CN116804255A - Preparation method of high-magnetic-induction oriented silicon steel ultrathin strip with excellent adhesion - Google Patents
Preparation method of high-magnetic-induction oriented silicon steel ultrathin strip with excellent adhesion Download PDFInfo
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- 229910000976 Electrical steel Inorganic materials 0.000 title claims abstract description 32
- 238000002360 preparation method Methods 0.000 title claims abstract description 9
- 239000011248 coating agent Substances 0.000 claims abstract description 41
- 238000000576 coating method Methods 0.000 claims abstract description 41
- 238000000137 annealing Methods 0.000 claims abstract description 31
- 238000005097 cold rolling Methods 0.000 claims abstract description 28
- 239000000463 material Substances 0.000 claims abstract description 22
- 238000000034 method Methods 0.000 claims abstract description 22
- 230000006698 induction Effects 0.000 claims abstract description 19
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 19
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 11
- 238000001035 drying Methods 0.000 claims description 7
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 claims description 6
- 239000004327 boric acid Substances 0.000 claims description 6
- RGPUVZXXZFNFBF-UHFFFAOYSA-K diphosphonooxyalumanyl dihydrogen phosphate Chemical compound [Al+3].OP(O)([O-])=O.OP(O)([O-])=O.OP(O)([O-])=O RGPUVZXXZFNFBF-UHFFFAOYSA-K 0.000 claims description 6
- 239000011347 resin Substances 0.000 claims description 6
- 229920005989 resin Polymers 0.000 claims description 6
- 229910052785 arsenic Inorganic materials 0.000 claims description 5
- 229910052742 iron Inorganic materials 0.000 claims description 5
- HCWCAKKEBCNQJP-UHFFFAOYSA-N magnesium orthosilicate Chemical compound [Mg+2].[Mg+2].[O-][Si]([O-])([O-])[O-] HCWCAKKEBCNQJP-UHFFFAOYSA-N 0.000 claims description 5
- 239000000391 magnesium silicate Substances 0.000 claims description 5
- 229910052919 magnesium silicate Inorganic materials 0.000 claims description 5
- 235000019792 magnesium silicate Nutrition 0.000 claims description 5
- 230000009467 reduction Effects 0.000 claims description 5
- 230000002441 reversible effect Effects 0.000 claims description 4
- 239000012535 impurity Substances 0.000 claims description 3
- 239000012752 auxiliary agent Substances 0.000 claims description 2
- 239000003973 paint Substances 0.000 claims description 2
- 239000002131 composite material Substances 0.000 claims 1
- 230000000052 comparative effect Effects 0.000 description 15
- 238000004519 manufacturing process Methods 0.000 description 9
- 230000008569 process Effects 0.000 description 9
- 238000001953 recrystallisation Methods 0.000 description 8
- 238000012545 processing Methods 0.000 description 6
- 238000005098 hot rolling Methods 0.000 description 5
- 238000005096 rolling process Methods 0.000 description 4
- 239000013078 crystal Substances 0.000 description 3
- 239000003112 inhibitor Substances 0.000 description 3
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 239000008199 coating composition Substances 0.000 description 2
- 239000000696 magnetic material Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000011056 performance test Methods 0.000 description 2
- 238000004321 preservation Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 238000009628 steelmaking Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000010953 base metal Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000011162 core material Substances 0.000 description 1
- 238000005261 decarburization Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- WMYWOWFOOVUPFY-UHFFFAOYSA-L dihydroxy(dioxo)chromium;phosphoric acid Chemical compound OP(O)(O)=O.O[Cr](O)(=O)=O WMYWOWFOOVUPFY-UHFFFAOYSA-L 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000005121 nitriding Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000010301 surface-oxidation reaction Methods 0.000 description 1
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- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/02—Ferrous alloys, e.g. steel alloys containing silicon
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- C21—METALLURGY OF IRON
- C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
- C21D1/00—General methods or devices for heat treatment, e.g. annealing, hardening, quenching or tempering
- C21D1/26—Methods of annealing
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- C21D1/00—General methods or devices for heat treatment, e.g. annealing, hardening, quenching or tempering
- C21D1/74—Methods of treatment in inert gas, controlled atmosphere, vacuum or pulverulent material
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- C21—METALLURGY OF IRON
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- C21D8/00—Modifying the physical properties by deformation combined with, or followed by, heat treatment
- C21D8/12—Modifying the physical properties by deformation combined with, or followed by, heat treatment during manufacturing of articles with special electromagnetic properties
- C21D8/1216—Modifying the physical properties by deformation combined with, or followed by, heat treatment during manufacturing of articles with special electromagnetic properties the working step(s) being of interest
- C21D8/1233—Cold rolling
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- C21D8/00—Modifying the physical properties by deformation combined with, or followed by, heat treatment
- C21D8/12—Modifying the physical properties by deformation combined with, or followed by, heat treatment during manufacturing of articles with special electromagnetic properties
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- C21D8/1272—Final recrystallisation annealing
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- C21D8/00—Modifying the physical properties by deformation combined with, or followed by, heat treatment
- C21D8/12—Modifying the physical properties by deformation combined with, or followed by, heat treatment during manufacturing of articles with special electromagnetic properties
- C21D8/1277—Modifying the physical properties by deformation combined with, or followed by, heat treatment during manufacturing of articles with special electromagnetic properties involving a particular surface treatment
- C21D8/1283—Application of a separating or insulating coating
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Abstract
AttachmentThe preparation method of the high magnetic induction oriented silicon steel ultrathin strip with excellent performance comprises the following steps: selecting a parent material; cold rolling; annealing; coating; and (5) standby application. The thickness of the product is 0.03-0.12 mm, and the invention ensures that B 800 Is 1.90-1.98T and loss P 1.5/400 The A-level proportion of the coating adhesion is more than 95 percent (round bar method) and can meet the requirements of the power electronics industry on low loss, high magnetic induction, medium and high frequency use.
Description
Technical Field
The invention relates to a production method of oriented silicon steel, in particular to a preparation method of an extremely-thin strip of high-magnetic-induction oriented silicon steel with excellent adhesiveness.
Background
The oriented silicon steel ultrathin strip is obtained by cold rolling and annealing a traditional oriented silicon steel product, is mainly used as a high-frequency transformer, a high-power magnetic amplifier, a pulse transformer, a pulse generator, a communication choke coil, an inductance, a storage and memory element and a transformer working under vibration and radiation conditions, shows extremely low iron loss in the frequency range of 400 Hz-1000 Hz, and is regarded as a transformer iron core material for higher frequencies. The existing coating of the oriented silicon steel ultrathin strip is mainly a phosphate-chromate insulating coating, and has certain problems of insulativity and adhesiveness before and after stress relief annealing, and meanwhile, the oriented silicon steel ultrathin strip has some problems in production cost (such as higher cost caused by secondary rolling), product quality (magnetic induction cannot reach 1.92T) and the like.
The document of Chinese patent application No. CN201510239650.6 discloses a production method of an ultrathin oriented silicon steel strip with the thickness of 0.02mm, which comprises the following steps: (1) first cold rolling: adopting ordinary oriented silicon steel as a steel strip raw material, and performing first cold rolling under the condition of ensuring a certain deformation rate range at room temperature; (2) intermediate annealing: intermediate annealing is carried out in a reducing atmosphere, and the annealing temperature is 750-1150 ℃ to form a recrystallization structure; (3) second cold rolling: at room temperature, ensuring a certain deformation rate range, performing secondary cold rolling, wherein the final rolling thickness is 0.02mm; (4) recrystallization annealing: carrying out recrystallization annealing in a reducing atmosphere at 750-1150 ℃ to form a recrystallization structure; (5) coating: and continuously coating an insulating coating to obtain the ultrathin oriented silicon steel thin strip. This document requires two passes, resulting in increased production costs.
The document with the Chinese patent application number of CN201810126373.1 discloses an ultrathin oriented silicon steel plate and a preparation method thereof: the process comprises the following steps: (1) Cold rolling the sheet without the bottom layer for 1-5 times to obtain a cold-rolled sheet with the thickness of 0.01-0.1 mm; (2) Cold-rolled sheet is processed in H 2 Recrystallizing and annealing in a continuous annealing furnace in atmosphere to obtain an annealed plate; (3) And coating a coating with the thickness of 0.1-2 mu m on the surface of the annealed plate to obtain the ultrathin oriented silicon steel plate. The thickness of the ultrathin oriented silicon steel plate prepared by the document is 0.01-0.1 mm, and the loss P of the strip is reduced 1.5T/400Hz The magnetic flux density B is 9W/kg to 16W/kg 8 The temperature is 1.75 to 1.90T, and can meet the requirements of low-loss and high-magnetic induction medium-frequency soft magnetic materials in the existing electric and electronic industry equipment such as reactors, sensors and the like. The document B 8 The temperature is 1.75 to 1.90T, and the highest temperature is 1.90T, so that the requirements of low-loss and high-magnetic induction medium-frequency soft magnetic materials in devices such as reactors and sensors in the electric power industry and the electronic industry cannot be met.
The Chinese patent with the application number of CN201911126524.4 discloses oriented silicon steel capable of reducing surface hardness and a preparation method thereof: (1) Steelmaking, wherein the Als content is controlled to be 0.020% -0.035%, the N content is controlled to be 0.0050% -0.0100%, the Mn content is controlled to be 0.010% -1.00%, the S content is controlled to be 0.0030% -0.0300%, and one or more of a small amount of P, cu, sn, bi, sb, cr and As (P+Cu+Sn+Bi+Sb+Cr+As is less than or equal to 1.80%) is added in the steelmaking process As an auxiliary inhibitor; (2) Hot rolling after heating at 1100-1400 deg.c; (3) Normalizing position of hot rolled plate at 1000-1150 DEG CAfter primary cold rolling, decarburization annealing, nitriding treatment (the hot rolled slab is not nitrided when heated at the temperature of more than or equal to 1260 ℃), magnesia isolating coating and high-temperature annealing, obtaining magnesium silicate-free bottom oriented silicon steel with the thickness of 0.15-0.50 mm, and coating a semi-organic insulating coating containing aqueous resin, aluminum dihydrogen phosphate and boric acid, obtaining B 800 ≥1.83T,P 17 And the performance of the semi-organic insulating coating oriented silicon steel product is less than or equal to 1.50W/kg. The thickness of the finished oriented silicon steel product prepared by the method is 0.15-0.50 mm, and the oriented silicon steel product is oriented silicon steel with the traditional thickness specification and is suitable for magnetic performance at power frequency of 50 Hz.
Disclosure of Invention
The invention aims to overcome the defects in the prior art, provides a product with the thickness of 0.03-0.12 mm and B 800 Is 1.90-1.98T and loss P 1.5/400 The coating adhesion A grade ratio is more than 95 percent (round bar method) and is 7.50-16.50W/kg, so as to meet the requirements of the power electronics industry on the preparation method of the high magnetic induction oriented silicon steel ultrathin strip with excellent adhesion of the low-loss high magnetic induction middle-high frequency oriented silicon steel material.
Measures for achieving the above object:
a preparation method of a high magnetic induction oriented silicon steel ultrathin strip with excellent adhesiveness comprises the following steps:
1) Base material
The base material comprises the following components in percentage by weight: si:2.80 to 3.60 percent of Mn:0.01% to
1.00% of a complex containing one or more of P, cu, sn, bi, sb, cr and As, and
satisfying (P+Cu+Sn+Bi+Sb+Cr+As) less than or equal to 1.80%, and the balance being iron and unavoidable impurities;
base material performance: no magnesium silicate bottom layer along the whole plate surface of the plate width, B 800 ≥1.89T,P 1.7/50 ≤
1.45W/kg;
2) Cold rolling
Cold rolling at normal temperature; the cold rolling accumulated reduction rate is not lower than 65 percent, and the cold rolling accumulated reduction rate is reversible for 2 to 10 times
Cold rolling to obtain a product with the thickness of 0.03-0.12 mm;
3) Annealing is carried out
The annealing atmosphere is dry H 2 And N 2 Or all H 2 The method comprises the steps of carrying out a first treatment on the surface of the H in the mixed gas 2 Not less than 50% by volume, the balance being N 2 The method comprises the steps of carrying out a first treatment on the surface of the The annealing temperature is controlled between 750 and 1050 ℃, and the temperature is kept for 30 to 300 seconds;
4) Coating is carried out
a. Coating a semi-organic water-based insulating coating on the surface of the strip, and controlling the thickness of the single-sided coating to be 0.05-2.00 mu m; b. curing the coating: the curing temperature is controlled between 150 and 850 ℃, and the temperature is kept for 30 to 180 seconds;
C. conventional drying is carried out, and the content of non-volatile matters after drying is controlled to be 30-80%;
5) And (5) standby application.
The method comprises the following steps: the semi-organic water-based insulating paint comprises the following components in percentage by weight: 2.0 to 30.0 percent of water-based resin, 10.0 to 50.0 percent of aluminum dihydrogen phosphate, 1.0 to 10.0 percent of boric acid, 1.0 to 5.0 percent of water-based auxiliary agent and the balance of water.
Preferably: the curing temperature is controlled between 162 and 839 ℃, and the temperature is kept between 33 and 176 seconds.
Preferably: the thickness of the single-sided coating is 0.05-1.92 mu m.
The action and mechanism of each raw material and main process in the invention
The invention adopts a one-time rolling normal temperature cold rolling process, and obtains the cold-rolled strip through 2-10 times of reversible cold rolling, ensures that the cold rolling reduction rate is more than 65%, and the thickness of the cold-rolled finished strip is 0.03-0.12 mm, so that the manufacturing cost of the cold rolling process is reduced, and the excellent finished product performance of the oriented silicon steel ultrathin strip is ensured.
The invention carries out finished product annealing in reducing atmosphere, the annealing temperature is 750-1050 ℃, the heat preservation time is 30-300S, and the protective atmosphere is dry H 2 And N 2 In the atmosphere H 2 The volume content of (2) is 50-100%, so that the cold-rolled deformed structure is recovered and recrystallized, and a sufficient quantity of [110 ] is formed in the matrix](001) The crystal nucleus (Gaussian crystal nucleus) grows to form a crystal with Gaussian grains as the main materialAnd minimizing surface oxidation of the very thin strips.
The invention coats a semi-organic water-based insulating coating with single-sided thickness of 0.05 mu m-2.00 on the surface of the strip, and controls the curing temperature of the coating to be 150-850 ℃ and the curing heat preservation time to be 30-180S, thereby ensuring that excellent adhesion of the ultrathin strip finished product is obtained.
In addition, the resistivity can be improved and the iron loss can be reduced by adding Si into the base material, but the processing brittleness can be caused by the improvement of the Si content, so that the Si content needs to be controlled to ensure the processing property, and the Si content is between 2.80 and 3.60 percent; mn in the base material is an element which is favorable for separating out MnS, alN is taken as a main inhibitor in the production of oriented silicon steel by a low-temperature hot rolling process at 1100-1200 ℃, and the eddy current loss can be reduced due to the increase of the Mn content, so that the Mn content is controlled to be 0.010-1.00%; one or more of P, cu, sn, bi, sb, cr and As are mainly used As auxiliary inhibitors, and the eddy current loss can be reduced, but the content is not too high, so that the content of (P+Cu+Sn+Bi+Sb+Cr+As) is controlled to be less than or equal to 1.80%; the base material has no magnesium silicate bottom layer along the whole plate surface of the plate width, the plate surface is clean and smooth, the secondary recrystallization grain size is uniform, the re-rolling processing is facilitated, the processing efficiency is improved, B 800 ≥1.89T、P 1.7/50 The magnetic property of the base metal is excellent and is beneficial to obtaining the excellent finished product property of the oriented silicon steel ultrathin strip, wherein the W/kg is less than or equal to 1.45.
Compared with the prior art, the invention not only has the thickness of 0.03-0.12 mm, but also ensures that the thickness of B 800 Is 1.90-1.98T and loss P 1.5/400 The A-level proportion of the coating adhesiveness is more than 95 percent, which is 7.50 to 16.50W/kg
The requirement of the power electronics industry on low-loss and high-magnetic induction medium-high frequency can be met.
Detailed Description
The present invention will be described in detail below:
table 1 is a table showing the chemical composition and annealing process values of the examples and comparative examples of the present invention;
table 2 shows the coating composition and curing process parameters of each example and comparative example of the present invention;
table 3 shows a list of performance tests for each of the examples and comparative examples of the present invention.
The embodiments of the invention were produced according to the following steps
1) Base material
The base material comprises the following components in percentage by weight: si:2.80 to 3.60 percent of Mn:0.01% to
1.00% of a complex containing one or more of P, cu, sn, bi, sb, cr and As, and
satisfying (P+Cu+Sn+Bi+Sb+Cr+As) less than or equal to 1.80%, and the balance being iron and unavoidable impurities;
base material performance: no magnesium silicate bottom layer along the whole plate surface of the plate width, B 800 ≥1.89T,P 1.7/50 ≤
1.45W/kg;
2) Cold rolling
Cold rolling at normal temperature; the product with the thickness of 0.03 mm-0.12 mm is obtained through 2-10 times of reversible cold rolling under the condition that the cold rolling accumulated reduction is not lower than 65%;
3) Annealing is carried out
The annealing atmosphere is dry H 2 And N 2 Or all H 2 The method comprises the steps of carrying out a first treatment on the surface of the H in the mixed gas 2 Not less than 50% by volume, the balance being N 2 The method comprises the steps of carrying out a first treatment on the surface of the The annealing temperature is controlled between 750 and 1050 ℃, and the temperature is kept for 30 to 300 seconds;
4) Coating is carried out
a. Coating a semi-organic water-based insulating coating on the surface of the strip, and controlling the thickness of the single-sided coating to be 0.05-2.00 mu m; b. curing the coating: the curing temperature is controlled between 150 and 850 ℃, and the temperature is kept for 30 to 180 seconds;
C. conventional drying is carried out, and the content of non-volatile matters after drying is controlled to be 30-80%;
5) And (5) standby application.
Table 1 list of chemical compositions and annealing process values for each of the examples and comparative examples of the present invention
As can be seen from Table 1, in comparative example Q1, the base material Si of the oriented silicon steel without magnesium silicate bottom layer is less than 2.80%, mn is less than 0.010%, the Si and Mn contents are low, and the base material magnetic induction B 800 Low loss P 1.7/50 High, resulting in extremely thin band loss P 1.5/400 The alloy is higher than 1.80 percent (P+Cu+Sn+Bi+Sb+Cr+As), so that the processing difficulty of hot rolling and cold rolling is increased, the production cost is increased, the annealing temperature is less than 750 ℃, the annealing time is more than 300S, recrystallized grains grow up, the overall performance of the ultrathin strip finished product is reduced, and H is protected in the atmosphere 2 The volume content of the product is less than 50%, and the recrystallization is incomplete, so that the performance of the finished product of the ultrathin strip is wholly reduced; comparative example Q2 has a base material Si of less than 2.80%, mn of less than 0.010%, si and Mn content lower, and base material magnetic induction B 800 Low base material loss P 1.7/50 High, resulting in extremely thin band loss P 1.5/400 The alloy is higher than 1.80 percent (P+Cu+Sn+Bi+Sb+Cr+As), so that the processing difficulty of hot rolling and cold rolling is increased, the production cost is increased, the annealing temperature is less than 750 ℃, the annealing time is more than 300S, recrystallized grains grow up, the overall performance of the ultrathin strip finished product is reduced, and H is protected in the atmosphere 2 The volume content of the product is less than 50%, and the recrystallization is incomplete, so that the performance of the finished product of the ultrathin strip is wholly reduced; in comparative example Q3, the base material Si is more than 3.60%, mn is more than 1.00%, the content of (P+Cu+Sn+Bi+Sb+Cr+As) is more than 1.80%, the content of Si and Mn is higher, the difficulty of hot rolling and cold rolling is increased, the production cost is increased, meanwhile, mn is more than 1.00%, the performance of the base material is reduced As a whole, and the magnetic induction B is improved 800 Low loss P 1.7/50 The overall performance of the ultrathin strip is reduced due to the higher temperature, the annealing temperature is more than 1050 ℃, the annealing time is less than 30S, recrystallized grains grow up, the overall performance of the ultrathin strip is reduced, and H is protected in the atmosphere 2 The volume content of the product is less than 50%, and the recrystallization is incomplete, so that the performance of the finished product of the ultrathin strip is wholly reduced.
TABLE 2 list of the main process parameters (coating composition, curing Process) for each example of the invention and comparative example
Description: the semi-organic aqueous insulating coating in Table 2 was water except for the materials listed.
The comparative example Q1 has water resin less than 2.00%, aluminum dihydrogen phosphate less than 10.00%, boric acid less than 1.00%, water assistant less than 1.00%, the non-volatile component content of the coating after drying less than 30%, the film thickness less than 0.05 μm, the curing temperature less than 150 ℃, the curing time more than 180S, and the adhesiveness of the ultrathin strip finished product is reduced; comparative example Q2 has water resin less than 2.00%, aluminum dihydrogen phosphate less than 10.00%, boric acid less than 1.00%, water assistant less than 1.00%, and after the coating is dried, the nonvolatile content is less than 30%, the curing temperature is more than 850 ℃, the curing time is less than 30S, the adhesiveness of the ultrathin strip finished product is reduced, the film thickness is more than 2.00 mu m, resulting in the ultrathin strip finished product loss P 1.5/400 Rise and overall performance is reduced; comparative example Q3 has water resin less than 2.00%, aluminum dihydrogen phosphate less than 10.00%, boric acid less than 1.00%, water assistant less than 1.00%, and after the coating is dried, the nonvolatile content is less than 30%, the curing temperature is more than 850 ℃, the curing time is less than 30S, the adhesiveness of the ultrathin strip finished product is reduced, the film thickness is more than 2.00 μm, resulting in the ultrathin strip finished product loss P 1.5/400 Rise and overall performance is reduced.
TABLE 3 Performance test cases list for examples and comparative examples of the present invention
Magnetic induction B of the extremely thin strip product in comparative example Q1 800 Less than 1.85T, loss P 1.5/400 > 16.50W/kg, lower grade A ratio of coating adhesion (42%); magnetic induction B of the ultra-thin strip finished product in comparative example Q2 800 Less than 1.85T, loss P 1.5/400 > 16.50W/kg, lower grade A ratio of coating adhesion (37%); magnetic induction B of the ultra-thin strip finished product in comparative example Q3 800 Less than 1.85T, loss P 1.5/400 The coating adhesion A scale is low, only 36%, with a W/kg of > 16.50.
This embodiment is merely a best example and is not intended to limit the implementation of the technical solution of the present invention.
Claims (4)
1. A preparation method of a high magnetic induction oriented silicon steel ultrathin strip with excellent adhesiveness comprises the following steps:
1) Base material
The base material comprises the following components in percentage by weight: si:2.80 to 3.60 percent of Mn:0.01 to 1.00 percent of composite containing one or more of P, cu, sn, bi, sb, cr and As and meeting the requirements of (P+Cu+Sn+Bi+Sb+Cr+As)
Less than or equal to 1.80 percent, and the balance of iron and unavoidable impurities;
base material performance: no magnesium silicate bottom layer along the whole plate surface of the plate width, B 800 ≥1.89T,P 1.7/50 ≤1.45W/kg;
2) Cold rolling
Cold rolling at normal temperature; the product with the thickness of 0.03 mm-0.12 mm is obtained through 2-10 times of reversible cold rolling under the condition that the cold rolling accumulated reduction is not lower than 65%;
3) Annealing is carried out
The annealing atmosphere is dry H 2 And N 2 Or all H 2 The method comprises the steps of carrying out a first treatment on the surface of the H in the mixed gas 2 Not less than 50% by volume, the balance being N 2 The method comprises the steps of carrying out a first treatment on the surface of the The annealing temperature is controlled between 750 and 1050 ℃, and the temperature is kept for 30 to 300 seconds;
4) Coating is carried out
a. Coating a semi-organic water-based insulating coating on the surface of the strip, and controlling the thickness of the single-sided coating to be 0.05-2.00 mu m;
b. curing the coating: the curing temperature is controlled between 150 and 850 ℃, and the temperature is kept for 30 to 180 seconds;
C. conventional drying is carried out, and the content of non-volatile matters after drying is controlled to be 30-80%;
5) And (5) standby application.
2. The method for preparing the high magnetic induction oriented silicon steel ultrathin strip with excellent adhesiveness according to claim 1, which is characterized in that: the semi-organic water-based insulating paint comprises the following components in percentage by weight: 2.0 to 30.0 percent of water-based resin, 10.0 to 50.0 percent of aluminum dihydrogen phosphate, 1.0 to 10.0 percent of boric acid, 1.0 to 5.0 percent of water-based auxiliary agent and the balance of water.
3. The method for preparing the high magnetic induction oriented silicon steel ultrathin strip with excellent adhesiveness according to claim 1, which is characterized in that: the curing temperature is controlled between 162 and 839 ℃, and the temperature is kept between 33 and 176 seconds.
4. The method for preparing the high magnetic induction oriented silicon steel ultrathin strip with excellent adhesiveness according to claim 1, which is characterized in that: the thickness of the single-sided coating is 0.05-1.92 mu m.
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CN108018489A (en) * | 2017-12-15 | 2018-05-11 | 武汉钢铁有限公司 | A kind of economical high magnetic induction grain-oriented silicon steel and production method |
CN110964977A (en) * | 2019-11-18 | 2020-04-07 | 武汉钢铁有限公司 | Oriented silicon steel capable of reducing surface hardness and preparation method thereof |
CN111100978A (en) * | 2019-11-18 | 2020-05-05 | 武汉钢铁有限公司 | Oriented silicon steel capable of improving coating adhesion performance and preparation method thereof |
CN111334653A (en) * | 2020-03-26 | 2020-06-26 | 武汉钢铁有限公司 | High magnetic induction oriented silicon steel and preparation method thereof |
CN116219135A (en) * | 2023-01-18 | 2023-06-06 | 无锡华精新材股份有限公司 | Preparation method of ultrathin high-magnetic-induction oriented silicon steel |
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Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
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CN108018489A (en) * | 2017-12-15 | 2018-05-11 | 武汉钢铁有限公司 | A kind of economical high magnetic induction grain-oriented silicon steel and production method |
CN110964977A (en) * | 2019-11-18 | 2020-04-07 | 武汉钢铁有限公司 | Oriented silicon steel capable of reducing surface hardness and preparation method thereof |
CN111100978A (en) * | 2019-11-18 | 2020-05-05 | 武汉钢铁有限公司 | Oriented silicon steel capable of improving coating adhesion performance and preparation method thereof |
CN111334653A (en) * | 2020-03-26 | 2020-06-26 | 武汉钢铁有限公司 | High magnetic induction oriented silicon steel and preparation method thereof |
CN116219135A (en) * | 2023-01-18 | 2023-06-06 | 无锡华精新材股份有限公司 | Preparation method of ultrathin high-magnetic-induction oriented silicon steel |
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