CN116448389A - Method and device for detecting laser durability of mask protection film - Google Patents
Method and device for detecting laser durability of mask protection film Download PDFInfo
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Abstract
The invention provides a method for detecting the laser durability of a mask protection film, which comprises the steps of irradiating the mask protection film by using a laser, detecting a characteristic value capable of representing the optical performance of the mask protection film, and acquiring the total laser quantity irradiated on a unit area of the mask protection film when the change of the characteristic value reaches a preset value, wherein the total laser quantity can represent the laser durability of the mask protection film, and the service life of the mask protection film can be estimated in advance according to the laser durability of the mask protection film and the actual use scene, so that the mask protection film can be discarded in proper time, thereby not only meeting the exposure requirement, but also avoiding waste. Correspondingly, the invention also provides a device for detecting the laser durability of the mask protection film.
Description
Technical Field
The invention relates to the technical field of semiconductors, in particular to a method and a device for detecting laser durability of a mask protection film.
Background
In recent years, the design rules of large scale integrated circuits (Large Scale Integrated circuit, LSI) are advancing to miniaturization of sub-quarter micron (sub-quarter micron), and since photolithography requires a larger resolution, the wavelength of an exposure light source in photolithography tends to be shortened, and a Deep Ultraviolet (DUV) light such as a g-ray (436 nm) based on a mercury lamp, an i-ray (365 nm) is converted into a KrF excimer laser (248 nm), an ArF excimer laser (193 nm), and EUV exposure technology using an EUV light having a dominant wavelength of 13.5nm (Extreme Ultra Violet Light) is emerging.
Although the environment of the lithography process has been kept very clean, there are still some contaminating particles that could interfere with the lithography process if present on the mask, resulting in defocusing or defocus problems. Therefore, in a conventional photolithography process, a thin film, which is called Mask pellicles (Mask pellicles), is generally placed several millimeters above the Mask to protect the Mask from contamination during processing and exposure, etc. The mask protective film provides a barrier for preventing particle contamination for the mask plate, but in order not to affect the imaging quality, the mask protective film is required to have characteristics of high transmittance, strong mechanical strength, good thermal stability, and the like. However, the mask protection film is subjected to laser irradiation during the working process, and starts to age after repeated use, and the optical performance of the mask protection film cannot meet the exposure requirement, but the mask protection film is wasted if the mask protection film is discarded too early for safety, so that the detection of the laser durability of the mask protection film is important in practical use.
Disclosure of Invention
The invention aims to provide a method and a device for detecting laser durability of a mask protection film, which are used for detecting the laser durability of the mask protection film.
In order to achieve the above object, the present invention provides a method for detecting laser durability of a mask protection film, comprising:
irradiating the mask protection film by using a laser, and detecting a characteristic value of the mask protection film, wherein the characteristic value can represent the optical performance of the mask protection film; the method comprises the steps of,
and when the change of the characteristic value reaches a preset value, acquiring the total laser quantity irradiated to the unit area of the mask protection film, wherein the total laser quantity is used for representing the laser durability of the mask protection film.
Optionally, when the laser is deep ultraviolet light, the characteristic value is transmittance or film thickness; when the laser is extreme ultraviolet light, the characteristic value is transmittance.
Optionally, when the laser is deep ultraviolet light, placing the mask protection film in air for laser irradiation; alternatively, when the laser is extreme ultraviolet light, the mask protection film is placed in vacuum for laser irradiation, and the mask protection film is surrounded by hydrogen plasma.
Optionally, calculating the total laser according to the pulse energy, the emission frequency and the irradiation time of the laser; alternatively, pulse energy irradiated to a unit area of the mask protective film is detected in real time to acquire the laser light amount.
Optionally, after the total laser quantity is obtained, the service life of the mask protection film is calculated according to the total laser quantity and pulse energy born by the mask protection film in one exposure unit area in practical application.
The invention also provides a device for detecting the laser durability of the mask protection film, which comprises:
a detection chamber for placing a mask protection film;
a light source for emitting a laser and irradiating the mask protective film;
the detection module is used for detecting the characteristic value of the mask protection film, and the characteristic value can be used for representing the optical performance of the mask protection film; the method comprises the steps of,
and the data processing module is used for acquiring the total laser quantity irradiated on the unit area of the mask protection film when the change of the characteristic value reaches a preset value, wherein the total laser quantity is used for representing the laser durability of the mask protection film.
Optionally, the light source comprises a deep ultraviolet laser and/or an extreme ultraviolet laser.
Optionally, the detection module is a film thickness measuring instrument, and is used for measuring the film thickness of the mask protection film; or the detection module comprises two energy detection units, the two energy detection units are respectively used for detecting pulse energy incident on the mask protection film and pulse energy penetrating through the mask protection film, and the data processing module obtains the transmittance of the mask protection film according to the measurement results of the two energy detection units.
Optionally, a hydrogen plasma generating module is disposed in the detection chamber, and is used for providing hydrogen plasma around the mask protection film.
Optionally, the detection chamber further has a gas channel for connecting to atmosphere or to a vacuum device.
The invention provides a method for detecting the laser durability of a mask protection film, which comprises the steps of irradiating the mask protection film by using a laser, detecting a characteristic value capable of representing the optical performance of the mask protection film, and acquiring the total laser quantity irradiated on a unit area of the mask protection film when the change of the characteristic value reaches a preset value, wherein the total laser quantity can represent the laser durability of the mask protection film, and the service life of the mask protection film can be estimated in advance according to the laser durability of the mask protection film and the actual use scene, so that the mask protection film can be discarded in proper time, thereby not only meeting the exposure requirement, but also avoiding waste. Correspondingly, the invention also provides a device for detecting the laser durability of the mask protection film.
Drawings
FIG. 1 is a flowchart of a method for detecting laser durability of a mask protection film according to an embodiment of the present invention;
FIG. 2 is a simplified schematic diagram of an optical path of an EUV exposure process according to an embodiment of the present invention;
FIG. 3 is a schematic diagram of a device for detecting laser durability of a mask protection film according to an embodiment of the present invention;
fig. 4 is a schematic structural diagram of a device for detecting laser durability of a mask protection film according to a second embodiment of the present invention;
wherein, the reference numerals are as follows:
10-mask plate; 20. 400-mask protective film; 100-light source; 200. 201-a dimming module; 301-a first energy detection unit; 302-a second energy detection unit; 500-gas channels; 600-a hydrogen plasma generation module; 700-detection chamber.
Detailed Description
Specific embodiments of the present invention will be described in more detail below with reference to the drawings. The advantages and features of the present invention will become more apparent from the following description. It should be noted that the drawings are in a very simplified form and are all to a non-precise scale, merely for convenience and clarity in aiding in the description of embodiments of the invention.
Example 1
Fig. 1 is a flowchart of a method for detecting laser durability of a mask protection film according to the present embodiment. As shown in fig. 1, the method for detecting laser durability of a mask protection film includes:
step S100: irradiating the mask protection film by using a laser, and detecting a characteristic value of the mask protection film, wherein the characteristic value can represent the optical performance of the mask protection film; the method comprises the steps of,
step S200: and when the change of the characteristic value reaches a preset value, acquiring the total laser quantity irradiated to the unit area of the mask protection film, wherein the total laser quantity is used for representing the laser durability of the mask protection film.
Specifically, first, step S100 is performed to provide a mask protection film for which laser durability detection is required.
In some embodiments, the mask protection film may be unused, for example, at least one mask protection film may be arbitrarily selected from a batch of mask protection film products that have not been shipped as a sample for laser durability detection, and the laser durability of the samples may be written in the product description of the batch of mask protection film products as the laser durability of the batch of mask protection film products is not greatly different from each other in terms of the parameters of the same batch of products. After the batch of mask protection film products leave the factory, a user can estimate the service life of the mask protection film in advance according to the laser durability in the product description and the actual use scene of the mask protection film.
In some embodiments, the mask protection film may also be used, for example, after a lot of mask protection film products is used for the same time in the same exposure process, at least one mask protection film may be arbitrarily selected from the lot of mask protection film products as a sample for laser durability detection, and the laser durability of the sample may be used as the laser durability of the lot of mask protection film products because the parameters of the same lot of products are not different greatly and the total amount of laser received is not different greatly (because the same time is used in the same exposure process). The user can estimate the remaining life of the mask protective film based on the detected laser durability and the actual use scene of the mask protective film.
A specific manner of estimating the lifetime of the mask protective film based on the laser durability of the mask protective film and the actual use situation will be described below.
After the mask protection film for which the laser durability detection is required is determined, the mask protection film is continuously irradiated with laser light, and the mask protection film starts to age under the irradiation of the laser light, and the optical performance thereof gradually decreases. Specifically, the surface of the mask protective film is etched, the film thickness is reduced, the surface is roughened, and the transmittance is reduced, so that the optical performance of the mask protective film can be characterized by the characteristic values such as the film thickness, the surface roughness, the transmittance and the like.
It should be understood that, since the deep ultraviolet exposure process is performed in air, when it is required to detect the laser durability of the mask protective film against deep ultraviolet light, the laser is deep ultraviolet light, and it is required to place the mask protective film in air for laser irradiation; similarly, since the euv exposure process is performed in vacuum and a reducing gas (typically hydrogen plasma) is required to protect the euv light source, when it is required to detect the laser durability of the mask protective film against the euv light, the laser is the euv light, the mask protective film is required to be placed in vacuum for laser irradiation, and the mask protective film is also required to be surrounded by the hydrogen plasma. Therefore, when the laser durability is detected, the real exposure environment can be simulated, the adverse effect of different exposure environments on the detection result is reduced, and the detection precision is improved.
Further, it is necessary to detect a characteristic value that characterizes the optical performance of the mask protective film when the mask protective film is irradiated, for example, when the laser is deep ultraviolet light, the transmittance or film thickness of the mask protective film can be detected; when the laser is extreme ultraviolet light, the transmittance of the mask protective film can be detected.
It should be noted that some other characteristic values of the mask protection film (parameters other than the transmittance and the film thickness) may also be capable of characterizing the optical performance thereof, but are limited by the prior art, and these parameters may be difficult to measure at present or even easy to measure but difficult to obtain a quantitative relationship between the mask protection film and the optical performance at present, but these schemes should not be excluded from the protection scope of the present invention.
It should be understood that the characteristic value of the mask protective film may be detected in real time or may be detected at a fixed time. For example, when the transmittance of the mask protective film is detected, the energy of the incident light and the emitted light at the same position of the mask protective film can be detected in real time, and the transmittance of the mask protective film can be calculated in real time according to the difference in the energy of the incident light and the emitted light; when the film thickness of the mask protection film is detected, the film thickness of the mask protection film at the same position can be detected at a certain time.
Step S200 is executed, when the variation of the characteristic value reaches a predetermined value, it indicates that the optical performance of the mask protection film has been reduced to a level that cannot meet the exposure requirement, and at this time, the total amount of laser irradiated onto the unit area of the mask protection film is obtained, and the laser total amount can be used to characterize the laser durability of the mask protection film.
It should be understood that the predetermined value is a critical value for determining the lifetime of the mask protective film, and may be set according to actual requirements. For example, the predetermined value may be set to 1% when discarding is required that the transmittance of the mask protective film is reduced by 1%; the mask protection film is required to be discarded when the film thickness is reduced by 3.4nm (for 193nm laser exposure process), and the predetermined value may be set to 3.4nm, but should not be limited thereto.
In some embodiments, if the laser is directly irradiated onto the mask protective film without passing through any dimming module, the total amount of laser light may be calculated according to the pulse energy, the emission frequency, and the irradiation time of the laser light. For example, the pulse energy of the laser is 20mJ/cm 2 The irradiation frequency was 100Hz, and when the characteristic value change reached a predetermined value after the mask protective film was irradiated with the laser light for 1s (irradiation time was 1 s), the mask protective film was irradiated to a unit area (1 cm) 2 ) The total amount of laser light was 2000mJ.
In some embodiments, whether or not the dimming module is passed before the laser light is irradiated to the mask protection film, pulse energy per unit area irradiated to the mask protection film may be detected in real time to obtain the total amount of laser light. For example, when the laser light irradiates the mask protection film for 1s, the change of the characteristic value reaches a predetermined value, 100 pulses irradiated to the mask protection film per unit area are detected within 1s, and the energy of these 100 pulses is added to obtain the total laser light.
Further, after the laser durability of the mask protective film is obtained, the lifetime of the mask protective film can be estimated from the laser durability and the actual use situation of the mask protective film. For example, if the laser durability of the mask protection film is 2000mJ and the laser energy to which the mask protection film is subjected once for practical use is 100mJ, the mask protection film may be used 20 times.
Fig. 2 is a simplified schematic diagram of an optical path of an euv exposure process according to the present embodiment. As shown in fig. 2, it should be noted that, in the euv exposure process, the laser irradiates onto the mask protection film 20, irradiates onto the reticle 10 through the mask protection film 20, is reflected onto the mask protection film 20 by the reticle 10, and finally exits from the mask protection film 20, and at least a partial region (at a virtual circle in fig. 2) of the mask protection film 20 is subjected to two laser transmissions. Therefore, when the mask protective film is applied in the extreme ultraviolet exposure process, the lifetime calculated from the laser durability and the actual use field Jing Gu is halved. For example, the laser durability of the mask protection film is 2000mJ, the laser energy received by the mask protection film once in actual use is 100mJ, and the lifetime calculated from the laser durability and the actual use field Jing Gu is 20 times, but the actual lifetime of the mask protection film is halved and can only be used 10 times.
Based on this, the present embodiment provides a detection apparatus for laser durability of a mask protection film. Fig. 3 is a schematic structural diagram of a device for detecting laser durability of a mask protection film according to the present embodiment, as shown in fig. 3, in the present embodiment, the device for detecting laser durability of a mask protection film is used for measuring laser durability of a mask protection film 400 to deep ultraviolet light, and includes a detection chamber 700, a light source 100, a dimming module 200, a detection module and a data processing module (not shown in fig. 3).
Specifically, the light source 100 is located outside the detection chamber 700 and is used for emitting laser light, and in this embodiment, the light source 100 is a deep ultraviolet laser, so that the laser light emitted by the light source 100 is deep ultraviolet light. The light modulation module 200 and the mask protection film 400 are located in the detection chamber 700 and are sequentially arranged along the optical path, and the laser emitted by the light source 100 irradiates (vertically or non-vertically) the mask protection film 400 after passing through the light modulation module 200, where the light modulation module 200 is used for modulating the laser, for example, collimating the laser, adjusting the optical path direction, adjusting the energy of the laser, and the like.
The laser light is continuously irradiated onto the mask protection film 400, so that the mask protection film 400 starts to age and the optical performance gradually decreases. In this embodiment, the detection module includes a first energy detection unit 301 and a second energy detection unit 302, where the first energy detection unit 301 is located on an optical path between the dimming module 200 and the mask protection film 400, for detecting pulse energy incident on the mask protection film 400 in real time, and the second energy detection unit 302 is located on an optical path behind the mask protection film 400, for detecting pulse energy transmitted through the mask protection film 400 in real time. The first energy detecting unit 301 and the second energy detecting unit 302 are in signal connection with the data processing module, and the first energy detecting unit 301 and the second energy detecting unit 302 can send detection results to the data processing module in real time.
Further, the detecting chamber 700 has a gas channel 500, and the gas channel 500 is connected to the atmosphere, so that when the mask protection film 400 is irradiated by the laser, the mask protection film 400 is always in the air, thereby truly simulating the exposure environment of the deep ultraviolet exposure process, reducing the adverse effects of different exposure environments on the detecting result, and improving the detecting precision.
Alternatively, the first energy detecting unit 301 and the second energy detecting unit 302 may be, for example, photodetectors or the like, and the photodetectors such as area arrays may enable independent detection of pulse energy received per unit area of the mask protection film 400.
The data processing module is typically located outside the detection chamber 700 and is responsible for the data processing operations of the overall device. First, after the data processing module receives the detection results transmitted by the first energy detecting unit 301 and the second energy detecting unit 302, the transmittance of the mask protection film 400 is calculated from the detected fruits of the first energy detecting unit 301 and the second energy detecting unit 302. Thereafter, when the change in transmittance reaches a predetermined value (for example, the change in transmittance reaches 1%), the total amount of laser light irradiated onto the unit area of the mask protection film 400 is obtained, which may characterize the laser durability of the mask protection film 400.
It can be understood that since the first energy detecting unit 301 detects the pulse energy incident on the mask protection film 400 in real time, the data processing module obtains the total amount of laser light irradiated onto the unit area of the mask protection film 400 based on the detection result of the first energy detecting unit 301 (the energy detected during a period from when the laser light just enters onto the mask protection film 400 until the transmittance of the mask protection film 400 reaches a predetermined value).
In some embodiments, the dimming module 200 may be omitted, and the laser light may be directly irradiated onto the mask protection film 400, where the total amount of laser light irradiated onto the unit area of the mask protection film 400 may be calculated according to the pulse energy, the emission frequency and the irradiation time of the laser light due to the small loss of the laser light after the laser light is emitted from the light source 100; alternatively, the dimming module 200 is not used to adjust the energy of the laser light, but may calculate the total amount of laser light irradiated onto the unit area of the mask protection film 400 based on the pulse energy, the emission frequency, and the irradiation time of the laser light in some cases where the accuracy is not high.
In some embodiments, the detection module may also be a film thickness measuring apparatus, where the detection module may be disposed outside the detection chamber 700, and the mask protection film 400 may be moved out of the detection chamber 700 at regular intervals, and the detection module measures the film thickness of the mask protection film 400 and transmits the measurement result to the data processing module. When the change in film thickness reaches a predetermined value (for example, a decrease in film thickness of 3.4 nm), the data processing module may acquire the total amount of laser light irradiated onto the unit area of the mask protection film 400.
When the detection module is a film thickness measuring apparatus, a third energy detection unit may be provided on the optical path between the light modulation module 200 and the mask protection film 400 in order to obtain the total amount of laser light irradiated onto the unit area of the mask protection film 400, and the third energy detection unit may detect pulse energy incident on the mask protection film 400 in real time and transmit the measurement result to the data processing module. The data processing module obtains the total amount of laser light irradiated onto the unit area of the mask protective film 400 based on the detection result of the third energy detection unit (the energy detected during a period from when the laser light just enters the mask protective film 400 until the transmittance of the mask protective film 400 reaches a predetermined value). Of course, the third energy detection means is not necessary, and the total amount of laser light irradiated onto the unit area of the mask protection film 400 may be directly calculated from the pulse energy, the emission frequency, and the irradiation time of the laser light, without adjusting the energy of the laser light by the light adjusting module 200 or by the light adjusting module 200.
Example two
Fig. 4 is a schematic structural diagram of a device for detecting laser durability of a mask protection film according to the present embodiment. As shown in fig. 4, the difference from the first embodiment is that in the present embodiment, the detection device of the laser durability of the mask protection film is used to measure the laser durability of the mask protection film 400 against extreme ultraviolet light.
Specifically, the light source 100 is an extreme ultraviolet laser, and the laser light emitted from the light source 100 is extreme ultraviolet light. A hydrogen plasma generation module 600 for supplying hydrogen plasma around the mask protection film 400 is further provided in the detection chamber 700; and, the gas passage 500 is connected to a vacuum apparatus that can evacuate the detection chamber 700. In this way, when the mask protection film 400 is irradiated with the laser light, the mask protection film 400 is always in a vacuum environment and surrounded by the hydrogen plasma. The detection device in the embodiment can truly simulate the exposure environment of the extreme ultraviolet exposure process, reduce the adverse effect of different exposure environments on the detection result, and improve the detection precision.
Further, the dimming module 201 in this embodiment is slightly different from the first embodiment, and the dimming module 201 in this embodiment is provided with a plurality of mirrors (the number and the arrangement positions of the mirrors in fig. 4 are only schematic), and the mirrors turn the light path, so that the lateral space can be saved. However, it should be understood that the dimming module 201 in this embodiment may also have the same structure as the dimming module 200 in the first embodiment, which does not affect the implementation of the present invention.
Example III
The difference from the first and second embodiments is that in the present embodiment, the detection device for the laser durability of the mask protection film can be used to detect the laser durability of the mask protection film 400 against deep ultraviolet light or extreme ultraviolet light.
Specifically, the light source 100 may include a deep ultraviolet laser and an extreme ultraviolet laser, which may be switched for use; two gas passages 500 may be provided, one connected to the atmosphere and the other connected to the vacuum apparatus, and the two gas passages 500 may be switched by a valve; the hydrogen plasma generation module 600 is provided in the detection chamber 700, and the hydrogen plasma generation module 600 is turned on when necessary (for detecting the laser durability of extreme ultraviolet light) and turned off when not necessary (for detecting the laser durability of deep ultraviolet light). Thus, the laser durability of the mask protective film 400 against two ultraviolet light can be detected in one set of apparatus.
In summary, in the method for detecting the laser durability of the mask protection film provided by the embodiment of the invention, a laser is used to irradiate the mask protection film, and a characteristic value capable of representing the optical performance of the mask protection film is detected, when the characteristic value changes to a predetermined value, the total laser irradiated to the unit area of the mask protection film is obtained, the total laser is used to represent the laser durability of the mask protection film, and the service life of the mask protection film can be estimated in advance according to the laser durability of the mask protection film and the actual use scene, so that the mask protection film can be discarded in a proper time, thereby not only meeting the exposure requirement, but also avoiding waste. Correspondingly, the invention also provides a device for detecting the laser durability of the mask protection film.
It should be noted that, in the present description, each embodiment is described in a progressive manner, and each embodiment is mainly described in a different manner from other embodiments, and identical and similar parts between the embodiments are all enough to refer to each other. For the system disclosed in the embodiment, the description is relatively simple because of corresponding to the method disclosed in the embodiment, and the relevant points refer to the description of the method section.
It should be further noted that although the present invention has been disclosed in the preferred embodiments, the above embodiments are not intended to limit the present invention. Many possible variations and modifications of the disclosed technology can be made by anyone skilled in the art without departing from the scope of the technology, or the technology can be modified to be equivalent. Therefore, any simple modification, equivalent variation and modification of the above embodiments according to the technical substance of the present invention still fall within the scope of the technical solution of the present invention.
It should be further understood that the terms "first," "second," "third," and the like in this specification are used merely for distinguishing between various components, elements, steps, etc. in the specification and not for indicating a logical or sequential relationship between the various components, elements, steps, etc., unless otherwise indicated.
It should also be understood that the terminology described herein is for the purpose of describing particular embodiments only, and is not intended to limit the scope of the present invention. It must be noted that, as used herein and in the appended claims, the singular forms "a," "an," and "the" include plural referents unless the context clearly dictates otherwise. For example, reference to "a step" or "an apparatus" means a reference to one or more steps or apparatuses, and may include sub-steps as well as sub-apparatuses. All conjunctions used should be understood in the broadest sense. And, the word "or" should be understood as having the definition of a logical "or" rather than a logical "exclusive or" unless the context clearly indicates the contrary. Furthermore, implementation of the methods and/or apparatus in embodiments of the invention may include performing selected tasks manually, automatically, or in combination.
Claims (10)
1. A method for detecting laser durability of a mask protective film, comprising:
irradiating the mask protection film by using a laser, and detecting a characteristic value of the mask protection film, wherein the characteristic value can represent the optical performance of the mask protection film; the method comprises the steps of,
and when the change of the characteristic value reaches a preset value, acquiring the total laser quantity irradiated to the unit area of the mask protection film, wherein the total laser quantity is used for representing the laser durability of the mask protection film.
2. The method for detecting laser durability of a mask protective film according to claim 1, wherein when the laser is deep ultraviolet light, the characteristic value is a transmittance or a film thickness; when the laser is extreme ultraviolet light, the characteristic value is transmittance.
3. The method for detecting laser durability of a mask protective film according to claim 1, wherein when the laser is deep ultraviolet light, the mask protective film is placed in air for laser irradiation; alternatively, when the laser is extreme ultraviolet light, the mask protection film is placed in vacuum for laser irradiation, and the mask protection film is surrounded by hydrogen plasma.
4. The method for detecting laser durability of a mask protective film according to any one of claims 1 to 3 wherein the total amount of laser light is calculated from pulse energy, emission frequency, and irradiation time of the laser light; alternatively, pulse energy irradiated to a unit area of the mask protective film is detected in real time to acquire the laser light amount.
5. The method for detecting laser durability of a mask protective film according to any one of claims 1 to 3, wherein a lifetime of the mask protective film is calculated from the total amount of laser light and pulse energy received by the mask protective film per unit area of exposure at the time of actual application after the total amount of laser light is obtained.
6. A mask protective film laser durability detection device, characterized by comprising:
a detection chamber for placing a mask protection film;
a light source for emitting a laser and irradiating the mask protective film;
the detection module is used for detecting the characteristic value of the mask protection film, and the characteristic value can be used for representing the optical performance of the mask protection film; the method comprises the steps of,
and the data processing module is used for acquiring the total laser quantity irradiated on the unit area of the mask protection film when the change of the characteristic value reaches a preset value, wherein the total laser quantity is used for representing the laser durability of the mask protection film.
7. The apparatus for detecting laser durability of a mask protective film according to claim 6 wherein the light source includes a deep ultraviolet laser and/or an extreme ultraviolet laser.
8. The apparatus for detecting laser durability of a mask protective film according to claim 6 or 7, wherein the detection module is a film thickness measuring instrument for measuring a film thickness of the mask protective film; or the detection module comprises two energy detection units, the two energy detection units are respectively used for detecting pulse energy incident on the mask protection film and pulse energy penetrating through the mask protection film, and the data processing module obtains the transmittance of the mask protection film according to the measurement results of the two energy detection units.
9. The apparatus for detecting laser durability of a mask protective film according to claim 6 or 7 wherein a hydrogen plasma generating module for supplying hydrogen plasma around the mask protective film is provided in the detection chamber.
10. The apparatus for detecting laser durability of a mask protective film according to claim 6 or 7 wherein the detection chamber further has a gas passage for connecting to the atmosphere or connecting to a vacuum device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310432406.6A CN116448389A (en) | 2023-04-20 | 2023-04-20 | Method and device for detecting laser durability of mask protection film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310432406.6A CN116448389A (en) | 2023-04-20 | 2023-04-20 | Method and device for detecting laser durability of mask protection film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN116448389A true CN116448389A (en) | 2023-07-18 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202310432406.6A Pending CN116448389A (en) | 2023-04-20 | 2023-04-20 | Method and device for detecting laser durability of mask protection film |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN116448389A (en) |
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2023
- 2023-04-20 CN CN202310432406.6A patent/CN116448389A/en active Pending
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