CN116904926A - Multi-element composite nitride coating and preparation method thereof - Google Patents
Multi-element composite nitride coating and preparation method thereof Download PDFInfo
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- 150000004767 nitrides Chemical class 0.000 title claims abstract description 71
- 238000000576 coating method Methods 0.000 title claims abstract description 61
- 239000011248 coating agent Substances 0.000 title claims abstract description 59
- 239000002131 composite material Substances 0.000 title claims abstract description 33
- 238000002360 preparation method Methods 0.000 title claims abstract description 15
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 32
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 22
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 16
- 239000007789 gas Substances 0.000 claims abstract description 15
- 229910052802 copper Inorganic materials 0.000 claims abstract description 5
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 23
- 239000000758 substrate Substances 0.000 claims description 23
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 20
- 238000000151 deposition Methods 0.000 claims description 15
- 238000005477 sputtering target Methods 0.000 claims description 14
- 230000008021 deposition Effects 0.000 claims description 13
- 229910000831 Steel Inorganic materials 0.000 claims description 12
- 239000010959 steel Substances 0.000 claims description 12
- 229910052786 argon Inorganic materials 0.000 claims description 10
- 238000004140 cleaning Methods 0.000 claims description 8
- 238000004544 sputter deposition Methods 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 229910045601 alloy Inorganic materials 0.000 claims description 4
- 239000000956 alloy Substances 0.000 claims description 4
- 238000001035 drying Methods 0.000 claims description 4
- 229910000975 Carbon steel Inorganic materials 0.000 claims description 2
- 229910000861 Mg alloy Inorganic materials 0.000 claims description 2
- 229910001069 Ti alloy Inorganic materials 0.000 claims description 2
- 239000010962 carbon steel Substances 0.000 claims description 2
- 229910052748 manganese Inorganic materials 0.000 claims description 2
- 229910052750 molybdenum Inorganic materials 0.000 claims description 2
- 239000010935 stainless steel Substances 0.000 claims description 2
- 229910001220 stainless steel Inorganic materials 0.000 claims description 2
- 239000011159 matrix material Substances 0.000 abstract description 8
- 238000000034 method Methods 0.000 abstract description 8
- 238000005240 physical vapour deposition Methods 0.000 abstract description 3
- 239000000126 substance Substances 0.000 abstract 1
- 150000002500 ions Chemical class 0.000 description 5
- 239000011247 coating layer Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000010884 ion-beam technique Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 239000011253 protective coating Substances 0.000 description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 238000005086 pumping Methods 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910004205 SiNX Inorganic materials 0.000 description 1
- 229910010037 TiAlN Inorganic materials 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 238000011089 mechanical engineering Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002159 nanocrystal Substances 0.000 description 1
- 239000002086 nanomaterial Substances 0.000 description 1
- 229910052755 nonmetal Inorganic materials 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 230000002028 premature Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- -1 transition metal nitrides Chemical class 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
- C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
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- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses a multi-element composite nitride coating and a preparation method thereof, wherein the method adopts one of high-purity simple substance element Cr, al, si, mo and non-nitride forming element (such as Cu, co, ni, mn) as a composite component, and N is adopted 2 An Ar mixed gas as a reactive gas, a multi-component composite nitride coating prepared by physical vapor deposition with Cr, al, si, mo and non-nitride forming elements, the coating being characterized in that Cr, al, si, mo and non-nitride forming element content ratio is equimolar, the ratio of nitrogen element to other elements (Cr, al, si, mo and non-nitride forming elements) is 1.0-2.0, the structure is mainly amorphous. The multi-element composite nitride coating has high hardness, high coating-matrix binding force, low stress and lower friction coefficient, and is a comprehensive performanceExcellent composite coating.
Description
Technical Field
The invention belongs to the technical field of material surface coating, and particularly relates to a multi-element composite nitride coating and a preparation method thereof.
Background
Binary transition metal nitrides, such as CrN, tiN, etc., have the advantages of high melting point, large hardness, wear resistance, etc., and are commonly used for various types of hard protective surface coatings in the industrial field, as well as for automotive and aerospace parts. However, such protective coatings do not meet the requirements of harsh environments. Therefore, the development of complex multi-element nitride coatings has attracted considerable attention due to their structural features and excellent mechanical properties.
TiN is traditionally the most popular protective coating due to its high hardness but is easily oxidized above 550 ℃. Another widely used hard coating material CrN also faces the same problem. Ternary nitrides of added Al (e.g., crAlN and TiAlN) exhibit better oxidation resistance and wear resistance. In addition, a small amount of metal-like elements such as B, si are doped, so that the nano-structure coating can be realized, the hardness is improved, for example, in the CrAlSiN coating, the nano-crystal with the grain size of about 10nm is surrounded by amorphous SiNx grain boundaries, and dislocation slip is restrained. These ternary and quaternary nitrides also exhibit good performance in the antiwear field. Indeed, the central search for multi-component nitrides has been continued for decades. Recently, the concept of High Entropy Alloys (HEAs) has been proposed by Yeh et al, HEA being a candidate application material in the industry due to its potential for excellent performance. Nitride protective coatings based on HEA concept such as (AlCrMoSiTi) N, (TiAlCrSiV) N, (AlCrTaTiZr) N, (AlCrNbSiTiV) N, etc., have hardness exceeding 30GPa, and simultaneously maintain high oxidation resistance and thermal stability. However, the fatal weaknesses of nitrides are large brittleness and insufficient toughness. The defects formed in the magnetron sputtering process and the difference of the thermal expansion coefficients of the nitride film and the substrate lead to the generation of GPa-level residual stress of the film, and the residual stress can be gradually accumulated along with the increase of the deposition thickness of the film, so that the bonding performance of the nitride film and the substrate is reduced. The method for preparing the nitride film by the film deposition has the advantages of improving the toughness of the nitride, reducing the residual stress in the film deposition preparation process, and obtaining the nitride film with high hardness, high wear resistance, low friction coefficient and high toughness is always a hot spot and a difficult problem in the research of the industry.
The invention patent CN114540753A proposes a gradient transition layer for improving the bonding strength of a high-entropy nitride film base and a preparation method thereof, wherein the method can alleviate the internal stress of a film and improve the bonding strength between the nitride film layer and a cutter substrate
The bonding strength of the film base is improved greatly, but the multilayer structure design also improves the production cost and limits the commercial application of the film base. The non-nitride forming elements such as Cu, co, ni, mn have weak affinity with nitrogen element, can control the microstructure of the film, inhibit the growth of crystal phase, lead to the formation of nanocrystalline and/or amorphous structure, improve the ductility and toughness of the nitride film, and simultaneously maintain good binding force with the metal matrix. Therefore, the purpose of the patent is to control the residual stress of the nitride film by introducing non-nitride forming elements and combining multi-element alloying, so as to improve the comprehensive performance of the nitride film.
Disclosure of Invention
In order to overcome the limitations in the prior art, the invention provides a multi-element composite nitride coating and a preparation method thereof, wherein the multi-element composite nitride coating has high hardness, high coating-substrate binding force, low stress and lower friction coefficient, and is a composite coating with excellent comprehensive performance.
The technical scheme adopted by the invention is as follows:
the method adopts one of Cr, al, mo, nonmetallic element Si and non-nitride forming element Cu, co, ni, mn as a composite component, and N is used as 2 Ar mixed gas is used as a reaction gas, and the multi-element composite nitride coating with Cr, al, mo, si and non-nitride forming element composition is prepared by physical vapor deposition.
The coating consists of Cr, al, mo, nonmetallic element Si, one of non-nitride forming elements Cu, co, ni, mn and nitrogen element.
The content ratio of Cr, al and Mo to non-metal element Si and non-nitride forming element in the coating is equal molar ratio, and the ratio of nitrogen element to element (Cr, al, si, mo and non-nitride forming element) is 1.0-2.0.
The preparation method of the multi-element composite nitride coating adopts a vacuum magnetron sputtering system to coat a film, and specifically comprises the following steps:
step 1: cleaning and drying the polished sample substrate, mounting the polished sample substrate on a sample table of a rotating frame, and further cleaning the surface of the polished sample substrate by utilizing plasma;
step 2: starting a magnetron sputtering source, introducing argon into the magnetron sputtering source, introducing mixed gas of nitrogen and argon into the ion source, setting magnetron sputtering power and deposition time, and depositing a nitride coating;
step 3: and (3) turning off the power supply, opening the vacuum chamber to take out the substrate after the temperature of the vacuum chamber is reduced to the room temperature, and obtaining the coating formed on the surface of the substrate, namely the multi-element composite nitride coating.
The substrate in the step 1 is a sample to be coated, and comprises carbon steel, stainless steel, bearing steel, titanium alloy, magnesium alloy, hard alloy and the like. The specific size of the matrix can be selected according to the actual plating part requirement.
The sputtering targets loaded by the magnetron sputtering source in the step 2 are 5 integrated 1.5 inch Co-sputtering targets, namely Cr, al, si, mo, cu (or Co, ni and Mn) targets respectively, the purity of all targets is more than 99.99%, the content of the targets in the mixed gas is 20-40%, and the gas flow of the mixed gas is 5-50 sccm.
The sputtering power corresponding to the 5 sputtering targets loaded by the magnetron sputtering source in the step 2 is respectively 200-300W (Cr), 260-300W (Al), 280-320W (Si), 200-250W (Mo), 180-240W (Cu) (or 200-250W (Co), 220-300W (Ni) and 220-320W (Mn)), and meanwhile, the bias voltage of the substrate is set to be-80 to-200V, the deposition temperature is 250-350 ℃, and the deposition time is 100-200min.
To sum up, the physical vapor deposition device is used for preparing the multi-element composite nitride coating with the structure of amorphous state and the thickness of 0.5-10 mu m.
The multi-element composite nitride coating can be applied to the surface or inner hole protection of metal mechanical parts, precision dies, precision transmission mechanical equipment, bearings, electronic products, decorative products and materials.
Compared with the prior art, the multi-element composite nitride coating and the preparation method thereof have the following advantages:
according to the invention, the sputtering targets adopt 5 integrated co-sputtering targets in the film preparation process, so that the non-uniformity of coating components and tissues caused by different sputtering thresholds and sputtering yields in the alloy targets is avoided, and further, the premature failure of the coating in the service process is avoided.
The invention adopts the addition of non-nitride forming elements and other elements with different functions to regulate the structural performance of the nitride coating, and simultaneously the five-component composite nitride coating has high entropy effect (thermodynamics), delayed diffusion effect (dynamics), lattice distortion effect (structure) and cocktail effect (performance), thereby providing an effective thought for the research of the composite nitride coating with excellent comprehensive performance;
in the multi-element composite nitride coating, the nitride formed by Cr and Al has high hardness, strong thermal stability and strong oxidation resistance, and Mo can reduce the friction coefficient of the coating. The non-nitride forming element can improve the ductility and toughness of the nitride film and the binding force with the matrix, the Si coating is more compact, and the residual stress is reduced. The addition of the multiple components reduces residual stress, enhances the toughness of the coating, enhances the adhesive force of the coating, improves the friction and wear resistance and the thermal stability of the coating, ensures that the coating is more suitable for more severe application environments, and expands the application of the coating in mechanical engineering and other fields.
Detailed Description
The preparation method of the present invention will be further described with reference to the following examples.
Example 1
In this example 1, the coating layer on the surface of the bearing steel was a multi-component composite nitride coating layer composed of nitride forming elements Cr, al, mo, nonmetallic element Si, non-nitride forming element Cu, and nitrogen element.
The multi-element composite nitride coating is prepared by adopting a vacuum magnetron sputtering system, and the equipment comprises a vacuum chamber, 5 magnetron sputtering sources of 1.5 inch co-sputtering targets which can be integrated, an ion source and a workpiece support, wherein the workpiece support is arranged at the central position inside the vacuum chamber. The method specifically comprises the following steps:
step 1: cleaning and drying polished bearing steel matrix, mounting on sample stage of rotating frame, and pumping vacuum degree of vacuum cavity to 2.0X10 by using molecular pump -3 Under Pa, high-purity argon with purity of 99.99% is introduced, the air flow is 30sccm, and the vacuum cavity air pressure is kept at 5×10 -1 Pa, setting the ion beam voltage to 1000V and carrying out ion beam cleaning on bearing steel for 20min under the bias voltage of-600V;
step 2: starting a magnetron sputtering source, introducing argon into the magnetron sputtering source, wherein the flow is 60sccm, introducing mixed gas of argon and nitrogen into the ion source, introducing the gas flow to be 20sccm, wherein the nitrogen accounts for 20%, sputtering targets loaded by the magnetron sputtering source are integrated 5 1.5 inch co-sputtering targets which are Cr, al, mo, si, cu targets respectively, the purity of all targets is greater than 99.99%, the corresponding sputtering power is respectively 200-300W (Cr), 260-300W (Al), 280-320W (Si), 200-250W (Mo), 180-240W (Cu), the bias voltage of a bearing steel matrix is set to be-100V, the deposition temperature is 300 ℃, and the deposition time is 120min;
step 3: and (3) turning off the power supply, opening the vacuum chamber to take out the bearing steel substrate when the temperature of the vacuum chamber is reduced to the room temperature, and obtaining the coating formed on the surface of the substrate, namely the multi-element composite nitride coating.
The ratio of Cr, al, mo, si, cu element content in the formed coating is close to the molar ratio, the ratio of nitrogen element to element (CrAlMoSiCu) is 1.1, the structure is amorphous Cr, W, cu, si, and the ratio of Mo element is 10.1:10.4:9.6 9.2:10.1, film thickness 2.35 μm; hardness 25.3GPa; residual stress 0.43Gpa; coating substrate binding force 72N; the friction coefficient is 0.13 (the friction dual ball is alumina ceramic).
Example 2
In this example 2, the coating layer on the surface of the bearing steel was a multi-component composite nitride coating layer composed of nitride forming elements Cr, al, mo, nonmetallic element Si, non-nitride forming element Co, and nitrogen element.
The multi-element composite nitride coating is prepared by adopting a vacuum magnetron sputtering system, and the equipment comprises a vacuum chamber, 5 magnetron sputtering sources of 1.5 inch co-sputtering targets which can be integrated, an ion source and a workpiece support, wherein the workpiece support is arranged at the central position inside the vacuum chamber. The method specifically comprises the following steps:
step 1: cleaning and drying polished bearing steel matrix, mounting on sample stage of rotating frame, and pumping vacuum degree of vacuum cavity to 2.0X10 by using molecular pump -3 Under Pa, high-purity argon with purity of 99.99% is introduced, the air flow is 30sccm, and the vacuum cavity air pressure is kept at 5×10 -1 Pa, setting the ion beam voltage to 1000V and carrying out ion beam cleaning on bearing steel for 20min under the bias voltage of-600V;
step 2: starting a magnetron sputtering source, introducing argon into the magnetron sputtering source, wherein the flow is 60sccm, introducing mixed gas of argon and nitrogen into the ion source, wherein the gas flow is 30sccm, the nitrogen accounts for 20%, the sputtering targets loaded by the magnetron sputtering source are integrated 5 1.5 inch Co-sputtering targets which are Cr, al, mo, si, co targets respectively, the purity of all targets is greater than 99.99%, the corresponding sputtering powers are respectively 200-300W (Cr), 260-300W (Al), 280-320W (Si), 200-250W (Mo), 200-250W (Co), the bias voltage of a bearing steel matrix is set to-120V, the deposition temperature is 300 ℃, and the deposition time is 120min;
step 3: and (3) turning off the power supply, opening the vacuum chamber to take out the bearing steel substrate when the temperature of the vacuum chamber is reduced to the room temperature, and obtaining the coating formed on the surface of the substrate, namely the multi-element composite nitride coating.
The ratio of Cr, al, mo, si, co element content in the formed coating is close to the molar ratio, the ratio of nitrogen element to element (CrAlMoSiCO) is 1.2, and the structure is amorphous.
The above examples are preferred embodiments of the present invention, but the embodiments of the present invention are not limited to the above examples, and any other changes, modifications, substitutions, combinations, and simplifications that do not depart from the spirit and principle of the present invention should be made in the equivalent manner, and the embodiments are included in the protection scope of the present invention.
Claims (7)
1. A multi-element composite nitride coating and a preparation method thereof are characterized in that the coating is composed of one of nitride forming elements Cr, al and Mo, nonmetallic elements Si, non-nitride forming elements Cu, co, ni, mn and nitrogen.
2. The multi-component composite nitride coating and the preparation method thereof according to claim 1, wherein the ratio of Cr, al, si, mo to non-nitride forming elements in the coating is equal in molar ratio, and the ratio of nitrogen element to other elements (Cr, al, si, mo and non-nitride forming elements) is 1.0-2.0.
3. The multi-element composite nitride coating and the preparation method thereof according to claim 1, wherein the thickness of the coating is 0.5-10 μm, and the structure is mainly amorphous.
4. A multi-component composite nitride coating and method of making same as defined in claims 1-3, wherein: the preparation method of the multi-element composite nitride coating adopts a vacuum magnetron sputtering system for coating, and specifically comprises the following steps:
step 1: cleaning and drying the polished sample substrate, mounting the polished sample substrate on a sample table of a rotating frame, and further cleaning the surface of the polished sample substrate by utilizing plasma;
step 2: starting a magnetron sputtering source, introducing argon into the magnetron sputtering source, introducing mixed gas of the argon and nitrogen into the ion source, setting magnetron sputtering power and deposition time, and depositing a nitride coating;
step 3: and (3) turning off the power supply, opening the vacuum chamber to take out the substrate after the temperature of the vacuum chamber is reduced to the room temperature, and obtaining the coating formed on the surface of the substrate, namely the multi-element composite nitride coating.
5. The method of manufacturing according to claim 4, wherein: the substrate in the step 1 is a sample to be coated, and comprises carbon steel, stainless steel, bearing steel, titanium alloy, magnesium alloy, hard alloy and the like.
6. The method of manufacturing according to claim 4, wherein: the sputtering targets loaded by the magnetron sputtering source in the step 2 are 5 integrated 1.5 inch Co-sputtering targets, namely Cr, al, si, mo, cu (or Co, ni and Mn) targets respectively, the purity of all targets is more than 99.99%, the content of the targets in the mixed gas is 20-40%, and the gas flow of the mixed gas is 5-50 sccm.
7. The method of manufacturing according to claim 4, wherein: and 2, the sputtering power corresponding to 5 sputtering targets loaded by the magnetron sputtering source in the step 2 is respectively 200-300W (Cr), 260-300W (Al), 280-320W (Si), 200-250W (Mo), 180-240W (Cu) (or 200-250W (Co), 220-300W (Ni) and 220-320W (Mn)), and meanwhile, the bias voltage of the substrate is set to be-80 to-200V, the deposition temperature is 250-350 ℃, and the deposition time is 100-200min.
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