CN116605904A - Pyrochlore/defective fluorite zirconates - Google Patents
Pyrochlore/defective fluorite zirconates Download PDFInfo
- Publication number
- CN116605904A CN116605904A CN202211525827.5A CN202211525827A CN116605904A CN 116605904 A CN116605904 A CN 116605904A CN 202211525827 A CN202211525827 A CN 202211525827A CN 116605904 A CN116605904 A CN 116605904A
- Authority
- CN
- China
- Prior art keywords
- rare earth
- radius ratio
- atomic radius
- atomic
- composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 title abstract description 8
- 230000002950 deficient Effects 0.000 title abstract description 7
- 239000010436 fluorite Substances 0.000 title description 8
- 229910052761 rare earth metal Inorganic materials 0.000 claims abstract description 101
- 239000000203 mixture Substances 0.000 claims abstract description 67
- 150000002910 rare earth metals Chemical class 0.000 claims abstract description 49
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims abstract description 48
- 229910052726 zirconium Inorganic materials 0.000 claims abstract description 40
- 229910000449 hafnium oxide Inorganic materials 0.000 claims abstract description 37
- 229910001928 zirconium oxide Inorganic materials 0.000 claims abstract description 37
- 238000000034 method Methods 0.000 claims abstract description 25
- 239000012720 thermal barrier coating Substances 0.000 claims description 35
- 239000000758 substrate Substances 0.000 claims description 15
- 229910052735 hafnium Inorganic materials 0.000 claims description 13
- 229910001404 rare earth metal oxide Inorganic materials 0.000 claims description 13
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims description 12
- 230000008569 process Effects 0.000 claims description 4
- 238000000576 coating method Methods 0.000 abstract description 15
- 239000011248 coating agent Substances 0.000 abstract description 12
- 239000007789 gas Substances 0.000 description 18
- 239000000126 substance Substances 0.000 description 9
- 229910052727 yttrium Inorganic materials 0.000 description 9
- 239000004973 liquid crystal related substance Substances 0.000 description 8
- 239000000567 combustion gas Substances 0.000 description 7
- 229910052771 Terbium Inorganic materials 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 229910052765 Lutetium Inorganic materials 0.000 description 5
- 238000002485 combustion reaction Methods 0.000 description 5
- 229910052746 lanthanum Inorganic materials 0.000 description 5
- 229910052688 Gadolinium Inorganic materials 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical group [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical group [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 229910000601 superalloy Inorganic materials 0.000 description 4
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 239000000446 fuel Substances 0.000 description 3
- 238000007373 indentation Methods 0.000 description 3
- 238000002347 injection Methods 0.000 description 3
- 239000007924 injection Substances 0.000 description 3
- 238000007750 plasma spraying Methods 0.000 description 3
- 239000002243 precursor Substances 0.000 description 3
- 229910002076 stabilized zirconia Inorganic materials 0.000 description 3
- 238000011282 treatment Methods 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 2
- 238000000975 co-precipitation Methods 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- 239000010941 cobalt Chemical group 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical group [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 2
- 238000005328 electron beam physical vapour deposition Methods 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229910052759 nickel Chemical group 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- 229910002080 8 mol% Y2O3 fully stabilized ZrO2 Inorganic materials 0.000 description 1
- 229910000951 Aluminide Inorganic materials 0.000 description 1
- FIPWRIJSWJWJAI-UHFFFAOYSA-N Butyl carbitol 6-propylpiperonyl ether Chemical compound C1=C(CCC)C(COCCOCCOCCCC)=CC2=C1OCO2 FIPWRIJSWJWJAI-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- 229910052692 Dysprosium Inorganic materials 0.000 description 1
- 229910052691 Erbium Inorganic materials 0.000 description 1
- 229910052693 Europium Inorganic materials 0.000 description 1
- 229910052689 Holmium Inorganic materials 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910021193 La 2 O 3 Inorganic materials 0.000 description 1
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 229910052777 Praseodymium Inorganic materials 0.000 description 1
- 229910052773 Promethium Inorganic materials 0.000 description 1
- 229910052772 Samarium Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 229910052775 Thulium Inorganic materials 0.000 description 1
- 229910052769 Ytterbium Inorganic materials 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 1
- 230000005465 channeling Effects 0.000 description 1
- 229910052729 chemical element Inorganic materials 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- KBQHZAAAGSGFKK-UHFFFAOYSA-N dysprosium atom Chemical compound [Dy] KBQHZAAAGSGFKK-UHFFFAOYSA-N 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- UYAHIZSMUZPPFV-UHFFFAOYSA-N erbium Chemical compound [Er] UYAHIZSMUZPPFV-UHFFFAOYSA-N 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- HHFAWKCIHAUFRX-UHFFFAOYSA-N ethoxide Chemical compound CC[O-] HHFAWKCIHAUFRX-UHFFFAOYSA-N 0.000 description 1
- OGPBJKLSAFTDLK-UHFFFAOYSA-N europium atom Chemical compound [Eu] OGPBJKLSAFTDLK-UHFFFAOYSA-N 0.000 description 1
- UIWYJDYFSGRHKR-UHFFFAOYSA-N gadolinium atom Chemical compound [Gd] UIWYJDYFSGRHKR-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910000856 hastalloy Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- KJZYNXUDTRRSPN-UHFFFAOYSA-N holmium atom Chemical compound [Ho] KJZYNXUDTRRSPN-UHFFFAOYSA-N 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 238000011221 initial treatment Methods 0.000 description 1
- 150000007529 inorganic bases Chemical class 0.000 description 1
- 229910000765 intermetallic Inorganic materials 0.000 description 1
- OHSVLFRHMCKCQY-UHFFFAOYSA-N lutetium atom Chemical compound [Lu] OHSVLFRHMCKCQY-UHFFFAOYSA-N 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 229910001510 metal chloride Inorganic materials 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 229910052863 mullite Inorganic materials 0.000 description 1
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 150000007530 organic bases Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- -1 oxynitrates Chemical class 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 229960005235 piperonyl butoxide Drugs 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- PUDIUYLPXJFUGB-UHFFFAOYSA-N praseodymium atom Chemical compound [Pr] PUDIUYLPXJFUGB-UHFFFAOYSA-N 0.000 description 1
- VQMWBBYLQSCNPO-UHFFFAOYSA-N promethium atom Chemical compound [Pm] VQMWBBYLQSCNPO-UHFFFAOYSA-N 0.000 description 1
- IKNCGYCHMGNBCP-UHFFFAOYSA-N propan-1-olate Chemical compound CCC[O-] IKNCGYCHMGNBCP-UHFFFAOYSA-N 0.000 description 1
- OGHBATFHNDZKSO-UHFFFAOYSA-N propan-2-olate Chemical compound CC(C)[O-] OGHBATFHNDZKSO-UHFFFAOYSA-N 0.000 description 1
- 230000001141 propulsive effect Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229910001173 rene N5 Inorganic materials 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- KZUNJOHGWZRPMI-UHFFFAOYSA-N samarium atom Chemical compound [Sm] KZUNJOHGWZRPMI-UHFFFAOYSA-N 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- GZCRRIHWUXGPOV-UHFFFAOYSA-N terbium atom Chemical compound [Tb] GZCRRIHWUXGPOV-UHFFFAOYSA-N 0.000 description 1
- FRNOGLGSGLTDKL-UHFFFAOYSA-N thulium atom Chemical compound [Tm] FRNOGLGSGLTDKL-UHFFFAOYSA-N 0.000 description 1
- 239000004034 viscosity adjusting agent Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G25/00—Compounds of zirconium
- C01G25/006—Compounds containing, besides zirconium, two or more other elements, with the exception of oxygen or hydrogen
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G27/00—Compounds of hafnium
- C01G27/006—Compounds containing, besides hafnium, two or more other elements, with the exception of oxygen or hydrogen
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/48—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zirconium or hafnium oxides, zirconates, zircon or hafnates
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/30—Three-dimensional structures
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/30—Three-dimensional structures
- C01P2002/36—Three-dimensional structures pyrochlore-type (A2B2O7)
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/50—Solid solutions
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/3224—Rare earth oxide or oxide forming salts thereof, e.g. scandium oxide
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/3224—Rare earth oxide or oxide forming salts thereof, e.g. scandium oxide
- C04B2235/3225—Yttrium oxide or oxide-forming salts thereof
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/70—Aspects relating to sintered or melt-casted ceramic products
- C04B2235/74—Physical characteristics
- C04B2235/76—Crystal structural characteristics, e.g. symmetry
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Inorganic Chemistry (AREA)
- Ceramic Engineering (AREA)
- Composite Materials (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Structural Engineering (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
Abstract
A composition is provided that includes a rare earth doped zirconium/hafnium oxide having a defective fluorite structure or pyrochlore structure. The rare earth doped zirconium/hafnium oxide has the formula: (Ln) 1 a Ln 2 a Ln 3 a Ln 4 a Ln 5 b ) 2 M 2 O 7 Wherein Ln 1 、Ln 2 、Ln 3 、Ln 4 And Ln 5 Each of which is a different rare earth element such that Ln 1 And M has a first atomic radius ratio, ln, of from 1.35 to 1.45 2 And M has a second atomic radius ratio of 1.35 to 1.45, ln 3 And M has a third atomic radius ratio, ln, of from 1.46 to 1.78 4 And M has a fourth atomic radius ratio of 1.46 to 1.78; a is 0.2 or 0.25; b is 0.2 when a is 0.2, and b is 0 when a is 0.25; and M is Zr, hf or mixtures thereof. Methods of forming a coating comprising the composition and the resulting coated parts are also provided.
Description
PRIORITY INFORMATION
The present application claims priority from indian provisional patent application No. 202211008138 filed on day 2022, month 2 and 16.
Technical Field
The present application relates broadly to ultra low thermal conductivity pyrochlore/defective fluorite zirconate (pyrochlore/defect fluorite zirconates). More particularly, the present application relates generally to compositions suitable for use in coating systems on components exposed to high temperature environments (e.g., hot gas flow paths through a gas turbine engine).
Background
The use of thermal barrier coatings on components such as combustors, high Pressure Turbine (HPT) blades, and gas turbine engine vanes (vane) is increasing. Generally, the thermal insulation of TBCs enables such components to withstand higher operating temperatures, increases component durability, and improves engine reliability. In order for a TBC to remain effective throughout the planned life cycle of the component it protects, it is desirable that the TBC have a low thermal conductivity throughout the life cycle of the component, including a high Wen Piaoyi (high temperature excursion). In addition, it is desirable for TBCs to have high toughness, thereby reducing damage to the rotating, combustor, and static turbine components (e.g., turbine nozzles) of the HPT from erosion and shock. Low thermal conductivity TBCs can improve efficiency by reducing heat loss and potentially allowing higher temperature operation.
Current TBC materials 8YSZ are known for their high toughness and high thermal conductivity. Low thermal conductivity components such as 55YSZ lack high toughness. Accordingly, further improvements in TBC technology are desired, particularly when the TBC is used for thermal insulation for components of more demanding engine designs.
Disclosure of Invention
The present application provides a composition comprising: a rare earth doped zirconium/hafnium oxide having a defect-fluorite structure or a pyrochlore structure, wherein the rare earth doped zirconium/hafnium oxide has the formula:
(Ln 1 a Ln 2 a Ln 3 a Ln 4 a Ln 5 b ) 2 M 2 O 7 ,
wherein, the liquid crystal display device comprises a liquid crystal display device,
Ln 1 、Ln 2 、Ln 3 、Ln 4 and Ln 5 Each of which is a different rare earth element such that Ln 1 And M has a first atomic radius ratio, ln, of from 1.35 to 1.45 2 And M has a second atomic radius ratio of 1.35 to 1.45, ln 3 And M has a third atomic radius ratio, ln, of from 1.46 to 1.78 4 And M has a fourth atomic radius ratio of 1.46 to 1.78;
a is 0.2 or 0.25;
b is 0.2 when a is 0.2, and b is 0 when a is 0.25; and
m is Zr, hf or a mixture thereof.
Preferably, in the above formula, a is 0.2 such that the rare earth doped zirconium/hafnium oxide has the formula:
(Ln 1 0.2 Ln 2 0.2 Ln 3 0.2 Ln 4 0.2 Ln 5 0.2 ) 2 M 2 O 7 ,
wherein, the liquid crystal display device comprises a liquid crystal display device,
Ln 1 、Ln 2 、Ln 3 、Ln 4 and Ln 5 Each of which is a different rare earth element such that Ln 1 And M has a first atomic radius ratio, ln, of from 1.35 to 1.45 2 And M has a second atomic radius ratio of 1.35 to 1.45, ln 3 And M has a third atomic radius ratio, ln, of from 1.46 to 1.78 4 And M has a fourth atomic radius ratio of 1.46 to 1.78; and
m is Zr, hf or a mixture thereof.
Preferably, in the above formula, a is 0.25 and b is 0, such that the rare earth doped zirconium/hafnium oxide has the formula:
(Ln 1 0.25 Ln 2 0.25 Ln 3 0.25 Ln 4 0.25 ) 2 M 2 O 7 ,
wherein, the liquid crystal display device comprises a liquid crystal display device,
Ln 1 、Ln 2 、Ln 3 and Ln 4 Each of which is a different rare earth element such that Ln 1 And M has a first atomic radius ratio, ln, of from 1.35 to 1.45 2 And M has a second atomic radius ratio of 1.35 to 1.45, ln 3 And M has a third atomic radius ratio, ln, of from 1.46 to 1.78 4 And M has a fourth atomic radius ratio of 1.46 to 1.78; and
m is Zr, hf or a mixture thereof.
Preferably, M is 50 atomic% to 100 atomic% Zr, more preferably, M is 95 atomic% to 100 atomic% Zr, still more preferably, M consists of Zr.
Preferably, in the above formula, ln 1 And Ln 2 Is a different rare earth element selected from Tb, dy, Y, ho, er, tm, yb and Lu.
Preferably, in the above formula, ln 3 And Ln 4 Is a different rare earth element selected from La, ce, pr, nd, pm, sm, eu and Gd.
Preferably, the composition has a thermal conductivity of 0.5W/m-K to 1.5W/m-K at 1000℃in a 95-100% dense disk as measured by laser flash method according to ASTM E1461-13.
Preferably, the composition is selected from the following:
(Nd 0.2 Eu 0.2 Y 0.2 Dy 0.2 Lu 0.2 ) 2 Zr 2 O 7 ;
(Nd 0.2 Eu 0.2 Tb 0.2 Dy 0.2 Lu 0.2 ) 2 Zr 2 O 7 ;
(Sm 0.2 Eu 0.2 Gd 0.2 Dy 0.2 Lu 0.2 ) 2 Zr 2 O 7 ;
(Sm 0.2 Eu 0.2 Y 0.2 Dy 0.2 Lu 0.2 ) 2 Zr 2 O 7 ;
(Nd 0.2 Eu 0.2 La 0.2 Dy 0.2 Lu 0.2 ) 2 Zr 2 O 7 ;
(Nd 0.2 Eu 0.2 Ho 0.2 Dy 0.2 Lu 0.2 ) 2 Zr 2 O 7 ;
(Nd 0.2 Eu 0.2 Y 0.2 Dy 0.2 Er 0.2 ) 2 Zr 2 O 7 ;
(Nd 0.2 Eu 0.2 Ho 0.2 Dy 0.2 Er 0.2 ) 2 Zr 2 O 7 ;
(Sm 0.2 Eu 0.2 Ho 0.2 Dy 0.2 Lu 0.2 ) 2 Zr 2 O 7 ;
(Nd 0.25 Eu 0.25 Ho 0.25 Dy 0.25 ) 2 Zr 2 O 7 ;
(Nd 0.25 Eu 0.25 Y 0.25 Dy 0.25 ) 2 Zr 2 O 7 ;
(Sm 0.25 Eu 0.25 Ho 0.25 Dy 0.25 ) 2 Zr 2 O 7 the method comprises the steps of carrying out a first treatment on the surface of the And mixtures thereof.
The present application also provides a coated member, wherein the coated member comprises:
a substrate having a surface; and
a thermal barrier coating on the surface, wherein the thermal barrier coating comprises a layer comprising the composition of the present application.
The present application also provides a coated member, wherein the coated member comprises:
a substrate having a surface; and
a thermal barrier coating on the surface, wherein the thermal barrier coating comprises a layer comprising a rare earth doped zirconium/hafnium oxide having a defect-fluorite structure or a pyrochlore structure, the layer having a thermal conductivity of 0.5W/m "K to 1.5W/m" K at 1000 ℃ in a 95-100% dense disk as measured by laser flash method according to ASTM E1461-13.
Preferably, in the coated part, the layer has an indentation fracture toughness in the 95-100% dense disk of 2MPa-m 0.5 ~3MPa-m 0.5 。
Preferably, in the coated component, the rare earth doped zirconium/hafnium oxide comprises 4 or 5 different rare earth elements each present in substantially equal atomic percentages.
Preferably, in the coated member, the layer comprises a single phase rare earth doped zirconium/hafnium oxide having a defect-fluorite structure.
Preferably, in the coated member, the layer comprises a single phase rare earth doped zirconium/hafnium oxide having a pyrochlore structure.
Preferably, in the coated member, the rare earth doped zirconium/hafnium oxide having a defect-fluorite structure or pyrochlore structure has the formula:
(Ln 1 a Ln 2 a Ln 3 a Ln 4 a Ln 5 b ) 2 M 2 O 7 ,
wherein, the liquid crystal display device comprises a liquid crystal display device,
Ln 1 、Ln 2 、Ln 3 、Ln 4 and Ln 5 Each of which is a different rare earth element such that Ln 1 And M has a first atomic radius ratio, ln, of from 1.35 to 1.45 2 And M has a second atomic radius ratio of 1.35 to 1.45, ln 3 And M has a third atomic radius ratio, ln, of from 1.46 to 1.78 4 And M has a fourth atomic radius ratio of 1.46 to 1.78;
a is 0.2 or 0.25;
b is 0.2 when a is 0.2, and b is 0 when a is 0.25; and
m is Zr, hf or a mixture thereof.
Preferably, M is 95 atomic% to 100 atomic% Zr in the coated member.
In another aspect, the present application also provides a method of forming a rare earth doped zirconium/hafnium oxide, the method comprising:
combining 4 or 5 different rare earth zirconium/hafnium oxides to form rare earth doped zirconium/hafnium oxides having a defect-fluorite structure or pyrochlore structure,
wherein the first rare earth oxide contains a first rare earth element, the first atomic radius ratio of the first rare earth element to Zr is 1.35-1.45, the second rare earth oxide contains a second rare earth element, the second atomic radius ratio of the second rare earth element to Zr is 1.35-1.45, the third rare earth oxide contains a third rare earth element, the third atomic radius ratio of the third rare earth element to Zr is 1.46-1.78, the fourth rare earth oxide contains a fourth rare earth element, the fourth atomic radius ratio of the fourth rare earth element to Zr is 1.46-1.78,
wherein each of the different rare earth zirconium/hafnium oxides is present at substantially equal atomic weights of their respective rare earth elements.
Drawings
A full and enabling disclosure of the present application, including the best mode thereof, directed to one of ordinary skill in the art, is set forth in the specification, which makes reference to the appended figures, in which:
FIG. 1 is a cross-sectional side view of an exemplary coated component; and
FIG. 2 is a schematic cross-sectional view of an exemplary gas turbine engine according to various embodiments of the present subject matter.
Repeat use of reference characters in the present specification and drawings is intended to represent same or analogous features or elements of the application.
Detailed Description
Definition of the definition
As used herein, the term "exemplary" means "serving as an example, instance, or illustration. Any embodiment described herein as "exemplary" is not necessarily to be construed as preferred or advantageous over other embodiments. In addition, all embodiments described herein should be considered exemplary unless specifically indicated otherwise.
The term "gas turbine engine" refers to an engine having a turbine as all or part of its power source. Exemplary gas turbine engines include turbofan engines, turboprop engines, turbojet engines, turboshaft engines, and the like, as well as hybrid versions of one or more of these engines. The term "turbomachinery" or "turbomachinery" refers to a machine that includes one or more compressors, a heat-generating section (e.g., a combustion section), and one or more turbines that together produce a torque output.
In the present application, when a layer is described as being "on" or "over" another layer or substrate, it is to be understood that the layers can either be in direct contact with each other or have another layer or feature between the layers unless expressly stated to the contrary. Thus, these terms merely describe the relative position of the layers to one another and do not necessarily mean "on top of … …" because the relative position above or below depends on the orientation of the device with respect to the viewer.
In the present application, chemical elements are discussed using their common chemical abbreviations, such as those common on the periodic table of elements. For example, hydrogen is represented by its common chemical abbreviation H; helium is represented by its common chemical abbreviation He; etc.
As used herein, "Ln" refers to a rare earth element or a mixture of rare earth elements. More specifically, "Ln" refers to rare earth elements in scandium (Sc), yttrium (Y), lanthanum (La), cerium (Ce), praseodymium (Pr), neodymium (Nd), promethium (Pm), samarium (Sm), europium (Eu), gadolinium (Gd), terbium (Tb), dysprosium (Dy), holmium (Ho), erbium (Er), thulium (Tm), ytterbium (Yb), lutetium (Lu), or mixtures thereof.
As used herein, the term "substantially free" is to be understood as either completely free of the recited ingredient or containing trace amounts of the same ingredient. "traces" are quantitative levels of chemical components that are barely detectable and provide no benefit to the functional or aesthetic properties of the subject composition (subject composition). The term "substantially free" also includes complete absence.
As used herein, the term "substantially equal" should be understood to include minor trace changes at quantitative levels that are barely detectable and provide no benefit to the functional or aesthetic properties of the subject composition. The term "substantially equal" also includes perfect equality.
Reference now will be made in detail to embodiments of the application, one or more examples of which are illustrated in the drawings. Each example is provided by way of explanation of the application, not limitation of the application. Indeed, it will be apparent to those skilled in the art that various modifications and variations can be made to the present application without departing from the scope of the application. For example, features illustrated or described as part of one embodiment can be used with another embodiment to yield still a further embodiment. Accordingly, it is intended that the present application cover such modifications and variations as come within the scope of the appended claims and their equivalents.
Compositions based on rare earth-zirconium/hafnium oxides having pyrochlore or defective fluorite structures and coatings formed from the compositions are generally disclosed. These compositions and coatings may have relatively low thermal conductivities (e.g., 0.5W/m-K to 1.5W/m-K at 1000℃, such as 0.5W/m-K to 1.4W/m-K at 1000℃ in 95-100% dense disk (dense puck) as measured by laser flash according to ASTM E1461-13). In general, these compositions are useful for forming films having ultra-low thermal conductivity and suitable toughness (e.g., indentation fracture toughness in 95-100% dense disks of 2 MPa-m) 0.5 ~3MPa-m 0.5 ) Is included in the TBC layer of (C).
In one particular embodiment, the TBC layer may have a single phase (i.e., a pyrochlore structure or a defect-fluorite structure). Thus, the resulting TBC will allow for a higher component surface temperature and/or reduced coating thickness for the same surface temperature. Reduced TBC thickness (particularly in applications such as combustors where a relatively thick TBC is required) will result in significant cost reduction as well as weight benefits.
The composition generally comprises a rare earth doped zirconium/hafnium oxide having a defect-fluorite structure or a pyrochlore-structure. In one embodiment, the rare earth doped zirconium/hafnium oxide has the formula shown in formula 1:
formula 1: (Ln) 1 a Ln 2 a Ln 3 a Ln 4 a Ln 5 b ) 2 M 2 O 7
Wherein Ln 1 、Ln 2 、Ln 3 、Ln 4 And Ln 5 Each of which is a different rare earth element such that Ln 1 And M has a first atomic radius ratio, ln, of from 1.35 to 1.45 2 And M has a second atomic radius ratio of 1.35 to 1.45, ln 3 And M has a third atomic radius ratio of 1.46 to 1.78, and Ln 4 And M has a fourth atomic radius ratio of 1.46 to 1.78; a is 0.2 or 0.25; b is 0.2 when a is 0.2, and b is 0 when a is 0.25; m is Zr, hf or a mixture thereof.
In general, ln 1 And Ln2 are each a different rare earth element, which forms a defective fluorite Ln 2 Zr 2 O 7 (e.g., tb, dy, Y, ho, er, tm, yb and Lu) and/or forming defective fluorite Ln 2 Hf 2 O 7 (e.g., dy, Y, ho, er, tm, yb and Lu). In a particular embodiment, ln 1 And Ln 2 Each of which is a different rare earth element selected from Tb, dy, Y, ho, er, tm, yb and Lu.
Alternatively, ln 3 And Ln 4 Each of which is a different rare earth element, which forms pyrochlore Ln 2 Zr 2 O 7 (e.g., la, ce, pr, nd, pm, sm, eu and Gd) and/or pyrochlore Ln formation 2 Hf 2 O 7 (e.g., la, ce, pr, nd, pm, sm, eu, gd and Tb). In a particular embodiment, ln 1 And Ln 2 Is a different rare earth element selected from La, ce, pr, nd, pm, sm, eu, gd and Tb.
In a particular embodiment, a is 0.2 such that the rare earth doped zirconium/hafnium oxide has the formula shown in formula 2:
formula 2: (Ln) 1 0.2 Ln 2 0.2 Ln 3 0.2 Ln 4 0.2 Ln 5 0.2 ) 2 M 2 O 7
Wherein Ln 1 、Ln 2 、Ln 3 、Ln 4 And Ln 5 Each of which is a different rare earth element such that Ln 1 And M has a first atomic radius ratio, ln, of from 1.35 to 1.45 2 And M has a second atomic radius ratio of 1.35 to 1.45, ln 3 And M has a third atomic radius ratio of 1.46 to 1.78, and Ln 4 And M has a fourth atomic radius ratio of 1.46 to 1.78; m is Zr, hf or a mixture thereof. In such an embodiment, ln 5 And M may have a second atomic radius ratio of 1.35 to 1.45 or 1.46 to 1.78.
In another particular embodiment, a is 0.25 and b is 0, such that the rare earth doped zirconium/hafnium oxide has the formula shown in formula 3:
formula 3: (Ln) 1 0.25 Ln 2 0.25 Ln 3 0.25 Ln 4 0.25 ) 2 M 2 O 7
Wherein Ln 1 、Ln 2 、Ln 3 And Ln 4 Each of which is a different rare earth element such that Ln 1 And M has a first atomic radius ratio, ln, of from 1.35 to 1.45 2 And M has a second atomic radius ratio of 1.35 to 1.45, ln 3 And M has a third atomic radius ratio of 1.46 to 1.78, and Ln 4 And M has a fourth atomic radius ratio of 1.46 to 1.78; m is Zr, hf or a mixture thereof.
As described above, due to ZrO 2 And HfO 2 Chemical similarity of (2) and Zr 4+ () And Hf 4+ (/>) Since M in any of the formulae 1, 2 or 3 may be Zr, hf or a mixture thereof. Thus, M may be 0 atomic% to 100 atomic% Zr. Conversely, M may be 0 atomic% to 100 atomic% Hf. However, in particular embodiments, zr may form half or more of the atomic percent of M, such that M is 50 atomic% to 100 atomic%Zr. In a particular embodiment, zr is the major component of M (e.g., M is 95 atomic% to 100 atomic% Zr). For example, in certain embodiments, M may consist of Zr (i.e., M is 100 atomic% Zr).
Particularly suitable compositions of rare earth doped zirconium/hafnium oxides having a defect-fluorite structure or pyrochlore structure may include, but are not limited to:
(Nd 0.2 Eu 0.2 Y 0.2 Dy 0.2 Lu 0.2 ) 2 Zr 2 O 7 ;
(Nd 0.2 Eu 0.2 Tb 0.2 Dy 0.2 Lu 0.2 ) 2 Zr 2 O 7 ;
(Sm 0.2 Eu 0.2 Gd 0.2 Dy 0.2 Lu 0.2 ) 2 Zr 2 O 7 ;
(Sm 0.2 Eu 0.2 Y 0.2 Dy 0.2 Lu 0.2 ) 2 Zr 2 O 7 ;
(Nd 0.2 Eu 0.2 La 0.2 Dy 0.2 Lu 0.2 ) 2 Zr 2 O 7 ;
(Nd 0.2 Eu 0.2 Ho 0.2 Dy 0.2 Lu 0.2 ) 2 Zr 2 O 7 ;
(Nd 0.2 Eu 0.2 Y 0.2 Dy 0.2 Er 0.2 ) 2 Zr 2 O 7 ;
(Nd 0.2 Eu 0.2 Ho 0.2 Dy 0.2 Er 0.2 ) 2 Zr 2 O 7 ;
(Sm 0.2 Eu 0.2 Ho 0.2 Dy 0.2 Lu 0.2 ) 2 Zr 2 O 7 ;
(Nd 0.25 Eu 0.25 Ho 0.25 Dy 0.25 ) 2 Zr 2 O 7 ;
(Nd 0.25 Eu 0.25 Y 0.25 Dy 0.25 ) 2 Zr 2 O 7 ;
(Sm 0.25 Eu 0.25 Ho 0.25 Dy 0.25 ) 2 Zr 2 O 7 the method comprises the steps of carrying out a first treatment on the surface of the Or a mixture thereof.
As noted above, compositions of rare earth doped zirconium/hafnium oxides having a defect-fluorite structure or pyrochlore structure are particularly useful as layers in thermal barrier coatings on components.
For example, referring to FIG. 1, an exemplary coated component 100 is shown formed from a substrate 102 having a surface 103 and a coating system 106 thereon. In general, coating system 106 includes bond coat layer 104 on surface 103 of substrate 102 and TBC 108 on bond coat layer 104. In the embodiment shown, the bond coat 104 is directly on the surface 103 without any layer in between. Bond coat materials widely used in TBC systems may include, but are not limited to: an oxidation resistant overlay coating, such as MCrAlX (where M is iron, cobalt and/or nickel, and X is yttrium or other rare earth element), and an oxidation resistant diffusion coating, such as a diffusion aluminide containing aluminum intermetallic compounds.
The substrate 102 may be any suitable material, for example, a metal, such as steel or a superalloy (e.g., a nickel-based superalloy, a cobalt-based superalloy, or an iron-based superalloy, such as Rene N5, N500, N4, N2, IN718, hastelloy X, or Haynes 188) or other suitable material for withstanding high temperatures. The coating system 106 may be disposed along one or more portions of the substrate 102 or substantially on the entire exterior of the substrate 102. In particular embodiments, the coating system 106 can have a total thickness of 50 μm (e.g., microns or μm) to 2500 μm, such as 100 μm to 700 μm.
TBC 108 may be formed from a plurality of individual layers 114. In one embodiment, at least one of the layers 114 of the TBC 108 comprises a layer comprising a composition comprising a rare earth doped zirconium/hafnium oxide having a defect-fluorite structure or a pyrochlore structure, such as the formula of formula 1. For example, at least one of the layers 114 of the TBC 108 may comprise at least 80 wt.% of a composition of a rare earth doped zirconium/hafnium oxide having a defect-fluorite structure or a pyrochlore structure, such as a formula having formula 1. In one embodiment, at least one of the layers 114 of the TBC 108 may comprise 90 wt% to 100 wt% of a composition of a rare earth doped zirconium/hafnium oxide having a defect-fluorite structure or a pyrochlore structure, such as that having formula 1.
In particular embodiments, each of the layers 114 of the TBC 108 may have a layer thickness of 25 μm to 100 μm (e.g., 25 μm to 50 μm).
One or more of the individual layers 114 may be formed of a stable ceramic capable of withstanding relatively high temperature gradients so that the coated metal component may be operated at gas temperatures above the melting point of the metal. For example, the stable ceramic material may be one or more of the following: yttrium Stabilized Zirconia (YSZ) and other rare earth stabilized zirconia compositions, mullite (3 Al) 2 O 3 -2SiO 2 ) Alumina, ceria (CeO) 2 ) Lanthanum zirconate, rare earth oxide (e.g. La 2 O 3 、Nb 2 O 5 、Pr 2 O 3 、CeO 2 ) And metal-glass composites and combinations thereof (e.g., alumina and YSZ, or ceria and YSZ). In addition to having high temperature stability, YSZ has a good combination of high toughness and chemical inertness, and the coefficient of thermal expansion of YSZ is quite suitably matched to that of the coated metal part.
Each individual layer 114 may be formed by any suitable process. For example, one or more of the individual layers 114 may be formed by air-plasma spraying (APS), suspension Plasma Spraying (SPS), solution Precursor Plasma Spraying (SPPS), electron Beam Physical Vapor Deposition (EBPVD), high Velocity Oxygen Fuel (HVOF), electrostatic Spray Assisted Vapor Deposition (ESAVD), and direct vapor deposition.
In one embodiment, TBC 108 may comprise a layer based on YSZ (e.g., 8 YSZ) closest to substrate 102 (e.g., directly on bond coat 104, if present). Thus, yttrium stabilized zirconia can form a barrier coating between a substrate and a layer comprising a rare earth doped zirconium/hafnium oxide composition having a defect-fluorite structure or pyrochlore structure, such as the formula of formula 1.
The coated component 100 is particularly suitable for use as a component present in high temperature environments, such as those found in gas turbine engines, for example, combustor components, turbine blades, shrouds, nozzles, heat shields, and vanes. In particular, the coated component 100 may be a component located within a hot gas flow path of a gas turbine such that the coating system 106 forms a thermal barrier for the underlying substrate 102 to protect the component 100 within the gas turbine when exposed to the hot gas flow path.
Coatings comprising rare earth doped zirconium/hafnium oxides can be obtained by using powder raw materials synthesized by: in a suitable solvent (e.g., aqueous or organic or a combination), a suitable metal (Ln, hf, zr) precursor (organic (e.g., metal alkoxides such as propoxide, butoxide, isopropoxide, ethoxide, tetraethoxide, or triethoxide) or inorganic (e.g., metal chlorides, oxychlorides, nitrates, oxynitrates, carbonates)) is used, synthesized by wet chemical synthetic routes. Suitable organic solvents may include, but are not limited to, isopropanol, ethanol, butanol, or ethylene glycol monobutyl ether. Other components in the wet chemical route may include organic acids (e.g., citric acid or acetic acid), inorganic acids (e.g., HCl or HNO) 3 ) An organic base (e.g. diethylamine, triethylamine or diethylenetriamine) or an inorganic base (e.g. NaOH or NH) 4 OH). Viscosity modifiers (e.g., glycerol, ethylene glycol, ethyl acetate, or polyethylene glycol) may also be present. Non-limiting examples of wet chemical routes include sol-gel, polymer precursor or gel-combustion, hydrothermal or solvothermal, co-precipitation hydrothermal combinations, and co-precipitation molten salt square combinations. In these methods, the initial treatment may be performed at room temperature to about 200 ℃, followed by a heat treatment at a low temperature of 500 ℃ to 1000 ℃ (which is relatively low compared to the solid state synthetic route) may result in the formation of a final composition having a low grain size (e.g., within a nanometer size, such as 10nm to 100 nm). The powder particles of the compositions obtained in this way can be sprayed by the above-described method to obtain a final coating with a fine-grained microstructure (for example, 2-10 μm), which, thanks to the inherent resistance to sintering, can be cycled through heatingThe fine-grained microstructure is maintained during the ring.
FIG. 2 is a schematic cross-sectional view of a gas turbine engine according to an exemplary embodiment of the application. More specifically, for the embodiment of FIG. 2, the gas turbine engine is a high bypass turbofan engine 10, referred to herein as "turbofan engine 10". As shown in fig. 2, turbofan engine 10 defines an axial direction a (extending parallel to longitudinal axis 12 for reference) and a radial direction R. Generally, turbofan engine 10 includes a fan section 14 and a core turbine engine 16 disposed downstream of fan section 14. Although described below with reference to turbofan engine 10, the present application is generally applicable to turbomachinery, including turbojet engines, turboprop engines, and turboshaft gas turbine engines, including industrial and marine gas turbine engines and auxiliary power units. It may also be suitable for other high temperature applications containing water vapor in the gas phase, such as those resulting from the combustion of hydrocarbon fuels.
The exemplary core turbine engine 16 shown generally includes a generally tubular outer casing 18 defining an annular inlet 20. The housing 18 encloses, in serial flow relationship, a compressor section including a booster or Low Pressure (LP) compressor 22 and a High Pressure (HP) compressor 24; a combustion section 26; a turbine section including a High Pressure (HP) turbine 28 and a Low Pressure (LP) turbine 30; and an injection exhaust nozzle section 32. A High Pressure (HP) shaft or spool (spool) 34 drivingly connects HP turbine 28 to HP compressor 24. A Low Pressure (LP) shaft or spool 36 drivingly connects LP turbine 30 to LP compressor 22.
For the illustrated embodiment, the fan section 14 includes a variable pitch fan 38, the variable pitch fan 38 having a plurality of fan blades 40 connected to a disk 42 in a spaced apart manner. As shown, the fan blades 40 extend generally outwardly from the disk 42 in a radial direction R. Since the fan blades 40 are operatively connected to a suitable actuating member 44 (the actuating member 44 is configured to collectively and consistently vary the pitch (pitch) of the fan blades 40), each fan blade 40 is rotatable relative to the disk 42 about a pitch axis P (a pitch axis). The fan blades 40, disk 42, and actuating member 44 are rotatable together about the longitudinal axis 12 by the LP spool 36 on an optional power gearbox 46. The power gearbox 46 includes a plurality of gears for reducing the rotational speed of the LP spool 36 to a more efficient rotational fan speed.
Still referring to the exemplary embodiment of FIG. 2, the disk 42 is covered by a rotatable forward nacelle 48, the forward nacelle 48 having an aerodynamic profile to facilitate airflow through the plurality of fan blades 40. Further, the exemplary fan section 14 includes an annular fan casing or nacelle 50 that circumferentially surrounds at least a portion of the fan 38 and/or the core turbine engine 16. It should be appreciated that the nacelle 50 may be configured to be supported relative to the core turbine engine 16 by a plurality of circumferentially spaced outlet guide vanes 52. Further, the downstream section 54 of the nacelle 50 may extend beyond the exterior of the core turbine engine 16 to define a bypass airflow passage 56 therebetween.
During operation of turbofan engine 10, a volume of air 58 enters turbofan engine 10 through nacelle 50 and/or an associated inlet 60 of fan section 14. As a volume of air 58 passes over the fan blades 40, a first portion 62 of the air 58 is directed or channeled into the bypass airflow passage 56 as indicated by the arrows, and a second portion 64 of the air 58 is directed or channeled into the LP compressor 22 as indicated by the arrows. The ratio between the first portion of air 62 and the second portion of air 64 is commonly referred to as the bypass ratio. The pressure of the second portion 64 of air then increases as it is passed through the High Pressure (HP) compressor 24 and into the combustion section 26, where the second portion 64 of air mixes with fuel and combusts to provide combustion gases 66.
The combustion gases 66 are channeled through HP turbine 28 wherein heat energy and/or a portion of the kinetic energy from combustion gases 66 are extracted via stages of sequential HP turbine stator vanes 68 (connected to casing 18) and HP turbine rotor blades 70 (connected to HP shaft or spool 34) thereby causing HP shaft or spool 34 to rotate, thereby supporting operation of HP compressor 24. The combustion gases 66 are then channeled through LP turbine 30 wherein thermal energy and a second portion of the kinetic energy are extracted from combustion gases 66 via stages of sequential LP turbine stator vanes 72 (coupled to casing 18) and LP turbine rotor blades 74 (coupled to LP shaft or spool 36), thereby causing LP shaft or spool 36 to rotate, thereby supporting operation of LP compressor 22 and/or rotation of fan 38.
The combustion gases 66 are then channeled through injection exhaust nozzle section 32 of core turbine engine 16 to provide propulsion thrust. At the same time, as the first portion of air 62 is channeled through bypass airflow passage 56 (also providing propulsive thrust) before it is discharged from fan nozzle exhaust section 76 of turbofan engine 10, the pressure of first portion of air 62 increases substantially. The HP turbine 28, the LP turbine 30, and the injection exhaust nozzle section 32 at least partially define a hot gas path 78 for channeling the combustion gases 66 through the core turbine engine 16.
Other aspects of the application are provided by the subject matter of the following clauses:
1. a composition comprising: a rare earth doped zirconium/hafnium oxide having a defect-fluorite structure or a pyrochlore structure, wherein the rare earth doped zirconium/hafnium oxide has the formula:
(Ln 1 a Ln 2 a Ln 3 a Ln 4 a Ln 5 b ) 2 M 2 O 7 ,
wherein Ln 1 、Ln 2 、Ln 3 、Ln 4 And Ln 5 Each of which is a different rare earth element such that Ln 1 And M has a first atomic radius ratio, ln, of from 1.35 to 1.45 2 And M has a second atomic radius ratio of 1.35 to 1.45, ln 3 And M has a third atomic radius ratio, ln, of from 1.46 to 1.78 4 And M has a fourth atomic radius ratio of 1.46 to 1.78; a is 0.2 or 0.25; b is 0.2 when a is 0.2, and b is 0 when a is 0.25; m is Zr, hf or a mixture thereof.
2. The composition of any of the preceding clauses wherein a is 0.2 such that the rare earth doped zirconium/hafnium oxide has the formula:
(Ln 1 0.2 Ln 2 0.2 Ln 3 0.2 Ln 4 0.2 Ln 5 0.2 ) 2 M 2 O 7 ,
wherein Ln 1 、Ln 2 、Ln 3 、Ln 4 And Ln 5 Each of which is a different rare earth element such that Ln 1 And M has a first atomic radius ratio, ln, of from 1.35 to 1.45 2 And M has a second atomic radius ratio of 1.35 to 1.45, ln 3 And M has a third atomic radius ratio, ln, of from 1.46 to 1.78 4 And M has a fourth atomic radius ratio of 1.46 to 1.78; m is Zr, hf or a mixture thereof.
3. The composition of any of the preceding clauses wherein Ln 5 And M has a second atomic radius ratio of 1.35 to 1.45 or 1.46 to 1.78.
4. The composition of any of the preceding clauses wherein a is 0.25 and b is 0 such that the rare earth doped zirconium/hafnium oxide has the formula:
(Ln 1 0.25 Ln 2 0.25 Ln 3 0.25 Ln 4 0.25 ) 2 M 2 O 7 ,
wherein Ln 1 、Ln 2 、Ln 3 And Ln 4 Each of which is a different rare earth element such that Ln 1 And M has a first atomic radius ratio, ln, of from 1.35 to 1.45 2 And M has a second atomic radius ratio of 1.35 to 1.45, ln 3 And M has a third atomic radius ratio, ln, of from 1.46 to 1.78 4 And M has a fourth atomic radius ratio of 1.46 to 1.78; m is Zr, hf or a mixture thereof.
5. The composition of any of the preceding clauses wherein M is 50 atomic% to 100 atomic% Zr.
6. The composition of any of the preceding clauses wherein M is 95 atomic% to 100 atomic% Zr.
7. The composition of any of the preceding clauses wherein M consists of Zr.
8. The composition of any of the preceding clauses wherein Ln 1 And Ln 2 Each of which is not selected from Tb, dy, Y, ho, er, tm, yb and LuThe same rare earth element.
9. The composition of any of the preceding clauses wherein Ln 3 And Ln 4 Each of which is a different rare earth element selected from La, ce, pr, nd, pm, sm, eu and Gd.
10. The composition of any of the preceding clauses wherein the composition has a thermal conductivity of 0.5W/m-K to 1.5W/m-K at 1000 ℃ in a 95-100% dense disk as measured by laser flash method according to ASTM E1461-13.
11. The composition of any of the preceding clauses, wherein the composition is selected from the group consisting of:
(Nd 0.2 Eu 0.2 Y 0.2 Dy 0.2 Lu 0.2 ) 2 Zr 2 O 7 ;
(Nd 0.2 Eu 0.2 Tb 0.2 Dy 0.2 Lu 0.2 ) 2 Zr 2 O 7 ;
(Sm 0.2 Eu 0.2 Gd 0.2 Dy 0.2 Lu 0.2 ) 2 Zr 2 O 7 ;
(Sm 0.2 Eu 0.2 Y 0.2 Dy 0.2 Lu 0.2 ) 2 Zr 2 O 7 ;
(Nd 0.2 Eu 0.2 La 0.2 Dy 0.2 Lu 0.2 ) 2 Zr 2 O 7 ;
(Nd 0.2 Eu 0.2 Ho 0.2 Dy 0.2 Lu 0.2 ) 2 Zr 2 O 7 ;
(Nd 0.2 Eu 0.2 Y 0.2 Dy 0.2 Er 0.2 ) 2 Zr 2 O 7 ;
(Nd 0.2 Eu 0.2 Ho 0.2 Dy 0.2 Er 0.2 ) 2 Zr 2 O 7 ;
(Sm 0.2 Eu 0.2 Ho 0.2 Dy 0.2 Lu 0.2 ) 2 Zr 2 O 7 ;
(Nd 0.25 Eu 0.25 Ho 0.25 Dy 0.25 ) 2 Zr 2 O 7 ;
(Nd 0.25 Eu 0.25 Y 0.25 Dy 0.25 ) 2 Zr 2 O 7 ;
(Sm 0.25 Eu 0.25 Ho 0.25 Dy 0.25 ) 2 Zr 2 O 7 the method comprises the steps of carrying out a first treatment on the surface of the And mixtures thereof.
12. A coated component comprising: a substrate having a surface; a thermal barrier coating on the surface, wherein the thermal barrier coating comprises a layer comprising the composition of any of the preceding clauses.
13. A coated component comprising: a substrate having a surface; a thermal barrier coating on the surface, wherein,
the thermal barrier coating comprises a layer comprising a rare earth doped zirconium/hafnium oxide having a defect-fluorite structure or a pyrochlore structure, wherein the layer has a thermal conductivity of 0.5W/m-K to 1.5W/m-K at 1000 ℃ in a 95-100% dense disk as measured by laser flash method according to ASTM E1461-13.
14. The coated member according to any one of the preceding clauses wherein,
the layer has an indentation fracture toughness in a 95-100% dense disk of 2MPa-m 0.5 ~3MPa-m 0.5 。
15. The coated member according to any one of the preceding clauses wherein,
the rare earth doped zirconium/hafnium oxide contains 4 or 5 different rare earth elements each present in substantially equal atomic percentages.
16. The coated member according to any one of the preceding clauses wherein,
the layer comprises a single phase defect-fluorite structured rare earth doped zirconium/hafnium oxide.
17. The coated member according to any one of the preceding clauses wherein,
the layer comprises a rare earth doped zirconium/hafnium oxide of a single phase pyrochlore structure.
18. The coated member according to any one of the preceding clauses wherein,
rare earth doped zirconium/hafnium oxide having a defect-fluorite structure or pyrochlore structure has the formula:
(Ln 1 a Ln 2 a Ln 3 a Ln 4 a Ln 5 b ) 2 M 2 O 7 ,
wherein Ln 1 、Ln 2 、Ln 3 、Ln 4 And Ln 5 Each of which is a different rare earth element such that Ln 1 And M has a first atomic radius ratio, ln, of from 1.35 to 1.45 2 And M has a second atomic radius ratio of 1.35 to 1.45, ln 3 And M has a third atomic radius ratio, ln, of from 1.46 to 1.78 4 And M has a fourth atomic radius ratio of 1.46 to 1.78; a is 0.2 or 0.25; b is 0.2 when a is 0.2, and b is 0 when a is 0.25; m is Zr, hf or a mixture thereof.
19. The coated member according to any one of the preceding clauses wherein M is 95 to 100 atomic% Zr.
20. A method of forming a rare earth doped zirconium/hafnium oxide, the method comprising:
combining 4 or 5 different rare earth zirconium/hafnium oxides to form a rare earth doped zirconium/hafnium oxide having a defect-fluorite structure or pyrochlore structure, wherein a first rare earth oxide comprises a first rare earth element having a first atomic radius ratio to Zr of 1.35-1.45, a second rare earth oxide comprises a second rare earth element having a second atomic radius ratio to Zr of 1.35-1.45, a third rare earth oxide comprises a third rare earth element having a third atomic radius ratio to Zr of 1.46-1.78, and a fourth rare earth oxide comprising a fourth rare earth element having a fourth atomic radius ratio to Zr of 1.46-1.78, wherein each of the different rare earth zirconium/hafnium oxides is present at substantially equal atomic weights of their respective rare earth elements.
This written description uses example embodiments to disclose the application, including the best mode, and also to enable any person skilled in the art to practice the application (including making and using any devices or systems and performing any incorporated methods). The patentable scope of the application is defined by the claims, and may include other examples that occur to those skilled in the art. Such other examples are intended to be within the scope of the claims if they have structural elements that do not differ from the literal language of the claims, or if they include equivalent structural elements with insubstantial differences from the literal languages of the claims.
Claims (10)
1. A composition comprising:
a rare earth doped zirconium/hafnium oxide having a defect-fluorite structure or a pyrochlore structure, wherein the rare earth doped zirconium/hafnium oxide has the formula:
(Ln 1 a Ln 2 a Ln 3 aLn 4 a Ln 5 b ) 2 M 2 O 7 ,
in the method, in the process of the application,
Ln 1 、Ln 2 、Ln 3 、Ln 4 and Ln 5 Each of which is a different rare earth element such that Ln 1 And M has a first atomic radius ratio, ln, of from 1.35 to 1.45 2 And M has a second atomic radius ratio of 1.35 to 1.45, ln 3 And M has a third atomic radius ratio, ln, of from 1.46 to 1.78 4 And M has a fourth atomic radius ratio of 1.46 to 1.78;
a is 0.2 or 0.25;
b is 0.2 when a is 0.2, and b is 0 when a is 0.25; and
m is Zr, hf or a mixture thereof.
2. The composition of claim 1, wherein a is 0.2 such that the rare earth doped zirconium/hafnium oxide has the formula:
(Ln 1 0.2 Ln 2 0.2 Ln 3 0.2 Ln 4 0.2 Ln 5 0.2 ) 2 M 2 O 7 ,
in the method, in the process of the application,
Ln 1 、Ln 2 、Ln 3 、Ln 4 and Ln 5 Each of which is a different rare earth element such that Ln 1 And M has a first atomic radius ratio, ln, of from 1.35 to 1.45 2 And M has a second atomic radius ratio of 1.35 to 1.45, ln 3 And M has a third atomic radius ratio, ln, of from 1.46 to 1.78 4 And M has a fourth atomic radius ratio of 1.46 to 1.78; and
m is Zr, hf or a mixture thereof.
3. The composition of claim 2, wherein Ln 5 And M has a second atomic radius ratio of 1.35 to 1.45 or 1.46 to 1.78.
4. The composition of claim 1, wherein a is 0.25 and b is 0 such that the rare earth doped zirconium/hafnium oxide has the formula:
(Ln 1 0.25 Ln 2 0.25 Ln 3 0.25 Ln 4 0.25 ) 2 M 2 O 7 ,
in the method, in the process of the application,
Ln 1 、Ln 2 、Ln 3 and Ln 4 Each of which is a different rare earth element such that Ln 1 And M has a first atomic radius ratio, ln, of from 1.35 to 1.45 2 And M has a second atomic radius ratio of 1.35 to 1.45, ln 3 And M has a third atomic radius ratio, ln, of from 1.46 to 1.78 4 And M has a fourth atomic radius ratio of 1.46 to 1.78; and
m is Zr, hf or a mixture thereof.
5. The composition of claim 1, wherein M is 50 atomic% to 100 atomic% Zr.
6. The composition of claim 1, wherein M is 95 atomic% to 100 atomic% Zr.
7. The composition of claim 1, wherein M consists of Zr.
8. A coated member, wherein the coated member comprises:
a substrate having a surface; and
a thermal barrier coating on the surface, the thermal barrier coating comprising a layer comprising the composition of claim 1.
9. A coated member, wherein the coated member comprises:
a substrate having a surface; and
a thermal barrier coating on the surface, the thermal barrier coating comprising a layer comprising a rare earth doped zirconium/hafnium oxide having a defect-fluorite structure or a pyrochlore structure, the layer having a thermal conductivity of 0.5W/m-K to 1.5W/m-K at 1000 ℃ in a 95-100% dense disk as measured by laser flash method according to ASTM E1461-13.
10. A method of forming a rare earth doped zirconium/hafnium oxide, the method comprising:
combining 4 or 5 different rare earth zirconium/hafnium oxides to form rare earth doped zirconium/hafnium oxides having a defect-fluorite structure or pyrochlore structure,
wherein the first rare earth oxide contains a first rare earth element, the first atomic radius ratio of the first rare earth element to Zr is 1.35-1.45, the second rare earth oxide contains a second rare earth element, the second atomic radius ratio of the second rare earth element to Zr is 1.35-1.45, the third rare earth oxide contains a third rare earth element, the third atomic radius ratio of the third rare earth element to Zr is 1.46-1.78, the fourth rare earth oxide contains a fourth rare earth element, the fourth atomic radius ratio of the fourth rare earth element to Zr is 1.46-1.78,
wherein each of the different rare earth zirconium/hafnium oxides is present at substantially equal atomic weights of their respective rare earth elements.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IN202211008138 | 2022-02-16 | ||
US17/838,567 | 2022-06-13 | ||
US17/838,567 US20230257595A1 (en) | 2022-02-16 | 2022-06-13 | Pyrochlore/defect fluorite zirconates |
Publications (1)
Publication Number | Publication Date |
---|---|
CN116605904A true CN116605904A (en) | 2023-08-18 |
Family
ID=87676973
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202211525827.5A Pending CN116605904A (en) | 2022-02-16 | 2022-11-30 | Pyrochlore/defective fluorite zirconates |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN116605904A (en) |
-
2022
- 2022-11-30 CN CN202211525827.5A patent/CN116605904A/en active Pending
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN109422533B (en) | Coating system on substrate surface, coated component, and coating forming method | |
CN109952281B (en) | Boron-containing silicon-based materials | |
US20190233344A1 (en) | Silicon-Based Materials Containing Indium and Methods of Forming the Same | |
US11578008B2 (en) | Silicon compositions containing boron and methods of forming the same | |
US11667584B2 (en) | Compositions for erosion and molten dust resistant environmental barrier coatings | |
CN109982986B (en) | Boron-containing silicon compositions and methods of forming the same | |
EP4230585A1 (en) | Pyrochlore/defect fluorite zirconates | |
US20230257595A1 (en) | Pyrochlore/defect fluorite zirconates | |
CN116605904A (en) | Pyrochlore/defective fluorite zirconates | |
US10259716B2 (en) | Boron doped rare earth metal oxide compound | |
US10294112B2 (en) | Silicon compositions containing boron and methods of forming the same | |
US10138740B2 (en) | Silicon-based materials containing gallium and methods of forming the same | |
US20230392264A1 (en) | Low thermal conductivity, high toughness tbc compositions | |
US20230392020A1 (en) | Low thermal conductivity, high toughness tbc compositions | |
US20230323516A1 (en) | High entropy alloy-based compositions and bond coats formed therefrom | |
US11746066B2 (en) | Compositions containing gallium and/or indium and methods of forming the same | |
EP4261301A1 (en) | High entropy alloy-based compositions and bond coats formed therefrom | |
CN116891967A (en) | High entropy alloy-based composition and bond coat formed therefrom | |
US20230330700A1 (en) | Thermal barrier coatings | |
EP4261322A1 (en) | Vertically cracked thermal barrier coatings compositions |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination |