CN116770421B - Graphite boat for horizontal liquid phase epitaxial growth - Google Patents
Graphite boat for horizontal liquid phase epitaxial growth Download PDFInfo
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- CN116770421B CN116770421B CN202310809117.3A CN202310809117A CN116770421B CN 116770421 B CN116770421 B CN 116770421B CN 202310809117 A CN202310809117 A CN 202310809117A CN 116770421 B CN116770421 B CN 116770421B
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- mother liquor
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- liquid phase
- tank
- epitaxial growth
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- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 title claims abstract description 53
- 229910002804 graphite Inorganic materials 0.000 title claims abstract description 53
- 239000010439 graphite Substances 0.000 title claims abstract description 53
- 239000007791 liquid phase Substances 0.000 title claims abstract description 49
- 239000012452 mother liquor Substances 0.000 claims abstract description 184
- 239000000758 substrate Substances 0.000 claims abstract description 177
- 238000007599 discharging Methods 0.000 claims abstract description 8
- 230000013011 mating Effects 0.000 claims description 6
- 238000005452 bending Methods 0.000 claims description 3
- 239000010413 mother solution Substances 0.000 abstract description 43
- 239000010408 film Substances 0.000 description 30
- 239000000463 material Substances 0.000 description 21
- 238000000034 method Methods 0.000 description 19
- 238000004943 liquid phase epitaxy Methods 0.000 description 16
- 230000008569 process Effects 0.000 description 15
- 238000009826 distribution Methods 0.000 description 10
- 230000005484 gravity Effects 0.000 description 9
- 230000000694 effects Effects 0.000 description 7
- 238000001816 cooling Methods 0.000 description 6
- 238000000407 epitaxy Methods 0.000 description 6
- 239000007788 liquid Substances 0.000 description 6
- 239000010409 thin film Substances 0.000 description 6
- 229910000661 Mercury cadmium telluride Inorganic materials 0.000 description 5
- 230000009471 action Effects 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- 238000012797 qualification Methods 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 229910004262 HgTe Inorganic materials 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- MCMSPRNYOJJPIZ-UHFFFAOYSA-N cadmium;mercury;tellurium Chemical compound [Cd]=[Te]=[Hg] MCMSPRNYOJJPIZ-UHFFFAOYSA-N 0.000 description 2
- 230000001276 controlling effect Effects 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 238000001451 molecular beam epitaxy Methods 0.000 description 2
- 238000007790 scraping Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000008859 change Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000005501 phase interface Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000005204 segregation Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000000927 vapour-phase epitaxy Methods 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Abstract
The invention discloses a graphite boat for horizontal liquid phase epitaxial growth. The graphite boat for horizontal liquid phase epitaxial growth comprises a base, wherein a mother liquor discharge tank is arranged; the substrate placing piece comprises a placing piece body and a substrate clamp, the placing piece body is provided with a clamp mounting groove, the substrate clamp is arranged in the clamp mounting groove in a sliding manner in the vertical direction, the substrate clamp is provided with a substrate groove for placing a substrate, and the placing piece body is connected with the base and forms a sliding space between the placing piece body and the base; the mother liquor accommodating part is arranged in the sliding space in a sliding way and is provided with a mother liquor tank for accommodating mother liquor; the clamp mounting groove and the mother liquor discharging groove are arranged in an offset manner in the vertical direction, and when the mother liquor accommodating piece slides to a first preset position, the clamp mounting groove is communicated with the mother liquor groove; when the mother liquor accommodating part slides to the second preset position, the mother liquor tank is communicated with the mother liquor discharge tank. The substrate level is automatically adjusted by utilizing the buoyancy generated by the mother solution, so that the quality of the horizontal liquid phase epitaxial growth film is improved.
Description
Technical Field
The invention relates to the technical field of graphite boats, in particular to a horizontal liquid phase epitaxial growth graphite boat.
Background
The liquid phase epitaxy technology is a mature III-V or II-VI compound semiconductor single crystal film growth technology, the near-equilibrium growth provides the crystal quality of an epitaxial layer material, the grown material has higher mobility and carrier life, the prepared photoelectric device has small dark current, the deposition efficiency of the material is high, and the epitaxial growth cost is low. The method is widely applied to the preparation process of II-VI family and II-VI family compound semiconductor materials such as HgCdTe and the like.
The HgCdTe material is formed by mixing HgTe with a negative energy gap and CdTe with a positive energy gap, is a (HgTe) 1-x (CdTe) x pseudo-binary compound material with a direct energy gap, can cover the whole infrared band by adjusting the photon wavelength corresponding to the energy gap of the HgCdTe by adjusting the component x of the material, and is an ideal infrared detector material. The detector materials are currently the most widely used in the infrared detection field. At present, various methods such as LPE (liquid phase epitaxy), MOVPE (metal organic vapor phase epitaxy), MBE (molecular beam epitaxy) and the like can be adopted to prepare a plurality of high-quality Hg1-xCdxTe epitaxial films and high-performance infrared detection devices, but the horizontal liquid phase epitaxy has the advantages of easy component change, strong component and thickness control capability, good repeatability, high technical crystal quality and the like, and is the most mature and most widely applied film material preparation method in the prior art, and particularly, the method is still the most main detector material preparation mode in the fields of long waves and very long waves.
In a system for growing a film material by adopting a horizontal liquid phase epitaxy technology, the use of a horizontal sliding graphite boat is very common, and the basic process is as follows: according to the requirements of required film components, firstly, accurately weighing a certain component ratio of growth mother liquor, placing the growth mother liquor in a mother liquor tank of a graphite boat, heating the graphite boat until the mother liquor is completely and uniformly melted, controlling a certain cooling rate to slowly cool the graphite boat, reducing the solubility of solute in a liquid solvent along with the reduction of temperature, when the solution reaches a saturated state, pulling a graphite boat slide bar to enable a substrate to move to the position right below the mother liquor, cooling to supercool the mother liquor, controlling the growth rate, and crystallizing and growing film materials with the thickness of about several to more than ten micrometers on the surface of the substrate, so that the epitaxial growth of the film can be realized. The liquid phase epitaxial film materials with different components can be obtained by adjusting the formula of the liquid phase epitaxial mother solution.
However, as the infrared focal plane detector of mercury cadmium telluride develops towards high density, large area array, high working temperature, high frame frequency and polychromatization, higher requirements are put on the uniformity of the mercury cadmium telluride thin film material, mainly comprising uniformity of thickness, components, electrical parameters and dislocation distribution. Wherein, the thickness is closely related to the uniformity of the components, and is influenced by the growth rate of each region by the solid-liquid interface distribution in the epitaxial growth process; the electrical parameters and uniformity of dislocation distribution are mainly affected by the component segregation effects and are also essentially determined by the growth rate and uniformity of distribution. The epitaxial growth rate is mainly influenced by the temperature field of a graphite boat and the distribution gradient of solute in the solution, and in the epitaxial growth process of the tellurium-cadmium-mercury film, the distribution gradient, horizontal inclination and temperature field non-uniformity of the solute content in the solution influence the distribution uniformity of a tellurium-cadmium-mercury solid-liquid phase interface on the surface of a substrate, so that the overcooling degree and the growth rate of different areas on the surface of the substrate are inconsistent, and the uniformity of the tellurium-cadmium-mercury film material is influenced.
The existing horizontal liquid phase epitaxy graphite boat is used for placing the substrate below tellurium-cadmium-mercury mother solution, so that the graphite boat is required to have good horizontal placement degree for ensuring the quality of the thin film, and is obviously influenced by factors such as convection of the mother solution and gravity, so that the large-area material has larger epitaxial thickness distribution difference, and the quality of the thin film is reduced; in addition, on the basis of high growth temperature and strong fluidity of mother solution, the condition that mother solution is easy to remain on the surface of a film in a large area in the liquid phase epitaxial growth process, a scraper and other structures are generally arranged to remove the residual mother solution, and in the process of removing the residual mother solution, the phenomenon that the surface of the film is scratched often occurs, so that the qualification rate of the film is reduced.
Therefore, how to improve the quality and qualification rate of the horizontal liquid phase epitaxial growth film is a technical problem that needs to be solved by the skilled in the art.
Disclosure of Invention
In view of the above, the present invention is to provide a graphite boat for horizontal liquid phase epitaxy growth to improve the quality and yield of the thin film for horizontal liquid phase epitaxy growth.
In order to achieve the above object, the present invention provides the following technical solutions:
a horizontal liquid phase epitaxial growth graphite boat comprising:
a base provided with a mother liquor discharge tank;
the substrate placing part comprises a placing part body and a substrate clamp, wherein the placing part body is provided with a clamp mounting groove, the substrate clamp is arranged in the clamp mounting groove in a sliding manner in the vertical direction, the substrate clamp is provided with a substrate groove for placing a substrate, and the placing part body is connected with the base and forms a sliding space between the placing part body and the base;
the mother liquor accommodating part is arranged in the sliding space in a sliding way, and is provided with a mother liquor tank for accommodating mother liquor;
the clamp mounting groove and the mother liquor discharging groove are arranged in an offset mode in the vertical direction, and when the mother liquor accommodating piece slides to a first preset position, the clamp mounting groove is communicated with the mother liquor groove; when the mother liquor accommodating part slides to a second preset position, the mother liquor tank is communicated with the mother liquor discharge tank.
Optionally, in the horizontal liquid phase epitaxial growth graphite boat, the clamp mounting groove is provided with a first anti-falling structure, the substrate clamp is provided with a first matching structure, and when the substrate clamp slides to a preset height in the clamp mounting groove, the first anti-falling structure is in contact limit with the first matching structure.
Optionally, in the horizontal liquid phase epitaxial growth graphite boat, the first anti-drop structure is a sinking table formed by recessing an edge of the fixture mounting groove, and the first matching structure is a flange formed by bending from the edge of the substrate fixture to a side far away from the substrate groove.
Optionally, in the horizontal liquid phase epitaxial growth graphite boat, two opposite ends of the substrate groove are respectively provided with a first opening and a second opening, and the first opening is positioned at one side of the substrate groove close to the mother solution accommodating part;
wherein the size of the first opening is smaller than the size of the substrate, and the size of the second opening is larger than the size of the substrate; or, a second anti-falling structure is arranged in the substrate groove and used for limiting the substrate in a contact way so as to prevent the substrate from falling off in the substrate groove.
Optionally, in the horizontal liquid phase epitaxial growth graphite boat, two ends of the mother liquor tank are open, and a bottom opening of the mother liquor tank is abutted with the upper surface of the base;
or, the bottom of the mother liquor tank is provided with a flow guiding structure, and the flow guiding structure is used for guiding the mother liquor in the mother liquor tank to the mother liquor discharge tank.
Optionally, in the horizontal liquid phase epitaxial growth graphite boat, a sliding guide structure is arranged in the fixture mounting groove, a sliding fit structure is arranged on the outer wall of the substrate fixture, and the sliding guide structure is in sliding fit with the sliding fit structure.
Optionally, in the horizontal liquid phase epitaxial growth graphite boat, the base is provided with a sliding groove, and the mother liquid container is slidably disposed in the sliding groove.
Optionally, in the horizontal liquid phase epitaxial growth graphite boat, the substrate placing member further comprises a cover plate, and the cover plate is arranged on one side of the substrate placing member away from the mother liquid accommodating member.
Optionally, in the horizontal liquid phase epitaxial growth graphite boat, the cover plate, the placement member body and the base are connected by screws.
A horizontal liquid phase epitaxial growth system comprising a horizontal liquid phase epitaxial growth graphite boat as described above.
When the graphite boat for horizontal liquid phase epitaxial growth provided by the invention is used, as the placing part body is connected with the base and a sliding space is formed between the placing part body and the base, and the mother liquor containing part is arranged in the sliding space in a sliding way, after the base is placed on the bearing surface, the base, the mother liquor containing part and the substrate placing part are arranged layer by layer from bottom to top; before the epitaxial process grows, placing a substrate clamp in a clamp mounting groove of a placing part body, placing a substrate in the substrate groove of the substrate clamp and enabling the growth surface of the substrate to be downward, placing mother liquor in a mother liquor groove of a mother liquor accommodating part, then pulling the mother liquor accommodating part to enable the mother liquor accommodating part to slide in a sliding space, and heating the horizontal liquid phase epitaxial growth graphite boat when the mother liquor groove slides to one side, far away from a mother liquor discharge groove, of the clamp mounting groove, namely, when the mother liquor groove and the mother liquor discharge groove are positioned at two sides of the substrate; after the mother solution is completely melted uniformly, the horizontal liquid-phase epitaxial growth graphite boat is subjected to preliminary cooling, when the temperature is reduced to a balance temperature point of the mother solution, the mother solution accommodating part is pulled for the first time, so that the mother solution tank slides towards the direction of the substrate, as the clamp mounting groove and the mother solution discharging groove are arranged in an offset manner in the vertical direction, in the initial pulling state, the mother solution tank and the mother solution discharging groove are positioned at two sides of the substrate, so that the mother solution accommodating part slides to a first preset position along with the sliding of the mother solution accommodating part, the clamp mounting groove is communicated with the mother solution tank, and the mother solution accommodating part and the substrate placing part are arranged from bottom to top, so that the mother solution tank is positioned below the clamp mounting groove, and after the clamp mounting groove is communicated with the mother solution tank, the substrate clamp slides downwards in the vertical direction under the dead weight effect, so that the lower surface of the substrate in the substrate clamp is immersed in the mother solution tank and grows a film, and the substrate can be automatically regulated and kept in the horizontal state by utilizing the characteristic of high density of the falling mother solution; according to the parameters such as the target thickness of the epitaxial growth film and the growth rate, the horizontal liquid phase epitaxial growth graphite boat is subjected to secondary cooling, after the target thickness of the epitaxial growth film is reached, the mother liquor accommodating part is pulled for the second time, so that the mother liquor accommodating part slides to a second preset position, the mother liquor tank is communicated with the mother liquor discharge tank, the base and the mother liquor accommodating part are arranged from bottom to top, therefore, the mother liquor discharge tank is positioned below the mother liquor tank, mother liquor in the mother liquor tank can flow into the mother liquor discharge tank under the action of gravity until the mother liquor is completely separated from the substrate, residual mother liquor on the substrate can drop under the action of gravity, and the mother liquor adhered to the surface of the substrate is completely removed in the growth process without taking subsequent measures for removing the mother liquor.
Therefore, the graphite boat for horizontal liquid phase epitaxy provided by the invention overturns the traditional epitaxial growth mode of arranging the mother liquor above the substrate, so that the mother liquor is positioned below the substrate, the substrate level is automatically adjusted by utilizing the buoyancy generated by the mother liquor, and meanwhile, the growth direction of the film material is changed from the upward growth direction of the general traditional liquid phase epitaxy to downward growth, thereby being beneficial to reducing the influence of solute gradient distribution and gravity on the uniformity of epitaxy in the epitaxy process, improving the uniformity of the epitaxial growth film material and improving the quality of the horizontal liquid phase epitaxial growth film; and because the mother solution is always positioned below the substrate, the effect of completely removing the mother solution from the surface of the substrate can be directly realized by utilizing gravity after the epitaxial growth is finished, the structures such as scrapers for removing various residual mother solutions adopted by the traditional structure are not required to be added, the scratch phenomenon of the surface of the film caused by scraping the mother solution is reduced, and the qualification rate of the film is improved.
Drawings
In order to more clearly illustrate the embodiments of the invention or the technical solutions in the prior art, the drawings that are required in the embodiments or the description of the prior art will be briefly described, it being obvious that the drawings in the following description are only some embodiments of the invention, and that other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.
FIG. 1 is a schematic diagram of an exploded structure of a graphite boat for horizontal liquid phase epitaxial growth according to an embodiment of the present invention;
FIG. 2 is a schematic view of a placement member according to an embodiment of the present invention;
FIG. 3 is a schematic view of a substrate holder according to an embodiment of the present invention;
FIG. 4 is a schematic view of a structure of a substrate holder for holding a substrate according to an embodiment of the present invention;
FIG. 5 is a schematic view of a placement member body with a substrate holder according to an embodiment of the present invention;
fig. 6 is a schematic cross-sectional view of a graphite boat for horizontal liquid phase epitaxy growth according to an embodiment of the present invention before epitaxy.
Wherein 100 is the base, 101 is the mother liquor discharge tank, 200 is the substrate and places the piece, 201 is placing the piece body, 2011 is the anchor clamps mounting groove, 2012 is first anticreep structure, 202 is the substrate anchor clamps, 2021 is the substrate groove, 2022 is first cooperation structure, 300 is the mother liquor holding member, 301 is the mother liquor groove, 400 is the apron, 500 is the substrate.
Detailed Description
In view of this, the core of the present invention is to provide a graphite boat for horizontal liquid phase epitaxy growth to improve the quality and yield of the thin film for horizontal liquid phase epitaxy growth.
The following description of the embodiments of the present invention will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present invention, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
As shown in fig. 1 to 6, an embodiment of the present invention discloses a horizontal liquid phase epitaxial growth graphite boat comprising a base 100, a substrate holder 200, and a mother liquor container 300.
Wherein the base 100 is provided with a mother liquor discharge tank 101; the substrate placing member 200 includes a placing member body 201 and a substrate holder 202, the placing member body 201 is provided with a holder mounting groove 2011, the substrate holder 202 is slidably disposed in the holder mounting groove 2011 in a vertical direction, the substrate holder 202 is provided with a substrate groove 2021 for placing the substrate 500, the placing member body 201 is detachably disposed above the base 100, and a sliding space is formed between the placing member body 201 and the base 100; the mother liquor container 300 is slidably disposed in the sliding space, and the mother liquor container 300 is provided with a mother liquor tank 301 for accommodating mother liquor; the clamp installation groove 2011 and the mother liquor discharge groove 101 are arranged in an offset manner in the vertical direction, and when the mother liquor accommodating member 300 slides to a first preset position, the clamp installation groove 2011 is communicated with the mother liquor groove 301; when the mother liquor container 300 slides to the second preset position, the mother liquor tank 301 and the mother liquor discharge tank 101 communicate.
When the horizontal liquid phase epitaxial growth graphite boat provided by the invention is used, as the placement piece body 201 is detachably arranged above the base 100, and a sliding space is formed between the placement piece body 201 and the base 100, and the mother liquor containing piece 300 is arranged in the sliding space in a sliding manner, after the base 100 is placed on a bearing surface, the base 100, the mother liquor containing piece 300 and the substrate placement piece 200 are arranged layer by layer from bottom to top; before the epitaxy process grows, placing the substrate clamp 202 in the clamp mounting groove 2011 of the holder body 201, placing the substrate 500 in the substrate groove 2021 of the substrate clamp 202 with the growth surface of the substrate 500 facing downwards, placing the mother liquor in the mother liquor groove 301 of the mother liquor holder 300, then pulling the mother liquor holder 300 to slide in the sliding space, and heating the horizontal liquid phase epitaxy growth graphite boat when the mother liquor groove 301 slides to one side of the clamp mounting groove 2011 far from the mother liquor discharge groove 101, namely, the mother liquor groove 301 and the mother liquor discharge groove 101 are positioned at two sides of the substrate 500; after the mother liquor is completely melted uniformly, the horizontal liquid phase epitaxial growth graphite boat is subjected to preliminary cooling, when the temperature is reduced to the equilibrium temperature point of the mother liquor, the mother liquor accommodating part 300 is pulled for the first time, so that the mother liquor tank 301 slides towards the substrate 500, and because the clamp mounting groove 2011 and the mother liquor discharging groove 101 are arranged in a vertical offset manner, and in the initial pulling state, the mother liquor tank 301 and the mother liquor discharging groove 101 are positioned at two sides of the substrate 500, so that the mother liquor accommodating part 300 slides to a first preset position along with the sliding of the mother liquor accommodating part 300, so that the clamp mounting groove 2011 is communicated with the mother liquor tank 301, and because the mother liquor accommodating part 300 and the substrate placing part 200 are arranged from bottom to top, the mother liquor tank 301 is positioned below the clamp mounting groove 2011, and when the clamp mounting groove 2011 is communicated with the mother liquor tank 301, the substrate clamp 202 slides downwards in the vertical direction under the dead weight effect, so that the lower surface of the substrate 500 in the substrate clamp 202 is immersed in the mother liquor tank 301 and grows a thin film, buoyancy is generated on the substrate 500, and the buoyancy force can be automatically adjusted and the horizontal state of the substrate 500 is maintained by utilizing the characteristic that the mother liquor density is high; according to the parameters such as the target thickness of the epitaxial growth film and the growth rate, the horizontal liquid-phase epitaxial growth graphite boat is subjected to secondary cooling, after the target thickness of the epitaxial growth film is reached, the mother liquor accommodating part 300 is pulled for the second time, so that the mother liquor accommodating part 300 slides to a second preset position, the mother liquor tank 301 is communicated with the mother liquor discharge tank 101, and as the base 100 and the mother liquor accommodating part 300 are arranged from bottom to top, the mother liquor discharge tank 101 is positioned below the mother liquor tank 301, the mother liquor in the mother liquor tank 301 flows into the mother liquor discharge tank 101 under the action of gravity until the mother liquor is completely separated from the substrate 500, the residual mother liquor on the substrate 500 also drops under the action of gravity, and the mother liquor adhered to the surface of the substrate 500 is completely removed in the growth process, so that subsequent measures for removing the mother liquor are not needed.
Therefore, the graphite boat for horizontal liquid phase epitaxy provided by the invention overturns the traditional epitaxial growth mode of arranging the mother liquor above the substrate 500, so that the mother liquor is positioned below the substrate 500, the substrate 500 level is automatically adjusted by utilizing the buoyancy generated by the mother liquor, and meanwhile, the growth direction of the film material is changed from the upward growth direction of the general traditional liquid phase epitaxy to downward growth, thereby being beneficial to reducing the influence of solute gradient distribution and gravity on the uniformity of the epitaxy in the epitaxy process, improving the uniformity of the epitaxial growth film material and improving the quality of the horizontal liquid phase epitaxial growth film; in addition, since the mother solution is always located below the substrate 500, the effect of completely removing the mother solution from the surface of the substrate 500 can be directly achieved by utilizing gravity after the epitaxial growth is finished, various residual mother solution removing scrapers and other structures adopted by the traditional structure are not required to be added, the phenomenon of scratch on the surface of a film caused by scraping the mother solution is reduced, and the qualification rate of the film is improved.
It should be noted that the dimension of the mother liquor tank 301 in the sliding direction parallel to the mother liquor receiving member 300 is not too small, as shown in fig. 6, the length of the mother liquor tank 301 in the sliding direction parallel to the mother liquor receiving member 300 needs to be longer than the length from the rightmost side of the substrate holder 202 to the right side of the mother liquor discharge tank 101, so that the substrate holder 202 will not interfere with the right side of the mother liquor tank 301 during the process of sliding the mother liquor tank 301 from the first preset position to the second preset position, that is, the process of sliding the mother liquor tank 301 from the first preset position to the left side thereof to reach above the mother liquor discharge tank 101 and communicate with the mother liquor discharge tank 101 up and down.
In addition, the above-mentioned clamp mounting groove 2011 is provided with a first anti-drop structure 2012, the substrate clamp 202 is provided with a first mating structure 2022, and when the substrate clamp 202 slides to a preset height in the clamp mounting groove 2011, the first anti-drop structure 2012 is in contact with the first mating structure 2022 to limit the position, so as to prevent the mother liquor containing member 300 from sliding to a first preset position, and when the clamp mounting groove 2011 is communicated with the mother liquor groove 301, the substrate clamp 202 falls from the clamp mounting groove 2011 to the bottom of the mother liquor groove 301, resulting in that both the upper surface and the lower surface of the substrate 500 in the substrate clamp 202 are immersed in the mother liquor.
The depth of the substrate 500 immersed in the mother solution can be adjusted by adjusting the total amount of the mother solution in the mother solution tank 301 and the height of the substrate holder 202, for example, the total amount of the mother solution is increased, the size of the substrate holder 202 is increased, and the depth of the substrate 500 immersed in the mother solution becomes larger, so that the lower surface of the substrate 500 is just immersed in the mother solution, and the upper surface of the substrate 500 is higher than the mother solution by adjusting the height of the mother solution longitudinal beam and the substrate holder 202, and the good horizontal placement and growth plane of the substrate 500 are realized by using the buoyancy effect of the mother solution on the substrate 500 due to the larger density of the mother solution.
It should be appreciated that, the first anti-falling structure 2012 may be a structure such as a stopper or a boss, and the first mating structure 2022 may be a structure such as an abutment block or a groove, so long as the first anti-falling structure 2012 and the first mating structure 2022 can contact and limit, so long as the substrate clamp 202 is prevented from falling from the clamp mounting groove 2011 to the bottom of the mother liquor groove 301; optionally, the first anti-disengaging structure 2012 provided by the present invention is a countersink formed by recessing an edge of the fixture mounting groove 2011, and the first mating structure 2022 is a flange formed by bending from an edge of the substrate fixture 202 to a side away from the substrate groove 2021, so as to limit the substrate fixture 202 through overlapping contact between the flange and the countersink.
It can be seen that the present invention can also adjust the depth of immersion of the substrate 500 in the mother liquor by adjusting the sinking height of the sinking table, for example, increasing the sinking height of the sinking table, increasing the falling slide height of the substrate holder 202, and increasing the depth of immersion of the substrate 500 in the mother liquor.
Further, the opposite ends of the substrate groove 2021 are respectively provided with a first opening and a second opening, and the first opening is positioned at one side of the substrate groove 2021 close to the mother liquor accommodating member 300; the size of the first opening is smaller than that of the substrate 500, the size of the second opening is larger than that of the substrate 500, so that the substrate 500 is placed into the second opening, the substrate 500 is limited through the first opening, the substrate 500 is prevented from falling to the lower side of the substrate clamp 202 from the first opening, the lower surface of the substrate 500 is just immersed in mother liquor, the upper surface of the substrate 500 is higher than the mother liquor, and good horizontal placement and growth plane of the substrate 500 are achieved through buoyancy generated by the mother liquor on the substrate 500 by utilizing the characteristic of higher mother liquor density.
When the substrate 500 is directly limited by using the first opening, the inner wall of the substrate groove 2021 may be designed into a truncated cone structure, an arc-shaped table structure, or a polygonal pyramid structure with a large top and a small bottom, so long as the size of the first opening is smaller than the size of the substrate 500, and the size of the second opening is larger than the size of the substrate 500, so that the substrate 500 is conveniently placed from the second opening, and the substrate 500 is limited by the first opening.
Or, a second anti-drop structure is arranged in the substrate groove 2021, and the second anti-drop structure is used for limiting the substrate 500 in a contact manner, so that the substrate 500 is prevented from falling below the substrate groove 2021 in the substrate groove 2021, the lower surface of the substrate 500 is just immersed in the mother liquor, the upper surface of the substrate 500 is higher than the mother liquor, and good horizontal placement and growth planes of the substrate 500 are realized through buoyancy generated on the substrate 500 by the mother liquor by utilizing the characteristic of higher density of the mother liquor.
The second anti-drop structure may be a flange or a limiting piece extending from the edge of the substrate groove 2021 into the substrate groove 2021, and any type of structure capable of limiting the substrate 500 is within the scope of the present invention; optionally, the second anti-drop structure provided in this embodiment of the present invention is a flange formed by extending from the edge of the substrate groove 2021 to the inside thereof, so that the inverted edge of the front surface of the substrate 500 is attached to the flange, and most of the remaining area is completely exposed.
In addition, both ends of the mother liquor tank 301 are opened, and the bottom opening of the mother liquor tank 301 is abutted against the upper surface of the base 100, so as to accommodate the mother liquor through a space formed by enclosing the upper surface of the base 100 and the side wall of the mother liquor tank 301, after the epitaxial growth film on the lower surface of the substrate 500 grows to the target thickness, the mother liquor accommodating part 300 is slid to a second preset position, and the mother liquor tank 301 is communicated with the mother liquor discharge tank 101, so that the mother liquor in the mother liquor tank 301 enters the mother liquor discharge tank 101 under the action of dead weight; or, the bottom of the mother liquor tank 301 is provided with a flow guiding structure, and mother liquor in the mother liquor tank 301 is guided into the mother liquor discharge tank 101 through the flow guiding structure, so that the cleaning efficiency of residual mother liquor is improved.
The above-mentioned flow guiding structure may be a type of inclined flow guiding plate or funnel, and all the structures are within the scope of the present invention as long as they are convenient for guiding the residual mother liquid to the mother liquid discharge tank 101.
Still further, the above-mentioned clamp mounting groove 2011 is internally provided with a sliding guide structure, the outer wall of the substrate clamp 202 is provided with a sliding fit structure, and the sliding guide structure and the sliding fit structure are in sliding fit, so that the falling of the substrate clamp 202 is guided by the sliding fit between the sliding guide structure and the sliding fit structure, and the substrate clamp 202 is prevented from being askew in the falling process, and the contact between the substrate 500 and the mother solution is affected.
The sliding guide structure can be a guide groove, a guide rail or a guide rod and other types of structures, and the sliding fit structure can be a sliding block or a pulley and other types of parts, so long as the sliding guide structure can meet the use requirement, and the sliding guide structure is within the protection scope of the invention.
The base 100 provided by the invention is provided with the sliding groove, so that two sides of the mother liquor accommodating part 300 are in sliding clamping connection in the sliding groove, the mother liquor accommodating part 300 is arranged in the sliding groove in a sliding way, and the mother liquor accommodating part 300 is pulled to slide along the sliding groove.
In addition, the above-mentioned horizontal liquid phase epitaxial growth graphite boat further comprises a cover plate 400, and the cover plate 400 is disposed at a side of the substrate holder 200 remote from the mother liquor container 300 such that the cover plate 400 covers the substrate groove 2021.
The cover plate 400 and the substrate holder 200 may be connected together by a fastening or screw connection, and any connection manner capable of meeting the connection requirement is within the scope of the present invention; optionally, the cover plate 400, the placement member body 201 and the base 100 provided in the embodiment of the present invention are all provided with threaded connection holes, and screws sequentially penetrate through the threaded connection holes on the cover plate 400, the placement member body 201 and the base 100 to fix the whole horizontal liquid phase epitaxial growth graphite boat.
In addition, the invention also discloses a horizontal liquid phase epitaxial growth system which comprises the horizontal liquid phase epitaxial growth graphite boat, so that all the technical effects of the horizontal liquid phase epitaxial growth graphite boat are achieved, and the horizontal liquid phase epitaxial growth graphite boat is not described in detail herein.
The terms first and second and the like in the description and in the claims and in the above-described figures are used for distinguishing between different objects and not necessarily for describing a sequential or chronological order. Furthermore, the terms "comprise" and "have," as well as any variations thereof, are intended to cover a non-exclusive inclusion. For example, a process, method, system, article, or apparatus that comprises a list of steps or elements is not necessarily limited to the listed steps or elements but may include steps or elements not expressly listed.
The previous description of the disclosed embodiments is provided to enable any person skilled in the art to make or use the present invention. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the generic principles defined herein may be applied to other embodiments without departing from the spirit or scope of the invention. Thus, the present invention is not intended to be limited to the embodiments shown herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.
Claims (9)
1. A horizontal liquid phase epitaxial growth graphite boat comprising:
a base provided with a mother liquor discharge tank;
the substrate placing part comprises a placing part body and a substrate clamp, wherein the placing part body is provided with a clamp mounting groove, the substrate clamp is arranged in the clamp mounting groove in a sliding manner in the vertical direction, the substrate clamp is provided with a substrate groove for placing a substrate, and the placing part body is connected with the base and forms a sliding space between the placing part body and the base;
the mother liquor accommodating part is arranged in the sliding space in a sliding way, and is provided with a mother liquor tank for accommodating mother liquor;
wherein the length of the mother liquor tank in the sliding direction parallel to the mother liquor accommodating part is longer than the length from the rightmost side of the substrate clamp to the right side of the mother liquor discharging tank, the clamp mounting tank and the mother liquor discharging tank are arranged in an offset manner in the vertical direction, and when the mother liquor accommodating part slides to a first preset position, the clamp mounting tank is communicated with the mother liquor tank; when the mother liquor accommodating part slides to a second preset position, the mother liquor tank is communicated with the mother liquor discharge tank;
the substrate clamp is provided with a first matching structure, and when the substrate clamp slides to a preset height in the clamp mounting groove, the first anti-falling structure is in contact limit with the first matching structure.
2. The horizontal liquid phase epitaxial growth graphite boat of claim 1, wherein the first anti-drop structure is a countersink formed by recessing an edge of the fixture mounting groove, and the first mating structure is a flange formed by bending from the edge of the substrate fixture to a side away from the substrate groove.
3. The horizontal liquid phase epitaxial growth graphite boat of claim 1, wherein the opposite ends of the substrate groove are provided with a first opening and a second opening, respectively, the first opening being located on a side of the substrate groove adjacent to the mother liquor container;
wherein the size of the first opening is smaller than the size of the substrate, and the size of the second opening is larger than the size of the substrate; or, a second anti-falling structure is arranged in the substrate groove and used for limiting the substrate in a contact way so as to prevent the substrate from falling off in the substrate groove.
4. The horizontal liquid phase epitaxial growth graphite boat of claim 1, wherein both ends of the mother liquor tank are open, and a bottom opening of the mother liquor tank is in abutment with an upper surface of the base;
or, the bottom of the mother liquor tank is provided with a flow guiding structure, and the flow guiding structure is used for guiding the mother liquor in the mother liquor tank to the mother liquor discharge tank.
5. The horizontal liquid phase epitaxial growth graphite boat of claim 1, wherein a sliding guide structure is arranged in the clamp mounting groove, a sliding fit structure is arranged on the outer wall of the substrate clamp, and the sliding guide structure is in sliding fit with the sliding fit structure.
6. The horizontal liquid phase epitaxial growth graphite boat of claim 1, wherein the base is provided with a sliding groove in which the mother liquor container is slidably disposed.
7. The horizontal liquid phase epitaxial growth graphite boat of claim 1, further comprising a cover plate disposed on a side of the substrate placement member remote from the mother liquor containment member.
8. The horizontal liquid phase epitaxial growth graphite boat of claim 7, wherein the cover plate, the placement member body and the base are connected by screws.
9. A horizontal liquid phase epitaxial growth system comprising the horizontal liquid phase epitaxial growth graphite boat of any one of claims 1 to 8.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310809117.3A CN116770421B (en) | 2023-07-03 | 2023-07-03 | Graphite boat for horizontal liquid phase epitaxial growth |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310809117.3A CN116770421B (en) | 2023-07-03 | 2023-07-03 | Graphite boat for horizontal liquid phase epitaxial growth |
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| CN116770421B true CN116770421B (en) | 2023-12-01 |
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0243723A (en) * | 1988-08-03 | 1990-02-14 | Uchu Kankyo Riyou Kenkyusho:Kk | Solution growth device |
| US5603761A (en) * | 1994-08-30 | 1997-02-18 | Shin-Etsu Handotai Co., Ltd. | Liquid phase epitaxial growth method for carrying out the same |
| JP2001106600A (en) * | 1999-10-12 | 2001-04-17 | Mitsubishi Cable Ind Ltd | Method for growing silicon carbide crystal in liquid phase |
| CN1360090A (en) * | 2001-11-07 | 2002-07-24 | 中国科学院上海技术物理研究所 | Graphite boat with mother liquid remover for light-phase epitaxial growth of Te-Cd-Hg film |
-
2023
- 2023-07-03 CN CN202310809117.3A patent/CN116770421B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0243723A (en) * | 1988-08-03 | 1990-02-14 | Uchu Kankyo Riyou Kenkyusho:Kk | Solution growth device |
| US5603761A (en) * | 1994-08-30 | 1997-02-18 | Shin-Etsu Handotai Co., Ltd. | Liquid phase epitaxial growth method for carrying out the same |
| JP2001106600A (en) * | 1999-10-12 | 2001-04-17 | Mitsubishi Cable Ind Ltd | Method for growing silicon carbide crystal in liquid phase |
| CN1360090A (en) * | 2001-11-07 | 2002-07-24 | 中国科学院上海技术物理研究所 | Graphite boat with mother liquid remover for light-phase epitaxial growth of Te-Cd-Hg film |
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| Publication number | Publication date |
|---|---|
| CN116770421A (en) | 2023-09-19 |
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