CN116658807A

CN116658807A - Liquid source vaporization system

Info

Publication number: CN116658807A
Application number: CN202310869801.0A
Authority: CN
Inventors: 周厉颖; 杨帅
Original assignee: Beijing Naura Microelectronics Equipment Co Ltd
Current assignee: Beijing Naura Microelectronics Equipment Co Ltd
Priority date: 2023-07-14
Filing date: 2023-07-14
Publication date: 2023-08-29

Abstract

The invention provides a liquid source vaporization system, which is applied to semiconductor process equipment and comprises: the liquid source pipeline, the vaporization device and the output pipeline are sequentially communicated; the liquid source vaporization system further includes: the purging pipeline is communicated with the vaporizing device; the first control unit is used for controlling the communication between the purging pipeline and the vaporizing device or between the liquid source pipeline and the vaporizing device; the tail gas treatment unit is communicated with the vaporization device; and the second control unit is used for controlling the tail gas treatment unit to be communicated with the vaporizing device or the output pipeline to be communicated with the vaporizing device. According to the liquid source vaporization system, the purging pipeline, the first control unit, the tail gas treatment unit and the second control unit are arranged, so that not only can the liquid process medium be vaporized, but also the interior of the vaporization device can be cleaned through the purging gas.

Description

Liquid source vaporization system

Technical Field

The invention relates to the field of semiconductor manufacturing, in particular to a liquid source vaporization system.

Background

In the process of manufacturing integrated circuits, in order to enable a silicon wafer to meet certain process characteristics, such as forming different insulating layers, dielectric layers and the like on the surface of the silicon wafer, the silicon wafer needs to be placed in a process chamber with certain temperature, pressure and process gas atmosphere. In advanced processes, special process media are introduced, which are usually stored in liquid form, whereas in processes, it is necessary to convert these liquid process media into gaseous form for transport into the process chamber.

In the prior art, in the process of conveying the liquid source of the process medium into the gaseous state with higher accuracy and stability of controlling the fluid flow, there are two different modes

Vapor pressure difference control method and liquid phase direct control method.

The vapor pressure difference control method is also called a baking method, and is a method of controlling a gas by using a mass flowmeter using a vapor pressure of a liquid material and a pressure difference between a process chamber pressure. However, the vapor pressure difference control method is to evaporate the liquid in the container by heating to saturated vapor pressure, so that the pressure after evaporation is low, the transmission requirement can be met when the process chamber is required to be in a vacuum environment, the amount of the evaporated gas is relatively small, and the required flow rate of the process gas cannot be met when the required flow rate of the process gas is large; in addition, because the gas mass flowmeter is arranged on the outlet pipeline, the measured gas temperature is higher, and because the gas mass flowmeter has limited temperature resistance, when the baking temperature is too high, the measurement requirement cannot be met, so that the range of applicable liquid is limited; in addition, the baking device for baking liquid medium has larger volume and mass, is generally placed at the bottom of the equipment, has longer distance from the baking device to the process chamber, and needs to perform temperature management on pipelines and devices during transmission, so that the gasified gas can be liquefied into liquid again if meeting a cold point.

The liquid phase direct control method is also called a direct vaporization method, and is a method of vaporizing a liquid using a mass flowmeter and a vaporizer. The method mainly adopts a vaporizer, and a carrier gas is introduced into the vaporizer to atomize a liquid process medium and then spray the atomized process medium into a vaporization chamber. The outside of the vaporizing chamber is integrally heated, atomized process medium is vaporized by heat radiation emitted by the vaporizing chamber, and the liquid spray which is not completely vaporized is completely vaporized by heat conduction generated by contacting the inner wall of the vaporizing chamber and then is output.

Although the above-mentioned method can solve many problems of vapor pressure difference control method, however, there still exists a new problem, because the carrier gas is needed to atomize the liquid process medium, and after each use, the liquid process medium remains in the pipeline to affect the next use, so how to clean the process medium remains in the pipeline is a problem to be solved in the art.

Disclosure of Invention

The invention aims at solving at least one of the technical problems in the prior art and provides a liquid source vaporization system.

In order to achieve the object of the present invention, there is provided a liquid source vaporization system applied to semiconductor process equipment, comprising: the liquid source pipeline is used for providing liquid process media for the vaporizing device, the vaporizing device is used for vaporizing the liquid process media into gaseous process media, the output pipeline is used for conveying the vaporized gaseous process media into a process chamber of the semiconductor process equipment, and the liquid source vaporizing system further comprises: the purging pipeline is communicated with the vaporizing device and is used for providing purging gas into the vaporizing device; the first control unit is used for controlling the purging pipeline to be communicated with the vaporizing device or the liquid source pipeline to be communicated with the vaporizing device; the tail gas treatment unit is communicated with the vaporizing device and is used for treating pollutants blown out of the vaporizing device by the purge gas; and the second control unit is used for controlling the tail gas treatment unit to be communicated with the vaporizing device or the output pipeline to be communicated with the vaporizing device.

Further, the vaporizing device includes: a vaporizer having a vaporization chamber for vaporizing the liquid process medium; the outlet end of the liquid inlet pipeline is communicated with the vaporization chamber, and the inlet end of the liquid inlet pipeline is respectively communicated with the outlet end of the liquid source pipeline and the outlet end of the purging pipeline; the inlet end of the air outlet pipeline is communicated with the vaporization chamber, and the outlet end of the air outlet pipeline is respectively communicated with the inlet end of the output pipeline and the tail gas treatment unit.

Further, the first control unit includes: the first control valve is arranged on the liquid source pipeline and used for controlling the on-off of the liquid source pipeline; the second control valve is arranged on the purging pipeline and used for controlling the on-off of the purging pipeline.

Further, the tail gas treatment unit comprises a tail gas treatment device and a tail gas treatment pipeline, wherein the inlet end of the tail gas treatment pipeline is communicated with the outlet end of the air outlet pipeline, and the outlet end of the tail gas treatment pipeline is communicated with the tail gas treatment device; the second control unit includes: the third control valve is arranged on the output pipeline and used for controlling the on-off of the output pipeline; and the fourth control valve is arranged on the tail gas treatment pipeline and used for controlling the on-off of the tail gas treatment pipeline.

Further, the vaporizing device further includes: the inlet end of the carrier gas pipeline is communicated with a carrier gas source, and the outlet end of the carrier gas pipeline is communicated with the vaporization chamber; and the carrier gas control valve is arranged on the carrier gas pipeline and is used for controlling the on-off of the carrier gas pipeline.

Further, the liquid source vaporization system further includes: the first flowmeter is arranged on the liquid inlet pipeline and is used for calculating the flow rate of the liquid process medium; the inlet end of the first bypass pipeline is communicated with the liquid inlet pipeline, the inlet end of the first bypass pipeline is positioned between the first flowmeter and the carburetor, and the outlet end of the first bypass pipeline is communicated with the tail gas treatment unit; and the bypass control unit is used for controlling the first flowmeter to be communicated with the vaporization chamber or the first flowmeter to be communicated with the first bypass pipeline.

Further, the liquid source vaporization system further includes: the first flowmeter is arranged on the liquid inlet pipeline and is used for calculating the flow rate of the liquid process medium; the inlet end of the second bypass pipeline is communicated with a purge gas source, the outlet end of the second bypass pipeline is communicated with the liquid inlet pipeline, and the outlet end of the second bypass pipeline is positioned between the first flowmeter and the vaporizing chamber; and the fifth control valve is used for controlling the on-off of the second bypass pipeline.

Further, the liquid source vaporization system further includes: and the residual liquid recovery device is communicated with the liquid inlet pipeline and is used for recovering residual process media.

Further, the raffinate recovery apparatus includes: a raffinate collector for recovering residual liquid process media; the outlet end of the residual liquid recovery pipeline is communicated with the residual liquid collector, and the inlet end of the residual liquid recovery pipeline is communicated with the liquid inlet pipeline; the sixth control valve is arranged on the residual liquid recovery pipeline and used for controlling the on-off of the residual liquid recovery pipeline; the vaporizing device further comprises: the seventh control valve is arranged on the liquid inlet pipeline, and is positioned between the inlet end of the residual liquid recovery pipeline and the vaporizer and used for controlling the on-off between the vaporizer and the liquid inlet pipeline.

Further, the raffinate recovery apparatus further comprises: an exhaust line, the raffinate collector having an exhaust port, the exhaust port being in communication with the tail gas treatment unit through the exhaust line; and the eighth control valve is arranged on the exhaust pipeline and is used for controlling the on-off of the exhaust pipeline.

Further, the raffinate recovery apparatus further comprises: and a ninth control valve arranged on the raffinate recovery pipeline, wherein the ninth control valve is positioned between the sixth control valve and the outlet end of the raffinate recovery pipeline.

Further, the liquid source vaporization system further includes: the inlet end of the purging branch is communicated with a purging air source, the outlet end of the purging branch is communicated with the residual liquid recovery pipeline, and the outlet end of the purging branch is positioned between the ninth control valve and the sixth control valve; and the tenth control valve is arranged on the purging branch and is used for controlling the on-off of the purging branch.

Further, the raffinate recovery apparatus further comprises: the inlet end of the residual gas discharge pipeline is communicated with the residual liquid recovery pipeline, the inlet end of the residual gas discharge pipeline is positioned between the sixth control valve and the ninth control valve, and the outlet end of the residual gas discharge pipeline is communicated with the tail gas treatment unit; the residual air control valve is arranged on the residual air discharge pipeline and used for controlling the on-off of the residual air discharge pipeline.

Further, the vaporizing device further includes: the inlet end of the carrier gas pipeline is communicated with the carrier gas source, and the outlet end of the carrier gas pipeline is communicated with the vaporization chamber; the carrier gas control valve is arranged on the carrier gas pipeline and is used for controlling the on-off of the carrier gas pipeline; the first flowmeter is arranged on the liquid inlet pipeline and is used for calculating the flow rate of the liquid process medium; the inlet end of the second bypass pipeline is communicated with the purge gas source, the outlet end of the second bypass pipeline is communicated with the liquid inlet pipeline, and the outlet end of the second bypass pipeline is positioned between the first flowmeter and the vaporizing chamber; and the fifth control valve is used for controlling the on-off of the second bypass pipeline.

The invention has the following beneficial effects:

according to the liquid source vaporization system, the purging pipeline, the first control unit, the tail gas treatment unit and the second control unit are arranged, so that not only can liquid process media be vaporized, but also the purging pipeline and the tail gas treatment unit are communicated with the vaporization device by controlling the first control unit and the second control unit, purging gas is introduced into the vaporization device, and the interior of the vaporization device is cleaned by the purging gas, so that the process media in the pipeline are blown out, the residues of the process media in the pipeline are reduced, and the influence on the next use is avoided. In addition, due to the arrangement of the tail gas treatment unit, pollutants blown out from the vaporizing device by the purge gas can be treated by the tail gas treatment unit, so that the pollution of the pollutants to the environment is avoided.

Drawings

FIG. 1 is a schematic diagram of a liquid source vaporization system according to a first embodiment of the present invention;

FIG. 2 is a schematic diagram illustrating an operation state of a liquid source vaporization system according to a first embodiment of the present invention;

FIG. 3 is a schematic view illustrating a first cleaning state of the liquid source vaporization system according to the first embodiment of the present invention;

FIG. 4 is a schematic view showing a second cleaning state of the liquid source vaporization system according to the first embodiment of the present invention;

FIG. 5 is a schematic diagram illustrating a third cleaning state of the liquid source vaporization system according to the second embodiment of the present invention;

FIG. 6 is a schematic view of a fourth cleaning state of a liquid source vaporization system according to a third embodiment of the present invention;

FIG. 7 is a schematic diagram showing a first raffinate recovery status of a liquid source vaporization system according to a fourth embodiment of the present invention;

FIG. 8 is a schematic diagram showing a second raffinate recovery status of the liquid source vaporization system according to the fifth embodiment of the present invention;

FIG. 9 is a schematic diagram showing the residual air discharging state of the liquid source vaporization system according to the sixth embodiment of the present invention;

FIG. 10 is a schematic diagram showing an operation state of a liquid source vaporization system according to a seventh embodiment of the present invention;

FIG. 11 is a schematic diagram illustrating a first junction status of a liquid source vaporization system according to a seventh embodiment of the present invention;

FIG. 12 is a schematic diagram showing a second please-up state of the liquid source vaporization system according to the seventh embodiment of the present invention;

FIG. 13 is a schematic view showing a third cleaning state of a liquid source vaporization system according to a seventh embodiment of the present invention;

FIG. 14 is a schematic diagram showing a first raffinate recovery status of a liquid source vaporization system according to a seventh embodiment of the present invention;

FIG. 15 is a schematic diagram showing a second raffinate recovery status of the liquid source vaporization system according to the seventh embodiment of the present invention;

FIG. 16 is a schematic diagram showing the residual air discharging state of the liquid source vaporization system according to the seventh embodiment of the present invention;

FIG. 17 is a schematic diagram showing the residual air discharging state of the liquid source vaporization system according to the eighth embodiment of the present invention;

list of reference numerals:

10. a liquid source pipeline; 20. a vaporization device; 21. a vaporizer; 22. a liquid inlet pipeline; 23. an air outlet pipeline; 24. a carrier gas line; 25. a carrier gas control valve; 26. a seventh control valve; 30. an output line; 40. purging the pipeline; 50. a first control unit; 51. a first control valve; 52. a second control valve; 60. a tail gas treatment unit; 61. a tail gas treatment device; 62. a tail gas treatment pipeline; 70. a second control unit; 71. a third control valve; 72. a fourth control valve; 80. a first flowmeter; 90. a first bypass line; 100. a bypass control unit; 101. a first bypass valve; 102. a second bypass valve; 110. a second bypass line; 120. a fifth control valve; 130. a raffinate recovery unit; 131. a raffinate collector; 132. a raffinate recovery line; 133. a sixth control valve; 134. an exhaust line; 135. an eighth control valve; 136. a ninth control valve; 137. a residual gas discharge pipeline; 138. a residual gas control valve; 140. a purge branch; 150. tenth control valve.

Detailed Description

In order to enable those skilled in the art to better understand the technical scheme of the present invention, the temperature control device and the reaction chamber using the same provided by the present invention are described in detail below with reference to the accompanying drawings.

As shown in fig. 1, in one embodiment, a liquid source vaporization system is disclosed for use in semiconductor processing equipment. The liquid source vaporization system includes: the device comprises a liquid source pipeline 10, a vaporizing device 20, an output pipeline 30, a purging pipeline 40, a first control unit 50, an exhaust gas treatment unit 60 and a second control unit 70.

The liquid source pipeline 10, the vaporizing device 20 and the output pipeline 30 are sequentially communicated. That is, the inlet end of the liquid source line 10 communicates with a liquid source and the outlet end of the liquid source line 10 communicates with the vaporizing device 20 so that the liquid source line 10 can provide a liquid process medium to the vaporizing device 20. After the liquid process medium enters the vaporizing device 20, the vaporizing device 20 vaporizes the liquid process medium into a gaseous process medium, and then the output line 30 conveys the vaporized gaseous process medium into a process chamber of the semiconductor process apparatus, thereby performing a corresponding semiconductor process.

In this embodiment, the purge line 40 is in communication with the vaporizing device 20, the inlet end of the purge line 40 is in communication with a purge gas source, and the purge line 40 is used to provide purge gas into the vaporizing device 20; the first control unit 50 is used for controlling the communication between the purge pipeline 40 and the vaporizing device 20 or the communication between the liquid source pipeline 10 and the vaporizing device 20; the tail gas treatment unit 60 is communicated with the vaporizing device 20, and the tail gas treatment unit 60 is used for treating pollutants blown out of the vaporizing device 20 by the purge gas; the second control unit 70 is used for controlling the exhaust gas treatment unit 60 to communicate with the vaporizing device 20 or the output pipe 30 to communicate with the vaporizing device 20.

As shown in fig. 2-3, the liquid source vaporization system has an operating state and a first cleaning state during use. The liquid source vaporization system is switched between the working state and the first cleaning state by controlling the first control unit 50.

As shown in fig. 2, in the operating state, the first control unit 50 controls the liquid source line 10 to communicate with the vaporizing device 20, and the second control unit 70 controls the output line 30 to communicate with the vaporizing device 20. The liquid process medium enters the vaporizing device 20 through the liquid source pipeline 10, the vaporizing device 20 vaporizes the liquid process medium, and the vaporized gaseous process medium is conveyed into a process chamber of the semiconductor process equipment through the output pipeline 30, so that the corresponding semiconductor process is performed.

As shown in fig. 3, in the first cleaning state, the first control unit 50 controls the purge line 40 to communicate with the vaporizing device 20, and the second control unit 70 controls the exhaust gas treatment unit 60 to communicate with the vaporizing device 20. The purge gas sequentially passes through the purge pipeline 40, the vaporizing device 20 and the tail gas treatment unit 60, the purge gas purges the air, the moisture, the particles and the like in the pipeline, and meanwhile, the pollutants blown out of the vaporizing device 20 by the purge gas can be treated by the tail gas treatment unit 60, so that the pollution of the pollutants to the environment is avoided.

According to the liquid source vaporization system, the purging pipeline 40, the first control unit 50, the tail gas treatment unit 60 and the second control unit 70 are arranged, so that not only can liquid process media be vaporized, but also the purging pipeline 40 and the tail gas treatment unit 60 can be communicated with the vaporization device 20 by controlling the first control unit 50 and the second control unit 70, purging gas is introduced into the vaporization device 20, and the interior of the vaporization device 20 is cleaned by the purging gas, so that the process media residues in the pipeline are blown out, the residues of the process media in the pipeline are reduced, and the influence on the next use is avoided. In addition, due to the arrangement of the tail gas treatment unit 60, the pollutants blown out of the vaporizing device 20 by the purge gas can be treated by the tail gas treatment unit 60, so that the pollution of the pollutants to the environment is avoided.

It should be noted that, in the first cleaning state, the vaporization device 20 may be cleaned after the liquid process medium is vaporized by the liquid source vaporization system, or the liquid process medium may be cleaned before the liquid source vaporization system vaporizes the process medium, so that air, moisture, particles and the like in the pipeline or the vaporization device 20 are purged, and the process is ready.

Further, in this example, the vaporizing device 20 includes a vaporizer 21, a liquid inlet line 22, an air outlet line 23, a carrier gas line 24, and a carrier gas control valve 25. The vaporizer 21 has a vaporization chamber for vaporizing a liquid process medium; the outlet end of the liquid inlet pipeline 22 is communicated with the vaporization chamber, and the inlet end of the liquid inlet pipeline 22 is respectively communicated with the outlet end of the liquid source pipeline 10 and the outlet end of the purging pipeline 40; the inlet end of the air outlet pipeline 23 is communicated with the vaporization chamber, and the outlet end of the air outlet pipeline 23 is respectively communicated with the inlet end of the output pipeline 30 and the tail gas treatment unit 60. The inlet end of the carrier gas pipeline 24 is used for communicating with a carrier gas source, and the outlet end of the carrier gas pipeline 24 is communicated with the vaporization chamber; a carrier gas control valve 25 is provided on the carrier gas line 24, and the carrier gas control valve 25 is used to control on-off of the carrier gas line 24.

The exhaust gas treatment unit 60 includes an exhaust gas treatment device 61, a vacuum pump and an exhaust gas treatment pipeline 62, wherein an inlet end of the exhaust gas treatment pipeline 62 is communicated with an outlet end of the air outlet pipeline 23, an outlet end of the exhaust gas treatment pipeline 62 is communicated with the exhaust gas treatment device 61, and the vacuum pump is arranged on the exhaust gas treatment pipeline 62.

The first control unit 50 comprises a first control valve 51 and a second control valve 52, wherein the first control valve 51 is arranged on the liquid source pipeline 10 and is used for controlling the on-off of the liquid source pipeline 10; a second control valve 52 is provided on the purge line 40 for controlling the on-off of the purge line 40.

The second control unit 70 comprises a third control valve 71 and a fourth control valve 72, wherein the third control valve 71 is arranged on the output pipeline 30 and is used for controlling the on-off of the output pipeline 30; the fourth control valve 72 is disposed on the exhaust gas treatment pipeline 62, and is used for controlling on-off of the exhaust gas treatment pipeline 62, and the vacuum pump is located between the fourth control valve 72 and the exhaust gas treatment device 61.

The liquid source vaporization system has a working state, a first cleaning state and a second cleaning state.

As shown in fig. 2, in the operating state, the first control valve 51 is open, the second control valve 52 is closed, the third control valve 71 is open, the fourth control valve 72 is closed, and the carrier gas control valve 25 is open. The liquid source pipeline 10, the liquid inlet pipeline 22, the vaporizer 21, the air outlet pipeline 23 and the output pipeline 30 are sequentially communicated. The liquid process medium sequentially passes through the liquid source pipeline 10 and the liquid inlet pipeline 22 to enter the vaporizer 21, the vaporizer 21 vaporizes the liquid process medium, and the vaporized gaseous process medium sequentially passes through the gas outlet pipeline 23 and the output pipeline 30 to enter the process chamber of the semiconductor process equipment, so that the corresponding semiconductor process is performed.

As shown in fig. 3, in the first cleaning state, the second control valve 52 is opened, the first control valve 51 is closed, the fourth control valve 72 is opened, the third control valve 71 is closed, and the carrier gas control valve 25 is closed. The purge gas sequentially passes through the purge pipeline 40, the liquid inlet pipeline 22, the vaporizer 21 and the air outlet pipeline 23, so that residual liquid, air, moisture, particles and the like in the pipelines and the vaporizer 21 are purged completely, and meanwhile, pollutants blown out of the vaporizer 20 by the purge gas enter the tail gas treatment device 61 through the tail gas treatment pipeline 62, so that the pollutants are treated through the tail gas treatment unit 60, and the pollution of the pollutants to the environment is avoided.

As shown in fig. 4, in the second cleaning state, the second control valve 52 is opened, the first control valve 51 is closed, the fourth control valve 72 is opened, the third control valve 71 is closed, and the carrier gas control valve 25 is opened. The second cleaning state is mainly for discharging the residual liquid and gas in the pipeline and the vaporizer 21 after the process is finished. The purge gas sequentially passes through the purge pipeline 40, the liquid inlet pipeline 22, the vaporizer 21 and the air outlet pipeline 23, meanwhile, as the carrier gas control valve 25 is opened, under the action of carrier gas, the vaporizer 21 vaporizes the liquid in the interior into gas, and then the gas is blown out together by the purge gas, so that residual liquid and gas in the pipelines and the vaporizer 21 are purged completely, and meanwhile, pollutants blown out by the purge gas from the vaporizer 20 enter the tail gas treatment device 61 through the tail gas treatment pipeline 62, so that the pollutants are treated through the tail gas treatment unit 60, and the pollution of the pollutants to the environment is avoided.

It should be noted that, in the first embodiment, the liquid source vaporization system further includes a first flow meter 80, the first flow meter 80 is disposed on the liquid inlet pipe 22, and the first flow meter 80 is used for calculating the flow rate of the liquid process medium.

It should be further noted that, in the above embodiment, the first control unit 50 includes the first control valve 51 and the second control valve 52, but this is not limitative, but for example, in some other embodiments not shown in the drawings, the first control unit 50 may also be a three-way valve, a first end of which communicates with the liquid inlet line 22, a second end of which communicates with the liquid source line 10, and a third end of which communicates with the purge line 40, so that the purge line 40 communicates with the liquid inlet line 22 or the liquid source line 10 communicates with the liquid inlet line 22 through the three-way valve. That is, the present invention is not limited to the working principle, and any structure that can switch between the purge line 40 and the liquid inlet line 22 is within the scope of the present invention. Similarly, in the above embodiment, the second control unit 70 may also be a three-way valve, which is not described herein.

In a second embodiment of the present invention as shown in fig. 5, there is also disclosed a liquid source vaporization system which is substantially the same as the first embodiment, except that in this example, the liquid source vaporization system further includes: a first bypass line 90 and a bypass control unit 100, wherein an inlet end of the first bypass line 90 is communicated with the liquid inlet line 22, an inlet end of the first bypass line 90 is positioned between the first flowmeter 80 and the carburetor 21, an outlet end of the first bypass line 90 is communicated with the exhaust gas treatment unit 60, and specifically, an outlet end of the first bypass line 90 is connected to the exhaust gas treatment line 62 between the fourth control valve 72 and the vacuum pump; the bypass control unit 100 is used to control the first flow meter 80 to communicate with the vaporization chamber or the first flow meter 80 to communicate with the first bypass line 90.

The bypass control unit 100 includes a first bypass valve 101 and a second bypass valve 102, the first bypass valve 101 is disposed on the first bypass line 90, the second bypass valve 102 is disposed on the liquid intake line 22, and the second bypass valve 102 is disposed between an inlet end of the first bypass line 90 and the carburetor 21.

The liquid source vaporization system has an operating state and a third cleaning state.

In the operating state, the first control valve 51 is open and the second control valve 52 is closed; the third control valve 71 is open, the fourth control valve 72 is closed, the second bypass valve 102 is open, the first bypass valve 101 is closed, and the carrier gas control valve 25 is open. In the working state, the liquid source pipeline 10, the first flowmeter 80, the liquid inlet pipeline 22, the vaporizer 21, the air outlet pipeline 23 and the output pipeline 30 are sequentially communicated. The liquid process medium sequentially passes through the liquid source pipeline 10, the first flowmeter 80 and the liquid inlet pipeline 22 to enter the vaporizer 21, the vaporizer 21 vaporizes the liquid process medium, and the vaporized gaseous process medium sequentially passes through the gas outlet pipeline 23 and the output pipeline 30 to enter the process chamber of the semiconductor process equipment, so that the corresponding semiconductor process is performed.

As shown in fig. 5, in the third cleaning state, the second control valve 52 is opened and the first control valve 51 is closed; the first bypass valve 101 is opened, the second bypass valve 102 is closed, and the carrier gas control valve 25 is closed. So that the liquid source line 10, the first flowmeter 80, the liquid inlet line 22, the first bypass line 90, the exhaust gas treatment line 62, the vacuum pump, and the exhaust gas treatment device 61 are sequentially communicated. The normally used liquid process media may have pyrophoric, corrosive, toxic and other dangerous properties. When the first flowmeter 80 needs maintenance and replacement, sufficient purging must be performed to ensure personnel safety, preventing device and piping residues. When the liquid source vaporization system is in the third state, the purge gas sequentially passes through the liquid source pipeline 10, the first flowmeter 80, the liquid inlet pipeline 22, the first bypass pipeline 90, the tail gas treatment pipeline 62 and the vacuum pump, and pollutants and residual liquid in the purge gas are blown to the tail gas treatment system for treatment, so that the safety of operators in the maintenance and replacement process of the first flowmeter 80 is ensured.

It should be noted that, in the above embodiment, the bypass control unit 100 includes the first bypass valve 101 and the second bypass valve 102, but this is not limitative, and for example, in some other embodiments not shown in the drawings, the first control unit 50 may also be a three-way valve, where a first end of the three-way valve is in communication with the liquid inlet line 22, a second end of the three-way valve is in communication with the first bypass line 90, and a third end of the three-way valve is in communication with the vaporizer 21, so that the liquid inlet line 22 is in communication with the first bypass line 90 or the liquid inlet line 22 is in communication with the vaporizer 21 through the three-way valve. That is, the present invention is not limited to the principle of operation, and any structure that allows switching between the carburetor 21 and the first bypass duct 90 is within the scope of the present invention.

In a third embodiment of the present invention as shown in fig. 6, there is also disclosed a liquid source vaporization system which is substantially the same as the first embodiment except that in this example, the liquid source vaporization system further includes: a second bypass line 110 and a fifth control valve 120, the inlet end of the second bypass line 110 being in communication with the purge gas source, the outlet end of the second bypass line 110 being in communication with the liquid inlet line 22, the outlet end of the second bypass line 110 being located between the first flow meter 80 and the vaporization chamber; the fifth control valve 120 is used for controlling the on-off of the second bypass line 110.

The liquid source vaporization system has an operating state and a fourth cleaning state.

In the operating state, the first control valve 51 is open, the second control valve 52 is closed, the fifth control valve 120 is closed, the third control valve 71 is open, the fourth control valve 72 is closed, and the carrier gas control valve 25 is open. The liquid source pipeline 10, the liquid inlet pipeline 22, the vaporizer 21, the air outlet pipeline 23 and the output pipeline 30 are sequentially communicated. The liquid process medium sequentially passes through the liquid source pipeline 10 and the liquid inlet pipeline 22 to enter the vaporizer 21, the vaporizer 21 vaporizes the liquid process medium, and the vaporized gaseous process medium sequentially passes through the gas outlet pipeline 23 and the output pipeline 30 to enter the process chamber of the semiconductor process equipment, so that the corresponding semiconductor process is performed.

As shown in fig. 6, in the fourth cleaning state, the fifth control valve 120 is opened, the first control valve 51 is closed, the second control valve 52 is closed, the carrier gas control valve 25 is opened, the fourth control valve 72 is opened, and the third control valve 71 is closed.

The fourth cleaning state is mainly used in the case where the first flow meter 80 fails and cannot pass through the liquid. When the liquid source vaporization system is in the fourth state, the purge gas source, the second bypass line 110, the liquid inlet line 22, the vaporizer 21, the gas outlet line 23, the tail gas treatment line 62, the vacuum pump, and the tail gas treatment device 61 are sequentially communicated. The purge gas bypasses the first flowmeter 80 through the second bypass pipeline 110, then sequentially passes through the liquid inlet pipeline 22 and enters the vaporizer 21, meanwhile, the vaporizer 21 vaporizes residual liquid in the interior under the assistance of carrier gas, the residual liquid, air, moisture, particles and the like in the pipeline and the vaporizer 21 are purged completely under the action of the purge gas, the vaporized gas and pollutants are discharged into the tail gas treatment device 61 through the air outlet pipeline 23 and the tail gas treatment pipeline 62, and finally the pollutants are treated through the tail gas treatment device 61, so that the pollution of the pollutants to the environment is avoided. By providing the second bypass line 110, when the first flowmeter 80 fails and cannot pass through the liquid, residual liquid in the rear end line of the first flowmeter 80 can be drained, so that the overall safety is ensured.

In the prior art, if the vaporizer 21 fails to vaporize the liquid process medium continuously, the discharge of the residual liquid process medium in the pipeline becomes difficult. To solve this problem, as shown in fig. 7, in a fourth embodiment of the present invention, there is also disclosed a liquid source vaporization system, which is substantially the same as that of the first embodiment, except that in this example, the liquid source vaporization system further includes: the residual liquid recovery device 130, the residual liquid recovery device 130 is communicated with the liquid inlet pipeline 22, and the residual liquid recovery device 130 is used for recovering residual process media.

According to the liquid source vaporization system of the fourth embodiment of the invention, the residual liquid recovery device 130 is added on the basis of the first embodiment, and residual liquid in a pipeline can be recovered, so that the loss of a liquid process medium is reduced, and the material cost is reduced.

Specifically, in the fourth embodiment, as shown in fig. 7, the raffinate recovery apparatus 130 includes: a raffinate collector 131, a raffinate recovery line 132 and a sixth control valve 133, the raffinate collector 131 being for recovering a residual liquid process medium; the outlet end of the residual liquid recovery pipeline 132 is communicated with the residual liquid collector 131, and the inlet end of the residual liquid recovery pipeline 132 is communicated with the liquid inlet pipeline 22; the sixth control valve 133 is disposed on the raffinate recovery line 132, and is used for controlling on/off of the raffinate recovery line 132.

In order to recover the raffinate in cooperation with the raffinate recovery apparatus 130, the vaporizing apparatus 20 further comprises: the seventh control valve 26, the seventh control valve 26 is disposed on the liquid inlet pipeline 22, and the seventh control valve 26 is disposed between the inlet end of the raffinate recovery pipeline 132 and the vaporizer 21, for controlling the on-off between the vaporization chamber of the vaporizer 21 and the liquid inlet pipeline 22.

Still further, the raffinate recovery apparatus 130 further comprises an exhaust line 134 and an eighth control valve 135, the raffinate collector 131 having an exhaust port, the exhaust port being in communication with the tail gas treatment unit 60 through the exhaust line 134; an eighth control valve 135 is disposed on the exhaust pipe 134 for controlling the on-off of the exhaust pipe 134. By providing the vent line 134, excess gas and pressure in the vessel can be removed, thereby facilitating the collection of the raffinate.

In this embodiment, the liquid source vaporization system has an operating state and a first raffinate recovery state.

In the operating state, the first control valve 51 is open and the second control valve 52 is closed; the third control valve 71 is open, the fourth control valve 72 is closed, the seventh control valve 26 is open, the sixth control valve 133 is closed, and the carrier gas control valve 25 is open. In the working state, the liquid source pipeline 10, the first flowmeter 80, the liquid inlet pipeline 22, the vaporizer 21, the air outlet pipeline 23 and the output pipeline 30 are sequentially communicated. The liquid process medium sequentially passes through the liquid source pipeline 10, the first flowmeter 80 and the liquid inlet pipeline 22 to enter the vaporizer 21, the vaporizer 21 vaporizes the liquid process medium, and the vaporized gaseous process medium sequentially passes through the gas outlet pipeline 23 and the output pipeline 30 to enter the process chamber of the semiconductor process equipment, so that the corresponding semiconductor process is performed.

As shown in fig. 7, in the first raffinate withdrawal state, the second control valve 52 is open, the first control valve 51 is closed, the sixth control valve 133 is open, the seventh control valve 26 is closed, the eighth control valve 135 is open, and the carrier gas control valve 25 is closed.

The first raffinate recovery state is mainly used when the vaporizer 21 fails and vaporization cannot be performed. When the liquid source vaporization system is in the first residual liquid recovery state, the purge gas source, the purge line 40, the liquid inlet line 22, the residual liquid recovery line 132 and the residual liquid collector 131 are sequentially communicated, and the gas outlet of the residual liquid collector 131, the gas exhaust line 134, the tail gas treatment line 62 and the tail gas treatment device 61 are sequentially communicated. The purge gas sequentially passes through the purge pipeline 40, the liquid inlet pipeline 22 and the residual liquid recovery pipeline 132 to enter the residual liquid collector 131, and then passes through the exhaust port of the residual liquid collector 131, the exhaust pipeline 134 and the tail gas treatment pipeline 62 to enter the tail gas treatment device 61. In this process, the residual liquid in the pipeline enters the residual liquid collector 131 along with the purge gas for recovery, and the gaseous process medium or other waste gas in the pipeline can enter the tail gas treatment device 61 along with the purge gas for treatment, so that the residual liquid collection is ensured, and meanwhile, the environmental pollution can be avoided.

According to the liquid source vaporization system of the fourth embodiment of the invention, by arranging the residual liquid collector 131, the residual liquid recovery pipeline 132 and the sixth control valve 133 and arranging the seventh control valve 26 on the liquid inlet pipeline 22 between the inlet end of the residual liquid recovery pipeline 132 and the vaporizer 21, the liquid inlet pipeline 22 can be controlled to be communicated with the residual liquid recovery pipeline 132 or the liquid inlet pipeline 22 can be communicated with the vaporizer 21 through the sixth control valve 133 and the seventh control valve 26, so that residual liquid in the pipeline can be recovered, thereby reducing the loss of liquid process media and reducing the material cost. In addition, by arranging the exhaust pipeline 134, redundant gas and pressure in the container can be treated, and gaseous process media or other waste gases in the pipeline can enter the tail gas treatment device 61 along with the purge gas for treatment, so that the residual liquid can be conveniently collected, and meanwhile, the environment pollution can be avoided, and the device belongs to a typical one-object multi-purpose device.

As shown in fig. 8, in a fifth embodiment of the present invention, there is also disclosed a liquid source vaporization system, which is substantially the same as the fourth embodiment, except that in this example, the liquid source vaporization system further includes: a ninth control valve 136, the ninth control valve 136 being disposed on the raffinate withdrawal line 132, the ninth control valve 136 being located between the sixth control valve 133 and the outlet end of the raffinate withdrawal line 132.

The liquid source vaporization system further includes: a purge branch 140 and a tenth control valve 150, wherein an inlet end of the purge branch 140 is communicated with a purge gas source, an outlet end of the purge branch 140 is communicated with the raffinate recovery line 132, and an outlet end of the purge branch 140 is positioned between the ninth control valve 136 and the sixth control valve 133; a tenth control valve 150 is provided on the purge branch 140 for controlling the on-off of the purge branch 140.

In this embodiment, the liquid source vaporization system has an operating state and a second raffinate recovery state.

In the operating state, the first control valve 51 is open, the second control valve 52 is closed, and the tenth control valve 150 is closed; the third control valve 71 is open, the fourth control valve 72 is closed, the seventh control valve 26 is open, the sixth control valve 133 is closed, and the carrier gas control valve 25 is open. In the working state, the liquid source pipeline 10, the first flowmeter 80, the liquid inlet pipeline 22, the vaporizer 21, the air outlet pipeline 23 and the output pipeline 30 are sequentially communicated. The liquid process medium sequentially passes through the liquid source pipeline 10, the first flowmeter 80 and the liquid inlet pipeline 22 to enter the vaporizer 21, the vaporizer 21 vaporizes the liquid process medium, and the vaporized gaseous process medium sequentially passes through the gas outlet pipeline 23 and the output pipeline 30 to enter the process chamber of the semiconductor process equipment, so that the corresponding semiconductor process is performed.

As shown in fig. 8, in the second raffinate withdrawal state, tenth control valve 150 is open, first control valve 51 is closed, second control valve 52 is closed, ninth control valve 136 is open, sixth control valve 133 is closed, seventh control valve 26 is closed, eighth control valve 135 is open, and carrier gas control valve 25 is closed.

The second raffinate recovery state is mainly used for purging the pipeline after the raffinate is collected, so as to remove impurities such as air, moisture and the like in the pipeline and the raffinate collector 131. When the liquid source vaporization system is in the second residual liquid recovery state, the purge gas source, the purge branch 140, the residual liquid recovery pipeline 132 and the residual liquid collector 131 are sequentially communicated, and the exhaust port of the residual liquid collector 131, the exhaust pipeline 134, the tail gas treatment pipeline 62 and the tail gas treatment device 61 are sequentially communicated. The purge gas sequentially passes through the purge branch 140 and the residual liquid recovery pipeline 132 to enter the residual liquid collector 131, and then passes through the exhaust port of the residual liquid collector 131, the exhaust pipeline 134 and the tail gas treatment pipeline 62 to enter the tail gas treatment device 61. In the process, impurities such as air, water vapor and the like in the pipeline and the residual liquid collector 131 are discharged from the residual liquid collector 131 along with the purge gas and enter the tail gas treatment device 61 along with the purge gas for treatment, so that the collected residual liquid is ensured not to react with the gas impurities and is in a relatively stable state; meanwhile, the environmental pollution of the discharged waste gas can be avoided.

As shown in fig. 9, in a sixth embodiment of the present invention, there is also disclosed a liquid source vaporization system which is substantially the same as that of the fifth embodiment, except that in this example, the raffinate recovery apparatus 130 further comprises: a residual gas discharge pipe 137 and a residual gas control valve 138, wherein an inlet end of the residual gas discharge pipe 137 is communicated with the residual liquid recovery pipe 132, an inlet end of the residual gas discharge pipe 137 is positioned between the sixth control valve 133 and the ninth control valve 136, an outlet end of the residual gas discharge pipe 137 is communicated with the tail gas treatment pipe 62, and an outlet end of the residual gas discharge pipe 137 is positioned between the fourth control valve 72 and the vacuum pump; a residual air control valve 138 is provided on the residual air discharge pipe 137 for controlling on-off of the residual air discharge pipe 137.

In this embodiment, the liquid source vaporization system has an operating state and a residual air discharging state.

As shown in fig. 9, in the residual gas discharging state, the second control valve 52 is opened, the first control valve 51 is closed, the tenth control valve 150 is closed, the sixth control valve 133 is opened, the residual gas control valve 138 is opened, the seventh control valve 26 is closed, the ninth control valve 136 is closed, and the carrier gas control valve 25 is closed.

The residual gas discharging state is mainly used for purging the pipeline through purge gas when the residual liquid collector 131 needs to be removed after the residual liquid is collected, so as to remove residual gaseous process media, air, moisture and other impurities in the pipeline.

When the liquid source vaporization system is in the residual gas discharging state, the purge gas source, the purge line 40, the liquid inlet line 22, the residual liquid recovery line 132, the residual gas discharging line 137, the tail gas treatment line 62, and the tail gas treatment device 61 are sequentially communicated. The purge gas sequentially passes through the purge pipeline 40, the liquid inlet pipeline 22, the residual liquid recovery pipeline 132, the residual gas discharge pipeline 137 and the tail gas treatment pipeline 62 to enter the tail gas treatment device 61, and in the process, the purge gas brings gaseous process media in the pipeline and impurities such as air and moisture into the tail gas treatment device 61 for treatment, so that the impurities such as the gaseous process media in the pipeline, the air and the moisture are removed, and the safety of the detachment process of the residual liquid collector 131 is ensured. Meanwhile, the environmental pollution of the discharged waste gas can be avoided.

A seventh embodiment of the present invention as shown in fig. 10 to 16 also discloses a liquid source vaporization system, which is substantially the same as the sixth embodiment, except that in this example, the liquid source vaporization system further includes: a second bypass line 110 and a fifth control valve 120, the inlet end of the second bypass line 110 being in communication with the purge gas source, the outlet end of the second bypass line 110 being in communication with the liquid inlet line 22, the outlet end of the second bypass line 110 being located between the first flow meter 80 and the vaporization chamber; the fifth control valve 120 is used for controlling the on-off of the second bypass line 110.

In this example, the liquid source vaporization system has an operating state, a first cleaning state, a second cleaning state, a fourth cleaning state, a first raffinate collection state, and a raffinate discharge state.

As shown in fig. 10, in the operating state, the first control valve 51 is open, the second control valve 52 is closed, the fifth control valve 120 is closed, the tenth control valve 150 is closed, the seventh control valve 26 is open, the sixth control valve 133 is closed, the carrier gas control valve 25 is open, the third control valve 71 is open, and the fourth control valve 72 is closed.

In the working state, the liquid source pipeline 10, the first flowmeter 80, the liquid inlet pipeline 22, the vaporizer 21, the air outlet pipeline 23 and the output pipeline 30 are sequentially communicated. The liquid process medium sequentially passes through the liquid source pipeline 10, the first flowmeter 80 and the liquid inlet pipeline 22 to enter the vaporizer 21, the vaporizer 21 vaporizes the liquid process medium, and the vaporized gaseous process medium sequentially passes through the gas outlet pipeline 23 and the output pipeline 30 to enter the process chamber of the semiconductor process equipment, so that the corresponding semiconductor process is performed.

As shown in fig. 11, in the first cleaning state, the second control valve 52 is opened, the first control valve 51 is closed, the fifth control valve 120 is closed, the tenth control valve 150 is closed, the seventh control valve 26 is opened, the sixth control valve 133 is closed, the carrier gas control valve 25 is closed, the fourth control valve 72 is opened, and the third control valve 71 is closed.

The purge gas sequentially passes through the purge pipeline 40, the liquid inlet pipeline 22, the vaporizer 21 and the air outlet pipeline 23, so that residual liquid, air, moisture, particles and the like in the pipelines and the vaporizer 21 are purged completely, and meanwhile, pollutants blown out of the vaporizer 20 by the purge gas enter the tail gas treatment device 61 through the tail gas treatment pipeline 62, so that the pollutants are treated through the tail gas treatment unit 60, and the pollution of the pollutants to the environment is avoided.

As shown in fig. 12, in the second cleaning state, the second control valve 52 is opened, the first control valve 51 is closed, the fifth control valve 120 is closed, the tenth control valve 150 is closed, the seventh control valve 26 is opened, the sixth control valve 133 is closed, the carrier gas control valve 25 is opened, the fourth control valve 72 is opened, and the third control valve 71 is closed.

The second cleaning state is mainly for discharging the residual liquid and gas in the pipeline and the vaporizer 21 after the process is finished. The purge gas sequentially passes through the purge pipeline 40, the liquid inlet pipeline 22, the vaporizer 21 and the air outlet pipeline 23, meanwhile, as the carrier gas control valve 25 is opened, under the action of carrier gas, the vaporizer 21 vaporizes the liquid in the interior into gas, and then the gas is blown out together by the purge gas, so that residual liquid and gas in the pipelines and the vaporizer 21 are purged completely, and meanwhile, pollutants blown out by the purge gas from the vaporizer 20 enter the tail gas treatment device 61 through the tail gas treatment pipeline 62, so that the pollutants are treated through the tail gas treatment unit 60, and the pollution of the pollutants to the environment is avoided.

As shown in fig. 13, in the fourth cleaning state, the fifth control valve 120 is opened, the first control valve 51 is closed, the second control valve 52 is closed, the tenth control valve 150 is closed, the seventh control valve 26 is opened, the sixth control valve 133 is closed, the carrier gas control valve 25 is opened, the fourth control valve 72 is opened, and the third control valve 71 is closed.

As shown in fig. 14, in the first raffinate withdrawal state, the second control valve 52 is open, the first control valve 51 is closed, the fifth control valve 120 is closed, the tenth control valve 150 is closed, the sixth control valve 133 is open, the ninth control valve 136 is open, the seventh control valve 26 is closed, the residual gas control valve 138 is closed, the eighth control valve 135 is open, the carrier gas control valve 25 is closed, the third control valve 71 is closed, and the fourth control valve 72 is closed.

According to the liquid source vaporization system of the seventh embodiment of the invention, by arranging the raffinate collector 131, the raffinate recovery pipeline 132 and the sixth control valve 133 and arranging the seventh control valve 26 on the liquid inlet pipeline 22 between the inlet end of the raffinate recovery pipeline 132 and the vaporizer 21, the liquid inlet pipeline 22 can be controlled to be communicated with the raffinate recovery pipeline 132 or the liquid inlet pipeline 22 can be controlled to be communicated with the vaporizer 21 through the sixth control valve 133 and the seventh control valve 26, so that the raffinate in the pipeline can be recovered, thereby reducing the loss of liquid process media and reducing the material cost. In addition, by arranging the exhaust pipeline 134, redundant gas and pressure in the container can be treated, and gaseous process media or other waste gases in the pipeline can enter the tail gas treatment device 61 along with the purge gas for treatment, so that the residual liquid can be conveniently collected, and meanwhile, the environment pollution can be avoided, and the device belongs to a typical one-object multi-purpose device.

As shown in fig. 15, in the second raffinate withdrawal state, tenth control valve 150 is open, first control valve 51 is closed, second control valve 52 is closed, fifth control valve 120 is closed, ninth control valve 136 is open, sixth control valve 133 is closed, seventh control valve 26 is closed, residual gas control valve 138 is closed, eighth control valve 135 is open, carrier gas control valve 25 is closed, third control valve 71 is closed, and fourth control valve 72 is closed.

As shown in fig. 16, in the residual gas discharging state, the second control valve 52 is opened, the first control valve 51 is closed, the fifth control valve 120 is closed, the tenth control valve 150 is closed, the sixth control valve 133 is opened, the residual gas control valve 138 is opened, the seventh control valve 26 is closed, the ninth control valve 136 is closed, the eighth control valve 135, the carrier gas control valve 25 is closed, the third control valve 71 is closed, and the fourth control valve 72 is closed.

It should be noted that, in this embodiment, the residual air removal state may also implement the function of the third cleaning state in the second embodiment, that is, when the first flowmeter 80 needs to be maintained and replaced, in order to ensure the safety of personnel, the liquid source vaporization system of this embodiment may be adjusted to the residual air removal state, and the pollutants and residual liquid therein may be blown to the tail gas treatment system for treatment, so as to ensure the safety of the operators during the maintenance and replacement of the first flowmeter 80, which belongs to a typical one-object-multi-purpose.

In the prior art, the atomizer and the flowmeter in the vaporizer 21 have small pore structures, and when the liquid source is viscous, the liquid source is easy to be blocked, so that the vaporizer 21 and the flowmeter need to be replaced and maintained.

In order to solve the above-mentioned problem, the liquid source vaporization system of the present embodiment further has a first flushing mode, which is substantially the same as the first collecting state, except that in the first flushing state, the first control valve 51 is opened and the second control valve 52 is closed. And the liquid introduced into the liquid source is not a process medium any more, but is changed into an organic solvent, for example: n-octane and the like, the pipelines and the devices are washed by the organic solvent, and the residual liquid and the organic solvent after the pipeline washing sequentially enter a residual liquid collector 131 through a purging pipeline 40, a liquid inlet pipeline 22 and a residual liquid recovery pipeline 132, and the waste liquid after the washing is collected, so that the pipeline is washed. And then, the first residual liquid recovery state can be entered, and residual liquid in the pipeline is recovered through the purge gas, so that the cleaning work of the pipeline is completed.

In addition, the liquid source vaporization system of the present embodiment further has a second flushing mode, which is substantially the same as the second collecting state, except that in the second flushing state, the first control valve 51 is opened and the second control valve 52 is closed. The liquid introduced into the liquid source is likewise no longer a process medium but is instead an organic solvent, for example: n-octane and the like, and the organic solvent sequentially passes through the purging pipeline 40, the liquid inlet pipeline 22, the vaporizer 21 and the air outlet pipeline 23, meanwhile, under the action of carrier gas, the vaporizer 21 gasifies the internal liquid organic solvent into gas due to the opening of the carrier gas control valve 25, and simultaneously dissolves and blows out the residual process medium in the vaporizer 21, so that the residual process medium in the pipeline and the vaporizer 21 is flushed clean and enters the tail gas treatment device 61 through the tail gas treatment pipeline 62, and the pollutants are treated through the tail gas treatment unit 60, so that the pollution of the pollutants to the environment is avoided. And then, the device can enter a second cleaning state, and residual liquid in the pipeline is recovered through the purge gas, so that the cleaning work of the pipeline is completed.

The first flushing state differs from the second flushing state in that the first flushing state is flushing the line preceding the carburetor 21, whereas the second flushing state enables flushing of the interior of the carburetor 21.

An eighth embodiment of the present invention shown in fig. 17 also discloses a liquid source vaporization system which is substantially the same as the seventh embodiment except that in this example, the exhaust line 134 is directly connected to the exhaust gas treatment device 61 without passing through a vacuum pump. With this structure, the liquid source vaporization system is directly adjusted to the second residual liquid recovery state after the installation is completed, and no special gas or liquid is in the pipeline because the residual liquid collector 131 is purged for the first time, so the residual liquid can be directly purged into the tail gas treatment system without a vacuum pump.

In the above embodiment, in order to prevent the carrier gas from fluctuating to the original temperature after entering the vaporizer 21, the vaporizing device 20 further includes a heat exchanger disposed on the carrier gas pipe 24, and the heat exchanger is used to heat the carrier gas so as to raise the temperature of the carrier gas to the required temperature in a short time, thereby improving the vaporizing effect.

In the above embodiment, the first flow meter 80 is a mass flow meter, and the flow rate of the liquid can be precisely controlled. In addition, in order to precisely control the flow rate of the carrier gas, a gas flow meter, a mass flow meter, is provided on the carrier gas line 24, and the flow rate of the gas can be precisely controlled. However, this is not limitative, but is within the scope of the invention as long as it is a device that can accurately meter the flow of liquid or gas without departing from the inventive concept of the present invention.

In order to monitor the state of the liquid or gas in the pipeline, a pressure detection device may be provided on the pipeline to confirm the overall transmission performance and safety. Take embodiment seven as an example:

a first pressure sensing device may be provided on the feed line 22 between the inlet end of the raffinate withdrawal line 132 and the first flow meter 80. For detecting the pressure of the fluid entering the vaporizer 21 and confirming the stability of the supply pressure of the liquid source.

The second pressure detecting device may be further disposed on the re-air outlet pipeline 23 to detect the air outlet pressure at the rear end of the vaporizer 21, for example, if the air outlet pressure is too low, the carrier gas pressure and the carrier gas amount may be appropriately increased to raise the air outlet pressure, ensure the forward transmission of the fluid, and confirm the tightness of the pipeline.

A third pressure detecting device may be provided in the residual air discharging pipe 137, and the third pressure detecting device may be located between the inlet end of the third pressure detecting device and the residual air control valve 138, so that the tightness of the pipe may be confirmed.

A fourth pressure detection device can be arranged at the inlet position of the vacuum pump, so that whether the vacuum pump operates normally or not can be confirmed, and whether the pipeline is in a vacuum state or not can be confirmed.

In the above embodiment, the vacuum pump is used to pump the gas in the pipeline and discharge the gas into the exhaust gas treatment device by using the negative pressure, but this is not limitative, and the device may be an air pump, a fan, or the like, as long as the device can generate the airflow and discharge the airflow into the exhaust gas treatment device, which is within the protection scope of the present invention.

It is to be understood that the above embodiments are merely illustrative of the application of the principles of the present invention, but not in limitation thereof. Various modifications and improvements may be made by those skilled in the art without departing from the spirit and substance of the invention, and are also considered to be within the scope of the invention.

Claims

1. A liquid source vaporization system for use in semiconductor processing equipment, comprising:

Vaporizing means (20) for vaporizing the liquid process medium into a gaseous process medium;

a liquid source line (10) for providing a liquid process medium to the vaporizing device (20);

a purge line (40) in communication with the vaporizing device (20) for providing purge gas to the vaporizing device (20);

a first control unit (50) for controlling the communication of the purge line (40) or the liquid source line (10) with the vaporizing device (20);

an output line (30) for delivering the vaporized gaseous process medium into a process chamber of the semiconductor process apparatus;

an exhaust gas treatment line (62) that communicates with the vaporizing device (20) and that is configured to convey the contaminants blown out of the vaporizing device (20) by the purge gas to an exhaust gas treatment device (61);

and a second control unit (70) for controlling the exhaust gas treatment pipeline (62) or the output pipeline (30) to be communicated with the vaporizing device (20).

2. The liquid source vaporization system of claim 1, wherein the liquid source is a liquid source,

the liquid source vaporization system has a working state and a first cleaning state;

in the working state, the first control unit (50) controls the liquid source pipeline (10) to be communicated with the vaporizing device (20), and the second control unit (70) controls the output pipeline (30) to be communicated with the vaporizing device (20);

In the first cleaning state, the first control unit (50) controls the purge line (40) to communicate with the vaporizing device (20), and the second control unit (70) controls the exhaust gas treatment line (62) to communicate with the vaporizing device (20).

3. The liquid source vaporization system of claim 1, wherein the vaporization device (20) comprises:

a vaporizer (21), the vaporizer (21) having a vaporization chamber for vaporizing the liquid process medium;

the outlet end of the liquid inlet pipeline (22) is communicated with the vaporization chamber, and the inlet end of the liquid inlet pipeline (22) is respectively communicated with the outlet end of the liquid source pipeline (10) and the outlet end of the purging pipeline (40);

the inlet end of the air outlet pipeline (23) is communicated with the vaporization chamber, and the outlet end of the air outlet pipeline (23) is respectively communicated with the inlet end of the output pipeline (30) and the tail gas treatment pipeline (62).

4. The liquid source vaporization system of claim 3 wherein,

in the working state, the first control unit (50) controls the liquid source pipeline (10) to be communicated with the liquid inlet pipeline (22), and the second control unit (70) controls the output pipeline (30) to be communicated with the air outlet pipeline (23);

In the first cleaning state, the first control unit (50) controls the purge pipeline (40) to be communicated with the liquid inlet pipeline (22), and the second control unit (70) controls the tail gas treatment pipeline (62) to be communicated with the air outlet pipeline (23).

5. The liquid source vaporization system of claim 4, wherein the first control unit (50) comprises:

the first control valve (51) is arranged on the liquid source pipeline (10) and used for controlling the on-off of the liquid source pipeline (10);

the second control valve (52) is arranged on the purging pipeline (40) and used for controlling the on-off of the purging pipeline (40); and is also provided with

The second control unit (70) includes:

the third control valve (71) is arranged on the output pipeline (30) and used for controlling the on-off of the output pipeline (30);

a fourth control valve (72), wherein the fourth control valve (72) is arranged on the tail gas treatment pipeline (62) and is used for controlling the on-off of the tail gas treatment pipeline (62); wherein the method comprises the steps of

In the working state, the first control valve (51) is opened, the second control valve (52) is closed, the third control valve (71) is opened, and the fourth control valve (72) is closed;

In the first cleaning state, the second control valve (52) is open, the first control valve (51) is closed, the fourth control valve (72) is open, and the third control valve (71) is closed.

6. The liquid source vaporization system of claim 4, wherein the vaporizing device (20) further comprises:

a carrier gas line (24), wherein an inlet end of the carrier gas line (24) is used for communicating with a carrier gas source, and an outlet end of the carrier gas line (24) is communicated with the vaporization chamber;

and the carrier gas control valve (25) is arranged on the carrier gas pipeline (24), and the carrier gas control valve (25) is used for controlling the on-off of the carrier gas pipeline (24).

7. The liquid source vaporization system of claim 6, wherein the liquid source is a liquid source,

in the operating state, the carrier gas control valve (25) is open;

in the first cleaning state, the carrier gas control valve (25) is closed.

8. The liquid source vaporization system of claim 6, wherein the liquid source is a liquid source,

the liquid source vaporization system also has a second cleaning state;

in the second cleaning state, the first control unit (50) controls the purge pipeline (40) to be communicated with the liquid inlet pipeline (22), the second control unit (70) controls the air outlet pipeline (23) to be communicated with the tail gas treatment pipeline (62), and the carrier gas control valve (25) is opened.

9. The liquid source vaporization system of claim 3, wherein the liquid source vaporization system further comprises:

-a first flow meter (80), said first flow meter (80) being arranged on said feed line (22), said first flow meter (80) being adapted to control the flow of said liquid process medium;

a first bypass line (90), an inlet end of the first bypass line (90) being in communication with the liquid inlet line (22), an inlet end of the first bypass line (90) being located between the first flowmeter (80) and the vaporizer (21), an outlet end of the first bypass line (90) being in communication with the exhaust gas treatment line (62);

-a bypass control unit (100), the bypass control unit (100) being adapted to control the first flow meter (80) to communicate with the vaporisation chamber or the first flow meter (80) to communicate with the first bypass line (90).

10. The liquid source vaporization system of claim 9, wherein the liquid source is a liquid source,

the liquid source vaporization system has a working state and a third cleaning state;

in the working state, the first control unit (50) controls the liquid source pipeline (10) to be communicated with the liquid inlet pipeline (22), the bypass control unit (100) controls the first flowmeter (80) to be communicated with the vaporization chamber, and the second control unit (70) controls the output pipeline (30) to be communicated with the air outlet pipeline (23);

In the third cleaning state, the first control unit (50) controls the purge line (40) to communicate with the liquid inlet line (22), and the bypass control unit (100) controls the first flowmeter (80) to communicate with the first bypass line (90).

11. The liquid source vaporization system of claim 6, further comprising:

-a first flow meter (80), said first flow meter (80) being arranged on said feed line (22), said first flow meter (80) being adapted to calculate a flow rate of said liquid process medium;

a second bypass line (110), an inlet end of the second bypass line (110) being in communication with a purge gas source, an outlet end of the second bypass line (110) being in communication with the liquid inlet line (22), an outlet end of the second bypass line (110) being located between the first flow meter (80) and the vaporization chamber;

and a fifth control valve (120), wherein the fifth control valve (120) is used for controlling the on-off of the second bypass pipeline (110).

12. The liquid source vaporization system of claim 11, wherein the liquid source is a liquid source,

the liquid source vaporization system has a working state and a fourth cleaning state;

in the working state, the first control unit (50) controls the liquid source pipeline (10) to be communicated with the vaporizing device (20), the carrier gas control valve (25) is opened, and the fifth control valve (120) is closed;

The liquid source vaporization system has a fourth cleaning state;

in the fourth cleaning state, the first control unit (50) controls the liquid source pipeline (10) and the purging pipeline (40) to be disconnected from the vaporizing device (20), the carrier gas control valve (25) and the fifth control valve (120) are opened, and the second control unit (70) controls the tail gas treatment pipeline (62) to be communicated with the vaporizing device (20).

13. The liquid source vaporization system of claim 4, further comprising:

a raffinate collector (131), the raffinate collector (131) being for recovering a residual liquid process medium;

a raffinate recovery line (132), wherein an outlet end of the raffinate recovery line (132) is communicated with the raffinate collector (131), and an inlet end of the raffinate recovery line (132) is communicated with the feed liquor line (22);

a sixth control valve (133), wherein the sixth control valve (133) is arranged on the raffinate recovery pipeline (132) and is used for controlling the on-off of the raffinate recovery pipeline (132);

the vaporizing device (20) further comprises:

the seventh control valve (26), the seventh control valve (26) is arranged on the liquid inlet pipeline (22), and the seventh control valve (26) is arranged between the inlet end of the residual liquid recovery pipeline (132) and the vaporizer (21) and is used for controlling the on-off between the vaporizer (21) and the liquid inlet pipeline (22).

14. The liquid source vaporization system of claim 13, wherein the liquid source vaporization system further comprises:

an exhaust line (134), the raffinate collector (131) having an exhaust vent, the exhaust vent being in communication with the exhaust treatment line (62) through the exhaust line (134);

and an eighth control valve (135), wherein the eighth control valve (135) is arranged on the exhaust pipeline (134) and is used for controlling the on-off of the exhaust pipeline (134).

15. The liquid source vaporization system of claim 14 wherein the liquid source is a liquid source,

in an operating mode of the liquid source vaporization system, the seventh control valve (26) is open and the sixth control valve (133) is closed;

the liquid source vaporization system further comprises a first residual liquid recovery state, in which the first control unit (50) controls the purge pipeline (40) to be communicated with the vaporization device (20), the seventh control valve (26) is closed, and the sixth control valve (133) and the eighth control valve (135) are opened.

16. The liquid source vaporization system of claim 14, wherein the liquid source vaporization system further comprises:

a ninth control valve (136), the ninth control valve (136) being disposed on the raffinate withdrawal line (132), the ninth control valve (136) being located between the sixth control valve (133) and an outlet end of the raffinate withdrawal line (132);

A purge branch (140), wherein an inlet end of the purge branch (140) is communicated with a purge gas source, an outlet end of the purge branch (140) is communicated with the raffinate recovery pipeline (132), and an outlet end of the purge branch (140) is positioned between the ninth control valve (136) and the sixth control valve (133);

and a tenth control valve (150), wherein the tenth control valve (150) is arranged on the purging branch (140) and is used for controlling the on-off of the purging branch (140).

17. The liquid source vaporization system of claim 16 wherein the liquid source is a liquid source,

in the working mode of the liquid source vaporization system, the sixth control valve (133) and the tenth control valve (150) are closed, and the seventh control valve (26) is opened;

the liquid source vaporization system further comprises a second residual liquid recovery state, in which the first control unit (50) controls the liquid source pipeline (10) and the purge pipeline (40) to be disconnected from the vaporization device (20), the sixth control valve (133) is closed, and the tenth control valve (150), the ninth control valve (136) and the eighth control valve (135) are opened.

18. The liquid source vaporization system of claim 17, wherein the liquid source vaporization system further comprises:

A residual gas discharge pipeline (137), wherein an inlet end of the residual gas discharge pipeline (137) is communicated with the residual liquid recovery pipeline (132), an inlet end of the residual gas discharge pipeline (137) is positioned between the sixth control valve (133) and the ninth control valve (136), and an outlet end of the residual gas discharge pipeline (137) is communicated with the tail gas treatment pipeline (62);

and the residual air control valve (138) is arranged on the residual air discharge pipeline (137) and used for controlling the on-off of the residual air discharge pipeline (137).

19. The liquid source vaporization system of claim 18 wherein the liquid source is a liquid source,

the liquid source vaporization system is provided with a pipeline residual air discharge state;

in the pipeline residual air discharging state, the first control unit (50) controls the purging pipeline (40) to be communicated with the vaporizing device (20), and a sixth control valve, a tenth control valve (150), a ninth control valve (136) and a seventh control valve (26) are closed; the sixth control valve (133) and the residual air control valve (138) are opened.

20. The liquid source vaporization system of claim 18, wherein the vaporizing device (20) further comprises:

a carrier gas pipeline (24), wherein the inlet end of the carrier gas pipeline (24) is used for being communicated with a carrier gas source, and the outlet end of the carrier gas pipeline (24) is communicated with the vaporization chamber;

A carrier gas control valve (25), wherein the carrier gas control valve (25) is arranged on the carrier gas pipeline (24), and the carrier gas control valve (25) is used for controlling the on-off of the carrier gas pipeline (24);

a second bypass line (110), an inlet end of the second bypass line (110) being in communication with the purge gas source, an outlet end of the second bypass line (110) being in communication with the liquid inlet line (22), the outlet end of the second bypass line (110) being located between the first flowmeter (80) and the vaporization chamber;

21. The liquid source vaporization system of claim 20, wherein the liquid source is a liquid source,

in the working state, the carrier gas control valve (25) is opened, and the second control valve (52) and the fifth control valve (120) are closed; or alternatively

In the first cleaning state, a seventh control valve (26) is opened, and the carrier gas control valve (25), the fifth control valve (120), the sixth control valve (133), and the tenth control valve (150) are closed; or alternatively

The liquid source vaporization system also has a second cleaning state;

in the second cleaning state, the first control unit (50) controls the purge line (40) to communicate with the liquid inlet line (22), the fifth control valve (120), the sixth control valve (133) and the tenth control valve (150) to be closed, and the seventh control valve (26) to be opened; or alternatively

The liquid source vaporization system also has a fourth cleaning state;

in the fourth cleaning state, the first control unit (50) controls the liquid source pipeline (10) and the purging pipeline (40) to be disconnected from the vaporizing device (20), a tenth control valve (150) and the sixth control valve (133) are closed, the carrier gas control valve (25) and the fifth control valve (120) are opened, and the second control unit (70) controls the tail gas treatment pipeline (62) to be communicated with the vaporizing device (20); or alternatively

A first raffinate withdrawal state, wherein the fifth control valve (120) and the tenth control valve (150) are closed; or alternatively

A second raffinate withdrawal state in which the fifth control valve (120) and the raffinate control valve (138) are closed; or alternatively

And the fifth control valve (120) is closed in the residual air discharging state.