CN116837326A - Evaporation source for carrying out multistage heating on evaporation material - Google Patents
Evaporation source for carrying out multistage heating on evaporation material Download PDFInfo
- Publication number
- CN116837326A CN116837326A CN202210295599.0A CN202210295599A CN116837326A CN 116837326 A CN116837326 A CN 116837326A CN 202210295599 A CN202210295599 A CN 202210295599A CN 116837326 A CN116837326 A CN 116837326A
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- Prior art keywords
- evaporation
- cracking
- heater
- evaporation source
- heat shield
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- 238000001704 evaporation Methods 0.000 title claims abstract description 171
- 230000008020 evaporation Effects 0.000 title claims abstract description 162
- 239000000463 material Substances 0.000 title claims abstract description 47
- 238000010438 heat treatment Methods 0.000 title claims abstract description 35
- 238000005336 cracking Methods 0.000 claims abstract description 78
- 238000000034 method Methods 0.000 claims abstract description 41
- 238000007789 sealing Methods 0.000 claims abstract description 8
- 238000001816 cooling Methods 0.000 claims description 22
- 239000000919 ceramic Substances 0.000 claims description 7
- 229910052751 metal Inorganic materials 0.000 claims description 7
- 239000002184 metal Substances 0.000 claims description 7
- 239000011248 coating agent Substances 0.000 claims description 6
- 238000000576 coating method Methods 0.000 claims description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 5
- 229910002804 graphite Inorganic materials 0.000 claims description 5
- 239000010439 graphite Substances 0.000 claims description 5
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 4
- 229910052750 molybdenum Inorganic materials 0.000 claims description 4
- 239000011733 molybdenum Substances 0.000 claims description 4
- 229910052758 niobium Inorganic materials 0.000 claims description 4
- 239000010955 niobium Substances 0.000 claims description 4
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 4
- 229910052715 tantalum Inorganic materials 0.000 claims description 4
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 4
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 4
- 229910052721 tungsten Inorganic materials 0.000 claims description 4
- 239000010937 tungsten Substances 0.000 claims description 4
- 239000011810 insulating material Substances 0.000 claims description 3
- 230000000149 penetrating effect Effects 0.000 abstract 1
- 238000000197 pyrolysis Methods 0.000 description 12
- 238000011282 treatment Methods 0.000 description 7
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 4
- 229910052711 selenium Inorganic materials 0.000 description 4
- 239000011669 selenium Substances 0.000 description 4
- 238000007740 vapor deposition Methods 0.000 description 4
- 238000003776 cleavage reaction Methods 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 230000017525 heat dissipation Effects 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000000630 rising effect Effects 0.000 description 2
- 230000007017 scission Effects 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000012774 insulation material Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 150000003384 small molecules Chemical class 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses an evaporation source for carrying out multistage heating on evaporation materials, which comprises the following components: the evaporation source cavity is used for accommodating evaporation source materials, a feeding pipe and an evaporation air outlet pipe are arranged at the upper part of the evaporation source cavity, and a sealing cover plate is arranged at the upper end of the feeding pipe; the evaporation heater is arranged above the evaporation source cavity and is positioned in a closed space formed by the evaporation heater heat shield, the cracking heating structure comprises a cracking plate and a cracking heater, the cracking heater is arranged above the evaporation heater heat shield, the cracking heater heat shield is arranged outside the evaporation heater heat shield, and a cracking air outlet pipe penetrating through the heat shield is arranged on the surface of the cracking plate; after the material is evaporated, the material enters the cracking plate through the evaporation air outlet pipe, a specific molecular state is formed after the material is heated to the process temperature by the cracking heater, and the material enters the evaporation process area after reaching the cracking air outlet pipe through the vent hole on the cracking plate. The structure of the invention solves the problem that the existing evaporation source can not further heat the evaporation material gas to reach the required molecular state, thereby being incapable of obtaining the quality of a high-quality film layer.
Description
Technical Field
The invention belongs to the technical field of vacuum coating, and particularly relates to an evaporation source for performing multistage heating treatment on an evaporation material.
Background
When evaporating materials in the vacuum coating process, the materials are required to be heated to the evaporating temperature and the evaporating gas is required to be stabilized, so that the gas amount required by the process evaporation is achieved. However, some materials, such as selenium materials, are vaporized in a stable gaseous state, and the state of the gas is a macromolecular group state, so that the gas is further heated and cracked into small molecules in the process to reach the molecular state required by the process for the purposes of film quality and film stability, and the process is further required to reach the better film quality.
Disclosure of Invention
The invention aims to provide an evaporation source for heating evaporation materials in multiple stages, which is used for heating evaporation material gas, and solves the problem that the existing evaporation device structure cannot perform multiple stages of heating treatment on the evaporation gas to reach the molecular state required by the process, so that the quality of a high-quality film layer cannot be obtained.
In order to achieve the above object, according to one aspect of the present invention, there is provided an evaporation source for heating an evaporation material in multiple stages, comprising: the evaporation source cavity is used for accommodating evaporation source materials, the upper part of the evaporation source cavity is provided with a feeding pipe and an evaporation air outlet pipe, the feeding pipe is used for adding the evaporation materials, and the upper end of the feeding pipe is provided with a sealing cover plate for sealing; the evaporation heater is arranged above the evaporation source cavity and forms a closed space with an evaporation heater heat shield above the evaporation source cavity, and the evaporation heater heat shield shields the feeding pipe, the sealing cover plate and the evaporation heater, so that the evaporation heater is isolated from the surrounding environment; the cracking heating structure is arranged above the evaporation heater heat shield and comprises a cracking plate and a cracking heater, the cracking heater heat shield is arranged outside the cracking heating structure, and a cracking air outlet pipe which is communicated with the cracking plate and an external evaporation process area is arranged on the surface of the cracking heater heat shield; after the material in the evaporation source cavity is evaporated, the material enters the cracking plate through the evaporation air outlet pipe, then enters the evaporation process area after reaching the cracking air outlet pipe through the gas channel on the cracking plate, and is heated to the process temperature and the required molecular state by the cracking heater when passing through the gas channel.
According to the invention, the evaporation source cavity is arranged in the cooling tank, and the cooling pipe is arranged in the cooling tank, and is cooled through the contact surface of the cooling tank and the evaporation source cavity.
According to the invention, the space formed by the heat shield of the evaporation heater is filled with heat-insulating materials, so that heat dissipation is prevented, and the temperature of the evaporation heating area is kept constant and controllable.
According to the invention, the pyrolysis heating structure is externally coated with one or more heat shields arranged along the inner surface of the pyrolysis heater heat shield.
According to the invention, the evaporation heating area has two or more stages, and two or more corresponding heaters are provided, namely one or more evaporation heaters are communicated with each other from low temperature to high temperature, and are structurally and independently arranged on the upper surface of the evaporation source cavity in sequence; the evaporation heater is of a U-shaped structure, the bottom of the U-shaped structure surrounds the feeding pipe, two ends of the opening extend along the length direction of the evaporation source cavity, and the end parts of the opening extend out of a closed space formed by the evaporation heater heat shield.
According to the invention, the evaporation heater is an armored metal heater, the tail part is of a corrugated pipe structure, and the evaporation heater is directly connected to the process cavity or the outside of the vacuum chamber through the corrugated pipe and is reliably sealed.
According to the invention, the cracking heater can be rectangular, U-shaped or U-shaped in a zigzag shape according to design parameters, and extends along the length direction, and the end part of the cracking heater extends out of the heat shield of the cracking heater.
According to the invention, the cracking heater is a graphite heater coated or covered with a ceramic insulating coating on the surface or a high-temperature metal heater such as tungsten, molybdenum, tantalum, niobium and the like.
According to the invention, the cracking heater is positioned on the upper side and the lower side or on a single side of the cracking plate.
According to the invention, the cracking heating structure is fixed at the upper end of the heat shield of the evaporation heater through a supporting plate.
The invention has the beneficial effects that:
1) According to the invention, two or more independent heaters and independent heat insulation temperature zone structures, namely an evaporation source cavity, an evaporation heater, a cracking heating structure and the like are arranged, so that the process requirements of two or more different process temperatures are realized, the molecular state required by the process is reached, and the better film quality is achieved. From the structure, the materials are independent from each other except the gas passage, the materials enter the cracking plate through the evaporation gas outlet pipe after being evaporated, the gas passage is arranged on the cracking plate so that the evaporation gas outlet pipe is communicated with the cracking gas outlet pipe, the required process temperature is reached through the cracking heater, a specific molecular state is formed, the materials enter the evaporation process area through the cracking gas outlet pipe, the whole process gas is not leaked, and even selenium steam such as strong corrosion can meet the process requirement.
2) The invention puts the evaporation source into the cooling tank and dips into certain height, the cooling tank is equipped with the cooling tube to take away the heat of the bottom of the evaporation source, the PID temperature control of the evaporation heater and the cooling control of the cooling tube are used to make the selenium source reach heat balance, and the amount of the evaporation material gas is stable continuously at the evaporation process temperature.
Drawings
Fig. 1 is a schematic cross-sectional view showing an evaporation apparatus for vapor deposition material gas temperature rising treatment.
Fig. 2 shows a schematic sectional structure in the direction E-E in fig. 1.
Fig. 3 shows a cross-sectional view B-B in fig. 1.
Fig. 4 shows a cross-sectional view of C-C in fig. 1.
Fig. 5 shows a D-D cross-sectional view of fig. 1.
Fig. 6 is a front view showing the entire external structure of the evaporation apparatus for vapor deposition material gas temperature increasing treatment.
Fig. 7 is a plan view showing the entire external structure of the evaporation apparatus for vapor deposition material gas temperature increase treatment.
Fig. 8 is a side view showing the external overall structure of the evaporation apparatus for vapor deposition material gas temperature rising treatment.
Reference numerals: 1. a cooling tank; 2. a cooling tube; 3. an evaporation source cavity; 4. an evaporation heater; 5. a feeding tube; 6. a charging cover plate; 7. evaporating the heater heat shield; 8. a pyrolysis heater heat shield; 9. an evaporation air outlet pipe; 10 splitting plates; 11. a pyrolysis heater; 12. cracking an air outlet pipe; 13. a thermal shielding layer; 14. a thermal insulation material.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention will be further described in detail with reference to the accompanying drawings and examples. It should be emphasized that the specific embodiments described herein are merely illustrative of some, but not all embodiments of the invention, and are not intended to limit the invention. Further, technical features relating to the embodiments of the present invention described below may be combined with each other as long as they do not collide with each other.
Because each material has the evaporating temperature corresponding to the pressure state of the process, the stable output of the evaporating material is achieved at the evaporating temperature, and if the process needs to further treat the gas at high temperature, the gas needs to be heated for the second time or for multiple times by the corresponding heating structure, so that the gas reaches the required molecular state.
As shown in fig. 1 to 8, in order to achieve the above object, the present invention provides an evaporation source for heating an evaporation material in multiple stages, comprising: the evaporation source cavity 3, evaporation heater 4 and schizolysis heating structure, evaporation source cavity 3 are used for holding evaporation source material, and charging tube 5 and evaporation outlet duct 9 have been seted up on its upper portion, and charging tube 5 is used for adding evaporation material and upper end configuration have be used for sealed apron 6.
Wherein, evaporation source cavity 3 can be the cuboid shape, and evaporation heater 4 is equipped with to the upper portion, and the outside is equipped with evaporation heater heat exchanger 7, and evaporation heater heat exchanger 7 covers filling tube 5, sealed apron 6 and evaporation heater 4, forms the enclosure space for evaporation heater 4 and surrounding environment keep apart. The evaporation heater heat shield 7 wraps the feeding pipe 5 and the sealing cover plate 6, so that the temperature of an external process area is ensured not to influence a material source such as a selenium source and the temperature control of the evaporation process is not influenced.
Preferably, the intermediate space portion of the evaporation heater heat shield 7 is provided with a heat insulating material 14 to prevent heat dissipation and keep the temperature of the evaporation heating area constant and controllable.
As shown in fig. 1 and 2, the pyrolysis heating arrangement comprises a pyrolysis plate 10 and a pyrolysis heater 11, the pyrolysis heater 11 being adapted to heat the pyrolysis plate 10, both being arranged above the evaporation heater heat shield 7. The outside of the cracking heating structure is provided with a multi-layer cracking heater heat shield 8, an evaporation gas channel is arranged in the cracking plate 10, and gas enters the process area from a cracking gas outlet pipe 12 through the gas channel in the cracking plate 10. Preferably, the pyrolysis heating structure is fixed at the upper end of the evaporation heater heat shield 7 by a support plate.
According to the invention, the cracking heating structure is externally coated with one or more heat shielding layers 13, the heat shielding layers 13 are arranged along the inner surface of the cracking heater heat shield 8, and the outside of the cracking heater heat shield 8 is reduced to be close to the temperature of a process zone by reducing heat radiation, so that the cracking heat does not influence the temperature field of the process zone.
According to the invention, the evaporation material is fed through the feeding pipe 5, and is covered and sealed by the feeding cover plate 6 after being fed, and the feeding pipe 5 and the feeding cover plate 6 are positioned in the evaporation heater heat shield 7, so that the temperature control in the evaporation heating process is facilitated. The material enters a cracking plate 10 through an evaporation air outlet pipe 9 after evaporation, and a gas channel is arranged on the cracking plate 10 to communicate the evaporation air outlet pipe 9 with a cracking air outlet pipe 12. After the material in the evaporation source cavity is evaporated, the material enters the cracking plate 10 through the evaporation air outlet pipe 9, then enters the evaporation process area after reaching the cracking air outlet pipe 12 through the gas channel on the cracking plate 10, and is heated to the process temperature and the required molecular state by the cracking heater 11 when passing through the gas channel. If the process is needed, the evaporating material gas can be subjected to third and multiple heating treatments, and the corresponding cracking heating structure is changed into three stages and multiple stages.
In the present invention, the evaporating heating zone may be two or more stages, and there are two or more corresponding heaters. As shown in fig. 4, the evaporation heaters 4 are one or more, and are mutually communicated from low temperature to high temperature, and are structurally and independently arranged on the upper surface of the evaporation source cavity in sequence; the evaporation heater 4 is preferably in a "U" shaped structure, the bottom of the "U" shaped structure surrounds the charging pipe 5, the two ends of the opening extend along the length direction of the evaporation source cavity 3, and the ends extend out of the closed space formed by the evaporation heater heat shield 7.
Preferably, the evaporation heater 4 is an armored metal heater, the tail part is of a corrugated pipe structure, the evaporation heater is directly connected to the process cavity or the outside of the vacuum chamber through the corrugated pipe and is reliably sealed, no connection exists in the process cavity or the inside of the vacuum chamber, wiring is conducted in the atmosphere, the evaporation heater is isolated from the vacuum environment, corrosion and other adverse factors of the vacuum environment can not affect the insulation of the evaporation heater, the maintenance is simple, and the heating requirement of less than 700 ℃ can be realized.
Preferably, the evaporation heater 4 may be coated with graphite felt or ceramic felt, and the evaporation heater heat shield 7 at the outermost layer is made of metal material.
Preferably, the cracking heater 11 is preferably a graphite heater coated or covered with a ceramic insulating coating or a high-temperature metal heater of tungsten, molybdenum, tantalum, niobium, or the like. The cracking heater 11 is coated or clad with a ceramic insulating coating on the surface of a graphite heater or coated or clad with a ceramic insulating coating on the surface of a high-temperature metal heater such as tungsten, molybdenum, tantalum, niobium and the like, and the cracking plate 10 is heated, so that the evaporation material gas passing through the cracking plate 10 reaches the required process temperature, and the process requirement of not lower than 1000 ℃ can be realized.
The shape of the cleavage heater 11 is not limited in the present invention, as long as the cleavage plate 10 can be heated. Preferably, as shown in fig. 2, the pyrolysis heater 11 is rectangular, U-shaped or zigzag U-shaped, and extends in the length direction to the outside of the pyrolysis heater heat shield 8.
Preferably, as shown in fig. 1, the evaporation source cavity is arranged in a cooling tank 1, a cooling pipe 2 is arranged in the cooling tank, the cooling tank is cooled through the contact surface of the cooling tank 1 and the evaporation source cavity, and the heat balance when the material evaporation temperature is reached through the control of the cooling pipe 2 and the heating of an evaporation heater 4.
Preferably, the connecting end of the cooling pipe 2 is of a corrugated pipe structure, is directly connected to the outside of the process cavity or the vacuum chamber and is reliably sealed, no connection exists in the process cavity or the vacuum chamber, the connection caused by process gas or corrosive gas is prevented from being unreliable, and the maintenance is simple.
The above description is of the preferred application of the present invention, and it should be noted that it is possible for those skilled in the art to make several improvements and modifications without departing from the technical principle of the present invention, and these improvements and modifications should also be considered as the protection scope of the present invention.
Claims (10)
1. An evaporation source for heating an evaporation material in multiple stages, comprising:
the evaporation source cavity (3) is used for accommodating evaporation source materials, a feeding pipe (5) and an evaporation air outlet pipe (9) are arranged at the upper part of the evaporation source cavity, the feeding pipe (5) is used for adding the evaporation materials, and a sealing cover plate (6) used for sealing is arranged at the upper end of the feeding pipe;
the evaporation heater (4) is arranged above the evaporation source cavity (3) and forms a closed space with an evaporation heater heat shield (7) above the evaporation source cavity (3), and the evaporation heater heat shield (7) covers the feeding pipe (5), the sealing cover plate (6) and the evaporation heater (4) so that the evaporation heater (4) is isolated from the surrounding environment;
the cracking heating structure is arranged above the evaporation heater heat shield (7) and comprises a cracking plate (10) and a cracking heater (11), the cracking heater heat shield (8) is arranged outside the cracking heating structure, and a cracking air outlet pipe (12) which is communicated with the cracking plate (10) and an external evaporation process area is arranged on the surface of the cracking heater heat shield (8);
after the materials in the evaporation source cavity (3) are evaporated, the materials enter the cracking plate (10) through the evaporation air outlet pipe (9), are heated by the cracking heater (11) to reach the required process temperature and molecular state, and enter the evaporation process area after reaching the cracking air outlet pipe (12) through the air channel in the cracking plate (10).
2. The evaporation source according to claim 1, characterized in that the evaporation source cavity (3) is installed in a cooling tank (1), a cooling tube (2) is installed in the cooling tank (1), and the evaporation source cavity (3) is cooled by contact of the cooling tank (1) with the evaporation source cavity.
3. The evaporation source according to claim 1, characterized in that the evaporation heater heat shield (7) is provided with a heat insulating material (14) in the space formed thereby to prevent heat loss and to keep the temperature of the evaporation heating area constant and controllable.
4. The evaporation source according to claim 1, characterized in that the cracking heating structure is externally clad with one or more heat shields (13), the heat shields (13) being arranged along the inner surface of the cracking heater heat shield (8).
5. The evaporation source according to claim 1, characterized in that the evaporation heater (4) is one or more, from low temperature to high temperature, mutually communicated, and structurally and sequentially installed on the upper surface of the evaporation source cavity (3) independently of each other.
6. The evaporation source according to claim 5, characterized in that the evaporation heater (4) has a "U" shaped structure, and the "U" shaped bottom surrounds the feed tube (5), the open ends extend along the length of the evaporation source cavity (3) and the ends extend out of the enclosed space formed by the evaporation heater heat shield (7).
7. The evaporation source according to claim 1, characterized in that the evaporation heater (4) is an armoured metal heater, the tail part is a corrugated pipe structure, and the evaporation heater is directly connected to the process cavity or the outside of the vacuum chamber through the corrugated pipe and is reliably sealed.
8. The evaporation source according to claim 1, characterized in that the cracking heater (11) has a rectangular or U-shaped structure, which extends in the length direction and ends protruding outside the cracking heater heat shield (8); preferably, the cracking heater (11) is of a zigzag U-shaped structure.
9. The evaporation source according to claim 1, characterized in that the cracking heater (11) is a graphite heater coated or coated with a ceramic insulating coating or a tungsten, molybdenum, tantalum, niobium high temperature metal heater coated or coated with a ceramic insulating coating.
10. The evaporation source according to claim 1, characterized in that the cracking heater (11) is located on both upper and lower sides or on a single side of the cracking plate (10).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210295599.0A CN116837326A (en) | 2022-03-23 | 2022-03-23 | Evaporation source for carrying out multistage heating on evaporation material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210295599.0A CN116837326A (en) | 2022-03-23 | 2022-03-23 | Evaporation source for carrying out multistage heating on evaporation material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN116837326A true CN116837326A (en) | 2023-10-03 |
Family
ID=88173002
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202210295599.0A Pending CN116837326A (en) | 2022-03-23 | 2022-03-23 | Evaporation source for carrying out multistage heating on evaporation material |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN116837326A (en) |
-
2022
- 2022-03-23 CN CN202210295599.0A patent/CN116837326A/en active Pending
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