CN1164040A - Orientation layer of liquid crystal display unit and making method thereof - Google Patents
Orientation layer of liquid crystal display unit and making method thereof Download PDFInfo
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- CN1164040A CN1164040A CN 96104920 CN96104920A CN1164040A CN 1164040 A CN1164040 A CN 1164040A CN 96104920 CN96104920 CN 96104920 CN 96104920 A CN96104920 A CN 96104920A CN 1164040 A CN1164040 A CN 1164040A
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Abstract
A method for manufacturing the orientation layer of liquid crystal display (LCD) features that a light mask with changeable luminousness is made up by lithograph and has orientation lines in different directions to different colour pixels. The light mask is used to expose the photoresist gradually in incremental or decremental mode and deep etching is used to remove photoresist to obtain orientation lines with pre-inclination. Said orientation layer also has the multi-area division and phase difference compensation actions. Its advantages include simple process, low cost and effective improvement of colour contrast and reduction of colour interference.
Description
The present invention relates to a kind of orientation layer of liquid crystal display unit (LCD Aligner) and preparation method thereof, make the required making step of LCD oriented layer to significantly reduce, to reduce cost of manufacture, method for making of the present invention is simple and easy, and key is to utilize litho (Lithography) art and the manufacturing of dark etching (Etchback) method.
In the flat-panel screens technological development, include Field Emission Display (FED at present; Field Emission Display), plasma display (PDP; PlasmaDisplay) and LCD (LCD; Liquid Crystal Display) etc., wherein comparatively ripe with the LCD technology again, by product and the market sale value that LCD uses, all grow up with multiple every year, can find out its importance, wherein film crystal formula LCD (TFT LCD; Thin Film Transistor Liquid Crystal Display) color and quality is enough to and cathode-ray tube (CRT) (CRT; Cathode Ray Tube) competition, but that LCD is subject to the visual angle width is not enough, nowadays still can't replace the product of most of CRT, the major defect of CRT product are that volume is big, Heavy Weight etc.
Tradition TET LCD product is to utilize liquid crystal molecule rotation mode (TN mode; Twist Nematic mode) alignment characteristics, control the arrangement of liquid crystal molecule in modes such as making alives, and then whether control light is by the liquid crystal in display, and show the shading value of LCD picture, its principle of work is described as follows: at first, please refer to shown in Fig. 1 (a), when between the power-on and power-off pole plate not during applying bias, behind the light A process polaroid B that light source is injected, then parallel with the polar biased direction of polaroid B light can pass through, and by the light of polaroid B, will rotate 90 degree along with its phasing degree of rotation arrangement liquid crystal molecule C, so be able to by with the polaroid D of phase differential 90 degree of polaroid B, make lcd screen produce bright picture.
Please refer to shown in Fig. 1 (b), when being added with bias voltage between the upper/lower electrode, the optical axis of liquid crystal molecule C can be arranged in the same direction, lose the optically-active effect, so incident ray A via polaroid B after, can't pass the polaroid D that spends with the phase differential 90 of polaroid B, and make lcd screen produce black dull picture.
Between the power-on and power-off pole plate, rotate 90 degree so have the liquid crystal molecule C of rotation mode, mainly be the lines that are subject to the oriented layer on the battery lead plate, line orientations on the oriented layer is mutually 90 degree up and down, the interior liquid crystal molecule of oriented layer lines can present the arrangements that rotation 90 is spent so part is bumped into up and down, hence one can see that, and the structure of oriented layer plays an important role in the principle of work of LCD.
Traditional fabrication orientation layer of liquid crystal display unit method, be utilize vacuum deposition method on substrate E, to deposit oriented layer F or utilize roller (roller) and the rotation methods such as (spin), (material of this oriented layer generally is polyamide (polyimide) to cloth last layer oriented layer F on substrate E, please read shown in Fig. 1 (a), afterwards, utilize the modes such as optical orientation of brushing method (Rubbing method) again with felt or grating, oriented layer is orientated, promptly formulate the lines G (please refer to Fig. 2 (b), arrow direction indication brushing direction among the figure) of oriented layer.Wherein, if the oriented layer F of LCD is not cut apart (please refer to shown in Fig. 3 (a)), then the observer is by diverse location (that is different visual angles) A
1, A
2And A
3The light penetration rate that is measured and (shown in Fig. 3 (b)) inequality; In addition, please refer to shown in Fig. 3 (c), (transverse axis is represented different angulars field of view, Z-axis is represented the color and luster contrast of light penetration LCD, same dotted line represented this LCD light and shade contrast equipotential curve, and (for example: lightness is decided to be 16/16, more secretly be decided to be 313/16, more secretly be decided to be 1/16 or the like), solid line is represented the sharpness of different visual angles scope), light and shade contrast and sharpness that the lcd screen that the observer is watched in the different visual angles scope has been described are all inequality, and this figure has also illustrated problems such as the asymmetric and visual angle width in visual angle is not enough.Therefore, at above LCD shortcoming, the someone proposes to utilize dual area (TD; Twp domain) or the liquid crystal molecule of multizone rotation mode (shown in Fig. 4 (a), be divided into regional H and area I) be used for improving the angular field of view of LCD, LCD with this oriented layer structure produces improves aspect the visual angle really greatly (shown in Fig. 4 (b).But because up and down two substrates utilizes the brushing legal system to make multizone division alignment layer, need the above brushing step at least three roads, so complicated step can increase cost of manufacture and man-hour (shown in Fig. 4 (c), the arrow direction is represented the brushing direction, substrate E, oriented layer F, photoresistance J, oriented layer lines G).In addition, classic method be with phase difference compensation film solve colored multifrequency source (as white light) the different light of the frequency spectrum that sent, and cause different spectral light (for example: red, blue and green etc. light) together after the incident, can be inconsistent along the liquid crystal anglec of rotation, the feasible different problem of each frequency spectrum light intensity that drops on the same point screen.Please refer to shown in Fig. 5 (a), it is decomposing schematic representation (this LCD synoptic diagram that is added with the LCD of one deck or two-layer phase difference compensation film (retardation film), comprise: polaroid B, phase difference compensation film K and oriented layer F or the like, wherein phase difference compensation film K can singly use one deck K
1Or two-layer K
2One reinstates), wherein application phase difference compensate film can be compensated the light anglec of rotation of different frequency, to improve the color and luster contrast, also can make visual angle of liquid crystal display broader simultaneously, shown in Fig. 5 (b).
Located by prior art generally is to utilize brushing method (rubbing method) to make the oriented layer of multizone in order to improve LCD visual angle broadness degree, needs the above brushing step at least three roads, and its step is complicated and cost is high; In addition, in order to compensate the different frequency light anglec of rotation and to improve the color and luster contrast, use extra phase difference compensation film, this compensate film can make the cost of equipment, processing procedure, material increase, and does not meet economic benefit.
Fundamental purpose of the present invention is to provide the method for making of the simple orientation layer of liquid crystal display unit of a kind of method for making.
Another object of the present invention is to provide the method for making of the low orientation layer of liquid crystal display unit of a kind of cost.
The LCD oriented layer that provides a kind of performance good is provided.
Four of purpose of the present invention be to provide a kind of supply to be used in to make have that the orientation multizone is cut apart and the light shield of the LCD alignment films of phase difference compensation effect.
For achieving the above object, the present invention takes following measure:
The method for making of oriented layer of the present invention, one of embodiment, its step is described as follows: (1) at first, cloth last layer oriented layer basic material on the LCD battery lead plate; (2) coating one deck photoresist is on basic material; (3) utilize the energy of strict control electron beam (electron beam), make asymptotic expression and change transmittance oriented layer lines light shield; (4) then, use light shield of the present invention in modes such as tradition exposures, to being arranged in the photoresistance exposure on the battery lead plate, wherein, this photoresistance is the exposure that is subjected to the asymptotic expression luminous energy; (5) after the development, utilize dark etching (Etchback) mode not select the ionic reaction etching mode (RIE of ratio; Reactive Ion Etch) the oriented layer vertical direction is carried out the etching of equal altitudes, remove part photoresistance and partially oriented layer basic material; (6) remove remaining photoresistance, this promptly finishes the making of LCD oriented layer.
The method for making of oriented layer of the present invention, two of embodiment, its step is described as follows: (1) at first, cloth last layer transparent feel photosensitiveness photoresistance is as the oriented layer basic material on the LCD battery lead plate; (2) utilize the energy of strict control electron beam (electron beam), make asymptotic expression and change transmittance oriented layer lines light shield; (3) then, use light shield of the present invention in modes such as tradition exposures, to the transparent feel photosensitiveness photoresistance exposure of cloth on battery lead plate, wherein, this photoresistance is subjected to the exposure of asymptotic time amount; 4) utilize when developing, remove the part photoresistance; This promptly finishes the making of LCD oriented layer.
Orientation layer of liquid crystal display unit of the present invention has following characteristic: phase difference compensation one different colours pixel, its oriented layer has the different directions lines, the differential seat angle of these different directions lines, just in time compensate different colours and pass through the phase differential of oriented layer optically-active up and down, this promptly reaches the compensating action of different colours light phase difference.
The making of light shield is as one among the present invention: at first, the pairing pixel of light shield is divided into two zones or two more than the zone, and in each zone, be covered with and desire the required lines of etching oriented layer, wherein, make the light shield line orientations of oriented layer up and down and inequality (its direction depends on the needs, it specifies in the detailed description of the invention part), then each zone with about 150 millimeters joule to 50 millijoules of electron beam (electron beam) energy about, rise from an end of light shield line image with the asymptotic expression beam energy change along this lines scanning (for example: electron beam whenever move 0.5 micron then energy reduce (or increasing) 1 millijoule) to this lines other end, wherein, beam energy in each sector scanning changes and can depend on the needs, and zones of different can be made different beam energies and change; So, promptly obtain each area relative light shield lines, the variable quantity difference of its unit length iuuminting rate replaces tradition with brushing legal system oriented layer pixel area with this mode.
Reaching embodiment in conjunction with the accompanying drawings is described as follows the present invention:
Brief Description Of Drawings:
Figure 1A: the liquid crystal of LCD during impressed voltage, does not produce the factor synoptic diagram of bright picture;
Figure (b) produces the synoptic diagram of dark picture when being added with voltage for liquid crystal.
Fig. 2: known brushing legal system is made the principle of work synoptic diagram (arrow direction indication brushing direction among the figure) of LCD oriented layer.
Fig. 3: commonly use and have the not shortcoming synoptic diagram of the LCD of division alignment layer, wherein Fig. 3 (a) is A from different perspectives
1, A
2And A
3Measure the light transmittance synoptic diagram; Fig. 3 (b) is for representing from the light penetration rate that different visual angle measured; The synoptic diagram that concerns by Fig. 3 (c) expression lcd screen color and luster contrast and visual angle.
Fig. 4 (a): the side schematic view of known dual area or multizone oriented layer; Fig. 4 (b) has the LCD that dual area or multizone oriented layer make, the coordinate synoptic diagram of its screen color and luster contrast different visual angles for known utilization; Fig. 4 (c) is for to utilize traditional brushing legal system to make the making step synoptic diagram of dual area or multizone oriented layer.
Fig. 5 (a): the known decomposing schematic representation that is added with the thin film transistor-liquid crystal display of one deck or two-layer phase difference compensation film;
Fig. 5 (b) is for being added with one deck, two-layer and do not add the color and luster degree coordinate synoptic diagram of different visual angles of the film crystal display of compensate film.
Fig. 6: the making step synoptic diagram of orientation layer of liquid crystal display unit of the present invention.
Fig. 7: the schematic top view of orientation layer of liquid crystal display unit of the present invention.
Fig. 8,9: the schematic side view of orientation layer of liquid crystal display unit of the present invention.
Please refer to Fig. 6, it is described as follows for the making step of orientation layer of liquid crystal display unit of the present invention:
(1) please refer to shown in Fig. 6 (a), at first, utilize roller (roller) or spinner (spinner) with rotation or other method, the polyamide (polyimide) on thick about 500 dust to the 2000 Izod right sides of cloth last layer or silicon nitride (SiNx) material on power-on and power-off pole plate 1 are in order to the basic material as this oriented layer;
(2) please refer to shown in Fig. 6 (b) photoresistance 3 on thick about 5000 dust to the 12000 Izod right sides of cloth last layer on the oriented layer basic material;
(3) please refer to shown in Fig. 6 (c), make the light shield of oriented layer under the application etching, at first, with redness (R; Red), blue (B; Blue) and green (G; Green) the pairing pixel of each color (pixel) is divided into two zones, with zone 4 and zone 5 expressions, and be covered with the required parallel lines of etching oriented layer 6 in each zone, and the length of formulating these lines is about 50 microns (μ m) width and is about about 5 microns (μ m);
(4) please refer to shown in Fig. 6 (d), it is a first embodiment of the invention, utilize parallel lines 6 patterns on the oriented layer etching light shield under the Electron Beam Fabrication, at first in zone 4, electron beam (electron beam) begins to scan left from starting point 7 places with energy 150 millijoules (mJ), promptly, electron beam is beaten on the light shield parallel lines, this electron beam whenever moves 0.5 micron then energy reduction 1mJ, reduce beam energy to line in this asymptotic mode and know terminal point 8 places, this moment, beam energy was 50 millijoules (mJ); In zone 5, electron beam begins to scan left from starting point 9 places with energy 50 millijoules (mJ), beat on the light shield parallel lines, whenever move 0.5 micron then beam energy increase 1mJ, increase beam energy to lines terminal point 10 places in asymptotic mode, this moment, beam energy was 150 millijoules, finished with this mode and made the different light shield of pixel lines transmittance, wherein the pixel lines transmittance of this light shield changes situation 25, shown in Fig. 6 (e);
(5) please refer to shown in Fig. 6 (f), it is a second embodiment of the invention, utilize the parallel lines pattern 6 on the oriented layer etching light shield under the Electron Beam Fabrication, at first, in zone 4, electron beam begins to scan left (promptly from starting point 11 places with energy 150 millijoules (mJ), electron beam is beaten on the light shield parallel lines), this electron beam whenever moves 0.5 micron (μ m) then energy reduction 1mj, reduces beam energy to lines terminal point 12 places in asymptotic mode, and this moment, beam energy was 50 millijoules; In zone 5, electron beam begins to scan left (promptly from initial 13 places with energy 130 millijoules (mJ), electron beam is beaten on the light shield parallel lines), this electron beam whenever move 0.5 micron then energy reduce by 0.5 millijoule, reduce beam energy to lines terminal point 14 places in asymptotic mode, this moment, beam energy was 80 millijoules.Finish the different light shield of making pixel lines transmittance with this mode, wherein, the pixel lines transmittance of this light shield changes situation 25, shown in Fig. 6 (g);
(6) then, use light shield of the present invention in modes such as traditional exposure imagings, to being furnished with the lower electrode plate exposure of basic material and photoresistance on it, because the pixel lines transmittance difference on the light shield of the present invention, so after the exposure, luminous energy by each lines of light shield is also different, therefore, and after development, the residual thickness of photoresist is also just different, shown in accompanying drawing 6 (h), it utilizes the light shield pattern of first embodiment of the invention, to the side schematic view of battery lead plate 1 exposure imaging; Shown in accompanying drawing 6 (i), it utilizes the light shield pattern of second embodiment of the present invention, and it is for making the side schematic view of exposure imaging to battery lead plate 1;
(7) then, utilize dark etching (Etchback) mode not select the ionic reaction etching (RIE of ratio; Reactive Ion Etch), carry out the etching of equal altitudes in the oriented layer vertical direction, and then remove removing photoresistance to obtain required line image, please refer to shown in Fig. 6 (i), it utilizes the light shield pattern of first embodiment of the invention, obtain down the side schematic view of oriented layer, each pixel of this time oriented layer has the tilt angle 12 (pretiltangle) of symmetric offset spread; Please refer to shown in Fig. 6 (k), it is the light shield pattern that utilizes second embodiment of the present invention, obtains down the texture edge synoptic diagram of oriented layer, and each pixel of this time oriented layer has two kinds of different tilt angles 12;
(8) next, oriented layer light shield in the making, the similar light shield that is produced on down oriented layer of its manufacture method, also utilize electron beam to come all lines in the etching light shield, the situation that this beam energy changes needs to cooperate the etching inclination angle of the following oriented layer of first and second embodiment, so, when electron beam was applied in the making of oriented layer, its energy variation had two kinds of selections:
First kind of selection:
Please refer to shown in Fig. 6 (l), it is making of going up the oriented layer light shield of the present invention, make the pattern of orientation in order to application, this pattern need cooperate the following oriented layer pattern of first example, at first, in zone 4, electron beam begins to scan left from starting point 15 places with energy 50 millijoules, and this electron beam whenever moves 0.5 micron, and then energy increases by 1 millijoule, increase beam energy to lines terminal point 16 places in asymptotic mode, this moment, beam energy was 150 millijoules; In like manner, in zone 5, electron beam begins to scan left from starting point 17 places with energy 150 millijoules, and this electron beam whenever moves 0.5 micron, and then energy reduces by 1 millijoule, reduce beam energy to lines terminal point 18 places in asymptotic mode, this moment, beam energy was 50 millijoules, finished with this mode and made the different light shield of pixel lines transmittance, wherein, this light shield pixel lines transmittance changes situation 25, shown in Fig. 6 (m);
Second kind of selection:
Please refer to shown in Fig. 6 (n), it is making of going up the oriented layer light shield of the present invention, in order to making the pattern of oriented layer, this pattern is in order to cooperate the following oriented layer pattern of second embodiment, at first, in zone 4, electron beam begins to scan left from starting point 19 places with energy 80 millijoules, and this electron beam whenever moves 0.5 micron, and then energy increases by 0.5 millijoule, increase beam energy to lines terminal point 20 places in asymptotic mode, this moment, beam energy was 130 millijoules; In like manner, in zone 5, electron beam begins to scan left from starting point 21 places with 50 joules of energy, this beam energy is to lines terminal point 22 places, this moment, beam energy was 150 millijoules, finish the different light shield of making pixel lines transmittance with this mode, wherein, this light shield pixel lines transmittance changes situation 25 shown in Fig. 6 (o);
(9) light shield of oriented layer on the application embodiment of the invention, in modes such as traditional lithographies, to electric pole plate 1 exposure imaging (shown in Fig. 6 (p) and 6 (r)) that is furnished with basic material and photoresistance on it, afterwards, utilize dark etching mode vertically to do the etching of equal altitudes again, remove the remaining photoresistance 3 of going up oriented layer, to obtain required oriented layer pattern, shown in Fig. 6 (q) and 6 (s);
(10) please refer to shown in Fig. 6 (t), it goes up oriented layer light shield lines angle schematic top view for explanation is of the present invention, light shield lines for the different colours pixel have different optically-active angles, therefore on making during oriented layer, need to consider the light shield lines angle of different colours pixel, at first, according to following formula:
T＝(1+μ
2)
-1Sin
2(Q(1+μ
2)
1/2)
Calculate the anglec of rotation of different colours light;
Wherein
T: light is by the transmittance of LCD
θ: the liquid crystal anglec of rotation
Δ n: optical anisotropy's parameter
Δ n=Ne-No, wherein, Ne is defined as different optical index (exordinary index), and No is defined as ordinary light refractive index (ordinary index)
λ: wavelength of light
D: the distance of oriented layer up and down
And μ=π d Δ n/ θ λ
If, two-layer oriented layer is 5 microns apart from d up and down, and known red light wavelength=650mm, green wavelength=550nm and blue light wavelength=450nm, and when considering that light does not penetrate (T=0) utilize this formula to calculate oriented layer anglec of rotation θ red, blue, green pixel respectively to be
Ruddiness → θ is red=144 degree
Green glow → θ is green=127 degree
The last oriented layer that blue light → θ indigo plant=90 degree is produced with the method has considered that the pixel because of different colours has different angles optically-active effect, so this oriented layer has had the function of phase difference compensation film concurrently, has the phase difference compensation effect to red, indigo plant and green glow.
Please refer to shown in Fig. 6 (u), it is the pattern of the oriented layer up and down side schematic view of first embodiment of the invention, and this Fig. 6 (u) is the combination by the last oriented layer of the following oriented layer of Fig. 6 (i) and Fig. 6 (q).
(v), it is the pattern of the oriented layer up and down side schematic view of second embodiment of the invention, and this Fig. 6 (v) is the combination by the last oriented layer of the following oriented layer of Fig. 6 (k) and Fig. 6 (s) to please refer to Fig. 6.
If with transparent feel photosensitiveness photoresistance as the oriented layer basic material; Be 2,3 parts shown in Fig. 6 (B) both integrate, then can omit Fig. 6 (B) coating photoresistance and not have selection than dark etching step; And in the step of Fig. 6 (h), Fig. 6 (i), Fig. 6 (p) and Fig. 6 (r), directly to transparent feel photosensitiveness photoresist exposure as the oriented layer basic material, processing procedure after so simplifying, can obtain an oriented layer that has with spline structure and performance after the development, its processing procedure is except institute abridged coating photoresistance and do not have selection than the etch-back step, and similar above-mentioned Fig. 6 of all the other steps (a) are to Fig. 6 (v) flow process.
Please refer to shown in Figure 7, it is the schematic top view of orientation layer of liquid crystal display unit of the present invention, explanation is at the pixel of different colours, oriented layer has the lines of different directions on it, utilize this differential seat angle of oriented layer line orientations up and down, reach phase difference compensation (retardation) effect different colours light.
Please refer to Fig. 8, shown in Figure 9, it is the side schematic view of the orientation layer of liquid crystal display unit of first and second embodiment of the present invention, this structure explanation is divided into two or more zones (zone 4, zone 5 at first color pixel (R=red pixel, G=green pixel and B=blue picture element) ...) (Domain), the angle difference of each regional oriented layer lines tilt angle 12.
With respect to located by prior art, the present invention has following effect:
(1) according to located by prior art, be to utilize brushing method (Rubbing Method) division alignment layer, at least need three roads above brushing legal system journey just can finish multizone division alignment layer, yet,, can finish the division alignment layer as long as respectively carry out an etching at the power-on and power-off pole plate because the present invention utilizes litho (Lithography) mode, therefore, only need two procedures, step is simplified, and can reduce manufacturing cost;
(2) known LCD needs extra one to two compensate film, as the phase difference compensation effect, yet, make special LCD oriented layer owing to utilize etching mode, promptly have the phase difference compensation effect, then need not additionally to make again phase difference compensation film, to reduce the additional demand of equipment and materials;
(3) since the present invention utilize etching mode, can so that multizone division alignment layer and phase difference compensation effect finish simultaneously;
(4) oriented layer of the present invention is applied on the LCD, can effectively improve the color and luster contrast (Contrast Ratio) of lcd screen and reduce the visual angle width that color and luster disturbed and increased LCD.
Claims (10)
1, a kind of orientation layer of liquid crystal display unit that is used for color monitor is characterized in that:
Be carved with the orientation lines of different directions of the pixel of corresponding different colours light on the oriented layer basic material, the differential seat angle between these orientation lines plays the compensating action of different colours light phase difference.
2, orientation layer of liquid crystal display unit according to claim 1 is characterized in that: each color pixel all is divided into two or more zones, the angle difference of each regional oriented layer lines tilt angle.
3, orientation layer of liquid crystal display unit according to claim 1 is characterized in that: each color pixel all is divided at least two zones, and each regional oriented layer lines tilt angle becomes symmetric offset spread.
4, orientation layer of liquid crystal display unit according to claim 1 is characterized in that: described oriented layer basic material is the photonasty photoresist.
5, orientation layer of liquid crystal display unit according to claim 1 is characterized in that, described oriented layer basic material is a polyamide.
6, orientation layer of liquid crystal display unit according to claim 1 is characterized in that: described oriented layer basic material is a silicon nitride.
7, a kind of method for making of orientation layer of liquid crystal display unit, its step comprises:
(1) cloth last layer oriented layer basic material on battery lead plate;
(2) cloth last layer photoresist on the oriented layer basic material;
(3) making one can make the light shield that the transmittance asymptotic expression of oriented layer lines changes;
(4) use described light shield, developed with the exposure that Exposure mode makes photoresistance be subjected to gradual luminous energy;
(5) utilize the etching mode that is etched with nothing selection ratio deeply, remove part photoresistance and partially oriented layer basic material;
(6) remove remaining photoresist, on the oriented layer basic material, stay orientation lines with tilt angle.
8, a kind of method for making of orientation layer of liquid crystal display unit, its step comprises:
(1) on battery lead plate cloth last layer transparent feel photosensitiveness photoresist as the oriented layer basic material;
(2) making one can make the light shield that the transmittance asymptotic expression of oriented layer lines changes;
(3) use described light shield, developed with the exposure that traditional Exposure mode makes photoresistance be subjected to the asymptotic expression luminous energy;
(4) the development back stays the orientation lines of tool tilt angle on transparent feel photosensitiveness photoresistance.
9, according to the method for making of claim 7 or 8 described orientation layer of liquid crystal display unit, it is characterized in that, described making is applied in the light shield on the oriented layer, the steps include: to make light shield that each pixel is divided at least two zones, and the transmittance variable quantity difference in each its unit length of area relative light shield lines.
10, according to the method for making of claim 7 or 8 described orientation layer of liquid crystal display unit, it is characterized in that, make described oriented layer lines light shield, its the line orientations of corresponding different colours pixel oriented layer have nothing in common with each other, and the differential seat angle of different directions lines just in time compensates different colours and passes through the phase differential of oriented layer optically-active up and down.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 96104920 CN1062077C (en) | 1996-04-29 | 1996-04-29 | Orientation layer of liquid crystal display unit and making method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 96104920 CN1062077C (en) | 1996-04-29 | 1996-04-29 | Orientation layer of liquid crystal display unit and making method thereof |
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| Publication Number | Publication Date |
|---|---|
| CN1164040A true CN1164040A (en) | 1997-11-05 |
| CN1062077C CN1062077C (en) | 2001-02-14 |
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ID=5118632
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 96104920 Expired - Fee Related CN1062077C (en) | 1996-04-29 | 1996-04-29 | Orientation layer of liquid crystal display unit and making method thereof |
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1308754C (en) * | 2003-11-26 | 2007-04-04 | 友达光电股份有限公司 | Liquid crystal display panel with Gamma correction function and manufacturing method thereof |
| CN1308755C (en) * | 2003-09-04 | 2007-04-04 | 精工爱普生株式会社 | Orientation film forming method,orientation film,substrate for electronic device,liquid crystal panel |
| CN1312513C (en) * | 2003-07-04 | 2007-04-25 | 精工爱普生株式会社 | Liquid crystal device, method for producing the liquid crystal device, and electronic apparatus |
| CN100407014C (en) * | 2005-06-02 | 2008-07-30 | 友达光电股份有限公司 | Liquid crystal display device |
| CN103842858A (en) * | 2011-03-04 | 2014-06-04 | 大日本印刷株式会社 | Long pattern alignment film and long pattern phase difference film using same |
| CN109283749A (en) * | 2018-11-22 | 2019-01-29 | 张家港康得新光电材料有限公司 | A kind of orientation membrane preparation method |
-
1996
- 1996-04-29 CN CN 96104920 patent/CN1062077C/en not_active Expired - Fee Related
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1312513C (en) * | 2003-07-04 | 2007-04-25 | 精工爱普生株式会社 | Liquid crystal device, method for producing the liquid crystal device, and electronic apparatus |
| CN1308755C (en) * | 2003-09-04 | 2007-04-04 | 精工爱普生株式会社 | Orientation film forming method,orientation film,substrate for electronic device,liquid crystal panel |
| CN1308754C (en) * | 2003-11-26 | 2007-04-04 | 友达光电股份有限公司 | Liquid crystal display panel with Gamma correction function and manufacturing method thereof |
| CN100407014C (en) * | 2005-06-02 | 2008-07-30 | 友达光电股份有限公司 | Liquid crystal display device |
| CN103842858A (en) * | 2011-03-04 | 2014-06-04 | 大日本印刷株式会社 | Long pattern alignment film and long pattern phase difference film using same |
| CN103842858B (en) * | 2011-03-04 | 2016-12-07 | 大日本印刷株式会社 | Long strip type pattern orientation film and use its long strip type pattern phase-contrast film |
| CN109283749A (en) * | 2018-11-22 | 2019-01-29 | 张家港康得新光电材料有限公司 | A kind of orientation membrane preparation method |
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| Publication number | Publication date |
|---|---|
| CN1062077C (en) | 2001-02-14 |
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