CN116199251A - Method for efficiently preparing gallium oxyhydroxide - Google Patents
Method for efficiently preparing gallium oxyhydroxide Download PDFInfo
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- CN116199251A CN116199251A CN202310054518.2A CN202310054518A CN116199251A CN 116199251 A CN116199251 A CN 116199251A CN 202310054518 A CN202310054518 A CN 202310054518A CN 116199251 A CN116199251 A CN 116199251A
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- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 title claims abstract description 145
- 229910052733 gallium Inorganic materials 0.000 title claims abstract description 145
- 238000000034 method Methods 0.000 title claims abstract description 54
- 229910052751 metal Inorganic materials 0.000 claims abstract description 53
- 239000002184 metal Substances 0.000 claims abstract description 53
- 239000000843 powder Substances 0.000 claims abstract description 21
- 239000000463 material Substances 0.000 claims abstract description 20
- 238000002360 preparation method Methods 0.000 claims abstract description 14
- 238000006243 chemical reaction Methods 0.000 claims description 36
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 33
- 239000008367 deionised water Substances 0.000 claims description 29
- 229910021641 deionized water Inorganic materials 0.000 claims description 29
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 15
- 229910052760 oxygen Inorganic materials 0.000 claims description 15
- 239000001301 oxygen Substances 0.000 claims description 15
- 238000010907 mechanical stirring Methods 0.000 claims description 14
- 239000007788 liquid Substances 0.000 claims description 12
- 238000000926 separation method Methods 0.000 claims description 10
- 239000011268 mixed slurry Substances 0.000 claims description 8
- 239000003570 air Substances 0.000 claims description 4
- 238000001035 drying Methods 0.000 claims description 4
- 238000007664 blowing Methods 0.000 claims description 2
- 238000011112 process operation Methods 0.000 claims description 2
- 230000035484 reaction time Effects 0.000 claims description 2
- 230000008569 process Effects 0.000 abstract description 15
- 238000005265 energy consumption Methods 0.000 abstract description 7
- 239000003153 chemical reaction reagent Substances 0.000 abstract description 6
- 238000005272 metallurgy Methods 0.000 abstract description 2
- 239000000243 solution Substances 0.000 description 9
- AJNVQOSZGJRYEI-UHFFFAOYSA-N digallium;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Ga+3].[Ga+3] AJNVQOSZGJRYEI-UHFFFAOYSA-N 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 8
- 238000004090 dissolution Methods 0.000 description 7
- 229910001195 gallium oxide Inorganic materials 0.000 description 7
- 239000004065 semiconductor Substances 0.000 description 7
- QZPSXPBJTPJTSZ-UHFFFAOYSA-N aqua regia Chemical compound Cl.O[N+]([O-])=O QZPSXPBJTPJTSZ-UHFFFAOYSA-N 0.000 description 5
- 238000009616 inductively coupled plasma Methods 0.000 description 5
- 238000003672 processing method Methods 0.000 description 5
- 239000002994 raw material Substances 0.000 description 5
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- CHPZKNULDCNCBW-UHFFFAOYSA-N gallium nitrate Chemical compound [Ga+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O CHPZKNULDCNCBW-UHFFFAOYSA-N 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- 239000003513 alkali Substances 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 229910000373 gallium sulfate Inorganic materials 0.000 description 3
- SBDRYJMIQMDXRH-UHFFFAOYSA-N gallium;sulfuric acid Chemical compound [Ga].OS(O)(=O)=O SBDRYJMIQMDXRH-UHFFFAOYSA-N 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000005587 bubbling Effects 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 230000018109 developmental process Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 229940044658 gallium nitrate Drugs 0.000 description 2
- 238000003837 high-temperature calcination Methods 0.000 description 2
- 238000001027 hydrothermal synthesis Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 229910001338 liquidmetal Inorganic materials 0.000 description 2
- 239000002159 nanocrystal Substances 0.000 description 2
- 230000003472 neutralizing effect Effects 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 2
- FZHLWVUAICIIPW-UHFFFAOYSA-M sodium gallate Chemical compound [Na+].OC1=CC(C([O-])=O)=CC(O)=C1O FZHLWVUAICIIPW-UHFFFAOYSA-M 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 239000002351 wastewater Substances 0.000 description 2
- WBIQQQGBSDOWNP-UHFFFAOYSA-N 2-dodecylbenzenesulfonic acid Chemical compound CCCCCCCCCCCCC1=CC=CC=C1S(O)(=O)=O WBIQQQGBSDOWNP-UHFFFAOYSA-N 0.000 description 1
- LZZYPRNAOMGNLH-UHFFFAOYSA-M Cetrimonium bromide Chemical compound [Br-].CCCCCCCCCCCCCCCC[N+](C)(C)C LZZYPRNAOMGNLH-UHFFFAOYSA-M 0.000 description 1
- 229910005191 Ga 2 O 3 Inorganic materials 0.000 description 1
- 229910002601 GaN Inorganic materials 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 238000001354 calcination Methods 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007123 defense Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 229940060296 dodecylbenzenesulfonic acid Drugs 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 239000003517 fume Substances 0.000 description 1
- 150000002258 gallium Chemical class 0.000 description 1
- UPWPDUACHOATKO-UHFFFAOYSA-K gallium trichloride Chemical compound Cl[Ga](Cl)Cl UPWPDUACHOATKO-UHFFFAOYSA-K 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000002386 leaching Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 239000012429 reaction media Substances 0.000 description 1
- 239000012047 saturated solution Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G15/00—Compounds of gallium, indium or thallium
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/80—Compositional purity
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/10—Energy storage using batteries
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Manufacture And Refinement Of Metals (AREA)
Abstract
Description
技术领域technical field
本发明属于有色金属冶金技术领域,具体涉及一种高效制备羟基氧化镓的方法。The invention belongs to the technical field of nonferrous metal metallurgy, and in particular relates to a method for efficiently preparing gallium oxyhydroxide.
背景技术Background technique
氧化镓(Ga2O3)是一种超宽禁带半导体,是目前最新型的第四代半导体材料,其禁带宽度高达4.9-5.3eV。相比之下,碳化硅(SiC)、氮化镓(GaN)等半导体的禁带宽度分别为3.25eV、3.4eV,而硅的禁带宽度仅为1.1eV。超高的禁带宽度使Ga2O3具有高抗辐照、抗高温能力以及高击穿场强,制备的器件可在高低温、强辐射等极端环境下保持稳定,而且其功率半导体性能数倍于Si、SiC和GaN,是制备高功率半导体电子器件的优选材料,在大功率电子器件、紫外透明导电、日盲探测、气体传感等方面具有十分重要的应用价值。Gallium oxide (Ga 2 O 3 ) is an ultra-wide bandgap semiconductor, the latest fourth-generation semiconductor material, with a bandgap as high as 4.9-5.3eV. In contrast, semiconductors such as silicon carbide (SiC) and gallium nitride (GaN) have a bandgap of 3.25eV and 3.4eV, respectively, while the bandgap of silicon is only 1.1eV. The ultra-high band gap makes Ga 2 O 3 have high radiation resistance, high temperature resistance and high breakdown field strength. The prepared device can maintain stability in extreme environments such as high and low temperature, strong radiation, etc., and its power semiconductor performance data It is twice as much as Si, SiC and GaN, and it is the preferred material for the preparation of high-power semiconductor electronic devices. It has very important application value in high-power electronic devices, ultraviolet transparent conduction, solar blind detection, gas sensing, etc.
随着信息、能源、交通、国防等高新技术产业领域的快速发展,行业对氧化镓的需求与日俱增。生产高纯氧化镓,通常以高纯金属镓或镓盐为原料,首先制备纯度和尺寸形貌符合要求的羟基氧化镓前驱体,再进一步经高温煅烧获得高纯氧化镓。因此,制备合格的羟基氧化镓是生产氧化镓的必要条件和技术核心。With the rapid development of high-tech industries such as information, energy, transportation, and national defense, the industry's demand for gallium oxide is increasing day by day. The production of high-purity gallium oxide usually uses high-purity metal gallium or gallium salt as raw materials. First, a gallium oxyhydroxide precursor with a purity and size that meets the requirements is prepared, and then high-purity gallium oxide is obtained by further high-temperature calcination. Therefore, the preparation of qualified gallium oxyhydroxide is the necessary condition and technical core for the production of gallium oxide.
经检索,中国专利申请号为201810752162.9的申请案公开了一种制备氧化镓的方法,以硫酸和双氧水为溶解剂与金属镓反应生成硫酸镓溶液,再进一步结晶析出硫酸镓晶体,经高温煅烧得到氧化镓粉末。该方案由于采用的是反应活性相对较低的硫酸,在浸出时需加入双氧水促进金属镓的溶解过程,试剂成本较高,且在硫酸镓高温煅烧制备氧化镓过程会产生SO2烟气,环保压力较大。After retrieval, the Chinese patent application No. 201810752162.9 discloses a method for preparing gallium oxide, which uses sulfuric acid and hydrogen peroxide as solvents to react with metal gallium to form a gallium sulfate solution, and then further crystallizes out gallium sulfate crystals, which are obtained by high-temperature calcination. Gallium oxide powder. Because this solution uses sulfuric acid with relatively low reactivity, it is necessary to add hydrogen peroxide to promote the dissolution process of metal gallium during leaching, the reagent cost is high, and the process of preparing gallium oxide by calcining gallium sulfate at high temperature will produce SO 2 fume, which is environmentally friendly The pressure is high.
中国专利申请号为201711418839.7和201710311705.9的申请案公开了以金属镓为原料制备羟基氧化镓的方法,优选地以硝酸为溶解剂与金属镓反应生成硝酸镓溶液,再进一步向溶液中滴加碱液进行中和,经陈化后得到羟基氧化镓粉体;中国专利申请号为202010436819.8的申请案在此基础上提出在制备硝酸镓溶液阶段加入十二烷基苯磺酸等表面活性剂,以促进下一阶段中和沉淀羟基氧化镓过程;以上三个申请案均是基于金属镓酸溶、碱中和的基本思路制备羟基氧化镓,涉及大量酸、碱等试剂的消耗,不仅试剂成本高,易引入杂质,影响产品纯度,且酸碱无法回收,产生高盐废水难以处理。Chinese patent application numbers 201711418839.7 and 201710311705.9 disclose a method for preparing gallium oxyhydroxide using gallium metal as a raw material, preferably using nitric acid as a dissolving agent to react with gallium metal to form a gallium nitrate solution, and then further adding lye to the solution Neutralize and obtain gallium oxyhydroxide powder after aging; on this basis, the Chinese patent application number 202010436819.8 proposes to add surfactants such as dodecylbenzenesulfonic acid in the preparation of gallium nitrate solution to promote The next stage is the process of neutralizing and precipitating gallium oxyhydroxide; the above three applications are all based on the basic idea of metal gallium acid dissolution and alkali neutralization to prepare gallium oxyhydroxide, which involves the consumption of a large amount of reagents such as acid and alkali, not only the cost of reagents is high, It is easy to introduce impurities and affect the purity of the product, and the acid and alkali cannot be recovered, resulting in high-salt wastewater that is difficult to treat.
中国专利申请号为201210542115.4的申请案公开了一种电化学制备羟基氧化镓的方法,以金属镓为阳极在碱液电解质中进行三段电解得到镓酸钠溶液,进一步进行中和、洗涤、干燥获得了羟基氧化镓。该方法虽能获得高纯度产品,但通过电解金属镓获得镓酸钠溶液不仅流程长、操作复杂,且能耗较高,经济性不佳。The Chinese patent application No. 201210542115.4 discloses a method for electrochemically preparing gallium oxyhydroxide, using metal gallium as the anode to conduct three-stage electrolysis in lye electrolyte to obtain sodium gallate solution, further neutralizing, washing and drying Gallium oxyhydroxide was obtained. Although this method can obtain high-purity products, the process of obtaining sodium gallate solution by electrolyzing metal gallium is not only long and complicated, but also requires high energy consumption and poor economic efficiency.
中国专利申请号为201210313080.7的申请案公开了一种羟基氧化镓纳米晶体的制备方法,以氯化镓的苯饱和溶液和十六烷基三甲基溴化铵为原料,在高压反应釜中160-200℃温度下反应10-18h,成功得到了羟基氧化镓纳米晶体,但该方法能耗高、对设备要求高,且易产生难处理的有机废水,环保压力较大。The Chinese patent application No. 201210313080.7 discloses a preparation method of gallium oxyhydroxide nanocrystals, using a benzene saturated solution of gallium chloride and cetyltrimethylammonium bromide as raw materials in a high-pressure reactor for 160 Gallium oxyhydroxide nanocrystals were successfully obtained by reacting at -200°C for 10-18 hours. However, this method requires high energy consumption, high equipment requirements, and is prone to produce difficult-to-treat organic wastewater, which poses a high pressure on environmental protection.
中国专利申请号为201910971014.0和201510835364.6的申请案公开了基于水热反应的短流程制备羟基氧化镓方法,以金属镓为原料与水直接反应获得了羟基氧化镓粉体,但金属镓与水的反应需要在150℃以上的高温、高压条件下进行,不仅能耗较高,且需要用到成本较高的压力反应设备,而且机械搅拌的方式无法将液态金属镓充分打散、搅匀,导致水热反应难以进行彻底,且无法获得形貌和尺寸均一的羟基氧化镓粉体材料。Chinese patent application numbers 201910971014.0 and 201510835364.6 disclose a short-process method for preparing gallium oxyhydroxide based on hydrothermal reaction. The gallium oxyhydroxide powder is obtained by direct reaction of metal gallium with water, but the reaction between metal gallium and water It needs to be carried out under high temperature and high pressure conditions above 150°C, which not only requires high energy consumption, but also requires the use of high-cost pressure reaction equipment, and the mechanical stirring method cannot fully disperse and stir the liquid gallium metal, resulting in water The thermal reaction is difficult to complete, and gallium oxyhydroxide powder materials with uniform shape and size cannot be obtained.
综上所述,现有的羟基氧化镓制备工艺仍有较大的优化和提升空间,有必要进一步开发操作简单、流程短、成本低、对环境友好的羟基氧化镓制备工艺技术,支撑第四代半导体行业的高质量发展。In summary, the existing gallium oxyhydroxide preparation process still has a lot of room for optimization and improvement. It is necessary to further develop a gallium oxyhydroxide preparation process technology with simple operation, short process, low cost and environmental friendliness to support the fourth High-quality development of the modern semiconductor industry.
发明内容Contents of the invention
本发明的目的在于克服现有羟基氧化镓制备工艺流程长、试剂消耗量大、对设备要求高、产品纯度和物理规格难以达标等问题,提供了一种高效制备羟基氧化镓的方法。本发明的工艺技术具有对设备要求低、操作简单、能耗低、流程短、效率高、成本低等特点,可以实现高纯羟基氧化镓粉体材料的高效短流程制备。The purpose of the present invention is to overcome the problems of the existing gallium oxyhydroxide preparation process, such as long process flow, large consumption of reagents, high requirements on equipment, difficulty in meeting product purity and physical specifications, etc., and provide a method for efficiently preparing gallium oxyhydroxide. The process technology of the present invention has the characteristics of low equipment requirements, simple operation, low energy consumption, short process, high efficiency, low cost, etc., and can realize efficient and short process preparation of high-purity gallium oxyhydroxide powder material.
为实现上述技术目的,达到上述技术效果,本发明是通过以下技术方案实现:In order to achieve the above-mentioned technical purpose and achieve the above-mentioned technical effect, the present invention is realized through the following technical solutions:
一种高效制备羟基氧化镓的方法,在常压条件下,将金属镓加入去离子水中,同时向体系中鼓入氧气或空气,在机械搅拌条件下使金属镓转化为羟基氧化镓,实现高纯羟基氧化镓粉体材料的高效短流程制备。A method for efficiently preparing gallium oxyhydroxide. Under normal pressure, metal gallium is added to deionized water, and oxygen or air is blown into the system at the same time, and metal gallium is converted into gallium oxyhydroxide under mechanical stirring conditions to achieve high Efficient short-process preparation of pure gallium oxyhydroxide powder materials.
进一步地,如上所述高效制备羟基氧化镓的方法,具体工艺操作为:Further, the method for efficiently preparing gallium oxyhydroxide as described above, the specific process operation is:
1)将金属镓按比例加入去离子水中;1) adding metal gallium to deionized water in proportion;
2)在常压条件下,将体系加热至预定温度,同时向体系中鼓入氧气或空气,在机械搅拌条件下使金属镓转化为羟基氧化镓;2) under normal pressure, the system is heated to a predetermined temperature, and oxygen or air is blown into the system at the same time, and metal gallium is converted into gallium oxyhydroxide under mechanical stirring conditions;
3)反应结束后对所得混合料浆进行过滤,实现固液分离;3) After the reaction, the resulting mixed slurry is filtered to achieve solid-liquid separation;
4)对滤渣进行干燥,得到高纯羟基氧化镓粉体材料。4) drying the filter residue to obtain a high-purity gallium oxyhydroxide powder material.
进一步地,如上所述高效制备羟基氧化镓的方法,步骤1)中,金属镓的纯度在4N以上,去离子水与金属镓的质量比控制在5-50:1。Further, in the method for efficiently preparing gallium oxyhydroxide as described above, in step 1), the purity of gallium metal is above 4N, and the mass ratio of deionized water to gallium metal is controlled at 5-50:1.
进一步地,如上所述高效制备羟基氧化镓的方法,步骤2)中,反应温度控制在25-95℃,反应时间控制在2-12h。Furthermore, in the method for efficiently preparing gallium oxyhydroxide as described above, in step 2), the reaction temperature is controlled at 25-95°C, and the reaction time is controlled at 2-12h.
进一步地,如上所述高效制备羟基氧化镓的方法,步骤2)中,氧气或空气的鼓入速度控制在1-20L/min。Further, in the method for efficiently preparing gallium oxyhydroxide as described above, in step 2), the blowing rate of oxygen or air is controlled at 1-20 L/min.
进一步地,如上所述高效制备羟基氧化镓的方法,步骤2)中,机械搅拌速度控制在300-1200r/min。Further, in the method for efficiently preparing gallium oxyhydroxide as described above, in step 2), the mechanical stirring speed is controlled at 300-1200r/min.
进一步地,如上所述高效制备羟基氧化镓的方法,步骤3)中,固液分离温度与步骤2)中化学反应温度一致,滤渣用去离子水洗涤3-8次。Further, in the method for efficiently preparing gallium oxyhydroxide as described above, in step 3), the solid-liquid separation temperature is consistent with the chemical reaction temperature in step 2), and the filter residue is washed 3-8 times with deionized water.
进一步地,如上所述高效制备羟基氧化镓的方法,步骤4)中,滤渣在120-180℃下干燥12-48h,得到高纯羟基氧化镓粉体材料。Further, in the method for efficiently preparing gallium oxyhydroxide as described above, in step 4), the filter residue is dried at 120-180° C. for 12-48 hours to obtain high-purity gallium oxyhydroxide powder material.
本发明的有益效果是:The beneficial effects of the present invention are:
1、本发明采用金属镓、去离子水以及氧气或空气为原料,通过气-液反应一步制备高纯羟基氧化镓粉体材料,流程短、效率高,无需消耗任何酸、碱等化学试剂,大幅降低原料引入杂质的风险,有利于获得高纯度产品,且生产过程对环境友好,生产成本低。1. The present invention uses gallium metal, deionized water, and oxygen or air as raw materials to prepare high-purity gallium oxyhydroxide powder materials in one step through gas-liquid reaction. The process is short and efficient, and no chemical reagents such as acids and alkalis are consumed. The risk of introducing impurities into raw materials is greatly reduced, which is conducive to obtaining high-purity products, and the production process is environmentally friendly and the production cost is low.
2、本发明以去离子水为反应介质,通过鼓入氧气或空气与液态金属镓直接反应生成羟基氧化镓,大幅强化了反应的热力学和动力学条件。相比于不通入氧气/空气的传统金属镓水热反应,生成羟基氧化镓的起始温度由原来的>150℃(优选200℃以上)降低至水的沸点以下(<100℃),使反应得以在常压条件下进行,不仅大幅降低反应所需能耗,且无需用到投资和维护成本较高的高压反应设备,可有效降低生产成本,提高生产企业的经济效益。2. The present invention uses deionized water as the reaction medium to directly react with liquid metal gallium to generate gallium oxyhydroxide by bubbling oxygen or air, which greatly strengthens the thermodynamic and kinetic conditions of the reaction. Compared with the traditional gallium metal hydrothermal reaction without oxygen/air, the initial temperature of gallium oxyhydroxide is lowered from the original >150°C (preferably above 200°C) to below the boiling point of water (<100°C), making the reaction It can be carried out under normal pressure conditions, which not only greatly reduces the energy consumption required for the reaction, but also does not need to use high-pressure reaction equipment with high investment and maintenance costs, which can effectively reduce production costs and improve the economic benefits of production enterprises.
3、本发明通过鼓入氧气/空气与机械搅拌协同强化家属镓向羟基氧化镓的转化过程,不仅能够有效降低反应所需温度和压力,而且能够在反应过程中将液态金属镓充分打散、搅匀,形成高度分散且尺寸均一的纳米级金属镓微粒,该微粒表面活性高、反应活性大,有利于反应过程高效、彻底地进行,且能够形成微观形貌和颗粒尺寸均一的羟基氧化镓粉体,从而最终获得化学纯度和物理规格均满足要求的生产第四代半导体材料的羟基氧化镓前驱体,实现高纯羟基氧化镓的高效短流程制备。3. The present invention synergistically strengthens the conversion process of family gallium to gallium oxyhydroxide by bubbling oxygen/air and mechanical stirring, which can not only effectively reduce the temperature and pressure required for the reaction, but also fully disperse the liquid metal gallium during the reaction process, Stir well to form highly dispersed and uniform-sized nano-scale metal gallium particles. The particles have high surface activity and high reactivity, which is conducive to the efficient and thorough reaction process, and can form gallium oxyhydroxide with uniform microscopic morphology and particle size. Powder, so as to finally obtain the gallium oxyhydroxide precursor for the production of fourth-generation semiconductor materials that meet the requirements of chemical purity and physical specifications, and realize the efficient and short-process preparation of high-purity gallium oxyhydroxide.
当然,实施本发明的任一产品并不一定需要同时达到以上的所有优点。Of course, implementing any product of the present invention does not necessarily need to achieve all the above advantages at the same time.
具体实施方式Detailed ways
下面将对本发明实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本发明一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其它实施例,都属于本发明保护的范围。The technical solutions in the embodiments of the present invention will be clearly and completely described below. Obviously, the described embodiments are only some of the embodiments of the present invention, but not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.
本发明公开了一种高效制备羟基氧化镓的方法,在常压条件下,将金属镓加入去离子水中,同时向体系中鼓入氧气或空气,在机械搅拌条件下使金属镓转化为羟基氧化镓。本发明技术方案具有对设备要求低、操作简单、能耗低、流程短、效率高、成本低等特点,可以实现高纯羟基氧化镓粉体材料的高效短流程制备。The invention discloses a method for efficiently preparing gallium oxyhydroxide. Under normal pressure conditions, metal gallium is added to deionized water, and oxygen or air is blown into the system at the same time, and metal gallium is converted into oxyhydroxide under mechanical stirring conditions. gallium. The technical scheme of the invention has the characteristics of low equipment requirements, simple operation, low energy consumption, short process, high efficiency, low cost, etc., and can realize the efficient and short process preparation of high-purity gallium oxyhydroxide powder material.
本发明的生产工艺具体包括以下步骤:Production technology of the present invention specifically comprises the following steps:
1)将纯度为4N以上金属镓按比例加入去离子水中,控制去离子水与金属镓的质量比在2:1至15:1之间。1) Add gallium metal with a purity of 4N or more into deionized water in proportion, and control the mass ratio of deionized water to gallium metal between 2:1 and 15:1.
2)在常压条件下,将体系加热至25-95℃,同时以1-20L/min的速度向体系中鼓入氧气或空气,在转速为300-1200r/min的机械搅拌条件下反应2-12h,使金属镓转化为羟基氧化镓。2) Under normal pressure, heat the system to 25-95°C, and at the same time blow oxygen or air into the system at a speed of 1-20L/min, and react under the condition of mechanical stirring at a speed of 300-1200r/min. -12h, to convert gallium metal into gallium oxyhydroxide.
3)反应结束后,在25-95℃温度下(与上一步反应温度一致)对所得混合料浆进行过滤,实现固液分离,滤渣用去离子水洗涤3-8次。3) After the reaction is completed, filter the obtained mixed slurry at a temperature of 25-95° C. (consistent with the reaction temperature of the previous step) to realize solid-liquid separation, and wash the filter residue with deionized water for 3-8 times.
4)将滤渣在120-180℃温度下干燥12-48h,得到高纯羟基氧化镓粉体材料。4) drying the filter residue at a temperature of 120-180° C. for 12-48 hours to obtain a high-purity gallium oxyhydroxide powder material.
下面结合具体实施例对本发明进一步进行描述。The present invention will be further described below in conjunction with specific embodiments.
实施例1Example 1
本实施例提供一种高效制备羟基氧化镓的方法,具体包括以下步骤:This embodiment provides a method for efficiently preparing gallium oxyhydroxide, which specifically includes the following steps:
1)将纯度为4N的金属镓按比例加入去离子水中,控制去离子水与金属镓的质量比为2:1。1) Add gallium metal with a purity of 4N to deionized water in proportion, and control the mass ratio of deionized water to gallium metal to be 2:1.
2)在常压条件下,将体系加热至25℃,同时以1L/min的速度向体系中鼓入氧气,在转速为300r/min的机械搅拌条件下反应12h,使金属镓转化为羟基氧化镓。2) Under normal pressure, heat the system to 25°C, and at the same time blow oxygen into the system at a speed of 1L/min, and react for 12h under the condition of mechanical stirring at a speed of 300r/min, so that gallium metal is converted into oxyhydroxide gallium.
3)反应结束后,在25℃温度下对所得混合料浆进行过滤,实现固液分离,滤渣用去离子水洗涤3次。3) After the reaction, the obtained mixed slurry was filtered at a temperature of 25° C. to realize solid-liquid separation, and the filter residue was washed three times with deionized water.
4)将滤渣在120℃温度下干燥48h,得到高纯羟基氧化镓粉体材料。4) Dry the filter residue at 120° C. for 48 hours to obtain a high-purity gallium oxyhydroxide powder material.
采用本实施例的处理方法,通过王水溶解结合电感耦合等离子体质谱仪(ICP-MS)分析羟基氧化镓的转化率和产品纯度,结果为金属镓向羟基氧化镓的转化率为99.71%,羟基氧化镓产品纯度为99.995%。Using the processing method of the present embodiment, the conversion rate and product purity of gallium oxyhydroxide were analyzed by aqua regia dissolution combined with inductively coupled plasma mass spectrometer (ICP-MS), and the result was that the conversion rate of metal gallium to gallium oxyhydroxide was 99.71%. Gallium oxyhydroxide product has a purity of 99.995%.
实施例2Example 2
本实施例提供一种高效制备羟基氧化镓的方法,具体包括以下步骤:This embodiment provides a method for efficiently preparing gallium oxyhydroxide, which specifically includes the following steps:
1)将纯度为4N的金属镓按比例加入去离子水中,控制去离子水与金属镓的质量比为15:1。1) Add gallium metal with a purity of 4N to deionized water in proportion, and control the mass ratio of deionized water to gallium metal to be 15:1.
2)在常压条件下,将体系加热至95℃,同时以20L/min的速度向体系中鼓入空气,在转速为1200r/min的机械搅拌条件下反应2h,使金属镓转化为羟基氧化镓。2) Under normal pressure, heat the system to 95°C, and at the same time blow air into the system at a speed of 20L/min, and react for 2h under the condition of mechanical stirring at a speed of 1200r/min, so that gallium metal is converted into oxyhydroxide gallium.
3)反应结束后,在95℃温度下对所得混合料浆进行过滤,实现固液分离,滤渣用去离子水洗涤8次。3) After the reaction, the obtained mixed slurry was filtered at a temperature of 95° C. to realize solid-liquid separation, and the filter residue was washed 8 times with deionized water.
4)将滤渣在180℃温度下干燥12h,得到高纯羟基氧化镓粉体材料。4) Dry the filter residue at 180° C. for 12 hours to obtain a high-purity gallium oxyhydroxide powder material.
采用本实施例的处理方法,通过王水溶解结合电感耦合等离子体质谱仪(ICP-MS)分析羟基氧化镓的转化率和产品纯度,结果为金属镓向羟基氧化镓的转化率为99.53%,羟基氧化镓产品纯度为99.998%。Using the processing method of the present embodiment, the conversion rate and product purity of gallium oxyhydroxide were analyzed by aqua regia dissolution combined with inductively coupled plasma mass spectrometer (ICP-MS), and the result was that the conversion rate of metal gallium to gallium oxyhydroxide was 99.53%. Gallium oxyhydroxide product has a purity of 99.998%.
实施例3Example 3
本实施例提供一种高效制备羟基氧化镓的方法,具体包括以下步骤:This embodiment provides a method for efficiently preparing gallium oxyhydroxide, which specifically includes the following steps:
1)将纯度为4N的金属镓按比例加入去离子水中,控制去离子水与金属镓的质量比为4:1。1) Add gallium metal with a purity of 4N to deionized water in proportion, and control the mass ratio of deionized water to gallium metal to be 4:1.
2)在常压条件下,将体系加热至45℃,同时以5L/min的速度向体系中鼓入氧气,在转速为450r/min的机械搅拌条件下反应4h,使金属镓转化为羟基氧化镓。2) Under normal pressure, heat the system to 45°C, and at the same time blow oxygen into the system at a speed of 5L/min, and react for 4h under the condition of mechanical stirring at a speed of 450r/min, so that gallium metal is converted into oxyhydroxide gallium.
3)反应结束后,在45℃温度下对所得混合料浆进行过滤,实现固液分离,滤渣用去离子水洗涤4次。3) After the reaction, the obtained mixed slurry was filtered at a temperature of 45° C. to realize solid-liquid separation, and the filter residue was washed 4 times with deionized water.
4)将滤渣在130℃温度下干燥18h,得到高纯羟基氧化镓粉体材料。4) Dry the filter residue at 130° C. for 18 hours to obtain a high-purity gallium oxyhydroxide powder material.
采用本实施例的处理方法,通过王水溶解结合电感耦合等离子体质谱仪(ICP-MS)分析羟基氧化镓的转化率和产品纯度,结果为金属镓向羟基氧化镓的转化率为99.23%,羟基氧化镓产品纯度为99.996%。Using the processing method of the present embodiment, the conversion rate and product purity of gallium oxyhydroxide were analyzed by aqua regia dissolution combined with inductively coupled plasma mass spectrometer (ICP-MS), and the result was that the conversion rate of metal gallium to gallium oxyhydroxide was 99.23%. Gallium oxyhydroxide product has a purity of 99.996%.
实施例4Example 4
本实施例提供一种高效制备羟基氧化镓的方法,具体包括以下步骤:This embodiment provides a method for efficiently preparing gallium oxyhydroxide, which specifically includes the following steps:
1)将纯度为4N的金属镓按比例加入去离子水中,控制去离子水与金属镓的质量比为8:1。1) Add gallium metal with a purity of 4N to deionized water in proportion, and control the mass ratio of deionized water to gallium metal to be 8:1.
2)在常压条件下,将体系加热至55℃,同时以10L/min的速度向体系中鼓入空气,在转速为600r/min的机械搅拌条件下反应8h,使金属镓转化为羟基氧化镓。2) Under normal pressure, heat the system to 55°C, and at the same time blow air into the system at a speed of 10L/min, and react for 8h under the condition of mechanical stirring at a speed of 600r/min, so that gallium metal is converted into oxyhydroxide gallium.
3)反应结束后,在55℃温度下对所得混合料浆进行过滤,实现固液分离,滤渣用去离子水洗涤5次。3) After the reaction, the obtained mixed slurry was filtered at a temperature of 55° C. to realize solid-liquid separation, and the filter residue was washed 5 times with deionized water.
4)将滤渣在140℃温度下干燥24h,得到高纯羟基氧化镓粉体材料。4) Dry the filter residue at 140° C. for 24 hours to obtain a high-purity gallium oxyhydroxide powder material.
采用本实施例的处理方法,通过王水溶解结合电感耦合等离子体质谱仪(ICP-MS)分析羟基氧化镓的转化率和产品纯度,结果为金属镓向羟基氧化镓的转化率为99.37%,羟基氧化镓产品纯度为99.997%。Using the processing method of the present embodiment, the conversion rate and product purity of gallium oxyhydroxide were analyzed by aqua regia dissolution combined with inductively coupled plasma mass spectrometer (ICP-MS), and the result was that the conversion rate of metal gallium to gallium oxyhydroxide was 99.37%. Gallium oxyhydroxide product has a purity of 99.997%.
实施例5Example 5
本实施例提供一种高效制备羟基氧化镓的方法,具体包括以下步骤:This embodiment provides a method for efficiently preparing gallium oxyhydroxide, which specifically includes the following steps:
1)将纯度为4N的金属镓按比例加入去离子水中,控制去离子水与金属镓的质量比为12:1。1) Add gallium metal with a purity of 4N to deionized water in proportion, and control the mass ratio of deionized water to gallium metal to be 12:1.
2)在常压条件下,将体系加热至70℃,同时以15L/min的速度向体系中鼓入氧气,在转速为800r/min的机械搅拌条件下反应10h,使金属镓转化为羟基氧化镓。2) Under normal pressure, heat the system to 70°C, and at the same time blow oxygen into the system at a speed of 15L/min, and react for 10h under the condition of mechanical stirring at a speed of 800r/min, so that gallium metal is converted into oxyhydroxide gallium.
3)反应结束后,在70℃温度下对所得混合料浆进行过滤,实现固液分离,滤渣用去离子水洗涤6次。3) After the reaction, the obtained mixed slurry was filtered at a temperature of 70° C. to realize solid-liquid separation, and the filter residue was washed 6 times with deionized water.
4)将滤渣在160℃温度下干燥36h,得到高纯羟基氧化镓粉体材料。4) Dry the filter residue at 160° C. for 36 hours to obtain a high-purity gallium oxyhydroxide powder material.
采用本实施例的处理方法,通过王水溶解结合电感耦合等离子体质谱仪(ICP-MS)分析羟基氧化镓的转化率和产品纯度,结果为金属镓向羟基氧化镓的转化率为99.42%,羟基氧化镓产品纯度为99.996%。Using the processing method of the present embodiment, the conversion rate and product purity of gallium oxyhydroxide were analyzed by aqua regia dissolution combined with inductively coupled plasma mass spectrometer (ICP-MS), and the result was that the conversion rate of metal gallium to gallium oxyhydroxide was 99.42%. Gallium oxyhydroxide product has a purity of 99.996%.
以上公开的本发明优选实施例只是用于帮助阐述本发明。优选实施例并没有详尽叙述所有的细节,也不限制该发明仅为具体实施方式。显然,根据本说明书的内容,可作很多的修改和变化。本说明书选取并具体描述这些实施例,是为了更好地解释本发明的原理和实际应用,从而使所属技术领域技术人员能很好地理解和利用本发明。本发明仅受权利要求书及其全部范围和等效物的限制。The preferred embodiments of the invention disclosed above are only to help illustrate the invention. The preferred embodiments do not exhaust all details nor limit the invention to specific implementations. Obviously, many modifications and variations can be made based on the contents of this specification. This description selects and specifically describes these embodiments in order to better explain the principle and practical application of the present invention, so that those skilled in the art can well understand and utilize the present invention. The invention is to be limited only by the claims, along with their full scope and equivalents.
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