CN117206274A - Graphite boat plasma cleaning device and cleaning method - Google Patents
Graphite boat plasma cleaning device and cleaning method Download PDFInfo
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- CN117206274A CN117206274A CN202311198592.8A CN202311198592A CN117206274A CN 117206274 A CN117206274 A CN 117206274A CN 202311198592 A CN202311198592 A CN 202311198592A CN 117206274 A CN117206274 A CN 117206274A
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- 239000010439 graphite Substances 0.000 title claims abstract description 120
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- 238000004140 cleaning Methods 0.000 title claims abstract description 92
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- 238000005192 partition Methods 0.000 claims description 12
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- 230000001939 inductive effect Effects 0.000 claims description 10
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- QKCGXXHCELUCKW-UHFFFAOYSA-N n-[4-[4-(dinaphthalen-2-ylamino)phenyl]phenyl]-n-naphthalen-2-ylnaphthalen-2-amine Chemical compound C1=CC=CC2=CC(N(C=3C=CC(=CC=3)C=3C=CC(=CC=3)N(C=3C=C4C=CC=CC4=CC=3)C=3C=C4C=CC=CC4=CC=3)C3=CC4=CC=CC=C4C=C3)=CC=C21 QKCGXXHCELUCKW-UHFFFAOYSA-N 0.000 claims description 3
- SFZCNBIFKDRMGX-UHFFFAOYSA-N sulfur hexafluoride Chemical compound FS(F)(F)(F)(F)F SFZCNBIFKDRMGX-UHFFFAOYSA-N 0.000 claims description 3
- 229960000909 sulfur hexafluoride Drugs 0.000 claims description 3
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 claims description 3
- UBAZGMLMVVQSCD-UHFFFAOYSA-N carbon dioxide;molecular oxygen Chemical compound O=O.O=C=O UBAZGMLMVVQSCD-UHFFFAOYSA-N 0.000 claims description 2
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
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- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
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- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
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Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Drying Of Semiconductors (AREA)
Abstract
The invention provides a graphite boat plasma cleaning device and a cleaning method, wherein the graphite boat plasma cleaning device comprises a reaction chamber, the reaction chamber is provided with a reaction cavity for accommodating a graphite boat, an offset electrode plate is arranged in the reaction cavity, an insulating block for supporting the graphite boat is arranged on the offset electrode plate, the offset electrode plate is electrically connected with an offset power supply arranged outside the reaction cavity, a plurality of mounting holes are formed in the top of the reaction chamber, plasma generators are hermetically arranged in the mounting holes, the plasma generators are uniformly distributed along the length direction of the reaction chamber, the ionization power of each plasma generator is independently controlled, a gas introducing assembly is arranged at the top of the reaction cavity, the gas introducing assembly comprises a plurality of gas homogenizing parts, the position of a gas outlet of each gas homogenizing part corresponds to the position of one plasma generator, and the gas outlet of each gas homogenizing part is independently regulated. The technology of the invention can realize uniform and effective cleaning of the surface of the graphite boat workpiece with large size and complex structure.
Description
Technical Field
The invention relates to the technical field of solar cell production equipment, in particular to a graphite boat plasma cleaning device and a cleaning method.
Background
The tunneling silicon oxide passivation contact (TOPCon) is a high-efficiency solar technology which is widely focused by the photovoltaic community in recent years, and the core of the technology is to spatially separate the metal contact on the back surface of the solar cell from the crystalline silicon body absorption layer by utilizing ultra-thin silicon oxide and highly doped polysilicon, so that the metal/semiconductor contact recombination in the conventional aluminum back surface field or PERC solar cell is effectively reduced, and the efficiency of the solar cell is effectively improved. The mass production limiting efficiency of PERC battery is about 23.5%, while the current mass production efficiency of TOPCO battery has reached 24.5% -25.5%, and the efficiency is still being improved; in addition, TOPCon batteries have the advantages of high cost performance, high profitability and the like, and are widely accepted by industry. At present, TOPCon batteries have become a main technical route for expanding production of the photovoltaic industry, the productivity is rapidly expanded, and the trend of replacing PERC batteries is shown.
In the TOPCon solar cell production process, the tunneling oxide layer ultra-thin silicon oxide and the highly doped polysilicon are generally prepared by using a tubular plasma enhanced chemical vapor deposition (tubular PECVD), and in the growth process of the tunneling oxide layer and the highly doped polysilicon prepared by tubular PECVD, a carrier for carrying the crystalline silicon cell is required to be used, which is called a graphite boat. In the preparation process of the PECVD process, the graphite boat carries the crystalline silicon battery piece to be immersed in the PECVD reaction cavity, so that silicon oxide and doped polysilicon materials deposited on the battery piece can be deposited on the surfaces of all structures of the graphite boat, and after a film deposited on the graphite boat reaches a certain thickness, the resistance value between the boat leaves of the graphite boat, which are mutually positive and negative, can be influenced due to the weak conductivity of the highly doped polysilicon, so that the PECVD deposition reaction growth rate is influenced, and the stability of the battery piece production process is reduced. Therefore, after a period of use, the graphite boat needs to be cleaned to remove the surface deposited silicon oxide and doped polysilicon material.
For cleaning graphite boats, a wet cleaning method is generally adopted in the industry at present, namely, the graphite boat is soaked in an acid or alkaline cleaning solution to clean silicon oxide and highly doped polysilicon materials deposited on the graphite boat, the method needs to separate all parts on the graphite boat, the treatment process time and concentration of acid and alkali soaking are strictly controlled according to the severity of deposition on different parts, and finally, water is required to be removed through soaking in pure water, flushing and high-temperature baking for a long time. Therefore, the wet cleaning process is longer, about 24 hours to 36 hours are needed, the efficiency is low, and the condition of disjointing with the productivity of process equipment is easy to cause; the cleaning operation process needs the steps of manual intervention disassembly, process time monitoring and the like, so that the damage to the graphite boat, insufficient cleaning or excessive cleaning are easily caused, and the PECVD process stability using the graphite boat is also influenced to a certain extent; in addition, the pollution generated after the acid and alkali soaking cleaning liquid used in the wet cleaning and the pure water used in the wet cleaning are soaked can have great influence on environmental protection.
To overcome the defects of the wet cleaning process, chinese patent CN115954406A provides a microwave plasma dry etching process for cleaning a graphite boat for photovoltaic production. The technology inputs plasmas generated by the action of a remote microwave plasma system into a process cavity with a graphite boat, applies an alternating electric field generated by a radio frequency power supply to the graphite boat in the process cavity, and drives the plasmas to bombard the graphite boat through the alternating electric field so as to remove films deposited on the graphite boat. However, because the graphite boat has larger size and complex structure, the corresponding process cavity has larger volume, and the gas distribution in the process cavity of the patent technology cannot be controlled; and only one plasma source is provided, so that the plasma has a limited scope of action; the plasma in the horizontal direction can generate gradient difference, so that the surface of the graphite boat cannot be uniformly cleaned; the positions where the partially deposited films are thicker cannot be effectively cleaned, and in summary, the cleaning effect is poor, and the silicon oxide and doped polysilicon materials deposited on the surface of the graphite boat cannot be completely removed.
Disclosure of Invention
Aiming at the defects of the prior art, the invention aims to solve the problems of improving the cleaning effect of graphite boat plasma cleaning equipment and realizing uniform and effective cleaning of the surface of a large-size and complex-structure graphite boat workpiece.
In order to solve the problems, according to one aspect of the present invention, a graphite boat plasma cleaning device is provided, which comprises a reaction chamber, wherein the reaction chamber is provided with a reaction chamber for accommodating a graphite boat, a bias electrode plate is arranged in the reaction chamber, an insulating block for supporting the graphite boat is arranged on the bias electrode plate, the bias electrode plate is electrically connected with a bias power supply arranged outside the reaction chamber, a plurality of mounting holes are formed in the top of the reaction chamber, plasma generators are hermetically arranged in the mounting holes, the plasma generators are uniformly distributed along the length direction of the reaction chamber, ionization power of each plasma generator is independently controlled, a gas introducing assembly is arranged at the top of the reaction chamber, the gas introducing assembly comprises a plurality of gas homogenizing components, the position of a gas outlet of each gas homogenizing component corresponds to the position of one plasma generator, and the gas outlet of each gas homogenizing component is independently adjusted.
Compared with the prior art, the invention has the advantages that the plurality of groups of plasma generators which can be independently controlled are arranged at the top of the reaction chamber, the gas homogenizing components which can be independently adjusted are arranged at the corresponding positions of the plasma generators, and the plasma generators are combined to act, so that the problems of limited plasma action range and gradient difference in the horizontal direction of the plasma are overcome, and the uniform and effective cleaning of the surface of a large-size graphite boat workpiece with a complex structure can be realized. The offset electrode plate arranged below the graphite boat is used for attracting the plasmas to bombard the surface of the graphite boat, so that the plasmas penetrate through the whole space in the height direction of the graphite boat, the cleaning reaction rate is improved, and the uniform cleaning of the surface is realized. In a preferred or alternative scheme, the plasma generator comprises an inductance coupling coil and a baffle plate, wherein the baffle plate is arranged in the mounting hole in a sealing way, and the inductance coupling coil is arranged above the corresponding baffle plate. The invention adopts the inductively coupled plasma to clean the polysilicon material attached to the surface of the graphite boat, and has the advantages of high cleaning speed, high selection ratio, small etching damage, good large-area uniformity, high contour controllability, flat and smooth etching surface and the like.
In a preferred or alternative scheme, the inductance coupling coil is in a spiral disc-shaped structure, and the diameter of the inductance coupling coil is larger than 1/3 of the width of the graphite boat. The inductance coupling coil with the spiral disc-shaped structure can ensure that the plasma concentration in the working range is uniform, the relation between the diameter of the inductance coupling coil and the width of the graphite boat is limited, the plasma concentration of each part in the reaction cavity along the width direction of the graphite boat is ensured to be uniform, and the effect of uniformly cleaning the surface of the graphite boat is achieved.
In a preferred or alternative scheme, the graphite boat plasma cleaning device further comprises a reciprocating mechanism for controlling the inductance coupling coil to horizontally reciprocate along the length and/or width direction of the graphite boat. The reciprocating mechanism can control the inductance coupling coil to move, so that the concentration gradient difference of plasmas in the horizontal direction of the graphite boat is balanced to the greatest extent, and the cleaning uniformity is improved.
In a preferred or alternative aspect, the separator is made of ceramic. The partition board is made of ceramic materials with low dielectric coefficients, so that electromagnetic field interference is avoided, and electromagnetic induction coupling is not blocked.
In a preferred or alternative scheme, a shielding plate made of conductive materials is arranged below the partition plate, and the shielding plate is partially hollowed out. And a shielding plate with a hollowed-out design is arranged and is used for shielding the capacitive impedance excited by the radio frequency.
In a preferred or alternative, the gas homogenizing component is a gas distribution pipe or a shower plate. The gas homogenizing component has a gas homogenizing effect and ensures the uniform distribution of plasmas; the gas homogenizing component is also made of a material with low dielectric coefficient, and electromagnetic induction coupling of reaction gas can not be blocked.
In a preferred or alternative scheme, the gas homogenizing component and the shielding plate can be designed into a whole, namely, the spraying plate of the gas homogenizing component is made of metal materials and is made into a hollowed structure, and a gas homogenizing pipeline is made in the structure body and sprayed out through a tiny hole, so that the effects of homogenizing gas and shielding capacitive impedance are achieved.
A second aspect of the present invention provides a method for cleaning a graphite boat plasma, using the above-described graphite boat plasma cleaning apparatus, the cleaning method comprising the steps of:
s1, conveying a graphite boat into a reaction cavity, installing the graphite boat above a bias electrode plate, insulating the contact position of the bias electrode plate and the graphite boat, and applying bias voltage to the bias electrode plate;
s2, vacuumizing the reaction cavity to confirm that the reaction cavity is free of leakage;
s3, filling reaction gas into the reaction cavity through the gas introduction assembly, wherein the reaction gas comprises fluorine-containing gas and carrier gas, and controlling the cavity pressure of the reaction cavity;
s4, starting the plasma generators, cleaning in the first stage, controlling the ionization power of each plasma generator to be the same, and controlling the gas flow of the reaction gas introduced by each gas homogenizing component to be the same as the proportion of fluorine-containing gas;
s5, cleaning in a second stage, controlling different ionization powers of the plasma generators, and enabling the gas flow and the components of the reaction gas to be different through the gas homogenizing components;
s6, after the cleaning is finished, closing the plasma generator, introducing inert gas into the reaction cavity for purging, and taking out the cleaned graphite boat.
The plasma cleaning device is adopted to clean the graphite boat, the ionization power of each plasma generator can be independently controlled, the gas flow rate and the proportion of fluorine-containing gas of each gas homogenizing module can be independently controlled, and the graphite boat can be cleaned in a targeted manner according to the structure of the graphite boat; the main body cleaning process is carried out in two stages, wherein the first stage is a primary cleaning stage for reducing the thickness of a film on the surface of the graphite boat, the second stage is a targeted cleaning stage for targeted control of the local concentration of plasma and effective cleaning of the position with thicker local deposition on the graphite boat.
In a preferred or alternative manner, in the step S5, along the direction in which the graphite boat enters the reaction chamber, the ionization power of each plasma generator is gradually reduced, and the proportion of the fluorine-containing gas in the reaction gas introduced into each gas homogenizing component is gradually reduced. In the preparation process of PECVD technology, the thickness of the thin film on the surface of the graphite boat is distributed in a gradient manner along the length direction, and according to the characteristic, the ionization power of the plasma generator and the proportion of fluorine-containing gas in the reaction gas are regulated and controlled in a targeted cleaning stage, so that the thin film with thicker local deposition on the graphite boat can be cleaned.
In a preferred or alternative scheme, the fluorine-containing gas is selected from one or more of nitrogen trifluoride, carbon tetrafluoride and sulfur hexafluoride, the carrier gas is selected from one or more of argon, hydrogen, oxygen and carbon dioxide, and the inert gas is selected from one or more of nitrogen, helium and argon. The ionized fluorine ion of the fluorine-containing gas is utilized to react with silicon element in the film to generate gaseous chemical molecules which are discharged through vacuum, thereby achieving the aim of cleaning the graphite boat substrate.
In summary, the invention has the following beneficial effects:
1) The invention arranges a plurality of plasma generators at different positions in the reaction cavity, and each plasma generator corresponds to one gas homogenizing component, thereby effectively compensating the influence of the limit of the plasma action range and the gradient difference of the plasma in the horizontal direction and achieving the purpose of uniformly cleaning the surface of the graphite boat body.
2) The invention is provided with the offset electrode plate below the graphite boat to attract the plasma to bombard the surface of the graphite boat, and compared with the direct application of voltage on the graphite boat, the technical proposal of the invention is beneficial to leading the plasma to penetrate through the whole space of the height direction of the graphite boat, improving the cleaning reaction rate and realizing the uniform cleaning of the surface
3) The method adopts the inductively coupled plasma mode to clean the film material attached on the graphite boat, and has the advantages of high cleaning speed, high selection ratio, small etching damage, good large-area uniformity, high contour controllability, flat and smooth etching surface and the like.
4) The ionization power of each plasma generator can be controlled independently, and the gas flow and the ratio of each gas homogenizing component can be controlled independently, so that the local concentration of plasma can be controlled in a targeted manner, and the compensation effect is realized on the position of the graphite boat where the local deposition is thicker.
5) The cleaning method adopts step cleaning, the first step is a preliminary cleaning stage to thin the whole deposited film on the surface of the graphite boat, and the second step is a targeted cleaning stage to control the plasma concentration according to the deposited thickness of each part, so as to realize uniform and effective cleaning on the surface of the graphite boat.
Drawings
FIG. 1 is a schematic diagram of a graphite boat plasma cleaning apparatus in an embodiment of the present invention;
fig. 2 is a cross-sectional view showing an internal structure of a plasma generator according to an embodiment of the present invention.
Reference numerals illustrate:
the device comprises a 1-reaction chamber, a 11-reaction chamber, a 12-boat inlet end cover, a 13-exhaust end cover, a 2-plasma generator, a 21-inductance coupling coil, a 22-partition board, a 23-radio frequency power supply, a 3-shielding plate, a 4-reciprocating mechanism, a 5-gas introducing component, a 51-gas homogenizing component, a 6-bias electrode plate, a 61-insulating block, a 62-bias power supply and a 7-graphite boat.
Detailed Description
For the purpose of making the objects, technical solutions and advantages of the embodiments of the present invention more apparent, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention, and it is apparent that the described embodiments are some embodiments of the present invention, but not all embodiments of the present invention. The components of the embodiments of the present invention generally described and illustrated in the figures herein may be arranged and designed in a wide variety of different configurations.
It should be noted that: like numerals and letters indicate like items in the following figures, and thus once an item is defined in one figure, no further definition or explanation thereof is necessary in the following figures.
In the description of the present invention, it should be noted that, unless explicitly specified and limited otherwise, the terms "mounted," "configured," "connected," and the like are to be construed broadly and include, for example, "connected," either permanently connected, detachably connected, or integrally connected; can be mechanically or electrically connected; can be directly connected or indirectly connected through an intermediate medium, and can be communication between two elements. The specific meaning of the above terms in the present invention will be understood in specific cases by those of ordinary skill in the art.
The preferred embodiments of the present invention will be described below with reference to the accompanying drawings, it being understood that the preferred embodiments described herein are for illustration and explanation of the present invention only, and are not intended to limit the present invention.
Referring to fig. 1 and 2, an embodiment of the present invention provides a graphite boat plasma cleaning apparatus, comprising a reaction chamber 1, the reaction chamber 1 having a reaction chamber 11 for accommodating a graphite boat 7. The reaction chamber 1 is in a cuboid structure or an approximately cuboid structure, two sides of the length direction of the reaction chamber are provided with an inlet boat end cover 12 and an exhaust end cover 13 which can be opened and closed, the graphite boat 7 is suitable for entering the reaction chamber 11 from one side of the inlet boat end cover 12, and the exhaust end cover 13 is provided with an exhaust pipeline (not shown in the figure) connected with a vacuum system. The reaction chamber 11 is internally provided with a bias electrode plate 6, an insulating block for supporting the graphite boat 7 is arranged on the bias electrode plate, and the bias electrode plate 6 is electrically connected with a bias power supply 62 arranged outside the reaction chamber 11, so that bias voltage can be applied to the bias electrode plate 6, the bias electrode plate 6 has potential difference relative to plasma, the plasma is attracted to bombard the graphite boat 7 above the bias electrode plate 6, the cleaning reaction rate is improved, and the arrangement mode of the bias electrode plate 6 and the graphite boat 7 is favorable for the plasma to penetrate through the whole space in the height direction of the graphite boat 7, so that uniform surface cleaning is realized.
The top of the reaction chamber 1 is provided with a plurality of mounting holes, plasma generators 2 are arranged in the mounting holes in a sealing manner, the plasma generators 2 are uniformly distributed along the length direction of the reaction chamber 1, and the plasma generators 2 are electrically connected with a radio frequency power supply 23. The plasma generators 2 act together to overcome the problem that the plasma has a limited range of application and a gradient difference in the horizontal direction, and the plasma concentration at each part in the reaction chamber 11 is uniform. The top of the reaction chamber 11 is also provided with a gas introduction component 5 for inputting reaction gas into the reaction chamber 11, the gas introduction component 5 comprises a plurality of gas homogenizing components 51, the gas outlet position of each gas homogenizing component 51 corresponds to the position of one plasma generator 2, and the gas introduction component 5 plays a role in homogenizing gas, so that plasma concentration of each part in the reaction chamber 11 is more uniform. By arranging a plurality of plasma generators 2 and corresponding gas homogenizing parts 51, the plasma cleaning device can realize uniform cleaning of the surface of a workpiece of the graphite boat 7 with large size and complex structure.
Further, the ionization power of each plasma generator 2 is independently controlled, and the gas outlet of each gas homogenizing part 51 is independently regulated. Therefore, the local concentration of the plasmas can be controlled in a targeted manner, and the compensation cleaning is performed on the position with thicker local deposition on the graphite boat 7, so that the cleaning effect is improved.
As shown in fig. 2, the plasma generator 2 includes an inductance coupling coil 21 and a partition plate 22, the partition plate 22 being hermetically disposed in the mounting hole, the inductance coupling coil 21 being mounted above the corresponding partition plate 22. The inductive coupling coil 21 is connected to a radio frequency power supply 23 for generating a high temperature plasma and for balancing and sustaining ionization of the plasma by the pushing of the gas. The spacer 22 is made of a material with a low dielectric constant, preferably a ceramic such as alumina, aluminum nitride, boron nitride, etc., and the spacer 22 has little interference to electromagnetic fields and does not block electromagnetic inductive coupling. The method for cleaning the polysilicon material attached to the surface of the graphite boat 7 by using the inductively coupled plasma has the advantages of high cleaning speed, high selection ratio, small etching damage, good large-area uniformity, high contour controllability, flat and smooth etching surface and the like.
Preferably, a shielding plate 3 made of conductive materials is arranged below the partition plate 22, and the shielding plate 3 is partially hollowed out and is used for shielding the capacitive impedance excited by radio frequency.
In this embodiment, the inductance coupling coil 21 has a spiral disc structure, the inductance coupling coil 21 with the spiral disc structure can make the plasma concentration in the working range uniform, and the diameter of the inductance coupling coil 21 is 1/2 of the width of the graphite boat 7, so as to ensure that the plasma concentration in each part along the width direction of the graphite boat 7 in the reaction chamber 11 is uniform. In other embodiments, the diameter of the inductive coupling coil 21 is greater than 1/3 of the width of the graphite boat 7, which can substantially meet the requirement of uniform cleaning of the surface of the graphite boat 7.
As shown in fig. 1, the graphite boat plasma cleaning device further comprises a reciprocating mechanism 4, wherein the reciprocating mechanism 4 is connected with the shell containing the inductance coupling coil 21 and is used for controlling the inductance coupling coil 21 to horizontally reciprocate along the length direction of the graphite boat 7, so that the concentration gradient difference of the plasma in the length direction of the graphite boat 7 is balanced to the greatest extent. In other embodiments, the reciprocating mechanism 4 may also be used to control the inductance coupling coil 21 to horizontally reciprocate along the width direction of the graphite boat 7, so that the plasma concentration in the region is uniform, and the surface of the graphite boat 7 is uniformly cleaned.
The material of the gas introduction member 5 is a low dielectric constant material such as ceramic, etc., which does not affect the inductive coupling. The gas homogenizing component 51 is a gas distributing pipe or a spraying plate, and ensures that the gas concentration in the gas outlet range is uniform. The air outlet of the air homogenizing component 51 is arranged around the outer ring of the inductive coupling coil 21, and can also be arranged in the range of the outer ring of the inductive coupling coil 21 and close to the action range of the inductive coupling coil 21 so as to form plasma through inductive coupling to the greatest extent.
The graphite boat 7 was cleaned using the graphite boat plasma cleaning apparatus of the above embodiment, and the working procedure was as follows:
s1, feeding the graphite boat 7 into the reaction chamber 11, installing above the bias electrode plate 6, forming insulation arrangement by the insulation block 61 on the bias electrode plate 6 contacting with the bottom of the graphite boat 7, applying bias voltage to the bias electrode plate 6, and setting the bias voltage to be 200-2000V.
S2, vacuumizing the reaction cavity 11 to a set value, detecting whether the reaction cavity 11 leaks or not by monitoring the change condition of the vacuum degree, and performing subsequent steps after confirming that the reaction cavity 11 does not leak.
S3, filling reaction gas into the reaction cavity 11 through the gas introduction assembly 5, wherein the reaction gas comprises fluorine-containing gas and carrier gas, the fluorine-containing gas comprises nitrogen trifluoride, carbon tetrafluoride, sulfur hexafluoride and the like, the carrier gas comprises argon, hydrogen, oxygen, carbon dioxide and the like, and the cavity pressure of the reaction cavity 11 is controlled to be generally 5-300 Pa.
S4, starting the plasma generators 2, performing first-stage cleaning, and controlling the ionization power of each plasma generator 2 to be the same, preferably 1-10 KW; the gas flow rate of the reaction gas and the fluorine-containing gas ratio of each gas homogenizing member 51 are controlled to be the same, the gas flow rate is preferably 1 to 20SLM, and the fluorine-containing gas/carrier gas ratio is preferably 1/100 to 3/1. The fluoride ion body ionized by the fluorine-containing gas reacts with silicon element in the film, the first stage is a preliminary cleaning stage, the whole deposited film on the surface of the graphite boat 7 is thinned, and the cleaning time is preferably 600-10000S.
S5, performing second-stage cleaning, and controlling the ionization power of each plasma generator 2 to be different, wherein preferably, the ionization power of each plasma generator 2 gradually decreases along the direction from the boat inlet end cover 12 to the exhaust end cover 13; the flow rate and composition of the reactant gas introduced into each of the gas homogenizing members 51 are different, and preferably, the proportion of the fluorine-containing gas introduced into the reactant gas into each of the gas homogenizing members 51 gradually decreases in the direction from the boat inlet end cover 12 to the exhaust end cover 13. The stage is a targeted cleaning stage, and plasma concentration is controlled according to deposition thickness of each part, so that the surface of the graphite boat 7 is uniformly and effectively cleaned.
S6, after cleaning is completed, the plasma generator 2 is closed, inert gas is introduced into the reaction cavity 11 for purging, repeated purging and vacuumizing cycles can be performed, and the reaction gas in the reaction cavity 11 is ensured to be discharged cleanly. After the cleaning is finished, the boat inlet end cover 12 is opened, and the cleaned graphite boat 7 is taken out.
The plasma cleaning device of the embodiment is used for cleaning the graphite boat 7, the ionization power of each plasma generator 2 can be controlled independently, the gas flow rate of each gas homogenizing module and the proportion of fluorine-containing gas can be controlled independently, the graphite boat 7 can be cleaned in a targeted manner according to the structure of the graphite boat 7, and the cleaning process is convenient, efficient, stable and controllable, low in cost, low in pollution, good in cleaning effect and high in industrial application and popularization value.
Finally, it should be noted that the above embodiments are merely illustrative of the technical solution of the present invention, and not limiting thereof; although the invention has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: the technical scheme described in the foregoing embodiments can be modified or some or all of the technical features thereof can be replaced by equivalents; such modifications and substitutions do not depart from the spirit of the invention.
Claims (10)
1. The utility model provides a graphite boat plasma cleaning device, its characterized in that includes reaction chamber (1), reaction chamber (1) have reaction chamber (11) that are used for holding graphite boat (7), be equipped with bias electrode board (6) in reaction chamber (11), be equipped with on the bias electrode board and be used for supporting insulating piece (61) of graphite boat (7), bias electrode board (6) are in with setting up outside bias power supply (62) electricity of reaction chamber (11), reaction chamber (1) top is equipped with a plurality of mounting holes, the mounting hole is interior sealed to set up plasma generator (2), each plasma generator (2) are followed reaction chamber (1) length direction evenly distributed, each plasma generator (2) ionization power independent control, reaction chamber (11) top is equipped with gas introduction subassembly (5), gas introduction subassembly (5) are including a plurality of even gas component (51), the gas outlet position of every even gas component (51) corresponds with the position of plasma generator (2), the independent regulation of even gas component (51).
2. The graphite boat plasma cleaning device according to claim 1, wherein the plasma generator (2) includes an inductance coupling coil (21) and a partition plate (22), the partition plate (22) is sealingly disposed in the mounting hole, and the inductance coupling coil (21) is mounted above the corresponding partition plate (22).
3. The graphite boat plasma cleaning device according to claim 2, characterized in that the inductance coupling coil (21) has a spiral disk-like structure, and the diameter of the inductance coupling coil (21) is larger than 1/3 of the width of the graphite boat (7).
4. A graphite boat plasma cleaning apparatus according to claim 3, further comprising a reciprocating mechanism (4), said reciprocating mechanism (4) being connected to said inductive coupling coil (21) for controlling said inductive coupling coil (21) to horizontally reciprocate in a length and/or width direction of said graphite boat (7).
5. The graphite boat plasma cleaning apparatus according to claim 2, wherein the partition plate (22) is made of ceramic material.
6. The graphite boat plasma cleaning device according to claim 2, wherein a shielding plate (3) made of conductive materials is arranged below the partition plate (22), and the shielding plate (3) is partially hollowed out.
7. The graphite boat plasma cleaning device according to claim 1, wherein the gas homogenizing member (51) is a gas-distributing pipe or a shower plate.
8. A method for cleaning a graphite boat plasma, characterized in that a graphite boat plasma cleaning apparatus according to any one of claims 1 to 7 is used, the cleaning method comprising the steps of:
s1, feeding a graphite boat (7) into a reaction cavity (11), installing the graphite boat above a bias electrode plate (6), insulating the contact position of the bias electrode plate (6) and the graphite boat (7), and applying bias voltage to the bias electrode plate (6);
s2, vacuumizing the reaction cavity (11) to confirm that the reaction cavity (11) is free of leakage;
s3, filling reaction gas into the reaction cavity (11) through the gas introduction assembly (5), wherein the reaction gas comprises fluorine-containing gas and carrier gas, and controlling the cavity pressure of the reaction cavity (11);
s4, starting the plasma generators (2), cleaning in the first stage, controlling the ionization power of each plasma generator (2) to be the same, and controlling the gas flow of the reaction gas introduced by each gas homogenizing component (51) to be the same as the proportion of fluorine-containing gas;
s5, performing second-stage cleaning, and controlling the ionization power of each plasma generator (2) to be different, wherein the gas flow and the components of the reaction gas introduced into each gas homogenizing component (51) are different;
s6, after the cleaning is finished, the plasma generator (2) is closed, inert gas is introduced into the reaction cavity (11) for purging, and the cleaned graphite boat (7) is taken out.
9. The method for cleaning graphite boat plasma according to claim 8, wherein in the step S5, the ionization power of each plasma generator (2) is gradually decreased in the direction in which the graphite boat (7) enters the reaction chamber (11), and the proportion of fluorine-containing gas in the reaction gas introduced into each gas homogenizing member (51) is gradually decreased.
10. The graphite boat plasma cleaning method according to claim 8 or 9, wherein the fluorine-containing gas is one or more selected from nitrogen trifluoride, carbon tetrafluoride, sulfur hexafluoride, the carrier gas is one or more selected from argon, hydrogen, oxygen, carbon dioxide, and the inert gas is one or more selected from nitrogen, helium, and argon.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202311198592.8A CN117206274A (en) | 2023-09-18 | 2023-09-18 | Graphite boat plasma cleaning device and cleaning method |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202311198592.8A CN117206274A (en) | 2023-09-18 | 2023-09-18 | Graphite boat plasma cleaning device and cleaning method |
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| CN117206274A true CN117206274A (en) | 2023-12-12 |
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| CN202311198592.8A Pending CN117206274A (en) | 2023-09-18 | 2023-09-18 | Graphite boat plasma cleaning device and cleaning method |
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- 2023-09-18 CN CN202311198592.8A patent/CN117206274A/en active Pending
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