CN116285891A - Cerium oxide@ZIF-8 composite abrasive particles, and preparation method and application thereof - Google Patents

Cerium oxide@ZIF-8 composite abrasive particles, and preparation method and application thereof Download PDF

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Publication number
CN116285891A
CN116285891A CN202211088718.1A CN202211088718A CN116285891A CN 116285891 A CN116285891 A CN 116285891A CN 202211088718 A CN202211088718 A CN 202211088718A CN 116285891 A CN116285891 A CN 116285891A
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cerium oxide
zif
abrasive particles
composite abrasive
aqueous solution
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雷红
袁晓玥
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University of Shanghai for Science and Technology
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University of Shanghai for Science and Technology
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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1436—Composite particles, e.g. coated particles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/10—Greenhouse gas [GHG] capture, material saving, heat recovery or other energy efficient measures, e.g. motor control, characterised by manufacturing processes, e.g. for rolling metal or metal working

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Composite Materials (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Abstract

The invention discloses a cerium oxide @ ZIF-8 composite abrasive particle, a preparation method and application thereof, wherein the cerium oxide @ ZIF-8 composite abrasive particle is a micron-sized cerium oxide-metal organic framework material composite particle with irregular morphology, the preparation method comprises the steps of utilizing gamma-aminopropyl triethoxysilane and glutaric anhydride to carry out carboxyl modification on cerium oxide, and then adopting a hydrothermal method to grow a layer of zeolite imidazole ester framework material (ZIF-8) outside a carboxyl modified cerium oxide core by using zinc nitrate hexahydrate and dimethyl imidazole, so as to obtain the cerium oxide @ ZIF-8 composite abrasive particle with catalytic characteristics. Compared with the conventional commercial cerium oxide abrasive particles, the novel cerium oxide@ZIF-8 composite abrasive particles can maximally improve the material removal rate of TFT-LCD substrate glass by 26%, and can effectively reduce the surface roughness after polishing so as to meet the surface processing requirement of the TFT-LCD substrate glass.

Description

Cerium oxide@ZIF-8 composite abrasive particles, and preparation method and application thereof
Technical Field
The invention relates to micron-sized abrasive particles with irregular morphology and a preparation method thereof. In particular to cerium oxide@ZIF-8 composite abrasive particles which are used in the polishing process of the substrate glass of a thin film transistor liquid crystal display, and belong to the technical field of surface polishing.
Background
Thin Film Transistor (TFT) technology was born in nineties of the last century, and mainly comprises forming various films necessary for manufacturing circuits on non-single-crystal wafers (or wafers) such as glass or plastic substrates by sputtering and chemical deposition, processing the films, and finally bonding the substrates and the films to form a thin film transistor liquid crystal display (TFT-LCD) by internal liquid crystal filling. The TFT-LCD substrate glass is alkali-free glass, has high strain point, good chemical stability and low thermal expansion coefficient, and is widely applied to the electronic information display industry. As the production line evolves along the western law, the size of the glass substrate becomes larger and larger in the coming of the large screen age, which also puts higher demands on the thinning process of the substrate glass, and the material removal rate of the substrate glass is improved to the greatest extent while removing the surface defects such as microprotrusions, corrosion pits and the like of the substrate glass after chemical etching.
Currently, chemical mechanical polishing techniques are common processing techniques that assist in grinding substrate glass to achieve global planarization. Polishing solutions are the most important consumable for chemical mechanical polishing, wherein abrasive particles are a vital component of the polishing solution. The rare earth cerium oxide material has low price and moderate hardness, has high removal rate on glass materials, and becomes the abrasive particles most widely applied in substrate glass polishing. Aiming at the current situation that the rare earth polishing material for the novel display glass substrate with the high generation and large size completely depends on import, the development of cerium oxide abrasive particles with higher material removal rate is hoped to meet the increasing industrial demand.
Disclosure of Invention
The invention aims to overcome the defects of the prior art and provide a cerium oxide@ZIF-8 composite abrasive particle, a preparation method and application thereof, which improve the material removal rate, effectively reduce the surface roughness after polishing and improve the polishing efficiency and polishing quality, and solve the problems of poor dispersion stability and easiness in scratch of the commercial cerium oxide abrasive particles.
In order to achieve the above purpose, the invention adopts the following technical scheme:
a preparation method of cerium oxide @ ZIF-8 composite abrasive particles comprises the following steps:
s01: adding gamma-aminopropyl triethoxysilane into N, N-Dimethylformamide (DMF), stirring and mixing well, adding glutaric anhydride, and stirring at room temperature of not lower than 25deg.C for at least 3 hr to obtain clear solution;
s02: dissolving cerium oxide with the average particle size of 1 micron in an N, N-dimethylformamide aqueous solution, and carrying out ultrasonic treatment for at least 10min to obtain cerium oxide suspension;
s03: adding the cerium oxide suspension obtained in the step S02 to the clarified solution obtained in the step S01, so that the mass ratio of the cerium oxide suspension to the clarified solution is 32:25, continuously stirring at room temperature of 25 ℃ for at least 5 hours to obtain a reactant mixed solution; then centrifugally separating the reactant mixed solution for at least 5min at the rotation speed of not lower than 5000rpm, precipitating, washing the precipitate with water and ethanol for at least 2 times, and drying at the temperature of not lower than 60 ℃ for at least 8h to obtain carboxyl modified cerium oxide powder;
s04: adding the carboxyl modified cerium oxide powder obtained in the step S03 into a zinc nitrate hexahydrate aqueous solution, stirring until the cerium oxide powder is uniformly dispersed, heating in a water bath at a temperature of not lower than 70 ℃ for at least 30min, then rapidly adding a dimethyl imidazole aqueous solution with a molar concentration of not lower than 0.389M into the cerium oxide powder, continuously stirring for at least 20min after the dimethyl imidazole aqueous solution is added, cooling to room temperature, centrifuging at a speed of not lower than 5000rpm for at least 5min, precipitating, washing the precipitate with water and ethanol for at least 2 times, and drying at a temperature of not lower than 80 ℃ for at least 8h to obtain cerium oxide@ZIF-8 composite abrasive particles.
Preferably, in the step S01, the mass ratio of γ -aminopropyl triethoxysilane, N-dimethylformamide, glutaric anhydride is 5:120:3.
preferably, in the step S02, the mass ratio of cerium oxide, N-dimethylformamide to water is 2:2:1.
preferably, in the step S04, the molar concentration of the zinc nitrate hexahydrate aqueous solution is 0.019 to 0.146M.
Preferably, in the step S04, the mass ratio of the zinc nitrate hexahydrate aqueous solution, the carboxyl group modified cerium oxide, and the dimethyl imidazole aqueous solution is 25:2:75.
preferably, in the step S04, the prepared ceria @ ZIF-8 composite abrasive particles have a ZIF-8 mass percentage content of 5.35 to 41.31 wt%.
The cerium oxide@ZIF-8 composite abrasive particle is prepared by the preparation method of the cerium oxide@ZIF-8 composite abrasive particle.
The invention relates to application of cerium oxide@ZIF-8 composite abrasive particles, which utilizes cerium oxide@ZIF-8 composite abrasive particles to prepare polishing solution and is applied to the polishing process of TFT-LCD substrate glass.
Compared with the prior art, the invention has the following obvious prominent substantive features and obvious advantages:
1. the invention prepares cerium oxide @ ZIF-8 composite abrasive particles by a hydrothermal method under mild conditions; positively charged Zn in aqueous solution 2+ Adsorbed on negatively charged CeO 2 on-COOH, then coordinates with N in dimethylimidazole, at CeO 2 -COOH out-core growth ZIF-8 shell layer to prepare cerium oxide @ ZIF-8 composite abrasive particles; the novel abrasive particle has simple preparation method and can be amplified for industrial production;
2. the cerium oxide@ZIF-8 composite abrasive particle polishing solution is applied to the chemical mechanical polishing of TFT-LCD substrate glass, can effectively reduce the surface roughness of the substrate glass, and can maximally improve the polishing rate of the cerium oxide@ZIF-8 composite abrasive particles by 26% compared with the conventional commercial cerium oxide abrasive particles;
3. compared with the conventional commercial cerium oxide abrasive particles, the cerium oxide@ZIF-8 composite abrasive particles with catalytic properties have round surface edges, are favorable for reducing hard injuries such as scratches and the like, and can improve solid-phase chemical reaction by utilizing the pore channel characteristics of ZIF-8 with high specific surface area, so that the aim of efficient processing is achieved.
Drawings
FIG. 1 is a field emission scanning electron microscope image of a ceria @ ZIF-8 composite abrasive particle according to example 1 of the present invention.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the following detailed description of the specific embodiments of the present invention will be given with reference to the accompanying drawings.
A preparation method of cerium oxide @ ZIF-8 composite abrasive particles comprises the following steps:
s01: adding gamma-aminopropyl triethoxysilane into N, N-Dimethylformamide (DMF), stirring and mixing well, adding glutaric anhydride, and stirring at room temperature of not lower than 25deg.C for at least 3 hr to obtain clear solution; wherein, the mass ratio of the gamma-aminopropyl triethoxysilane, the N, N-dimethylformamide and the glutaric anhydride is 5:120:3, a step of;
s02: dissolving cerium oxide with the average particle size of 1 micron in an N, N-dimethylformamide aqueous solution, and carrying out ultrasonic treatment for at least 10min to obtain cerium oxide suspension; wherein, the mass ratio of cerium oxide, N-dimethylformamide to water is 2:2:1, a step of;
s03: adding the cerium oxide suspension obtained in the step S02 to the clarified solution obtained in the step S01, so that the mass ratio of the cerium oxide suspension to the clarified solution is 32:25, continuously stirring at room temperature of 25 ℃ for at least 5 hours to obtain a reactant mixed solution; then centrifugally separating the reactant mixed solution for at least 5min at the rotation speed of not lower than 5000rpm, precipitating, washing the precipitate with water and ethanol for at least 2 times, and drying at the temperature of not lower than 60 ℃ for at least 8h to obtain carboxyl modified cerium oxide powder;
s04: adding the carboxyl modified cerium oxide powder obtained in the step S03 into a zinc nitrate hexahydrate aqueous solution, stirring until the cerium oxide powder is uniformly dispersed, heating in a water bath at a temperature of not lower than 70 ℃ for at least 30min, then rapidly adding a dimethyl imidazole aqueous solution with a molar concentration of not lower than 0.389M into the cerium oxide powder, continuously stirring for at least 20min after the dimethyl imidazole aqueous solution is added, cooling to room temperature, centrifuging at a speed of not lower than 5000rpm for at least 5min, precipitating, washing the precipitate with water and ethanol for at least 2 times, and drying at a temperature of not lower than 80 ℃ for at least 8h to obtain cerium oxide@ZIF-8 composite abrasive particles. Wherein, the mass ratio of the zinc nitrate hexahydrate aqueous solution to the carboxyl modified cerium oxide to the dimethyl imidazole aqueous solution is 25:2:75. the molar concentration of the hexahydrated zinc nitrate aqueous solution is 0.019-0.146M; by adopting zinc nitrate hexahydrate solutions with different molar concentrations, the composite abrasive particles of cerium oxide@ZIF8 with the ZIF8 content of 5.35-41.31 wt.% can be prepared.
The polishing solution is prepared from the cerium oxide@ZIF-8 composite abrasive particles, can be applied to polishing of TFT-LCD substrate glass, can remarkably improve polishing rate and polishing precision, and achieves the polishing effect of high efficiency and high precision.
The foregoing aspects are further described in conjunction with specific embodiments, and the following detailed description of preferred embodiments of the present invention is provided:
example 1
In this embodiment, a preparation method of cerium oxide @ ZIF-8 composite abrasive particles prepares zeolite imidazole ester-cerium oxide composite abrasive particles by a simple and feasible hydrothermal method, and the method comprises the following steps:
(1) 5g of gamma-aminopropyl triethoxysilane is added into 120g of N, N-Dimethylformamide (DMF), and the mixture is stirred and mixed uniformly, 3g of glutaric anhydride is added, and the mixture is stirred for 3 hours at room temperature of 25 ℃ to obtain a clear solution;
(2) 40g of cerium oxide having an average particle diameter of 1 μm are dissolved in 60g of an aqueous solution of N, N-dimethylformamide (DMF: H) 2 O mass ratio = 2:1), sonicating for 10min to obtain cerium oxide suspension;
(3) Adding 100g of cerium oxide suspension obtained in the step (2) into 128g of clear solution obtained in the step (1), and continuously stirring at the room temperature of 25 ℃ for 5 hours; finally, the collected reaction solution is centrifugally separated for 5min at 5000rpm, the sediment is washed for 2 times by water and ethanol respectively, and is dried for 8h at 60 ℃ to obtain carboxyl modified cerium oxide powder (CeO) 2 -COOH)；
(4) Adding 10g of carboxyl modified cerium oxide powder into 125g of 0.019M zinc nitrate hexahydrate water solution with a molar concentration, stirring until the cerium oxide powder is uniformly dispersed, and heating the cerium oxide powder in a water bath at 70 ℃ for 30min; then, the prepared 375g of 0.389M dimethyl imidazole aqueous solution is added into the solution rapidly, and after the dimethyl imidazole solution is added, stirring is continued for 20min and cooling is carried out to room temperature; finally, the collected reaction liquid is centrifugally separated for 5min at a rotation speed of 5000rpm, the sediment is washed for 2 times by water and ethanol respectively, and is dried for 8h at 80 ℃, so that the cerium oxide@ZIF-8 composite abrasive particles with the ZIF-8 content of 5.35wt.% are obtained;
and adding deionized water into the obtained cerium oxide@ZIF-8 composite abrasive particles to prepare a cerium oxide@ZIF-8 composite abrasive particle polishing solution with the solid mass fraction of 2wt.%, thereby obtaining the polishing solution in the embodiment 1.
The polishing effect of the polishing liquid of this example on the substrate glass is shown in Table 1.
Example 2
This embodiment is substantially the same as embodiment 1, except that:
in this example, the same procedure and amounts as in example 1 were used except that the molar concentration of the aqueous zinc nitrate hexahydrate solution in step (4) was changed to 0.076M, to obtain a composite abrasive grain of cerium oxide @ ZIF-8 having a ZIF-8 content of 21.42 wt.%.
Likewise, deionized water is added to prepare the cerium oxide@ZIF-8 composite abrasive particle polishing solution with the solid mass fraction of 2 wt.%.
The polishing effect on substrate glass using the polishing liquid of this example 2 is shown in table 1.
Example 3
This embodiment is substantially identical to the previous embodiment, except that:
in this example, the same procedure and amounts as in example 1 were used except that the molar concentration of the aqueous zinc nitrate hexahydrate solution in step (4) was changed to 0.146M, to obtain ceria @ ZIF-8 composite abrasive grains having a ZIF-8 content of 41.31wt.%.
Likewise, deionized water is added to prepare the cerium oxide@ZIF-8 composite abrasive particle polishing solution with the solid mass fraction of 2 wt.%.
The polishing effect on substrate glass using the polishing liquid of this example 3 is shown in table 1.
Comparative example
Comparison was made using unmodified pure cerium oxide as a comparative example. In the comparative example, a method for preparing a cerium oxide polishing liquid comprises the following steps:
(1) 10g of cerium oxide powder with an average particle diameter of 1 μm was weighed and dissolved in deionized water to prepare a cerium oxide polishing liquid with a mass fraction of 2 wt.%.
The polishing effect on the substrate glass using the polishing liquid of this comparative example 1 is shown in table 1.
Polishing tests were performed on substrate glass under a certain polishing condition using the polishing solutions of examples 1 to 3 and comparative example 1.
The polishing conditions for the polishing test were as follows:
polishing machine: automatic UNIPL-1000 s pressure grinding polisher;
work piece: a TFT-LCD substrate glass sheet with a diameter of 50mm and a thickness of 0.7 mm;
polishing pad: a polyurethane polishing pad;
polishing pressure: 3kg;
upper disc rotation speed: 30rpm;
lower disc rotation speed: 60rpm;
polishing time: 1h;
after polishing, the substrate glass sheet is washed and dried in the order of cleaning liquid, deionized water and ethanol, and the mass of the substrate glass sheet before and after polishing is weighed by a precision analytical balance, and the material removal rate MRR is calculated. In addition, the surface roughness Ra, the order precision and the step repeatability of the substrate glass sheet before and after polishing are 0.5%, the vertical resolution is 0.1nm, the transverse resolution is 0.14nm at maximum and the Z-direction scanning range is 0.1nm-34mm, which are measured by a 3D surface profiler.
The polishing effects of the polishing liquid on the substrate glass sheet with the abrasive grain mass fraction of about 2wt.% in each example are shown in table 1, respectively. As can be seen from table 1, the polishing solutions of each example had significantly increased material removal rates and significantly reduced surface roughness compared to the polishing solutions of the comparative examples having the same solids content. The cerium oxide @ ZIF-8 composite abrasive particles of example 2 have a 26% improvement in removal rate and a 35% reduction in roughness over the commercially available cerium oxide abrasive particle material of comparative example 1.
TABLE 1 polishing effects of the polishing solutions of the examples and comparative examples of the present invention on substrate glass
Example 1 Example 2 Example 3 Comparative example 1
ZIF-8 content (%) 5.35 21.42 41.31 0
Polishing rate MRR (mum/h) 19.24 22.2 18.24 17.6
Ra(nm) 120.6 100.4 121.3 154.9
Note that: the ZIF-8 content in Table 1 refers to the ratio of the mass of ZIF-8 to the total mass of the ceria @ ZIF-8 composite abrasive particles.
In summary, the ceria @ ZIF-8 composite abrasive particles of the invention have a rougher surface and a dull edge compared to conventional commercial ceria abrasive particles. The ZIF-8 used for polishing the substrate glass has a pore structure and a large specific surface area, so that the ZIF-8 can promote chemical reaction in the chemical mechanical polishing process, remarkably improve the material removal rate and effectively improve the surface precision after polishing. The cerium oxide @ ZIF-8 composite abrasive particles are micron-sized cerium oxide-metal organic framework material composite particles with irregular morphology, gamma-aminopropyl triethoxysilane and glutaric anhydride are utilized to carry out carboxyl modification on cerium oxide, then a layer of zeolite imidazole ester framework material (ZIF-8) is grown outside carboxyl modified cerium oxide cores by a hydrothermal method through zinc nitrate hexahydrate and dimethyl imidazole, and the cerium oxide @ ZIF-8 composite abrasive particles are obtained. Compared with the conventional commercial cerium oxide abrasive particles, the novel cerium oxide@ZIF-8 composite abrasive particles disclosed by the embodiment of the invention can maximally improve the material removal rate of TFT-LCD substrate glass by 26%, and can effectively reduce the surface roughness after polishing.
The embodiments of the present invention have been described above with reference to the accompanying drawings, but the present invention is not limited to the embodiments described above, and various changes, modifications, substitutions, combinations or simplifications made under the spirit and principles of the technical solution of the present invention can be made according to the purpose of the present invention, and all the changes, modifications, substitutions, combinations or simplifications should be equivalent to the substitution, so long as the purpose of the present invention is met, and all the changes are within the scope of the present invention without departing from the technical principles and the inventive concept of the present invention.

Claims (8)

1. The preparation method of the cerium oxide@ZIF-8 composite abrasive particles is characterized by comprising the following steps of:
s01: adding gamma-aminopropyl triethoxysilane into N, N-Dimethylformamide (DMF), stirring and mixing well, adding glutaric anhydride, and stirring at room temperature of not lower than 25deg.C for at least 3 hr to obtain clear solution;
s02: dissolving cerium oxide with the average particle size of 1 micron in an N, N-dimethylformamide aqueous solution, and carrying out ultrasonic treatment for at least 10min to obtain cerium oxide suspension;
s03: adding the cerium oxide suspension obtained in the step S02 to the clarified solution obtained in the step S01, so that the mass ratio of the cerium oxide suspension to the clarified solution is 32:25, continuously stirring at room temperature of 25 ℃ for at least 5 hours to obtain a reactant mixed solution; then centrifugally separating the reactant mixed solution for at least 5min at the rotation speed of not lower than 5000rpm, precipitating, washing the precipitate with water and ethanol for at least 2 times, and drying at the temperature of not lower than 60 ℃ for at least 8h to obtain carboxyl modified cerium oxide powder;
s04: adding the carboxyl modified cerium oxide powder obtained in the step S03 into a zinc nitrate hexahydrate aqueous solution, stirring until the cerium oxide powder is uniformly dispersed, heating in a water bath at a temperature of not lower than 70 ℃ for at least 30min, then rapidly adding a dimethyl imidazole aqueous solution with a molar concentration of not lower than 0.389M into the cerium oxide powder, continuously stirring for at least 20min after the dimethyl imidazole aqueous solution is added, cooling to room temperature, centrifuging at a speed of not lower than 5000rpm for at least 5min, precipitating, washing the precipitate with water and ethanol for at least 2 times, and drying at a temperature of not lower than 80 ℃ for at least 8h to obtain cerium oxide@ZIF-8 composite abrasive particles.
2. The method for preparing the cerium oxide @ ZIF-8 composite abrasive particles according to claim 1, wherein: in the step S01, the mass ratio of the gamma-aminopropyl triethoxysilane, the N, N-dimethylformamide and the glutaric anhydride is 5:120:3.
3. the method for preparing the cerium oxide @ ZIF-8 composite abrasive particles according to claim 1, wherein: in the step S02, the mass ratio of cerium oxide, N-dimethylformamide to water is 2:2:1.
4. the method for preparing the cerium oxide @ ZIF-8 composite abrasive particles according to claim 1, wherein: in the step S04, the molar concentration of the aqueous solution of zinc nitrate hexahydrate is 0.019 to 0.146M.
5. The method for preparing the cerium oxide @ ZIF-8 composite abrasive particles according to claim 1, wherein: in the step S04, the mass ratio of the zinc nitrate hexahydrate aqueous solution to the carboxyl group modified cerium oxide aqueous solution to the dimethyl imidazole aqueous solution is 25:2:75.
6. the method for preparing the cerium oxide @ ZIF-8 composite abrasive particles according to claim 1, wherein: in the step S04, the prepared cerium oxide@ZIF-8 composite abrasive particles have the ZIF-8 content of 5.35-41.31 wt%.
7. The cerium oxide @ ZIF-8 composite abrasive particle is characterized in that: is prepared by the preparation method of the cerium oxide@ZIF-8 composite abrasive particles.
8. Use of the ceria @ ZIF-8 composite abrasive particles of claim 7, wherein: the polishing solution is prepared by utilizing the cerium oxide@ZIF-8 composite abrasive particles and is applied to the polishing process of TFT-LCD substrate glass.
CN202211088718.1A 2022-09-07 2022-09-07 Cerium oxide@ZIF-8 composite abrasive particles, and preparation method and application thereof Pending CN116285891A (en)

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CN202211088718.1A CN116285891A (en) 2022-09-07 2022-09-07 Cerium oxide@ZIF-8 composite abrasive particles, and preparation method and application thereof

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CN202211088718.1A CN116285891A (en) 2022-09-07 2022-09-07 Cerium oxide@ZIF-8 composite abrasive particles, and preparation method and application thereof

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CN116285891A true CN116285891A (en) 2023-06-23

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