CN116716023A - AG coating liquid composition, AG coating liquid and application thereof, AG film, polarizer and liquid crystal display - Google Patents
AG coating liquid composition, AG coating liquid and application thereof, AG film, polarizer and liquid crystal display Download PDFInfo
- Publication number
- CN116716023A CN116716023A CN202310671181.XA CN202310671181A CN116716023A CN 116716023 A CN116716023 A CN 116716023A CN 202310671181 A CN202310671181 A CN 202310671181A CN 116716023 A CN116716023 A CN 116716023A
- Authority
- CN
- China
- Prior art keywords
- coating liquid
- silica microspheres
- polarizer
- film
- weight
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011248 coating agent Substances 0.000 title claims abstract description 78
- 238000000576 coating method Methods 0.000 title claims abstract description 78
- 239000007788 liquid Substances 0.000 title claims abstract description 70
- 239000000203 mixture Substances 0.000 title claims abstract description 48
- 239000003795 chemical substances by application Substances 0.000 title claims abstract description 28
- 239000004973 liquid crystal related substance Substances 0.000 title claims abstract description 18
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical class O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 69
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims abstract description 34
- 239000000178 monomer Substances 0.000 claims abstract description 20
- 239000013078 crystal Substances 0.000 claims abstract description 11
- 239000010453 quartz Substances 0.000 claims abstract description 10
- 229910052710 silicon Inorganic materials 0.000 claims description 26
- 239000002245 particle Substances 0.000 claims description 25
- 239000010703 silicon Substances 0.000 claims description 22
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 21
- 239000000758 substrate Substances 0.000 claims description 16
- 238000000034 method Methods 0.000 claims description 15
- -1 carboxylic acid compounds Chemical class 0.000 claims description 14
- 239000000463 material Substances 0.000 claims description 14
- 239000007787 solid Substances 0.000 claims description 9
- 239000007822 coupling agent Substances 0.000 claims description 8
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 6
- 230000008569 process Effects 0.000 claims description 6
- 239000003921 oil Substances 0.000 claims description 4
- 239000002253 acid Substances 0.000 claims description 3
- 239000004094 surface-active agent Substances 0.000 claims description 3
- 239000002671 adjuvant Substances 0.000 claims description 2
- 239000012752 auxiliary agent Substances 0.000 claims description 2
- 230000001681 protective effect Effects 0.000 abstract description 9
- 239000004005 microsphere Substances 0.000 description 27
- 238000002360 preparation method Methods 0.000 description 17
- 235000012239 silicon dioxide Nutrition 0.000 description 16
- 239000004925 Acrylic resin Substances 0.000 description 11
- 229920000178 Acrylic resin Polymers 0.000 description 11
- 239000010410 layer Substances 0.000 description 11
- 238000002156 mixing Methods 0.000 description 11
- 230000000052 comparative effect Effects 0.000 description 10
- 239000000243 solution Substances 0.000 description 10
- 239000000377 silicon dioxide Substances 0.000 description 9
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 8
- 238000001035 drying Methods 0.000 description 7
- 238000001704 evaporation Methods 0.000 description 7
- 239000002904 solvent Substances 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- 239000006087 Silane Coupling Agent Substances 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 230000004048 modification Effects 0.000 description 6
- 238000012986 modification Methods 0.000 description 6
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 5
- 235000021355 Stearic acid Nutrition 0.000 description 5
- 239000003929 acidic solution Substances 0.000 description 5
- 239000011247 coating layer Substances 0.000 description 5
- 239000006185 dispersion Substances 0.000 description 5
- 230000008020 evaporation Effects 0.000 description 5
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 5
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 239000008117 stearic acid Substances 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 4
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 230000008878 coupling Effects 0.000 description 4
- 238000010168 coupling process Methods 0.000 description 4
- 238000005859 coupling reaction Methods 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- LZZYPRNAOMGNLH-UHFFFAOYSA-M Cetrimonium bromide Chemical compound [Br-].CCCCCCCCCCCCCCCC[N+](C)(C)C LZZYPRNAOMGNLH-UHFFFAOYSA-M 0.000 description 3
- 239000004593 Epoxy Substances 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 3
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 3
- 239000006227 byproduct Substances 0.000 description 3
- 238000000227 grinding Methods 0.000 description 3
- 238000006460 hydrolysis reaction Methods 0.000 description 3
- 238000003384 imaging method Methods 0.000 description 3
- 239000011259 mixed solution Substances 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 229920000728 polyester Polymers 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 238000005245 sintering Methods 0.000 description 3
- 238000002834 transmittance Methods 0.000 description 3
- 238000001291 vacuum drying Methods 0.000 description 3
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- KUDUQBURMYMBIJ-UHFFFAOYSA-N 2-prop-2-enoyloxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC(=O)C=C KUDUQBURMYMBIJ-UHFFFAOYSA-N 0.000 description 2
- CXRFDZFCGOPDTD-UHFFFAOYSA-M Cetrimide Chemical compound [Br-].CCCCCCCCCCCCCC[N+](C)(C)C CXRFDZFCGOPDTD-UHFFFAOYSA-M 0.000 description 2
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 238000003776 cleavage reaction Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000014509 gene expression Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- 230000007017 scission Effects 0.000 description 2
- 239000012798 spherical particle Substances 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- QNODIIQQMGDSEF-UHFFFAOYSA-N (1-hydroxycyclohexyl)-phenylmethanone Chemical compound C=1C=CC=CC=1C(=O)C1(O)CCCCC1 QNODIIQQMGDSEF-UHFFFAOYSA-N 0.000 description 1
- MYWOJODOMFBVCB-UHFFFAOYSA-N 1,2,6-trimethylphenanthrene Chemical compound CC1=CC=C2C3=CC(C)=CC=C3C=CC2=C1C MYWOJODOMFBVCB-UHFFFAOYSA-N 0.000 description 1
- ZDQNWDNMNKSMHI-UHFFFAOYSA-N 1-[2-(2-prop-2-enoyloxypropoxy)propoxy]propan-2-yl prop-2-enoate Chemical compound C=CC(=O)OC(C)COC(C)COCC(C)OC(=O)C=C ZDQNWDNMNKSMHI-UHFFFAOYSA-N 0.000 description 1
- PUGOMSLRUSTQGV-UHFFFAOYSA-N 2,3-di(prop-2-enoyloxy)propyl prop-2-enoate Chemical compound C=CC(=O)OCC(OC(=O)C=C)COC(=O)C=C PUGOMSLRUSTQGV-UHFFFAOYSA-N 0.000 description 1
- UHFFVFAKEGKNAQ-UHFFFAOYSA-N 2-benzyl-2-(dimethylamino)-1-(4-morpholin-4-ylphenyl)butan-1-one Chemical compound C=1C=C(N2CCOCC2)C=CC=1C(=O)C(CC)(N(C)C)CC1=CC=CC=C1 UHFFVFAKEGKNAQ-UHFFFAOYSA-N 0.000 description 1
- HQPQZMMDWFLVTD-UHFFFAOYSA-N 3-prop-2-enoyloxypropyl prop-2-enoate propyl prop-2-enoate Chemical compound C(C=C)(=O)OCCCOC(C=C)=O.C(C=C)(=O)OCCC HQPQZMMDWFLVTD-UHFFFAOYSA-N 0.000 description 1
- FIHBHSQYSYVZQE-UHFFFAOYSA-N 6-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound C=CC(=O)OCCCCCCOC(=O)C=C FIHBHSQYSYVZQE-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 238000000944 Soxhlet extraction Methods 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 1
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 229960000686 benzalkonium chloride Drugs 0.000 description 1
- CADWTSSKOVRVJC-UHFFFAOYSA-N benzyl(dimethyl)azanium;chloride Chemical compound [Cl-].C[NH+](C)CC1=CC=CC=C1 CADWTSSKOVRVJC-UHFFFAOYSA-N 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 229960002798 cetrimide Drugs 0.000 description 1
- 239000012295 chemical reaction liquid Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- FCZCIXQGZOUIDN-UHFFFAOYSA-N ethyl 2-diethoxyphosphinothioyloxyacetate Chemical compound CCOC(=O)COP(=S)(OCC)OCC FCZCIXQGZOUIDN-UHFFFAOYSA-N 0.000 description 1
- 239000012065 filter cake Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000004313 glare Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000004020 luminiscence type Methods 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical compound [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 1
- 150000003376 silicon Chemical class 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000000967 suction filtration Methods 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- 238000004627 transmission electron microscopy Methods 0.000 description 1
- ILJSQTXMGCGYMG-UHFFFAOYSA-N triacetic acid Chemical compound CC(=O)CC(=O)CC(O)=O ILJSQTXMGCGYMG-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D163/00—Coating compositions based on epoxy resins; Coating compositions based on derivatives of epoxy resins
- C09D163/10—Epoxy resins modified by unsaturated compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/0427—Coating with only one layer of a composition containing a polymer binder
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/60—Additives non-macromolecular
- C09D7/61—Additives non-macromolecular inorganic
- C09D7/62—Additives non-macromolecular inorganic modified by treatment with other compounds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/70—Additives characterised by shape, e.g. fibres, flakes or microspheres
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
- G02B5/3033—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133528—Polarisers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2301/00—Characterised by the use of cellulose, modified cellulose or cellulose derivatives
- C08J2301/08—Cellulose derivatives
- C08J2301/10—Esters of organic acids
- C08J2301/12—Cellulose acetate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2463/00—Characterised by the use of epoxy resins; Derivatives of epoxy resins
- C08J2463/10—Epoxy resins modified by unsaturated compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Nonlinear Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Inorganic Chemistry (AREA)
- Mathematical Physics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Paints Or Removers (AREA)
Abstract
The invention relates to the technical field of polarizer protective films, and provides an AG coating liquid composition, AG coating liquid and application thereof, an AG film, a polarizer and a liquid crystal display. Wherein the AG coating liquid composition comprises an acrylic prepolymer, an acrylic monomer and a functional factor; wherein the content of the acrylic prepolymer is 60-500 parts by weight and the content of the acrylic monomer is 30-300 parts by weight relative to 100 parts by weight of the functional factor; the functional factors are organically modified silica microspheres, and the silica microspheres are monodisperse quartz crystal type silica microspheres. The AG film obtained from the AG coating liquid composition is applied to polarizer protection, and has the advantages of high definition, low flash point and good appearance.
Description
Technical Field
The invention relates to the technical field of polarizer protective films, in particular to an AG coating liquid composition, AG coating liquid and application thereof, an AG film, a polarizer and a liquid crystal display.
Background
The polaroid is one of three key raw materials of the LCD panel, has the characteristics of high technical threshold, high market concentration and the like, and the global market scale exceeds billions of dollars. At present, the autonomy rate of the Chinese polaroid product exceeds 45%, and the Chinese display industry comprehensively surpasses the international competitors to complement the key short plates. The polaroid is used as a key raw material required by a liquid crystal display imaging technology, is mainly used for producing a liquid crystal display module, and is applied to terminal consumer electronic products such as televisions, computers, mobile phones and the like and other liquid crystal imaging fields. Two polarizers are respectively stuck on two sides of the glass substrate in the liquid crystal display module, the lower polarizer is used for converting light beams generated by the backlight source into polarized light, and the upper polarizer is used for analyzing the polarized light after the liquid crystal electric modulation to generate light-dark contrast, so that a display picture is generated. The imaging of the liquid crystal display module must depend on polarized light, and the liquid crystal display module cannot display images without any polarizer. Considering that the polyvinyl alcohol (PVA) layer material is fragile, the protection layer is formed at both ends to be a problem to be solved.
Currently, the protective layer mainly takes AG (anti-glare) film without luminous flux loss as the main stream. The AG film realization technology for protecting the original polaroid mainly comprises two types: 1. the coating is prepared by adopting common commercial spherical particles to be matched with resin for dispersion, and the uniform spreading of the particles on the surface layer of the substrate is required to be ensured, and no lap joint exists among the particles. On the one hand, the particle dispersion uniformity is difficult to ensure (the problem of poor particle dispersion often exists), and the appearance of a finished product after coating cannot be ensured (the film after coating has low definition and serious flash point and serious apparent transverse and vertical lines); on the other hand, spherical particles are simply and uniformly paved on the surface to be too ideal, so that corresponding design requirements are difficult to ensure in practical operation, and stable production cannot be performed. 2. The method is obtained by using common particles for preparation, dispersion and coating, on one hand, the definition flash point cannot be ensured, and on the other hand, the particles are extremely easy to agglomerate to cause poor appearance.
Therefore, it is necessary to develop an AG film for polarizer protection that has high definition, low flash point, and good performance.
Disclosure of Invention
The present invention has been made to overcome the above-mentioned problems occurring in the prior art, and an object of the present invention is to provide an AG coating liquid composition, an AG coating liquid obtained from the AG coating liquid composition, and an AG film; the AG coating liquid composition, AG coating liquid and AG film are applied to the polaroid protective film; and a polarizer comprising the AG film, and a liquid crystal display comprising the polarizer. The AG film obtained from the AG coating liquid composition is applied to polarizer protection, and has the advantages of high definition, low flash point and good appearance.
The first aspect of the invention provides an AG coating liquid composition, which comprises an acrylic prepolymer, an acrylic monomer and a functional factor; wherein the content of the acrylic prepolymer is 60-500 parts by weight and the content of the acrylic monomer is 30-300 parts by weight relative to 100 parts by weight of the functional factor;
the functional factors are organically modified silica microspheres, and the silica microspheres are monodisperse quartz crystal type silica microspheres.
The inventor of the invention finds that the organically modified silica microspheres are used as AG particles to be matched with acrylic acid prepolymer and acrylic ester monomers, and the monodisperse quartz crystal form silica microspheres have the advantages of high hardness and high wear resistance due to the self materials, on one hand, the coating after coating can be ensured to have high wear resistance and high hardness, and meanwhile, the uniformity of particle dispersion can be ensured after the organic modification.
According to a second aspect of the present invention, there is provided an AG coating liquid, wherein the AG coating liquid contains the AG coating liquid composition according to the first aspect of the present invention, or is prepared from the AG coating liquid composition.
In a third aspect, the present invention provides an AG film comprising a substrate layer and an AG coating layer coated on a surface of the substrate layer; the AG coating is prepared from the AG coating liquid according to the second aspect of the invention or the AG coating liquid composition according to the first aspect of the invention.
The fourth aspect of the present invention provides a polarizer comprising the AG film of the third aspect of the present invention, which is disposed on one or both sides of the polarizer.
A fifth aspect of the present invention provides a liquid crystal display having the polarizer of the fourth aspect of the present invention disposed on one side or both sides of a liquid crystal display panel.
The technical scheme adopted by the invention has the following beneficial effects:
(1) In the AG coating liquid composition provided by the invention, when the organic modified monodisperse quartz crystal silicon dioxide microspheres are used as AG particles (functional factors) to be matched with acrylic acid prepolymer and acrylic ester monomers, AG films obtained from the AG coating liquid composition are applied to polarizer protection, and the AG coating liquid composition has the advantages of high definition, low flash point and good appearance;
(2) The AG film obtained by the AG coating liquid composition provided by the invention uses the organic modified monodisperse quartz crystal form silica microspheres as AG particles, so that the definition and flash point of the AG film are ensured, the problem of poor coating is solved, and the production cost is reduced.
The endpoints and any values of the ranges disclosed herein are not limited to the precise range or value, and are understood to encompass values approaching those ranges or values. For numerical ranges, one or more new numerical ranges may be found between the endpoints of each range, between the endpoint of each range and the individual point value, and between the individual point value, in combination with each other, and are to be considered as specifically disclosed herein.
Drawings
FIG. 1 is a schematic diagram showing the structure of AG film provided in example B1.
Detailed Description
The following describes specific embodiments of the present invention in detail. It should be understood that the detailed description and specific examples, while indicating and illustrating the invention, are not intended to limit the invention.
Unless defined otherwise, all scientific and technical terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention relates.
The first aspect of the invention provides an AG coating liquid composition, which comprises an acrylic prepolymer, an acrylic monomer and a functional factor; wherein the content of the acrylic prepolymer is 60-500 parts by weight and the content of the acrylic monomer is 30-300 parts by weight relative to 100 parts by weight of the functional factor;
the functional factors are organically modified silica microspheres, and the silica microspheres are monodisperse quartz crystal type silica microspheres.
According to the invention, through the matched use of the acrylic prepolymer, the acrylic monomer and the functional factor, the AG film used for the prepared polaroid has good definition, flash point and apparent performance, and the proportioning relation of the three components is further optimized for better definition, flash point and apparent. Preferably, the content of the acrylic prepolymer is 300 to 450 parts by weight and the content of the acrylic monomer is 80 to 200 parts by weight with respect to 100 parts by weight of the functional factor. More preferably, the content of the acrylic prepolymer is 380 to 400 parts by weight and the content of the acrylic monomer is 90 to 100 parts by weight with respect to 100 parts by weight of the functional factor.
In the present invention, the acrylic prepolymer is a polyfunctional base resin.
In one example, the multi-functional matrix resin is a photocurable resin.
In one example, the multifunctional matrix resin is an acrylic resin; the acrylic resin is selected from any one or more of epoxy acrylic resin, polyester acrylic resin and polyurethane acrylic resin.
In one example, the epoxy acrylic resin is selected from the nine functional epoxy acrylic resin oligomer CNUVE151 NS; the polyester acrylic resin is selected from nine-functional polyester acrylic resin oligomer CN8201NS; the urethane acrylic resin is selected from nine-functional urethane acrylic resin oligomer CN983NS.
In an example, the acrylic monomer is an acrylic monomer or a methacrylic monomer with a functionality of ∈2.
In one example, the acrylic monomer is selected from any one or more of dipentaerythritol hydroxy pentaacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol hexaacrylate, trimethylolpropane ethoxy triacrylate, 1, 6-hexanediol diacrylate, trimethylene propyl triacrylate, propoxylated glycerol triacrylate, ethylene glycol diacrylate, and tripropylene glycol diacrylate.
In the invention, the organic modification is organic coupling grafting modification, which means that the microspheres are subjected to coupling agent treatment and then react with organic matters to carry out grafting modification.
In an example, the coupling agent is selected from a silane coupling agent and/or a titanate coupling agent, preferably a silane coupling agent, the silane coupling agent being selected from one or more of KH550, KH560, and KH 792.
In one example, the organic compound is a carboxylic acid compound selected from long chain fatty acid compounds, preferably stearic acid.
Preferably, the particle size of the functional factor is 1 μm-5 μm, preferably 2 μm-4 μm.
In the present invention, the term "particle size" refers to the geometric spherical diameter of individual particles rather than the average value, and when in range, refers to the particle size of such particles in the same material falling within that range; while the present invention allows for certain errors, i.e. when less than 5% of the total number of particles have a particle size outside the required range, it is also considered satisfactory. The particle size of the functional factor in the present invention is measured by transmission electron microscopy.
In one example, the portion of the silica microspheres in the functional factor comprises 92-98 wt%, preferably 95-98 wt%, of the total weight of the functional factor.
In one example, the portion of the carboxylic acid compound in the functional factor is 1-5 wt%, preferably 1-3 wt%, based on the total weight of the functional factor.
In one embodiment of the invention, the functional factor is prepared by a process comprising the steps of:
(1) First contacting silica microspheres with a coupling agent;
(2) And (3) carrying out second contact on the material obtained in the step (1) and carboxylic acid compounds.
Wherein, in the step (1), the conditions of the first contact include: the temperature is 50-65 ℃, the mixing speed is 50-500rpm/min, and the mixing time is 6-10h.
In one example, the coupling agent is selected from silane coupling agents selected from one or more of KH792, KH550, and KH 560.
Wherein in the step (2), the conditions of the second contact include: the temperature is 55-65 ℃, the mixing speed is 50-500rpm/min, and the mixing time is 2-5h.
In one example, the carboxylic acid compound is selected from long chain fatty acid compounds, preferably stearic acid.
The preparation method of the functional factor further comprises the following step (3): filtering to remove byproducts, vacuum drying and grinding.
In one embodiment of the invention, the organically coupled grafted modified silica microsphere is prepared by a process comprising the steps of:
(1) Mixing silicon dioxide microspheres and a solvent, carrying out ultrasonic oscillation, heating to 50-65 ℃, slowly dripping a coupling agent, and stirring for reaction for 6-10h at 50-500rpm/min under the condition of condensation reflux;
(2) Adding a long-chain fatty acid compound into the material obtained in the step (1), and continuing to stir at 50-500rpm/min for 2-5h;
(3) And (3) cooling the material reacted in the step (2), performing solid-liquid separation to remove byproducts, and performing vacuum drying and grinding.
The functional factor obtained by the preparation method of the functional factor may have the condition that the silica microspheres are not completely and organically modified, and in the condition, the part of the silica microspheres in the functional factor accounts for 92-98 weight percent of the total weight of the functional factor, and the part of the carboxylic acid compound accounts for 1-5 weight percent of the total weight of the functional factor.
Preferably, the silica microspheres used in the AG coating liquid composition of the present invention are one or a combination of two of solid silica microspheres and hollow silica microspheres.
In one embodiment of the invention, the silica microspheres are prepared by a process comprising the steps of:
(a) Performing third contact on the surfactant, the acid solution, the alcohol solution and the soluble silicon source;
(b) Carrying out fourth contact on the material obtained in the step (a) and the oil phase solution;
(c) Evaporating water, separating solid from liquid, washing and drying the material obtained in the step (b);
(d) And (3) sintering the material obtained in the step (c) at a high temperature.
In the step (a), the surfactant is selected from one or more of Cetrimide (CTAB), cetrimide bromide, benzalkonium chloride or tetradecyltrimethylammonium bromide.
The acidic solution may be a combination of one or more of hydrochloric acid, sulfuric acid, or nitric acid.
The alcohol solution is selected from lower alcohols, including for example, but not limited to, one or more of ethanol, methanol, or isopropanol.
The soluble silicon source is selected from one or more of tetraethyl orthosilicate (TEOS), methyl orthosilicate or aminosilane. Herein, the soluble silicon source refers to a silicon source liquid.
Preferably, the volume of the acidic solution is used in an amount of 5mL-15mL (in which case the concentration of the acidic solution is 1mol/L [ H ] + ]). Preferably, the acidic solution is used in a volume amount of 8mL-12mL (in which case the concentration of the acidic solution is 1mol/L [ H ] + ]). The inventor of the invention discovers that maintaining the ratio between the concentration of the silicon source and the concentration of the acid solution is beneficial to obtaining silicon microspheres with uniform size and better structure, and if the concentration of hydrogen ions in unit silicon source is lower, the hydrolysis of the silicon source is not beneficial; if the concentration of hydrogen ions in the unit silicon source is high, the hydrolysis speed of the silicon source is high, the silicon microsphere structure can be damaged, a hemispherical structure can be generated, and the obtained silicon microsphere structure and size are poor.
By "silicon source liquid" is meant a silicon source that is present in liquid form, rather than a silicon source solution that is dissolved in a solvent.
The term "one-unit Si atomic scale" refers to a chemical structure of a silicon source liquid having only one Si atom, e.g., si (OC) 2 H 5 ) 4 Can be recorded as a unit, K 2 Al 2 Si 6 O 16 Can be written as six units.
The expression "1mL of the silicon source liquid in terms of one unit of Si atom" means that the volume amount of the silicon source liquid is mL in terms of one Si atom. For example, 1mL of a silicon source compound containing one Si atom is used, and 0.5mL of a silicon source compound containing two Si atoms is used.
In the step (b), the oil phase solution includes, but is not limited to, one or more of benzene, butanone or n-heptane.
In one example, the conditions of the third contact include: the temperature is 20-30 ℃, the mixing speed is 40-60rpm/min, and the mixing time is 0.5-3h.
In one example, the conditions of the fourth contact include: the temperature is 25-45 ℃ and the time is 2-4h.
In the step (c), the temperature and time for evaporating the water can be controlled to make the prepared silica microsphere have a hollow and solid structure.
In one example, the temperature of the evaporated moisture is 100-120℃and the evaporation time is 0.5-2 hours. Wherein hollow microspheres are arranged in the evaporation time of 0.5-1h, and solid microspheres are arranged in the evaporation time of 1-2 h.
In one example, the sintering conditions of step (d) include: roasting for 3-5h at 700-900 ℃ in inert atmosphere. Argon may be used as the inert gas.
Preferably, the AG coating liquid composition further comprises an auxiliary agent.
In one example, the adjuvant includes a photoinitiator and a leveling agent. The content of the photoinitiator is 30-120 parts by weight relative to 100 parts by weight of the functional factor, and the content of the leveling agent is 30-120 parts by weight.
In one example, the photoinitiator is a cleavage type photoinitiator. The cleavage type photoinitiator includes, but is not limited to, one or more of photoinitiator 184, photoinitiator 1173, photoinitiator 907, photoinitiator 369, photoinitiator 1490, and photoinitiator 1700.
In one example, the leveling agent is a silicon modified leveling agent and may be selected from one or more of BYK-307, BYK-333, BYK-352, BYK-354, YK-377, BYK-378, and BYK-358.
In the invention, the AG coating liquid composition further comprises an organic solvent; the organic solvent is selected from any one or more of alcohols, ketones, alkanes, esters and ethers.
In one example, the organic solvent is selected from any one or more of butanone, propylene glycol methyl ether, 4-methyl-2-pentanone, propylene glycol methyl ether acetate, ethyl acetate and butyl acetate, more preferably a combination of butanone and propylene glycol methyl ether.
In one embodiment of the present invention, the AG coating liquid composition includes an acrylic prepolymer, an acrylic monomer, an organically modified silica microsphere, a photoinitiator, a leveling agent, and a solvent.
The first aspect of the invention claims a composition wherein the individual components may be stored separately or in a mixed combination of components. It will be appreciated that solvents may not be included in the composition for convenience of storage, transportation and sale. The purchaser may add the solvent by himself/herself in preparing the AG coating liquid composition.
According to a second aspect of the present invention, there is provided an AG coating liquid, wherein the AG coating liquid contains the AG coating liquid composition according to the first aspect of the present invention, or is prepared from the AG coating liquid composition.
The AG coating liquid of the second aspect of the present invention can be obtained by simply mixing the composition of the first aspect of the present invention.
In a third aspect, the present invention provides an AG film comprising a substrate layer and an AG coating layer coated on a surface of the substrate layer; the AG coating is prepared from the AG coating liquid according to the second aspect of the invention or the AG coating liquid composition according to the first aspect of the invention.
In one example, the substrate layer material is selected from the substrates used for protection of specific polarizers in the art, for example, the substrate layer material may be triacetate cellulose (TAC) film.
In order to make the clarity, flash point and appearance of the AG film used for the polarizer prepared more excellent, the AG coating layer preferably has a thickness of 1 μm to 5. Mu.m, more preferably 2 μm to 4. Mu.m.
The invention also provides a method for preparing the AG film according to the third aspect of the invention, which comprises the following steps of taking the AG coating liquid composition according to the first aspect of the invention as a raw material:
(i) Mixing AG coating liquid compositions to obtain AG coating liquid;
(ii) Coating the AG coating liquid obtained in the step (i) on a substrate layer;
(iii) Drying the substrate layer treated in the step (ii) and curing the AG coating liquid.
In the step (i), the acrylic prepolymer, the acrylic monomer, the organically modified microsphere, the photoinitiator, the leveling agent and the solvent are uniformly mixed according to the proportion, so as to obtain the AG coating liquid.
The step (ii) further comprises the step of adjusting the AG coating liquid to have a solid content of 20-40%, so that the AG coating liquid is easier to uniformly coat, and the flash point and the definition of the AG film are improved.
In the step (iii), the drying conditions include: the drying temperature is 80-120 ℃ and the drying time is 1-10 minutes.
In the step (iii), the curing is preferably ultraviolet light irradiation curing, preferably ultraviolet light with a dosage of 300-500mJ/cm 2 。
The fourth aspect of the present invention provides a polarizer comprising the AG film of the third aspect of the present invention, which is disposed on one or both sides of the polarizer.
A fifth aspect of the present invention provides a liquid crystal display having the polarizer of the fourth aspect of the present invention disposed on one side or both sides of a liquid crystal display panel.
In the present invention, when the terms such as "first contact", "second contact", "third contact", "fourth contact" and the like are distinguished by numbers, the numbers in the expressions only play a role of distinguishing, and do not indicate a sequence, and the numerical sizes of the numbers do not bring any limited effect to the technical solution unless specifically stated.
The technical solutions in the embodiments of the present invention will be clearly and completely described in the following in conjunction with the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
Materials, reagents and the like used in the examples described below are commercially available unless otherwise specified.
The invention is described in detail below in connection with specific embodiments, which are intended to be illustrative rather than limiting.
Preparation example 1
A method for preparing silica microspheres, comprising the following steps:
(1) 0.12g CTAB was charged into a 250mL three-necked flask, 4mL 1mol/L hydrochloric acid, 4mL C were added 2 H 5 OH、0.4mL TEOS(molecular formula: si (C) 2 H 5 O) 4 ) Magnetically stirring at 25 deg.c and mixing speed of 50rpm/min for 0.8 hr;
(2) Adding 50mL of benzene into the mixed solution obtained in the step (1), regulating the temperature of an oil bath to 35 ℃, and carrying out hydrolysis reaction for 3 hours;
(3) The temperature is regulated to 105 ℃, the water in the mixed solution obtained in the step (2) is distilled out, and the evaporation time is 0.5 to 1h until the solution in the water separator is clear and transparent, and the reaction is stopped;
(4) Taking centrifugal precipitation products, centrifugally washing mixed solution of isopropyl alcohol and water (volume ratio is 1:1), and finally drying the precipitate below the centrifuge tube to obtain SiO with the particle size of 1-2 mu m 2 A hollow microsphere sample;
(5) SiO obtained in the step (4) 2 And (3) adding the hollow microsphere sample into a tube furnace for roasting, and roasting for 4 hours at 800 ℃ under the protection of argon gas to obtain the quartz crystal form silicon dioxide microspheres.
Preparation example 2
A process for producing silica microspheres by the method of production example 1, wherein 3ml of 1mol/L hydrochloric acid is added in step (1) to obtain SiO having a particle diameter of about 2 to 3. Mu.m 2 Hollow microsphere samples.
Preparation example 3
A process for producing silica microspheres by the method of production example 1, wherein 2ml of 1mol/L hydrochloric acid is added in step (1) to obtain SiO having a particle diameter of about 3 to 4. Mu.m 2 Hollow microsphere samples.
Preparation example 4
A method for preparing silica microspheres was carried out according to the method of preparation example 1, except that the evaporation time in step (3) was 2 hours to obtain SiO having a particle diameter of about 1 to 2. Mu.m 2 Solid microsphere samples.
Preparation example 5
A method for producing silica microspheres was conducted as described in production example 1, except that step (5) was not conducted to obtain SiO having a particle diameter of about 1 to 2. Mu.m 2 Hollow microsphere samples (non-quartz crystal form).
Preparation examples 6 to 11
The preparation method of the organic coupling grafted modified silica microsphere comprises the following steps:
(1) Adding 2g of silicon dioxide microspheres and 75ml of solvent into a 250ml three-neck flask, ultrasonically oscillating for 30min, heating to 60 ℃, slowly dropwise adding 2% of silane coupling agent KH550, and rapidly and mechanically stirring at 300rpm/min for 8h under the condition of condensing reflux;
the silica microspheres added in preparation examples 6 to 10 were obtained in preparation examples 1 to 5, respectively；
Preparation 11 was supplemented with commercially available silica microspheres (Lidrei DQ1028L, non-quartz crystal form)；
(2) Adding 2% stearic acid into a three-neck flask, stirring at 60 ℃ at 300rpm/min for reaction for 3 hours, naturally cooling the reaction liquid to room temperature, and carrying out suction filtration;
(3) And performing Soxhlet extraction on the obtained filter cake to remove redundant coupling agent, stearic acid and byproducts generated in the reaction process, and grinding after vacuum drying to obtain the organic coupling grafting modified silica microsphere.
In the obtained organic coupling grafting modified silicon dioxide microsphere, the silicon dioxide microsphere part accounts for 90-95 wt% of the total weight, the stearic acid modified part accounts for 1-3 wt% of the total weight, and the rest is the silane coupling agent modified part.
In the examples below, unless otherwise specified, all of the ingredients used were commercially available analytical grade. 1 part by weight represents 1g.
Example group A
The following examples of group A in Table 1 are provided to illustrate AG coating liquid compositions of the present invention.
TABLE 1
Note that: the amounts of the components added are in parts by weight in Table 1.
Example group B
Group B examples are provided to illustrate AG films produced from AG coating liquid compositions of the present invention.
Example B1
A polarizer protective AG film prepared by a method comprising the steps of:
(i) Uniformly mixing the AG coating liquid composition prepared in the example 1 to obtain AG coating liquid;
(ii) Diluting the AG coating liquid obtained in the step (i) to a solid content of 35%, and coating the AG coating liquid on a TAC substrate (Kenicamantadine);
(iii) Drying the substrate layer treated in step (ii) in a circulating oven at 100deg.C for 2 minutes, and then at a dose of 400mJ/cm 2 To obtain AG film. Wherein the TAC substrate has a thickness of 125 μm and the AG coating has a thickness of 3 μm. The schematic structure of the polarizer-protective AG film is shown in FIG. 1.
Example B2
A polarizer protective AG film was prepared by referring to the preparation method of example B1, except that the AG coating liquid composition of example 2 was used in step (i) of example B2, and the AG coating layer had a thickness of 5 μm in step (iii).
Example B3
A polarizer protective AG film was prepared by referring to the preparation method of example B1, except that the AG coating liquid composition of example 3 was used in step (i) of example B3, and the AG coating layer had a thickness of 4 μm in step (iii).
Examples B4 to B10
A polarizer protective AG film was prepared by referring to the preparation method of example B1, except that AG coating liquid compositions in example 4a, example 4B, example 4c, example 5a, example 5B, example 5c and example 5d were used in step (i) of examples B4 to B10, respectively.
Comparative examples DB1 to DB4
A polarizer protective AG film was prepared by referring to the preparation method of example B1, except that AG coating liquid compositions in comparative examples 1 to 4 were used in step (i) of comparative examples DB1 to DB4, respectively.
Test case
(1) The clarity of AG films provided by group B examples and comparative examples was measured using a CS-720 clarity haze meter and the results are reported in Table 2.
(2) The transmittance of the AG films provided in examples and comparative examples was measured using a WGT-S transmittance tester, and the results are recorded in table 2.
(3) Using a green screen, AG film was placed on the screen surface, AG luminescence spots were observed, and the results are recorded in Table 2.
(4) With reference to industry standards, the appearance of AG coating on AG film was observed under darkroom glare, and no vertical lines were recorded as OK.
TABLE 2
| Sequence number | Definition of definition | Transmittance of light | Flash point | Appearance of |
| Example B1 | 96.2％ | 88.5％ | OK | OK |
| Example B2 | 94.5％ | 88.2％ | OK | OK |
| Example B3 | 98.8％ | 89.5％ | OK | OK |
| Example B4 | 98.3％ | 89.1％ | OK | OK |
| Example B5 | 98.2％ | 88.9％ | OK | OK |
| Example B6 | 98.5％ | 89.4％ | OK | OK |
| Example B7 | 93.5％ | 89.0％ | OK | OK |
| Example B8 | 95.2％ | 88.7％ | OK | OK |
| Example B9 | 92.3％ | 88.4％ | OK | OK |
| Example B10 | 92.8％ | 88％ | OK | OK |
| Comparative example DB1 | 53.2％ | 87.5％ | NG | NG |
| Comparative example DB2 | 46.5％ | 87.2％ | NG | NG |
| Comparative example DB3 | 65.2％ | 87％ | NG | NG |
| Comparative example DB4 | 38.9％ | 87.9％ | NG | NG |
As can be seen from Table 2, the polarizer protective AG film provided by the invention has the advantages of high definition, low flash point and good appearance. In the polarizer protection AG film, the acrylic prepolymer, the acrylic monomer and the silicon dioxide microsphere adopt reasonable proportion, reasonable particle size of the silicon dioxide microsphere and solid or hollow selection are adopted, the required crystal form is obtained through sintering, and the AG film with high definition, low flash point and good appearance, which is suitable for the technical application, can be obtained through organic grafting modification.
In addition, the result of comparative example DB shows that the ordinary silica microspheres, which have not been organically modified, have not reached the standards of definition and have poor flash point and appearance properties; the commercial silicon dioxide microspheres are still not up to standard in definition even if modified by adopting the technical scheme, and have poor flash point and appearance performances, and are not suitable for protecting AG films by using polaroids.
The foregoing description of the preferred embodiments of the invention is not intended to be limiting, but rather is to be construed as including any modifications, equivalents, and alternatives falling within the spirit and principles of the invention.
Claims (10)
1. An AG coating liquid composition, characterized in that the composition comprises an acrylic prepolymer, an acrylic monomer, and a functional factor; wherein the content of the acrylic prepolymer is 60-500 parts by weight and the content of the acrylic monomer is 30-300 parts by weight relative to 100 parts by weight of the functional factor;
the functional factors are organically modified silica microspheres, and the silica microspheres are monodisperse quartz crystal type silica microspheres.
2. Composition according to claim 1, wherein the functional factor has a particle size of 1-5 μm, preferably 2-4 μm;
the functional factor is prepared by a method comprising the following steps:
(1) First contacting silica microspheres with a coupling agent;
(2) And (3) carrying out second contact on the material obtained in the step (1) and carboxylic acid compounds.
3. The composition of claim 1 or 2, wherein the silica microspheres are one or a combination of two of solid silica microspheres, hollow silica microspheres;
preferably, the silica microspheres are prepared by a process comprising the steps of:
(a) Performing third contact on the surfactant, the acid solution, the alcohol solution and the soluble silicon source;
(b) And (3) carrying out fourth contact on the material obtained in the step (a) and the oil phase solution.
4. The composition of claim 1, wherein the composition further comprises an adjuvant;
preferably, the auxiliary agent comprises a photoinitiator and a leveling agent;
preferably, the photoinitiator is contained in an amount of 30 to 120 parts by weight and the leveling agent is contained in an amount of 30 to 120 parts by weight with respect to 100 parts by weight of the functional factor.
5. An AG coating liquid comprising or prepared from the composition according to any one of claims 1 to 4.
6. An AG film, which is characterized by comprising a substrate layer and an AG coating coated on the surface of the substrate layer;
the AG coating is prepared from the AG coating liquid according to claim 5 or the composition according to any one of claims 1 to 4.
7. The AG film according to claim 6, wherein the AG coating has a thickness of 1 μm to 5 μm, preferably 2 μm to 4 μm.
8. Use of the composition according to any one of claims 1 to 4, or the AG coating liquid according to claim 5, or the AG film according to claim 6 or 7 for polarizer protection.
9. A polarizer comprising the AG film of claim 6 or 7 disposed on one or both sides of the polarizer.
10. A liquid crystal display having the polarizer of claim 9 disposed on one or both sides of a liquid crystal display panel.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310671181.XA CN116716023A (en) | 2023-06-07 | 2023-06-07 | AG coating liquid composition, AG coating liquid and application thereof, AG film, polarizer and liquid crystal display |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310671181.XA CN116716023A (en) | 2023-06-07 | 2023-06-07 | AG coating liquid composition, AG coating liquid and application thereof, AG film, polarizer and liquid crystal display |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN116716023A true CN116716023A (en) | 2023-09-08 |
Family
ID=87867260
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202310671181.XA Pending CN116716023A (en) | 2023-06-07 | 2023-06-07 | AG coating liquid composition, AG coating liquid and application thereof, AG film, polarizer and liquid crystal display |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN116716023A (en) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5168541A (en) * | 1990-04-20 | 1992-12-01 | E. I. Du Pont De Nemours And Company | Moisture sealing of optical waveguide devices with doped silicon dioxide having a silicon monoxide undercoat |
| CN108196322A (en) * | 2017-12-14 | 2018-06-22 | 合肥乐凯科技产业有限公司 | A kind of anti-dazzle thin-membrane for polaroid |
| CN114231136A (en) * | 2021-12-20 | 2022-03-25 | 江苏皇冠新材料科技有限公司 | Antibacterial AG coating liquid composition, antibacterial AG coating liquid, antibacterial AG writing film and preparation method thereof |
| CN115201948A (en) * | 2022-09-14 | 2022-10-18 | 宁波长阳科技股份有限公司 | Preparation method of diffusion film, diffusion film and application |
| CN115231578A (en) * | 2022-08-31 | 2022-10-25 | 南通裕弘分析仪器有限公司 | Preparation method of monodisperse silicon dioxide microspheres |
-
2023
- 2023-06-07 CN CN202310671181.XA patent/CN116716023A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5168541A (en) * | 1990-04-20 | 1992-12-01 | E. I. Du Pont De Nemours And Company | Moisture sealing of optical waveguide devices with doped silicon dioxide having a silicon monoxide undercoat |
| CN108196322A (en) * | 2017-12-14 | 2018-06-22 | 合肥乐凯科技产业有限公司 | A kind of anti-dazzle thin-membrane for polaroid |
| CN114231136A (en) * | 2021-12-20 | 2022-03-25 | 江苏皇冠新材料科技有限公司 | Antibacterial AG coating liquid composition, antibacterial AG coating liquid, antibacterial AG writing film and preparation method thereof |
| CN115231578A (en) * | 2022-08-31 | 2022-10-25 | 南通裕弘分析仪器有限公司 | Preparation method of monodisperse silicon dioxide microspheres |
| CN115201948A (en) * | 2022-09-14 | 2022-10-18 | 宁波长阳科技股份有限公司 | Preparation method of diffusion film, diffusion film and application |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP6332522B1 (en) | Composition and method for producing the composition | |
| EP1784465B1 (en) | Coating composition for film with low refractive index and film prepared therefrom | |
| TWI314589B (en) | Preparation of a mechanically durable single layer coating with anti-reflective properties | |
| US6083314A (en) | Coating liquid for forming porous silica coating, coated substrate and short fiber silica | |
| KR100793597B1 (en) | Coating composition for ultraviolet-curable film type and film prepared from it | |
| JP4682368B2 (en) | Spherical core-shell cerium oxide / polymer hybrid nanoparticle aggregate and method for producing the same | |
| JP2018508599A (en) | Photocurable coating composition, low refractive layer and antireflection film | |
| EP2899243B1 (en) | Liquid composition and glass article | |
| JP6820354B2 (en) | Coating composition, antireflection film and its manufacturing method, laminate, and solar cell module | |
| JP2999603B2 (en) | Spin-on-glass composition, hard mask and method for manufacturing hard mask | |
| KR101273167B1 (en) | Anti-glare coating composition and preparation method for the same | |
| TW201906985A (en) | Composition, film, laminated structure, light-emitting device, display, and method of manufacturing the same | |
| CN112480454A (en) | Anti-dazzle hardening film for liquid crystal display | |
| CN114231136B (en) | Antibacterial AG coating liquid composition, antibacterial AG coating liquid, antibacterial AG writing film and preparation method thereof | |
| CN108388040B (en) | Resin optical filter and preparation method thereof | |
| CN116716023A (en) | AG coating liquid composition, AG coating liquid and application thereof, AG film, polarizer and liquid crystal display | |
| JP2011132343A (en) | Antistatic hard coating material and optical member | |
| JP2012236921A (en) | Antistatic hard coat coating material and optical member | |
| JP4655614B2 (en) | Magnesium fluoride particle organosol, method for producing the same, and paint using the same | |
| JP2011201931A (en) | Composition for hardcoat and base material coated therewith | |
| WO2020105405A1 (en) | Reactive silicone composition and cured product of same | |
| JP6730829B2 (en) | Active energy ray curable composition | |
| JP2005536617A (en) | Reactive and gel-free composition for the production of hybrid composites | |
| WO2010113462A1 (en) | Composition for forming anti-reflection film | |
| KR102533092B1 (en) | Inorganic particle dispersion composition for display and manufacturing method thereof |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination |