CN116923689A - Active flow control structure based on rapid height Wen Wenchang and preparation method - Google Patents
Active flow control structure based on rapid height Wen Wenchang and preparation method Download PDFInfo
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- CN116923689A CN116923689A CN202311198455.4A CN202311198455A CN116923689A CN 116923689 A CN116923689 A CN 116923689A CN 202311198455 A CN202311198455 A CN 202311198455A CN 116923689 A CN116923689 A CN 116923689A
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- 238000002360 preparation method Methods 0.000 title abstract description 14
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- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 7
- 229910052709 silver Inorganic materials 0.000 claims description 7
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- 239000011889 copper foil Substances 0.000 claims description 4
- 238000005520 cutting process Methods 0.000 claims description 4
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B64—AIRCRAFT; AVIATION; COSMONAUTICS
- B64C—AEROPLANES; HELICOPTERS
- B64C23/00—Influencing air flow over aircraft surfaces, not otherwise provided for
- B64C23/005—Influencing air flow over aircraft surfaces, not otherwise provided for by other means not covered by groups B64C23/02 - B64C23/08, e.g. by electric charges, magnetic panels, piezoelectric elements, static charges or ultrasounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B64—AIRCRAFT; AVIATION; COSMONAUTICS
- B64F—GROUND OR AIRCRAFT-CARRIER-DECK INSTALLATIONS SPECIALLY ADAPTED FOR USE IN CONNECTION WITH AIRCRAFT; DESIGNING, MANUFACTURING, ASSEMBLING, CLEANING, MAINTAINING OR REPAIRING AIRCRAFT, NOT OTHERWISE PROVIDED FOR; HANDLING, TRANSPORTING, TESTING OR INSPECTING AIRCRAFT COMPONENTS, NOT OTHERWISE PROVIDED FOR
- B64F5/00—Designing, manufacturing, assembling, cleaning, maintaining or repairing aircraft, not otherwise provided for; Handling, transporting, testing or inspecting aircraft components, not otherwise provided for
- B64F5/10—Manufacturing or assembling aircraft, e.g. jigs therefor
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Abstract
The application discloses an active flow control structure based on a rapid height Wen Wenchang and a preparation method thereof, and relates to the field of active flow control, wherein the active flow control structure comprises: the oxidation-resistant porous reduction graphene oxide film is arranged on the wall surface of the structure; electrodes are arranged at two ends of the oxidation-resistant porous reduction graphene oxide film; the rapid electroacoustic interaction of the oxidation-resistant porous reduction graphene oxide film is utilized to realize the rapid construction of the high Wen Wenchang; meanwhile, active flow control based on the rapid height Wen Wenchang is realized through the electrode; and provides a corresponding preparation method; the active flow control structure provided by the application has the capability of rapid temperature rise and fall and high Wen Wenchang construction, can realize rapid construction of a temperature field of more than 1000 ℃ in millisecond order, and meets the requirements of the field of active flow control.
Description
Technical Field
The application relates to the field of active flow control, in particular to an active flow control structure based on a rapid height Wen Wenchang and a preparation method thereof.
Background
The statements in this section merely provide background information related to the present disclosure and may not constitute prior art.
Active flow control is one of the hot problems in research today, and is a key technology for realizing more economic cruising and higher-speed excitation of future aircrafts; current common active flow control techniques include: air suction and blowing, micro-jet technology, plasma technology, magnetohydrodynamic technology, microelectromechanical technology, adaptive deformation materials, wall temperature control technology, etc.
For the field of active flow control, the state of the boundary layer can be changed by rapidly injecting energy into the boundary layer with low energy, so that the flow state of the whole flight is influenced; the wall temperature control technology realizes the influence on the shock wave-boundary layer by changing the wall temperature; in 1997, debieve et al have experimentally studied the effect of wall temperature on shock wave-turbulence boundary layer interference and provided an empirical formula of the effect of wall temperature; more recently, jaunet et al have experimentally studied the behavior of reflected shock-boundary layer disturbances at several wall temperatures; however, the theoretical and simulation calculation researches of the wall temperature control technology are rich in the whole, but the experimental researches aiming at the wall temperature control technology are also deficient. In the practical experiment of the wall temperature control technology, the wall heating layer has complex preparation process and circuit design, low energy conversion rate, low temperature rise rate and low temperature of a temperature field, and the construction temperature field has very limited range, so that the application of the wall heating layer in the field of active flow control is limited.
The prior art mainly has two defects:
1. the existing wall surface temperature control technology is realized by metal Joule heating effect, and metal electroacoustic interaction is very slow, so that the heating efficiency of a temperature field is low, and the active control effect is not obvious;
2. the existing wall temperature control technology is low in temperature rising rate and low in temperature field temperature, and cannot meet the requirement of active flow control on high speed and high temperature.
Disclosure of Invention
The application aims at: aiming at the problems in the prior art, an active flow control structure based on a rapid height Wen Wenchang and a preparation method thereof are provided, a porous reduced graphene oxide film is adopted as a high-temperature heat source, and rapid electroacoustic interaction of the porous reduced graphene oxide film is utilized to realize rapid construction of the height Wen Wenchang; meanwhile, a commercial antioxidation coating is adopted to carry out surface treatment on the porous reduced graphene oxide film, and an antioxidation layer (50-100 mu m) is manufactured on the surface of the porous reduced graphene oxide film to obtain an antioxidation-porous reduced graphene oxide film; finally, the oxidation-resistant porous reduction graphene oxide film is adhered to the wall surface, and electrodes are prepared at two ends of the oxidation-resistant porous reduction graphene oxide film, so that active flow control based on rapid height Wen Wenchang is realized, and the problem of active flow control in the current pneumatic field is solved.
The technical scheme of the application is as follows:
an active flow control structure based on a rapid height Wen Wenchang comprising:
the oxidation-resistant porous reduction graphene oxide film is arranged on the wall surface of the structure; electrodes are arranged at two ends of the oxidation-resistant porous reduction graphene oxide film;
the rapid electroacoustic interaction of the oxidation-resistant porous reduction graphene oxide film is utilized to realize the rapid construction of the high Wen Wenchang; while active flow control based on a rapid height Wen Wenchang is achieved by the electrodes.
Further, the structural wall surface is provided with a groove;
the oxidation-resistant porous reduced graphene oxide film is mounted in the groove.
Further, electrodes are arranged at two ends of the groove, and a parallel wire is led out;
the oxidation-resistant porous reduced graphene oxide film is arranged in the groove through high-temperature silver paste.
Further, the oxidation-resistant porous reduced graphene oxide film includes:
the surface of the porous reduced graphene oxide film is provided with an antioxidation layer.
Further, the thickness of the antioxidation layer is 50-100 μm.
A method of fabricating an active flow control structure based on rapid height Wen Wenchang comprising:
step S1: preparing an oxidation-resistant porous reduced graphene oxide film;
step S2: and installing the oxidation-resistant porous reduction graphene oxide film on the wall surface of the structure, and arranging electrodes at two ends of the oxidation-resistant porous reduction graphene oxide film.
Further, the step S1 includes:
step S11: preparing a graphene oxide film;
step S12: preparing a porous reduced graphene oxide film based on the graphene oxide film;
step S13: based on the porous reduced graphene oxide film, an oxidation-resistant porous reduced graphene oxide film is prepared.
Further, the step S11 includes:
stirring and mixing graphene oxide aqueous dispersion stock solution and deionized water;
stirring and mixing, coating the mixture on a copper foil, and drying to obtain a graphene oxide film;
step S12, including:
placing the graphene oxide film into a tubular furnace, and heating and cooling to obtain a pre-reduced graphene oxide film;
placing the pre-reduced graphene oxide film in a graphite furnace, and heating and cooling to obtain a porous reduced graphene oxide film;
step S13, including:
uniformly spraying an antioxidant coating on one side surface of the porous reduced graphene oxide film;
and then obtaining the oxidation-resistant porous reduction graphene oxide film after presetting and heating.
Further, the graphene oxide aqueous dispersion stock solution is a monolayer graphene oxide aqueous dispersion;
the monolayer rate of the monolayer graphene oxide aqueous dispersion liquid is more than 95%;
the average radial size of the single-layer graphene oxide in the single-layer graphene oxide aqueous dispersion liquid is 40-50 mu m.
Further, the step S2 includes:
step S21: machining a groove on the wall surface of the structure;
step S22: manufacturing electrodes at two ends of the groove and connecting wires in parallel for leading out;
step S23: cutting the oxidation-resistant porous reduction graphene oxide film to the size of the groove, and bonding the oxidation-resistant porous reduction graphene oxide film in the groove by using high-temperature silver paste.
Compared with the prior art, the application has the beneficial effects that:
an active flow control structure based on a rapid height Wen Wenchang and a preparation method thereof have rapid temperature rise and fall performance and high Wen Wenchang construction capacity, can realize rapid construction of a temperature field of more than 1000 ℃ in millisecond order, and meet the requirements of the field of active flow control.
Drawings
FIG. 1 is a flow chart of a method of fabricating an active flow control structure based on a rapid height Wen Wenchang;
FIG. 2 is a graph comparing active flow control effects based on rapid height Wen Wenchang;
FIG. 3 is the effect of geometry on the thermal radiation source temperature field;
FIG. 4 is a graph of the effect of thickness on the thermal radiation source temperature field;
FIG. 5 is a schematic illustration of graphene oxide film preparation;
fig. 6 is a schematic structural diagram of a porous graphene oxide film.
Detailed Description
It is noted that relational terms such as "first" and "second", and the like, are used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Moreover, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without further limitation, an element defined by the phrase "comprising one … …" does not exclude the presence of other like elements in a process, method, article, or apparatus that comprises the element.
The features and capabilities of the present application are described in further detail below in connection with examples.
Example 1
In the initial design stage of the active flow control structure proposed in this embodiment, in order to verify whether the rapid high-temperature field can realize active flow control, the following verification is performed:
the influence of the rapid height Wen Wenchang on the flow state of the flat plate air flow is simulated by adopting a DNS calculation method, so that the higher the wall temperature is, the more the shock wave position is, and the larger the separation area is; the transition of the connecting layer can be restrained by increasing the wall temperature; illustrating that active flow control can theoretically be achieved by a fast height Wen Wenchang.
Thus, the present embodiment proposes an active flow control structure based on a fast height Wen Wenchang, comprising:
the oxidation-resistant porous reduction graphene oxide film is arranged on the wall surface of the structure; electrodes are arranged at two ends of the oxidation-resistant porous reduction graphene oxide film;
the rapid electroacoustic interaction of the oxidation-resistant porous reduction graphene oxide film is utilized to realize the rapid construction of the high Wen Wenchang; while active flow control based on a rapid height Wen Wenchang is achieved by the electrodes.
In this embodiment, specifically, the structural wall surface is provided with a groove;
the oxidation-resistant porous reduced graphene oxide film is mounted in the groove.
In this embodiment, specifically, electrodes are disposed at two ends of the groove, and a parallel wire is led out;
the oxidation-resistant porous reduced graphene oxide film is arranged in the groove through high-temperature silver paste.
In this embodiment, specifically, the oxidation-resistant porous reduced graphene oxide thin film includes:
the surface of the porous reduced graphene oxide film is provided with an antioxidation layer.
In this embodiment, the thickness of the antioxidation layer is specifically 50-100 μm.
Referring to fig. 2, fig. 2 is a graph comparing the active flow control effect based on the rapid height Wen Wenchang, and it can be seen from fig. 2 that the active flow control effect by the rapid height Wen Wenchang is excellent.
Referring to fig. 1, a method for preparing an active flow control structure based on a fast height Wen Wenchang includes:
step S1: preparing an oxidation-resistant porous reduced graphene oxide film;
step S2: and installing the oxidation-resistant porous reduction graphene oxide film on the wall surface of the structure, and arranging electrodes at two ends of the oxidation-resistant porous reduction graphene oxide film.
In this embodiment, specifically, the step S1 includes:
step S11: preparing a graphene oxide film;
step S12: preparing a porous reduced graphene oxide film based on the graphene oxide film;
step S13: based on the porous reduced graphene oxide film, an oxidation-resistant porous reduced graphene oxide film is prepared.
In this embodiment, specifically, the step S11 includes:
stirring and mixing graphene oxide aqueous dispersion stock solution and deionized water;
stirring and mixing, coating the mixture on a copper foil, and drying to obtain a graphene oxide film;
step S12, including:
placing the graphene oxide film into a tubular furnace, and heating and cooling to obtain a pre-reduced graphene oxide film;
placing the pre-reduced graphene oxide film in a graphite furnace, and heating and cooling to obtain a porous reduced graphene oxide film;
step S13, including:
uniformly spraying an antioxidant coating on one side surface of the porous reduced graphene oxide film;
and then obtaining the oxidation-resistant porous reduction graphene oxide film after presetting and heating.
In this embodiment, specifically, the graphene oxide aqueous dispersion stock solution is a single-layer graphene oxide aqueous dispersion;
the monolayer rate of the monolayer graphene oxide aqueous dispersion liquid is more than 95%;
the average radial size of the single-layer graphene oxide in the single-layer graphene oxide aqueous dispersion liquid is 40-50 mu m.
In this embodiment, specifically, the step S2 includes:
step S21: machining a groove on the wall surface of the structure;
step S22: manufacturing electrodes at two ends of the groove and connecting wires in parallel for leading out;
step S23: cutting the oxidation-resistant porous reduction graphene oxide film to the size of the groove, and bonding the oxidation-resistant porous reduction graphene oxide film in the groove by using high-temperature silver paste.
Example two
Embodiment two is a specific application of the active flow control structure and the preparation method based on the rapid height Wen Wenchang proposed in embodiment one.
In order to realize rapid construction of high Wen Wenchang, the anti-oxidation-porous reduction graphene oxide film (the preferable film size is 10mm multiplied by 15mm, and the thickness is 20 μm) is prepared, has proper conductivity, higher emissivity and rapid electroacoustic interaction, can realize rapid construction and elimination of a temperature field, and has a heating rate of more than 8 multiplied by 104K s < -1 > and a cooling rate of more than 1 multiplied by 104K s < -1 >, as shown in fig. 3 and 4; because graphene cannot exist for a long time under the high temperature condition in an air environment, RLHY-12/800 coating produced by commercial antioxidant Beijing Rong Liheng company is selected, and an antioxidant layer is prepared on the surface of the porous reduced graphene oxide film.
In this embodiment, the specific preparation process of the graphene oxide film is as follows:
the preparation flow is shown in figure 5; taking 6.4ml of graphene oxide aqueous phase dispersion stock solution with the density of 12.5mg/ml, dropwise adding 3.6ml of deionized water into the graphene oxide aqueous phase dispersion stock solution according to the volume ratio of 16:9 under the condition that the stirring rotation speed is 500 r/min-1000 r/min, and continuously stirring for 1h after the dropwise addition is finished;
the graphene oxide aqueous phase dispersion liquid is a monolayer graphene oxide aqueous phase dispersion liquid; the single-pass graphene oxide aqueous dispersion liquid has a single-layer rate of more than 95%; the average radial size of the single-layer graphene oxide in the single-layer graphene oxide aqueous dispersion liquid is 40-50 mu m;
and (3) coating the mixed and stirred single-layer graphene oxide aqueous dispersion on a copper foil under the condition that the coating rate is 10 mm/s-14 mm/s and the coating thickness is 1.5 mm-2.5 mm, and drying for 24 hours at 35 ℃ to obtain the graphene oxide film.
In this embodiment, the specific preparation process of the oxidation-resistant porous reduced graphene oxide film is as follows:
placing the graphene oxide film prepared by the method into a tube furnace, heating to 1100 ℃ at a heating rate of 5 ℃/min, preserving heat for 30min, cooling along with the furnace, and removing to obtain a pre-reduced graphene oxide film;
then placing the pre-reduced graphene oxide film in a graphite furnace, heating to 2600 ℃ at a heating rate of 5 ℃/min, preserving heat for 30min, cooling along with the furnace, and taking out to obtain a porous reduced graphene oxide film, wherein the film structure is shown in figure 6;
finally, uniformly spraying the anti-oxidation coating on one side surface of the porous reduced graphene oxide film by using a spraying process, presetting for 30min at 60 ℃, and heating for 30min in a muffle furnace at 500 ℃ to obtain the anti-oxidation-porous reduced graphene oxide film.
In this embodiment, the active flow control structure is specifically prepared as follows:
processing a groove with a proper size (determined according to actual requirements) with a depth of about 1mm on the wall surface of the structure, and manufacturing electrodes at two ends of the groove and connecting wires in parallel to lead out;
and cutting the oxidation-resistant porous reduction graphene oxide film to the size of the groove, and bonding the oxidation-resistant porous reduction graphene oxide film at the groove by using high-temperature silver paste, so that the preparation of the active flow control structure is completed.
The above examples merely illustrate specific embodiments of the application, which are described in more detail and are not to be construed as limiting the scope of the application. It should be noted that it is possible for a person skilled in the art to make several variants and modifications without departing from the technical idea of the application, which fall within the scope of protection of the application.
This background section is provided to generally present the context of the present application and the work of the presently named inventors, to the extent it is described in this background section, as well as the description of the present section as not otherwise qualify as prior art at the time of filing, are neither expressly nor impliedly admitted as prior art against the present application.
Claims (10)
1. An active flow control architecture based on a rapid height Wen Wenchang comprising:
the oxidation-resistant porous reduction graphene oxide film is arranged on the wall surface of the structure; electrodes are arranged at two ends of the oxidation-resistant porous reduction graphene oxide film;
the rapid electroacoustic interaction of the oxidation-resistant porous reduction graphene oxide film is utilized to realize the rapid construction of the high Wen Wenchang; while active flow control based on a rapid height Wen Wenchang is achieved by the electrodes.
2. An active flow control structure based on a rapid height Wen Wenchang as claimed in claim 1, wherein the structure walls are provided with grooves;
the oxidation-resistant porous reduced graphene oxide film is mounted in the groove.
3. The active flow control structure based on rapid height Wen Wenchang as claimed in claim 2, wherein electrodes are arranged at two ends of the groove, and lead out is connected in parallel;
the oxidation-resistant porous reduced graphene oxide film is arranged in the groove through high-temperature silver paste.
4. The rapid high Wen Wenchang based active flow control structure of claim 1, wherein the oxidation-resistant porous reduced graphene oxide film comprises:
the surface of the porous reduced graphene oxide film is provided with an antioxidation layer.
5. An active flow control structure based on rapid height Wen Wenchang as claimed in claim 4, wherein the thickness of the oxidation resistant layer is in the range of 50-100 μm.
6. A method of preparing an active flow control structure based on rapid height Wen Wenchang comprising:
step S1: preparing an oxidation-resistant porous reduced graphene oxide film;
step S2: and installing the oxidation-resistant porous reduction graphene oxide film on the wall surface of the structure, and arranging electrodes at two ends of the oxidation-resistant porous reduction graphene oxide film.
7. The method for preparing an active flow control structure based on rapid height Wen Wenchang as claimed in claim 6, wherein said step S1 comprises:
step S11: preparing a graphene oxide film;
step S12: preparing a porous reduced graphene oxide film based on the graphene oxide film;
step S13: based on the porous reduced graphene oxide film, an oxidation-resistant porous reduced graphene oxide film is prepared.
8. The method for preparing an active flow control structure based on rapid height Wen Wenchang as claimed in claim 7, wherein said step S11 comprises:
stirring and mixing graphene oxide aqueous dispersion stock solution and deionized water;
stirring and mixing, coating the mixture on a copper foil, and drying to obtain a graphene oxide film;
step S12, including:
placing the graphene oxide film into a tubular furnace, and heating and cooling to obtain a pre-reduced graphene oxide film;
placing the pre-reduced graphene oxide film in a graphite furnace, and heating and cooling to obtain a porous reduced graphene oxide film;
step S13, including:
uniformly spraying an antioxidant coating on one side surface of the porous reduced graphene oxide film;
and then obtaining the oxidation-resistant porous reduction graphene oxide film after presetting and heating.
9. The method for preparing an active flow control structure based on rapid height Wen Wenchang as claimed in claim 8, wherein the graphene oxide aqueous dispersion stock solution is a single-layer graphene oxide aqueous dispersion;
the monolayer rate of the monolayer graphene oxide aqueous dispersion liquid is more than 95%;
the average radial size of the single-layer graphene oxide in the single-layer graphene oxide aqueous dispersion liquid is 40-50 mu m.
10. The method for preparing an active flow control structure based on rapid height Wen Wenchang as claimed in claim 6, wherein said step S2 comprises:
step S21: machining a groove on the wall surface of the structure;
step S22: manufacturing electrodes at two ends of the groove and connecting wires in parallel for leading out;
step S23: cutting the oxidation-resistant porous reduction graphene oxide film to the size of the groove, and bonding the oxidation-resistant porous reduction graphene oxide film in the groove by using high-temperature silver paste.
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