CN117031695A

CN117031695A - Photoetching lens device

Info

Publication number: CN117031695A
Application number: CN202311053281.2A
Authority: CN
Inventors: 陈志特; 吴中海; 王重桂; 王�华
Original assignee: Dongguan Ruishi Optoelectronics Technology Co Ltd
Current assignee: Dongguan Ruishi Optoelectronics Technology Co Ltd
Priority date: 2023-08-21
Filing date: 2023-08-21
Publication date: 2023-11-10
Anticipated expiration: 2043-08-21
Also published as: CN117031695B

Abstract

The application relates to the technical field of photoetching lenses, in particular to a photoetching lens device, which comprises: the first lens assembly and the light guide device. The first lens assembly comprises a lens holder and at least one optical lens, and the optical lens is mounted on the lens holder. The light guide device comprises a shell and at least one reflecting component, wherein the reflecting component is arranged on the shell. The emergent light angle of the light beam is changed through the first lens component in the propagation process of the light beam, so that the emergent light angle of the light beam meets the expected requirement. The light beam enters the shell from the light inlet and is reflected by the reflecting component, so that the path of the light beam is in a zigzag shape, and the size and the length of the equipment are reduced under the condition that the propagation distance of the light beam is not reduced. Since the propagation distance of the light beam is not reduced, the light beam has a sufficient propagation distance to expand the area of the irradiation region from the lithography lens apparatus to a desired range. In this way, the size of the lithography lens apparatus is reduced, and the collimation of the outgoing light of the lithography lens apparatus and the irradiation area are made to be within the desired range.

Description

Photoetching lens device

Technical Field

The present application relates to the field of photolithography lenses, and in particular, to a photolithography lens apparatus.

Background

When the photoetching is carried out, a photoetching lens provides a light source to realize photoetching. The light source of the lithography lens generally irradiates the light beam from the laser source into the lithography lens through the optical fiber bundle, and finally irradiates the light beam outwards from the light outlet of the lithography lens, so as to form an irradiation area with a certain irradiation range. The area of the irradiation area of the light beam irradiated from the photoetching lens is controlled within an expected range, and the light collimation degree in the light beam meets the expected requirement so as to enable the photoetching effect to meet the expected requirement.

Since the light exit area of the optical fiber bundle is relatively small, if the irradiation area of the light beam is required to reach the expected range within a relatively small propagation distance, the light exit angle of the light beam exiting the optical fiber bundle needs to be relatively large, which results in difficulty in meeting the expected requirement of the collimation of the light beam. If the exit angle of the optical fiber bundle exit beam is reduced, it is necessary to make the propagation distance of the beam large enough so that a light source with a small exit area exits at a small angle with a sufficient irradiation distance to expand the irradiation range area of the beam to the desired range.

In order to make the collimation of the light beam meet the expected requirement, the emergent light angle of the emergent light of the photoetching lens needs to be regulated. If the light beam propagates in the lithography lens with a smaller emergent light angle, the length of the lithography lens needs to be increased to enable the light beam to have a sufficient propagation distance so as to enlarge the area of the irradiation area of the lithography lens to an expected range, which results in the large size of the lithography lens, not only increases the occupied space of the lithography lens, but also increases the installation difficulty of the lithography lens and reduces the reliability and the stability of the lithography lens. In the photoetching process, the overlong photoetching lens can cause the photoetching lens to generate larger shaking when moving, so that the irradiation area shakes, thereby reducing the photoetching efficiency and the photoetching quality.

It is seen that how to reduce the size of the lithography lens and make the collimation of the outgoing light and the area of the irradiation area of the lithography lens within the expected range is a technical problem to be solved.

Disclosure of Invention

The application provides a photoetching lens device, which aims to solve the technical problems of reducing the size of the photoetching lens device and enabling the collimation of emergent light and the irradiation area of the photoetching lens device to be in an expected range in the prior art.

The application provides a photoetching lens device, which comprises:

a first lens assembly for changing the angle of light beam exit, the first lens assembly comprising a lens holder and at least one optical lens, the optical lenses being mounted to the lens holder; and

the light guide device is used for changing the propagation direction of the light beam and comprises a shell and at least one reflecting component, wherein the reflecting components are arranged on the shell;

the lens seat is arranged at the light inlet;

when the light beam enters the photoetching lens device, the light beam sequentially passes through the first lens component and the light guide device;

when the light beam enters the lens seat, the light beam sequentially passes through the optical lens, and the optical lens changes the emergent light angle of the light beam;

When the light beam enters the shell from the light inlet, the light beam propagates between the reflecting components, so that the propagation path of the light beam is in a zigzag shape and is emitted from the light outlet.

Further, the number of the optical lenses is four, and the optical lenses comprise a first lens, a second lens, a third lens and a fourth lens;

the first lens, the second lens, the third lens and the fourth lens are coaxially arranged in sequence along the propagation direction of the incident light beam;

the first lens is a biconvex lens, the second lens is a concave-convex lens, the third lens is a convex-concave lens, and the fourth lens is a plano-convex lens.

Still further, the light outlet is provided with a second lens assembly, the second lens assembly comprises a fifth lens, and the fifth lens is a biconvex lens.

Further, the central axis of the first lens component is perpendicular to the central axis of the second lens component.

Further, the number of the reflecting assemblies is three, and the reflecting assemblies comprise a first reflecting piece, a second reflecting piece and a third reflecting piece;

the first reflecting piece comprises a first reflecting surface, the second reflecting piece comprises a second reflecting surface, and the third reflecting piece comprises a third reflecting surface;

The first reflecting surface faces the light inlet, the second reflecting surface faces the first reflecting surface, and the third reflecting surface faces the second reflecting surface and the light outlet;

in the light beam propagation process, the light beam sequentially passes through the first reflecting surface, the second reflecting surface and the third reflecting surface, so that the light beam propagation path is in a zigzag shape.

Further, an included angle α1 between the propagation direction of the light beam entering from the light inlet and the first reflecting surface is configured to be 0 ° < α1 < 90 °;

the included angle alpha 2 between the propagation direction of the light beam reflected by the first reflecting surface and the second reflecting surface is configured to be 75 degrees less than alpha 2 less than 85 degrees;

the included angle alpha 3 between the propagation direction of the light beam reflected by the second reflecting surface and the third reflecting surface is configured to be 0 degrees less than alpha 3 less than 90 degrees.

Further, an included angle α1 between the propagation direction of the light beam entering from the light inlet and the first reflecting surface is configured to be 75 ° < α1 < 85 °;

the included angle alpha 2 between the propagation direction of the light beam reflected by the first reflecting surface and the second reflecting surface is configured to be 78 degrees and less than alpha 2 and less than 82 degrees;

The included angle alpha 3 between the propagation direction of the light beam reflected by the second reflecting surface and the third reflecting surface is configured to be 30 degrees less than alpha 3 less than 50 degrees.

Furthermore, the lens seat is provided with a plurality of first screw holes and a plurality of through holes, the first screw holes and the through holes are uniformly distributed along the circumference of the propagation direction of the incident light beam, the first screw holes are uniformly inserted between the through holes, and the first screw holes are adapted with first screws;

the shell is provided with a plurality of second screw holes, the positions and the number of the second screw holes correspond to those of the through holes, the second screw holes are matched with the through holes, and the second screw holes are matched with second screws;

the second screw rod penetrates through the through hole and then is screwed into the second screw hole and abuts against the lens seat through a screw head of the second screw rod;

after the first screw rod is screwed into the first screw hole, the first screw rod is abutted with the shell.

Still further, the lens holder is installed and is crossed a light section of thick bamboo, light inlet fixed mounting has a guiding tube, the inner wall of guiding tube with cross the outer wall looks adaptation of light section of thick bamboo, the guiding tube cross the light section of thick bamboo with optical lens concentric axis.

Further, the lens holder is connected with the shell in series by at least one positioning pin.

The beneficial effects achieved by the application are as follows:

the application provides a photoetching lens device, which comprises: the first lens assembly and the light guide device. The first lens component is used for changing the emergent light angle of the light beam and comprises a lens seat and at least one optical lens, and the optical lenses are arranged on the lens seat. The light guide device is used for changing the light beam propagation direction and comprises a shell and at least one reflecting component, and the reflecting components are all arranged on the shell. The shell is provided with a light inlet and a light outlet, and the lens seat is arranged at the light inlet. After the light beam enters the photoetching lens device, the light beam sequentially passes through the first lens component and the light guide device. When the light beam enters the lens seat, the light beam sequentially passes through the optical lens, and the emergent light angle of the light beam is changed by the optical lens. When the light beam enters the shell from the light inlet, the light beam propagates between the reflecting components, so that the propagation path of the light beam is in a zigzag shape and is emitted from the light outlet. The emergent light angle of the light beam is changed through the first lens component in the propagation process of the light beam, so that the emergent light angle of the light beam meets the expected requirement. The light beam enters the shell from the light inlet and is reflected by the reflecting component, so that the path of the light beam is in a zigzag shape, and the size and the length of the equipment are reduced under the condition that the propagation distance of the light beam is not reduced. Since the propagation distance of the light beam is not reduced, the light beam has a sufficient propagation distance to expand the area of the irradiation region from the lithography lens apparatus to a desired range. In this way, the size of the lithography lens apparatus is reduced, and the collimation of the outgoing light of the lithography lens apparatus and the irradiation area are made to be within the desired range.

Drawings

FIG. 1 is a cross-sectional view of a lithographic lens apparatus in an embodiment of the invention;

FIG. 2 is an exploded view of a lithographic lens apparatus according to an embodiment of the invention;

FIG. 3 is an enlarged view of FIG. 1 at A in an embodiment of the invention;

FIG. 4 is a schematic diagram of a propagation path of a light beam sequentially passing through a light homogenizing rod, an optical lens, and a reflecting component according to an embodiment of the present invention;

FIG. 5 is an enlarged view of B in FIG. 4 in an embodiment of the invention;

FIG. 6 is a cross-sectional view of a light homogenizing assembly in an embodiment of the invention;

FIG. 7 is a schematic perspective view of an adjusting device according to an embodiment of the present invention;

FIG. 8 is an exploded view of an adjustment device in an embodiment of the invention;

FIG. 9 is an exploded view of the first lens assembly of the present invention when mounted to a light outlet;

FIG. 10 is a schematic diagram showing a perspective structure of a lithographic lens apparatus according to an embodiment of the invention;

FIG. 11 is a schematic diagram of the optical path of an optical lens in an embodiment of the invention;

FIG. 12 is an enlarged view of FIG. 11C in an embodiment of the invention;

fig. 13 is an exposure surface illuminance distribution chart of the first embodiment in the example of the present invention;

fig. 14 is a graph showing illuminance uniformity detection results of the first embodiment in the example of the present invention;

fig. 15 is an exposure surface illuminance distribution chart of a second embodiment in the example of the present invention;

Fig. 16 is a graph showing illuminance uniformity detection results in the second embodiment of the present invention.

Description of main reference numerals:

10. a lithography lens device; 20. a light guide device; 21. a housing; 22. a light inlet; 23. a light outlet; 26. a second screw hole; 27. a second screw; 28. a guide cylinder; 30. a reflective assembly; 40. a first reflecting member; 45. a first reflecting surface; 50. a second reflecting member; 53. a second reflecting surface; 60. a third reflecting member; 62. a third reflective surface; 70. a light homogenizing component; 71. a lens barrel; 72. a fixing seat; 73. a first bayonet; 74. a second bayonet; 75. a light homogenizing rod; 80. a first lens assembly; 81. a lens holder; 82. a first screw hole; 83. a first screw; 84. a via hole; 85. a light passing cylinder; 86. an optical lens; 861. a first lens; 862. a second lens; 863. a third lens; 864. a fourth lens; 87. a positioning pin; 90. an exit assembly; 91. a second lens assembly; 911. a fifth lens; 92. a light filtering component; 100. a light beam; 101. an adjusting device; 102. a mounting member; 103. a connecting piece; 104. an adapter; 111. a first threaded hole; 112. a first adjustment screw; 113. a second threaded hole; 114. a second adjusting screw; 121. a first abutment surface; 122. a second abutment surface; 131. a third threaded hole; 132. a third adjusting screw; 133. a fourth threaded hole; 134. a fourth adjusting screw; 141. a third abutment surface; 142. a fourth abutment surface; x, a first direction; y, second direction; s1, a first surface; s2, a second surface; s3, a third surface; s4, a fourth surface; s5, a fifth surface; s6, a sixth surface; s7, a seventh surface; s8, a eighth aspect; s9, a ninth surface; s10, a tenth surface.

Detailed Description

The present invention will be described in further detail with reference to the drawings and examples, in order to make the objects, technical solutions and advantages of the present invention more apparent. Examples of the embodiments are illustrated in the accompanying drawings, wherein like or similar reference numerals refer to like or similar elements throughout or elements having like or similar functionality. The embodiments described below by referring to the drawings are illustrative only and are not to be construed as limiting the invention. Furthermore, it should be understood that the specific embodiments described herein are for purposes of illustration only and are not intended to limit the scope of the present invention.

In the description of the present invention, it should be understood that the terms "length," "width," "upper," "lower," "left," "right," "horizontal," "top," "bottom," and the like indicate orientations or positional relationships based on the orientation or positional relationships shown in the drawings, are merely for convenience in describing the present invention and simplifying the description, and do not indicate or imply that the devices or elements referred to must have a specific orientation, be configured and operated in a specific orientation, and thus should not be construed as limiting the present invention.

Furthermore, the terms "first," "second," and the like, are used for descriptive purposes only and are not to be construed as indicating or implying a relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defining "a first" or "a second" may explicitly or implicitly include one or more of the described features. In the description of the present invention, the meaning of "a plurality" is two or more, unless explicitly defined otherwise.

In the description of the present invention, it should be noted that, unless explicitly specified and limited otherwise, the terms "mounted," "connected," and "connected" are to be construed broadly, and may be either fixedly connected, detachably connected, or integrally connected, for example; can be mechanically connected, electrically connected or can be communicated with each other; can be directly connected or indirectly connected through an intermediate medium, and can be communicated with the inside of two elements or the interaction relationship of the two elements. The specific meaning of the above terms in the present invention can be understood by those of ordinary skill in the art according to the specific circumstances.

In the present invention, unless expressly stated or limited otherwise, a first feature "above" or "below" a second feature may include both the first and second features being in direct contact, as well as the first and second features not being in direct contact but being in contact with each other through additional features therebetween. Moreover, a first feature being "above," "over" and "on" a second feature includes the first feature being directly above and obliquely above the second feature, or simply indicating that the first feature is higher in level than the second feature. The first feature being "under", "below" and "beneath" the second feature includes the first feature being directly under and obliquely below the second feature, or simply means that the first feature is less level than the second feature.

The following disclosure provides many different embodiments, or examples, for implementing different structures of the application. In order to simplify the present disclosure, components and arrangements of specific examples are described below. They are, of course, merely examples and are not intended to limit the application. Furthermore, the present application may repeat reference numerals and/or letters in the various examples, which are for the purpose of brevity and clarity, and which do not themselves indicate the relationship between the various embodiments and/or arrangements discussed. In addition, the present application provides examples of various specific processes and materials, but one of ordinary skill in the art will recognize the application of other processes and/or the use of other materials.

Example 1

Referring to fig. 1 to 5, in some embodiments of the present application, a lithographic lens apparatus 10 is provided, comprising: a first lens assembly 80 and a light guide 20. The first lens assembly 80 is used for changing the emergent angle of the light beam, the first lens assembly 80 comprises a lens seat 81 and at least one optical lens 86, and the optical lenses 86 are all installed on the lens seat 81. The light guiding device 20 is used for changing the propagation direction of the light beam, the light guiding device 20 comprises a housing 21 and at least one reflecting component 30, and the reflecting components 30 are mounted on the housing 21. Wherein, the shell 21 is provided with a light inlet 22 and a light outlet 23, and the lens seat 81 is arranged at the light inlet 22; after the light beam enters the lithography lens apparatus 10, the light beam sequentially passes through the first lens assembly 80 and the light guiding apparatus 20; when the light beam enters the lens holder 81, the light beam sequentially passes through the optical lens 86, and the optical lens 86 changes the emergent light angle of the light beam; when the light beam enters the housing 21 from the light inlet 22, the light beam propagates between the reflecting members 30 such that the propagation path of the light beam is shaped like a zigzag, and is emitted from the light outlet 23.

The exit angle of the light beam is changed by the first lens assembly 80 during the propagation of the light beam so that the exit angle of the light beam meets the desired requirements.

After the light beam passes through the first lens assembly 80, the outgoing light angle of the light beam is changed by the first lens assembly 80, so that the outgoing light angle of the light beam is changed to a desired range. If the exit angle of the light beam before entering the first lens assembly 80 is too large, the first lens assembly 80 reduces the exit angle of the light beam; if the exit angle of the light beam before entering the first lens assembly 80 is too small, the first lens assembly 80 increases the exit angle of the light beam. If the first lens assembly 80 is difficult to change the outgoing angle of the light beam to the desired range, the outgoing angle of the light beam can be changed by changing the lenses in the first lens assembly 80 and by combining lenses of different types so as to change the outgoing angle of the light beam to the desired range.

The outgoing light angle of the light beam is limited in an expected range through the first lens assembly 80, so that the outgoing light angle of the light beam is not excessively large to reduce the collimation of the light beam; and the emergent light angle of the light beam is not too small, so that the irradiation area of the light beam is difficult to expand to the expected range.

The light beam enters the housing 21 from the light inlet 22 and is reflected by the reflecting component 30 to form a zigzag path, so that the size and the length of the device are reduced without reducing the propagation distance of the light beam. Since the propagation distance of the light beam is not reduced, the light beam has a sufficient propagation distance to expand the area of the irradiation region from the lithography lens apparatus 10 to a desired range.

In this way, the size of the lithography lens apparatus 10 is reduced, and the collimation of the outgoing light of the lithography lens apparatus 10 and the irradiation area are made to be within the desired range.

Referring to fig. 1 to 2, in some embodiments of the present application, the light outlet 23 is provided with an exit assembly 90, and the exit assembly 90 includes a second lens assembly 91 and a filter assembly 92, and the second lens assembly 91 is installed between the housing 21 and the filter assembly 92. After the light beam is reflected by the reflecting member in the light guide 20, the propagation path of the light beam takes a zigzag shape, thereby reducing the size length of the apparatus without reducing the propagation distance of the light beam. Since the propagation distance of the light beam is not reduced, the light beam has a sufficient propagation distance to expand the area of the irradiation region from the lithography lens apparatus 10 to a desired range. In this way, the size of the lithographic lens apparatus 10 is reduced without affecting the illuminated area of the lithographic lens apparatus 10.

After the light beam is reflected by the reflecting member in the light guide 20, the propagation path of the light beam takes a zigzag shape, thereby reducing the size length of the apparatus without reducing the propagation distance of the light beam. Since the propagation distance of the light beam is not reduced, the light beam has a sufficient propagation distance to expand the area of the irradiation region from the lithography lens apparatus 10 to a desired range. The exit assembly 90 is mounted on the light outlet 23 of the light guide 20, and the light beam passes through the light guide 20, enters the exit assembly 90 from the light outlet 23, and passes through the second lens assembly 91 and the filter assembly 92 in sequence. The second lens assembly 91 further changes the outgoing light angle of the light beam, and the outgoing light angle of the light beam can be finely adjusted by the second lens assembly 91, so that the irradiation area and the outgoing light angle of the light beam emitted from the lithography lens apparatus 10 meet the expected requirements. The filter assembly 92 can pass specific light and further emit the specific light from the lithography lens apparatus 10, so that the lithography effect meets the requirements.

Example two

Referring to fig. 1-5, in some embodiments of the present application, the number of optical lenses 86 is four, including a first lens 861, a second lens 862, a third lens 863, and a fourth lens 864. The first lens 861, the second lens 862, the third lens 863, and the fourth lens 864 are coaxially disposed in order along the propagation direction of the incident light beam. The first lens 861 is a biconvex lens, the second lens 862 is a meniscus lens, the third lens 863 is a meniscus lens, and the fourth lens 864 is a plano-convex lens.

After entering the first lens assembly 80, the light beam sequentially passes through the first lens 861, the second lens 862, the third lens 863 and the fourth lens 864, and finally exits from the fourth lens 864 after being refracted multiple times.

The first lens element 861 with positive refractive power is a biconvex lens element, i.e., an object-side surface of the first lens element 861 is convex; the image-side surface of the first lens element 861 is convex, with positive refractive power. Second lens element 862 with negative refractive power is a concave-convex lens element, i.e., an object-side surface of second lens element 862 is a concave surface; the image-side surface of the second lens element 862 is convex, and has positive refractive power. The third lens element 863 with positive refractive power is a convex-concave lens element, i.e., an object-side surface of the third lens element 863 is convex; the image-side surface of the third lens element 863 is concave, and has negative refractive power. The fourth lens 864 is a plano-convex lens, i.e., an object-side surface of the fourth lens 864 is a plane; the fourth lens element 864 has a convex image-side surface with positive refractive power. After entering the first lens assembly 80, the light beam sequentially passes through the first lens 861, the second lens 862, the third lens 863 and the fourth lens 864, and finally exits from the fourth lens 864 after being refracted multiple times. After the light beam is emitted from the fourth lens 864, the light beam has an outgoing angle of 4 ° to 5 °, and then enters the light guide device 20, and after the light beam enters the housing 21 from the light inlet 22, the light beam propagates between the reflection assemblies 30 according to the reflection principle of the light, so that the propagation path of the light beam is in a zigzag shape, and finally is emitted from the light outlet 23. The path of the beam is in the shape of a meander, thereby reducing the device size length without reducing the propagation distance of the beam. Since the propagation distance of the light beam is not reduced, the light beam has a sufficient propagation distance to expand the area of the irradiation region from the lithography lens apparatus 10 to a desired range.

Referring to fig. 1 to 2, in some embodiments of the present application, the light outlet 23 is mounted with a second lens assembly 91, the second lens assembly 91 includes a fifth lens 911, and the fifth lens 911 is a biconvex lens.

After the light beam passes through the first lens assembly 80, although the outgoing light angle of the light beam can be limited within the expected range by the first lens assembly 80, in order to prevent the outgoing light angle of the light beam from being too small, the irradiation area of the light beam is difficult to expand to the expected range, so that the outgoing light angle of the light beam after being emitted from the light outlet 23 needs to be further adjusted, so that the collimation of the light beam meets the expected requirement. The angle of the light beam emitted from the lithography lens apparatus 10 is further adjusted by the fifth lens 911 of the light outlet 23 so that the angle of the light beam emitted from the lithography lens apparatus meets the expected requirement. After the light beam passes through the first lens 861, the second lens 862, the third lens 863, the fourth lens 864 and the fifth lens 911, the emergent light angle is smaller than 0.15 degrees, and the light beam has higher parallelism, so that the photoetching effect is ensured to be within an expected range.

Referring to fig. 1 and 4, in some embodiments of the present application, the central axis of the first lens assembly 80 is perpendicular to the central axis of the second lens assembly 91.

When the light beam enters the housing 21 from the light inlet 22, the light beam propagates between the reflecting components according to the reflection principle of the light, so that the propagation path of the light beam is in a zigzag shape, and finally, the light beam is emitted from the light outlet 23. After being reflected by the reflecting component, the light beam transversely enters the light guide device 20 and is emitted from the vertical direction. Thus, the height of the photoetching lens device 10 is reduced, the gravity center height of the photoetching lens device 10 is reduced, the photoetching lens device 10 moves more stably, the shaking of the photoetching lens device 10 is reduced, the photoetching effect is improved, and the photoetching efficiency is improved. The central axis of the first lens assembly 80 is perpendicular to the central axis of the second lens assembly 91, so that the emergent light angle of the light beam is adjusted by the first lens assembly 80, and after being reflected by the reflecting assembly, the emergent light angle of the light beam can be further adjusted by the second lens assembly 91, and further the emergent light angle of the light beam meets the expected requirement.

Example III

Referring to fig. 1 to 5, in some embodiments of the present application, a light guiding device 20 is provided, which includes a housing 21 and a reflective component. The housing 21 is provided with a light inlet 22 and a light outlet 23. The number of the reflection assemblies is at least one, and the reflection assemblies are mounted to the housing 21. The reflecting component reflects the light beam so that the propagation path of the light beam is in a zigzag shape and is emitted from the light outlet 23. In the propagation process of the light beam, after the light beam enters the housing 21 from the light inlet 22, the light beam propagates between the reflecting components according to the reflection principle of the light, so that the propagation path of the light beam is in a zigzag shape, and finally is emitted from the light outlet 23, thereby reducing the size and the length of the device without reducing the propagation distance of the light beam. Since the propagation distance of the light beam is not reduced, the light beam has a sufficient propagation distance to expand the area of the irradiation region from the lithography lens apparatus 10 to a desired range.

In this way, the size of the lithographic lens apparatus 10 is reduced without affecting the illuminated area of the lithographic lens apparatus 10.

In some embodiments of the present application, the light beam propagates at a certain exit light angle, and the irradiation range of the light beam increases gradually as the propagation distance of the light beam increases. The emergent light angle of the light beam needs to be emitted at a smaller emergent light angle, so that the collimation of the light rays in the light beam is ensured. If the light beam propagates at a small exit angle, the area of the irradiation range of the light beam is significantly too small per unit distance, and a large propagation distance is required to meet the expected requirement. If the propagation path of the light beam is a straight line, the length of the lithography lens device 10 is too long, which results in that the size of the lithography lens device 10 is too large, not only increases the occupied space of the lithography lens device 10, but also increases the installation difficulty of the lithography lens device 10, and reduces the reliability and stability of the lithography lens device 10. In the photolithography process, the excessively long photolithography lens apparatus 10 may cause the photolithography lens apparatus 10 to generate a larger shake when moving, and further cause the irradiation area to shake, thereby reducing the photolithography efficiency and the photolithography quality.

In some embodiments of the present application, the light beam enters the light guiding device 20 at a certain outgoing light angle, and the reflection assembly reflects the light beam, so as to change the propagation path of the light beam, so that the propagation path of the light beam has a zigzag shape. If the number of the reflecting components is two or more, the light beam propagates in the reflecting component according to the reflection principle of the light. Since the reflection of the light rays in the light beam at the reflecting component is specular, the reflecting component has less influence on the outgoing light angle of the light beam. Although the reflective element does not significantly affect the angle of the outgoing beam, the reflective element alters the path of the beam so that the path of the beam is in the shape of a fold, thereby reducing the required length of the beam propagation space and thus the length dimension of the lithographic lens apparatus 10. The photoetching lens device 10 is in a short and wide shape instead of a slender shape, so that the occupied space of the photoetching lens device 10 is more concentrated, the occupied space of the photoetching lens device 10 is reduced, and the space layout of the photoetching equipment is facilitated. And since the length of the photolithography lens apparatus 10 is reduced, shaking of the photolithography lens apparatus 10 during movement is reduced, and influence on an irradiation area of the photolithography lens apparatus 10 due to shaking is reduced, thereby improving a photolithography effect and improving photolithography efficiency.

Referring to fig. 1 to 4 and referring to fig. 1 to 2, in some embodiments of the present application, the number of reflective elements is three, including a first reflective element 40, a second reflective element 50, and a third reflective element 60. The first reflecting member 40 includes a first reflecting surface 45, the second reflecting member 50 includes a second reflecting surface 53, and the third reflecting member 60 includes a third reflecting surface 62. The first reflecting surface 45 faces the light inlet 22, the second reflecting surface 53 faces the first reflecting surface 45, and the third reflecting surface 62 faces the second reflecting surface 53 and the light outlet 23. Wherein the light beam passes through the first reflecting surface 45, the second reflecting surface 53 and the third reflecting surface 62 in this order.

During the propagation of the light beam, the light beam reaches the second reflecting surface 53 after being reflected by the first reflecting surface 45 according to the reflection principle of the light, reaches the third reflecting surface 62 after being reflected by the second reflecting surface 53, and is emitted from the light outlet 23 after being reflected by the third reflecting surface 62.

After entering the light guide device 20, the light beam reaches the first reflecting surface 45 of the first reflecting member 40, then reaches the second reflecting surface 53 of the second reflecting member 50 after being reflected by the first reflecting surface 45, then reaches the third reflecting surface 62 of the third reflecting member 60 after being reflected by the second reflecting surface 53, and finally is emitted from the light outlet 23 after being reflected by the third reflecting surface 62. Thus, the propagation path of the light beam is changed three times to present a tri-fold line shape, thereby effectively reducing the length space required by light beam propagation. The reflection of the light beam at the first, second and third reflection surfaces 45, 53 and 62 is specular, so that the outgoing angle of the light beam and the length of the propagation path are not significantly affected, and thus the size and length of the lithography lens apparatus 10 are reduced without reducing the propagation distance of the light beam. Since the propagation distance of the light beam is not reduced, the light beam has a sufficient propagation distance to expand the area of the irradiation region from the lithography lens apparatus 10 to a desired range.

Referring to fig. 1, in some embodiments of the present application, an angle α1 between a propagation direction of a light beam entering from the light inlet 22 and the first reflecting surface 45 is configured to be 0 ° < α1 < 90 °. The angle α2 between the propagation direction of the light beam reflected by the first reflecting surface 45 to the second reflecting surface 53 and the second reflecting surface 53 is configured to be 75 ° < α2 < 85 °. The angle α3 between the propagation direction of the light beam reflected by the second reflecting surface 53 toward the third reflecting surface 62 and the third reflecting surface 62 is configured to be 0 ° < α3 < 90 °.

If the angle α1 between the propagation direction of the light beam entering from the light inlet 22 and the first reflecting surface 45 is equal to 90 °, the light beam entering from the light inlet 22 reaches the first reflecting surface 45 along the normal direction of the first reflecting surface 45, and then the light beam is reflected by the first reflecting surface 45 and returns to the light inlet 22 in the original path, and the light beam cannot reach the second reflecting surface 53.

If the angle α1 between the propagation direction of the light beam entering from the light inlet 22 and the first reflecting surface 45 is greater than 90 °, the first reflecting surface 45 is inclined in a direction away from the second reflecting surface 53, and the light beam cannot reach the second reflecting surface 53 after being reflected by the first reflecting surface 45.

If the angle α1 between the propagation direction of the light beam entering from the light inlet 22 and the first reflecting surface 45 is equal to 0 °, the first reflecting surface 45 is parallel to the propagation direction of the light beam entering from the light inlet 22, so that the light beam cannot reach the first reflecting surface 45.

If the included angle α1 between the propagation direction of the light beam entering from the light inlet 22 and the first reflecting surface 45 is smaller than 0 °, the first reflecting surface 45 faces away from the light inlet 22, so that the light beam cannot reach the first reflecting surface 45.

The angle α1 between the propagation direction of the light beam entering from the light inlet 22 and the first reflecting surface 45 is set to 0 ° < α1 < 90 °, so that the light beam entering from the light inlet 22 can reach the first reflecting surface 45, be reflected by the first reflecting surface 45, and reach the second reflecting surface 53.

Too small an angle α2 between the propagation direction of the light beam reflected by the first reflecting surface 45 and the second reflecting surface 53 may cause too small a reflection angle of the light beam at the second reflecting surface 53, so that the overlapping area of the incident light beam and the outgoing light beam at the second reflecting surface 53 after the light beam is reflected by the second reflecting surface 53 is too large, and the height of the third reflecting element 60 and the height of the second reflecting element 50 are too close to each other, so that the structure of the lithographic lens apparatus 10 is too crowded, and the assembly difficulty of the lithographic lens apparatus 10 is increased. Too large an angle α2 between the propagation direction of the light beam reflected by the first reflecting surface 45 and the second reflecting surface 53, which is directed to the second reflecting surface 53, may result in too large a reflection angle of the light beam at the second reflecting surface 53, and further increase the width space required for light beam propagation, which may result in too large a size of the lithographic lens apparatus 10. The included angle α2 between the propagation direction of the light beam reflected by the first reflecting surface 45 and the second reflecting surface 53 is configured to be 75 ° < α2 < 85 °, so that the size of the lithography lens device 10 is moderate, which is convenient for assembling the lithography lens device 10 and does not cause the size of the lithography lens device 10 to be oversized.

If the included angle α3 between the propagation direction of the light beam reflected by the second reflecting surface 53 and the third reflecting surface 62 is less than or equal to 0 °, the third reflecting surface 62 faces away from the second reflecting surface 53, and the light beam cannot reach the third reflecting surface 62. If the included angle α3 between the propagation direction of the light beam reflected by the second reflecting surface 53 and the third reflecting surface 62 is greater than or equal to 90 °, the third reflecting surface 62 is inclined in a direction away from the light outlet 23, and the light beam is reflected by the third reflecting surface 62 and cannot reach the light outlet 23. The angle α3 between the propagation direction of the light beam reflected by the second reflecting surface 53 to the third reflecting surface 62 and the third reflecting surface 62 is set to be 0 ° < α3 < 90 °, so that the light beam is reflected by the third reflecting surface 62 and smoothly emitted from the light outlet 23.

In some embodiments of the present application, the angle α1 between the propagation direction of the light beam entering from the light inlet 22 and the first reflecting surface 45 is configured to be 75 ° < α1 < 85 °;

the included angle alpha 2 between the propagation direction of the light beam reflected by the first reflecting surface 45 and the second reflecting surface 53 is 78 degrees < alpha 2 < 82 degrees;

the angle α3 between the propagation direction of the light beam reflected by the second reflecting surface 53 toward the third reflecting surface 62 and the third reflecting surface 62 is configured to be 30 ° < α3 < 50 °.

If the included angle α1 between the propagation direction of the light beam entering from the light inlet 22 and the first reflecting surface 45 is too small, the reflection angle of the light beam at the first reflecting surface 45 is too small, so that the overlapping area of the incident light beam and the outgoing light beam at the first reflecting surface 45 after the light beam is reflected by the first reflecting surface 45 is too large, and the height of the second reflecting member 50 is too close to the height of the light inlet 22, so that the structure of the lithography lens device 10 is too crowded, and the assembly difficulty of the lithography lens device 10 is increased. If the included angle α1 between the propagation direction of the light beam entering from the light inlet 22 and the first reflecting surface 45 is too large, the reflection angle of the light beam at the first reflecting surface 45 is too large, and the width space required for light beam propagation is increased, which results in an oversized photolithography lens apparatus 10. The included angle α1 between the propagation direction of the light beam entering from the light inlet 22 and the first reflecting surface 45 is configured to be 75 ° < α1 < 85 °, so that the size of the lithography lens device 10 is moderate, which is convenient for assembling the lithography lens device 10 and does not cause the size of the lithography lens device 10 to be oversized.

Similarly, the included angle α2 between the propagation direction of the light beam reflected by the first reflecting surface 45 and the second reflecting surface 53 is 78 ° < α2 < 82 °, so that the size of the lithography lens apparatus 10 is moderate, which is convenient for assembling the lithography lens apparatus 10 and does not cause the size of the lithography lens apparatus 10 to be too large.

Similarly, the included angle α3 between the propagation direction of the light beam reflected by the second reflecting surface 53 and the third reflecting surface 62 is configured to be 30 ° < α3 < 50 °, so that the size of the lithography lens apparatus 10 is moderate, which is convenient for assembling the lithography lens apparatus 10 and does not cause the size of the lithography lens apparatus 10 to be oversized.

In some embodiments of the present application, an included angle α1=80° between the propagation direction of the light beam entering from the light inlet 22 and the first reflecting surface 45, an included angle α2=80° between the propagation direction of the light beam reflected by the first reflecting surface 45 toward the second reflecting surface 53 and the second reflecting surface 53 (in this case, the first reflecting surface 45 is parallel to the second reflecting surface 53), and an included angle α3=45° between the propagation direction of the light beam reflected by the second reflecting surface 53 toward the third reflecting surface 62 and the third reflecting surface 62.

After entering the housing 21 from the light inlet 22, the light beam reaches the first reflecting surface 45 in a straight direction, and is reflected by the first reflecting surface 45 according to the principle of specular reflection of the light, and at this time, the incident angle of the light beam on the first reflecting surface 45 is 10 °. The second reflecting surface 53 is parallel to the first reflecting surface 45, so that the reflection angle of the light beam on the second reflecting surface 53 is 10 °, and the propagation direction of the light beam after being reflected by the second reflecting surface 53 is parallel to the propagation direction of the light beam after being incident into the housing 21 from the light inlet 22, that is, the light beam reaches the third reflecting surface 62 in the straight direction after being reflected by the second reflecting surface 53. The propagation direction of the light beam reflected by the second reflecting surface 53 toward the third reflecting surface 62 is at an angle α3=45° to the third reflecting surface 62, and therefore, the incident angle of the light beam at the third reflecting surface 62 is 45 °, and thus, the angle between the incident light beam and the outgoing light beam at the third reflecting surface 62 after the light beam is reflected at the third reflecting surface 62 is 90 °. Since the propagation direction of the light beam reflected by the second reflecting surface 53 is parallel to the propagation direction of the light beam after entering the housing 21 from the light inlet 22, the propagation direction of the light beam entering the light guide 20 in the light guide 20 is perpendicular to the propagation direction of the light beam exiting the light guide 20, that is, the propagation direction of the light beam is changed by 90 ° by the light guide 20. In this way, the light beam entering the light guide 20 in the lateral direction is emitted from the vertical direction. Thus, the height of the photoetching lens device 10 is reduced, the gravity center height of the photoetching lens device 10 is reduced, the photoetching lens device 10 moves more stably, the shaking of the photoetching lens device 10 is reduced, the photoetching effect is improved, and the photoetching efficiency is improved.

Example IV

Referring to fig. 1 to fig. 2 and fig. 6, in some embodiments of the present application, a lithographic lens apparatus 10 is provided, which includes a light homogenizing element 70, a first lens element 80, a light guiding device 20, and a second lens element 91 mounted at a light outlet 23 of the first lens element 80.

The dodging component 70 is used for dodging. The first lens assembly 80 is used to change the beam exit angle. The first lens assembly 80 is mounted on the light inlet 22 of the light guide device 20, and the light homogenizing assembly 70 is mounted on the light inlet of the first lens assembly 80. After the light beam enters the lithography lens apparatus 10, the light beam sequentially passes through the light uniformizing assembly 70, the first lens assembly 80, and the light guiding device 20.

During the propagation of the lithography lens apparatus 10, the light beam is homogenized by the homogenizing component 70, and then enters the first lens component 80. After the light beam passes through the first lens assembly 80, the outgoing light angle of the light beam is changed by the first lens assembly 80, so that the outgoing light angle of the light beam is changed to a desired range. The path of the light beam is made to be a zigzag shape by the light guide 20, thereby reducing the device size length without reducing the propagation distance of the light beam.

The dodging component 70 includes: a lens barrel 71 and a fixing base 72. The lens barrel 71 is adapted to be connected to the outside. The fixing base 72 is detachably and fixedly installed in the lens barrel 71, and the fixing base 72 is provided with a first bayonet 73 and a second bayonet 74. Wherein, the relation between the distance D between the first bayonet 73 and the second bayonet 74 and the length L of the light homogenizing rod 75 is 2/3.ltoreq.D/L < 3/4. The first bayonet 73 and the second bayonet 74 are arranged along the longitudinal direction of the light rod 75, and when the light rod 75 is fixed, the first bayonet 73 and the second bayonet 74 simultaneously engage the light rod 75.

When the light homogenizing rod 75 is fixed, the light homogenizing rod 75 is fixed through the first bayonet 73 and the second bayonet 74, and the relation between the distance D between the first bayonet 73 and the second bayonet 74 and the length L of the light homogenizing rod 75 is configured to be 2/3-less than or equal to D/L < 3/4, so that the suspension length of one end of the light homogenizing rod 75 can be reduced on one hand, and the suspension length between other fixed points can be limited on the other hand. In this way, the vibration of the light homogenizing rod 75 is reduced, the risks of deformation, crack and even fracture of the light homogenizing rod 75 are reduced, and the vibration generated by the irradiation area of the small photoetching lens device 10 is reduced, so that the photoetching effect and the photoetching efficiency meet the expected requirements, and the photoetching process is more stable and reliable.

Example five

Referring to fig. 1 to 2 and fig. 7 to 8, in some embodiments of the present application, a lithographic lens apparatus 10 according to the present application includes an over-adjusting device 101, a light homogenizing component 70, a first lens component 80, and a light guiding device 20, and a second lens component 91 is mounted on a light outlet 23 of the first lens component 80.

The light homogenizing module 70 is detachably connected to the adjusting means 101. The first lens assembly 80 is detachably connected to the light homogenizing assembly 70. The light guide 20 is detachably connected to the first lens assembly 80. The light beam emitted by the optical fiber sequentially passes through the adjusting device 101, the light homogenizing component 70, the first lens component 80 and the light guiding device 20.

The optical fiber is mounted on the mounting member 102 of the adjusting device 101, and the adjusting device 101 is mounted on the dodging module 70 via the connecting member 103 of the adjusting device 101. The light beam from the optical fiber is incident on the light homogenizing rod 75 in the light homogenizing module 70, forms a light spot at the incident end of the light homogenizing rod 75, is homogenized by the light homogenizing rod 75, sequentially passes through the first lens module 80 and the light guiding device 20, and finally is emitted to the outside of the lithography lens device 10 to form an irradiation area.

During the propagation process of the optical beam in the lithography lens device 10, the effect of the irradiation position of the optical fiber optical beam is adjusted by the adjusting device 101, so that the irradiation region position of the lithography lens device 10 is calibrated to ensure that the lithography effect meets the expected requirement. The light distribution in the illuminated area is made more uniform by the light homogenizing element 70. After the light beam passes through the first lens assembly 80, the outgoing light angle of the light beam is changed by the first lens assembly 80, so that the outgoing light angle of the light beam is changed to a desired range. The path of the light beam is made to be a zigzag shape by the light guide 20, thereby reducing the device size length without reducing the propagation distance of the light beam. In this way, under the condition of reducing the size of the lithography lens device 10, the beam emitted by the lithography lens device 10 forms an irradiation area with uniform light distribution on the to-be-lithography piece, and the size and the position of the irradiation area meet the expected requirements.

Referring to fig. 7 to 8, the adjusting device 101 includes: mounting member 102, connecting member 103, and adapter 104. The mount 102 is used to mount an optical fiber. The connector 103 is adapted to be connected to an external structure. The adapter 104 is used to connect the mounting member 102 with the connector 103. The mounting member 102 and the connecting member 103 are located at two sides of the adaptor member 104, the mounting member 102 can move relative to the adaptor member 104 in a first direction X, the adaptor member 104 can move relative to the connecting member 103 in a second direction Y, the first direction X and the second direction Y intersect, and both the first direction X and the second direction Y are perpendicular to the propagation direction of the light beam.

The optical fiber is mounted on the mounting member 102, and the position of the optical fiber is changed by moving the mounting member 102 relative to the adapter member 104 in the first direction X and moving the adapter member 104 relative to the connector member 103 in the second direction Y, so that the irradiation position of the light beam from the optical fiber is adjusted, and the irradiation area position of the lithography lens apparatus 10 is calibrated, so that the lithography effect meets the expected requirement.

Referring to fig. 7 to 8, in some embodiments of the present application, the mounting member 102 is provided with a first threaded hole 111 and a second threaded hole 113 toward the first direction X. The first threaded hole 111 is provided with a first adjustment screw 112 and the second threaded hole 113 is provided with a second adjustment screw 114. The adaptor 104 is provided with a first abutting surface 121 and a second abutting surface 122 on two sides respectively, the first abutting surface 121 and the second abutting surface 122 are located between the first threaded hole 111 and the second threaded hole 113, and the distance between the first abutting surface 121 and the second abutting surface 122 is smaller than the distance between the first threaded hole 111 and the second threaded hole 113. In the process of moving the mounting member 102 in the first direction X, the first adjusting screw 112 and/or the second adjusting screw 114 are screwed, and the first adjusting screw 112 abuts against the first abutment surface 121 and/or the second adjusting screw 114 abuts against the second abutment surface 122, so that the mounting member 102 moves in the first direction X relative to the adapter 104.

In the process of moving the mounting member 102 along one side of the first direction X, the first adjusting screw 112 is screwed to screw out the first adjusting screw 112 to the outside of the first threaded hole 111, and at this time, the end portion of the first adjusting screw 112 is retracted to the outside of the first threaded hole 111; simultaneously, the second adjusting screw 114 is screwed, so that the second adjusting screw 114 is screwed into the second threaded hole 113, at the moment, the end part of the second adjusting screw 114 extends out towards the inner side of the second threaded hole 113, and the end part of the second adjusting screw 114 abuts against the second abutting surface 122; in this manner, the mounting member 102 is moved relative to the adapter 104 along one side of the first direction X. In the process of screwing the first adjusting screw 112 and the second adjusting screw 114, the retraction speed of the first adjusting screw 112 is greater than or equal to the extension speed of the second adjusting screw 114, so as to avoid the jamming caused by the excessive pressing of the second adjusting screw 114 on the second abutting surface 122.

Similarly, in the process of moving the mounting member 102 along the other side of the first direction X, the second adjusting screw 114 is screwed to screw out the second adjusting screw 114 to the outside of the second threaded hole 113, and at this time, the end of the second adjusting screw 114 is retracted to the outside of the second threaded hole 113; simultaneously, the first adjusting screw 112 is screwed, so that the first adjusting screw 112 is screwed into the first threaded hole 111, at this time, the end part of the first adjusting screw 112 extends out towards the inner side of the first threaded hole 111, and the end part of the first adjusting screw 112 abuts against the first abutting surface 121; thus, the other side of the mounting member 102 in the first direction X is moved relative to the adapter 104. In the process of screwing the first adjusting screw 112 and the second adjusting screw 114, the retraction speed of the second adjusting screw 114 is greater than or equal to the extension speed of the first adjusting screw 112, so that the first adjusting screw 112 is prevented from excessively pressing against the first abutting surface 121 to generate blocking.

The adapter 104 is provided with a third threaded hole 131 and a fourth threaded hole 133 in the second direction Y. The third threaded hole 131 is provided with a third adjusting screw 132 and the fourth threaded hole 133 is provided with a fourth adjusting screw 134. The two sides of the connecting piece 103 are respectively provided with a third abutting surface 141 and a fourth abutting surface 142, the third abutting surface 141 and the fourth abutting surface 142 are positioned between the third threaded hole 131 and the fourth threaded hole 133, and the distance between the third abutting surface 141 and the fourth abutting surface 142 is smaller than the distance between the third threaded hole 131 and the fourth threaded hole 133. In the process of moving the adaptor 104 in the second direction Y, the third adjusting screw 132 and/or the fourth adjusting screw 134 are screwed, and the third adjusting screw 132 abuts against the third abutment surface 141 and/or the fourth adjusting screw 134 abuts against the fourth abutment surface 142, so that the adaptor 104 moves in the second direction Y relative to the connector 103.

In the process of moving the adaptor 104 along one side of the second direction Y, the third adjusting screw 132 is screwed out of the third threaded hole 131, and at this time, the end part of the third adjusting screw 132 is retracted towards the outer side of the third threaded hole 131; simultaneously, the fourth adjusting screw 134 is screwed, so that the fourth adjusting screw 134 is screwed into the fourth threaded hole 133, at this time, the end of the fourth adjusting screw 134 extends toward the inner side of the fourth threaded hole 133, and the end of the fourth adjusting screw 134 abuts against the fourth abutting surface 142; in this manner, the mounting member 102 is moved relative to the adapter member 104 along one side of the second direction Y. In the process of screwing the third adjusting screw 132 and the fourth adjusting screw 134, the retraction speed of the third adjusting screw 132 is greater than or equal to the extension speed of the fourth adjusting screw 134, so as to prevent the fourth adjusting screw 134 from excessively pressing against the fourth abutting surface 142 to generate blocking.

Similarly, in the process of moving the adaptor 104 along the other side of the second direction Y, the fourth adjusting screw 134 is screwed to screw out the fourth adjusting screw 134 to the outside of the fourth threaded hole 133, and at this time, the end of the fourth adjusting screw 134 is retracted to the outside of the fourth threaded hole 133; simultaneously, the third adjusting screw 132 is screwed, so that the third adjusting screw 132 is screwed into the third threaded hole 131, at this time, the end part of the third adjusting screw 132 extends out toward the inner side of the third threaded hole 131, and the end part of the third adjusting screw 132 abuts against the third abutting surface 141; thus, the other side of the mounting member 102 in the second direction Y is moved relative to the adapter 104. In the process of screwing the third adjusting screw 132 and the fourth adjusting screw 134, the retraction speed of the fourth adjusting screw 134 is greater than or equal to the extension speed of the third adjusting screw 132, so as to prevent the third adjusting screw 132 from excessively pressing against the third abutting surface 141 to generate blocking.

Example six

Referring to fig. 9 to 10, in some embodiments of the application, the lens holder 81 is provided with a plurality of first screw holes 82 and a plurality of through holes 84, the first screw holes 82 and the through holes 84 are uniformly circumferentially arranged along the propagation direction of the incident beam, the first screw holes 82 are uniformly inserted between the through holes 84, and the first screw rod 83 is adapted to the first screw holes 82. The casing 21 is provided with a plurality of second screw holes 26, the positions and the number of the second screw holes 26 are corresponding to those of the through holes 84, the second screw holes 26 are matched with the through holes 84, and the second screw holes 26 are matched with the second screws 27. The second screw 27 is screwed into the second screw hole 26 after passing through the through hole 84 and abuts against the lens holder 81 by the screw head of the second screw 27. After the first screw 83 is screwed into the first screw hole 82, the first screw 83 abuts against the housing 21.

The second screw 27 is screwed into the second screw hole 26 after passing through the through hole 84, so that the lens holder 81 is difficult to move radially relative to the housing 21; after the second screw 27 is screwed into the second screw hole 26, the screw head of the second screw 27 abuts against the lens holder 81, so that the lens holder 81 is difficult to separate from the housing 21; after the first screw 83 is screwed into the first screw hole 82, the screw end of the first screw 83 abuts against the housing 21, so that the lens holder 81 is less likely to approach the housing 21. In this way, the position of the lens holder 81 and the position of the housing 21 are held relatively fixed by the first screw 83 and the second screw 27, and the lens holder 81 is fixedly attached to the housing 21. The first screw 83 and the second screw 27 are screwed to adjust the amount of the lens holder 81 extending into the housing 21, thereby adjusting the propagation distance of the light beam and further adjusting the size of the irradiation area of the lithography lens apparatus 10. The angle of incidence at the reflective assembly 30 after the light beam exits the first lens assembly 80 can also be adjusted by twisting the first screw 83 and the second screw 27, thereby adjusting the size and shape of the illuminated area formed after the light beam exits the lithographic lens apparatus 10, and the uniformity of the light within the illuminated area.

Screwing the first screw 83 inward and screwing the second screw 27 outward can reduce the amount of penetration of the lens holder 81 at the housing 21, thereby increasing the propagation distance of the light beam, and thus increasing the irradiation area of the lithographic lens apparatus 10; screwing the first screw 83 out and screwing the second screw 27 in increases the amount of protrusion of the lens holder 81 at the housing 21, thereby reducing the propagation distance of the light beam, and thus the irradiation area of the lithographic lens apparatus 10.

In some embodiments of the present application, the lens holder 81 is provided with a light-passing tube 85, the light inlet 22 is fixedly provided with a guide tube 28, the inner wall of the guide tube 28 is matched with the outer wall of the light-passing tube 85, and the guide tube 28, the light-passing tube 85 and the optical lens 86 are concentric.

In the process of increasing or decreasing the extending amount of the lens holder 81 in the housing 21, the light passing cylinder 85 is guided by the guide cylinder 28, so that the position accuracy of the relative position of the lens holder 81 and the housing 21 is improved, and the influence of the adjustment process on the uniformity of the light beam is reduced.

In some embodiments of the present application, the lens holder 81 is connected in series with the housing 21 by at least one positioning pin 87.

The lens seat 81 is positioned at the housing 21 by the positioning pin 87, so that the position accuracy of the relative position of the lens seat 81 and the housing 21 is further improved, and the influence of the adjustment process on the uniformity of the light beam is further reduced.

Example seven

Referring to fig. 1-2 and 11-12, in some embodiments of the present application, a light beam emitted from an optical fiber bundle is homogenized by a homogenizing rod 75 and then enters a first lens assembly 80. The number of optical lenses 86 in the first lens assembly 80 is four, including a first lens 861, a second lens 862, a third lens 863, and a fourth lens 864. The first lens 861, the second lens 862, the third lens 863, and the fourth lens 864 are coaxially disposed in order along the propagation direction of the incident light beam. The first lens 861 is a biconvex lens, the second lens 862 is a meniscus lens, the third lens 863 is a meniscus lens, and the fourth lens 864 is a plano-convex lens. The fifth lens 911 is mounted on the light outlet 23.

After entering the first lens assembly 80, the light beam sequentially passes through the first lens 861, the second lens 862, the third lens 863 and the fourth lens 864, is refracted for multiple times, then exits the first lens assembly 80 from the fourth lens 864, enters the light guide device 20 from the light inlet 22, and is reflected by the reflecting assembly 30, so that the path of the light beam is in a zigzag shape, and the size and the length of the device are reduced under the condition that the propagation distance of the light beam is not reduced. Since the propagation distance of the light beam is not reduced, the light beam has a sufficient propagation distance to expand the area of the irradiation region from the lithography lens apparatus 10 to a desired range. The light beam passes through the light guide 20, then exits the light outlet 23, and passes through the fifth lens 911.

The first lens element 861 with positive refractive power is a biconvex lens element, i.e., an object-side surface of the first lens element 861 is convex; the image-side surface of the first lens element 861 is convex, with positive refractive power. Second lens element 862 with negative refractive power is a concave-convex lens element, i.e., an object-side surface of second lens element 862 is a concave surface; the image-side surface of the second lens element 862 is convex, and has positive refractive power. The third lens element 863 with positive refractive power is a convex-concave lens element, i.e., an object-side surface of the third lens element 863 is convex; the image-side surface of the third lens element 863 is concave, and has negative refractive power. The fourth lens 864 is a plano-convex lens, i.e., an object-side surface of the fourth lens 864 is a plane; the fourth lens element 864 with positive refractive power has a convex image-side surface; the fifth lens element 911 has a convex object-side surface and positive refractive power; the fifth lens element 911 has a convex image-side surface and positive refractive power.

In some embodiments of the present application, the curvature vector of the object-side surface of the first lens element 861 is defined as R11, and the curvature vector of the image-side surface of the first lens element 861 is defined as R12; the curvature vector of the object-side surface of the second lens 862 is R21, and the curvature vector of the image-side surface of the second lens 862 is R22; the curvature vector of the object-side surface of the third lens element 863 is R31, and the curvature vector of the image-side surface of the third lens element 863 is R32; the curvature vector of the object-side surface of the fourth lens 864 is R41, and the curvature vector of the image-side surface of the fourth lens 864 is R42; the curvature vector of the object-side surface of the fifth lens element 911 is R51, and the curvature vector of the image-side surface of the fifth lens element 911 is R52; the direction toward the object side is positive, and the direction toward the image side is negative, then there are:

40mm<R11<60mm，-70mm<R12<-50mm；

-20mm<R21<-6mm，-30mm<R22<-10mm；

80mm<R31<100mm，50mm<R32<85mm；

R41=∞，-85mm<R42<-35mm；

2500mm<R51<3500mm，-3500mm<R52<-2500mm。

in some embodiments of the present application, defining the focal length of the first lens 861 as f1, the focal length of the second lens 862 as f2, the focal length of the third lens 863 as f3, the focal length of the fourth lens 864 as f4, and the focal length of the fifth lens 911 as f5, there are:

60mm≤f1≤70mm，-75mm≤f2≤-60mm，-750mm≤f3≤-640mm，75mm≤f4≤100mm，3690mm≤f5≤3730mm。

in some embodiments of the present application, the thickness of the light homogenizing rod 75 is defined as d0, the thickness of the first lens 861 on the central axis is d1, the thickness of the second lens 862 on the central axis is d2, the thickness of the third lens 863 on the central axis is d3, the thickness of the fourth lens 864 on the central axis is d4, and the thickness of the fifth lens 911 on the central axis is d5, then:

130mm≤d0≤140mm，4mm≤d1≤8mm，6mm≤d2≤10mm，3mm≤d3≤6mm，4mm≤d4≤8mm，38mm≤d1≤42mm。

In some embodiments of the present application, an object side surface of the first lens element 861 is defined as a first surface S1, and an image side surface of the first lens element 861 is defined as a second surface S2; the object side of the second lens element 862 is a third surface S3, and the image side of the second lens element 862 is a fourth surface S4; the object side of the third lens element 863 is a fifth surface S5, and the image side of the third lens element 863 is a sixth surface S6; the object-side surface of the fourth lens element 864 is a seventh surface S7, and the image-side surface of the fourth lens element 864 is an eighth surface S8; the object side surface of the fifth lens element 911 is a ninth surface S9, and the image side surface of the fifth lens element 911 is a tenth surface S10.

Defining the axial distance between the light-emitting end face of the optical fiber bundle and the object side face of the light-homogenizing rod 75 as L0, the axial distance between the image side face of the light-homogenizing rod 75 and the first face S1 assembly as L1, the axial distance between the second face S2 and the third face S3 as L2, the axial distance between the fourth face S4 and the fifth face S5 as L3, the axial distance between the sixth face S6 and the seventh face S7 as L4, the propagation axial distance from the light beam after being emitted from the eighth face S8 to the ninth face S9 as L5, and the axial distance from the tenth face S10 to the lithography face of the to-be-lithography piece as L6, there are:

1mm≤L0≤3mm，9mm≤L1≤15mm，50mm≤L2≤60mm，50mm≤L3≤60mm，50mm≤L4≤60mm，2800mm≤L5≤3200mm，360mm≤L6≤370mm。

by defining the shape of the light rod 75, the uniformity of the light beam is made to meet the desired requirements. By limiting the shapes of the first lens 861, the second lens 862, the third lens 863, the fourth lens 864, and the fifth lens 911, the overall reduction in size and correction of system aberrations are facilitated when the lens is within the range. When the lower limit is exceeded, although the lens is favorable to be thinned, the curvature of field increases, axial aberration increases, the image plane size increases, and collimation and uniformity deteriorate; conversely, when the upper limit specified value is exceeded, axial aberration, curvature of field, and distortion increase, the image plane size becomes smaller, and uniformity becomes worse. By limiting the parameters of the light equalizing rod 75 and the lenses to predetermined ranges, the overall lithography lens device 10 can have good exposure surface illuminance and uniformity, and can satisfy the low distortion characteristic.

The photolithography lens apparatus of the present application will be described below by way of example. Symbols described in the examples are as follows. The units of focal length, on-axis distance, curvature vector, on-axis thickness are mm.

The first lens, the second lens, the third lens, the fourth lens and the fifth lens are all made of glass materials.

Table 1 shows design data of a lithographic lens apparatus according to a first embodiment of the present application.

TABLE 1

Wherein the meanings of the symbols are as follows.

R11: a curvature vector of the first lens object side; r12: a curvature vector of the image side surface of the first lens;

r21: a curvature vector of the second lens object-side surface; r22: a curvature vector of the image side of the second lens;

r31: a curvature vector of the third lens object-side surface; r32: a curvature vector of the image side surface of the third lens;

r41: a curvature vector of the fourth lens object-side surface; r42: a curvature vector of the fourth lens element image-side surface;

r51: a curvature vector of the fifth lens object side; r52: a curvature vector of the fourth lens element image-side surface;

f1: a focal length of the first lens; f2 the focal length of the second lens; f3 focal length of the third lens; f4: a focal length of the fourth lens; the focal length of the fifth lens is f5;

nd0: refractive index of the light rod 75; nd1: refractive index of the first lens; nd2: refractive index of the second lens; nd3: refractive index of the third lens; nd4: refractive index of the fourth lens; nd5: refractive index of the fifth lens;

vd0: abbe number of the light homogenizing rod 75; vd1: abbe number of the first lens; vd2: abbe number of the second lens; vd3: abbe number of the third lens; vd4: abbe number of the fourth lens; vd5: abbe number of the fifth lens;

d0: the thickness of the light homogenizing rod 75 is d1: the thickness on the central axis of the first lens; d2: the thickness of the second lens on the central axis; d3: the thickness of the third lens on the central axis; d4: the thickness of the fourth lens on the central axis; d5: the thickness of the fifth lens on the central axis;

l0: an on-axis distance between the light-emitting end face of the optical fiber bundle and the object side face of the light homogenizing rod 75;

l1: the on-axis distance of the image side surface of the light bar 75 from the first surface assembly;

l2: an on-axis distance between the second face and the third face;

l3: an on-axis distance between the fourth face and the fifth face;

l4: an on-axis distance between the sixth and seventh faces;

l5: the distance between the beam emitted from the eighth surface and the propagation axis of the ninth surface;

l6: an on-axis distance between the tenth surface and the lithographic surface of the piece to be lithographically etched.

Fig. 13 shows an exposure surface illuminance distribution map of a light beam after passing through the lithography lens apparatus of the first embodiment. Fig. 14 is a graph showing the illuminance uniformity detection result after the light beam passes through the lithography lens apparatus according to the first embodiment.

Table 1 shows ranges of various values of the lithography lens apparatus provided by the present application and parameters specified in the conditional expression.

As shown in table 1, the first embodiment satisfies the range of each conditional expression.

In the first embodiment, the incident angle range α when the light source of the lithographic lens apparatus enters the integrator 75 satisfies: the angle of incidence is the angle between the incident light and the normal of the incident surface of the light homogenizing rod 75, and is more uniform when the angle is more than 12 degrees and less than 13 degrees after the light path passes through the light homogenizing rod 75. When the incident angle range α satisfies: when 12 DEG < alpha < 13 DEG, the axial distance d0 of the light homogenizing rod 75 satisfies the following conditions: 130 mm.ltoreq.d0.ltoreq.140 mm, so that the light emitted from the light source falls into the light homogenizing rod 75 as much as possible, preventing light energy loss, and at the same time, improving illuminance uniformity, preferably d0=135 mm, in order to satisfy structural optimization of the whole system.

The second embodiment is substantially the same as the first embodiment, and the meaning of symbols is the same as the first embodiment, and only differences are listed below.

Table 2 shows design data of a lithographic lens apparatus according to a second embodiment of the present application.

TABLE 2

As shown in table 2, the second embodiment satisfies the range of each conditional expression.

Fig. 15 shows an exposure surface illuminance distribution diagram of a light beam after passing through the lithography lens apparatus of the second embodiment. Fig. 16 is a graph showing the illuminance uniformity detection result after the light beam passes through the lithography lens apparatus according to the second embodiment.

Fig. 13 is a graph showing an illuminance distribution of an exposure surface according to the first embodiment of the present invention; fig. 15 is an exposure surface illuminance distribution diagram according to a second embodiment of the present invention. The uniformity of the illumination of the exposure surface can be more than 95% by using a common nine-point method for the images obtained in the two embodiments, and the emergent light angle is less than 0.15 °.

In the description of the present specification, reference to the terms "some embodiments," "illustrative embodiments," "examples," "specific examples," or "some examples," etc., means that a particular feature, structure, material, or characteristic described in connection with the embodiments or examples is included in at least one embodiment or example of the invention. In this specification, schematic representations of the above terms do not necessarily refer to the same embodiments or examples. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.

Furthermore, the foregoing description of the preferred embodiment of the invention is provided for the purpose of illustration only, and is not intended to limit the invention to the particular form disclosed, but on the contrary, the intention is to cover all modifications, equivalents, and alternatives falling within the spirit and scope of the invention.

Claims

1. A lithographic lens apparatus, comprising:

the lens seat is arranged at the light inlet;

2. The lithographic lens apparatus of claim 1, wherein the number of optical lenses is four, comprising a first lens, a second lens, a third lens, and a fourth lens;

3. The lithographic lens apparatus of claim 2, wherein the light outlet is mounted with a second lens assembly comprising a fifth lens, the fifth lens being a biconvex lens.

4. A lithographic lens apparatus according to claim 3, wherein a central axis of said first lens assembly and a central axis of said second lens assembly are mutually perpendicular.

5. The lithographic lens apparatus of claim 1, wherein the number of reflective assemblies is three, comprising a first reflective member, a second reflective member, and a third reflective member;

6. The lithographic lens apparatus according to claim 5, wherein an angle α1 between a propagation direction of the light beam entering from the light entrance and the first reflective surface is configured to be 0 ° < α1 < 90 °;

7. The lithographic lens apparatus according to claim 6, wherein an angle α1 between a propagation direction of the light beam entering from the light entrance and the first reflective surface is configured to be 75 ° < α1 < 85 °;

8. The lithographic lens apparatus according to claim 1, wherein the lens holder is provided with a plurality of first screw holes and a plurality of through holes, the first screw holes and the through holes are uniformly circumferentially arranged along a propagation direction of an incident beam, the first screw holes are uniformly inserted between the through holes, and the first screw holes are adapted with first screws;

9. The lithographic lens apparatus of claim 8, wherein the lens holder is provided with a light-passing tube, the light inlet is fixedly provided with a guide tube, an inner wall of the guide tube is adapted to an outer wall of the light-passing tube, and the guide tube, the light-passing tube and the optical lens are concentric.

10. The lithographic lens apparatus of claim 8, wherein the lens holder and the housing are connected in series by at least one dowel pin.