CN117055307A - Data processing method and device applied to mask imaging and exposure equipment - Google Patents

Data processing method and device applied to mask imaging and exposure equipment Download PDF

Info

Publication number
CN117055307A
CN117055307A CN202311309899.0A CN202311309899A CN117055307A CN 117055307 A CN117055307 A CN 117055307A CN 202311309899 A CN202311309899 A CN 202311309899A CN 117055307 A CN117055307 A CN 117055307A
Authority
CN
China
Prior art keywords
current
prior
imaging
loss value
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN202311309899.0A
Other languages
Chinese (zh)
Other versions
CN117055307B (en
Inventor
和琨
牛志元
韦炳威
陈晨
杜德川
张瑾轩
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Guangke Xintu Beijing Technology Co ltd
Original Assignee
Guangke Xintu Beijing Technology Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Guangke Xintu Beijing Technology Co ltd filed Critical Guangke Xintu Beijing Technology Co ltd
Priority to CN202311309899.0A priority Critical patent/CN117055307B/en
Publication of CN117055307A publication Critical patent/CN117055307A/en
Application granted granted Critical
Publication of CN117055307B publication Critical patent/CN117055307B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70508—Data handling in all parts of the microlithographic apparatus, e.g. handling pattern data for addressable masks or data transfer to or from different components within the exposure apparatus
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

The invention relates to the technical field of integrated circuit manufacturing and the technical field of computational lithography, and discloses a data processing method, a device and exposure equipment applied to mask imaging, wherein the method comprises the following steps: acquiring a prior imaging image generated by imaging illumination light through a prior mask, and determining a prior loss value based on the prior imaging image; updating a prior mask plate as a current mask plate, acquiring a current imaging image generated by imaging illumination light through the current mask plate, and determining a current loss value based on the current imaging image; and updating the current mask plate according to the prior loss value and the current loss value until the exposure condition is met. According to the invention, the mask is updated, imaging is carried out through illumination light passing through the current mask, the current loss value is calculated according to the generated current imaging image, and the mask is continuously updated through the size relation between the previous loss value and the current loss value, so that the adjustment of photo-imaging is realized, and the imaging resolution and the energy utilization rate are greatly improved.

Description

Data processing method and device applied to mask imaging and exposure equipment
Technical Field
The present invention relates to the field of integrated circuit manufacturing technology and the field of computational lithography technology, and in particular, to a data processing method and apparatus for mask imaging, and an exposure device.
Background
Photolithography, which is one of the most important process steps in semiconductor manufacturing, is a process of transferring a pattern on a reticle onto a wafer by using a photochemical reaction principle, is one of the most critical technologies in the manufacture of large-scale integrated circuit chips, and can directly affect the process level of the whole integrated circuit industry chain.
In the prior art, the most widely used lithography technology in the integrated circuit field is the projection exposure technology, in which light is projected onto the surface of a wafer through a complex projection optical system after passing through a mask, and exposure is completed. In this process, the numerical aperture of the objective directly influences the imaging resolution in projection lithography due to the intervention of the optical system. Therefore, how to adjust the lithographic imaging in the lithographic process, and thus the imaging resolution, is a problem to be solved.
Disclosure of Invention
In view of the above, the present invention provides a data processing method, apparatus and exposure device applied to mask imaging, so as to solve the problem of adjusting imaging resolution.
In a first aspect, the present invention provides a data processing method for use in mask imaging, the method comprising: acquiring a prior imaging image generated by imaging illumination light through a prior mask, and determining a prior loss value based on the prior imaging image; updating a prior mask plate as a current mask plate, acquiring a current imaging image generated by imaging illumination light through the current mask plate, and determining a current loss value based on the current imaging image; and updating the current mask plate according to the prior loss value and the current loss value until the exposure condition is met.
According to the invention, the illumination light is used for imaging through the prior mask, the prior loss value is calculated according to the generated prior imaging image, the mask is updated, the illumination light is used for imaging through the current mask, the current loss value is calculated according to the generated current imaging image, and the mask is continuously updated according to the size relation between the prior loss value and the current loss value, so that the adjustment of photo-imaging is realized, and the imaging resolution and the energy utilization rate are greatly improved.
In an alternative embodiment, the determining a prior loss value based on the prior imaging image includes: acquiring target light field distribution data corresponding to a target integrated circuit pattern; a prior loss value is determined based on the target light field distribution data and prior aerial image data corresponding to the prior imaged image.
According to the method, the prior loss value when the mask is not updated is calculated according to the target light field distribution data and the prior aerial image data corresponding to the prior imaging image, so that the change of the loss value is conveniently judged.
In an alternative embodiment, the acquiring the prior imaging image generated by imaging the illumination light through the prior reticle includes: according to the mask surface complex amplitude corresponding to the illumination light and the matched diffraction transfer function, determining the prior aerial image data conforming to the prior mask plate coordinate and the image surface coordinate thereof, wherein the prior aerial image data meets the following conditions:
wherein,for the preceding aerial image data, < >>Converging spherical wave illumination light emitted for the illumination device, < >>For mask surface complex amplitude +.>For diffraction transfer function>For the image plane coordinates +.>For the preceding reticle coordinates +.>Is the diffraction distance.
According to the invention, the diffraction formula is used for calculating the prior imaging image generated by imaging the illumination light through the prior mask plate, so that the accuracy of the imaging image result is improved.
In an alternative embodiment, the determining a prior loss value based on the target light field distribution data and the prior aerial image data corresponding to the prior imaged image comprises: according to the amplitude and the phase corresponding to the target light field distribution data, determining a prior loss value corresponding to the prior aerial image data, wherein the prior loss value meets the following conditions:
Wherein,for the prior loss value, +.>For the preceding aerial image data, < >>For the light field of the object,，/>for the coordinates of the point of interest of the object plane, +.> ，/>For the amplitude of the target light field +.>For the phase of the target light field +.>In imaginary units.
The method calculates the prior loss value by comparing the prior aerial image data with the target light field distribution, so as to update the mask plate according to the change of the loss value and adjust imaging.
In an alternative embodiment, the updating the previous reticle to be the current reticle, and obtaining the current imaging image generated by imaging the illumination light through the current reticle includes: updating the pixel previous value of the appointed pixel point on the previous mask plate to be the current value of the pixel, and generating a current mask plate; acquiring current light field distribution data corresponding to the current mask plate and formed by imaging illumination light through a specified pixel point corresponding to a current value of an illumination light through pixel, wherein the current light field distribution data is light field data generated by imaging the illumination light through the specified pixel point; determining a current imaging image according to the current light field distribution data and a previous imaging image, wherein the current space image data of the current imaging image meets the following conditions:
wherein, For the current aerial image data, +.>For the prior aerial image data corresponding to the prior imaged image,for the current pixel value, +.>Data is distributed for the current light field.
According to the invention, the current aerial image data is calculated according to the prior aerial image data and the current light field distribution data, so that the calculation speed and accuracy of the aerial image data are improved.
In an optional embodiment, the updating the current reticle according to the previous loss value and the current loss value includes: if the current loss value is greater than or equal to the previous loss value, updating the current value of the pixel of the appointed pixel point of the current mask plate, recovering the current mask plate as the previous mask plate, and recovering the current mask plate as the previous mask plate.
According to the invention, the pixel value of the pixel point is adjusted according to the magnitude relation between the current loss value and the prior loss value so as to change imaging, thereby improving imaging quality.
In an alternative embodiment, after updating the current reticle based on the prior loss value and the current loss value, the method further comprises: updating the recovered prior mask plate to be a first new mask plate, acquiring a first new imaging image generated by imaging illumination light through the first new mask plate, and determining a first new loss value based on the first new imaging image; and updating the first new mask according to the first new loss value and the previous loss value corresponding to the previous mask.
The invention continuously updates the mask plate, images through the new mask plate by the illumination light, calculates the loss value to determine the imaging quality, and updates the mask plate according to the magnitude relation between the newly calculated loss value and the previous loss value so as to change the imaging and improve the imaging quality.
In an alternative embodiment, before the updating the first new reticle according to the first new loss value and the previous loss value corresponding to the previous reticle, the method further includes: when the first new loss value is equal to the current loss value, or the first new imaging image generated by imaging the illumination light through the first new mask reaches a preset imaging quality value, determining that the exposure condition is met.
The invention compares the newly calculated loss value with the current loss value or judges the imaging quality of the newly imaged image to judge whether the exposure condition is met, so that the mask meeting the exposure condition can be used for imaging in time, and the resource waste caused by continuous updating is avoided.
In an alternative embodiment, the method further comprises: and if the current loss value is smaller than the prior loss value, maintaining the current pixel value of the appointed pixel point of the current mask plate unchanged.
The invention maintains the pixel value of the pixel point on the mask plate unchanged by comparing the current loss value with the prior loss value so as to maintain the mask plate and image on the mask plate meeting the exposure condition.
In an alternative embodiment, after updating the current reticle based on the prior loss value and the current loss value, the method further comprises: updating the current mask plate to be a second new mask plate, acquiring a second new imaging image generated by imaging illumination light through the second new mask plate, and determining a second new loss value based on the second new imaging image; and updating the second new mask according to the second new loss value and the current loss value corresponding to the current mask.
The invention continuously updates the mask plate, images through the new mask plate by the illumination light, calculates the loss value to determine the imaging quality, and updates the mask plate according to the magnitude relation between the newly calculated loss value and the previous loss value so as to change the imaging and improve the imaging quality.
In an optional embodiment, before the updating the second new reticle according to the second new loss value and the current loss value corresponding to the current reticle, the method further includes: and when the second new loss value is equal to the current loss value, or a second new imaging image generated by imaging the illumination light through the second new mask plate reaches a preset imaging quality value, determining that the exposure condition is met.
The invention compares the newly calculated loss value with the current loss value or judges the imaging quality of the newly imaged image to judge whether the exposure condition is met, so that the mask meeting the exposure condition can be used for imaging in time, and the resource waste caused by continuous updating is avoided.
In a second aspect, the present invention provides a data processing apparatus for mask imaging, the apparatus comprising a prior determination module, a current determination module and a layout update module.
The prior determining module is used for acquiring a prior imaging image generated by imaging illumination light through a prior mask plate and determining a prior loss value based on the prior imaging image;
the current determining module is used for updating the prior mask plate into a current mask plate, acquiring a current imaging image generated by imaging illumination light through the current mask plate, and determining a current loss value based on the current imaging image;
the layout updating module is used for updating the current mask plate according to the prior loss value and the current loss value until the exposure condition is met.
In a third aspect, the present invention provides an exposure apparatus comprising: the memory and the processor are in communication connection, computer instructions are stored in the memory, and the processor executes the computer instructions, so that the data processing method applied to mask imaging in the first aspect or any implementation mode corresponding to the first aspect is executed.
In a fourth aspect, the present invention provides a computer-readable storage medium having stored thereon computer instructions for causing a computer to execute the data processing method of the first aspect or any of its corresponding embodiments described above, applied to mask imaging.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings that are needed in the description of the embodiments or the prior art will be briefly described, and it is obvious that the drawings in the description below are some embodiments of the present invention, and other drawings can be obtained according to the drawings without inventive effort for a person skilled in the art.
FIG. 1 is a schematic diagram of an imaging principle according to an embodiment of the present invention;
FIG. 2 is a flow chart of a data processing method applied to mask imaging according to an embodiment of the present invention;
FIG. 3 is a flow chart of another data processing method applied to mask imaging according to an embodiment of the present invention;
FIG. 4 is a flow chart of yet another data processing method applied to mask imaging according to an embodiment of the present invention;
FIG. 5 is a schematic diagram of a target test pattern according to an embodiment of the invention;
FIG. 6 is a schematic diagram of an imaging reconstruction according to an embodiment of the present invention;
FIG. 7 is a schematic diagram of an optimized imaging reconstruction according to an embodiment of the present invention;
FIG. 8 is a block diagram of a data processing apparatus applied to mask imaging according to an embodiment of the present invention;
fig. 9 is a schematic diagram of a hardware configuration of an exposure apparatus according to an embodiment of the present invention.
Detailed Description
For the purpose of making the objects, technical solutions and advantages of the embodiments of the present invention more apparent, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention, and it is apparent that the described embodiments are some embodiments of the present invention, but not all embodiments of the present invention. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
At present, with the shrinking of the feature size of integrated circuits, the integration level of the integrated circuits is improved, the development of computer technology is promoted, and the calculation holographic technology is developed continuously. The holographic technology uses the principle of light interference and diffraction, calculates the hologram of the synthesized target image strictly by a computer, and uses a designed light source to irradiate the hologram physically, so that the required pattern can be presented at the corresponding position.
As feature sizes on integrated circuits continue to shrink, the required numerical aperture continues to grow, and the manufacturing issues of projection objective systems are difficult to solve. The calculation holographic lithography technology is one of application scenes of calculation holographic, and compared with the traditional projection lithography technology, the method has the advantages of low mask manufacturing and maintenance cost, no need of complex projection objective lenses and the like, and is a new scheme in the lithography technology. Therefore, how to improve the energy utilization and imaging resolution is clearly the key to the development of computational holographic lithography.
In the field of lithography, imaging feature size and energy utilization rate are important indexes of development of lithography technology, which directly relate to the process node and yield which can be achieved, and for the computational holographic lithography technology, if parallel illumination similar to projection lithography is adopted to vertically irradiate a holographic mask, the imaging resolution which can be achieved is limited, so how to improve the imaging resolution and energy utilization rate is a key problem to be solved.
According to an embodiment of the present invention, there is provided an embodiment of a data processing method applied to mask imaging, it being noted that the steps shown in the flowcharts of the figures may be performed in a computer system such as a set of computer executable instructions, and although a logical order is shown in the flowcharts, in some cases the steps shown or described may be performed in an order different from that shown or described herein.
In the present embodiment, there is provided a data processing method applied to mask imaging, as shown in fig. 1, a mask image transfer apparatus including an illumination apparatus 1, a hologram mask 2, and an imaging plane 3. Wherein the lighting device is used for forming a required converging spherical wave as illumination light, and a converging focus is positionedIn FIG. 1zThe axis direction is the illumination light direction of the illumination device. The holographic mask is positioned at +.>The plane can be optimized by adopting a certain optimization method and is manufactured. The imaging surface is used to form an image, and may be a wafer coated with photoresist, a microscope, or the like.
Taking the optimization of a binary phase mask as an example, fig. 2 is a flowchart of a mask image transfer apparatus imaging adjustment method according to an embodiment of the present invention, where the method flow may also be applied to binary amplitude or other amplitude masks, and is only used herein by way of example and not limitation, and as shown in fig. 2, the flow includes the following steps:
in step S201, a previous imaged image generated by imaging illumination light through a previous reticle is acquired, and a previous loss value is determined based on the previous imaged image.
In the embodiment of the invention, the illumination light is emitted by the illumination device, and the illumination light of the illumination device is set as Wherein->，/>Is wave number. Wherein the illumination light is a converging spherical wave.
The illumination light is imaged through the prior mask plate to form a prior imaging image, and a prior loss value is calculated according to the prior imaging image。
Step S202, updating a prior mask as a current mask, acquiring a current imaging image generated by imaging illumination light through the current mask, and determining a current loss value based on the current imaging image.
In the embodiment of the invention, the pixel value of at least one appointed pixel point on the prior mask plate is updated, illumination light is imaged through the current mask plate and updated at the same time to form a current imaging image, and the current loss is calculated according to the current imaging imageLoss of value。
Step S203, updating the current mask until the exposure condition is met according to the prior loss value and the current loss value.
In the embodiment of the invention, the method is based on the prior loss valueAnd the current loss value->Updating the current mask plate, and repeating the steps S202-S203 until the exposure condition is met.
In the embodiment of the invention, the data processing method applied to mask imaging is a cyclic iteration of mask optimization, and can realize continuous updating optimization of the mask layout for mask exposure imaging until the mask capable of achieving the optimal exposure imaging effect is determined. The previous mask plate can be an initial mask plate in a cyclic iteration process or a mask plate updated in a certain intermediate iteration in the cyclic iteration process. In addition, the current reticle is a reticle after the prior reticle update.
For example, when step S201 is the initial step in the data processing method, the previous mask is the initial mask that has not been updated, and the previous mask is the mask after the initial mask is updated; if step S201 is a non-initial step in the data processing method, the previous reticle is an updated reticle after the similar processing iteration of steps S201 to S203, and the previous reticle is a reticle after the reticle is updated again. In this way, the mask layout for mask exposure imaging can be updated and optimized continuously until the mask which can achieve the best exposure imaging effect is determined.
According to the data processing method applied to mask imaging, the illumination light is used for imaging through the prior mask, the prior loss value is calculated according to the generated prior imaging image, the prior mask is further updated based on the prior loss value, the illumination light is used for imaging through the updated current mask, the current loss value is calculated according to the generated current imaging image, and finally the mask is continuously updated according to the magnitude relation between the prior loss value and the current loss value, so that fine optimization of imaging of a photoetching mask is achieved, and the imaging resolution and the energy utilization rate of mask imaging are greatly improved.
In this embodiment, a data processing method applied to mask imaging is provided, and fig. 3 is a flowchart of a data processing method applied to mask imaging according to an embodiment of the present invention, as shown in fig. 3, the flowchart includes the following steps:
in step S301, a prior imaged image generated by imaging illumination light through a prior reticle is acquired, and a prior loss value is determined based on the prior imaged image.
Specifically, the step S301 includes:
step S3011, determining the prior aerial image data according to the prior reticle coordinates and the image plane coordinates thereof according to the mask plane complex amplitude corresponding to the illumination light and the matched diffraction transfer function.
Specifically, the prior aerial image data satisfies:
（1）
wherein,for the preceding aerial image data, < >>Converging spherical wave illumination light emitted for the illumination device, < >>For mask surface complex amplitude +.>For diffraction transfer function>For the image plane coordinates +.>For the preceding reticle coordinates +.>Is the diffraction distance.
The accuracy of imaging image results can be greatly improved by calculating a prior imaging image generated by imaging illumination light through a prior mask through a diffraction formula.
The aerial image data may be calculated according to the rayleigh-soxhlet equation (1) calculated by diffraction as described above, or may be calculated according to another diffraction calculation equation, which is merely an example and not a limitation. And calculating the aerial image data of the illumination light on the imaging surface through a diffraction formula so as to increase the accuracy of an aerial image result.
Step S3012, obtaining target light field distribution data corresponding to the target integrated circuit pattern.
Step S3013, a prior loss value is determined based on the target light field distribution data and the prior aerial image data corresponding to the prior imaged image.
In the embodiment of the invention, a target light field is set by a target integrated circuit pattern, and target light field distribution data corresponding to the target integrated circuit pattern is acquiredSetting the initial pixel value of each pixel point on the mask plate as +.>Wherein 0 represents that the phase of light passing through the pixel is unchanged, < >>Representing the phase inversion of light passing through the pixel>And (2) and，/>is the mask pixel size.
And calculating a previous loss value when the mask is not updated according to the target light field distribution data and the previous aerial image data corresponding to the previous imaging image, so as to more accurately judge the change of the loss value.
Specifically, the step S3013 includes:
in step S30131, a previous loss value corresponding to the previous aerial image data is determined according to the amplitude and phase corresponding to the target light field distribution data.
Specifically, the prior loss value satisfies:
（2）
wherein,for the prior loss value, +.>For the preceding aerial image data, < >>For the light field of the object,，/>for the coordinates of the point of interest of the object plane, +. > ，/>For the amplitude of the target light field +.>For the phase of the target light field +.>In imaginary units.
The prior loss value is calculated by comparing the prior aerial image data with the target light field distribution, so that the mask is updated according to the change of the loss value to adjust imaging.
Step S302, updating a prior mask as a current mask, and acquiring a current imaging image generated by imaging illumination light through the current mask.
Specifically, the step S302 includes:
in step S3021, updating the pixel previous value of the specified pixel point on the previous mask to be the current value of the pixel, and generating the current mask.
In step S3022, current light field distribution data corresponding to the current mask plate and imaged by the illumination light is obtained.
The current light field distribution data are light field data generated by imaging illumination light through a specified pixel point corresponding to the current value of the pixel.
Step S3023, determining a current imaging image from the current light field distribution data and the previous imaging image.
Specifically, the current aerial image data of the current imaging image satisfies:
（3）
wherein,for the current aerial image data, +.>For the prior aerial image data corresponding to the prior imaged image,for the current pixel value, +. >Data is distributed for the current light field.
In the embodiment of the invention, the pixel prior value of the appointed pixel point on the prior mask is updated, and the current mask is determined according to the pixel value of the updated pixel point. By calculating the current aerial image data according to the prior aerial image data and the current light field distribution data, the calculation speed and accuracy of the aerial image data are improved.
Because the imaging of the whole mask plate is equivalent to the coherent superposition of the imaging of all pixel points on the mask plate, and if the pixel value of the pixel point is 0, the contribution to the image is addedIf the pixel value of the pixel point is 1, the phase is reversed, and the contribution to the image is reduced by +.>. Therefore, pixel dot +.>After the pixel value of the mask plate is changed, the contribution of the point to the image is changed from adding to subtracting, and from subtracting to adding, namely the space image formed by the whole mask plate on the image plane is changed to +>。
Specifically, the current loss value is calculated according to the following formula:
（4）
wherein,for the current loss value, +.>For the current aerial image data, +.>Is the target light field.
Step S303, updating the current mask plate according to the prior loss value and the current loss value.
Please refer to step S203 in the embodiment shown in fig. 2 in detail, which is not described herein.
According to the data processing method applied to mask imaging, the pixel values of the pixel points are adjusted according to the magnitude relation between the current loss value and the previous loss value, so that imaging is changed, and imaging quality is improved.
In this embodiment, a data processing method applied to mask imaging is provided, and fig. 4 is a flowchart of a data processing method applied to mask imaging according to an embodiment of the present invention, as shown in fig. 4, the flowchart includes the following steps:
step S401, acquiring a prior imaged image generated by imaging illumination light through a prior reticle, and determining a prior loss value based on the prior imaged image。
Please refer to step S201 in the embodiment shown in fig. 2 in detail, which is not described herein.
Step S402, updating the prior mask as the current mask, acquiring a current imaging image generated by imaging illumination light through the current mask, and determining a current loss value based on the current imaging image。
Please refer to step S202 in the embodiment shown in fig. 2, which is not described herein.
Wherein, as in the previous step S203, according to the previous loss valueAnd the current loss value->Updating the current mask, typically by comparing the previous loss value +. >And the current loss value->As a judgment condition for the subsequent update iteration, as shown in fig. 4, refer to steps S403 to S406 and S407 to S410 as follows.
Specifically, when the current loss valueGreater than or equal to the previous loss value->In this case, the contents of steps S403 to S406 may be executed; conversely, when the current loss value +.>Less than the previous loss value->In this case, the steps S407 to S410 may be performed.
Step S403, if the current loss valueGreater than or equal to the previous loss value->And updating the pixel current value of the appointed pixel point of the current mask plate, restoring the pixel current value to be the pixel prior value, and restoring the current mask plate to be the prior mask plate.
In the embodiment of the invention, if the current loss value isThe ∈R is ≡>The pixel current value of the appointed pixel point of the current mask plate is +.>Reduction, i.e.)>And returns to step S402 to evaluate the next pixel.
After the step S403 is completed, the current reticle may be restored to the original previous reticle, that is, the reticle may still not meet the exposure condition. Therefore, the previous mask after recovery needs to be further updated, and the pixel value of one of the pixel points is updated again to determine the first new mask, specifically referring to the following steps S404 to S406.
Step S404, updating the recovered prior mask as a first new mask, acquiring a first new imaging image generated by imaging illumination light through the first new mask, and determining a first new loss value based on the first new imaging imagee 1 。
Step S405, when the first new loss valuee 1 And the current loss valueAnd leveling or enabling the illumination light to pass through the first new mask plate to carry out imaging to generate a first new imaging image reaching a preset imaging quality value, and determining that the exposure condition is met.
Step S406, according to the first new loss valuee 1 Previous loss value corresponding to previous reticleUpdating the first new mask.
In the embodiment of the invention, the mask is continuously updated, the new mask is imaged by illumination light, and a first new loss value is calculated according to a first new imaging image generated by imaging the first new maske 1 。
After the mask is continuously updated, the loss value may be reduced, and when the loss value converges, the first new loss valuee 1 And the current loss valueeThe exposure bar is satisfied when the level is maintained or the first new imaging image reaches a preset imaging quality value, i.e. the imaging resolution reaches a preset resolutionThe mask plate meeting the imaging requirement is obtained.
In step S407, if the current loss value is smaller than the previous loss value, the current pixel value of the specified pixel point of the current mask is maintained unchanged.
In the embodiment of the invention, if the current loss value isPreceding loss value->And receiving the change, maintaining the current value of the pixel of the appointed pixel point of the current mask plate unchanged, returning to the step S402, and updating and evaluating the next pixel point.
Wherein, after completing the content as in step S407, the current reticle will be maintained at this time. If the current mask still cannot meet the exposure condition, further updating the current mask is further needed, and specifically updating the pixel value of one of the pixel points again to determine a second new mask, and specifically referring to the following steps S408-S410.
Step S408, updating the current mask plate to a second new mask plate, obtaining a second new imaging image generated by imaging illumination light through the second new mask plate, and determining a second new loss value based on the second new imaging imagee 1 '。
Step S409, when the second new loss valuee 1 ' and current loss valueeAnd leveling or enabling the illumination light to penetrate through a second new mask plate to carry out imaging to generate a second new imaging image which reaches a preset imaging quality value, and determining that the exposure condition is met.
Step S410, according to the second new loss valuee 1 ' Current loss value corresponding to Current mask plateeAnd updating the second new mask.
In the embodiment of the invention, the mask plate is continuously updated, the illumination light is used for imaging through a second new mask plate to obtain a second new imaging image, and a second new loss value is calculatede 1 '。
Thus, the mask plate is movedAfter the line is continuously updated, the loss value may decrease, and when the loss value converges, the second new loss valuee 1 ' and current loss valueeAnd (3) leveling or when the second new imaging image reaches a preset imaging quality value, namely when the imaging resolution reaches the preset resolution, the exposure condition is met, and the mask plate meeting the imaging requirement is obtained.
And comparing the newly calculated loss value with the current loss value, or judging the imaging quality of the new imaging image to judge whether the exposure condition is met, so that the mask meeting the exposure condition can be used for imaging in time, and meanwhile, the resource waste caused by continuous updating is avoided.
According to the data processing method applied to mask imaging, the mask is updated continuously, the new mask is imaged through illumination light, the loss value is calculated to determine imaging quality, and the mask is updated according to the magnitude relation between the newly calculated loss value and the previous loss value, so that imaging is changed, and imaging quality is improved.
It should be noted that, the illumination light is changed from plane wave to spherical wave, the high frequency component that the imaging surface can accept increases, can improve the imaging resolution, in addition because of the convergence effect of spherical wave, more energy can participate in imaging, has consequently improved the energy utilization ratio in the holographic imaging. The required numerical aperture of the illumination system is smaller compared to conventional projection lithography objective systems and is therefore of practical significance.
Taking a light source with a wavelength of 193 nm and an imaging resolution of 65 nm as an example, the mask imaging procedure is as follows:
1. the spherical wave adopted isWherein->The target test pattern is shown in fig. 5, where the line width and spacing are 65 nm.
2. Setting the imaging distance asSpherical wave focal distance->Mask sizeMask pixel size->And optimizing to obtain a binary phase mask.
3. The mask is used for imaging reconstruction to obtain the desired pattern, as shown in fig. 6.
In conventional dry projection lithography, to present a 65 nm line, the resolution formula is followedIn the followingUnder, the numerical aperture of the objective system +.>It is required to reach 0.89.
In the calculation holographic lithography, in the above step 1, the illumination wave is changed to a plane wave Wherein->And->Are respectively->Shaft and->The chord value of the shaft clamping angle, when the vertical incidence is carried outAfter optimization according to the steps in the technical scheme, the reconstructed image is shown in fig. 7. As can be seen from fig. 7, under the same optimized condition, the normal incident plane wave is difficult to obtain the reconstructed image with the imaging resolution of 65 nm, so the invention can improve the imaging resolution in the calculation holographic lithography, and the numerical aperture of the illumination system is +.>Less than 0.89 in conventional projection lithography and thus has practical applicability.
Furthermore, it has surprisingly been found that due to the use of converging spherical waves, more light can participate in the imaging, and thus the overall energy utilization of the illumination system can be improved at the same time. Specifically, by changing the illumination wave to a plane wave, the high-frequency component that the image plane can receive increases, and thus the imaging resolution can be improved. In addition, due to the convergence of spherical waves, more energy can participate in imaging, so that the energy utilization rate in holographic imaging is greatly improved.
It can be seen that the data processing method of the embodiments of the present disclosure has practical engineering significance due to the smaller numerical aperture of the illumination system required compared to conventional projection lithography objective systems. In addition, by means of the data processing method applied to mask imaging, the optimization accuracy of the mask can be greatly improved by means of the updating iterative process, unnecessary mask optimization updating processes are reduced, and efficient and accurate mask optimization can be achieved. Through mask optimization, the mask plate of final imaging exposure can be ensured to meet exposure conditions, and the high-efficiency mask imaging effect with ultrahigh precision is achieved, so that the yield of the photoetching process is ensured in the subsequent exposure process.
In this embodiment, a data processing device applied to mask imaging is further provided, and the device is used to implement the foregoing embodiments and preferred implementation manners, which are not described in detail. As used below, the term "module" may be a combination of software and/or hardware that implements a predetermined function. While the means described in the following embodiments are preferably implemented in software, implementation in hardware, or a combination of software and hardware, is also possible and contemplated.
The present embodiment provides a data processing apparatus applied to mask imaging, as shown in fig. 8, including a previous determination module 801, a current determination module 802, and a layout update module 803, wherein:
the prior determination module 801 is configured to obtain a prior imaged image generated by imaging illumination through a prior reticle and determine a prior loss value based on the prior imaged image.
The current determining module 802 is configured to update a previous mask to be a current mask, obtain a current imaging image generated by imaging illumination light through the current mask, and determine a current loss value based on the current imaging image.
The layout updating module 803 is configured to update the current mask until the exposure condition is satisfied, according to the previous loss value and the current loss value.
In some alternative embodiments, the prior determination module 801 includes:
the first acquisition unit is used for acquiring target light field distribution data corresponding to the target integrated circuit pattern.
The first determination unit is used for determining a prior loss value based on target light field distribution data and prior aerial image data corresponding to a prior imaging image.
In some alternative embodiments, the prior determination module 801 further comprises:
the second determining unit is used for determining the prior aerial image data which accords with the prior mask plate coordinates and the image plane coordinates thereof according to the mask surface complex amplitude corresponding to the illumination light and the matched diffraction transfer function.
In some alternative embodiments, the prior determination module 801 further comprises:
the third determining unit is used for determining a previous loss value corresponding to the previous aerial image data according to the amplitude and the phase corresponding to the target light field distribution data.
In some alternative embodiments, the current determination module 802 includes:
the first updating unit is used for updating the pixel previous value of the appointed pixel point on the previous mask plate to be the pixel current value, and generating the current mask plate.
The second acquisition unit is used for acquiring current light field distribution data corresponding to the current mask plate and formed by imaging illumination light through a specified pixel point corresponding to the current value of the illumination light through pixel.
The fourth determination module is used for determining a current imaging image according to the current light field distribution data and the prior imaging image.
In some alternative embodiments, the layout update module 803 includes:
and the second updating unit is used for updating the pixel current value of the appointed pixel point of the current mask plate to restore to the pixel prior value if the current loss value is larger than or equal to the prior loss value, and restoring the current mask plate to be the prior mask plate.
In some optional embodiments, the apparatus further comprises a first determination module and a first reticle update module, wherein:
the first determining module is used for updating the recovered prior mask plate to be a first new mask plate, obtaining a first new imaging image generated by imaging illumination light through the first new mask plate, and determining a first new loss value based on the first new imaging image.
The first mask updating module is used for updating the first new mask according to the first new loss value and the previous loss value corresponding to the previous mask.
In some alternative embodiments, the apparatus further comprises a second determination module, wherein:
the second determining module is used for determining that the exposure condition is met when the first new loss value is equal to the current loss value or a first new imaging image generated by imaging illumination light through the first new mask reaches a preset imaging quality value.
In some alternative embodiments, the apparatus further comprises a pixel value maintenance module, wherein:
and the pixel value maintaining module is used for maintaining the current value of the pixel of the appointed pixel point of the current mask plate unchanged if the current loss value is smaller than the prior loss value.
In some optional embodiments, the apparatus further comprises a third determining module and a second reticle updating module, wherein:
the third determining module is used for updating the current mask plate into a second new mask plate, obtaining a second new imaging image generated by imaging illumination light through the second new mask plate, and determining a second new loss value based on the second new imaging image.
The second mask updating module is used for updating the second new mask according to the second new loss value and the current loss value corresponding to the current mask.
In some alternative embodiments, the apparatus further comprises a fourth determination module, wherein:
and the fourth determining module is used for determining that the exposure condition is met when the second new loss value is equal to the current loss value or a second new imaging image generated by imaging illumination light through the second new mask reaches a preset imaging quality value.
Further functional descriptions of the above respective modules and units are the same as those of the above corresponding embodiments, and are not repeated here.
The data processing apparatus applied to mask imaging in this embodiment is presented in the form of functional units, where the units refer to ASIC (Application Specific Integrated Circuit ) circuits, processors and memories executing one or more software or fixed programs, and/or other devices that can provide the above described functions.
The embodiment of the invention also provides exposure equipment, which is provided with the data processing device applied to mask imaging shown in the figure 8. The exposure apparatus may be a lithographic apparatus having a computer processing function, or may be a computer apparatus having a lithographic function that can be used in a chip manufacturing process, which is not limited herein.
Referring to fig. 9, fig. 9 is a schematic structural diagram of an exposure apparatus according to an alternative embodiment of the present invention, as shown in fig. 9, the exposure apparatus includes: one or more processors 10, memory 20, and interfaces for connecting the various components, including high-speed interfaces and low-speed interfaces. The various components are communicatively coupled to each other using different buses and may be mounted on a common motherboard or in other manners as desired. The processor may process instructions executed within the exposure apparatus, including instructions stored in or on memory to display graphical information of the GUI on an external input/output device, such as a display apparatus coupled to the interface. In some alternative embodiments, multiple processors and/or multiple buses may be used, if desired, along with multiple memories and multiple memories. Also, multiple exposure apparatuses may be connected, each providing a portion of the necessary operations (e.g., as a server array, a set of blade servers, or a multiprocessor system). One processor 10 is illustrated in fig. 9.
The processor 10 may be a central processor, a network processor, or a combination thereof. The processor 10 may further include a hardware chip, among others. The hardware chip may be an application specific integrated circuit, a programmable logic device, or a combination thereof. The programmable logic device may be a complex programmable logic device, a field programmable gate array, a general-purpose array logic, or any combination thereof.
Wherein the memory 20 stores instructions executable by the at least one processor 10 to cause the at least one processor 10 to perform a method for implementing the embodiments described above.
The memory 20 may include a storage program area that may store an operating system, at least one application program required for functions, and a storage data area; the storage data area may store data created according to the use of the exposure apparatus, and the like. In addition, the memory 20 may include high-speed random access memory, and may also include non-transitory memory, such as at least one magnetic disk storage device, flash memory device, or other non-transitory solid-state storage device. In some alternative embodiments, memory 20 may optionally include memory located remotely from processor 10, which may be connected to the exposure apparatus via a network. Examples of such networks include, but are not limited to, the internet, intranets, local area networks, mobile communication networks, and combinations thereof.
Memory 20 may include volatile memory, such as random access memory; the memory may also include non-volatile memory, such as flash memory, hard disk, or solid state disk; the memory 20 may also comprise a combination of the above types of memories.
The exposure apparatus further comprises an input device 30 and an output device 40. The processor 10, memory 20, input device 30, and output device 40 may be connected by a bus or other means, for example by a bus connection in fig. 9.
The input device 30 may receive input numeric or character information and generate key signal inputs related to user settings and function control of the exposure apparatus, such as a touch screen or the like. The output means 40 may comprise a display device or the like.
The embodiments of the present invention also provide a computer readable storage medium, and the method according to the embodiments of the present invention described above may be implemented in hardware, firmware, or as a computer code which may be recorded on a storage medium, or as original stored in a remote storage medium or a non-transitory machine readable storage medium downloaded through a network and to be stored in a local storage medium, so that the method described herein may be stored on such software process on a storage medium using a general purpose computer, a special purpose processor, or programmable or special purpose hardware. The storage medium can be a magnetic disk, an optical disk, a read-only memory, a random access memory, a flash memory, a hard disk, a solid state disk or the like; further, the storage medium may also comprise a combination of memories of the kind described above. It will be appreciated that a computer, processor, microprocessor controller or programmable hardware includes a storage element that can store or receive software or computer code that, when accessed and executed by the computer, processor or hardware, implements the methods illustrated by the above embodiments.
Although embodiments of the present invention have been described in connection with the accompanying drawings, various modifications and variations may be made by those skilled in the art without departing from the spirit and scope of the invention, and such modifications and variations fall within the scope of the invention as defined by the appended claims.

Claims (13)

1. A data processing method for mask imaging, the method comprising:
acquiring a prior imaging image generated by imaging illumination light through a prior mask, and determining a prior loss value based on the prior imaging image;
updating a prior mask plate as a current mask plate, acquiring a current imaging image generated by imaging illumination light through the current mask plate, and determining a current loss value based on the current imaging image;
and updating the current mask plate according to the prior loss value and the current loss value until the exposure condition is met.
2. The method of claim 1, wherein the determining a prior loss value based on the prior imaging image comprises:
acquiring target light field distribution data corresponding to a target integrated circuit pattern;
a prior loss value is determined based on the target light field distribution data and prior aerial image data corresponding to the prior imaged image.
3. The method of claim 1, wherein the acquiring a prior imaged image generated by imaging illumination through a prior reticle comprises:
according to the mask surface complex amplitude corresponding to the illumination light and the matched diffraction transfer function, determining the prior aerial image data conforming to the prior mask plate coordinate and the image surface coordinate thereof, wherein the prior aerial image data meets the following conditions:
wherein,for the preceding aerial image data, < >>For the converging spherical wave illumination emitted by the illumination device,for mask surface complex amplitude +.>For diffraction transfer function>For the image plane coordinates +.>For the preceding reticle coordinates +.>Is the diffraction distance.
4. The method of claim 2, wherein the determining a prior loss value based on the target light field distribution data and prior aerial image data corresponding to the prior imaged image comprises:
according to the amplitude and the phase corresponding to the target light field distribution data, determining a prior loss value corresponding to the prior aerial image data, wherein the prior loss value meets the following conditions:
wherein,for the prior loss value, +.>For the preceding aerial image data, < >>For the target light field +.>，/>For the coordinates of the point of interest of the object plane, +.> ，/>For the amplitude of the target light field +. >For the phase of the target light field +.>In imaginary units.
5. The method of claim 1, wherein updating the prior reticle to be the current reticle, acquiring a current imaging image generated by imaging illumination light through the current reticle, comprises:
updating the pixel previous value of the appointed pixel point on the previous mask plate to be the current value of the pixel, and generating a current mask plate;
acquiring current light field distribution data corresponding to the current mask plate and formed by imaging illumination light through a specified pixel point corresponding to a current value of an illumination light through pixel, wherein the current light field distribution data is light field data generated by imaging the illumination light through the specified pixel point;
determining a current imaging image according to the current light field distribution data and a previous imaging image, wherein the current space image data of the current imaging image meets the following conditions:
wherein,for the current aerial image data, +.>For the prior aerial image data corresponding to the prior imaged image,for the current pixel value, +.>Data is distributed for the current light field.
6. The method of claim 1, wherein updating the current reticle based on the prior loss value and the current loss value comprises:
if the current loss value is greater than or equal to the previous loss value, updating the current value of the pixel of the appointed pixel point of the current mask plate, recovering the current mask plate as the previous mask plate, and recovering the current mask plate as the previous mask plate.
7. The method of claim 6, wherein after updating the current reticle based on a prior loss value and a current loss value, the method further comprises:
updating the recovered prior mask plate to be a first new mask plate, acquiring a first new imaging image generated by imaging illumination light through the first new mask plate, and determining a first new loss value based on the first new imaging image;
and updating the first new mask according to the first new loss value and the previous loss value corresponding to the previous mask.
8. The method of claim 7, wherein prior to updating the first new reticle based on the first new loss value and the prior loss value corresponding to the prior reticle, the method further comprises:
when the first new loss value is equal to the current loss value, or the first new imaging image generated by imaging the illumination light through the first new mask reaches a preset imaging quality value, determining that the exposure condition is met.
9. The method according to claim 1, wherein the method further comprises:
and if the current loss value is smaller than the prior loss value, maintaining the current pixel value of the appointed pixel point of the current mask plate unchanged.
10. The method of claim 9, wherein after updating the current reticle based on a prior loss value and a current loss value, the method further comprises:
updating the current mask plate to be a second new mask plate, acquiring a second new imaging image generated by imaging illumination light through the second new mask plate, and determining a second new loss value based on the second new imaging image;
and updating the second new mask according to the second new loss value and the current loss value corresponding to the current mask.
11. The method of claim 10, further comprising, prior to the updating the second new reticle based on the second new penalty value and the current penalty value corresponding to the current reticle:
and when the second new loss value is equal to the current loss value, or a second new imaging image generated by imaging the illumination light through the second new mask plate reaches a preset imaging quality value, determining that the exposure condition is met.
12. A data processing apparatus for mask imaging, the apparatus comprising a prior determination module, a current determination module, and a layout update module, wherein:
The prior determining module is used for acquiring a prior imaging image generated by imaging illumination light through a prior mask plate and determining a prior loss value based on the prior imaging image;
the current determining module is used for updating the prior mask plate into a current mask plate, acquiring a current imaging image generated by imaging illumination light through the current mask plate, and determining a current loss value based on the current imaging image;
the layout updating module is used for updating the current mask plate according to the prior loss value and the current loss value until the exposure condition is met.
13. An exposure apparatus, characterized by comprising:
a memory and a processor in communication with each other, the memory having stored therein computer instructions which, upon execution, perform the data processing method of any one of claims 1 to 11 for mask imaging.
CN202311309899.0A 2023-10-11 2023-10-11 Data processing method and device applied to mask imaging and exposure equipment Active CN117055307B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202311309899.0A CN117055307B (en) 2023-10-11 2023-10-11 Data processing method and device applied to mask imaging and exposure equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202311309899.0A CN117055307B (en) 2023-10-11 2023-10-11 Data processing method and device applied to mask imaging and exposure equipment

Publications (2)

Publication Number Publication Date
CN117055307A true CN117055307A (en) 2023-11-14
CN117055307B CN117055307B (en) 2023-12-15

Family

ID=88663010

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202311309899.0A Active CN117055307B (en) 2023-10-11 2023-10-11 Data processing method and device applied to mask imaging and exposure equipment

Country Status (1)

Country Link
CN (1) CN117055307B (en)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60124822A (en) * 1983-12-09 1985-07-03 Fujitsu Ltd Pattern forming method using reduced projection- exposure device
US20030174298A1 (en) * 2002-03-18 2003-09-18 Canon Kabushiki Kaisha Exposure apparatus, semiconductor device manufacturing method, maintenance method of exposure apparatus, and semiconductor manufacturing factory
US20080259323A1 (en) * 2007-04-18 2008-10-23 Advanced Mask Inspection Technology Inc. Reticle defect inspection apparatus and reticle defect inspection method
CN101451963A (en) * 2006-08-01 2009-06-10 以色列商·应用材料以色列公司 Method and system for defect detection
CN116841135A (en) * 2023-08-31 2023-10-03 光科芯图(北京)科技有限公司 Mask pattern optimization method, mask pattern optimization device, exposure equipment and storage medium

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60124822A (en) * 1983-12-09 1985-07-03 Fujitsu Ltd Pattern forming method using reduced projection- exposure device
US20030174298A1 (en) * 2002-03-18 2003-09-18 Canon Kabushiki Kaisha Exposure apparatus, semiconductor device manufacturing method, maintenance method of exposure apparatus, and semiconductor manufacturing factory
CN101451963A (en) * 2006-08-01 2009-06-10 以色列商·应用材料以色列公司 Method and system for defect detection
US20080259323A1 (en) * 2007-04-18 2008-10-23 Advanced Mask Inspection Technology Inc. Reticle defect inspection apparatus and reticle defect inspection method
CN116841135A (en) * 2023-08-31 2023-10-03 光科芯图(北京)科技有限公司 Mask pattern optimization method, mask pattern optimization device, exposure equipment and storage medium

Also Published As

Publication number Publication date
CN117055307B (en) 2023-12-15

Similar Documents

Publication Publication Date Title
US10909294B2 (en) Modeling of a design in reticle enhancement technology
CN111581907B (en) Hessian-Free photoetching mask optimization method and device and electronic equipment
US8683396B2 (en) Determining source patterns for use in photolithography
US8285030B2 (en) Determining calibration parameters for a lithographic process
TWI757950B (en) Method for determining curvilinear patterns for patterning device
US10520829B2 (en) Optical proximity correction methodology using underlying layer information
US8473878B2 (en) Lithographically enhanced edge determination
CN102096331B (en) Polarization designs for lithographic apparatus
CN108228981B (en) OPC model generation method based on neural network and experimental pattern prediction method
JP2008153447A (en) Simulation method and system, and modifying method of mask pattern
CN116841135B (en) Mask pattern optimization method, mask pattern optimization device, exposure equipment and storage medium
CN117055307B (en) Data processing method and device applied to mask imaging and exposure equipment
CN114647143A (en) Multi-component kernel for vector optical image simulation
CN110244523A (en) Integrated optical carving method and lithography system
JP2004279997A (en) Method of calculating displacement amount of edge position, verification method, verification program, and verification system
CN116224707B (en) Optical proximity correction method and device, storage medium and terminal
CN111507059B (en) Graphic and image joint optimization photoetching mask optimization method and device and electronic equipment
CN110361926B (en) Optical proximity effect correction model, establishment method thereof and mask forming method
CN113962185B (en) Method and system for optimizing surface plasma near-field photoetching mask topology
CN110806679B (en) Full-field low-aberration sensitivity integrated photoetching method and photoetching system
CN116819911A (en) Mask pattern optimization method, mask pattern optimization device, exposure equipment and storage medium
CN110320764A (en) Litho machine matching process
TWI840340B (en) Method and system for reticle enhancement technology
CN115185165B (en) Construction method of assistant model, optical correction method and device and terminal
KR102666268B1 (en) Wafer exposure method using wafer model and wafer manufacturing assembly

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant