CN116749055B - Polishing machine and leveling method - Google Patents
Polishing machine and leveling method Download PDFInfo
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- CN116749055B CN116749055B CN202311037434.4A CN202311037434A CN116749055B CN 116749055 B CN116749055 B CN 116749055B CN 202311037434 A CN202311037434 A CN 202311037434A CN 116749055 B CN116749055 B CN 116749055B
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- leveling
- liquid receiving
- receiving ring
- load
- disc
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- 238000005498 polishing Methods 0.000 title claims abstract description 70
- 238000000034 method Methods 0.000 title claims abstract description 36
- 239000007788 liquid Substances 0.000 claims abstract description 239
- 238000001514 detection method Methods 0.000 claims abstract description 26
- 238000005096 rolling process Methods 0.000 claims description 20
- 230000008569 process Effects 0.000 claims description 13
- 238000007789 sealing Methods 0.000 claims description 12
- 230000003247 decreasing effect Effects 0.000 claims description 3
- 230000001174 ascending effect Effects 0.000 claims description 2
- 230000009467 reduction Effects 0.000 claims description 2
- 238000004378 air conditioning Methods 0.000 claims 1
- 239000013078 crystal Substances 0.000 abstract description 16
- RSMUVYRMZCOLBH-UHFFFAOYSA-N metsulfuron methyl Chemical compound COC(=O)C1=CC=CC=C1S(=O)(=O)NC(=O)NC1=NC(C)=NC(OC)=N1 RSMUVYRMZCOLBH-UHFFFAOYSA-N 0.000 abstract description 3
- 238000006748 scratching Methods 0.000 abstract 1
- 230000002393 scratching effect Effects 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 238000005406 washing Methods 0.000 description 4
- 230000009471 action Effects 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 230000003749 cleanliness Effects 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 230000008595 infiltration Effects 0.000 description 2
- 238000001764 infiltration Methods 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 238000010079 rubber tapping Methods 0.000 description 2
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B29/00—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
- B24B41/02—Frames; Beds; Carriages
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
- B24B57/02—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/10—Greenhouse gas [GHG] capture, material saving, heat recovery or other energy efficient measures, e.g. motor control, characterised by manufacturing processes, e.g. for rolling metal or metal working
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
The invention relates to a polishing machine and a leveling method, wherein the polishing machine comprises: the upper rack is fixedly arranged relative to the central shaft of the upper disc; the liquid receiving structure comprises a connecting disc and a liquid receiving ring, wherein the connecting disc is sleeved on the central shaft of the upper part, and the liquid receiving ring is fixedly connected with the connecting disc; the brush head is at least partially positioned in the liquid receiving ring so as to be contacted with the inner wall of the liquid receiving ring; the first driving piece is connected to the upper frame and used for driving the brush head to rotate; a detection unit for detecting a load of the first driving member; and the leveling unit is movably arranged on the upper frame. The first driving piece drives the brush head to rotate so as to brush off crystals on the inner wall of the liquid receiving ring, thereby avoiding scratching the polished product after the crystals formed on the inner wall of the liquid receiving ring are removed. By detecting the load of the first driving piece, whether the brush head works in the state of leveling the liquid receiving ring can be judged, so that whether the liquid receiving ring is leveled or not is judged, and the liquid receiving ring is leveled through the leveling unit according to the load of the first driving piece.
Description
Technical Field
The invention relates to the technical field of polishing, in particular to a polishing machine and a leveling method.
Background
The polishing machine is in an open structure, and consists of an upper frame at the upper part, a plurality of liquid flowing pipes fixed on the upper frame and a liquid receiving ring at the lower part, wherein the liquid outlets of the liquid flowing pipes are positioned on the same circumference. The polishing liquid in the liquid flowing pipe flows onto the liquid receiving ring, and the liquid receiving ring rotates to enable the polishing liquid to be distributed on the whole liquid receiving ring by utilizing centrifugal force, so that the polishing liquid flows into the upper disc from a plurality of pore channels on the liquid receiving ring.
Due to the infiltration of the polishing solution, some refractory crystals can be formed on the inner wall of the liquid receiving ring. During polishing, if these crystals fall off and then flow into the upper plate with the polishing liquid, the product under polishing is scratched. At present, the surface of the liquid ring is usually cleaned by washing with pure water, but the washing with pure water cannot remove the crystals. Moreover, the liquid receiving ring can incline due to mechanical vibration and the like, so that the height difference between the liquid outlet of each liquid flowing pipe and the liquid receiving ring is inconsistent, polishing liquid in different liquid flowing pipes is dripped on the liquid receiving ring through different distances, the liquid quantity and the flow velocity of the polishing liquid flowing into the upper disc are uneven, the even supply of the polishing liquid is not facilitated, and the polishing quality of products is affected. Therefore, before the polishing machine works, it is necessary to make adjustments so that the height difference between the liquid outlet of each liquid flow pipe and the liquid receiving ring is uniform.
Disclosure of Invention
Based on this, it is necessary to provide a polishing machine in view of the above-described problems. The polishing machine can brush off crystals on the inner wall of the liquid receiving ring by using the brush head, and can level the liquid receiving ring by using the brush head so as to ensure that the height difference between the liquid outlet of each liquid flowing pipe and the liquid receiving ring is consistent.
In order to solve the problems, the invention provides the following technical scheme:
the utility model provides a burnishing machine, includes the upper disc center pin, the upper disc center pin is used for driving the upper disc and rotates and go up and down, still includes: the upper rack is fixedly arranged relative to the central shaft of the upper disc; the liquid receiving structure comprises a connecting disc and a liquid receiving ring, wherein the connecting disc is sleeved on the central shaft of the upper disc, and the liquid receiving ring is fixedly connected with the connecting disc;
the brush head is at least partially positioned in the liquid receiving ring and is contacted with the inner wall of the liquid receiving ring; the first driving piece is connected to the upper frame and used for driving the brush head to rotate; a detection unit for detecting a load of the first driving member; and the leveling unit is movably arranged on the upper frame and is used for leveling the connecting disc.
So set up, before using this burnishing machine to polish, can drive the brush head through first driving piece and rotate, the crystallization on the inner wall of liquid receiving ring just can be brushed to the brush head of pivoted. The liquid receiving ring rotates at least one circle, the position of the brush head is unchanged, and the brush head can remove crystals on the inner wall of the whole circle of the liquid receiving ring, so that the phenomenon that the crystals formed on the inner wall of the liquid receiving ring fall off and enter the upper disc to scratch a polished product can be avoided.
Moreover, by detecting the load of the first driving piece, whether the brush head works in the state that the liquid receiving ring is leveled or not can be judged, so that whether the liquid receiving ring is leveled or not is judged. If the liquid receiving ring is not leveled, the connecting disc can be leveled through the leveling unit according to the load of the first driving piece so as to level the liquid receiving ring.
The liquid receiving ring is leveled, so that the liquid outlet of each liquid flowing pipe is consistent with the height difference between the liquid receiving ring, the liquid quantity and the flow rate of the polishing liquid flowing into the upper disc are uniform, the polishing liquid is uniformly supplied, and the polishing quality of products is improved. In addition, if the liquid receiving ring is cleaned with the brush head for a long time in a state in which the liquid receiving ring is inclined with respect to the upper frame, the brush head may damage the liquid receiving ring. Leveling the liquid receiving ring can prevent the brush head from damaging the liquid receiving ring.
In one embodiment, the polishing machine further comprises a second driving piece fixedly arranged on the upper frame, the second driving piece comprises a second output shaft which can be lifted, and the brush head is connected with the second output shaft; and/or, the polishing machine further comprises a third driving piece fixedly arranged on the upper frame, the third driving piece comprises a third output shaft capable of ascending and descending, and the leveling unit is arranged on the third output shaft.
In one embodiment, the leveling unit comprises a connecting piece and a rolling piece, wherein the connecting piece is arranged on the upper frame in a lifting manner, and the rolling piece is rotationally connected with the connecting piece and is in rolling connection with the connecting disc in the leveling process so as to be abutted against the connecting disc.
In one embodiment, the brush head, the first driving piece, the detecting unit and the leveling unit are all provided with a plurality of brush heads, and are respectively arranged in a one-to-one correspondence manner, and the brush heads are annularly arranged on the central shaft of the upper disc; and/or the brush head, the first driving piece, the detection unit and the leveling unit are all provided with a plurality of groups and are respectively arranged in a one-to-one correspondence manner, and the leveling units are annularly arranged on the upper disc central shaft; and/or the brush head, the first driving piece, the detection unit and the leveling unit are all provided with a plurality of parts and are respectively arranged in one-to-one correspondence, and the corresponding first driving piece and the leveling unit are arranged side by side.
In one embodiment, the polishing machine further comprises a sealing cover, the sealing cover is sleeved outside the central shaft of the upper disc, and the upper frame and the liquid receiving structure are both located in the sealing cover.
So set up, can utilize the sealed cowling to play the guard action. Specifically, the sealing cover separates the upper frame and the liquid receiving structure from the outside, so that the outside impurities are prevented from entering the polishing machine, and the cleanliness of the polishing machine is improved.
The invention also provides a leveling method for leveling the connecting disc in the polishing machine, thereby leveling the liquid receiving ring, comprising the following steps:
a. setting the load of the first driving piece in the leveling state of the connecting disc as a standard load m 0 ；
b. Rotating the connecting disc at least one circle;
c. obtaining the load m of the first driving member in one rotation of the connecting disc 1 Judging the load m 1 Whether or not to equal the standard load m 0 ；
d. For any first driving piece, if the load of the first driving piece in the process of rotating the connecting disc from the first driving piece by a first angle is always smaller than m 0 C, jacking up an area corresponding to the first angle of rotation of the connecting disc by using the leveling unit, and executing the step c;
e. for any first driving piece, if the load of the first driving piece in the process of rotating the connecting disc from the first driving piece by a first angle is always larger than m 0 The leveling unit is utilized to rotate the connecting discDescending the area corresponding to the angle, and executing the step c;
f. if the load m of each first driving member 1 Are all always equal to m 0 And judging that the connecting disc is in a leveling state, and finishing leveling.
So arranged, by detecting the load m of the first driving member 1 And let m 1 And standard load m 0 By comparing, whether the brush head works in the state that the liquid receiving ring is leveled or not can be judged, so that whether the liquid receiving ring is leveled or not can be indirectly judged. In other words, the standard load m 0 Provides visual index for leveling the liquid receiving ring, and the load m of the first driving piece 1 As the parameter being adjusted. If the load m of each first driving member 1 Are all equal to m 0 The connection disc is in a leveling state, the liquid receiving ring is in a leveling state, and leveling is completed. Otherwise, the posture of the liquid receiving ring relative to the upper frame is regulated by the leveling unit so as to enable the load m of each first driving piece 1 All tend to m 0 Up to the load m of the respective first driving member 1 Are all equal to m 0 . Therefore, the leveling method can realize leveling only by detecting the load of the first driving piece without detecting the relative pose between the liquid receiving ring and the upper frame. Compared with the detection of the relative pose, the detection load is easier to realize, and the detection cost is lower. Therefore, the leveling method is easy to implement and has low detection cost.
After the liquid receiving ring is leveled by using the leveling method, the height difference between the liquid outlet of each liquid flowing pipe and the liquid receiving ring is consistent, so that the liquid quantity and the flow rate of the polishing liquid flowing into the upper disc are uniform, the uniform supply of the polishing liquid is facilitated, and the polishing quality of products is improved.
In addition, if the liquid receiving ring is cleaned with the brush head for a long time in a state in which the liquid receiving ring is inclined with respect to the upper frame, the brush head may damage the liquid receiving ring. The liquid receiving ring is leveled by the leveling method, so that the brush head can be prevented from damaging the liquid receiving ring.
In one embodiment, in step d: if a radial line on the connecting disc rotationally passes over a first driving memberIn the course of (a), the load m of the first driving member 1 Always smaller than m 0 And m is 1 Firstly reducing and then increasing, and then jacking up the radial line segment by using a leveling unit; and/or, in step e: if a radial line on the connecting disc passes a certain first driving member in a rotating way, the load m of the first driving member 1 Always greater than m 0 And m is 1 The radial line segment is lowered by the leveling unit after the radial line segment is increased.
In one embodiment, in step d: upon detection of the load m of the first driving member 1 When the radial line segment starts to be increased, the leveling units arranged on the first driving piece in parallel are lifted to jack up the part of the radial line segment, which is positioned on the connecting disc; and/or, in step e: upon detection of the load m of the first driving member 1 When the reduction starts, the leveling units arranged side by side on the first driving member are lowered so that the portion of the radial line segment located on the connecting disc is lowered.
In one embodiment, in the step b, each leveling unit is always kept in a state of being separated from the liquid receiving structure; and/or in the step d and the step e, adjusting each leveling unit simultaneously so that each leveling unit always keeps contact with the connecting disc.
In one embodiment, if the leveling unit is abutted to the upper end of the connecting disc, the step d is executed first and then the step e is executed; and if the leveling unit is abutted against the lower end of the connecting disc, executing the step e and then executing the step d.
Drawings
Fig. 1 is a schematic structural view of a part of a polishing machine according to a first embodiment of the present invention;
FIG. 2 is a schematic view of the first embodiment of FIG. 1 from another perspective;
FIG. 3 is a cross-sectional view taken along the direction E-E in FIG. 2;
FIG. 4 is a schematic view of a portion of the structure shown in FIG. 1;
fig. 5 is a cross-sectional view of a portion of another embodiment.
Reference numerals:
1. an upper frame; 2. a liquid receiving structure; 21. a connecting disc; 22. a liquid receiving ring; 3. a brush head; 31. a carrier; 32. a brush body; 4. a first driving member; 5. a leveling unit; 51. a connecting piece; 52. a rolling member; 6. a second driving member; 7. and a third driving member.
Detailed Description
In order that the above objects, features and advantages of the invention will be readily understood, a more particular description of the invention will be rendered by reference to the appended drawings. In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present invention. The present invention may be embodied in many other forms than described herein and similarly modified by those skilled in the art without departing from the spirit of the invention, whereby the invention is not limited to the specific embodiments disclosed below.
In the description of the present invention, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential", etc. indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings are merely for convenience in describing the present invention and simplifying the description, and do not indicate or imply that the device or element being referred to must have a specific orientation, be configured and operated in a specific orientation, and therefore should not be construed as limiting the present invention.
Furthermore, the terms "first," "second," and the like, are used for descriptive purposes only and are not to be construed as indicating or implying a relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defining "a first" or "a second" may explicitly or implicitly include at least one such feature. In the description of the present invention, the meaning of "plurality" means at least two, for example, two, three, etc., unless specifically defined otherwise.
In the present invention, unless explicitly specified and limited otherwise, the terms "mounted," "connected," "secured," and the like are to be construed broadly, and may be, for example, fixedly connected, detachably connected, or integrally formed; can be mechanically or electrically connected; either directly or indirectly, through intermediaries, or both, may be in communication with each other or in interaction with each other, unless expressly defined otherwise. The specific meaning of the above terms in the present invention can be understood by those of ordinary skill in the art according to the specific circumstances.
In the present invention, unless expressly stated or limited otherwise, a first feature "up" or "down" a second feature may be the first and second features in direct contact, or the first and second features in indirect contact via an intervening medium. Moreover, a first feature being "above," "over" and "on" a second feature may be a first feature being directly above or obliquely above the second feature, or simply indicating that the first feature is level higher than the second feature. The first feature being "under", "below" and "beneath" the second feature may be the first feature being directly under or obliquely below the second feature, or simply indicating that the first feature is less level than the second feature.
It will be understood that when an element is referred to as being "fixed" or "disposed" on another element, it can be directly on the other element or intervening elements may also be present. When an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements may also be present. The terms "vertical," "horizontal," "upper," "lower," "left," "right," and the like are used herein for illustrative purposes only and are not meant to be the only embodiment.
First, the present invention provides a polishing machine, referring to fig. 1 to 3, which includes a top disk center shaft (not shown), a top frame 1, and a liquid receiving structure 2. Wherein:
the upper disc central shaft is used for driving the upper disc to rotate and lift so that the upper disc and the lower disc of the polishing machine are contacted and relatively rotated, and therefore products located between the upper disc and the lower disc are polished.
The upper frame 1 is fixedly provided with a plurality of liquid flowing pipes, and the liquid outlets of the liquid flowing pipes are positioned on the same circumference. The upper frame 1 is fixed relative to the central shaft of the upper disc.
The liquid receiving structure 2 comprises a connecting disc 21 and a liquid receiving ring 22, wherein the liquid receiving ring 22 is fixedly connected to the connecting disc 21, and the liquid receiving ring 22 is positioned below a liquid outlet of the liquid flowing pipe so as to receive polishing liquid flowing out of the liquid flowing pipe. The connecting disc 21 is sleeved on the central shaft of the upper disc, and the central shaft of the upper disc drives the liquid receiving ring 22 to rotate together through the connecting disc 21, so that polishing liquid received by the liquid receiving ring 22 is distributed on the whole liquid receiving ring 22 under the action of centrifugal force, and therefore the polishing liquid flows into the upper disc from a plurality of pore channels on the liquid receiving ring 22.
In one embodiment, the upper frame 1 is fixed to the ground through a centering component and is sleeved outside the central shaft of the upper disc but is not in contact with the central shaft of the upper disc.
In the conventional art, some refractory crystals are formed on the inner wall of the liquid receiving ring due to infiltration of the polishing liquid. During polishing, if these crystals fall off and then flow into the upper plate with the polishing liquid, the product under polishing is scratched. At present, the surface of the liquid ring is usually cleaned by washing with pure water, but the washing with pure water cannot remove the crystals. Moreover, the liquid receiving ring can incline due to mechanical vibration and the like, so that the height difference between the liquid outlet of each liquid flowing pipe and the liquid receiving ring is inconsistent, polishing liquid in different liquid flowing pipes is dripped on the liquid receiving ring through different distances, the liquid quantity and the flow velocity of the polishing liquid flowing into the upper disc are uneven, the even supply of the polishing liquid is not facilitated, and the polishing quality of products is affected. Therefore, before the polishing machine works, it is necessary to make adjustments so that the height difference between the liquid outlet of each liquid flow pipe and the liquid receiving ring is uniform.
Referring to fig. 1 to 4, in order to solve the above-mentioned problems, the polishing machine further includes a brush head 3, a first driving member 4, a detecting unit (not shown in the drawings), and a leveling unit 5. The brush head 3 is at least partially positioned within the liquid receiving ring 22 to contact the inner wall of the liquid receiving ring 22. The first driving member 4 is connected to the upper frame 1 for driving the brush head 3 to rotate. The detection unit is used for detecting the load of the first driving member 4. The leveling unit 5 is movably provided to the upper frame 1 for leveling the connection pad 21 and thus the liquid receiving ring 22. The "leveling the liquid receiving ring 22" refers to adjusting the liquid receiving ring 22 to a state that the height difference between the liquid receiving ring 22 and the liquid outlet of each liquid flowing pipe is consistent.
In the present invention, the brush head 3 can be used to both remove crystals and level the liquid receiving ring 22. The specific explanation is as follows:
on the one hand, the brush head 3 can remove crystals. Before polishing by the polishing machine, the brush head 3 can be driven to rotate by the first driving piece 4, and the rotating brush head 3 can brush off crystals on the inner wall of the liquid receiving ring 22. The liquid receiving ring 22 is rotated at least one circle, the position of the brush head 3 is unchanged, and the brush head 3 can remove crystals on the inner wall of the whole circle of the liquid receiving ring 22, so that the phenomenon that the crystals formed on the inner wall of the liquid receiving ring 22 fall off and enter the upper disc to scratch a polished product can be avoided.
On the other hand, the brush head 3 can be used to level the liquid receiving ring 22. By detecting the load of the first driving member 4, it is possible to determine whether the brush head 3 is operated in a state where the liquid receiving ring 22 is leveled, thereby determining whether the liquid receiving ring 22 is leveled. If the liquid receiving ring 22 is not leveled, the land 21 may be leveled by the leveling unit 5 to level the liquid receiving ring 22 according to the load of the first driving member 4.
The liquid receiving ring 22 is leveled, so that the height difference between the liquid outlet of each liquid flowing pipe and the liquid receiving ring 22 is consistent, the liquid quantity and the flow rate of the polishing liquid flowing into the upper disc are uniform, the polishing liquid is uniformly supplied, and the polishing quality of products is improved. Further, if the liquid receiving ring 22 is cleaned with the brush head 3 for a long time in a state where the liquid receiving ring 22 is inclined with respect to the upper frame 1, the brush head 3 may damage the liquid receiving ring 22. Leveling the liquid receiving ring 22 prevents the brush head 3 from damaging the liquid receiving ring 22.
In the first embodiment of the present invention, the first driving member 4 includes a rotatable first output shaft, and the first output shaft is connected to the brush head 3, and the first output shaft rotates to drive the brush head 3 to rotate.
Referring to fig. 1, 3 and 4, in the first embodiment of the present invention, the polishing machine further includes a second driving member 6 fixed to the upper frame 1, where the second driving member 6 includes a second output shaft (not numbered in the figures) that can be lifted and lowered, and the brush head 3 is connected to the second output shaft. Thereby, the brush head 3 can be driven to be lifted and lowered by the second driving member 6. When the liquid receiving ring 22 is to be cleaned, the second output shaft descends, so that the brush head 3 at least partially stretches into the liquid receiving ring 22 to be in contact with the inner wall of the liquid receiving ring 22; after the liquid receiving ring 22 is cleaned, the second output shaft rises, so that the brush head 3 leaves the liquid receiving ring 22, and the polishing machine can conveniently carry out subsequent polishing operation.
It will be appreciated that in the first embodiment the brush head 3 is connected to the second output shaft by a first drive member 4 which is centred, the first drive member 4 being connected to the upper housing 1 by a second drive member 6 which is centred. The second output shaft is lifted, and the first driving piece 4 is lifted along with the second output shaft so as to drive the brush head 3 to lift.
Referring to fig. 3 and 4, in the first embodiment, the brush head 3 includes a carrier 31 and a brush body 32, the carrier 31 is connected to the second output shaft, and the brush body 32 is protruding from the carrier 31 to abut against the inner wall of the liquid ring 22. The brush body 32 may be a natural wool or a plastic wire or a metal wire, and the structure of the brush body 32 is not particularly limited in the first embodiment.
It will be appreciated that during cleaning of the liquid receiving ring 22 by the brush head 3, only the brush body 32 is in contact with the inner wall of the liquid receiving ring 22, the carrier 31 is not in contact with the inner wall of the liquid receiving ring, and a distance exists between the bottom end of the carrier 31 and the bottom wall of the liquid receiving ring 22.
It should be noted that, by combining the up-and-down movement of the brush head 3 and the rotation of the liquid receiving ring 22, the brush head 3 can sweep each area of the inner wall of the liquid receiving ring 22 in turn, thereby realizing dead-angle-free cleaning of the inner wall of the liquid receiving ring 22.
Referring to fig. 1 to 4, in the first embodiment or other embodiments, the polishing machine further includes a third driving member 7 fixed to the upper frame 1, where the third driving member 7 includes a third output shaft (not shown) that can be lifted and lowered, and the leveling unit 5 is disposed on the third output shaft. Thereby, the leveling unit 5 can be driven to rise and fall by the third driving member 7, so that the leveling unit 5 can level the liquid receiving ring 22.
In one embodiment, the liquid receiving ring 22 is connected to the central shaft of the upper disc through a bracket, the bracket is fixedly arranged on the central shaft of the upper disc, the liquid receiving ring 22 is arranged on the bracket in a tilting and swinging manner, and the bracket rotates and lifts along with the central shaft of the upper disc so as to drive the liquid receiving ring 22 to rotate and lift. Since the liquid receiving ring 22 is provided to the bracket so as to be tiltable, the leveling unit 5 is driven to be lifted by the third driving member 7, so that one side of the liquid receiving ring 22 is lifted or one side of the liquid receiving ring 22 is lowered, thereby leveling the liquid receiving ring 22.
In the above embodiment, the first driving member 4 may be a motor, the second driving member 6 and the third driving member 7 may be an air cylinder or an electric push rod, and the structural form of the first driving member 4, the second driving member 6 and the third driving member 7 is not particularly limited.
In other embodiments, the leveling unit 5 may also abut against the liquid receiving structure 2 or be far away from the liquid receiving structure 2 in a rotating manner to achieve leveling of the liquid receiving ring 22.
Referring to fig. 3 and 4, in the first embodiment, the leveling unit 5 includes a connecting member 51 and a rolling member 52, the connecting member 51 is liftably provided to the upper frame 1, and the rolling member 52 is rotatably connected to the connecting member 51 and is rollably connected to the connection pad 21 to abut against the connection pad 21 during leveling. Thereby, the rolling member 52 can rotate relative to the land 21 when the land 21 and the liquid receiving ring 22 rotate, thereby reducing friction between the leveling unit 5 and the land 21. Thus, when the liquid receiving ring 22 rotates, the liquid receiving ring 22 can be leveled by the leveling unit 5.
Referring to fig. 3, in the first embodiment, the rolling member 52 abuts against the upper end surface of the land 21. In the process of leveling the liquid receiving ring 22, if the portion of the land 21 that is abutted by the rolling piece 52 is inclined upward, the rolling piece 52 is lowered to return the portion of the land 21 that is abutted by the rolling piece 52 to the leveling state; if the portion of the land 21 abutted by the rolling piece 52 is inclined downward, the rolling piece 52 is lifted up to allow the portion of the land 21 abutted by the rolling piece 52 to return to the leveling state.
Of course, as shown in fig. 5, in other embodiments, the rolling element 52 may abut against the lower end surface of the connecting disc 21.
In the above embodiment, the rolling member 52 may be a roller, and the above embodiment does not particularly limit the structural form of the rolling member 52.
Referring to fig. 1 to 4, in the first embodiment, the brush head 3, the first driving member 4, the detecting unit, and the leveling unit 5 are all provided with a plurality of sets, and are respectively disposed in a one-to-one correspondence: each first driving member 4 drives the corresponding brush head 3 to rotate, each detecting unit detects the load of the corresponding first driving member 4, and each leveling unit 5 is disposed near the corresponding brush head 3. When the part of the liquid receiving ring 22 below the brush head 3 deviates from the leveling state, the leveling unit 5 corresponding to the brush head 3 participates in leveling the liquid receiving ring 22. Wherein the brush head 3 is arranged around the central shaft of the upper disc.
These brush heads 3 are, for example, uniformly distributed along the circumferential direction of the central axis of the upper disc. Thus, when the liquid receiving ring 22 is cleaned, the plurality of brush heads 3 uniformly apply force to the liquid receiving ring 22, and indirectly, the plurality of brush heads 3 uniformly apply force to the upper disc central shaft, which is beneficial to preventing the centering degree of the upper disc central shaft from being influenced by the force applied by the brush heads 3.
Referring to fig. 1 to fig. 4, in the first embodiment or other embodiments, the brush head 3, the first driving member 4, the detecting unit, and the leveling unit 5 are all provided with a plurality of sets, and are respectively disposed in a one-to-one correspondence manner, and the leveling unit 5 is disposed around the central axis of the upper disc.
Illustratively, these leveling units 5 are uniformly distributed along the circumferential direction of the central axis of the upper tray. Thus, the liquid receiving ring 22 can be leveled by the leveling unit 5 regardless of the direction in which the liquid receiving ring 22 is inclined with respect to the upper frame 1.
Referring to fig. 1 to fig. 4 together, in the first embodiment or other embodiments, the brush head 3, the first driving member 4, the detecting unit, and the leveling unit 5 are all provided with a plurality of sets, and are respectively disposed in one-to-one correspondence, and the corresponding first driving member 4 and the leveling unit 5 are disposed side by side. Thereby, the leveling unit 5 is facilitated to level the portion of the liquid receiving ring 22 located below the corresponding brush head 3.
In the first embodiment or other embodiments, the polishing machine further comprises a sealing cover, the sealing cover is sleeved outside the central shaft of the upper disc, and the upper frame 1 and the liquid receiving structure 2 are both positioned in the sealing cover. The sealing cover plays a protective role, and specifically, the sealing cover separates the upper frame 1 and the liquid receiving structure 2 from the outside so as to prevent the outside impurities from entering the polishing machine, thereby being beneficial to improving the cleanliness of the polishing machine.
It will be appreciated that a water wash arrangement may be provided on the polisher described above to co-clean the liquid receiving ring 22 with the brush head 3. In the above-described embodiment, the detection unit includes a sensor for detecting the load of the first driver 4.
Secondly, the invention also provides a leveling method for leveling the connecting disc 21 in the polishing machine, thereby leveling the liquid receiving ring 22. It will be appreciated that since the liquid receiving ring 22 is fixedly connected to the connecting disc 21, leveling the connecting disc 21 levels the liquid receiving ring 22. The leveling method comprises the following steps:
a. setting the load of the first driving member 4 in the state where the connection disc 21 is leveled as a standard load m 0 ；
b. Rotating the connection disc 21 at least one turn;
c. acquisition of load m of first driver 4 during one revolution of coupling disc 21 1 Judging the load m 1 Whether or not to equal the standard load m 0 ；
d. For any first driving member 4, if the load of the first driving member 4 during the rotation of the connecting disc 21 from the first driving member 4 by a first angle is always smaller than m 0 C, jacking up the area corresponding to the first angle of rotation of the connecting disc 21 by using the leveling unit 5, and executing the step c;
e. for any first driving member 4, if the load of the first driving member 4 during the rotation of the connecting disc 21 from the first driving member 4 by a first angle is always larger than m 0 C, using the leveling unit 5 to enable the area corresponding to the rotation of the connecting disc 21 by the first angle to descend, and executing the step c;
f. if the load m of each first driving member 4 1 Are all always equal to m 0 And judging that the connecting disc 21 is in a leveling state, and finishing leveling.
It will be appreciated that in step d, if the load of the first driving member 4 during the rotation of the connection disc 21 from the first driving member 4 by the first angle is always smaller than m 0 It is explained that the distance between the bottom wall of the liquid receiving ring 22 and the bottom end of the carrier 31 is too large in this process. In step e, if theThe load of the first driving member 4 during the rotation of the connecting disc 21 from the first driving member 4 by a first angle is always larger than m 0 It is explained that the distance between the bottom wall of the liquid receiving ring 22 and the bottom end of the carrier 31 is too small in this process.
In this levelling method, the load m of the first drive 4 is detected by detecting 1 And let m 1 And standard load m 0 By comparison, whether the brush head 3 works in the state that the liquid receiving ring 22 is leveled can be judged, so that whether the liquid receiving ring 22 is in the leveling state can be indirectly judged. In other words, the standard load m 0 Provides visual index for leveling the liquid receiving ring 22, and the load m of the first driving member 4 1 As the parameter being adjusted. If the load m of each first driving member 4 1 Are all equal to m 0 The connection disc 21 is in a leveling state, the liquid receiving ring 22 is in a leveling state, and leveling is completed. Otherwise, the attitude of the liquid receiving ring 22 relative to the upper frame 1 is adjusted by the leveling unit 5 so that the load m of each first driving member 4 1 All tend to m 0 Up to the load m of the respective first driving member 4 1 Are all equal to m 0 . Therefore, the leveling method can achieve leveling only by detecting the load of the first driving piece 4 without detecting the relative pose between the liquid receiving ring 22 and the upper frame 1.
Compared with the detection of the relative pose, the detection load is easier to realize, and the detection cost is lower. Therefore, the leveling method is easy to implement and has low detection cost.
After the liquid receiving ring 22 is leveled by the leveling method, the height difference between the liquid outlet of each liquid flowing pipe and the liquid receiving ring 22 is consistent, so that the liquid quantity and the flow rate of the polishing liquid flowing into the upper disc are uniform, the polishing liquid is uniformly supplied, and the polishing quality of products is improved.
Further, if the liquid receiving ring 22 is cleaned with the brush head 3 for a long time in a state where the liquid receiving ring 22 is inclined with respect to the upper frame 1, the brush head 3 may damage the liquid receiving ring 22. The leveling method can be used for leveling the liquid receiving ring 22 so as to prevent the brush head 3 from damaging the liquid receiving ring 22.
In one embodiment, the center of the upper disc can be passedThe shaft drives the connecting disc 21 to rotate, and the load m of the first driving piece 4 can be obtained through the detection unit 1 The leveling unit 5 may be driven to lift up and down by the third driving piece 7 to jack up the land 21 or to lower down the land 21.
In one embodiment, for step c, the load m of the first drive member 4 can be continuously acquired in real time by the detection unit during one revolution of the connection disc 21 1 To learn the load m of the first driving member 4 1 How it changes during one revolution of the connection disc 21.
In one embodiment, in step d: if a radial line segment on the connecting disc 21 rotationally passes over a first driving member 4, the load m of the first driving member 4 1 Always smaller than m 0 And m is 1 Decreasing followed by increasing means that the lowest point when the liquid receiving ring 22 is tilted is located on the extension of the radial line segment extending towards the liquid receiving ring 22. If so, the radial line segment is jacked up by the leveling unit 5. It should be noted that the process of rotationally passing the radial line segment on the connection disc 21 over the first driving member 4 is similar to the process of passing the hand on the timepiece over the time scale, and the description is intended to assist understanding of the present embodiment, not limitation of the positional relationship between the connection disc 21 and the first driving member 4.
Illustratively, in step d: upon detection of the load m of the first driving member 4 1 When the expansion starts, the leveling units 5 provided side by side to the first driver 4 are lifted up to jack up the portion of the radial line segment located at the land 21. Alternatively, in step d: the load m on the first driving member 4 1 In the gradual decrease process, if m is detected 1 When the rate of change of (2) is close to 0, the leveling units 5 provided in parallel to the first driving element 4 are raised to jack up the portion of the radial line segment located on the land 21.
In one embodiment, in step e: if a radial line segment on the connecting disc 21 rotationally passes over a first driving member 4, the load m of the first driving member 4 1 Always greater than m 0 And m is 1 The increase and decrease are described as the highest point of the liquid receiving ring 22 when it is tiltedOn an extension of the radial line segment extending toward the liquid receiving ring 22. If so, the radial line segment is lowered by the leveling unit 5.
Illustratively, in step e: upon detection of the load m of the first driving member 4 1 At the beginning of the decrease, the leveling units 5 provided side by side to the first driving member 4 are lowered so that the portion of the radial line segment located at the land 21 is lowered. Alternatively, in step e: the load m on the first driving member 4 1 In the process of gradually increasing, if m is detected 1 When the rate of change of (2) is close to 0, the leveling units 5 provided in parallel to the first driving element 4 are raised to jack up the portion of the radial line segment located on the land 21.
In one of the embodiments, in step b, each leveling unit 5 is kept separate from the tapping structure 2 at all times. Therefore, the leveling unit 5 can be prevented from affecting the posture of the liquid receiving structure 2, so that the inclination direction of the liquid receiving ring 22 can be continuously changed along with the rotation of the liquid receiving ring 22, and the lowest point and the highest point of the liquid receiving ring 22 when the liquid receiving ring 22 is inclined can be avoided from being found out through the steps. If the inclination direction of the liquid receiving ring 22 is regarded as a line, the line moves like a conical pendulum during the rotation of the liquid receiving ring 22.
In one of the embodiments, in step d and step e, each leveling unit 5 is adjusted simultaneously so that each leveling unit 5 is always in contact with the connection disc 21. In a state where each leveling unit 5 is in contact with the land 21, the pose of the land 21 and the liquid receiving ring 22 is defined by the leveling units 5, and the rotation of the liquid receiving ring 22 no longer affects the inclination direction of the liquid receiving ring 22. In this state, in the leveling method described above, the leveling unit 5 that needs to perform the raising operation always performs only the raising operation and does not perform the lowering operation, and the leveling unit 5 that needs to perform the lowering operation always performs only the lowering operation and does not perform the raising operation. Thus, each leveling unit 5 performs only a unidirectional action to cause the load m of the corresponding first driving member 4 1 Gradually trend towards m 0 Up to the load m of the respective first driving member 4 1 Are all equal to m 0 Leveling of the tapping ring 22 is completed.
In each embodiment of the leveling method, if the leveling unit 5 is abutted against the upper end of the connection pad 21 (as shown in fig. 3), the step d is performed first and then the step e is performed; if the leveling unit 5 abuts against the lower end of the connection pad 21 (as shown in fig. 5), step e is performed first and then step d is performed. Thereby, the mutual interference between the respective leveling units can be prevented.
The technical features of the above-described embodiments may be arbitrarily combined, and all possible combinations of the technical features in the above-described embodiments are not described for brevity of description, however, as long as there is no contradiction between the combinations of the technical features, they should be considered as the scope of the description.
The above examples illustrate only a few embodiments of the invention, which are described in detail and are not to be construed as limiting the scope of the invention. It should be noted that it will be apparent to those skilled in the art that several variations and modifications can be made without departing from the spirit of the invention, which are all within the scope of the invention. Accordingly, the scope of protection of the present invention is to be determined by the appended claims.
Claims (9)
1. The utility model provides a burnishing machine, includes the upper disc center pin, the upper disc center pin is used for driving the upper disc and rotates and go up and down, its characterized in that still includes:
the upper rack (1) is fixedly arranged relative to the central shaft of the upper disc;
the liquid receiving structure (2) comprises a connecting disc (21) and a liquid receiving ring (22), wherein the connecting disc (21) is sleeved on the central shaft of the upper disc, and the liquid receiving ring (22) is fixedly connected with the connecting disc (21);
a brush head (3) at least partially positioned in the liquid receiving ring (22) so as to be in contact with the inner wall of the liquid receiving ring (22);
the first driving piece (4) is connected to the upper frame (1) and used for driving the brush head (3) to rotate;
a detection unit for detecting a load of the first driving member (4); a kind of electronic device with high-pressure air-conditioning system
The leveling unit (5) is movably arranged on the upper frame (1) and is used for leveling the connecting disc (21); the leveling unit (5) comprises a connecting piece (51) and a rolling piece (52), wherein the connecting piece (51) is arranged on the upper frame (1) in a lifting mode, and the rolling piece (52) is rotationally connected with the connecting piece (51) and is in rolling connection with the connecting disc (21) in the leveling process so as to be abutted to the connecting disc (21).
2. The polishing machine according to claim 1, further comprising a second driving member (6) fixedly arranged on the upper frame (1), wherein the second driving member (6) comprises a second output shaft which can be lifted, and the brush head (3) is connected to the second output shaft; and/or the number of the groups of groups,
the polishing machine further comprises a third driving piece (7) fixedly arranged on the upper frame (1), the third driving piece (7) comprises a third output shaft capable of ascending and descending, and the leveling unit (5) is arranged on the third output shaft.
3. The polishing machine according to claim 1, wherein a plurality of brush heads (3), the first driving piece (4), the detection unit and the leveling unit (5) are arranged and are respectively arranged in a one-to-one correspondence manner, and the brush heads (3) are annularly arranged on the upper disc central shaft; and/or the number of the groups of groups,
the brush head (3), the first driving piece (4), the detection unit and the leveling unit (5) are all provided with a plurality of brush heads and are respectively arranged in a one-to-one correspondence manner, and the leveling units (5) are annularly arranged on the central shaft of the upper disc; and/or the number of the groups of groups,
the brush head (3) is provided with a plurality of first driving parts (4), the detection units and the leveling units (5) respectively correspond to each other one by one, and the corresponding first driving parts (4) and the leveling units (5) are arranged side by side.
4. The polishing machine according to claim 1, further comprising a sealing cover, wherein the sealing cover is sleeved outside the upper disc central shaft, and the upper frame (1) and the liquid receiving structure (2) are both positioned in the sealing cover.
5. A leveling method for leveling the connection pad (21) in the polishing machine according to any one of claims 1 to 4, characterized by comprising the steps of:
a. setting the load of the first driving piece (4) in the leveling state of the connecting disc (21) as a standard load m 0 ；
b. Rotating the connecting disc (21) at least one circle;
c. acquiring the load m of the first driving member (4) during one rotation of the connecting disc (21) 1 Judging the load m 1 Whether or not to equal the standard load m 0 ；
d. For any first driving piece (4), if the load of the first driving piece (4) in the process of rotating the connecting disc (21) from the first driving piece (4) to a first angle is always smaller than m 0 C, jacking up an area corresponding to the rotation of the connecting disc (21) by a first angle by using the leveling unit (5), and executing the step c;
e. for any first driving piece (4), if the load of the first driving piece (4) in the process of rotating the connecting disc (21) from the first driving piece (4) to a first angle is always larger than m 0 C, the leveling unit (5) is utilized to enable the area corresponding to the rotation of the connecting disc (21) by a first angle to descend, and the step c is executed;
f. if the load m of each first driving member (4) 1 Are all always equal to m 0 And judging that the connecting disc (21) is in a leveling state, and finishing leveling.
6. The leveling method according to claim 5, characterized in that in step d: if a certain radial line segment on the connecting disc (21) rotationally passes over a certain first driving member (4), the load m of the first driving member (4) 1 Always smaller than m 0 And m is 1 Firstly decreasing and then increasing, the diameter is adjusted by a leveling unit (5)Jacking up the line segment; and/or the number of the groups of groups,
in step e: if a certain radial line segment on the connecting disc (21) rotationally passes over a certain first driving member (4), the load m of the first driving member (4) 1 Always greater than m 0 And m is 1 The radial line segment is lowered by the leveling unit (5) when the radial line segment is increased and then decreased.
7. The leveling method according to claim 6, characterized in that in step d: upon detection of the load m of the first driving member (4) 1 When the radial line section starts to be increased, the leveling units (5) arranged in parallel on the first driving piece (4) are lifted to jack up the part of the radial line section positioned on the connecting disc (21); and/or the number of the groups of groups,
in step e: upon detection of the load m of the first driving member (4) 1 When the reduction is started, the leveling units (5) arranged side by side on the first driving piece (4) are lowered so that the part of the radial line segment positioned on the connecting disc (21) is lowered.
8. Leveling method according to claim 5, characterized in that in step b, each leveling unit (5) is kept always separate from the liquid receiving structure (2); and/or the number of the groups of groups,
in step d and step e, each leveling unit (5) is adjusted simultaneously so that each leveling unit (5) is always in contact with the connection disc (21).
9. The leveling method according to claim 5, wherein if the leveling unit (5) is abutted against the upper end of the connection disc (21), step d is performed first and then step e is performed; if the leveling unit (5) is abutted against the lower end of the connecting disc (21), the step e is executed first, and then the step d is executed.
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| CN202311037434.4A CN116749055B (en) | 2023-08-17 | 2023-08-17 | Polishing machine and leveling method |
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| CN202311037434.4A CN116749055B (en) | 2023-08-17 | 2023-08-17 | Polishing machine and leveling method |
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| DE19941903A1 (en) * | 1999-09-02 | 2001-03-15 | Wacker Siltronic Halbleitermat | Semiconductor wafers polishing method e.g. for manufacture of microelectronic devices, allows individual treatment of wafers by independent adjustment of pressure of polishing chambers |
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