reflection to light with the wavelength of 16-25 mu m, and the reflectivity is more than 0.5.
2. The multi-band selective atmospheric radiation thermal insulation material of claim 1, wherein the infrared selective reflection layer is composed of thin film layers of high and low refractive index materials alternately arranged on the substrate in sequence, and the innermost layer and the outermost layer are both thin film layers of high refractive index materials.
3. The multi-band selective use atmospheric radiation thermal insulation material of claim 2, wherein the high refractive index material is selected from one or more of germanium, germanium antimony tellurium, lead telluride; the low refractive index material is selected from one or more of zinc sulfide, zinc selenide, barium fluoride and calcium fluoride.
4. The multi-band selective use atmospheric radiation thermal insulation material of claim 1, wherein the infrared broadband highly absorptive substrate material is silicon, oxide, nitride, or organic; the thickness is 100-1000 mu m.
5. The multi-band selective use atmospheric radiation thermal insulation material of claim 4, wherein the infrared broadband high absorption substrate material is one or more of silicon dioxide, titanium dioxide, silicon nitride, boron nitride, polymethyl methacrylate, polyurethane, polystyrene.
6. The multi-band selective use atmospheric radiation thermal insulation material of claim 2, wherein the high refractive index material is germanium and the low refractive index material is zinc sulfide.
7. The multi-band selective use atmospheric radiation thermal insulation material according to claim 1 or 2, wherein the total number of layers of the infrared selective reflection layer is 3-20 layers, and the overall thickness is 1-100 μm.
8. The multi-band selective use atmospheric radiation thermal insulation material according to claim 1 or 2, wherein the absorption rate in the infrared atmospheric radiation band is 0.7 and the reflectance in the infrared atmospheric transparent band is 0.84.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202311239210.1A CN117250679A (en) | 2023-09-25 | 2023-09-25 | Multi-band heat insulation material capable of selectively utilizing atmospheric radiation |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202311239210.1A CN117250679A (en) | 2023-09-25 | 2023-09-25 | Multi-band heat insulation material capable of selectively utilizing atmospheric radiation |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN117250679A true CN117250679A (en) | 2023-12-19 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202311239210.1A Pending CN117250679A (en) | 2023-09-25 | 2023-09-25 | Multi-band heat insulation material capable of selectively utilizing atmospheric radiation |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN117250679A (en) |
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2023
- 2023-09-25 CN CN202311239210.1A patent/CN117250679A/en active Pending
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