CN117139264B - Ultrapure water cleaning energy-saving consumption-reducing system in polycrystalline silicon production process - Google Patents
Ultrapure water cleaning energy-saving consumption-reducing system in polycrystalline silicon production process Download PDFInfo
- Publication number
- CN117139264B CN117139264B CN202311402851.4A CN202311402851A CN117139264B CN 117139264 B CN117139264 B CN 117139264B CN 202311402851 A CN202311402851 A CN 202311402851A CN 117139264 B CN117139264 B CN 117139264B
- Authority
- CN
- China
- Prior art keywords
- tank
- water
- ultrasonic
- pure water
- ultrapure water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 229910021642 ultra pure water Inorganic materials 0.000 title claims abstract description 111
- 239000012498 ultrapure water Substances 0.000 title claims abstract description 111
- 238000004140 cleaning Methods 0.000 title claims abstract description 70
- 229910021420 polycrystalline silicon Inorganic materials 0.000 title claims abstract description 22
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 18
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 167
- 239000000919 ceramic Substances 0.000 claims abstract description 87
- 238000005406 washing Methods 0.000 claims abstract description 61
- 238000010791 quenching Methods 0.000 claims abstract description 50
- 230000000171 quenching effect Effects 0.000 claims abstract description 49
- 239000012528 membrane Substances 0.000 claims abstract description 44
- 230000009467 reduction Effects 0.000 claims abstract description 16
- 238000001914 filtration Methods 0.000 claims abstract description 14
- 239000002210 silicon-based material Substances 0.000 claims description 40
- 229920005591 polysilicon Polymers 0.000 claims description 12
- 229910052739 hydrogen Inorganic materials 0.000 claims description 11
- 239000001257 hydrogen Substances 0.000 claims description 11
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 10
- 238000003860 storage Methods 0.000 claims description 7
- 238000003756 stirring Methods 0.000 claims description 3
- 239000000126 substance Substances 0.000 claims description 2
- 239000002351 wastewater Substances 0.000 abstract description 63
- 230000000694 effects Effects 0.000 abstract description 15
- 230000008676 import Effects 0.000 abstract description 2
- 229910021487 silica fume Inorganic materials 0.000 abstract 1
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 62
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 42
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 29
- 229910052573 porcelain Inorganic materials 0.000 description 23
- 239000000377 silicon dioxide Substances 0.000 description 21
- 235000011121 sodium hydroxide Nutrition 0.000 description 21
- 238000010438 heat treatment Methods 0.000 description 20
- 229910052710 silicon Inorganic materials 0.000 description 17
- 239000010703 silicon Substances 0.000 description 17
- 239000003513 alkali Substances 0.000 description 12
- 239000011863 silicon-based powder Substances 0.000 description 12
- 230000005611 electricity Effects 0.000 description 11
- 235000013312 flour Nutrition 0.000 description 11
- 238000001816 cooling Methods 0.000 description 10
- 239000000843 powder Substances 0.000 description 10
- 229910052581 Si3N4 Inorganic materials 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 8
- 239000012535 impurity Substances 0.000 description 8
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 8
- 238000000034 method Methods 0.000 description 7
- 238000004064 recycling Methods 0.000 description 7
- 239000004115 Sodium Silicate Substances 0.000 description 6
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 6
- 229910052911 sodium silicate Inorganic materials 0.000 description 6
- 239000002699 waste material Substances 0.000 description 6
- 238000007667 floating Methods 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- 238000001035 drying Methods 0.000 description 4
- 239000003518 caustics Substances 0.000 description 3
- 238000005265 energy consumption Methods 0.000 description 3
- 238000010248 power generation Methods 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000003670 easy-to-clean Effects 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 238000005984 hydrogenation reaction Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 230000001502 supplementing effect Effects 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/14—Removing waste, e.g. labels, from cleaning liquid; Regenerating cleaning liquids
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B2203/00—Details of cleaning machines or methods involving the use or presence of liquid or steam
- B08B2203/007—Heating the liquid
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/10—Process efficiency
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
The application relates to an ultrapure water cleaning energy saving and consumption reduction system in polycrystalline silicon production process, the water inlet of ultrasonic tank, quick-discharge rinsing tank, ultrasonic pure water tank and water quenching tank all links to each other with the ultrapure water pipeline, and the delivery port of alkaline washing tank, ultrasonic tank and quick-discharge rinsing tank all links to each other with the ground jar, and the delivery port of ultrasonic pure water tank and water quenching tank all links to each other with ceramic membrane filter's import, and ceramic membrane filter's filtration water export links to each other with alkaline washing tank's water inlet. After the silica fume is filtered by the ceramic membrane filter, the waste water discharged by the ultrasonic pure water tank and the water quenching tank is recycled to the alkaline washing tank to replace the ultrapure water used by the alkaline washing tank in the prior art to preliminarily clean the ceramic ring, so that the effect of saving the ultrapure water is achieved.
Description
Technical Field
The application relates to the technical field of cleaning for polysilicon production, in particular to an ultrapure water cleaning energy-saving consumption-reducing system in the polysilicon production process.
Background
Currently, the annual average growth rate of the worldwide photovoltaic industry is 31.2%, and the growth rate thereof is first in the global energy power generation market. It is estimated that photovoltaic power generation will account for more than 33.3% of the total world power generation by year 2030, and solar energy will be an important energy source for promoting human development by year 2050. Along with the related policies of the platform delivery of each country and the corresponding plan, the photovoltaic industry truly goes to a rapidly developed road. Polysilicon is the most important photovoltaic material in silicon materials, and is an important link affecting the development scale of the silicon material preparation industry.
The insulation between the electrode (silicon core) of the reduction furnace and the chassis of the reduction furnace depends on a tetrafluoro sleeve and a silicon nitride porcelain ring, and the silicon nitride porcelain ring plays a role in prolonging the creepage distance between the chassis and the electrode head in the furnace during high-voltage breakdown. Because the silicon nitride ceramic ring is in the furnace and is influenced by high temperature and materials in the reduction furnace, scaling is serious and the silicon nitride ceramic ring is not easy to clean, so that insulation is reduced, and the silicon nitride ceramic ring needs to be replaced periodically. Because the purchase price of the silicon nitride porcelain ring is relatively high, the silicon nitride porcelain ring needs to be replaced periodically to be cleaned in order to save the cost, and the silicon nitride porcelain ring can be recycled after the surface scale layer is cleaned before being used, so that the cost can be greatly saved.
After the preparation of the polysilicon in the reducing furnace, the procedures of furnace disassembly, transportation, crushing and the like are needed, and during the treatment process, the surface of the silicon material is polluted or mixed with non-silicon impurities, so that the purity is reduced, the quality requirement of downstream use cannot be met, and therefore the polysilicon is required to be cleaned, and the impurities on the surface of the silicon material are removed.
Before the polysilicon is used, the polysilicon is required to be crushed, namely, the silicon bar is crushed by a crusher, and before the crushing, the silicon bar is generally required to be subjected to water quenching treatment so as to generate a state of natural fracture or easy fracture.
In the prior art, the ceramic ring cleaning, the silicon material cleaning and the water quenching treatment are carried out through the ultrapure water system shown in fig. 1, and mainly comprise a ceramic ring cleaning machine 10, a silicon material cleaning machine 20, a water quenching tank 30 and a ground tank 40, wherein the ceramic ring cleaning machine 10 is provided with an alkaline washing tank with 1-3 grooves and an ultrasonic tank with 4-6 grooves, and the silicon material cleaning machine 20 is provided with a quick-discharge rinsing tank with 1 groove and an ultrasonic pure water tank with 2-4 grooves. In the use process, the porcelain ring cleaning machine 10, the silicon material cleaning machine 20 and the water quenching tank 30 all need to be filled with ultra-pure water.
Each ceramic ring washer 10 consumes 11 (10+1) tons of ultrapure water per hour, each silicon washer 20 consumes 12 (3+9) tons of ultrapure water per hour, and each water quench tank 30 consumes 4 tons of ultrapure water per hour, and if these three devices are operated individually and simultaneously, 11+12+4=27 tons of ultrapure water per hour.
Therefore, the ultrapure water consumption of the system for ceramic ring cleaning, silicon material cleaning and water quenching treatment in the prior art is huge, and in the actual production process, the three devices are all operated simultaneously, so that the ultrapure water consumption is huge, and the production cost of the polycrystalline silicon is very high and high.
Disclosure of Invention
Based on this, it is necessary to be directed against among the prior art, the ultrapure water consumption of the system of ceramic ring cleaning, silicon material cleaning and water quenching treatment is huge, lead to polycrystalline silicon manufacturing cost very high, and the problem of being high down, this application provides an ultrapure water cleaning energy saving and consumption reduction system in the polycrystalline silicon production process, after the silica flour is filtered through ceramic membrane filter with ultrasonic pure water tank and water quenching tank exhaust waste water, the retrieval and utilization is to the alkaline wash tank, be used for the preliminary washing ceramic ring of alkaline wash tank, replace the preliminary washing ceramic ring of ultrapure water that uses in the prior art, thereby reach the effect of practicing thrift the ultrapure water, the water conservation rate is up to 37%, simultaneously, all single and the simultaneous operation of these three equipment in this application can also practice thrift electricity 840 degree per hour, the power saving rate is up to 35.4%.
The utility model provides an ultrapure water washs energy saving and consumption reduction system in polycrystalline silicon production process, includes ceramic ring cleaning machine, silicon material cleaning machine, water quenching tank, ground jar and ceramic membrane filter, the ceramic ring cleaning machine has alkaline wash tank and ultrasonic tank, alkaline wash tank with the temperature of ultrapure water in the ultrasonic tank is 85 ℃, silicon material cleaning machine has quick-discharge rinsing tank and ultrasonic pure water tank, the temperature of ultrapure water in the quick-discharge rinsing tank is 30 ℃, the temperature of ultrapure water in the ultrasonic pure water tank is 70 ℃, the temperature of ultrapure water in the water quenching tank is 80 ℃, the ultrasonic tank the quick-discharge rinsing tank the ultrasonic pure water tank with the water inlet of water quenching tank all links to each other with the ultrapure water pipeline, alkaline wash tank the ultrasonic tank with the delivery port of quick-discharge rinsing tank all links to each other with the ground jar, ultrasonic pure water tank with the delivery port of water quenching tank all links to each other with the import of ceramic membrane filter, the filtration water outlet of ceramic membrane filter links to each other with the water inlet of alkaline wash tank.
The technical scheme that this application adopted can reach following beneficial effect:
in the ultrapure water cleaning energy-saving consumption-reducing system in the polycrystalline silicon production process disclosed by the embodiment of the application, (1) after the waste water discharged from the ultrasonic pure water tank and the water quenching tank is filtered by the ceramic membrane filter, the waste water is recycled to the alkaline washing tank for primarily cleaning the ceramic ring by the alkaline washing tank, and the ultrapure water is used for primarily cleaning the ceramic ring by replacing the alkaline washing tank in the prior art, so that the effect of saving the ultrapure water is achieved. (2) The silica powder is filtered by the ceramic membrane filter, so that the silica powder in the filtered water is prevented from being consumed by alkali liquor in the alkali washing tank during recycling, and the consumption and waste of caustic soda caused by direct recycling are prevented. (3) The temperature of the wastewater discharged by the ultrasonic pure water tank is 70 ℃, the temperature of the wastewater discharged by the water quenching tank is 80 ℃, the wastewater is mixed and then passes through the ceramic membrane filter, the process has certain natural cooling, the temperature of the filtered water filtered by the ceramic membrane filter is about 70 ℃, the filtered water at the temperature of 70 ℃ is directly connected into the alkaline washing tank to clean the ceramic ring, and the temperature required by the alkaline washing tank is 85 ℃, so that the filtered water at the temperature of 70 ℃ is heated to 85 ℃ compared with the temperature required by the alkaline washing tank, the energy consumption can be obviously reduced by heating the filtered water at the temperature of 70 ℃ to 85 ℃ in comparison with the prior art, and the energy can be saved. (4) Because the temperature in the alkaline washing tank can promote to 85 ℃ fast, and need in the prior art to heat the ultrapure water of normal atmospheric temperature to 85 ℃, certainly can be longer than the time that only need to heat 70 ℃ of filtration water to 85 ℃ in this application consumes, that is to say, compare in prior art with the duration of heating the ultrapure water of normal atmospheric temperature to 85 ℃, this application only need to heat 70 ℃ of filtration water to 85 ℃ can be shorter, consequently can accomplish the heating in the short time and reach the requirement temperature, consequently can effectively improve the washing speed. The above all belong to unexpected effects.
Drawings
FIG. 1 is a schematic diagram of a prior art system for ceramic ring cleaning, silicon batch cleaning, and water quenching;
fig. 2 is a schematic diagram of an ultrapure water cleaning energy-saving and consumption-reducing system in a polysilicon production process disclosed in an embodiment of the application.
Description of the drawings: ceramic ring cleaning machine 10, silicon material cleaning machine 20, water quenching tank 30 and ground tank 40;
ceramic ring cleaner 100, alkaline washing tank 110, ultrasonic tank 120, silicon cleaner 200, quick-drain rinsing tank 210, ultrasonic pure water tank 220, water quenching tank 300, ground tank 400, ceramic membrane filter 500, ultrapure water pipe 610, and hydrogen storage tank 620.
Description of the embodiments
In order that the present application may be readily understood, a more particular description of the invention will be rendered by reference to specific embodiments that are illustrated in the appended drawings. Preferred embodiments of this application are given in the examples. This application may, however, be embodied in many different forms and is not limited to the embodiments described herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete.
It will be understood that when an element is referred to as being "disposed on" another element, it can be directly on the other element or intervening elements may also be present. When an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements may also be present. The terms "vertical," "horizontal," "left," "right," "top," "bottom," "top," and the like are used herein for illustrative purposes only and are not meant to be the only embodiment.
Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs. The terminology used herein in the description of the application is for the purpose of describing particular embodiments only and is not intended to be limiting of the application. The term "and/or" as used herein includes any and all combinations of one or more of the associated listed items.
Referring to fig. 2, an embodiment of the application discloses an ultrapure water cleaning energy saving and consumption reduction system in a polysilicon production process, which comprises a ceramic ring cleaning machine 100, a silicon material cleaning machine 200, a water quenching tank 300, a ground tank 400 and a ceramic membrane filter 500, wherein:
the porcelain ring washer 100 has an alkaline washing tank 110 and an ultrasonic tank 120, the porcelain ring washer 100 generally has 8 washing tanks, wherein 1-3 tanks are the alkaline washing tank 110, 85 ℃ ultrapure water and 70% caustic soda are used for alkaline washing the porcelain ring, 4-6 tanks are the ultrasonic tank 120, 85 ℃ ultrapure water is used, the porcelain ring after alkaline washing needs to be washed through the ultrasonic tank 120, the porcelain ring after alkaline washing is washed with surface floating ash in the ultrasonic tank 120 in an ultrasonic washing mode, impurities, alkali liquor and the like remained on the surface of the porcelain ring, 7 tanks are porcelain ring drying tanks, the washed porcelain ring is dried in the porcelain ring drying tanks by heating to 95 ℃,8 tanks are porcelain ring cooling tanks, and since the porcelain ring is heated and dried, there is a risk of burning staff when directly moving out of the porcelain ring washer 100, the porcelain ring is cooled to 30 ℃ by the porcelain ring cooling tanks, and then the porcelain ring washer 100 is moved out, so that the cleaning of the porcelain ring is completed.
The silicon material cleaning machine 200 is provided with a quick-discharge rinsing tank 210 and an ultrasonic pure water tank 220, the silicon material cleaning machine 200 is generally provided with 10 cleaning tanks, wherein 1 tank is the quick-discharge rinsing tank 210, 30 ℃ ultrapure water is used for cleaning floating ash and impurities on the surface of the silicon material, 2-4 tanks are the ultrasonic pure water tank 220, 70 ℃ ultrapure water is used for cleaning the silicon material with the floating ash on the surface, the ultrasonic pure water tank 220 is required for fine cleaning the silicon material with the floating ash on the surface, the ultrasonic pure water tank 220 is used for cleaning the silicon material with the floating ash on the surface, 5-9 tanks are silicon material drying tanks, the cleaned silicon material is dried in the silicon material drying tanks by heating to 85 ℃,10 tanks are silicon material cooling tanks, and because the silicon material is heated and dried, there is a risk of scalding staff when the silicon material is directly removed from the silicon material cleaning machine 200, the silicon material cooling tanks are required to be cooled to 30 ℃, and then the silicon material cleaning machine 200 is removed, and the cleaning of the silicon material is completed.
According to the above, the temperature of the ultrapure water in the alkaline washing tank 110 and the ultrasonic tank 120 is 85 ℃, the temperature of the ultrapure water in the quick-release rinsing tank 210 is 30 ℃, the temperature of the ultrapure water in the ultrasonic pure water tank 220 is 70 ℃, and at the same time, when the porcelain ring cleaning machine 100 is operated, the alkaline washing tank 110 consumes 10 tons of ultrapure water per hour and discharges 10 tons of wastewater at 85 ℃, the ultrasonic tank 120 consumes 1 ton of ultrapure water per hour and discharges 1 ton of wastewater at 85 ℃, and when the silicon material cleaning machine 200 is operated, the quick-release rinsing tank 210 consumes 3 tons of ultrapure water per hour and discharges 3 tons of wastewater at 30 ℃, and the ultrasonic pure water tank 220 consumes 9 tons of ultrapure water per hour and discharges 9 tons of wastewater at 70 ℃.
Before crushing the silicon bar, the silicon bar is subjected to water quenching treatment so as to generate a state of natural fracture or easy fracture, the silicon bar is firstly heated to a specific temperature and then placed into a water quenching water tank 300 to be cooled by ultrapure water, during the water quenching treatment of the silicon bar, ultrapure water with lower temperature is continuously added into the water quenching water tank 300, and ultrapure water with higher temperature in the water quenching water tank 300 is continuously discharged so as to keep the temperature of the ultrapure water in the water quenching water tank 300 at 80 ℃, that is, the temperature of the ultrapure water in the water quenching water tank 300 is 80 ℃, and meanwhile, during the water quenching treatment, the water quenching water tank 300 needs to consume 4 tons of ultrapure water per hour, and 4 tons of wastewater with 80 ℃ is discharged per hour.
The water inlets of the ultrasonic tank 120, the quick-discharge rinsing tank 210, the ultrasonic pure water tank 220 and the water quenching tank 300 are all connected with the ultrapure water pipeline 610 so as to enable ultrapure water to be introduced into the ultrasonic tank 120, the quick-discharge rinsing tank 210, the ultrasonic pure water tank 220 and the water quenching tank 300 for use, and the water outlets of the alkaline tank 110, the ultrasonic tank 120 and the quick-discharge rinsing tank 210 are all connected with the ground tank 400 so as to enable wastewater discharged from the alkaline tank 110, the ultrasonic tank 120 and the quick-discharge rinsing tank 210 to be introduced into the ground tank 400 for temporary storage, and the wastewater temporarily stored in the ground tank 400 is subsequently treated and discharged. Since the waste water discharged from the alkaline washing tank 110, the ultrasonic tank 120 and the quick-discharge rinsing tank 210 after washing is very dirty (the impurity components are complex and the content is high), the waste water discharged from the alkaline washing tank 110, the ultrasonic tank 120 and the quick-discharge rinsing tank 210 is introduced into the ground tank 400 for subsequent treatment and discharge, while the waste water discharged from the ultrasonic pure water tank 220 and the water quenching tank 300 is relatively clean (the impurity is silicon powder only and the content is relatively low), if the waste water is directly discharged into the ground tank 400, a certain waste is caused, and therefore, the water outlets of the ultrasonic pure water tank 220 and the water quenching tank 300 are connected with the inlet of the ceramic membrane filter 500 to introduce the waste water discharged from the ultrasonic pure water tank 220 and the water quenching tank 300 into the ceramic membrane filter 500 for filtering silicon powder, and since the waste water is mainly silicon powder and the content of other impurities is very low and can be basically ignored, after the waste water is filtered by the ceramic membrane filter 500, the waste water does not contain silicon powder, and clean filtered water (the silicon powder is filtered cleanly and the content of other impurities is very low and can be ignored basically).
Meanwhile, since the ultrasonic tank 120, the quick-discharge rinsing tank 210 and the ultrasonic pure water tank 220 have high requirements on water quality, and the alkaline washing tank 110 is a preliminary link for cleaning the ceramic ring, the requirements on water quality are low, and the filtered water filtered by the ceramic membrane filter 500 can be recycled, that is, the filtered water outlet of the ceramic membrane filter 500 is connected with the water inlet of the alkaline washing tank 110, that is, the filtered water filtered by the ceramic membrane filter 500 is introduced into the alkaline washing tank 110 for preliminarily cleaning the ceramic ring, so that the effect of saving ultrapure water is achieved by replacing the prior art in which the alkaline washing tank 110 uses ultrapure water for preliminarily cleaning the ceramic ring. After the ceramic membrane filter 500 filters, the part of wastewater does not contain silica powder, clean filtered water is obtained, the part of filtered water is introduced into the alkaline washing tank 110 for primarily cleaning the ceramic ring, and consumption of alkali liquor in the alkaline washing tank 110 due to the existence of silica powder in the filtered water can be avoided, that is, the silica powder is filtered through the ceramic membrane filter 500, and consumption of alkali liquor in the alkaline washing tank 110 during recycling of the filtered water can be avoided, so that direct recycling is prevented, and caustic soda consumption and waste are caused.
In the prior art, each ceramic ring cleaner 100 consumes 11 tons of ultrapure water per hour, each silicon cleaner 200 consumes 12 tons of ultrapure water per hour, and each water quenching tank 300 consumes 4 tons of ultrapure water per hour, and if all three devices are operated singly and simultaneously, 11+12+4=27 tons of ultrapure water per hour are consumed. In this application, by supplementing the filtered water filtered by the ceramic membrane filter 500 to the caustic wash tank 110 instead of the ultrapure water supply originally used by the caustic wash tank 110, only 1 ton of ultrapure water is required per hour for each ceramic ring washer 100, 12 tons of ultrapure water is consumed per hour for each silicon washer 200, and 4 tons of ultrapure water is consumed per hour for each water quenching tank 300, and if these three devices are operated individually and simultaneously, 1+12+4=17 tons of ultrapure water is consumed per hour, it is found that compared with the prior art, 10 tons of ultrapure water can be saved per hour for each of these three devices in this application, and the water saving rate is as high as 37%.
Meanwhile, the temperature of the wastewater discharged from the ultrasonic pure water tank 220 is 70 ℃, the temperature of the wastewater discharged from the water quenching tank 300 is 80 ℃, the wastewater is mixed and then passes through the ceramic membrane filter 500, the temperature of the filtered water filtered by the ceramic membrane filter 500 is usually about 70 ℃, the part of the filtered water at 70 ℃ is directly connected into the alkaline washing tank 110 to clean the ceramic ring, the required temperature of the alkaline washing tank 110 is 85 ℃, the filtered water at 70 ℃ is heated to 85 ℃, compared with the prior art, the temperature of the ultra-pure water at normal temperature is heated to 85 ℃, the energy consumption can be obviously reduced, the energy is saved, and the cleaning speed can be effectively improved, because the temperature in the alkaline washing tank 110 can be quickly increased to 85 ℃, the time for heating the ultra-pure water at normal temperature is definitely longer than the time for heating the filtered water at 70 ℃ to 85 ℃, that is shorter than the time for heating the ultra-pure water at normal temperature to 85 ℃ in the prior art, the time for heating the ultra-pure water at 70 ℃ can be effectively heated to 85 ℃, and the cleaning speed can be effectively improved.
In the prior art, 1122 (1020+102) degrees of electricity are required to be consumed by each ceramic ring washer 100 per hour of heating ultrapure water (initial temperature is assumed to be 0 ℃) and 864 (108+756) degrees of electricity are required to be consumed by each silicon material washer 200 per hour of heating ultrapure water (initial temperature is assumed to be 0 ℃) and 384 degrees of electricity are required to be consumed by each water quenching tank 300 per hour of heating ultrapure water (initial temperature is assumed to be 0 ℃) and 1122+864+384=2370 degrees of electricity are consumed per hour if all three devices are operated singly and simultaneously. In this application, each ceramic ring washer 100 consumes 282 (180+102) degrees of electricity per hour of heating ultrapure water (initial temperature is assumed to be 0 ℃) and filtered water, each silicon washer 200 consumes 864 (108+756) degrees of electricity per hour of heating ultrapure water (initial temperature is assumed to be 0 ℃) and each water quenching tank 300 consumes 384 degrees of electricity per hour of heating ultrapure water (initial temperature is assumed to be 0 ℃) and 282+864+384=1530 degrees of electricity per hour if all three devices are operated singly and simultaneously. Compared with the prior art, the three devices in the method have the advantages that the power consumption can be saved by 840 degrees per hour when the three devices are operated simultaneously, and the power saving rate is as high as 35.4 percent, which is an unexpected effect.
In the ultrapure water cleaning energy-saving consumption-reducing system in the polycrystalline silicon production process disclosed by the embodiment of the application, (1) after the waste water discharged by the ultrasonic pure water tank 220 and the water quenching tank 300 is filtered by the ceramic membrane filter 500, the waste water is recycled to the alkaline washing tank 110 for primarily cleaning the ceramic ring by the alkaline washing tank 110, and the ultrapure water is used for primarily cleaning the ceramic ring instead of the alkaline washing tank 110 in the prior art, so that the effect of saving the ultrapure water is achieved. (2) The silica powder is filtered by the ceramic membrane filter 500, so that the silica powder in the filtered water can be prevented from being consumed by alkali liquor in the alkali washing tank 110 during recycling, and the consumption and waste of caustic soda caused by direct recycling are prevented. (3) The temperature of the wastewater discharged from the ultrasonic pure water tank 220 is 70 ℃, the temperature of the wastewater discharged from the water quenching tank 300 is 80 ℃, the wastewater and the wastewater are mixed and then pass through the ceramic membrane filter 500, the process has a certain natural temperature reduction, the temperature of the filtered water filtered by the ceramic membrane filter 500 is about 70 ℃, the filtered water at the temperature of 70 ℃ is directly connected into the alkaline washing tank 110 to clean the ceramic ring, and the temperature required by the alkaline washing tank 110 is 85 ℃, and only the filtered water at the temperature of 70 ℃ is heated to 85 ℃, compared with the prior art, the temperature of the ultra-pure water at the normal temperature is heated to 85 ℃, the energy consumption can be obviously reduced by only heating the filtered water at the temperature of 70 ℃, and the energy can be saved. (4) Because the temperature in the caustic wash tank 110 can be quickly raised to 85 ℃, and the prior art needs to heat the normal-temperature ultrapure water to 85 ℃, certainly the time taken to heat the normal-temperature ultrapure water to 85 ℃ is longer than the time taken to heat the normal-temperature filtered water to 85 ℃ in the application, that is, the time taken to heat the normal-temperature ultrapure water to 85 ℃ in the application is shorter than the time taken to heat the normal-temperature ultrapure water to 85 ℃ in the prior art, the heating can be completed in a short time and the required temperature can be reached, and therefore the cleaning speed can be effectively improved. The above (3) and (4) are unexpected effects.
In order to further improve the energy saving and consumption reduction degree, optionally, the shell structure of the ceramic ring cooling tank of the ceramic ring cleaning machine 100 and the shell structure of the silicon material cooling tank of the silicon material cleaning machine 200 are of a jacket structure, the ultrapure water pipeline 610 is connected with the inlet of the jacket structure, the outlet of the jacket structure is connected with the water inlets of the ultrasonic tank 120, the quick-discharge rinsing tank 210, the ultrasonic pure water tank 220 and the water quenching tank 300, when the ceramic ring and the silicon material are cooled in the ceramic ring cooling tank and the silicon material cooling tank, the ceramic ring and the silicon material release heat, the released heat is absorbed by the ultrapure water in the jacket structure to improve the temperature of the ultrapure water, and then the ultrapure water is used for cleaning after being heated in the ultrasonic tank 120, the quick-discharge rinsing tank 210, the ultrasonic pure water tank 220 and the water quenching tank 300, and the energy (electric quantity) consumption of the subsequent heating to the required temperature can be improved through absorbing the heat in the ceramic ring and the silicon material cooling, firstly the effect of heat utilization can be achieved, secondly, the energy saving and consumption reduction degree can be further improved, and further reduced.
Because caustic soda needs to be added into the alkaline washing tank 110 for washing, in the process of washing the ceramic ring, silica powder on the ceramic ring reacts with caustic soda to generate sodium silicate, and then the sodium silicate is discharged into the ground tank 400 together, that is, in the ground tank 400, the residual caustic soda of the reaction and the sodium silicate obtained after the reaction exist, the waste water in the ground tank 400 contains alkali and salt, so that the subsequent treatment discharge is not favored, and on the basis of the condition that the waste water in the ground tank 400 contains no caustic soda, the concentrated water outlet of the ceramic membrane filter 500 is connected with the ground tank 400 and is used for removing alkaline substances (residual caustic soda of the reaction), after the ceramic membrane filter 500 filters the waste water, clean filtered water is produced, concentrated water enriched with silica powder is also produced, and the concentrated water is introduced into the ground tank 400, so that the silica powder in the concentrated water continuously reacts with the residual caustic soda in the ground tank 400 to generate sodium silicate, and the waste water in the ground tank 400 contains only sodium silicate, and does not contain caustic soda.
In this application, silica flour is separated from filtered water through ceramic membrane filter 500 and is recycled to the inside of the system (filtered water is recycled to alkaline washing tank 110, concentrated water is used for consuming alkali liquor in ground tank 400), and according to the concentrated water component and the filtered water component, the concentrated water containing silica flour is used for treating residual alkali liquor in ground tank 400, and filtered water from which silica flour is removed is recycled to alkaline washing tank 110, so that not only can the pure water consumption be saved, but also the problem of additional consumption of caustic soda due to introduction of silica flour into alkaline washing tank 110 can be avoided. The ceramic membrane filter 500 not only performs a filtering function, but also provides a dual-purpose effect of treating the concentrated water of the residual alkali solution in the ground tank 400.
Because silica flour and caustic soda reaction can produce hydrogen, therefore, the system disclosed herein can also include hydrogen storage tank 620, and the top of ground jar 400 is provided with the gas outlet, and the gas outlet links to each other with hydrogen storage tank 620, and hydrogen that the reaction obtained is retrieved through hydrogen storage tank 620 avoids the hydrogen extravagant, and this part hydrogen can be used for cold hydrogenation stage to use.
In order to promote the reaction of the silicon powder and the caustic soda in the ground tank 400, so that the reaction of the caustic soda in the ground tank 400 is complete and is consumed, optionally, a stirring device is arranged in the ground tank 400, and the waste water in the ground tank 400 is stirred by the stirring device, so that the caustic soda in the waste water is fully contacted with the silicon powder and reacts, the consumption of the caustic soda in the waste water is complete, the waste water in the ground tank 400 is ensured to only contain sodium silicate, and the waste water is ensured to contain no caustic soda, thereby being beneficial to ensuring no waste discharge in subsequent treatment. At the same time, the waste water in the ground tank 400 is agitated by the agitating means, so that the hydrogen in the waste water is advantageously released and then recovered.
In this application, filter the silica flour in the waste water through ceramic membrane filter 500, specifically, the filtration aperture of ceramic membrane filter 500 is less than or equal to 20nm, filtration aperture is less than or equal to 20nm, can filter the silica flour of 99.7% more, can improve the clean degree of filtration water, so that the silica flour content of filtration water is lower, thereby can avoid consuming caustic soda in alkaline wash tank 110, and then make ceramic membrane filter 500 filter more silica flour and can avoid filtering water and exist silica flour and lead to its alkali lye in alkaline wash tank 110 when the retrieval and utilization, thereby prevent direct retrieval and utilization and cause the consumption and the waste of caustic soda. Meanwhile, when the silicon rod coming out of the reduction furnace is cleaned by the silicon powder cleaning machine 200, silicon powder particles attached to the silicon rod are very fine due to complex chemical reaction in the reduction furnace, so that the silicon powder cleaned from the silicon rod cannot be filtered cleanly by conventional filtering equipment, the ceramic membrane filter 500 is adopted, the filtering aperture is less than or equal to 20nm, the fine silicon powder can be effectively filtered, and the silicon powder is prevented from entering the alkaline washing tank 110 to consume alkaline liquor.
Preferably, the water yield of the ceramic membrane filter 500 is equal to or higher than 85%, the total amount of wastewater discharged from the ultrasonic pure water tank 220 and the water quenching tank 300 is 13 tons per hour, while the alkaline washing tank 110 needs 10 tons per hour of filtered water, and at the same time, a part of wastewater is consumed when the ceramic membrane filter 500 filters and cannot realize dry-wet separation, and a part of wastewater is discharged into the ground tank 400, so that the water yield of the ceramic membrane filter 500 is equal to or higher than 85% according to the supply-demand relationship, and 13×85% =11.05, that is, the filtered water of the ceramic membrane filter 500 produces water per hour is 11 tons, so that the requirement of the alkaline washing tank 110 can be satisfied to reach the supply-demand balance, the condition of supply and demand is avoided, and the whole system can stably operate.
As described above, the wastewater discharged from the alkaline washing tank 110, the ultrasonic tank 120 and the quick-discharge rinsing tank 210 is introduced into the ground tank 400, since the temperature of 10 tons of wastewater discharged from the alkaline washing tank 110 per hour is 85 ℃, the temperature of 1 ton of wastewater discharged from the ultrasonic tank 120 per hour is 85 ℃, and the temperature of 3 tons of wastewater discharged from the quick-discharge rinsing tank 210 per hour is 30 ℃, if these wastewater having temperature are directly discharged into the ground tank 400, it is inevitable that heat in these wastewater is wasted, and therefore, in an alternative embodiment, the system disclosed herein further comprises a first heat exchanger, wherein the water outlets of the alkaline washing tank 110, the ultrasonic tank 120 and the quick-discharge rinsing tank 210 are all connected to the tube side inlet of the first heat exchanger, the tube side outlet of the first heat exchanger is connected to the ground tank 400, the ultrapure water tube 610 is connected to the shell side inlet of the first heat exchanger, and the shell side outlets of the ultrasonic tank 120, the quick-discharge rinsing tank 220 and the water quenching tank 300 are all connected to the water inlets of the ultrasonic tank 300.
The discharged hot waste water is introduced into the tube pass of the first heat exchanger to exchange heat with the ultrapure water in the shell pass of the first heat exchanger, so that the ultrapure water in the shell pass of the first heat exchanger is heated, the temperature of the ultrapure water is increased, the ultrapure water is preheated, the temperature of the ultrapure water can be increased by recycling heat in the waste water, the energy (electricity) consumption for subsequent heating to the required temperature can be reduced, the effect of heat utilization can be achieved, the energy saving and consumption reduction degree can be further improved, and the electricity consumption can be further reduced.
Further, the temperature of 3 tons of wastewater discharged per hour from the quick-discharge rinsing tank 210 is 30 ℃, the preheating effect on ultrapure water is poor, and if the wastewater is mixed with other wastewater, the temperature of the mixed whole wastewater is reduced, so that the preheating effect on ultrapure water is poor.
The hot waste water discharged from the alkaline washing tank 110 and the ultrasonic tank 120 is only introduced into the second heat exchanger to preheat the ultrapure water, so that the temperature reduction of the whole waste water after mixing caused by the mixed preheating of the waste water discharged from the quick-discharge rinsing tank 210 at the temperature of only 30 ℃ is avoided, the deterioration of the preheating effect on the ultrapure water is avoided, the heat recovery in the waste water is ensured, the preheating effect on the ultrapure water is ensured, the energy (electric quantity) consumption for subsequent heating to the required temperature is further ensured, and the power consumption is further reduced.
The technical features of the above-described embodiments may be arbitrarily combined, and all possible combinations of the technical features in the above-described embodiments are not described for brevity of description, however, as long as there is no contradiction between the combinations of the technical features, they should be considered as the scope of the description.
The above examples only represent a few embodiments of the present application, which are described in more detail and are not to be construed as limiting the scope of the claims. It should be noted that it would be apparent to those skilled in the art that various modifications and improvements could be made without departing from the spirit of the present application, which would be within the scope of the present application. Accordingly, the scope of protection of the present application is to be determined by the claims appended hereto.
Claims (4)
1. The ultra-pure water cleaning energy-saving consumption-reducing system in the production process of polycrystalline silicon is characterized by comprising a ceramic ring cleaning machine (100), a silicon material cleaning machine (200), a water quenching tank (300), a ground tank (400), a ceramic membrane filter (500) and a hydrogen storage tank (620), wherein the ceramic ring cleaning machine (100) is provided with an alkaline cleaning tank (110) and an ultrasonic tank (120), the temperatures of ultra-pure water in the alkaline cleaning tank (110) and the ultrasonic tank (120) are 85 ℃, the silicon material cleaning machine (200) is provided with a quick-discharge rinsing tank (210) and an ultrasonic pure water tank (220), the temperature of ultra-pure water in the quick-discharge rinsing tank (210) is 30 ℃, the temperature of ultra-pure water in the ultrasonic pure water tank (220) is 70 ℃, the temperature of ultra-pure water in the water quenching tank (300) is 80 ℃, water inlets of the ultrasonic tank (120), the quick-discharge rinsing tank (210), the ultrasonic pure water tank (220) and the ultra-pure water tank (300) are connected with a pipeline (610), the ultra-pure water tank (110), the ultra-pure water tank (210) and the ultra-pure water filter (300) are connected with the water inlet (300), the filtering water outlet of the ceramic membrane filter (500) is connected with the water inlet of the alkaline washing tank (110), the concentrated water outlet of the ceramic membrane filter (500) is connected with the ground tank (400) and is used for removing alkaline substances, the top of the ground tank (400) is provided with an air outlet, the air outlet is connected with the hydrogen storage tank (620), and a stirring device is arranged in the ground tank (400).
2. The ultrapure water cleaning energy-saving consumption reduction system in the production process of polysilicon according to claim 1, further comprising a first heat exchanger, wherein water outlets of the alkaline washing tank (110), the ultrasonic tank (120) and the quick-discharge rinsing tank (210) are connected with a tube side inlet of the first heat exchanger, a tube side outlet of the first heat exchanger is connected with the ground tank (400), an ultrapure water pipeline (610) is connected with a shell side inlet of the first heat exchanger, and a shell side outlet of the first heat exchanger is connected with water inlets of the ultrasonic tank (120), the quick-discharge rinsing tank (210), the ultrasonic pure water tank (220) and the water quenching tank (300).
3. The ultrapure water cleaning energy-saving consumption reduction system in the production process of polysilicon according to claim 1, further comprising a second heat exchanger, wherein the water outlets of the alkaline washing tank (110) and the ultrasonic tank (120) are connected with a tube side inlet of the second heat exchanger, a tube side outlet of the second heat exchanger is connected with the ground tank (400), an ultrapure water pipeline (610) is connected with a shell side inlet of the second heat exchanger, and a shell side outlet of the second heat exchanger is connected with water inlets of the ultrasonic tank (120), the quick-discharge rinsing tank (210), the ultrasonic pure water tank (220) and the water quenching tank (300).
4. The ultrapure water cleaning energy-saving consumption-reducing system in the production process of the polysilicon according to claim 1, wherein the water yield of the ceramic membrane filter (500) is more than or equal to 85 percent.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202311402851.4A CN117139264B (en) | 2023-10-27 | 2023-10-27 | Ultrapure water cleaning energy-saving consumption-reducing system in polycrystalline silicon production process |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202311402851.4A CN117139264B (en) | 2023-10-27 | 2023-10-27 | Ultrapure water cleaning energy-saving consumption-reducing system in polycrystalline silicon production process |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN117139264A CN117139264A (en) | 2023-12-01 |
| CN117139264B true CN117139264B (en) | 2024-04-05 |
Family
ID=88910364
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202311402851.4A Active CN117139264B (en) | 2023-10-27 | 2023-10-27 | Ultrapure water cleaning energy-saving consumption-reducing system in polycrystalline silicon production process |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN117139264B (en) |
Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN203030566U (en) * | 2012-12-24 | 2013-07-03 | 英利能源（中国）有限公司 | Cleaning machine for recycled silicon wafers |
| CA2803383A1 (en) * | 2012-02-21 | 2013-08-21 | Wacker Chemie Ag | Chunk polycrystalline silicon and process for cleaning polycrystalline silicon chunks |
| CN205442658U (en) * | 2015-12-31 | 2016-08-10 | 天津英利新能源有限公司 | Energy -concerving and environment -protective silicon material cleaning machine |
| CN208695748U (en) * | 2018-07-09 | 2019-04-05 | 阜宁协鑫光伏科技有限公司 | System for carrying out degumming to the boiling glue on silicon wafer |
| CN112452897A (en) * | 2020-07-06 | 2021-03-09 | 上海思恩装备科技股份有限公司 | Full-automatic magnetic ring steam cleaning equipment |
| CN212944360U (en) * | 2020-08-24 | 2021-04-13 | 新疆大全新能源股份有限公司 | Cleaning device for silicon nitride ceramic ring for polycrystalline silicon reduction furnace |
| CN217962008U (en) * | 2022-06-28 | 2022-12-06 | 宁夏润阳硅材料科技有限公司 | Polycrystalline silicon production waste gas and cleaning wastewater treatment system |
| CN217963815U (en) * | 2022-06-28 | 2022-12-06 | 宁夏润阳硅材料科技有限公司 | Multifunctional cleaning system for polycrystalline silicon reduction furnace |
| CN116287664A (en) * | 2023-05-15 | 2023-06-23 | 江苏永钢集团有限公司 | High-speed wire on-line heat treatment equipment and process based on energy recycling |
| CN219597456U (en) * | 2022-12-27 | 2023-08-29 | 金发科技股份有限公司 | Cleaning equipment |
-
2023
- 2023-10-27 CN CN202311402851.4A patent/CN117139264B/en active Active
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA2803383A1 (en) * | 2012-02-21 | 2013-08-21 | Wacker Chemie Ag | Chunk polycrystalline silicon and process for cleaning polycrystalline silicon chunks |
| CN203030566U (en) * | 2012-12-24 | 2013-07-03 | 英利能源（中国）有限公司 | Cleaning machine for recycled silicon wafers |
| CN205442658U (en) * | 2015-12-31 | 2016-08-10 | 天津英利新能源有限公司 | Energy -concerving and environment -protective silicon material cleaning machine |
| CN208695748U (en) * | 2018-07-09 | 2019-04-05 | 阜宁协鑫光伏科技有限公司 | System for carrying out degumming to the boiling glue on silicon wafer |
| CN112452897A (en) * | 2020-07-06 | 2021-03-09 | 上海思恩装备科技股份有限公司 | Full-automatic magnetic ring steam cleaning equipment |
| CN212944360U (en) * | 2020-08-24 | 2021-04-13 | 新疆大全新能源股份有限公司 | Cleaning device for silicon nitride ceramic ring for polycrystalline silicon reduction furnace |
| CN217962008U (en) * | 2022-06-28 | 2022-12-06 | 宁夏润阳硅材料科技有限公司 | Polycrystalline silicon production waste gas and cleaning wastewater treatment system |
| CN217963815U (en) * | 2022-06-28 | 2022-12-06 | 宁夏润阳硅材料科技有限公司 | Multifunctional cleaning system for polycrystalline silicon reduction furnace |
| CN219597456U (en) * | 2022-12-27 | 2023-08-29 | 金发科技股份有限公司 | Cleaning equipment |
| CN116287664A (en) * | 2023-05-15 | 2023-06-23 | 江苏永钢集团有限公司 | High-speed wire on-line heat treatment equipment and process based on energy recycling |
Also Published As
| Publication number | Publication date |
|---|---|
| CN117139264A (en) | 2023-12-01 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN102432022B (en) | Method for producing ultra-pure quartz sand by vein quartz and high-temperature chlorination device | |
| CN101920966B (en) | Method for producing porous nano silica and active carbon by utilizing rice hull ash | |
| CN105948062A (en) | Preparation method of highly pure quartz sands | |
| CN105084370B (en) | A kind of slurry treating method and apparatus in cold hydrogenation process | |
| CN214570772U (en) | Alkali washing device for preparing high-purity graphite by using alkali-acid method | |
| CN111153409A (en) | Method for purifying quartz sand by removing iron through microwave heating and ultrasonic-assisted acid leaching | |
| CN105129807B (en) | A kind of method that utilization chlorosilane raffinate prepares superfine silicon dioxide | |
| CN105036081A (en) | Method for producing HCl gas through chlorosilane residual liquor | |
| CN107140648B (en) | A kind of preparation method of essence diatomite | |
| CN117139264B (en) | Ultrapure water cleaning energy-saving consumption-reducing system in polycrystalline silicon production process | |
| CN104003405B (en) | Environment-friendly method for preparing high-purity quartz sand by utilizing vein quartz and quartz stone calcining furnace | |
| CN101623695B (en) | Method for cleaning graphitic silicon materials | |
| CN103803981A (en) | Method for preparing submicron silicon carbide powder | |
| CN216910117U (en) | Maltodextrin apparatus for producing | |
| CN101857253A (en) | Process for producing aluminium hydroxide, silicic acid and sodium carbonate by utilizing fly ash | |
| CN103754844B (en) | A kind of stirred crystallization produces the device of electron-level phosphoric acid | |
| CN210506153U (en) | Waste heat recovery and utilization system of PTA refining unit mother liquor | |
| CN102030342B (en) | Method and device for recovering anhydrous sodium sulfate from hydroxy benzotriazole production waste liquor | |
| CN103771370B (en) | The device of electron-level phosphoric acid is produced in a kind of U-tube crystallization | |
| CN110625851A (en) | Rubber cracking residue recycling process | |
| CN203833616U (en) | Device for producing electronic-grade phosphoric acid by division plate crystallization | |
| CN103771368B (en) | A kind of baffle crystallization produces the device of electron-level phosphoric acid | |
| CN217662827U (en) | Energy-saving phthalocyanine blue apparatus for producing | |
| CN113856280B (en) | Method special for pumping and filtering concentrated acid in cubic boron nitride | |
| CN218740711U (en) | Dry treatment system for slag slurry |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| TA01 | Transfer of patent application right | ||
| TA01 | Transfer of patent application right |
Effective date of registration: 20240315 Address after: No. 596 Shanshui Avenue, Industrial Park, Pingluo County, Shizuishan City, Ningxia Hui Autonomous Region, 753400 Applicant after: Ningxia Runyang Silicon Material Technology Co.,Ltd. Country or region after: Zhong Guo Address before: 016200 A2--7 Cultural Industrial Park, Aole Zhaoqi Town, Otog Front Banner, Ordos City City, Inner Mongolia Applicant before: Inner Mongolia Runyang Yueda New Energy Technology Co.,Ltd. Country or region before: Zhong Guo Applicant before: Ningxia Runyang Silicon Material Technology Co.,Ltd. |
|
| GR01 | Patent grant | ||
| GR01 | Patent grant |