CN117059521A - Thin film deposition equipment, vaporization detection device and vaporization detection method - Google Patents

Abstract

The invention discloses a thin film deposition device, a vaporization detection device and a vaporization detection method. The thin film deposition apparatus includes: a vaporizer for vaporizing a reactant in a liquid state to form a reactant gas; the reaction cavity is connected with the vaporizer through a pipeline and is used for acquiring the reaction gas from the vaporizer so as to perform film deposition; and the vaporization detection device is arranged between the vaporizer and the reaction cavity and is used for detecting the vaporization degree of the reactant so as to allow or prevent the reactant from entering the reaction cavity. By using the thin film deposition equipment, the vaporization efficiency of the reaction gas which is about to enter the reaction cavity can be effectively detected, and a series of problems of particle pollution, uneven deposited thin film and the like in the deposition process caused by incomplete vaporization of the reaction gas are avoided.

Description

Thin film deposition equipment, vaporization detection device and vaporization detection method

Technical field

The invention relates to the field of semiconductor processing technology, and specifically to a thin film deposition equipment, a vaporization detection device, a vaporization detection method and a computer-readable storage medium.

Background technique

During the processing of semiconductors, thin film deposition equipment usually uses vaporized liquid sources as reactants, such as tetraethoxysilane (TEOS), water, etc., so a vaporization device is needed to process these liquid reactants. Evaporate and turn it into a gaseous state.

After the liquid reactants pass through the vaporization device, they often need to be transported through a long path before they can be transported to the reaction chamber in the thin film deposition equipment where the deposition reaction is performed. Due to the special characteristics of gas, stainless steel pipes are usually used as transportation pipeline materials. Since stainless steel has extremely low thermal conductivity, it makes the delivery pipes difficult to heat. During the transportation process, if the vaporization is insufficient or the gaseous reactants are condensed midway, it is easy to cause the existence of very small droplets. These small droplets will affect the quality of the final film deposition, leading to a series of problems such as particle contamination and uneven deposited films.

In order to solve the above-mentioned problems existing in the prior art, the field is in urgent need of a thin film deposition technology that can effectively detect the vaporization efficiency of the reaction gas that is about to enter the reaction chamber, and avoid particles during the deposition process caused by incomplete vaporization of the reaction gas. A series of problems such as contamination and uneven deposited films.

Contents of the invention

A brief overview of one or more aspects is given below to provide a basic understanding of these aspects. This summary is not an exhaustive overview of all contemplated aspects and is intended to neither identify key or critical elements of all aspects nor attempt to delineate the scope of any or all aspects. Its sole purpose is to present some concepts of one or more aspects in a simplified form as a prelude to the more detailed description that is presented later.

In order to overcome the above-mentioned defects of the prior art, the present invention provides a thin film deposition equipment, a vaporization detection device, a vaporization detection method and a computer-readable storage medium, which can effectively detect the vapor that is about to enter the reaction chamber. The vaporization efficiency of the reaction gas avoids a series of problems such as particle contamination during the deposition process and uneven deposited films caused by incomplete vaporization of the reaction gas.

Specifically, the above-mentioned thin film deposition equipment provided according to the first aspect of the present invention includes: a vaporizer for vaporizing liquid reactants to form reaction gas; a reaction chamber connected to the vaporizer via a pipeline for extracting from the The vaporizer obtains the reaction gas for thin film deposition; and a vaporization detection device is provided between the vaporizer and the reaction chamber for detecting the vaporization degree of the reactant to allow or prevent the reaction. material enters the reaction chamber.

Further, in some embodiments of the present invention, the vaporized reactants include intermediate gases, the vaporization detection device includes a detection box with an absorption plate on the top, and the detection box is filled with a standard gas. The density of the standard gas is used to perform gas-liquid separation of the intermediate gas to obtain the reaction gas. The reaction gas floats to the absorption plate and is absorbed by the absorption plate.

Further, in some embodiments of the present invention, the density of the standard gas in the detection box is greater than the density of the reaction gas and less than the density of the reaction liquid in the intermediate gas, and the density of the reaction liquid in the intermediate gas is The reaction gas floats and rises in the environment of the standard gas, and the reaction liquid in the intermediate gas falls and falls in the environment of the standard gas.

Further, in some embodiments of the present invention, the standard gas includes nitrogen with a density of 0.9g/cm ³ , the reaction liquid includes water with a density of 1 g/cm ³ , and the reaction gas includes nitrogen with a density of 0.6g /cm ³ of water vapor.

Further, in some embodiments of the present invention, the absorbent plate includes an absorbent, which causes a chemical absorption reaction with the reactive gas.

Further, in some embodiments of the present invention, the thin film deposition equipment further includes a heating device, which is at least disposed in the detection box to heat the standard gas.

Further, in some embodiments of the present invention, the vaporization detection device includes a front-end separator, which performs primary gas-liquid separation on the intermediate gas and passes the separated gaseous reactants into the The detection box.

Further, in some embodiments of the present invention, the front-end separator includes a centrifugal device, and the reaction gas in the intermediate gas is separated by high-speed rotation of the centrifugal device.

In addition, the above-mentioned vaporization detection device provided according to the second aspect of the present invention includes: a detection box provided with an air inlet to obtain an intermediate gas composed of vaporized liquid reactants, and the detection box is filled with a standard gas; A plate is arranged on the top of the detection box. The intermediate gas is separated into gas and liquid according to the density of the standard gas to obtain a reaction gas. The reaction gas floats to the absorption plate and is absorbed by the absorption plate. Absorption, the vaporization degree of the reactant is determined based on the weight change before and after absorption by the absorption plate and the initial weight of the reactant.

In addition, according to the above-mentioned vaporization detection method provided in the third aspect of the present invention, the method includes the following steps: obtaining an intermediate gas composed of vaporized liquid reactants; performing gas-liquid separation on the intermediate gas according to the density of the standard gas, so as to Obtain the reaction gas; and absorb the reaction gas through the absorption plate, and determine the vaporization degree of the reactant based on the weight change before and after absorption by the absorption plate and the initial weight of the reactant.

In addition, according to a fourth aspect of the present invention, there is also provided a computer-readable storage medium having computer instructions stored thereon. When the computer instructions are executed by the processor, the above-mentioned vaporization detection method provided by the third aspect of the present invention is implemented.

Description of the drawings

The above-described features and advantages of the present invention can be better understood after reading the detailed description of the embodiments of the present disclosure in conjunction with the following drawings. In the drawings, components are not necessarily drawn to scale, and components with similar related properties or characteristics may have the same or similar reference numerals.

Figure 1 shows a structural block diagram of a thin film deposition equipment provided according to some embodiments of the present invention;

Figure 2 shows a schematic structural diagram of a vaporization detection device provided according to some embodiments of the present invention; and

Figure 3 shows a flow chart of a vaporization detection method provided according to some embodiments of the present invention.

Reference signs:

10 Thin film deposition equipment;

100 carburetor;

200 vaporization detection device;

210 test box;

211 absorbent plate;

220 standard gas;

230 front-end separator;

231 air inlet;

232 air outlet;

300 reaction chamber;

410 Reactive gases;

420 reaction liquid;

Steps S310~S330.

Detailed ways

The implementation of the present invention is described below with specific examples. Those skilled in the art can easily understand other advantages and effects of the present invention from the content disclosed in this specification. Although the invention will be described in conjunction with a preferred embodiment, this does not mean that the features of the invention are limited to this embodiment. On the contrary, the purpose of introducing the invention in conjunction with the embodiments is to cover other options or modifications that may be extended based on the claims of the invention. The following description contains numerous specific details in order to provide a thorough understanding of the invention. The invention may be practiced without these details. Furthermore, some specific details will be omitted from the description in order to avoid confusing or obscuring the focus of the present invention.

In the description of the present invention, it should be noted that, unless otherwise clearly stated and limited, the terms "installation", "connection" and "connection" should be understood in a broad sense. For example, it can be a fixed connection or a detachable connection. Connection, or integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium; it can be an internal connection between two components. For those of ordinary skill in the art, the specific meanings of the above terms in the present invention can be understood on a case-by-case basis.

In addition, "upper", "lower", "left", "right", "top", "bottom", "horizontal" and "vertical" used in the following description should be understood as the paragraph and related appendixes. The orientation shown in the figure. This relative terminology is only for convenience of explanation. It does not mean that the device described needs to be manufactured or operated in a specific orientation, and therefore should not be construed as a limitation of the present invention.

It will be understood that, although the terms "first," "second," "third," etc. may be used herein to describe various components, regions, layers and/or sections, these components, regions, layers and/or sections These terms should not be limited and are only used to distinguish between different components, regions, layers and/or sections. Thus, a first component, region, layer or section discussed below could be termed a second component, region, layer or section without departing from some embodiments of the invention.

As mentioned above, during the processing of semiconductors, thin film deposition equipment usually uses vaporized liquid sources as reactants, such as tetraethoxysilane (TEOS), water, etc., so a vaporization device is needed to process these The liquid reactants are vaporized and converted into gaseous state. After the liquid reactants pass through the vaporization device, they often need to be transported through a long path before they can be transported to the reaction chamber in the thin film deposition equipment where the deposition reaction is performed. Due to the special characteristics of gas, stainless steel pipes are usually used as transportation pipeline materials. Since stainless steel has extremely low thermal conductivity, it makes the delivery pipes difficult to heat. During the transportation process, if the vaporization is insufficient or the gaseous reactants are condensed midway, it is easy to cause the existence of very small droplets. These small droplets will affect the quality of the final film deposition, leading to a series of problems such as particle contamination and uneven deposited films.

In order to solve the above-mentioned problems existing in the prior art, the present invention provides a thin film deposition equipment, a vaporization detection device, a vaporization detection method and a computer-readable storage medium, which can effectively detect the impending entry into the reaction chamber. The vaporization efficiency of the reaction gas can be improved to avoid a series of problems such as particle contamination during the deposition process and uneven deposited films caused by incomplete vaporization of the reaction gas.

In some non-limiting embodiments, the above-mentioned thin film deposition equipment provided by the first aspect of the present invention can be configured with the above-mentioned vaporization detection device provided by the second aspect of the present invention. In addition, the above-mentioned vaporization detection method provided in the third aspect of the present invention can also be implemented by the vaporization detection device provided in the above-mentioned second aspect.

First, please refer to FIG. 1 , which shows a structural block diagram of a thin film deposition equipment provided according to some embodiments of the present invention.

As shown in Figure 1, in some embodiments of the present invention, the thin film deposition equipment 10 may mainly include: a vaporizer 100, which can be used to vaporize liquid reactants to form reaction gas; a reaction chamber 300, which can be connected to the vaporizer via a pipeline 100, used to obtain reaction gas from the vaporizer 100 for thin film deposition. Since the vaporization rate of the liquid reactant cannot reach 100% during the actual vaporization process through the vaporizer 100, the obtained reaction gas will include some small droplets. If these small droplets enter the subsequent reaction chamber 300 , will affect the quality of the deposited film. Therefore, a vaporization detection device 200 may be provided between the vaporizer 100 and the reaction chamber 300 , mainly for detecting the vaporization degree of the reactants, thereby further allowing or preventing the reactants from entering the reaction chamber 300 .

When the vaporization detection device 200 detects that the vaporization degree of the reactant meets the target vaporization degree, the liquid reactant can be continuously introduced into the vaporizer 100 for vaporization, and the remaining reaction gas detected by the vaporization detection device 200 can be introduced into the reaction chamber 300 . When the vaporization detection device 200 detects that the vaporization degree of the reactant does not meet the target vaporization degree, a valve can be provided in the delivery pipeline between the vaporization detection device 200 and the reaction chamber 300 to prevent the reaction gas from flowing into the reaction chamber 300 middle.

Specifically, referring to Figure 2, Figure 2 shows a schematic structural diagram of a vaporization detection device provided according to some embodiments of the present invention.

In some embodiments, since the reaction gas obtained by direct vaporization by the vaporizer 100 may include small droplets, for convenience of description, the reaction gas including small droplets is defined as an intermediate gas in the present invention, and subsequent processing is required. In other words, the vaporized reactants can be defined as intermediate gases.

As shown in Figure 2, the vaporization detection device 200 may include a detection box 210 with an absorption plate 211 on the top, and the detection box 210 is filled with a standard gas 220. The intermediate gas can be separated into gas and liquid through the density of the standard gas 220, so as to Reaction gas 410 is obtained. The reaction gas 410 floats up to contact the absorption plate 211 and is absorbed by the absorption plate 211 .

Specifically, the density of the standard gas in the detection box 210 may be greater than the density of the reaction gas 410 in the intermediate gas, and less than the density of the reaction liquid 420 in the intermediate gas. As shown in Figure 2, in this way, the reaction gas 410 in the intermediate gas can float and rise in the environment of the standard gas 220 in the detection box 210, and the reaction liquid 420 in the intermediate gas can float in the environment of the standard gas 220 in the detection box 210. It falls and descends in the environment to achieve gas-liquid separation.

For example, optionally, intermediate gases used as reactants for thin film deposition may include water vapor and liquid water. The reaction liquid 420 in the intermediate gas may be liquid water with a density of 1g/cm ³ . Correspondingly, the reaction gas 410 in the intermediate gas may be water vapor with a density of 0.6g/cm ³ . In this regard, in the sealed detection box 210, nitrogen can be selected as the standard gas 220, and its density is about 0.9g/ ^cm3 . In the closed detection box 210 filled with nitrogen, since the density of nitrogen is greater than the density of water vapor and less than the density of liquid water, nitrogen can help water vapor with a smaller density float to float. The water vapor in the intermediate gas can float and rise in a nitrogen-filled environment with the help of the buoyancy of nitrogen, while the liquid water in the intermediate gas falls and falls in a nitrogen-filled environment, thus achieving the effect of separating steam and liquid droplets. . Moreover, since the amount of intermediate gas introduced is small, the air pressure in the detection box 210 will not change in a short period of time, which will affect the density separation effect.

Furthermore, in some preferred embodiments, a heating device (not shown in FIG. 2 ) may be provided in the detection box 210 , and the heating device can change the standard gas (such as nitrogen) in the detection box 210 into a high-temperature gas to form A sealed high-temperature detection environment to prevent reactive gases (such as water vapor) from being cooled and liquefied.

Those skilled in the art can understand that the above solution in which the reaction gas 410 is water vapor, the reaction liquid 420 is liquid water, and the standard gas 220 is nitrogen is only a non-limiting implementation provided by the present invention and is intended to be clearly demonstrated. The main idea of the present invention is to provide a specific solution that is convenient for the public to implement, but is not used to limit the protection scope of the present invention. Those skilled in the art can select different standard gases 220 for filling the detection box 210 and corresponding absorbents for the absorption plate 211 according to different reactants, so the present invention has a very wide scope of application.

In some embodiments, the absorbent plate 211 in the detection box 210 may include absorbent, and the absorbent in the absorbent plate 211 and the reactive gas may produce a chemical absorption reaction. For example, for the above embodiment in which the reactive gas 410 is water vapor, the absorbent in the absorbing plate 211 may be an absorbent that can absorb and react with water, such as anhydrous calcium chloride or calcium hydroxide.

In the above preferred embodiment, the absorption plate 211 is arranged at the top of the detection box 210. The separated reaction gas 410 needs to float to the top of the detection box 210 before it can be absorbed by the absorption plate 211, which is conducive to further increasing the amount of intermediate gas. The space between the separated reaction gas 410 and the reaction liquid 420 prevents the absorption plate 211 from accidentally chemically absorbing the reaction liquid 420 and affecting the accuracy of subsequent vaporization detection.

In some embodiments of the present invention, the vaporization degree of the reactant can be determined based on the weight change before and after the absorbing plate 211 absorbs the reaction gas 410 and the initial weight of the reactant.

Specifically, the initial weight A0 of the absorption plate 211 is determined. After the absorption plate 211 absorbs the reaction gas 410 (such as water vapor), the weight A1 of the absorption plate 211 is determined again, and the initial weight A0 and the current weight A1 of the absorption plate 211 are obtained. The weight difference is A1-A0. Obtain the weight B1 of the liquid reactant before the vaporizer 100. According to the ratio of the weight difference A1-A0 to the initial weight B1 of the liquid reactant, the vaporization degree of the reactant can be determined. The degree of vaporization is (A1-A0)/ B1, complete the vaporization efficiency test.

Further, as shown in FIG. 2 , in some other preferred embodiments, in order to completely separate the reaction gas 410 and the reaction liquid 420 in the vaporized reactants, the vaporization detection device 200 may also include a front-end separator 230 . The front-end separator 230 can be installed outside the detection box 210 and connected to the detection box 210 through pipelines. Optionally, as shown in FIG. 2 , the front-end separator 230 can also be disposed inside the detection box 210 to reduce the overall space occupation of the vaporization detection device 200 .

The front-end separator 230 can be used to perform initial gas-liquid separation of the initial intermediate gas after vaporization in the vaporizer 100, and pass the separated gaseous reactants into the detection box 210, where they pass through the standard gas 220 and the absorption plate 211. Carry out secondary gas-liquid separation, and then conduct vaporization detection.

As shown in Figure 2, in some optional embodiments, the front-end separator 230 may include a centrifugal device (not shown in Figure 2). Since the gas flow rate used in semiconductor processing is extremely fast, for example, 8 to 80 m/s, it can be applied to the requirements of separators including centrifugal devices. The initial intermediate gas vaporized by the vaporizer 100 enters the front-end separator 230 through the air inlet 231. Through the centrifugal force generated by the high-speed rotation of the centrifugal device, the reaction liquid in the initial intermediate gas flies out along the tangential direction of the rotation direction, so that the reaction liquid can be The reaction gas is separated from the initial intermediate gas flow (the direction of the initial intermediate gas flow is represented by a spiral in Figure 2). The intermediate gas after the primary gas-liquid separation is completed is discharged through the gas outlet 232, and the discharged reaction gas 410 and reaction liquid 420 are subjected to the above-mentioned secondary gas-liquid separation based on the density of the standard gas 220. Since the centrifugal force experienced by the reaction liquid 420 is much greater than gravity and inertial force, the separation efficiency of gas-liquid separation through the centrifugal structure is relatively high.

Please continue to return to FIG. 1 . After the vaporization degree of the liquid reactant is detected by the vaporization detection device 200 , it can be further determined whether to allow or prevent the reactant from entering the reaction chamber 300 .

Specifically, in some embodiments, a gate valve structure may be included in the pipeline connecting the vaporization detection device 200 and the reaction chamber 300 . The vaporization threshold can be preset to correspond to the target vaporization degree. In response to the detected vaporization degree of the liquid reactant exceeding the vaporization threshold, it means that the vaporization degree of the current reactant has reached the target vaporization degree and meets the vaporization requirements, which does not include small droplets. Or if the content of small droplets is very small, they can continue to be passed into the reaction chamber 300 . If the vaporization degree of the liquid reactant detected in response is less than the vaporization threshold, it means that the vaporization degree of the current reactant has not reached the target vaporization degree and does not meet the vaporization requirements. It contains more small droplets. You can choose to close the valve. To prevent reactants from entering the reaction chamber 300. Furthermore, optionally, the reactants whose vaporization does not meet the standard can also be continuously transported to the vaporizer 100 through another pipeline to vaporize them for a second time.

Next, please refer to Figure 3, which shows a flow chart of a vaporization detection method provided according to some embodiments of the present invention.

As shown in Figure 3, in some embodiments of the present invention, the vaporization detection method may mainly include the following steps:

S310: Obtain the intermediate gas composed of the vaporized liquid reactants.

Specifically, in some embodiments, the reaction gas including small droplets obtained by direct vaporization by the vaporizer 100 is defined as an intermediate gas in the present invention.

Furthermore, in some preferred embodiments, primary gas-liquid separation can be performed on the initial intermediate gas vaporized by the above-mentioned vaporizer 100 . Specifically, it can be through the front-end separator 230 in the vaporization detection device 200, which can include a centrifugal device (not shown in Figure 2). The initial intermediate gas vaporized by the vaporizer 100 enters the front-end separator 230 through the air inlet 231. Through the centrifugal force generated by the high-speed rotation of the centrifugal device, the reaction liquid in the initial intermediate gas flies out along the tangential direction of the rotation direction, so that the reaction liquid can be The reaction gas is separated from the initial flow of intermediate gas. The intermediate gas after the primary gas-liquid separation is completed is discharged through the gas outlet 232, and the discharged reaction gas 410 and reaction liquid 420 are subjected to the above-mentioned secondary gas-liquid separation based on the density of the standard gas 220. Since the centrifugal force experienced by the reaction liquid 420 is much greater than gravity and inertial force, the separation efficiency of gas-liquid separation through the centrifugal structure is relatively high.

Next, step S320 can be performed: perform gas-liquid separation on the intermediate gas according to the density of the standard gas to obtain the reaction gas.

In some embodiments, the vaporization detection device 200 may include a detection box 210 with an absorption plate 211 on the top, and the detection box 210 is filled with a standard gas 220. The intermediate gas can be separated into gas and liquid through the density of the standard gas 220, so as to Reaction gas 410 is obtained. The reaction gas 410 floats up to contact the absorption plate 211 and is absorbed by the absorption plate 211 .

Specifically, the density of the standard gas in the detection box 210 may be greater than the density of the reaction gas 410 in the intermediate gas, and less than the density of the reaction liquid 420 in the intermediate gas. In this way, the reaction gas 410 in the intermediate gas can float and rise in the environment of the standard gas 220 in the detection box 210, and the reaction liquid 420 in the intermediate gas can fall and fall in the environment of the standard gas 220 in the detection box 210, thereby Achieve secondary gas-liquid separation.

For example, optionally, intermediate gases used as reactants for thin film deposition may include water vapor and liquid water. That is to say, the reaction liquid 420 in the intermediate gas can be water, and the density of water is 1g/cm3. Correspondingly, the reaction gas 410 in the intermediate gas can be water vapor, and the density of water vapor is 0.6g/ ^cm3 . In this regard, in the sealed detection box 210, nitrogen can be selected as the standard gas 220, and the density of nitrogen is about 0.9g/ ^cm3 . In the closed detection box 210 filled with nitrogen, since the density of nitrogen is greater than the density of water vapor and less than the density of liquid water, nitrogen can help water vapor with a smaller density float to float. The water vapor in the intermediate gas can float and rise in an environment full of nitrogen with the help of the buoyancy of nitrogen, while the liquid water in the intermediate gas falls and falls in an environment full of nitrogen, thus achieving the secondary separation of steam and droplets. Effect.

Next, step S330 can be performed: absorb the reaction gas through the absorption plate, and determine the vaporization degree of the reactant based on the weight change before and after absorption by the absorption plate and the initial weight of the reactant.

Specifically, in some embodiments, the initial weight A0 of the absorption plate 211 is determined. After the absorption plate 211 absorbs the reaction gas 410 (such as water vapor), the weight A1 of the absorption plate 211 is determined again to obtain the initial weight A1 of the absorption plate 211 . The weight difference A1-A0 between the weight A0 and the current weight A1. Obtain the weight B1 of the liquid reactant before the vaporizer 100. According to the ratio of the weight difference A1-A0 to the initial weight B1 of the liquid reactant, the vaporization degree of the reactant can be determined. The degree of vaporization is (A1-A0)/ B1, complete the vaporization efficiency test.

Although the methods described above are illustrated and described as a sequence of acts to simplify explanation, it should be understood and appreciated that the methods are not limited by the order of the acts, as some acts may occur in a different order in accordance with one or more embodiments. and/or occur concurrently with other actions illustrated and described herein or not illustrated and described herein but understood by those skilled in the art.

Another aspect of the present invention also provides a computer-readable storage medium on which computer instructions are stored, which can be used to implement the above-mentioned vaporization detection method provided by the third aspect of the present invention.

Those skilled in the art can understand that the above-mentioned examples of vaporization detection methods are only some non-limiting implementations provided by the present invention, and are intended to clearly demonstrate the main concepts of the present invention and provide some specific solutions that are convenient for the public to implement. It is not used to limit all working modes or all functions of the vapor detection device 200 and the thin film deposition equipment 10 . Similarly, the vaporization detection device 200 and the thin film deposition equipment 10 are only non-limiting implementations provided by the present invention, and do not limit the implementation of each step in these vaporization detection methods.

To sum up, the present invention provides a thin film deposition equipment, a vaporization detection device, a vaporization detection method and a computer-readable storage medium, which can effectively detect the vaporization efficiency of the reaction gas that is about to enter the reaction chamber. , to avoid a series of problems such as particle contamination and uneven deposited films during the deposition process caused by incomplete vaporization of the reaction gas.

The previous description of the disclosure is provided to enable any person skilled in the art to make or use the disclosure. Various modifications to the disclosure will be readily apparent to those skilled in the art, and the general principles defined herein may be applied to other variations without departing from the spirit or scope of the disclosure. Thus, the disclosure is not intended to be limited to the examples and designs described herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.

Claims (11)

1. A thin film deposition apparatus, comprising:

a vaporizer for vaporizing a reactant in a liquid state to form a reactant gas;

the reaction cavity is connected with the vaporizer through a pipeline and is used for acquiring the reaction gas from the vaporizer so as to perform film deposition; and

and the vaporization detection device is arranged between the vaporizer and the reaction cavity and is used for detecting the vaporization degree of the reactant so as to allow or prevent the reactant from entering the reaction cavity.

2. The thin film deposition apparatus as claimed in claim 1, wherein the reactant after vaporization comprises an intermediate gas, the vaporization detection means comprises a detection tank having an absorption plate at a top thereof, and the detection tank is filled with a standard gas, and the intermediate gas is subjected to gas-liquid separation by a density of the standard gas to obtain the reactant gas, and the reactant gas floats up to the absorption plate to be absorbed by the absorption plate.

3. The thin film deposition apparatus according to claim 2, wherein a density of the standard gas in the detection chamber is greater than a density of the reactive gas and less than a density of the reactive liquid in the intermediate gas, the reactive gas in the intermediate gas being suspended to rise in an environment of the standard gas, and the reactive liquid in the intermediate gas being dropped to fall in an environment of the standard gas.

4. The thin film deposition apparatus according to claim 3, wherein the standard gas comprises a density of 0.9g/cm ³ The reaction liquid comprising nitrogen having a density of 1g/cm ³ The reaction gas includes water having a density of 0.6g/cm ³ Is a water vapor of (a).

5. The thin film deposition apparatus according to claim 2, wherein the absorber plate includes an absorber therein to chemically react with the reaction gas.

6. The thin film deposition apparatus according to claim 2, further comprising a heating device provided at least in the detection chamber to heat the standard gas.

7. The thin film deposition apparatus according to claim 2, wherein the vaporization detection means includes a front-end separator that performs primary gas-liquid separation of the intermediate gas and passes the separated gaseous reactant into the detection chamber.

8. The thin film deposition apparatus as claimed in claim 7, wherein the front-end separator comprises a centrifugal device, and the reaction gas in the intermediate gas is separated by high-speed rotation of the centrifugal device.

9. A vaporization detection device, comprising:

the detection box is provided with an air inlet, and is used for acquiring intermediate gas formed by the vaporized liquid reactant, and standard gas is filled in the detection box;

the absorption plate is arranged at the top of the detection box, the gas-liquid separation is carried out on the intermediate gas through the density of the standard gas, so that reaction gas is obtained, floats to the absorption plate and is absorbed by the absorption plate, and the vaporization degree of the reactant is determined according to the weight change before and after the absorption of the absorption plate and the initial weight of the reactant.

10. A vaporization detection method, characterized by comprising the steps of:

obtaining intermediate gas formed by vaporized liquid reactants;

according to the density of the standard gas, carrying out gas-liquid separation on the intermediate gas to obtain a reaction gas; and

the reactant gas is absorbed by the absorbing plate, and the vaporization degree of the reactant is determined according to the weight change before and after the absorption by the absorbing plate and the initial weight of the reactant.

11. A computer readable storage medium having stored thereon computer instructions which, when executed by a processor, implement the vaporization detection method of claim 10.