CN117101250A - Continuous production photoresist precise filtering system and control method thereof - Google Patents
Continuous production photoresist precise filtering system and control method thereof Download PDFInfo
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- CN117101250A CN117101250A CN202311361917.XA CN202311361917A CN117101250A CN 117101250 A CN117101250 A CN 117101250A CN 202311361917 A CN202311361917 A CN 202311361917A CN 117101250 A CN117101250 A CN 117101250A
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- 229920002120 photoresistant polymer Polymers 0.000 title claims abstract description 98
- 238000001914 filtration Methods 0.000 title claims abstract description 97
- 238000010924 continuous production Methods 0.000 title claims abstract description 16
- 238000000034 method Methods 0.000 title claims abstract description 10
- 239000012528 membrane Substances 0.000 claims abstract description 153
- 239000007788 liquid Substances 0.000 claims abstract description 133
- 230000007246 mechanism Effects 0.000 claims abstract description 14
- 239000004696 Poly ether ether ketone Substances 0.000 claims description 7
- JUPQTSLXMOCDHR-UHFFFAOYSA-N benzene-1,4-diol;bis(4-fluorophenyl)methanone Chemical compound OC1=CC=C(O)C=C1.C1=CC(F)=CC=C1C(=O)C1=CC=C(F)C=C1 JUPQTSLXMOCDHR-UHFFFAOYSA-N 0.000 claims description 7
- 229920002530 polyetherether ketone Polymers 0.000 claims description 7
- 238000005096 rolling process Methods 0.000 claims description 3
- 239000000243 solution Substances 0.000 description 59
- 239000011148 porous material Substances 0.000 description 31
- 239000002245 particle Substances 0.000 description 10
- 239000003504 photosensitizing agent Substances 0.000 description 9
- 239000002904 solvent Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 3
- 230000008859 change Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000005484 gravity Effects 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 239000012045 crude solution Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 230000002427 irreversible effect Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000013618 particulate matter Substances 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D35/00—Filtering devices having features not specifically covered by groups B01D24/00 - B01D33/00, or for applications not specifically covered by groups B01D24/00 - B01D33/00; Auxiliary devices for filtration; Filter housing constructions
- B01D35/12—Devices for taking out of action one or more units of multi- unit filters, e.g. for regeneration
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D29/00—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor
- B01D29/50—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor with multiple filtering elements, characterised by their mutual disposition
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D29/00—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor
- B01D29/50—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor with multiple filtering elements, characterised by their mutual disposition
- B01D29/56—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor with multiple filtering elements, characterised by their mutual disposition in series connection
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D29/00—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor
- B01D29/60—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor integrally combined with devices for controlling the filtration
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
Abstract
The application relates to a continuous production photoresist precise filtration system and a control method thereof, comprising the following steps: the photoresist solution input end to be filtered; an n-stage filter device; the liquid inlet of the standby filter device is connected with the liquid inlet of the 1 st stage filter device and the liquid outlet of the 1 st to n-1 st stage filter device in parallel, the liquid outlet of the standby filter device is connected to the liquid inlet of the 2~n th stage filter device, and an adjustable filter membrane mechanism is arranged in the standby filter device; a plurality of electromagnetic valves; the adjustable filter membrane mechanism comprises: an elastic net; the rigidity adjusting device is arranged around the periphery of the elastic net in a surrounding manner, and the expansion difficulty of the elastic net can be adjusted by changing the rigidity of the rigidity adjusting device; the adjustable filter membrane is hung on the inner wall of the elastic net, the pressure generated by liquid in the adjustable filter membrane enables the adjustable filter membrane and the elastic net to expand together, and the aperture of the adjustable filter membrane can be enlarged after the adjustable filter membrane is expanded.
Description
Technical Field
The application relates to the field of photoresist preparation, in particular to a continuous production photoresist precise filtering system and a control method thereof.
Background
The photoresist is a photosensitive mixture composed of photosensitive resin, photosensitizer, solvent and the like, can be subjected to crosslinking curing or degradation reaction under the irradiation of ultraviolet light beams, and has wide application in the electronic fields of integrated circuits, liquid crystal displays, solar photovoltaics, micro-electromechanical systems and the like. The photoresist mainly comprises film forming resin, photosensitizer and solvent. The sensitizer may absorb energy of a wavelength to initiate polymerization of the monomer to crosslink the cured compound.
In the production process of the photoresist, firstly, a photosensitizer is needed to be prepared, or the existing photosensitizer is directly applied, the photosensitizer is added into resin and solvent to fully react to obtain the finished photoresist, and insoluble impurities in the solution and particles brought in the production process of the photoresist are needed to be filtered out to improve the purity of the photoresist. In the prior art, multistage filtration is carried out on photoresist by adopting a multi-level filter membrane with large aperture from large aperture to small aperture, when the filter membrane is used for a certain time, excessive particulate matters are attached to the filter membrane, the filter membrane of a filter system needs to be replaced, equipment is stopped at the moment, the filter core is replaced after the equipment is disassembled, the whole production is directly stopped, and higher time cost is consumed.
The application aims at solving the problems in the prior art and designing a continuous production photoresist precise filtering system and a control method thereof.
Disclosure of Invention
The application aims to solve the problems of the prior art, and provides a continuous production photoresist precise filtering system and a control method thereof, which can effectively solve at least one problem of the prior art.
The technical scheme of the application is as follows:
a continuous production photoresist precision filtration system comprising:
the photoresist solution input end to be filtered;
the liquid inlet of the 1 st stage filter device is connected to the liquid inlet of the photoresist solution to be filtered, the liquid outlet of the i st stage filter device is connected to the liquid inlet of the i+1st stage filter device, wherein n is a positive integer greater than 2, i is a positive integer between 1 and n, each stage filter device is internally provided with a filter membrane, the aperture of the filter membrane of the i st stage filter device is greater than the aperture of the filter membrane of the i+1st stage filter device, and the photoresist solution to be filtered is filtered by the filter membrane with a corresponding fixed aperture in each stage filter device;
the liquid inlet of the standby filter device is connected with the liquid inlet of the 1 st stage filter device and the liquid outlet of the 1 st to n-1 st stage filter device in parallel, the liquid outlet of the standby filter device is connected to the liquid inlet of the 2~n th stage filter device, and an adjustable filter membrane mechanism is arranged in the standby filter device;
the filtered photoresist solution output end is connected to a liquid outlet of the standby filter device or a liquid outlet of the nth stage filter device;
a plurality of electromagnetic valves which are respectively connected with a to-be-filtered photoresist solution input end, a channel between a liquid outlet of the 1 st-n-1 st stage filtering device and a liquid inlet of the standby filtering device, and a channel between a liquid inlet of the 2~n th stage filtering device and a liquid outlet of the standby filtering device; the channel is connected between the liquid outlet of the nth stage filtering device, the liquid outlet of the standby filtering device and the output end of the filtered photoresist solution; the device is used for controlling the connection relation between the n-level filtering devices and the standby filtering device so as to isolate one of the level filtering devices and replace the corresponding level filtering device with the standby filtering device;
the back-up filtration device comprises a housing, and the adjustable filter membrane mechanism comprises:
the elastic net is hung in the shell;
the rigidity adjusting device is arranged around the periphery of the elastic net in a surrounding manner, and the expansion difficulty of the elastic net can be adjusted by changing the rigidity of the rigidity adjusting device;
the adjustable filter membrane is hung on the inner wall of the elastic net, the pressure generated by liquid in the adjustable filter membrane enables the adjustable filter membrane to expand together with the elastic net, the expansion amount of the elastic net is controlled by the rigidity adjusting device, and the aperture of the adjustable filter membrane can be increased after the adjustable filter membrane is expanded.
Further, the rigidity adjusting device comprises a plurality of springs, the periphery of each spring is sleeved with a flexible sleeve, the bottom ends of the springs are connected to the bottom ends of the shells, the top ends of the springs are connected to connecting pieces, the connecting pieces are driven to move up and down, and the springs are tensioned after the connecting pieces move up, so that the rigidity of the springs is improved.
Further, the top end of the shell is connected with a plurality of driving cylinders, an output shaft of each driving cylinder is connected to the connecting piece, and each driving cylinder is used for driving the connecting piece to move up and down.
Further, the adjustable filter membrane is a UPE filter membrane, and the structure of the adjustable filter membrane becomes loose after the adjustable filter membrane is expanded, so that the pore diameter of the adjustable filter membrane becomes large.
Further, the adjustable filter membrane is made by rolling a plurality of through holes through the PEEK membrane, and the aperture of the through holes is enlarged after the adjustable filter membrane is expanded.
Further, the adjustable range of the aperture of the adjustable filter membrane is 0.2-1 mu m, and the thickness of the unexpanded adjustable filter membrane is 50-100 mu m.
Further, the liquid outlets of the n-level filtering devices are all provided with flow sensors.
Further provided is a control method of a continuous production photoresist precise filtration system based on any one of the continuous production photoresist precise filtration systems;
when the filter membranes of the n-stage filter devices are normal, the electromagnetic valves close the channels of the liquid inlet and the liquid outlet of the standby filter device, so that the standby filter device is isolated, and the liquid outlet of the i-th stage filter device of the n-stage filter device is communicated with the liquid inlet of the i+1th stage filter device;
when the filter membrane of the ith grade filter device needs to be replaced, a plurality of electromagnetic valves close the channels of the liquid inlet and the liquid outlet of the ith grade filter device, so that the ith grade filter device is isolated, a plurality of electromagnetic valves open the channel between the liquid inlet of the standby filter device and the liquid outlet of the i-1 grade filter device and the channel between the liquid outlet of the standby filter device and the liquid inlet of the i+1 grade filter device, and the filter aperture of the standby filter device is adjusted to be matched with the aperture of the filter membrane of the ith grade filter device through the adjustable filter membrane mechanism, so that the standby filter device replaces the corresponding grade filter device.
Further, when the filter membranes of the n-th stage filter device are required to be replaced, the electromagnetic valve is communicated with a channel between the filtered photoresist solution output end and the liquid outlet of the standby filter device, and when the filter membranes of the filter devices other than the n-th stage filter device are required to be replaced, the electromagnetic valve is communicated with the liquid outlet of the n-th stage filter device and the filtered photoresist solution output end.
Accordingly, the present application provides the following effects and/or advantages:
according to the application, particles are intercepted by classifying the photoresist solution, and the particles from large to small are intercepted at each stage, so that the precise filtration of the photoresist solution is realized. The standby filter device can replace the filter membrane to filter when the filter membrane of any one stage of filter device needs to be replaced. When the filter membranes of the n-stage filter devices are normal, the filter membranes are sequentially connected through each stage of filter device, and when the filter membranes of the i-stage filter devices are required to be replaced, the i-stage filter devices are isolated through electromagnetic valves and photoresist solution is controlled to flow through the standby filter devices, so that the standby filter devices replace the i-stage filter devices, and continuous production without stopping the machine when the filter membranes are required to be replaced is realized.
The application is provided with the rigidity adjusting device, thereby controlling the expansion difficulty of the elastic net and the adjustable filter membrane, the filter aperture of the adjustable filter membrane presents corresponding aperture under different expansion amounts, and the adjustable filter aperture of the adjustable filter membrane is realized by adjusting the stretching amount of the spring. Finally, the filter aperture of the adjustable filter membrane can be adjusted to be matched with the filter aperture of the corresponding filter device by using only one standby filter device.
It is to be understood that both the foregoing general description and the following detailed description of the present application are exemplary and explanatory and are intended to provide further explanation of the application as claimed.
Drawings
FIG. 1 is a schematic diagram of a photoresist precision filtration system according to an embodiment of the present application.
Fig. 2 is a schematic structural view of the spare filter device.
Fig. 3 is a sectional view of the structure of the spare filter device.
Fig. 4 is a schematic exploded view of the structure of the back-up filter device.
FIG. 5 shows the flow path of the photoresist solution to be filtered when the filter membranes of the n-stage filter device are normal in accordance with the embodiment of the present application.
FIG. 6 is a flow path of the photoresist solution to be filtered when the filter membrane of the stage 1 filter device needs to be replaced according to an embodiment of the present application.
Description of the drawings: the photoresist solution to be filtered is input into a device 1, an n-stage filtering device 2, a standby filtering device 3, a shell 301, an elastic net 302, a spring 303, a flexible sleeve 304, an adjustable filter 305, a connecting piece 306, a driving cylinder 307, a filtered photoresist solution output end 4 and an electromagnetic valve 5.
Detailed Description
For the convenience of understanding by those skilled in the art, the structure of the present application will now be described in further detail with reference to the accompanying drawings:
referring to fig. 1-6, a continuously produced photoresist precision filtration system comprising:
a photoresist solution input end 1 to be filtered;
in this embodiment, the photoresist solution input end 1 to be filtered may be a photoresist solution crude solution produced by a previous stage photoresist production device, for example, a stirring reaction kettle, and uniformly mixing and reacting a photosensitizer with a monomer, a film-forming resin, a solvent, and the like in the stirring reaction kettle, wherein the photosensitizer is a solid crystal. During the mixing reaction, the photosensitizer dissolves in the solvent, but some of the photosensitizer does not dissolve completely to form small particles suspended in the colloid. Thus, filtration by the present filtration system is required. The photoresist solution to be filtered input terminal 1 can input the photoresist solution to be filtered to the 1 st stage filtering device.
The liquid inlet of the 1 st stage filter device is connected to the liquid inlet of the photoresist solution to be filtered 1, the liquid outlet of the i st stage filter device is connected to the liquid inlet of the i+1st stage filter device, wherein n is a positive integer greater than 2, i is a positive integer between 1 and n, filter membranes are arranged in each stage filter device, the pore diameter of the filter membrane of the i st stage filter device is greater than that of the filter membrane of the i+1st stage filter device, and the photoresist solution to be filtered is filtered by the filter membrane with a corresponding fixed pore diameter in each stage filter device;
in this embodiment, including 3 stages of filter devices 2, n=3, i is 1 or 2 or 3. As shown in fig. 1, the n-stage filtering device 2 in fig. 1 is a 1 st stage filtering device, a 2 nd stage filtering device and a 3 rd stage filtering device in turn from left to right, the liquid inlet of each stage filtering device is arranged at the top end of the n-stage filtering device, the liquid outlet of each stage filtering device is arranged at the bottom end of the n-stage filtering device, the liquid inlet of the 1 st stage filtering device is connected to the liquid inlet of the 2 nd stage filtering device, the liquid outlet of the 2 nd stage filtering device is connected to the liquid inlet of the 3 rd stage filtering device, and the liquid outlet of the 3 rd stage filtering device is connected to the filtered photoresist solution output end 4. A filter membrane is arranged in each stage of filter device, and is a UPE filter membrane in the prior art, and a plurality of tiny pore diameters of the filter membrane are adopted, so that particles in photoresist solution are intercepted. The filter membrane may be of a bag-like structure to receive the photoresist solution to be filtered, to cause the photoresist solution to be filtered to accumulate within the filter membrane, and to gradually permeate through the filter membrane by gravity and hydraulic pressure generated by the photoresist solution to be filtered to the filter membrane, leaving behind particles larger than the pore size of the filter membrane. In order to intercept particles in a classified manner, the pore diameter of the filter membrane of the ith stage filter device is larger than that of the filter membrane of the (i+1) th stage filter device. For example, the pore size of the 1 st stage filter device may be 1 μm, the pore size of the 2 nd stage filter device may be 0.5 μm, and the pore size of the 3 rd stage filter device may be 0.3 μm, so as to intercept particles having diameters from large to small in sequence, while allowing a viscous photoresist solution to penetrate the filter membrane at a proper rate.
Through the arrangement of the multistage filtering device, particles from large to small can be intercepted at each stage, so that precise filtering of photoresist solution is realized. And after the filter device is used for a period of time, the filter membrane is enriched with particles, and the performance of the filter membrane is reduced at the moment, so that the filter efficiency is reduced, the filter effect is poor, and the filter membrane of the filter device of the corresponding stage is required to be replaced at the moment. In order to realize continuous production automatically and without stopping replacement, the present embodiment is realized by the following structure.
The liquid inlet of the standby filter device 3 is connected with the liquid inlet of the photoresist solution input end 1 to be filtered and the liquid outlet of the 1 st-n-1 st stage filter device in parallel, the liquid outlet of the standby filter device 3 is connected to the liquid inlet of the 2~n th stage filter device, and an adjustable filter membrane mechanism is arranged in the standby filter device 3;
the spare filter device 3 of this embodiment can replace any one of the primary filter devices to perform filtration when it is necessary to replace the filter membrane. When the spare filter device 3 is substituted for a corresponding level of filter device, the prior art needs to be equipped with a plurality of spare filter devices 3 to realize substitution of filter membranes of different pore diameters due to inclusion of a multi-stage filter device. The present embodiment implements replacement of any one stage of filter device by one spare filter device 3, and implements different filter pore sizes by an adjustable filter membrane mechanism of the spare filter device 3.
As shown in FIG. 1, the photoresist solution to be filtered can be input into the standby filter 3 through the liquid outlets of the 1 st-n-1 st stage filter, the photoresist solution can be output from the liquid outlets of the standby filter 3 to the liquid inlets of the 2 nd and 3 rd stage filters, and the photoresist solution can be output from the liquid outlet of the standby filter 3 to the filtered photoresist solution output end 4. Therefore, the spare filter device 3 is provided with a connection structure for replacing any one of the primary filter devices at any time. In order to adapt to the connection structure for replacing any one stage of filter device at any time, an adjustable filter membrane mechanism is arranged in the standby filter device 3, so that the aperture of the filter membrane of the standby filter device 3 is adjusted to adapt to the aperture of the corresponding stage of filter device.
The filtered photoresist solution output end 4 is connected to a liquid outlet of the standby filter device 3 or a liquid outlet of an nth stage filter device;
in this embodiment, the filtered photoresist solution is obtained at the filtered photoresist solution output end 4, and when the spare filter device 3 does not replace any one of the stage filtering devices, or the spare filter device 3 replaces the stage 1 or 2 filtering device, the outlet of the stage 3 filtering device may be connected to the filtered photoresist solution output end 4 so as to output the filtered photoresist solution. Or when the spare filter device 3 replaces the 3 rd stage filter device, the liquid outlet of the spare filter device 3 is communicated with the filtered photoresist solution output end 4, so that the filtered photoresist solution is output from the liquid outlet of the spare filter device 3.
A plurality of electromagnetic valves 5 respectively connected with the to-be-filtered photoresist solution input end 1, a channel between the liquid outlet of the 1 st-n-1 st stage filtering device and the liquid inlet of the standby filtering device, and a channel between the liquid inlet of the 2~n th stage filtering device and the liquid outlet of the standby filtering device 3; and a channel connected between the liquid outlet of the nth stage filtering device, the liquid outlet of the standby filtering device 3 and the filtered photoresist solution output end 4; for controlling the connection between the n-stage filter device and the spare filter device 3, thereby isolating one of the stage filter devices and replacing the spare filter device with the corresponding stage filter device.
The position of the solenoid valve 5 and its operation are also one of the cores of the present application. In this embodiment, a three-way valve is adopted for a channel between the liquid outlet of the to-be-filtered photoresist solution input end 1 and the 1 st-n-1 st stage filtering device and the liquid inlet of the standby filtering device, a two-way valve is adopted for a channel between the liquid inlet of the 2~n th stage filtering device and the liquid outlet of the standby filtering device 3, and a three-way valve is adopted for a channel between the liquid outlet of the nth stage filtering device 3, the liquid outlet of the standby filtering device and the filtered photoresist solution output end 4. The three-way valve can be used for switching to the corresponding channel, and the two-way valve can be used for opening or closing the corresponding channel. For example, as shown in fig. 6, when the standby filter 3 needs to replace the 1 st stage filter, the corresponding three-way valve is controlled to open the channel from the to-be-filtered photoresist solution input end 1 to the liquid inlet of the standby filter 3, close the channel from the to-be-filtered photoresist solution input end 1 to the liquid inlet of the 1 st stage filter, control the corresponding two-way valve to open the channel from the liquid outlet of the standby filter 3 to the liquid inlet of the 2 nd stage filter, and control the corresponding three-way valve to open the channel from the 3 rd stage filter to the filtered photoresist solution output end 4, and close the channel from the liquid outlet of the standby filter 3 to the filtered photoresist solution output end 4, thereby realizing the replacement.
Further, the back-up filter device 3 comprises a housing 301, and the adjustable filter membrane mechanism comprises:
an elastic net 302 hung in the housing 301;
the rigidity adjusting device is arranged around the periphery of the elastic net 302 in a surrounding manner, and the expansion difficulty of the elastic net 302 can be adjusted by changing the rigidity of the rigidity adjusting device;
the adjustable filter membrane 305 is hung on the inner wall of the elastic net 302, the pressure generated by the liquid in the adjustable filter membrane 305 makes the adjustable filter membrane 305 and the elastic net 302 expand together, the expansion amount of the elastic net 302 is controlled by the rigidity adjusting device, and the aperture of the adjustable filter membrane 305 can be increased after the adjustable filter membrane 305 expands.
In this embodiment, the elastic net 302 and the adjustable filter membrane 305 are both in a bag-shaped structure, and when the adjustable filter membrane 305 is filled with liquid, the adjustable filter membrane 305 and the elastic net 302 expand together under the action of gravity and liquid pressure, so as to expand. The pore size of the tunable filter 305 is also expanded after the tunable filter 305 is expanded, and thus the pore size becomes large. The expansion amount of the elastic net 302 is controlled by the rigidity adjusting apparatus, so that the rigidity of the rigidity adjusting apparatus can be reduced when the spare filter apparatus 3 is used for replacing the 1 st and 2 nd stage filter apparatuses, thereby making the expansion of the elastic net 302 easier, making the expansion of the adjustable filter membrane 305 larger, making the pore size larger, for example 0.5 or 1 μm, and the rigidity of the rigidity adjusting apparatus can be increased when the spare filter apparatus 3 is used for replacing the 3 rd stage filter apparatus, thereby making the expansion of the elastic net 302 more difficult, making the expansion of the adjustable filter membrane 305 difficult, and making the pore size thereof maintain in a smaller range, for example 0.3 μm. Thereby realizing the aperture adjustment of the adjustable filter membrane 305.
Further, the rigidity adjusting apparatus comprises a plurality of springs 303, wherein a flexible sleeve 304 is sleeved on the periphery of the springs 303, the bottom ends of the springs 303 are connected to the bottom end of the housing 301, the top ends of the springs 303 are connected to a connecting piece 306, the connecting piece 306 is driven to move up and down, and the springs 303 are tensioned after the connecting piece 306 moves up, so that the rigidity of the springs 303 is improved.
In this embodiment, the spring 303 is sleeved in the flexible sleeve 304 to form the rigidity adjusting device. When the spring 303 is tensioned, the rigidity of the spring 303 sleeved with the flexible sleeve 304 increases. Is connected to the periphery of the elastic net 302 by a flexible sleeve 304 to vary the ease of expansion of the elastic net 302. When the spring 303 is tensioned, the rigidity of the spring 303 is improved, and the elastic net 302 needs a larger force to push the spring 303 to deform, so that the expansion difficulty of the elastic net 302 becomes difficult, and at the moment, the expansion amount of the adjustable filter membrane 305 is reduced under the condition that the adjustable filter membrane 305 is filled with the same amount of liquid, so that the aperture of the adjustable filter membrane 305 is maintained in a smaller range. The connecting piece 306 can drive the top end of the spring 303 to stretch, so that the stretched amount of the spring 303 is changed, and the rigidity of the spring 303 is changed.
The specific stretched amount of the spring 303 can be obtained according to the aperture and the material of the adjustable filter membrane 305 and the change relation between the stretched length and the rigidity of the stretched spring 303, so as to obtain a change function between the stretched length of the stretched spring 303 and the aperture of the adjustable filter membrane 305, thereby obtaining the specific stretching amount of the adjustable spring 303.
Further, a plurality of driving cylinders 307 are connected to the top end of the housing 301, an output shaft of the driving cylinders 307 is connected to the connecting member 306, and the driving cylinders 307 are used for driving the connecting member 306 to move up and down.
In this embodiment, the connecting member 306 has a circular ring structure, and is adapted to the periphery of the elastic net 302, so as to drive the spring 303 to stretch.
Further, the tunable filter 305 is a UPE filter, and the structure of the tunable filter 305 becomes loose after being expanded, so that the pore size of the tunable filter 305 becomes large.
The UPE filtering membrane is a high molecular chemical material and has a porous spongy structure. When the water pressure in the adjustable filter 305 expands it, the spongy structure inside it is loosened, and the pore size becomes larger. The rigidity of the spring 303 is controlled to control the deformation difficulty of the elastic net 302, so that the expansion degree of the UPE filtering membrane can be controlled, and the pore diameter of the UPE filtering membrane can be controlled.
Further, the adjustable range of the pore diameter of the adjustable filter membrane 305 is 0.2 μm to 1 μm, and the thickness of the unexpanded adjustable filter membrane 305 is 50 μm to 100 μm.
In this embodiment, the pore size of the filter membrane of the 3 rd stage filter device is 0.3 μm, the pore size of the filter membrane of the 2 nd stage filter device is 0.5 μm, and the pore size of the filter membrane of the 1 st stage filter device is 1 μm, so that the adjustable range of the pore size of the adjustable filter membrane 305 is 0.2 μm to 1 μm, and the controllable range of the pore size of the adjustable filter membrane 305 can cover the pore size of the filter membrane of the 1 st to 3 rd stage filter devices, so that the adjustable filter membrane can be replaced by any one stage filter device after being adjusted. In this embodiment, the pore size and thickness of the adjustable filter membrane 305 are defined, so that the control of the expansion amount can be conveniently realized by matching with the rigidity adjusting device, and thus the pore size is changed. The membrane expansion is difficult to achieve by selecting an adjustable filter membrane 305 that is too thick, and irreversible deformation is easily generated after the membrane expansion is achieved by selecting an adjustable filter membrane 305 that is too thin.
Further, the liquid outlets of the n-stage filtering devices are all provided with flow sensors (not shown).
In this embodiment, the purpose of the flow sensor is to indicate that the performance of the filter membrane of the i-th stage filter device is reduced when the flow of the liquid outlet of the i-th stage filter device is reduced, which may be the case when the filter membrane is used for too long, too much particulate matter is attached to the filter membrane, the filter membrane is deteriorated, and the filter membrane needs to be replaced at this time. In this embodiment, the flow sensor is disposed at the liquid outlet of each filtering device, when the flow of the liquid outlet decreases, the control system automatically switches on or off the electromagnetic valves 5, so that the standby filtering device 3 is replaced by the corresponding ith filtering device, and the control system sends a message for starting the standby filtering device 3 to the staff, so as to remind the staff to replace the filter membrane of the ith filtering device in time.
A control method of a continuous production photoresist precise filtering system is based on the continuous production photoresist precise filtering system;
when the filter membranes of the n-stage filter devices are normal, the electromagnetic valves 5 close the channels of the liquid inlet and the liquid outlet of the standby filter device, so that the standby filter device is isolated, and the liquid outlet of the i-th stage filter device of the n-stage filter device is communicated with the liquid inlet of the i+1th stage filter device;
in this step, when the filter membranes of the n-stage filter devices are normal, the electromagnetic valve 5 is opened and closed, so that the flow path of the photoresist solution to be filtered is as shown in fig. 5, the photoresist solution to be filtered flows through each stage of filter device, and finally, the filtered photoresist solution is output to the filtered photoresist solution output end 4 at the liquid outlet of the 3 rd stage filter device.
When the filter membrane of the ith grade filter device needs to be replaced, a plurality of electromagnetic valves 5 close the channels of the liquid inlet and the liquid outlet of the ith grade filter device, so that the ith grade filter device is isolated, a plurality of electromagnetic valves 5 open the channel between the liquid inlet of the standby filter device 3 and the liquid outlet of the i-1 th grade filter device, and the channel between the liquid outlet of the standby filter device 3 and the liquid inlet of the i+1 th grade filter device, and the filter aperture of the standby filter device is adjusted by the adjustable filter membrane mechanism to be matched with the aperture of the filter membrane of the ith grade filter device, so that the standby filter device 3 replaces the corresponding grade filter device.
In this step, when the filter membranes of the ith stage filter device need to be replaced, the ith stage filter device is isolated, and the spare filter device 3 replaces the corresponding stage filter device. For example, when the 1 st stage filter device needs to be replaced, as shown in fig. 6, the liquid outlet and liquid inlet of the 1 st stage filter device are closed, so that the 1 st stage filter device is isolated, and the standby filter device 3 is connected to replace the 1 st stage filter device. Meanwhile, the stretching amount of the spring 303 needs to be adjusted, so that the rigidity of the spring 303 is controlled, and the adjustable filter membrane mechanism is further adjusted, so that the filter pore diameter of the standby filter device 3 is matched with the pore diameter of the filter membrane of the ith stage of filter device.
Further, when the filter membranes of the n-th stage filter device need to be replaced, the electromagnetic valve 5 is communicated with a channel between the filtered photoresist solution output end 4 and the liquid outlet of the standby filter device 3, and when the filter membranes of the filter devices other than the n-th stage filter device need to be replaced, the electromagnetic valve 5 is communicated with the liquid outlet of the n-th stage filter device and the filtered photoresist solution output end 4.
Through this step, the channel between the filtered photoresist solution output end 4 and the liquid outlet of the standby filter 3 can be controlled, and the photoresist solution output from the liquid outlet of the standby filter 3 is used as the final output filtered photoresist solution.
Example two
The difference between this embodiment and the first embodiment is that the adjustable filter 305 is made by rolling a plurality of through holes in a PEEK film, and the aperture of the through holes is enlarged after the adjustable filter 305 is expanded. The other structure of this embodiment is the same as that of the first embodiment.
In this embodiment, the PEEK film is a dense film, and after it is rolled with a plurality of through holes, it has through holes with a certain pore diameter as the filter holes. When the PEEK membrane is filled with liquid, expansion is generated, and the through holes of the PEEK membrane are enlarged, so that the filtration pore diameter of the PEEK membrane is controllable.
It should be noted that in the claims, any reference signs placed between parentheses shall not be construed as limiting the claim. The word "comprising" does not exclude the presence of elements or steps not listed in a claim. The word "a" or "an" preceding an element does not exclude the presence of a plurality of such elements. The application may be implemented by means of hardware comprising several distinct elements, and by means of a suitably programmed computer. In the unit claims enumerating several means, several of these means may be embodied by one and the same item of hardware. The use of the words first, second, third, etc. do not denote any order. These words may be interpreted as names.
While preferred embodiments of the present application have been described, additional variations and modifications in those embodiments may occur to those skilled in the art once they learn of the basic inventive concepts. It is therefore intended that the following claims be interpreted as including the preferred embodiments and all such alterations and modifications as fall within the scope of the application.
In the present application, unless explicitly specified and limited otherwise, the terms "mounted," "connected," "secured," and the like are to be construed broadly, and may be, for example, fixedly connected, detachably connected, or integrally formed; can be mechanically or electrically connected; can be directly connected or indirectly connected through an intermediate medium, and can be communicated with the inside of two elements or the interaction relationship of the two elements. The specific meaning of the above terms in the present application can be understood by those of ordinary skill in the art according to the specific circumstances.
In the description of the present specification, a description referring to terms "one embodiment," "some embodiments," "examples," "specific examples," or "some examples," etc., means that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the present application. In this specification, schematic representations of the above terms should not be understood as necessarily being directed to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples. Furthermore, the different embodiments or examples described in this specification and the features of the different embodiments or examples may be combined and combined by those skilled in the art without contradiction.
Claims (9)
1. A continuous production photoresist precision filtration system, characterized in that: comprising the following steps:
the photoresist solution input end to be filtered;
the liquid inlet of the 1 st stage filter device is connected to the input end of the photoresist solution to be filtered, the liquid outlet of the i st stage filter device is connected to the liquid inlet of the i+1st stage filter device, wherein n is a positive integer greater than 2, i is a positive integer between 1 and n, filter membranes are arranged in each stage filter device, the aperture of the filter membrane of the i st stage filter device is greater than that of the filter membrane of the i+1st stage filter device, and the photoresist solution to be filtered is filtered by the filter membrane with a corresponding fixed aperture in each stage filter device;
the liquid inlet of the standby filter device is connected with the liquid inlet of the 1 st stage filter device and the liquid outlet of the 1 st to n-1 st stage filter device in parallel, the liquid outlet of the standby filter device is connected to the liquid inlet of the 2~n th stage filter device, and an adjustable filter membrane mechanism is arranged in the standby filter device;
the filtered photoresist solution output end is connected to a liquid outlet of the standby filter device or a liquid outlet of the nth stage filter device;
the electromagnetic valves are respectively connected with a to-be-filtered photoresist solution input end, a channel from a liquid outlet of the 1 st-n-1 st stage filtering device to a liquid inlet of the standby filtering device, a channel from the liquid inlet of the 2~n th stage filtering device to the liquid outlet of the standby filtering device, and a channel from the liquid outlet of the nth stage filtering device, the liquid outlet of the standby filtering device and the filtered photoresist solution output end, and are used for controlling the connection relationship between the n-stage filtering device and the standby filtering device, so that one stage of filtering device is isolated, and the standby filtering device replaces the corresponding stage of filtering device;
the back-up filtration device comprises a housing, and the adjustable filter membrane mechanism comprises:
the elastic net is hung in the shell;
the rigidity adjusting device is arranged around the periphery of the elastic net in a surrounding manner, and the expansion difficulty of the elastic net can be adjusted by changing the rigidity of the rigidity adjusting device;
the adjustable filter membrane is hung on the inner wall of the elastic net, the pressure generated by liquid in the adjustable filter membrane enables the adjustable filter membrane to expand together with the elastic net, the expansion amount of the elastic net is controlled by the rigidity adjusting device, and the aperture of the adjustable filter membrane can be increased after the adjustable filter membrane is expanded.
2. A continuously produced photoresist precision filtration system according to claim 1, wherein: the rigidity adjusting device comprises a plurality of springs, wherein flexible sleeves are sleeved on the peripheries of the springs, the bottom ends of the springs are connected to the bottom ends of the shells, the top ends of the springs are connected to connecting pieces, the connecting pieces are driven to move up and down, and the springs are tensioned after the connecting pieces move up, so that the rigidity of the springs is improved.
3. A continuously produced photoresist precision filtration system according to claim 2, wherein: the top of casing is connected with a plurality of actuating cylinders, the output shaft of actuating cylinder is connected to the connecting piece, the actuating cylinder is used for driving the connecting piece reciprocates.
4. A continuously produced photoresist precision filtration system according to claim 1, wherein: the adjustable filter membrane is a UPE filter membrane, and the structure of the adjustable filter membrane becomes loose after the adjustable filter membrane is expanded, so that the aperture of the adjustable filter membrane becomes large.
5. A continuously produced photoresist precision filtration system according to claim 1, wherein: the adjustable filter membrane is made by rolling a plurality of through holes through the PEEK membrane, and the aperture of the through holes is enlarged after the adjustable filter membrane is expanded.
6. A continuously produced photoresist precision filtration system according to claim 1, wherein: the adjustable range of the aperture of the adjustable filter membrane is 0.2-1 mu m, and the thickness of the unexpanded adjustable filter membrane is 50-100 mu m.
7. A continuously produced photoresist precision filtration system according to claim 1, wherein: and liquid outlets of the n-level filtering devices are provided with flow sensors.
8. A control method of a continuous production photoresist precise filtration system, based on the continuous production photoresist precise filtration system of any one of claims 1-7, characterized in that:
when the filter membranes of the n-stage filter devices are normal, the electromagnetic valves close the channels of the liquid inlet and the liquid outlet of the standby filter device, so that the standby filter device is isolated, and the liquid outlet of the i-th stage filter device of the n-stage filter device is communicated with the liquid inlet of the i+1th stage filter device;
when the filter membrane of the ith grade filter device needs to be replaced, a plurality of electromagnetic valves close the channels of the liquid inlet and the liquid outlet of the ith grade filter device, so that the ith grade filter device is isolated, a plurality of electromagnetic valves open the channel between the liquid inlet of the standby filter device and the liquid outlet of the i-1 grade filter device and the channel between the liquid outlet of the standby filter device and the liquid inlet of the i+1 grade filter device, and the filter aperture of the standby filter device is adjusted to be matched with the aperture of the filter membrane of the ith grade filter device through the adjustable filter membrane mechanism, so that the standby filter device replaces the corresponding grade filter device.
9. The method for controlling a continuous photoresist precision filtration system according to claim 8, wherein: when the filter membranes of the filter devices except the nth stage are required to be replaced, the electromagnetic valve is communicated with the liquid outlet of the nth stage filter device and the filtered photoresist solution output end.
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