CN116269060A

CN116269060A - Cleaning device and cleaning assembly

Info

Publication number: CN116269060A
Application number: CN202310580449.9A
Authority: CN
Inventors: 宋三力; 陶哲; 曹华奎; 蒋月红; 毕金廷; 黄华; 侯玉磊
Original assignee: Ecovacs Robotics Suzhou Co Ltd
Current assignee: Ecovacs Robotics Suzhou Co Ltd
Priority date: 2023-05-23
Filing date: 2023-05-23
Publication date: 2023-06-23
Anticipated expiration: 2043-05-23
Also published as: CN116269060B

Abstract

The application discloses a cleaning device and a cleaning assembly, the cleaning device comprising a body, a support and a wiper; a water tank disposed in the body, the water tank configured to provide a cleaning liquid to the support; the support is connected with the machine body, and is provided with a water through hole, the water through hole penetrates through the support, and the water through hole is configured to receive cleaning liquid provided by the water tank; the back of the wiper is connected with the support, the wiper is provided with a water passing hole, the water passing hole extends from the back of the wiper to the front of the wiper, and the water passing hole is communicated with the water passing hole, so that the cleaning liquid enters the water passing hole through the water passing hole. According to the technical scheme, the time for the cleaning liquid to reach the target surface can be shortened, so that the cleaning effect of the cleaning device is improved.

Description

Cleaning device and cleaning assembly

Technical Field

The application relates to the field of cleaning technology, in particular to a cleaning device and a cleaning assembly.

Background

The cleaning robot generally adopts the rag dish to clean the target surface, and simultaneously in the cleaning process of the rag dish, a water tank in the cleaning robot provides cleaning solution for the rag dish to improve the cleaning effect of the rag dish on the target surface.

However, in the prior art, the water tank is used for supplying the cleaning liquid to the back surface of the cleaning cloth tray, the cleaning liquid needs to slowly permeate from the back surface of the cleaning cloth to the target surface, that is, the cleaning liquid needs to flow to the target surface for a certain permeation time, so that the cleaning liquid cannot reach the target surface in time in the cleaning process of the cleaning robot, and the cleaning effect of the cleaning robot is affected.

Disclosure of Invention

An object of the present application is to provide a cleaning device and a cleaning assembly that can shorten the time period for the cleaning liquid to reach the target surface, so as to improve the cleaning effect of the cleaning device.

The application provides a cleaning device comprising a body, a support and a wiper; a water tank disposed in the body, the water tank configured to provide a cleaning liquid to the support; the support is connected with the machine body, and is provided with a water through hole, the water through hole penetrates through the support, and the water through hole is configured to receive cleaning liquid provided by the water tank; the back of the wiper is connected with the support, the wiper is provided with a water passing hole, the water passing hole extends from the back of the wiper to the front of the wiper, and the water passing hole is communicated with the water passing hole, so that the cleaning liquid enters the water passing hole through the water passing hole.

Accordingly, the present application also provides a cleaning assembly comprising at least a support and a wiper; the support piece is provided with a top surface, a bottom surface and water through holes, the top surface and the bottom surface are respectively positioned at two sides of the support piece, and the water through holes penetrate through the top surface and the bottom surface; the back surface of the wiper is connected with the bottom surface, the wiper is provided with a water passing hole, the water passing hole is communicated with the water passing hole, and the water passing hole extends from the back surface of the wiper to the front surface of the wiper.

Therefore, the technical scheme that this application provided is formed with the water hole on the wiper, and water hole and the limbers intercommunication on the support piece for when the water tank provided cleaning solution to the limbers, this cleaning solution can flow to the water downthehole through the limbers. Also, the water holes extend from the back of the wiper to the front of the wiper, that is, during the process of cleaning liquid flowing from the back of the wiper to the front of the wiper, the process of cleaning liquid flowing through the water holes can at least partially replace the existing process of cleaning liquid penetrating the wiper. Therefore, the duration that the cleaning liquid reaches the target surface through the wiping piece can be shortened by means of the water through holes, and the cleaning liquid can reach the target surface in time during cleaning, so that the cleaning effect of the cleaning device on the target surface is guaranteed.

Meanwhile, the process that the cleaning liquid flows through the water through holes at least partially replaces the existing process that the cleaning liquid permeates the wiping piece, and the mixing probability of the cleaning liquid and the sewage in the wiping piece can be reduced, so that the dilution degree of the sewage in the wiping piece to the cleaning liquid is reduced, the cleaning concentration of the cleaning liquid reaching the target surface is ensured, and the cleaning effect of the cleaning device to the target surface is ensured. In addition, after the cleaning device finishes cleaning, the residual quantity of the cleaning liquid with high concentration in the wiping piece is reduced, and the waste of the cleaning liquid is avoided.

Drawings

In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings that are needed in the description of the embodiments will be briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present application, and that other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.

FIG. 1 is a schematic view of a cleaning device according to one embodiment of the present application;

FIG. 2 is an exploded view of a portion of the structure of a cleaning device in one embodiment provided herein;

FIG. 3 is a schematic illustration of a semi-sectional configuration of a wiper in one embodiment provided herein;

FIG. 4 is a schematic illustration of a semi-sectional configuration of a wiper in accordance with another embodiment provided herein;

FIG. 5 is a schematic illustration of an isometric view of a support member and a rotating shaft after the support member and rotating shaft are coupled in one embodiment provided herein;

FIG. 6 is a schematic top view of one embodiment of the present application after the support and the rotating shaft are coupled;

FIG. 7 is another perspective view of the support member and the rotatable shaft after attachment in one embodiment provided herein;

FIG. 8 is an isometric view of a wiper in one embodiment provided herein;

FIG. 9 is a schematic illustration in semi-section of one embodiment provided herein after the support and the rotating shaft are coupled;

FIG. 10 is an isometric view of a portion of the structure of a cleaning device in one embodiment provided herein;

FIG. 11 is a schematic view of the semi-sectional structure of FIG. 10;

FIG. 12 is an enlarged schematic view of portion A of FIG. 11;

FIG. 13 is an exploded view of a portion of the structure of a cleaning device in one embodiment provided herein;

fig. 14 is a schematic view in half section of the partially constructed connection of fig. 13.

Detailed Description

For the purpose of making the objects, technical solutions and advantages of the present application more apparent, the embodiments of the present application will be described in further detail below with reference to the accompanying drawings. Terms such as "upper," "lower," "first end," "second end," "one end," "the other end," and the like as used herein to refer to a spatially relative position are used for ease of description to describe one element or feature's relationship to another element or feature as illustrated in the figures. The term spatially relative position may be intended to encompass different orientations of the device in use or operation in addition to the orientation depicted in the figures. For example, if the device in the figures is turned over, elements described as "below" or "beneath" other elements or features would then be oriented "above" the other elements or features. Thus, the exemplary term "below" can encompass both an orientation of above and below. The device may be otherwise oriented (rotated 90 degrees or other orientations) and the spatially relative descriptors used herein interpreted accordingly.

Furthermore, the terms "mounted," "disposed," "provided," "connected," "slidingly connected," "secured," and "sleeved" are to be construed broadly. For example, "connected" may be in a fixed connection, a removable connection, or a unitary construction; may be a mechanical connection, or an electrical connection; may be directly connected, or indirectly connected through intervening media, or may be in internal communication between two devices, elements, or components. The specific meaning of the terms in this application will be understood by those of ordinary skill in the art as the case may be.

With the improvement of living standard, more and more families start to use cleaning devices, such as sweeping robots, window cleaning robots and the like, so as to reduce labor intensity and improve living quality. Taking the sweeping robot as an example, the sweeping robot cleans the target surface by rotating the rag disc, and meanwhile, in the cleaning process of the rag disc, the water tank in the sweeping robot provides cleaning liquid for the rag disc so as to improve the cleaning effect of the rag disc on the target surface.

However, in the prior art, the water tank is used for supplying the cleaning liquid to the back of the cleaning cloth tray, the cleaning liquid needs to slowly permeate from the back of the cleaning cloth to the front of the cleaning cloth so as to flow to the target surface, that is, the cleaning liquid needs to flow to the target surface for a certain permeation time, so that the cleaning liquid cannot reach the target surface in time during cleaning of the cleaning robot, and thus the cleaning effect of the cleaning robot is affected.

Moreover, due to the water absorption of the rag, a large amount of sewage is adsorbed in the rag after a period of time of cleaning. If the cleaning solution still slowly permeates to the target surface through the back surface of the cleaning cloth, the cleaning solution is firstly mixed with sewage in the cleaning cloth in the permeation process of the cleaning solution, so that the cleaning concentration of the cleaning solution is diluted, and the cleaning concentration of the cleaning solution reaching the target surface is too low, thereby influencing the cleaning effect of the cleaning device. Meanwhile, after the cleaning device finishes the cleaning operation, a large amount of high-concentration cleaning liquid can be remained on the cleaning cloth, so that waste is caused.

In addition, in the actual cleaning process, the cleaning device has reasons such as jolt, the liquid supply mouth of the water tank is blocked or the like, and the cleaning liquid provided by the water tank can deviate from the water through holes in the support piece in the rag disc, so that cleaning liquid drops fall on the support piece, and along with the rotation of the rag disc, the cleaning liquid on the support piece is thrown to the surrounding ground under the action of centrifugal force, so that secondary pollution is caused, and the use experience of a user is influenced.

Therefore, how to improve the structure of the cleaning device, further improve the cleaning effect of the cleaning device, and improve the use experience of the user is a problem to be solved in the art.

The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the accompanying drawings. It should be apparent that the embodiments described herein are only some, but not all, of the embodiments of the present application. All other embodiments, based on the embodiments herein, which are within the scope of the protection of the present application, will be within the skill of the art without undue effort.

In view of the foregoing, the present application provides a cleaning device for cleaning a target surface. The cleaning device may include, but is not limited to, a sweeping robot, a cleaning robot, a window cleaning robot, and the like. The target surface may be a floor surface, a wall surface, a glass surface, or a surface of an object to be cleaned, or the like.

Referring to fig. 1 and 2 together, in one embodiment, the cleaning device includes at least a body 10, a support 20, and a wiper 30. The machine body 10 is used as a basic carrier of the cleaning device, and is used for carrying and protecting other parts of the cleaning device, and a water tank 40 can be arranged in the machine body 10, wherein the water tank 40 is used for providing cleaning liquid for the support member 20 so as to assist cleaning. It should be noted that the water tank 40 may be a cavity formed in the machine body 10 for containing the cleaning solution, or may be a separate tank body and detachably connected to the machine body 10, which is not particularly limited in this application.

The supporting member 20 is used for being connected between the machine body 10 and the wiping member 30, and the wiping member 30 is used for being contacted with the target surface, so that the wiping member 30 can move along with the walking of the machine body 10 under the driving of the supporting member 20, and the target surface is cleaned. Meanwhile, the supporting piece 20 is also used for supporting the wiping piece 30, so that the structural strength of the wiping piece 30 is improved, and the cleaning requirement of the wiping piece 30 on the target surface is met. It should be noted that the wiping member 30 may be a cloth, a sponge, a brush plate, or the like, and the cloth may be cotton cloth, microfiber cloth, coral fleece, nonwoven fabric, or the like.

In one possible embodiment, the support 20 has a water passage hole 21, and the water passage hole 21 penetrates the support 20. The water through hole 21 is used for receiving the cleaning solution provided by the water tank 40, so that the cleaning solution provided by the water tank 40 to the support member 20 flows to the wiper 30 through the water through hole 21 and flows to the target surface through the wiper 30 to dissolve stains on the target surface, thereby improving the cleaning effect of the cleaning device on the target surface. It should be noted that, compared to the manner in which the water tank 40 directly sprays the cleaning solution onto the target surface, the cleaning solution flows to the target surface sequentially through the supporting member 20 and the wiping member 30, so that secondary pollution caused by splashing the cleaning solution onto the target surface in the process of flowing to the target surface can be avoided.

For ease of description, the present application defines the side of the wiper 30 that is attached to the support 20 as the back side and the opposite side as the front side. Specifically, the back of the wiper 30 is connected to the support 20, and the front of the wiper 30 is used to contact and clean the target surface. The wiper 30 has a water passing hole 31 communicating with the water passing hole 21, and the cleaning liquid received by the water passing hole 21 can enter the water passing hole 31 through the water passing hole 21 and then flow onto the target surface. And, the water passing hole 31 is configured to: extending from the back of the wiper 30 toward the front of the wiper 30, such that the cleaning fluid passing through the water holes 31 during the cleaning fluid passing from the back of the wiper 30 to the front of the wiper 30 may at least partially replace the existing cleaning fluid penetrating the wiper 30. Thus, the duration that the cleaning liquid reaches the target surface through the wiper 30 can be shortened by means of the water through holes 31, so that the cleaning liquid can reach the target surface in time during cleaning, and the cleaning effect of the cleaning device on the target surface is ensured.

It should be noted that the cleaning liquid may be clear water or a cleaning agent having a function of dissolving stains. When the cleaning solution is a cleaning agent, a large amount of sewage is adsorbed in the wiper 30 after the cleaning device works for a period of time, the process that the cleaning solution at least partially replaces the existing process that the cleaning solution permeates the wiper 30 through the water holes 31 can further reduce the mixing opportunity of the cleaning solution and the sewage in the wiper 30, so that the dilution degree of the sewage contained in the wiper 30 to the cleaning solution is reduced, the cleaning concentration of the cleaning solution reaching the target surface is ensured, and the cleaning effect of the cleaning device to the target surface is ensured. And, the above structure can also reduce the adsorption amount of the high-concentration cleaning liquid by the wiper 30, thereby reducing the residual amount of the high-concentration cleaning liquid in the wiper 30 after cleaning is completed and avoiding the waste of the cleaning liquid.

Since the sweeping robot is generally used for cleaning the floor in a substantially horizontal state, and the window cleaning robot is generally used for cleaning the glass in a substantially vertical state, there is a certain difference in the structure of the sweeping robot from that of the window cleaning robot. For ease of understanding, the present application will be described by way of example with reference to the perspective of fig. 1 in combination with structural features of a sweeping robot. Specifically, the support 20 and the wiper 30 are generally installed under the body 10, and the water through holes 21 penetrate the support 20 in a vertical direction, and the water through holes 31 are also provided in a vertical direction and communicate with the water through holes 21. When the floor cleaning robot cleans the floor, the wiper 30 contacts the floor and moves by the travel of the body 10, thereby cleaning the floor. During the cleaning, the water tank 40 supplies the cleaning liquid, and the cleaning liquid can quickly reach the floor through the water passing holes 21 and the water passing holes 31, thereby performing the auxiliary cleaning.

Regarding the specific form of the water passing holes 31 described above, two possible embodiments are provided herein for reference.

In the first embodiment, as shown in fig. 3, the water passing hole 31 may be a through hole. Specifically, the water passing hole 31 penetrates the back surface of the wiper 30 and the front surface of the wiper 30, and when the cleaning device cleans the target surface, the cleaning liquid supplied from the water tank 40 may directly drop on the target surface after passing through the water passing hole 21 and the water passing hole 31 in sequence. That is, the process of passing the cleaning liquid through the water passing holes 31 completely replaces the existing process of the cleaning liquid penetrating the wiper 30, thereby achieving the purpose of shortening the time period for the cleaning liquid to reach the target surface through the wiper 30.

In the second embodiment, as shown in fig. 4, the water passing hole 31 may be a blind hole. Specifically, the opening of the water passing hole 31 is located at the back of the wiper 30 and is communicated with the water passing hole 21, and when the cleaning device cleans the target surface, the cleaning liquid supplied from the water tank 40 is dropped onto the wiper 30 after passing through the water passing hole 21 and the water passing hole 31 in order, and then is permeated onto the target surface through the wiper 30. That is, the process of passing the cleaning liquid through the water passing holes 31 partially replaces the existing process of the cleaning liquid penetrating the wiper 30, and the depth of the cleaning liquid that needs to penetrate the wiper 30 is reduced, so that the purpose of shortening the time period for the cleaning liquid to reach the target surface through the wiper 30 can be achieved as well.

One end of the water through hole 21 should be opened at a side where the supporting member 20 is connected to the wiper member 30, so that one end of the water through hole 21 communicates with the water through hole 31. The other end of the water through hole 21 may be formed on the side of the support member 20 away from the wiper member 30, or may be formed on the side of the support member 20. However, in view of the fact that the cleaning liquid supplied from the water tank 40 needs to flow into the water through-hole 21 through the other end of the water through-hole 21, in order to reduce the difficulty of the cleaning liquid supplied from the water tank 40 flowing into the water through-hole 21, the present application preferably opens the other end of the water through-hole 21 on the side of the support member 20 away from the wiper member 30. Specifically, as shown in fig. 5, the support member 20 has a top surface 22 and a bottom surface 23, the top surface 22 and the bottom surface 23 are located on both sides of the support member 20, the bottom surface 23 is connected to the back surface of the wiper member 30, and the water through holes 21 penetrate the top surface 22 and the bottom surface 23.

In order to further enhance the cleaning effect of the wiper 30 on the target surface, in one possible embodiment, please refer to fig. 1, 5 and 6 together, the cleaning device further includes a driving portion 50. The driving part 50 is installed on the body 10, and the driving part 50 is connected with the support 20 through the rotation shaft 60, and the driving part 50 drives the support 20 to rotate through the rotation shaft 60, thereby driving the wiper 30 to rotate. Thus, when cleaning device cleans the target surface, compare and only drive the mode that wiper 30 moved the cleaning to the target surface through organism 10, this application is when organism 10 drives wiper 30 and removes the cleaning to the target surface, drive portion 50 can also drive wiper 30 through support 20 and rotate for wiper 30 rotates the cleaning to the target surface, increases the frequency of wiping of wiper 30 to the target surface, thereby improves wiper 30 to the cleaning effect of target surface. The driving unit 50 may be a motor, a cylinder, or the like, and is not particularly limited in this application.

In practical applications, if the center of mass of the support 20 and the wiper 30 is not coincident with the center of rotation, a centrifugal force is generated during rotation, and the centrifugal force generates an exciting force to the rotation shaft 60 to cause the driving portion 50 to vibrate, and if the centrifugal force is too large, the vibration may even damage the structure of the driving portion 50. In order to solve the above problem, the support 20 is provided with a mounting hole 24 at the center of mass of the support 20 and the wiper 30, that is, the mounting hole 24 coincides with the center of mass of the support 20 and the wiper 30, and one end of the rotation shaft 60 may be nested in the mounting hole 24, so that the center of mass of the support 20 and the wiper 30 coincides with the center of rotation thereof, thereby ensuring that the unbalance of the support 20 and the wiper 30 is within a qualified range.

Since the support 20 and the wiper 30 are typically detachably connected, the center of mass of the support 20 and the center of mass of the wiper 30 may be determined to coincide with the mounting hole 24 during use, respectively, such that the center of mass of the support 20 and the wiper 30 together coincides with the center of rotation thereof. In one possible embodiment, the support 20 may be configured as a disk structure, and the mass distribution of the support 20 is substantially uniform, so that the centroid of the support 20 coincides with the center of rotation thereof, which is determined by merely opening the mounting hole 24 at the geometric center of the support 20, thereby facilitating the production operation. Correspondingly, the wiper 30 may be configured as a disc structure, and the mass distribution of the wiper 30 may be substantially uniform, such that only the wiper 30 and the support 20 need be coaxially disposed to ensure that the center of mass of the wiper 30 also coincides with the mounting hole 24, such that the center of mass of the support 20 and the wiper 30 together coincides with the center of rotation thereof.

Further, in order to facilitate the user to coaxially connect the wiper 30 with the support 20, referring to fig. 7 and 8, in an embodiment, a positioning portion 25 is formed on the support 20, and the positioning portion 25 protrudes from the bottom surface 23. The wiper 30 has a positioning hole 32 corresponding to the positioning portion 25, and when the positioning portion 25 is fitted into the positioning hole 32, it is ensured that the axis of the wiper 30 coincides with the axis of the support 20. In actual use, when a user needs to install the wiper 30 on the support 20, the user only needs to match the positioning portion 25 with the positioning hole 32, so that the center of mass of the wiper 30 and the support 20 is coincident with the rotation center thereof, and the user can replace the wiper 30 alone conveniently.

In the present embodiment, the support 20 may be connected with the wiper 30 through the connection member 70. The connecting component 70 may be a glue, a screw, a magic tape, a slot buckle, or the like. Taking the connecting member 70 as a magic tape for example, the supporting member 20 is formed with a groove 26, and a notch of the groove 26 faces the bottom surface 23. A velcro is used to fit within the recess 26 and to adhere to the wiper 30, thereby attaching the wiper 30 to the support 20. Further, the hook and loop fastener should not protrude from the recess 26, i.e. the thickness of the hook and loop fastener should be less than or equal to the depth of the recess 26, so that when the hook and loop fastener is connected with the wiper 30, the bottom surface 23 can contact with the wiper 30 and support the wiper 30, thereby improving the supporting effect of the bottom surface 23 on the wiper 30 and ensuring the front flatness of the wiper 30.

Considering that the support member 20 is rotated during operation, the water through hole 21 is rotated and forms a rotation path a during rotation, as shown in fig. 6. Therefore, when the flow direction of the cleaning liquid supplied from the water tank 40 is arranged, the cleaning liquid supplied from the water tank 40 can be caused to flow to the water passage 21 by flowing the cleaning liquid supplied from the water tank 40 to any one of the rotation paths a.

In the present embodiment, the water tank 40 may supply the cleaning liquid to the support 20 through the liquid replenishing pipe 41, and the liquid replenishing pipe 41 and the top surface 22 have a preset angle α at the water outlet of the liquid replenishing pipe 41, and the preset angle α may be set according to a specific structural arrangement in the cleaning apparatus. For example, when there is enough space right above the rotation path a for installing the fluid infusion line 41 in a vertical state, the preset angle α may be a right angle, and the water outlet of the fluid infusion line 41 is located right above the rotation path a, so that the cleaning fluid flowing out of the fluid infusion line 41 may drop vertically on the rotation path a and enter the water through hole 21. When the driving part 50 is installed directly above the supporting member 20, since the driving part 50 occupies the space for installing the fluid infusion line 41 in a vertical state, the fluid infusion line 41 may be installed above the rotation path a in an inclined state, i.e. the preset included angle α may be an acute angle, so that the driving part 50 may be avoided, and the cleaning fluid flowing out of the fluid infusion line 41 may flow to the rotation path a in a parabolic manner and enter the water through hole 21.

In the present embodiment, as shown in fig. 6, the water passing hole 21 may include a plurality of first through holes 211, and the plurality of first through holes 211 are disposed in a circular array with the axis of the rotation shaft 60 as a center line, so that the plurality of first through holes 211 may be located on the same rotation path a, and when the cleaning liquid supplied from the water tank 40 flows to the rotation path a, the plurality of first through holes 211 may receive the cleaning liquid supplied from the water tank 40. Correspondingly, the number of the water passing holes 31 is plural, the number of the water passing holes 31 may be identical to the number of the first through holes 211, and the orthographic projection of the water passing holes 31 on the bottom surface 23 is at least partially overlapped with the first through holes 211, so that the cleaning solution received by the first through holes 211 may flow to the target surface through the water passing holes 31.

In practical applications, the plurality of first through holes 211 may be arranged in an arc array with the axis of the rotation shaft 60 as a center line, or the plurality of first through holes 211 may be arranged in a circular array with the axis of the rotation shaft 60 as a center line. Preferably, the plurality of first through holes 211 should be arranged in a circular array with the axis of the rotation shaft 60 as the center, so that the cleaning liquid provided by the water tank 40 can be uniformly flowed into each first through hole 211, so that the cleaning liquid can be uniformly distributed on the surface of the wiper 30 contacting the target surface, the consistency of cleaning the target surface is ensured, the change of the mass center position of the support 20 by the plurality of first through holes 211 is avoided, and the unbalance amount of the support 20 in the rotation process is ensured to be within a qualified range as much as possible.

Further, the water through hole 21 may further include a plurality of second through holes 212, and the plurality of second through holes 212 are located in an annular array of the plurality of first through holes 211. In other words, the plurality of second through holes 212 are also arranged in a circular array with the axis of the rotary shaft 60 as the center line, and the array radius of the plurality of second through holes 212 coincides with the array radius of the plurality of first through holes 211. Thus, when the cleaning liquid supplied from the water tank 40 flows to the rotation path a, the plurality of second through holes 212 can also receive the cleaning liquid supplied from the water tank 40. It should be noted that the plurality of second through holes 212 are not communicated with the plurality of water passing holes 31, and the cleaning solution received by the plurality of second through holes 212 flows to the back surface of the wiper 30 to wet the wiper 30, so as to keep the wiper 30 in a wet state, and ensure that the cleaning effect of each area on the wiper 30 on the target surface is as consistent as possible.

In practical application, the first through holes 211 and the second through holes 212 are staggered in sequence, and the distance between the second through holes 212 and the adjacent two first through holes 211 is equal, so that the cleaning liquid received by the second through holes 212 can uniformly wet the wiper 30. Preferably, the plurality of second through holes 212 are circularly arranged with the axis of the rotary shaft 60 as a center line, and the plurality of second through holes 212 are identical to the plurality of first through holes 211 in number, so that one second through hole 212 is arranged at the middle position of two adjacent first through holes 211, and the first through holes 211 are used for wetting the wiper 30 between the two adjacent first through holes 211, thereby uniformly distributing the wetting area of each first through hole 211 to the wiper 30, and further ensuring the wetting uniformity of the wiper 30.

Since the amount of the cleaning liquid required for flowing to the target surface is larger than that required for wetting the wiper 30 in actual use, the flow rate of the cleaning liquid supplied from the water tank 40 into the first through hole 211 and the flow rate into the second through hole 212 should be reasonably distributed in order to make full use of the cleaning liquid supplied from the water tank 40. In one implementation, the present application may limit the flow rate of the cleaning liquid supplied from the water tank 40 into the first through hole 211 and the flow rate into the second through hole 212 by controlling the hole area of the first through hole 211 and the hole area of the second through hole 212. Specifically, the hole area of the first through hole 211 should be larger than that of the second through hole 212, so that the flow rate of the cleaning liquid supplied from the water tank 40 into the first through hole 211 is larger than that into the second through hole 212, thereby controlling the amount of cleaning liquid required to flow to the target surface mainly to be larger than that required to wet the wiper 30 mainly.

It should be noted that, in order to precisely control the flow rate of the cleaning liquid supplied from the water tank 40 into the first through hole 211 and the flow rate of the cleaning liquid supplied into the second through hole 212, a predetermined ratio may exist between the hole area of the first through hole 211 and the hole area of the second through hole 212, and the flow rate of the cleaning liquid supplied from the water tank 40 into the first through hole 211 and the flow rate of the cleaning liquid supplied into the second through hole 212 may be adjusted by changing the magnitude of the predetermined ratio. The preset ratio should lie between 5:1 and 20:1, depending on empirical values.

In practical application, in the cleaning process of the target surface, the cleaning device is inevitably jolt or the water outlet of the fluid supplementing pipeline 41 is blocked by the dirty part, so that the cleaning fluid provided by the water tank 40 deviates from the rotating path a, thereby causing cleaning fluid drops to fall on the top surface 22 and not fall into the water through hole 21, and along with the high-speed rotation of the supporting member 20, the cleaning fluid is thrown from the top surface 22 to the target surface under the action of centrifugal force, so that secondary pollution of the target surface is caused. For this reason, in an implementation manner, the cleaning device may be further provided with a blocking structure, so that on one hand, dirt is blocked by the blocking mechanism, and the dirt is prevented from blocking the water outlet of the fluid infusion pipeline 41, and on the other hand, cleaning liquid is blocked by the blocking structure and is thrown out from the top surface 22, so that secondary pollution to the target surface caused by throwing out the cleaning liquid from the top surface 22 is avoided, and further, the use experience of a user is improved.

With respect to the specific form of the blocking structure, three embodiments that can be implemented are provided herein by reference.

In one embodiment, as shown in fig. 9, the blocking structure may be configured as an annular collar 27 provided on the support 20. Specifically, the annular collar 27 should extend from the top surface 22 in a direction away from the bottom surface 23, and the annular collar 27 is disposed around the edge of the support member 20, so that it is ensured that the cleaning liquid dropped on the top surface 22 is located in the area surrounded by the annular collar 27, and when the cleaning liquid drops flowing out from the water outlet of the liquid replenishing pipe 41 fall on the top surface 22, the annular collar 27 can block the cleaning liquid from being thrown from the top surface 22 to the target surface.

In the present embodiment, the annular retainer ring 27 may be an annular structure of any shape, and the shape thereof may be circular, rectangular, pentagonal, hexagonal, or the like. In order to conveniently determine the centroid position of the annular retainer ring 27, the shape of the annular retainer ring 27 may be circular, that is, the annular retainer ring 27 has a circular structure, so that only the axis of the annular retainer ring 27 and the axis of the support member 20 are required to be coincident, the centroid of the annular retainer ring 27 can be ensured to be positioned on the rotation center of the annular retainer ring 27, and deflection of the support member 20 caused by the arrangement of the annular retainer ring 27 on the support member 20 during rotation is avoided. In practical applications, the annular retainer ring 27 and the support member 20 may be integrally formed by injection molding, casting, etc., and of course, the annular retainer ring 27 and the support member 20 may be separately formed and then connected by bonding, hot melting, welding, etc.

In the second embodiment, referring to fig. 10, 11 and 12, the side surface of the supporting member 20 is generally covered with the encapsulation member 80 to reduce the damage caused by the collision between the supporting member 20 and the dirt during the cleaning process, and correspondingly, the blocking structure may be formed on the encapsulation member 80. Specifically, the encapsulation member 80 has a blocking portion 81, the blocking portion 81 has an annular structure, and the blocking portion 81 extends from the encapsulation member 80 in a direction away from the bottom surface 23, that is, the blocking portion 81 is disposed around the side edge of the support member 20, so that the cleaning liquid dropped on the top surface 22 is ensured to be located in the area surrounded by the blocking portion 81. Also, the blocking portion 81 should protrude from the top surface 22, and the protruding portion of the blocking portion 81 may block the cleaning liquid from being thrown from the top surface 22 toward the target surface.

In the present embodiment, the top of the blocking portion 81 has a preset distance d from the top surface 22, which should be capable of blocking the cleaning liquid on the top surface 22 and not interfering with the body 10. The preset distance d is between 0.1cm and 2cm according to empirical values. In practical application, the rubber coating 80 and the blocking portion 81 are integrally formed, and are made of rubber, foam plastic, and other materials with buffering function, so as to protect the supporting member 20 and reduce the collision damage rate of the supporting member 20.

In a third embodiment, referring to fig. 13 and 14, the barrier structure may also be configured as a water permeable member 90. The water permeable member 90 is disposed on the top surface 22, and when the cleaning solution flowing out of the water tank 40 falls on the water permeable member 90, the water permeable member 90 can prevent the cleaning solution from being thrown out under the action of centrifugal force. The water permeable member 90 may be a member such as a water permeable cloth or sponge having water absorbability, and absorbs the cleaning liquid by its own water absorbability, thereby blocking the cleaning liquid from being thrown out by centrifugal force. The water permeable member 90 may also be a member having a plurality of through holes, which blocks the cleaning liquid from being thrown out by centrifugal force through the wall of each through hole.

In one possible embodiment, the water permeable member 90 may cover the water passing hole 21 such that the cleaning liquid flowing out of the water tank 40 passes through the water permeable member 90 into the water passing hole 21. That is, regardless of whether the cleaning liquid supplied from the water tank 40 deviates from the rotation path a, the cleaning liquid passes through the water penetration member 90 and is then received by the water penetration holes 21, so that the cleaning liquid dropped on the top surface 22 is blocked by the water penetration member 90 from being thrown out by the centrifugal force. Taking the water seepage member 90 as an example of the water seepage cloth, along with the increase of the cleaning liquid on the water seepage cloth, the cleaning liquid on the water seepage cloth can drop into the water through holes 21 after the water seepage cloth reaches a saturated state.

Of course, in order to enable the cleaning solution provided by the water tank 40 to reach the target surface as soon as possible, in another possible embodiment, an opening (not shown) may be formed in the water permeable member 90, and the orthographic projection of the opening on the top surface 22 and the water through hole 21 at least partially coincide, so that the cleaning solution flowing to the rotation path a may enter the water through hole 21 through the opening, thereby reducing the time period for the cleaning solution provided by the water tank 40 to reach the target surface. Meanwhile, the cleaning liquid deviating from the rotating path a drops on the seepage member 90, and the seepage member 90 prevents the cleaning liquid from being thrown out under the action of centrifugal force, so that secondary pollution to the target surface is avoided.

Further, the top surface 22 may also be configured to: is disposed obliquely downward from the inner side of the top surface 22 and the outer edge of the top surface 22 toward the water passage hole 21. When the cleaning liquid supplied from the water tank 40 is dropped onto the water penetration member 90 from the rotation path a, the cleaning liquid is dropped onto the top surface 22 through the water penetration member 90, and then flows into the water through hole 21 under the self gravity of the cleaning liquid and the structural guide of the top surface 22.

Based on the same inventive concept, the present application also provides a cleaning assembly. The cleaning assembly includes at least a support 20 and a wiper 30. The support 20 has a top surface 22, a bottom surface 23 and a water through hole 21, wherein the top surface 22 and the bottom surface 23 are respectively positioned at two sides of the support 20, and the water through hole 21 penetrates through the top surface 22 and the bottom surface 23. The back surface of the wiper 30 is connected to the bottom surface 23, the wiper 30 has a water passing hole 31, the water passing hole 31 communicates with the water passing hole 21, and the water passing hole 31 extends from the back surface of the wiper 30 to the front surface of the wiper 30.

Further, the water passing holes 31 are penetrating holes, and the water passing holes 31 penetrate the back surface of the wiper 30 and the front surface of the wiper 30.

Further, the water passing hole 31 is a blind hole, and the opening of the water passing hole 31 is positioned on the back of the wiper 30.

Further, the cleaning assembly further includes a rotating shaft 60, and the rotating shaft 60 is connected to the support member 20 and protrudes from the top surface 22. The support 20 and the wiper 30 are each constructed in a disk structure, and the axis of the support 20, the axis of the wiper 30, and the axis of the rotary shaft 60 coincide.

Further, the water through holes 21 include a plurality of first through holes 211 and a plurality of second through holes 212. The plurality of first through holes 211 are annularly arranged with the axis of the rotary shaft 60 as a central line, the number of the water passing holes 31 is multiple, the number of the plurality of water passing holes 31 is consistent with that of the plurality of first through holes 211, and the orthographic projection of the plurality of water passing holes 31 on the bottom surface 23 is at least partially overlapped with the plurality of first through holes 211. The plurality of second through holes 212 are located in the annular array of the plurality of first through holes 211, the plurality of first through holes 211 and the plurality of second through holes 212 are sequentially staggered, and the distances between the second through holes 212 and the adjacent two first through holes 211 are equal.

For the specific structure of the support 20, the wiper 30 and the rotation shaft 60, reference may be made to the above embodiments, and a detailed description thereof will be omitted.

The working principle of the cleaning device is described in detail below in connection with a specific application scenario.

Application scenario one:

take a cleaning device as an example of a sweeping robot. When the floor sweeping robot provided with the water tank cleans the floor, the water tank supplies cleaning liquid to the rotating path through the liquid supplementing pipeline. Wherein, part of cleaning solution is through first through-hole and water through-hole back fast reach ground in proper order for the robot of sweeping floor just begins when moving, and the cleaning solution alright reach ground and carry out auxiliary cleaning, guarantees the uniformity of the whole clean effect of robot of sweeping floor. And a part of the cleaning solution can keep higher concentration to be in contact with stains on the ground, so that the cleaning effect of the sweeping robot on the ground is further optimized. At the same time, the other part of the cleaning liquid flows to the back surface of the wiper through the second through holes and permeates from the back surface of the wiper to the front surface of the wiper to wet the wiper, so that the consistency of the cleaning effect of each part of the wiper contacted with the floor on the floor is ensured.

And (2) an application scene II:

when the water outlet of the fluid-filled line is clogged with dirt, the dirt forces the cleaning fluid flowing out of the fluid-filled line to deviate from the rotational path, thereby dripping on the top surface of the support. Meanwhile, along with the high-speed rotation of the support piece, the cleaning liquid dropped on the top surface of the support piece is thrown out to the periphery and collides on the blocking part under the action of centrifugal force, so that the blocking part blocks the cleaning liquid from throwing to the ground from the periphery of the support piece, and secondary pollution to the ground is avoided.

Therefore, the technical scheme provided by the application is that the water through holes are formed in the wiping piece, and the water through holes are communicated with the water through holes in the supporting piece, so that when the water tank supplies cleaning liquid to the water through holes, the cleaning liquid can flow into the water through holes. Also, the water holes extend from the back of the wiper to the front of the wiper, that is, during the process of cleaning liquid flowing from the back of the wiper to the front of the wiper, the process of cleaning liquid flowing through the water holes can at least partially replace the existing process of cleaning liquid penetrating the wiper. Therefore, the duration that the cleaning liquid reaches the target surface through the wiping piece can be shortened by means of the water through holes, and the cleaning liquid can reach the target surface in time during cleaning, so that the cleaning effect of the cleaning device on the target surface is guaranteed.

Further, the application is through forming the barrier on the rubber coating piece to the barrier protrusion is in the top surface, makes the cleaning solution that the drip is on the top surface all be located the region that the barrier was around forming, thereby blocks this cleaning solution by the barrier and gets rid of to the target surface from the top surface under the effect of centrifugal force, avoids causing secondary pollution to the target surface.

Further, this application is through laying the infiltration piece on the top surface, utilizes the water absorption of infiltration piece to absorb the cleaning solution of drip at the top surface to by infiltration piece pinning cleaning solution, thereby avoid the cleaning solution to get rid of from the top surface to the target surface under the effect of centrifugal force and cause secondary pollution.

The foregoing description of the preferred embodiments of the present application is not intended to limit the invention to the particular embodiments of the present application, but to limit the scope of the invention to the particular embodiments of the present application.

Claims

1. A cleaning device, characterized in that the cleaning device comprises a body, a support and a wiper;

a water tank disposed in the body, the water tank configured to provide a cleaning liquid to the support;

the support is connected with the machine body, and is provided with a water through hole, the water through hole penetrates through the support, and the water through hole is configured to receive cleaning liquid provided by the water tank;

The back of the wiper is connected with the support, the wiper is provided with a water passing hole, the water passing hole extends from the back of the wiper to the front of the wiper, and the water passing hole is communicated with the water passing hole, so that the cleaning liquid enters the water passing hole through the water passing hole.

2. The cleaning device of claim 1, wherein the water passing holes are through holes;

the water passing holes penetrate through the back surface of the wiping piece and the front surface of the wiping piece, and when the cleaning device cleans the target surface, cleaning liquid provided by the water tank sequentially passes through the water passing holes and drops on the target surface.

3. The cleaning device of claim 1, wherein the water passing holes are blind holes;

the opening of the water passing hole is positioned on the back surface of the wiping piece, and when the cleaning device cleans the target surface, cleaning liquid provided by the water tank sequentially passes through the water passing hole and drops on the wiping piece.

4. A cleaning device according to claim 2 or claim 3, wherein the support member has oppositely disposed top and bottom surfaces;

The water through holes penetrate through the top surface and the bottom surface, and the back surface of the wiping piece is connected with the bottom surface.

5. The cleaning device of claim 4, further comprising a drive portion;

the driving part is connected with the supporting piece through a rotating shaft, drives the supporting piece to rotate and drives the water through hole to rotate to form a rotating path;

the cleaning liquid provided by the water tank flows to the rotating path so as to be received by the water through hole.

6. The cleaning device of claim 5, wherein the water passage hole comprises a plurality of first through holes;

the plurality of first through holes are annularly arranged by taking the axis of the rotating shaft as a central line;

the number of the water passing holes is equal to that of the first through holes, and orthographic projections of the water passing holes on the bottom surface are at least partially overlapped with the first through holes.

7. The cleaning device of claim 6, wherein the water passage hole further comprises a plurality of second through holes;

the plurality of second vias are located in an annular array of the plurality of first vias.

8. The cleaning device of claim 7, wherein a plurality of the first through holes and a plurality of the second through holes are staggered in sequence, and the second through holes are equidistant from adjacent two of the first through holes.

9. The cleaning device of claim 8, wherein the first through-hole has a larger hole area than the second through-hole.

10. The cleaning device of claim 5, wherein the support member and the wiper member are each configured as a disc structure;

the support piece is provided with a positioning part, and the positioning part protrudes out of the bottom surface;

the wiper has a positioning hole, the positioning part is embedded in the positioning hole, and the axis of the wiper is coincident with the axis of the support.

11. The cleaning device of claim 10, wherein the support member has an annular collar disposed thereon;

the annular retainer ring extends from the top surface in a direction away from the bottom surface, and the annular retainer ring is circumferentially disposed along an edge of the support member.

12. The cleaning device of claim 11, wherein the annular collar is configured as a circular ring structure, an axis of the annular collar and an axis of the support member being coincident.

13. The cleaning device of claim 10, further comprising an encapsulation member that encapsulates a side of the support member;

the rubber coating piece is provided with a blocking portion, the blocking portion is of an annular structure, the blocking portion extends from the rubber coating piece to a direction away from the bottom surface, and the blocking portion protrudes out of the top surface.

14. The cleaning device of claim 13, wherein a predetermined distance is provided between the top of the barrier and the top surface, the predetermined distance being between 0.1cm and 2 cm.

15. The cleaning device of claim 10, further comprising a water permeable member;

the water seepage piece is paved on the top surface, and when the cleaning liquid flowing out of the water tank drops on the water seepage piece, the water seepage piece blocks the cleaning liquid from being thrown out under the action of centrifugal force.

16. The cleaning device of claim 15, wherein the water permeable member covers the water passage hole, and the cleaning liquid supplied from the water tank passes through the water permeable member and enters the water passage hole.

17. The cleaning device of claim 15, wherein the water permeable member has an aperture;

The orthographic projection of the opening on the top surface is at least partially coincident with the water through hole, so that the cleaning liquid flowing to the rotating path enters the water through hole through the opening.

18. The cleaning device of claim 17, wherein the top surface is configured to: the water holes are obliquely downwards arranged from the inner side of the top surface and the outer edge of the top surface towards the water through holes;

when the cleaning liquid provided by the water tank drops on the water seepage piece, the cleaning liquid drops on the top surface through the water seepage piece and flows to the water through hole under the guidance of the top surface.

19. The cleaning device of claim 5, wherein the tank provides cleaning liquid to the support member through a liquid replenishment line;

the liquid supplementing pipeline and the top surface have a preset included angle at the water outlet of the liquid supplementing pipeline;

the preset included angle is an acute angle, so that cleaning liquid flowing out of the water outlet of the liquid supplementing pipeline flows to the rotating path in a parabolic manner;

or alternatively, the process may be performed,

the preset included angle is a right angle, and the water outlet of the liquid supplementing pipeline is positioned right above the rotating path.

20. A cleaning assembly comprising at least a support and a wiper;

The support piece is provided with a top surface, a bottom surface and water through holes, the top surface and the bottom surface are respectively positioned at two sides of the support piece, and the water through holes penetrate through the top surface and the bottom surface;

the back surface of the wiper is connected with the bottom surface, the wiper is provided with a water passing hole, the water passing hole is communicated with the water passing hole, and the water passing hole extends from the back surface of the wiper to the front surface of the wiper.

21. The cleaning assembly of claim 20, wherein the water passing holes are through holes that extend through the back side of the wipe and the front side of the wipe.

22. The cleaning assembly of claim 20, wherein the water passing hole is a blind hole and an opening of the water passing hole is located on a back side of the wiper.

23. The cleaning assembly of claim 20 or 22, further comprising a rotating shaft coupled to the support and protruding from the top surface;

the support and the wiper are each configured as a disc structure, the axis of the wiper, the axis of the support and the axis of the rotary shaft being coincident.

24. The cleaning assembly of claim 23, wherein the water passage holes comprise a plurality of first through holes and a plurality of second through holes;

the plurality of first through holes are arranged in an annular array by taking the axis of the rotating shaft as a central line, the number of the water passing holes is the same as that of the plurality of first through holes, and the orthographic projection of the plurality of water passing holes on the bottom surface is at least partially overlapped with the plurality of first through holes;

the second through holes are arranged in the annular arrays of the first through holes, the first through holes and the second through holes are sequentially staggered, and the distances between the second through holes and the adjacent two first through holes are equal.