CN1171189C - Plasma display panel and its manufacture - Google Patents
Plasma display panel and its manufacture Download PDFInfo
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- CN1171189C CN1171189C CNB001225006A CN00122500A CN1171189C CN 1171189 C CN1171189 C CN 1171189C CN B001225006 A CNB001225006 A CN B001225006A CN 00122500 A CN00122500 A CN 00122500A CN 1171189 C CN1171189 C CN 1171189C
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Abstract
The present invention relates to a plasma display panel (pdp) and a manufacture method thereof. A blocking wall in the shape of a square grid is directly formed on a back base plate of the plasma display panel, and a columnar convex block corresponding to a concave notch on the blocking wall is formed on a front base plate of the plasma display panel. Manufacture techniques are simple, and the front base plate and the back base plate can be aligned easily. In addition, the size of an opening of the blocking wall in the shape of a square grid and the size of the concave notch can be easily adjusted according to requirements of applications in a manufacture process.
Description
The present invention relates to a kind of plasma display and manufacture method thereof, particularly relate to a kind of structure and manufacture method of its square grid shape barrier rib.
Plasma display (Plasma Display Panel; Be designated hereinafter simply as PDP) barrier rib (rib), the much more general structures of using strips (strip).Also have at present and adopt the square grid shape structure, disclosed in its United States Patent (USP) (US 5701056) as NEC Corporation.Yet the structure that NEC disclosed is to form the strip barrier rib on the metacoxal plate of PDP, and forms the barrier rib of square grid shape on prebasal plate, more forward and backward two substrates combination back is constituted; As shown in Figure 1.Think over the disclosed structure of NEC, still have following four shortcomings to have to be overcome.
The structure of NEC and since prebasal plate many manufacture craft of one barrier rib, so cost is higher comparatively speaking.
When forward and backward substrate in combination, the accuracy requirement that both aim at is quite strict, therefore deepens the degree of difficulty of manufacture craft.
Can accurately aim in order to ensure forward and backward substrate, often need to strengthen the metacoxal plate or the thickness of prebasal plate barrier rib.Therefore, also sacrifice the aperture opening ratio of PDP.
Because the thickness of barrier rib, the useful area of related feasible coating phosphor body diminishes.
The objective of the invention is to propose a kind of structure and manufacture method thereof of plasma display, not only manufacture craft is simple for its square grid shape barrier rib, and can overcome the problem that NEC meets with.
Another object of the present invention can limit the size of needed depression breach by simple steps for proposing the manufacture method of PDP square grid shape barrier rib.
The object of the present invention is achieved like this, and a kind of plasma display promptly is provided, and this plasma display panel comprises: one first substrate; One second substrate disposes in parallel with each other with this first substrate, makes and forms a discharge space between this first substrate and this second substrate; A plurality of column-like projection blocks, be formed on this second substrate, this column-like projection block forms the position with respect to the breach that should cave on this first substrate, and a square grid shape barrier rib is formed on this first substrate, this square grid shape barrier rib includes a plurality of first stripe region, and these a plurality of first stripe region are defined as a plurality of row discharge spaces with this discharge space; A plurality of second stripe region, each above-mentioned second stripe region crisscrosses each above-mentioned first stripe region, and in each above-mentioned row discharge space, each above-mentioned second stripe region has a depression breach, makes gas cave in breach and circulate in this row discharge space by this.
The present invention also provides a kind of manufacture method of plasma display, comprising: one first substrate is provided, and this first substrate is provided with an aspirating hole; Form a plurality of strip electrodes on this first substrate, each above-mentioned strip electrode is parallel to a first direction; On above-mentioned strip electrode and above-mentioned first substrate, form an overlayer; One second substrate is provided, disposes in parallel with each other, make and form a discharge space, this discharge space and this aspirating hole conducting between this first substrate and this second substrate with this first substrate; On this first substrate, form a square grid shape barrier rib, this square grid shape barrier rib includes a plurality of first stripe region, these a plurality of first stripe region are defined as a plurality of row discharge spaces with this discharge space, a plurality of second stripe region, each above-mentioned second stripe region is staggered in each above-mentioned first stripe region, and in each above-mentioned row discharge space, each above-mentioned second stripe region has a depression breach, makes gas cave in breach and circulate in this row discharge space by this; Form a plurality of column-like projection blocks on this second substrate, this column-like projection block is formed on the position that corresponds to this depression breach on this first substrate; The periphery of this first substrate is combined with the periphery of this second substrate, to seal this discharge space; By this aspirating hole this discharge space is bled, make gas this bleeding point extraction certainly in this row discharge space by this depression breach.
Below in conjunction with accompanying drawing, describe embodiments of the invention in detail, wherein:
Fig. 1 is the structural drawing of the disclosed PDP barrier rib of NEC;
Fig. 2 A to Fig. 2 E is for forming the three-dimensional section process flow diagram of first kind of manufacture method of square grid shape barrier rib;
Fig. 3 A is the combination synoptic diagram of PDP front-back baseboard part-structure;
After Fig. 3 B finishes for Fig. 3 A makes up, along the cut-open view of A-A ' direction;
Fig. 4 A to Fig. 4 B is for forming the three-dimensional section process flow diagram of second kind of manufacture method of square grid shape barrier rib;
Fig. 5 A to Fig. 5 C is for forming the three-dimensional section process flow diagram of the third manufacture method of square grid shape barrier rib;
Fig. 6 A to Fig. 6 D is for forming the three-dimensional section process flow diagram of the 4th kind of manufacture method of square grid shape barrier rib.
With reference to Fig. 3 A, Fig. 3 B, Fig. 3 A shows the combination synoptic diagram of PDP front-back baseboard part-structure; After Fig. 3 B displayed map 3A combination is finished, along the cut-open view of A-A ' direction.The disclosed plasma display of the present invention comprises: one first substrate 300; One second substrate 304 disposes in parallel with each other with above-mentioned first substrate 300, makes with this to form a discharge space between above-mentioned first substrate 300 and above-mentioned second substrate 304.Wherein, on above-mentioned first substrate 300, be formed with square grid shape barrier rib 302; On above-mentioned second substrate 304, be formed with multicolumn shape projection 312, and an aspirating hole 316.
Square grid shape barrier rib 302 on above-mentioned first substrate 300 includes:
A plurality of first stripe region 302
1, these a plurality of first stripe region 302
1This discharge space is defined as a plurality of row discharge spaces 308;
A plurality of second stripe region 302
2, each above-mentioned second stripe region 302
2Crisscross each above-mentioned first stripe region 302
1, and in each above-mentioned row discharge space 308, each above-mentioned second stripe region 302
2Have a depression breach 306, make gas cave in breach 306 and in this row discharge space, circulate by this.
A plurality of column-like projection blocks 312 on above-mentioned second substrate 304 form the position with respect to depression breach 306 on above-mentioned first substrate 300; And the projecting height of above-mentioned column-like projection block is H
2Depth H less than above-mentioned depression breach 306
1
Therefore (with reference to Fig. 3 B), when above-mentioned first substrate 300 makes up with above-mentioned second substrate 304, in the time of in the depression breach 306 of column-like projection block 312 on above-mentioned second substrate 304 on embedding above-mentioned first substrate 300, can in above-mentioned depression breach 306, keep a passage 314, gas still can be circulated in this row discharge space by this passage 314.
The manufacture method of the plasma display that the present invention proposes then comprises the following steps:
(9) provide first substrate 300, this first substrate 300 is provided with an aspirating hole 316.
(10) a plurality of strip electrodes of formation are (not shown in Fig. 3 A～3B), each above-mentioned strip electrode is parallel to a first direction on this first substrate 300.
(11)) it is (not shown in Fig. 3 A～3B) to form an overlayer on above-mentioned strip electrode and above-mentioned first substrate 300.
(12) provide one second substrate 304, this second substrate and this first substrate 300 are provided with parallel to each other; Form a discharge space, this discharge space and 316 conductings of this aspirating hole between this first substrate 300 and this second substrate 304.
(13) form a square grid shape barrier rib 302 on this first substrate 300, this square grid shape barrier rib 302 includes a plurality of first stripe region 302
1With a plurality of second stripe region 302
2, these a plurality of first stripe region 302
1This discharge space is defined as a plurality of row discharge spaces 308, each above-mentioned second stripe region 302
2Crisscross each above-mentioned first stripe region 302
1And in each above-mentioned row discharge space 308, each above-mentioned second stripe region 302
2Has a depression breach 306, this second stripe region 302
2This depression breach 306 have a cup depth H
1, gas can be circulated in this row discharge space 308 by this depression breach 306.
(14) form a plurality of column-like projection blocks 312 on this second substrate 304, this column-like projection block 312 is formed on the position of this depression breach 306 on corresponding this first substrate 300, and this column-like projection block 312 has a projecting height H
2, and this projecting height H
2Less than this cup depth H
1
(15) periphery with this first substrate 300 combines with the periphery of this second substrate 304, to seal this discharge space, make this depression breach 306 of part on these column-like projection block 312 these first substrates 300 of meeting embedding on this second substrate 304, and in this depression breach 306, keep a passage 314, gas still can be circulated in this row discharge space 308 by this passage 314.
(16) bleed by 316 pairs of these discharge spaces of this aspirating hole, make that gas is drawn out of outside this discharge space by this passage 314 and from this bleeding point 316 in this row discharge space 308.
The manufacture craft of above-mentioned column-like projection block 312 can be: before second substrate, 304 coating surface protective seams (MgO), utilize wire mark or optical etching manufacture craft to generate some column protrusions earlier on second substrate, 304 surface of semi-finished; After last one MgO coating, the place promptly can form this column-like projection block 312 at corresponding column protrusion.
In the present embodiment, each pixel discharge space is by first stripe region 302
1With second stripe region 302
2Isolated, have only passage 314 to connect each the pixel discharge space that belongs to same row discharge space 308, and by these column-like projection block 312 height H
2Restriction, make this passage 314 have H at least apart from prebasal plate 304 surfaces
2Distance.Because each pixel discharge space has column-like projection block 312 to be intercepted in next-door neighbour's prebasal plate 304 surfaces, so can reduce in drive signal and keep the cycle in (Sustain Period), when header board X-Y electrode back and forth drives ionized gas, the interference between different pixels (cross talk) phenomenon.But this column-like projection block 312 is an omissible structure, and each pixel discharge space also can only rely on first stripe region 302
1With second stripe region 302
2Completely cut off, effects of jamming between the pixel of attenuating is so also arranged.
Go up formation square grid shape barrier rib at above-mentioned first substrate (metacoxal plate), following four kinds of manufacture methods are arranged.
[first method]
Fig. 2 A to Fig. 2 E shows that the present invention forms the three-dimensional section process flow diagram of first kind of manufacture method of square grid shape barrier rib.
At first, provide a substrate 200; Wherein, aforesaid substrate 200 is provided with a plurality of strip electrodes 202, and each above-mentioned strip electrode 200 is parallel to a first direction (D represents with arrow).For for purpose of brevity, only illustrate two strip electrodes in this embodiment.
Then on above-mentioned strip electrode 202 and aforesaid substrate 200, form overlayer (overcoatlayer) 204; Shown in Fig. 2 A.
On above-mentioned overlayer 204, form moulding layer 206 again.Shown in Fig. 2 B, the surface of above-mentioned moulding layer 206 is formed with a plurality of strip projection 206a; Each above-mentioned projection 206a is positioned at the central authorities in 202 zones of per two above-mentioned strip electrodes, and is parallel to above-mentioned first direction.
In this embodiment, the moulding layer 206 shown in Fig. 2 B has following two kinds of possible production methods.
(1) first kind of mode: earlier with whole printing (solid print), on above-mentioned overlayer 204, print multilayer (for example 7～8 layers) slurry, promptly form terrace part 206b after the baking (baking).Then, re-use screen painting (pattem print), print 1～3 layer of slurry, baking (baking) back forms above-mentioned strip projection 206a.
(2) second way: use screen painting earlier, print 1～3 layer of slurry; After the baking, form a plurality of strips along above-mentioned first direction and protrude the district, with this bottom as strip projection 206a.Carry out whole printing again, printing multilayer (for example 7～8 floor) slurry on the above-mentioned overlayer 204 and in the above-mentioned strip protrusion district, promptly form the above-mentioned moulding layer 206 shown in Fig. 2 B after the baking (baking).
After finishing above-mentioned moulding layer 206, with mode formation dry film photoresist layer on above-mentioned moulding layer of press mold.
Then, exposure, the above-mentioned dry film photoresist layer that develops limit shade 208 and form on above-mentioned moulding layer 206.Above-mentioned qualification shade 208 shown in Fig. 2 C, has the structure of square grid shape, comprises a plurality of first rectangular district 208
1, and a plurality of second rectangular district 208
2Each above-mentioned first rectangular district 208
1Be parallel to this first direction and be formed on the above-mentioned strip projection 206a; Each above-mentioned second rectangular district 208
2Form staggered perpendicular to above-mentioned first direction and on a plurality of strip projection 206a and terrace part 206b.
Carry out sandblast (sand blast) program, remove the moulding layer 206 that is exposed to outside the above-mentioned qualification shade 208,, (comprising: a plurality of first rectangular wall district 212 and form square grid shape barrier rib 212 up to exposing above-mentioned overlayer 204
1With a plurality of second rectangular wall district 212
2); Shown in Fig. 2 D.
After finishing barrier rib, above-mentioned qualification shade 208 (promptly develop after dry film photoresist) is removed, stamp phosphor body 210 again, promptly as the metacoxal plate of PDP; Shown in Fig. 2 E.It should be noted: each the second rectangular wall district 212 in barrier rib 212
2On, be formed with depression breach 209.
At last, above-mentioned metacoxal plate after prebasal plate combination, promptly can carry out down-stream.
According to method of the present invention, with reference to Fig. 2 C, Fig. 2 E as can be known, change (above-mentioned mask layer 208) first rectangular district 208 respectively
1Width L
1With the above-mentioned second rectangular district 208
2Width L
2, can adjust the thickness of barrier rib, thereby influence each pixel grid size, and obtain the suitable opening rate.
In addition, with reference to Fig. 2 C, Fig. 2 E as can be known, change the width L of the terrace part 206b of above-mentioned moulding layer 206 respectively
3With height L
4, promptly can control the width and the degree of depth of above-mentioned depression breach 209.
[second method]
Fig. 4 A to Fig. 4 B shows that the present invention forms the three-dimensional section process flow diagram of second kind of manufacture method of square grid shape barrier rib.
At first, provide a substrate 400; Wherein, aforesaid substrate 400 is provided with a plurality of strip electrodes 402, and each above-mentioned strip electrode 402 is parallel to a first direction (D represents with arrow).For for purpose of brevity, only illustrate two strip electrodes in this embodiment.
On above-mentioned strip electrode 402 and aforesaid substrate 400, form overlayer 404.
Then, use screen painting (pattern print),, promptly constitute the square grid shape barrier rib of PDP on above-mentioned overlayer 404, to form the moulding layer 406 of square grid shape.Shown in Fig. 4 A, above-mentioned moulding floor 406 comprises a plurality of first rectangular district 406a, and a plurality of second rectangular district 406b.Each above-mentioned first rectangular district 406a is positioned on the above-mentioned overlayer 404 of 402 at per two above-mentioned strip electrodes, and is parallel to above-mentioned first direction; Each above-mentioned second rectangular district 406b is parallel to first direction, and perpendicular to above-mentioned first direction, staggered with a plurality of strip electrodes 402.
Above-mentioned moulding layer 406 is printed multilayer (for example 7～8 layers) slurry with screen painting on above-mentioned overlayer 404, after toasting and form.Because these a plurality of strip electrodes 402 are highly lower, so after the wire mark multilayer, this 406b top, moulding floor second rectangular district still is close to a flat surfaces.
At last, use screen painting, form a plurality of the 3rd rectangular district 407 and be respectively formed on each above-mentioned first rectangular district 406a.After finishing baking, the 3rd rectangular district 407 promptly becomes the top wall part of the first rectangular district 406a.Again, per two the 3rd rectangular districts 407 and the arbitrary second rectangular district 406b constitute the depression breach; With this, after the combination of current, metacoxal plate, gas can be by this breach and circulating in each row discharge space of caving in.
The above-mentioned the 3rd rectangular district 407 uses screen painting, prints multilayer strip pulp layer, after toasting and form.
[third party's method]
Fig. 5 A to Fig. 5 C shows that the present invention forms the three-dimensional section process flow diagram of the third manufacture method of square grid shape barrier rib.
At first, provide a substrate 500; Wherein, aforesaid substrate 500 is provided with a plurality of strip electrodes 502, and each above-mentioned strip electrode 502 is parallel to a first direction (D represents with arrow).In this embodiment for simplicity's sake, only illustrate two strip electrodes.
On above-mentioned strip shaped electric poles 502 how long and aforesaid substrate 500, form overlayer 504.On above-mentioned overlayer 504, form moulding layer 506 again; Shown in Fig. 5 A.In this embodiment, the making of above-mentioned moulding layer 506 is the modes with whole printing (solid print), prints multilayer (for example 7～8 layers) slurry on above-mentioned overlayer 504, after toasting and finish.
On above-mentioned moulding layer 506, form dry film photoresist layer.
Exposure, the above-mentioned dry film photoresist layer that develops, and on above-mentioned moulding layer 506, form qualification shade 508.Shown in Fig. 5 B, above-mentioned qualification shade 508 comprises a plurality of first rectangular district 508
1, and the many second rectangular district 508
2Each above-mentioned first rectangular district 508
1Be parallel to above-mentioned first direction, be positioned on 502 above-mentioned moulding layers 506 of per two above-mentioned strip electrodes.Each above-mentioned second rectangular district 508
2Extend along second direction, and perpendicular to each above-mentioned first rectangular district 508
1Each above-mentioned second rectangular district 508
2Between per two first rectangular districts 508
1Between locate to be formed with and disconnect district CR, to expose above-mentioned moulding layer 506.
At last, carry out grit blast procedure, remove the moulding layer 506 that is exposed to outside the above-mentioned qualification shade 508, expose overlayer 504, and the barrier rib 512 of formation square grid shape (comprises a plurality of first rectangular wall district 512
1With a plurality of second rectangular wall district 512
2); Shown in Fig. 5 C.Wherein, because disconnect the width L of district CR
7Much smaller than the size of square grid shape opening, so the degree of depth that is corroded during its sandblast degree of depth that will be etched much smaller than the square grid shape open area; Therefore still residual in each disconnects district CR have a moulding floor 506 of part; By the qualification of disconnection district CR, and on barrier rib, form depression breach 510.
According to method of the present invention, with reference to Fig. 5 B, Fig. 5 C as can be known, change the above-mentioned first rectangular district 508 respectively
1Width L
5With the above-mentioned second rectangular district 508
2Width L
6, can adjust the grid size of barrier rib 512, and obtain the suitable opening rate.
By changing the width L in above-mentioned disconnection district
7, can adjust the depression breach 510 width dimensions.
[cubic method]
Fig. 6 A to Fig. 6 D shows that the present invention forms the three-dimensional section process flow diagram of the 4th kind of manufacture method of square grid shape barrier rib.
At first, provide a substrate 600; Wherein, aforesaid substrate 600 is provided with a plurality of strip electrodes 602, and each above-mentioned strip electrode is parallel to a first direction (D represents with arrow).In this embodiment for simplicity's sake, only illustrate two strip electrodes.
On above-mentioned strip electrode 602 and aforesaid substrate 600, form overlayer 604.
On above-mentioned overlayer 604, form moulding layer 606; As shown in Figure 6A.In this embodiment, the making of above-mentioned moulding layer 606 in the mode of whole printing, is printed multilayer (for example 7～8 layers) slurry on above-mentioned overlayer 604, after toasting and finish.
Then, on above-mentioned moulding layer 606, form the sensitization qualification layer 608 of square grid shape.Shown in Fig. 6 B, above-mentioned sensitization limits floor 608 and comprises a plurality of first rectangular district 608
1, and a plurality of second rectangular district 608
2Each above-mentioned first rectangular district 608
1Be positioned on the above-mentioned moulding layer 606 of 602 at per two above-mentioned strip electrodes, and be parallel to above-mentioned first direction.Each above-mentioned second rectangular district 608
2Be parallel to a second direction, and perpendicular to above-mentioned first direction.The above-mentioned first rectangular district 608
1Height greater than the above-mentioned second rectangular district 608
2Height.
Above-mentioned sensitization limits the material of layer 608, is mixed and is constituted by photoactive substance and slurry.In addition, in this embodiment, sensitization limits layer 608 following two kinds of possible production methods.
(1) first kind of mode: use screen painting (pattern print) earlier, first sensitization of printing the multilayer square grid shape on above-mentioned moulding layer 606 limits layer, and making becomes the second rectangular district 608
2With the first rectangular district 608
1The bottom; Then re-use screen painting, limit second sensitization of printing strip on the layer along above-mentioned first direction in above-mentioned first sensitization and limit layer, making becomes the first rectangular district 608
1The top, so the sensitization that forms shown in Fig. 6 B limits layer 608.
(2) second way: use screen painting, second sensitization of printing the multilayer strip along above-mentioned first direction on above-mentioned moulding layer 606 limits layer, and making becomes the first rectangular district 608
1The bottom; Re-use screen painting, first sensitization that limits the square grid shape of printing multilayer on the layer in above-mentioned second sensitization limits layer, and the sensitization that forms shown in Fig. 6 B limits layer 608.
Then, with ultraviolet (UV) above-mentioned sensitization is limited layer 608 and expose, on above-mentioned moulding layer 606, limit shade 610 to form; Shown in Fig. 6 C.
At last, carry out grit blast procedure, remove and to be exposed to the outer moulding layer 606 of above-mentioned qualification shade 610, exposing above-mentioned overlayer 604, and form the barrier rib of square grid shape; Shown in Fig. 6 D.
In sum, the disclosed plasma display of the present invention comprises: one first substrate (metacoxal plate); One second substrate (prebasal plate) disposes in parallel with each other with above-mentioned first substrate, makes with this to form a discharge space between above-mentioned first substrate and above-mentioned second substrate.Wherein, on above-mentioned first substrate, be formed with the square grid shape barrier rib; On above-mentioned second substrate, be formed with multicolumn shape projection, and an aspirating hole.
Square grid shape barrier rib on above-mentioned first substrate includes: a plurality of first stripe region, and these a plurality of first stripe region are defined as a plurality of row discharge spaces with this discharge space; A plurality of second stripe region, each above-mentioned second stripe region crisscrosses each above-mentioned first stripe region, and in each above-mentioned row discharge space, each above-mentioned second stripe region has a depression breach, makes gas cave in breach and circulate in this row discharge space by this.
A plurality of column-like projection blocks on above-mentioned second substrate form the position with respect to depression breach on above-mentioned first substrate; And the projecting height of above-mentioned column-like projection block is H
2Depth H less than above-mentioned depression breach
1
The manufacture method of the plasma display that the present invention proposes comprises the following steps: that (1) provides first substrate, and this first substrate is provided with an aspirating hole.(2) form a plurality of strip electrodes on this first substrate, each above-mentioned strip electrode is parallel to a first direction.(3) form an overlayer on above-mentioned strip electrode and above-mentioned first substrate.(4) provide one second substrate, this second substrate and this first substrate are provided with parallel to each other; Form a discharge space, this discharge space and this aspirating hole conducting between this first substrate and this second substrate.(5) form a square grid shape barrier rib on this first substrate, this square grid shape barrier rib includes a plurality of first stripe region and a plurality of second stripe region, these a plurality of first stripe region are defined as a plurality of row discharge spaces with this discharge space, and each above-mentioned second stripe region crisscrosses each above-mentioned first stripe region; And in each above-mentioned row discharge space, each above-mentioned second stripe region has a depression breach, and this depression breach of this second stripe region has a cup depth H
1, make gas cave in breach and in this row discharge space, circulate by this.(6) form a plurality of column-like projection blocks on this second substrate, this column-like projection block is formed at the position of this depression breach on corresponding this first substrate, and this column-like projection block has a projecting height H
2, and this projecting height H
2Less than this cup depth H
1(7) periphery with this first substrate combines with the periphery of this second substrate, to seal this discharge space, make this column-like projection block on this second substrate can embed this depression breach of part on this first substrate, and in this depression breach, keep a passage, gas still can be circulated in this row discharge space by this passage.(8) by this aspirating hole this discharge space is bled, make in this row discharge space gas by this passage certainly this bleeding point be drawn out of outside this discharge space.
According to the present invention, go up formation square grid shape barrier rib at above-mentioned first substrate (metacoxal plate), following four kinds of manufacture methods are arranged.
Make first method of barrier rib according to the present invention, comprise the steps.(a) at first, provide a substrate, wherein, how long aforesaid substrate is provided with strip shaped electric poles, and each above-mentioned strip electrode is parallel to a first direction.(b) on above-mentioned strip electrode and aforesaid substrate, form overlayer.(c) on above-mentioned overlayer, form moulding layer; Wherein, how long the surface of above-mentioned moulding layer is formed with the strip projection; Each above-mentioned projection is positioned on the interelectrode above-mentioned moulding layer of per two above-mentioned strips, and is parallel to above-mentioned first direction.(d) then, on above-mentioned moulding layer, form dry film photoresist layer.(e) the above-mentioned dry film photoresist layer that exposes again, develop limits shade on above-mentioned moulding layer and form; Wherein, above-mentioned qualification shade comprises a plurality of first rectangular district, and a plurality of second rectangular district; Each above-mentioned first rectangular district is formed on each above-mentioned strip projection; Each above-mentioned second rectangular district is parallel to a second direction, and perpendicular to above-mentioned first direction.(f) last, carry out grit blast procedure, remove and be exposed to the outer moulding layer of above-mentioned qualification shade, exposing above-mentioned overlayer, and form above-mentioned square grid shape barrier rib.
Make second method of barrier rib according to the present invention, comprise the steps.(a) at first, provide a substrate; Wherein, aforesaid substrate is provided with a plurality of strip electrodes, and each above-mentioned strip electrode is parallel to a first direction.(b) form overlayer on above-mentioned strip electrode and aforesaid substrate.(c) use screen painting, on above-mentioned overlayer, to form the moulding layer of square grid shape.Wherein, above-mentioned moulding floor comprises a plurality of first rectangular district, and a plurality of second rectangular district; Each above-mentioned first rectangular district is positioned on the interelectrode above-mentioned overlayer of per two above-mentioned strips, and is parallel to above-mentioned first direction; Each above-mentioned second rectangular district is parallel to second direction, and perpendicular to above-mentioned first direction.(d) last, use screen painting, on above-mentioned moulding floor, form a plurality of the 3rd rectangular district; Wherein, each above-mentioned the 3rd sliver layer is respectively formed on first above-mentioned first sliver layer, forms above-mentioned square grid shape barrier rib with this.
Make third party's method of barrier rib according to the present invention, comprise the steps.(a) at first, provide a substrate; Wherein, aforesaid substrate is provided with a plurality of strip electrodes, and each above-mentioned strip electrode is parallel to a first direction.(b) on above-mentioned strip shaped electric poles how long and aforesaid substrate, form overlayer.(c) on above-mentioned overlayer, form moulding layer.(d) on above-mentioned moulding layer, form dry film photoresist layer.(e) exposure, the above-mentioned dry film photoresist layer that develops, and on above-mentioned moulding layer, form the qualification shade.Wherein, above-mentioned qualification shade comprises a plurality of first rectangular district, and a plurality of second rectangular district; Each above-mentioned first rectangular district is parallel to above-mentioned first direction, is positioned on the interelectrode above-mentioned moulding layer of per two above-mentioned strips; Extend along second direction in each above-mentioned second rectangular district, and perpendicular to each above-mentioned first rectangular district; Each above-mentioned second rectangular district is formed with at the place of reporting to the leadship after accomplishing a task with each above-mentioned strip electrode and disconnects the district, to expose above-mentioned moulding layer.(f) last, carry out grit blast procedure, remove and be exposed to the outer moulding layer of above-mentioned qualification shade, expose above-mentioned overlayer, and form above-mentioned square grid shape barrier rib; Wherein, still residual in each above-mentioned disconnection district have an above-mentioned moulding floor.
According to the present invention, make the cubic method of barrier rib, comprise the steps.(a) at first, provide a substrate; Wherein, aforesaid substrate is provided with a plurality of strip electrodes, and each above-mentioned strip electrode is parallel to a first direction.(b) on above-mentioned strip electrode and aforesaid substrate, form overlayer.(c) on above-mentioned overlayer, form moulding layer.(d) sensitization of formation square grid shape limits layer on above-mentioned moulding layer.Wherein, above-mentioned sensitization limits floor and comprises a plurality of first rectangular district, and a plurality of second rectangular district; Each above-mentioned first rectangular district is positioned on the interelectrode above-mentioned moulding floor of per two above-mentioned strips, and is parallel to above-mentioned first direction; Each above-mentioned second rectangular district is parallel to a second direction, and perpendicular to above-mentioned first direction; The height in the above-mentioned first rectangular district is greater than the height in the above-mentioned second rectangular district.(e) exposure, the above-mentioned sensitization of development limit layer, and form the qualification shade on above-mentioned moulding layer.(f) last, carry out grit blast procedure, remove and be exposed to the outer moulding layer of above-mentioned qualification shade, exposing above-mentioned overlayer, and form the barrier rib of above-mentioned square grid shape.
By the manufacture method of above four kinds of barrier ribs as can be known, manufacture craft of the present invention has following advantage:
1. manufacture craft of the present invention is only made barrier rib on metacoxal plate, so when PDP made up, the aligning of forward and backward substrate was disclosed simpler than NEC significantly.
2. the open area of barrier rib can be adjusted easily with the acquisition better opening ratio, and increases the spreading area of phosphor body, so can obtain preferable legibility (luminance).
3. on barrier rib, all be formed with the depression breach, so be easy to when encapsulation, carry out vacuum program (Vacuum process) and gas filling (fill gas).
Though disclosed the present invention in conjunction with above preferred embodiment; yet it is not in order to limit the present invention; any those skilled in the art without departing from the spirit and scope of the present invention; can do a little change and retouching, so protection scope of the present invention should be with being as the criterion that claims were defined.
Claims (16)
1. plasma display, this plasma display panel comprises:
One first substrate;
One second substrate disposes in parallel with each other with this first substrate, makes and forms a discharge space between this first substrate and this second substrate;
A plurality of column-like projection blocks are formed on this second substrate, and this column-like projection block forms the position with respect to the breach that should cave on this first substrate, and
One square grid shape barrier rib is formed on this first substrate, and this square grid shape barrier rib includes
A plurality of first stripe region, these a plurality of first stripe region are defined as a plurality of row discharge spaces with this discharge space;
A plurality of second stripe region, each above-mentioned second stripe region crisscrosses each above-mentioned first stripe region, and in each above-mentioned row discharge space, each above-mentioned second stripe region has a depression breach, makes gas cave in breach and circulate in this row discharge space by this.
2. plasma display as claimed in claim 1, wherein this column-like projection block has a projecting height H
2, this depression breach of this second stripe region has a cup depth H
1, and this projecting height H
2Less than this cup depth H
1When this first substrate and this second substrate junction fashionable, this column-like projection block on this second substrate can embed this depression breach of part on this first substrate, and keeps a passage in this depression breach, and gas still can be circulated in this row discharge space by this passage.
3. the manufacture method of a plasma display comprises:
One first substrate is provided, and this first substrate is provided with an aspirating hole;
Form a plurality of strip electrodes on this first substrate, each above-mentioned strip electrode is parallel to a first direction;
On above-mentioned strip electrode and above-mentioned first substrate, form an overlayer;
One second substrate is provided, disposes in parallel with each other, make and form a discharge space, this discharge space and this aspirating hole conducting between this first substrate and this second substrate with this first substrate;
On this first substrate, form a square grid shape barrier rib, this square grid shape barrier rib includes a plurality of first stripe region, these a plurality of first stripe region are defined as a plurality of row discharge spaces with this discharge space, a plurality of second stripe region, each above-mentioned second stripe region is staggered in each above-mentioned first stripe region, and in each above-mentioned row discharge space, each above-mentioned second stripe region has a depression breach, makes gas cave in breach and circulate in this row discharge space by this;
Form a plurality of column-like projection blocks on this second substrate, this column-like projection block is formed on the position that corresponds to this depression breach on this first substrate;
The periphery of this first substrate is combined with the periphery of this second substrate, to seal this discharge space;
By this aspirating hole this discharge space is bled, make gas this bleeding point extraction certainly in this row discharge space by this depression breach.
4. plasma display manufacture method as claimed in claim 3, its step also comprises: this column-like projection block has a projecting height H
2, this depression breach of this second stripe region has a cup depth H
1, and this projecting height H
2Less than this cup depth H
1When this first substrate with after this second substrate combines, this column-like projection block on this second substrate can embed this depression breach of part on this first substrate, and keeps a passage in this depression breach, and gas still can be circulated in this row discharge space by this passage.
5. plasma display manufacture method as claimed in claim 3, its step also comprises the manufacture method of following this square grid shape barrier rib, comprising:
On above-mentioned overlayer, form moulding layer; Wherein, the surface of above-mentioned moulding layer is formed with a plurality of strip projections; Each above-mentioned projection is positioned on the interelectrode above-mentioned moulding layer of per two above-mentioned strips, and is parallel to above-mentioned first direction;
On above-mentioned moulding layer, form dry film photoresist layer;
Exposure, the above-mentioned dry film photoresist layer that develops, and on above-mentioned moulding layer, form the qualification shade; Wherein, above-mentioned qualification shade comprises a plurality of first rectangular district, and a plurality of second rectangular district; Each above-mentioned first rectangular district is formed on each above-mentioned strip projection; Each above-mentioned second rectangular district is parallel to a second direction, and perpendicular to above-mentioned first direction;
Carry out grit blast procedure, remove and to be exposed to the outer moulding layer of above-mentioned qualification shade, exposing above-mentioned overlayer, and form above-mentioned square grid shape barrier rib.
6. plasma display manufacture method as claimed in claim 5 wherein, is made above-mentioned moulding layer and is comprised the steps: the mode of elder generation with whole printing, prints multilayer first pulp layer on above-mentioned overlayer; Above-mentioned first pulp layer is toasted; Use screen painting, print second pulp layer of multilayer strip, on above-mentioned first pulp layer; And above-mentioned second pulp layer toasted.
7. plasma display manufacture method as claimed in claim 5 wherein, is made above-mentioned moulding layer and is comprised the steps: to use earlier screen painting, prints second pulp layer of multilayer strip on above-mentioned overlayer; Above-mentioned first pulp layer is toasted; Re-use the mode of whole printing, on above-mentioned second pulp layer, print multilayer first pulp layer; Above-mentioned second pulp layer is toasted.
8. plasma display manufacture method as claimed in claim 3, its step also comprises the manufacture method of following this square grid shape barrier rib, comprising:
Use screen painting, with the moulding layer that forms square grid shape on above-mentioned overlayer; Wherein, above-mentioned moulding floor comprises a plurality of first rectangular district, and a plurality of second rectangular district; Each above-mentioned first rectangular district is positioned on the interelectrode above-mentioned overlayer of per two above-mentioned strips, and is parallel to above-mentioned first direction; Each above-mentioned second rectangular district is parallel to a second direction, and perpendicular to above-mentioned first direction;
Use screen painting, on above-mentioned moulding floor, form a plurality of the 3rd rectangular district; Wherein, each the above-mentioned the 3rd rectangular district is formed at respectively on each above-mentioned first sliver layer, forms above-mentioned square grid shape barrier rib with this.
9. plasma display manufacture method as claimed in claim 8, wherein, above-mentioned moulding layer uses screen painting, prints the multilayer slurry on above-mentioned overlayer, after toasting and form.
10. plasma display manufacture method as claimed in claim 8, wherein, the above-mentioned the 3rd rectangular district uses screen painting, prints multilayer strip pulp layer, after toasting and form.
11. plasma display manufacture method as claimed in claim 3, its step also comprises the manufacture method of following this square grid shape barrier rib, comprising:
On above-mentioned overlayer, form moulding layer;
On above-mentioned moulding layer, form dry film photoresist layer;
Exposure, the above-mentioned dry film photoresist layer that develops limit shade and form on above-mentioned moulding layer; Wherein, above-mentioned qualification shade comprises a plurality of first rectangular district, and a plurality of second rectangular district; Each above-mentioned first rectangular district is parallel to above-mentioned first direction, is positioned on the interelectrode above-mentioned moulding layer of per two above-mentioned strips; Extend along second direction in each above-mentioned second rectangular district, and perpendicular to each above-mentioned first rectangular district; Each above-mentioned second rectangular district is formed with at the place of reporting to the leadship after accomplishing a task with each above-mentioned strip electrode and disconnects the district, to expose above-mentioned moulding layer;
Carry out grit blast procedure, remove and to be exposed to the outer moulding layer of above-mentioned qualification shade, exposing above-mentioned overlayer, and form the barrier rib of above-mentioned square grid shape; Wherein, still residual in each above-mentioned disconnection district have an above-mentioned moulding floor.
12. plasma display manufacture method as claimed in claim 11, wherein, the making of above-mentioned moulding layer in the mode of whole printing, is printed the multilayer slurry on above-mentioned overlayer, finish through baking.
13. plasma display manufacture method as claimed in claim 3, its step also comprises the manufacture method of following this square grid shape barrier rib, comprising:
One substrate is provided; Wherein, how long aforesaid substrate is provided with strip shaped electric poles, and each above-mentioned strip electrode is parallel to a first direction;
On above-mentioned strip electrode and aforesaid substrate, form overlayer;
On above-mentioned overlayer, form moulding layer;
The sensitization that forms square grid shape on above-mentioned moulding layer limits layer; Wherein, above-mentioned sensitization limits floor and comprises a plurality of first rectangular district, and a plurality of second rectangular district; Each above-mentioned first rectangular district is positioned on the interelectrode above-mentioned moulding floor of per two above-mentioned strips, and is parallel to above-mentioned first direction; Each above-mentioned second rectangular district is parallel to a second direction, and perpendicular to above-mentioned first direction; The height in the above-mentioned first rectangular district is greater than the height in the above-mentioned second rectangular district;
The above-mentioned sensitization that exposes limits layer, limits layer shade and form on above-mentioned moulding layer;
Carry out grit blast procedure, remove and to be exposed to the outer moulding layer of above-mentioned qualification shade, exposing above-mentioned overlayer, and form the barrier rib of above-mentioned square grid shape.
14. plasma display manufacture method as claimed in claim 13, wherein, above-mentioned sensitization limits the material of layer, is to be mixed and constituted by photoactive substance and slurry.
15. plasma display manufacture method as claimed in claim 13, wherein, the making step that above-mentioned sensitization limits layer comprises: use screen painting earlier, first sensitization of printing the square grid shape of multilayer on above-mentioned moulding layer limits layer; Re-use screen painting, limit second sensitization of printing strip on the layer along above-mentioned first direction in above-mentioned first sensitization and limit layer.
16. plasma display manufacture method as claimed in claim 13, wherein, the making step that above-mentioned sensitization limits layer comprises: use screen painting, second sensitization of printing the multilayer strip along above-mentioned first direction on above-mentioned moulding layer limits layer; Re-use screen painting, first sensitization that limits the square grid shape of printing multilayer on the layer in above-mentioned second sensitization limits layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB001225006A CN1171189C (en) | 2000-08-04 | 2000-08-04 | Plasma display panel and its manufacture |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB001225006A CN1171189C (en) | 2000-08-04 | 2000-08-04 | Plasma display panel and its manufacture |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1337665A CN1337665A (en) | 2002-02-27 |
| CN1171189C true CN1171189C (en) | 2004-10-13 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB001225006A Expired - Fee Related CN1171189C (en) | 2000-08-04 | 2000-08-04 | Plasma display panel and its manufacture |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1975968B (en) * | 2005-11-28 | 2010-06-09 | Lg电子株式会社 | Plasma display apparatus |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7323818B2 (en) | 2002-12-27 | 2008-01-29 | Samsung Sdi Co., Ltd. | Plasma display panel |
| US7315122B2 (en) | 2003-01-02 | 2008-01-01 | Samsung Sdi Co., Ltd. | Plasma display panel |
| JP2004214166A (en) | 2003-01-02 | 2004-07-29 | Samsung Sdi Co Ltd | Plasma display panel |
| JP4285039B2 (en) * | 2003-03-27 | 2009-06-24 | パナソニック株式会社 | Plasma display panel |
| JP4137013B2 (en) | 2003-06-19 | 2008-08-20 | 三星エスディアイ株式会社 | Plasma display panel |
| US7327083B2 (en) | 2003-06-25 | 2008-02-05 | Samsung Sdi Co., Ltd. | Plasma display panel |
| US7425797B2 (en) | 2003-07-04 | 2008-09-16 | Samsung Sdi Co., Ltd. | Plasma display panel having protrusion electrode with indentation and aperture |
| GB2403842A (en) * | 2003-07-10 | 2005-01-12 | Ocuity Ltd | Alignment of elements of a display apparatus |
| US7208876B2 (en) | 2003-07-22 | 2007-04-24 | Samsung Sdi Co., Ltd. | Plasma display panel |
| KR100589369B1 (en) | 2003-11-29 | 2006-06-14 | 삼성에스디아이 주식회사 | Plasma display panel |
| KR100659064B1 (en) * | 2004-10-12 | 2006-12-19 | 삼성에스디아이 주식회사 | Plasma display panel |
| US7467983B2 (en) | 2005-05-02 | 2008-12-23 | Chunghwa Picture Tubes, Ltd. | Method for manufacturing barrier ribs of a plasma display panel |
| BR112012017239A2 (en) * | 2010-01-15 | 2016-03-22 | Sharp Kk | liquid crystal video device and method for manufacturing it |
-
2000
- 2000-08-04 CN CNB001225006A patent/CN1171189C/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1975968B (en) * | 2005-11-28 | 2010-06-09 | Lg电子株式会社 | Plasma display apparatus |
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| Publication number | Publication date |
|---|---|
| CN1337665A (en) | 2002-02-27 |
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