CN117179571A - Cooker and manufacturing method thereof - Google Patents
Cooker and manufacturing method thereof Download PDFInfo
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- CN117179571A CN117179571A CN202311164988.0A CN202311164988A CN117179571A CN 117179571 A CN117179571 A CN 117179571A CN 202311164988 A CN202311164988 A CN 202311164988A CN 117179571 A CN117179571 A CN 117179571A
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 24
- 239000010410 layer Substances 0.000 claims abstract description 159
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 146
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims abstract description 98
- 239000011733 molybdenum Substances 0.000 claims abstract description 98
- 229910052750 molybdenum Inorganic materials 0.000 claims abstract description 98
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims abstract description 76
- 239000011651 chromium Substances 0.000 claims abstract description 76
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 76
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 73
- 239000002346 layers by function Substances 0.000 claims abstract description 64
- 230000003014 reinforcing effect Effects 0.000 claims abstract description 57
- 239000000758 substrate Substances 0.000 claims abstract description 55
- 239000000463 material Substances 0.000 claims abstract description 52
- 239000000203 mixture Substances 0.000 claims abstract description 28
- 238000000034 method Methods 0.000 claims description 43
- 238000000151 deposition Methods 0.000 claims description 42
- 230000008569 process Effects 0.000 claims description 33
- 239000013077 target material Substances 0.000 claims description 33
- 230000008020 evaporation Effects 0.000 claims description 27
- 238000001704 evaporation Methods 0.000 claims description 27
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 24
- 238000005137 deposition process Methods 0.000 claims description 15
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 12
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 12
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 12
- 229910052782 aluminium Inorganic materials 0.000 claims description 12
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 12
- 229910052802 copper Inorganic materials 0.000 claims description 12
- 239000010949 copper Substances 0.000 claims description 12
- 229910052749 magnesium Inorganic materials 0.000 claims description 12
- 239000011777 magnesium Substances 0.000 claims description 12
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 claims description 12
- 229910052759 nickel Inorganic materials 0.000 claims description 12
- 229910052710 silicon Inorganic materials 0.000 claims description 12
- 239000010703 silicon Substances 0.000 claims description 12
- 239000010936 titanium Substances 0.000 claims description 12
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- 238000012545 processing Methods 0.000 claims description 7
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- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 1
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- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Cookers (AREA)
Abstract
The application relates to the technical field of cookers, in particular to a cooker and a manufacturing method thereof. The cooker includes: the substrate is provided with a bonding layer, a reinforcing layer and a functional layer which are sequentially arranged on the upper surface of the substrate; the material of the functional layer includes at least one of molybdenum, a mixture of molybdenum and nitrogen, and a mixture of molybdenum, chromium and nitrogen. In the application, the material of the functional layer is at least one of molybdenum, molybdenum and nitrogen mixture and molybdenum, chromium and nitrogen mixture, which can provide non-tackiness for food cooking, and the high-bonding, high-temperature-resistant and corrosion-resistant non-tackiness layer of the cooker is realized by arranging the bonding layer, the reinforcing layer and the functional layer on the upper surface of the substrate in sequence.
Description
Technical Field
The application relates to the technical field of cookers, in particular to a cooker and a manufacturing method thereof.
Background
In the traditional cookware industry, chemical coatings are typically sprayed onto the surface of a substrate in order to achieve non-tackiness of the product food. However, the existing chemical organic film layer mainly comprises fluorocarbon resin and silica sol, and has the defects of heavy pollution (volatilization of chemical solvent), low film hardness, wear resistance (2H-8H), high temperature resistance, easy decomposition and the like in the construction process.
In order to solve the problems of the organic chemical coating, a thermal spraying technology is developed in the realization technical industry, and a required metal material or ceramic material is directly melted and deposited on the surface of a substrate to form an inorganic cooking surface. In material use, thermal spraying basically adopts corrosion-resistant titanium alloy and stainless steel as bottom layers, and aluminum oxide, titanium carbide and composite materials thereof and the like as surface layers. In the film structure, the product realized by thermal spraying is a two-layer system with the metal layer as the bottom and the ceramic layer as the surface, wherein the two-layer system is formed by melting the materials and then adsorbing the materials on the surface of a metal substrate (such as the surface of aluminum alloy, stainless steel, titanium alloy, cast iron and the like) of the cooker. Wherein the metal layer provides structural strength (currently mainly titanium alloy, stainless steel and good corrosion resistance), and the ceramic layer provides high hardness and iron spade resistance (the hardness is generally above 700 HV). The cooking film formed by thermal spraying has the advantages of high thickness, high gap and non-stick oil storage function, but insufficient corrosion resistance (due to the existence of the holes, corrosive liquid is easy to permeate, and the base material and the metal bottom layer are corroded by primary cells).
Disclosure of Invention
The application provides a cooker and a manufacturing method thereof, aiming at realizing the cooker with high hardness, corrosion resistance and certain non-tackiness.
The present application provides a cooker, comprising:
the substrate is provided with a bonding layer, a reinforcing layer and a functional layer which are sequentially arranged on the upper surface of the substrate;
the material of the functional layer includes at least one of molybdenum, a mixture of molybdenum and nitrogen, and a mixture of molybdenum, chromium and nitrogen.
In the application, the bonding layer can provide bonding strength and corrosion resistance, is beneficial to the bonding layer, the reinforcing layer and the functional layer to be adhered to the substrate, the reinforcing layer can provide hardness, and the functional layer is made of at least one of molybdenum, molybdenum and nitrogen mixture and molybdenum, chromium and nitrogen mixture, so that the food cooking non-tackiness can be provided. According to the embodiment, the bonding layer, the reinforcing layer and the functional layer are sequentially arranged on the upper surface of the base body, so that the non-adhesive layer with high bonding, high temperature resistance and corrosion resistance of the cooker is realized.
In one possible design, the material of the bonding layer includes chromium.
In the application, the bonding layer is made of chromium, which can provide bonding strength and is beneficial to the bonding layer, the reinforcing layer and the functional layer to be attached to the substrate. And the bonding layer formed by the chromium material also has the characteristics of high temperature resistance and small porosity, so that the corrosion resistance of the cooker is improved.
In one possible design, the material of the reinforcement layer includes chromium and molybdenum.
In the application, the reinforcing layer is made of molybdenum and chromium, can provide hardness and certain non-tackiness, and also has the characteristic of high temperature resistance.
In one possible design, the material of the reinforcement layer further includes at least one of copper, aluminum, nickel, magnesium, manganese, silicon, titanium.
In the application, materials such as copper, aluminum, nickel, magnesium, manganese, silicon, titanium and the like are added into the reinforcing layer to serve as the color mixing function, and the auxiliary functions such as compactness and the like are improved.
In one possible design, the purity of the chromium is 99.99%, the purity of the molybdenum is 99.99%, and the purity of the nitrogen is 99.99%.
In the application, chromium, molybdenum and nitrogen all use high-purity materials, and the film layer formed by using the high-purity materials has high purity and good quality.
The application also provides a manufacturing method of the cooker, which is used for manufacturing the cooker, and comprises the following steps:
processing the blank body to form a matrix;
placing the substrate into a process chamber, taking a chromium material as a first target material, and adopting a physical evaporation deposition process to deposit and form a bonding layer on the upper surface of the substrate;
taking chromium and molybdenum materials as a second target material, and adopting a physical evaporation deposition process to deposit a reinforcing layer on the surface of the bonding layer;
and taking a molybdenum material as a third target material, and adopting a physical evaporation deposition process to deposit and form a functional layer on the surface of the reinforcing layer.
In the application, a blank is prepared, the blank is molded and surface treated to form a matrix, the matrix is placed in a process chamber, and the upper surface of the matrix corresponds to a deposition device. And placing a first target material which takes chromium as a material on a deposition device, ionizing the surface of the first target material by adopting a physical evaporation deposition technology to form ions, and depositing a film layer with chromium on the surface of the substrate to form a bonding layer. And after the deposition of the bonding layer is finished, placing a second target material which takes chromium and molybdenum as materials on deposition equipment, ionizing the surface of the target material by adopting a physical evaporation deposition technology to form ions, and depositing a film layer with the chromium and the molybdenum on the surface of the bonding layer to form a reinforcing layer. And after the deposition of the reinforcing layer is finished, placing a third target material which takes molybdenum as a material on deposition equipment, ionizing the surface of the third target material by adopting a physical evaporation deposition technology to carry out ions, and depositing a film layer with molybdenum on the surface of the reinforcing layer to form a functional layer. The embodiment adopts the physical evaporation deposition technology of the metal surface, so that the processing process is more environment-friendly and safer. Chromium has the characteristics of high bonding strength, high hardness and small pores, molybdenum has the characteristic of non-sticking during cooking, and a high-bonding, high-temperature-resistant and corrosion-resistant food non-sticking layer is formed on a substrate by depositing a bonding layer made of chromium, a reinforcing layer made of molybdenum and chromium and a functional layer made of molybdenum on the substrate.
The process of forming the substrate from the green body may include: shaping, surface treatment, surface modification, surface polishing, and the like. Specifically, the step of forming the blank may include: stamping and stretching the sheet blank to form a pot-shaped blank. The step of surface treatment of the blank may comprise: the method comprises the steps of deburring, trimming, degreasing and the like, wherein the deburring is used for removing thorns or burrs formed on the blank, the trimming is used for punching and shearing process supplement parts around the blank, and the degreasing is used for improving the bonding strength of a substrate and a film layer and improving the functions of corrosion resistance, wear resistance, lubrication and the like of the film layer. The step of modifying the surface of the blank may comprise: and carrying out selective physical processing on the surface of the blank body, including shot blasting, etching, embossing and the like. The shot blasting is used for removing impurities such as surface oxide skin and the like, improving appearance quality, improving fatigue fracture resistance of a blank body and prolonging fatigue life. Etching and embossing are to treat the surface of the blank body to increase the aesthetic feeling. The step of polishing the surface of the blank may comprise: polishing and degreasing the surface-modified green body, and ensuring that the surface of the green body is highlight and clean.
In one possible design, the method for manufacturing the functional layer further includes:
and taking a molybdenum material as a third target, adding nitrogen into the process chamber, and depositing the functional layer on the surface of the reinforcing layer by adopting a physical evaporation deposition process.
In the application, a third target material which takes molybdenum as a material is placed on a deposition device, nitrogen is added into a process chamber, the surface of the target material and the nitrogen are ionized by adopting a physical evaporation deposition technology, and a film layer with molybdenum and nitrogen is deposited on the surface of a reinforcing layer to form a functional layer. According to the embodiment, nitrogen is added into the process chamber to carry out nitriding treatment on the formed functional layer, so that the wear resistance, corrosion resistance, fatigue resistance and high temperature resistance of the functional layer are enhanced.
In one possible design, the method for manufacturing the functional layer further includes:
and taking molybdenum and chromium materials as a third target, adding nitrogen into the process chamber, and depositing the functional layer on the surface of the reinforcing layer by adopting a physical evaporation deposition process.
In the application, a third target material which takes molybdenum and chromium as materials is placed on a deposition device, nitrogen is added into a process chamber at the same time, the surface of the third target material and the nitrogen are ionized by adopting a physical evaporation deposition technology, and a film layer which is formed by mixing molybdenum, nitrogen, chromium and nitrogen is deposited on the surface of a reinforcing layer so as to form a functional layer. According to the embodiment, nitrogen is added into the process chamber to carry out nitriding treatment on the formed functional layer, so that the wear resistance, corrosion resistance, fatigue resistance and high temperature resistance of the functional layer are enhanced.
In one possible design, the functional layer can form a mixed film layer with molybdenum, a mixture of molybdenum and nitrogen and chromium and nitrogen, a mixture of molybdenum and chromium.
In one possible design, the second target is further mixed with at least one of copper, aluminum, nickel, magnesium, manganese, silicon, titanium.
In the application, at least one of copper, aluminum, nickel, magnesium, manganese, silicon, titanium and the like is mixed in the second target material for forming the reinforcing layer, so that the reinforcing layer is provided with at least one of copper, aluminum, nickel, magnesium, manganese, silicon, titanium and the like, thereby realizing the functions of mixing colors of the reinforcing layer, improving the compactness of the reinforcing layer and the like.
It is to be understood that both the foregoing general description and the following detailed description are exemplary and explanatory only and are not restrictive of the application as claimed.
Drawings
FIG. 1 is a schematic cross-sectional view of a film layer of a cooker provided by the application;
FIG. 2 is a flow chart of a method of making a cooker according to one embodiment of the application;
FIG. 3 is a flow chart of a method of making a cooker according to another embodiment of the application;
fig. 4 is a flowchart of a method for manufacturing a cooker according to another embodiment of the application.
Reference numerals:
1-a substrate;
2-a bonding layer;
3-a reinforcing layer;
4-functional layer.
The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate embodiments consistent with the application and together with the description, serve to explain the principles of the application.
Detailed Description
For a better understanding of the technical solution of the present application, the following detailed description of the embodiments of the present application refers to the accompanying drawings.
It should be understood that the described embodiments are merely some, but not all, embodiments of the application. All other embodiments, which can be made by those skilled in the art based on the embodiments of the application without making any inventive effort, are intended to be within the scope of the application.
The terminology used in the embodiments of the application is for the purpose of describing particular embodiments only and is not intended to be limiting of the application. As used in this application and the appended claims, the singular forms "a," "an," and "the" are intended to include the plural forms as well, unless the context clearly indicates otherwise.
It should be understood that the term "and/or" as used herein is merely one relationship describing the association of the associated objects, meaning that there may be three relationships, e.g., a and/or B, may represent: a exists alone, A and B exist together, and B exists alone. In addition, the character "/" herein generally indicates that the front and rear associated objects are an "or" relationship.
It should be noted that, the terms "upper", "lower", "left", "right", and the like in the embodiments of the present application are described in terms of the angles shown in the drawings, and should not be construed as limiting the embodiments of the present application. In the context of this document, it will also be understood that when an element is referred to as being "on" or "under" another element, it can be directly on the other element or be indirectly on the other element through intervening elements.
As shown in fig. 1, the present embodiment provides a cooker including a base 1, and a bonding layer 2, a reinforcing layer 3, and a functional layer 4 sequentially provided on an upper surface of the base 1. The substrate 1 may be stainless steel, cast iron, titanium alloy or a composite substrate thereof. The upper surface of the base 1 is the surface of the cooker that contacts the food. The material of the bonding layer 2 comprises chromium, the material of the reinforcing layer 3 comprises chromium and molybdenum, and the material of the functional layer 4 comprises at least one of molybdenum, a molybdenum and nitrogen mixture, and a molybdenum, chromium and nitrogen mixture.
In this embodiment, the material of the bonding layer 2 is chromium, which can provide bonding strength, and facilitate the adhesion of the bonding layer 2, the reinforcing layer 3 and the functional layer 4 to the substrate 1. In addition, the bonding layer 2 formed of the chromium material also has the characteristics of high temperature resistance and small porosity, and improves the corrosion resistance of the cooker. The reinforcing layer 3 is made of molybdenum and chromium, can provide hardness and certain non-tackiness, and also has the characteristic of high temperature resistance. The material of the functional layer 4 is at least one of molybdenum, molybdenum and nitrogen mixture, and molybdenum, chromium and nitrogen mixture, and can provide food cooking non-tackiness. In the embodiment, the bonding layer 2, the reinforcing layer 3 and the functional layer 4 are sequentially arranged on the upper surface of the substrate 1, so that the non-adhesive layer with high bonding, high temperature resistance and corrosion resistance of the cooker is realized.
The materials involved in this example are all high purity materials, the purity of chromium is 99.99%, the purity of molybdenum is 99.99%, the purity of nitrogen is 99.99%, and the purity of the film layer formed by using the high purity materials is high and good.
Further, the material of the reinforcing layer 3 further includes at least one of copper, aluminum, nickel, magnesium, manganese, silicon, and titanium, and the auxiliary functions such as color mixing and compactness improvement can be achieved by adding the material of copper, aluminum, nickel, magnesium, manganese, silicon, and titanium into the reinforcing layer 3. Copper, aluminum, nickel, magnesium, manganese, silicon, titanium, etc. are mixed with chromium and molybdenum and deposited on the bonding layer 2.
The thickness of the bonding layer 2 is 3 μm to 5 μm, the thickness of the reinforcing layer 3 is 3 μm to 5 μm, and the thickness of the functional layer 4 is 3 μm to 5 μm.
As shown in fig. 2, the embodiment also provides a manufacturing method of the cooker, which includes: processing the blank to form a matrix 1; putting the substrate 1 into a process chamber, taking a chromium material as a first target material, and adopting a physical evaporation deposition process to deposit and form a bonding layer 2 on the upper surface of the substrate 1; taking chromium and molybdenum materials as second targets, and adopting a physical evaporation deposition process to deposit and form a reinforcing layer 3 on the surface of the bonding layer 2; and taking a molybdenum material as a third target material, and adopting a physical evaporation deposition process to deposit and form a functional layer 4 on the surface of the reinforcing layer 3.
In this embodiment, a blank is first prepared, the blank is formed and surface treated to form a substrate 1, the substrate 1 is placed in a process chamber, and the upper surface of the substrate 1 corresponds to a deposition apparatus. And placing a first target material with chromium as a material on a deposition device, ionizing the surface of the first target material by adopting a physical evaporation deposition technology to form ions, and depositing a film layer with chromium on the surface of the substrate 1 to form the bonding layer 2. After the deposition of the bonding layer 2 is completed, a second target material with chromium and molybdenum as materials is placed on a deposition device, the surface of the second target material is ionized by adopting a physical evaporation deposition technology to form ions, and a film layer with chromium and molybdenum is deposited on the surface of the bonding layer 2 to form the reinforcing layer 3. After the deposition of the reinforcement layer 3 is completed, a third target material made of molybdenum is placed on a deposition device, the surface of the third target material is ionized by adopting a physical evaporation deposition technology to carry out ions, and a film layer with molybdenum is deposited on the surface of the reinforcement layer 3 to form the functional layer 4. The embodiment adopts the physical evaporation deposition technology of the metal surface, so that the processing process is more environment-friendly and safer. Chromium has the characteristics of high bonding strength, high hardness and small pores, molybdenum has the characteristic of non-adhesion during cooking, and a high-bonding, high-temperature-resistant and corrosion-resistant food non-adhesion layer is formed on the substrate 1 by depositing a bonding layer 2 made of chromium, a reinforcing layer 3 made of molybdenum and chromium and a functional layer 4 made of molybdenum on the substrate 1.
Wherein, the process of forming the substrate 1 by blank manufacture can comprise: shaping, surface treatment, surface modification, surface polishing, and the like. Specifically, the step of forming the blank may include: stamping and stretching the sheet blank to form a pot-shaped blank. The step of surface treatment of the blank may comprise: the method comprises the steps of deburring, trimming, degreasing and the like, wherein the deburring is used for removing thorns or burrs formed on the blank, the trimming is used for punching and shearing process supplement parts around the blank, and the degreasing is used for improving the bonding strength of the substrate 1 and the film layer and improving the functions of corrosion resistance, wear resistance, lubrication and the like of the film layer. The step of modifying the surface of the blank may comprise: and carrying out selective physical processing on the surface of the blank body, including shot blasting, etching, embossing and the like. The shot blasting is used for removing impurities such as surface oxide skin and the like, improving appearance quality, improving fatigue fracture resistance of a blank body and prolonging fatigue life. Etching and embossing are to treat the surface of the blank body to increase the aesthetic feeling. The step of polishing the surface of the blank may comprise: polishing and degreasing the surface-modified green body, and ensuring that the surface of the green body is highlight and clean.
As shown in fig. 3, in some embodiments, the method for manufacturing the functional layer 4 further includes: and taking molybdenum material as a third target material, adding nitrogen into the process chamber, and depositing and forming a functional layer 4 on the surface of the reinforcing layer 3 by adopting a physical evaporation deposition process. Wherein the nitrogen flow is 0sccm-50sccm.
In this embodiment, a third target material made of molybdenum is placed on a deposition device, nitrogen is added into a process chamber, the surface of the third target material and the nitrogen are ionized by adopting a physical evaporation deposition technology, and a film layer with molybdenum and nitrogen is deposited on the surface of the reinforcement layer 3 to form the functional layer 4. In this embodiment, nitrogen is added into the process chamber to perform nitriding treatment on the formed functional layer 4, so that the wear resistance, corrosion resistance, fatigue resistance and high temperature resistance of the functional layer 4 are enhanced.
As shown in fig. 4, in some embodiments, the method for manufacturing the functional layer 4 further includes: and taking molybdenum and chromium materials as a third target material, adding nitrogen into a process chamber, and depositing and forming a functional layer 4 on the surface of the reinforcing layer 3 by adopting a physical evaporation deposition process. Wherein the nitrogen flow is 0sccm-50sccm.
In this embodiment, a third target material made of molybdenum and chromium is placed on a deposition device, nitrogen is added into a process chamber, the surface of the third target material and the nitrogen are ionized by adopting a physical evaporation deposition technology, and a film layer with a mixture of molybdenum and nitrogen, chromium and nitrogen is deposited on the surface of the reinforcement layer 3 to form the functional layer 4. In this embodiment, nitrogen is added into the process chamber to perform nitriding treatment on the formed functional layer 4, so that the wear resistance, corrosion resistance, fatigue resistance and high temperature resistance of the functional layer 4 are enhanced.
Further, the functional layer 4 can be formed as a mixed film layer having a mixture of molybdenum, nitrogen, chromium, and nitrogen, a mixture of molybdenum, nitrogen, chromium, and nitrogen, and a mixture of molybdenum, chromium, in addition to a film layer formed of a mixture of molybdenum, nitrogen, chromium, and nitrogen.
In some embodiments, the method for manufacturing the reinforcement layer 3 further includes: at least one of copper, aluminum, nickel, magnesium, manganese, silicon, titanium and the like is mixed in the second target material for forming the reinforcing layer 3, so that the reinforcing layer 3 is provided with at least one of copper, aluminum, nickel, magnesium, manganese, silicon, titanium and the like, thereby realizing the functions of mixing colors of the reinforcing layer 3, improving the compactness of the reinforcing layer 3 and the like.
In some embodiments, the physical vapor deposition may be one of vacuum plating, ion plating, vapor plating, multi-arc ion plating, (low frequency/medium frequency) magnetron sputtering. In the embodiment, the multi-target magnetron sputtering technology is taken as an example, and the multi-target magnetron sputtering has the characteristics of high deposition rate, environmental protection, film plating firmness and the like. In the process of adopting multi-target magnetron sputtering to ionize the target, the distance between the target and the substrate is 15cm-30cm, the sputtering power is 100w-400w, the sputtering bias voltage is 50v-200v, the sputtering temperature is 100-300 ℃, and the sputtering air pressure is 1Pa-3 Pa.
The specifications of the bonding layer 2, the reinforcing layer 3 and the functional layer 4 during the magnetron sputtering process are shown in table 1 below.
TABLE 1
Specifically, table 2 below shows the specifications of bond layer 2 during the magnetron sputtering process.
TABLE 2
In Table 2, the distance between the target and the substrate 1 is 15cm-30cm, the sputtering power is 100w-400w, the sputtering bias is 50v-200v, the sputtering temperature is 100-300 ℃, the sputtering time is 30-60 min, and the sputtering air pressure is 1Pa-3 Pa (nitrogen is added into the process chamber).
Table 3 below is a specification of the stiffening layer 3 during the magnetron sputtering process.
TABLE 3 Table 3
In Table 3, the distance between the targets and the substrate 1 is 15cm-30cm, the sputtering power is 200w-500w, the sputtering bias is 50v-200v, the sputtering temperature is 100-300 ℃, the sputtering time is 50-10 min, the number of targets of the chromium targets is 1-3, the number of targets of the molybdenum targets is 3-1, and the sputtering air pressure is 1Pa-3 Pa (nitrogen is added into the process chamber).
Table 4 below shows the specifications of functional layer 4 during the magnetron sputtering process.
TABLE 4 Table 4
In this table 4, there are three schemes for forming the functional layer 4, and the specification conditions of each scheme are different.
Scheme 1 is to form a film layer with molybdenum, in scheme 1, the specification of example 1 is: the distance between the targets and the substrate 1 is 15cm, the sputtering power is 200w, the sputtering bias is 50v, the sputtering temperature is 100 ℃, the sputtering time is 50, the number of the targets is 4, and the air pressure of the sputtering chamber is 3Pa; the specification of the second embodiment is that the distance between the target and the substrate 1 is 20cm, the sputtering power is 300w, the sputtering bias is 100v, the sputtering temperature is 150 ℃, the sputtering time is 75, the number of targets is 4, and the air pressure of the sputtering chamber is 2Pa; the specification of the third example is that the distance between the target and the substrate 1 is 30cm, the sputtering power is 500w, the sputtering bias is 200v, the sputtering temperature is 300 ℃, the sputtering time is 100, the number of molybdenum targets is 4, and the sputtering chamber air pressure is 1Pa.
Scheme 2 is to form a film layer with molybdenum and nitrogen, in scheme 2 the specification for the fourth example is: the distance between the targets and the substrate 1 is 15cm, the nitrogen flow is 15sccm, the sputtering power is 200w, the sputtering bias is 50v, the sputtering temperature is 100 ℃, the sputtering time is 50, the number of molybdenum targets is 4, and the air pressure of the sputtering chamber is 3Pa; the specifications of the fifth embodiment are: the distance between the targets and the substrate 1 is 20cm, the nitrogen flow is 25sccm, the sputtering power is 300w, the sputtering bias is 100v, the sputtering temperature is 150 ℃, the sputtering time is 75, the number of molybdenum targets is 4, and the air pressure of the sputtering chamber is 2Pa; the specifications of the sixth embodiment are: the distance between the targets and the substrate 1 is 30cm, the nitrogen flow is 50sccm, the sputtering power is 500w, the sputtering bias is 200v, the sputtering temperature is 300 ℃, the sputtering time is 100, the number of molybdenum targets is 4, and the air pressure of the sputtering chamber is 1Pa.
Scheme 3 is to form a film layer with a mixture of molybdenum and nitrogen, chromium and nitrogen, in scheme 3 the specifications for the seventh example are: the distance between the targets and the substrate 1 is 15cm, the nitrogen flow is 15sccm, the sputtering power is 200w, the sputtering bias is 50v, the sputtering temperature is 100 ℃, the sputtering time of the molybdenum targets is 50min, the sputtering time of the chromium targets is 50min, the number of the molybdenum targets is 2, the number of the chromium targets is 2, and the air pressure of the sputtering chamber is 3Pa; the specification of the eighth embodiment is: the distance between the targets and the substrate 1 is 20cm, the nitrogen flow is 25sccm, the sputtering power is 300w, the sputtering bias is 100v, the sputtering temperature is 150 ℃, the sputtering time of the molybdenum targets is 75min, the sputtering time of the chromium targets is 75min, the number of the molybdenum targets is 3, the number of the chromium targets is 1, and the air pressure of the sputtering chamber is 2Pa; the specifications of the ninth embodiment are: the distance between the targets and the substrate 1 is 30cm, the nitrogen flow is 50sccm, the sputtering power is 500w, the sputtering bias is 200v, the sputtering temperature is 300 ℃, the sputtering time of the molybdenum targets is 100min, the sputtering time of the chromium targets is 100min, the number of the molybdenum targets is 3, the number of the chromium targets is 1, and the air pressure of the sputtering chamber is 1Pa.
In addition to the film layers shown in table 3, the functional layer 4 may be formed as a mixed film layer having a mixture of molybdenum, and nitrogen, a mixture of molybdenum, nitrogen, and chromium, and a mixture of molybdenum, chromium.
Table 5 below shows the test results of each example and comparative example. The test environments of each example and comparative example are the same. Examples 1 to 9 are examples of the present application, in which comparative example 1 is stainless steel, comparative example 2 is a substrate 1 coated with a bonding layer 2, comparative example 3 is a substrate 1 coated with a reinforcing layer 3, comparative example 4 is a substrate 1 coated with a functional layer 4, comparative example 5 is a substrate 1 coated with a reinforcing layer 3 and a functional layer 4, comparative example 6 is a substrate 1 coated with a bonding layer 2 and a reinforcing layer 3, and comparative example 7 is a substrate 1 coated with a bonding layer 2 and a functional layer 4.
TABLE 5
In table 5, the second column (film layer) shows the film layer material of each product, the third column shows the number of abrasion resistance times of the product (the product is required to pass 5000 abrasion resistance tests according to the standard), the fourth column shows the hardness of the product (the hardness test is to be performed by placing the product under vickers hardness), the fifth column shows the corrosion resistance time of the product (the product is required to pass 24 hours of salt water test according to the standard), and the sixth column shows the number of thermal shock times of the product (after the thermal shock measurement is performed by using 400 ℃ cold and hot shock 25, whether the film layer is cracked or peeled off is checked). Among them, the stainless steel of comparative example 1, which was not coated, was not measured for abrasion resistance and heat shock times, and thus, there was no data.
From the experimental results in table 5, it can be seen that: comparative example 1 was not provided with a film layer, and was inferior in hardness and corrosion resistance to the inventive examples and comparative examples. In the comparative example product provided with the film layer, the product provided with only the chromium film layer (equivalent to only the bonding layer 2) was poor in abrasion resistance, the product provided with only the chromium and molybdenum film layer (equivalent to only the reinforcing layer 3) was poor in corrosion resistance, the product provided with only the mixed film layer of chromium and nitrogen, molybdenum and nitrogen (equivalent to only the functional layer 4) was poor in thermal shock resistance, the product provided with the mixed film layer of chromium and molybdenum and the mixed film layer of chromium and nitrogen (equivalent to the reinforcing layer 3 and the functional layer 4) was poor in thermal shock resistance, the product provided with the film layer of chromium and molybdenum (equivalent to the bonding layer 2 and the reinforcing layer 3) was poor in corrosion resistance, and the product provided with the mixed film layer of chromium and nitrogen, molybdenum and nitrogen (equivalent to the bonding layer 2 and the functional layer 4) was good in each test result.
In the embodiments of the present application, the hardness values are also better, while the embodiments meet the standards of wear resistance, corrosion resistance and thermal shock resistance. Therefore, the application ensures that the cooker has no chemical coating, is more sanitary and healthy, and has the advantages of high temperature resistance, corrosion resistance, high hardness, abrasion resistance, non-tackiness of food and the like by sequentially depositing the bonding layer, the reinforcing layer and the functional layer on the substrate.
The above description is only of the preferred embodiments of the present application and is not intended to limit the present application, but various modifications and variations can be made to the present application by those skilled in the art. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present application should be included in the protection scope of the present application.
Claims (10)
1. A cooker, characterized in that the cooker comprises:
the substrate is provided with a bonding layer, a reinforcing layer and a functional layer which are sequentially arranged on the upper surface of the substrate;
the material of the functional layer includes at least one of molybdenum, a mixture of molybdenum and nitrogen, and a mixture of molybdenum, chromium and nitrogen.
2. The cooker of claim 1, wherein the material of the bonding layer comprises chromium.
3. The cooker of claim 1, wherein the material of the reinforcing layer comprises chromium and molybdenum.
4. A cooker according to claim 3, wherein the material of the reinforcing layer further comprises at least one of copper, aluminum, nickel, magnesium, manganese, silicon, titanium.
5. The cooker of claim 1, wherein the purity of the chromium is 99.99%, the purity of the molybdenum is 99.99%, and the purity of the nitrogen is 99.99%.
6. A method of making a cooker as claimed in any one of claims 1 to 5, the method comprising:
processing the blank body to form a matrix;
placing the substrate into a process chamber, taking a chromium material as a first target material, and adopting a physical evaporation deposition process to deposit and form a bonding layer on the upper surface of the substrate;
taking chromium and molybdenum materials as a second target material, and adopting a physical evaporation deposition process to deposit a reinforcing layer on the surface of the bonding layer;
and taking a molybdenum material as a third target material, and adopting a physical evaporation deposition process to deposit and form a functional layer on the surface of the reinforcing layer.
7. The method of manufacturing a cooker according to claim 6, wherein the method of manufacturing a functional layer further comprises:
and taking a molybdenum material as a third target, adding nitrogen into the process chamber, and depositing the functional layer on the surface of the reinforcing layer by adopting a physical evaporation deposition process.
8. The method of manufacturing a cooker according to claim 6, wherein the method of manufacturing a functional layer further comprises:
and taking molybdenum and chromium materials as a third target, adding nitrogen into the process chamber, and depositing the functional layer on the surface of the reinforcing layer by adopting a physical evaporation deposition process.
9. The method of manufacturing a cooker according to claim 8, wherein the functional layer is capable of forming a mixed film layer having a mixture of molybdenum, molybdenum and nitrogen, a mixture of molybdenum and nitrogen and chromium and nitrogen, and a mixture of molybdenum and chromium.
10. The method for manufacturing a cooker according to claim 6, wherein,
and the second target material is also mixed with at least one of copper, aluminum, nickel, magnesium, manganese, silicon and titanium.
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CN202311164988.0A CN117179571A (en) | 2023-09-08 | 2023-09-08 | Cooker and manufacturing method thereof |
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