CN117026166A - Ultrathin vacuum transition device and pressure difference eliminating system - Google Patents
Ultrathin vacuum transition device and pressure difference eliminating system Download PDFInfo
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- 239000010408 film Substances 0.000 description 47
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- 239000010409 thin film Substances 0.000 description 10
- 239000007789 gas Substances 0.000 description 8
- 238000011160 research Methods 0.000 description 6
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
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- 229910052755 nonmetal Inorganic materials 0.000 description 3
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- 229920002799 BoPET Polymers 0.000 description 1
- 239000005041 Mylar™ Substances 0.000 description 1
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- 239000002131 composite material Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000036314 physical performance Effects 0.000 description 1
- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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Abstract
The disclosure provides an ultrathin vacuum transition device and a pressure difference elimination system, which can be applied to the technical field of particle accelerators. The vacuum transition device comprises: the vacuum transition film is configured as a nonmetallic film with the thickness of less than 0.1 millimeter, and the two sealing connecting pieces are respectively arranged at two sides of the vacuum transition film and are both connected with the particle beam pipeline. The energy loss of the particle beam during passing can be greatly reduced while the vacuum gradient transition in the ultra-wide range can be realized. The pressure difference eliminating system is used for accurately controlling the pressure at two sides of the vacuum transition membrane in the vacuumizing and air amplifying stage, so that the pressure difference at two sides of the vacuum transition membrane in the using process is eliminated to avoid bearing larger gas pressure, the risk of membrane structure damage can be obviously reduced, the service life of the vacuum transition membrane is greatly prolonged, and the vacuum transition device with an extremely thin membrane structure is ensured to realize long-term safe and stable operation.
Description
Technical Field
The disclosure relates to the technical field of particle accelerator vacuum, in particular to an ultrathin vacuum transition device and a pressure difference elimination system.
Background
The vacuum transition device is a technology for realizing vacuum transition in different vacuum degree areas, and in particle accelerators (such as heavy ion accelerators, proton accelerators, electron accelerators and the like), the vacuum degree required by the synchrotron is high (better than 10) -9 mbar) while the vacuum required for high energy transport lines is lower (10 -5 mbar). At this time, there is a vacuum gradient difference of four orders between the synchrotron and the high-energy transport line, and a vacuum transition device is required.
Conventional particle accelerators use differential pumping systems to achieve the vacuum gradient transition requirement, which require multiple vacuum pump sections and thus are costly and space consuming. The membrane structure (such as a metal membrane, a metal and nonmetal composite membrane and a nonmetal membrane) is one of vacuum transition devices, and by arranging the membrane structure between a high vacuum degree and a low vacuum degree, the transmission of gas in the membrane structure is limited under the condition that particles (such as heavy ions, protons, electrons and the like) in a particle accelerator are allowed to pass through, wherein the nonmetal membrane does not generate neutron pollution when the particles pass through the accelerator, so that the vacuum transition device has better radiophysical performance. The conventional nonmetallic film vacuum transition device needs to bear atmospheric pressure or pressure difference in the vacuumizing and air amplifying stages of a vacuum system, so that the thickness of the film is thicker, particularly for a vacuum transition section with larger area, the change of a divergence angle, the change of emittance and energy loss are large when particle beams pass each time, and the quality and quality of the beam after the particle beams pass through a film structure are greatly reduced.
The vacuum gradient transition device with the extremely thin film structure can realize the vacuum gradient transition of more than 9 orders of magnitude under the condition of almost occupying no installation space, and more importantly, the vacuum gradient transition device can reduce the influence on the quality in the particle beam transmission process, thereby improving the overall performance index of the particle accelerator. The vacuum transition device with the extremely thin film structure is characterized in that the vacuum gradient transition in the ultra-wide range is realized, the influence on the particle beam transmission process is reduced, meanwhile, the accurate pressure control on two sides of the film structure and the accurate pressure difference control in the vacuumizing and amplifying process are both complex and important problems, and the vacuum transition device with the extremely thin film structure is also a key point of long-term safe and stable use of the vacuum transition device with the extremely thin film structure in a particle accelerator. The method is characterized in that ultra-wide range vacuum gradient transition is realized in the particle accelerator, the influence on the particle transmission quality is reduced, the pressure at two sides of the membrane structure is accurately controlled, and the pressure difference at two sides of the membrane structure is accurately controlled, which are important points and difficulties in the development process of the vacuum transition device of the particle accelerator. In order to realize transition of vacuum gradient in ultra-wide range, related research and application of the vacuum transition device with the existing nonmetallic film structure are based on meeting the requirements of mechanical strength for bearing atmospheric pressure and larger pressure difference generated in the processes of vacuumizing and amplifying the atmosphere. At present, no related research on a vacuum transition device with an extremely thin film structure, which is not considered to bear atmospheric pressure and pressure difference in the process of vacuumizing and amplifying the atmosphere, is available, mainly because the pressure which can be born by the extremely thin film structure is extremely small (usually within 0.1 atmosphere), and the requirement of lower pressure difference on two sides of the extremely thin film structure is difficult to be always reached in the whole using process. The vacuum transition device in particle accelerators as well has difficulty in achieving the lower pressure difference requirements across the extremely thin film structure throughout the use. At present, the research on the vacuum transition device of the particle accelerator realizes the requirement of vacuum gradient transition through current limiting and difference, and the influence on the energy loss performance index in the particle transmission process is also the key point of the research on the vacuum transition device. The energy loss of the particle beam in the transmission process can be greatly reduced by the extremely thin film structure. The problems of ultra-wide vacuum transition, elimination of the influence of performance parameters in the particle beam transmission process, use of an ultra-thin vacuum transition structure and the like are all important points and difficulties in the development of a vacuum transition device of a particle accelerator.
The membrane structure vacuum transition device has the advantages of unique pressure distribution, higher capability of blocking gas transmission, abnormal high-efficiency structure and the like which are difficult to compare with the conventional vacuum transition device. Because of the defects of the intensive research on the technology of accurately controlling the pressure and accurately controlling and even eliminating the pressure difference at present, the use requirement of the vacuum transition device with the extremely thin film structure cannot be met for the existing particle accelerator.
At present, the methods of researching and using the membrane structure vacuum transition device are used in the environment of pressure fluctuation by considering the bearing capacity of gas pressure so as to ensure long-term safety and stability, for example, the method of increasing the thickness of the membrane structure and combining the membrane structure with a high-strength nonmetallic structure is used, and the transmission efficiency of the particle beam is reduced, so that the method cannot be used in a particle accelerator device requiring that the particle beam can pass through the membrane structure and have enough small energy loss. The main purpose of the related research of the particle accelerator is to provide qualified particle beam quality, so that the influence of performance indexes of the particle beam in the transmission process is negligible, and the method cannot be realized according to the current technical conditions, namely, the current film structure vacuum transition device used in the particle accelerator cannot meet the physical parameter requirements of unaffected beam passing.
Disclosure of Invention
In view of the above, the present disclosure provides an ultrathin vacuum transition device and a pressure difference elimination system, which can greatly reduce energy loss when a particle beam passes through while realizing vacuum gradient transition in an ultra-wide range, and eliminate pressure differences on two sides of a film structure in a vacuumizing and amplifying stage by precisely controlling pressure and pressure differences on two sides of the ultrathin vacuum transition device, so that the ultrathin film structure vacuum transition device can realize long-term safe and stable operation.
According to a first aspect of the present disclosure, there is provided an ultra-thin vacuum transition device for use in a particle beam conduit, the ultra-thin vacuum transition device comprising:
a vacuum transition film configured as a nonmetallic film having a thickness of less than 0.1 millimeters;
the two sealing connectors are respectively arranged at two sides of the vacuum transition film and are connected with the particle beam pipeline.
According to an embodiment of the present disclosure, the sealing connection comprises:
the first flange is configured to connect the vacuum transition film and the particle beam pipeline;
and the sealing ring is arranged between the vacuum transition membrane and the first flange and is configured to seal the vacuum transition membrane.
According to an embodiment of the present disclosure, the leak rate of the vacuum transition film is 10 in the case that the atmospheric pressure is the backing pressure -4 mbarL/s；
The vacuum transition range of the vacuum transition film is at least 10 -11 mbar-10 -2 Between mbar.
According to the embodiment of the disclosure, at least one through hole is formed in the vacuum transition film, and the number of the through holes is the same as the number of the fixing holes in the first flange;
the through hole is used for fixing the first flange with the vacuum transition membrane through the fixing hole.
According to embodiments of the present disclosure, the thickness of the vacuum transition film is related to the energy loss requirements of the particle beam;
the area of the vacuum transition membrane is related to the area of the beam cross section required by the particle beam as it passes through the vacuum transition membrane.
A second aspect of the present disclosure provides a pressure differential cancellation system, comprising:
the ultra-thin vacuum transition device of the first aspect;
the two particle beam pipelines are arranged at two sides of the ultrathin vacuum transition device and are connected with the vacuum transition film through the sealing connecting piece;
the pressure difference eliminating device comprises a flow guide assembly and a vacuumizing assembly which are respectively arranged on two particle beam pipelines, wherein the two flow guide assemblies are connected with the vacuumizing assembly through a tee joint.
According to an embodiment of the disclosure, one of the two particle beam channels is connected to the sealing connection via a first bellows.
According to an embodiment of the present disclosure, the conductance assembly includes:
the angle valve comprises two interfaces, one of the two interfaces is connected with the particle beam pipeline, and the other of the two interfaces is connected with the flow guiding element;
the flow guiding element comprises two second flanges and a pipeline connected with the two second flanges, one second flange of the two second flanges is connected with the other interface, and the other second flange of the two second flanges is connected with the second corrugated pipe;
the second corrugated pipe comprises two interfaces, one of the two interfaces is connected with the other second flange, and the other of the two interfaces is connected with one of the tee joints.
According to an embodiment of the present disclosure, the length of the pipe connecting the two second flanges is related to the pressure control requirements of the evacuation and amplification stages;
under the condition that the two flow guiding elements are used simultaneously, the flow guiding elements control the pressure difference of the vacuum transition film at two sides in the vacuumizing and air amplifying processes.
A third aspect of the present disclosure provides a particle accelerator comprising: the pressure difference cancellation system of the second aspect.
The technical scheme adopted by the present disclosure has the following advantages:
(1) The ultrathin vacuum transition device has the advantages that the influence of mechanical strength is not required to be considered, and an ultrathin structure can be realized, so that the influence on beam current is greatly eliminated, and the structure is simple and compact, and has a wide application prospect.
(2) Only one layer of vacuum transition film is needed for vacuum transition of two particle beam pipelines, so that the vacuum gradient transition requirement in an ultra-wide range can be realized, the cost is extremely low, the manufacturing process is simple, and the popularization is easy.
(3) The pressure difference of two sides of the vacuum transition membrane is accurately controlled by using the two flow guide elements, so that the vacuum transition membrane does not need to consider gas pressure in the whole use process, the risk of membrane structural damage can be obviously reduced, and the service life of the vacuum transition membrane is greatly prolonged.
(4) The pressure difference eliminating system has the advantages of simple structure, easy processing and manufacturing, low cost, stable performance, easy popularization and wide application prospect.
Drawings
The foregoing and other objects, features and advantages of the disclosure will be more apparent from the following description of embodiments of the disclosure with reference to the accompanying drawings, in which:
FIG. 1 schematically illustrates an exploded schematic view of an ultra-thin vacuum transition device provided in accordance with an embodiment of the present disclosure;
FIG. 2 schematically illustrates a schematic view of a vacuum transition membrane provided in accordance with an embodiment of the present disclosure;
FIG. 3 schematically illustrates a schematic diagram of a pressure differential cancellation system provided in accordance with an embodiment of the present disclosure;
FIG. 4 schematically illustrates a schematic diagram of a conductance element provided in accordance with an embodiment of the present disclosure;
FIG. 5 schematically illustrates a pressure gradient profile schematic of a vacuum transition membrane provided in accordance with an embodiment of the present disclosure;
FIG. 6 schematically illustrates a graphical representation of the pressure over time during an evacuation phase provided in accordance with an embodiment of the present disclosure;
FIG. 7 schematically illustrates a graphical representation of the pressure difference over time during an evacuation phase provided in accordance with an embodiment of the present disclosure;
FIG. 8 schematically illustrates a graphical representation of the pressure of an amplification stage over time provided in accordance with an embodiment of the present disclosure;
fig. 9 schematically illustrates a graph of the amplification stage pressure difference over time provided in accordance with an embodiment of the present disclosure.
Detailed Description
Hereinafter, embodiments of the present disclosure will be described with reference to the accompanying drawings. It should be understood that the description is only exemplary and is not intended to limit the scope of the present disclosure. In the following detailed description, for purposes of explanation, numerous specific details are set forth in order to provide a thorough understanding of the embodiments of the present disclosure. It may be evident, however, that one or more embodiments may be practiced without these specific details. In addition, in the following description, descriptions of well-known structures and techniques are omitted so as not to unnecessarily obscure the concepts of the present disclosure.
The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the disclosure. The terms "comprises," "comprising," and/or the like, as used herein, specify the presence of stated features, steps, operations, and/or components, but do not preclude the presence or addition of one or more other features, steps, operations, or components.
All terms (including technical and scientific terms) used herein have the same meaning as commonly understood by one of ordinary skill in the art unless otherwise defined. It should be noted that the terms used herein should be construed to have meanings consistent with the context of the present specification and should not be construed in an idealized or overly formal manner.
Where expressions like at least one of "A, B and C, etc. are used, the expressions should generally be interpreted in accordance with the meaning as commonly understood by those skilled in the art (e.g.," a system having at least one of A, B and C "shall include, but not be limited to, a system having a alone, B alone, C alone, a and B together, a and C together, B and C together, and/or A, B, C together, etc.).
Fig. 1 schematically illustrates an exploded schematic view of an ultra-thin vacuum transition device provided in accordance with an embodiment of the present disclosure.
As shown in fig. 1, the ultra-thin vacuum transition device includes: a vacuum transition membrane 1 and two sealing joints. The vacuum transition film 1 is configured as a nonmetallic film with a thickness of less than 0.1 mm for realizing vacuum gradient transition and allowing particle beam to pass through. The two sealing connectors are respectively arranged at two sides of the vacuum transition film 1 and are both connected with a particle beam pipeline.
In an embodiment, a set of sealing connectors comprises a first flange 3 and a sealing ring 2, the first flange 3 is configured to connect the vacuum transition membrane 1 with a particle beam conduit, the sealing ring 2 is arranged between the vacuum transition membrane 1 and the first flange 3, and the sealing ring 2 is configured to seal the vacuum transition membrane 1 and to assemble it to a particle beam transport line. The vacuum transition membrane 1 is connected with the first flange 3 through a sealing ring 2 to realize vacuum sealing.
Fig. 2 schematically illustrates a schematic view of a vacuum transition film provided in accordance with an embodiment of the present disclosure.
As shown in fig. 2, 16 through holes are distributed around the periphery of the vacuum transition film 1. The 16 through holes are matched with the 16 fixing holes of the first flange 3 and used for fixing and positioning the vacuum transition membrane 1.
The vacuum transition membrane 1 is a nonmetallic membrane such as a Hostaphan membrane, a Mylar membrane, or a Kapton membrane.
In one implementation, the performance parameters of the vacuum transition film 1 used in the present disclosure may be as shown in table 1 below:
TABLE 1
| Material name | Hostaphan film |
| Poisson's ratio | 0.4 |
| Young's modulus | 4.4E9Pa |
| Density of | 1.395g/cm3 |
| Ultimate yield strength | 130MPa |
| Thickness of (L) | 0.075mm |
In the embodiment of the present disclosure, the vacuum transition film 1 is used for realizing vacuum gradient transition and beam current transmission, and the loss in the beam current transmission process is negligible because the vacuum transition film 1 of the present disclosure is extremely thin.
The vacuum transition film 1 of the present disclosure can realize transition from extremely high vacuum degree to medium vacuum degree. The leak rate of the vacuum transition membrane 1 was 10 in the case where the atmospheric pressure was the backing pressure -4 mbarL/s. The vacuum transition range is at least 10 -11 mbar-10 -2 Vacuum transitions between mbar, i.e. the vacuum level on both sides of the vacuum transition membrane 1, can be achieved by the vacuum transition membrane 1 of the present disclosure in this interval.
In an embodiment of the present disclosure, the thickness of the vacuum transition film 1 is related to the energy loss requirement of the particle beam, and may be set according to the practical application requirement, where the thickness directly affects the energy loss during the beam passing. The area of the vacuum transition film 1 is related to the area of the beam cross section required when the particle beam passes through the vacuum transition film 1, and can be set according to practical application requirements.
It should be noted that, the shape and size of the vacuum transition film 1 may also be set according to practical application requirements, so as to meet the size requirement of the beam passing through the vacuum transition film 1. As illustrated in fig. 2, the vacuum transition film 1 is circular in shape.
The effect of the vacuum transition film 1 used in this example on the physical performance parameters of the beam is shown in table 2 below:
TABLE 2
| Index (I) | Influencing the results |
| The particles pass through a divergence angle rms (mrad) | 0.257 |
| Variation of emittance | 1.07 |
| 120Mev/u energy loss (C particle) | 0.18Mev/u(0.15％) |
| 400Mev/u energy loss (C particle) | 0.083Mev/u(0.021％) |
Fig. 3 schematically illustrates a schematic diagram of a pressure differential cancellation system provided in accordance with an embodiment of the present disclosure.
As shown in fig. 3, the pressure difference cancellation system includes: an ultrathin vacuum transition device, two particle beam pipelines 5 and a pressure difference eliminating device. Two particle beam ducts 5 are arranged on both sides of the ultra-thin vacuum transition device. The pressure difference eliminating device comprises a flow guide assembly and a vacuumizing assembly which are respectively arranged on the two particle beam pipelines, and the two flow guide assemblies are connected with the vacuumizing assembly through a tee joint.
One side of the vacuum transition film 1 is connected with the particle beam pipeline 5 through the first flange 3, and the other side of the vacuum transition film 1 is connected with the particle beam pipeline 5 through the other first flange 3, so that vacuum gradient transition between the two particle beam pipelines 5 is realized.
In one embodiment, the ultrathin vacuum transition device is an ultrathin vacuum transition device as shown in fig. 1, and two particle beam pipelines 5 are arranged at two sides of the ultrathin vacuum transition device and are connected with the vacuum transition film 1 through the sealing connection piece. A particle beam conduit 5 is connected to the sealing connection via a first bellows 6.
Optionally, the first flange 3 at one side of the vacuum transition membrane 1 is connected with the particle beam pipeline 5 through argon arc welding, the first flange 3 at the other side is connected with the first corrugated pipe 6 through argon arc welding, and the first corrugated pipe 6 is connected with the beam pipeline 5.
As shown in fig. 3, the conductance assembly includes: an angle valve 8, a flow guiding element 10 and a second bellows 11. The angle valve 8 comprises two interfaces, one of which is connected to the particle beam conduit 5 and the other of which is connected to the flow guiding element 10.
As shown in fig. 3 and 4, the flow guiding member 10 includes two second flanges 101 and a pipe 102 connecting the two second flanges, both ends of the pipe 102 are respectively connected to the two second flanges 101, one second flange 101 is connected to the other port, and the other second flange 101 is connected to the second bellows 11.
The conductance element used in this embodiment may be purchased custom through the Beijing letter vacuum mall.
As shown in fig. 3, the second bellows 11 comprises two interfaces, one of which is connected to the other second flange 101, and the other of which is connected to one of the three-way pipe 12.
In an embodiment of the present disclosure, the length of the pipe 102 connecting the two second flanges 101 is related to the pressure control requirements of the evacuation and amplification stages. In the case where two of the conductance elements 10 are used simultaneously, the conductance elements 10 control the pressure difference across the vacuum transition membrane 1 during evacuation and amplification of the gas.
It will be appreciated that the lengths of the conduits 102 of the two flow directing elements 10 may be the same or different, as may be desired.
In one example, the inner diameter of the pipe 102 connecting the two second flanges 101 is 1 mm.
In the present disclosure, the types of each of the first flange 3 and the second flange 101 may be the same or different, which is not limited by the present disclosure, and may be selected by those skilled in the art according to actual needs. For example, two second flanges 101 included in the flow guiding member 10 may be respectively employed as the flange of CF35 and the flange of KF 25.
In one embodiment of the present disclosure, as shown in fig. 3, the evacuation assembly includes a tee 12, a diaphragm valve 13, and a vacuum pump 14. The two conductance elements 10 are connected to a vacuum pump 14 via a bellows 11, a tee 12 and a diaphragm valve 13.
According to the pressure difference eliminating system provided by the disclosure, the pressure difference eliminating method is as follows:
the length of the two flow guiding elements 10 is determined according to the need for pressure control during the evacuation and amplification phases. Then vacuum is applied by means of a vacuum pump 14, and then an amplification of the gas is performed. After the evacuation and amplification phases are completed, the angle valve 8 is closed for isolating the particle beam duct 5 from the atmosphere.
Vacuumizing: the vacuum pump 14 simultaneously vacuumizes the particle beam pipelines 5 at the two sides of the vacuum transition film 1 through the flow guiding elements 10 at the two sides of the vacuum transition film 1, and discharges the gas in the particle beam pipelines 5.
And (3) amplifying: only the vacuum pump 14 needs to be removed in the amplifying stage, and two particle beam pipelines 5 are simultaneously amplified from the interface of the second corrugated pipe 11 through two conductance elements 10.
Wherein the two flow guiding elements 10 can be removed after the evacuation and amplification phases are completed.
The pressure difference eliminating mode is used for eliminating the pressure difference at two sides of the vacuum transition membrane 1 in the vacuumizing and air amplifying stages, so that the vacuum transition membrane 1 is hardly subjected to the pressure difference in the whole operation and use process, and therefore, the factors of mechanical strength are not considered, and an extremely thin structure is achieved.
Fig. 5 schematically illustrates a pressure gradient distribution diagram of the vacuum transition membrane 1 provided according to an embodiment of the present disclosure.
The stress values and the ratio of the ultimate yield stress of the vacuum transition membrane 1 used in this example under different pressure difference conditions are shown in the following table 3:
TABLE 3 Table 3
| Pressure difference (Pa) | Simulated stress value (Pa) | Simulated stress value/limit stress value |
| 1000 | 2.40E7 | 0.18 |
| 2000 | 3.82E7 | 0.29 |
| 3000 | 5.02E7 | 0.39 |
| 4000 | 6.09E7 | 0.47 |
| 5000 | 7.09E7 | 0.55 |
| 6000 | 8.03E7 | 0.62 |
| 7000 | 8.92E7 | 0.67 |
| 8000 | 9.77E7 | 0.76 |
| 9000 | 1.06E8 | 0.82 |
| 10000 | 1.14E8 | 0.88 |
The vacuum transition film 1 used in this embodiment is safe when the pressure difference is lower than 10000Pa, and v1=34L on the left side of the particle beam duct 5 and v2=134L on the right side of the particle beam duct 5 of the vacuum chamber volume on both sides of the vacuum transition film 1 in fig. 3.
In the evacuation phase, the initial pressure is 1E for a vacuum volume of 134L 5 Pa, the inner diameter and length of the two flow guiding elements 10 may be determined by:
when the pressure p=10000 Pa, the mean free path λ=6.67×10 -3 /10000＝6.67×10 -7 m, the inner diameter d/lambda is viscous flow when the inner diameter d/lambda is more than or equal to 100, and the inner diameter d is more than or equal to 6.67 multiplied by 10 -2 In mm, the pumping speed of the vacuum pump used in this example was s=4l/S for viscous flow at a pressure P of not less than 10000Pa, and the pumping speed for the particle beam flow line 5 was mainly determined by C2 when the conductance value C2/S of the conductance element 10 connected to the side of the particle beam flow line 5 having a vacuum volume of 134L was not more than 0.1.
When the inner diameter d=1 mm of the flow guiding element 10, c2=0.4L/s, the flow guiding value of the fixed flow guiding element 10 can be determined by the following formula:
at this time, taking fig. 3 as an example, the length L of the pipe 102 of the right-side flow guiding element 10 in fig. 3 can be obtained 2 The length of the tube 102 in the conductance element 10 is selected to be 0.17m, so that c2+.0.4s can be ensured, and the time-dependent pressure change in the particle beam tube 5 on both sides of the vacuum transition film 1 can be determined by the following formula in the whole evacuation process:
P(t)＝10 5 /(1+(Ct/V))
fig. 6 schematically illustrates a graphical representation of the pressure over time during an evacuation phase provided in accordance with an embodiment of the present disclosure.
When the air suction time is 3600s, the pressure is lower than 10000Pa.
In order to ensure the safety of the vacuum transition membrane 1 in the whole air extraction process, the pressure difference between two sides is kept to be 0Pa, and the pressure difference between two sides of the vacuum transition membrane 1 can be described by the following formula:
ΔP＝10 5 /(1+(C1t/V1))-10 5 /(1+(C2t/V2))
to obtain c2=4c1, for selecting an inner diameter d=1 mm of the pipe 102 of the flow guiding element 10 on the left side of fig. 3, the length L of the pipe 102 of the flow guiding element 10 on the left side 1 ＝4L 2 =0.68m, at which time the pressure difference across the vacuum transition membrane 1 can be controlled to be close to 0Pa theoretically.
Fig. 7 schematically illustrates a graphical representation of the pressure difference over time during an evacuation phase provided in accordance with an embodiment of the present disclosure.
The pressure difference is lower than 1000Pa throughout the evacuation phase.
Simulation is carried out through COMSOL software, in the whole vacuumizing process, the deformation of the vacuum transition film 1 is smaller than 2mm, and the maximum stress value born by the vacuum transition film is smaller than 3E 7 N/m 2 。
In the amplifying stage, the initial pressure is about 0Pa, and the external inflation pressure is 1E 5 Pa, when the inner diameter d=1 mm of the flow guiding element, length L 1 ＝4L 2 The pressure change with time in the particle beam line 10 on both sides of the vacuum transition film 1 can be determined by the following formula throughout the amplifying stage =0.68m:
P(t)＝10 5 (e Ct/V -e -Ct/V )/(e Ct/V +e -Ct/V )
fig. 8 schematically illustrates a graphical representation of the pressure of the amplification stage over time provided in accordance with an embodiment of the present disclosure.
The pressure was about 100000Pa at an atmospheric time of 900 s.
The pressure difference across the vacuum transition membrane 1 throughout the amplifying stage can be described by the following formula:
P(t)＝10 5 (e C1t/V1 -e -C1t/V1 )/(e C1t/V1 +e -C1t/V1 )-10 5 (e C2t/V2 -e -C2t/V2 )/(e C2t/V2 +e -C2t/V2 )
for a selected flow guide element 10, the inner diameter d=1 mm, l of the conduit 102 1 ＝4L 2 =0.68m, at which time the pressure difference across the vacuum transition membrane 1 can be controlled to be close to 0Pa theoretically.
Fig. 9 schematically illustrates a graph of the amplification stage pressure difference over time provided in accordance with an embodiment of the present disclosure.
The pressure difference is lower than 1000Pa throughout the amplifying stage.
Simulation by COMSOL software shows that the deformation of the vacuum transition membrane 1 is less than 2mm and the maximum stress value is less than 3E in the whole atmospheric process 7 N/m 2 。
In the normal operation process, the pressure difference at two sides of the vacuum transition membrane 1 is the vacuum degree of the high-energy transmission line, and the value is lower than 1Pa, so that the vacuum transition membrane 1 does not need to consider the effect of gas pressure in the whole operation process.
The ultrathin vacuum transition device and the pressure difference elimination system provided by the disclosure have good performance after being tested, and meet the design and use requirements.
Those skilled in the art will appreciate that the features recited in the various embodiments of the disclosure and/or in the claims may be provided in a variety of combinations and/or combinations, even if such combinations or combinations are not explicitly recited in the disclosure. In particular, the features recited in the various embodiments of the present disclosure and/or the claims may be variously combined and/or combined without departing from the spirit and teachings of the present disclosure. All such combinations and/or combinations fall within the scope of the present disclosure.
The embodiments of the present disclosure are described above. However, these examples are for illustrative purposes only and are not intended to limit the scope of the present disclosure. Although the embodiments are described above separately, this does not mean that the measures in the embodiments cannot be used advantageously in combination. The scope of the disclosure is defined by the appended claims and equivalents thereof. Various alternatives and modifications can be made by those skilled in the art without departing from the scope of the disclosure, and such alternatives and modifications are intended to fall within the scope of the disclosure.
Claims (9)
1. An ultra-thin vacuum transition device for use in a particle beam conduit, the ultra-thin vacuum transition device comprising:
a vacuum transition film configured as a nonmetallic film having a thickness of less than 0.1 millimeters;
the two sealing connectors are respectively arranged at two sides of the vacuum transition film and are connected with the particle beam pipeline.
2. The ultrathin vacuum transition device of claim 1, the sealing connection comprising:
the first flange is configured to connect the vacuum transition film and the particle beam pipeline;
and the sealing ring is arranged between the vacuum transition membrane and the first flange and is configured to seal the vacuum transition membrane.
3. The ultrathin vacuum transition device according to claim 1, wherein the leak rate of the vacuum transition film is 10 in the case that the atmospheric pressure is the backing pressure -4 mbarL/s；
The vacuum transition range of the vacuum transition film is at least 10 -11 mbar-10 -2 Between mbar.
4. The ultrathin vacuum transition device according to claim 2, wherein at least one through hole is arranged on the vacuum transition film, and the number of the through holes is the same as the number of the fixing holes on the first flange;
the through hole is used for fixing the first flange with the vacuum transition membrane through the fixing hole.
5. The ultra-thin vacuum transition device of claim 1, the thickness of the vacuum transition film being related to energy loss requirements of particle beam current;
the area of the vacuum transition membrane is related to the area of the beam cross section required by the particle beam as it passes through the vacuum transition membrane.
6. A pressure differential cancellation system, comprising:
an ultra-thin vacuum transition device as claimed in any one of claims 1 to 5;
the two particle beam pipelines are arranged at two sides of the ultrathin vacuum transition device and are connected with the vacuum transition film through the sealing connecting piece;
the pressure difference eliminating device comprises a flow guide assembly and a vacuumizing assembly which are respectively arranged on two particle beam pipelines, wherein the two flow guide assemblies are connected with the vacuumizing assembly through a tee joint.
7. The pressure differential cancellation system according to claim 6, wherein one of the two particle beam conduits is connected to the sealing connection by a first bellows.
8. The pressure differential cancellation system of claim 6, the conductance assembly comprising:
the angle valve comprises two interfaces, one of the two interfaces is connected with the particle beam pipeline, and the other of the two interfaces is connected with the flow guiding element;
the flow guiding element comprises two second flanges and a pipeline connected with the two second flanges, two ends of the pipeline are respectively connected with the two second flanges, one second flange of the two second flanges is connected with the other interface, and the other second flange of the two second flanges is connected with the second corrugated pipe;
the second corrugated pipe comprises two interfaces, one of the two interfaces is connected with the other second flange, and the other of the two interfaces is connected with one of the tee joints.
9. The pressure differential cancellation system of claim 8, the length of the conduit connecting the two second flanges being related to pressure control requirements of the evacuation and amplification stages;
under the condition that the two conductance elements are used simultaneously, the pressure difference eliminating system controls the pressure difference of the two sides of the vacuum transition membrane in the vacuumizing and gas amplifying processes.
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| CN202310889998.4A CN117026166A (en) | 2023-07-19 | 2023-07-19 | Ultrathin vacuum transition device and pressure difference eliminating system |
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| CN202310889998.4A CN117026166A (en) | 2023-07-19 | 2023-07-19 | Ultrathin vacuum transition device and pressure difference eliminating system |
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