CN116673325A - Preparation method and system of non-oriented silicon steel ultrathin strip, electronic equipment and medium - Google Patents

Preparation method and system of non-oriented silicon steel ultrathin strip, electronic equipment and medium Download PDF

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Publication number
CN116673325A
CN116673325A CN202310664958.XA CN202310664958A CN116673325A CN 116673325 A CN116673325 A CN 116673325A CN 202310664958 A CN202310664958 A CN 202310664958A CN 116673325 A CN116673325 A CN 116673325A
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pass
silicon steel
rolling
oriented silicon
strip
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王吉
李中奎
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Yantai Advanced Materials And Green Manufacturing Shandong Laboratory
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Yantai Advanced Materials And Green Manufacturing Shandong Laboratory
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B21MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21BROLLING OF METAL
    • B21B1/00Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations
    • B21B1/22Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations for rolling plates, strips, bands or sheets of indefinite length
    • B21B1/222Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations for rolling plates, strips, bands or sheets of indefinite length in a rolling-drawing process; in a multi-pass mill
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B21MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21BROLLING OF METAL
    • B21B1/00Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations
    • B21B1/22Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations for rolling plates, strips, bands or sheets of indefinite length
    • B21B2001/221Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations for rolling plates, strips, bands or sheets of indefinite length by cold-rolling

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Metal Rolling (AREA)

Abstract

The invention discloses a preparation method, a system, electronic equipment and a medium of a non-oriented silicon steel ultrathin strip, and relates to the technical field of plate and strip rolling. Carrying out multi-pass asynchronous cold rolling on the non-oriented silicon steel strip until the thickness of the non-oriented silicon steel strip reaches the target thickness to obtain a rolled non-oriented silicon steel extremely-thin strip with the target thickness; annealing is not needed in the multi-pass asynchronous cold rolling process, and the speed ratio and the front tension of each pass meet the set conditions so as to meet the first condition or the second condition; the first condition is that all the rolling deformation areas of each pass are rubbing rolling areas, the second condition is that the front sliding areas in the rolling deformation areas of each pass disappear, and the deformation areas consist of rubbing rolling areas and rear sliding areas; degreasing the rolled non-oriented silicon steel ultrathin strip with the target thickness, and then carrying out bright annealing through a continuous annealing furnace to obtain the non-oriented silicon steel ultrathin strip. The invention can prepare the non-oriented silicon steel ultrathin strip with high magnetic induction, low iron loss and high strength.

Description

Preparation method and system of non-oriented silicon steel ultrathin strip, electronic equipment and medium
Technical Field
The invention relates to the technical field of plate and strip rolling, in particular to a preparation method, a system, electronic equipment and a medium of a non-oriented silicon steel ultrathin strip.
Background
The non-oriented silicon steel used in the emerging industries such as new energy automobiles, intelligent robots and the like is required to have thinner thickness, high magnetic induction intensity, low iron loss at medium-high frequency and high intensity so as to adapt to the development of motors in the directions of light weight, miniaturization, high efficiency and high speed. The reduction of the thickness of the silicon steel strip is one of the most effective means for reducing the iron loss of the non-oriented silicon steel under the medium-high frequency condition, but in the existing preparation method of the non-oriented silicon steel, when the silicon steel strip is thinned to a certain thickness (0.1 mm), the silicon steel strip has high magnetic induction intensity, the crystal grains cannot be too small, and the silicon steel strip needs to have proper size, so that the number of crystal grain layers in the thickness direction of the non-oriented silicon steel strip is reduced, and even a plurality of single-layer crystals appear, thereby reducing the strength of the silicon steel strip. Therefore, a processing and manufacturing technology for enabling the non-oriented silicon steel ultrathin belt to have high magnetic induction, low iron loss and high strength is needed.
Disclosure of Invention
The invention aims to provide a preparation method, a system, electronic equipment and a medium for a non-oriented silicon steel ultrathin strip, which can be used for preparing the non-oriented silicon steel ultrathin strip with high magnetic induction, low iron loss and high strength.
In order to achieve the above object, the present invention provides the following solutions:
a preparation method of a non-oriented silicon steel ultrathin strip comprises the following steps:
carrying out multi-pass asynchronous cold rolling on the non-oriented silicon steel strip until the thickness of the non-oriented silicon steel strip reaches the target thickness to obtain a rolled non-oriented silicon steel extremely-thin strip with the target thickness; annealing is not needed in the multi-pass asynchronous cold rolling process, and the speed ratio and the front tension of each pass meet the set conditions so as to meet the first condition or the second condition; the first condition is that all the rolling deformation areas of each pass are rubbing rolling areas, the second condition is that the front sliding areas in the rolling deformation areas of each pass disappear, and the deformation areas consist of rubbing rolling areas and rear sliding areas; the non-oriented silicon steel strip during the first-pass asynchronous cold rolling is an annealed non-oriented silicon steel strip, the non-oriented silicon steel strip during the nth-pass asynchronous cold rolling is a non-oriented silicon steel strip obtained after the nth-1-pass asynchronous cold rolling, and n is a positive integer greater than 1;
degreasing the rolled non-oriented silicon steel ultrathin strip with the target thickness, and then carrying out bright annealing through a continuous annealing furnace to obtain the non-oriented silicon steel ultrathin strip.
Optionally, the multi-pass asynchronous cold rolling is performed on the non-oriented silicon steel strip until the thickness of the non-oriented silicon steel strip reaches the target thickness to obtain the non-oriented silicon steel ultrathin strip with the target thickness after rolling, which specifically comprises the following steps:
determining the average plane deformation resistance of the unoriented silicon steel strip in each pass deformation zone according to the work hardening curve of the unoriented silicon steel strip in the annealed state and the reduction rate of each pass; in the multi-pass asynchronous cold rolling process, the rolling reduction rate of each pass is less than 15%, and the total rolling reduction rate of all passes is 80-98%;
for any one pass, determining the maximum engineering allowable tension of the pass and the expected post-tension of the pass according to the average plane deformation resistance of the unoriented silicon steel strip in the pass deformation zone;
calculating critical front tension of a rolling deformation zone of the pass based on the expected back tension of the pass, wherein the critical front tension is formed by the rolling deformation zone of the pass;
if the critical pre-tension of all the rolling deformation areas of the pass is smaller than the maximum engineering allowable tension of the pass, the value range of the different speed ratio of the pass satisfies the formula i not less than i c2 And the range of the front tension of the pass meets the formula sigma f ≥σ fc Wherein i represents the different speed ratio of the pass, i c2 Represents the critical differential speed ratio sigma of the rolling deformation zone of the pass f Representing the pre-tension, sigma, of the pass fc Representing critical pre-tension in a rolling deformation zone of the pass to be a rubbing zone;
if the critical pre-tension of all the rolling deformation areas of the pass is greater than or equal to the maximum engineering allowable tension of the pass, the value range of the different speed ratio of the pass satisfies the formula i not less than i c1 And the range of the front tension of the pass meets the formula sigma f <σ max Wherein i is c1 Representing critical speed ratio, sigma, of the deformation zone formed by the rubbing zone and the post-rolling zone, which causes the forward sliding zone to disappear in the rolling deformation zone of the pass max Representing the maximum engineering allowable tension of the pass;
and carrying out multi-pass asynchronous cold rolling on the non-oriented silicon steel strip according to the expected post-tension, the value range of the different speed ratio and the value range of the pre-tension of each pass until the thickness of the non-oriented silicon steel strip reaches the target thickness to obtain the rolled non-oriented silicon steel extremely-thin strip with the target thickness.
Optionally, the determining process of the critical speed ratio of all the rolling deformation areas of the pass to be the rubbing rolling area is as follows:
according to the formulaCalculating critical speed ratios for enabling all rolling deformation areas of the pass to be rubbing rolling areas, wherein H represents the thickness of the unoriented silicon steel strip before the pass is rolled, H represents the thickness of the unoriented silicon steel strip after the pass is rolled, and R 1 Represents the radius of the first work roll, R 2 Represents the radius of the second work roll and epsilon represents the reduction of the unoriented silicon steel strip in the pass.
Optionally, the determining process of calculating the critical pre-tension of the rolling deformation area of the pass to be the rubbing area based on the expected post-tension of the pass is as follows:
according to the formulaCalculating critical pre-tension for making all rolling deformation areas of the pass be rubbing rolling areas, wherein sigma b Representing the expected post-tension, delta, of the pass 2 Represents an intermediate variable, and K represents the average plane deformation resistance of the unoriented silicon steel strip in the pass deformation zone.
Optionally, the determining process of the critical speed difference ratio that the front sliding region disappears in the rolling deformation region and the deformation region consists of the rubbing rolling region and the rear sliding region in the pass is as follows:
according to the formulaCalculating a critical speed ratio which causes the forward sliding region in the rolling deformation region of the pass to disappear and the deformation region to consist of a rubbing rolling region and a backward sliding region, wherein h 2 Represents the thickness of the unoriented silicon steel strip at the fast roll neutral point in the pass deformation zone.
Optionally, when the continuous annealing furnace is used for bright annealing, the annealing temperature is 750-950 ℃, and the heat preservation time is 30-600 s.
A system for producing a non-oriented silicon steel very thin strip comprising:
the multi-pass asynchronous cold rolling module is used for carrying out multi-pass asynchronous cold rolling on the non-oriented silicon steel strip until the thickness of the non-oriented silicon steel strip reaches the target thickness to obtain a non-oriented silicon steel ultrathin strip with the target thickness after rolling; annealing is not needed in the multi-pass asynchronous cold rolling process, and the speed ratio and the front tension of each pass meet the set conditions so as to meet the first condition or the second condition; the first condition is that all the rolling deformation areas of each pass are rubbing rolling areas, the second condition is that the front sliding areas in the rolling deformation areas of each pass disappear, and the deformation areas consist of rubbing rolling areas and rear sliding areas; the non-oriented silicon steel strip during the first-pass asynchronous cold rolling is an annealed non-oriented silicon steel strip, the non-oriented silicon steel strip during the nth-pass asynchronous cold rolling is a non-oriented silicon steel strip obtained after the nth-1-pass asynchronous cold rolling, and n is a positive integer greater than 1;
and the annealing module is used for degreasing the rolled non-oriented silicon steel ultrathin strip with the target thickness and then carrying out bright annealing through a continuous annealing furnace to obtain the non-oriented silicon steel ultrathin strip.
An electronic device, comprising:
the device comprises a memory and a processor, wherein the memory is used for storing a computer program, and the processor runs the computer program to enable the electronic equipment to execute the preparation method of the non-oriented silicon steel ultrathin strip.
A computer readable storage medium storing a computer program which when executed by a processor implements the above-described method for producing a non-oriented silicon steel very thin strip.
According to the specific embodiment provided by the invention, the invention discloses the following technical effects:
according to the invention, in the asynchronous rolling process, intermediate annealing is not needed, so that the annealed non-oriented silicon steel strip can be rolled thinner to realize low iron loss, the deformation zone is positioned in the full rubbing or rubbing zone and the rear sliding zone through the control of the different speed ratio and the front tension, the favorable texture strength can be improved, the magnetic induction is further improved to realize high magnetic induction, and the annealing heat treatment is matched, so that the grain size distribution of rolled pieces is improved, and the high strength is realized.
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In order to more clearly illustrate the embodiments of the present invention or the technical solutions of the prior art, the drawings that are needed in the embodiments will be briefly described below, it being obvious that the drawings in the following description are only some embodiments of the present invention, and that other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.
FIG. 1 is a flowchart of a method for producing a non-oriented silicon steel ultrathin strip according to an embodiment of the invention;
FIG. 2 is a schematic diagram of a conventional four-roll reversible asynchronous cold rolling mill.
Detailed Description
The following description of the embodiments of the present invention will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present invention, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
In order that the above-recited objects, features and advantages of the present invention will become more readily apparent, a more particular description of the invention will be rendered by reference to the appended drawings and appended detailed description.
The embodiment of the invention provides a preparation method of a non-oriented silicon steel ultrathin strip, which mainly comprises the following steps: step 1: taking an annealed unoriented silicon steel strip with a smooth surface and no insulating coating as a base material; step 2: the base material is thinned to the target thickness (0.01 to 0.1 mm) through multi-pass asynchronous cold rolling, and annealing is not needed in the thinning process; and 3, degreasing the rolled non-oriented silicon steel ultrathin strip with the target thickness, and then continuously annealing. The rolling parameters of each pass in the asynchronous rolling thinning process are required to meet corresponding conditions so as to improve the strength of favorable textures in the tissues, and the grain size distribution of the non-oriented silicon steel ultrathin strip is improved through an annealing process, so that the non-oriented silicon steel ultrathin strip has high magnetic induction, low iron loss and high strength. As shown in fig. 1, the specific steps are as follows:
step 101: carrying out multi-pass asynchronous cold rolling on the non-oriented silicon steel strip until the thickness of the non-oriented silicon steel strip reaches the target thickness to obtain a rolled non-oriented silicon steel extremely-thin strip with the target thickness; annealing is not needed in the multi-pass asynchronous cold rolling process, and the speed ratio and the front tension of each pass meet the set conditions so as to meet the first condition or the second condition; the first condition is that all the rolling deformation areas of each pass are rubbing rolling areas, the second condition is that the front sliding areas in the rolling deformation areas of each pass disappear, and the deformation areas consist of rubbing rolling areas and rear sliding areas; the non-oriented silicon steel strip during the first-pass asynchronous cold rolling is an annealed non-oriented silicon steel strip, the non-oriented silicon steel strip during the nth-pass asynchronous cold rolling is a non-oriented silicon steel strip obtained after the nth-1-pass asynchronous cold rolling, and n is a positive integer greater than 1.
Step 102: degreasing the rolled non-oriented silicon steel ultrathin strip with the target thickness, and then carrying out bright annealing through a continuous annealing furnace to obtain the non-oriented silicon steel ultrathin strip.
In practical application, when the unoriented silicon steel strip is subjected to multi-pass asynchronous cold rolling, upper and lower working rolls of a rolling mill are independently driven, and the different speed ratio is continuously adjustable between 1 and 1.5; the rolling mill is a reversible rolling mill, in the multi-pass rolling thinning process, the rolling direction is changed once every time when passing through one pass, and meanwhile, the rapid roller of the previous pass is changed into the slow roller of the next pass, and the slow roller of the previous pass is changed into the rapid roller of the next pass.
In practical application, the multi-pass asynchronous cold rolling is performed on the non-oriented silicon steel strip until the thickness of the non-oriented silicon steel strip reaches the target thickness to obtain the non-oriented silicon steel ultrathin strip with the target thickness after rolling, which comprises the following steps:
and determining the average plane deformation resistance of the unoriented silicon steel strip in each pass in a deformation zone according to the work hardening curve of the unoriented silicon steel strip in the annealed state and the rolling reduction of each pass, wherein the rolling reduction of each pass is less than 15%, and the total rolling reduction is 80-98%.
For any one pass, determining the maximum engineering allowable tension sigma of the pass according to the average plane deformation resistance of the unoriented silicon steel strip in the pass deformation zone max Expected post-tension sigma of the pass b 。σ max Maximum engineering allowable tension, unit MPa, according to formula, set to prevent production accidents such as belt breakageAnd (5) calculating to obtain the product.
Calculating critical front tension sigma of all rolling deformation areas of the pass to be rubbing rolling areas based on expected back tension of the pass fc
If the critical pre-tension of all the rolling deformation areas of the pass is smaller than the maximum engineering allowable tension of the pass, the value range of the different speed ratio i of the pass meets the formula i not less than i c2 And the front tension sigma of the pass f The value range of (2) satisfies the formula sigma f ≥σ fc In this case, the first condition is satisfied when all the rolling deformation zones in each pass are rubbing rolling zones, wherein i represents the different speed ratio of the pass, namely the linear speed ratio of the fast and slow working rolls of the rolling mill, and i c2 Represents the critical differential speed ratio sigma of the rolling deformation zone of the pass f Representing the pre-tension of the pass in MPa, sigma fc The critical pre-tension in MPa is expressed in the rolling deformation zone of the pass.
If the critical pre-tension of all the rolling deformation areas of the pass is greater than or equal to the maximum engineering allowable tension of the pass, the value range of the different speed ratio of the pass satisfies the formula i not less than i c1 And the range of the front tension of the pass meets the formula sigma f <σ max In this case, it is ensured that the forward sliding region in the rolling deformation zone disappears and that the deformation zone consists of the rubbing-rolling zone and the backward sliding region, i.e. the second condition is satisfied, wherein i c1 Indicating that the forward sliding region in the rolling deformation region of the pass is disappeared and the deformation region is formed by a rubbing rolling region and a rolling deformation regionCritical differential speed ratio, sigma, of the rear sliding region composition max Representing the maximum engineering allowable tension for the pass.
And carrying out multi-pass asynchronous cold rolling on the non-oriented silicon steel strip according to the expected post-tension, the value range of the different speed ratio and the value range of the pre-tension of each pass until the thickness of the non-oriented silicon steel strip reaches the target thickness to obtain the rolled non-oriented silicon steel extremely-thin strip with the target thickness.
In practical application, the process of determining the expected post-tension is as follows:
according to the formulaThe expected post-tension is calculated.
In practical application, the determination process of the critical speed ratio of all the rolling deformation areas of the pass to be the rubbing rolling areas is as follows:
according to the formulaCalculating critical speed ratios for enabling all rolling deformation areas of the pass to be rubbing rolling areas, wherein H represents the thickness of the unoriented silicon steel strip before the pass is rolled, and H represents the thickness of the unoriented silicon steel strip after the pass is rolled, and R represents the thickness of the unoriented silicon steel strip after the pass 1 Represents the radius of the first work roll (rolling mill fast roll radius), in mm, R 2 Represents the radius of the second work roll (rolling mill slow roll radius), the unit millimeter, epsilon represents the reduction of unoriented silicon steel strip in the pass, V 1 The rolling mill is provided with a fast roll linear speed of m/min; v (V) 2 Is the slow linear speed of the rolling mill, m/min.
In practical application, the determination process of calculating the critical pre-tension of the rolling deformation area of the pass based on the expected post-tension of the pass is as follows:
according to the formulaCalculating critical front tension of the rolling deformation area of the pass, wherein the critical front tension is the rolling deformation area of the pass,σ b representing the expected post-tension in MPa, delta for the pass 2 Representing intermediate variables +.>f is the friction coefficient between the upper and lower surfaces of the rolled piece and the working roll; and l is the contact arc length of the pass deformation zone, the elastic flattening of a roller is considered during calculation, and K represents the average plane deformation resistance of the unoriented silicon steel strip in the pass deformation zone, and the unit is MPa.
In practical application, the critical speed ratio determination process for enabling the front sliding region in the rolling deformation region of the pass to disappear and enabling the deformation region to consist of the rubbing rolling region and the rear sliding region is as follows:
according to the formulaCalculating a critical speed ratio which causes the forward sliding region in the rolling deformation region of the pass to disappear and the deformation region to consist of a rubbing rolling region and a backward sliding region, wherein h 2 Represents the thickness in mm of the unoriented silicon steel strip at the neutral point of the fast roll in the pass deformation zone.
In practical application, when the continuous annealing furnace is used for bright annealing, the annealing temperature is 750-950 ℃ and the heat preservation time is 30-600 s.
The invention provides a more specific embodiment for describing the method in detail:
preparing a non-oriented silicon steel ultrathin strip by adopting a four-roller reversible asynchronous cold rolling mill shown in fig. 2, wherein working rollers of the non-oriented silicon steel ultrathin strip are independently driven, and the differential speed ratio i is continuously adjustable within 1-1.5; radius R of work roll 1 1 And working roll 2 radius R 2 All 50mm; the rolling process adopts special rolling liquid for silicon steel for lubrication, the use concentration is 3% -5%, and the friction coefficient f is 0.04-0.1.
Step 1, using a smooth surface non-oriented silicon steel strip with the thickness H=0.5 mm and the width of 180mm and without an insulating coating as a rolling base material, obtaining a work hardening curve of the rolling base material through a stretching experiment, wherein the average plane deformation resistance K of the rolling base material under different rolling reduction can be calculated according to the work hardening curve by adopting the existing method.
Step 2, setting the target thickness h of the rolled piece in the current pass, wherein the pass reduction rate is required to be less than 15%, obtaining the average plane deformation resistance K of the rolled piece in the pass through a work hardening curve (only the raw materials need to be tested after each pass is changed to obtain the work hardening curve, and substituting the raw materials into the calculation according to the reduction rate of each pass), and determining the maximum engineering allowable tension sigma of the pass through the average plane deformation resistance K and a formula (1) max The method comprises the steps of carrying out a first treatment on the surface of the Setting the expected post-tension sigma of the rolled piece in the pass according to formula (2) b
The front thickness H, the back thickness H and the radius R of the working roll 1 of the rolled piece 1 Radius R of work roll 2 2 Coefficient of friction f, the average plane deformation resistance K of the pass, the back tension sigma b Substituting the critical speed ratio i into formulas (3) and (4), and calculating to obtain the critical speed ratio i required by the pass rolling c2 And critical pre-tension sigma fc
If the pass critical pre-tension sigma fc <σ max The pass selects the different speed ratio i to be more than or equal to i c2 And front tension sigma f ≥σ fc The method comprises the steps of carrying out a first treatment on the surface of the If the pass critical pre-tension sigma fc ≥σ max The pass calculates i according to equation (5) c1 And selects the different speed ratio i to be more than or equal to i c1 And front tension sigma f <σ max
In the following implementation process, the pass critical pre-tension sigma is used fc <σ max An example is described.
Placing a rolled piece on an uncoiler, passing through a roll gap formed by a working roll 1 and a working roll 2 through a guide roll 1, leading out through the guide roll 2, winding on the uncoiler, and rotating the uncoiler and the uncoiler to preliminarily tension the rolled piece;
rolling reduction by applying rolling force to working rolls by means of a reduction device, and application of a desired back tension sigma to the rolled stock by means of an uncoiler b Applying a front tension sigma to the rolled piece by a winder f ≥σ fc
Starting the transmission motor to start rolling so as to lead the linear speed V of the working roller 1 to be 1 And the linear velocity V of the working roll 2 2 Ratio i=v 1 /V 2 ≥i c2 The method comprises the steps of carrying out a first treatment on the surface of the And monitoring the thickness of the rolled piece outlet through a thickness gauge, and adjusting the pressing device to enable the thickness of the rolled piece after rolling to be a target value h.
When a rolled piece is about to be rolled, the rotating speed of a transmission motor is reduced until the rolling piece is stopped, a thickness gauge is used for checking whether the rolling piece is a final rolling pass, if the rolling piece is not the final rolling pass, the transmission motor is reversed, the working roll 1 is changed from a fast roll to a slow roll, and the working roll 2 is changed from the slow roll to a fast roll; the uncoiler changes into a coiling machine to apply front tension, and the coiling machine changes into a uncoiler to apply rear tension; the thickness of the rolled piece after the last rolling is changed into the thickness before the next rolling; and (3) repeating the step (2) and adjusting corresponding rolling parameters, and entering the next rolling.
If the final rolling pass is completed, the uncoiler and the coiling machine are stopped to unload rolling tension, the pressing device unloads rolling force, the working roll 1 is lifted, the rolled piece is coiled by the coiling machine, and the rolling process is finished.
According to the rolling method, the unoriented silicon steel strip raw material is rolled to the target thickness of 0.05mm through multi-pass asynchronous rolling, the total rolling reduction is 90%, and annealing is not needed in the whole process of thinning.
And 3, degreasing the non-oriented silicon steel ultrathin strip with the target thickness after rolling, and then performing bright annealing in a continuous annealing furnace under a dry atmosphere, wherein the annealing temperature is 750-950 ℃, and the heat preservation time is 30-600 s.
The embodiment of the invention provides a preparation system of a non-oriented silicon steel ultrathin strip corresponding to the method, which comprises the following steps:
the multi-pass asynchronous cold rolling module is used for carrying out multi-pass asynchronous cold rolling on the non-oriented silicon steel strip until the thickness of the non-oriented silicon steel strip reaches the target thickness to obtain a non-oriented silicon steel ultrathin strip with the target thickness after rolling; annealing is not needed in the multi-pass asynchronous cold rolling process, and the speed ratio and the front tension of each pass meet the set conditions so as to meet the first condition or the second condition; the first condition is that all the rolling deformation areas of each pass are rubbing rolling areas, the second condition is that the front sliding areas in the rolling deformation areas of each pass disappear, and the deformation areas consist of rubbing rolling areas and rear sliding areas; the non-oriented silicon steel strip during the first-pass asynchronous cold rolling is an annealed non-oriented silicon steel strip, the non-oriented silicon steel strip during the nth-pass asynchronous cold rolling is a non-oriented silicon steel strip obtained after the nth-1-pass asynchronous cold rolling, and n is a positive integer greater than 1.
And the annealing module is used for degreasing the rolled non-oriented silicon steel ultrathin strip with the target thickness and then carrying out bright annealing through a continuous annealing furnace to obtain the non-oriented silicon steel ultrathin strip.
An electronic device, comprising:
the device comprises a memory and a processor, wherein the memory is used for storing a computer program, and the processor runs the computer program to enable the electronic device to execute the preparation method of the non-oriented silicon steel ultrathin strip according to the embodiment.
A computer-readable storage medium storing a computer program which, when executed by a processor, implements the method for producing a non-oriented silicon steel very thin strip according to the above embodiment.
The invention has the beneficial effects that:
1. the rolling parameters (different speed ratio and front tension) are optimized to ensure that the rolling deformation zone is kept in a rubbing zone or a rear sliding zone and a rubbing zone, so that the effect of asynchronously rolling to enhance the favorable texture intensity of the non-oriented silicon steel can be fully exerted, the favorable texture intensity in the non-oriented silicon steel is remarkably improved, the recrystallization annealing texture is improved, and the magnetic induction intensity of the non-oriented silicon steel ultrathin strip is favorably improved.
2. The optimization of rolling parameters can maximally reduce rolling force, fully exert the characteristic of strong asynchronous rolling thinning capability, break through the minimum rolling thickness limit of synchronous rolling, and further reduce the iron loss of the non-oriented silicon steel ultrathin strip under high frequency.
3. The asynchronous rolling thinning capability is strong, annealing is not needed in the whole process of thinning to the target thickness, the shearing bands of the tissue after rolling are increased, and when recrystallization annealing is carried out in the subsequent annealing process, the non-uniform nucleation points at the shearing bands are increased, so that grains with smaller sizes appear in the annealed tissue, the grain size distribution in the non-oriented silicon steel ultrathin strip tissue is improved, the appearance of single-layer crystals is avoided, and the strength of the non-oriented silicon steel ultrathin strip can be improved under the conditions of high magnetic induction and low iron loss.
In the present specification, each embodiment is described in a progressive manner, and each embodiment is mainly described in a different point from other embodiments, and identical and similar parts between the embodiments are all enough to refer to each other. For the system disclosed in the embodiment, since it corresponds to the method disclosed in the embodiment, the description is relatively simple, and the relevant points refer to the description of the method section.
The principles and embodiments of the present invention have been described herein with reference to specific examples, the description of which is intended only to assist in understanding the methods of the present invention and the core ideas thereof; also, it is within the scope of the present invention to be modified by those of ordinary skill in the art in light of the present teachings. In view of the foregoing, this description should not be construed as limiting the invention.

Claims (9)

1. The preparation method of the non-oriented silicon steel ultrathin strip is characterized by comprising the following steps of:
carrying out multi-pass asynchronous cold rolling on the non-oriented silicon steel strip until the thickness of the non-oriented silicon steel strip reaches the target thickness to obtain a rolled non-oriented silicon steel extremely-thin strip with the target thickness; annealing is not needed in the multi-pass asynchronous cold rolling process, and the speed ratio and the front tension of each pass meet the set conditions so as to meet the first condition or the second condition; the first condition is that all the rolling deformation areas of each pass are rubbing rolling areas, the second condition is that the front sliding areas in the rolling deformation areas of each pass disappear, and the deformation areas consist of rubbing rolling areas and rear sliding areas; the non-oriented silicon steel strip during the first-pass asynchronous cold rolling is an annealed non-oriented silicon steel strip, the non-oriented silicon steel strip during the nth-pass asynchronous cold rolling is a non-oriented silicon steel strip obtained after the nth-1-pass asynchronous cold rolling, and n is a positive integer greater than 1;
degreasing the rolled non-oriented silicon steel ultrathin strip with the target thickness, and then carrying out bright annealing through a continuous annealing furnace to obtain the non-oriented silicon steel ultrathin strip.
2. The method for producing an ultra-thin strip of non-oriented silicon steel according to claim 1, wherein the multi-pass asynchronous cold rolling is performed on the non-oriented silicon steel strip until the thickness of the non-oriented silicon steel strip reaches a target thickness to obtain the ultra-thin strip of non-oriented silicon steel with the target thickness after rolling, specifically comprising:
determining the average plane deformation resistance of the unoriented silicon steel strip in each pass deformation zone according to the work hardening curve of the unoriented silicon steel strip in the annealed state and the reduction rate of each pass; in the multi-pass asynchronous cold rolling process, the rolling reduction rate of each pass is less than 15%, and the total rolling reduction rate of all passes is 80-98%;
for any one pass, determining the maximum engineering allowable tension of the pass and the expected post-tension of the pass according to the average plane deformation resistance of the unoriented silicon steel strip in the pass deformation zone;
calculating critical front tension of a rolling deformation zone of the pass based on the expected back tension of the pass, wherein the critical front tension is formed by the rolling deformation zone of the pass;
if the critical pre-tension of all the rolling deformation areas of the pass is smaller than the maximum engineering allowable tension of the pass, the value range of the different speed ratio of the pass satisfies the formula i not less than i c2 And the range of the front tension of the pass meets the formula sigma f ≥σ fc Wherein i represents the different speed ratio of the pass, i c2 Represents the critical differential speed ratio sigma of the rolling deformation zone of the pass f Representing the pre-tension, sigma, of the pass fc Representing critical pre-tension in a rolling deformation zone of the pass to be a rubbing zone;
if the critical pre-tension of all the rolling deformation areas of the pass is greater than or equal to the maximum engineering allowable tension of the pass, the value range of the different speed ratio of the pass satisfies the formula i not less than i c1 And the range of the front tension of the pass meets the formula sigma f <σ max Wherein i is c1 Representing critical speed ratio, sigma, of the deformation zone formed by the rubbing zone and the post-rolling zone, which causes the forward sliding zone to disappear in the rolling deformation zone of the pass max Representing the maximum engineering allowable tension of the pass;
and carrying out multi-pass asynchronous cold rolling on the non-oriented silicon steel strip according to the expected post-tension, the value range of the different speed ratio and the value range of the pre-tension of each pass until the thickness of the non-oriented silicon steel strip reaches the target thickness to obtain the rolled non-oriented silicon steel extremely-thin strip with the target thickness.
3. The method for producing an extremely thin strip of non-oriented silicon steel according to claim 2, wherein the determination process of the critical differential speed ratio for all the rolling deformation regions of the pass to be the rubbing rolling regions is:
according to the formulaCalculating critical speed ratios for enabling all rolling deformation areas of the pass to be rubbing rolling areas, wherein H represents the thickness of the unoriented silicon steel strip before the pass is rolled, H represents the thickness of the unoriented silicon steel strip after the pass is rolled, and R 1 Represents the radius of the first work roll, R 2 Represents the radius of the second work roll and epsilon represents the reduction of the unoriented silicon steel strip in the pass.
4. The method for producing a non-oriented silicon steel ultrathin strip according to claim 3, wherein the critical pre-tension in the rolling deformation zone of the pass is calculated based on the expected post-tension of the pass, and the critical pre-tension in the rolling deformation zone is determined by:
according to the formulaCalculating critical pre-tension for making all rolling deformation areas of the pass be rubbing rolling areas, wherein sigma b Representing the expected post-tension, delta, of the pass 2 Represents an intermediate variable, and K represents the average plane deformation resistance of the unoriented silicon steel strip in the pass deformation zone.
5. The method for producing an extremely thin strip of non-oriented silicon steel as claimed in claim 4, wherein the critical speed ratio determination process for the front sliding region to disappear in the rolling deformation region of the pass and the deformation region to consist of the rubbing-rolling region and the rear sliding region is:
according to the formulaCalculating a critical speed ratio which causes the forward sliding region in the rolling deformation region of the pass to disappear and the deformation region to consist of a rubbing rolling region and a backward sliding region, wherein h 2 Represents the thickness of the unoriented silicon steel strip at the fast roll neutral point in the pass deformation zone.
6. The method for producing an extremely thin strip of non-oriented silicon steel as claimed in claim 1, wherein the annealing temperature is 750 to 950 ℃ and the holding time is 30 to 600s when the bright annealing is performed by a continuous annealing furnace.
7. The preparation system of the non-oriented silicon steel ultrathin strip is characterized by comprising the following components:
the multi-pass asynchronous cold rolling module is used for carrying out multi-pass asynchronous cold rolling on the non-oriented silicon steel strip until the thickness of the non-oriented silicon steel strip reaches the target thickness to obtain a non-oriented silicon steel ultrathin strip with the target thickness after rolling; annealing is not needed in the multi-pass asynchronous cold rolling process, and the speed ratio and the front tension of each pass meet the set conditions so as to meet the first condition or the second condition; the first condition is that all the rolling deformation areas of each pass are rubbing rolling areas, the second condition is that the front sliding areas in the rolling deformation areas of each pass disappear, and the deformation areas consist of rubbing rolling areas and rear sliding areas; the non-oriented silicon steel strip during the first-pass asynchronous cold rolling is an annealed non-oriented silicon steel strip, the non-oriented silicon steel strip during the nth-pass asynchronous cold rolling is a non-oriented silicon steel strip obtained after the nth-1-pass asynchronous cold rolling, and n is a positive integer greater than 1;
and the annealing module is used for degreasing the rolled non-oriented silicon steel ultrathin strip with the target thickness and then carrying out bright annealing through a continuous annealing furnace to obtain the non-oriented silicon steel ultrathin strip.
8. An electronic device, comprising:
a memory for storing a computer program that runs the computer program to cause the electronic device to execute the production method of the non-oriented silicon steel ultrathin strip according to any one of claims 1 to 6.
9. A computer-readable storage medium, characterized in that it stores a computer program which, when executed by a processor, implements the method for producing a non-oriented silicon steel ultrathin strip as defined in any one of claims 1 to 6.
CN202310664958.XA 2023-06-07 2023-06-07 Preparation method and system of non-oriented silicon steel ultrathin strip, electronic equipment and medium Pending CN116673325A (en)

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