CN116240598A - Preparation method of titanium-based noble metal oxide coating electrode material - Google Patents

Preparation method of titanium-based noble metal oxide coating electrode material Download PDF

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CN116240598A
CN116240598A CN202310083708.7A CN202310083708A CN116240598A CN 116240598 A CN116240598 A CN 116240598A CN 202310083708 A CN202310083708 A CN 202310083708A CN 116240598 A CN116240598 A CN 116240598A
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electrode material
titanium
noble metal
metal oxide
ionic liquid
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张永春
李乔
乔志华
乔嘉豪
陈朝阳
王飞
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Baoji Titanium Prius Titanium Anode Technology Co ltd
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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10—Electroplating with more than one layer of the same or of different metals
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/04—Wires; Strips; Foils
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/38—Electroplating: Baths therefor from solutions of copper
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/34—Pretreatment of metallic surfaces to be electroplated
    • C25D5/38—Pretreatment of metallic surfaces to be electroplated of refractory metals or nickel
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/48—After-treatment of electroplated surfaces
    • C25D5/50—After-treatment of electroplated surfaces by heat-treatment

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  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
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  • Electrodes For Compound Or Non-Metal Manufacture (AREA)

Abstract

The invention belongs to the technical field of electrode material preparation, and discloses a preparation method of a titanium-based noble metal oxide coating electrode material, which comprises the steps of carrying out sand blasting, acid etching and surface cleaning pretreatment on a titanium substrate; then constant current electrodeposition is carried out by using the ionic liquid electrodeposition solution I and II and high temperature oxidation is carried out to form Ta 2 O 5 Underlayer and external IrO 2 ‑Ta 2 O 5 And (3) a composite coating. The titanium-based noble metal oxygen prepared by the inventionThe binding force of the electrode material of the chemical coating is good, the consistency of the components and the structure is good, and the service life is long.

Description

Preparation method of titanium-based noble metal oxide coating electrode material
Technical Field
The invention belongs to the technical field of electrode material preparation, in particular relates to a preparation method of a titanium-based noble metal oxide coating electrode material, and particularly relates to a titanium-based IrO for electrolytic copper foil 2 -Ta 2 O 5 A preparation method of a coating electrode material.
Background
Titanium-based IrO 2 -Ta 2 O 5 The electrode material has the advantages of high electrocatalytic activity and long service life, thereby being applied to the fields of electrolytic copper foil, electroplating, water treatment and the like. Currently, ti/IrO 2 -Ta 2 O 5 The bottleneck of electrode materials is the quality non-uniformity of the whole set of products, which directly affects the service life and the quality of cathode copper foil. Industrial production of Ti/IrO 2 -Ta 2 O 5 The electrode material is mainly prepared by a coating oxidation method, and the method inevitably has the problems of poor binding force and uneven coating thickness. Literature reports that the binding force and the uniformity of the coating are improved by preparing the tantalum bottom layer through methods such as molten salt dip plating, magnetron sputtering, plasma spraying and the like, but the methods are expensive in equipment, complex in process, large in raw material waste and not suitable for industrial production. The ionic liquid has the advantages of low vapor pressure, good thermal stability and wide electrochemical window, but the composite coating of Ta and Ir-Ta can not be realized by the method of electrodepositing the aqueous solution by the ionic liquid.
Disclosure of Invention
In view of the defects in the prior art, the invention aims to provide a method for preparing a Ta or Ir-Ta coating by electrodeposition in an ionic liquid solution and preparing titanium-based IrO by oxidation 2 -Ta 2 O 5 A method of electrode material.
In order to achieve the purpose of the invention, the inventor is continuously explored through a large amount of experimental researches, and finally screens out a proper ionic liquid electrodeposition solution and obtains the following technical scheme: a method for preparing a titanium-based noble metal oxide coating electrode material, which comprises the following steps:
(1) Carrying out surface pretreatment on a titanium matrix, wherein the pretreatment comprises sand blasting, acid etching and surface cleaning;
(2) Performing constant current electrodeposition and high temperature oxidation on the surface of the titanium substrate pretreated in the step (1) by utilizing an ionic liquid electrodeposition solution I to form Ta 2 O 5 A coating;
(3) Ta formed in step (2) 2 O 5 The surface of the coating is subjected to constant current electrodeposition by utilizing ionic liquid electrodeposition solution II and high-temperature oxidation to form external IrO 2 -Ta 2 O 5 Compounding the coating to obtain a titanium-based noble metal oxide coating electrode material;
the ionic liquid electrodeposition solution I is prepared by mixing BMIPF6 ionic liquid and anhydrous tantalum pentachloride according to the weight ratio of 1L:
(2-20) g;
the ionic liquid electrodeposition solution II is prepared by mixing BMIPF6 ionic liquid with anhydrous tantalum pentachloride and anhydrous ruthenium trichloride according to the following ratio of 1L: (2-20) g: (3-20) g.
The BMIPF6 ionic liquid disclosed by the invention is 1-methyl-3-butylimidazole hexafluorophosphate. The coating obtained from the ionic liquid electrodeposition solution I is Ta, and the Ta is obtained after oxidation at 450-550 DEG C 2 O 5 A coating; the coating obtained from the ionic liquid electrodeposition solution II is Ta and Ir composite coating, and IrO is obtained after oxidation at 450-550 DEG C 2 -Ta 2 O 5 And (3) a composite coating. Ta 2 O 5 The coating is used as a bottom layer of the titanium-based noble metal oxide coating electrode material; irO (IrO) 2 -Ta 2 O 5 The composite coating layer is used as an active coating layer of the titanium-based noble metal oxide coating electrode material.
Further preferred is a method for preparing a titanium-based noble metal oxide-coated electrode material as described above, said IrO 2 -Ta 2 O 5 Ir in the composite coating: ta molar ratio of 7: (2-3).
Further preferred isIn the ionic liquid electrodeposition solution I of the step (2), ti/IrO 2 -Ta 2 O 5 The electrode material is used as an anode, the pure titanium plate is used as a cathode, and the interval between the anode and the cathode is 19-21 mm.
Still further preferably, the constant current density of step (2) is 0.05 to 0.50mA/dm, as described above for the preparation of the titanium-based noble metal oxide-coated electrode material 2 The voltage between the anode and the cathode is 1.0-4.0V, the electrodeposition temperature is 60-80 ℃, and the electrodeposition time is 0.5-4 h.
Further preferably, the preparation method of the titanium-based noble metal oxide coated electrode material comprises the step (3) of coating Ti/IrO prepared by an oxidation process in the ionic liquid electrodeposition solution II 2 -Ta 2 O 5 The electrode material is used as an anode, and the titanium-based Ta prepared in the step (2) is prepared 2 O 5 The electrode material of the coating is used as a cathode, and the interval between the anode and the cathode is 19-21 mm.
Still further preferably, the constant current density of step (2) is 0.05 to 0.50mA/dm, as described above for the preparation of the titanium-based noble metal oxide-coated electrode material 2 The voltage between the anode and the cathode is 1.0-4.0V, the electrodeposition temperature is 60-80 ℃, and the electrodeposition time is 0.5-12 h.
Further preferably, the preparation method of the titanium-based noble metal oxide-coated electrode material as described above, the step (2) is repeated 2 to 4 times before the step (3).
Further preferably, the preparation method of the titanium-based noble metal oxide-coated electrode material as described above, the step (3) is repeated 5 to 7 times.
Further preferably, as described above, the preparation method of the titanium-based noble metal oxide coated electrode material, wherein the high temperature oxidation step in step (2) or step (3) is to wash the sample with absolute ethanol and pure water in sequence, then dry the sample at 100-125 ℃ for 4-8 min, and oxidize the sample in a muffle furnace at 450-550 ℃ for 10-20 min.
Still further preferably, a titanium-based noble metal oxide-coated electrode as described abovePreparation method of material, ti/IrO 2 -Ta 2 O 5 The electrode material is prepared by a coating oxidation process.
Compared with the prior art, the preparation method of the titanium-based noble metal oxide coating electrode material has the following advantages and remarkable progress:
(1) The method prepares the Ta plating layer with good binding force and uniform thickness by utilizing the ionic liquid solution electrodeposition, and the Ta plating layer with good binding force and uniform thickness is obtained after oxidation 2 O 5 A bottom layer.
(2) The invention is in Ta 2 O 5 Ir-Ta coating with good binding force and uniform thickness is prepared on the surface of the bottom layer, and then IrO with good binding force and uniform thickness is obtained through oxidation 2 -Ta 2 O 5 And (3) an active coating.
(3) The titanium-based noble metal oxide coating electrode material prepared by the invention has good binding force, good consistency of components and structures and long service life.
Drawings
FIG. 1 is a diagram of Ti/IrO prepared in example 3 2 -Ta 2 O 5 And (5) carrying out electron microscopy on the surface of the electrode material.
DETAILED DESCRIPTION OF EMBODIMENT (S) OF INVENTION
The present invention will be described in detail with reference to specific examples. The following examples will assist those skilled in the art in further understanding the present invention, but are not intended to limit the invention in any way. It should be noted that variations and modifications could be made by those skilled in the art without departing from the inventive concept. These are all within the scope of the present invention.
Example 1
S1: 250ml of BMIPF6 ionic liquid was added to a 500ml electrodeposition cell in a vacuum glove box, and 0.6g of anhydrous TaCl was added to the solution 5 Stirring the salt at a rotating speed of 1000r/min, and heating the solution to 80 ℃ to completely dissolve the tantalum salt into the ionic liquid to serve as an ionic liquid electrodeposition solution I;
s2: with 20mm x 20mm Ti/IrO 2 -Ta 2 O 5 The electrode material is used as anode, 20mm by 20mmThe pure titanium plate is used as a cathode, the surface of the anode is parallel to the surface of the cathode, and the interval between the anode and the cathode is 20mm;
s3: constant current electrodeposition in an ionic liquid electrodeposition solution I at 80 ℃ with a cathodic current density of 0.05mA/dm 2 The voltage between the anode and the cathode is about 1.8V;
s4: taking out the matrix material after electrodeposition for 3 hours, washing the matrix material with absolute ethyl alcohol and pure water in sequence, drying the matrix material at 120 ℃ for 5 minutes, and oxidizing the matrix material in a muffle furnace at 500 ℃ for 15 minutes to obtain Ta 2 O 5 A bottom layer, air-cooled to room temperature;
s5: 250ml of BMIPF6 ionic liquid was added to a 500ml electrodeposition cell in a vacuum glove box, and 0.6g of anhydrous TaCl was added to the solution 5 Salt and 0.8g of anhydrous IrCl 3 Stirring the salt at a rotating speed of 1000r/min, and heating the solution to 80 ℃ to completely dissolve the tantalum salt into the ionic liquid to serve as an ionic liquid electrodeposition solution II;
s6: electrodepositing the sample obtained in the step S4 in an ionic liquid electrodeposition solution II at 80 ℃ for 6 hours, taking out, washing with absolute ethyl alcohol and pure water in sequence, drying at 120 ℃ for 5 minutes, oxidizing in a muffle furnace at 500 ℃ for 15 minutes, and cooling to room temperature to obtain Ti/IrO 2 -Ta 2 O 5 An electrode material 1.
Example 2
S1: 250ml of BMIPF6 ionic liquid was added to a 500ml electrodeposition cell in a vacuum glove box, and 0.6g of anhydrous TaCl was added to the solution 5 Stirring the salt at a rotating speed of 1000r/min, and heating the solution to 80 ℃ to completely dissolve the tantalum salt into the ionic liquid to serve as an ionic liquid electrodeposition solution I;
s2: with 20mm x 20mm Ti/IrO2-Ta 2 O 5 The electrode material is used as an anode, a pure titanium plate with the thickness of 20mm is used as a cathode, the surface of the anode is parallel to the surface of the cathode, and the interval between the anode and the cathode is 20mm;
s3: constant current electrodeposition in an ionic liquid electrodeposition solution I at 80℃with a cathodic current density of 0.05mA/dm 2 The voltage between the anode and the cathode is about 1.8V;
s4: electrodeposition in an ionic liquid electrodeposition solution I at 80 DEG CTaking out the matrix material after 1h of accumulation, washing the matrix material with absolute ethyl alcohol and pure water in sequence, drying the matrix material at 120 ℃ for 5min, and oxidizing the matrix material in a muffle furnace at 500 ℃ for 15min to obtain Ta 2 O 5 A bottom layer, air-cooled to room temperature;
s5: repeating step S4 for 3 times to obtain Ta 2 O 5 A bottom layer;
s6: 250ml of BMIPF6 ionic liquid was added to a 500ml electrodeposition cell in a vacuum glove box, and 0.6g of anhydrous TaCl was added to the solution 5 Salt and 0.8g of anhydrous IrCl 3 Stirring the salt at a rotating speed of 1000r/min, and heating the solution to 80 ℃ to completely dissolve the tantalum salt into the ionic liquid to serve as an ionic liquid electrodeposition solution II;
s7: electrodepositing the sample obtained in the step S5 in an ionic liquid electrodeposition solution II at 80 ℃ for 6 hours, taking out, washing with absolute ethyl alcohol and pure water in sequence, drying at 120 ℃ for 5 minutes, oxidizing in a muffle furnace at 500 ℃ for 15 minutes, and cooling to room temperature to obtain Ti/IrO 2 -Ta 2 O 5 Electrode material 2.
Example 3
S1: 250ml of BMIPF6 ionic liquid was added to a 500ml electrodeposition cell in a vacuum glove box, and 0.6g of anhydrous TaCl was added to the solution 5 Stirring the salt at a rotating speed of 1000r/min, and heating the solution to 80 ℃ to completely dissolve the tantalum salt into the ionic liquid to serve as an ionic liquid electrodeposition solution I;
s2: with 20mm x 20mm Ti/IrO 2 -Ta 2 O 5 The electrode material is used as an anode, a pure titanium plate with the thickness of 20mm is used as a cathode, the surface of the anode is parallel to the surface of the cathode, and the interval between the anode and the cathode is 20mm;
s3: constant current electrodeposition in an ionic liquid electrodeposition solution I at 80℃with a cathodic current density of 0.05mA/dm 2 The voltage between the anode and the cathode is about 1.8V;
s4: taking out the matrix material after electrodeposition for 1h, washing with absolute ethyl alcohol and pure water in sequence, drying at 120 ℃ for 5min, and oxidizing in a muffle furnace at 500 ℃ for 15min to obtain Ta 2 O 5 A bottom layer, air-cooled to room temperature;
s5: repeating step S4 for 3 times to obtain Ta 2 O 5 A bottom layer;
s6: 250ml of BMIPF6 ionic liquid was added to a 500ml electrodeposition cell in a vacuum glove box, and 0.6g of anhydrous TaCl was added to the solution 5 Salt and 0.8g of anhydrous IrCl 3 Stirring the salt at a rotating speed of 1000r/min, and heating the solution to 80 ℃ to completely dissolve the tantalum salt into the ionic liquid to serve as an ionic liquid electrodeposition solution II;
s7: electrodepositing the sample obtained in the step S5 in an ionic liquid electrodeposition solution II at 80 ℃ for 1h, taking out, washing with absolute ethyl alcohol and pure water in sequence, drying at 120 ℃ for 5min, oxidizing in a muffle furnace at 500 ℃ for 15min, and cooling to room temperature to obtain IrO 2 -Ta 2 And (3) O5 coating.
S8: repeating the step S7 for 6 times to obtain Ti/IrO 2 -Ta 2 O 5 Electrode material 3 (shown in fig. 1).
The life spans for the electrode materials 1, 2, and 3 obtained in examples 1, 2, and 3 were 10.2 days, 13.5 days, and 20.5 days, respectively.
Example 4 (Ionic liquid BMIPF4 instead of BMIPF 6)
S1: 250ml of BMIPF4 ionic liquid was added to a 500ml electrodeposition cell in a vacuum glove box, and 0.6g of anhydrous TaCl was added to the solution 5 Stirring the salt at a rotating speed of 1000r/min, and heating the solution to 80 ℃ to completely dissolve the tantalum salt into the ionic liquid to serve as an ionic liquid electrodeposition solution I;
s2: with 20mm x 20mm Ti/IrO 2 -Ta 2 O 5 The electrode material is used as an anode, a pure titanium plate with the thickness of 20mm is used as a cathode, the surface of the anode is parallel to the surface of the cathode, and the interval between the anode and the cathode is 20mm;
s3: constant current electrodeposition in an ionic liquid electrodeposition solution I at 80℃with a cathodic current density of 0.05mA/dm 2 The voltage between the anode and the cathode is about 1.8V;
s4: taking out the matrix material after electrodeposition for 1h, washing with absolute ethyl alcohol and pure water in sequence, drying at 120 ℃ for 5min, and oxidizing in a muffle furnace at 500 ℃ for 15min to obtain Ta 2 O 5 A bottom layer, air-cooled to room temperature;
s5: repeatingS4, step 3 times, obtaining Ta 2 O 5 A bottom layer;
s6: 250ml of BMIPF4 ionic liquid was added to a 500ml electrodeposition cell in a vacuum glove box, and 0.6g of anhydrous TaCl was added to the solution 5 Salt and 0.8g of anhydrous IrCl 3 Stirring the salt at a rotating speed of 1000r/min, and heating the solution to 80 ℃ to completely dissolve the tantalum salt into the ionic liquid to serve as an ionic liquid electrodeposition solution II;
s7: and S5, electrodepositing the sample obtained in the S5 in an ionic liquid electrodeposition solution II at 80 ℃ for 1h, taking out, washing with absolute ethyl alcohol and pure water sequentially, drying at 120 ℃ for 5min, oxidizing in a muffle furnace at 500 ℃ for 15min, and cooling to room temperature to obtain IrO 2 -Ta 2 O 5 And (3) coating.
S8: repeating the step S7 for 6 times to obtain Ti/IrO 2 -Ta 2 O 5 And an electrode material 4.
The enhanced lifetime analysis showed that the enhanced lifetime of electrode material 4 obtained in example 4 was 16.2 days, which is less than 20.5 days of electrode material 3.
Example 5
Example 5 preparation of Ti/IrO having the same noble metals Ir, ta content as example 3 Using coating Process 2 -Ta 2 O 5 The electrode material comprises the following specific implementation steps:
s1: coating tantalum pentachloride n-butanol and n-butanol solution with oxidation of 0.20mol/L on the surface of the titanium substrate for 3 times, wherein the coating is full and wet, the oxidation temperature is 500 ℃, and the oxidation time is 15min;
s2: coating the sample obtained in S1 with 0.20mol of IrCl oxide 3 Coating with n-butanol solution of tantalum pentachloride/n-butanol solution of tantalum pentachloride and isopropanol solution of tantalum pentachloride for 3 times, wherein the coating is full and wet, and the oxidation temperature is 500 ℃ and the oxidation time is 15min; wherein IrCl is 3 The molar ratio of the titanium tetrachloride to the tantalum pentachloride is 1:1;
s3: coating the sample obtained in S2 with 0.20mol of IrCl oxide 3 Coating with n-butanol solution of tantalum pentachloride/n-butanol solution of isopropyl alcohol solution of tantalum pentachloride for 6 times, wherein the coating is full and wet, the oxidation temperature is 500 deg.C, and the first 5 times of oxidation are 15min, wherein IrCl is added 3 The molar ratio of the titanium dioxide to tantalum pentachloride is 7:3, the time of the 6 th oxidation is 30min, and the Ti/IrO can be obtained 2 -Ta 2 O 5 And an electrode material 5.
The enhanced lifetime analysis showed that the enhanced lifetime of electrode material 5 obtained in example 5 was 18.3 days, which is less than 20.5 days of electrode material 3.

Claims (10)

1. A method for preparing a titanium-based noble metal oxide coating electrode material, which is characterized by comprising the following steps:
(1) Carrying out surface pretreatment on a titanium matrix, wherein the pretreatment comprises sand blasting, acid etching and surface cleaning;
(2) Performing constant current electrodeposition and high temperature oxidation on the surface of the titanium substrate pretreated in the step (1) by utilizing an ionic liquid electrodeposition solution I to form Ta 2 O 5 A coating;
(3) Ta formed in step (2) 2 O 5 The surface of the coating is subjected to constant current electrodeposition by utilizing ionic liquid electrodeposition solution II and high-temperature oxidation to form external IrO 2 -Ta 2 O 5 Compounding the coating to obtain a titanium-based noble metal oxide coating electrode material;
the ionic liquid electrodeposition solution I is prepared by mixing BMIPF6 ionic liquid and anhydrous tantalum pentachloride according to the weight ratio of 1L:
(2.0-20 g) and mixing and dissolving the mixture to obtain the product;
the ionic liquid electrodeposition solution II is prepared by mixing BMIPF6 ionic liquid with anhydrous tantalum pentachloride and anhydrous ruthenium trichloride according to the following ratio of 1L: (2-20) g: (3-20) g.
2. The method for preparing a titanium-based noble metal oxide-coated electrode material according to claim 1, wherein the IrO is 2 -Ta 2 O 5 Ir in the composite coating: ta molar ratio of 7: (2-3).
3. The method for producing a titanium-based noble metal oxide-coated electrode material according to claim 1, wherein in the step (2), the ionic liquid is electroprecipitatedIn the solution I, ti/IrO 2 -Ta 2 O 5 The electrode material is used as an anode, the pure titanium plate is used as a cathode, and the interval between the anode and the cathode is 19-21 mm.
4. The method for producing a titanium-based noble metal oxide-coated electrode material according to claim 3, wherein the constant current density in step (2) is 0.05 to 0.50mA/dm 2 The voltage between the anode and the cathode is 1.0-4.0V, the electrodeposition temperature is 60-80 ℃, and the electrodeposition time is 0.5-4 h.
5. The method for preparing a titanium-based noble metal oxide coated electrode material according to claim 1, wherein in the ionic liquid electrodeposition solution II in the step (3), ti/IrO prepared by an oxidation process is coated 2 -Ta 2 O 5 The electrode material is used as an anode, and the titanium-based Ta prepared in the step (2) is prepared 2 O 5 The electrode material of the coating is used as a cathode, and the interval between the anode and the cathode is 19-21 mm.
6. The method for producing a titanium-based noble metal oxide-coated electrode material according to claim 5, wherein the constant current density in step (2) is 0.05 to 0.50mA/dm 2 The voltage between the anode and the cathode is 1.0-4.0V, the electrodeposition temperature is 60-80 ℃, and the electrodeposition time is 0.5-12 h.
7. The method for producing a titanium-based noble metal oxide-coated electrode material according to claim 1, wherein the step (2) is repeated 2 to 4 times before the step (3).
8. The method for producing a titanium-based noble metal oxide-coated electrode material according to claim 1, wherein the step (3) is repeated 5 to 7 times.
9. The method for preparing a titanium-based noble metal oxide coated electrode material according to claim 1, wherein the high-temperature oxidation step in the step (2) or the step (3) is to wash a sample with absolute ethanol and pure water in sequence, dry the sample at 100-125 ℃ for 4-8 min, and oxidize the sample in a muffle furnace at 450-550 ℃ for 10-20 min.
10. The method for producing a titanium-based noble metal oxide-coated electrode material according to claim 3, wherein the Ti/IrO 2 -Ta 2 O 5 The electrode material is prepared by a coating oxidation process.
CN202310083708.7A 2023-02-08 2023-02-08 Preparation method of titanium-based noble metal oxide coating electrode material Pending CN116240598A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117646270A (en) * 2024-01-29 2024-03-05 宝鸡钛普锐斯钛阳极科技有限公司 Titanium anode suitable for organic additive application system and manufacturing method thereof

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117646270A (en) * 2024-01-29 2024-03-05 宝鸡钛普锐斯钛阳极科技有限公司 Titanium anode suitable for organic additive application system and manufacturing method thereof
CN117646270B (en) * 2024-01-29 2024-04-12 宝鸡钛普锐斯钛阳极科技有限公司 Titanium anode suitable for organic additive application system and manufacturing method thereof

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