CN116695194A - Production process for chromium plating - Google Patents
Production process for chromium plating Download PDFInfo
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- CN116695194A CN116695194A CN202310600488.0A CN202310600488A CN116695194A CN 116695194 A CN116695194 A CN 116695194A CN 202310600488 A CN202310600488 A CN 202310600488A CN 116695194 A CN116695194 A CN 116695194A
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- electroplating
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- 238000007747 plating Methods 0.000 title claims abstract description 63
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 title claims abstract description 49
- 229910052804 chromium Inorganic materials 0.000 title claims abstract description 43
- 239000011651 chromium Substances 0.000 title claims abstract description 43
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 14
- 238000009713 electroplating Methods 0.000 claims abstract description 57
- 238000000034 method Methods 0.000 claims abstract description 40
- 239000002270 dispersing agent Substances 0.000 claims abstract description 35
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 claims abstract description 33
- 230000008569 process Effects 0.000 claims abstract description 28
- 239000002202 Polyethylene glycol Substances 0.000 claims abstract description 18
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims abstract description 18
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims abstract description 18
- 229920001223 polyethylene glycol Polymers 0.000 claims abstract description 18
- 238000003756 stirring Methods 0.000 claims abstract description 16
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 claims abstract description 15
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims abstract description 13
- LJAOOBNHPFKCDR-UHFFFAOYSA-K chromium(3+) trichloride hexahydrate Chemical compound O.O.O.O.O.O.[Cl-].[Cl-].[Cl-].[Cr+3] LJAOOBNHPFKCDR-UHFFFAOYSA-K 0.000 claims abstract description 13
- 239000007788 liquid Substances 0.000 claims abstract description 13
- 239000000178 monomer Substances 0.000 claims abstract description 13
- 125000003396 thiol group Chemical class [H]S* 0.000 claims abstract description 13
- 238000005406 washing Methods 0.000 claims abstract description 11
- 239000008139 complexing agent Substances 0.000 claims abstract description 10
- 239000002994 raw material Substances 0.000 claims abstract description 9
- 150000003841 chloride salts Chemical class 0.000 claims abstract description 8
- 238000001035 drying Methods 0.000 claims abstract description 6
- 239000006172 buffering agent Substances 0.000 claims abstract description 5
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims description 12
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 claims description 12
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 claims description 12
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 claims description 8
- 239000004327 boric acid Substances 0.000 claims description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 7
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 claims description 6
- 235000019253 formic acid Nutrition 0.000 claims description 6
- 239000011780 sodium chloride Substances 0.000 claims description 6
- 238000005238 degreasing Methods 0.000 claims description 5
- 239000000872 buffer Substances 0.000 claims description 4
- 239000001103 potassium chloride Substances 0.000 claims description 4
- 235000011164 potassium chloride Nutrition 0.000 claims description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims description 2
- 125000005619 boric acid group Chemical group 0.000 claims description 2
- 238000006243 chemical reaction Methods 0.000 abstract description 6
- 229910001385 heavy metal Inorganic materials 0.000 abstract description 3
- 230000001988 toxicity Effects 0.000 abstract description 3
- 231100000419 toxicity Toxicity 0.000 abstract description 3
- 239000000243 solution Substances 0.000 description 21
- 230000000052 comparative effect Effects 0.000 description 7
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- PXQLVRUNWNTZOS-UHFFFAOYSA-N sulfanyl Chemical class [SH] PXQLVRUNWNTZOS-UHFFFAOYSA-N 0.000 description 5
- 238000004321 preservation Methods 0.000 description 4
- 230000009471 action Effects 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 239000003792 electrolyte Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 2
- 230000004075 alteration Effects 0.000 description 2
- JOPOVCBBYLSVDA-UHFFFAOYSA-N chromium(6+) Chemical compound [Cr+6] JOPOVCBBYLSVDA-UHFFFAOYSA-N 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000004070 electrodeposition Methods 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 239000012085 test solution Substances 0.000 description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- 229910000978 Pb alloy Inorganic materials 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000036541 health Effects 0.000 description 1
- 238000005805 hydroxylation reaction Methods 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000011056 performance test Methods 0.000 description 1
- -1 potassium ferricyanide Chemical compound 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
- C25D3/06—Electroplating: Baths therefor from solutions of chromium from solutions of trivalent chromium
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/42—Block-or graft-polymers containing polysiloxane sequences
- C08G77/46—Block-or graft-polymers containing polysiloxane sequences containing polyether sequences
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K23/00—Use of substances as emulsifying, wetting, dispersing, or foam-producing agents
- C09K23/54—Silicon compounds
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
- C25D3/10—Electroplating: Baths therefor from solutions of chromium characterised by the organic bath constituents used
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/20—Recycling
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Metallurgy (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Abstract
The invention discloses a production process for chrome plating, which belongs to the technical field of electroplating and comprises the following steps: 1) Pre-treating plating pieces; 2) Preparing electroplating liquid; the electroplating solution comprises the following raw materials: chromium trichloride hexahydrate, a complexing agent, chloride salt, a buffering agent, a dispersing agent, N-dimethylformamide and ferric trichloride; the dispersing agent is prepared through the following steps: adding mercapto polyethylene glycol carboxyl and octavinyl POSS monomer into toluene, adding triethylamine, keeping the temperature unchanged after the addition, and stirring for reaction to obtain a dispersing agent; 3) Placing the plating piece into electroplating liquid for electroplating; 4) And (3) washing, drying and insulating the electroplated part. Trivalent chromium is selected as a raw material, so that toxicity and heavy metal pollution are reduced; in order to alleviate the problem that pinholes and cracks are easy to appear in a plated part in the electroplating process, a self-made dispersing agent is added into the electroplating solution, so that the surface tension of the electroplating solution is reduced, and pinholes and cracks of a plating layer are reduced.
Description
Technical Field
The invention belongs to the technical field of electroplating, and particularly relates to a production process for chromium plating.
Background
The chromium plating is performed by taking chromium as a plating layer to be plated on other metals, the chromium plating layer has high hardness, the chromium plating layer has better heat resistance, the glossiness and the hardness of the chromium plating layer are not obviously changed when the chromium plating layer is heated below 500 ℃, the oxidation discoloration is started when the temperature is higher than 500 ℃, and the hardness is reduced when the temperature is higher than 700 ℃. The chrome plating layer has a small coefficient of friction, particularly a dry coefficient of friction, which is the lowest among all metals. The chrome plating layer has excellent wear resistance.
According to different electrolytes, the chromium plating process is divided into a hexavalent chromium process and a trivalent chromium process, an anode adopts insoluble lead alloy in the hexavalent chromium electroplating process, a large amount of oxygen is generated at the anode, a large amount of hydrogen is generated at the cathode, the generated gas is released in a bubble form, chromium-containing liquid drops can be carried in the releasing process to form 'chromium fog', the release of the chromium fog can cause the loss of chromic anhydride to cause heavy metal pollution, and the chromium fog has strong corrosiveness and seriously affects the physical health of workshop personnel. When trivalent chromium is used as electrolyte, toxicity is low, but pinholes and cracks are easy to appear in a plating piece in the electroplating process, and the quality of the plating piece is affected.
Disclosure of Invention
The invention aims to provide a production process for chromium plating, which aims to solve the problem of unstable quality of a plated part when trivalent chromium is used as an electrolyte.
The aim of the invention can be achieved by the following technical scheme:
a process for the production of chromium plating comprising the steps of:
1) Pre-treating plating pieces;
2) Preparing electroplating liquid; the electroplating solution comprises the following raw materials:
chromium trichloride hexahydrate, a complexing agent, chloride salt, a buffering agent, a dispersing agent, N-dimethylformamide and ferric trichloride; ferric trichloride is added in the electroplating solution, the ferric trichloride has higher reduction potential, the hydrogen evolution condition of a cathode in the electroplating process can be reduced, and compared with the scheme of adding iron powder, the method has the advantages that the local concentration is not too high, and the color of a chromium layer is not affected.
The dispersing agent is prepared through the following steps: adding mercapto polyethylene glycol carboxyl and octavinyl POSS monomer into toluene, setting the temperature at 40 ℃, adding triethylamine, keeping the temperature unchanged after the addition, stirring and reacting for 4-5h, and obtaining a dispersing agent after the reaction is finished; the dispersion liquid has acidity and oxidability, and the conventional organic dispersing agent cannot exist in the plating liquid stably, so that the dispersing agent is prepared by taking mercapto polyethylene glycol carboxyl and octavinyl POSS monomers as raw materials, belongs to a macromolecular surfactant, has strong three-dimensional rigidity due to the fact that the dispersing agent contains POSS in the structure, and has good stability in the plating liquid.
3) Placing the plating piece into electroplating liquid for electroplating;
4) Washing, drying and insulating the electroplated part: heat preservation treatment is carried out at 70-80 ℃ for 20-30 min.
Further, the molecular weight of the mercapto polyethylene glycol carboxyl is 2000, and the dosage mass ratio of the mercapto polyethylene glycol carboxyl, triethylamine and octavinyl POSS monomer is 20:1:6.
further, the pretreatment process of the plating piece comprises the following steps: removing wax, degreasing and washing with water.
Further, the plating is a vehicle component.
Further, the current density during electroplating is 20-30A/dm 2 The method comprises the steps of carrying out a first treatment on the surface of the The electroplating time is 4-6min, and the electroplating temperature is 30-40 ℃.
Further, the plating solution is prepared by the steps of:
step a, setting the temperature to 55-60 ℃, adding chloride and buffer into water, stirring and dispersing, and then adding into chromium trichloride hexahydrate to obtain premix;
step b, adding complexing agent, dispersing agent, N-dimethylformamide and ferric trichloride into the premix; stirring for 3-4h, and standing for 12h to obtain the electroplating solution.
Further, in the plating solution: 90-120g/L of chromium trichloride hexahydrate, 10-20g/L of complexing agent, 200-250g/L of chloride salt, 60-80g/L of buffering agent, 10-12g/L, N of dispersing agent, 0.3-0.5g/L of N-dimethylformamide and 0.05-0.1g/L of ferric trichloride.
Further, the chloride salt is one of sodium chloride and potassium chloride.
Further, the complexing agent is one of formic acid and acetic acid. The addition of the complexing agent can improve the dispersivity of the trivalent chromium, prevent the hydroxylation reaction of the trivalent chromium, and improve the contact effect of the trivalent chromium and the electrode surface by matching with the dispersing agent, so that the trivalent chromium has higher deposition speed
Further, the buffer is boric acid.
The invention has the beneficial effects that:
the invention provides a production process for chromium plating, which adopts trivalent chromium as a raw material, so that toxicity is reduced, and heavy metal pollution is reduced; in order to alleviate the problem that pinholes and cracks are easy to appear in electroplated parts in the electroplating process, a self-made dispersing agent is added into the electroplating solution, so that the surface tension of the electroplating solution is reduced, and pinholes and cracks of a plating layer are reduced.
The dispersing agent is prepared from mercapto polyethylene glycol carboxyl and octavinyl POSS monomers serving as raw materials, belongs to a macromolecular dispersing agent, and has the structure that POSS in the structure is a nanoscale organic-inorganic hybrid material, the surface activity of the POSS is strongly adsorbed on the surface of a plated part, and the dispersing agent not only can be used as a disperse phase, but also can serve as a crystallization element in the electroplating process, and can change the composition of a plating layer to form a non-porous plating layer, so that the performance of the plating layer is improved, the corrosion resistance and the wear resistance of the plating layer are improved, the distribution of the plating layer is more uniform, and the binding force between the plating layer and the plated part is improved.
Detailed Description
The technical solutions of the embodiments of the present invention will be clearly and completely described below in conjunction with the embodiments of the present invention, and it is apparent that the described embodiments are only some embodiments of the present invention, not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
Example 1
The embodiment provides an electroplating solution, which is prepared by the following steps:
step a, setting the temperature to 55 ℃, adding sodium chloride and boric acid into water, stirring and dispersing, and then adding into chromium trichloride hexahydrate to obtain a premix;
step b, adding formic acid, a dispersing agent, N-dimethylformamide and ferric trichloride into the premix; stirring for 3h, and standing for 12h to obtain the electroplating solution.
In the electroplating solution: 90g/L of chromium trichloride hexahydrate, 10g/L of formic acid, 200g/L of sodium chloride, 60g/L of boric acid, 10g/L, N of dispersing agent, 0.3g/L of N-dimethylformamide and 0.05g/L of ferric trichloride;
the dispersant is prepared by the following steps:
adding sulfhydryl polyethylene glycol carboxyl and octavinyl POSS monomer into toluene, setting the temperature to 40 ℃, adding triethylamine, keeping the temperature unchanged after the addition, stirring and reacting for 4 hours, and obtaining the dispersing agent after the reaction is finished, wherein the molecular weight of the sulfhydryl polyethylene glycol carboxyl is 2000, and the dosage mass ratio of the sulfhydryl polyethylene glycol carboxyl, the triethylamine and the octavinyl POSS monomer is 20:1:6.
example 2
The embodiment provides an electroplating solution, which is prepared by the following steps:
step a, setting the temperature to 55 ℃, adding sodium chloride and boric acid into water, stirring and dispersing, and then adding into chromium trichloride hexahydrate to obtain a premix;
step b, adding formic acid, a dispersing agent, N-dimethylformamide and ferric trichloride into the premix; stirring for 4 hours, and standing for 12 hours to obtain the electroplating solution.
In the electroplating solution: 110g/L of chromium trichloride hexahydrate, 15g/L of formic acid, 230g/L of chloride salt, 70g/L of boric acid, 12g/L, N of dispersing agent, 0.5g/L of N-dimethylformamide and 0.1g/L of ferric trichloride;
the dispersant is prepared by the following steps:
adding sulfhydryl polyethylene glycol carboxyl and octavinyl POSS monomer into toluene, setting the temperature to 40 ℃, adding triethylamine, keeping the temperature unchanged after the addition, stirring and reacting for 5 hours, and obtaining the dispersing agent after the reaction is finished, wherein the molecular weight of the sulfhydryl polyethylene glycol carboxyl is 2000, and the dosage mass ratio of the sulfhydryl polyethylene glycol carboxyl, the triethylamine and the octavinyl POSS monomer is 20:1:6.
example 3
The embodiment provides an electroplating solution, which is prepared by the following steps:
step a, setting the temperature to 60 ℃, adding potassium chloride and boric acid into water, stirring and dispersing, and then adding the mixture into chromium trichloride hexahydrate to obtain a premix;
step b, adding acetic acid, a dispersing agent, N-dimethylformamide and ferric trichloride into the premix; stirring for 4 hours, and standing for 12 hours to obtain the electroplating solution.
In the electroplating solution: 120g/L of chromium trichloride hexahydrate, 20g/L of acetic acid, 250g/L of potassium chloride, 80g/L of boric acid, 12g/L, N of dispersing agent, 0.5g/L of N-dimethylformamide and 0.1g/L of ferric trichloride;
the dispersant is prepared by the following steps:
adding sulfhydryl polyethylene glycol carboxyl and octavinyl POSS monomer into toluene, setting the temperature to 40 ℃, adding triethylamine, keeping the temperature unchanged after the addition, stirring and reacting for 5 hours, and obtaining the dispersing agent after the reaction is finished, wherein the molecular weight of the sulfhydryl polyethylene glycol carboxyl is 2000, and the dosage mass ratio of the sulfhydryl polyethylene glycol carboxyl, the triethylamine and the octavinyl POSS monomer is 20:1:6.
comparative example 1
In this comparative example, the dispersant was replaced with perfluoroalkylpolyoxyethylene ether sulfonic acid as in example 2, and the remaining raw materials and the production process were the same as in example 2.
Example 4
A process for the production of chromium plating comprising the steps of:
1) Pre-treating plating parts: removing wax, degreasing and washing;
2) Preparing a plating solution according to the method of example 1;
3) Placing the piston rod into electroplating liquid for electroplating; the current density during electroplating was 30A/dm 2 The method comprises the steps of carrying out a first treatment on the surface of the The electroplating time is 5mi < n >, and the electroplating temperature is 30 ℃;
4) Washing, drying and insulating the electroplated part: and (5) heat preservation treatment for 30min at 70 ℃.
Example 5
A process for the production of chromium plating comprising the steps of:
1) Pre-treating plating parts: removing wax, degreasing and washing;
2) Preparing a plating solution according to the method of example 2;
3) Placing the piston rod into electroplating liquid for electroplating; the current density during electroplating was 30A/dm 2 The method comprises the steps of carrying out a first treatment on the surface of the The electroplating time is 5mi < n >, and the electroplating temperature is 30 ℃;
4) Washing, drying and insulating the electroplated part: and (5) heat preservation treatment for 30min at 70 ℃.
Example 6
A process for the production of chromium plating comprising the steps of:
1) Pre-treating plating parts: removing wax, degreasing and washing;
2) Preparing a plating solution according to the method of example 3;
3) Placing the piston rod into electroplating liquid for electroplating; the current density during electroplating was 30A/dm 2 The method comprises the steps of carrying out a first treatment on the surface of the The electroplating time is 5mi < n >, and the electroplating temperature is 30 ℃;
4) Washing, drying and insulating the electroplated part: heat preservation is carried out for 20min at 80 ℃.
Comparative example 2
In this comparative example, the plating solution was changed to the sample prepared in comparative example 1, and the remaining raw materials and the preparation process were the same as in example 6.
Performance tests were performed on the samples prepared in examples 4-6 and comparative example 2;
cross-sectional microhardness (HV) was measured using an FM-700 semi-automatic digital microhardness system, 10 hardness values were measured for each sample, and averaged. The load was 25g and the holding time was 15s, the average chromium electrodeposition rate/(μm/min) =chromium layer thickness/time.
Wear loss measurement: the rotating speed is selected to be 200 r/min, the loading load is 60N, the mass measurement is carried out on the sample at 200 min, the abrasion loss is calculated, and the total rotating speed of the friction pair is 4 ten thousand revolutions; weighing was performed.
And (3) checking the porosity of the coating: and (3) adopting a filter paper pasting method for inspection, if the coating has pores or cracks, generating chemical reaction between the inspection test solution and the matrix metal or the middle coating through the pores or cracks, generating a compound with obvious chromatic aberration with the coating, and penetrating the compound onto the filter paper to enable the compound to present colored spots, and then evaluating the porosity of the coating according to the number of the spots on the filter paper. The components of the used test solution are as follows: 10g/L of potassium ferricyanide, 30g/L of ammonium chloride and 60g/L of sodium chloride. The calculation formula of the plating layer porosity is as follows: porosity=n/S (individual/cm 2 )。
The results are shown in Table 1:
TABLE 1
| Project | Example 4 | Example 5 | Example 6 | Comparative example 2 |
| Chromium layer thickness (μm) | 0.54 | 0.56 | 0.57 | 0.50 |
| Hardness (HV) | 1185 | 1192 | 1189 | 1080 |
| Average chromium electrodeposition Rate (μm/min) | 0.108 | 0.112 | 0.114 | 0.100 |
| Loss weight of mill (mg) | 1.07 | 1.01 | 1.02 | 2.31 |
| Porosity (units/cm) 2 ) | 0.09 | 0.05 | 0.08 | 0.19 |
As can be seen from Table 1, the chromium plating process of the present invention has a high deposition rate, and the samples prepared by the chromium plating process of the present invention have high hardness and better wear resistance.
It is noted that relational terms such as first and second, and the like are used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Moreover, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus.
Although embodiments of the present invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made therein without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.
Claims (10)
1. A process for the production of chromium plating, characterized by the steps of:
1) Pre-treating plating pieces;
2) Preparing electroplating liquid; the electroplating solution comprises the following raw materials: chromium trichloride hexahydrate, a complexing agent, chloride salt, a buffering agent, a dispersing agent, N-dimethylformamide and ferric trichloride; the dispersing agent is prepared through the following steps: adding mercapto polyethylene glycol carboxyl and octavinyl POSS monomer into toluene, setting the temperature at 40 ℃, adding triethylamine, keeping the temperature unchanged after the addition, and stirring for reacting for 4-5h to obtain a dispersing agent;
3) Placing the plating piece into electroplating liquid for electroplating;
4) And (3) washing, drying and insulating the electroplated part.
2. The process for producing chrome plating according to claim 1, wherein the molecular weight of the mercapto polyethylene glycol carboxyl is 2000, and the mass ratio of the mercapto polyethylene glycol carboxyl, triethylamine and octavinyl POSS monomer is 20:1:6.
3. a process for the production of chromium plating according to claim 1, wherein the pretreatment of the plated article comprises: removing wax, degreasing and washing with water.
4. A process for producing chromium plating according to claim 1, wherein said plated member is a vehicle part.
5. A process for producing chromium plating according to claim 1, wherein the current density at the time of electroplating is 20-30A/dm 2 The method comprises the steps of carrying out a first treatment on the surface of the The electroplating time is 4-6min, and the electroplating temperature is 30-40 ℃.
6. The process for producing chrome plating according to claim 1, wherein the plating solution is prepared by:
step a, setting the temperature to 55-60 ℃, adding chloride and buffer into water, stirring and dispersing, and then adding into chromium trichloride hexahydrate to obtain premix;
step b, adding complexing agent, dispersing agent, N-dimethylformamide and ferric trichloride into the premix; stirring for 3-4h, and standing for 12h to obtain the electroplating solution.
7. The process for producing chromium plating according to claim 1, wherein, in said plating solution: 90-120g/L of chromium trichloride hexahydrate, 10-20g/L of complexing agent, 200-250g/L of chloride salt, 60-80g/L of buffering agent, 10-12g/L, N of dispersing agent, 0.3-0.5g/L of N-dimethylformamide and 0.05-0.1g/L of ferric trichloride.
8. The process for producing chromium plating according to claim 1, wherein said chloride salt is one of sodium chloride and potassium chloride.
9. The process for producing chromium plating according to claim 1, wherein the complexing agent is one of formic acid and acetic acid.
10. A production process for chrome plating according to claim 1, wherein the buffer is boric acid.
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105063676A (en) * | 2015-08-17 | 2015-11-18 | 内蒙古第一机械集团有限公司 | Method for electroplating hard chromium by using trivalent chromium |
| CN105670004A (en) * | 2016-01-19 | 2016-06-15 | 武汉纺织大学 | Preparation method of POSS (polyhedral oligomeric silsesquioxane)-based nanohybrid micelles |
| CN112226791A (en) * | 2020-10-26 | 2021-01-15 | 厦门市金宝源实业有限公司 | Trivalent chromium plating solution, preparation method thereof and trivalent chromium plating method |
| US20210172081A1 (en) * | 2017-12-13 | 2021-06-10 | Jcu Corporation | Trivalent chromium plating solution and method for chromium-plating using same |
| CN114411211A (en) * | 2022-01-20 | 2022-04-29 | 厦门市金宝源实业有限公司 | Stainless steel color imitation decorative chromium plating process |
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Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105063676A (en) * | 2015-08-17 | 2015-11-18 | 内蒙古第一机械集团有限公司 | Method for electroplating hard chromium by using trivalent chromium |
| CN105670004A (en) * | 2016-01-19 | 2016-06-15 | 武汉纺织大学 | Preparation method of POSS (polyhedral oligomeric silsesquioxane)-based nanohybrid micelles |
| US20210172081A1 (en) * | 2017-12-13 | 2021-06-10 | Jcu Corporation | Trivalent chromium plating solution and method for chromium-plating using same |
| CN112226791A (en) * | 2020-10-26 | 2021-01-15 | 厦门市金宝源实业有限公司 | Trivalent chromium plating solution, preparation method thereof and trivalent chromium plating method |
| CN114411211A (en) * | 2022-01-20 | 2022-04-29 | 厦门市金宝源实业有限公司 | Stainless steel color imitation decorative chromium plating process |
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