CN116699324A - GIS discharge tracking system and method based on single photon detection - Google Patents
GIS discharge tracking system and method based on single photon detection Download PDFInfo
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Abstract
The invention discloses a GIS discharge tracking system and method based on single photon detection. The method comprises the following steps: the computing terminal carries out geometric modeling on the gas-insulated metal-enclosed switchgear according to the real size to obtain a geometric model of the gas-insulated metal-enclosed switchgear; the imaging objective receives the radiation photons of the tip defect of the gas-insulated metal-enclosed switchgear, and the photons are transmitted to the photomultiplier by the light guide-image transmission optical fiber; the photomultiplier outputs a pulse voltage signal to the acquisition terminal, and the acquisition terminal sends the pulse voltage signal to the calculation terminal; the computing terminal performs ray tracing according to the pulse voltage signals; and drawing a photon amplitude distribution diagram in a geometric space of the geometric model according to the ray tracing result by the computing terminal to form a photon track and a light field distribution diagram.
Description
Technical Field
The invention relates to the technical field of power equipment state evaluation, in particular to a GIS (gas insulated switchgear) discharge tracking system and method based on single photon detection.
Background
In an electric power system, a gas-insulated metal-enclosed switchgear (Gas Insulated Switchgear, GIS) is one of key power transformation equipment, and is widely applied and plays a vital role in the electric power transmission process. The GIS equipment is formed by sealing and combining all the components, is not generally interfered by the external environment, has low noise and weak electromagnetic wave interference, and has less post maintenance work; meanwhile, the equipment layout with high integration level greatly reduces the inherent installation distance between the equipment and the electrified distance of the equipment. Because of the advantages and characteristics, despite the high cost of GIS devices, in densely populated areas or large and medium urban areas, large open-type substations are replaced by GIS devices with small occupied area and high integration level, which is becoming a trend. With the continuous expansion of the power grid scale and the continuous improvement of the power supply requirement, the GIS equipment has a rapid growth speed in the power industry in recent years.
The research on the spectral characteristics and propagation rules of ultraviolet light, visible light and infrared light in GIS is carried out at home. Currently Fu Zhong describes the detection of ac using a grating monochromator, a lock-in amplifier, etcThe implementation method and software of the corona discharge spectral characteristics design and analyze the spectral characteristics to obtain the size of the spectral peak value on the characteristic wavelength, which can be used as a reference quantity for judging the corona discharge intensity. In the aspect of monitoring equipment failure, SF in GIS when failure occurs is analyzed through experiments 6 Characteristics of the decomposition products and measuring SO using ultraviolet spectroscopy (UV) 2 Early warning of discharge faults is realized, wherein a first derivative method and Savitzky-Golay filtering are utilized to carry out quick baseline correction and spectrum smoothing, and 290-310 nm is selected as a characteristic region to carry out SO 2 Detection and quantification, thereby developing a set of system for monitoring SF from two aspects of detection principle, totally-enclosed circulation on-line sampling system and the like 6 Content of decomposition products and trend of change. For the problem of online discharge fault monitoring, ultraviolet spectrum is applied to rapidly identify SO in equipment online 2 The components are processed by using fast Fourier transformation analysis, autocorrelation analysis and power spectrum density analysis to 209-219 nm and 295-305 nm characteristic region data, the number of correlation peaks, the expected and standard deviation of the distance between adjacent peaks and 5 characteristic values of frequency domain components at the maximum peak of the fast Fourier transformation and the power spectrum density are selected, and the voting principle is adopted to realize trace SO in the equipment 2 And (5) discriminating the components. For the research of maintenance strategies of air leakage equipment, SF is utilized 6 The characteristic of the specific infrared absorption spectrum of the gas can rapidly and accurately position the leakage part under the condition that the equipment is not powered off, so that the leaked gas is visual and effective, and sufficient information support is provided.
The spectral characteristics and propagation rules of ultraviolet light, visible light and infrared light in the GIS outside the country are studied. The state of development of the two-dimensional ultraviolet spectrum is reviewed by the R.Borrego-Varillas, the basic principle of a scientific case of the technology is discussed, the calculation tool of simulation experiment and development of the technology is reviewed, and the development potential of the two-dimensional ultraviolet spectrum is highlighted by applying some examples. A novel and simple ultraviolet spectroscopic analysis method was developed by experimentally predicting the solubility of Oleanolic Acid (OA) and Ursolic Acid (UA) in different solvents, thereby preliminarily determining which solvents are suitable for extraction from any plant material containing at least one such triterpene. Next, the current state of near-functional near-infrared spectroscopy and imaging (fNIRS/fNIRS) and the method of continuous wave fNIRS are reviewed, and fNIRS have become a commercial instrument widely used in neuroscience research from simple modification of Beer-Lambert law to the complex image reconstruction and data analysis methods used today. Many manufacturing processes, such as pelleting, mixing or drying, are monitored by Near Infrared (NIR) spectroscopy by its use in pharmaceutical technology to determine the end point of these processes, as well as some checks for the determination of the mass and number of pharmaceutical compounds, measurement and control of the physical and chemical parameters of the final drug. Finally, some defects of the method are emphasized, and future development prospects are expected.
Disclosure of Invention
Aiming at the problems of low accuracy and complex operation of a GIS equipment state detection means in the prior art, the invention provides a GIS discharge tracking system and method based on single photon detection.
According to one aspect of the present invention, there is provided a GIS discharge tracking system based on single photon detection, comprising:
the system comprises a light guide-image transmission optical fiber, an imaging objective lens, a photomultiplier, an acquisition terminal and a calculation terminal; wherein the method comprises the steps of
The imaging objective is connected with the light guide-image transmission optical fiber and is placed in the shell of the gas-insulated metal-enclosed switchgear;
one end of the light guide-image transmission optical fiber passes through a certain distance from the shell of the gas-insulated metal-enclosed switchgear, and the other end is connected with the photomultiplier;
generating a pulse voltage signal after receiving photons by the photomultiplier, and transmitting the pulse voltage signal to an acquisition terminal;
the acquisition terminal transmits the received pulse voltage signals to the calculation terminal;
and the computing terminal performs ray tracing according to the pulse voltage signals and computes photon trajectories and light field distribution diagrams.
Preferably, the imaging objective is of quartz material.
Preferably, the operation of performing ray tracing by the computing terminal according to the pulse voltage signal includes:
the calculation terminal calculates photon amplitude and wavelength according to the pulse voltage signal;
and the computing terminal performs ray tracing according to the photon amplitude, the wavelength and a pre-established geometric model.
Preferably, the operation of calculating the light field distribution map by the computing terminal includes:
and drawing a photon amplitude distribution diagram in a geometric model by the computing terminal according to the ray tracing result to form a photon track and a light field distribution diagram.
According to another aspect of the present invention, there is provided a GIS discharge tracking method based on single photon detection, including:
the computing terminal carries out geometric modeling on the gas-insulated metal-enclosed switchgear according to the real size to obtain a geometric model of the gas-insulated metal-enclosed switchgear;
the imaging objective receives the radiation photons of the tip defect of the gas-insulated metal-enclosed switchgear, and the photons are transmitted to the photomultiplier by the light guide-image transmission optical fiber;
the photomultiplier outputs a pulse voltage signal to the acquisition terminal, and the acquisition terminal sends the pulse voltage signal to the calculation terminal;
the computing terminal performs ray tracing according to the pulse voltage signals;
and drawing a photon amplitude distribution diagram in a geometric space of the geometric model according to the ray tracing result by the computing terminal to form a photon track and a light field distribution diagram.
Preferably, the operation of performing ray tracing by the computing terminal according to the pulse voltage signal includes:
the imaging objective lens is taken as a starting point, a path of photon movement before 1ns is reversely pushed, and surface shielding judgment and corresponding field value calculation are carried out;
keeping the current photon travelling track and amplitude, then reversely pushing a path of 1ns, and carrying out surface shielding judgment and corresponding field value calculation;
and stopping calculation when the photon amplitude reaches the signal-to-noise ratio or the reverse-push path is larger than a preset threshold value.
Preferably, the preset threshold is 10m.
Preferably, the surface occlusion determination and the corresponding field value calculation comprise:
when the structure generates surface diffraction and the source point is positioned in the field of the light area, the field value function of the diffracted rays is shown as the formula (1):
wherein ,is the diffraction field vector coefficient; s is the distance between the source point and the field point; />Is a constant related to the starting diffraction point; r is R 0 Is a field point; r is R s Is the source point; k is the light propagation constant; />Is a normal vector of the curved surface at the source point; />Is the normal vector of the ray; z is the wave impedance of the medium; />M, N is a process parameter for a vector from normal.
Preferably, the surface occlusion determination and the corresponding field value calculation comprise:
when surface diffraction occurs and the source point is located in the dark field, the field value function of the diffraction field is as shown in formula (2):
wherein ,unit vector as field pointAn amount of; s is S d1 A direction vector for the current tracking position; s is S d2 A direction vector for the next trace position; ρ is the loose focal length; phase factor s 0 And the source point R s To S d1 Is related to the distance of S due to the position of the field point in the shadow region d1 Coincides with the source point, thus s 0 =1; each component of the diffraction field side vector coefficient is shown in a formula (3);
wherein ,T5 (S d1 )、T 6 (S d1 ) Both H, S are process parameters; ρ is the loose focal length; z is the wave impedance of the medium;
considering the geodesic length t represented by the generalized fermat principle, the defocus distance ρ is:
wherein ,is the phase; η is the refractive index; s is S d2 A direction vector for the next trace position; ρ is the free focal length.
Preferably, the surface occlusion determination and the corresponding field value calculation comprise:
when edge diffraction occurs, the diffraction and reflection are considered to follow the locality principle, namely, the edge of the wedge can be regarded as the edge of a certain curved surface, and then two oblique cleavage planes are two tangent planes of the curved surface where the diffraction point is located, and the expression of the edge diffraction field is shown as formula (5):
wherein ,is wound aroundThe shooting field vector coefficient; phi is the included angle between the projection of the ray around the x-axis and the x-axis on the xoy plane; phi' is the included angle between the projection of the incident ray on the xoy plane and the x axis; s is the length of the incident ray; s' is the diffracted ray length; beta 0 Is the included angle between the incident ray and the diffraction boundary; fx]As a transition function; />The calculation of a is shown in formula (6):
a＝cos(2nπN-φ-φ')+1 (6)
wherein N is the smallest integer satisfying the formula 2n_Φ+Φ' =pi.
According to the invention, the discharge position can be timely judged through non-single photon detection, early warning is timely performed, the maintenance strategy is guided to be formulated, maintenance is timely performed, and the operation reliability of equipment is improved. And (5) reversely pushing the position of the discharge source through a ray tracing method. The single photon can effectively represent whether discharge occurs in the GIS, and through geometric modeling of the GIS, the whole process track and amplitude information from radiation to annihilation of the photon can be rapidly and effectively tracked, and rapid defect positioning is facilitated. Therefore, the GIS discharge system and the GIS discharge method based on single photon detection can be applied to detection and maintenance of GIS equipment, and a detection device can be installed at a key position according to factors such as a GIS equipment structure and operation conditions by means of pre-implanting a plurality of optical fiber bundles, so that ultraviolet signals radiated during GIS tip defect discharge are detected. The method can be applied to the internal state observation of GIS equipment of different factories and different voltage levels, effectively improves the problems of low detection accuracy and complex operation of the traditional means, improves the maintenance efficiency, and ensures the safe and stable operation and reliable power supply of the power grid.
Drawings
Exemplary embodiments of the present invention may be more completely understood in consideration of the following drawings:
FIG. 1 is a schematic diagram of a GIS discharge tracking system based on single photon detection according to an exemplary embodiment of the present invention;
FIG. 2 is a schematic flow chart of a single photon detection-based GIS discharge tracking method according to an exemplary embodiment of the present invention;
FIG. 3 is a schematic diagram of a field value calculation equivalent model of edge diffraction provided by an exemplary embodiment of the present invention;
FIG. 4 is a schematic diagram of a GIS optical computing model according to an exemplary embodiment of the present invention;
fig. 5 is a schematic diagram of a light field distribution result provided by an exemplary embodiment of the present invention.
Detailed Description
Hereinafter, exemplary embodiments according to the present invention will be described in detail with reference to the accompanying drawings. It should be apparent that the described embodiments are only some embodiments of the present invention and not all embodiments of the present invention, and it should be understood that the present invention is not limited by the example embodiments described herein.
It should be noted that: the relative arrangement of the components and steps, numerical expressions and numerical values set forth in these embodiments do not limit the scope of the present invention unless it is specifically stated otherwise.
It will be appreciated by those of skill in the art that the terms "first," "second," etc. in embodiments of the present invention are used merely to distinguish between different steps, devices or modules, etc., and do not represent any particular technical meaning nor necessarily logical order between them.
It should also be understood that in embodiments of the present invention, "plurality" may refer to two or more, and "at least one" may refer to one, two or more.
It should also be appreciated that any component, data, or structure referred to in an embodiment of the invention may be generally understood as one or more without explicit limitation or the contrary in the context.
In addition, the term "and/or" in the present invention is merely an association relationship describing the association object, and indicates that three relationships may exist, for example, a and/or B may indicate: a exists alone, A and B exist together, and B exists alone. In the present invention, the character "/" generally indicates that the front and rear related objects are an or relationship.
It should also be understood that the description of the embodiments of the present invention emphasizes the differences between the embodiments, and that the same or similar features may be referred to each other, and for brevity, will not be described in detail.
Meanwhile, it should be understood that the sizes of the respective parts shown in the drawings are not drawn in actual scale for convenience of description.
The following description of at least one exemplary embodiment is merely exemplary in nature and is in no way intended to limit the invention, its application, or uses.
Techniques, methods, and apparatus known to one of ordinary skill in the relevant art may not be discussed in detail, but where appropriate, the techniques, methods, and apparatus should be considered part of the specification.
It should be noted that: like reference numerals and letters denote like items in the following figures, and thus once an item is defined in one figure, no further discussion thereof is necessary in subsequent figures.
Embodiments of the invention are operational with numerous other general purpose or special purpose computing system environments or configurations with electronic devices, such as terminal devices, computer systems, servers, etc. Examples of well known terminal devices, computing systems, environments, and/or configurations that may be suitable for use with the terminal device, computer system, server, or other electronic device include, but are not limited to: personal computer systems, server computer systems, thin clients, thick clients, hand-held or laptop devices, microprocessor-based systems, set-top boxes, programmable consumer electronics, network personal computers, small computer systems, mainframe computer systems, and distributed cloud computing technology environments that include any of the foregoing, and the like.
Electronic devices such as terminal devices, computer systems, servers, etc. may be described in the general context of computer system-executable instructions, such as program modules, being executed by a computer system. Generally, program modules may include routines, programs, objects, components, logic, data structures, etc., that perform particular tasks or implement particular abstract data types. The computer system/server may be implemented in a distributed cloud computing environment in which tasks are performed by remote processing devices that are linked through a communications network. In a distributed cloud computing environment, program modules may be located in both local and remote computing system storage media including memory storage devices.
Exemplary System
Fig. 1 is a schematic diagram of a GIS discharge tracking system based on single photon detection according to an exemplary embodiment of the present invention. As shown in fig. 1, the GIS discharge tracking system based on single photon detection includes: the system comprises a light guide-image transmission optical fiber, an imaging objective lens, a photomultiplier, an acquisition terminal and a calculation terminal; wherein the imaging objective is connected with the light guide-image transmission optical fiber, and is arranged in a gas insulated metal enclosed switchgear (GIS) shell; one end of the light guide-image transmission optical fiber passes through a certain distance from the shell of the gas-insulated metal-enclosed switchgear, and the other end is connected with the photomultiplier; generating a pulse voltage signal after receiving photons by the photomultiplier, and transmitting the pulse voltage signal to an acquisition terminal; the acquisition terminal transmits the received pulse voltage signals to the calculation terminal; and the computing terminal performs ray tracing according to the pulse voltage signals and computes photon trajectories and light field distribution diagrams.
Preferably, the imaging objective is of quartz material.
Preferably, the operation of performing ray tracing by the computing terminal according to the pulse voltage signal includes: the calculation terminal calculates photon amplitude and wavelength according to the pulse voltage signal; and the computing terminal performs ray tracing according to the photon amplitude, the wavelength and a pre-established geometric model.
Preferably, the operation of calculating the light field distribution map by the computing terminal includes: and drawing a photon amplitude distribution diagram in a geometric model by the computing terminal according to the ray tracing result to form a photon track and a light field distribution diagram.
In the embodiment of the invention, referring to fig. 1, a GIS discharge tracking system based on single photon detection is composed of a light guide-image transmission optical fiber, an imaging objective lens, a photomultiplier, an acquisition terminal and a calculation terminal. The imaging objective lens is made of quartz, is connected with the light guide-image transmission optical fiber and is placed in the GIS shell; the optical fiber passes through a proper distance from the GIS shell, and the other end of the optical fiber is connected with the photomultiplier; the photomultiplier receives photons and then generates pulse voltage signals, the pulse voltage signals are transmitted to the acquisition terminal, and the acquisition terminal transmits the received pulse voltage signals to the calculation terminal; and the computing terminal performs ray tracing according to the pulse voltage signals and computes photon trajectories and light field distribution diagrams.
Exemplary method
Fig. 2 is a schematic flow chart of a GIS discharge tracking method based on single photon detection according to an exemplary embodiment of the present invention. As shown in fig. 2, the method includes:
s201: and the computing terminal performs geometric modeling on the gas-insulated metal-enclosed switchgear according to the real size to obtain a geometric model of the gas-insulated metal-enclosed switchgear.
S202: the imaging objective receives photons radiated by the tip defect of the gas-insulated metal-enclosed switchgear, and the photons are transmitted to the photomultiplier by the light-guiding-image-transmitting optical fiber.
S203: the photomultiplier outputs a pulse voltage signal to the acquisition terminal, and the acquisition terminal sends the pulse voltage signal to the calculation terminal.
S204: and the computing terminal performs ray tracing according to the pulse voltage signals.
Preferably, the operation of performing ray tracing according to the pulse voltage signal includes: the imaging objective lens is taken as a starting point, a path of photon movement before 1ns is reversely pushed, and surface shielding judgment and corresponding field value calculation are carried out; and reserving the current photon travelling track and amplitude, then reversely pushing a path of 1ns, carrying out surface shielding judgment and corresponding field value calculation, and terminating calculation when the photon amplitude reaches the signal to noise ratio or the reversely pushing path is larger than a preset threshold value.
Preferably, the preset threshold is 10m.
Specifically, the method performs ray tracing according to the pulse voltage signals, and specifically comprises the following steps:
(1) The imaging objective lens is taken as a starting point, a path of photon movement before 1ns is reversely pushed, and surface shielding judgment and corresponding field value calculation are carried out;
(2) Reserving the current photon advancing track and amplitude, back-pushing a path of 1ns, and carrying out surface shielding judgment and corresponding field value calculation according to the step (1):
(3) The calculation is terminated when the photon amplitude reaches a signal to noise ratio, or the back-propagation path is greater than 10m.
Preferably, the surface occlusion determination and the corresponding field value calculation comprise:
when the structure generates surface diffraction and the source point is positioned in the field of the light area, the field value function of the diffracted rays is shown as the formula (1):
wherein ,is the diffraction field vector coefficient; s is the distance between the source point and the field point; />Is a constant related to the starting diffraction point; r is R 0 Is a field point; r is R s Is the source point; k is the light propagation constant; />Is a normal vector of the curved surface at the source point; />Is the normal vector of the ray; z is the wave impedance of the medium; />M, N is a process parameter for a vector from normal.
Specifically, when the structure undergoes surface diffraction and the source point is located in the bright field, the field value function of the diffracted rays is shown in formula (1).
wherein ,Is the diffraction field vector coefficient; s is the distance between the source point and the field point; />Is a constant related to the starting diffraction point. The calculation of the relevant parameters in formula (1) is shown in Table 1, where g (ζ) and +.>The hard and soft Fuke functions, respectively.
TABLE 1 field value parameters for the field with source points in the bright region
Preferably, the surface occlusion determination and the corresponding field value calculation comprise:
when surface diffraction occurs and the source point is located in the dark field, the field value function of the diffraction field is as shown in formula (2):
wherein ,is a unit vector of a field point; s is S d1 A direction vector for the current tracking position; s is S d2 A direction vector for the next trace position; ρ is the loose focal length; phase factor s 0 And the source point R s To S d1 Is related to the distance of S due to the position of the field point in the shadow region d1 Coincides with the source point, thus s 0 =1; each component of the diffraction field side vector coefficient is shown in a formula (3);
wherein ,T5 (S d1 )、T 6 (S d1 ) H, S are process parameters, and the calculation method is shown in the following table 2; ρ is the loose focal length; z is the wave impedance of the medium;
TABLE 2
In Table 2, T (R d1 ) Is the sum of the coefficients of the vectors of the current tracking position, ρ (R d1 ) For the radius of curvature of the current tracking position, m (S d1 )＝[kρ(R d1 )/2] 1/3 /[1+T(R d1 ) 2 cos 2 (θ i )] 1/3 。
Considering the geodesic length t represented by the generalized fermat principle, the defocus distance ρ is:
wherein ,is the phase; η is the refractive index; s is S d2 A direction vector for the next trace position; ρ is the free focal length.
Specifically, when surface diffraction occurs and the source point is located in the dark field, the field value function of the diffraction field is shown in formula (2).
Phase factor (amplitude attenuation factor) s 0 And source point to S d1 Is related to the distance of S due to the position of the field point in the shadow region d1 Coincides with the source point, thus s 0 =1. The components of the side-by-side coefficients are shown in formula (3).
Considering the geodesic length t represented by the generalized fermat principle, the defocus distance ρ is:
preferably, the surface occlusion determination and the corresponding field value calculation comprise:
when edge diffraction occurs, the diffraction and reflection are considered to follow the locality principle, namely, the edge of the wedge can be regarded as the edge of a certain curved surface, and then two oblique cleavage planes are two tangent planes of the curved surface where the diffraction point is located, and the expression of the edge diffraction field is shown as formula (5):
wherein ,is the diffraction field vector coefficient; phi is the included angle between the projection of the ray around the x-axis and the x-axis on the xoy plane; phi' is the included angle between the projection of the incident ray on the xoy plane and the x axis; s is the length of the incident ray; s' is the diffracted ray length; beta 0 Is the included angle between the incident ray and the diffraction boundary; fx]As a transition function; />The calculation of a is shown in formula (6):
a＝cos(2nπN-φ-φ')+1 (6)
wherein N is the smallest integer satisfying the formula 2n_Φ+Φ' =pi.
S205: and drawing a photon amplitude distribution diagram in a geometric space of the geometric model according to the ray tracing result by the computing terminal to form a photon track and a light field distribution diagram.
Specifically, when edge diffraction occurs, diffraction and reflection are considered to follow the principle of locality, that is, the edge of the oblique wedge can be regarded as the edge of a certain curved surface, and then two oblique cleavage planes are two tangent planes of the curved surface where the diffraction point is located, and the equivalent geometric model is shown in fig. 3.
The expression of the fringe diffraction field is shown in formula (5).
wherein ,is the diffraction field vector coefficient; phi is the included angle between the projection of the ray around the x-axis and the x-axis on the xoy plane; phi' is the included angle between the projection of the incident ray on the xoy plane and the x axis; s is the length of the incident ray; s' is the diffracted ray length; beta 0 Is the included angle between the incident ray and the diffraction boundary; fx]As a transition function; />The calculation of a is shown in formula (6).
a＝cos(2nπN-φ-φ')+1 (6)
Wherein N is a minimum integer satisfying the formula (7).
2πN-φ+φ'＝π (7)
A specific embodiment of the present invention is given below in conjunction with fig. 4 and 5:
and setting the point discharge defect at the low-voltage side of the GIS low-position basin-type insulator, simulating foreign matters or particles to discharge at the bottom of the basin-type insulator due to poor mounting process, and the model and the calculation result are shown in fig. 4 and 5.
As shown in FIG. 5, the ray tracing calculation result shows that when the light source formed by discharge is positioned on the low-order basin-type insulator, the maximum radiation illuminance received by the left observation surface is 314.34W/m 2 Average irradiance of 67.33W/m 2 The maximum value is positioned around the low-level branch bus where the defect is positioned and the isolation switch tank body; the maximum radiation illuminance received by the right observation surface is 384.34W/m 2 Average irradiance of 76.44W/m 2 The maximum value is positioned at the opposite side of the maximum radiation illuminance of the left observation surface and is used as a light sourceAnd the intersection point of the scattered or diffracted light and the observation surface. The distribution of the incident rays shows that the light source cannot completely direct to the left observation surface to generate a part of dark area, so that the average radiation illuminance is smaller, the distribution range is larger, the average radiation illuminance is higher, and the discharge area is most likely to be near the area corresponding to the maximum radiation illuminance due to light refraction, reflection and diffraction.
Thus, the invention has the following beneficial effects:
(1) And the GIS state monitoring capability is improved. At present, GIS equipment lacks a high-sensitivity defect discharge monitoring means, the discharge position can be timely judged through non-single photon detection, early warning is timely carried out, an overhaul strategy is guided to be formulated, overhaul is timely carried out, and the operation reliability of the equipment is improved.
(2) And (5) reversely pushing the position of the discharge source through a ray tracing method. The single photon can effectively represent whether discharge occurs in the GIS, and through geometric modeling of the GIS, the whole process track and amplitude information from radiation to annihilation of the photon can be rapidly and effectively tracked, and rapid defect positioning is facilitated.
Therefore, the GIS discharge system and the GIS discharge method based on single photon detection can be applied to detection and maintenance of GIS equipment, and a detection device can be installed at a key position according to factors such as a GIS equipment structure and operation conditions by means of pre-implanting a plurality of optical fiber bundles, so that ultraviolet signals radiated during GIS tip defect discharge are detected. The method can be applied to the internal state observation of GIS equipment of different factories and different voltage levels, effectively improves the problems of low detection accuracy and complex operation of the traditional means, improves the maintenance efficiency, and ensures the safe and stable operation and reliable power supply of the power grid.
The basic principles of the present invention have been described above in connection with specific embodiments, however, it should be noted that the advantages, benefits, effects, etc. mentioned in the present invention are merely examples and not intended to be limiting, and these advantages, benefits, effects, etc. are not to be considered as essential to the various embodiments of the present invention. Furthermore, the specific details disclosed herein are for purposes of illustration and understanding only, and are not intended to be limiting, as the invention is not necessarily limited to practice with the above described specific details.
In this specification, each embodiment is described in a progressive manner, and each embodiment is mainly described in a different manner from other embodiments, so that the same or similar parts between the embodiments are mutually referred to. For system embodiments, the description is relatively simple as it essentially corresponds to method embodiments, and reference should be made to the description of method embodiments for relevant points.
The foregoing description has been presented for purposes of illustration and description. Furthermore, this description is not intended to limit embodiments of the invention to the form disclosed herein. Although a number of example aspects and embodiments have been discussed above, a person of ordinary skill in the art will recognize certain variations, modifications, alterations, additions, and subcombinations thereof.
Claims (10)
1. A GIS discharge tracking system based on single photon detection, comprising: the system comprises a light guide-image transmission optical fiber, an imaging objective lens, a photomultiplier, an acquisition terminal and a calculation terminal; wherein the method comprises the steps of
The imaging objective is connected with the light guide-image transmission optical fiber and is placed in the shell of the gas-insulated metal-enclosed switchgear;
one end of the light guide-image transmission optical fiber passes through a certain distance from the shell of the gas-insulated metal-enclosed switchgear, and the other end is connected with the photomultiplier;
generating a pulse voltage signal after receiving photons by the photomultiplier, and transmitting the pulse voltage signal to an acquisition terminal;
the acquisition terminal transmits the received pulse voltage signals to the calculation terminal;
and the computing terminal performs ray tracing according to the pulse voltage signals and computes photon trajectories and light field distribution diagrams.
2. The system of claim 1, wherein the imaging objective is quartz.
3. The system of claim 1, wherein the operation of the computing terminal for ray tracing from the pulsed voltage signal comprises:
the calculation terminal calculates photon amplitude and wavelength according to the pulse voltage signal;
and the computing terminal performs ray tracing according to the photon amplitude, the wavelength and a pre-established geometric model.
4. A system according to claim 3, wherein the operation of the computing terminal to calculate the light field profile comprises:
and drawing a photon amplitude distribution diagram in a geometric model by the computing terminal according to the ray tracing result to form a photon track and a light field distribution diagram.
5. The GIS discharge tracking method based on single photon detection is characterized by comprising the following steps of:
the computing terminal carries out geometric modeling on the gas-insulated metal-enclosed switchgear according to the real size to obtain a geometric model of the gas-insulated metal-enclosed switchgear, wherein the geometric model is used for judging whether a photon track is shielded, and when the photon track is shielded, whether reflection and diffraction occur is judged according to the geometric model;
the imaging objective receives the radiation photons of the tip defect of the gas-insulated metal-enclosed switchgear, and the photons are transmitted to the photomultiplier by the light guide-image transmission optical fiber;
the photomultiplier outputs a pulse voltage signal to the acquisition terminal, and the acquisition terminal sends the pulse voltage signal to the calculation terminal;
the computing terminal performs ray tracing according to the pulse voltage signals;
and drawing a photon amplitude distribution diagram in a geometric space of the geometric model according to the ray tracing result by the computing terminal to form a photon track and a light field distribution diagram.
6. The method of claim 5, wherein the operation of the computing terminal for ray tracing from the pulsed voltage signal comprises:
the imaging objective lens is taken as a starting point, a path of photon movement before 1ns is reversely pushed, and surface shielding judgment and corresponding field value calculation are carried out;
keeping the current photon travelling track and amplitude, then reversely pushing a path of 1ns, and carrying out surface shielding judgment and corresponding field value calculation;
and stopping calculation when the photon amplitude reaches the signal-to-noise ratio or the reverse-push path is larger than a preset threshold value.
7. The method of claim 6, wherein the predetermined threshold is 10m.
8. The method of claim 6, wherein the surface occlusion determination and the calculation of the corresponding field value comprise:
when the structure generates surface diffraction and the source point is positioned in the field of the light area, the field value function of the diffracted rays is shown as the formula (1):
wherein ,is the diffraction field vector coefficient; s is the distance between the source point and the field point; />Is a constant related to the starting diffraction point; r is R 0 Is a field point; r is R s Is the source point; k is the light propagation constant; />Is a normal vector of the curved surface at the source point; />Is the normal vector of the ray; z is the wave impedance of the medium; />To be from the normal directionVector M, N is a process parameter.
9. The method of claim 6, wherein the surface occlusion determination and the calculation of the corresponding field value comprise:
when surface diffraction occurs and the source point is located in the dark field, the field value function of the diffraction field is as shown in formula (2):
wherein ,is a unit vector of a field point; s is S d1 A direction vector for the current tracking position; s is S d2 A direction vector for the next trace position; ρ is the loose focal length; phase factor s 0 And the source point R s To S d1 Is related to the distance of S due to the position of the field point in the shadow region d1 Coincides with the source point, thus s 0 =1; each component of the diffraction field side vector coefficient is shown in a formula (3);
wherein ,T5 (S d1 )、T 6 (S d1 ) Both H, S are process parameters; ρ is the loose focal length; z is the wave impedance of the medium;
considering the geodesic length t represented by the generalized fermat principle, the defocus distance ρ is:
wherein ,is the phase; η is the refractive index; s is S d2 A direction vector for the next trace position; ρ is the free focal length.
10. The method of claim 6, wherein the surface occlusion determination and the calculation of the corresponding field value comprise:
when edge diffraction occurs, the diffraction and reflection are considered to follow the locality principle, namely, the edge of the wedge can be regarded as the edge of a certain curved surface, and then two oblique cleavage planes are two tangent planes of the curved surface where the diffraction point is located, and the expression of the edge diffraction field is shown as formula (5):
wherein ,is the diffraction field vector coefficient; phi is the included angle between the projection of the ray around the x-axis and the x-axis on the xoy plane; phi' is the included angle between the projection of the incident ray on the xoy plane and the x axis; s is the length of the incident ray; s' is the diffracted ray length; beta 0 Is the included angle between the incident ray and the diffraction boundary; fx]As a transition function; />The calculation of a is shown in formula (6):
a＝cos(2nπN-φ-φ')+1 (6)
wherein N is the smallest integer satisfying the formula 2n_Φ+Φ' =pi.
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