CN116344668A - Photovoltaic silicon wafer cleaning control system - Google Patents

Photovoltaic silicon wafer cleaning control system Download PDF

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Publication number
CN116344668A
CN116344668A CN202310119613.6A CN202310119613A CN116344668A CN 116344668 A CN116344668 A CN 116344668A CN 202310119613 A CN202310119613 A CN 202310119613A CN 116344668 A CN116344668 A CN 116344668A
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CN
China
Prior art keywords
cleaning
drying
photovoltaic silicon
silicon wafer
devices
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Pending
Application number
CN202310119613.6A
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Chinese (zh)
Inventor
钱诚
李刚
王长江
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Jiangsu Asia Electronics Technology Co Ltd
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Jiangsu Asia Electronics Technology Co Ltd
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Priority to CN202310119613.6A priority Critical patent/CN116344668A/en
Publication of CN116344668A publication Critical patent/CN116344668A/en
Pending legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/1804—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof comprising only elements of Group IV of the Periodic Table
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/041—Cleaning travelling work
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/1876—Particular processes or apparatus for batch treatment of the devices
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electromagnetism (AREA)
  • Cleaning By Liquid Or Steam (AREA)

Abstract

The application relates to a photovoltaic silicon wafer cleaning control system, when setting for the manipulator to snatch and press basket through belt cleaning device and drying device's delivery sequence, need accord with following condition and set up: condition one: all cleaning devices precede all drying devices; condition II: the cleaning device and the drying device located in front must be located earlier than the cleaning device and the drying device located in rear. The first condition limits that the mechanical arm must be cleaned and then dried, and the second condition limits that the movement sequence of the mechanical arm in the working process can only be from front to back, so that the mechanical arm is prevented from reciprocating back and forth, and the production efficiency is improved.

Description

Photovoltaic silicon wafer cleaning control system
Technical Field
The application belongs to the technical field of photovoltaic silicon wafer production equipment, and particularly relates to a photovoltaic silicon wafer cleaning control system.
Background
The wool making cleaning device generally comprises a pre-cleaning device, a cleaning device and a cleaning device, wherein the pre-cleaning device is used for cleaning greasy dirt and metal ions on the surface of a silicon wafer by using acid liquor; the device comprises a texturing and cleaning device, wherein the silicon wafer is firstly washed by water, and then is textured by alkali liquor; a chemical polishing and cleaning device for removing a layer of the surface of the silicon wafer by using alkali liquor containing a composite solvent; the acid cleaning device is used for cleaning the surface of the silicon wafer by using acid liquor containing hydrogen peroxide, and the drying device is used for air-drying and drying the silicon wafer passing through the cleaning device. Wherein the pre-cleaning device, the wool making cleaning device, the chemical polishing cleaning device and the acid cleaning device are all arranged according to the process sequence and can be collectively called as a cleaning device.
The photovoltaic silicon wafer cleaning control system is arranged in a program of a PLC of the wool making cleaning device and is used for controlling the basket conveying device to convey the basket with the photovoltaic silicon wafers to the cleaning device or the drying device sequentially according to the arranged conveying sequence, generally, the wool making cleaning device is customized according to a cleaning process, the basket is required to traverse all the cleaning devices and the drying device, when the process is modified, the program in the PLC is required to be modified, but the conveying sequence after the modified program is not limited in the prior art, so that the reciprocating motion of a manipulator is easy to occur, and the production efficiency of the photovoltaic silicon wafers is reduced.
Reference document: CN115411149A, CN115207154a.
Disclosure of Invention
The invention aims to solve the technical problems that: in order to solve the defects in the prior art, the photovoltaic silicon wafer cleaning control system for ensuring the production efficiency when the cleaning sequence is modified is provided.
The technical scheme adopted for solving the technical problems is as follows:
a photovoltaic silicon wafer cleaning control system for controlling a photovoltaic silicon wafer cleaning apparatus, comprising:
the photovoltaic silicon wafer cleaning equipment comprises a hanging basket carrying device, a plurality of cleaning devices and a plurality of drying devices, wherein the cleaning devices are arranged in a row, the cleaning devices are used for cleaning the photovoltaic silicon wafers, the drying devices are used for drying the cleaned photovoltaic silicon wafers, and the photovoltaic silicon wafer cleaning control system is used for controlling the hanging basket carrying device to convey the hanging basket with the photovoltaic silicon wafers to the cleaning devices or the drying devices;
the photovoltaic silicon wafer cleaning control system comprises:
the working module is used for controlling the hanging basket carrying device to carry the hanging basket with the photovoltaic silicon wafers to sequentially carry the hanging basket of the photovoltaic silicon wafers to the cleaning device or the drying device according to the set conveying sequence;
the setting module is used for setting the conveying sequence, and the conveying sequence is required to be set according with the following conditions:
condition one: all cleaning devices precede all drying devices;
condition II: the cleaning device and the drying device located in front must be located earlier than the cleaning device and the drying device located in rear.
Preferably, the photovoltaic silicon wafer cleaning control system of the invention,
the hanging basket carrying device comprises a conveying rail with a plurality of conveying sections and a manipulator arranged on each conveying section, wherein a connecting area between two adjacent conveying sections is a transition section, the manipulators of two adjacent conveying sections can move to the transition section, one or more cleaning devices or one or more drying devices corresponding to the transition section are arranged, and a setting module is arranged on the conveying sequence and still meets the following conditions: the transport sequence must include at least one washing device or one drying device for all transitions.
Preferably, the photovoltaic silicon wafer cleaning control system provided by the invention has at least one transition section correspondingly comprising at least one cleaning device and at least one drying device, so that the cleaning and drying process time can be freely allocated according to actual conditions.
Preferably, in the photovoltaic silicon wafer cleaning control system, a pre-drying device is further arranged between the cleaning device and the drying device, and the pre-drying device is also positioned at the transition section.
Preferably, the photovoltaic silicon wafer cleaning control system further comprises an adjusting module, wherein the adjusting module is used for adjusting cleaning process parameters and drying process parameters in the cleaning device and the drying device.
Preferably, the photovoltaic silicon wafer cleaning control system further comprises an adjusting module, wherein the adjusting module is used for adjusting cleaning process parameters and drying process parameters in the cleaning device and the drying device.
Preferably, the photovoltaic silicon wafer cleaning control system further comprises an adjusting module, wherein the processing time of the cleaning device corresponding to the transition section and the drying time corresponding to the transition section are not less than the time required for the manipulator to pass through the transition section.
Preferably, the photovoltaic silicon wafer cleaning control system further comprises a correction module, wherein the correction module is used for automatically adjusting unconditional settings into conditioned settings when the conveying sequence is manually set, and synchronously adjusting cleaning process parameters and drying process parameters in the cleaning device and the drying device while adjusting the sequence of the cleaning device and the drying device.
The application also comprises a photovoltaic silicon wafer cleaning control system, wherein the photovoltaic silicon wafer cleaning equipment is wool making cleaning equipment.
The beneficial effects of the invention are as follows:
according to the photovoltaic silicon wafer cleaning control system, when the conveying sequence of the manipulator grabbing press basket passing through the cleaning device and the drying device is set, the following conditions are met: condition one: all cleaning devices precede all drying devices; condition II: the cleaning device and the drying device located in front must be located earlier than the cleaning device and the drying device located in rear. The first condition limits that the mechanical arm must be cleaned and then dried, and the second condition limits that the movement sequence of the mechanical arm in the working process can only be from front to back, so that the mechanical arm is prevented from reciprocating back and forth, and the production efficiency is improved.
Drawings
The technical scheme of the application is further described below with reference to the accompanying drawings and examples.
Fig. 1 is a block diagram of a photovoltaic silicon wafer cleaning control system according to an embodiment of the present application.
Detailed Description
It should be noted that, in the case of no conflict, the embodiments and features in the embodiments may be combined with each other.
The technical solutions of the present application will be described in detail below with reference to the accompanying drawings in combination with embodiments.
Example 1
The embodiment provides a photovoltaic silicon wafer cleaning control system, which is used for controlling a photovoltaic silicon wafer cleaning device, as shown in fig. 1, and comprises:
the photovoltaic silicon wafer cleaning equipment comprises a hanging basket carrying device, a plurality of cleaning devices and a plurality of drying devices, wherein the cleaning devices are arranged in a row, the cleaning devices are used for cleaning the photovoltaic silicon wafers, the drying devices are used for drying the cleaned photovoltaic silicon wafers, and the photovoltaic silicon wafer cleaning control system is used for controlling the hanging basket carrying device to convey the hanging basket with the photovoltaic silicon wafers to the cleaning devices or the drying devices;
the photovoltaic silicon wafer cleaning control system comprises:
the working module is used for controlling the hanging basket carrying device to carry the hanging basket with the photovoltaic silicon wafers to sequentially carry the hanging basket of the photovoltaic silicon wafers to the cleaning device or the drying device according to the set conveying sequence;
the setting module is used for setting the conveying sequence, and the conveying sequence is required to be set according with the following conditions:
condition one: all cleaning devices precede all drying devices;
condition II: the cleaning device and the drying device located in front must be located earlier than the cleaning device and the drying device located in rear.
Such as: an exemplary photovoltaic silicon wafer cleaning apparatus includes a first cleaning tank, a second cleaning tank, a third cleaning tank, a fourth cleaning tank, a fifth cleaning tank, and a first drying tank and a second drying tank in order. When the setting module is set, the conveying sequence can be directly set as the first cleaning tank, the second cleaning tank, the third cleaning tank, the fourth cleaning tank, the fifth cleaning tank, the first drying tank and the second drying tank, and one or more cleaning tanks or drying tanks can be omitted as required, for example: first washing tank-third washing tank-first drying tank-second drying tank. But cannot be set to the following cleaning mode: such as the third cleaning tank-first drying tank-second drying tank, which violates the second condition, the cleaning device and the drying device in the present example are certainly arranged in accordance with the first condition. After the cleaning, the manipulator returns to the original position, and can move from back to front without grabbing the hanging basket.
According to the photovoltaic silicon wafer cleaning control system, the first condition limits that cleaning is needed before drying, the second condition limits that the movement sequence of the manipulator in the working process can only be from front to back, the manipulator is prevented from reciprocating back and forth, and the production efficiency is improved.
The hanging basket carrying device comprises a conveying rail with a plurality of conveying sections and a manipulator arranged on each conveying section, wherein a connecting area between two adjacent conveying sections is a transition section, the manipulators of two adjacent conveying sections can move to the transition section, one or more cleaning devices or one or more drying devices corresponding to the transition section are arranged, and a setting module is arranged on the conveying sequence and still meets the following conditions: the transport sequence must include at least one washing device or one drying device for all transitions. The plurality of conveying sections correspond to the plurality of manipulators, so that the manipulators can simultaneously grasp one flower basket respectively in different conveying sections, and the working efficiency is improved.
That is, all cleaning devices or drying devices in the transition section need to be provided with flower baskets so that the whole basket hanging carrying device can smoothly finish the handover of the mechanical arms of different conveying sections in the transition section.
In the above description of the photovoltaic silicon wafer cleaning apparatus, the first manipulator corresponds to the first cleaning tank, the second cleaning tank, and the third cleaning tank, the second manipulator corresponds to the third cleaning tank, the fourth cleaning tank, and the fifth cleaning tank, the third manipulator corresponds to the fifth cleaning tank, the first drying tank, and the second drying tank, then the transition section corresponds to the third cleaning tank and the fifth cleaning tank, the manipulator must grasp the basket from the third cleaning tank and the fifth cleaning tank to complete the conversion of different manipulators, and then the manipulator must pass through the third cleaning tank and the fifth cleaning tank when the conveying sequence is set, so that the whole cleaning process time can be optimized.
Preferably, at least one transition section comprises at least one cleaning device and at least one drying device, i.e. the transition section must be arranged at the connection part of the cleaning device and the drying device, and the transition section comprises at least two devices, so that the cleaning and drying process time can be freely adapted according to the actual situation.
Preferably, a pre-drying device is also arranged between the washing device and the drying device, and the pre-drying device is also located in the transition section, the pre-drying usually being for draining.
The device also comprises an adjusting module for adjusting the cleaning process parameters and the drying process parameters in the cleaning device and the drying device. The cleaning process parameters generally include cleaning time, type of cleaning fluid, cleaning fluid temperature, and cleaning fluid dosage. The drying process parameters include the problem of blowing gas and drying time.
The automatic cleaning device further comprises a correction module, wherein the correction module is used for automatically adjusting unconditional settings into conditioned settings when the conveying sequence is manually set, and synchronously adjusting cleaning process parameters and drying process parameters in the cleaning device and the drying device while adjusting the sequence of the cleaning device and the drying device. Of course, the final delivery order is determined by the operator.
The correction method of the correction module comprises the following steps:
s1: reading the conveying sequence of the basket carried by the manipulator to the cleaning device and the drying device;
s2: judging that all cleaning devices precede all drying devices, if yes, entering a step S3; if not, adjusting the drying device to all the cleaning devices according to the principle of approach, and then entering the step S3;
s3: judging whether the cleaning device and the drying device with the front positions are earlier than the cleaning device and the drying device with the rear positions, if so, ending; if not, adjusting the sequence of the drying device according to the sequence so as to conform to the cleaning device and the drying device which are earlier than the cleaning device and the drying device which are later in position, and ending;
if the hanging basket carrying device comprises a conveying rail with a plurality of conveying sections and manipulators arranged on each conveying section, the connecting area between every two adjacent conveying sections is a transition section, the manipulators of every two adjacent conveying sections can move to the transition section, one or more cleaning devices or one or more drying devices corresponding to the transition section are added before the end, at least one cleaning device or drying device in the cleaning devices and the drying devices corresponding to all the transition sections is judged to be in a conveying sequence, if yes, the end is achieved, and if not, the cleaning device or the drying device closest to the cleaning device and the drying device corresponding to the transition section is adjusted to the cleaning device and the drying device corresponding to the transition section.
The photovoltaic silicon wafer cleaning equipment is texturing cleaning equipment, namely the photovoltaic silicon wafer cleaning control system is a control system of the texturing cleaning equipment.
With the above-described preferred embodiments according to the present application as a teaching, the related workers can make various changes and modifications without departing from the scope of the technical idea of the present application. The technical scope of the present application is not limited to the contents of the specification, and must be determined according to the scope of claims.
It will be appreciated by those skilled in the art that embodiments of the present application may be provided as a method, system, or computer program product. Accordingly, the present application may take the form of an entirely hardware embodiment, an entirely software embodiment, or an embodiment combining software and hardware aspects. Furthermore, the present application may take the form of a computer program product embodied on one or more computer-usable storage media having computer-usable program code embodied therein.
The present application is described with reference to flowchart illustrations and/or block diagrams of methods, apparatus, and computer program products according to embodiments of the application. It will be understood that each flow and/or block of the flowchart illustrations and/or block diagrams, and combinations of flows and/or blocks in the flowchart illustrations and/or block diagrams, can be implemented by computer program instructions. These computer program instructions may be provided to a processor of a general purpose computer, special purpose computer, embedded processor, or other programmable data processing apparatus to produce a machine, such that the instructions, which execute via the processor of the computer or other programmable data processing apparatus, create means for implementing the functions specified in the flowchart flow or flows and/or block diagram block or blocks.
These computer program instructions may also be stored in a computer-readable memory that can direct a computer or other programmable data processing apparatus to function in a particular manner, such that the instructions stored in the computer-readable memory produce an article of manufacture including instruction means which implement the function specified in the flowchart flow or flows and/or block diagram block or blocks.
These computer program instructions may also be loaded onto a computer or other programmable data processing apparatus to cause a series of operational steps to be performed on the computer or other programmable apparatus to produce a computer implemented process such that the instructions which execute on the computer or other programmable apparatus provide steps for implementing the functions specified in the flowchart flow or flows and/or block diagram block or blocks.

Claims (9)

1. A photovoltaic silicon wafer cleaning control system for controlling a photovoltaic silicon wafer cleaning apparatus, comprising:
the photovoltaic silicon wafer cleaning equipment comprises a hanging basket carrying device, a plurality of cleaning devices and a plurality of drying devices, wherein the cleaning devices are arranged in a row, the cleaning devices are used for cleaning the photovoltaic silicon wafers, the drying devices are used for drying the cleaned photovoltaic silicon wafers, and the photovoltaic silicon wafer cleaning control system is used for controlling the hanging basket carrying device to convey the hanging basket with the photovoltaic silicon wafers to the cleaning devices or the drying devices;
the photovoltaic silicon wafer cleaning control system comprises:
the working module is used for controlling the hanging basket carrying device to carry the hanging basket with the photovoltaic silicon wafers to sequentially carry the hanging basket of the photovoltaic silicon wafers to the cleaning device or the drying device according to the set conveying sequence;
the setting module is used for setting the conveying sequence, and the conveying sequence is required to be set according with the following conditions:
condition one: all cleaning devices precede all drying devices;
condition II: the cleaning device and the drying device located in front must be located earlier than the cleaning device and the drying device located in rear.
2. The photovoltaic silicon wafer cleaning control system according to claim 1, wherein the basket carrier comprises a conveying rail with a plurality of conveying sections and a manipulator arranged on each conveying section, a connecting area between two adjacent conveying sections is a transition section, the manipulators of two adjacent conveying sections can move to the transition section, one or more cleaning devices or one or more drying devices corresponding to the transition section, and the setting module is required to meet the following third: the transport sequence must include at least one washing device or one drying device for all transitions.
3. The photovoltaic wafer cleaning control system of claim 2, wherein at least one transition section comprises at least one cleaning device and at least one drying device.
4. A photovoltaic silicon wafer cleaning control system according to claim 2, wherein a pre-drying device is further provided between the cleaning device and the drying device, and the pre-drying device is also located in the transition section.
5. The photovoltaic wafer cleaning control system of claim 1, further comprising an adjustment module for adjusting the cleaning process parameters and the drying process parameters in the cleaning apparatus and the drying apparatus.
6. The photovoltaic wafer cleaning control system of claim 2, further comprising an adjustment module for adjusting the cleaning process parameters and the drying process parameters in the cleaning apparatus and the drying apparatus.
7. The system of claim 6, further comprising an adjustment module, wherein a processing time of the cleaning device corresponding to the transition section and a drying time corresponding to the transition section are not less than a time required for the manipulator to pass through the transition section.
8. The system of claim 1, further comprising a correction module for automatically adjusting the unconditional settings to the conditioned settings when the delivery sequence is manually set, and for adjusting the sequence of the cleaning device and the drying device while simultaneously adjusting the cleaning process parameters and the drying process parameters in the cleaning device and the drying device.
9. A photovoltaic silicon wafer cleaning control system, characterized in that the photovoltaic silicon wafer cleaning apparatus of any one of claims 1 to 8 is a texturing cleaning apparatus.
CN202310119613.6A 2023-02-15 2023-02-15 Photovoltaic silicon wafer cleaning control system Pending CN116344668A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202310119613.6A CN116344668A (en) 2023-02-15 2023-02-15 Photovoltaic silicon wafer cleaning control system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202310119613.6A CN116344668A (en) 2023-02-15 2023-02-15 Photovoltaic silicon wafer cleaning control system

Publications (1)

Publication Number Publication Date
CN116344668A true CN116344668A (en) 2023-06-27

Family

ID=86892105

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202310119613.6A Pending CN116344668A (en) 2023-02-15 2023-02-15 Photovoltaic silicon wafer cleaning control system

Country Status (1)

Country Link
CN (1) CN116344668A (en)

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