CN116745835A - Display device, display module, electronic apparatus, and method for manufacturing display device - Google Patents
Display device, display module, electronic apparatus, and method for manufacturing display device Download PDFInfo
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- CN116745835A CN116745835A CN202280010936.5A CN202280010936A CN116745835A CN 116745835 A CN116745835 A CN 116745835A CN 202280010936 A CN202280010936 A CN 202280010936A CN 116745835 A CN116745835 A CN 116745835A
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Landscapes
- Electroluminescent Light Sources (AREA)
Abstract
A high definition display device having a light detection function is provided. A high resolution display device having a light detection function is provided. In the display device, the first pixel includes a first light emitting device, a second light emitting device, a third light emitting device, a first light receiving device, and a second light receiving device. The first light emitting device has a function of emitting red light. The second light emitting device has a function of emitting green light. The third light emitting device has a function of emitting blue light. The first light receiving device has a function of detecting light emitted from at least one of the three light emitting devices. The second light receiving device has a function of detecting infrared light.
Description
Technical Field
One embodiment of the present invention relates to a display device, a display module, and an electronic apparatus. One embodiment of the present invention relates to a method for manufacturing a display device.
Note that one embodiment of the present invention is not limited to the above-described technical field. Examples of the technical field of one embodiment of the present invention include a semiconductor device, a display device, a light-emitting device, a power storage device, a storage device, an electronic device, a lighting device, an input device (for example, a touch sensor or the like), an input/output device (for example, a touch panel or the like), a driving method of these devices, and a manufacturing method of these devices.
Background
In recent years, mobile phones such as smart phones, tablet information terminals, information terminal devices such as notebook PCs (personal computers), and the like have been widely used. Such information terminal apparatuses include personal information and the like in many cases, and various identification technologies for preventing improper use have been developed. An information terminal device having various functions such as an image display function, a touch sensor function, a function for recognizing a photographed fingerprint, and the like is required.
For example, patent document 1 discloses an electronic device including a fingerprint sensor in a push-button switch section.
As a display device, for example, a light-emitting device including a light-emitting device (also referred to as a light-emitting element) has been developed. A light-emitting device (also referred to as an "EL device", "EL element") utilizing an Electroluminescence (hereinafter referred to as EL) phenomenon has a structure in which a thin and lightweight structure is easily achieved; can respond to the input signal at a high speed; and a feature that can be driven using a direct current constant voltage power supply or the like, and has been applied to a display device.
[ Prior Art literature ]
[ patent literature ]
Patent document 1 U.S. patent application publication No. 2014/0056493 specification
Disclosure of Invention
Technical problem to be solved by the invention
An object of one embodiment of the present invention is to provide a high-definition display device having a light detection function. An object of one embodiment of the present invention is to provide a high-resolution display device having a light detection function. An object of one embodiment of the present invention is to provide a large-sized display device having a light detection function. An object of one embodiment of the present invention is to provide a display device having a light detection function with high reliability.
An object of one embodiment of the present invention is to provide a method for manufacturing a high-definition display device having a light detection function. An object of one embodiment of the present invention is to provide a method for manufacturing a high-resolution display device having a light detection function. An object of one embodiment of the present invention is to provide a method for manufacturing a large-sized display device having a light detection function. An object of one embodiment of the present invention is to provide a method for manufacturing a display device having a light detection function with high reliability. An object of one embodiment of the present invention is to provide a method for manufacturing a display device having a light detection function and a high yield.
Note that the description of these objects does not prevent the existence of other objects. Not all of the above objects need be achieved in one embodiment of the present invention. Other objects than the above objects can be extracted from the description of the specification, drawings, and claims.
Means for solving the technical problems
One embodiment of the present invention is a display device including: and a first pixel including a first light emitting device, a second light emitting device, a first light receiving device, and a second light receiving device, the first light emitting device and the second light emitting device having a function of emitting visible light having different wavelengths from each other, the first light receiving device having a function of detecting light emitted from the first light emitting device, and the second light receiving device having a function of detecting infrared light.
One embodiment of the present invention is a display device including: and a first pixel including a first light emitting device having a function of emitting red light, a second light emitting device having a function of emitting green light, a third light emitting device having a function of emitting blue light, a first light receiving device having a function of detecting light emitted from at least one of the first light emitting device, the second light emitting device, and the third light emitting device, and a second light receiving device having a function of detecting infrared light.
The second light receiving device preferably has a function of detecting an object that is not in contact with the display device.
The area of the light receiving region of the first light receiving device is preferably smaller than the area of the light receiving region of the second light receiving device.
Each of the display devices preferably includes a second pixel having a first light emitting device, a second light emitting device, a first light receiving device, and a sensor device.
One embodiment of the present invention is an electronic device including: the display device having any one of the above structures has a function of detecting at least one of force, displacement, position, velocity, acceleration, angular velocity, rotational speed, distance, magnetism, temperature, chemical substance, time, hardness, electric field, current, voltage, electric power, radiation, flow, humidity, inclination, vibration, smell, health state, pulse, body temperature, and blood oxygen concentration using the sensor.
Each of the display devices preferably includes a second pixel having a first light emitting device, a second light emitting device, a fourth light emitting device, and a first light receiving device.
An embodiment of the present invention is an electronic apparatus including the display device, the fourth light-emitting device, and the housing of any of the above structures. The fourth light emitting device preferably has a function of emitting infrared light. The fourth light emitting device preferably emits light to the outside of the electronic apparatus through the display device.
One embodiment of the present invention is a display module including a display device having any of the above-described structures, in which a connector such as a flexible printed circuit board (Flexible Printed Circuit), a TCP (Tape Carrier Package: tape carrier package) or the like is mounted, and an Integrated Circuit (IC) is mounted by a COG (Chip On Glass) method, a COF (Chip On Film) method or the like.
One embodiment of the present invention is an electronic device including: the display module; and at least one of a housing, a battery, a camera, a speaker, and a microphone.
One embodiment of the present invention is a method for manufacturing a display device, including the steps of: forming a first pixel electrode, a second pixel electrode and a third pixel electrode; forming a first layer including a light emitting layer over the first pixel electrode, the second pixel electrode, and the third pixel electrode; forming a first sacrificial layer on the first layer; processing the first layer and the first sacrificial layer to expose the second pixel electrode and the third pixel electrode; forming a second layer including a first active layer on the first pixel electrode, the second pixel electrode, and the third pixel electrode; forming a second sacrificial layer on the second layer; processing the second layer and the second sacrificial layer to expose the first sacrificial layer and the third pixel electrode; forming a third layer including a second active layer over the first pixel electrode, the second pixel electrode, and the third pixel electrode; forming a third sacrificial layer on the third layer; processing the third layer and the third sacrificial layer to expose the first sacrificial layer and the second sacrificial layer; removing the first sacrificial layer, the second sacrificial layer and the third sacrificial layer; and forming a common electrode on the first layer, the second layer, and the third layer.
After removing the first, second, and third sacrificial layers, a fourth layer may be formed on the first, second, and third layers, and the common electrode may be formed on the fourth layer.
A protective layer may also be formed on the common electrode.
Effects of the invention
According to one embodiment of the present invention, a high-definition display device having a light detection function can be provided. According to one embodiment of the present invention, a high-resolution display device having a light detection function can be provided. According to one embodiment of the present invention, a large-sized display device having a light detection function can be provided. According to one embodiment of the present invention, a display device having a light detection function with high reliability can be provided.
According to one embodiment of the present invention, a method of manufacturing a high-definition display device having a light detection function can be provided. According to one embodiment of the present invention, a method for manufacturing a high-resolution display device having a light detection function can be provided. According to one embodiment of the present invention, a method for manufacturing a large-sized display device having a light detection function can be provided. According to one embodiment of the present invention, a method for manufacturing a display device having a light detection function and high reliability can be provided. According to one embodiment of the present invention, a method for manufacturing a display device having a light detection function and a high yield can be provided.
Note that the description of these effects does not prevent the existence of other effects. One embodiment of the present invention need not have all of the above effects. Effects other than the above can be extracted from the description, drawings, and claims.
Brief description of the drawings
Fig. 1A and 1B are diagrams showing an example of a pixel of a display device. Fig. 1C and 1D are cross-sectional views showing an example of an electronic device.
Fig. 2A and 2B are cross-sectional views showing an example of an electronic device.
Fig. 3A to 3D are diagrams showing one example of a pixel of a display device. Fig. 3E is a sectional view showing one example of the electronic device.
Fig. 4 is a diagram showing an example of the layout of the display device.
Fig. 5 is a diagram showing an example of the layout of the display device.
Fig. 6 is a diagram showing an example of a layout of the display device.
Fig. 7 is a diagram showing an example of the layout of the display device.
Fig. 8 is a diagram showing an example of a pixel circuit.
Fig. 9A is a plan view showing an example of the display device. Fig. 9B is a sectional view showing an example of the display device.
Fig. 10A to 10D are diagrams showing an example of a manufacturing method of a display device.
Fig. 11A to 11C are diagrams showing an example of a manufacturing method of a display device.
Fig. 12A to 12C are diagrams showing an example of a manufacturing method of a display device.
Fig. 13A to 13C are diagrams showing an example of a manufacturing method of a display device.
Fig. 14 is a perspective view showing an example of a display device.
Fig. 15A is a cross-sectional view showing an example of a display device. Fig. 15B and 15C are cross-sectional views showing an example of a transistor.
Fig. 16A to 16D are diagrams showing structural examples of the light emitting device.
Fig. 17A and 17B are cross-sectional views showing an example of a display device.
Fig. 18A and 18B are cross-sectional views showing an example of a display device.
Fig. 19A and 19B are cross-sectional views showing an example of a display device.
Fig. 20A to 20C are sectional views showing one example of a display device.
Fig. 21A and 21B are diagrams showing an example of an electronic device.
Fig. 22A to 22D are diagrams showing one example of the electronic device.
Fig. 23A to 23F are diagrams showing one example of the electronic device.
Fig. 24A and 24B are diagrams illustrating an evaluation method according to an embodiment.
Fig. 25A and 25B are diagrams showing the evaluation results of the examples.
Fig. 26 is a diagram showing the evaluation results of the examples.
Fig. 27 is a diagram showing the evaluation results of the examples.
Fig. 28 is a diagram showing the evaluation results of the examples.
Fig. 29 is a diagram showing the evaluation results of the examples.
Modes for carrying out the invention
The embodiments will be described in detail with reference to the accompanying drawings. It is noted that the present invention is not limited to the following description, but one of ordinary skill in the art can easily understand the fact that the manner and details thereof can be changed into various forms without departing from the spirit and scope of the present invention. Therefore, the present invention should not be construed as being limited to the description of the embodiments shown below.
Note that in the structure of the invention described below, the same reference numerals are used in common in different drawings to show the same portions or portions having the same functions, and repetitive description thereof will be omitted. In addition, the same hatching is sometimes used when displaying portions having the same function, and no symbol is particularly appended.
For ease of understanding, the positions, sizes, ranges, and the like of the constituent elements shown in the drawings may not show actual positions, sizes, ranges, and the like. Accordingly, the disclosed invention is not necessarily limited to the position, size, scope, etc. disclosed in the accompanying drawings.
Furthermore, the words "film" and "layer" may be interchanged depending on the circumstances or state. For example, the "conductive layer" may be converted into the "conductive film". Further, the "insulating film" may be converted into an "insulating layer".
(embodiment 1)
In this embodiment mode, a display device according to an embodiment of the present invention will be described with reference to fig. 1 to 8.
The display device according to one embodiment of the present invention includes a first pixel including a light emitting device, a first light receiving device, and a second light receiving device.
The display device according to one embodiment of the present invention can display an image using a light emitting device.
The first light receiving device preferably has a smaller area of the light receiving region (also simply referred to as light receiving area) than the second light receiving device. By narrowing the photographing range, the first light receiving device can perform high-definition photographing as compared with the second light receiving device. At this time, the first light receiving device may be used for photographing or the like using personal recognition of fingerprints, palmprints, irises, pulse shapes (including vein shapes, artery shapes), faces, or the like. The first light receiving device may appropriately determine the wavelength of the detected light according to the purpose. For example, the first light receiving device preferably detects visible light.
The second light receiving device may be used for a touch sensor (also referred to as a direct touch sensor) or a proximity touch sensor (also referred to as a hover sensor, hover touch sensor, non-contact sensor, non-touch sensor), or the like. The second light receiving device may appropriately determine the wavelength of the detected light according to the purpose. For example, the second light receiving device preferably detects infrared light (including near infrared light). Thus, touch can be detected even in a dim environment. In addition, when the second light receiving device detects infrared light, detection may be performed with high sensitivity even if dust or water drops adhere to the surface of the display device, as compared with the capacitive touch sensor.
Here, the touch sensor or the proximity touch sensor may detect proximity or touch of an object (finger, palm, pen, or the like). The touch sensor can detect an object by directly contacting the object with the display device. Further, the proximity touch sensor can detect an object even if the object is not in contact with the display device. For example, the following structure is preferably adopted: the display device can detect an object within a range of 0.1mm to 300mm, preferably 3mm to 50mm, of a distance between the display device and the object. With this configuration, the operation can be performed without directly touching the display device with the object. In other words, the display device can be operated with no touch (non-contact). By adopting the above structure, the risk of the display device being stained or damaged can be reduced or the display device can be operated so that the object does not come into direct contact with the stain (for example, dust, virus, or the like) adhering to the display device.
Further, since the first light receiving device and the second light receiving device have a difference in detection accuracy, the detection method of the object may be selected according to the function. For example, the scrolling function of the display screen may be realized by a proximity touch sensor function using the second light receiving device, and the input function with the keyboard displayed on the screen may be realized by a high definition touch sensor function using the first light receiving device.
By mounting two types of light receiving devices in one pixel, two functions can be added in addition to the display function, and thus the display device can be made multifunctional.
Note that, for high-definition photographing, the first light receiving device is preferably provided in all pixels included in the display apparatus. On the other hand, the second light receiving device used for the touch sensor, the proximity touch sensor, or the like may be provided in a part of the pixels included in the display device since it is not necessary to detect with higher accuracy than the detection using the first light receiving device. The number of second light receiving devices included in the display device is smaller than the number of first light receiving devices, so that the detection speed can be increased.
The display device according to an embodiment of the present invention may include a plurality of the first pixels and a plurality of the second pixels. The second pixel includes a light emitting device and a first light receiving device, which is the same as the first pixel, and includes other devices excluding the second light receiving device, which is different from the first pixel.
The second pixel may include various sensing devices or a light emitting device emitting infrared light, etc. In this manner, by providing a device different from the first pixel in the second pixel, the display device can be made multifunctional.
Note that when light emitting devices of three colors of red, green, and blue are provided in a pixel for full-color display, one pixel is constituted by five sub-pixels by further providing two light receiving devices. In a pixel including a plurality of sub-pixels as such, it is difficult to achieve a high aperture ratio. Alternatively, it is difficult to realize a display device with high definition using pixels including a plurality of sub-pixels. Accordingly, the display device according to one embodiment of the present invention is preferably manufactured by using the manufacturing method of the display device according to one embodiment of the present invention described in detail in embodiment 2.
In the method for manufacturing the display device described in embodiment mode 2, the island-shaped EL layer is formed by processing after the EL layer is deposited over the entire surface, and is formed without using a high-definition metal mask. Thus, a high-definition display device or a high aperture ratio display device which could not be realized before can be realized. Further, a high-definition display device or a high-aperture display device having a light detection function with a light receiving device mounted thereon can be realized.
As described above, the display device according to one embodiment of the present invention can have a high aperture ratio or a high definition and multifunctional structure.
Fig. 1A shows an example of a pixel included in a display device according to an embodiment of the present invention.
The pixel 180A shown in fig. 1A includes a sub-pixel G, a sub-pixel B, a sub-pixel R, a sub-pixel PS, and a sub-pixel IRS.
Fig. 1A shows an example in which sub-pixels of 2 rows and 3 columns are arranged in one pixel 180A. The pixel 180A includes three sub-pixels (sub-pixel G, sub-pixel B, and sub-pixel R) in the upper line (line 1), and two sub-pixels (sub-pixel PS and sub-pixel IRS) in the lower line (line 2). In other words, the pixel 180A includes two sub-pixels (sub-pixel G and sub-pixel PS) in the left column (column 1), sub-pixel B in the center column (column 2), sub-pixel R in the right column (column 3), and sub-pixel IRS along the center column to the right column. Note that the layout of the sub-pixels is not limited to the structure of fig. 1A.
As shown in fig. 1B, three sub-pixels (sub-pixel PS and two sub-pixels IRS) may be included in the downstream line (line 2). As shown in fig. 1B, by aligning the arrangement of the up-and down-going sub-pixels, dust and the like that may occur in the manufacturing process can be efficiently removed. Accordingly, a display device with high display quality can be provided.
Fig. 1C and 1D show an example of a cross-sectional view of an electronic device including a display device according to an embodiment of the present invention.
The electronic apparatuses shown in fig. 1C and 1D each include a display device 100 and a light source 104 between a housing 103 and a protective member 105.
The light source 104 includes a light emitting device that emits infrared light 31 IR. Light source 104 preferably uses a light emitting diode (LED: light Emitting Diode), for example.
Fig. 1C shows an example in which the light source 104 is arranged at a position that does not overlap with the display device 100. At this time, the light emitted from the light source 104 is emitted to the outside of the electronic apparatus through the protection member 105.
Fig. 1D shows an example in which a display device is provided overlapping with a light source 104. At this time, the light emitted from the light source 104 is emitted to the outside of the electronic apparatus through the display device 100 and the protection member 105.
The display device 100 shown in fig. 1C and 1D corresponds to a cross-sectional structure between the dashed lines A1 to A2 in fig. 1A. The display device 100 includes a plurality of light emitting devices and a plurality of light receiving devices between the substrate 106 and the substrate 102.
The subpixel R includes a light emitting device 130R emitting red light 31R. The subpixel G includes a light emitting device 130G emitting green light 31G. The sub-pixel B includes a light emitting device 130B that emits blue light 31B.
The sub-pixel PS includes a light receiving device 150PS, and the sub-pixel IRS includes a light receiving device 150IRS.
As shown in fig. 1C and 1D, the infrared light 31IR emitted from the light source 104 is reflected by the object 108 (here, finger), and the reflected light 32IR from the object 108 enters the light receiving device 150IRs. Although the object 108 does not touch the electronic device, the object 108 may be detected using the light receiving device 150IRS.
Note that although the example of detecting the object using the infrared light 31IR is shown in the present embodiment, the wavelength of light detected by the light receiving device 150IRs is not particularly limited. The light receiving device 150IRS preferably detects infrared light. Alternatively, the light receiving device 150IRS may detect visible light, or may detect both infrared light and visible light.
Here, in the touch sensor or the proximity touch sensor, by increasing the light receiving area of the light receiving device, the object may be more easily detected. Therefore, as shown in fig. 2A, the object 108 can also be detected by using both the light receiving device 150PS and the light receiving device 150IRS.
As in fig. 1C and 1D, in fig. 2A, the infrared light 31IR emitted from the light source 104 is reflected by the object 108 (here, finger), and the reflected light 32IR from the object 108 enters the light receiving device 150IRs. In fig. 2A, the green light 31G emitted from the light emitting device 130G is also reflected by the object 108, and the reflected light 32G from the object 108 enters the light receiving device 150PS. Although the object 108 does not touch the electronic device, the object 108 may be detected using the light receiving device 150IRS and the light receiving device 150PS.
Note that the object 108 of the touch electronic device may be detected using the light receiving device 150IRS (and the light receiving device 150 PS).
The light receiving area of the sub-pixel PS is smaller than that of the sub-pixel IRS. The smaller the light receiving area, the narrower the imaging range, whereby blurring of the imaging result can be suppressed and resolution can be improved. Therefore, by using the sub-pixel PS, high-definition or high-resolution photographing can be performed as compared with the case of using the sub-pixel IRS. For example, imaging or the like for personal recognition of a fingerprint, palm print, iris, pulse shape (including vein shape, artery shape), face, or the like using the sub-pixels PS may be performed.
For example, as shown in fig. 2B, the green light 31G emitted from the light emitting device 130G is reflected by the object 108, and the reflected light 32G from the object 108 is incident on the light receiving device 150PS. The fingerprint of the object 108 may be captured using the light receiving device 150PS.
Note that in the present embodiment, an example is shown in which the object is detected by the light receiving device 150PS using the green light 31G emitted from the light emitting device 130G, and the wavelength of the light detected by the light receiving device 150PS is not particularly limited. The light receiving device 150PS preferably detects visible light, and preferably detects one or more of light of colors such as blue, violet, bluish violet, green, yellowish green, yellow, orange, and red. The light receiving device 150PS may detect infrared light.
For example, the light receiving device 150PS may have a function of detecting the red light 31R emitted from the light emitting device 130R. The light receiving device 150PS may also have a function of detecting the blue light 31B emitted from the light emitting device 130B.
Note that a light emitting device that emits light detected by the light receiving device 150PS is preferably provided in a sub-pixel near the ion pixel PS in the pixel. For example, in the pixel 180A, light emitted from the light emitting device 130G included in the sub-pixel G adjacent to the sub-pixel PS is detected by the light receiving device 150 PS. By adopting such a structure, the detection accuracy can be improved.
The display device according to one embodiment of the present invention may use the structure of the pixel 180A for all pixels, or may use the structure of the pixel 180A for some pixels and use other structures for other pixels.
For example, the display device according to one embodiment of the present invention may include both the pixel 180A shown in fig. 3A and the pixel 180B shown in fig. 3B. Since the pixel 180A shown in fig. 3A has the same structure as the pixel 180A shown in fig. 1A, a detailed description is omitted.
The pixel 180B shown in fig. 3B includes a sub-pixel G, a sub-pixel B, a sub-pixel R, a sub-pixel PS, and a sub-pixel X.
As shown in fig. 3C, the pixel may also include three sub-pixels (sub-pixel PS and two sub-pixels X) in the downstream line (line 2). As described above, by aligning the arrangement of the up-and down-sub-pixels, dust and the like that may occur in the manufacturing process can be efficiently removed. Accordingly, a display device with high display quality can be provided.
By using the device included in the sub-pixel X, various functions can be realized in the display device or the electronic apparatus in which the display device is mounted.
For example, the display device or the electronic apparatus may have a function of measuring at least one of force, displacement, position, velocity, acceleration, angular velocity, rotational speed, distance, magnetism, temperature, chemical substance, time, hardness, electric field, current, voltage, electric power, radiation, flow, humidity, inclination, vibration, smell, health state, pulse, body temperature, blood oxygen concentration, and arterial blood oxygen saturation by using a device included in the sub-pixel X.
Examples of the functions of the display device or the electronic apparatus include a strobe function, a degradation correction function, an acceleration sensor function, an odor sensor function, a health state detection function, a pulse detection function, a body temperature detection function, a pulse oximetry function, and an oximetry function.
The strobe function can be realized by, for example, repeating light emission and non-light emission in a short period.
The flash function can be realized by, for example, generating a flash by instantaneous discharge using the principle of an electric double layer or the like.
Note that the strobe function and the strobe function can be used for crime prevention, self-defense, and the like, for example. The emission color of the strobe light and the flash lamp is preferably white. Note that the emission color of the strobe light and the flash lamp is not particularly limited, and an operator may appropriately select an optimum emission color of one or more of white, blue, violet, bluish violet, green, yellowish green, yellow, orange, red, and the like.
As the degradation correction function, a function of correcting degradation of a light emitting device included in at least one sub-pixel selected from the sub-pixels G, B, and R is given. More specifically, when the reliability of the material for the light emitting device included in the subpixel G is low, two subpixels G may be provided in the pixel 180B by the structure of the subpixel X being the same as that of the subpixel G. By adopting this structure, the area of the sub-pixel G can be doubled. By doubling the area of the sub-pixel G, the reliability can be improved to about twice as compared with a structure having one sub-pixel G. Alternatively, the following structure may be adopted: by providing two sub-pixels G in the pixel 180B, when one sub-pixel G emits no light due to degradation or the like, the other sub-pixel G supplements the emission of one sub-pixel G.
Note that the sub-pixel G, the sub-pixel B, and the sub-pixel R are shown in the above, and the same structure may be adopted.
The acceleration sensor function, the smell sensor function, the health state detection function, the pulse detection function, the body temperature detection function, and the blood oxygen concentration measurement function can be realized by respectively arranging sensor devices required for detection in the sub-pixels X. Further, it can be said that the display apparatus or the electronic device can realize various functions according to the sensor device provided in the sub-pixel X.
As described above, by imparting various functions to the sub-pixel X shown in fig. 3B, the display device including the pixel 180B can be referred to as a multi-function display device or a multi-function panel. Note that the subpixel X may have one or more functions, and the practitioner may appropriately select the most appropriate function.
Note that the display device according to one embodiment of the present invention may include pixels each including four sub-pixels, excluding both the sub-pixel X and the sub-pixel IRS. That is, a pixel having a subpixel G, a subpixel B, a subpixel R, and a subpixel PS may be included. In addition, the number of sub-pixels included in each pixel may be different in the display device. On the other hand, in order to make the quality of each pixel uniform, the number of sub-pixels in all pixels is preferably equal.
For example, the display device according to one embodiment of the present invention may include the pixel 180A shown in fig. 3A and the pixel 180C shown in fig. 3D.
The pixel 180C shown in fig. 3D includes a sub-pixel G, a sub-pixel B, a sub-pixel R, a sub-pixel PS, and a sub-pixel IR.
The sub-pixel IR includes a light emitting device that emits infrared light. That is, the sub-pixels IR may be used as a light source of the sensor. By including the light emitting device that emits infrared light in the display device, it is not necessary to provide a light source separately from the display device, and thus the number of components of the electronic apparatus can be reduced.
Fig. 3E shows an example of a cross-sectional view of an electronic device including a display device according to an embodiment of the present invention.
The electronic apparatus shown in fig. 3E includes the display device 100 between the housing 103 and the protective member 105.
The display device 100 shown in fig. 3E corresponds to a cross-sectional structure along the chain line A1-A2 of fig. 3A and a cross-sectional structure along the chain line A3-A4 of fig. 3D. That is, the display device 100 shown in fig. 3E includes the pixel 180A and the pixel 180C.
The subpixel R includes a light emitting device 130R emitting red light 31R. The subpixel G includes a light emitting device 130G emitting green light 31G. The sub-pixel B includes a light emitting device 130B that emits blue light 31B.
The sub-pixel PS includes a light receiving device 150PS, and the sub-pixel IRS includes a light receiving device 150IRS. The sub-pixel IR includes a light emitting device 130IR that emits infrared light 31 IR.
As shown in fig. 3E, the infrared light 31IR emitted from the light emitting device 130IR is reflected by the object 108 (here, finger), and the reflected light 32IR from the object 108 enters the light receiving device 150IRs. Although the object 108 does not touch the electronic device, the object 108 may be detected using the light receiving device 150IRS.
Fig. 4 to 7 show an example of the layout of the display device.
The proximity touch sensor function may be implemented, for example, as follows: the object (finger, palm, pen, or the like) is irradiated with the light source fixed to the specified portion, the reflected light from the object is detected by the plurality of sub-pixels IRS, and the position of the object is estimated from the detection intensity ratio of the plurality of sub-pixels IRS.
The pixels 180A including the sub-pixels IRS may be arranged in the display section at a fixed period, or may be arranged on the outer periphery of the display section, or the like.
By performing proximity touch detection using only a part of pixels, the driving frequency can be increased. Further, since the sub-pixel X or the sub-pixel IR is mounted in other pixels, the display device can be made multifunctional.
The display device 100A shown in fig. 4 includes two kinds of pixels, namely a pixel 180A and a pixel 180B. In the display device 100A, 1 pixel 180A is provided among 3×3 pixels (9 pixels), and the pixel 180B is used among other pixels.
Note that the period of configuring the pixels 180A is not limited to 3×3 pixels. For example, 1 pixel for touch detection is set for 4 pixels (2×2 pixels), 1 pixel for 16 pixels (4×4 pixels), 1 pixel for 100 pixels (10×10 pixels), or 1 pixel for 900 pixels (30×30 pixels), or the like, may be appropriately determined.
The display device 100B shown in fig. 5 includes two kinds of pixels, namely a pixel 180A and a pixel 180C. In the display device 100B, 1 pixel 180A is provided in 3×3 pixels (9 pixels), and the pixel 180C is used in other pixels.
The display device 100C shown in fig. 6 includes two kinds of pixels, namely a pixel 180A and a pixel 180B. In the display device 100C, the pixel 180A is provided on the outer periphery of the display portion, and the pixel 180B is used for other pixels.
When the pixel 180A is provided on the outer periphery of the display portion, the pixel 180A may be arranged around all of four sides, may be arranged at four corners, may be arranged one or more on each side, and may be arranged in various configurations as shown in fig. 6.
The display device 100D shown in fig. 7 includes two kinds of pixels of a pixel 180A and a pixel 180C. In the display device 100D, the pixel 180A is provided on the outer periphery of the display portion, and the pixel 180C is used for other pixels.
In fig. 4 and 6, the infrared light 31IR emitted from the light source 104 provided outside the display portion of the display device is reflected by the object 108, and the reflected light 32IR from the object 108 is incident on the plurality of pixels 180A. The reflected light 32IR is detected by the sub-pixel IRS provided in the pixel 180A, and the position of the object 108 can be estimated from the detection intensity ratios of the plurality of sub-pixels IRS.
Note that the light source 104 may be provided at least outside the display portion of the display device, or may be mounted in an electronic apparatus separately from the display device. The light source 104 may be, for example, a light emitting diode or the like that emits infrared light.
In fig. 5 and 7, the infrared light 31IR emitted from the sub-pixel IR included in the pixel 180C is reflected by the object 108, and the reflected light 32IR from the object 108 enters the plurality of pixels 180A. The reflected light 32IR may be detected by the sub-pixel IRS provided in the pixel 180A, and the position of the object 108 may be estimated from the detection intensity ratios of the plurality of sub-pixels IRS.
As described above, the layout of the display device may take various forms.
Fig. 8 shows an example of a pixel circuit including two light receiving devices.
The pixel shown in fig. 8 includes transistors M11, M12, M13, M14, M15, a capacitor C1, and light receiving devices PD1, PD2.
In the transistor M11, the gate is electrically connected to the wiring TX, one of the source and the drain is electrically connected to the anode electrode of the light receiving device PD1 and one of the source and the drain of the transistor M15, and the other of the source and the drain is electrically connected to one of the source and the drain of the transistor M12, the first electrode of the capacitor C1, and the gate of the transistor M13. In the transistor M12, the gate is electrically connected to the wiring RS, and the other of the source and the drain is electrically connected to the wiring VRS. In the transistor M13, one of a source and a drain is electrically connected to the wiring VPI, and the other of the source and the drain is electrically connected to one of a source and a drain of the transistor M14. In the transistor M14, the gate is electrically connected to the wiring SE, and the other of the source and the drain is electrically connected to the wiring WX. In the transistor M15, the gate is electrically connected to the wiring SW, and the other of the source and the drain is electrically connected to the anode electrode of the light receiving device PD 1. The cathode electrode of the light receiving device PD1 and the light receiving device PD2 are electrically connected to the wiring CL. The second electrode of the capacitor C1 is electrically connected to the wiring VCP.
The transistors M11, M12, M14, and M15 are used as switches. The transistor M13 is used as an amplifying element (amplifier).
In the display device according to one embodiment of the present invention, as the transistor included in the pixel circuit, a transistor including a metal oxide (also referred to as an oxide semiconductor) in a semiconductor layer in which a channel is formed (hereinafter, also referred to as an OS transistor) is preferably used. The OS transistor has an extremely low off-state current and can hold the charge stored in the capacitor connected in series with the transistor for a long period of time. In addition, by using an OS transistor, power consumption of the display device can be reduced.
Alternatively, in the display device according to one embodiment of the present invention, as the transistor included in the pixel circuit, a transistor including silicon in a semiconductor layer in which a channel is formed (hereinafter, also referred to as a Si transistor) is preferably used. The silicon may be monocrystalline silicon, polycrystalline silicon, amorphous silicon, or the like. In particular, a transistor (hereinafter, also referred to as LTPS transistor) including low-temperature polysilicon (LTPS (Low Temperature Poly-Silicon)) in a semiconductor layer is preferably used. LTPS transistors have high field effect mobility to enable high speed operation.
Alternatively, in the display device according to one embodiment of the present invention, two types of transistors are preferably used for the pixel circuit. Specifically, the pixel circuit preferably includes an OS transistor and an LTPS transistor. By changing the material of the semiconductor layer according to the function required for the transistor, the quality of the pixel circuit can be improved to improve the accuracy of sensing or image capturing.
For example, the transistors M11 to M15 are preferably LTPS transistors using low-temperature polysilicon in the semiconductor layer. Alternatively, it is preferable that the transistor M11, the transistor M12, and the transistor M15 use OS transistors using metal oxides in the semiconductor layers, and LTPS transistors are used for the transistor M13. At this time, the transistor M14 may be an OS transistor or an LTPS transistor.
By using OS transistors for the transistor M11, the transistor M12, and the transistor M15, it is possible to prevent the potential held in the gate of the transistor M13 based on the charges generated in the light receiving device PD1 and the light receiving device PD2 from leaking through the transistor M11, the transistor M12, or the transistor M15.
On the other hand, an LTPS transistor is preferably used for the transistor M13. The LTPS transistor can realize higher field effect mobility than the OS transistor and has good driving capability and current capability. Therefore, the transistor M13 can operate at a higher speed than the transistors M11, M12, and M15. By using an LTPS transistor for the transistor M13, output corresponding to a minute potential based on the light receiving amount of the light receiving device PD1 or the light receiving device PD2 can be promptly performed to the transistor M14.
That is, in the pixel circuit shown in fig. 8, since the leakage current of the transistor M11, the transistor M12, and the transistor M15 is low and the driving capability of the transistor M13 is high, light can be received by the light receiving device PD1 and the light receiving device PD2, and the charge transferred through the transistor M11 and the transistor M15 can be held without leakage, and high-speed readout can be performed.
Since the transistor M14 is used as a switch for supplying the output from the transistor M13 to the wiring WX, low off-state current, high-speed operation, and the like are not necessarily required unlike the transistors M11 to M13 and M15. Therefore, low-temperature polysilicon or oxide semiconductor may be used for the semiconductor layer of the transistor M14.
Note that in fig. 8, the transistor is an n-channel type transistor, but a p-channel type transistor may be used.
As described above, in a case where high-definition and clear photographing is required for photographing for personal identification or the like, the aperture ratio (light receiving area) of the light receiving device is preferably small. On the other hand, in the case where the proximity touch sensor or the like is only required to be able to detect the approximate position, the aperture ratio (light receiving area) of the light receiving device is preferably large. Therefore, the aperture ratio (light receiving area) of the light receiving device PD1 is preferably made smaller than the aperture ratio (light receiving area) of the light receiving device PD 2. In the case where high-definition imaging is required, it is preferable to turn on the transistor M11 and turn off the transistor M15, and to perform imaging using only the light receiving device PD 1. On the other hand, in the case of large-area detection, it is preferable to turn on both the transistor M11 and the transistor M15 and perform imaging using both the light receiving device PD1 and the light receiving device PD 2. Thus, by increasing the amount of light that can be captured, it is possible to easily detect an object at a location remote from the display device.
As described above, the display device of the present embodiment can realize multifunction of the display device by mounting two types of light receiving devices in one pixel, and adding two functions in addition to the display function. For example, a high-definition photographing function and a sensing function of a touch sensor, a proximity touch sensor, or the like can be realized. Further, by combining the pixels on which the two light receiving devices are mounted and the pixels of other structures, the functions of the display device can be further increased. For example, a light emitting device that emits infrared light or a pixel including various sensor devices or the like may be used.
This embodiment mode can be combined with other embodiment modes as appropriate. In addition, in this specification, in the case where a plurality of structural examples are shown in one embodiment, the structural examples may be appropriately combined.
(embodiment 2)
In this embodiment mode, a display device and a method for manufacturing the same according to one embodiment of the present invention are described with reference to fig. 9 to 13.
A display device according to an embodiment of the present invention includes a light emitting device and a light receiving device in a pixel. In the display device according to one embodiment of the present invention, since the pixels have a light receiving function, contact or proximity of an object can be detected while displaying an image. For example, an image is not displayed in all the subpixels included in the display device, but light may be emitted as a light source in some of the subpixels, and light detection may be performed in other subpixels and an image may be displayed in other subpixels.
In the display unit of the display device according to one embodiment of the present invention, the light emitting devices are arranged in a matrix, and an image can be displayed on the display unit. In addition, in the display section, the light receiving devices are arranged in a matrix, and the display section has one or both of a photographing function and a sensing function in addition to an image display function. The display portion may be used for an image sensor or a touch sensor. That is, by detecting light by the display portion, an image or proximity or contact of a detection object (finger, palm, pen, or the like) can be captured. Further, the display device according to one embodiment of the present invention may use a light emitting device as a light source of the sensor. Therefore, it is not necessary to provide a light receiving unit and a light source separately from the display device, and the number of components of the electronic device can be reduced.
In the display device according to one embodiment of the present invention, when light emitted from the light emitting device included in the display portion is reflected (or scattered) by the object, the light receiving device can detect the reflected light (or scattered light), and thus imaging or touch detection can be performed even in a dark place.
The display device according to one embodiment of the present invention has a function of displaying an image using a light emitting device. That is, the light emitting device is used as a display device (also referred to as a display element).
Examples of the light-emitting device include an OLED (Organic Light Emitting Diode: organic light-emitting diode) and a QLED (Quantum-dot Light Emitting Diode: quantum dot light-emitting diode). Examples of the light-emitting substance included in the light-emitting device include a substance that emits fluorescence (fluorescent material), a substance that emits phosphorescence (phosphorescent material), an inorganic compound (quantum dot material, etc.), and a substance that exhibits thermally activated delayed fluorescence (Thermally Activated Delayed Fluorescence: TADF) material). Further, as the light emitting device, an LED such as a micro light emitting diode (Light Emitting Diode) may be used.
The display device according to one embodiment of the present invention has a function of detecting light using a light receiving device.
When the light receiving device is used for an image sensor, the display apparatus may capture an image using the light receiving device. For example, the display device of the present embodiment can be used as a scanner.
For example, an image sensor may be used to acquire data based on biometric data such as a fingerprint, palm print, or the like. That is, a sensor for biometric identification may be provided in the display device. By providing the biometric sensor in the display device, the number of components of the electronic device can be reduced as compared with the case where the display device and the biometric sensor are provided separately, and thus, the electronic device can be miniaturized and light-weighted.
In addition, in the case where the light receiving device is used for a touch sensor, the display device detects the proximity or contact of an object using the light receiving device.
As the light receiving device, for example, a pn-type or pin-type photodiode can be used. The light receiving device is used as a photoelectric conversion device (also referred to as a photoelectric conversion element) that detects light incident on the light receiving device and generates electric charges. The amount of charge generated by the light receiving device depends on the amount of light incident to the light receiving device.
In particular, as the light receiving device, an organic photodiode including a layer containing an organic compound is preferably used. The organic photodiode is easily thinned, lightened, and enlarged in area, and has a high degree of freedom in shape and design, so that it can be applied to various display devices.
In one embodiment of the present invention, an organic EL device is used as a light emitting device, and an organic photodiode is used as a light receiving device. The organic EL device and the organic photodiode can be formed on the same substrate. Accordingly, an organic photodiode can be mounted in a display apparatus using an organic EL device.
Since the organic photodiode includes a plurality of layers that can have the same structure as the organic EL device, by forming the layers that can have the same structure as the organic EL device at one time, an increase in deposition process can be suppressed.
For example, one of the pair of electrodes (common electrode) may be a layer commonly used between the light receiving device and the light emitting device. Further, for example, at least one of the hole injection layer, the hole transport layer, the electron transport layer, and the electron injection layer is preferably a layer commonly used between the light-receiving device and the light-emitting device.
Note that a layer common to the light-receiving device and the light-emitting device sometimes has different functions in the light-emitting device and the light-receiving device. In this specification, structural elements are referred to according to functions in the light emitting device. For example, the hole injection layer is used as a hole injection layer in a light emitting device and as a hole transport layer in a light receiving device. Also, the electron injection layer is used as an electron injection layer in a light emitting device and as an electron transport layer in a light receiving device. In addition, a layer common to the light-receiving device and the light-emitting device may have the same function as the light-emitting device and the light-receiving device. The hole transport layer is used as a hole transport layer in both the light emitting device and the light receiving device, and the electron transport layer is used as an electron transport layer in both the light emitting device and the light receiving device.
In manufacturing a display apparatus including a plurality of organic EL devices having different emission colors of light-emitting layers, it is necessary to form the light-emitting layers having different emission colors into islands, respectively.
For example, an island-shaped light-emitting layer can be deposited by a vacuum vapor deposition method using a metal mask (also referred to as a shadow mask). However, in this method, the shape and position of the island-like light-emitting layer are separated from the design due to various influences such as the accuracy of the metal mask, the positional misalignment between the metal mask and the substrate, the curvature of the metal mask, and the expansion of the profile of the deposited film due to vapor scattering, and the like, and it is difficult to increase the definition and the aperture ratio of the display device.
In the method for manufacturing a display device according to one embodiment of the present invention, an island-shaped pixel electrode (may also be referred to as a lower electrode) is formed, a first layer including a light-emitting layer that emits light of a first color (may also be referred to as an EL layer or a part of an EL layer) is formed over one surface, and then a first sacrificial layer is formed over the first layer. Then, a first resist mask is formed over the first sacrificial layer, and the first layer and the first sacrificial layer are processed using the first resist mask to form an island-shaped first layer. Next, as with the first layer, a second layer (which may also be referred to as an EL layer or a part of an EL layer) including a light-emitting layer that emits light of a second color is formed in an island shape using a second sacrificial layer and a second resist mask.
In this way, in the method for manufacturing a display device according to one embodiment of the present invention, the island-shaped EL layer is formed by processing after depositing the EL layer over the entire surface, instead of using a high-definition metal mask. Therefore, a high-definition display device or a high aperture ratio display device which cannot be manufactured before can be realized. Further, since the EL layers can be formed for each color, a display device having extremely clear display, high contrast, and high display quality can be realized. Further, by providing a sacrificial layer (which may also be referred to as a mask layer) over the EL layer, damage to the EL layer during a manufacturing process of the display device can be reduced, and thus the reliability of the light-emitting device can be improved.
Regarding the interval of adjacent light emitting devices, for example, in a forming method using a metal mask, it is difficult that the interval is less than 10 μm, but by the above method, the interval can be reduced to 3 μm or less, 2 μm or less, or 1 μm or less.
Further, the pattern (also referred to as a processed size) of the EL layer itself can be extremely small as compared with the case of using a metal mask. In addition, for example, when the EL layers are formed using metal masks, thickness unevenness occurs in the center and the end portions of the EL layers, and therefore the effective area that can be used as a light-emitting region in the entire area of the EL layers is reduced. On the other hand, in the above-described manufacturing method, since the EL layer is formed by processing a film deposited with a uniform thickness, the thickness can be uniform in the EL layer, and even if a fine pattern is used, almost the entire region can be used as the light-emitting region. Therefore, a display device having high definition and high aperture ratio can be manufactured.
Here, the first layer and the second layer each include at least a light-emitting layer, and are preferably composed of a plurality of layers. Specifically, it is preferable to include one or more layers on the light-emitting layer. By including another layer between the light-emitting layer and the sacrificial layer, the light-emitting layer can be prevented from being exposed to the outermost surface in the manufacturing process of the display device, and damage to the light-emitting layer can be reduced. Thereby, the reliability of the light emitting device can be improved.
Note that in a light-emitting device that emits light of different colors, all layers constituting the EL layer need not be formed separately, and a part of the layers may be deposited by the same process. In the method for manufacturing a display device according to one embodiment of the present invention, after forming a part of layers constituting an EL layer into an island shape according to colors, the sacrificial layer is removed, and other layers constituting the EL layer and a common electrode (which may be referred to as an upper electrode) common to light emitting devices of the respective colors are formed.
As the light receiving device, the same manufacturing method as that of the light emitting device can be used. The island-shaped active layer (also referred to as a photoelectric conversion layer) included in the light-receiving device is formed not by using a high-definition metal mask but by processing after depositing a film serving as an active layer over the entire surface, and thus the island-shaped active layer can be formed with a uniform thickness. Further, by providing the sacrificial layer over the active layer, damage to the active layer during the manufacturing process of the display device can be reduced, and thus the reliability of the light receiving device can be improved.
[ structural example of display device ]
Fig. 9A and 9B show a display device according to an embodiment of the present invention.
Fig. 9A shows a top view of the display device 100E. The display device 100E includes a display portion in which a plurality of pixels 110 are arranged in a matrix, and a connection portion 140 outside the display portion. One pixel 110 is composed of five sub-pixels 110a, 110b, 110c, 110d, and 110 e. The connection portion 140 may also be referred to as a cathode contact portion.
The top surface shape of the sub-pixel shown in fig. 9A corresponds to the top surface shape of the light emitting region or the light receiving region.
The circuit layout of the sub-pixel is not limited to the range of the sub-pixel shown in fig. 9A, and may be disposed outside the sub-pixel. For example, the transistor included in the sub-pixel 110a may be located within the range of the sub-pixel 110b shown in fig. 9A, and a part or all of the transistor may be located outside the range of the sub-pixel 110 a.
In fig. 9 (a), the aperture ratios (may also be referred to as the size, the size of the light emitting region) of the sub-pixels 110a, 110b, 110c are the same or substantially the same, but one embodiment of the present invention is not limited thereto. The aperture ratio of each of the sub-pixels 110a, 110b, 110c, 110d, and 110e can be appropriately determined. The aperture ratios of the sub-pixels 110a, 110b, 110c, 110d, and 110e may be different from each other, or two or more of them may be the same or substantially the same.
Fig. 9A shows an example in which sub-pixels of 2 rows and 3 columns are arranged in one pixel 110. The pixel 110 includes three sub-pixels (sub-pixels 110a, 110b, 110 c) in the upper row (row 1) and two sub-pixels (sub-pixels 110d, 110 e) in the lower row (row 2). In other words, the pixel 110 includes two sub-pixels (sub-pixels 110a, 110 d) in the left column (column 1), a sub-pixel 110b in the center column (column 2), a sub-pixel 110c in the right column (column 3), and a sub-pixel 110e along the center column to the right column.
In the present embodiment, examples are shown in which the sub-pixels 110a, 110b, 110c include light emitting devices that emit light of different colors, and the sub-pixels 110d, 110e include light receiving devices having light receiving areas different from each other. For example, the sub-pixels 110a, 110b, and 110c correspond to the sub-pixel G, B, R shown in fig. 1A and the like. The subpixel 110d corresponds to the subpixel PS shown in fig. 1A and the like, and the subpixel 110e corresponds to the subpixel IRS shown in fig. 1A and the like.
Note that the device provided in the sub-pixel 110e may also be changed for each pixel. Accordingly, a configuration may be adopted in which a part of the sub-pixels 110e corresponds to the sub-pixel IRS and the other sub-pixels 110e correspond to the sub-pixel X (see fig. 3B) or the sub-pixel IR (see fig. 3D).
In the example shown in fig. 9A, the connection portion 140 is located below the display portion in a plan view, but is not particularly limited. The connection portion 140 may be provided at least one of the upper side, the right side, the left side, and the lower side of the display portion in a plan view, and may be provided so as to surround four sides of the display portion. In addition, the connection part 140 may be one or more.
Fig. 9B shows a cross-sectional view along the dash-dot lines X1-X2, Y1-Y2, and Y3-Y4 of fig. 9A.
As shown in fig. 9B, in the display device 100E, light emitting devices 130a, 130B, and 130c and light receiving devices 150d (see fig. 13B), and 150E are provided on the layer 101 having transistors, and a protective layer 131 is provided so as to cover the light emitting devices and the light receiving devices. The protective layer 131 is bonded with the substrate 120 by the resin layer 122.
The display device according to one embodiment of the present invention may have any of the following structures: a top emission structure (top emission) that emits light in a direction opposite to a substrate in which the light emitting device is formed, a bottom emission structure (bottom emission) that emits light to a side of the substrate in which the light emitting device is formed, and a double-sided emission structure (dual emission) that emits light to both sides.
As the layer 101 having transistors, for example, a stacked structure in which a plurality of transistors are provided over a substrate and an insulating layer is provided so as to cover the transistors can be used. A structural example of the layer 101 having a transistor will be described later in embodiment mode 3.
The light emitting devices 130a, 130b, 130c emit different colors of light, respectively. The light emitting devices 130a, 130B, 130c are preferably combinations of light emitting three colors of red (R), green (G), and blue (B), for example.
The light emitting device includes an EL layer between a pair of electrodes. In this specification or the like, one of a pair of electrodes is sometimes referred to as a pixel electrode, and the other is sometimes referred to as a common electrode.
Among a pair of electrodes included in the light emitting device, one electrode is used as an anode and the other electrode is used as a cathode. The following description will be given by taking a case where a pixel electrode is used as an anode and a common electrode is used as a cathode as an example.
The light emitting device 130a includes a pixel electrode 111a on the layer 101 having a transistor, a first layer 113a on the pixel electrode 111a, a sixth layer 114 on the first layer 113a, and a common electrode 115 on the sixth layer 114. In the light emitting device 130a, the first layer 113a and the sixth layer 114 may be collectively referred to as an EL layer.
The first layer 113a includes a first hole injection layer 181a on the pixel electrode 111a, a first hole transport layer 182a on the first hole injection layer 181a, a first light emitting layer 183a on the first hole transport layer 182a, and a first electron transport layer 184a on the first light emitting layer 183 a.
The sixth layer 114 includes, for example, an electron injection layer. Alternatively, the sixth layer 114 may include an electron transport layer and an electron injection layer.
The light emitting device 130b includes a pixel electrode 111b on the layer 101 having a transistor, a second layer 113b on the pixel electrode 111b, a sixth layer 114 on the second layer 113b, and a common electrode 115 on the sixth layer 114. In the light emitting device 130b, the second layer 113b and the sixth layer 114 may be collectively referred to as an EL layer.
The second layer 113b includes a second hole injection layer 181b on the pixel electrode 111b, a second hole transport layer 182b on the second hole injection layer 181b, a second light emitting layer 183b on the second hole transport layer 182b, and a second electron transport layer 184b on the second light emitting layer 183 b.
The light emitting device 130c includes a pixel electrode 111c on the layer 101 having a transistor, a third layer 113c on the pixel electrode 111c, a sixth layer 114 on the third layer 113c, and a common electrode 115 on the sixth layer 114. In the light emitting device 130c, the third layer 113c and the sixth layer 114 may be collectively referred to as an EL layer.
The third layer 113c includes a third hole injection layer 181c on the pixel electrode 111c, a third hole transport layer 182c on the third hole injection layer 181c, a third light emitting layer 183c on the third hole transport layer 182c, and a third electron transport layer 184c on the third light emitting layer 183 c.
The light emitting devices 130a, 130b, 130c emit different colors of light, respectively. The light emitting devices 130a, 130B, 130c are preferably combinations of light emitting three colors of red (R), green (G), and blue (B), for example.
The light receiving device includes an active layer between a pair of electrodes. In this specification or the like, one of a pair of electrodes is sometimes referred to as a pixel electrode and the other is sometimes referred to as a common electrode.
Among a pair of electrodes included in the light receiving device, one electrode is used as an anode and the other electrode is used as a cathode. The following description will be given by taking a case where a pixel electrode is used as an anode and a common electrode is used as a cathode as an example. That is, by driving the light receiving device by applying a reverse bias between the pixel electrode and the common electrode, light incident to the light receiving device can be detected to generate electric charges, and thus can be extracted as electric current.
The light receiving device 150d (see fig. 12B and 13B) includes a pixel electrode 111d on the layer 101 having a transistor, a fourth layer 113d on the pixel electrode 111d, a sixth layer 114 on the fourth layer 113d, and a common electrode 115 on the sixth layer 114.
The fourth layer 113d includes a fourth hole transport layer 182d on the pixel electrode 111d, a first active layer 185d on the fourth hole transport layer 182d, and a fourth electron transport layer 184d on the first active layer 185 d.
The sixth layer 114 is a layer common to the light emitting device and the light receiving device. The sixth layer 114 includes, for example, an electron injection layer as described above. Alternatively, the sixth layer 114 may include an electron transport layer and an electron injection layer.
Here, the layer shared by the light-receiving device and the light-emitting device may have a function different from that of the light-receiving device. In this specification, the constituent elements are sometimes referred to according to functions in the light emitting device. For example, the hole injection layer is used as a hole injection layer in a light emitting device and as a hole transport layer in a light receiving device. Also, the electron injection layer is used as an electron injection layer in a light emitting device and as an electron transport layer in a light receiving device. In addition, a layer common to the light-receiving device and the light-emitting device may have the same function as the light-emitting device and the light-receiving device. The hole transport layer is used as a hole transport layer in both the light emitting device and the light receiving device, and the electron transport layer is used as an electron transport layer in both the light emitting device and the light receiving device.
The light receiving device 150e includes a pixel electrode 111e on the layer 101 having a transistor, a fifth layer 113e on the pixel electrode 111e, a sixth layer 114 on the fifth layer 113e, and a common electrode 115 on the sixth layer 114.
The fifth layer 113e includes a fifth hole transport layer 182e on the pixel electrode 111e, a second active layer 185e on the fifth hole transport layer 182e, and a fifth electron transport layer 184e on the second active layer 185 e.
The common electrode 115 is electrically connected to the conductive layer 123 provided in the connection part 140. Thereby, the same potential is supplied to the common electrode 115 included in the light emitting devices of the respective colors.
As an electrode on the side of the pixel electrode and the common electrode from which light is extracted, a conductive film that transmits visible light and infrared light is used. Further, as the electrode on the side from which light is not extracted, a conductive film that reflects visible light and infrared light is preferably used.
As a material for forming a pair of electrodes (a pixel electrode and a common electrode) of the light emitting device and the light receiving device, a metal, an alloy, a conductive compound, a mixture thereof, or the like can be suitably used. Specifically, there may be mentioned aluminum-containing alloys (aluminum alloys) such as indium tin oxide (also referred to as In-Sn oxide, ITO), in-Si-Sn oxide (also referred to as ITSO), indium zinc oxide (In-Zn oxide), in-W-Zn oxide, aluminum, nickel, and lanthanum alloys (Al-Ni-La), and alloys of silver, palladium, and copper (also referred to as ag—pd-Cu, APC). In addition to the above, metals such as aluminum (Al), titanium (Ti), chromium (Cr), manganese (Mn), iron (Fe), cobalt (Co), nickel (Ni), copper (Cu), gallium (Ga), zinc (Zn), indium (In), tin (Sn), molybdenum (Mo), tantalum (Ta), tungsten (W), palladium (Pd), gold (Au), platinum (Pt), silver (Ag), yttrium (Y), neodymium (Nd), and alloys containing these metals are suitably combined. In addition, rare earth metals such as lithium (Li), cesium (Cs), calcium (Ca), strontium (Sr)), europium (Eu), ytterbium (Yb), and the like, and alloys and graphene containing them in appropriate combination, which are not listed above, can be used as elements belonging to group 1 or group 2 of the periodic table.
The light emitting device and the light receiving device preferably employ a microcavity resonator (microcavity) structure. Therefore, one of the pair of electrodes included in the light emitting device and the light receiving device preferably includes an electrode (semi-transmissive/semi-reflective electrode) having transparency and reflectivity to visible light, and the other electrode preferably includes an electrode (reflective electrode) having reflectivity to visible light. When the light emitting device has a microcavity structure, light emission obtained from the light emitting layer can be made to resonate between the two electrodes, and light emitted from the light emitting device can be enhanced. When the light emitting device has a microcavity structure, light received by the active layer can be resonated between the two electrodes, and the light can be enhanced, whereby the detection accuracy of the light receiving device can be improved.
The semi-transmissive/semi-reflective electrode may have a stacked structure of a reflective electrode and an electrode (also referred to as a transparent electrode) having transparency to visible light.
The light transmittance of the transparent electrode is 40% or more. For example, an electrode having a transmittance of 40% or more of visible light (light having a wavelength of 400nm or more and less than 750 nm) is preferably used for the light-emitting device. The visible light reflectance of the semi-transmissive/semi-reflective electrode is set to 10% or more and 95% or less, preferably 30% or more and 80% or less. The visible light reflectance of the reflective electrode is set to 40% or more and 100% or less, preferably 70% or more and 100% or less. The resistivity of the electrode is preferably 1×10 -2 And Ω cm or less. The transmittance or reflectance of near infrared light (light having a wavelength of 750nm or more and 1300nm or less) of these electrodes preferably satisfies the above numerical range similarly to the transmittance or reflectance of visible light.
The first layer 113a, the second layer 113b, and the third layer 113c each include a light-emitting layer. The first layer 113a, the second layer 113b, and the third layer 113c preferably include light emitting layers that respectively emit light of different colors.
The light-emitting layer is a layer containing a light-emitting substance. The light emitting layer may include one or more light emitting substances. As the light-emitting substance, a substance which emits light-emitting colors such as blue, violet, bluish violet, green, yellowish green, yellow, orange, and red is suitably used. Further, a substance that emits near infrared rays may be used as the light-emitting substance.
Examples of the luminescent material include a fluorescent material, a phosphorescent material, a thermally activated delayed fluorescence (Thermally activated delayed fluorescence: TADF) material, and a quantum dot material.
Examples of the fluorescent material include pyrene derivatives, anthracene derivatives, triphenylene derivatives, fluorene derivatives, carbazole derivatives, dibenzothiophene derivatives, dibenzofuran derivatives, dibenzoquinoxaline derivatives, quinoxaline derivatives, pyridine derivatives, pyrimidine derivatives, phenanthrene derivatives, naphthalene derivatives, and the like.
Examples of the phosphorescent material include an organometallic complex (particularly iridium complex) having a 4H-triazole skeleton, a 1H-triazole skeleton, an imidazole skeleton, a pyrimidine skeleton, a pyrazine skeleton or a pyridine skeleton, an organometallic complex (particularly iridium complex) having a phenylpyridine derivative having an electron-withdrawing group as a ligand, a platinum complex, a rare earth metal complex, and the like.
The light-emitting layer may contain one or more organic compounds (host material, auxiliary material, etc.) in addition to the light-emitting substance (guest material). As the one or more organic compounds, one or both of a hole transporting material and an electron transporting material may be used. Furthermore, as one or more organic compounds, bipolar materials or TADF materials may also be used.
For example, the light-emitting layer preferably contains a combination of a phosphorescent material, a hole-transporting material that easily forms an exciplex, and an electron-transporting material. By adopting such a structure, light emission of ExTET (Excilex-Triplet Energy Transfer: exciplex-triplet energy transfer) utilizing energy transfer from an Exciplex to a light-emitting substance (phosphorescent material) can be obtained efficiently. Further, by selecting a combination such that an exciplex that emits light overlapping the wavelength of the absorption band on the lowest energy side of the light-emitting substance is formed, energy transfer can be made smooth, and light emission can be obtained efficiently. By adopting the above structure, high efficiency, low voltage driving, and long life of the light emitting device can be simultaneously realized.
The first layer 113a, the second layer 113b, and the third layer 113c may include layers including a substance having high hole injection property, a substance having high hole transport property, a hole blocking material, a substance having high electron transport property, a substance having high electron injection property, an electron blocking material, a bipolar substance (a substance having high electron transport property and hole transport property), or the like as layers other than the light-emitting layer.
The light-emitting device may use a low-molecular compound or a high-molecular compound, and may further include an inorganic compound. The layers constituting the light-emitting device can be formed by a method such as a vapor deposition method (including a vacuum vapor deposition method), a transfer method, a printing method, an inkjet method, or a coating method.
For example, each of the first layer 113a, the second layer 113b, and the third layer 113c may include one or more of a hole injection layer, a hole transport layer, a hole blocking layer, an electron transport layer, and an electron injection layer.
The sixth layer 114 may also include one or more of a hole injection layer, a hole transport layer, a hole blocking layer, an electron transport layer, and an electron injection layer. For example, when the pixel electrodes 111a, 111b, 111c are used as anodes and the common electrode 115 is used as a cathode, the sixth layer 114 preferably includes an electron injection layer.
The hole injection layer is a layer containing a material having high hole injection property, which injects holes from the anode to the hole transport layer. Examples of the material having high hole injection property include an aromatic amine compound, a composite material containing a hole-transporting material and an acceptor material (electron acceptor material), and the like.
In the light emitting device, the hole transporting layer is a layer that transports holes injected from the anode to the light emitting layer through the hole injecting layer. In the light-receiving device, the hole transport layer is a layer that transports holes generated according to light incident into the active layer to the anode. The hole transport layer is a layer containing a hole transporting material. As the hole transporting material, a material having a hole mobility of 1X 10 is preferably used -6 cm 2 Materials above/Vs. Note that as long as the hole transport property is higher than the electron transport property, substances other than the above may be used. As hole-transporting materials, it is preferable to use a pi-electron-rich heteroaromatic compoundA material having high hole-transporting property such as a carbazole derivative, a thiophene derivative, a furan derivative, or an aromatic amine (a compound having an aromatic amine skeleton).
In the light emitting device, the electron transport layer is a layer that transports electrons injected from the cathode to the light emitting layer through the electron injection layer. In the light-receiving device, the electron transport layer is a layer that transports electrons generated based on light incident into the active layer to the cathode. The electron transport layer is a layer containing an electron transport material. As the electron transporting material, an electron mobility of 1X 10 is preferably used -6 cm 2 Materials above/Vs. Note that as long as the electron transport property is higher than the hole transport property, substances other than the above may be used. Examples of the electron-transporting material include materials having high electron-transporting properties such as a metal complex containing a quinoline skeleton, a metal complex containing a benzoquinoline skeleton, a metal complex containing an oxazole skeleton, a metal complex containing a thiazole skeleton, an oxadiazole derivative, a triazole derivative, an imidazole derivative, an oxazole derivative, a thiazole derivative, a phenanthroline derivative, a quinoline derivative containing a quinoline ligand, a benzoquinoline derivative, a quinoxaline derivative, a dibenzoquinoxaline derivative, a pyridine derivative, a bipyridine derivative, a pyrimidine derivative, and a nitrogen-containing heteroaromatic compound.
The electron injection layer is a layer containing a material having high electron injection property, which injects electrons from the cathode to the electron transport layer. As the material having high electron injection properties, alkali metal, alkaline earth metal, or a compound thereof can be used. As the material having high electron injection properties, a composite material containing an electron-transporting material and a donor material (electron-donor material) may be used.
As the electron injection layer, lithium, cesium, lithium fluoride (LiF), cesium fluoride (CsF), calcium fluoride (CaF) can be used 2 ) Lithium 8- (hydroxyquinoline) (abbreviation: liq), lithium 2- (2-pyridyl) phenoxide (abbreviation: liPP), lithium 2- (2-pyridyl) -3-hydroxypyridine (abbreviation: liPPy), lithium 4-phenyl-2- (2-pyridyl) phenol (abbreviation: liPPP), lithium oxide (LiO x ) Alkali metal, alkaline earth metal, such as cesium carbonateGenus or a compound thereof.
Alternatively, an electron-transporting material may be used as the electron injection layer. For example, compounds having a non-common electron pair and having an electron-deficient heteroaromatic ring may be used for the electron-transporting material. Specifically, a compound having at least one of a pyridine ring, a diazine ring (pyrimidine ring, pyrazine ring, pyridazine ring), and a triazine ring can be used.
Further, the lowest unoccupied molecular orbital (LUMO: lowest Unoccupied Molecular Orbital) of the organic compound having an unshared electron pair is preferably not less than-3.6 eV and not more than-2.3 eV. In general, the highest occupied molecular orbital (HOMO: highest Occupied Molecular Orbital) energy level of an organic compound can be estimated using CV (cyclic voltammetry), photoelectron spectroscopy, light absorption spectroscopy, reverse-light electron spectroscopy, or the like.
For example, as the organic compound having an unshared electron pair, 4, 7-diphenyl-1, 10-phenanthroline (abbreviated as BPhen), 2, 9-bis (naphthalen-2-yl) -4, 7-diphenyl-1, 10-phenanthroline (abbreviated as NBPhen), and diquinoxalino [2,3-a:2',3' -c ] phenazine (abbreviated as HATNA), 2,4, 6-tris [3' - (pyridin-3-yl) biphenyl-3-yl ] -1,3, 5-triazine (abbreviated as TmPPyTz), and the like. In addition, NBPhen has a high glass transition point (Tg) as compared with BPhen, and thus has high heat resistance.
The fourth layer 113d and the fifth layer 113e each include an active layer. The fourth layer 113d and the fifth layer 113e may include active layers of the same or different structures. For example, by having a microcavity structure in the light-receiving device, the fourth layer 113d and the fifth layer 113e can detect light of different wavelengths even if the structures of the active layers are the same. Note that the microcavity structure can be manufactured by changing the thickness of the pixel electrode or the thickness of the optical adjustment layer in the light receiving devices 150d, 150 e. In this case, the fourth layer 113d and the fifth layer 113e may have the same structure.
The first active layer 185d and the second active layer 185e each include a semiconductor. Examples of the semiconductor include inorganic semiconductors such as silicon and organic semiconductors containing organic compounds. In this embodiment mode, an example of a semiconductor included in an active layer using an organic semiconductor is described. By using an organic semiconductor, a light-emitting layer and an active layer can be formed by the same method (for example, a vacuum evaporation method), and manufacturing equipment can be used in common, so that this is preferable.
Examples of the material of the n-type semiconductor contained in the active layer include fullerenes (e.g., C 60 、C 70 Etc.), fullerene derivatives, and the like. Fullerenes have a football shape that is energetically stable. The HOMO level and LUMO level of fullerenes are deep (low). Since fullerenes have a deep LUMO level, electron acceptors (acceptors) are extremely high. Generally, when pi electron conjugation (resonance) expands on a plane like benzene, electron donor properties (donor type) become high. On the other hand, fullerenes have a spherical shape, and although pi electrons are widely expanded, electron acceptors become high. When the electron acceptors are high, charge separation is caused at high speed and high efficiency, and therefore, the present invention is advantageous for a light-receiving device. C (C) 60 、C 70 All have a broad absorption band in the visible region, in particular C 70 And C 60 It is preferable to have a wider absorption band in the long wavelength region as compared with a conjugated system having a larger pi electron. In addition, examples of fullerene derivatives include [6,6 ]]phenyl-C71-butanoic acid methyl ester (abbreviated as PC70 BM), [6,6 ]]phenyl-C61-butanoic acid methyl ester (abbreviated as PC60 BM), 1',1",4',4" -tetrahydro-bis [1,4 ] ]Methanonaphtho (methanonaphtho) [1,2:2',3',56, 60:2",3"][5，6]Fullerene-C60 (abbreviated as ICBA) and the like.
Examples of the material of the n-type semiconductor include a metal complex having a quinoline skeleton, a metal complex having a benzoquinoline skeleton, a metal complex having an oxazole skeleton, a metal complex having a thiazole skeleton, an oxadiazole derivative, a triazole derivative, an imidazole derivative, an oxazole derivative, a thiazole derivative, a phenanthroline derivative, a quinoline derivative, a benzoquinoline derivative, a quinoxaline derivative, a dibenzoquinoxaline derivative, a pyridine derivative, a bipyridine derivative, a pyrimidine derivative, a naphthalene derivative, an anthracene derivative, a coumarin derivative, a rhodamine derivative, a triazine derivative, a quinone derivative, and the like.
Examples of the material of the p-type semiconductor included in the active layer include organic semiconductor materials having an electron donor property such as Copper (II) phthalocyanine (CuPc), tetraphenyldibenzo-bisindenopyrene (DBP), zinc phthalocyanine (Zinc Phthalocyanine: znPc), tin phthalocyanine (SnPc), and quinacridone.
Examples of the p-type semiconductor material include carbazole derivatives, thiophene derivatives, furan derivatives, and compounds having an aromatic amine skeleton. Examples of the material of the p-type semiconductor include naphthalene derivatives, anthracene derivatives, pyrene derivatives, triphenylene derivatives, fluorene derivatives, pyrrole derivatives, benzofuran derivatives, benzothiophene derivatives, indole derivatives, dibenzofuran derivatives, dibenzothiophene derivatives, indolocarbazole derivatives, porphyrin derivatives, phthalocyanine derivatives, naphthalocyanine derivatives, quinacridone derivatives, polyphenylene derivatives, polyparaphenylene derivatives, polyfluorene derivatives, polyvinylcarbazole derivatives, and polythiophene derivatives.
The HOMO level of the organic semiconductor material having electron donating property is preferably shallower (higher) than the HOMO level of the organic semiconductor material having electron accepting property. The LUMO level of the organic semiconductor material having electron donating property is preferably shallower (higher) than that of the organic semiconductor material having electron accepting property.
As the organic semiconductor material having electron accepting property, spherical fullerenes are preferably used, and as the organic semiconductor material having electron donating property, organic semiconductor materials having shapes similar to a plane are preferably used. Molecules of similar shapes have a tendency to aggregate easily, and when the same molecule is aggregated, carrier transport properties can be improved due to the close energy levels of molecular orbitals.
For example, the active layer is preferably formed by co-evaporation of an n-type semiconductor and a p-type semiconductor. Further, an n-type semiconductor and a p-type semiconductor may be stacked to form an active layer.
The fourth layer 113d and the fifth layer 113e include layers including a substance having a high hole-transporting property, a substance having a high electron-transporting property, a substance having a bipolar property (a substance having a high electron-transporting property and a high hole-transporting property), and the like, in addition to the active layer. The fourth layer 113d and the fifth layer 113e may include various functional layers that can be used for the first layer 113a, the second layer 113b, and the third layer 113 c.
The light-receiving device may use a low-molecular compound or a high-molecular compound, and may further contain an inorganic compound. The layer constituting the light-receiving device may be formed by a method such as a vapor deposition method (including a vacuum vapor deposition method), a transfer method, a printing method, an inkjet method, or a coating method.
For example, a polymer compound such as poly (3, 4-ethylenedioxythiophene)/poly (styrenesulfonic acid) (PEDOT/PSS) and an inorganic compound such as molybdenum oxide and copper iodide (Cul) can be used as the hole transporting material. Further, an inorganic compound such as zinc oxide (ZnO) may be used as the electron transporting material.
In addition, as the active layer, poly [ [4, 8-bis [5- (2-ethylhexyl) -2-thienyl ] benzo [1,2-b ] that is used as a donor may be used: 4,5-b' ] dithiophene-2, 6-diyl ] -2, 5-thiophenediyl [5, 7-bis (2-ethylhexyl) -4, 8-dioxo-4 h,8 h-benzo [1,2-c:4,5-c' ] dithiophene-1, 3-diyl ] ] polymer (PBDB-T for short) or PBDB-T derivative. For example, a method of dispersing a receptor material in PBDB-T or a PBDB-T derivative, or the like can be used.
In addition, three or more materials may be mixed in the active layer. For example, for the purpose of expanding the absorption wavelength region, a third material may be mixed in addition to the material of the n-type semiconductor and the material of the p-type semiconductor. In this case, the third material may be a low molecular compound or a high molecular compound.
The protective layer 131 is preferably included on the light emitting devices 130a, 130b, 130c and the light receiving devices 150d, 150 e. By providing the protective layer 131, the reliability of the light emitting device and the light receiving device can be improved.
The conductivity of the protective layer 131 is not limited. As the protective layer 131, at least one of an insulating film, a semiconductor film, and a conductive film can be used.
When the protective layer 131 includes an inorganic film, deterioration of the light emitting device and the light receiving device, such as prevention of oxidation of the common electrode 115, inhibition of entry of impurities (moisture, oxygen, and the like) into the light emitting devices 130a, 130b, 130c, the light receiving devices 150d, 150e, and the like, can be suppressed, whereby reliability of the display apparatus can be improved.
As the protective layer 131, for example, an inorganic insulating film such as an oxide insulating film, a nitride insulating film, an oxynitride insulating film, or a oxynitride insulating film can be used. Examples of the oxide insulating film include a silicon oxide film, an aluminum oxide film, a gallium oxide film, a germanium oxide film, a yttrium oxide film, a zirconium oxide film, a lanthanum oxide film, a neodymium oxide film, a hafnium oxide film, and a tantalum oxide film. The nitride insulating film may be a silicon nitride film, an aluminum nitride film, or the like. The oxynitride insulating film may be a silicon oxynitride film, an aluminum oxynitride film, or the like. The oxynitride insulating film may be a silicon oxynitride film, an aluminum oxynitride film, or the like.
Note that in this specification and the like, "oxynitride" refers to a material having a greater oxygen content than nitrogen content in its composition, and "nitride oxide" refers to a material having a greater nitrogen content than oxygen content in its composition.
The protective layer 131 preferably includes a nitride insulating film or an oxynitride insulating film, more preferably includes a nitride insulating film.
In addition, an inorganic film containing ITO, in-Zn oxide, ga-Zn oxide, al-Zn oxide, indium gallium zinc oxide (also referred to as In-Ga-Zn oxide, IGZO), or the like may be used for the protective layer 131. The inorganic film preferably has a high resistance, and particularly preferably has a higher resistance than the common electrode 115. The inorganic film may further contain nitrogen.
In the case where light emission of the light-emitting device is extracted through the protective layer 131, the visible light transmittance of the protective layer 131 is preferably high. For example, ITO, IGZO, and alumina are all inorganic materials having high visible light transmittance, and are therefore preferable.
As the protective layer 131, for example, a stacked structure of an aluminum oxide film and a silicon nitride film on the aluminum oxide film, a stacked structure of an aluminum oxide film and an IGZO film on the aluminum oxide film, or the like can be used. By using this stacked structure, entry of impurities (water, oxygen, and the like) into the EL layer side can be suppressed.
Also, the protective layer 131 may include an organic film. For example, the protective layer 131 may include both an organic film and an inorganic film.
The end portions of the pixel electrodes 111a, 111b, and 111c are covered with an insulating layer 121.
In this specification and the like, a device manufactured using a Metal Mask or an FMM (Fine Metal Mask) is sometimes referred to as a device having a MM (Metal Mask) structure. In this specification and the like, a device manufactured without using a metal mask or an FMM is sometimes referred to as a device having a MML (Metal Mask Less) structure.
In this specification and the like, a structure in which light-emitting layers are formed or applied to light-emitting devices of respective colors (here, blue (B), green (G), and red (R)) is sometimes referred to as a SBS (Side By Side) structure. In this specification and the like, a light-emitting device that can emit white light is sometimes referred to as a white light-emitting device. The white light emitting device can realize a display device that displays in full color by combining with a colored layer (e.g., a color filter).
In addition, the light emitting device can be roughly classified into a single structure and a series structure. The single structure device preferably has the following structure: a light emitting unit is included between a pair of electrodes, and the light emitting unit includes one or more light emitting layers. In order to obtain white light emission, the light emitting layers may be selected so that the light emission of two or more light emitting layers is in a complementary relationship. For example, by placing the light emission color of the first light emission layer and the light emission color of the second light emission layer in a complementary relationship, a structure that emits light in white on the whole light emitting device can be obtained. In addition, the same applies to a light-emitting device including three or more light-emitting layers.
The device of the tandem structure preferably has the following structure: two or more light emitting units are included between a pair of electrodes, and each light emitting unit includes one or more light emitting layers. In order to obtain white light emission, a structure may be employed in which light emitted from the light-emitting layers of the plurality of light-emitting units is combined to obtain white light emission. Note that the structure to obtain white light emission is the same as that in the single structure. In the device having the tandem structure, an intermediate layer such as a charge generation layer is preferably provided between the plurality of light emitting cells.
In addition, in the case of comparing the above-described white light emitting device (single structure or tandem structure) and the light emitting device of the SBS structure, the power consumption of the light emitting device of the SBS structure can be made lower than that of the white light emitting device. A light emitting device employing an SBS structure is preferable when power consumption reduction is desired. On the other hand, the manufacturing process of the white light emitting device is simpler than that of the SBS structure, and thus the manufacturing cost can be reduced or the manufacturing yield can be improved, so that it is preferable.
In the display device of the present embodiment, the distance between the light emitting devices can be reduced. Specifically, the distance between the light emitting devices may be 1 μm or less, preferably 500nm or less, more preferably 200nm or less, 100nm or less, 90nm or less, 70nm or less, 50nm or less, 30nm or less, 20nm or less, 15nm or less, or 10nm or less. In other words, the display device of this embodiment mode has a region in which the distance between the side surface of the first layer 113a and the side surface of the second layer 113b or the distance between the side surface of the second layer 113b and the side surface of the third layer 113c is 1 μm or less, preferably a region of 0.5 μm (500 nm) or less, and more preferably a region of 100nm or less.
Note that the distance between the light emitting device and the light receiving device may also be within the above-described range. In order to suppress leakage between the light emitting device and the light receiving device, the distance between the light emitting device and the light receiving device is preferably made wider than the distance between the light emitting device. For example, the distance between the light emitting device and the light receiving device may be 8 μm or less, 5 μm or less, or 3 μm or less.
[ example of a method for manufacturing a display device ]
Next, an example of a method for manufacturing a display device is described with reference to fig. 10 to 13. Fig. 10A to 10D show side by side a sectional view between the dash-dot lines X1 to X2, a sectional view between X3 to X4, and a sectional view between Y1 to Y2 in fig. 9A. Fig. 11 to 13 are also similar to fig. 10.
The thin films (insulating film, semiconductor film, conductive film, and the like) constituting the display device can be formed by a sputtering method, a chemical vapor deposition (CVD: chemical Vapor Deposition) method, a vacuum deposition method, a pulse laser deposition (PLD: pulsed Laser Deposition) method, an ALD method, or the like. The CVD method includes a plasma enhanced chemical vapor deposition (PECVD: plasma Enhanced CVD) method, a thermal CVD method, and the like. In addition, as one of the thermal CVD methods, there is a metal organic chemical vapor deposition (MOCVD: metal Organic CVD) method.
The thin film (insulating film, semiconductor film, conductive film, or the like) constituting the display device can be formed by a spin coating method, a dipping method, a spray coating method, an inkjet method, a dispenser method, a screen printing method, an offset printing method, a doctor blade (doctor blade) method, a slit coating method, a roll coating method, a curtain coating method, a doctor blade coating method, or the like.
In particular, when a light emitting device is manufactured, a vacuum process such as a vapor deposition method, a solution process such as a spin coating method, an inkjet method, or the like may be used. Examples of the vapor deposition method include a physical vapor deposition method (PVD method) such as a sputtering method, an ion plating method, an ion beam vapor deposition method, a molecular beam vapor deposition method, and a vacuum vapor deposition method, and a chemical vapor deposition method (CVD method). In particular, the functional layers (hole injection layer, hole transport layer, light emitting layer, electron transport layer, electron injection layer, and the like) included in the EL layer can be formed by a method such as a vapor deposition method (vacuum vapor deposition method), a coating method (dip coating method, dye coating method, bar coating method, spin coating method, spray coating method), a printing method (inkjet method, screen printing (stencil printing) method, offset printing (lithographic printing) method, flexography (relief printing) method, gravure printing method, microcontact printing method, or the like).
In addition, when a thin film constituting the display device is processed, photolithography or the like can be used. Alternatively, the thin film may be processed by nanoimprint, sandblasting, peeling, or the like. Further, an island-like thin film may be directly formed by a deposition method using a shadow mask such as a metal mask.
Photolithography typically involves two methods. One is a method of forming a resist mask on a thin film to be processed, processing the thin film by etching or the like, and removing the resist mask. Another is a method of processing a photosensitive film into a desired shape by exposing and developing the film after depositing the film.
In the photolithography, for example, i-line (wavelength 365 nm), g-line (wavelength 436 nm), h-line (wavelength 405 nm), or light in which these light are mixed can be used as light for exposure. In addition, ultraviolet light, krF laser, arF laser, or the like can also be used. In addition, exposure may also be performed using a liquid immersion exposure technique. Furthermore, as the light for exposure, extreme Ultraviolet (EUV) light or X-ray may also be used. In addition, an electron beam may be used instead of the light for exposure. When extreme ultraviolet light, X-rays, or electron beams are used, extremely fine processing can be performed, so that it is preferable. In addition, a photomask is not required when exposure is performed by scanning with a light beam such as an electron beam.
In etching of the thin film, a dry etching method, a wet etching method, a sand blasting method, or the like can be used.
First, as shown in fig. 10A, pixel electrodes 111a, 111b, 111c, 111d, and 111e, and a conductive layer 123 are formed over the layer 101 having a transistor. Each pixel electrode is provided in the display portion, and the conductive layer 123 is provided in the connection portion 140.
Next, an insulating layer 121 is formed to cover the end portions of the pixel electrodes 111a, 111b, 111c, 111d, and 111e and the end portion of the conductive layer 123.
As shown in fig. 10B, a first hole injection layer 181A, a first hole transport layer 182A, a first light emitting layer 183A, and a first electron transport layer 184A are sequentially formed over each pixel electrode and over the insulating layer 121, a first sacrificial layer 118A is formed over the first electron transport layer 184A, and a second sacrificial layer 119A is formed over the first sacrificial layer 118A.
Fig. 10B shows an example in which the first hole injection layer 181A, the first hole transport layer 182A, the first light emitting layer 183A, the first electron transport layer 184A, the first sacrificial layer 118A, and the second sacrificial layer 119A are provided over the conductive layer 123 in a cross-sectional view between Y1 and Y2, but is not limited thereto.
For example, the first hole injection layer 181A, the first hole transport layer 182A, the first light-emitting layer 183A, the first electron transport layer 184A, and the first sacrificial layer 118A may not overlap with the conductive layer 123. The end portions of the first hole injection layer 181A, the first hole transport layer 182A, the first light emitting layer 183A, and the first electron transport layer 184A on the side of the connection portion 140 may be located inside the end portions of the first sacrificial layer 118A and the second sacrificial layer 119A. For example, by using a mask for defining a deposition region (which is different from a high-definition metal mask, also referred to as a region mask, a rough metal mask, or the like), deposition regions of the first hole injection layer 181A, the first hole transport layer 182A, the first light emitting layer 183A, and the first electron transport layer 184A, and the first sacrificial layer 118A and the second sacrificial layer 119A may be different. In one embodiment of the present invention, a light-emitting device is formed using a resist mask, and by combining the above-described region masks, the light-emitting device can be manufactured in a relatively simple process.
Materials that can be used for the pixel electrode are as described above. For forming the pixel electrode, for example, a sputtering method or a vacuum evaporation method can be used.
The insulating layer 121 may have a single-layer structure or a stacked-layer structure using one or both of an inorganic insulating film and an organic insulating film.
Examples of the organic insulating material that can be used for the insulating layer 121 include an acrylic resin, an epoxy resin, a polyimide resin, a polyamide resin, a polyimide amide resin, a polysiloxane resin, a benzocyclobutene resin, and a phenol resin. In addition, as an inorganic insulating film which can be used for the insulating layer 121, an inorganic insulating film which can be used for the protective layer 131 can be used.
When an inorganic insulating film is used as the insulating layer 121 covering the end portion of the pixel electrode, impurities are less likely to intrude into the light emitting device than in the case of using an organic insulating film, and thus the reliability of the light emitting device can be improved. When an organic insulating film is used as the insulating layer 121 covering the end portion of the pixel electrode, the step coverage is high and is less susceptible to the shape of the pixel electrode than when an inorganic insulating film is used. Therefore, a short circuit of the light emitting device can be prevented. Specifically, when an organic insulating film is used as the insulating layer 121, the insulating layer 121 may be processed into a tapered shape or the like. Note that, in this specification and the like, the tapered shape refers to a shape in which at least a part of a side surface of a constituent element is provided obliquely with respect to a substrate surface or a formed surface. For example, it is preferable to have inclined sides and a substrate surface or a region where the angle formed by the formed surfaces (also referred to as taper angle) is less than 90 °.
Note that the insulating layer 121 may not be provided. In the case where the insulating layer 121 is not provided, the aperture ratio of the sub-pixel may be increased. Alternatively, the distance between the sub-pixels may be reduced to improve the definition or resolution of the display device.
The first hole injection layer 181A, the first hole transport layer 182A, the first light emitting layer 183A, and the first electron transport layer 184A are layers which are later referred to as a first hole injection layer 181A, a first hole transport layer 182A, a first light emitting layer 183A, and a first electron transport layer 184A, respectively. Accordingly, structures that can be used for the first hole injection layer 181a, the first hole transport layer 182a, the first light-emitting layer 183a, and the first electron transport layer 184a can be used, respectively. The first hole injection layer 181A, the first hole transport layer 182A, the first light-emitting layer 183A, and the first electron transport layer 184A are formed by a method such as a vapor deposition method (vacuum vapor deposition method), a transfer method, a printing method, an inkjet method, or a coating method. The first hole injection layer 181A, the first hole transport layer 182A, the first light-emitting layer 183A, and the first electron transport layer 184A may be formed using a compound material. Note that in this specification and the like, the formulation mixed material refers to a material in which a plurality of materials are blended or mixed in advance.
In this embodiment, an example in which the sacrificial layer has a two-layer structure including the first sacrificial layer and the second sacrificial layer is described, and the sacrificial layer may have a single-layer structure or a stacked structure including three or more layers. As the sacrificial layer, a film having high resistance to processing conditions of the first hole injection layer 181A, the first hole transport layer 182A, the first light emitting layer 183A, the first electron transport layer 184A, and various functional layers (a hole injection layer, a hole transport layer, a light emitting layer, an electron transport layer, an active layer, and the like) formed in a later process, specifically, a film having a large etching selectivity is used.
In forming the sacrificial layer, for example, a sputtering method, an ALD method (including a thermal ALD method, a PEALD method), or a vacuum evaporation method may be used. The sacrificial layer is preferably formed by an ALD method or a vacuum deposition method, as compared with a sputtering method, by a method that causes less damage to the EL layer.
As the sacrificial layer, a film which can be removed by wet etching is preferably used. By using the wet etching method, damage to the first hole injection layer 181A, the first hole transport layer 182A, the first light-emitting layer 183A, and the first electron transport layer 184A during processing of the sacrificial layer can be reduced as compared with the case of using the dry etching method.
In the method for manufacturing a display device according to the present embodiment, it is preferable that various functional layers (a hole injection layer, a hole transport layer, a light emitting layer, an active layer, an electron transport layer, and the like) constituting a light emitting device and a light receiving device are not easily processed in the processing steps of the various sacrificial layers, and that the various sacrificial layers are not easily processed in the processing steps of the functional layers. The material of the sacrificial layer, the processing method, and the processing method of the functional layer are preferably selected in consideration of these conditions.
As the sacrificial layer, for example, an inorganic film such as a metal film, an alloy film, a metal oxide film, a semiconductor film, or an inorganic insulating film can be used.
As the sacrificial layer, for example, a metal material such as gold, silver, platinum, magnesium, nickel, tungsten, chromium, molybdenum, iron, cobalt, copper, palladium, titanium, aluminum, yttrium, zirconium, tantalum, or an alloy material containing the metal material can be used.
In addition, a metal oxide such as an in—ga—zn oxide may be used for the sacrificial layer. As the sacrificial layer, an In-Ga-Zn oxide film can be formed by, for example, sputtering. Indium oxide, in-Zn oxide, in-Sn oxide, indium titanium oxide (In-Ti oxide), indium tin zinc oxide (In-Sn-Zn oxide), indium titanium zinc oxide (In-Ti-Zn oxide), indium gallium tin zinc oxide (In-Ga-Sn-Zn oxide), and the like can be used. Alternatively, indium tin oxide containing silicon or the like may be used.
Note that instead of the above gallium, an element M (M is one or more of aluminum, silicon, boron, yttrium, tin, copper, vanadium, beryllium, titanium, iron, nickel, germanium, zirconium, molybdenum, lanthanum, cerium, neodymium, hafnium, tantalum, tungsten, and magnesium) may be used.
In addition, as the sacrificial layer, various inorganic insulating films that can be used for the protective layer 131 can be used. In particular, the adhesion between the oxide insulating film and the EL layer is preferably higher than the adhesion between the nitride insulating film and the EL layer. For example, an inorganic insulating material such as aluminum oxide, hafnium oxide, or silicon oxide may be used for the sacrificial layer. As the sacrificial layer, an aluminum oxide film can be formed by an ALD method, for example. The ALD method is preferable because damage to a substrate (particularly, an EL layer) can be reduced.
For example, as the sacrificial layer, a stacked structure of an In-Ga-Zn oxide film formed by a sputtering method and an aluminum oxide film formed on the In-Ga-Zn oxide film by an ALD method can be used. Further, as the sacrificial layer, a stacked structure of an aluminum oxide film formed by an ALD method and an In-Ga-Zn oxide film formed on the aluminum oxide film by a sputtering method can be used. Further, as the sacrificial layer, a single-layer structure of an aluminum oxide film formed by an ALD method may be used.
Next, as shown in fig. 10C, a resist mask 190a is formed on the second sacrificial layer 119A. The resist mask may be formed by applying a photosensitive resin (photoresist) and exposing and developing. The resist mask 190a is provided at a position overlapping with the pixel electrode 111 a. The resist mask 190a preferably does not overlap the pixel electrodes 111b, 111c, 111d, 111 e. When the resist mask 190a overlaps at least one of the pixel electrodes 111b, 111c, 111d, 111e, it is preferable to sandwich the insulating layer 121 therebetween. When the first hole injection layer 181A or the like is provided over the conductive layer 123, the resist mask 190a preferably does not overlap with the conductive layer 123. Further, when the first hole injection layer 181A or the like is not provided over the conductive layer 123 by depositing the first hole injection layer 181A or the like using a range mask or the like, the resist mask 190a is preferably provided at a position overlapping with the conductive layer 123. This can prevent the conductive layer 123 from being damaged in a later process.
As shown in fig. 10D, a portion of the second sacrificial layer 119A is removed using a resist mask 190a. Thereby, the region of the second sacrificial layer 119A that does not overlap with the resist mask 190a can be removed. Accordingly, the second sacrificial layer 119a remains at a position overlapping the pixel electrode 111 a. The resist mask 190a is then removed.
Next, as shown in fig. 11A, a portion of the first sacrificial layer 118A is removed using the second sacrificial layer 119 a. Thereby, a region of the first sacrificial layer 118A that does not overlap with the second sacrificial layer 119a can be removed. Therefore, a stacked structure of the first sacrificial layer 118a and the second sacrificial layer 119a remains at a position overlapping the pixel electrode 111 a.
Next, as shown in fig. 11B, a portion of the first hole injection layer 181A, a portion of the first hole transport layer 182A, a portion of the first light emitting layer 183A, and a portion of the first electron transport layer 184A are removed using the first sacrificial layer 118a and the second sacrificial layer 119 a. Thereby, the regions of the first hole injection layer 181A, the first hole transport layer 182A, the first light emitting layer 183A, and the first electron transport layer 184A, which do not overlap with the first sacrificial layer 118a and the second sacrificial layer 119a, can be removed. Thereby, the pixel electrodes 111b, 111c, 111d, 111e and the conductive layer 123 are exposed. A stacked structure of the first hole injection layer 181a, the first hole transport layer 182a, the first light emitting layer 183a, the first electron transport layer 184a, the first sacrificial layer 118a, and the second sacrificial layer 119a remains on the pixel electrode 111 a. Note that the stacked-layer structure of the first hole injection layer 181a, the first hole transport layer 182a, the first light-emitting layer 183a, and the first electron transport layer 184a is also referred to as the first layer 113a.
The first sacrificial layer 118A and the second sacrificial layer 119A may be processed by wet etching or dry etching. The first sacrificial layer 118A and the second sacrificial layer 119A are preferably processed by anisotropic etching.
By using the wet etching method, damage to the first hole injection layer 181A, the first hole transport layer 182A, the first light-emitting layer 183A, and the first electron transport layer 184A during processing of the sacrificial layer can be reduced as compared with the case of using the dry etching method. In the case of wet etching, for example, a developer, an aqueous solution of tetramethylammonium hydroxide (TMAH), a chemical solution of dilute hydrofluoric acid, oxalic acid, phosphoric acid, acetic acid, nitric acid, or a mixed liquid thereof is preferably used.
In addition, in the case of using the dry etching method, the first hole injection layer 181A, the first hole transport layer 182A, the first light-emitting layer 183A, and the first electron transport layer can be suppressed by using no gas containing oxygen as an etching gasDegradation of 184A. In the case of using the dry etching method, for example, CF is preferably used 4 、C 4 F 8 、SF 6 、CHF 3 、Cl 2 、H 2 O、BCl 3 Or He or the like, a noble gas (also referred to as a rare gas) is used as the etching gas.
By having a stacked structure of the sacrificial layer, a part of the layer can be processed using the resist mask 190a, the resist mask 190a is removed, and then the remaining layer can be processed using the part of the layer as a hard mask.
For example, after the second sacrificial layer 119A is processed using the resist mask 190a, the resist mask 190a is removed by ashing or the like using oxygen plasma. At this time, since the first sacrificial layer 118A is located at the outermost surface, the first hole injection layer 181A, the first hole transport layer 182A, the first light emitting layer 183A, and the first electron transport layer 184A are not exposed, and therefore damage to the first hole injection layer 181A, the first hole transport layer 182A, the first light emitting layer 183A, and the first electron transport layer 184A can be suppressed in the removal step of the resist mask 190a. The second sacrificial layer 119a may be used as a hard mask and the first sacrificial layer 118A may be processed, and the first hole injection layer 181A, the first hole transport layer 182A, the first light emitting layer 183A, and the first electron transport layer 184A may be processed using the first sacrificial layer 118A and the second sacrificial layer 119a as hard masks.
The first hole injection layer 181A, the first hole transport layer 182A, the first light-emitting layer 183A, and the first electron transport layer 184A are preferably processed by anisotropic etching. Anisotropic dry etching is particularly preferred. As the etching gas, a gas containing nitrogen, a gas containing hydrogen, a gas containing a noble gas, a gas containing nitrogen and argon, a gas containing nitrogen and hydrogen, or the like is preferably used. By not using a gas containing oxygen as the etching gas, deterioration of the first hole injection layer 181A, the first hole transport layer 182A, the first light-emitting layer 183A, and the first electron transport layer 184A can be suppressed.
In addition, as the etching gas, a gas containing oxygen may be used. When the etching gas contains oxygen, the etching rate can be increased. Therefore, etching can be performed under low power conditions while maintaining a sufficient etching rate. Therefore, damage to the first hole injection layer 181A, the first hole transport layer 182A, the first light-emitting layer 183A, and the first electron transport layer 184A can be suppressed. In addition, the adhesion of reaction products generated during etching and other defects can be suppressed.
Next, as shown in fig. 11C, a second hole injection layer 181B, a second hole transport layer 182B, a second light emitting layer 183B, and a second electron transport layer 184B are sequentially formed over the second sacrificial layer 119a, the pixel electrodes 111B, 111C, 111d, and 111e, and the insulating layer 121, the first sacrificial layer 118B is formed over the second electron transport layer 184B, and the second sacrificial layer 119B is formed over the first sacrificial layer 118B.
The second hole injection layer 181B, the second hole transport layer 182B, the second light emitting layer 183B, and the second electron transport layer 184B are layers which are later referred to as a second hole injection layer 181B, a second hole transport layer 182B, a second light emitting layer 183B, and a second electron transport layer 184B, respectively. The second light emitting layer 183b emits light of a different color from the first light emitting layer 183 a. The structures, materials, and the like that can be used for the second hole injection layer 181b, the second hole transport layer 182b, the second light emitting layer 183b, and the second electron transport layer 184b are the same as those of the first hole injection layer 181a, the first hole transport layer 182a, the first light emitting layer 183a, and the first electron transport layer 184a, respectively. The second hole transport layer 182B, the second light emitting layer 183B, and the second electron transport layer 184B may be deposited in the same manner as the first hole injection layer 181A, the first hole transport layer 182A, the first light emitting layer 183A, and the first electron transport layer 184A, respectively.
The first sacrificial layer 118B and the second sacrificial layer 119B may be formed using a material that can be used for the first sacrificial layer 118A and the second sacrificial layer 119A.
Next, as shown in fig. 11C, a resist mask 190B is formed on the first sacrificial layer 118B. The resist mask 190b is provided at a position overlapping with the pixel electrode 111 b.
As shown in fig. 12A, a portion of the second sacrificial layer 119B is removed using a resist mask 190B. Thereby, a region of the second sacrificial layer 119B that does not overlap with the resist mask 190B can be removed. Accordingly, the second sacrificial layer 119b remains at a position overlapping the pixel electrode 111 b. Then, the resist mask 190b is removed.
Next, the first sacrificial layer 118B is processed by using the second sacrificial layer 119B as a hard mask, thereby forming the first sacrificial layer 118B. The second hole injection layer 181B, the second hole transport layer 182B, the second light emitting layer 183B, and the second electron transport layer 184B are formed by processing the second hole injection layer 181B, the second hole transport layer 182B, the second light emitting layer 183B, and the second electron transport layer 184B using the first sacrificial layer 118B and the second sacrificial layer 119B as hard masks. Note that the stacked-layer structure of the second hole injection layer 181b, the second hole transport layer 182b, the second light-emitting layer 183b, and the second electron transport layer 184b is also referred to as the second layer 113b.
The first sacrificial layer 118B and the second sacrificial layer 119B may be processed by using a method that can be used for processing the first sacrificial layer 118A and the second sacrificial layer 119A. The second hole injection layer 181B, the second hole transport layer 182B, the second light emitting layer 183B, and the second electron transport layer 184B may be processed by using a method that can be used for processing of the first hole injection layer 181A, the first hole transport layer 182A, the first light emitting layer 183A, and the first electron transport layer 184A. The resist mask 190b may be removed by a method and timing that can be used for removal of the resist mask 190 a.
By the same method, a stacked structure of the third layer 113c, the first sacrificial layer 118c, and the second sacrificial layer 119c is formed over the pixel electrode 111c, a stacked structure of the fourth layer 113d, the first sacrificial layer 118d, and the second sacrificial layer 119d is formed over the pixel electrode 111d, and a stacked structure of the fifth layer 113e, the first sacrificial layer 118e, and the second sacrificial layer 119e is formed over the pixel electrode 111 e. Note that although the fourth layer 113d and the fifth layer 113e are shown as different structural examples in this embodiment, when the fourth layer 113d and the fifth layer 113e have the same structure, they may be manufactured in the same process.
Note that a resist mask used for forming the fifth layer 113e is preferably provided in such a manner as to also overlap with the conductive layer 123. As a result, as shown in fig. 12C, a stacked structure of the first sacrificial layer 118e and the second sacrificial layer 119e remains on the conductive layer 123. With this structure, damage to the conductive layer 123 can be suppressed in the following steps of removing the first sacrificial layer and the second sacrificial layer, which is preferable.
Next, as shown in fig. 13A, the first sacrificial layers 118a, 118b, 118c, 118d, 118e and the second sacrificial layers 119a, 119b, 119c, 119d, 119e are removed. Thus, the first electron transport layer 184a is exposed on the pixel electrode 111a, the second electron transport layer 184b is exposed on the pixel electrode 111b, the third electron transport layer 184c is exposed on the pixel electrode 111c, the fourth electron transport layer 184d is exposed on the pixel electrode 111d, the fifth electron transport layer 184e is exposed on the pixel electrode 111e, and the conductive layer 123 is exposed in the connection portion 140.
The sacrificial layer removal step may be performed by the same method as the sacrificial layer processing step. In particular, by using the wet etching method, damage to the first layer 113a, the second layer 113b, the third layer 113c, the fourth layer 113d, and the fifth layer 113e can be reduced when the sacrificial layer is removed, as compared with when the dry etching method is used.
Next, as shown in fig. 13B, the sixth layer 114 is formed so as to cover the first layer 113a, the second layer 113B, the third layer 113c, the fourth layer 113d, the fifth layer 113e, and the insulating layer 121, and the common electrode 115 is formed over the sixth layer 114, the insulating layer 121, and the conductive layer 123.
Materials that can be used for the sixth layer 114 can be referred to above. The layers constituting the sixth layer 114 may be formed by a vapor deposition method (including a vacuum vapor deposition method), a transfer method, a printing method, an inkjet method, a coating method, or the like, respectively. In addition, the layers constituting the sixth layer 114 may be formed using a formulation mixture material. Note that the sixth layer 114 may not be provided if not required.
Materials that can be used for the common electrode 115 can be referred to above. The common electrode 115 is formed by using, for example, a sputtering method or a vacuum evaporation method.
As shown in fig. 13B, a protective layer 131 is formed on the common electrode 115.
Materials that can be used for the protective layer 131 can be referred to above. Examples of the deposition method of the protective layer 131 include a vacuum deposition method, a sputtering method, a CVD method, and an ALD method. The protective layer 131 may have a single layer structure or a stacked structure. For example, the protective layer 131 may also have a two-layered layer structure formed using deposition methods different from each other.
Note that fig. 13B shows an example in which the sixth layer 114 enters a region between the first layer 113a and the second layer 113B, or the like, and a void 133 may be formed in this region as shown in fig. 13C.
The void 133 contains, for example, one or more selected from the group consisting of air, nitrogen, oxygen, carbon dioxide, and group 18 elements (typically helium, neon, argon, xenon, krypton, and the like).
In the case where the refractive index of the void 133 is lower than that of the sixth layer 114, light emitted from the light emitting device is reflected by the interface of the sixth layer 114 and the void 133. Thereby, light emitted from the light emitting device can be suppressed from being incident on an adjacent pixel (or sub-pixel). Thus, mixing of light of different colors can be suppressed, and thus display quality of the display device can be improved.
By bonding the substrate 120 using the resin layer 122 over the protective layer 131, the display device 100E shown in fig. 9B can be manufactured.
As described above, in the method for manufacturing the display device of the present embodiment, the island-shaped EL layer is formed by processing after depositing the EL layer over the entire surface, instead of using a high-definition metal mask. Therefore, the island-like EL layer can be formed with a uniform thickness. Further, a high-definition display device or a high aperture ratio display device which could not be manufactured before can be realized. Further, a high-definition display device or a high-aperture display device having a light detection function with a light receiving device mounted thereon can be realized.
The first layer, the second layer, and the third layer constituting the light emitting device of each color are formed in different steps. Accordingly, each EL layer can be manufactured in a structure (material, thickness, and the like) suitable for a light emitting device of each color. Thus, a light-emitting device having excellent characteristics can be manufactured.
This embodiment mode can be combined with other embodiment modes as appropriate.
Embodiment 3
In this embodiment, a display device according to an embodiment of the present invention will be described with reference to fig. 14 and 15.
The display device of the present embodiment may be a high-resolution display device or a large-sized display device. Therefore, for example, the display device of the present embodiment can be used as a display portion of: electronic devices having a large screen such as a television set, a desktop or notebook type personal computer, a display for a computer or the like, a digital signage, a large-sized game machine such as a pachinko machine, and the like; a digital camera; a digital video camera; a digital photo frame; a mobile telephone; a portable game machine; a portable information terminal; and a sound reproducing device.
Fig. 14 shows a perspective view of the display device 100F, and fig. 15A shows a cross-sectional view of the display device 100F.
The display device 100F has a structure in which a substrate 152 and a substrate 151 are bonded. In fig. 14, the substrate 152 is shown in broken lines.
The display device 100F includes a display portion 162, a circuit 164, a wiring 165, and the like. Fig. 14 shows an example in which the IC173 and the FPC172 are mounted in the display device 100F. Accordingly, the structure shown in fig. 14 may also be referred to as a display module including the display device 100F, IC (integrated circuit) and an FPC.
As the circuit 164, for example, a scanning line driver circuit can be used.
The wiring 165 has a function of supplying signals and power to the display portion 162 and the circuit 164. The signal and power are input to the wiring 165 from the outside through the FPC172 or input to the wiring 165 from the IC 173.
Fig. 14 shows an example in which an IC173 is provided over a substrate 151 by a COG (Chip On Glass) method, a COF (Chip On Film) method, or the like. As the IC173, for example, an IC including a scanning line driver circuit, a signal line driver circuit, or the like can be used. Note that the display device 100F and the display module are not necessarily provided with ICs. Further, the IC may be mounted on the FPC by COF method or the like.
Fig. 15A shows an example of a cross section of a portion of a region including the FPC172, a portion of the circuit 164, a portion of the display portion 162, and a portion of a region including an end portion of the display device 100F.
The display device 100F shown in fig. 15A includes a transistor 201, a transistor 205A, a transistor 205e, a light-emitting device 130a, a light-receiving device 150e, and the like between the substrate 151 and the substrate 152. The light emitting device 130a emits, for example, red, green, or blue light. Alternatively, the light emitting device 130a may emit infrared light. The light receiving device 150e detects infrared light, for example. Alternatively, the light receiving device 150e may detect visible light or both visible light and infrared light.
Here, when the pixel of the display device includes three sub-pixels having light emitting devices that emit light of different colors from each other, the three sub-pixels include a sub-pixel of three colors of R, G, B, a sub-pixel of three colors of yellow (Y), cyan (C), and magenta (M), and the like. When four of the above-described sub-pixels are included, the four sub-pixels include a sub-pixel of four colors of R, G, B and white (W), a sub-pixel of four colors of R, G, B and Y, and the like.
The protective layer 131 and the substrate 152 are bonded by the adhesive layer 142. As the sealing of the light emitting device, a solid sealing structure, a hollow sealing structure, or the like may be employed. In fig. 15A, a space between the substrate 152 and the substrate 151 is filled with the adhesive layer 142, that is, a solid sealing structure is adopted. Alternatively, a hollow sealing structure may be employed in which the space is filled with an inert gas (nitrogen, argon, or the like). At this time, the adhesive layer 142 may be provided so as not to overlap with the light emitting device. In addition, the space may be filled with a resin different from the adhesive layer 142 provided in a frame shape.
The light emitting device 130a has the same stacked structure as the light emitting device 130a shown in fig. 9B, and the light receiving device 150e has the same stacked structure as the light receiving device 150e shown in fig. 9B. For details of the light emitting device and the light receiving device, reference is made to embodiment 2. In addition, the end portions of the light emitting device 130a and the end portions of the light receiving device 150e are covered with the protective layer 131.
The pixel electrodes 111a and 111e are connected to the conductive layer 222b included in the transistors 205a and 205e through openings provided in the insulating layer 214.
The end of the pixel electrode is covered with an insulating layer 121. The pixel electrode includes a material that emits visible light, and the common electrode includes a material that transmits visible light.
Light emitted from the light emitting device exits to the substrate 152 side. Further, light incident from the substrate 152 side is detected by the light receiving device. Therefore, a material having high transmittance to visible light and infrared light is preferably used for the substrate 152.
The stacked structure of the substrate 151 to the insulating layer 214 corresponds to the layer 101 having a transistor in embodiment mode 2.
The transistor 201, the transistor 205a, and the transistor 205e are formed over the substrate 151. These transistors may be formed using the same material and the same process.
An insulating layer 211, an insulating layer 213, an insulating layer 215, and an insulating layer 214 are provided in this order over the substrate 151. A part of the insulating layer 211 is used as a gate insulating layer of each transistor. A part of the insulating layer 213 serves as a gate insulating layer of each transistor. The insulating layer 215 is provided so as to cover the transistor. The insulating layer 214 is provided so as to cover the transistor, and is used as a planarizing layer. The number of gate insulating layers and the number of insulating layers covering the transistor are not particularly limited, and may be one or two or more.
Preferably, a material which is not easily diffused by impurities such as water and hydrogen is used for at least one of insulating layers covering the transistor. Thereby, the insulating layer can be used as a barrier layer. By adopting such a structure, diffusion of impurities into the transistor from the outside can be effectively suppressed, so that the reliability of the display device can be improved.
An inorganic insulating film is preferably used for the insulating layer 211, the insulating layer 213, and the insulating layer 215. As the inorganic insulating film, for example, a silicon nitride film, a silicon oxynitride film, a silicon oxide film, a silicon nitride oxide film, an aluminum nitride film, or the like can be used. Further, a hafnium oxide film, an yttrium oxide film, a zirconium oxide film, a gallium oxide film, a tantalum oxide film, a magnesium oxide film, a lanthanum oxide film, a cerium oxide film, a neodymium oxide film, or the like can be used. Further, two or more of the insulating films may be stacked.
Here, the barrier property of the organic insulating film is lower than that of the inorganic insulating film in many cases. Therefore, the organic insulating film preferably includes an opening near an end of the display device 100F. Thereby, entry of impurities from the end portion of the display device 100F through the organic insulating film can be suppressed. Further, the organic insulating film may be formed such that an end portion thereof is positioned inside an end portion of the display device 100F so that the organic insulating film is not exposed to the end portion of the display device 100F.
The insulating layer 214 used as the planarizing layer is preferably an organic insulating film. As a material that can be used for the organic insulating film, for example, an acrylic resin, a polyimide resin, an epoxy resin, a polyamide resin, a polyimide amide resin, a siloxane resin, a benzocyclobutene resin, a phenol resin, a precursor of these resins, and the like can be used.
In the region 228 shown in fig. 15A, an opening is formed in the insulating layer 214. Thus, even in the case where an organic insulating film is used as the insulating layer 214, entry of impurities into the display portion 162 through the insulating layer 214 from the outside can be suppressed. Thereby, the reliability of the display device 100F can be improved.
The transistor 201, the transistor 205a, and the transistor 205e include: a conductive layer 221 serving as a gate electrode; an insulating layer 211 serving as a gate insulating layer; conductive layers 222a and 222b serving as a source and a drain; a semiconductor layer 231; an insulating layer 213 serving as a gate insulating layer; and a conductive layer 223 serving as a gate electrode. Here, a plurality of layers obtained by processing the same conductive film are indicated by the same hatching. The insulating layer 211 is located between the conductive layer 221 and the semiconductor layer 231. The insulating layer 213 is located between the conductive layer 223 and the semiconductor layer 231.
The transistor structure included in the display device of this embodiment is not particularly limited. For example, a planar transistor, an interleaved transistor, an inverted interleaved transistor, or the like can be employed. In addition, the transistors may have either a top gate structure or a bottom gate structure. Alternatively, a gate electrode may be provided above and below the semiconductor layer forming the channel.
As the transistor 201, the transistor 205a, and the transistor 205e, a structure in which two gates sandwich a semiconductor layer forming a channel is adopted. Further, two gates may be connected to each other, and the same signal may be supplied to the two gates to drive the transistor. Alternatively, the threshold voltage of the transistor can be controlled by applying a potential for controlling the threshold voltage to one of the two gates and applying a potential for driving to the other gate.
The crystallinity of the semiconductor material used for the transistor is not particularly limited, and an amorphous semiconductor, a single crystal semiconductor, or a semiconductor having crystallinity other than single crystal (a microcrystalline semiconductor, a polycrystalline semiconductor, or a semiconductor in which a part thereof has a crystalline region) can be used. When a single crystal semiconductor or a semiconductor having crystallinity is used, deterioration in characteristics of a transistor can be suppressed, so that it is preferable.
The semiconductor layer of the transistor preferably contains a metal oxide (oxide semiconductor). That is, the display device of this embodiment mode preferably uses a transistor (hereinafter, an OS transistor) in which a metal oxide is used for a channel formation region. In addition, the semiconductor layer of the transistor may contain silicon. Examples of the silicon include amorphous silicon and crystalline silicon (low-temperature polycrystalline silicon, single crystal silicon, and the like).
For example, the semiconductor layer preferably contains indium, M (M is one or more selected from gallium, aluminum, silicon, boron, yttrium, tin, copper, vanadium, beryllium, titanium, iron, nickel, germanium, zirconium, molybdenum, lanthanum, cerium, neodymium, hafnium, tantalum, tungsten, or magnesium), and zinc. In particular, M is preferably one or more selected from aluminum, gallium, yttrium or tin.
In particular, as the semiconductor layer, an oxide (IGZO) containing indium (In), gallium (Ga), and zinc (Zn) is preferably used.
When an In-M-Zn oxide is used for the semiconductor layer, the atomic ratio of In the In-M-Zn oxide is preferably equal to or greater than the atomic ratio of M. The atomic number ratio of the metal elements of such an In-M-Zn oxide includes In: m: zn=1: 1:1 or the vicinity thereof, in: m: zn=1: 1:1.2 composition at or near, in: m: zn=2: 1:3 or the vicinity thereof, in: m: zn=3: 1:2 or the vicinity thereof, in: m: zn=4: 2:3 or the vicinity thereof, in: m: zn=4: 2:4.1 or the vicinity thereof, in: m: zn=5: 1:3 or the vicinity thereof, in: m: zn=5: 1:6 or the vicinity thereof, in: m: zn=5: 1:7 or the vicinity thereof, in: m: zn=5: 1:8 or the vicinity thereof, in: m: zn=6: 1:6 or the vicinity thereof, in: m: zn=5: 2:5 or the vicinity thereof, and the like. The composition in the vicinity includes a range of ±30% of the desired atomic number ratio.
For example, when the atomic number ratio is expressed as In: ga: zn=4: 2:3 or its vicinity, including the following: in is 4, ga is 1 to 3, zn is 2 to 4. Note that, when the atomic number ratio is expressed as In: ga: zn=5: 1:6 or its vicinity, including the following: in is 5, ga is more than 0.1 and not more than 2, and Zn is not less than 5 and not more than 7. Note that, when the atomic number ratio is expressed as In: ga: zn=1: 1:1 or its vicinity, including the following: in is 1, ga is more than 0.1 and not more than 2, and Zn is more than 0.1 and not more than 2.
The transistor included in the circuit 164 and the transistor included in the display portion 162 may have the same structure or may have different structures. The plurality of transistors included in the circuit 164 may have the same structure or may have two or more different structures. In the same manner, the plurality of transistors included in the display portion 162 may have the same structure or two or more different structures.
Fig. 15B and 15C show other structural examples of the transistor.
Transistor 209 and transistor 210 include: a conductive layer 221 serving as a gate electrode; an insulating layer 211 serving as a gate insulating layer; a semiconductor layer 231 including a channel formation region 231i and a pair of low-resistance regions 231 n; a conductive layer 222a connected to one of the pair of low-resistance regions 231 n; a conductive layer 222b connected to the other of the pair of low-resistance regions 231 n; an insulating layer 225 serving as a gate insulating layer; a conductive layer 223 serving as a gate electrode; and an insulating layer 215 covering the conductive layer 223. The insulating layer 211 is located between the conductive layer 221 and the channel formation region 231 i. The insulating layer 225 is located at least between the conductive layer 223 and the channel formation region 231 i. Furthermore, an insulating layer 218 covering the transistor may be provided.
In the example shown in fig. 15B, the insulating layer 225 covers the top surface and the side surface of the semiconductor layer 231 in the transistor 209. The conductive layer 222a and the conductive layer 222b are connected to the low-resistance region 231n through openings provided in the insulating layer 225 and the insulating layer 215. One of the conductive layer 222a and the conductive layer 222b serves as a source, and the other serves as a drain.
On the other hand, in the transistor 210 illustrated in fig. 15C, the insulating layer 225 overlaps with the channel formation region 231i of the semiconductor layer 231 and does not overlap with the low-resistance region 231 n. For example, the structure shown in fig. 15C can be formed by processing the insulating layer 225 using the conductive layer 223 as a mask. In fig. 15C, the insulating layer 215 covers the insulating layer 225 and the conductive layer 223, and the conductive layer 222a and the conductive layer 222b are connected to the low-resistance region 231n through openings of the insulating layer 215, respectively.
The connection portion 204 is provided in a region of the substrate 151 which does not overlap with the substrate 152. In the connection portion 204, the wiring 165 is electrically connected to the FPC172 through the conductive layer 166 and the connection layer 242. The following examples are shown: the conductive layer 166 is a conductive film obtained by processing the same conductive film as the pixel electrode. Conductive layer 166 is exposed on the top surface of connection portion 204. Accordingly, the connection portion 204 can be electrically connected to the FPC172 through the connection layer 242.
The light shielding layer 148 is preferably provided on the surface of the substrate 152 on the substrate 151 side. Further, various optical members may be arranged outside the substrate 152. As the optical member, a polarizing plate, a retardation plate, a light diffusion layer (diffusion film or the like), an antireflection layer, a condensing film (condensing film) or the like can be used. Further, an antistatic film which suppresses adhesion of dust, a film which is not easily stained and has water repellency, a hard coat film which suppresses damage in use, an impact absorbing layer, and the like may be disposed on the outer side of the substrate 152.
By forming the protective layer 131 covering the light emitting device, entry of impurities such as water into the light emitting device can be suppressed, whereby the reliability of the light emitting device can be improved.
In the region 228 near the end portion of the display device 100F, it is preferable that the insulating layer 215 and the protective layer 131 be in contact with each other through the opening of the insulating layer 214. In particular, it is particularly preferable that the inorganic insulating films are in contact with each other. Thus, the entry of impurities into the display portion 162 through the organic insulating film from the outside can be suppressed. Therefore, the reliability of the display device 100F can be improved.
As the substrate 151 and the substrate 152, glass, quartz, ceramic, sapphire, resin, metal, alloy, semiconductor, or the like can be used. The substrate on the side from which light from the light-emitting device is extracted uses a material that transmits the light. By using a material having flexibility for the substrate 151 and the substrate 152, flexibility of the display device can be improved. As the substrate 151 or the substrate 152, a polarizing plate can be used.
As the substrate 151 and the substrate 152, the following materials can be used: polyester resins such as polyethylene terephthalate (PET) and polyethylene naphthalate (PEN), polyacrylonitrile resins, acrylic resins, polyimide resins, polymethyl methacrylate resins, polycarbonate (PC) resins, polyethersulfone (PES) resins, polyamide resins (nylon, aramid, etc.), polysiloxane resins, cycloolefin resins, polystyrene resins, polyamide-imide resins, polyurethane resins, polyvinyl chloride resins, polyvinylidene chloride resins, polypropylene resins, polytetrafluoroethylene (PTFE) resins, ABS resins, cellulose nanofibers, and the like. Further, glass having a thickness of a degree of flexibility may be used as one or both of the substrate 151 and the substrate 152.
In the case of overlapping the circularly polarizing plate on the display device, a substrate having high optical isotropy is preferably used as the substrate included in the display device. Substrates with high optical isotropy have lower birefringence (also referred to as lower birefringence).
The absolute value of the phase difference value (retardation value) of the substrate having high optical isotropy is preferably 30nm or less, more preferably 20nm or less, and further preferably 10nm or less.
Examples of the film having high optical isotropy include a cellulose triacetate (also referred to as TAC or Cellulose triacetate) film, a cycloolefin polymer (COP) film, a cycloolefin copolymer (COC) film, and an acrylic film.
When a film is used as a substrate, there is a possibility that shape changes such as wrinkles in the display panel occur due to water absorption of the film. Therefore, a film having low water absorption is preferably used as the substrate. For example, a film having a water absorption of 1% or less is preferably used, a film having a water absorption of 0.1% or less is more preferably used, and a film having a water absorption of 0.01% or less is more preferably used.
As the adhesive layer, various kinds of cured adhesives such as a photo-cured adhesive such as an ultraviolet-cured adhesive, a reaction-cured adhesive, a heat-cured adhesive, and an anaerobic adhesive can be used. Examples of such binders include epoxy resins, acrylic resins, silicone resins, phenolic resins, polyimide resins, imide resins, PVC (polyvinyl chloride) resins, PVB (polyvinyl butyral) resins, and EVA (ethylene-vinyl acetate) resins. In particular, a material having low moisture permeability such as epoxy resin is preferably used. In addition, a two-liquid mixed type resin may be used. In addition, an adhesive sheet or the like may be used.
As the connection layer 242, an anisotropic conductive film (ACF: anisotropic Conductive Film), an anisotropic conductive paste (ACP: anisotropic Conductive Paste), or the like can be used.
Examples of materials that can be used for the gate electrode, source electrode, drain electrode, various wirings constituting a display device, and conductive layers such as electrodes include metals such as aluminum, titanium, chromium, nickel, copper, yttrium, zirconium, molybdenum, silver, tantalum, and tungsten, and alloys containing the metals as main components. A single layer or a stack of films comprising these materials may be used.
As the light-transmitting conductive material, a conductive oxide such as indium oxide, indium tin oxide, indium zinc oxide, or zinc oxide containing gallium, or graphene can be used. Alternatively, a metal material such as gold, silver, platinum, magnesium, nickel, tungsten, chromium, molybdenum, iron, cobalt, copper, palladium, or titanium, or an alloy material containing the metal material may be used. Alternatively, a nitride (e.g., titanium nitride) of the metal material or the like may be used. Further, when a metal material or an alloy material (or their nitrides) is used, it is preferable to form it thin so as to have light transmittance. In addition, a laminated film of the above materials can be used as the conductive layer. For example, a laminate film of an alloy of silver and magnesium and indium tin oxide is preferable because conductivity can be improved. The above material can be used for conductive layers such as various wirings and electrodes constituting a display device and conductive layers included in a light-emitting device (used as a conductive layer for a pixel electrode or a common electrode).
Examples of the insulating material that can be used for each insulating layer include resins such as acrylic resin and epoxy resin, and inorganic insulating materials such as silicon oxide, silicon oxynitride, silicon nitride oxide, silicon nitride, and aluminum oxide.
This embodiment mode can be combined with other embodiment modes as appropriate.
Embodiment 4
In this embodiment, a light-emitting device which can be used in a display device according to one embodiment of the present invention will be described.
The light-emitting device shown in fig. 16A includes an electrode 772, an EL layer 786, and an electrode 788. One of the electrode 772 and the electrode 788 is used as an anode, and the other is used as a cathode. Among the electrode 772 and the electrode 788, one is used as a pixel electrode and the other is used as a common electrode. In addition, it is preferable that, among the electrode 772 and the electrode 788, the electrode on the light extraction side has visible light transmittance, and the other electrode reflects visible light.
As shown in fig. 16A, the EL layer 786 included in the light-emitting device may be formed of a plurality of layers such as a layer 4420, a light-emitting layer 4411, and a layer 4430. The layer 4420 may include, for example, a layer containing a substance having high electron injection property (an electron injection layer), a layer containing a substance having high electron transport property (an electron transport layer), or the like. The light-emitting layer 4411 includes, for example, a light-emitting compound. The layer 4430 may include, for example, a layer containing a substance having high hole injection property (a hole injection layer) and a layer containing a substance having high hole transport property (a hole transport layer).
The structure including the layer 4420, the light-emitting layer 4411, and the layer 4430 which are provided between a pair of electrodes can be used as a single light-emitting unit, and the structure of fig. 16A is referred to as a single structure in this specification.
In addition, fig. 16B shows a modified example of the EL layer 786 included in the light-emitting device shown in fig. 16A. Specifically, the light-emitting device shown in fig. 16B includes a layer 4431 over the electrode 772, a layer 4432 over the layer 4431, a light-emitting layer 4411 over the layer 4432, a layer 4421 over the light-emitting layer 4411, a layer 4422 over the layer 4421, and an upper electrode 788 over the layer 4422. For example, when the electrode 772 is used as an anode and the electrode 788 is used as a cathode, the layer 4431 is used as a hole injection layer, the layer 4432 is used as a hole transport layer, the layer 4421 is used as an electron transport layer, and the layer 4422 is used as an electron injection layer. Alternatively, when the electrode 772 is used as a cathode and the electrode 788 is used as an anode, the layer 4431 is used as an electron injection layer, the layer 4432 is used as an electron transport layer, the layer 4421 is used as a hole transport layer, and the layer 4422 is used as a hole injection layer. By adopting the above layer structure, carriers can be efficiently injected into the light-emitting layer 4411, whereby recombination efficiency of carriers in the light-emitting layer 4411 can be improved.
As shown in fig. 16C, a structure in which a plurality of light-emitting layers (light-emitting layers 4411, 4412, and 4413) are provided between the layers 4420 and 4430 is also a modification example of a single structure.
As shown in fig. 16D, a structure in which a plurality of light emitting units (EL layers 786a and 786 b) are connected in series with an intermediate layer 4440 (also referred to as a charge generation layer) interposed therebetween is referred to as a series structure in this specification. But is not limited thereto, and for example, the series structure may also be referred to as a laminated structure. By adopting the series structure, a light-emitting device capable of emitting light with high luminance can be realized.
In fig. 16C and 16D, the layers 4420 and 4430 may have a stacked structure of two or more layers as shown in fig. 16B.
The light emitting color of the light emitting device can be red, green, blue, cyan, magenta, yellow, white, or the like depending on the material constituting the EL layer 786. In addition, when the light emitting device has a microcavity structure, color purity can be further improved.
The white light emitting device preferably has a structure in which the light emitting layer contains two or more kinds of light emitting substances. In order to obtain white light emission, two or more kinds of light-emitting substances each having a complementary color relationship may be selected. For example, by placing the light-emitting color of the first light-emitting layer and the light-emitting color of the second light-emitting layer in a complementary relationship, a light-emitting device that emits light in white color as a whole can be obtained. In addition, the same applies to a light-emitting device including three or more light-emitting layers. For example, when the light emitting colors of the light emitting layers 4411, 4412, 4413 shown in fig. 16C are in a complementary color relationship, a white light emitting device of a single structure can be realized.
The light-emitting layer preferably contains two or more kinds of light-emitting substances each of which emits light such as R (red), G (green), B (blue), Y (yellow), O (orange), and the like. Alternatively, two or more luminescent materials each of which emits light and contains two or more spectral components in R, G, B are preferably contained.
Modification of display device
A structural example of the light emitting device is described with reference to fig. 17 to 20.
Fig. 17A shows a schematic cross-sectional view of a display device 500. The display device 500 includes a light emitting device 550R emitting red light, a light emitting device 550G emitting green light, and a light emitting device 550B emitting blue light. Note that in this embodiment, description of a light receiving device included in a display device is omitted.
The light emitting device 550R has a structure in which two light emitting units (light emitting unit 512r_1 and light emitting unit 512r_2) are stacked with an intermediate layer 531 interposed between a pair of electrodes (electrode 501 and electrode 502). Similarly, the light emitting device 550G includes light emitting units 512g_1 and 512g_2, and the light emitting device 550B includes light emitting units 512b_1 and 512b_2.
The electrode 501 is used as a pixel electrode and is provided in each light emitting device. The electrode 502 is used as a common electrode and is commonly provided in a plurality of light emitting devices.
The light emitting unit 512r_1 includes a layer 521, a layer 522, a light emitting layer 523R, a layer 524, and the like. The light emitting unit 512r_2 includes a layer 522, a light emitting layer 523R, a layer 524, and the like. Further, the light emitting device 550R includes a layer 525 or the like between the light emitting unit 512r_2 and the electrode 502. Note that the layer 525 can also be regarded as a part of the light emitting unit 512r_2.
The layer 521 includes, for example, a layer containing a substance having high hole injection property (a hole injection layer). The layer 522 includes, for example, a layer containing a substance having high hole-transport property (a hole-transport layer), and the like. The layer 524 includes, for example, a layer containing a substance having high electron-transport property (an electron-transport layer), and the like. The layer 525 includes, for example, a layer containing a substance having high electron injection property (an electron injection layer), and the like.
Alternatively, the structure may be as follows: layer 521 includes an electron injection layer, layer 522 includes an electron transport layer, layer 524 includes a hole transport layer, and layer 525 includes a hole injection layer.
Note that the layer 522, the light-emitting layer 523R, and the layer 524 may have the same or different structures (materials, thicknesses, and the like) in the light-emitting unit 512r_1 and the light-emitting unit 512r_2.
In fig. 17A, layers 521 and 522 are shown, respectively, but are not limited thereto. For example, when the layer 521 has a function of both the hole injection layer and the hole transport layer or when the layer 521 has a function of both the electron injection layer and the electron transport layer, the layer 522 may be omitted.
The intermediate layer 531 has a function of injecting electrons into one of the light emitting cells 512r_1 and 512r_2 and injecting holes into the other when a voltage is applied between the electrode 501 and the electrode 502. The intermediate layer 531 may also be referred to as a charge generation layer.
As the intermediate layer 531, for example, a material such as lithium that can be used for the electron injection layer can be suitably used. Further, as the intermediate layer, for example, a material that can be used for the hole injection layer can be suitably used. In addition, a layer containing a hole-transporting material and an acceptor material (electron-accepting material) can be used for the intermediate layer. In addition, a layer containing an electron-transporting material and a donor material may be used as the intermediate layer. By forming an intermediate layer including such a layer, an increase in driving voltage when light emitting units are stacked can be suppressed.
Note that the light-emitting layer 523R included in the light-emitting device 550R contains a light-emitting substance that emits red light, the light-emitting layer 523G included in the light-emitting device 550G contains a light-emitting substance that emits green light, and the light-emitting layer 523B included in the light-emitting device 550B contains a light-emitting substance that emits blue light. Note that the light-emitting device 550G and the light-emitting device 550B each have a structure in which the light-emitting layer 523R included in the light-emitting device 550R is replaced with the light-emitting layer 523G and the light-emitting layer 523B, and the other structures are similar to the light-emitting device 550R.
Note that the layer 521, the layer 522, the layer 524, and the layer 525 may have the same or different structures (materials, thicknesses, and the like) in each color light-emitting device.
Like the light emitting devices 550R, 550G, and 550B, a structure in which a plurality of light emitting units are connected in series with the intermediate layer 531 therebetween is referred to as a series structure in this specification. On the other hand, a structure having one light emitting unit between a pair of electrodes is called a single structure. Note that in this specification and the like, the tandem structure is referred to, but is not limited thereto, and for example, the tandem structure may also be referred to as a stacked structure. Note that by adopting a series structure, a light-emitting device capable of emitting light with high luminance can be realized. In addition, the series structure can reduce the current for obtaining the same brightness as compared with the single structure, and thus can improve the reliability.
As in the light-emitting devices 550R, 550G, and 550B, a structure in which a light-emitting layer is formed for each light-emitting device is sometimes referred to as a SBS (Side By Side) structure. The SBS structure can optimize the material and structure for each light emitting device, and thus the degree of freedom in selecting the material and structure can be improved, and the improvement of brightness and reliability can be easily achieved.
The display device 500 can be said to have a serial structure and an SBS structure. This has the advantage of both the tandem structure and the SBS structure. Note that the display device 500 has a structure in which two-stage light emitting units are formed in series as shown in fig. 17A, and thus may also be referred to as a two-stage series structure. Further, in the two-stage series structure shown in fig. 17A, a second light emitting unit including a red light emitting layer is stacked on a first light emitting unit including a red light emitting layer. Similarly, in the two-stage tandem structure shown in fig. 17A, a second light emitting unit including a green light emitting layer is stacked on a first light emitting unit including a green light emitting layer, and a second light emitting unit including a blue light emitting layer is stacked on a first light emitting unit including a blue light emitting layer.
In fig. 17A, the light emitting unit 512r_1, the intermediate layer 531, the light emitting unit 512r_2, and the layer 525 may be formed as island-shaped layers. In addition, the light emitting unit 512g_1, the intermediate layer 531, the light emitting unit 512g_2, and the layer 525 may be formed as island-shaped layers. The light emitting unit 512b_1, the intermediate layer 531, the light emitting unit 512b_2, and the layer 525 may be formed as island-shaped layers. That is, the layer 113 shown in fig. 17A corresponds to the first layer 113a, the second layer 113B, or the third layer 113c shown in fig. 9B or the like.
Fig. 17B is a modification of the display device 500 shown in fig. 17A. The display device 500 shown in fig. 17B is an example in which a layer 525 is provided in common between light emitting devices like the electrode 502. At this time, the layer 525 may be referred to as a common layer. In this way, by providing one or more common layers in the plurality of light emitting devices, the manufacturing process can be simplified, and thus the manufacturing cost can be reduced.
In fig. 17B, the light emitting unit 512r_1, the intermediate layer 531, and the light emitting unit 512r_2 may be formed as island-shaped layers. Further, the light emitting unit 512g_1, the intermediate layer 531, and the light emitting unit 512g_2 may be formed as island-shaped layers. In addition, the light emitting unit 512b_1, the intermediate layer 531, and the light emitting unit 512b_2 may be formed as island-shaped layers. That is, the layer 113 shown in fig. 17B corresponds to the first layer 113a, the second layer 113B, or the third layer 113c shown in fig. 9B or the like. Further, the layer 525 corresponds to the sixth layer 114 shown in fig. 9B. Note that in fig. 18 to 20, a layer equivalent to the first layer 113a, the second layer 113B, or the third layer 113c shown in fig. 9B or the like is denoted as a layer 113.
The display device 500 shown in fig. 18A is an example in which three light emitting units are stacked. In fig. 18A, in the light emitting device 550R, a light emitting unit 512r_3 is further stacked on the light emitting unit 512r_2 with an intermediate layer 531 interposed therebetween. The light emitting unit 512r_3 includes a layer 522, a light emitting layer 523R, a layer 524, and the like. The light emitting unit 512r_3 may use the same structure as the light emitting unit 512r_2. In addition, the same applies to the light emitting unit 512g_3 included in the light emitting device 550G and the light emitting unit 512b_3 included in the light emitting device 550B.
Fig. 18B shows an example in which n light emitting units (n is an integer of 2 or more) are stacked.
Thus, by increasing the number of stacked layers of the light emitting unit, the luminance obtained from the light emitting device at the same amount of current can be improved according to the number of stacked layers. Further, by increasing the number of stacked layers of the light emitting unit, a current required to obtain the same luminance can be reduced, and power consumption of the light emitting device can be reduced according to the number of stacked layers.
The display device 500 shown in fig. 19A shows an example in which two adjacent light emitting devices are separated and the electrode 502 is provided along the side surfaces of the light emitting unit and the intermediate layer 531.
Here, when the intermediate layer 531 is in contact with the electrode 502, an electrical short may occur. Therefore, the intermediate layer 531 is preferably insulated from the electrode 502.
Fig. 19A shows an example in which an insulating layer 541 is provided to cover the side surfaces of the electrode 501, each light-emitting cell, and the intermediate layer 531. The insulating layer 541 may be referred to as a sidewall, a sidewall protection layer, a sidewall insulating film, or the like. By providing the insulating layer 541, the intermediate layer 531 can be electrically insulated from the electrode 502.
The side surfaces of the light emitting units and the intermediate layer 531 are preferably perpendicular or substantially perpendicular to the surface to be formed. For example, the angle formed by the surface to be formed and the side surfaces is preferably set to 60 degrees or more and 90 degrees or less.
Fig. 19B shows an example in which the layer 525 and the electrode 502 are provided along the side surfaces of the light-emitting unit and the intermediate layer 531. Further, a two-layer structure of an insulating layer 541 and an insulating layer 542 is provided as a side wall protective layer.
Fig. 20A is a modification of fig. 19B. Further, fig. 20B is an enlarged view of the region 503 shown in fig. 20A. Fig. 20A is different from fig. 19B in the shape of the end portion of the insulating layer 542. Further, since the insulating layer 542 has different shapes at the end portions and the layer 525 and the electrode 502 are formed along the shape of the insulating layer 542, the shapes of the layer 525 and the electrode 502 are also different. Further, fig. 20A is different from fig. 19B in that the thickness of the insulating layer 542 is thicker than that of the insulating layer 541. The shape of the end portion of the insulating layer 542 may have a circular shape as shown in fig. 20B. For example, when the insulating layer 542 is formed, in a case where an upper portion of the insulating layer 542 is etched by anisotropic etching by dry etching, an end portion of the insulating layer 542 has a circular shape as shown in fig. 20B. The shape of the end portion of the insulating layer 542 is preferably circular, since the coverage of the layer 525 and the electrode 502 is improved. As shown in fig. 20A and 20B, the insulating layer 542 may have a thicker thickness than the insulating layer 541, so that the shape of the end portion may be rounded.
By the insulating layer 541 (and the insulating layer 542) functioning as a side wall protective layer, the electrode 502 can be prevented from being electrically shorted with the intermediate layer 531. Further, by covering the side surface of the electrode 501 with the insulating layer 541 (and the insulating layer 542), an electrical short between the electrode 501 and the electrode 502 can be prevented. Thereby, it is possible to prevent an electrical short circuit from occurring at the portions located at the four corners of the light emitting device.
The insulating layer 541 and the insulating layer 542 are preferably formed using an inorganic insulating film. For example, an oxide or nitride such as silicon oxide, silicon oxynitride, silicon nitride, aluminum oxide, aluminum oxynitride, or hafnium oxide can be used. In addition, yttrium oxide, zirconium oxide, gallium oxide, tantalum oxide, magnesium oxide, lanthanum oxide, cerium oxide, neodymium oxide, and the like can also be used.
The insulating layer 541 and the insulating layer 542 can be formed by various deposition methods such as a sputtering method, a vapor deposition method, a CVD method, and an ALD method. In particular, since the ALD method causes little deposition damage to the formation layer, the insulating layer 541 directly formed on the light emitting element and the intermediate layer 531 is preferably formed by the ALD method. In addition, in this case, when the insulating layer 542 is formed by a sputtering method, productivity can be improved, which is preferable.
For example, an aluminum oxide film formed by an ALD method may be used as the insulating layer 541, and a silicon nitride film formed by a sputtering method may be used as the insulating layer 542.
One or both of the insulating layer 541 and the insulating layer 542 preferably have a function of blocking an insulating film for at least one of water and oxygen. Alternatively, one or both of the insulating layer 541 and the insulating layer 542 preferably have a function of suppressing diffusion of at least one of water and oxygen. Alternatively, one or both of the insulating layer 541 and the insulating layer 542 preferably have a function of trapping or fixing at least one of water and oxygen (also referred to as gettering).
Note that in this specification and the like, the barrier insulating film means an insulating film having barrier properties. In the present specification, the barrier property means a function of suppressing diffusion of a corresponding substance (also referred to as low permeability). Or, it means a function of capturing or immobilizing a corresponding substance (also referred to as gettering).
By having the function of blocking the insulating film or the gettering function described above in one or both of the insulating layer 541 and the insulating layer 542, entry of impurities (typically, water or oxygen) which may diffuse to each light emitting device from the outside can be suppressed. By adopting this structure, a display device excellent in reliability can be provided.
Note that as shown in fig. 20C, the insulating layer 541 and the insulating layer 542 serving as side wall protective layers may not be included. In fig. 20C, the layer 525 is provided in contact with the side surfaces of the light emitting cells and the intermediate layer 531.
Note that in the display device 500, a light-emitting material of the light-emitting layer is not particularly limited. For example, in the display device 500 shown in fig. 17A, the following structure may be provided: the light emitting layer 523R included in the light emitting unit 512r_1 has a phosphorescent material, the light emitting layer 523R included in the light emitting unit 512r_2 has a phosphorescent material, the light emitting layer 523G included in the light emitting unit 512g_1 has a fluorescent material, the light emitting layer 523G included in the light emitting unit 512g_2 has a fluorescent material, the light emitting layer 523B included in the light emitting unit 512b_1 has a fluorescent material, and the light emitting layer 523B included in the light emitting unit 512b_2 has a fluorescent material.
Alternatively, in the display device 500 shown in fig. 17A, the following structure may be provided: the light emitting layer 523R included in the light emitting unit 512r_1 has a phosphorescent material, the light emitting layer 523R included in the light emitting unit 512r_2 has a phosphorescent material, the light emitting layer 523G included in the light emitting unit 512g_1 has a phosphorescent material, the light emitting layer 523G included in the light emitting unit 512g_2 has a phosphorescent material, the light emitting layer 523B included in the light emitting unit 512b_1 has a fluorescent material, and the light emitting layer 523B included in the light emitting unit 512b_2 has a fluorescent material.
Note that the display device according to one embodiment of the present invention may have a structure in which all light-emitting layers include a fluorescent material or a structure in which all light-emitting layers include a phosphorescent material.
Alternatively, in the display device 500 shown in fig. 17A, a structure in which the light-emitting layer 523R included in the light-emitting unit 512r_1 uses a phosphorescent material and the light-emitting layer 523R included in the light-emitting unit 512r_2 uses a fluorescent material, or a structure in which the light-emitting layer 523R included in the light-emitting unit 512r_1 uses a fluorescent material and the light-emitting layer 523R included in the light-emitting unit 512r_2 uses a phosphorescent material may be adopted, that is, the light-emitting materials of the first-stage light-emitting layer and the second-stage light-emitting layer may be different. Note that, although the description herein is about the light emitting units 512r_1 and 512r_2, the light emitting units 512g_1 and 512g_2 and the light emitting units 512b_1 and 512b_2 may have the same configuration.
This embodiment mode can be combined with other embodiment modes as appropriate.
Embodiment 5
In this embodiment mode, a metal oxide (also referred to as an oxide semiconductor) that can be used for the OS transistor described in the above embodiment mode is described.
The metal oxide preferably contains at least indium or zinc. Particularly preferred are indium and zinc. In addition, aluminum, gallium, yttrium, tin, or the like is preferably contained. Further, one or more selected from boron, silicon, titanium, iron, nickel, germanium, zirconium, molybdenum, lanthanum, cerium, neodymium, hafnium, tantalum, tungsten, magnesium, cobalt, and the like may be contained.
The metal oxide may be formed by a chemical vapor deposition (CVD: chemical Vapor Deposition) method such as a sputtering method or an organic metal chemical vapor deposition (MOCVD: metal Organic Chemical Vapor Deposition) method, an atomic layer deposition (ALD: atomic Layer Deposition) method, or the like.
< classification of Crystal Structure >
Examples of the crystalline structure of the oxide semiconductor include amorphous (including completely amorphous), CAAC (c-axis-aligned crystalline), nc (nanocrystalline), CAC (closed-aligned composite), single crystal (single crystal), and polycrystalline (poly crystal).
The crystalline structure of the film or substrate can be evaluated using X-Ray Diffraction (XRD) spectroscopy. For example, the XRD spectrum measured by GIXD (Graving-incoedence XRD) measurement can be used for evaluation. Furthermore, the GIXD process is also referred to as a thin film process or a Seemann-Bohlin process.
For example, the peak shape of the XRD spectrum of the quartz glass substrate is substantially bilaterally symmetrical. On the other hand, the peak shape of the XRD spectrum of the IGZO film having a crystalline structure is not bilaterally symmetrical. The peak shape of the XRD spectrum is left-right asymmetric indicating the presence of crystals in the film or in the substrate. In other words, unless the peak shape of the XRD spectrum is bilaterally symmetrical, it cannot be said that the film or substrate is in an amorphous state.
In addition, the crystalline structure of the film or substrate can be evaluated using a diffraction pattern (also referred to as a nanobeam electron diffraction pattern) observed by a nanobeam electron diffraction method (NBED: nano Beam Electron Diffraction). For example, it can be confirmed that the quartz glass is in an amorphous state by observing a halo pattern in a diffraction pattern of the quartz glass substrate. Further, a spot-like pattern was observed in the diffraction pattern of the IGZO film deposited at room temperature without the halo. It is therefore presumed that the IGZO film deposited at room temperature is in an intermediate state where it is neither crystalline nor amorphous, and it cannot be concluded that the IGZO film is amorphous.
Structure of oxide semiconductor
In addition, in the case of focusing attention on the structure of an oxide semiconductor, the classification of the oxide semiconductor may be different from the above classification. For example, oxide semiconductors can be classified into single crystal oxide semiconductors and non-single crystal oxide semiconductors other than the single crystal oxide semiconductors. Examples of the non-single crystal oxide semiconductor include the CAAC-OS and nc-OS described above. The non-single crystal oxide semiconductor includes a polycrystalline oxide semiconductor, an a-like OS (amorphorus-like oxide semiconductor), an amorphous oxide semiconductor, and the like.
Details of the CAAC-OS, nc-OS, and a-like OS will be described herein.
[CAAC-OS]
The CAAC-OS is an oxide semiconductor including a plurality of crystal regions, the c-axis of which is oriented in a specific direction. The specific direction refers to the thickness direction of the CAAC-OS film, the normal direction of the surface on which the CAAC-OS film is formed, or the normal direction of the surface of the CAAC-OS film. The crystallization region is a region having periodicity of atomic arrangement. Note that the crystal region is also a region in which lattice arrangements are uniform when the atomic arrangements are regarded as lattice arrangements. The CAAC-OS may have a region where a plurality of crystal regions are connected in the a-b plane direction, and the region may have distortion. In addition, distortion refers to a portion in which the direction of lattice arrangement changes between a region in which lattice arrangements are uniform and other regions in which lattice arrangements are uniform among regions in which a plurality of crystal regions are connected. In other words, CAAC-OS refers to an oxide semiconductor that is c-axis oriented and has no significant orientation in the a-b plane direction.
Each of the plurality of crystal regions is composed of one or more fine crystals (crystals having a maximum diameter of less than 10 nm). In the case where the crystal region is composed of one minute crystal, the maximum diameter of the crystal region is less than 10nm. In the case where the crystal region is composed of a plurality of fine crystals, the size of the crystal region may be about several tens of nm.
In addition, in the In-M-Zn oxide (element M is one or more selected from aluminum, gallium, yttrium, tin, titanium, and the like), CAAC-OS tends to have a layered crystal structure (also referred to as a layered structure) In which a layer containing indium (In) and oxygen (hereinafter, in layer) and a layer containing element M, zinc (Zn) and oxygen (hereinafter, (M, zn layer) are stacked. Furthermore, indium and the element M may be substituted for each other. Therefore, the (M, zn) layer sometimes contains indium. In addition, the In layer sometimes contains an element M. Note that sometimes the In layer contains Zn. The layered structure is observed as a lattice image, for example, in a high resolution TEM (Transmission Electron Microscope) image.
For example, when structural analysis is performed on a CAAC-OS film using an XRD device, a peak indicating c-axis orientation is detected at or near 2θ=31° in Out-of-plane XRD measurement using θ/2θ scanning. Note that the position (2θ value) of the peak indicating the c-axis orientation may vary depending on the kind, composition, and the like of the metal element constituting the CAAC-OS.
Further, for example, a plurality of bright spots (spots) are observed in the electron diffraction pattern of the CAAC-OS film. In addition, when a spot of an incident electron beam (also referred to as a direct spot) passing through a sample is taken as a symmetry center, a certain spot and other spots are observed at a point-symmetrical position.
When the crystal region is observed from the above specific direction, the lattice arrangement in the crystal region is basically a hexagonal lattice, but the unit cell is not limited to a regular hexagon, and may be a non-regular hexagon. In addition, the distortion may have a lattice arrangement such as pentagonal or heptagonal. In addition, no clear grain boundary (grain boundary) was observed near the distortion of CAAC-OS. That is, distortion of the lattice arrangement suppresses the formation of grain boundaries. This is probably because CAAC-OS can accommodate distortion due to low density of arrangement of oxygen atoms in the a-b face direction or change in bonding distance between atoms due to substitution of metal atoms, or the like.
In addition, it was confirmed that the crystal structure of the clear grain boundary was called poly crystal (polycrystalline). Since the grain boundary serves as a recombination center and carriers are trapped, there is a possibility that on-state current of the transistor is lowered, field effect mobility is lowered, or the like. Therefore, CAAC-OS, in which no definite grain boundary is confirmed, is one of crystalline oxides that provide a semiconductor layer of a transistor with an excellent crystalline structure. Note that, in order to constitute the CAAC-OS, a structure containing Zn is preferable. For example, in—zn oxide and in—ga—zn oxide are preferable because occurrence of grain boundaries can be further suppressed as compared with In oxide.
CAAC-OS is an oxide semiconductor with high crystallinity and no clear grain boundary is confirmed. Therefore, it can be said that in the CAAC-OS, a decrease in electron mobility due to grain boundaries does not easily occur. Further, since crystallinity of an oxide semiconductor is sometimes lowered by contamination of impurities, generation of defects, and the like, CAAC-OS is said to be an oxide semiconductor with few impurities and defects (oxygen vacancies, and the like). Therefore, the physical properties of the oxide semiconductor including CAAC-OS are stable. Therefore, an oxide semiconductor including CAAC-OS has high heat resistance and high reliability. In addition, CAAC-OS is also stable to high temperatures (so-called thermal budget) in the manufacturing process. Thus, by using the CAAC-OS for the OS transistor, the degree of freedom in the manufacturing process can be increased.
[nc-OS]
In nc-OS, atomic arrangements in minute regions (for example, regions of 1nm to 10nm, particularly, regions of 1nm to 3 nm) have periodicity. In other words, nc-OS has a minute crystal. For example, the size of the fine crystals is 1nm to 10nm, particularly 1nm to 3nm, and the fine crystals are called nanocrystals. Furthermore, the nc-OS did not observe regularity of crystal orientation between different nanocrystals. Therefore, the orientation was not observed in the whole film. Therefore, nc-OS is sometimes not different from a-like OS or amorphous oxide semiconductor in some analytical methods. For example, when a structural analysis is performed on an nc-OS film using an XRD device, a peak indicating crystallinity is not detected in an Out-of-plane XRD measurement using a θ/2θ scan. In addition, when an electron diffraction (also referred to as selective electron diffraction) using an electron beam having a beam diameter larger than that of nanocrystals (for example, 50nm or more) is performed on the nc-OS film, a diffraction pattern resembling a halo pattern is observed. On the other hand, when an electron diffraction (also referred to as a "nanobeam electron diffraction") using an electron beam having a beam diameter equal to or smaller than the size of a nanocrystal (for example, 1nm or more and 30nm or less) is performed on an nc-OS film, an electron diffraction pattern in which a plurality of spots are observed in an annular region centered on a direct spot may be obtained.
[a-like OS]
The a-like OS is an oxide semiconductor having a structure between nc-OS and an amorphous oxide semiconductor. The a-like OS contains holes or low density regions. That is, the crystallinity of the a-like OS is lower than that of nc-OS and CAAC-OS. The concentration of hydrogen in the film of a-like OS is higher than that in the films of nc-OS and CAAC-OS.
Constitution of oxide semiconductor
Next, details of the CAC-OS will be described. In addition, CAC-OS is related to material composition.
[CAC-OS]
The CAC-OS refers to, for example, a constitution in which elements contained in a metal oxide are unevenly distributed, wherein the size of a material containing unevenly distributed elements is 0.5nm or more and 10nm or less, preferably 1nm or more and 3nm or less or an approximate size. Note that a state in which one or more metal elements are unevenly distributed in a metal oxide and a region including the metal elements is mixed is also referred to as a mosaic shape or a patch shape hereinafter, and the size of the region is 0.5nm or more and 10nm or less, preferably 1nm or more and 3nm or less or an approximate size.
The CAC-OS is a structure in which a material is divided into a first region and a second region, and the first region is mosaic-shaped and distributed in a film (hereinafter also referred to as cloud-shaped). That is, CAC-OS refers to a composite metal oxide having a structure in which the first region and the second region are mixed.
Here, the atomic number ratios of In, ga and Zn with respect to the metal elements constituting the CAC-OS of the In-Ga-Zn oxide are each represented by [ In ], [ Ga ] and [ Zn ]. For example, in CAC-OS of In-Ga-Zn oxide, the first region is a region whose [ In ] is larger than that In the composition of CAC-OS. Further, the second region is a region whose [ Ga ] is larger than [ Ga ] in the composition of the CAC-OS. Further, for example, the first region is a region whose [ In ] is larger than that In the second region and whose [ Ga ] is smaller than that In the second region. Further, the second region is a region whose [ Ga ] is larger than that In the first region and whose [ In ] is smaller than that In the first region.
Specifically, the first region is a region mainly composed of indium oxide, indium zinc oxide, or the like. The second region is a region mainly composed of gallium oxide, gallium zinc oxide, or the like. In other words, the first region may be referred to as a region mainly composed of In. The second region may be referred to as a region containing Ga as a main component.
Note that a clear boundary between the first region and the second region may not be observed.
The CAC-OS In the In-Ga-Zn oxide is constituted as follows: in the material composition containing In, ga, zn, and O, a region having a part of the main component Ga and a region having a part of the main component In are irregularly present In a mosaic shape. Therefore, it is presumed that the CAC-OS has a structure in which metal elements are unevenly distributed.
The CAC-OS can be formed by, for example, sputtering without heating the substrate. In the case of forming CAC-OS by the sputtering method, as the deposition gas, any one or more selected from inert gas (typically argon), oxygen gas, and nitrogen gas may be used. The lower the flow rate ratio of the oxygen gas in the total flow rate of the deposition gas at the time of deposition, for example, the flow rate ratio of the oxygen gas in the total flow rate of the deposition gas at the time of deposition is preferably set to 0% or more and less than 30%, more preferably 0% or more and 10% or less.
For example, in CAC-OS of In-Ga-Zn oxide, it was confirmed that the structure was mixed by unevenly distributing a region (first region) mainly composed of In and a region (second region) mainly composed of Ga based on an EDX-plane analysis (EDX-mapping) image obtained by an energy dispersive X-ray analysis method (EDX: energy Dispersive X-ray spectroscopy).
Here, the first region is a region having higher conductivity than the second region. That is, when carriers flow through the first region, conductivity as a metal oxide is exhibited. Thus, when the first region is distributed in a cloud in the metal oxide, high field effect mobility (μ) can be achieved.
On the other hand, the second region is a region having higher insulation than the first region. That is, when the second region is distributed in the metal oxide, leakage current can be suppressed.
In the case of using the CAC-OS for the transistor, the CAC-OS can be provided with a switching function (a function of controlling on/off) by a complementary effect of the conductivity due to the first region and the insulation due to the second region. In other words, the CAC-OS material has a conductive function in one part and an insulating function in the other part, and has a semiconductor function in the whole material. By separating the conductive function from the insulating function, each function can be improved to the maximum extent. Thus, by using CAC-OS for the transistor, a large on-state current (I on ) High field effect mobility (μ) and good switching operation.
Further, a transistor using CAC-OS has high reliability. Therefore, CAC-OS is most suitable for various semiconductor devices such as display devices.
Oxide semiconductors have various structures and various characteristics. The oxide semiconductor according to one embodiment of the present invention may include two or more of an amorphous oxide semiconductor, a polycrystalline oxide semiconductor, a-likeOS, CAC-OS, nc-OS, and CAAC-OS.
< transistor with oxide semiconductor >
Next, a case where the above oxide semiconductor is used for a transistor will be described.
By using the oxide semiconductor described above for a transistor, a transistor with high field effect mobility can be realized. Further, a transistor with high reliability can be realized.
An oxide semiconductor having a low carrier concentration is preferably used for the transistor. For example, the carrier concentration in the oxide semiconductor is 1×10 17 cm -3 Hereinafter, it is preferably 1X 10 15 cm -3 Hereinafter, more preferably 1X 10 13 cm -3 Hereinafter, it is more preferable that 1×10 11 cm -3 Hereinafter, it is more preferably less than 1X 10 10 cm -3 And is 1X 10 -9 cm -3 The above. In the case of aiming at reducing the carrier concentration of the oxide semiconductor film, the impurity concentration in the oxide semiconductor film can be reduced to reduce the defect state density. In this specification and the like, a state in which the impurity concentration is low and the defect state density is low is referred to as a high-purity intrinsic or substantially high-purity intrinsic. Further, an oxide semiconductor having a low carrier concentration is sometimes referred to as a high-purity intrinsic or substantially high-purity intrinsic oxide semiconductor.
Since the high-purity intrinsic or substantially high-purity intrinsic oxide semiconductor film has a low defect state density, it is possible to have a low trap state density.
Further, it takes a long time until the charge trapped in the trap state of the oxide semiconductor disappears, and the charge may act like a fixed charge. Therefore, the transistor in which the channel formation region is formed in the oxide semiconductor having a high trap state density may have unstable electrical characteristics.
Therefore, in order to stabilize the electrical characteristics of the transistor, it is effective to reduce the impurity concentration in the oxide semiconductor. In order to reduce the impurity concentration in the oxide semiconductor, it is preferable to also reduce the impurity concentration in a nearby film. Examples of impurities include hydrogen, nitrogen, alkali metals, alkaline earth metals, iron, nickel, silicon, and the like.
< impurity >
Here, the influence of each impurity in the oxide semiconductor will be described.
When the oxide semiconductor contains silicon or carbon which is one of group 14 elements, a defect state is formed in the oxide semiconductor. Therefore, the concentration of silicon or carbon in the oxide semiconductor or in the vicinity of the interface with the oxide semiconductor (concentration measured by secondary ion mass spectrometry (SIMS: secondary Ion Mass Spectrometry)) was set to 2X 10 18 atoms/cm 3 Hereinafter, it is preferably 2X 10 17 atoms/cm 3 The following is given.
In addition, when the oxide semiconductor contains an alkali metal or an alkaline earth metal, a defect state is sometimes formed to form carriers. Therefore, a transistor using an oxide semiconductor containing an alkali metal or an alkaline earth metal easily has normally-on characteristics. Thus, the concentration of the alkali metal or alkaline earth metal in the oxide semiconductor measured by SIMS was made 1X 10 18 atoms/cm 3 Hereinafter, it is preferably 2X 10 16 atoms/cm 3 The following is given.
When the oxide semiconductor contains nitrogen, electrons are easily generated as carriers, and the carrier concentration is increased, so that the oxide semiconductor is n-type. As a result, a transistor using an oxide semiconductor containing nitrogen for a semiconductor tends to have normally-on characteristics. Alternatively, when the oxide semiconductor contains nitrogen, a trap state may be formed. As a result, the electrical characteristics of the transistor may be unstable. Therefore, the nitrogen concentration in the oxide semiconductor measured by SIMS is set to be lower than 5X 10 19 atoms/cm 3 Preferably 5X 10 18 atoms/cm 3 Hereinafter, more preferably 1X 10 18 atoms/cm 3 Hereinafter, it is more preferable that the ratio is 5X 10 17 atoms/cm 3 The following is given.
Hydrogen contained in the oxide semiconductor reacts with oxygen bonded to a metal atom to generate water, and thus oxygen vacancies are sometimes formed. When hydrogen enters the oxygen vacancy, electrons are sometimes generated as carriers. In addition, some of the hydrogen may be bonded to oxygen bonded to a metal atom, thereby generating electrons as carriers. Therefore, a transistor using an oxide semiconductor containing hydrogen easily has normally-on characteristics. Thus, it is preferable to reduce hydrogen in the oxide semiconductor as much as possible. Specifically, in the oxide semiconductor, the hydrogen concentration measured by SIMS is set to be lower than 1×10 20 atoms/cm 3 Preferably less than 1X 10 19 atoms/cm 3 More preferably less than 5X 10 18 atoms/cm 3 More preferably less than 1X 10 18 atoms/cm 3 。
By using an oxide semiconductor whose impurity is sufficiently reduced for a channel formation region of a transistor, the transistor can have stable electrical characteristics.
This embodiment mode can be combined with other embodiment modes as appropriate.
Embodiment 6
In this embodiment, an electronic device according to an embodiment of the present invention will be described with reference to fig. 21 to 23.
The electronic device according to the present embodiment includes the display device according to one embodiment of the present invention in the display portion. The display device according to one embodiment of the present invention is easy to achieve high definition and high resolution. Therefore, the display device can be used for display portions of various electronic devices.
Examples of the electronic device include electronic devices having a large screen such as a television set, a desktop or notebook personal computer, a display for a computer or the like, a digital signage, a large-sized game machine such as a pachinko machine, and the like, and digital cameras, digital video cameras, digital photo frames, mobile phones, portable game machines, portable information terminals, and audio reproducing devices.
In particular, since the display device according to one embodiment of the present invention can improve the definition, the display device can be suitably used for an electronic apparatus including a small display portion. Examples of such electronic devices include wristwatch-type information terminal devices (wearable devices), wearable devices that can be worn on the head, VR (Virtual Reality) devices such as head-mounted displays, glasses-type AR (Augmented Reality) devices, MR (Mixed Reality) devices, and the like.
The display device according to one embodiment of the present invention preferably has extremely high resolution such as HD (1280×720 in pixel number), FHD (1920×1080 in pixel number), WQHD (2560×1440 in pixel number), WQXGA (2560×1600 in pixel number), 4K (3840×2160 in pixel number), 8K (7680×4320 in pixel number), or the like. In particular, the resolution is preferably set to 4K, 8K or more. In the display device according to one embodiment of the present invention, the pixel density (sharpness) is preferably 100ppi or more, more preferably 300ppi or more, still more preferably 500ppi or more, still more preferably 1000ppi or more, still more preferably 2000ppi or more, still more preferably 3000ppi or more, still more preferably 5000ppi or more, and still more preferably 7000ppi or more. By using the display device having one or both of high resolution and high definition, the sense of realism, sense of depth, and the like can be further improved in an electronic device for personal use such as a portable device or a home device. The screen ratio (aspect ratio) of the display device according to one embodiment of the present invention is not particularly limited. For example, the display device may adapt to 1:1 (square), 4: 3. 16: 9. 16:10, etc.
The electronic device of the present embodiment may also include a sensor (the sensor has a function of measuring force, displacement, position, velocity, acceleration, angular velocity, rotational speed, distance, light, liquid, magnetism, temperature, chemical substance, sound, time, hardness, electric field, electric current, voltage, electric power, radiation, flow rate, humidity, inclination, vibration, smell, or infrared ray).
The electronic device of the present embodiment may have various functions. For example, it may have the following functions: a function of displaying various information (still image, moving image, character image, etc.) on the display section; a function of the touch panel; a function of displaying a calendar, date, time, or the like; executing functions of various software (programs); a function of performing wireless communication; a function of reading out a program or data stored in the storage medium; etc.
The electronic device 6500 shown in fig. 21A is a portable information terminal device that can be used as a smartphone.
The electronic device 6500 includes a housing 6501, a display portion 6502, a power button 6503, a button 6504, a speaker 6505, a microphone 6506, a camera 6507, a light source 6508, and the like. The display portion 6502 has a touch panel function.
The display portion 6502 can use a display device according to one embodiment of the present invention.
Fig. 21B is a schematic cross-sectional view of an end portion on the microphone 6506 side including the housing 6501.
A light-transmissive protective member 6510 is provided on the display surface side of the housing 6501, and a display panel 6511, an optical member 6512, a touch sensor panel 6513, a printed circuit board 6517, a battery 6518, and the like are provided in a space surrounded by the housing 6501 and the protective member 6510.
The display panel 6511, the optical member 6512, and the touch sensor panel 6513 are fixed to the protective member 6510 using an adhesive layer (not shown).
In an area outside the display portion 6502, a part of the display panel 6511 is overlapped, and the overlapped part is connected with an FPC6515. The FPC6515 is mounted with an IC6516. The FPC6515 is connected to terminals provided on the printed circuit board 6517.
The display panel 6511 may use a flexible display of one embodiment of the present invention. Thus, an extremely lightweight electronic device can be realized. Further, since the display panel 6511 is extremely thin, the large-capacity battery 6518 can be mounted while suppressing the thickness of the electronic apparatus. Further, by folding a part of the display panel 6511 to provide a connection portion with the FPC6515 on the back surface of the pixel portion, a narrow-frame electronic device can be realized.
Fig. 22A shows an example of a television apparatus. In the television device 7100, a display unit 7000 is incorporated in a housing 7101. Here, a structure in which the housing 7101 is supported by a bracket 7103 is shown.
The display device according to one embodiment of the present invention can be applied to the display unit 7000.
The television device 7100 shown in fig. 22A can be operated by an operation switch provided in the housing 7101 and a remote control operation device 7111 provided separately. The display 7000 may be provided with a touch sensor, or the television device 7100 may be operated by touching the display 7000 with a finger or the like. The remote controller 7111 may be provided with a display unit for displaying data outputted from the remote controller 7111. By using the operation keys or touch panel provided in the remote control unit 7111, the channel and volume can be operated, and the video displayed on the display unit 7000 can be operated.
The television device 7100 includes a receiver, a modem, and the like. A general television broadcast may be received by using a receiver. Further, the communication network is connected to a wired or wireless communication network via a modem, and information communication is performed in one direction (from a sender to a receiver) or in two directions (between a sender and a receiver, between receivers, or the like).
Fig. 22B shows an example of a notebook personal computer. The notebook personal computer 7200 includes a housing 7211, a keyboard 7212, a pointing device 7213, an external connection port 7214, and the like. The display unit 7000 is incorporated in the housing 7211.
The display device according to one embodiment of the present invention can be applied to the display unit 7000.
Fig. 22C and 22D show one example of a digital signage.
The digital signage 7300 shown in fig. 22C includes a housing 7301, a display portion 7000, a speaker 7303, and the like. Further, an LED lamp, an operation key (including a power switch or an operation switch), a connection terminal, various sensors, a microphone, and the like may be included.
Fig. 22D shows a digital signage 7400 disposed on a cylindrical post 7401. The digital signage 7400 includes a display 7000 disposed along a curved surface of the post 7401.
In fig. 22C and 22D, a display device according to an embodiment of the present invention can be used for the display unit 7000.
The larger the display unit 7000 is, the larger the amount of information that can be provided at a time is. The larger the display unit 7000 is, the more attractive the user can be, for example, to improve the advertising effect.
By using the touch panel for the display unit 7000, not only a still image or a moving image can be displayed on the display unit 7000, but also a user can intuitively operate the touch panel, which is preferable. In addition, in the application for providing information such as route information and traffic information, usability can be improved by intuitive operations.
As shown in fig. 22C and 22D, the digital signage 7300 or 7400 can preferably be linked to an information terminal device 7311 or 7411 such as a smart phone carried by a user by wireless communication. For example, the advertisement information displayed on the display portion 7000 may be displayed on the screen of the information terminal device 7311 or the information terminal device 7411. Further, by operating the information terminal device 7311 or the information terminal device 7411, the display of the display portion 7000 can be switched.
Further, a game may be executed on the digital signage 7300 or the digital signage 7400 with the screen of the information terminal apparatus 7311 or the information terminal apparatus 7411 as an operation unit (controller). Thus, a plurality of users can participate in the game at the same time without specifying the users, and enjoy the game.
The electronic apparatus shown in fig. 23A to 23F includes a housing 9000, a display portion 9001, a speaker 9003, an operation key 9005 (including a power switch or an operation switch), a connection terminal 9006, a sensor 9007 (the sensor has a function of measuring a force, a displacement, a position, a speed, an acceleration, an angular velocity, a rotation speed, a distance, light, liquid, magnetism, temperature, a chemical substance, sound, time, hardness, an electric field, electric current, voltage, electric power, radiation, flow, humidity, inclination, vibration, smell, or infrared rays), a microphone 9008, or the like.
In fig. 23A to 23F, a display device according to an embodiment of the present invention can be used for the display portion 9001.
The electronic devices shown in fig. 23A to 23F have various functions. For example, it may have the following functions: a function of displaying various information (still image, moving image, character image, etc.) on the display unit; a function of the touch panel; a function of displaying a calendar, date, time, or the like; functions of controlling processing by using various software (programs); a function of performing wireless communication; a function of reading out and processing the program or data stored in the storage medium; etc. Note that the functions of the electronic apparatus are not limited to the above functions, but may have various functions. The electronic device may include a plurality of display portions. In addition, a camera or the like may be provided in the electronic device so as to have the following functions: a function of capturing a still image or a moving image, and storing the captured image in a storage medium (an external storage medium or a storage medium built in a camera); a function of displaying the photographed image on a display section; etc.
Next, the electronic apparatus shown in fig. 23A to 23F will be described in detail.
Fig. 23A is a perspective view showing the portable information terminal 9101. The portable information terminal 9101 can be used as a smart phone, for example. Note that in the portable information terminal 9101, a speaker 9003, a connection terminal 9006, a sensor 9007, and the like may be provided. Further, as the portable information terminal 9101, text or image information may be displayed on a plurality of surfaces thereof. An example of displaying three icons 9050 is shown in fig. 23A. In addition, information 9051 shown in a rectangle of a broken line may be displayed on the other surface of the display portion 9001. As an example of the information 9051, information indicating the receipt of an email, SNS, a telephone, or the like can be given; a title of an email, SNS, or the like; sender name of email or SNS; a date; time; a battery balance; and radio wave intensity. Alternatively, the icon 9050 or the like may be displayed at a position where the information 9051 is displayed.
Fig. 23B is a perspective view showing the portable information terminal 9102. The portable information terminal 9102 has a function of displaying information on three or more surfaces of the display portion 9001. Here, examples are shown in which the information 9052, the information 9053, and the information 9054 are displayed on different surfaces. For example, in a state where the portable information terminal 9102 is placed in a coat pocket, the user can confirm the information 9053 displayed at a position seen from above the portable information terminal 9102. For example, the user can confirm the display without taking out the portable information terminal 9102 from the pocket, whereby it can be determined whether to answer a call.
Fig. 23C is a perspective view showing the wristwatch-type portable information terminal 9200. The portable information terminal 9200 can be used as a smart watch (registered trademark), for example. The display surface of the display portion 9001 is curved, and can display along the curved display surface. Further, the portable information terminal 9200 can perform handsfree communication by, for example, communicating with a headset capable of wireless communication. Further, by using the connection terminal 9006, the portable information terminal 9200 can perform data transmission or charging with other information terminals. Charging may also be performed by wireless power.
Fig. 23D to 23F are perspective views showing the portable information terminal 9201 that can be folded. Fig. 23D is a perspective view showing a state in which the portable information terminal 9201 is unfolded, fig. 23F is a perspective view showing a state in which it is folded, and fig. 23E is a perspective view showing a state in the middle of transition from one of the state in fig. 23D and the state in fig. 23F to the other. The portable information terminal 9201 has good portability in a folded state and has a large display area with seamless splicing in an unfolded state, so that the display has a strong browsability. The display portion 9001 included in the portable information terminal 9201 is supported by three housings 9000 connected by hinges 9055. The display portion 9001 can be curved in a range of, for example, 0.1mm to 150mm in radius of curvature.
This embodiment mode can be combined with other embodiment modes as appropriate.
Examples (example)
In this embodiment, a result of evaluating a proximity touch sensor function of a display device according to an embodiment of the present invention will be described.
In this embodiment, evaluation is performed using a display device including a sub-pixel G, a sub-pixel B, a sub-pixel R, and a sub-pixel IRS in a pixel.
The subpixel R includes a light emitting device emitting red light. The subpixel G includes a light emitting device emitting green light. The sub-pixel B includes a light emitting device emitting blue light. An organic EL device was used as each light-emitting device.
The subpixel IRS includes a light receiving device that detects infrared light. An organic light sensor is used as the light receiving device.
In the present embodiment, the light receiving device included in the subpixel IRS detects reflected light of light emitted from the light source reflected by the palm (finger) of the object. Since the light reflected by the skin is almost completely scattered (completely scattered and slightly regular reflection component), the intensity of the detected reflected light differs depending on the relationship between the sub-pixel IRS for detecting the reflected light and the position of the finger. Therefore, the reflected light can be detected by the plurality of sub-pixels IRS and the position of the finger can be estimated from the ratio of the reflected intensities.
[ evaluation 1]
Fig. 24A is a photograph showing an evaluation system for evaluating the positional relationship between a display device and a light source, and the like. An LED emitting infrared light with a wavelength of 880nm was used as the light source IR-LED, and was driven at 0.3A. The distance between the light source IR-LED and the sensor OPD is about 4.5cm.
The evaluation system shown in fig. 24A was used to evaluate how far from the display device the light reflected by the palm can be detected.
Fig. 25A shows a change in detection intensity when there is a palm or no palm on the display device. In fig. 25A, period a shows a case where the palm is present on the display device, and period B shows a case where the palm is absent on the display device. In the period a, the detection intensity is strong, and in the period B, the detection intensity is low. Further, as shown in fig. 25A, it was confirmed that the reflected light from the palm could be detected even if the distance from the display device to the palm was about 15cm or more.
Fig. 25B shows the detection intensity differences in the period a and the period B corresponding to the distance from the display device to the palm. Specifically, the vertical axis of fig. 25B shows the difference in the average value of the detection intensities when there is a palm or no palm on the display device. As shown in fig. 25B, the longer the distance, the smaller the detection intensity difference. From this, it is found that the proximity touch sensor function detects an object having a distance from the display device of 0mm or more and 15cm or less, preferably 0mm or more and 10cm or less with high accuracy.
[ evaluation 2]
In evaluation 1, the display surface of the display device was evaluated in the vertical direction. Next, in evaluation 2, the display surface of the display device is evaluated in the horizontal direction, that is, the position accuracy is evaluated.
Specifically, as shown in fig. 24B, the camera is moved to take a picture along the outer periphery of the display device at a position approximately 5cm away from the display device.
Evaluation was performed under three conditions, a palm without gloves, a palm with black gloves, and a palm with grey gloves. The material of the black glove is a chemical fiber that cannot be detected with the electrostatic capacitive touch sensor. The gray glove is made of conductive fibers obtained by mixing copper sulfide with chemical fibers, and can be detected by an electrostatic capacitive touch sensor.
Note that the light source was the same as in evaluation 1.
Fig. 26 to 28 show the result of placing the palm over the display device and capturing the reflected image at each position of the areas 1 to 8 shown in fig. 24B.
Fig. 26 shows the evaluation results of a palm without gloves, fig. 27 shows the evaluation results of a palm with black gloves, and fig. 28 shows the evaluation results of a palm with gray gloves. Fig. 26 to 28 show the normalization result for each image for clarity.
As shown in fig. 26 to 28, it was confirmed that the palm was present at any position of the region 1 to the region 8 irrespective of the presence or absence of the glove, and the detection intensity was High (High) at the position nearest to that position and was Low (Low) at the other position. Therefore, it can be said that it is possible to identify at which position of the region 1 to the region 8 the palm is present according to these intensity ratios.
Next, fig. 29 shows the results of plotting the detection intensities of the reflected light in the regions 1 to 8 when the palm is present near the region 6 closest to the light source and the regions 1 and 3 farthest from the light source in the evaluation of the palm without the glove.
As can be seen from fig. 29, the detection intensity of the area closest to the palm increases as in the image of fig. 26.
From the results of the present embodiment, it was confirmed that the position of the object can be estimated by receiving light reflected by the object located far from the display device by a plurality of light receiving devices included in the display device using a point light source. Thus, even if the object is not in contact with the display device, the object can be detected. Thus, the screen operation such as sweeping, scrolling, etc. can be performed in a noncontact manner.
[ description of the symbols ]
CL: wiring, M11: transistor, M12: transistor, M13: transistor, M14: transistor, M15: transistor, RS: wiring, SE: wiring, SW: wiring, TX: wiring, VCP: wiring, VPI: wiring, VRS: wiring, WX: wiring, 31B: light, 31G: light, 31IR: infrared light, 31R: light, 32G: reflected light, 32IR: reflected light, 100A: display device, 100B: display device, 100C: display device, 100D: display device, 100E: display device, 100F: display device, 100: display device, 101: layer, 102: substrate, 103: housing, 104: light source, 105: protection member, 106: substrate, 108: object, 110a: sub-pixels, 110b: sub-pixels, 110c: sub-pixels, 110d: sub-pixels, 110e: sub-pixels, 110: pixel, 111a: pixel electrode, 111b: pixel electrode, 111c: pixel electrode, 111d: pixel electrode, 111e: pixel electrode, 113: layer, 113a: first layer, 113b: second layer, 113c: third layer, 113d: fourth layer, 113e: fifth layer, 114: sixth layer, 115: common electrode, 118A: first sacrificial layer, 118a: first sacrificial layer, 118B: first sacrificial layer, 118b: first sacrificial layer, 118c: first sacrificial layer, 118d: first sacrificial layer, 118e: first sacrificial layer, 119A: second sacrificial layer, 119a: second sacrificial layer, 119B: second sacrificial layer, 119b: second sacrificial layer, 119c: second sacrificial layer, 119d: second sacrificial layer, 119e: second sacrificial layer, 120: substrate, 121: insulating layer, 122: resin layer, 123: conductive layer, 130a: light emitting device, 130B: light emitting device, 130b: light emitting device, 130c: light emitting device, 130G: light emitting device, 130IR: light emitting device, 130R: light emitting device, 131: protective layer, 133: void, 140: connection part, 142: adhesive layer, 148: light shielding layer, 150d: light receiving device, 150e: light receiving device, 150IRS: light receiving device, 150PS: light receiving device, 151: substrate, 152: substrate, 162: display unit, 164: circuit, 165: wiring, 166: conductive layer, 172: FPC, 173: IC. 180A: pixel, 180B: pixel, 180C: pixel, 181A: first hole injection layer, 181a: first hole injection layer, 181B: second hole injection layer, 181b: second hole injection layer, 181c: third hole injection layer, 182A: first hole transport layer, 182a: first hole transport layer, 182B: second hole transport layer, 182b: second hole transport layer, 182c: third hole transport layer, 182d: fourth hole transport layer, 182e: fifth hole transport layer, 183A: first light-emitting layer, 183a: first light-emitting layer, 183B: second light-emitting layer, 183b: second light-emitting layer, 183c: third light emitting layer, 184A: first electron transport layer, 184a: first electron transport layer, 184B: second electron transport layer, 184b: second electron transport layer, 184c: third electron transport layer, 184d: fourth electron transport layer, 184e: fifth electron transport layer, 185d: first active layer, 185e: second active layer, 190a: resist mask, 190b: resist mask, 201: transistor, 204: connection part, 205a: transistor, 205e: transistor, 209: transistor, 210: transistor, 211: insulating layer, 213: insulating layer, 214: insulating layer, 215: insulating layer, 218: insulating layer, 221: conductive layer, 222a: conductive layer, 222b: conductive layer, 223: conductive layer, 225: insulating layer, 228: region, 231i: channel formation region, 231n: low resistance region, 231: semiconductor layer, 242: connection layer, 500: display device, 501: electrode, 502: electrode, 503: area, 512b_1: light emitting unit, 512b_2: light emitting unit, 512b_3: light emitting unit, 512g_1: light emitting unit, 512g_2: light emitting unit, 512g_3: light emitting unit, 512r_1: light emitting unit, 512r_2: light emitting unit, 512r_3: light emitting unit, 521: layer, 522: layer, 523B: light emitting layer, 523G: light emitting layer, 523R: light emitting layer, 524: layer 525: layer, 531: intermediate layer, 541: insulating layer, 542: insulating layer, 550B: light emitting device, 550G: light emitting device, 550R: light emitting device 772: electrode, 786a: EL layer, 786b: EL layer, 786: EL layer, 788: electrode, 4411: light emitting layer, 4412: light emitting layer, 4413: light emitting layer, 4420: layer, 4421: layer, 4422: layer, 4430: layer, 4431: layer, 4432: layer, 4440: intermediate layer, 6500: electronic device, 6501: housing, 6502: display unit, 6503: power button, 6504: button, 6505: speaker, 6506: microphone, 6507: camera, 6508: light source, 6510: protection member, 6511: display panel, 6512: optical member, 6513: touch sensor panel, 6515: FPC, 6516: IC. 6517: printed circuit board, 6518: battery, 7000: display unit, 7100: television apparatus, 7101: housing, 7103: support, 7111: remote control operation machine, 7200: notebook personal computer, 7211: housing, 7212: keyboard, 7213: pointing device, 7214: external connection port, 7300: digital signage, 7301: housing, 7303: speaker, 7311: information terminal apparatus, 7400: digital signage, 7401: column, 7411: information terminal apparatus, 9000: housing, 9001: display unit, 9003: speaker, 9005: operation key, 9006: connection terminal, 9007: sensor, 9008: microphone, 9050: icon, 9051: information, 9052: information, 9053: information, 9054: information, 9055: hinge, 9101: portable information terminal, 9102: portable information terminal, 9200: portable information terminal, 9201: portable information terminal
Claims (14)
1. A display device, comprising:
the first pixel of the pixel array is selected,
wherein the first pixel comprises a first light emitting device, a second light emitting device, a first light receiving device and a second light receiving device,
the first light emitting device and the second light emitting device have a function of emitting visible light having different wavelengths from each other,
the first light receiving device has a function of detecting light emitted from the first light emitting device, and the second light receiving device has a function of detecting infrared light.
2. A display device, comprising:
the first pixel of the pixel array is selected,
wherein the first pixel comprises a first light emitting device, a second light emitting device, a third light emitting device, a first light receiving device and a second light receiving device,
the first light emitting device has a function of emitting red light,
the second light emitting device has a function of emitting green light,
the third light emitting device has a function of emitting blue light,
the first light receiving device has a function of detecting light emitted from at least one of the first light emitting device, the second light emitting device and the third light emitting device,
the second light receiving device has a function of detecting infrared light.
3. The display device according to claim 1 or 2,
Wherein the area of the light receiving area of the first light receiving device is smaller than the area of the light receiving area of the second light receiving device.
4. The display device according to any one of claim 1 to 3,
wherein the second light receiving device has a function of detecting an object that is not in contact with the display device.
5. The display device according to any one of claims 1 to 4, further comprising a second pixel,
the second pixel comprises the first light emitting device, the second light emitting device, the first light receiving device and a sensing device.
6. An electronic device, comprising:
the display device according to claim 5,
the electronic device has a function of detecting at least one of force, displacement, position, velocity, acceleration, angular velocity, rotational speed, distance, magnetism, temperature, chemical substance, time, hardness, electric field, current, voltage, electric power, radiation, flow, humidity, inclination, vibration, smell, health state, pulse, body temperature, and blood oxygen concentration using the sensor device.
7. The display device according to any one of claims 1 to 4, further comprising a second pixel,
wherein the second pixel includes the first light emitting device, the second light emitting device, a fourth light emitting device, and the first light receiving device,
And the fourth light emitting device has a function of emitting infrared light.
8. An electronic device, comprising:
the display device of any one of claims 1 to 4;
a fourth light emitting device; and
the outer shell of the shell is provided with a plurality of grooves,
wherein the fourth light emitting device has a function of emitting infrared light.
9. The electronic device according to claim 8,
wherein the fourth light emitting device emits light to the outside of the electronic apparatus through the display device.
10. A display module, comprising:
the display device of any one of claims 1 to 4; and
at least one of the connector and the integrated circuit.
11. An electronic device, comprising:
the display module of claim 10; and
at least one of a housing, a battery, a camera, a speaker, and a microphone.
12. A method of manufacturing a display device, comprising the steps of:
forming a first pixel electrode, a second pixel electrode and a third pixel electrode;
forming a first layer including a light emitting layer over the first pixel electrode, over the second pixel electrode, and over the third pixel electrode;
forming a first sacrificial layer on the first layer;
processing the first layer and the first sacrificial layer to expose the second pixel electrode and the third pixel electrode;
Forming a second layer including a first active layer on the first pixel electrode, the second pixel electrode, and the third pixel electrode;
forming a second sacrificial layer on the second layer;
processing the second layer and the second sacrificial layer to expose the first sacrificial layer and the third pixel electrode;
forming a third layer including a second active layer over the first pixel electrode, over the second pixel electrode, and over the third pixel electrode;
forming a third sacrificial layer on the third layer;
processing the third layer and the third sacrificial layer to expose the first sacrificial layer and the second sacrificial layer;
removing the first sacrificial layer, the second sacrificial layer and the third sacrificial layer; and
a common electrode is formed on the first layer, the second layer, and the third layer.
13. The method for manufacturing a display device according to claim 12,
wherein after the first, second, and third sacrificial layers are removed, a fourth layer is formed on the first, second, and third layers, and the common electrode is formed on the fourth layer.
14. The method for manufacturing a display device according to claim 12 or 13,
wherein a protective layer is formed on the common electrode.
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021-012418 | 2021-01-28 | ||
| JP2021-024602 | 2021-02-18 | ||
| JP2021024602 | 2021-02-18 | ||
| PCT/IB2022/050337 WO2022162493A1 (en) | 2021-01-28 | 2022-01-17 | Display device, display module, electronic device, and method for manufacturing display device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN116745835A true CN116745835A (en) | 2023-09-12 |
Family
ID=87910147
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202280010936.5A Pending CN116745835A (en) | 2021-01-28 | 2022-01-17 | Display device, display module, electronic apparatus, and method for manufacturing display device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN116745835A (en) |
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2022
- 2022-01-17 CN CN202280010936.5A patent/CN116745835A/en active Pending
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