CN116441429B - Forming die, machining method of monopolar plate, and monopolar plate and bipolar plate assembly - Google Patents
Forming die, machining method of monopolar plate, and monopolar plate and bipolar plate assembly Download PDFInfo
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- CN116441429B CN116441429B CN202310718291.7A CN202310718291A CN116441429B CN 116441429 B CN116441429 B CN 116441429B CN 202310718291 A CN202310718291 A CN 202310718291A CN 116441429 B CN116441429 B CN 116441429B
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- 238000000034 method Methods 0.000 title claims description 7
- 238000003754 machining Methods 0.000 title description 4
- 238000005520 cutting process Methods 0.000 claims abstract description 142
- 230000005404 monopole Effects 0.000 claims abstract description 15
- 238000000465 moulding Methods 0.000 claims description 32
- 238000007789 sealing Methods 0.000 claims description 11
- 238000012545 processing Methods 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 238000003672 processing method Methods 0.000 abstract description 7
- 239000000446 fuel Substances 0.000 abstract description 6
- 239000012530 fluid Substances 0.000 description 50
- 239000003570 air Substances 0.000 description 14
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 13
- 239000001257 hydrogen Substances 0.000 description 13
- 229910052739 hydrogen Inorganic materials 0.000 description 13
- 239000000110 cooling liquid Substances 0.000 description 11
- 239000012528 membrane Substances 0.000 description 7
- 239000002826 coolant Substances 0.000 description 4
- 238000013461 design Methods 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 150000002431 hydrogen Chemical class 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 230000000712 assembly Effects 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000012809 cooling fluid Substances 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21D—WORKING OR PROCESSING OF SHEET METAL OR METAL TUBES, RODS OR PROFILES WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21D37/00—Tools as parts of machines covered by this subclass
- B21D37/10—Die sets; Pillar guides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21D—WORKING OR PROCESSING OF SHEET METAL OR METAL TUBES, RODS OR PROFILES WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21D35/00—Combined processes according to or processes combined with methods covered by groups B21D1/00 - B21D31/00
- B21D35/002—Processes combined with methods covered by groups B21D1/00 - B21D31/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M8/00—Fuel cells; Manufacture thereof
- H01M8/02—Details
- H01M8/0202—Collectors; Separators, e.g. bipolar separators; Interconnectors
- H01M8/0258—Collectors; Separators, e.g. bipolar separators; Interconnectors characterised by the configuration of channels, e.g. by the flow field of the reactant or coolant
- H01M8/0265—Collectors; Separators, e.g. bipolar separators; Interconnectors characterised by the configuration of channels, e.g. by the flow field of the reactant or coolant the reactant or coolant channels having varying cross sections
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/30—Hydrogen technology
- Y02E60/50—Fuel cells
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Sustainable Development (AREA)
- Sustainable Energy (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Fuel Cell (AREA)
Abstract
The application relates to the technical field of fuel cells, in particular to a forming die, a processing method of a monopolar plate, and a monopolar plate and bipolar plate assembly. The forming die comprises a flow field forming area, a first supporting part forming area, a second supporting part forming area, a first small cavity opening forming area, a third supporting part forming area, a second small cavity opening forming area and a fourth supporting part forming area. After the plate is punched through the forming die, a corresponding flow field region, a first supporting portion, a second supporting portion, a first small cavity opening cutting region, a third supporting portion, a second small cavity opening cutting region and a fourth supporting portion can be formed on the middle plate. The user cuts the first small cavity opening cutting area through the middle plate to form a first small cavity opening, cuts the second small cavity opening cutting area to form a second small cavity opening, cuts the first small cavity opening cutting area and the third supporting part to form a first large cavity opening, and cuts the second small cavity opening cutting area and the fourth supporting part to form a second large cavity opening, so that monopole plates with different structures are formed, and different requirements of the user are met.
Description
Technical Field
The application relates to the technical field of fuel cells, in particular to a forming die, a processing method of a monopolar plate, and a monopolar plate and bipolar plate assembly.
Background
The fuel cell stack is composed of a plurality of fuel cell units, each fuel cell unit comprises a bipolar plate and a membrane electrode which are assembled in a superposed mode, wherein the bipolar plate not only plays a role of supporting the membrane electrode, but also can provide channels and reaction sites for flowing hydrogen, oxygen and cooling liquid, thereby being used for collecting electrons and conducting heat. The bipolar plate is provided with a hydrogen inlet and outlet cavity opening, an oxygen inlet and outlet cavity opening and a cooling liquid inlet and outlet cavity opening, and in the existing bipolar plate, the hydrogen inlet and outlet cavity openings, the air inlet and outlet cavity openings and the cooling liquid inlet and outlet cavity openings are symmetrically distributed, so that the hydrogen inlet and outlet cavity openings, the air inlet and outlet cavity openings and the cooling liquid outlet cavity openings cannot be conveyed into the bipolar plate according to the optimal reaction proportion, and the performance of a fuel cell stack is poor.
Disclosure of Invention
The application provides a forming die, which comprises a forming area, wherein the forming area comprises a flow field forming area, two sides of the flow field forming area are respectively provided with a plurality of first cavity opening forming areas and a plurality of second cavity opening forming areas, a first supporting part forming area is arranged between the flow field forming area and the first cavity opening forming area, and a second supporting part forming area is arranged between the flow field forming area and the second cavity opening forming area; the first cavity opening forming area comprises a first small cavity opening forming area and a third supporting portion forming area, the third supporting portion forming area is located between the first small cavity opening forming area and the first supporting portion forming area, the second cavity opening forming area comprises a second small cavity opening forming area and a fourth supporting portion forming area, and the fourth supporting portion forming area is located between the second small cavity opening forming area and the second supporting portion forming area.
In the embodiment of the application, the plate can be punched through the forming die to form the intermediate plate for preparing the single-plate, after the plate is punched through the forming die, the flow field forming area forms a flow field area on the intermediate plate, the first cavity opening forming area forms a first cavity opening cutting area on the intermediate plate, the second cavity opening forming area forms a second cavity opening cutting area on the intermediate plate, the first supporting part forming area forms a first supporting part on the intermediate plate, and the second supporting part forming area forms a second supporting part on the intermediate plate. When the middle plate is processed (e.g. cut) for a second time, monopole plates with different structures can be formed so as to meet different requirements of users. The first supporting part forming area and the third supporting part forming area are positioned between the first small cavity opening forming area and the flow field forming area, the second supporting part forming area and the fourth supporting part forming area are positioned between the second small cavity opening forming area and the flow field forming area, and therefore the first supporting part and the third supporting part are positioned between the first small cavity opening cutting area and the flow field area, and the second supporting part and the fourth supporting part are positioned between the second small cavity opening cutting area and the flow field area on the middle plate. When the user performs secondary processing (e.g., cutting) on the intermediate plate, the user can cut the first cavity opening cutting area to form a first large cavity opening, or can cut the first small cavity opening cutting area to form a first small cavity opening, and the user can cut the second cavity opening cutting area to form a second large cavity opening, or can cut the second small cavity opening cutting area to form a second small cavity opening. Therefore, by cutting different positions of the middle plate, a unipolar plate with asymmetric cavity openings, namely the structures of the first cavity openings and the second cavity openings on two sides of the flow field region in the unipolar plate are not identical. Therefore, the forming die in the embodiment of the application is convenient for forming the unipolar plate with the asymmetric cavity opening.
In one possible implementation manner, the first cavity opening forming area is raised relative to the surface of the forming die, and the first small cavity opening forming area is a first groove arranged in the first cavity opening forming area; the second cavity opening forming area is protruded relative to the surface of the forming die, and the second small cavity opening forming area is a second groove arranged in the second cavity opening forming area.
In one possible embodiment, the first support section forming zone, the second support section forming zone, the third support section forming zone and the fourth support section forming zone each comprise a plurality of third grooves arranged at intervals.
In one possible embodiment, a fourth groove is provided between the first support section forming region and the third support section forming region, and a fifth groove is provided between the second support section forming region and the flow field forming region.
In one possible implementation manner, a sixth groove is formed between adjacent first cavity opening forming areas, a seventh groove is formed between adjacent second cavity opening forming areas, and an eighth groove is formed at the periphery of each forming area; the fourth groove, the fifth groove, the sixth groove, the seventh groove and the eighth groove are communicated.
In one possible embodiment, the first cavity mouth forming area, the second cavity mouth forming area, the first small cavity mouth forming area and the second small cavity mouth forming area are all rectangular.
In one possible embodiment, each of the first and second cell port forming regions has the same area, and each of the first and second cell port forming regions has the same area.
In one possible embodiment, the forming mold includes a cathode mold and an anode mold, the corresponding grooves of which have different depths and the corresponding protrusions of which have different heights.
The application also provides a processing method of the monopole plate, which comprises the following steps: stamping a plate by adopting a forming die to form an intermediate plate comprising a flow field region, a first cavity opening cutting region, a second cavity opening cutting region, a first supporting part and a second supporting part, wherein the first cavity opening cutting region and the second cavity opening cutting region are positioned at two sides of the flow field region, the first cavity opening cutting region comprises a first small cavity opening cutting region and a third supporting part cutting region, the second cavity opening cutting region comprises a second small cavity opening cutting region and a fourth supporting part cutting region, the first supporting part is positioned between the flow field region and the third supporting part cutting region, and the second supporting part is positioned between the flow field region and the fourth supporting part cutting region; and cutting the first cavity opening cutting area of the middle plate to form N small cavity openings and M large cavity openings, and cutting the second cavity opening cutting area of the middle plate to form M small cavity openings and N large cavity openings.
In one possible embodiment, when the first and second cavity mouth cutting regions of the intermediate plate are cut, the processing method includes: cutting along the edge of the first small cavity opening cutting area to form a first small cavity opening, cutting along the edge of the first cavity opening cutting area to form a first large cavity opening, cutting along the edge of the second small cavity opening cutting area to form a second small cavity opening, and cutting along the edge of the second cavity opening cutting area to form a second large cavity opening.
The application also provides a monopole plate which is manufactured by adopting the processing method of the monopole plate, and comprises a circulation area, wherein the circulation area comprises a flow field area, a plurality of first cavity openings and a plurality of second cavity openings, and the first cavity openings and the second cavity openings are distributed on two sides of the flow field area along the length direction of the monopole plate; the first cavity openings comprise N first small cavity openings and M first large cavity openings, and the second cavity openings comprise M second small cavity openings and N second large cavity openings.
In one possible embodiment, a side of the first small cavity port, which is close to the flow field region, is provided with a first supporting part and a third supporting part, and a side of the second small cavity port, which is close to the flow field region, is provided with a second supporting part and a fourth supporting part; the side of the first large cavity opening, which is close to the flow field area, is provided with a first supporting part, and the side of the second large cavity opening, which is close to the flow field area, is provided with a second supporting part.
In one possible embodiment, the first support portion, the second support portion, the third support portion, and the fourth support portion each include a plurality of protrusions disposed at intervals in a width direction of the unipolar plate.
In one possible embodiment, there is a first mounting portion between the first support portion and the third support portion, and a second mounting portion between the second support portion and the flow field region, the first and second mounting portions being for mounting a seal.
In one possible embodiment, a third mounting part is arranged between the adjacent first cavity openings, a fourth mounting part is arranged between the adjacent second cavity openings, and a fifth mounting part is arranged at the periphery of the circulation area; the first mounting part, the second mounting part, the third mounting part, the fourth mounting part and the fifth mounting part are communicated and are positioned on two surfaces of the monopole plate along the thickness direction with the supporting parts.
In one possible embodiment, the first mounting portion, the second mounting portion, the third mounting portion, the fourth mounting portion, and the fifth mounting portion are located on a first surface of the unipolar plate in a thickness direction, and the support portion is located on a second surface of the unipolar plate in the thickness direction; the first mounting part, the second mounting part, the third mounting part, the fourth mounting part and the fifth mounting part are grooves facing the first surface, and a bump is formed on one side of the second surface.
The application also provides a bipolar plate assembly, which comprises a cathode plate and an anode plate which are arranged in a stacking way along the thickness direction of the bipolar plate assembly and are connected, wherein the cathode plate and the anode plate are both unipolar plates; the first small cavity opening of the cathode plate is communicated with the second small cavity opening of the anode plate, the first large cavity opening of the cathode plate is communicated with the second large cavity opening of the anode plate, and the flow field area of the cathode plate and the flow field area of the anode plate form a reaction area of the bipolar plate assembly.
In one possible embodiment, in the cathode plate and the anode plate, a side of the first small cavity port close to the flow field region is provided with a first supporting part and a third supporting part, a side of the second small cavity port close to the flow field region is provided with a second supporting part and a fourth supporting part, a side of the first large cavity port close to the flow field region is provided with a first supporting part, and a side of the second large cavity port close to the flow field region is provided with a second supporting part; a first mounting part is arranged between the first supporting part and the third supporting part, a second mounting part is arranged between the second supporting part and the flow field area, a third mounting part is arranged between the adjacent first cavity openings, a fourth mounting part is arranged between the adjacent second cavity openings, and a fifth mounting part is arranged on the periphery of the flow area; the first mounting part, the second mounting part, the third mounting part, the fourth mounting part and the fifth mounting part are all used for mounting the sealing element, the first mounting part of the cathode plate is staggered with the second mounting part of the anode plate, and the second mounting part of the cathode plate is staggered with the first mounting part of the anode plate.
In one possible embodiment, the first, second, third, fourth and fifth mounting portions are grooves facing the first surface, and the first, second, third, fourth and fifth mounting portions form first, second, third, fourth and fifth bumps on one side of the second surface, respectively; the first supporting part of the cathode plate is abutted with the second lug of the anode plate, the second supporting part of the cathode plate is abutted with the first lug of the anode plate, the third lug of the cathode plate is abutted with the fourth lug of the anode plate, the fourth lug of the cathode plate is abutted with the third lug of the anode plate, and the fifth lug of the cathode plate is abutted with the fifth lug of the anode plate.
It is to be understood that both the foregoing general description and the following detailed description are exemplary and explanatory only and are not restrictive of the application as claimed.
Drawings
FIG. 1 is a schematic diagram of a molding die according to the present application;
FIG. 2 is an enlarged view of a portion of region I of FIG. 1;
FIG. 3 is an enlarged view of a portion of region II of FIG. 1;
FIG. 4 is a top view of FIG. 1;
FIG. 5 is a top view of the intermediate plate of the present application;
FIG. 6 is a schematic view of a unipolar plate in one embodiment of the present application;
FIG. 7 is a schematic view of the structure of an anode unipolar plate according to the present application;
FIG. 8 is a schematic view of a cathode unipolar plate according to the present application;
fig. 9 is an exploded view of a bipolar plate assembly of the present application;
fig. 10 is an exploded view of a bipolar plate assembly, membrane electrode and seal of the present application.
Reference numerals:
1-a forming die;
11-a forming zone;
111-a flow field forming zone;
112-a first cavity port forming zone;
112 a-a first cell port forming zone;
112 b-a third support forming zone;
113-a second cavity port forming zone;
113 a-a second cell port forming zone;
113 b-a fourth support forming zone;
114-a first support forming zone;
115-a second support forming zone;
116-a first groove;
117-a second groove;
118-third groove;
119-fourth grooves;
1110-a fifth groove;
1111-sixth grooves;
1112-seventh groove;
1113-eighth groove;
2-a unipolar plate;
21-a flow-through zone;
211-flow field region;
212-a hydrogen outlet;
213-cooling fluid inlet;
214-an air inlet;
215-hydrogen inlet;
216-a cooling liquid outlet;
217-air outlet;
22-a first surface;
221-a first mounting portion;
222-a second mounting portion;
223-a third mount;
224-fourth mounting portion;
225-a fifth mounting portion;
23-a second surface;
231-a first support;
232-a third support;
233-a second support;
234-fourth support;
235-a first bump;
236-a second bump;
237-third bump;
238-fourth bump;
239-fifth bump;
24-a first small cavity port;
25-a first large cavity port;
26-a second small cavity port;
27-a second large cavity port;
3-an intermediate plate;
31-a first cavity port cutting zone;
311-a first small cavity mouth cutting area;
312-a third support cut zone;
32-a second cavity port cutting zone;
321-a second small cavity mouth cutting area;
322-fourth support cut zone;
a 4-bipolar plate assembly;
41-cathode plate;
42-anode plate;
5-membrane electrode;
6-seal.
The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate embodiments consistent with the application and together with the description, serve to explain the principles of the application.
Detailed Description
For a better understanding of the technical solution of the present application, the following detailed description of the embodiments of the present application refers to the accompanying drawings.
It should be understood that the described embodiments are merely some, but not all, embodiments of the application. All other embodiments, which can be made by those skilled in the art based on the embodiments of the application without making any inventive effort, are intended to be within the scope of the application.
The terminology used in the embodiments of the application is for the purpose of describing particular embodiments only and is not intended to be limiting of the application. As used in this application and the appended claims, the singular forms "a," "an," and "the" are intended to include the plural forms as well, unless the context clearly indicates otherwise.
It should be understood that the term "and/or" as used herein is merely one relationship describing the association of the associated objects, meaning that there may be three relationships, e.g., a and/or B, may represent: a exists alone, A and B exist together, and B exists alone. In addition, the character "/" herein generally indicates that the front and rear associated objects are an "or" relationship.
It should be noted that, the terms "upper", "lower", "left", "right", and the like in the embodiments of the present application are described in terms of the angles shown in the drawings, and should not be construed as limiting the embodiments of the present application. In the context of this document, it will also be understood that when an element is referred to as being "on" or "under" another element, it can be directly on the other element or be indirectly on the other element through intervening elements.
The embodiment of the present application provides a molding die, as shown in fig. 1 to 4, the molding die 1 includes a molding zone 11, and the molding zone 11 includes a flow field molding zone 111, and the flow field molding zone 111 has a region (not shown in the drawings) for molding a runner. The two sides of the flow field forming area 111 are respectively provided with a plurality of first cavity opening forming areas 112 and a plurality of second cavity opening forming areas 113, a first supporting part forming area 114 is arranged between the flow field forming area 111 and the first cavity opening forming areas 112, and a second supporting part forming area 115 is arranged between the flow field forming area 111 and the second cavity opening forming areas 113; as shown in fig. 2, the first cavity forming zone 112 includes a first cavity forming zone 112a and a third support forming zone 112b, the third support forming zone 112b is located between the first cavity forming zone 112a and the first support forming zone 114, as shown in fig. 3, the second cavity forming zone 113 includes a second cavity forming zone 113a and a fourth support forming zone 113b, and the fourth support forming zone 113b is located between the second cavity forming zone 113a and the second support forming zone 115.
In the embodiment of the application, the plate material can be punched by the forming die 1 to form the middle plate 3 for preparing the unipolar plate as shown in fig. 5, when the plate material is punched by the forming die 1, the flow field forming area 111 forms the flow field area 211 on the middle plate 3, the first cavity opening forming area 112 forms the first cavity opening cutting area 31 on the middle plate 3, the second cavity opening forming area 113 forms the second cavity opening cutting area 32 on the middle plate 3, the first supporting portion forming area 114 forms the first supporting portion 231 on the middle plate 3, and the second supporting portion forming area 115 forms the second supporting portion 233 on the middle plate 3. When the intermediate plate 3 is subsequently subjected to secondary processing (e.g., cutting), a monopolar plate having a different structure can be formed to meet different demands of users.
The first support portion forming region 114 and the third support portion forming region 112b are located between the first small cavity opening forming region 112a and the flow field forming region 111, the second support portion forming region 115 and the fourth support portion forming region 113b are located between the second small cavity opening forming region 113a and the flow field forming region 111, so that on the intermediate plate 3, the first support portion 231 and the third support portion 232 are located between the first small cavity opening cutting region 311 and the flow field region 211, and the second support portion 233 and the fourth support portion 234 are located between the second small cavity opening cutting region 321 and the flow field region 211. When the user performs a secondary process (e.g., cutting) on the intermediate plate 3, the user can cut the first pocket cut region 31 to form the first large pocket 25, or can cut the first small pocket cut region 311 to form the first small pocket 24, and the user can cut the second pocket cut region 32 to form the second large pocket 27, or can cut the second small pocket cut region 321 to form the second small pocket 26. Thus, by cutting different positions of the intermediate plate 3, a unipolar plate can be formed with asymmetric cavity openings, which means that the structures of the first and second cavity openings on both sides of the flow field region 211 in the unipolar plate are not exactly the same. Thus, the forming die 1 in the embodiment of the application facilitates the formation of the unipolar plate of the asymmetric cavity opening.
Meanwhile, the middle plate 3 prepared by the forming die 1 has universality, so that a plurality of dies for forming the single-pole plate are not required, only one die for forming the anode plate and one die for forming the cathode plate are required, the design period of the dies is shortened, the development cost of the custom die can be reduced by using the forming die 1, and the waste of production resources is avoided. In a specific embodiment, as shown in fig. 1-4, the first cavity forming area 112 is raised relative to the surface of the forming mold 1, and the first small cavity forming area 112a is a first groove 116 disposed in the first cavity forming area 112; the second cavity forming area 113 is raised relative to the surface of the forming mold 1, and the second small cavity forming area 113a is a second groove 117 disposed in the second cavity forming area 113.
In the embodiment of the present application, the first cavity mouth forming area 112 and the second cavity mouth forming area 113 are both raised on the surface of the forming mold 1, so that a corresponding concave area can be formed on the middle plate 3 as shown in fig. 5, and the concave areas are respectively a first cavity mouth cutting area 31 and a second cavity mouth cutting area 32; the first and second port forming regions 112a and 113a are recessed from the surfaces of the first and second port forming regions 112 and 113, respectively, so that a raised region corresponding to the first and second port cutting regions 311 and 321 can be formed on the intermediate plate 3 as shown in fig. 5. The concave-convex structure formed by the concave area and the convex area can play a role in positioning on the middle plate 3, and the edges of the first cavity opening cutting area 31 and the second cavity opening cutting area 32 and the edges of the first small cavity opening cutting area 311 and the second small cavity opening cutting area 321 can play a role in positioning. Therefore, the possibility of machining errors occurring when the intermediate plate 3 is subjected to secondary machining can be reduced, thereby improving the production yield of the unipolar plate.
Specifically, as shown in fig. 2 to 3, each of the first support forming region 114, the second support forming region 115, the third support forming region 112b and the fourth support forming region 113b includes a plurality of third grooves 118 arranged at intervals so that a region corresponding thereto, which may be specifically a bump corresponding to the third groove 118, can be formed on the intermediate plate 3 as shown in fig. 5 so as to play a supporting role when two unipolar plates are assembled into a bipolar plate, and the bumps are arranged at intervals in the width direction of the intermediate plate 3 so as to form flow paths between adjacent two bumps for the flow of fluid.
In a specific embodiment, as shown in fig. 1-4, a fourth groove 119 is formed between the first support portion forming region 114 and the third support portion forming region 112b, and a fifth groove 1110 is formed between the second support portion forming region 115 and the flow field forming region 111, so that a raised region corresponding to the raised region can be formed on the intermediate plate 3 as shown in fig. 5, and can play a supporting role when the two unipolar plates are assembled into a bipolar plate, and can cooperate with the above-mentioned raised blocks to form a fluid channel, so as to facilitate inflow and outflow of fluid.
In a specific embodiment, as shown in fig. 1 to 4, a sixth groove 1111 is formed between the adjacent first cavity opening forming regions 112, and a seventh groove 1112 is formed between the adjacent second cavity opening forming regions 113, so that a raised region corresponding to the sixth groove 1111 and the seventh groove 1112 can be formed on the middle plate 3 as shown in fig. 5, and the raised region can be specifically a bump corresponding to the sixth groove 1111 and the seventh groove 1112, so that when two unipolar plates are assembled into a bipolar plate, the adjacent first cavity opening and the adjacent second cavity opening are isolated, the possibility of fluid diversion to other cavity openings is reduced, and the tightness between the adjacent cavity openings is improved. The outer periphery of the shaped region 11 has an eighth recess 1113 to enable a raised region corresponding thereto to be formed on the intermediate plate 3 as shown in fig. 5, which raised region may specifically be a bump corresponding to the eighth recess 1113 to seal the bipolar plate when the two unipolar plates are assembled into the bipolar plate, reducing the possibility of fluid leakage within the bipolar plate. Specifically, the fourth groove 119, the fifth groove 1110, the sixth groove 1111, the seventh groove 1112 and the eighth groove 1113 communicate with each other so as to communicate with each other between the convex regions corresponding thereto on the intermediate plate 3 as shown in fig. 5, thereby forming a whole, avoiding the existence of gaps between the convex regions corresponding to the respective grooves, and further improving the sealability of the bipolar plate when the two monopolar plates are assembled into the bipolar plate.
In a specific embodiment, as shown in fig. 1 to fig. 4, the first cavity opening forming area 112, the second cavity opening forming area 113, the first small cavity opening forming area 112a and the second small cavity opening forming area 113a are all rectangular, so that each cavity opening on the unipolar plate is rectangular, the positions of each cavity opening forming area are convenient to arrange, meanwhile, space can be saved, the area of each cavity opening forming area is larger in a limited space, the area of each cavity opening on the final unipolar plate is larger, the flow speed of fluid in the bipolar plate is improved, and the reaction efficiency is improved.
In one possible design, the first cavity opening forming area 112, the second cavity opening forming area 113, the first small cavity opening forming area 112a and the second small cavity opening forming area 113a may also be in other polygonal shapes such as triangle, circle, etc., and may specifically be set according to the shapes of the cavity openings on the unipolar plate.
Specifically, as shown in fig. 1 to 4, each first cell opening forming region 112a has the same area as each second cell opening forming region 113a, so that the first cell opening cutting region 311 and the second cell opening cutting region 321 having the same area can be formed on the intermediate plate 3 shown in fig. 5; the areas of the first and second cavity forming areas 112 and 113 are the same so that the first and second cavity cutting areas 31 and 32 can be formed on the intermediate plate 3 as shown in fig. 5. The area of each cavity opening cutting area is larger than that of each small cavity opening cutting area, and when the middle plate 3 is cut along each small cavity opening cutting area or the middle plate is cut along each cavity opening cutting area, a monopole plate with symmetrical cavity openings can be prepared; after cutting along a part of the small cavity opening cutting area and a part of the cavity opening cutting area on the middle plate 3, a unipolar plate with asymmetric cavity openings can be prepared, namely the unipolar plate comprises a part of the small cavity openings and a part of the large cavity openings. Therefore, when the areas of the first cavity opening forming areas 112a and the second cavity opening forming areas 113a are the same, the application range of the forming mold 1 can be further enlarged when the areas of the first cavity opening forming areas 112 and the second cavity opening forming areas 113 are the same, so as to obtain monopole plates with different plate types, thereby meeting different requirements of users.
Specifically, the forming mold 1 includes a cathode mold and an anode mold, the corresponding grooves of which have different depths, and the corresponding protrusions of which have different heights. So that the monopolar plates prepared by the cathode mould and the anode mould can be matched with each other, and the stability and reliability of connection between bipolar plate components are improved. Meanwhile, because the depth of the corresponding grooves is different, the heights of the corresponding protrusions are different, and after the cathode die and the monopolar plate prepared by the anode die are matched with each other, a gap exists between the bipolar plate components, so that fluid can flow through the inside of the bipolar plate and react.
The embodiment of the application also provides a processing method of the unipolar plate, which comprises the following steps:
s1: stamping the plate by using a forming die 1 to form an intermediate plate 3 comprising a flow field region 211, a first cavity opening cutting region 31, a second cavity opening cutting region 32, a first supporting part 231 and a second supporting part 233 as shown in fig. 5, wherein the first cavity opening cutting region 31 and the second cavity opening cutting region 32 are positioned at two sides of the flow field region 211, the first cavity opening cutting region 31 comprises a first small cavity opening cutting region 311 and a third supporting part cutting region 312, the second cavity opening cutting region 32 comprises a second small cavity opening cutting region 321 and a fourth supporting part cutting region 322, the first supporting part 231 is positioned between the flow field region 211 and the third supporting part cutting region 312, and the second supporting part 233 is positioned between the flow field region 211 and the fourth supporting part cutting region 322;
S2: the first cavity opening cutting area 31 of the middle plate 3 is cut to form N small cavity openings and M large cavity openings, and the second cavity opening cutting area 32 of the middle plate 3 is cut to form M small cavity openings and N large cavity openings.
In the embodiment of the application, after the plate is punched by the forming die 1, the middle plate 3 including the flow field region 211, the first cavity opening cutting region 31, the second cavity opening cutting region 32, the first supporting portion 231 and the second supporting portion 233 can be formed, and a user can perform secondary processing on the middle plate 3 according to different requirements, so that monopole plates with different structures can be obtained, and different requirements of the user can be met. Specifically, as shown in fig. 5, when the user cuts the same-sized region from the first and second pocket cut regions 31 and 32, a bipolar plate having symmetrical pocket openings can be obtained, thereby preparing a bipolar plate having symmetrical pocket openings; when a user cuts the first cavity opening cutting area 31 of the middle plate 3 into areas with different sizes, N small cavity openings and M large cavity openings are formed, and when the second cavity opening cutting area 32 of the middle plate 3 cuts the areas with different sizes, after the M small cavity openings and the N large cavity openings are formed, a single pole plate with an asymmetric cavity opening can be obtained, and when an anode single pole plate and a cathode single pole plate with the asymmetric cavity opening are assembled, a bipolar plate with the asymmetric cavity opening can be obtained.
The number of the small cavity openings in the first cavity opening cutting area 31 is consistent with the number of the large cavity openings in the second cavity opening cutting area 32, and the number of the large cavity openings in the first cavity opening cutting area 31 is consistent with the number of the small cavity openings in the first cavity opening cutting area 31, so that the small cavity openings in the first cavity opening cutting area 31 are communicated with the large cavity openings in the second cavity opening cutting area 32, and the large cavity openings in the first cavity opening cutting area 31 are communicated with the small cavity openings in the first cavity opening cutting area 31 to form a fluid flow channel. Specifically, each small cavity opening is a fluid inlet cavity opening, each large cavity opening is a fluid outlet cavity opening, so that fluid can enter from the small cavity opening and flow out from the large cavity opening through the flow field region 211, and the fluid outlet cavity opening is a large-area large cavity opening which is beneficial to the outflow of the fluid out of the bipolar plate assembly, so that the flow rate of the fluid in the bipolar plate is improved, the reaction of the bipolar plate assembly is further accelerated, and the service performance of the bipolar plate assembly is improved.
In a specific embodiment, the step S2 specifically includes:
s21: the first small cavity port 24 is formed by cutting along the edge of the first small cavity port cutting region 311, the first large cavity port 25 is formed by cutting along the edge of the first cavity port cutting region 31, the second small cavity port 26 is formed by cutting along the edge of the second small cavity port cutting region 321, and the second large cavity port 27 is formed by cutting along the edge of the second cavity port cutting region 32.
In the embodiment of the present application, in the cut monopolar plate, the first small cavity port 24 and the first large cavity port 25 are arranged at intervals, the second small cavity port 26 and the second large cavity port 27 are arranged at intervals, the first small cavity port 24 is communicated with the second large cavity port 27, the second small cavity port 26 is communicated with the first large cavity port 25, for example, in the embodiment shown in fig. 6-9, the first small cavity port 24 and the second small cavity port 26 are a cooling liquid inlet 213, an air inlet 214 and a hydrogen inlet 215, the first large cavity port 25 and the second large cavity port 27 are a cooling liquid outlet 216, an air outlet 217 and a hydrogen outlet 212, and the inlets and the outlets of the cavity ports can be arranged on the same side so that the flow channels of the fluids are staggered with each other, and the flow directions are opposite. Fluid flows from the ends of the flow field region 211 to the middle, which shortens the time for the fluid to react, thereby further accelerating the reaction rate of the fluid in the bipolar plate assembly.
The embodiment of the present application provides a unipolar plate, as shown in fig. 6-8, where the unipolar plate 2 is manufactured by using the processing method of the unipolar plate described above, the unipolar plate 2 includes a flow area 21, the flow area 21 includes a flow field area 211, a plurality of first cavity openings and a plurality of second cavity openings, and the first cavity openings and the second cavity openings are distributed on two sides of the flow field area 211 along the length direction of the unipolar plate 2; the first cavity ports comprise N first small cavity ports 24 and M first large cavity ports 25, and the second cavity ports comprise M second small cavity ports 26 and N second large cavity ports 27.
In the embodiment of the present application, along the length direction of the unipolar plate 2, one side of the flow field area 211 has N first small cavity openings 24 and M first large cavity openings 25, and the other side has M second small cavity openings 26 and N second large cavity openings 27, so that the unipolar plate 2 has asymmetric cavity openings, thereby improving the distribution condition of fluid, optimizing the management of fluid, and improving the performance of the bipolar plate assembled by the unipolar plate 2. Specifically, the number of the first small cavity openings 24 and the number of the second large cavity openings 27 of the unipolar plate 2 are identical, and the number of the first large cavity openings 25 and the number of the second small cavity openings 26 are identical, so that each of the first small cavity openings 24 and each of the second large cavity openings 27 of the unipolar plate 2 are communicated, and each of the first large cavity openings 25 and each of the second small cavity openings 26 are communicated, thereby forming a channel for fluid flow. In a specific embodiment, the first small cavity port 24 and the second small cavity port 26 are fluid inlet ports, and the first large cavity port 25 and the second large cavity port 27 are fluid outlet ports, so that the flowing directions of different fluids are opposite, so as to improve the reaction rate of the fluids, promote the fluids to flow out of the bipolar plate assembly, and improve the flowing speed of the fluids.
In a specific embodiment, as shown in fig. 6-8, the side of the first cell port 24 near the flow field region 211 has a first support 231 and a third support 232, and the side of the second cell port 26 near the flow field region 211 has a second support 233 and a fourth support 234; the side of the first large cavity port 25 near the flow field region 211 has a first support 231 and the side of the second large cavity port 27 near the flow field region 211 has a second support 233.
In the embodiment of the present application, the first small cavity port 24 and the second small cavity port 26 are obtained by cutting the middle plate 3 shown in fig. 5 along the edges of the first small cavity port cutting area 311 and the second small cavity port cutting area 321, so that two supporting parts are respectively arranged between the first small cavity port 24, the second small cavity port 26 and the flow field area 211 for supporting in the bipolar plate assembly; the first large cavity opening 25 and the second large cavity opening 27 are obtained by cutting the middle plate 3 along the edges of the first cavity opening cutting area 31 and the second cavity opening cutting area 32 respectively as shown in fig. 5, so that the first small cavity opening cutting area 311 is cut off together with the third supporting part cutting area 312, the second small cavity opening cutting area 321 is cut off together with the fourth supporting part cutting area 322, and a supporting part is arranged between the first large cavity opening 25, the second large cavity opening 27 and the flow field area 211 for supporting in the bipolar plate assembly. Therefore, the first support 231 and the second support 233 are located between the flow field region 211 and the cavity port, regardless of whether cutting is performed along the smaller cavity port cutting area or the larger cavity port cutting area, so that the unipolar plate 2 can be arbitrarily changed in plate shape while having the support, thereby satisfying different demands of users.
In a specific embodiment, as shown in fig. 6 to 8, each of the first support portion 231, the second support portion 233, the third support portion 232 and the fourth support portion 234 includes a plurality of protrusions spaced apart in the width direction of the unipolar plate 2, so as to play a supporting role when two unipolar plates 2 are assembled into a bipolar plate, and channels for inflow or outflow of fluid are provided between adjacent two of the protrusions, which is advantageous for distribution of fluid and reduces the possibility of uneven flow of fluid in each channel.
In a specific embodiment, as shown in fig. 6 to 10, a first mounting portion 221 is provided between the first support portion 231 and the third support portion 232, and a second mounting portion 222 is provided between the second support portion 233 and the flow field region 211, and the first mounting portion 221 and the second mounting portion 222 are used for mounting the seal 6, so that the seal 6 can be used to reduce leakage of fluid when flowing into or out of the cavity port of the bipolar plate, thereby improving sealability.
Specifically, as shown in fig. 6 to 10, the third mounting portion 223 is provided between the adjacent first cavity openings, the fourth mounting portion 224 is provided between the adjacent second cavity openings, and the sealing member 6 in which the third mounting portion 223 and the fourth mounting portion 224 are used for mounting can reduce the possibility of occurrence of fluid leakage or fluid diversion between the adjacent cavity openings. The fifth mounting portion 225 is provided on the outer periphery of the circulation area 21, and the sealing member 6 mounted on the fifth mounting portion 225 can surround the circulation area 21, so that the sealing performance between the monopolar plate 2 and the membrane electrode 5 or other components is improved, and the possibility that the fluid leaks to the periphery of the circulation area 21 before entering the cavity opening or after exiting the cavity opening is avoided.
In a specific embodiment, the first mounting portion 221, the second mounting portion 222, the third mounting portion 223, the fourth mounting portion 224 and the fifth mounting portion 225 are communicated, so that the sealing member 6 is an integral body, the possibility of gaps between a plurality of sealing members 6 is avoided, the risk of fluid leakage is reduced, and the tightness between the monopolar plate 2 and the membrane electrode 5 or an external device is improved. In addition, the first mounting portion 221, the second mounting portion 222, the third mounting portion 223, the fourth mounting portion 224, and the fifth mounting portion 225 are located on both surfaces of the unipolar plate 2 in the thickness direction with the respective support portions, so that the first mounting portion 221, the second mounting portion 222, the third mounting portion 223, the fourth mounting portion 224, and the fifth mounting portion 225 form a convex structure on the same side of the unipolar plate 2 as the respective support portions for cooperation with the respective support portions on the other unipolar plate 2, thereby improving stability and reliability of connection between the two unipolar plates 2.
Specifically, as shown in fig. 6 to 8, the first mounting portion 221, the second mounting portion 222, the third mounting portion 223, the fourth mounting portion 224, and the fifth mounting portion 225 are located on the first surface 22 of the unipolar plate 2 in the thickness direction, and as shown in fig. 9, the first mounting portion 221, the second mounting portion 222, the third mounting portion 223, the fourth mounting portion 224, and the fifth mounting portion 225 are used for mounting the sealing member 6 on the first surface 22, so that the unipolar plate 2 passes through the sealing member 6 and is connected with the membrane electrode 5 or other components, and the sealability between the two is improved; the support portion is located on the second surface 23 of the monopole plate 2 in the thickness direction, and is used for supporting when the monopole plates 2 are in fit connection, so that fluid can flow between the second surfaces 23 of the monopole plates 2.
Wherein the first mounting portion 221, the second mounting portion 222, the third mounting portion 223, the fourth mounting portion 224 and the fifth mounting portion 225 are grooves facing the first surface 22 so as to accommodate the sealing member 6, and a protrusion is formed at one side of the second surface 23 so as to cooperate with the second surface 23 of the other unipolar plate 2 to form a sealing area, thereby reducing the possibility of fluid leakage.
The embodiment of the present application also provides a bipolar plate assembly, as shown in fig. 6 to 9, the bipolar plate assembly 4 includes a cathode plate 41 and an anode plate 42 stacked and connected in a thickness direction of the bipolar plate assembly 4, and the cathode plate 41 and the anode plate 42 are the monopolar plates 2 described above;
in the embodiment of the present application, the first small cavity port 24 of the cathode plate 41 is communicated with the second small cavity port 26 of the anode plate 42, the first large cavity port 25 of the cathode plate 41 is communicated with the second large cavity port 27 of the anode plate 42, and the flow field region 211 of the cathode plate 41 and the flow field region 211 of the anode plate 42 form a reaction region of the bipolar plate assembly 4. Specifically, as shown in fig. 6-9, the flow field region 211, the hydrogen outlet 212, the coolant inlet 213, the air inlet 214, the hydrogen inlet 215, the coolant outlet 216, and the air outlet 217 of the cathode plate 41 correspond to the flow field region 211, the hydrogen outlet 212, the coolant inlet 213, the air inlet 214, the hydrogen inlet 215, the coolant outlet 216, and the air outlet 217 of the anode plate 42, thereby forming respective fluid inlet and outlet chamber ports and reaction regions in the bipolar plate assembly 4. Wherein the inlets of the fluids are small cavity openings, and the outlets of the fluids are large cavity openings, so that the flow speed of hydrogen, air and cooling liquid in the bipolar plate assembly 4 is improved. In addition, in the bipolar plate assembly 4, the flow direction of the hydrogen gas is opposite to the flow direction of the air and the cooling liquid, so that the reaction rate of the three in the reaction zone is improved.
In one possible design, the flow direction of the cooling liquid is opposite to the flow direction of the hydrogen gas and the air, or the flow direction of the air is opposite to the flow direction of the hydrogen gas and the cooling liquid, and the application is not limited herein. In addition, the positions and the sizes of the fluid inlet and the fluid outlet can be arranged randomly according to the requirements of users.
Specifically, as shown in fig. 6 to 9, the first mounting portion 221 of the cathode plate 41 is offset from the second mounting portion 222 of the anode plate 42, and the second mounting portion 222 of the cathode plate 41 is offset from the first mounting portion 221 of the anode plate 42 so that the first mounting portion 221 of the cathode plate 41 can abut against the second supporting portion 233 of the anode plate 42, and the second mounting portion 222 of the cathode plate 41 can abut against the first supporting portion 231 of the anode plate 42, thereby forming a channel for fluid flow. When the first mounting portion 221 and the second mounting portion 222 of the cathode plate 41 are offset from the second mounting portion 222 and the first mounting portion 221 of the anode plate 42, the first mounting portion 221 and the second mounting portion 222 of the cathode plate 41 can be prevented from abutting the second mounting portion 222 and the first mounting portion 221 of the anode plate 42 during assembly of the cathode plate 41 and the anode plate 42, and the channel for fluid flow can be prevented from being sealed.
More specifically, as shown in fig. 9, the first, second, third, fourth, and fifth mounting portions 221, 222, 223, 224, and 225 are grooves toward the first surface 22, and the first, second, third, fourth, and fifth mounting portions 221, 222, 223, 224, and 225 form first, second, third, fourth, and fifth bumps 235, 236, 237, 238, and 239, respectively, on one side of the second surface 23; the first support 231 of the cathode plate 41 is abutted against the second projection 236 of the anode plate 42, the second support 233 of the cathode plate 41 is abutted against the first projection 235 of the anode plate 42, the third projection 237 of the cathode plate 41 is abutted against the fourth projection 238 of the anode plate 42, the fourth projection 238 of the cathode plate 41 is abutted against the third projection 237 of the anode plate 42, and the fifth projection 239 of the cathode plate 41 is abutted against the fifth projection 239 of the anode plate 42.
In the embodiment of the application, the second surfaces 23 of the cathode plate 41 and the anode plate 42 are respectively provided with a first bump 235, a second bump 236, a third bump 237, a fourth bump 238 and a fifth bump 239, wherein the first supporting portion 231 of the cathode plate 41 is abutted against the second bump 236 of the anode plate 42, and the second supporting portion 233 of the cathode plate 41 is abutted against the first bump 235 of the anode plate 42 to form a channel for fluid flow between each cavity and the reaction zone, and meanwhile, the function of distributing fluid is also achieved to promote the reaction of the fluid in the reaction zone. Specifically, the plurality of protrusions on the first and second support portions 231, 233 of the cathode plate 41 abut against the second and first protrusions 236, 235 of the anode plate 42, thereby forming a plurality of through holes, and the plurality of through holes are arranged at intervals in the width direction along the bipolar plate assembly 4. The third protrusion 237 of the cathode plate 41 abuts against the fourth protrusion 238 of the anode plate 42, and the fourth protrusion 238 of the cathode plate 41 abuts against the third protrusion 237 of the anode plate 42 to separate each cavity opening, so that each cavity opening is an independent cavity opening, the tightness between the cavity openings is improved, the possibility that the fluid reacts between entering the reaction areas is reduced, and thus, each fluid can fully react in the bipolar plate assembly 4, and the performance of the bipolar plate assembly 4 is optimized. The fifth projection 239 of the cathode plate 41 and the fifth projection 239 of the anode plate 42 abut, so that the cathode plate 41 and the circulation zone 21 of the anode plate 42 form a closed space, the possibility of fluid leakage from each cavity opening or reaction zone is reduced, and the tightness of the connection between the bipolar plate assemblies 4 is improved.
The above description is only of the preferred embodiments of the present application and is not intended to limit the present application, but various modifications and variations can be made to the present application by those skilled in the art. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present application should be included in the protection scope of the present application.
Claims (19)
1. The forming die is characterized in that the forming die (1) comprises a forming area (11), the forming area (11) comprises a flow field forming area (111), a plurality of first cavity opening forming areas (112) and a plurality of second cavity opening forming areas (113) are respectively arranged on two sides of the flow field forming area (111), a first supporting part forming area (114) is arranged between the flow field forming area (111) and the first cavity opening forming area (112), and a second supporting part forming area (115) is arranged between the flow field forming area (111) and the second cavity opening forming area (113);
the first cavity mouth forming area (112) comprises a first small cavity mouth forming area (112 a) and a third supporting part forming area (112 b), the third supporting part forming area (112 b) is located between the first small cavity mouth forming area (112 a) and the first supporting part forming area (114), the second cavity mouth forming area (113) comprises a second small cavity mouth forming area (113 a) and a fourth supporting part forming area (113 b), and the fourth supporting part forming area (113 b) is located between the second small cavity mouth forming area (113 a) and the second supporting part forming area (115).
2. The molding die of claim 1, wherein the first cavity port molding zone (112) is raised relative to a surface of the molding die (1), the first small cavity port molding zone (112 a) being a first groove (116) provided in the first cavity port molding zone (112);
the second cavity opening forming area (113) is protruded relative to the surface of the forming die (1), and the second small cavity opening forming area (113 a) is a second groove (117) arranged in the second cavity opening forming area (113).
3. The molding die of claim 1, wherein the first support molding zone (114), the second support molding zone (115), the third support molding zone (112 b), and the fourth support molding zone (113 b) each comprise a plurality of third grooves (118) disposed at intervals.
4. A forming die according to claim 3, characterized in that a fourth groove (119) is provided between the first support forming zone (114) and the third support forming zone (112 b), and a fifth groove (1110) is provided between the second support forming zone (115) and the flow field forming zone (111).
5. The molding die according to claim 4, characterized in that a sixth groove (1111) is provided between adjacent first cavity port molding regions (112), a seventh groove (1112) is provided between adjacent second cavity port molding regions (113), and an eighth groove (1113) is provided at the outer periphery of the molding region (11);
the fourth groove (119), the fifth groove (1110), the sixth groove (1111), the seventh groove (1112), and the eighth groove (1113) communicate.
6. The molding die of claim 1, wherein the first cavity port molding zone (112), the second cavity port molding zone (113), the first cell cavity port molding zone (112 a), and the second cell cavity port molding zone (113 a) are each rectangular.
7. The molding die of claim 6, wherein each of the first small cavity port molding regions (112 a) and each of the second small cavity port molding regions (113 a) have the same area, and each of the first cavity port molding regions (112) and each of the second cavity port molding regions (113) have the same area.
8. The forming die according to claim 2, characterized in that the forming die (1) comprises a cathode die and an anode die, the depth of the corresponding grooves is different, and the height of the corresponding protrusions is different.
9. A method for processing a monopole plate using the forming die according to any one of claims 1 to 8, the method comprising:
stamping a plate by adopting a forming die (1) to form an intermediate plate (3) comprising a flow field region (211), a first cavity opening cutting region (31), a second cavity opening cutting region (32), a first supporting part (231) and a second supporting part (233), wherein the first cavity opening cutting region (31) and the second cavity opening cutting region (32) are positioned at two sides of the flow field region (211), the first cavity opening cutting region (31) comprises a first small cavity opening cutting region (311) and a third supporting part (232) cutting region, the second cavity opening cutting region (32) comprises a second small cavity opening cutting region (321) and a fourth supporting part (234) cutting region, the first supporting part (231) is positioned between the flow field region (211) and the third supporting part (232) cutting region, and the second supporting part (233) is positioned between the flow field region (211) and the fourth supporting part (234) cutting region;
cutting the first cavity opening cutting area (31) of the middle plate (3) to form N small cavity openings and M large cavity openings, and cutting the second cavity opening cutting area (32) of the middle plate (3) to form M small cavity openings and N large cavity openings.
10. The method of processing a unipolar plate according to claim 9, characterised in that it comprises, when cutting the first and second pocket cutting zones (31, 32) of the intermediate plate (3):
and cutting along the edge of the first small cavity opening cutting area (311) to form a first small cavity opening (24), cutting along the edge of the first cavity opening cutting area (31) to form a first large cavity opening (25), cutting along the edge of the second small cavity opening cutting area (321) to form a second small cavity opening (26), and cutting along the edge of the second cavity opening cutting area (32) to form a second large cavity opening (27).
11. A unipolar plate, characterized in that the unipolar plate (2) is manufactured by the method for manufacturing a unipolar plate according to claim 9 or 10, the unipolar plate (2) comprising a flow-through region (21), the flow-through region (21) comprising a flow field region (211), a plurality of first and second cavity openings distributed on both sides of the flow field region (211) along the length direction of the unipolar plate (2);
the first cavity openings comprise N first small cavity openings (24) and M first large cavity openings (25), and the second cavity openings comprise M second small cavity openings (26) and N second large cavity openings (27).
12. The unipolar plate of claim 11, characterized in that the side of the first cell port (24) adjacent the flow field region (211) has a first support (231) and a third support (232), and the side of the second cell port (26) adjacent the flow field region (211) has a second support (233) and a fourth support (234);
a first supporting part (231) is arranged on one side, close to the flow field area (211), of the first large cavity opening (25), and a second supporting part (233) is arranged on one side, close to the flow field area (211), of the second large cavity opening (27).
13. The unipolar plate according to claim 12, characterized in that the first support (231), the second support (233), the third support (232) and the fourth support (234) each include a plurality of projections disposed at intervals along the width direction of the unipolar plate (2).
14. The unipolar plate of claim 12, characterized in that there is a first mounting portion (221) between the first support portion (231) and the third support portion (232), a second mounting portion (222) between the second support portion (233) and the flow field region (211), the first mounting portion (221) and the second mounting portion (222) being for mounting a seal (6).
15. The unipolar plate of claim 14, characterized in that a third mounting portion (223) is provided between adjacent ones of the first apertures, a fourth mounting portion (224) is provided between adjacent ones of the second apertures, and a fifth mounting portion (225) is provided on an outer periphery of the flow-through region (21);
the first mounting part (221), the second mounting part (222), the third mounting part (223), the fourth mounting part (224) and the fifth mounting part (225) are communicated, and are positioned on two surfaces of the monopole plate (2) along the thickness direction with the supporting parts.
16. The unipolar plate according to claim 15, characterized in that the first mounting portion (221), the second mounting portion (222), the third mounting portion (223), the fourth mounting portion (224) and the fifth mounting portion (225) are located at a first surface (22) of the unipolar plate (2) in the thickness direction, and the support portion is located at a second surface (23) of the unipolar plate (2) in the thickness direction;
the first mounting part (221), the second mounting part (222), the third mounting part (223), the fourth mounting part (224) and the fifth mounting part (225) are grooves facing the first surface (22), and a bump is formed on one side of the second surface (23).
17. A bipolar plate assembly, characterized in that the bipolar plate assembly (4) comprises a cathode plate (41) and an anode plate (42) which are stacked and connected in a thickness direction of the bipolar plate assembly (4), the cathode plate (41) being the monopolar plate (2) of any one of claims 11-16, the anode plate (42) being the monopolar plate (2) of any one of claims 11-16;
the first small cavity opening (24) of the cathode plate (41) is communicated with the second small cavity opening (26) of the anode plate (42), the first large cavity opening (25) of the cathode plate (41) is communicated with the second large cavity opening (27) of the anode plate (42), and the flow field region (211) of the cathode plate (41) and the flow field region (211) of the anode plate (42) form a reaction region of the bipolar plate assembly (4).
18. The bipolar plate assembly according to claim 17, wherein in the cathode plate (41) and the anode plate (42), a side of the first small cavity port (24) adjacent to the flow field region (211) has a first support portion (231) and a third support portion (232), a side of the second small cavity port (26) adjacent to the flow field region (211) has a second support portion (233) and a fourth support portion (234), a side of the first large cavity port (25) adjacent to the flow field region (211) has a first support portion (231), and a side of the second large cavity port (27) adjacent to the flow field region (211) has a second support portion (233);
A first mounting part (221) is arranged between the first supporting part (231) and the third supporting part (232), a second mounting part (222) is arranged between the second supporting part (233) and the flow field region (211), a third mounting part (223) is arranged between the adjacent first cavity openings, a fourth mounting part (224) is arranged between the adjacent second cavity openings, and a fifth mounting part (225) is arranged on the periphery of the circulation region (21);
the first mounting part (221), the second mounting part (222), the third mounting part (223), the fourth mounting part (224) and the fifth mounting part (225) are all used for mounting the sealing element (6), the first mounting part (221) of the cathode plate (41) is staggered with the second mounting part (222) of the anode plate (42), and the second mounting part (222) of the cathode plate (41) is staggered with the first mounting part (221) of the anode plate (42).
19. The bipolar plate assembly according to claim 18, wherein the first mounting portion (221), the second mounting portion (222), the third mounting portion (223), the fourth mounting portion (224) and the fifth mounting portion (225) are located at a first surface (22) of the unipolar plate (2) in a thickness direction, and the support portion is located at a second surface (23) of the unipolar plate (2) in the thickness direction;
The first mounting part (221), the second mounting part (222), the third mounting part (223), the fourth mounting part (224) and the fifth mounting part (225) are grooves facing the first surface (22), and the first mounting part (221), the second mounting part (222), the third mounting part (223), the fourth mounting part (224) and the fifth mounting part (225) form a first bump (235), a second bump (236), a third bump (237), a fourth bump (238) and a fifth bump (239) on one side of the second surface (23) respectively;
the first supporting part (231) of the cathode plate (41) is abutted with the second lug (236) of the anode plate (42), the second supporting part (233) of the cathode plate (41) is abutted with the first lug (235) of the anode plate (42), the third lug (237) of the cathode plate (41) is abutted with the fourth lug (238) of the anode plate (42), the fourth lug (238) of the cathode plate (41) is abutted with the third lug (237) of the anode plate (42), and the fifth lug (239) of the cathode plate (41) is abutted with the fifth lug (239) of the anode plate (42).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310718291.7A CN116441429B (en) | 2023-06-16 | 2023-06-16 | Forming die, machining method of monopolar plate, and monopolar plate and bipolar plate assembly |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310718291.7A CN116441429B (en) | 2023-06-16 | 2023-06-16 | Forming die, machining method of monopolar plate, and monopolar plate and bipolar plate assembly |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN116441429A CN116441429A (en) | 2023-07-18 |
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| CN116441429A (en) | 2023-07-18 |
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