CN116634647A - Minimally invasive plasma treatment device and system - Google Patents
Minimally invasive plasma treatment device and system Download PDFInfo
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- CN116634647A CN116634647A CN202310470919.6A CN202310470919A CN116634647A CN 116634647 A CN116634647 A CN 116634647A CN 202310470919 A CN202310470919 A CN 202310470919A CN 116634647 A CN116634647 A CN 116634647A
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Classifications
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
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- A61B17/34—Trocars; Puncturing needles
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
- H05H1/2439—Surface discharges, e.g. air flow control
Abstract
The invention discloses a minimally invasive plasma treatment device and a minimally invasive plasma treatment system, wherein the minimally invasive plasma treatment device comprises a flexible medium pipe and an electrode, the flexible medium pipe is made of flexible insulating materials, and the pipe diameter of the flexible medium pipe is below millimeter level; the flexible medium tube comprises a hollow inner cavity, a gas input end for receiving working gas and a jet end for emitting plasma jet. The minimally invasive plasma treatment device can be used in the field of biomedical interventional therapy, wherein a flexible insulating microtubule below a millimeter level is adopted as a medium tube, is easy to bend and operate, can enter a living body to treat by utilizing atmospheric plasma jet flow, ensures the safety of entering the living body, and realizes the safety of minimally invasive interventional therapy and interventional therapy.
Description
Technical Field
The invention relates to the technical field of plasma jet, in particular to a minimally invasive plasma treatment device and system.
Background
The atmospheric pressure cold plasma is an emerging research field in recent years, and has wide application prospect in a plurality of fields such as environmental protection, nano manufacturing, chip etching and the like because the atmospheric pressure cold plasma can be generated under the atmospheric pressure, the particle temperature is close to the normal temperature, a large number of active particles are contained, the particle particles are smaller, the energy is concentrated and the like. In addition, the atmospheric pressure cold plasma can not cause obvious thermal injury to human bodies because of approaching to room temperature, can effectively inactivate various bacteria, fungi, viruses and other disease microorganisms, and is widely applied to the field of plasma medicine. Among them, the use of atmospheric pressure cryogenic plasma for the treatment of cancer has attracted considerable attention in the field of cancer treatment. However, the cancer treatment generally requires intervention of living body, which makes a high requirement for the plasma treatment device, and the current plasma generation device generally cannot meet the requirement of the intervention treatment, thereby limiting the application of the plasma generation device in biomedical intervention treatment.
Disclosure of Invention
The present invention aims to solve at least one of the technical problems existing in the prior art. To this end, the invention proposes a minimally invasive plasma treatment device and system.
In a first aspect of the present invention, a minimally invasive plasma processing apparatus is presented, comprising: a flexible dielectric tube and an electrode; the flexible medium pipe is made of flexible insulating materials, and the pipe diameter of the flexible medium pipe is below millimeter level; the flexible medium tube comprises a hollow inner cavity, a gas input end for receiving working gas and a jet end for emitting plasma jet.
The minimally invasive plasma treatment device provided by the embodiment of the invention has at least the following beneficial effects: the minimally invasive plasma treatment device adopts a flexible medium pipe and an electrode, the flexible medium pipe comprises a hollow inner cavity, a gas input end for receiving working gas and a jet end for emitting plasma jet, the flexible medium pipe adopts a flexible insulating material, the pipe diameter of the flexible medium pipe is below millimeter level, the minimally invasive plasma treatment device can be used in the field of biomedical intervention treatment, wherein the flexible insulating microtubule below millimeter level is adopted as the medium pipe, the flexible medium pipe is easy to bend and operate, can enter a living body to treat by utilizing atmospheric plasma jet, the safety of entering the living body is ensured, and the safety for minimally invasive intervention treatment and intervention treatment is realized.
In some embodiments of the invention, the electrode is selected from either or a combination of a ring electrode, a needle electrode;
the annular electrode is sleeved on the outer wall of the flexible medium pipe, which is close to the jet end, and the flexible medium pipe is also sleeved with an insulating sleeve, and the insulating sleeve covers the annular electrode;
the needle electrode is arranged in the hollow inner cavity at a position close to the jet end.
That is, in some embodiments, the electrode may be a needle electrode disposed solely within the hollow lumen near the jet end; in some embodiments, the annular electrode sleeved on the outer wall of the flexible medium pipe close to the jet end can be independently adopted, and meanwhile, the flexible medium pipe can be sleeved with the insulating sleeve, and the insulating sleeve covers the annular electrode; in some embodiments, the above needle electrode and ring electrode configurations may also be employed.
In some embodiments of the present invention, the ring electrode is configured to generate a glow discharge plasma jet, and the needle electrode is configured to generate a glow discharge plasma jet or an arc discharge plasma jet according to the distance from the outlet of the jet end, so that different discharge modes can be controlled according to different electrode structures, and different treatment modes can be realized.
In some embodiments of the invention, the needle electrode is spaced from the outlet of the jet end by a distance of 10 to 15mm. At this distance, the needle electrode may be configured to generate a glow discharge plasma jet, which may reduce or even avoid damage to the organism from the tip discharge.
In some embodiments of the invention, the needle electrode is less than 10mm from the outlet of the jet end, at which distance the needle electrode may be configured to generate an arc discharge plasma jet.
In some embodiments of the invention, the electrode adopts an annular electrode, the flexible medium tube is matched with the outer sleeve type annular electrode, and the insulating sleeve is further sleeved to cover the annular electrode, so that the problem that arc discharge is easy to cause when a metal probe is too close to a target object in the traditional plasma generating device, and damage to tissues is caused can be effectively avoided; the cladding arrangement of the insulating sleeve on the outer side of the annular electrode on the flexible medium tube can avoid the problem that the traditional needle electrode is easy to generate accidental discharge, and can realize accurate interventional therapy of the tumor by the plasma; in addition, the annular electrode coated by the insulating sleeve is sleeved on the flexible medium tube, compared with a needle electrode, the treatment area of the atmospheric pressure cold plasma is increased, so that the treatment is more easily concentrated on tumor tissues, the yield of free radicals and the treatment efficiency are improved, and accidental discharge is avoided. The minimally invasive plasma treatment device can control the produced active substances according to different voltages, so that the treatment of the atmospheric cold plasma in the target object to the tumor is realized, and the structural design of the minimally invasive plasma treatment device can ensure the plasma jet treatment effect and simultaneously realize that the micro plasma can safely enter the body, thereby achieving the aim of accurately treating the tumor.
In some embodiments of the invention, the insulating sleeve is a thermoplastic tube.
In some embodiments of the present invention, the flexible medium pipe is made of any one of silica gel, polyvinyl alcohol (PVA), polyester (PET), polyimide (PI), polyetheretherketone (PEEK), and thermoplastic polyurethane elastomer rubber (TPU). The Polyester (PET) may be at least one of polyethylene naphthalate (PEN), polymethyl methacrylate (PMMA), and Polycarbonate (PC).
In some embodiments of the invention, the flexible media tube has a tube diameter of 1 to 8mm.
In some embodiments of the invention, the electrode is a metal electrode.
In some embodiments of the present invention, the electrode is made of any one of tungsten, copper, aluminum, and stainless steel.
In a second aspect of the present invention, a minimally invasive plasma processing system is presented, comprising:
any of the minimally invasive plasma treatment devices proposed in the first aspect of the present invention;
the power supply is electrically connected with the electrode in the minimally invasive plasma treatment device;
and the working gas source is connected with a gas input end in the minimally invasive plasma processing device.
In some embodiments of the invention, the minimally invasive plasma processing system further comprises a step-up transformer connected between the power source and the electrode.
In some embodiments of the present invention, the working gas source is connected to a gas input end in the minimally invasive plasma processing apparatus through a pipeline, and a gas valve and a gas flowmeter are disposed on the pipeline, and the gas flowmeter is disposed between the gas valve and the gas input end.
Drawings
The invention is further described with reference to the accompanying drawings and examples, in which:
FIG. 1 is a schematic view of a minimally invasive plasma processing apparatus according to an embodiment of the present invention;
FIG. 2 is a schematic diagram of a minimally invasive plasma processing system according to an embodiment of the present invention;
FIG. 3 is a flowchart of the minimally invasive plasma processing system of FIG. 2 applied to a biological object;
FIG. 4 is a graph showing waveforms of voltages generated by a power supply in the minimally invasive plasma processing system of FIG. 2 after applying different DC voltages through a step-up transformer;
FIG. 5 is an optical emission spectrum of a normal pressure He plasma jet generated by the minimally invasive plasma treatment device under the drive of a 6V input voltage in the minimally invasive plasma treatment system shown in FIG. 2;
FIG. 6 is an optical emission spectrum of a normal pressure He plasma jet generated by the minimally invasive plasma treatment device under the drive of 9V input voltage in the minimally invasive plasma treatment system shown in FIG. 2;
FIG. 7 is an optical emission spectrum of a normal pressure He plasma jet generated by the minimally invasive plasma treatment device under the drive of 12V input voltage in the minimally invasive plasma treatment system shown in FIG. 2;
FIG. 8 is a schematic view of another embodiment of a minimally invasive plasma processing apparatus according to the present invention;
fig. 9 is a schematic structural view of a minimally invasive plasma processing apparatus according to another embodiment of the present invention.
Detailed Description
Embodiments of the present invention are described in detail below, examples of which are illustrated in the accompanying drawings, wherein like or similar reference numerals refer to like or similar elements or elements having like or similar functions throughout. The embodiments described below by referring to the drawings are illustrative only and are not to be construed as limiting the invention.
In the description of the present invention, the meaning of a number is one or more, the meaning of a number is two or more, and greater than, less than, exceeding, etc. are understood to exclude the present number, and the meaning of a number is understood to include the present number. The description of the first and second is for the purpose of distinguishing between technical features only and should not be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated or implicitly indicating the precedence of the technical features indicated.
In the description of the present invention, unless explicitly defined otherwise, terms such as arrangement, installation, connection, etc. should be construed broadly and the specific meaning of the terms in the present invention can be reasonably determined by a person skilled in the art in combination with the specific contents of the technical scheme.
In the description of the present invention, the descriptions of the terms "one embodiment," "some embodiments," "illustrative embodiments," "examples," "specific examples," or "some examples," etc., mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the present invention. In this specification, schematic representations of the above terms do not necessarily refer to the same embodiments or examples. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.
Referring to fig. 1, fig. 1 is a schematic structural diagram of a minimally invasive plasma processing apparatus according to an embodiment of the invention. As shown in fig. 1, the minimally invasive plasma processing apparatus 10 includes a flexible dielectric tube 11 and an electrode, wherein the flexible dielectric tube 11 includes a hollow inner cavity 113, a gas input end 111 for receiving a working gas, and a jet end 112 for emitting a plasma jet; in this embodiment, the electrode is an annular electrode 12, and the annular electrode 12 is sleeved on the outer wall of the flexible medium tube 11 close to the jet end 112; an insulating sleeve 13 is also sleeved on the outer wall of the flexible medium pipe 11, and the insulating sleeve 13 coats the annular electrode 12.
Wherein the flexible medium pipe 11 is a hollow tubular structure, specifically a hollow inner cavity 113. The flexible medium pipe 11 is made of a flexible insulating material, which is required to ensure biocompatibility and stability of entering organisms, wherein the stability comprises that after the flexible medium pipe 11 enters the organisms, the flexible medium pipe 11 can be ensured to be connected even if bending occurs, the flexible medium pipe 11 is made of at least one of silica gel, polyvinyl alcohol (PVA), polyester (PET), polyimide (PI), polyether ether ketone (PEEK) and thermoplastic polyurethane elastomer rubber (TPU), and the Polyester (PET) can be at least one of polyethylene naphthalate (PEN), polymethacrylate (PMMA) and Polycarbonate (PC); the flexible medium tube 11 is made of flexible insulating materials, is easy to bend, is easier to operate, can effectively avoid the problem that the metal micro-needle of the traditional minimally invasive plasma treatment device is easy to damage, and ensures the safety of entering organisms. The tube diameter of the flexible medium tube 11 is below millimeter level, so as to prepare a micro-minimally invasive plasma treatment device which can safely enter a treatment focus in vivo, for example, the flexible medium tube 11 can be millimeter tube (for example, the diameter can be 1-8 mm), micrometer tube or nanometer tube. The length of the flexible medium pipe 11 is not limited, and may be specifically designed according to actual needs.
The present embodiment generates a plasma jet by single electrode excitation, and specifically employs a ring-shaped single electrode, i.e., ring-shaped electrode 12. The ring electrode 12 may be configured to generate a glow discharge plasma jet. The ring electrode 12 may be a metal electrode, and may be made of tungsten, copper, aluminum, stainless steel, or the like. The annular metal electrode is sleeved on the outer wall of the flexible insulating medium tube, and plasma can be generated through the medium barrier discharge principle during operation. The annular electrode 12 can effectively increase the plasma production area, so that the treatment is more easily concentrated on tumor tissues, and the yield of free radicals and the treatment efficiency are improved. In addition, the ring electrode 12 may specifically be a ring-shaped high-voltage electrode (i.e., a ring-shaped high-voltage single electrode), so that the plasma generated by the excitation of the ring-shaped high-voltage electrode is more stable in the working process, and the risk of high-voltage discharge is avoided. The distance between the annular electrode 12 and the jet end pipe orifice of the flexible medium pipe 11 is controlled to be 5-15 mm.
The insulating sleeve 13 is a thermoplastic plastic tube and is used for wrapping the annular electrode 12, and can specifically wrap the annular electrode 12, so that the insulating sleeve has an insulating and protecting effect, accidental discharge can be avoided, and accurate intervention of plasma in treating tumors can be realized. And, the ring electrode 12 may be generally led out through a lead 14 to facilitate connection to a power source.
Referring to fig. 2, fig. 2 is a schematic diagram of a minimally invasive plasma processing system according to an embodiment of the invention. As shown in fig. 2, the minimally invasive plasma processing system includes a minimally invasive plasma processing apparatus 10, a power supply 20, and a working gas source 30. The structure of the minimally invasive plasma processing apparatus 10 is shown in fig. 1, and will not be described herein again; the power supply 20 is electrically connected with the annular electrode 12 in the minimally invasive plasma processing apparatus 10; the working gas source 30 is connected to a gas input 111 in the minimally invasive plasma processing apparatus 10.
In this embodiment, the power supply 20 is a low-voltage dc power supply, and a first end electrode of the power supply 20 is connected to the ring electrode, and the other end electrode is grounded. In addition, the minimally invasive plasma processing system further includes a step-up transformer 40 connected between the power supply 20 and the ring electrode 12 of the minimally invasive plasma processing apparatus 10 for converting the low voltage dc power provided by the low voltage dc power supply into high voltage ac power. By the above cooperation arrangement of the power supply 20 and the step-up transformer 40, the safety and reliability of the minimally invasive plasma processing system can be improved. Specifically, the voltage of the step-up transformer 40 after conversion is 4-6 kV, and the frequency is 16-20 kHz.
The working gas source 30 is used for supplying working gas, and may specifically be a gas cylinder; the working gas can be He, ar or N 2 、O 2 Or a mixture thereof, a rare gas such as helium is generally used as a medium. In the present embodiment, the working gas source 30 is connected to the gas source via a pipeline 31The gas input end 111 in the plasma jet generating device 10 is connected, and a gas valve 32 and a gas flowmeter 33 are arranged on the pipeline 31, and the gas flowmeter 33 is arranged between the gas valve 32 and the gas input end 111. By the cooperation of the gas valve 32 and the gas flowmeter 33, the flow rate of the working gas entering the hollow cavity 113 of the flexible medium pipe 11 can be controlled conveniently.
When the minimally invasive plasma treatment system works, working gas in the working gas source 30 is conveyed into the hollow inner cavity 113 of the flexible medium pipe 11 through the pipeline 31 by monitoring and controlling the gas valve 32 and the gas flowmeter 33; the power supply 20 is turned on, low-voltage direct current provided by the power supply 20 is converted into high-voltage alternating current through the step-up transformer 40 and is transmitted to the annular electrode 12 of the minimally invasive plasma treatment device 10, and then working gas in the flexible medium tube 11 at the position corresponding to the annular electrode 12 covered by the insulating sleeve 13 is broken down to generate discharge, so that uniform low-temperature plasma is generated under the atmospheric pressure in a dielectric barrier discharge mode, compared with a thin plasma jet generated by an internal needle electrode adopted in the conventional way, the external annular electrode is adopted in the minimally invasive plasma treatment device, and the generated plasma jet is thicker and is less prone to damage to tissues.
When the above minimally invasive plasma treatment system acts on a living body, the whole working process can be divided into five stages specifically, as shown in fig. 3, respectively: when the plasma jet does not contact the living being, when the plasma jet contacts the living being, further proximity, when the flexible dielectric tube contacts the living being, and when the minimally invasive plasma treatment device enters the living being. Wherein when the plasma jet contacts the organism, the jet tip is elongated and distinct, as shown in fig. 3 (a); and when the plasma jet contacts the living being, the plasma jet is brighter as shown in fig. 3 (b); as the plasma jet continues to approach the organism, the jet then shortens and brightly appears as shown in fig. 3 (c); until the flexible media tube contacts the living body as shown in fig. 3 (d) and the minimally invasive plasma treatment device enters the living body as shown in fig. 2 (e), the plasma jet spreads out and cannot be observed.
In addition, the inventor adopts the minimally invasive plasma processing system shown in fig. 2 to perform experiments on organisms (mice), and specifically uses helium as working gas, three different direct current power supply input voltages are set to be 6V, 9V and 12V respectively, stable positive selection voltage waveforms are generated after the direct current voltages are tested through a step-up transformer, and are respectively shown in fig. 4, wherein (a), (b) and (c) are respectively shown as sinusoidal waveforms generated by the direct current voltages of 6V, 9V and 12V through the step-up transformer, and corresponding output voltages are 5.28kV, 7.92kV and 9.84kV respectively.
And further testing Optical Emission Spectra (OES) of normal pressure He plasma jet generated by the minimally invasive plasma processing apparatus under the driving of the three different input voltages (6V, 9V and 12V), wherein the measurement range is 315nm to 800nm, and OES of five working stages at the same position are measured under each group of voltages, and the results are shown in fig. 5-7 when the plasma jet does not contact the living body, when the plasma jet contacts the living body, continuously approaches, when the flexible medium jet contacts the living body, and when the minimally invasive plasma processing apparatus enters the living body, wherein (a) - (e) respectively represent the optical emission spectra of the normal pressure He plasma jet generated by the minimally invasive plasma processing apparatus when the plasma jet does not contact the living body, continuously approaches, when the flexible medium jet contacts the living body, and when the minimally invasive plasma processing apparatus enters the living body. The peaks in fig. 5-7 indicate the presence of the critical chemical elements Reactive Nitrogen Species (RNS) and Reactive Oxygen Species (ROS) in the plasma jet. As can be seen in particular from fig. 5 to 7 (a), N is present in the plasma jet in the initial state (when the plasma jet is not in contact with the organism) 2 、N 2 + He and O species; the data shown in (b) increased when the plasma jet contacted the organism compared to the data shown in the state of (a); while as the plasma jet continues to approach the organism, the OES results do not change significantly; however, when the flexible medium pipe contacts with an organism, the jet end outlet of the flexible medium pipe is abutted against the contact surface, which is equivalent to the sealing of the jet end outlet of the flexible medium pipe by the contact surface, the values of other species are obviously reduced except that the peak value of He has no obvious change, and even the values cannot be measured; whileWhen the minimally invasive plasma treatment apparatus is completely introduced into the living body, the ring electrode is in contact with the living body through the insulating sleeve due to the electrical conduction of the living body, the discharge is enhanced although the high-voltage discharge is avoided, and thus the active substances are increased, the value is raised, and the stable phase is maintained. The minimally invasive plasma generating device can be applied to organisms to change the action, and can laterally reflect the safety of the device when the device acts on the organisms. Further, as can be seen from comparing the test results shown in fig. 5, 6 and 7, as the input voltage is gradually increased from 6V to 12V, the peak value at the same stage increases with the increase of the voltage, and the peak value of OES shown in fig. 7 is the highest.
Therefore, the minimally invasive plasma treatment device adopts the flexible medium tube which is easy to bend and operate, and can ensure the safety of entering organisms; the metal probe is matched with the outer sleeve type annular electrode, and the insulating sleeve is further sleeved to cover the annular electrode, so that arc discharge caused when the metal probe is too close to a target object in the traditional minimally invasive plasma treatment device can be effectively avoided, and damage to tissues is caused; the cladding arrangement of the insulating sleeve on the outer side of the annular electrode on the flexible medium tube can avoid the problem that the traditional needle electrode is easy to generate accidental discharge, and can realize accurate interventional therapy of the tumor by the plasma; and the annular electrode coated by the insulating sleeve is sleeved on the flexible medium tube, so that compared with a needle electrode, the treatment area of the atmospheric pressure cold plasma is increased, the treatment is more easily concentrated on tumor tissues, the yield of free radicals and the treatment efficiency are improved, and accidental discharge is avoided. The device is convenient to use, easy to operate, can control the active material of production according to different voltages, realize the treatment to the tumour to the cold plasma of atmospheric pressure in the target object, its structural design can realize that miniature plasma can safely get into in vivo when guaranteeing plasma jet treatment effect, reaches the purpose of accurate treatment tumour.
In addition, referring to fig. 8, fig. 8 is a schematic structural diagram of another embodiment of the minimally invasive plasma processing apparatus according to the present invention. As shown in fig. 8, the minimally invasive plasma processing apparatus includes a flexible dielectric tube 11a and an electrode. The flexible medium tube 11a is substantially the same as the flexible medium tube 11 in the minimally invasive plasma processing apparatus shown in fig. 1, and will not be described again.
In this embodiment, the electrode is a needle-shaped electrode 12a, which is internally arranged in the hollow cavity of the flexible medium pipe 11a at a position close to the jet end. The needle electrode 12a may be configured to generate glow discharge plasma jet or solitary discharge plasma jet according to the outlet distance from the jet end of the flexible medium tube 11a, so as to control different discharge modes and realize different treatment modes.
Specifically, in some embodiments, the needle electrode 12a may be controlled to be 10-15 cm from the outlet of the jet end of the flexible medium tube 11a, at which distance the needle electrode may be configured to generate a glow discharge plasma jet, which may reduce or even avoid damage to the living body by the tip, improving its safety for application in interventional procedures. In other embodiments, the exit distance of needle electrode 12a from the jet end of flexible medium tube 11a may also be controlled to be less than 10mm, at which distance needle electrode 12a may be configured to generate an arc discharge plasma jet; under high-voltage working conditions, the needle electrode 12a in the tube may emit a tip discharge, which is harmful to living organisms, but may be used for cutting, opening, burning, etc. in the medical field, for example, ophthalmic and dermatologists may use an solitary discharge for surgical cutting and incision, and for treatment of squamous cell carcinoma, mole removal, etc. Therefore, the setting position of the electrode can be adjusted according to the treatment requirement, so that different discharge modes are controlled, and different treatment modes are realized.
The minimally invasive plasma processing apparatus can be matched with a power supply and a working gas source to construct a minimally invasive plasma system according to a mode similar to that shown in fig. 2, wherein one end electrode of the power supply is electrically connected with a needle-shaped electrode 12a in the minimally invasive plasma processing apparatus, the other end electrode is grounded, and the working gas source is connected with a gas input end in the minimally invasive plasma processing apparatus.
Referring to fig. 9, fig. 9 is a schematic structural diagram of another embodiment of the minimally invasive plasma processing apparatus according to the present invention. As shown in fig. 9, the minimally invasive plasma processing apparatus includes a flexible dielectric tube 11b and an electrode 12b. The flexible medium tube 11b is substantially the same as the flexible medium tube 11 in the minimally invasive plasma processing apparatus shown in fig. 1, and will not be described again.
In this embodiment, the electrode 12b is formed by a ring electrode and a needle electrode in cooperation. The annular electrode is basically the same as the annular electrode 12 in the minimally invasive plasma treatment device shown in fig. 1 in structure and arrangement mode, the annular electrode is sleeved on the outer wall of the flexible medium pipe 11b close to the jet end, an insulating sleeve is sleeved on the outer wall of the flexible medium pipe 11b, and the annular electrode is coated by the insulating sleeve; the needle electrode has the same structure and arrangement as the needle electrode in the minimally invasive plasma processing apparatus shown in fig. 8, and is internally arranged in the hollow cavity of the flexible medium pipe 11b at a position close to the jet end.
The electrode in the minimally invasive plasma treatment device adopts a double-electrode structure, stable plasma jet is easier to excite, different discharge modes can be controlled by different structures, and the device is applicable to and meets different treatment requirements. In specific application, the minimally invasive plasma treatment device can be matched with a power supply and a working gas source to construct a minimally invasive plasma system according to the mode similar to that shown in fig. 2, wherein one end electrode of the power supply is electrically connected with a needle electrode in the minimally invasive plasma treatment device, the other end of the power supply is electrically connected with an annular electrode, and the working gas source is connected with a gas input end in the minimally invasive plasma treatment device.
The minimally invasive plasma treatment device can be used in the field of biomedical interventional therapy, wherein a flexible insulating microtubule below a millimeter level is adopted as a medium tube, is easy to bend and operate, can enter a living body to treat by utilizing atmospheric plasma jet flow, can ensure the safety of entering the living body, and realizes the safety of minimally invasive interventional therapy and interventional therapy.
The foregoing examples illustrate only a few embodiments of the invention and are described in detail herein without thereby limiting the scope of the invention. It should be noted that it will be apparent to those skilled in the art that several variations and modifications can be made without departing from the spirit of the invention, which are all within the scope of the invention.
Claims (10)
1. A minimally invasive plasma processing device, which is characterized by comprising a flexible medium tube and an electrode; the flexible medium pipe is made of flexible insulating materials, and the pipe diameter of the flexible medium pipe is below millimeter level; the flexible medium tube comprises a hollow inner cavity, a gas input end for receiving working gas and a jet end for emitting plasma jet.
2. The minimally invasive plasma processing apparatus according to claim 1, wherein the electrode is selected from one or a combination of two of a ring-shaped electrode and a needle-shaped electrode;
the annular electrode is sleeved on the outer wall of the flexible medium pipe, which is close to the jet end, and the flexible medium pipe is also sleeved with an insulating sleeve, and the insulating sleeve covers the annular electrode;
the needle electrode is arranged in the hollow inner cavity at a position close to the jet end.
3. The minimally invasive plasma processing apparatus according to claim 2, wherein the ring electrode is configured to generate a glow discharge plasma jet; the needle electrode is configured to generate a glow discharge plasma jet or an islanding discharge plasma jet according to an exit distance from the jet end.
4. The minimally invasive plasma treatment device according to claim 2, wherein the needle electrode is 10-15 mm from the outlet of the jet end.
5. The minimally invasive plasma treatment device of claim 2, wherein the insulating sleeve is a thermoplastic tube.
6. The minimally invasive plasma processing apparatus according to claim 1, wherein the flexible dielectric tube is made of at least one material selected from the group consisting of silicone rubber, polyvinyl alcohol, polyester, polyimide, polyetheretherketone, and thermoplastic polyurethane elastomer rubber.
7. The minimally invasive plasma processing apparatus according to claim 1, wherein the electrode is a metal electrode; preferably, the electrode is made of any one of tungsten, copper, aluminum and stainless steel.
8. A minimally invasive plasma processing system, comprising:
the minimally invasive plasma processing apparatus of any of claims 1 to 7;
the power supply is electrically connected with the electrode in the minimally invasive plasma treatment device;
and the working gas source is connected with a gas input end in the minimally invasive plasma processing device.
9. The minimally invasive plasma processing system according to claim 8, further comprising a step-up transformer connected between the power source and the electrode.
10. The minimally invasive plasma processing system according to claim 8, wherein the working gas source is connected to a gas input in the minimally invasive plasma processing apparatus through a pipeline, a gas valve and a gas flow meter are provided on the pipeline, and the gas flow meter is provided between the gas valve and the gas input.
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| CN202310470919.6A CN116634647A (en) | 2023-04-25 | 2023-04-25 | Minimally invasive plasma treatment device and system |
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| CN202310470919.6A CN116634647A (en) | 2023-04-25 | 2023-04-25 | Minimally invasive plasma treatment device and system |
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