CN116551158A - Laser system, photovoltaic cell processing method, electronic device, and storage medium - Google Patents
Laser system, photovoltaic cell processing method, electronic device, and storage medium Download PDFInfo
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Abstract
The application discloses a laser system, a photovoltaic cell processing method, electronic equipment and a storage medium, and relates to the technical field of solar cells. The laser system can adjust the laser parameters of the laser, the position parameters of the lens group and the scanning parameters of the galvanometer in real time according to the monitoring result fed back by the monitoring module through the control module, so that the light spot energy density, the light spot size and the light spot path meet the process requirements of the photovoltaic cell graphical processing. Therefore, each parameter is optimized and regulated in real time, the corresponding relation between the spot effect of actual processing and each parameter is formed, the energy distribution of the shaping spot generated by modulation is uniform, the relative stability of the spot size and the spot energy density in the processing process is ensured, the processing efficiency and the accuracy of the photovoltaic cell are improved, the laser system has flexibility and high efficiency so as to adapt to the technological requirements of the graphical processing of different photovoltaic cells, and the time cost and the labor cost are effectively reduced.
Description
Technical Field
The present disclosure relates to the field of solar cells, and in particular, to a laser system, a photovoltaic cell processing method, an electronic device, and a storage medium.
Background
Sustainable development is the subject of the world today. In order to replace the increasingly smaller fossil energy sources, the development and utilization of renewable energy sources is one of the most straightforward and efficient ways. Along with the continuous development of the photovoltaic solar technology, the photoelectric conversion rate is continuously improved, and the industrialized production cost is gradually reduced, so that the photovoltaic solar power generation is expected to become a mainstream energy acquisition mode.
The patterning process has important influence on photoelectric conversion efficiency, service life and the like of the solar cell, and laser is widely applied to process flows of various solar cells due to the characteristics of high precision, high efficiency, low loss, low pollution and the like. However, the laser system in the related art still has some problems in the application of patterning technology, including low processing efficiency, insufficient precision, complex overall system debugging mode, and the like, so that the flexibility and the high efficiency of the laser system are limited, and the laser system cannot adapt to the process requirements of patterning processing of photovoltaic cells with different sizes.
Disclosure of Invention
The present application aims to solve at least one of the technical problems existing in the prior art. Therefore, the embodiment of the application provides a laser system, a photovoltaic cell processing method, electronic equipment and a storage medium, which can monitor laser beams in real time so as to perform feedback adjustment on the spot size, the spot energy density and the like, and meet the process requirements of different photovoltaic cell graphical processing.
In a first aspect, embodiments of the present application provide a laser system, including:
the control module is used for controlling the laser to emit laser according to the laser parameters;
the laser is electrically connected with the control module and is used for emitting corresponding initial light beams according to the laser parameters;
the diffraction element is arranged behind the laser along the optical axis of the initial light beam and is used for modulating the initial light beam to form a modulated light beam;
the lens group is electrically connected with the control module, is arranged at the rear of the diffraction element along the optical axis of the modulated light beam and is used for adjusting the spot size of the modulated light beam according to the position parameter;
the beam splitter is arranged behind the lens group along the optical axis of the modulated light beam and is used for splitting the modulated light beam into a first beam splitter and a second beam splitter;
the monitoring module is electrically connected with the control module, is arranged above the beam splitter along the optical axis of the first beam splitter, and is used for receiving the first beam splitter to monitor the modulated beam, obtaining a monitoring result and sending the monitoring result to the control module;
the vibrating mirror is electrically connected with the control module, is arranged at the rear of the beam splitting mirror along the optical axis of the second beam splitting mirror, and is used for receiving the second beam splitting and adjusting the scanning position, the scanning amplitude and the scanning speed of the second beam splitting according to the scanning parameters;
The field lens is fixedly connected with the vibrating mirror and is used for focusing the second split beam to form a light spot to a photovoltaic cell to be processed so as to perform graphical processing;
the control module is also used for adjusting the laser parameters, the position parameters and the scanning parameters in real time according to the monitoring result, so that the light spot energy density, the light spot size and the light spot path meet the process requirements of the photovoltaic cell graphical processing.
In some embodiments of the present application, a reflective beam expansion module disposed between the laser and the diffraction element along an optical axis of the initial beam for adjusting a beam parameter of the initial beam;
the beam parameters include beam direction, beam size and divergence angle, and the reflective beam expansion module includes:
a mirror for adjusting the beam direction;
and the beam expander is used for adjusting the size of the light beam and the divergence angle.
In some embodiments of the present application, the laser parameters include at least one of: laser energy, laser frequency, laser power and laser speed; the initial beam emitted according to the laser parameters is a Gaussian initial beam with normally distributed beam energy.
In some embodiments of the present application, the diffractive element comprises at least one of: grating, diaphragm and prism; the diffraction element is used for modulating the phase of the initial light beam and shaping the phase to obtain the modulated light beam, and the spot shape of the modulated light beam comprises: rectangular, triangular, circular or oval.
In some embodiments of the present application, the lens group includes: a first lens, a second lens, and a third lens, the positional parameters including a first pitch and a second pitch;
the second lens is arranged between the first lens and the third lens, the first lens and the second lens are at the first interval, and the second lens and the third lens are at the second interval;
the first lens, the second lens and the third lens are arranged on the coaxial motor, so that the control module can adjust the first interval and the second interval according to the position parameters to adjust the light spot size.
In some embodiments of the present application, the monitoring module comprises: an image sensor and a power meter; the monitoring result comprises a light spot size and a light spot energy density, the image sensor is used for monitoring the light spot size, and the power meter is used for monitoring the light spot energy density.
In some embodiments of the present application, the galvanometer is comprised of a mirror group and a control motor; the reflecting mirror group is connected with the control motor, the scanning parameters comprise the angle of the reflecting mirror group, the swing amplitude of the motor and the rotation speed of the motor, the scanning position of the second sub-beam is controlled according to the angle of the reflecting mirror group, the scanning amplitude of the second sub-beam is controlled according to the swing amplitude of the motor, and the scanning speed of the second sub-beam is controlled according to the rotation speed of the motor.
In some embodiments of the present application, the laser parameters satisfy the following relationship:
wherein E is p The laser beam is a single pulse energy, W is laser power, f is laser frequency, D is spot diameter or side length, v is laser speed, k is spot superposition coefficient of unit area,is the energy density of light spot in unit area, A s Is the spot area.
In some embodiments of the present application, the focal length of the first lens is a first focal length, the focal length of the second lens is a second focal length, and the focal length of the third lens is a third focal length; the spot size satisfies the following relationship:
wherein d ′ Is the spot size, d is the initial spot size, f i F is the first focal length 2 F is the second focal length 3 Is the third focusDistance, L 1 At a first spacing, L 2 Is the second pitch.
In a second aspect, embodiments of the present application further provide a photovoltaic cell processing method, which is applied to the laser system described in the embodiments of the first aspect of the present application, including:
acquiring the process requirements of the photovoltaic cell; the process requirements comprise target light spot energy density, target light spot size and target light spot path of the graphic processing;
modulating initial process parameters according to the process requirements; the initial process parameters comprise initial laser parameters, initial position parameters and initial scanning parameters, wherein the initial laser parameters are used for adjusting laser energy, laser frequency and laser power of a laser beam emitted by the laser system, the initial position parameters are used for adjusting the spot size of the laser beam emitted by the laser system, and the initial scanning parameters are used for adjusting the scanning position, scanning amplitude and scanning speed of the laser beam emitted by the laser system;
adjusting a laser to emit a corresponding laser beam according to the initial laser parameters, adjusting the position interval of a lens group according to the initial position parameters so as to adjust the spot size of the laser beam, and adjusting the angle of a reflecting mirror group of a vibrating mirror according to the initial scanning parameters so as to adjust the scanning position, the scanning amplitude and the scanning speed of the laser beam, wherein the motor swings at an amplitude and the motor rotates at a speed;
And acquiring a monitoring result of a monitoring module, and feeding back and adjusting the initial laser parameter, the initial position parameter and the initial scanning parameter according to the monitoring result until the laser beam corresponding to the monitoring result reaches the target light spot energy density, the target light spot size and the target light spot path.
In a third aspect, an embodiment of the present application further provides an electronic device, including a memory, and a processor, where the memory stores a computer program, and the processor implements a photovoltaic cell processing method according to an embodiment of the second aspect of the present application when executing the computer program.
In a fourth aspect, embodiments of the present application also provide a computer readable storage medium storing a program that is executed by a processor to implement a photovoltaic cell processing method according to embodiments of the second aspect of the present application.
The embodiment of the application at least comprises the following beneficial effects:
the embodiment of the application provides a laser system, a photovoltaic cell processing method, electronic equipment and a storage medium, wherein the laser system comprises a control module for controlling a laser to emit laser according to laser parameters; the laser is electrically connected with the control module and is used for emitting corresponding initial light beams according to laser parameters; the diffraction element is arranged at the rear of the laser along the optical axis of the initial beam and is used for modulating the initial beam to form a modulated beam; the lens group is electrically connected with the control module, is arranged at the rear of the diffraction element along the optical axis of the modulated light beam and is used for adjusting the spot size of the modulated light beam according to the position parameter; the beam splitter is arranged behind the lens group along the optical axis of the modulated light beam and is used for splitting the modulated light beam into a first beam splitter and a second beam splitter; the monitoring module is electrically connected with the control module, is arranged above the beam splitting mirror along the optical axis of the first beam splitting, and is used for receiving the first beam splitting to monitor the modulated beam, obtaining a monitoring result and sending the monitoring result to the control module; the vibrating mirror is electrically connected with the control module, is arranged at the rear of the beam splitting mirror along the optical axis of the second beam splitting mirror, and is used for receiving the second beam splitting and adjusting the scanning position, the scanning amplitude and the scanning speed of the second beam splitting according to the scanning parameters; the field lens is fixedly connected with the vibrating mirror and is used for focusing the second split beam to form a light spot to a photovoltaic cell to be processed so as to carry out graphical processing; the control module is also used for adjusting laser parameters, position parameters and scanning parameters in real time according to monitoring results, so that the spot energy density, the spot size and the spot path meet the process requirements of the graphical processing of the photovoltaic cells, the processing efficiency and the processing precision of the photovoltaic cells are improved, and the laser system has flexibility and high efficiency so as to adapt to the process requirements of the graphical processing of different photovoltaic cells.
Additional aspects and advantages of the application will be set forth in part in the description which follows, and in part will be obvious from the description, or may be learned by practice of the application.
Drawings
The foregoing and/or additional aspects and advantages of the present application will become apparent and readily appreciated from the following description of the embodiments, taken in conjunction with the accompanying drawings, wherein:
FIG. 1 is a schematic diagram of a laser system provided in one embodiment of the present application;
FIG. 2 is a schematic diagram of a laser system according to another embodiment of the present application;
FIG. 3 is a schematic view of a lens assembly provided in one embodiment of the present application;
FIG. 4 is a parameter correspondence graph provided by one embodiment of the present application;
FIG. 5 is a schematic view of spot sizes provided in one embodiment of the present application;
FIG. 6 is a graph of parameter correspondence provided by another embodiment of the present application;
fig. 7 is a flow chart of a photovoltaic cell processing method according to one embodiment of the present disclosure;
fig. 8 is a schematic structural diagram of an electronic device according to an embodiment of the present application.
Reference numerals: the laser device comprises a control module 100, a laser 200, a diffraction element 300, a lens group 400, a first lens 401, a second lens 402, a third lens 403, a beam splitter 500, a monitoring module 600, a galvanometer 700, a field lens 800, a material to be processed 900, a reflecting beam expanding module 1000, a first reflecting mirror 1001, a second reflecting mirror 1003, a third reflecting mirror 1004, a beam expanding mirror 1002, an electronic device 1100, a processor 1101 and a memory 1102.
Detailed Description
In order to make the objects, technical solutions and advantages of the present application more apparent, the present application will be further described in detail with reference to the accompanying drawings and examples. It should be understood that the specific embodiments described herein are for purposes of illustration only and are not intended to limit the present application.
Embodiments of the present application are described in detail below, examples of which are illustrated in the accompanying drawings, wherein the same or similar reference numerals refer to the same or similar elements or elements having the same or similar functions throughout. The embodiments described below by referring to the drawings are exemplary only for the purpose of explaining the present application and are not to be construed as limiting the present application.
In the description of the present application, it should be understood that references to orientation descriptions, such as directions of up, down, front, back, left, right, etc., are based on the orientation or positional relationship shown in the drawings, are merely for convenience of describing the present application and simplifying the description, and do not indicate or imply that the apparatus or element referred to must have a specific orientation, be configured and operated in a specific orientation, and thus should not be construed as limiting the present application.
In the description of the present application, the meaning of a number is one or more, the meaning of a number is two or more, greater than, less than, exceeding, etc. are understood to not include the present number, and the meaning of a number above, below, within, etc. are understood to include the present number. The description of the first and second is for the purpose of distinguishing between technical features only and should not be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated or implicitly indicating the precedence of the technical features indicated.
In the description of the present application, unless explicitly defined otherwise, terms such as arrangement, installation, connection, etc. should be construed broadly and the specific meaning of the terms in the present application can be reasonably determined by a person skilled in the art in combination with the specific contents of the technical solution.
Sustainable development is the subject of the world today. In order to replace the increasingly smaller fossil energy sources, the development and utilization of renewable energy sources is one of the most straightforward and efficient ways. Along with the continuous development of the photovoltaic solar technology, the photoelectric conversion rate is continuously improved, and the industrialized production cost is gradually reduced, so that the photovoltaic solar power generation is expected to become a mainstream energy acquisition mode.
The emerging high-efficiency solar cells such as N-type silicon TOPCON (Tunnel oxide passivated contact solar cell tunnel oxide passivation cell), HJT (Heterojunction solar cells crystalline silicon heterojunction solar cell), IBC (Interdigitated Back Contact, interdigital back contact cell) and the like are continuously increasing the industrialization scale with higher photoelectric conversion and potential. The IBC type battery structurally shows the characteristics of no grid line on the front surface, positive and negative electrodes on the back surface and spaced arrangement, so that sunlight can completely act on the surface of the battery without shielding loss, and therefore the IBC type battery efficiency (the mass-production photoelectric conversion rate of 26.2 percent and the theoretical limit value of 29.1 percent) is higher than that of the TOPCO battery (the mass-production photoelectric conversion rate of 25.4 percent and the theoretical limit value of 28.7 percent) and the PERC battery (the mass-production photoelectric conversion rate of 23.2 percent and the theoretical limit of 24.5 percent). The IBC-type cell structure can be overlapped with various technologies such as PERC, TOPCON, HJT and perovskite, is a new generation platform-type technology, is overlapped with TOPCON technology and is called a 'TBC' cell, and is overlapped with HJT technology and is called a 'HBC' cell, so that the IBC-type cell structure is one of the most potential solar cell types at present.
In the current IBC cell manufacturing process, in order to form two different doped regions in a cross arrangement on the back surface of a silicon wafer, patterning (patterning) and alignment (alignment) steps are required to be introduced in a doping process and a metallization process, different doped regions are isolated by setting different masks, and an isolation layer is provided between the different doped regions. Therefore, the patterning process has important influence on the photoelectric conversion efficiency of other subsequent processes and even the final solar cell and the service life. The laser is widely applied to the process flow of various solar cells due to the characteristics of high processing precision, high efficiency, less loss, less pollution and the like, and is a main solution of the IBC cell patterning process.
In the current processing process of IBC solar cells and similar improved products, laser is generally adopted to divide areas on the surface, and patterns are formed to complete patterning. The effect of the patterning process has obvious influence on the subsequent processes of etching, annealing and the like. However, the laser system in the related art still has some problems in the application of patterning process, including poor beam modulation performance, low processing efficiency, insufficient precision, complex overall system debugging mode, and the like of the laser 200, so that flexibility and high efficiency of the laser system are limited, and the laser system cannot adapt to the process requirements of patterning process of photovoltaic cells with different sizes. In order to advance the industrialization process of IBC solar cells, a more complete laser system and method are needed.
Based on the above, the embodiment of the application provides a laser system, a photovoltaic cell processing method, electronic equipment and a storage medium, which can adjust laser parameters, position parameters and scanning parameters in real time according to monitoring results, so that the energy density of light spots, the size of the light spots and the light spot paths meet the process requirements of the graphical processing of the photovoltaic cells, thereby improving the processing efficiency and the precision of the photovoltaic cells, and enabling the laser system to have flexibility and high efficiency so as to adapt to the process requirements of the graphical processing of different photovoltaic cells.
The embodiment of the application provides a laser system, a photovoltaic cell processing method, electronic equipment and a storage medium, and specifically, the laser system in the embodiment of the application is described first by describing the following embodiment.
Referring to fig. 1, a laser system according to an embodiment of the present application includes:
the control module 100 controls the laser 200 to emit a laser beam according to the laser parameters;
the laser 200 is electrically connected with the control module 100, receives a control signal of the control module 100, and emits a corresponding initial light beam according to laser parameters in the control signal;
a diffraction element 300 disposed behind the laser 200 along an optical axis of the initial beam, for performing beam shaping by adjusting a phase of the initial beam to modulate the initial beam to form a modulated beam;
The lens group 400 is arranged behind the diffraction element 300 along the optical axis of the modulated light beam, is electrically connected with the control module 100, receives a control signal of the control module 100, and adjusts the distance between lenses according to the position parameter in the control signal so as to adjust the spot size of the modulated light beam;
the beam splitter 500 is disposed behind the lens group 400 along the optical axis of the modulated light beam, and splits the modulated light beam into a first split light beam and a second split light beam, wherein the first split light beam is a reflected light beam, and has a small part of energy in the modulated light beam, and the second split light beam is a transmitted light beam, and has a large part of energy in the modulated light beam;
the monitoring module 600 is electrically connected with the control module 100, is arranged above the beam splitter 500 along the optical axis of the first beam splitter, receives the first beam splitter to monitor the spot size, the spot energy density and the like of the modulated beam, obtains a monitoring result and sends the monitoring result to the control module 100;
the galvanometer 700 is arranged at the rear of the beam splitting mirror 500 along the optical axis of the second beam splitting mirror, receives the second beam splitting mirror, is electrically connected with the control module 100, receives a control signal of the control module 100, and adjusts the galvanometer 700 according to scanning parameters in the control signal so as to adjust the scanning position, the scanning amplitude and the scanning speed of the second beam splitting mirror;
The field lens 800 is fixedly connected with the galvanometer 700, and forms a light spot to the material 900 to be processed of the photovoltaic cell by focusing the second split beam so as to perform graphical processing, wherein the material 900 to be processed is a silicon wafer material.
Specifically, the control module 100 is further configured to adjust the laser parameter, the position parameter, and the scanning parameter in real time according to the monitoring result fed back by the monitoring module 600, further control the laser 200 to emit a corresponding laser beam, control the distance between lenses in the lens group 400 to adjust the spot size, the spot energy density, and the like after focusing the laser beam, and control the galvanometer 700 to adjust the spot path according to the adjusted scanning parameter, so that the finally processed spot energy density, the spot size, and the spot path satisfy the process requirements of the corresponding photovoltaic cell patterned processing.
It is understood that the size of the spot energy density has a significant impact on the processing quality and efficiency during the patterning of photovoltaic cells. When the energy density of the light spot is too low, the laser beam cannot effectively heat the surface of the silicon wafer, so that the processing effect is affected; when the energy density of the light spot is too high, the surface of the silicon wafer is excessively melted, and unnecessary damage and deformation are generated, so that the processing quality is affected. Therefore, in order to realize high-quality patterning of the solar cell, the energy density of the light spot needs to be reasonably adjusted according to specific conditions.
On the other hand, spot size is also an important parameter. The spot size determines the focal size of the laser beam and thus directly affects the quality and efficiency of the process. In particular, a smaller spot size can improve processing accuracy and resolution, but processing speed can be slowed down; conversely, a larger spot size may increase processing speed but accuracy and resolution may decrease.
Meanwhile, the light spot paths refer to the tracks left by the laser beams on the surface of the silicon wafer material, and it can be understood that the process requirements of different photovoltaic cells for patterning are different, and the corresponding light spot paths are also different. According to the method, the parameters are further controlled and regulated through real-time feedback, the processing efficiency and the processing precision of the photovoltaic cells are effectively improved, and the laser system has flexibility and high efficiency so as to adapt to the process requirements of graphical processing of different photovoltaic cells.
Referring to fig. 2, in some embodiments of the present application, the laser system further includes:
the reflection beam expansion module 1000 is arranged between the laser 200 and the diffraction element 300 along the optical axis of the initial beam, and adjusts the beam parameters of the initial beam; wherein the beam parameters include beam direction, beam size, and emission angle.
Specifically, the reflection beam expansion module 1000 includes a mirror for adjusting a beam direction and a beam expander 1002, and the beam expander 1002 is for adjusting a beam size and a divergence angle. In some embodiments, the mirrors may further include a first mirror 1001, a second mirror 1003 and a third mirror 1004, and the beam expander 1002 is disposed between the first mirror 1001 and the second mirror 1003 along the optical axis of the initial beam, and it is understood that each mirror may adjust an angular position according to the optical path condition to ensure that the initial beam enters and exits at an accurate angle and position when passing through each optical element of the laser system, and reduce aberration caused by the deviation of the optical path. Those skilled in the art may set the present embodiment according to actual requirements, and the present embodiment is not limited thereto.
In some embodiments, the beam size and divergence angle of the initial beam are further adjusted by the beam expander 1002 after the beam direction is adjusted by the first mirror 1001, so that the initial beam meets the requirement of the incident size when entering the diffraction element 300, thereby ensuring that the shaped light spot energy is uniformly distributed and the edges are sharp and smooth. Specifically, the beam expander 1002 with a fixed magnification or an adjustable magnification can be selected according to the size of the initial beam. The beam expander 1002 can change the diameter of the light beam by changing the curvature of the lens to meet different incident size requirements, and can realize adjustable control of the light beam by adjusting the fixed multiplying power or changing the lenses with different multiplying powers. Meanwhile, the beam expander 1002 can ensure that the energy of the shaping light spot is uniformly distributed, the edge is sharp and smooth, and any processing quality problem is avoided. Therefore, the beam expander 1002 plays an important role in the laser processing process, and can realize fine adjustment of the beam diameter and the power density by changing the lens parameters, the multiplying power setting and other modes, so as to ensure the quality and the efficiency of the whole processing process.
In some embodiments of the present application, the laser parameters include, but are not limited to: laser energy, laser frequency and laser power. Specifically, the laser energy refers to the total energy contained in one laser pulse, and for continuous laser, the laser energy is the amount of energy delivered per second. The laser frequency refers to the number of cycles the laser beam vibrates in unit time, typically in hertz (Hz). The laser frequency directly affects the color and spectral characteristics of the laser beam, e.g., the frequencies of the red and green lasers are different and therefore their wavelengths of light are also different. Laser power refers to the amount of energy delivered per unit time of a laser beam. For continuous lasers, the laser power is the amount of energy delivered per second by the beam, typically expressed in units of watts (W).
It will be appreciated that the laser energy is related to the laser wavelength, and that the energy carried by laser photons of different wavelengths is different according to the planck's formula. The shorter the laser wavelength, the more energy is carried by a single photon and therefore the more laser energy. In some embodiments, the laser 200 emits a gaussian beam, and in particular, the initial beam emitted according to the laser parameters is a gaussian initial beam with a normal distribution of beam energy. The Gaussian beam of the laser 200 has good beam quality and wide frequency power adjustable range, can meet the requirements of different graphic processing sizes, and can specifically select short pulses, ultra-short pulses or continuous lasers with the laser wavelength of 193nm to 10600nm, the energy range of 1-1000W and the frequency of 50Hz-1GHz. More preferred are short pulse lasers in the wavelength range 193nm to 1064nm, power 10-2000W and frequency 100-3000kHz laser sources. The embodiments of the present application are not limited in this regard.
In some embodiments of the present application, the laser parameters are single pulse energy, laser frequency, and laser speed, specifically satisfying the following relationship:
wherein E is p The laser beam is a single pulse energy, W is laser power, f is laser frequency, D is spot diameter or side length, v is laser speed, k is spot superposition coefficient of unit area,is the energy density of light spot in unit area, A s Is the spot area.
It will be appreciated that during the patterning process of IBC solar cells, a laser is applied to the sample to remove the surface layer and form a mask pattern, and a subsequent cleaning process is required. The degree of damage in the laser processing therefore determines the degree of patterning after cleaning, while the laser parameters determine the energy threshold acting on the IBC solar cell face.
When (when)When the value of (2) is within a certain range, the surface layer of the solar cell is removed without damaging the lower layer, and then a mask pattern is formed. IBC type battery technologyMultiple laser patterning and film cleaning are typically performed to form a multilayer structure. There is a difference in the energy thresholds required for the different layers. Thus, there are different combinations of single pulse energy, laser frequency and laser speed parameters under conditions that meet the energy threshold. It can be appreciated that the laser parameters need to be selectively optimized according to the actual pattern size, the machining efficiency, the damage threshold and the machining precision, which is not limited in the embodiment of the present application.
In some embodiments of the present application, the diffractive element 300 is an optical component fabricated based on the principle of diffractive optics by which the surface is etched or thin film structure to alter the phase of the light beams propagating through them to create differently shaped spots. The diffraction element 300 comprises at least one of the following: gratings, diaphragms, and prisms, while the phase of the initial beam modulated by the diffraction element 300 is shaped to obtain a modulated beam with a uniform spot energy distribution and a spot shape including, but not limited to: rectangular, triangular, circular or oval. It will be appreciated by those skilled in the art that the present embodiment is not limited in this regard, as may be desired.
In some embodiments of the present application, the lens group 400 includes a first lens 401, a second lens 402, and a third lens 403, and the positional parameters of the lens group 400 include a first pitch and a second pitch. Specifically, referring to the schematic view of the lens assembly 400 shown in fig. 3, the second lens 402 is disposed between the first lens 401 and the third lens 403, the first lens 401 and the second lens 402 are spaced apart by a first pitch, and the second lens 402 and the third lens 403 are spaced apart by a second pitch. It can be understood that the first lens 401, the second lens 402 and the third lens 403 are disposed on the coaxial motor, so that the control module 100 adjusts the first pitch and the second pitch according to the position parameter, and the modulated light beam passes through the lens group 400 to perform beam conversion, so as to achieve the enlargement or reduction of the light spot to adjust the light spot size.
In some embodiments of the present application, the focal length of the first lens 401 is a first focal length, the focal length of the second lens 402 is a second focal length, and the focal length of the third lens 403 is a third focal length.
Specifically, the spot size adjusted by the lens group 400 satisfies the following relationship:
wherein d ′ Is the spot size, d is the initial spot size, f 1 F is the first focal length 2 F is the second focal length 3 Is of a third focal length, L 1 At a first spacing, L 2 Is the second pitch.
Specifically, when the lens group 400 is not provided, the diffraction element 300 is customized, the spot size of the laser beam obtained by passing through the diffraction element 300 and the field lens 800 is the initial spot size d, and in this embodiment, the spot size d finally acting on the material 900 to be processed is changed by adjusting the first spacing between the first lens 401 and the second lens 402 and the second spacing between the second lens 402 and the third lens 403 ′ . Thereby, the spot size can be adjusted in real time by adjusting the position parameters through the control module 100, and the flexibility and the efficiency of the laser system are improved.
In some embodiments of the present application, the monitoring module 600 includes an image sensor and a power meter, where the monitoring result includes a spot size and a spot energy density, and in particular, the image sensor is used to monitor the spot size and the power meter is used to monitor the spot energy density. Specifically, the image sensor may be a CCD camera, and the power meter is a tool for measuring the power and energy of a light beam, and may be used for measuring the energy density of a laser spot, and for converting an optical signal into an electrical signal and processing the electrical signal. In measuring the spot energy density of the laser, a power density sensor may be used. Such sensors typically use thermal sensors or semiconductor materials to measure the heat generated after absorption of the beam and convert it into an electrical signal. Since such sensors are very sensitive to heat, the energy density of the beam can be measured accurately. The monitoring module 600 monitors the quality of the debug beam in real time, and feeds back the monitoring result to the control module 100 in real time, and according to the corresponding relation between the light intensity distribution and the action effect actually acting on the surface of the material, the light spot size, the light spot energy density and the laser parameters are formed, so as to provide basic data for parameter setting and optimization adjustment.
In some embodiments of the present application, the galvanometer 700 is composed of a mirror group and a control motor, and in particular, the mirror group includes two mirrors, the mirror group is connected with the control motor, and the scanning parameters include a mirror group angle, a motor swing amplitude, and a motor rotation speed. The scanning position of the second sub-beam can be controlled according to the angle of the reflecting mirror group, the farther the angle is, the smaller the angle is, and the closer the scanning position of the laser beam is, so that the laser beam can scan a preset path to reach a preset position by swinging the angle of the reflecting mirror group; controlling the scanning amplitude of the second sub-beam according to the motor swing amplitude, wherein the larger the motor swing amplitude is, the larger the scanning range of the laser beam is, and the smaller the motor swing amplitude is, the smaller the scanning range of the laser beam is; and controlling the scanning speed of the second sub-beam according to the rotation speed of the motor, wherein the faster the rotation speed of the motor is, the faster the scanning speed of the laser beam is, and the slower the rotation speed of the motor is, the slower the scanning speed of the laser beam is. Therefore, the laser system can adjust the processing speed of the vibrating mirror 700 according to the scanning parameters through the control module 100, so that different processing efficiency and precision requirements are met.
The following describes the application of the laser system of the present application by a specific example, specifically, performing a patterned processing test on an IBC-type battery of 182×182mm, and the target processing line width is 200×1000 μm.
The spot size when the laser beam of the laser system is focused is 50 μm, the fixed frequency is required to be 500kHz, the spot superposition coefficient k=1, and the spots are tangent. The control module 100 moves the first lens 401, the second lens 402 and the third lens 403 according to the parameter requirements, wherein the first focal length is 150mm, the second focal length is-10 mm, and the third focal length is 50mm. The different position parameters correspond to different beam effects, the corresponding relation is formed by measuring and feeding back the different beam effects to the control system through the monitoring module 600, when the relative position parameter of the lens is 137.2mm of the first spacing,at a second pitch of 4.28mm, the spot size reaches the desired size. Under the condition of the light beam, the laser parameters of the laser 200 are controlled to obtain the product light spot energy density process window with the range of about 0.0016-0.08 mu J/mu m 2 More preferably, the spot energy density is 0.048. Mu.J/. Mu.m 2 . Referring to fig. 4, the laser system obtains the product laser parameters of 60W laser power, 500kHz laser frequency, k=1 spot superposition coefficient, 25000mm/s motor rotation speed of the vibrating mirror 700, 50 x 50 μm square spot size and shape, l1=137.2mm, l2=4.28 mm position parameters of the lens group 400 through feedback adjustment.
When the process condition is required to be optimized and adjusted, the productivity is improved and the processing efficiency is improved. The laser system sets ideal beam effect parameters according to basic parameters and according to the needs, and the superposition coefficient of laser frequency and light spots is kept unchanged under normal conditions. The desired target spot size and target spot energy density are input into the control module 100, where the spot energy density is maintained at 0.048 muj/m, preferably 100 x 100 μm square, depending on the processing linewidth 2 . The initial beam passes through the monitoring module 600 at the beginning, the spot size parameter measured by the CCD camera is 50 x 50 μm, the position parameter of the lens group 400 is kept unchanged, and the monitoring result is obtained and fed back to the control module 100. The laser system detects that the output result is inconsistent with the set target spot size and the target spot energy density, so that adjustment is performed.
Firstly, the lens group 400 is adjusted, by changing the position parameters of the lens group 400 to change the spot size, when the first spacing is increased, the monitoring module 600 feeds back the real-time result to the control module 100, the spot size is reduced along with the increase of the first spacing, the adjusted spot size is smaller than 50 x 50 μm, namely, the adjustment direction increases the difference between the actual result and the target spot size, and the laser system controls the lens group 400 to adjust in the opposite direction to reduce the first spacing. The second pitch is adjusted in this way until the spot size of the monitoring result reaches the target spot size. At the same time, the setting is maintained according to the actual spot size The energy density was maintained at 0.048. Mu.J/. Mu.m 2 Is unchanged. The monitoring module 600 feeds back the real-time laser power to the system, the control module 100 calculates the actual spot energy density according to the formula, and can be subtracted from the target spot energy, when the result is negative, the system controls the laser 200 to increase the laser power, otherwise, the laser power is reduced until the measured actual spot energy density is equal to the target spot energy density.
Further, referring to fig. 5 and 6, the actual processing line width is kept constant at 200×1000 μm, and the laser frequency is fixed at 500kHz. By changing the position parameters of the lens group 400, keeping the second lens 402 motionless, and adjusting the first spacing to 134.4mm and the second spacing to 4.28mm, the spot size reaches 100 x 100 μm, and the processing speed of the galvanometer 700 can be doubled as compared with that of the galvanometer 700 with 50 x 50 μm, which reaches 50000mm/s; the second lens 402 is kept still, the first spacing is adjusted to 128.8mm and the second spacing is adjusted to 31.07mm, and the spot size reaches 200 x 200 μm, so that the processing speed can be doubled by 100000mm/s compared with the processing speed of the 100 x 100 μm galvanometer 700. According to the actual processing efficiency and the requirement of the dimensional accuracy, the control module 100 of the laser system can adjust the laser parameters, the position parameters and the scanning parameters, thereby obtaining the ideal light spot size and the stable energy density per unit area
The laser system applied to the IBC solar battery is fixed in processing spot size and monopulse energy, when process requirements change, important devices such as a laser 200 or a shaping element in the optical path system are required to be replaced, the adjustment mode is complex, time and labor cost consumption is high, and patterning accuracy is low. The laser system provided by the application can flexibly adjust the spot size to adapt to the optimization adjustment of the IBC type photovoltaic cell process, and simultaneously provides a main laser parameter test range to rapidly find a process window according to the requirements of processing efficiency and graphic size and the results of previous process parameters.
The laser system can optimally adjust each parameter to form the corresponding relation between the actual processing spot effect and each parameter, and the control module 100 adjusts the laser parameters, the position parameters and the scanning parameters in real time according to the monitoring result, so that the spot energy density, the spot size and the spot path meet the process requirements of the graphical processing of the photovoltaic cells, the shaping spot energy generated by the light path modulation is uniformly distributed, the spot size can realize the linear change of 10-1000 mu m, the relative stability of the spot size and the spot energy density in the processing process is ensured, the processing efficiency and the processing precision of the photovoltaic cells are improved, the laser system has flexibility and high efficiency to adapt to the process requirements of the graphical processing of different photovoltaic cells, and the time cost and the labor cost are effectively reduced.
The embodiment of the application also provides a photovoltaic cell processing method, which is applied to a laser system, and is shown with reference to fig. 7, and the photovoltaic cell processing method includes, but is not limited to, the following steps S100 to S400.
Step S100, obtaining the process requirement of a photovoltaic cell; the process requirements comprise the energy density of a target light spot, the size of the target light spot and the path of the target light spot in the graphical processing;
step S200, modulating initial process parameters according to process requirements; the initial process parameters comprise initial laser parameters, initial position parameters and initial scanning parameters, wherein the initial laser parameters are used for adjusting the laser energy, the laser frequency and the laser power of the laser beam emitted by the laser system, the initial position parameters are used for adjusting the spot size of the laser beam emitted by the laser system, and the initial scanning parameters are used for adjusting the scanning position, the scanning amplitude and the scanning speed of the laser beam emitted by the laser system;
step S300, adjusting the laser 200 to emit corresponding laser beams according to the initial laser parameters, adjusting the position spacing of the lens group 400 according to the initial position parameters to adjust the spot size of the laser beams, and adjusting the angle of the reflector group of the galvanometer 700, the motor swing amplitude and the motor rotation speed according to the initial scanning parameters to adjust the scanning position, the scanning amplitude and the scanning speed of the laser beams;
Step S400, a monitoring result of the monitoring module 600 is obtained, and the initial laser parameter, the initial position parameter and the initial scanning parameter are adjusted according to the monitoring result in a feedback manner until the laser beam corresponding to the monitoring result reaches the target spot energy density, the target spot size and the target spot path.
The photovoltaic cell processing method of the embodiment is applied to the laser system. For example, the control module in the laser system described above may perform the photovoltaic cell processing method comprising steps S100-S400 when running a computer program. For the description of the photovoltaic cell processing method, reference is made to the above laser system, and details are not repeated here.
Fig. 8 shows an electronic device 1100 provided by an embodiment of the present application. The electronic device 1100 includes: a processor 1101, a memory 1102, and a computer program stored on the memory 1102 and executable on the processor 1101, the computer program when run is for performing the photovoltaic cell processing method described above.
The processor 1101 and the memory 1102 may be connected by a bus or other means.
The memory 1102, as a non-transitory computer readable storage medium, may be used to store non-transitory software programs and non-transitory computer-executable programs, such as the photovoltaic cell processing methods described in embodiments of the present application. The processor 1101 implements the photovoltaic cell processing method described above by running non-transitory software programs and instructions stored in the memory 1102.
Memory 1102 may include a storage program area that may store an operating system, at least one application program required for functionality, and a storage data area; the storage data area may store the photovoltaic cell processing methods described above. In addition, the memory 1102 may include high-speed random access memory 1102, and may also include non-transitory memory 1102, such as at least one storage device memory device, flash memory device, or other non-transitory solid state memory device. In some implementations, the memory 1102 optionally includes memory 1102 remotely located relative to the processor 1101, the remote memory 1102 being connectable to the electronic device 1100 through a network. Examples of such networks include, but are not limited to, the internet, intranets, local area networks, mobile communication networks, and combinations thereof.
The non-transitory software programs and instructions required to implement the photovoltaic cell processing methods described above are stored in the memory 1102, which when executed by the one or more processors 1101, perform the photovoltaic cell processing methods described above, e.g., perform method steps S100 through S400 in fig. 7.
The embodiment of the application also provides a storage medium, which is a computer readable storage medium, and the storage medium stores a computer program, and the computer program realizes the photovoltaic cell processing method when being executed by a processor. The memory, as a non-transitory computer readable storage medium, may be used to store non-transitory software programs as well as non-transitory computer executable programs. In addition, the memory may include high-speed random access memory, and may also include non-transitory memory, such as at least one magnetic disk storage device, flash memory device, or other non-transitory solid state storage device. In some embodiments, the memory optionally includes memory remotely located relative to the processor, the remote memory being connectable to the processor through a network. Examples of such networks include, but are not limited to, the internet, intranets, local area networks, mobile communication networks, and combinations thereof.
According to the laser system, the photovoltaic cell processing method, the electronic equipment and the storage medium, the laser system adjusts the laser parameters, the position parameters and the scanning parameters in real time according to the monitoring result through the control module, so that the spot energy density, the spot size and the spot path meet the process requirements of the graphical processing of the photovoltaic cell, the parameters are optimally adjusted, the corresponding relation between the actual processing spot effect and the parameters is formed, the shaping spot energy generated by light path modulation is uniformly distributed, the relative stability of the spot size and the spot energy density in the processing process is guaranteed, the processing efficiency and the processing precision of the photovoltaic cell are improved, the laser system has flexibility and high efficiency to adapt to the process requirements of the graphical processing of different photovoltaic cells, and the time cost and the labor cost are effectively reduced.
The embodiments described above are merely illustrative, wherein the units described as separate components may or may not be physically separate, i.e. may be located in one place, or may be distributed over a plurality of network elements. Some or all of the modules may be selected according to actual needs to achieve the purpose of the solution of this embodiment.
Those of ordinary skill in the art will appreciate that all or some of the steps, systems, and methods disclosed above may be implemented as software, firmware, hardware, and suitable combinations thereof. Some or all of the physical components may be implemented as software executed by a processor, such as a central processing unit, digital signal processor, or microprocessor, or as hardware, or as an integrated circuit, such as an application specific integrated circuit. Such software may be distributed on computer readable media, which may include computer storage media (or non-transitory media) and communication media (or transitory media). The term computer storage media includes both volatile and nonvolatile, removable and non-removable media implemented in any method or technology for storage of information such as computer readable instructions, data structures, program modules or other data, as known to those skilled in the art. Computer storage media includes, but is not limited to, RAM, ROM, EEPROM, flash memory or other memory technology, CD-ROM, digital Versatile Disks (DVD) or other optical disk storage, magnetic cassettes, magnetic tape, storage device storage or other magnetic storage devices, or any other medium which can be used to store the desired information and which can be accessed by a computer. Furthermore, as is well known to those of ordinary skill in the art, communication media typically include computer readable instructions, data structures, program modules, or other data in a modulated data signal, such as a carrier wave or other transport mechanism, and may include any information delivery media.
It should also be appreciated that the various embodiments provided in the embodiments of the present application may be arbitrarily combined to achieve different technical effects. While the preferred embodiments of the present application have been described in detail, the present application is not limited to the above embodiments, and various equivalent modifications and substitutions can be made by those skilled in the art without departing from the spirit and scope of the present application.
Claims (12)
1. A laser system, comprising:
the control module is used for controlling the laser to emit laser according to the laser parameters;
the laser is electrically connected with the control module and is used for emitting corresponding initial light beams according to the laser parameters;
the diffraction element is arranged behind the laser along the optical axis of the initial light beam and is used for modulating the initial light beam to form a modulated light beam;
the lens group is electrically connected with the control module, is arranged at the rear of the diffraction element along the optical axis of the modulated light beam and is used for adjusting the spot size of the modulated light beam according to the position parameter;
the beam splitter is arranged behind the lens group along the optical axis of the modulated light beam and is used for splitting the modulated light beam into a first beam splitter and a second beam splitter;
The monitoring module is electrically connected with the control module, is arranged above the beam splitter along the optical axis of the first beam splitter, and is used for receiving the first beam splitter to monitor the modulated beam, obtaining a monitoring result and sending the monitoring result to the control module;
the vibrating mirror is electrically connected with the control module, is arranged at the rear of the beam splitting mirror along the optical axis of the second beam splitting mirror, and is used for receiving the second beam splitting and adjusting the scanning position, the scanning amplitude and the scanning speed of the second beam splitting according to the scanning parameters;
the field lens is fixedly connected with the vibrating mirror and is used for focusing the second split beam to form a light spot to a photovoltaic cell to be processed so as to perform graphical processing;
the control module is also used for adjusting the laser parameters, the position parameters and the scanning parameters in real time according to the monitoring result, so that the light spot energy density, the light spot size and the light spot path meet the process requirements of the photovoltaic cell graphical processing.
2. The laser system of claim 1, further comprising:
the reflection beam expanding module is arranged between the laser and the diffraction element along the optical axis of the initial beam and is used for adjusting the beam parameters of the initial beam;
The beam parameters include beam direction, beam size and divergence angle, and the reflective beam expansion module includes:
a mirror for adjusting the beam direction;
and the beam expander is used for adjusting the size of the light beam and the divergence angle.
3. The laser system of claim 1, wherein the laser parameters include at least one of: laser energy, laser frequency, laser power and laser speed; the initial beam emitted according to the laser parameters is a Gaussian initial beam with normally distributed beam energy.
4. The laser system of claim 1, wherein the diffraction element comprises at least one of: grating, diaphragm and prism; the diffraction element is used for modulating the phase of the initial light beam and shaping the phase to obtain the modulated light beam, and the spot shape of the modulated light beam comprises: rectangular, triangular, circular or oval.
5. The laser system of claim 1, wherein the lens group comprises: a first lens, a second lens, and a third lens, the positional parameters including a first pitch and a second pitch;
the second lens is arranged between the first lens and the third lens, the first lens and the second lens are at the first interval, and the second lens and the third lens are at the second interval;
The first lens, the second lens and the third lens are arranged on the coaxial motor, so that the control module can adjust the first interval and the second interval according to the position parameters to adjust the light spot size.
6. The laser system of claim 1, wherein the monitoring module comprises: an image sensor and a power meter; the monitoring result comprises a light spot size and a light spot energy density, the image sensor is used for monitoring the light spot size, and the power meter is used for monitoring the light spot energy density.
7. The laser system of claim 1, wherein the galvanometer is comprised of a mirror assembly and a control motor; the reflecting mirror group is connected with the control motor, the scanning parameters comprise the angle of the reflecting mirror group, the swing amplitude of the motor and the rotation speed of the motor, the scanning position of the second sub-beam is controlled according to the angle of the reflecting mirror group, the scanning amplitude of the second sub-beam is controlled according to the swing amplitude of the motor, and the scanning speed of the second sub-beam is controlled according to the rotation speed of the motor.
8. A laser system according to claim 3, wherein the laser parameters satisfy the following relationship:
Wherein E is p The laser beam is a single pulse energy, W is laser power, f is laser frequency, D is spot diameter or side length, v is laser speed, k is spot superposition coefficient of unit area,is the energy density of light spot in unit area，A S Is the spot area.
9. The laser system of claim 5, wherein the focal length of the first lens is a first focal length, the focal length of the second lens is a second focal length, and the focal length of the third lens is a third focal length; the spot size satisfies the following relationship:
wherein d ′ Is the spot size, d is the initial spot size, f 1 F is the first focal length 2 F is the second focal length 3 Is of a third focal length, L 1 At a first spacing, L 2 Is the second pitch.
10. A method of processing a photovoltaic cell, characterized by being applied to the laser system of any one of claims 1 to 9, comprising:
acquiring the process requirements of the photovoltaic cell; the process requirements comprise target light spot energy density, target light spot size and target light spot path of the graphic processing;
modulating initial process parameters according to the process requirements; the initial process parameters comprise initial laser parameters, initial position parameters and initial scanning parameters, wherein the initial laser parameters are used for adjusting laser energy, laser frequency and laser power of a laser beam emitted by the laser system, the initial position parameters are used for adjusting the spot size of the laser beam emitted by the laser system, and the initial scanning parameters are used for adjusting the scanning position, scanning amplitude and scanning speed of the laser beam emitted by the laser system;
Adjusting a laser to emit a corresponding laser beam according to the initial laser parameters, adjusting the position interval of a lens group according to the initial position parameters so as to adjust the spot size of the laser beam, and adjusting the angle of a reflecting mirror group of a vibrating mirror according to the initial scanning parameters so as to adjust the scanning position, the scanning amplitude and the scanning speed of the laser beam, wherein the motor swings at an amplitude and the motor rotates at a speed;
and acquiring a monitoring result of a monitoring module, and feeding back and adjusting the initial laser parameter, the initial position parameter and the initial scanning parameter according to the monitoring result until the laser beam corresponding to the monitoring result reaches the target light spot energy density, the target light spot size and the target light spot path.
11. An electronic device comprising a memory, a processor, the memory storing a computer program, the processor implementing the photovoltaic cell processing method of claim 10 when executing the computer program.
12. A computer-readable storage medium, characterized in that the storage medium stores a program that is executed by a processor to implement the photovoltaic cell processing method of claim 10.
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117340427A (en) * | 2023-12-06 | 2024-01-05 | 深圳市智鼎自动化技术有限公司 | Laser energy adjusting device and laser micromachining equipment |
| CN117583722A (en) * | 2024-01-19 | 2024-02-23 | 深圳市智鼎自动化技术有限公司 | Laser processing system and laser energy control method |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117340427A (en) * | 2023-12-06 | 2024-01-05 | 深圳市智鼎自动化技术有限公司 | Laser energy adjusting device and laser micromachining equipment |
| CN117340427B (en) * | 2023-12-06 | 2024-02-27 | 深圳市智鼎自动化技术有限公司 | Laser energy adjusting device and laser micromachining equipment |
| CN117583722A (en) * | 2024-01-19 | 2024-02-23 | 深圳市智鼎自动化技术有限公司 | Laser processing system and laser energy control method |
| CN117583722B (en) * | 2024-01-19 | 2024-04-30 | 深圳市智鼎自动化技术有限公司 | Laser processing system and laser energy control method |
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