CN116607148A - FeNiCrAl-based multi-element alloy transparent glaze and glazing process thereof - Google Patents
FeNiCrAl-based multi-element alloy transparent glaze and glazing process thereof Download PDFInfo
- Publication number
- CN116607148A CN116607148A CN202310606954.6A CN202310606954A CN116607148A CN 116607148 A CN116607148 A CN 116607148A CN 202310606954 A CN202310606954 A CN 202310606954A CN 116607148 A CN116607148 A CN 116607148A
- Authority
- CN
- China
- Prior art keywords
- glaze
- alloy
- fenicral
- sodium silicate
- oxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims abstract description 32
- 229910001325 element alloy Inorganic materials 0.000 title claims abstract description 11
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 71
- 239000000956 alloy Substances 0.000 claims abstract description 71
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Chemical compound [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 claims abstract description 52
- 239000004115 Sodium Silicate Substances 0.000 claims abstract description 41
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 claims abstract description 41
- 229910052911 sodium silicate Inorganic materials 0.000 claims abstract description 41
- 239000004005 microsphere Substances 0.000 claims abstract description 33
- 229910052809 inorganic oxide Inorganic materials 0.000 claims abstract description 29
- 239000007864 aqueous solution Substances 0.000 claims abstract description 23
- 239000011521 glass Substances 0.000 claims abstract description 22
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 13
- 238000002156 mixing Methods 0.000 claims abstract description 11
- 238000000576 coating method Methods 0.000 claims abstract description 5
- 239000011248 coating agent Substances 0.000 claims abstract description 4
- 238000010304 firing Methods 0.000 claims description 14
- 239000002994 raw material Substances 0.000 claims description 2
- 238000005303 weighing Methods 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 abstract description 5
- 238000001035 drying Methods 0.000 abstract description 4
- 238000005260 corrosion Methods 0.000 abstract description 3
- 230000007797 corrosion Effects 0.000 abstract description 3
- 239000000126 substance Substances 0.000 abstract description 3
- 229910052751 metal Inorganic materials 0.000 description 21
- 239000002184 metal Substances 0.000 description 21
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 20
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 20
- JKWMSGQKBLHBQQ-UHFFFAOYSA-N diboron trioxide Chemical compound O=BOB=O JKWMSGQKBLHBQQ-UHFFFAOYSA-N 0.000 description 20
- 239000000203 mixture Substances 0.000 description 17
- 230000003287 optical effect Effects 0.000 description 16
- 230000000052 comparative effect Effects 0.000 description 13
- 238000002360 preparation method Methods 0.000 description 13
- 235000012239 silicon dioxide Nutrition 0.000 description 11
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 10
- FUJCRWPEOMXPAD-UHFFFAOYSA-N lithium oxide Chemical compound [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 description 10
- 229910001947 lithium oxide Inorganic materials 0.000 description 10
- CHWRSCGUEQEHOH-UHFFFAOYSA-N potassium oxide Chemical compound [O-2].[K+].[K+] CHWRSCGUEQEHOH-UHFFFAOYSA-N 0.000 description 10
- 229910001950 potassium oxide Inorganic materials 0.000 description 10
- 239000000377 silicon dioxide Substances 0.000 description 10
- KKCBUQHMOMHUOY-UHFFFAOYSA-N sodium oxide Chemical compound [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 10
- 229910001948 sodium oxide Inorganic materials 0.000 description 10
- 239000004408 titanium dioxide Substances 0.000 description 10
- 239000002585 base Substances 0.000 description 9
- 238000005516 engineering process Methods 0.000 description 9
- 239000008367 deionised water Substances 0.000 description 8
- 229910021641 deionized water Inorganic materials 0.000 description 8
- 239000007788 liquid Substances 0.000 description 8
- 239000007787 solid Substances 0.000 description 8
- 238000003756 stirring Methods 0.000 description 8
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 7
- 238000007598 dipping method Methods 0.000 description 6
- 230000009172 bursting Effects 0.000 description 5
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 5
- 239000011787 zinc oxide Substances 0.000 description 5
- 239000000758 substrate Substances 0.000 description 4
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 3
- 229910052910 alkali metal silicate Inorganic materials 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 210000003298 dental enamel Anatomy 0.000 description 3
- 108010025899 gelatin film Proteins 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 238000009736 wetting Methods 0.000 description 3
- 229910052726 zirconium Inorganic materials 0.000 description 3
- 239000011230 binding agent Substances 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 238000004031 devitrification Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 229910052500 inorganic mineral Inorganic materials 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 239000011707 mineral Substances 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 229910052573 porcelain Inorganic materials 0.000 description 2
- 239000003381 stabilizer Substances 0.000 description 2
- 229910001018 Cast iron Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23D—ENAMELLING OF, OR APPLYING A VITREOUS LAYER TO, METALS
- C23D11/00—Continuous processes; Apparatus therefor
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23D—ENAMELLING OF, OR APPLYING A VITREOUS LAYER TO, METALS
- C23D5/00—Coating with enamels or vitreous layers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E30/00—Energy generation of nuclear origin
- Y02E30/30—Nuclear fission reactors
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Glass Compositions (AREA)
Abstract
Description
技术领域technical field
本发明属于釉料技术领域,具体涉及一种FeNiCrAl基多主元合金透明釉釉料及其上釉工艺。The invention belongs to the technical field of glazes, and in particular relates to a FeNiCrAl-based multi-principal alloy transparent glaze and a glazing process thereof.
背景技术Background technique
釉是覆盖在器物表面的无色或有色的玻璃态薄层。釉层能增加制品的机械强度、美化器物,使器物具有耐酸碱、耐磨损的特点。目前作用于金属表面的釉料主要以搪瓷釉为主,搪瓷釉是涂覆在钢材、铸铁、铝材、铜材和不锈钢等金属坯体上经烧成后能与金属坯体牢固结合的釉层。由于金属与釉层是两种不同的物质,热膨胀系数差异较大,因此搪瓷釉制备的一种方法是在金属基板上先涂敷乳浊底釉作为过渡层,减小金属与面釉之间的应力,然后再涂覆面釉赋予制品以光滑美观的表面。或者使用一次涂搪工艺,釉料既作为底釉又作为面釉,一次涂敷并烧制。由于底釉的存在,这些方法缺少了瓷釉的通透感。另外烧制时时间较长,一般需要3~5h,大大制约了生产效率。Glaze is a thin, colorless or colored glassy layer covering the surface of an object. The glaze layer can increase the mechanical strength of the product, beautify the utensils, and make the utensils have the characteristics of acid and alkali resistance and wear resistance. At present, the glazes acting on metal surfaces are mainly enamel glazes, which are glazes that can be firmly combined with metal bodies after being fired on steel, cast iron, aluminum, copper and stainless steel. layer. Since the metal and the glaze layer are two different substances with large differences in thermal expansion coefficients, one method of enamel preparation is to first apply an opaque bottom glaze on the metal substrate as a transition layer to reduce the gap between the metal and the surface glaze. The stress, and then coat the top glaze to give the product a smooth and beautiful surface. Or use a one-shot enamelling process, where the glaze acts as both a base glaze and a top glaze, applied and fired in one pass. Due to the presence of the underglaze, these methods lack the transparency of the enamel. In addition, the firing takes a long time, usually 3 to 5 hours, which greatly restricts the production efficiency.
FeNiCrAl基多主元合金是一种新型结构材料,具有高强度、高硬度、高耐磨、高耐蚀的特点。相比于传统合金,FeNiCrAl基多主元合金不同的相组成和微观结构限制了它的釉层制备。主要是由于该合金是由FCC(L12)和B2(BCC)相组成,FCC相主要富含Fe和Cr元素,B2相主要富含Ni和Al元素。两相组成的差异以及膨胀系数的不同极易造成釉层脱落,现有的釉料及工艺无法满足生产需求。因此,研究FeNiCrAl基多主元合金的釉层的釉料成分及其上釉工艺非常有必要。FeNiCrAl-based multi-principal element alloy is a new type of structural material, which has the characteristics of high strength, high hardness, high wear resistance and high corrosion resistance. Compared with traditional alloys, the different phase composition and microstructure of FeNiCrAl-based multi-principal alloys limit its glaze layer preparation. The main reason is that the alloy is composed of FCC (L1 2 ) and B2 (BCC) phases, the FCC phase is mainly rich in Fe and Cr elements, and the B2 phase is mainly rich in Ni and Al elements. The difference in the composition of the two phases and the difference in the expansion coefficient can easily cause the glaze layer to fall off, and the existing glaze materials and processes cannot meet the production needs. Therefore, it is very necessary to study the glaze composition and glazing process of the glaze layer of FeNiCrAl-based multi-principal component alloy.
发明内容Contents of the invention
为了解决上述技术问题,本发明提供了一种FeNiCrAl基多主元合金透明釉釉料及其上釉工艺,本发明的釉料应用在双相多主元合金、制作工艺简单,上釉工艺步骤简单,合金无需预处理一次烧成即可、可操作性高,釉层与合金粘附力强,能够解决釉层在多主元合金表面因两相成分差异导致的爆裂脱落问题。In order to solve the above-mentioned technical problems, the present invention provides a FeNiCrAl-based multi-principal alloy transparent glaze glaze and its glazing process. The glaze of the present invention is applied to dual-phase multi-principal alloys, and the manufacturing process is simple, and the glazing process steps are simple , the alloy can be fired once without pretreatment, high operability, strong adhesion between the glaze layer and the alloy, and can solve the problem of bursting and falling off of the glaze layer on the surface of the multi-principal alloy due to the difference in the composition of the two phases.
本发明具体是通过如下技术方案来实现的。The present invention is specifically realized through the following technical solutions.
本发明提供了一种FeNiCrAl基多主元合金透明釉釉料,由以下成分制成:The invention provides a FeNiCrAl-based multi-principal alloy transparent glaze glaze material, which is made of the following components:
无机氧化物、空心玻璃微球、氧化钡和硅酸钠水溶液,无机氧化物、空心玻璃微球、氧化钡和硅酸钠水溶液的混合质量比为1~10:0.1~3:0.5~4:2~16;Inorganic oxide, hollow glass microsphere, barium oxide and sodium silicate aqueous solution, the mixing mass ratio of inorganic oxide, hollow glass microsphere, barium oxide and sodium silicate aqueous solution is 1-10:0.1-3:0.5-4: 2~16;
硅酸钠水溶液中,硅酸钠与水的混合比例为5~15g:10~50mL。In the sodium silicate aqueous solution, the mixing ratio of sodium silicate and water is 5-15g: 10-50mL.
进一步的,空心玻璃微球密度为0.15g/cc,颜色为纯白色。Further, the density of the hollow glass microspheres is 0.15 g/cc, and the color is pure white.
进一步的,氧化钡纯度为90.00%~99.99%。Further, the purity of the barium oxide is 90.00%-99.99%.
进一步的,硅酸钠模数为1~2.2,纯度为分析纯。Further, the modulus of sodium silicate is 1-2.2, and the purity is analytically pure.
进一步的,无机氧化物为二氧化硅、三氧化二硼、氧化钠、氧化钾、氧化锂、氧化锌、二氧化锆、三氧化二铝、二氧化钛、F2O中的多种组合,纯度为分析纯。Further, the inorganic oxide is a combination of silicon dioxide, boron trioxide, sodium oxide, potassium oxide, lithium oxide, zinc oxide, zirconium dioxide, aluminum oxide, titanium dioxide, and F2O , with a purity of Analytical pure.
本发明提供了一种FeNiCrAl基多主元合金透明釉的上釉工艺,包括以下步骤:The invention provides a glazing process of FeNiCrAl-based multi-principal alloy transparent glaze, comprising the following steps:
S1、按照以下比例,分别称取原料:无机氧化物、空心玻璃微球、氧化钡和硅酸钠水溶液的混合质量比为1~10:0.1~3:0.5~4:2~16;硅酸钠水溶液中,硅酸钠与水的混合比例为5~15g:10~50mL;S1. Weigh the raw materials respectively according to the following proportions: the mixing mass ratio of inorganic oxide, hollow glass microspheres, barium oxide and sodium silicate aqueous solution is 1-10: 0.1-3: 0.5-4: 2-16; silicic acid In the sodium aqueous solution, the mixing ratio of sodium silicate and water is 5-15g: 10-50mL;
S2、将S1称取的无机氧化物、空心玻璃微球、氧化钡和硅酸钠水溶液混合均匀,制备釉料;S2, mixing the inorganic oxide, hollow glass microspheres, barium oxide and sodium silicate aqueous solution weighed in S1 to prepare a glaze;
S3、将S2制备的釉料均匀涂覆于预热后的FeNiCrAl基多主元合金表面;S3, uniformly coating the glaze prepared in S2 on the surface of the preheated FeNiCrAl-based multi-principal alloy;
S4、将S3处理后的合金固化;S4, solidifying the alloy treated in S3;
S5、将S4处理后的合金在1000~1300℃下烧制即可。S5, firing the alloy treated in S4 at 1000-1300°C.
进一步的,涂覆方法可采用蘸釉、荡釉、浇釉、刷釉、喷釉等方法。Further, the coating method may adopt methods such as dipping glaze, swirling glaze, pouring glaze, brushing glaze, spraying glaze and the like.
进一步的,S3中,将合金打磨后进行预热,预热温度为30~70℃,预热时间为5~30min。Further, in S3, the alloy is ground and preheated, the preheating temperature is 30-70° C., and the preheating time is 5-30 minutes.
进一步的,S4中,固化温度为25~70℃,固化时间为5~60min。Further, in S4, the curing temperature is 25-70° C., and the curing time is 5-60 minutes.
进一步的,S5中,烧制时间为5~60min。Further, in S5, the firing time is 5-60 minutes.
本发明与现有技术相比具有如下有益效果:Compared with the prior art, the present invention has the following beneficial effects:
本发明提供的釉料及其上釉工艺,通过将无机氧化物、空心玻璃微球、氧化钡和硅酸钠水溶液按一定比例混合,然后将加热的金属进行上釉、固化、烧制得到均匀的釉层。对该釉料及合金的预热,固化过程对釉层的制备具有重要作用。其中预热可以在蘸釉时,保证靠近金属表面的釉料迅速干燥,解决局部润湿不好的问题。固化可以保证釉料在金属表面的干燥成型,解决釉料流动性较大容易脱落的问题。通过该釉料及上釉工艺可以解决双相FeNiCrAl多主元合金由于两相成分差异造成的釉层在冷却过程中爆裂脱落的问题,釉层与基体结合力强,釉层光泽明显,效果好。The glaze and its glazing process provided by the invention are obtained by mixing inorganic oxides, hollow glass microspheres, barium oxide and sodium silicate aqueous solution in a certain proportion, and then glazing, curing and firing the heated metal to obtain a uniform glaze. glaze layer. The preheating and curing process of the glaze and alloy play an important role in the preparation of the glaze layer. Among them, preheating can ensure that the glaze close to the metal surface dries quickly when dipping the glaze, and solve the problem of poor local wetting. Curing can ensure the drying and molding of the glaze on the metal surface, and solve the problem that the fluidity of the glaze is relatively large and easy to fall off. The glaze and glazing process can solve the problem of the glaze layer bursting and falling off during the cooling process caused by the difference in the two-phase composition of the dual-phase FeNiCrAl multi-principal alloy.
空心微球作为一种中空玻璃微球填充材料具有密度低、稳定性好、耐腐蚀等特点,由于质轻、中空等特点可以起到应力缓冲的作用,即缓解在冷却过程中由于金属与釉层膨胀系数的差异导致的张应力或者压应力而产生的爆瓷或脱瓷问题。空心微球作为应力的释放中心,传递金属或釉层的应力并释放,平衡了两者的应力,起到解决釉层脱落问题。同时氧化钡具有助熔作用,能够提高釉的光泽度,扩大烧成范围,在釉料中可作为稳定剂、助熔剂使用。硅酸钠作为一种可溶性的矿黏合剂,可以涂在金属表面增加润湿性以及金属基体和釉料的结合力,形成碱金属硅酸盐及凝胶薄膜。As a hollow glass microsphere filling material, hollow microspheres have the characteristics of low density, good stability, and corrosion resistance. The problem of porcelain bursting or devitrification caused by tensile stress or compressive stress caused by the difference in expansion coefficient of the layer. As the stress release center, the hollow microsphere transmits and releases the stress of the metal or glaze layer, balances the stress of the two, and solves the problem of glaze layer shedding. At the same time, barium oxide has a fluxing effect, which can improve the gloss of the glaze, expand the firing range, and can be used as a stabilizer and flux in the glaze. As a soluble mineral binder, sodium silicate can be coated on the metal surface to increase the wettability and the bonding force between the metal substrate and the glaze, forming an alkali metal silicate and gel film.
附图说明Description of drawings
为了更清楚地说明本发明实施例的技术方案,下面对将实施例中所需要使用的附图做简单地介绍,显而易见地,下面描述中的附图仅仅是本发明的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其它的附图。In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the following briefly introduces the drawings that will be used in the embodiments. Obviously, the drawings in the following description are only some embodiments of the present invention. For Those of ordinary skill in the art can also obtain other drawings based on these drawings without making creative efforts.
图1为实施例1制备的得到的釉层光学图片。Fig. 1 is the optical picture of the glaze layer prepared by embodiment 1.
图2为实施例2制备的得到的釉层光学图片。Fig. 2 is the optical picture of the glaze layer prepared in Example 2.
图3为实施例3制备的得到的釉层光学图片。Fig. 3 is the optical picture of the glaze layer prepared in Example 3.
图4为实施例4制备的得到的釉层光学图片。Fig. 4 is the optical picture of the glaze layer prepared in Example 4.
图5为对比例1制备的不含空心微球得到的釉层光学图片。FIG. 5 is an optical picture of the glaze layer prepared in Comparative Example 1 without hollow microspheres.
图6为对比例2制备的不含氧化钡得到的釉层光学图片;其中,左图为烧制之前的图片,右图为烧制之后的图片;Fig. 6 is the optical picture of the glaze layer prepared in Comparative Example 2 without barium oxide; wherein, the left picture is the picture before firing, and the right picture is the picture after firing;
图7为对比例3制备的不含硅酸钠得到的釉层光学图片;Fig. 7 is the glaze layer optical picture that does not obtain sodium silicate that comparative example 3 prepares;
图8为对比例4中烧制之前得到的釉层光学图片;其中,左图为不预热处理,右图为预热处理。Fig. 8 is an optical picture of the glaze layer obtained before firing in Comparative Example 4; wherein, the left picture shows no preheating treatment, and the right picture shows preheating treatment.
具体实施方式Detailed ways
为了使本领域技术人员更好地理解本发明的技术方案能予以实施,下面结合具体实施例和附图对本发明作进一步说明,但所举实施例不作为对本发明的限定。In order to enable those skilled in the art to better understand that the technical solutions of the present invention can be implemented, the present invention will be further described below in conjunction with specific examples and accompanying drawings, but the given examples are not intended to limit the present invention.
下述各实施例中所述实验方法和检测方法,如无特殊说明,均为常规方法;所述试剂和材料,如无特殊说明,均可在市场上购买得到。The experimental methods and detection methods described in the following examples, unless otherwise specified, are conventional methods; the reagents and materials, unless otherwise specified, can be purchased in the market.
空心微球购买于佛山蓝岭化工,型号为S15,密度为0.15g/cc,颜色为纯白色。The hollow microspheres were purchased from Foshan Lanling Chemical, the model is S15, the density is 0.15g/cc, and the color is pure white.
氧化钡购买自北京伊诺凯科技有限公司,纯度在90.00%~99.99%。Barium oxide was purchased from Beijing Yinuokai Technology Co., Ltd., with a purity of 90.00% to 99.99%.
硅酸钠购买自北京伊诺凯科技有限公司,模数为1~2.2,分析纯。Sodium silicate was purchased from Beijing Yinuokai Technology Co., Ltd., with a modulus of 1-2.2 and analytically pure.
无机氧化物为二氧化硅、三氧化二硼、氧化钠、氧化钾、氧化锂、氧化锌、二氧化锆、三氧化二铝、二氧化钛、F2O中的多种组合,纯度为分析纯。The inorganic oxides are various combinations of silicon dioxide, diboron trioxide, sodium oxide, potassium oxide, lithium oxide, zinc oxide, zirconium dioxide, aluminum oxide, titanium dioxide, and F 2 O, and the purity is analytically pure.
对于FeNiCrAl基多主元合金来说,其是由FCC(L12)和B2(BCC)相组成,FCC相主要富含Fe和Cr元素,B2相主要富含Ni和Al元素。两相组成的差异以及膨胀系数的不同极易造成釉层脱落,现有的釉料及工艺无法满足生产需求。为此,本发明提供了一种FeNiCrAl基多主元合金透明釉釉料及其上釉工艺,从釉料成分和上釉工艺分别进行了改进:For the FeNiCrAl-based multi-principal element alloy, it is composed of FCC (L1 2 ) and B2 (BCC) phases, the FCC phase is mainly rich in Fe and Cr elements, and the B2 phase is mainly rich in Ni and Al elements. The difference in the composition of the two phases and the difference in the expansion coefficient can easily cause the glaze layer to fall off, and the existing glaze materials and processes cannot meet the production needs. For this reason, the invention provides a kind of FeNiCrAl-based multi-principal alloy transparent glaze glaze and its glazing process, which are improved respectively from the glaze material composition and glazing process:
从釉料成分方面,选用了无机氧化物、空心玻璃微球、氧化钡和硅酸钠水溶液。其中,空心微球可以缓解在冷却过程中由于金属与釉层膨胀系数的差异导致的张应力或者压应力而产生的爆瓷或脱瓷问题。空心微球作为应力的释放中心,传递金属或釉层的应力并释放,平衡了两者的应力,起到解决釉层脱落问题。同时氧化钡具有助熔作用,能够提高釉的光泽度,扩大烧成范围,在釉料中可作为稳定剂、助熔剂使用。硅酸钠作为一种可溶性的矿黏合剂,可以涂在金属表面增加润湿性以及金属基体和釉料的结合力,形成碱金属硅酸盐及凝胶薄膜。In terms of glaze composition, inorganic oxides, hollow glass microspheres, barium oxide and sodium silicate aqueous solutions were selected. Among them, hollow microspheres can alleviate the problem of porcelain bursting or devitrification caused by tensile stress or compressive stress caused by the difference in expansion coefficient between the metal and the glaze layer during the cooling process. As the stress release center, the hollow microsphere transmits and releases the stress of the metal or glaze layer, balances the stress of the two, and solves the problem of glaze layer shedding. At the same time, barium oxide has a fluxing effect, which can improve the gloss of the glaze, expand the firing range, and can be used as a stabilizer and flux in the glaze. As a soluble mineral binder, sodium silicate can be coated on the metal surface to increase the wettability and the bonding force between the metal substrate and the glaze, forming an alkali metal silicate and gel film.
从上釉工艺方面,将无机氧化物、空心玻璃微球、氧化钡和硅酸钠水溶液按一定比例混合,然后将加热的金属进行上釉、固化、烧制得到均匀的釉层。需要注意的是,对该釉料及合金的预热、固化过程对釉层的制备具有重要作用。其中预热可以在蘸釉时,保证靠近金属表面的釉料迅速干燥,解决局部润湿不好的问题。固化可以保证釉料在金属表面的干燥成型,解决釉料流动性较大容易脱落的问题。通过该釉料及上釉工艺可以解决双相FeNiCrAl多主元合金由于两相成分差异造成的釉层在冷却过程中爆裂脱落的问题,釉层与基体结合力强,釉层光泽明显,效果好。In terms of glazing process, inorganic oxides, hollow glass microspheres, barium oxide and sodium silicate aqueous solution are mixed in a certain proportion, and then the heated metal is glazed, cured, and fired to obtain a uniform glaze layer. It should be noted that the preheating and curing process of the glaze and alloy play an important role in the preparation of the glaze layer. Among them, preheating can ensure that the glaze close to the metal surface dries quickly when dipping the glaze, and solve the problem of poor local wetting. Curing can ensure the drying and molding of the glaze on the metal surface, and solve the problem that the fluidity of the glaze is relatively large and easy to fall off. The glaze and glazing process can solve the problem of the glaze layer bursting and falling off during the cooling process caused by the difference in the two-phase composition of the dual-phase FeNiCrAl multi-principal alloy.
下面通过以下实施例和对比例对本发明内容进行详细说明。The content of the present invention will be described in detail below through the following examples and comparative examples.
实施例1Example 1
一种FeNiCrAl基多主元合金透明釉釉料的制备方法,包括以下步骤:A preparation method of a FeNiCrAl-based multi-principal alloy transparent glaze glaze, comprising the following steps:
S1、使用电子分析天平称取无机氧化物共100g,其中二氧化硅54.26g、三氧化二硼12.38g、氧化钠6.55g、氧化钾11.32g、氧化锂1.14g、二氧化锆3.34g、二氧化钛10.04g、F2O2.91g。S1. Use an electronic analytical balance to weigh a total of 100g of inorganic oxides, including 54.26g of silicon dioxide, 12.38g of diboron trioxide, 6.55g of sodium oxide, 11.32g of potassium oxide, 1.14g of lithium oxide, 3.34g of zirconium dioxide, and titanium dioxide. 10.04g, F 2 O 2.91g.
S2、称取硅酸钠10g,胶头滴管吸取去离子水20ml,搅拌混合均匀。S2. Weigh 10 g of sodium silicate, absorb 20 ml of deionized water with a rubber dropper, and stir to mix evenly.
S3、按照无机氧化物:空心玻璃微球:氧化钡:硅酸钠水溶液=5:1:0.5:10的质量比将固体与液体混合均匀制得釉料。S3. According to the mass ratio of inorganic oxide: hollow glass microsphere: barium oxide: sodium silicate aqueous solution = 5:1:0.5:10, mix solid and liquid uniformly to prepare glaze.
一种FeNiCrAl基多主元合金透明釉的上釉工艺工艺,包括以下步骤:A kind of glazing technology of FeNiCrAl base multi-principal alloy transparent glaze comprises the following steps:
(1)将FeNiCrAl合金在50℃下保温5min后采用蘸釉的方法完全垂直浸没于上述釉料中停留2s,然后拿出在50℃下保温60min直至釉料完全干燥固化。(1) Keep the FeNiCrAl alloy at 50°C for 5 minutes, then dip it into the glaze vertically for 2 seconds, then take it out and keep it at 50°C for 60 minutes until the glaze is completely dry and solidified.
(2)将干燥后的FeNiCrAl合金放置于箱式电阻炉中,在1200℃条件下烧制5min后取出。冷却至室温获得涂覆釉层的合金。(2) Place the dried FeNiCrAl alloy in a box-type resistance furnace, burn it at 1200° C. for 5 minutes, and then take it out. Cool to room temperature to obtain a glaze-coated alloy.
图1为实施例1制备的得到的釉层光学图片,可见表面无明显脱落,釉层与合金粘附好,光泽度高。Fig. 1 is an optical picture of the glaze layer prepared in Example 1. It can be seen that the surface has no obvious peeling off, the glaze layer is well adhered to the alloy, and the gloss is high.
实施例2Example 2
一种FeNiCrAl基多主元合金透明釉釉料的制备方法,包括以下步骤:A preparation method of a FeNiCrAl-based multi-principal alloy transparent glaze glaze, comprising the following steps:
S1、使用电子分析天平称取无机氧化物共100g,其中二氧化硅45.26g、三氧化二硼12.38g、氧化钠6.55g、氧化钾11.32g、氧化锂1.14g、氧化锌4.50g、二氧化锆3.34g、三氧化二铝4.50g、二氧化钛10.04g、F2O 2.91g。S1. Use an electronic analytical balance to weigh a total of 100g of inorganic oxides, including 45.26g of silicon dioxide, 12.38g of diboron trioxide, 6.55g of sodium oxide, 11.32g of potassium oxide, 1.14g of lithium oxide, 4.50g of zinc oxide, and Zirconium 3.34g, aluminum oxide 4.50g, titanium dioxide 10.04g, F 2 O 2.91g.
S2、称取硅酸钠10g,胶头滴管吸取去离子水20ml,搅拌混合均匀。S2. Weigh 10 g of sodium silicate, absorb 20 ml of deionized water with a rubber dropper, and stir to mix evenly.
S3、按照无机氧化物:空心玻璃微球:氧化钡:硅酸钠水溶液=5:1:0.5:10的比例将固体与液体混合均匀制得釉料。S3. According to the ratio of inorganic oxide: hollow glass microsphere: barium oxide: sodium silicate aqueous solution = 5:1:0.5:10, mix solid and liquid uniformly to prepare glaze.
一种FeNiCrAl基多主元合金透明釉的上釉工艺工艺,包括以下步骤:A kind of glazing technology of FeNiCrAl base multi-principal alloy transparent glaze comprises the following steps:
(1)将FeNiCrAl合金在50℃下保温5min后采用蘸釉的方法完全垂直浸没于釉料中停留3s,然后拿出在50℃下保温60min直至釉料完全干燥固化。(1) After keeping the FeNiCrAl alloy at 50°C for 5 minutes, dip it into the glaze and immerse it vertically for 3 seconds, then take it out and keep it at 50°C for 60 minutes until the glaze is completely dry and solidified.
(2)将干燥后的FeNiCrAl合金放置于箱式电阻炉中,在1200℃条件下烧制5min后取出。冷却至室温获得涂覆釉层的合金。(2) Place the dried FeNiCrAl alloy in a box-type resistance furnace, burn it at 1200° C. for 5 minutes, and then take it out. Cool to room temperature to obtain a glaze-coated alloy.
图2为实施例2制备的得到的釉层光学图片,空心微球颗粒特征明显,釉层与合金粘附好。Fig. 2 is an optical picture of the glaze layer prepared in Example 2. The characteristics of the hollow microsphere particles are obvious, and the glaze layer adheres well to the alloy.
实施例3Example 3
一种FeNiCrAl基多主元合金透明釉釉料的制备方法,包括以下步骤:A preparation method of a FeNiCrAl-based multi-principal alloy transparent glaze glaze, comprising the following steps:
S1、使用电子分析天平称取无机氧化物共100g,其中二氧化硅45.26g、三氧化二硼12.38g、氧化钠6.55g、氧化钾11.32g、氧化锂1.14g、氧化锌4.50g、二氧化锆3.34g、三氧化二铝4.50g、二氧化钛10.04g、F2O 2.91g。S1. Use an electronic analytical balance to weigh a total of 100g of inorganic oxides, including 45.26g of silicon dioxide, 12.38g of diboron trioxide, 6.55g of sodium oxide, 11.32g of potassium oxide, 1.14g of lithium oxide, 4.50g of zinc oxide, and Zirconium 3.34g, aluminum oxide 4.50g, titanium dioxide 10.04g, F 2 O 2.91g.
S2、称取硅酸钠10g,胶头滴管吸取去离子水20ml,搅拌混合均匀。S2. Weigh 10 g of sodium silicate, absorb 20 ml of deionized water with a rubber dropper, and stir to mix evenly.
S3、按照无机氧化物:空心玻璃微球:氧化钡:硅酸钠水溶液=5:1:0.5:10的比例将固体与液体混合均匀制得釉料。S3. According to the ratio of inorganic oxide: hollow glass microsphere: barium oxide: sodium silicate aqueous solution = 5:1:0.5:10, mix solid and liquid uniformly to prepare glaze.
一种FeNiCrAl基多主元合金透明釉的上釉工艺工艺,包括以下步骤:A kind of glazing technology of FeNiCrAl base multi-principal alloy transparent glaze comprises the following steps:
(1)将FeNiCrAl合金在50℃下保温5min后采用蘸釉的方法完全垂直浸没于釉料中停留2~3s,然后拿出在50℃下保温60min直至釉料完全干燥。(1) Keep the FeNiCrAl alloy at 50°C for 5 minutes, then use the method of dipping the glaze to completely immerse it vertically in the glaze for 2-3 seconds, then take it out and keep it at 50°C for 60 minutes until the glaze is completely dry.
(2)将干燥后的FeNiCrAl合金放置于箱式电阻炉中,在1200℃条件下烧制10min后取出。冷却至室温获得涂覆釉层的合金。(2) Place the dried FeNiCrAl alloy in a box-type resistance furnace, burn it at 1200° C. for 10 minutes, and then take it out. Cool to room temperature to obtain a glaze-coated alloy.
图3为实施例3制备的得到的釉层光学图片,空心微球颗粒特征明显,釉层与合金粘附好。Fig. 3 is an optical picture of the glaze layer prepared in Example 3. The characteristics of the hollow microsphere particles are obvious, and the glaze layer adheres well to the alloy.
实施例4Example 4
一种FeNiCrAl基多主元合金透明釉釉料的制备方法,包括以下步骤:A preparation method of a FeNiCrAl-based multi-principal alloy transparent glaze glaze, comprising the following steps:
S1、使用电子分析天平称取无机氧化物共100g,其中二氧化硅45.26g、三氧化二硼12.38g、氧化钠6.55g、氧化钾11.32g、氧化锂1.14g、氧化锌4.50g、二氧化锆3.34g、三氧化二铝4.50g、二氧化钛10.04g、F2O 2.91g。S1. Use an electronic analytical balance to weigh a total of 100g of inorganic oxides, including 45.26g of silicon dioxide, 12.38g of diboron trioxide, 6.55g of sodium oxide, 11.32g of potassium oxide, 1.14g of lithium oxide, 4.50g of zinc oxide, and Zirconium 3.34g, aluminum oxide 4.50g, titanium dioxide 10.04g, F 2 O 2.91g.
S2、称取硅酸钠10g,胶头滴管吸取去离子水20ml,搅拌混合均匀。S2. Weigh 10 g of sodium silicate, absorb 20 ml of deionized water with a rubber dropper, and stir to mix evenly.
S3、按照无机氧化物:空心玻璃微球:氧化钡:硅酸钠水溶液=5:0.5:0.5:10的比例将固体与液体混合均匀制得釉料。S3. According to the ratio of inorganic oxide: hollow glass microsphere: barium oxide: sodium silicate aqueous solution = 5:0.5:0.5:10, mix solid and liquid uniformly to prepare glaze.
一种FeNiCrAl基多主元合金透明釉的上釉工艺工艺,包括以下步骤:A kind of glazing technology of FeNiCrAl base multi-principal alloy transparent glaze comprises the following steps:
(1)将FeNiCrAl合金在50℃下保温5min后采用蘸釉的方法完全垂直浸没于釉料中停留3s,然后拿出在50℃下保温10min直至釉料完全干燥固化。(1) After keeping the FeNiCrAl alloy at 50°C for 5 minutes, dip it into the glaze and immerse it vertically for 3 seconds, then take it out and keep it at 50°C for 10 minutes until the glaze is completely dry and solidified.
(2)将干燥后的FeNiCrAl合金放置于箱式电阻炉中,在1200℃条件下烧制5min后取出。冷却至室温获得涂覆釉层的合金。(2) Place the dried FeNiCrAl alloy in a box-type resistance furnace, burn it at 1200° C. for 5 minutes, and then take it out. Cool to room temperature to obtain a glaze-coated alloy.
图4为实施例4制备的得到的釉层光学图片,空心微球颗粒特征明显,釉层与合金粘附好。Fig. 4 is an optical picture of the glaze layer prepared in Example 4. The characteristics of the hollow microsphere particles are obvious, and the glaze layer adheres well to the alloy.
对比例1Comparative example 1
一种FeNiCrAl基多主元合金透明釉釉料的制备方法,包括以下步骤:A preparation method of a FeNiCrAl-based multi-principal alloy transparent glaze glaze, comprising the following steps:
S1、使用电子分析天平称取无机氧化物共100g,其中二氧化硅54.26g、三氧化二硼12.38g、氧化钠6.55g、氧化钾11.32g、氧化锂1.14g、二氧化锆3.34g、二氧化钛10.04g、F2O2.91g。S1. Use an electronic analytical balance to weigh a total of 100g of inorganic oxides, including 54.26g of silicon dioxide, 12.38g of diboron trioxide, 6.55g of sodium oxide, 11.32g of potassium oxide, 1.14g of lithium oxide, 3.34g of zirconium dioxide, and titanium dioxide. 10.04g, F 2 O 2.91g.
S2、称取硅酸钠10g,胶头滴管吸取去离子水20ml,搅拌混合均匀。S2. Weigh 10 g of sodium silicate, absorb 20 ml of deionized water with a rubber dropper, and stir to mix evenly.
S3、按照无机氧化物:空心玻璃微球:氧化钡:硅酸钠水溶液=5:0:0.5:10的比例将固体与液体混合均匀制得釉料。S3. According to the ratio of inorganic oxide: hollow glass microsphere: barium oxide: sodium silicate aqueous solution = 5:0:0.5:10, mix solid and liquid uniformly to prepare glaze.
一种FeNiCrAl基多主元合金透明釉的上釉工艺工艺,包括以下步骤:A kind of glazing technology of FeNiCrAl base multi-principal alloy transparent glaze comprises the following steps:
(1)将FeNiCrAl合金在50℃下保温5min后采用蘸釉的方法完全垂直浸没于上述釉料中停留2~3s,然后拿出在50℃下保温60min直至釉料完全干燥固化。(1) After keeping the FeNiCrAl alloy at 50°C for 5 minutes, dip it vertically into the above-mentioned glaze for 2-3 seconds, then take it out and keep it at 50°C for 60 minutes until the glaze is completely dry and solidified.
(2)将干燥后的FeNiCrAl合金放置于箱式电阻炉中,在1200℃条件下烧制5min后取出。冷却至室温获得涂覆釉层的合金。(2) Place the dried FeNiCrAl alloy in a box-type resistance furnace, burn it at 1200° C. for 5 minutes, and then take it out. Cool to room temperature to obtain a glaze-coated alloy.
图5为对比例1制备的不含空心微球得到的釉层光学图片,可见釉层几全部脱落。说明空心微球对于釉层具有重要作用,其主要是起到应力释放的作用,从而解决釉层脱落。Fig. 5 is an optical picture of the glaze layer prepared in Comparative Example 1 without hollow microspheres, and it can be seen that the glaze layer almost completely falls off. It shows that the hollow microspheres play an important role in the glaze layer, which mainly plays the role of stress release, so as to solve the loss of the glaze layer.
对比例2Comparative example 2
一种FeNiCrAl基多主元合金透明釉釉料的制备方法,包括以下步骤:A preparation method of a FeNiCrAl-based multi-principal alloy transparent glaze glaze, comprising the following steps:
S1、使用电子分析天平称取无机氧化物共100g,其中二氧化硅54.26g、三氧化二硼12.38g、氧化钠6.55g、氧化钾11.32g、氧化锂1.14g、二氧化锆3.34g、二氧化钛10.04g、F2O2.91g。S1. Use an electronic analytical balance to weigh a total of 100g of inorganic oxides, including 54.26g of silicon dioxide, 12.38g of diboron trioxide, 6.55g of sodium oxide, 11.32g of potassium oxide, 1.14g of lithium oxide, 3.34g of zirconium dioxide, and titanium dioxide. 10.04g, F 2 O 2.91g.
S2、称取硅酸钠10g,胶头滴管吸取去离子水20ml,搅拌混合均匀。S2. Weigh 10 g of sodium silicate, absorb 20 ml of deionized water with a rubber dropper, and stir to mix evenly.
S3、按照无机氧化物:空心玻璃微球:氧化钡:硅酸钠水溶液=5:0.5:0:10的比例将固体与液体混合均匀制得釉料。S3. According to the ratio of inorganic oxide: hollow glass microsphere: barium oxide: sodium silicate aqueous solution = 5:0.5:0:10, mix solid and liquid uniformly to prepare glaze.
一种FeNiCrAl基多主元合金透明釉的上釉工艺工艺,包括以下步骤:A kind of glazing technology of FeNiCrAl base multi-principal alloy transparent glaze comprises the following steps:
(1)将FeNiCrAl合金在50℃下保温5min后采用蘸釉的方法完全垂直浸没于上述釉料中停留2~3s,然后拿出在50℃下保温60min直至釉料完全干燥固化。(1) After keeping the FeNiCrAl alloy at 50°C for 5 minutes, dip it vertically into the above-mentioned glaze for 2-3 seconds, then take it out and keep it at 50°C for 60 minutes until the glaze is completely dry and solidified.
(2)将干燥后的FeNiCrAl合金放置于箱式电阻炉中,在1200℃条件下烧制5min后取出。冷却至室温获得涂覆釉层的合金。(2) Place the dried FeNiCrAl alloy in a box-type resistance furnace, burn it at 1200° C. for 5 minutes, and then take it out. Cool to room temperature to obtain a glaze-coated alloy.
图6为对比例2制备的不含氧化钡得到的釉层光学图片,其中,左图为烧制之前的图片,右图为烧制之后的图片,光泽度显著降低。Fig. 6 is an optical picture of the glaze layer prepared in Comparative Example 2 without barium oxide, wherein the left picture is the picture before firing, and the right picture is the picture after firing, and the glossiness is significantly reduced.
对比例3Comparative example 3
一种FeNiCrAl基多主元合金透明釉釉料的制备方法,包括以下步骤:A preparation method of a FeNiCrAl-based multi-principal alloy transparent glaze glaze, comprising the following steps:
S1、使用电子分析天平称取无机氧化物共100g,其中二氧化硅54.26g、三氧化二硼12.38g、氧化钠6.55g、氧化钾11.32g、氧化锂1.14g、二氧化锆3.34g、二氧化钛10.04g、F2O2.91g。S1. Use an electronic analytical balance to weigh a total of 100g of inorganic oxides, including 54.26g of silicon dioxide, 12.38g of diboron trioxide, 6.55g of sodium oxide, 11.32g of potassium oxide, 1.14g of lithium oxide, 3.34g of zirconium dioxide, and titanium dioxide. 10.04g, F 2 O 2.91g.
S2、称取硅酸钠10g,胶头滴管吸取去离子水20ml,搅拌混合均匀。S2. Weigh 10 g of sodium silicate, absorb 20 ml of deionized water with a rubber dropper, and stir to mix evenly.
S3、按照无机氧化物:空心玻璃微球:氧化钡:水溶液=5:0.5:0.5:10的比例将固体与液体混合均匀制得釉料。S3. According to the ratio of inorganic oxide: hollow glass microsphere: barium oxide: aqueous solution = 5:0.5:0.5:10, uniformly mix solid and liquid to prepare glaze.
一种FeNiCrAl基多主元合金透明釉的上釉工艺工艺,包括以下步骤:A kind of glazing technology of FeNiCrAl base multi-principal alloy transparent glaze comprises the following steps:
(1)将FeNiCrAl合金在50℃下保温5min后采用蘸釉的方法完全垂直浸没于上述釉料中停留2~3s,然后拿出在50℃下保温60min直至釉料完全干燥固化。(1) After keeping the FeNiCrAl alloy at 50°C for 5 minutes, dip it vertically into the above-mentioned glaze for 2-3 seconds, then take it out and keep it at 50°C for 60 minutes until the glaze is completely dry and solidified.
(2)将干燥后的FeNiCrAl合金放置于箱式电阻炉中,在1200℃条件下烧制5min后取出。冷却至室温获得涂覆釉层的合金。(2) Place the dried FeNiCrAl alloy in a box-type resistance furnace, burn it at 1200° C. for 5 minutes, and then take it out. Cool to room temperature to obtain a glaze-coated alloy.
图7为对比例3制备的不含硅酸钠得到的釉层光学图片,右侧为激光共聚焦显微镜下,不同倍率的图片,可见局部脱落特征明显,釉层不能完全覆盖合金表面。这印证了硅酸钠涂的作用,在金属表面增加润湿性以及金属基体和釉料的结合力,形成碱金属硅酸盐及凝胶薄膜。Figure 7 is the optical picture of the glaze layer prepared in Comparative Example 3 without sodium silicate. The right side is the picture of different magnifications under the laser confocal microscope. It can be seen that the local peeling characteristics are obvious, and the glaze layer cannot completely cover the alloy surface. This confirms the role of sodium silicate coating, which increases the wettability of the metal surface and the bonding force between the metal substrate and the glaze, forming an alkali metal silicate and gel film.
对比例4Comparative example 4
一种FeNiCrAl基多主元合金透明釉釉料的制备方法,包括以下步骤:A preparation method of a FeNiCrAl-based multi-principal alloy transparent glaze glaze, comprising the following steps:
S1、使用电子分析天平称取无机氧化物共100g,其中二氧化硅54.26g、三氧化二硼12.38g、氧化钠6.55g、氧化钾11.32g、氧化锂1.14g、二氧化锆3.34g、二氧化钛10.04g、F2O2.91g。S1. Use an electronic analytical balance to weigh a total of 100g of inorganic oxides, including 54.26g of silicon dioxide, 12.38g of diboron trioxide, 6.55g of sodium oxide, 11.32g of potassium oxide, 1.14g of lithium oxide, 3.34g of zirconium dioxide, and titanium dioxide. 10.04g, F 2 O 2.91g.
S2、称取硅酸钠10g,胶头滴管吸取去离子水20ml,搅拌混合均匀。S2. Weigh 10 g of sodium silicate, absorb 20 ml of deionized water with a rubber dropper, and stir to mix evenly.
S3、按照无机氧化物:空心玻璃微球:氧化钡:硅酸钠水溶液=5:0:0.5:10的比例将固体与液体混合均匀制得釉料。S3. According to the ratio of inorganic oxide: hollow glass microsphere: barium oxide: sodium silicate aqueous solution = 5:0:0.5:10, mix solid and liquid uniformly to prepare glaze.
一种FeNiCrAl基多主元合金透明釉的上釉工艺工艺,包括以下步骤:A kind of glazing technology of FeNiCrAl base multi-principal alloy transparent glaze comprises the following steps:
将FeNiCrAl合金采用蘸釉的方法完全垂直浸没于上述釉料中停留2~3s然后拿出在50℃下保温60min直至釉料完全干燥固化。Immerse the FeNiCrAl alloy vertically in the above-mentioned glaze for 2-3 seconds by dipping in the glaze, then take it out and keep it at 50°C for 60 minutes until the glaze is completely dry and solidified.
图8为对比例4中烧制之前得到的釉层光学图片;其中,左图为不预热处理,右图为预热处理,可见,不进行预热处理的表面釉料不均匀,存在局部成膜性差的现象。说明预热处理对釉层的制备具有重要作用,预热可以在蘸釉时,保证靠近金属表面的釉料迅速干燥,解决局部润湿不好的问题。Fig. 8 is the optical picture of the glaze layer obtained before firing in Comparative Example 4; wherein, the left picture is without preheating treatment, and the right picture is preheating treatment, it can be seen that the glaze on the surface without preheating treatment is not uniform, and there are local Phenomenon of poor film formation. It shows that preheating plays an important role in the preparation of the glaze layer. Preheating can ensure the rapid drying of the glaze near the metal surface when dipping the glaze, and solve the problem of poor local wetting.
显然,本领域的技术人员可以对本发明进行各种改动和变型而不脱离本发明的精神和范围。这样,倘若本发明的这些修改和变型属于本发明权利要求及其等同技术的范围之内也意图包含这些改动和变型在内。Obviously, those skilled in the art can make various changes and modifications to the present invention without departing from the spirit and scope of the present invention. In this way, if these modifications and variations of the present invention fall within the scope of the claims of the present invention and their equivalent technologies, it is also intended to include these modifications and variations.
Claims (8)
- The FeNiCrAl-based multi-element alloy transparent glaze is characterized by being prepared from the following components:the inorganic oxide, the hollow glass microspheres, the barium oxide and the sodium silicate aqueous solution are mixed in a mass ratio of 1-10: 0.1 to 3:0.5 to 4:2 to 16;in the aqueous solution of sodium silicate, the mixing proportion of sodium silicate and water is 5-15 g: 10-50 mL.
- 2. The fenicralbased multi-component alloy transparent glaze according to claim 1, wherein the hollow glass microspheres have a density of 0.15g/cc and a color of white.
- 3. The fenicralbased multi-component alloy transparent glaze according to claim 1, wherein the purity of barium oxide is 90.00% to 99.99%.
- 4. The fenicrally based multi-element alloy transparent glaze according to claim 1, wherein the sodium silicate has a modulus of 1 to 2.2 and a purity of analytically pure.
- 5. The glazing process of the FeNiCrAl-based multi-element alloy transparent glaze is characterized by comprising the following steps of:s1, respectively weighing the following raw materials: the mixing mass ratio of the inorganic oxide to the hollow glass microsphere to the barium oxide to the sodium silicate aqueous solution is 1-10: 0.1 to 3:0.5 to 4:2 to 16; in the aqueous solution of sodium silicate, the mixing proportion of sodium silicate and water is 5-15 g: 10-50 mL;s2, uniformly mixing the inorganic oxide, the hollow glass microspheres, the barium oxide and the sodium silicate aqueous solution weighed in the step S1 to prepare glaze;s3, coating the glaze prepared in the step S2 on the surface of the preheated FeNiCrAl-based multi-element alloy;s4, solidifying the alloy processed in the S3;and S5, firing the alloy treated by the S4 at 1000-1300 ℃.
- 6. The glazing process according to claim 5, wherein in S3, the alloy is preheated after grinding, the preheating temperature is 30-70 ℃, and the preheating time is 5-30 min.
- 7. The glazing process according to claim 5, wherein in S4, the curing temperature is 25 to 70 ℃ and the curing time is 5 to 60 minutes.
- 8. The glazing process according to claim 5, wherein in S5, the firing time is between 5 and 60 minutes.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202310606954.6A CN116607148A (en) | 2023-05-26 | 2023-05-26 | FeNiCrAl-based multi-element alloy transparent glaze and glazing process thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202310606954.6A CN116607148A (en) | 2023-05-26 | 2023-05-26 | FeNiCrAl-based multi-element alloy transparent glaze and glazing process thereof |
Publications (1)
Publication Number | Publication Date |
---|---|
CN116607148A true CN116607148A (en) | 2023-08-18 |
Family
ID=87681475
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202310606954.6A Pending CN116607148A (en) | 2023-05-26 | 2023-05-26 | FeNiCrAl-based multi-element alloy transparent glaze and glazing process thereof |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN116607148A (en) |
-
2023
- 2023-05-26 CN CN202310606954.6A patent/CN116607148A/en active Pending
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN101182119B (en) | A kind of low-temperature lead-free enamel composition and preparation method thereof | |
US6831027B2 (en) | Porcelain enamel having metallic appearance | |
JPH08253343A (en) | Self-semitranslucent enamel frit for enamel coating of aluminum or aluminum alloy | |
CN108623158A (en) | A kind of acidproof enamel enamel and preparation method thereof | |
US4224074A (en) | Non-toxic frits for decorating glass, glass-ceramic and ceramic articles | |
CN102352143B (en) | Glass coating and film technology for reducing platinum rhodium alloy bushing plate loss | |
US5705273A (en) | Method for strengthening dental restorative materials | |
CN102167512B (en) | Silicon carbide-doped glass-ceramic coating for titanium alloy | |
CN116607148A (en) | FeNiCrAl-based multi-element alloy transparent glaze and glazing process thereof | |
CN117510073B (en) | Glass lining ground coat based on composite adhesive and preparation method thereof | |
CN110563335B (en) | Lead-free transparent fritted glaze and preparation method thereof | |
US4469798A (en) | Low melting, opaque enamel frit | |
CN112174527A (en) | Low-temperature sintering process method for enamel | |
CN106631172A (en) | Silver glaze with metallic luster and preparation method thereof | |
US4582760A (en) | Glazes for glass-ceramic articles | |
CN116751472A (en) | Quartz glass adhesion-preventing refractory coating for zirconia bricks | |
JPS5856752B2 (en) | Enameling method for hot-dip aluminized steel sheets | |
CN103803800A (en) | Titanium alloy protective coating and preparation method thereof | |
CN107324766A (en) | China clay and production technology, product that a kind of Tao Yin is combined | |
CN115636586B (en) | Enamel glaze for reaction kettle and preparation method thereof | |
CN110396724B (en) | Processing method of sapphire optical sheet | |
CN107056059A (en) | Medium-temperature lead-free transparent ceramic glaze and preparation method thereof | |
MXPA02003747A (en) | Water resistant porcelain enamel coatings and method of manufacturing same. | |
CN118754723A (en) | A hydrophilic self-cleaning antique brick based on phase separation self-cleaning and preparation method thereof | |
KR100505363B1 (en) | Porcelain Enamel Slip For Bowl |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination |