CN116411913A - Automatic control integrated device for in-situ leaching uranium mining and gas injection - Google Patents
Automatic control integrated device for in-situ leaching uranium mining and gas injection Download PDFInfo
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- CN116411913A CN116411913A CN202111661194.6A CN202111661194A CN116411913A CN 116411913 A CN116411913 A CN 116411913A CN 202111661194 A CN202111661194 A CN 202111661194A CN 116411913 A CN116411913 A CN 116411913A
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- 238000002347 injection Methods 0.000 title claims abstract description 66
- 239000007924 injection Substances 0.000 title claims abstract description 66
- 229910052770 Uranium Inorganic materials 0.000 title claims abstract description 26
- JFALSRSLKYAFGM-UHFFFAOYSA-N uranium(0) Chemical compound [U] JFALSRSLKYAFGM-UHFFFAOYSA-N 0.000 title claims abstract description 26
- 238000002386 leaching Methods 0.000 title claims description 24
- 238000011065 in-situ storage Methods 0.000 title claims description 21
- 238000005065 mining Methods 0.000 title claims description 18
- 239000007788 liquid Substances 0.000 claims abstract description 160
- 238000006243 chemical reaction Methods 0.000 claims description 3
- 230000006698 induction Effects 0.000 claims 1
- 238000000605 extraction Methods 0.000 abstract description 4
- 238000005429 filling process Methods 0.000 abstract description 2
- 239000007789 gas Substances 0.000 description 99
- 238000000034 method Methods 0.000 description 21
- 230000008569 process Effects 0.000 description 17
- 230000001276 controlling effect Effects 0.000 description 3
- 238000012423 maintenance Methods 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000010992 reflux Methods 0.000 description 3
- 230000006978 adaptation Effects 0.000 description 2
- 238000007599 discharging Methods 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- UBAZGMLMVVQSCD-UHFFFAOYSA-N carbon dioxide;molecular oxygen Chemical compound O=O.O=C=O UBAZGMLMVVQSCD-UHFFFAOYSA-N 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
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Classifications
-
- E—FIXED CONSTRUCTIONS
- E21—EARTH OR ROCK DRILLING; MINING
- E21B—EARTH OR ROCK DRILLING; OBTAINING OIL, GAS, WATER, SOLUBLE OR MELTABLE MATERIALS OR A SLURRY OF MINERALS FROM WELLS
- E21B43/00—Methods or apparatus for obtaining oil, gas, water, soluble or meltable materials or a slurry of minerals from wells
- E21B43/28—Dissolving minerals other than hydrocarbons, e.g. by an alkaline or acid leaching agent
-
- E—FIXED CONSTRUCTIONS
- E21—EARTH OR ROCK DRILLING; MINING
- E21B—EARTH OR ROCK DRILLING; OBTAINING OIL, GAS, WATER, SOLUBLE OR MELTABLE MATERIALS OR A SLURRY OF MINERALS FROM WELLS
- E21B43/00—Methods or apparatus for obtaining oil, gas, water, soluble or meltable materials or a slurry of minerals from wells
- E21B43/25—Methods for stimulating production
- E21B43/255—Methods for stimulating production including the injection of a gaseous medium as treatment fluid into the formation
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/20—Recycling
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- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Geology (AREA)
- Mining & Mineral Resources (AREA)
- Physics & Mathematics (AREA)
- Environmental & Geological Engineering (AREA)
- Fluid Mechanics (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Abstract
The invention relates to the field of on-site uranium extraction, in particular to an on-site uranium extraction and gas injection automatic control integrated device. The device comprises: an inlet of the gas flow controller is connected with a gas source pipeline, and an outlet of the gas flow controller is connected with a one-way valve and a buffer container in sequence; the flow signal controller is connected with the gas flow controller; the buffer container is a transparent pressure-resistant container, the top end of the buffer container is connected with the one-way valve, the side surface of the buffer container is connected with the gas outlet pipeline, and the bottom end of the buffer container is connected with the liquid discharge outlet pipeline; an upper liquid level switch and a lower liquid level switch are respectively arranged on the side wall of the buffer container according to the upper liquid level and the lower liquid level; the upper liquid level switch is sequentially connected with the relay and the electromagnetic valve for gas; the electromagnetic valve for gas is arranged on the gas outlet pipeline; the lower liquid level switch is sequentially connected with the relay and the liquid electromagnetic valve; the liquid solenoid valve is arranged on the liquid discharge outlet pipeline. The invention improves the automation degree, the effectiveness and the control precision of the gas filling process and reduces the risk of manual operation.
Description
Technical Field
The invention relates to the field of on-site uranium extraction, in particular to an on-site uranium extraction and gas injection automatic control integrated device.
Background
In the process of in-situ leaching uranium mining, oxygen, carbon dioxide or other gases are generally required to be injected into a pressurized injection pipeline according to the requirements of the process. And under the condition that the ambient temperature and the pressure of the liquid injection pipeline are continuously changed, the stable and continuous addition of the gas into the liquid injection pipeline is ensured. In the existing in-situ leaching uranium gas filling process, the phenomenon of liquid returning to a gas control device and a pipeline often occurs in a liquid filling pipeline, so that the pipeline is scaled and the instrument is polluted.
In order to solve the problem, an additional backflow prevention device is adopted in the early stage, and a manual method is adopted to timely discharge backflow liquid [ an in-situ leaching uranium gas control system and method (ZL 201811602366.0) ]. However, in actual operation, manual monitoring and manual discharge of the reflux liquid are carried out for a long time, so that not only is the labor intensity high, but also the operation precision and real-time adjustment of the reflux liquid are limited; secondly, the flow rate of the fluid in the liquid injection pipeline is affected by various factors, and the flow rate is not constant, so that the content of the gas in the fluid is uneven; and lack corresponding measures in terms of installation, safety and maintenance.
Disclosure of Invention
The invention aims to solve the technical problems that: the automatic control integrated device for the in-situ leaching uranium mining and gas injection improves the automation degree, the effectiveness and the control precision of the gas injection process, and reduces the risk of manual operation.
The invention provides an automatic control integrated device for in-situ leaching uranium mining and gas injection, which comprises the following components:
an inlet of the gas flow controller is connected with a gas source pipeline, and an outlet of the gas flow controller is connected with a one-way valve and a buffer container in sequence;
the flow signal controller is connected with the gas flow controller and is used for receiving the injection flow output signal and outputting a conversion control signal to the gas flow controller;
the buffer container is a transparent pressure-resistant container, the top end of the buffer container is connected with the one-way valve, the side surface of the buffer container is connected with the gas outlet pipeline, and the bottom end of the buffer container is connected with the liquid discharge outlet pipeline;
an upper liquid level switch and a lower liquid level switch are respectively arranged on the side wall of the buffer container according to the upper liquid level and the lower liquid level;
the upper liquid level switch is sequentially connected with the relay and the electromagnetic valve for gas; the electromagnetic valve for gas is arranged on the gas outlet pipeline;
the lower liquid level switch is sequentially connected with the relay and the liquid electromagnetic valve; the liquid solenoid valve is arranged on the liquid discharge outlet pipeline.
Preferably, the method further comprises: and the gas flow integrating instrument is connected with the gas flow controller.
Preferably, the device further comprises a housing:
the air flow controller, the flow signal controller, the buffer container, the upper liquid level switch and the lower liquid level switch are all arranged in the shell.
Preferably, a liquid level observation window is formed in the side face of the shell, and the position of the liquid level observation window corresponds to the position of the buffer container.
Preferably, the wall thickness of the inductors of the upper liquid level switch and the lower liquid level switch is 15mm, and the liquid level sensing precision is 1.0mm.
Preferably, the upper liquid level switch is a capacitance switch, a photoelectric switch or an ultrasonic switch;
the working voltage of the upper potential switch is 5-24V, the low level range is 0-0.25V, and the high level range is 5-24V.
Preferably, the lower liquid level switch is a capacitance switch, a photoelectric switch or an ultrasonic switch;
the working voltage of the lower potential switch is 5-24V, the low level range is 0-0.25V, and the high level range is 5-24V.
Preferably, the buffer container has a volume of 50 to 500mL and a wall thickness of 0.5 to 1.5cm.
Preferably, the power of the electromagnetic valve for gas is 12-30W, and the pressure resistance is 1.6Mpa.
Preferably, the power of the electromagnetic valve for liquid is 12-30W, and the pressure resistance is 1.6Mpa.
Compared with the prior art, the automatic control integrated device for the in-situ leaching uranium mining and gas injection can automatically discharge the reflux liquid in the in-situ leaching gas injection process and recover gas injection; meanwhile, the automatic adjustment of the gas flow is controlled in real time through the size of the liquid injection amount, so that the gas can be uniformly injected into the liquid; in addition, the integrated device has compact structure, safe use, convenient installation and convenient maintenance. The device improves the automation and the precision degree of the ground immersion gas injection process, reduces the manual intervention, and ensures the long-term, stable and safe operation of the gas injection process. The invention can also be applied to other industrial production or gas control automation processes in the test process.
Drawings
FIG. 1 shows a structural diagram of an on-site leaching uranium mining gas injection automatic control integrated device;
FIG. 2 shows a side view of an in-situ leaching uranium injection automatic control integrated device;
in the drawing the view of the figure,
1-an air source interface; 2-a gas flow controller; 3-a gas flow integrating instrument; 4-a one-way valve; 5-a buffer container; 6-a power interface; 7-an upper liquid level switch; 8-a lower liquid level switch; 9-a signal line; 10-a flow signal controller; 11-a gas outlet line; 12-an air electromagnetic valve; 13-a relay; 14-electromagnetic valve for liquid; 15-a liquid discharge outlet pipeline; 16-liquid level observation window.
Detailed Description
For a further understanding of the present invention, embodiments of the invention are described below in conjunction with the examples, but it should be understood that these descriptions are merely intended to illustrate further features and advantages of the invention, and are not limiting of the invention.
The invention is mainly used for automatically discharging the backflow liquid generated by pressure fluctuation of the liquid injection pipeline and recovering gas injection when gas is injected into the liquid injection pipeline in the uranium leaching process, and the gas flow can be automatically adjusted along with the size of the liquid injection amount, so that the gas can be ensured to be uniformly injected into the liquid. Meanwhile, the device is convenient to install, maintain and reduce manual intervention, and ensures long-term stable and safe operation in the gas injection process.
The embodiment of the invention discloses an automatic control integrated device for in-situ leaching uranium mining and gas injection, which is shown in fig. 1 and comprises the following components:
the inlet of the gas flow controller 2 is connected with the gas source pipeline 1, and the outlet is sequentially connected with the one-way valve 4 and the buffer container 5;
the flow signal controller 10 is connected with the gas flow controller 2 and is used for receiving the injection flow output signal and outputting a conversion control signal to the gas flow controller;
the flow rate signal controller 10 is a relay device for receiving the injection flow rate output signal, and outputs a switching control signal to the gas flow rate controller 2 to control the gas flow rate;
the flow signal controller 10 can realize positive feedback control on the gas flow according to the flow of the injected liquid, wherein the corresponding relation of the gas flow and the liquid flow is set according to the leaching process parameters.
And a gas flow integrating instrument 3, wherein the gas flow integrating instrument 3 is connected with the gas flow controller 2.
The buffer container 5 is a transparent pressure-resistant container, the top end of the buffer container is connected with the one-way valve 4, the side surface of the buffer container is connected with the gas outlet pipeline 11, and the bottom end of the buffer container is connected with the liquid discharge outlet pipeline 15;
the buffer container 5 has a volume of 50-500 mL and a wall thickness of 0.5-1.5 cm.
An upper liquid level switch 7 and a lower liquid level switch 8 are respectively arranged on the side wall of the buffer container 5 according to the upper liquid level and the lower liquid level;
the upper liquid level switch 7 is sequentially connected with a relay 13 and an air electromagnetic valve 12; the gas electromagnetic valve 12 is arranged on the gas outlet pipeline 11;
the upper liquid level switch 7 is a circuit component with the diameter of about 2cm and the thickness of about 1cm, and can be adhered to the wall of the buffer container 5;
the wall thickness of the inductors of the upper liquid level switch 7 and the lower liquid level switch 8 is 15mm, and the liquid level sensing precision is 1.0mm.
The upper liquid level switch 7 is a capacitance switch, a photoelectric switch or an ultrasonic switch;
the working voltage of the upper potential switch 7 is 5-24V, the low level range is 0-0.25V, and the high level range is 5-24V.
The power of the electromagnetic valve 12 for gas is 12-30W, and the pressure resistance is 1.6Mpa. The pneumatic solenoid valve 12 is a pilot normally closed solenoid valve, and when the gas pressure is higher than the injection pressure, the solenoid valve can be driven to open by a relay through the action of an internal member of the solenoid valve.
The lower liquid level switch 8 is sequentially connected with the relay 12 and the liquid electromagnetic valve 14; the liquid solenoid valve 14 is provided in a liquid discharge outlet line 15.
The lower liquid level switch 8 is a circuit component with the diameter of about 2cm and the thickness of about 1cm, and can be adhered to the wall of the buffer container;
the lower liquid level switch 8 is a capacitance switch, a photoelectric switch or an ultrasonic switch;
the working voltage of the lower potential switch 8 is 5-24V, the low level range is 0-0.25V, and the high level range is 5-24V.
The power of the electromagnetic valve 14 for liquid is 12-30W, and the pressure resistance is 1.6Mpa.
Preferably, the device further comprises a housing:
the gas flow controller 2, the flow signal controller 10, the buffer container 5, the upper liquid level switch 7 and the lower liquid level switch 8 are all arranged in the shell.
The panel of the gas flow integrating instrument 3 is inlaid on the surface of the shell.
As shown in fig. 2, a liquid level observation window 16 is formed on the side surface of the housing, and the position of the liquid level observation window 16 corresponds to the position of the buffer container. The liquid level observation window 16 is transparent glass positioned on the panel of the integrated device shell, and can observe the liquid level change in the buffer container.
The back of the housing is provided with a power interface 6 for powering the elements.
The gas injection automatic control integrated device is characterized in that gas enters a buffer container through a gas controller and a one-way valve and is injected into a liquid injection pipeline through a gas outlet pipeline and a gas electromagnetic valve; the back flow liquid enters the buffer container through the outlet gas pipeline and the electromagnetic valve for gas, and is discharged through the liquid discharge outlet pipeline and the electromagnetic valve for liquid.
The integrated control device has the following automatic and manual control processes:
1. and connecting and installing pipelines. An inlet of the gas flow controller is connected with a gas source pipeline, and an outlet of the gas flow controller is sequentially connected with a one-way valve and a buffer container; the buffer container is stuck with an upper liquid level switch at the upper limit of the liquid level, a lower liquid level switch is stuck at the lower limit of the liquid level, the upper liquid level switch and the lower liquid level switch are connected with a high-low level relay, and an air electromagnetic valve for controlling a gas outlet pipeline and a liquid electromagnetic valve for a liquid discharge outlet pipeline are realized through level signal combination; meanwhile, the injection flow rate signal is connected to the gas flow rate controller through the flow rate signal controller.
2. And (5) normal operation control. When the buffer container is filled with liquid, the upper liquid level switch and the lower liquid level switch are both low-level signals, the electromagnetic valve for controlling the liquid by the relay is in a closed state, and the electromagnetic valve for controlling the liquid is in a closed state because the air pressure is smaller than the injection pressure; and opening an air source, enabling air to enter the buffer container through the air flow control system and the one-way valve, and opening an air solenoid valve to perform normal air injection after the air pressure reaches the injection pressure. Meanwhile, the flow signal controller converts and outputs the injection flow signal to the gas control system, and correspondingly adjusts the gas flow.
3. Draining and recovering gas injection. When the injection liquid or the gas injection pressure fluctuates, the liquid flows back to the gas path and enters the buffer container through the gas electromagnetic valve and the pipeline. When the liquid level in the buffer container rises to the upper liquid level switch position, the upper liquid level switch and the lower liquid level switch both output high-level signals to the relay, the relay drives the electromagnetic valve for closing the gas, and simultaneously, the electromagnetic valve for opening the liquid is used for discharging the liquid; when the liquid level in the buffer container drops to the position of the lower liquid level switch, the upper liquid level switch and the lower liquid level switch both output low-level signals to the relay, the relay drives to close the electromagnetic valve for liquid, and after the air pressure in the buffer container rises to the injection pressure, the relay drives to open the electromagnetic valve for air, so that air is injected into the injection pipeline.
4. And (5) manual control. During operation of the integrated device, the liquid level can be observed through a liquid level window of the panel of the device, and the electromagnetic valve is manually opened or closed through a panel button. For example, the electromagnetic valve for gas can be closed manually, and then the electromagnetic valve for liquid is opened to drain liquid; after the liquid discharge is finished, the electromagnetic valve for liquid is manually closed, the electromagnetic valve for gas is manually opened after the air pressure in the buffer container is stable, and the gas injection is recovered.
For a further understanding of the present invention, the following examples are provided to illustrate the present invention in detail, and the scope of the present invention is not limited by the following examples.
Example 1
Connecting a gas controller gas source interface 1 in the integrated device to a gas source; connecting a signal line 9 to the signal output of the injection flowmeter; connecting the gas outlet line 11 to the liquid injection line; when the power is turned on, the gas solenoid valve 12 and the liquid solenoid valve 14 are both in the closed state.
Opening a gas source, enabling the gas to pass through the gas controller 2 and enter the buffer container 5 at a flow rate controlled by the flow signal controller 10; when no liquid exists in the buffer container 5, the upper liquid level switch and the lower liquid level switch are low-level signals, and at the moment, the relay 13 respectively sends an opening signal and a closing signal to the air electromagnetic valve 12 and the liquid electromagnetic valve 14; the liquid electromagnetic valve 14 is in a closed state, when the air pressure in the buffer container 5 is slightly larger than the injection pressure, the air electromagnetic valve 12 is opened under the control of the relay 13, and air is injected into the liquid; when the liquid injection flow rate is changed, the corresponding gas flow rate automatically adjusts along with the dissolved gas concentration parameter set in the flow signal controller 10.
In the gas injection operation process, liquid flows back into the buffer container 5 along the gas outlet pipeline 11 and the gas pilot electromagnetic valve 12 due to fluctuation of the injection pressure and the injection flow and the like; when the liquid level reaches the upper liquid level switch position, the upper liquid level switch and the lower liquid level switch are both high-level signals, and at the moment, the relay 13 respectively sends a closing signal and an opening signal to the air electromagnetic valve 12 and the liquid electromagnetic valve 14; after the gas solenoid valve 12 is closed, liquid is prevented from continuing to return to the buffer container 5, and simultaneously the liquid solenoid valve 14 is opened to drain liquid through the liquid drain outlet pipeline 15.
When the liquid level in the buffer container 5 is discharged below the lower liquid level switch 8, the upper liquid level switch and the lower liquid level switch are both low-level signals, and at the moment, the liquid electromagnetic valve 14 is closed; when the air pressure rises to the injection pressure, the air solenoid valve 12 is opened to resume the injection.
In the running process of the integrated device, the gas flow is automatically regulated by a flow signal controller; the high-low level trigger relay is utilized to logically control the opening and closing of the electromagnetic valve through the combination of high-low level signals given by the upper liquid level switch and the lower liquid level switch; when the air pressure is larger than the injection pressure, the air-used pilot electromagnetic valve of the air outlet pipeline can be utilized to enable the internal components to act, and the electromagnetic valve is opened under the control of the high-low level trigger relay, so that the phenomenon that liquid flows back due to the opening of the electromagnetic valve when the air pressure is relatively low can be avoided.
The embodiment shows that the gas injection integrated device improves the automation and the precision degree of the ground immersion gas injection process, has the characteristics of real-time controllability, safety, reliability, stable performance and convenience in maintenance, and can meet the requirements of the gas injection process in the actual production or test process.
The above description of the embodiments is only for aiding in the understanding of the method of the present invention and its core ideas. It should be noted that it will be apparent to those skilled in the art that various modifications and adaptations of the invention can be made without departing from the principles of the invention and these modifications and adaptations are intended to be within the scope of the invention as defined in the following claims.
The previous description of the disclosed embodiments is provided to enable any person skilled in the art to make or use the present invention. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the generic principles defined herein may be applied to other embodiments without departing from the spirit or scope of the invention. Thus, the present invention is not intended to be limited to the embodiments shown herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.
Claims (10)
1. Automatic control integrated device for in-situ leaching uranium mining and gas injection, which is characterized by comprising:
an inlet of the gas flow controller is connected with a gas source pipeline, and an outlet of the gas flow controller is connected with a one-way valve and a buffer container in sequence;
the flow signal controller is connected with the gas flow controller and is used for receiving the injection flow output signal and outputting a conversion control signal to the gas flow controller;
the buffer container is a transparent pressure-resistant container, the top end of the buffer container is connected with the one-way valve, the side surface of the buffer container is connected with the gas outlet pipeline, and the bottom end of the buffer container is connected with the liquid discharge outlet pipeline;
an upper liquid level switch and a lower liquid level switch are respectively arranged on the side wall of the buffer container according to the upper liquid level and the lower liquid level;
the upper liquid level switch is sequentially connected with the relay and the electromagnetic valve for gas; the electromagnetic valve for gas is arranged on the gas outlet pipeline;
the lower liquid level switch is sequentially connected with the relay and the liquid electromagnetic valve; the liquid solenoid valve is arranged on the liquid discharge outlet pipeline.
2. The in-situ leaching uranium mining and gas injection automatic control integrated device of claim 1, further comprising: and the gas flow integrating instrument is connected with the gas flow controller.
3. The in-situ leaching uranium mining and gas injection automatic control integrated device of claim 1, further including a housing:
the air flow controller, the flow signal controller, the buffer container, the upper liquid level switch and the lower liquid level switch are all arranged in the shell.
4. The automatic control integrated device for in-situ leaching uranium mining and gas injection according to claim 3, wherein a liquid level observation window is formed in the side face of the shell, and the position of the liquid level observation window corresponds to the position of the buffer container.
5. The automatic control integrated device for in-situ leaching uranium mining and gas injection according to claim 1, wherein the wall thickness of the inductor of the upper liquid level switch and the lower liquid level switch is 15mm, and the liquid level induction precision is 1.0mm.
6. The automatic control integrated device for in-situ leaching uranium mining and gas injection according to claim 5, wherein the upper liquid level switch is a capacitance switch, a photoelectric switch or an ultrasonic switch;
the working voltage of the upper potential switch is 5-24V, the low level range is 0-0.25V, and the high level range is 5-24V.
7. The automatic control integrated device for in-situ leaching uranium mining and gas injection according to claim 5, wherein the lower liquid level switch is a capacitance switch, a photoelectric switch or an ultrasonic switch;
the working voltage of the lower potential switch is 5-24V, the low level range is 0-0.25V, and the high level range is 5-24V.
8. The automatic control integrated device for in-situ leaching uranium mining and gas injection according to claim 1, wherein the buffer container has a volume of 50-500 mL and a wall thickness of 0.5-1.5 cm.
9. The automatic control integrated device for in-situ leaching uranium mining and gas injection according to claim 1, wherein the power of the electromagnetic valve for gas is 12-30W, and the pressure resistance is 1.6Mpa.
10. The automatic control integrated device for in-situ leaching uranium mining and gas injection according to claim 1, wherein the power of the liquid electromagnetic valve is 12-30W, and the pressure resistance is 1.6Mpa.
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Cited By (1)
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CN118167256A (en) * | 2024-03-25 | 2024-06-11 | 核工业北京化工冶金研究院 | On-site leaching uranium mining gas flow control system and control method thereof |
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CN118167256A (en) * | 2024-03-25 | 2024-06-11 | 核工业北京化工冶金研究院 | On-site leaching uranium mining gas flow control system and control method thereof |
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