CN116737301A

CN116737301A - Alignment method and device for layer elements

Info

Publication number: CN116737301A
Application number: CN202310699244.2A
Authority: CN
Inventors: 吴通通; 张天宇; 刘洋; 杨帆; 孙子钧; 赵薇; 柳景明
Original assignee: Beijing Kanyun Software Co ltd
Current assignee: Beijing Kanyun Software Co ltd
Priority date: 2023-06-13
Filing date: 2023-06-13
Publication date: 2023-09-12

Abstract

The application provides an alignment method and an alignment device for layer elements, wherein the alignment method for layer elements comprises the following steps: acquiring at least one layer and layer elements of each layer; determining datum lines corresponding to the elements of each layer, and generating a datum line set based on each datum line; acquiring a first datum line and a second datum line in the datum line set, and generating at least one element adjustment information according to a first layer element corresponding to the first datum line and a second layer element corresponding to the second datum line; generating at least one initial element layout according to the element adjustment information; and determining a target element layout according to the number of the datum lines in each initial element layout, and adjusting each layer element based on the target element layout.

Description

Alignment method and device for layer elements

Technical Field

The application relates to the technical field of computers, in particular to an alignment method of layer elements. The application also relates to an alignment device of the layer elements, a computing device and a computer readable storage medium.

Background

In the design draft making process, alignment layout of the layers is an important task, which affects the overall aesthetic degree and the working efficiency of the design draft. However, the current manual layer alignment layout scheme lacks adaptivity and intelligence, and requires manual adjustment of the position and spacing of each layer, which consumes a lot of time and effort.

Therefore, how to improve the efficiency of aligning and layout of images and improve the manufacturing efficiency and quality of design manuscripts is a technical problem to be solved by those skilled in the art.

Disclosure of Invention

In view of this, the embodiment of the application provides an alignment method of layer elements. The present application is also directed to an alignment apparatus for layer elements, a computing device, and a computer-readable storage medium that solve the above-mentioned problems of the prior art.

According to a first aspect of an embodiment of the present application, there is provided a method for aligning layer elements, including:

acquiring at least one layer and layer elements of each layer;

determining datum lines corresponding to the elements of each layer, and generating a datum line set based on each datum line;

acquiring a first datum line and a second datum line in the datum line set, and generating at least one element adjustment information according to a first layer element corresponding to the first datum line and a second layer element corresponding to the second datum line;

generating at least one initial element layout according to the element adjustment information;

and determining a target element layout according to the number of the datum lines in each initial element layout, and adjusting each layer element based on the target element layout.

According to a second aspect of an embodiment of the present application, there is provided an alignment apparatus for layer elements, including:

the acquisition module is configured to acquire at least one layer and layer elements of each layer;

the determining module is configured to determine datum lines corresponding to the picture layer elements and generate a datum line set based on the datum lines;

the first generation module is configured to acquire a first datum line and a second datum line in the datum line set, and generate at least one element adjustment information according to a first layer element corresponding to the first datum line and a second layer element corresponding to the second datum line;

a second generation module configured to generate at least one initial element layout according to the element adjustment information;

and the adjustment module is configured to determine a target element layout according to the number of the datum lines in each initial element layout and adjust each layer element based on the target element layout.

According to a third aspect of embodiments of the present application, there is provided a computing device comprising a memory, a processor and computer instructions stored on the memory and executable on the processor, the processor implementing the steps of the method of aligning layer elements when executing the computer instructions.

According to a fourth aspect of embodiments of the present application, there is provided a computer readable storage medium storing computer instructions which, when executed by a processor, implement the steps of the method of alignment of layer elements.

The alignment method of the layer elements provided by the application obtains at least one layer and the layer elements of each layer; determining datum lines corresponding to the elements of each layer, and generating a datum line set based on each datum line; acquiring a first datum line and a second datum line in the datum line set, and generating at least one element adjustment information according to a first layer element corresponding to the first datum line and a second layer element corresponding to the second datum line; generating at least one initial element layout according to the element adjustment information; and determining a target element layout according to the number of the datum lines in each initial element layout, and adjusting each layer element based on the target element layout.

The embodiment of the application realizes the acquisition of the datum line of the layer element, thereby determining the alignment condition of the current layer element based on the datum line; determining a reference line in the reference line set, generating element adjustment information based on the reference line and the corresponding layer element, and further generating initial element layout based on the element adjustment information, so that a target element layout which is finally used for aligning the layer element can be selected according to the number of the reference lines corresponding to different initial element layouts; the layer elements are adjusted based on the target element layout, so that automatic alignment processing of the layer elements on the same layer or different layers is realized, and the efficiency of the alignment processing of the layer elements is improved.

Drawings

FIG. 1 is a schematic view of a layer element alignment method according to an embodiment of the present application;

FIG. 2 is a flowchart of a method for aligning layer elements according to an embodiment of the present application;

FIG. 3 is a schematic diagram of a datum line according to one embodiment of the present application;

FIG. 4 is a schematic diagram of an embodiment of the present application for determining whether an intersection exists;

FIG. 5 is a process flow diagram of a method for alignment of layer elements applied to text elements according to one embodiment of the present application;

FIG. 6 is a schematic structural diagram of an alignment device for layer elements according to an embodiment of the present application;

FIG. 7 is a block diagram of a computing device according to one embodiment of the application.

Detailed Description

In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present application. The present application may be embodied in many other forms than those herein described, and those skilled in the art will readily appreciate that the present application may be similarly embodied without departing from the spirit or essential characteristics thereof, and therefore the present application is not limited to the specific embodiments disclosed below.

The terminology used in the one or more embodiments of the application is for the purpose of describing particular embodiments only and is not intended to be limiting of the one or more embodiments of the application. As used in one or more embodiments of the application and the appended claims, the singular forms "a," "an," and "the" are intended to include the plural forms as well, unless the context clearly indicates otherwise. It should also be understood that the term "and/or" as used in one or more embodiments of the present application refers to and encompasses any or all possible combinations of one or more of the associated listed items.

It should be understood that, although the terms first, second, etc. may be used in one or more embodiments of the application to describe various information, these information should not be limited by these terms. These terms are only used to distinguish one type of information from another. For example, a first may also be referred to as a second, and similarly, a second may also be referred to as a first, without departing from the scope of one or more embodiments of the application. The word "if" as used herein may be interpreted as "at … …" or "at … …" or "responsive to a determination", depending on the context.

First, terms related to one or more embodiments of the present application will be explained.

Design draft: refers to a sketch of a layer element containing multiple layers that a designer draws during the design process.

In the design draft making process, the alignment layout of the layers is an important task, which affects the overall aesthetic and work efficiency of the design draft. However, the existing layer alignment layout scheme lacks adaptivity and intelligence, and requires manual adjustment of the position and pitch of each layer, which consumes a lot of time and effort. In particular, common layer alignment layout methods include manual adjustment, grid alignment, alignment lines, and the like. The manual adjustment requires the user to adjust each layer one by one, which consumes time and energy; grid alignment can improve alignment efficiency, but cannot adapt to different pitches and sizes of various layers; the alignment lines can help the user to align the layers quickly, but the alignment lines need to be added manually by the user, which is not intelligent enough. The above methods have drawbacks, and cannot fully meet the needs of users. The layer alignment layout method in the prior art lacks self-adaptability and intelligence, and needs manual adjustment by a user, thereby wasting time and energy.

Therefore, a way of automatically aligning the layer elements is needed, the defect of complicated alignment at present is solved, and the manufacturing efficiency and quality of the design manuscript are improved.

In the present application, a method for aligning layer elements is provided, and the present application relates to an alignment apparatus for layer elements, a computing device, and a computer-readable storage medium, which are described in detail in the following embodiments.

Fig. 1 shows a schematic view of a scenario of a method for aligning layer elements according to an embodiment of the present application, which specifically includes the following steps:

a design draft comprising a plurality of layer elements is illustrated in fig. 1, wherein each layer element is on a different layer of the design draft; the user can select the layer elements needing alignment operation in the design manuscript based on the requirement; FIG. 1 contains 4 selected layer elements that require alignment operations; determining element bounding boxes of elements of each layer, and based on the element bounding boxes; determining reference lines of each layer element based on element bounding boxes to generate a reference line set, specifically taking the "title" layer element in fig. 1 as an example, determining top, y-center, bottom, left, x-center and right according to the bounding boxes of the "title" layer element, and determining 6 reference lines of different types, wherein 6 types of reference lines of other selected layer elements can be determined in the same way, and generating the reference line set based on the same type of reference line, namely T, YC, B, L, XC, R can be generated, and the total of 6 reference line sets can be generated; the current alignment score of the design draft can be calculated through the datum lines corresponding to the elements of each layer, specifically, ji Fenshu score=len (L) +len (XC) +len (R) +len (T) +len (YC) +len (B), wherein len () represents the number of datum lines in the datum line set; as shown in fig. 1, the "title" layer element and the "task 2" layer element, whose left type reference line is the same reference line, are counted only once.

After 6 datum line sets are obtained, determining the distance between datum lines in each datum line set; further, determining a first datum line and a second datum line, wherein the distance between the datum lines is smaller than a preset threshold value, in each datum line set; for example, in the reference line set L, the distance between the reference line 1 of the "content" layer element and the reference line 2 of the "task 1" layer element is determined, and the reference line 1 and the reference line 2 are determined as the first reference line and the second reference line, compared with the minimum distance between other reference lines in the set; according to the 'content' layer element corresponding to the first datum line and the 'task 1' layer element corresponding to the second datum line, determining element adjustment information as follows: shifting the "task 1" layer element to the left by 10px; similarly, determining element adjustment information corresponding to each datum line set based on a first datum line and a second datum line in other datum line sets; determining the initial element layout of the layer element based on the element adjustment information; determining the number of datum lines corresponding to each initial element layout, and further selecting the initial element layout with the datum line smaller than a preset number threshold as a target element layout; and (3) carrying out position adjustment on the layer elements based on the target element layout, thereby obtaining the layer elements after alignment processing as shown in fig. 1.

According to the alignment method of the layer elements, the reference line of the layer elements is obtained, so that the alignment condition of the current layer elements can be determined based on the reference line; determining a reference line in the reference line set, generating element adjustment information based on the reference line and the corresponding layer element, and further generating initial element layout based on the element adjustment information, so that a target element layout which is finally used for aligning the layer element can be selected according to the number of the reference lines corresponding to different initial element layouts; the layer elements are adjusted based on the target element layout, so that automatic alignment processing of the layer elements on the same layer or different layers is realized, and the efficiency of the alignment processing of the layer elements is improved.

Fig. 2 shows a flowchart of a method for aligning layer elements according to an embodiment of the present application, which specifically includes the following steps:

step 202: at least one layer and layer elements of each layer are obtained.

Wherein, the layer refers to a layer level containing elements such as characters, figures and the like; the layer element means that the layer contains characters, graphics and other elements.

In practical application, different layer elements can be drawn on different layers, so that the layer elements can be adjusted conveniently; however, after drawing the layer elements in different layers, it is complicated to align the layer elements on each layer, and a designer needs to manually adjust the positions of the layer elements based on requirements.

Specifically, before aligning the layer elements, the layer elements that need to be aligned are determined, that is, at least one layer and the layer elements on each layer are acquired.

In practical applications, the method for obtaining at least one layer and layer elements of each layer may include:

determining at least one layer in response to a layer element alignment request;

and determining a layer element corresponding to each element identifier on at least one layer based on at least one element identifier in the layer element alignment request.

The layer element alignment request refers to a request for aligning layer elements needing alignment processing; element identification refers to a field that can uniquely identify a layer element.

Specifically, a layer element alignment request is received, wherein the layer element alignment request can be generated based on a layer element selected by a user in a page, can be generated based on a design draft processing task and the like, and the application is not limited in particular; determining a design draft needing alignment processing, and analyzing a layer element alignment request to obtain at least one element identifier; and determining the layer element corresponding to the element identifier in the layer of the design draft according to the element identifier.

In one embodiment of the application, a layer element alignment request generated based on a user selecting a layer element in a design draft is received; analyzing the layer element alignment request to obtain element identifiers (a 1 and a 2); an element layer 1 corresponding to the element identification "a1" and an element identification 2 corresponding to "a2" are determined in the layers of the design draft based on the element identification.

And obtaining at least one layer and layer elements on each layer so as to further process the determined layer elements.

Step 204: and determining datum lines corresponding to the elements of each layer, and generating a datum line set based on each datum line.

Wherein, the datum line refers to a straight line for aligning the layer elements; for example, determining that the layer element is a rectangle a, a straight line on the left side of the rectangle a may be used as a left reference line of the rectangle a, and a straight line on the right side of the bounding box of the layer element "title" is determined as a right reference line of the layer element "title"; reference line set refers to a set of reference lines of layer elements.

It should be noted that the same reference line may exist for different layer elements, for example, the upper edge line of layer element 1 and the upper edge line of layer element 2 are on the same line, i.e. the upper reference line corresponding to layer element 1 and layer element 2 is the same; in addition, to facilitate subsequent alignment processing, the fiducial lines may be generated as corresponding fiducial line sets for different fiducial line types.

Specifically, the method for determining the datum lines corresponding to the layer elements and generating the datum line set based on the datum lines may include:

determining element bounding boxes corresponding to elements of each layer;

determining a datum line corresponding to each layer element according to the side line and the central line corresponding to each element bounding box;

an edge reference line set is generated based on the edges of the element bounding boxes, and a centerline reference line set is generated based on the centerlines of the element bounding boxes.

The element bounding box refers to a display range bounding box corresponding to the element to be laid out; the side lines are four side lines of the element bounding box, namely an upper side line, a lower side line, a left side line and a right side line; the center line refers to a straight line in the x-axis direction and a straight line in the y-axis direction of the element bounding box; the edge reference line set refers to a set composed of edge reference lines of the element bounding box; the center line reference line set refers to a set composed of center line reference lines of element bounding boxes.

Specifically, determining element bounding boxes of elements of each layer; determining the side line of each layer element, and determining a central line based on the midpoint of the side line of each layer element; for example, as shown in fig. 3, the side line of the element bounding box includes points a, b, c and d, and the line between the points b and d is the center line of the x-axis of the bounding box, and the line between the points a and c is the center line of the y-axis of the bounding box; after the side line and the central line of the surrounding frame are determined, taking the straight line where the side line is positioned as a side line datum line and taking the straight line where the central line is positioned as a central line datum line; an edge reference line set is generated based on the edge reference lines of the element bounding boxes, and a center line reference line set is generated based on the center line reference lines of the element bounding boxes.

In one embodiment of the present application, as shown in fig. 3, an element bounding box of a layer element is determined according to the edge of the layer element 'header'; determining datum lines of the layer elements based on four side lines a, b, c and d of the element bounding box and two central lines, namely taking the straight line where the side lines are located as the side line datum line and taking the central line as the central line datum line; and forming an edge datum line set according to each edge datum line, and forming a middle line datum line set according to each middle line datum line.

It should be noted that, in the process of generating the edge line reference line set and the center line reference line set, the same type of reference lines of different layer elements may be placed in one set, for example, the upper reference lines of the layer element 1 and the layer element 2 are determined, that is, the reference lines determined based on the upper edge line of the layer element, the upper reference line set may be generated based on the upper reference lines of the layer element 1 and the layer element 2, and similarly, the lower reference line set, the left reference line set and the like may be obtained.

By determining the datum line of the layer element and generating one or more datum line sets based on the datum line, subsequent alignment processing of the layer element based on the datum line sets is facilitated.

Step 206: and acquiring a first datum line and a second datum line in the datum line set, and generating at least one element adjustment information according to a first layer element corresponding to the first datum line and a second layer element corresponding to the second datum line.

The first datum line and the second datum line refer to datum lines for automatically aligning and adjusting the layer elements; the first layer element refers to a layer element, wherein the reference line corresponding to the layer element comprises the first reference line; the second reference line refers to the layer element, wherein the reference line corresponding to the layer element comprises the layer element of the second reference line; the element adjustment information is information for adjusting the position of the layer element.

In practical applications, each reference line includes a reference line type; the method for acquiring the first datum line and the second datum line in the datum line set can comprise the following steps:

determining at least one datum to be processed in the datum line set based on the datum line type of each datum line;

and determining a first datum line and a second datum line in the at least one datum line to be processed according to the distance between the datum lines to be processed.

The reference line type refers to a type determined according to a reference line position, and for example, the reference line type includes an upper reference line type, a lower reference line type, a left reference line type, a right reference line type, an x-axis centerline reference line type, and a y-axis centerline reference line type; the reference line to be processed refers to a reference line of a target reference line type determined in the reference line set; the distance refers to the distance between the reference lines, and the first reference line and the second reference line are of different reference line types, so that the first reference line and the second reference line do not intersect, and the distance between the two reference lines can be calculated.

Specifically, after determining the datum lines corresponding to the layer elements, automatic alignment of the layer elements can be achieved based on the datum lines; and acquiring two datum lines of the same type in the datum line set, calculating the distance between the two datum lines, further determining the distance between the datum lines of the same information type in the datum line set, further determining the target distance based on each distance, and taking the two datum lines corresponding to the target distance as a first datum line and a second datum line.

It should be noted that the reference line set may be a set including various types of reference lines, or may be a set composed of subsets corresponding to the various types of reference lines; for example, the datum line set comprises an upper datum line subset, a lower datum line subset and an x-axis center line subset; in the case where the reference line set is a set composed of various types of reference line subsets, the distances between the reference lines in the respective reference line subsets are calculated without first determining the distances between the reference lines.

In one embodiment of the application, an upper datum line type datum line to be processed is determined in a datum line set, and an upper datum line subset is generated; and determining the distance between the datum lines in the upper datum line subset, and optionally determining the datum line to be processed with the distance m as a first datum line and a second datum line in the upper datum line subset.

Further, in order to ensure accuracy of subsequent automated alignment processing, a target distance may be selected from the distances based on a preset distance threshold, and further, a reference line may be determined based on the target distance; specifically, the method for determining the first datum line and the second datum line in the at least one datum line to be processed according to the datum line distance between the datum lines to be processed may include:

and determining the datum line with the datum line distance smaller than the preset distance threshold value as a first datum line and a second datum line.

The preset distance threshold value refers to a preset threshold value used for determining the target distance; in practical application, the datum lines corresponding to the target distance smaller than the preset distance threshold can be selected as the first datum line and the second datum line, so that automatic alignment is realized under the condition that the alignment distance of the layer elements is reduced subsequently.

Specifically, the reference line with smaller distance can be determined based on the preset distance threshold, the distances corresponding to the reference lines of the type can be ranked from large to small, the distance at the tail of the team is selected as the target distance, and the reference line corresponding to the distance is selected as the first reference line and the second reference line.

In one embodiment of the application, the distances between the datum lines in the lower datum line set are determined to be 3, 5, 7 and 10; and sequencing the distances from small to large, and determining the datum lines corresponding to the distance 3 at the head of the team as a first datum line and a second datum line.

And determining the first datum line and the second datum line so as to realize the alignment of the layer elements based on the first datum line and the second datum line.

After determining the first reference line and the second reference line, it may be further determined how to achieve alignment of the layer elements based on the first reference line and the second reference line.

In practical applications, the method for generating at least one element adjustment information according to the first layer element corresponding to the first reference line and the second layer element corresponding to the second reference line may include:

determining first position information corresponding to the first image element and second position information corresponding to the second image element;

determining whether an intersection exists between the first image element and the second image element after the alignment processing based on the distance between the first reference line and the second reference line;

and taking the distance between the first reference line and the second reference line as element adjustment information when the first image element and the second image element do not have intersection.

The first layer element refers to an element containing a first reference line in the corresponding reference line, and the first position information refers to the position information of the first layer element in the design draft; the second layer element refers to an element containing a second reference line in the corresponding reference line, and the second position information refers to the position information of the second layer element in the design draft; the element adjustment information refers to adjustment information for the layer element, for example, the layer element 1 is moved to the right by 10px.

Specifically, the first image element can be moved to the second image element by the distance between the first reference line and the second reference line, so that the first image element and the second image element share one reference line, and the number of the reference lines is reduced; after the movement, there may be overlapping between the layer elements, so it is necessary to determine whether the layer elements will overlap after the movement according to the first position information, the second position information and the distance; if the first reference line and the second reference line do not overlap, the distance between the first reference line and the second reference line is used as element adjustment information.

In one embodiment of the present application, as shown in a part a of fig. 4, a first datum line is determined to be a datum line 1, and a second datum line is determined to be a datum line 2; calculating the distance between the datum line 1 and the datum line 2 to be 5; the first position information of the first layer element is the lower right corner coordinate of the first layer element, and the second layer element of the second layer element is the upper left corner coordinate of the second layer; and based on the distance 5, the lower right corner coordinate and the upper left corner coordinate, determining that no intersection exists between the two elements after the first layer element is moved to the second layer element, and taking the distance 5 as element adjustment information between the first layer element and the second layer element.

By judging whether intersection exists between the layer elements after moving, the situation that the layer elements cannot be completely displayed after alignment processing is caused by shielding among the layer elements in automatic UI alignment is avoided.

The foregoing describes a case where there is no intersection of layer elements, and in a case where there is an intersection of layer elements, element adjustment information may also be determined based on the following manner, specifically, the method further includes:

determining a third fiducial line in the fiducial line set if there is an intersection of the first image element and the second image element;

element adjustment information is generated based on the first image element and a third image element corresponding to the third reference line.

The third reference line refers to a reference line which is the same type as the first reference line and the second reference line and is determined in the reference line set.

Specifically, after determining that the first layer element and the second layer element have an intersection, screening the third layer element in the reference line set based on the distance, so as to further determine whether the first layer element and the third layer element have an intersection, and if not, using the distance between the first layer element and the third layer element as element adjustment information; if there is still intersection, a fourth layer element may be further determined, and so on, until element adjustment information is obtained.

In a specific embodiment of the present application, as shown in part b in fig. 4, it is determined that an intersection exists between the first layer element and the second layer element after moving, then a third layer element with a second minimum distance is selected from the distance list, and it is further determined whether an intersection exists between the first layer element and the third layer element after moving; and under the condition that the intersection of the first layer element and the third layer element is not determined, taking the distance between the first datum line and the second datum line as element adjustment information.

The layout of the layer elements is determined based on the element adjustment information by determining the element adjustment information corresponding to the layer elements.

Step 208: at least one initial element layout is generated based on the element adjustment information.

Wherein, the initial element layout refers to pre-layout information of the layer elements determined based on the element adjustment information.

Specifically, the first datum line and the second datum line of the same type can be determined for a plurality of times in the datum line set, so that a plurality of element adjustment information is obtained, and an initial element layout is generated based on the plurality of element adjustment information of the same type; similarly, different types of element adjustment information can be determined, and initial element layouts corresponding to different types can be generated.

In one embodiment of the present application, element adjustment information is obtained by determining a first reference line and a second reference line in an upper reference line subset; generating an initial element layout 1 according to the element adjustment information is as follows: shifting the picture element m up by 10px; element adjustment information is obtained by determining a first reference line and a second reference line in the lower reference line subset, and an initial element layout 2 is generated by moving the image element n downward by 5px according to the element adjustment information.

The initial element layout of the layer elements is determined through the element adjustment information so as to determine that the current alignment treatment can achieve the alignment effect, so that the subsequent alignment of the layer elements is achieved based on the initial element layout, and the direct alignment of the layer elements is avoided, so that a complicated alignment treatment process is caused.

Step 210: and determining a target element layout according to the number of the datum lines in each initial element layout, and adjusting each layer element based on the target element layout.

The number of the datum lines refers to the total number of the datum lines corresponding to the layer elements under the condition of initial element layout; the target element layout refers to a layout for performing position adjustment on the layer elements.

In practical application, the initial element layout can be randomly selected as a target element, and the layer elements are adjusted; but ensuring the alignment effect of the aligned design manuscript and reducing the number of the datum lines as much as possible, the method for determining the target element layout based on the following mode, specifically, according to the number of the datum lines in each initial element layout, the method for determining the target element layout may include:

determining the initial element layout to be processed, the number of which is smaller than a preset number threshold value;

taking the initial element layout to be processed as a target element layout under the condition that the number of the initial element layouts to be processed is 1;

and under the condition that the number of the initial element layouts to be processed is larger than 1, determining element adjustment information corresponding to each initial element layout to be processed, and selecting the initial element layout to be processed, of which the element adjustment information is smaller than a preset adjustment threshold value, as a target element layout.

The initial element layout to be processed refers to an initial element layout of which the number of datum lines corresponding to the initial element layout is smaller than a preset number threshold value; the preset number threshold is a number threshold of preset reference lines, and an initial element layout smaller than the preset number threshold can be used as an initial element layout to be processed.

Specifically, a preset quantity threshold value is determined; selecting initial element layouts, of which the number of reference lines corresponding to the initial element layouts is smaller than a preset number threshold, as initial element layouts to be processed; further, counting the number of the initial element layouts to be processed, and taking the initial element layouts to be processed as target element layouts under the condition that the number is 1; and if the number exceeds 1, determining element adjustment information corresponding to each initial element layout to be processed, and selecting the initial element layout to be processed with smaller adjustment distance as a target element layout based on the element adjustment information.

In a specific embodiment of the application, 6 initial element layouts are determined, and the number of datum lines corresponding to each initial element layout is 15, 10, 14, 13, 12 and 11 respectively; and sorting the initial element layout pairs from small to large based on the number of the datum lines, determining the initial element layout corresponding to the number of the datum lines 10 positioned at the head of the team as the target element layout, and adjusting the positions of the layer elements based on element adjustment information corresponding to the target element layout to realize automatic alignment of the layer elements.

After the alignment of the layer elements is achieved, the steps 206-210 may be continuously performed in a loop until the number of reference lines corresponding to the layer elements to be aligned is less than or equal to the expected threshold, so as to end the alignment operation of the layer elements.

The alignment method of the layer elements utilizes the greedy algorithm to realize the local alignment of the layer elements, and in addition, dynamic planning, genetic algorithm and the like can be adopted to realize the alignment of the layer elements, but in order to ensure the processing efficiency, the alignment of the layer elements is carried out in a greedy algorithm mode, so that the simplicity and the high efficiency of the implementation mode are ensured.

The alignment method of the layer elements acquires at least one layer and the layer elements of each layer; determining datum lines corresponding to the elements of each layer, and generating a datum line set based on each datum line; acquiring a first datum line and a second datum line in the datum line set, and generating at least one element adjustment information according to a first layer element corresponding to the first datum line and a second layer element corresponding to the second datum line; generating at least one initial element layout according to the element adjustment information; and determining a target element layout according to the number of the datum lines in each initial element layout, and adjusting each layer element based on the target element layout.

The alignment condition of the current layer element can be determined based on the datum line by acquiring the datum line of the layer element; determining a reference line in the reference line set, generating element adjustment information based on the reference line and the corresponding layer element, and further generating initial element layout based on the element adjustment information, so that a target element layout which is finally used for aligning the layer element can be selected according to the number of the reference lines corresponding to different initial element layouts; the layer elements are adjusted based on the target element layout, so that automatic alignment processing of the layer elements on the same layer or different layers is realized, and the efficiency of the alignment processing of the layer elements is improved.

The following describes, with reference to fig. 5, an example of application of the method for aligning layer elements provided by the present application to text elements. Fig. 5 shows a process flow chart of an alignment method applied to a layer element of a text element according to an embodiment of the present application, which specifically includes the following steps:

step 502: in response to the layer element alignment request, a header element to be aligned is determined.

Specifically, analyzing the received layer element alignment request to obtain an element identifier; and determining the title element to be aligned corresponding to the element identifier in the design manuscript based on the element identifier.

Step 504: and determining the datum lines corresponding to the title elements to be aligned, and generating a datum line set corresponding to the datum line type based on each datum line.

Specifically, a bounding box of the title element to be aligned is determined, and different types of reference lines corresponding to the title element to be aligned are determined based on the bounding box.

Step 506: and respectively acquiring a first datum line and a second datum line in each datum line set in the datum line set corresponding to each datum line type.

Specifically, among the reference line sets, a reference line having a small distance between the reference lines is selected as the first reference line and the second reference line corresponding to the reference line set.

Step 508: and generating element adjustment information under each datum line type according to the first layer element corresponding to each first datum line and the second layer element corresponding to each second datum line.

Specifically, determining first position information corresponding to a first image element and second position information corresponding to a second image element; and judging whether an intersection exists between the first layer element and the second layer element after the first layer element and the second layer element are moved or not based on the first position information, the second position information and the distance between the first reference line and the second reference line, and if not, determining the distance between the first reference line and the second reference line as element adjustment information.

Step 510: and generating an initial element layout corresponding to the element adjustment information based on the element adjustment information.

Specifically, different first reference lines and second reference lines can be determined for multiple times in the reference line set, different element adjustment information is generated, and then an initial element layout can be generated based on the different element adjustment information.

Step 512: and determining the target element layout according to the number of the datum lines in each initial element layout.

Specifically, an initial element layout with the number of the reference lines smaller than a preset number threshold is determined as a target element layout.

Step 514: each title element to be aligned is adjusted based on the target element layout.

Step 516: steps 510-514 are continued until the number of fiducial lines corresponding to the elements to be aligned reaches the desired level.

Corresponding to the above method embodiment, the present application further provides an embodiment of a layer element alignment device, and fig. 6 shows a schematic structural diagram of a layer element alignment device according to an embodiment of the present application. As shown in fig. 6, the apparatus includes:

an acquisition module 602 configured to acquire at least one layer and layer elements of each layer;

a determining module 604 configured to determine reference lines corresponding to the layer elements, and generate a reference line set based on the reference lines;

a first generating module 606, configured to obtain a first reference line and a second reference line in the reference line set, and generate at least one element adjustment information according to a first layer element corresponding to the first reference line and a second layer element corresponding to the second reference line;

a second generation module 608 configured to generate at least one initial element layout from the element adjustment information;

the adjustment module 610 is configured to determine a target element layout according to the number of reference lines in each initial element layout, and adjust each layer element based on the target element layout.

Optionally, the obtaining module 602 is further configured to:

Optionally, the determining module 604 is further configured to:

determining element bounding boxes corresponding to elements of each layer;

Optionally, each fiducial line comprises a fiducial line type; the first generation module 406 is further configured to:

Optionally, the first generating module 606 is further configured to:

Optionally, the second generating module 408 is further configured to:

The application relates to an alignment device of layer elements, which comprises an acquisition module for acquiring at least one layer and layer elements of each layer; the determining module is used for determining datum lines corresponding to the picture layer elements and generating a datum line set based on the datum lines; the first generation module is used for acquiring a first datum line and a second datum line in the datum line set, and generating at least one element adjustment information according to a first layer element corresponding to the first datum line and a second layer element corresponding to the second datum line; the second generation module generates at least one initial element layout according to the element adjustment information; and the adjustment module is used for determining a target element layout according to the number of the datum lines in each initial element layout and adjusting each layer element based on the target element layout.

According to the alignment device of the layer elements, the datum line of the layer elements is obtained, so that the alignment condition of the current layer elements can be determined based on the datum line; determining a reference line in the reference line set, generating element adjustment information based on the reference line and the corresponding layer element, and further generating initial element layout based on the element adjustment information, so that a target element layout which is finally used for aligning the layer element can be selected according to the number of the reference lines corresponding to different initial element layouts; the layer elements are adjusted based on the target element layout, so that automatic alignment processing of the layer elements on the same layer or different layers is realized, and the efficiency of the alignment processing of the layer elements is improved.

The above is a schematic scheme of an alignment device for layer elements in this embodiment. It should be noted that, the technical solution of the alignment device for layer elements and the technical solution of the alignment method for layer elements belong to the same concept, and details of the technical solution of the alignment device for layer elements, which are not described in detail, can be referred to the description of the technical solution of the alignment method for layer elements.

Fig. 7 illustrates a block diagram of a computing device 700 provided in accordance with an embodiment of the present application. The components of computing device 700 include, but are not limited to, memory 710 and processor 720. Processor 720 is coupled to memory 710 via bus 730, and database 750 is used to store data.

Computing device 700 also includes access device 740, access device 740 enabling computing device 700 to communicate via one or more networks 760. Examples of such networks include the Public Switched Telephone Network (PSTN), a Local Area Network (LAN), a Wide Area Network (WAN), a Personal Area Network (PAN), or a combination of communication networks such as the internet. The access device 740 may include one or more of any type of network interface, wired or wireless (e.g., a Network Interface Card (NIC)), such as an IEEE802.11 Wireless Local Area Network (WLAN) wireless interface, a worldwide interoperability for microwave access (Wi-MAX) interface, an ethernet interface, a Universal Serial Bus (USB) interface, a cellular network interface, a bluetooth interface, a Near Field Communication (NFC) interface, and so forth.

In one embodiment of the application, the above-described components of computing device 700, as well as other components not shown in FIG. 7, may also be connected to each other, such as by a bus. It should be understood that the block diagram of the computing device illustrated in FIG. 7 is for exemplary purposes only and is not intended to limit the scope of the present application. Those skilled in the art may add or replace other components as desired.

Computing device 700 may be any type of stationary or mobile computing device including a mobile computer or mobile computing device (e.g., tablet, personal digital assistant, laptop, notebook, netbook, etc.), mobile phone (e.g., smart phone), wearable computing device (e.g., smart watch, smart glasses, etc.), or other type of mobile device, or a stationary computing device such as a desktop computer or PC. Computing device 700 may also be a mobile or stationary server.

Wherein the processor 720 performs the steps of the method for aligning layer elements when executing the computer instructions.

The foregoing is a schematic illustration of a computing device of this embodiment. It should be noted that, the technical solution of the computing device and the technical solution of the above-mentioned alignment method of layer elements belong to the same concept, and details of the technical solution of the computing device, which are not described in detail, can be referred to the description of the technical solution of the above-mentioned alignment method of layer elements.

An embodiment of the application also provides a computer-readable storage medium storing computer instructions that, when executed by a processor, implement the steps of a method of aligning layer elements as described above.

The above is an exemplary version of a computer-readable storage medium of the present embodiment. It should be noted that, the technical solution of the storage medium and the technical solution of the above-mentioned alignment method of layer elements belong to the same concept, and details of the technical solution of the storage medium, which are not described in detail, can be referred to the description of the technical solution of the above-mentioned alignment method of layer elements.

The foregoing describes certain embodiments of the present application. Other embodiments are within the scope of the following claims. In some cases, the actions or steps recited in the claims can be performed in a different order than in the embodiments and still achieve desirable results. In addition, the processes depicted in the accompanying figures do not necessarily require the particular order shown, or sequential order, to achieve desirable results. In some embodiments, multitasking and parallel processing are also possible or may be advantageous.

The computer instructions include computer program code that may be in source code form, object code form, executable file or some intermediate form, etc. The computer readable medium may include: any entity or device capable of carrying the computer program code, a recording medium, a U disk, a removable hard disk, a magnetic disk, an optical disk, a computer memory, a Read-only memory (ROM), a random access memory (RAM, randomAccessMemory), an electrical carrier signal, a telecommunication signal, a software distribution medium, and so forth. It should be noted that the computer readable medium contains content that can be appropriately scaled according to the requirements of jurisdictions in which such content is subject to legislation and patent practice, such as in certain jurisdictions in which such content is subject to legislation and patent practice, the computer readable medium does not include electrical carrier signals and telecommunication signals.

It should be noted that, for the sake of simplicity of description, the foregoing method embodiments are all expressed as a series of combinations of actions, but it should be understood by those skilled in the art that the present application is not limited by the order of actions described, as some steps may be performed in other order or simultaneously in accordance with the present application. Further, those skilled in the art will appreciate that the embodiments described in the specification are all preferred embodiments, and that the acts and modules referred to are not necessarily all required for the present application.

In the foregoing embodiments, the descriptions of the embodiments are emphasized, and for parts of one embodiment that are not described in detail, reference may be made to the related descriptions of other embodiments.

The preferred embodiments of the application disclosed above are intended only to assist in the explanation of the application. Alternative embodiments are not intended to be exhaustive or to limit the application to the precise form disclosed. Obviously, many modifications and variations are possible in light of the above teaching. The embodiments were chosen and described in order to best explain the principles of the application and the practical application, to thereby enable others skilled in the art to best understand and utilize the application. The application is limited only by the claims and the full scope and equivalents thereof.

Claims

1. A method of aligning layer elements, comprising:

acquiring at least one layer and layer elements of each layer;

2. The method of claim 1, wherein obtaining at least one layer and layer elements for each layer comprises:

3. The method of claim 1, wherein determining fiducial lines for each layer element and generating a fiducial line set based on each fiducial line comprises:

Determining element bounding boxes corresponding to elements of each layer;

4. The method of claim 1, wherein each fiducial line comprises a fiducial line type;

acquiring a first datum line and a second datum line in the datum line set comprises:

5. The method of claim 4, wherein determining the first fiducial line and the second fiducial line from the at least one fiducial line to be processed based on a fiducial line distance between the fiducial lines to be processed comprises:

6. The method of claim 1, wherein generating at least one element adjustment information from a first layer element corresponding to the first reference line and a second layer element corresponding to the second reference line comprises:

7. The method of claim 6, wherein the method further comprises:

8. The method of claim 1, wherein determining the target element layout based on the number of fiducial lines in each initial element layout comprises:

9. An alignment device for layer elements, comprising:

10. A computing device comprising a memory, a processor, and computer instructions stored on the memory and executable on the processor, wherein the processor, when executing the computer instructions, performs the steps of the method of any one of claims 1-8.

11. A computer readable storage medium storing computer instructions which, when executed by a processor, implement the steps of the method of any one of claims 1-8.